JP2022086829A - Film manufacturing system - Google Patents

Abstract

To provide a film manufacturing system which can improve manufacturing efficiency of a film.SOLUTION: A film manufacturing system 1 includes an extrusion molding device 2, a width direction extension device 4B extending a molded base material S in a width direction TD, and a control device 11. The control device 11 can execute first extension step (S1) of extending the base material S in the width direction TD while conveying the base material S at first conveyance speed, speed increase step (S3) of increasing the conveyance speed of the base material S from the first conveyance speed to second conveyance speed, rail pattern changing step (S4) of narrowing a space between a first rail 43A and a second rail 44A on an inlet side of the width direction extension device 4B, according to the width of the base material S narrowed by the speed increase step (S3), and second extension step (S5) of extending the base material S in a flow direction MD and the width direction TD while conveying the base material S at the second conveyance speed.SELECTED DRAWING: Figure 4

Description

The present invention relates to a film manufacturing system.

Conventionally, a melt extrusion film forming apparatus, a flow direction stretching apparatus for stretching a film-formed resin film in a flow direction, and a width direction stretching apparatus for stretching a resin film stretched in a flow direction in a width direction are sequentially included. Stretch-type film manufacturing equipment is known (see, for example, Patent Document 1).

Japanese Unexamined Patent Publication No. 2020-023170

In the manufacturing system as described in Patent Document 1 described above, for example, when the transport speed of the base material increases with the increase of the draw ratio in the flow direction, the width of the base material becomes narrow (so-called neck-in phenomenon). .. Therefore, it is necessary for the operator to change the rail pattern of the width direction stretching device according to the width of the base material. To change the rail pattern, the operator must manually move the multiple rails that make up the rail pattern, or operate the control panel of the manufacturing system to move the multiple rails. Therefore, it takes time and labor to change the rail pattern, and it is difficult to improve the production efficiency of the film.

The present invention provides a film manufacturing system capable of improving film production efficiency.

The present invention [1] is an extrusion molding device that forms a molten resin into a sheet-shaped base material, and a width direction stretching device that stretches the base material conveyed in the flow direction in the width direction, in the width direction. A first clip that grips one end of the base material, a second clip that grips the other end of the base material in the width direction, a first rail on which the first clip travels, and the second clip travel. A width direction stretching device having a second rail and a control device for controlling the extrusion molding device and the width direction stretching device are provided, and the control device transports the base material at the first transport speed and the base. When the first stretching step of stretching the material at least in the width direction, the speed increasing step of increasing the transport speed of the base material from the first transport speed to the second transport speed, and the speed increase step are executed, the said. A rail pattern changing step for narrowing the distance between the first rail and the second rail on the inlet side of the widthwise stretching device according to the width of the base material narrowed by an increase in the transport speed, and the base material. It comprises a film manufacturing system capable of performing a second stretching step of stretching the substrate in the flow direction and the width direction while transporting at the second transport speed.

According to such a configuration, the width direction stretching device automatically as the transfer speed of the base material increases, without the operator manually moving the first rail and the second rail by manual operation or operation of the control panel. The distance between the first rail and the second rail on the entrance side of the above can be narrowed according to the width of the base material.

As a result, when the transport speed of the base material increases, such as when the draw ratio in the flow direction is increased, the width direction stretching device grips one end of the base material in the width direction with the first clip and the second clip. Can grab the other end of the substrate in the width direction.

As a result, the production efficiency of the film can be improved.

The present invention [2] further includes a flow direction stretching device that stretches the base material in the flow direction, and the width direction stretching device stretches the base material that has passed through the flow direction stretching device in the width direction. The control device increases the stretching ratio in the flow direction by increasing the first transport speed to the second transport speed in the speed increasing step, and increases the stretching ratio in the flow direction in the rail pattern changing step. The film manufacturing system of the above [1] is included, in which the distance between the first rail and the second rail on the inlet side of the widthwise stretching device is narrowed according to the width of the base material narrowed by the rise of the above. ..

According to such a configuration, when the width of the base material becomes narrower as the draw ratio in the flow direction increases, the distance between the first rail and the second rail on the inlet side of the width direction stretching device is automatically set. Can be narrowed according to the width of the base material.

Therefore, it is possible to improve the production efficiency of the film in the configuration having the flow direction stretching device and the width direction stretching device.

According to the film manufacturing system of the present invention, the production efficiency of the film can be improved.

