JP2022062985A - Substrate processing method and substrate processing apparatus - Google Patents

Abstract

To provide a substrate processing method and a substrate processing apparatus capable of appropriately determining presence or absence of leakage of processing liquid from a valve.SOLUTION: The present invention relates to a substrate processing method and a substrate processing apparatus 1. A substrate processing method includes a detection step, a leak determination step, and a constant pressure step CC. The detection step detects a position of a first piston 18. In the leak determination step, the method acquires change in a position of the first piston 18 in a determination period J based on a detection result obtained in the detection step. In the leak determination step, the method determines presence or absence of leakage of processing liquid from a first valve based on the change in the position of the first piston 18 in the determination period J. In the constant pressure step CC, the method closes the first valve. In the constant pressure step CC, the method adjusts the position of the first piston 18 so as to keep pressure in a first pump chamber at a target value. All of the determination period J is included in a period in which the constant pressure process CC is executed.SELECTED DRAWING: Figure 6

Description

The present invention relates to a substrate processing method and a substrate processing apparatus.

Patent Document 1 includes a substrate processing apparatus. The substrate processing apparatus includes a pump, nozzles, and piping. The piping connects the pump and the nozzle in communication. The pump sends the processing liquid to the nozzle. The nozzle discharges the processing liquid onto the substrate.

The substrate processing device includes a valve and a flow meter. The valve and flow meter are each installed on the pipe. The valve opens and closes the flow path in the pipe. The flow meter detects the flow rate of the processing liquid flowing through the pipe.

In the process of supplying the processing liquid to the substrate, the valve opens and the flow meter detects the flow rate of the processing liquid supplied to the substrate. In the step of detecting the leakage of the treatment liquid from the valve, the valve is closed and the flow meter detects the flow rate of the treatment liquid leaking from the valve.

Japanese Unexamined Patent Publication No. 2017-46017

However, in the case of the conventional example having such a configuration, there are the following problems. Even when the treatment liquid leaks from the valve, the amount of the treatment liquid leaked from the valve is extremely small. Therefore, it may be difficult to appropriately determine the presence or absence of leakage of the treatment liquid from the valve based on the detection result of the flow meter.

The present invention has been made in view of such circumstances, and an object of the present invention is to provide a substrate processing method and a substrate processing apparatus capable of appropriately determining the presence or absence of leakage of a treatment liquid from a valve.

The present invention has the following configuration in order to achieve such an object. That is, the present invention is a substrate processing method, in which the volume of the first pump chamber is reduced by moving the first piston with respect to the first pump chamber, and the first pump chamber is communicated with the first pump chamber. A supply step of opening a valve, sending a treatment liquid from the first pump chamber to a nozzle via the first valve, and discharging the treatment liquid from the nozzle to a substrate, and a detection step of detecting the position of the first piston. , The change in the position of the first piston in the determination period is acquired based on the detection result obtained by the detection step, and the process from the first valve is based on the change in the position of the first piston in the determination period. A leak determination step for determining the presence or absence of a liquid leak and a constant pressure step for closing the first valve and adjusting the position of the first piston so as to keep the pressure in the first pump chamber at a target value are provided. The entire determination period is a substrate processing method included in the period during which the constant pressure step is executed.

The substrate processing method includes a supply process. The supply process opens the first valve. The supply step reduces the volume of the first pump chamber by moving the first piston relative to the first pump chamber. In the supply process, the processing liquid is sent from the first pump chamber to the nozzle via the first valve. In the supply process, the processing liquid is discharged from the nozzle to the substrate. Therefore, the supply process can appropriately process the substrate.

The substrate processing method includes a detection step, a leak determination step, and a constant pressure step. The detection step detects the position of the first piston. The leak determination step acquires a change in the position of the first piston during the determination period based on the detection result obtained by the detection step. The leak determination step determines whether or not there is a leak of the treatment liquid from the first valve based on the change in the position of the first piston during the determination period. Hereinafter, the leak of the treatment liquid from the first valve is simply referred to as “leak”. In the constant pressure step, the first valve is closed. In the constant pressure step, the position of the first piston is adjusted so as to keep the pressure in the first pump chamber at the target value. Therefore, if a leak occurs in the constant pressure process, the constant pressure process can continuously generate the leak. Here, the entire determination period is included in the period in which the constant pressure step is executed. Therefore, the leak determination step can suitably determine the presence or absence of a leak.

In the substrate processing method described above, the first valve includes an inlet port communicating with the first pump chamber and an outlet port communicating with the nozzle, and the constant pressure step is performed in the first pump chamber. It is preferable to apply pressure to the inlet port of the first valve. The constant pressure process keeps the pressure received by the inlet port of the first valve at the target value. Therefore, if the first valve leaks the treatment liquid in the constant pressure step, the constant pressure step can suitably lengthen the leak generation period.

In the above-mentioned substrate processing method, the target value is preferably higher than the atmospheric pressure. The constant pressure step can suitably reveal the leak. Therefore, in the leak determination step, the presence or absence of a leak can be suitably determined.