FIG. 1 is a cross-sectional view of a film manufactured by a film manufacturing system according to an embodiment of the present invention. FIG. 2 is a schematic configuration diagram of a film manufacturing system. FIG. 3 is an explanatory diagram illustrating the second stretching apparatus of FIG. 2, and shows a state in which the first stretching step is being executed. FIG. 4 is a flowchart for explaining the control of the film manufacturing system. FIG. 5 is an explanatory diagram illustrating the second stretching apparatus of FIG. 2, and shows a state in which the second stretching step is being executed.

1. 1. Film Manufacturing System A film F manufacturing system 1 will be described.

As shown in FIG. 1, the film F includes a base material S and a film C. The base material S has a first surface S1 and a second surface S2 in the thickness direction of the base material S. The coating film C is arranged on the first surface S1 of the base material S. The coating film C covers the first surface S1 of the base material S. The coating film C may be an easy-adhesive layer. When the film C is an easy-adhesive layer, the film F is an easy-adhesive film. The easy-adhesive film is used, for example, as a polarizing plate of an image display device such as a mobile device, a car navigation device, a monitor for a personal computer, and a television. Specifically, the easy-adhesive film is used as a protective film that protects the polarizing element of the polarizing plate. The easy-adhesive film is bonded to the polarizing element via an adhesive layer. The easy-adhesive film is an easy-adhesive layer and is bonded to a polarizing element.

As shown in FIG. 2, the film F manufacturing system 1 includes an extrusion molding device 2, a flow direction stretching device 4A, a coating device 3, a width direction stretching device 4B, a slit processing device 5, and a knurling processing device. 6 and a take-up device 7.

(1) Extrusion molding device The extrusion molding device 2 molds a molten resin in which a thermoplastic resin is melted into a sheet-shaped base material S.

Examples of the thermoplastic resin include acrylic resin, polyolefin resin, cyclic polyolefin resin, polyester resin (polyethylene terephthalate, etc.), polycarbonate resin, polystyrene resin, polyamide resin, polyimide resin, acetate resin (diacetyl cellulose, triacetyl cellulose, etc.) and the like. Can be mentioned.

When an easy-adhesive film used as a protective film for a polarizing element is produced, acrylic resin is preferable as the material of the base material S.

Further, when producing an easy-adhesion film used as a protective film for a polarizing element, the acrylic resin may be an acrylic resin having a glutaric acid anhydride structure or an acrylic resin having a lactone ring structure. Acrylic resin having a glutaric acid anhydride structure and acrylic resin having a lactone ring structure have high heat resistance, high transparency, and high mechanical strength, so that the polarizing plate has a high degree of polarization and excellent durability. Suitable for manufacturing. Acrylic resins having a glutaric acid anhydride structure are described in JP-A-2006-283013, JP-A-2006-335902, and JP-A-2006-274118. Acrylic resins having a lactone ring structure are described in JP-A-2000-230016, JP-A-2001-151814, JP-A-2002-120326, JP-A-2002-254544, and JP-A-2005-146084. Has been done.

Further, the base material S may contain a thermoplastic resin other than the acrylic resin in addition to the acrylic resin. By containing another thermoplastic resin, it is possible to cancel the birefringence of the acrylic resin and obtain an easily adhesive film having excellent optical anisotropy. In addition, the mechanical strength of the easy-adhesive film can be improved.

The base material S may contain additives such as antioxidants, stabilizers, reinforcing materials, ultraviolet absorbers, flame retardants, antistatic agents, colorants, fillers, plasticizers, lubricants and fillers. ..

(2) Flow Direction Stretching Device The flow direction stretching device 4A heats the base material S transported in the flow direction MD and then stretches it in the flow direction MD.

(3) Coating device The coating device 3 applies a coating liquid to the first surface S1 of the base material S. Examples of the coating device include a bar coater, a gravure coater, and a kiss coater. The first surface S1 of the base material S may be subjected to surface treatment such as corona treatment and plasma treatment before the coating liquid is applied.

When producing an easy-adhesive film, the coating liquid is an easy-adhesive composition for forming an easy-adhesive layer.

The easy-adhesion layer contains a binder resin and fine particles.

Examples of the binder resin include thermosetting resins such as urethane resin and epoxy resin, and thermoplastic resins such as acrylic resin and polyester resin. When the easy-adhesive film is used as a protective film for a stator, the binder resin is preferably a thermosetting resin. A plurality of types of binder resin can be used in combination.

Examples of the fine particles include oxides such as silicon oxide (silica), titanium oxide (titania), aluminum oxide (alumina), and zirconium oxide (zirconia), and carbonates such as calcium carbonate, such as calcium silicate and silicate. Examples thereof include silicates such as aluminum acetate and magnesium silicate, for example, silicate minerals such as talc and kaolin, for example, phosphates such as calcium phosphate. When the easy-adhesive film is used as a protective film for a stator, the fine particles are preferably an oxide, more preferably silicon oxide. A plurality of types of fine particles can be used in combination.

The coating liquid (easy-adhesive composition) contains a resin component, the above-mentioned fine particles, and a dispersion medium.

The resin component forms the above-mentioned binder resin film (easy-adhesive layer). When the binder resin is a urethane resin, examples of the resin component include an aqueous urethane resin. Examples of the water-based urethane resin include a non-reactive water-based urethane resin which is an emulsion of a urethane resin, and for example, a reaction-type water-based urethane resin which is an emulsion of a urethane resin in which an isocyanate group is protected with a blocking agent. When the binder resin is a urethane resin, the coating liquid may contain a urethane curing catalyst (such as triethylamine) and an isocyanate monomer.

Examples of the dispersion medium include water, for example, alcohols such as methanol and ethanol, and ketones such as acetone and methyl ethyl ketone.

(4) Width direction stretching device The width direction stretching device 4B dries the coating liquid applied to the base material S. As a result, the coating liquid becomes the above-mentioned film C. Further, the width direction stretching device 4B heats the base material S on which the coating film C is formed and then stretches it in the width direction TD. The width direction TD is orthogonal to the flow direction MD. The film F described above is obtained by stretching the base material S on which the film C is formed in the width direction TD.

Specifically, as shown in FIG. 3, the widthwise stretching device 4B has an inlet 41, an outlet 42, a preheating region A1, a stretching region A2, and a cooling region A3. The preheating region A1 is arranged between the inlet 41 and the stretching region A2 in the flow direction MD. The preheating region A1 heats the base material S. The stretched region A2 is arranged between the preheated region A1 and the cooling region A3 in the flow direction MD. The stretched region A2 stretches the base material S in the width direction TD. The cooling region A3 is arranged between the stretching region A2 and the outlet 42 in the flow direction MD. The cooling region A3 cools the base material S.

The widthwise stretching device 4B further includes a plurality of first rails 43A to 43I, a plurality of second rails 44A to 44I, a plurality of first clips 45, and a plurality of second clips 46.

The first rails 43A to 43I are arranged in the order of the first rails 43A to 43I from the inlet 41 to the outlet 42 in the widthwise stretching device 4B. By arranging the first rails 43A to 43I, the first rail pattern P1 is formed. Specifically, the first rails 43A to 43D in the preheating region A1 are arranged along the flow direction MD. The first rails 43E to 43G in the stretched region A2 are arranged in a direction inclined with respect to the flow direction MD. The first rails 43E to 43G move away from the second rails 44E to 44G toward the downstream side of the flow direction MD. The first rails 43H and 43I in the cooling region A3 are arranged along the flow direction MD.

The second rails 44A to 44I are arranged at intervals from the first rails 43A to 43I in the width direction TD. The second rails 44A to 44I are arranged in the order of the second rails 44A to 44I from the inlet 41 to the outlet 42 in the widthwise stretching device 4B. By arranging the second rails 44A to 44I, the second rail pattern P2 is formed. Specifically, the second rails 44A to 44D in the preheating region A1 are arranged along the flow direction MD. The second rails 44A to 44D are spaced apart from the first rails 43A to 43D in the width direction TD. The second rails 44E to 44G in the stretched region A2 are arranged in a direction inclined with respect to the flow direction MD. The second rails 44E to 44G move away from the first rails 43E to 43G toward the downstream side of the flow direction MD. The distance between the first rail 43F and the second rail 44F in the width direction TD is wider than the distance between the first rail 43E and the second rail 44E in the width direction TD. The distance between the first rail 43G and the second rail 44G in the width direction TD is wider than the distance between the first rail 43F and the second rail 44F in the width direction TD. The second rails 44H and 44I in the cooling region A3 are arranged along the flow direction MD. The second rails 44H and 44I are separated from the first rails 43H and 43I in the width direction TD.

The plurality of first clips 45 travel on the first rail pattern P1. In other words, the plurality of first clips 45 travel on the first rails 43A to 43I. Each of the plurality of first clips 45 grips one end E1 of the base material S in the widthwise direction TD from the inlet 41 to the outlet 42.

The plurality of second clips 46 travel on the second rail pattern P2. In other words, the plurality of second clips 46 travel on the second rails 44A to 44I. Each of the plurality of second clips 46 grips the other end E2 of the base material S in the widthwise direction TD from the inlet 41 to the outlet 42.

(5) Slit processing device As shown in FIG. 2, the slit processing device 5 cuts the film F to a predetermined width.

(6) Knurling device The knurling device 6 forms knurls at both ends of the film F cut to a predetermined width in the width direction. Knar is formed by a laser. Knar may be formed by heated embossed rolls.

(7) Winding device The winding device 7 winds up the film F on which nal is formed. When the winding is completed, a roll of the film F can be obtained.

2. 2. Details of the film manufacturing system The film manufacturing system 1 further includes a control device 11.

The control device 11 controls the operation of the film manufacturing system 1. Specifically, the control device 11 is electrically connected to the extrusion molding device 2, the flow direction stretching device 4A, the coating device 3, the width direction stretching device 4B, the slit processing device 5, the knurling processing device 6, and the winding device 7. Will be done. The control device 11 controls an extrusion molding device 2, a flow direction stretching device 4A, a coating device 3, a width direction stretching device 4B, a slit processing device 5, a knurling processing device 6, and a winding device 7. As shown in FIG. 4, the control device 11 can execute the first stretching step (S1), the speed increasing step (S3), the rail pattern changing step (S4), and the second stretching step (S5). be.

(1) First Stretching Step In the first stretching step (S1), the control device 11 stretches the base material S that has passed through the flow direction stretching device 4A in the width direction while transporting the base material S at the first transport speed. In the device 4B, it is stretched in the width direction TD. In the first stretching step (S1), the base material S does not have to be stretched in the flow direction MD by the flow direction stretching device 4A.

In the first stretching step (S1), the distance between the first rail 43A and the second rail 44A in the width direction TD is D1. The distance between the first rail 43B and the second rail 44B in the width direction TD, the distance between the first rail 43C and the second rail 44C in the width direction TD, and the first rail 43D and the second rail in the width direction TD. The distance from 44D is also D1.

Further, the distance between the first rail 43I and the second rail 44I in the width direction TD is D2. The interval D2 is wider than the interval D1. The distance between the first rail 43H and the second rail 44H in the width direction TD is also D2.

(2) Speed increase step As shown in FIG. 4, when the operator operates a control panel (not shown) to increase the stretch ratio of the film F (S2: YES), the control device 11 performs the speed increase step (S3). To execute.

In the speed increase step (S3), the control device 11 controls the flow direction stretching device 4A to increase the transport speed of the base material S from the first transport speed to the second transport speed, whereby the stretch ratio in the flow direction MD. Raise. Then, the width of the base material S becomes narrower due to the increase in the draw ratio in the flow direction MD (neck-in phenomenon).

Therefore, as shown in FIG. 5, the width W2 of the base material S entering the inlet 41 of the widthwise stretching device 4B is the width of the base material S entering the inlet 41 of the widthwise stretching device 4B in the first stretching step (S1). It is narrower than W1 (see FIG. 3).

(3) Rail pattern change step Next, as shown in FIG. 4, when the speed increase step (S3) is executed, the control device 11 executes the rail pattern change step (S4).

In the rail pattern change step (S4), as shown in FIG. 5, the control device 11 is located on the inlet 41 side of the widthwise stretching device 4B according to the width W2 of the base material S narrowed by the speed increase step (S3). The distance between the first rail 43A and the second rail 44A is narrowed. The control device 11 moves the first rail 43A and the second rail 44A in the width direction TD to narrow the distance between the first rail 43A and the second rail 44A. In the rail pattern change step (S4), the shapes of the first rail pattern P1 and the second rail pattern P2 are changed.

After the rail pattern change step (S4) is executed, the distance between the first rail 43A and the second rail 44A in the width direction TD is D3. The interval D3 is narrower than the interval D1 (see FIG. 3). The distance between the first rail 43B and the second rail 44B in the width direction TD, the distance between the first rail 43C and the second rail 44C in the width direction TD, and the first rail 43D and the second rail in the width direction TD. The distance from the 44D is D3, which is the same as the distance between the first rail 43A and the second rail 44A in the width direction TD.

Further, the control device 11 moves each of the first rails 43E to G and each of the second rails 44E to G in the width direction TD at a predetermined ratio with respect to the interval D3, and moves the first rail 43E. The distance between the first rail 44E and the second rail 44E, the distance between the first rail 43F and the second rail 44F, and the distance between the first rail 43G and the second rail 44G are narrowed.

In this embodiment, the control device 11 does not move the first rails 43H and 43I and the second rails 44H and 44I.

The amount of movement of the first rails 43A to 43G and the second rails 44A to 44G is determined in advance by experiment or calculation based on the amount of variation in the width of the base material S in the speed increase step (S3). In the present embodiment, the control device 11 uses the movement amount of the first rails 43A to 43G and the movement amount of the second rails 44A to 44G when the first transfer speed is changed to the second transfer speed as set values. I remember. The control device 11 moves the first rails 43A to 43G and the second rails 44A to 44G based on the set value.

As a result, the operator does not manually move the first rails 43A to 43G and the second rails 44A to 44G by manual operation or operation of the control panel, and the first rail automatically increases with the increase of the draw ratio in the flow direction MD. The rail pattern P1 and the second rail pattern P2 can be changed according to the width W2 of the base material S.

Therefore, even when the draw ratio in the flow direction MD is increased, the plurality of first clips 45 grip one end E1 of the base material S in the width direction TD, and the plurality of second clips 46 hold the base in the width direction TD. The other end E2 of the material S can be gripped.

As a result, the production efficiency of the film F can be improved.

(4) Second Stretching Step When the rail pattern changing step (S4) is completed, the control device 11 executes the second stretching step (S5).

In the second stretching step (S5), the control device 11 stretches the base material S in the flow direction MD at the stretching ratio set in the speed increasing step (S3) in the flow direction stretching device 4A, and the width direction stretching device. In 4B, the base material S is stretched in the width direction TD by the first rail pattern P1 and the second rail pattern P2 changed by the rail pattern changing step (S4) while transporting the base material S at the second transport speed. ..

In the present embodiment, the stretching ratio in the second stretching step (S5) is higher than the stretching ratio in the first stretching step (S1) in both the flow direction MD and the width direction TD.

3. 3. Modification example (1) The control device 11 moves the first rails 43A to 43G and the second rails 44A to 44G based on the amount of change in the transport speed due to the increase in the draw ratio in the flow direction MD. The first rail 43A to 43G and the second rail 44A to 44G may be moved based on the calculation result.

Further, the control device 11 measures the width W2 of the base material S after the speed increase step (S3), and moves the first rails 43A to 43G and the second rails 44A to 44G based on the measurement results. May be.

(2) The increase in the transport speed of the base material S in the speed increase step (S3) is not limited to the increase in the transport speed for increasing the draw ratio of the flow direction MD. The transfer speed may be increased in order to increase the production speed of the production system 1 of the film F.

(3) The film F manufacturing system 1 does not have to include the flow direction stretching device 4A. The base material S coated with the coating liquid may be stretched (biaxial simultaneous stretching) in the flow direction MD and the width direction TD by the width direction stretching device 4B.

(4) The film F manufacturing system 1 may include a masking film feeding device for feeding out the masking film and a bonding device for bonding the fed out masking film to the film F, instead of the narling processing device 6.

1 Film manufacturing system 2 Extrusion molding device 4B Width direction stretching device 11 Control device 43A 1st rail 44A 2nd rail 45 1st clip 46 2nd clip F film S base material S1 1st stretching step S3 Speed increase step S4 Rail pattern Change step S5 Second stretching step

Claims (2)

Extrusion molding equipment that molds molten resin into a sheet-shaped base material,
A widthwise stretching device that stretches the base material conveyed in the flow direction in the width direction, the first clip that grips one end of the base material in the width direction, and the other end of the base material in the width direction. A widthwise stretching device having a second clip for gripping a portion, a first rail on which the first clip travels, and a second rail on which the second clip travels.
A control device for controlling the extrusion molding device and the widthwise stretching device is provided.
The control device is
A first stretching step of stretching the base material at least in the width direction while transporting the base material at the first transport speed.
A speed increasing step of increasing the transport speed of the base material from the first transport speed to the second transport speed,
When the speed increase step is executed, the distance between the first rail and the second rail on the inlet side of the widthwise stretching device is narrowed according to the width of the base material narrowed by the increase in the transport speed. Rail pattern change step and
A film manufacturing system capable of performing a second stretching step of stretching the base material in the flow direction and the width direction while transporting the base material at the second transport speed. Further provided with a flow direction stretching device for stretching the base material in the flow direction,
The width direction stretching device stretches the base material that has passed through the flow direction stretching device in the width direction.
The control device is
In the speed increase step, by increasing the transport speed of the base material from the first transport speed to the second transport speed, the stretching ratio in the flow direction is increased.
In the rail pattern changing step, the distance between the first rail and the second rail on the inlet side of the widthwise stretching device is narrowed according to the width of the base material that is narrowed by the increase in the stretching ratio in the flow direction. The film manufacturing system according to claim 1.

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