In the above-mentioned substrate processing method, as at least one of the height difference between the first pump chamber and the first valve and the height difference between the first pump chamber and the nozzle becomes larger, the said It is preferable that the target value is set so that the target value becomes high. For example, regardless of the height difference between the first pump chamber and the first valve, the constant pressure step can appropriately reveal the leak. For example, the constant pressure step can appropriately reveal leaks regardless of the height difference between the first pump chamber and the nozzle. Therefore, in the leak determination step, the presence or absence of a leak can be suitably determined.

In the substrate processing method described above, it is preferable that the nozzle is arranged at the processing position in the supply step and the nozzle is arranged at the standby position in the constant pressure step. Even if a leak occurs in the constant pressure process, the quality of processing on the substrate can be preferably maintained.

In the substrate processing method described above, in the leak determination step, the change in the position of the first piston that reduces the volume of the first pump chamber and the position of the first piston that increases the volume of the first pump chamber. It is preferable to distinguish it from changes. In the leak determination step, the direction of the leak can be suitably specified. Specifically, the leak determination step can suitably determine whether the first valve leaks the treatment liquid from the first pump chamber to the nozzle or leaks the treatment liquid from the nozzle to the first pump chamber.

In the above-mentioned substrate processing method, it is preferable that the leak determination step determines the presence or absence of leakage of the processing liquid from the first valve based on the moving distance of the first piston during the determination period. The leak determination step can appropriately determine the presence or absence of a leak.

In the substrate processing method described above, it is preferable that the leak determination step determines the presence or absence of leakage of the processing liquid from the first valve based on the average speed of the first piston during the determination period. The leak determination step can appropriately determine the presence or absence of a leak.

In the above-mentioned substrate processing method, the determination period includes the first determination period, and from the first time when the pressure in the first pump chamber becomes within the allowable range of the target value for the first time after the constant pressure step is started. It is preferable that the first determination period starts. The first determination period does not include the period before the first time. In the period before the first time, the constant pressure step moves the first piston in order to bring the pressure in the first pump chamber closer to the target value. Therefore, the leak determination step can accurately determine the presence or absence of a leak. The first determination period starts from the first time. That is, the first determination period includes the period immediately after the first time. Leaks are likely to occur in the period immediately following the first time. Therefore, in the leak determination step, the presence or absence of a leak can be determined more accurately.

In the above-mentioned substrate processing method, the time length of the first determination period is preferably 8 seconds or less. The first determination period is relatively short. Therefore, the leak determination step can quickly determine the presence or absence of a leak.

In the substrate processing method described above, in the leak determination step, the first determination period is divided into a plurality of division periods, the movement distance of the first piston in each division period is calculated, and the movement distance of the first piston is calculated. It is preferable to specify the division period in which is equal to or greater than the first threshold value as the change period, and determine whether or not the treatment liquid leaks from the first valve based on the number of change periods. By using the number of change periods, the leak determination step can suitably determine whether or not the change in the position of the first piston is continuously occurring. As described above, the constant pressure step can prolong the leak generation period. Therefore, the presence or absence of a leak can be accurately determined by the combination of the constant pressure process and the leak determination process.

In the above-mentioned substrate processing method, the number of the division periods is preferably 8 or less. The number of split periods is relatively small. Therefore, the leak determination step can easily determine the presence or absence of a leak.

In the substrate processing method described above, it is preferable that the leak determination step determines the presence or absence of leakage of the treatment liquid from the first valve based on the ratio of the number of change periods to the number of division periods. The leak determination step can appropriately determine the presence or absence of a leak.

In the substrate processing method described above, in the leak determination step, the change period in which the moving distance of the first piston is equal to or greater than the second threshold value larger than the first threshold value is specified as an abnormal period, and the abnormal period is excluded. It is preferable to determine the presence or absence of leakage of the treatment liquid from the first valve based on the number of change periods. During the abnormal period, the first piston moves excessively. Excessive movement of the first piston is unlikely to be due to a leak. The leak determination step removes the number of abnormal periods from the number of change periods. Therefore, in the leak determination step, the presence or absence of a leak can be determined more accurately.

In the substrate processing method described above, in the leak determination step, the change period is a positive change period in which the first piston reduces the volume of the first pump chamber, and the first piston is in the first pump chamber. It can be classified into any of the negative change periods that increase the volume, and the presence or absence of leakage of the treatment liquid from the first valve can be determined based on the number of the positive change periods and the number of the negative change periods. preferable. In the leak determination step, the presence or absence of leakage of the treatment liquid from the first valve is determined in consideration of the direction of the leak. Therefore, in the leak determination step, the presence or absence of a leak can be determined more accurately.

In the substrate processing method described above, the first pump is closed, the second valve communicated with the first pump chamber is opened, and the first piston is moved with respect to the first pump chamber. It comprises a first filling step of increasing the volume of the chamber and filling the first pump chamber with the treatment liquid via the second valve, the supply step closing the second valve and the constant pressure step. , The second valve is closed, the supply step moves the first piston by a predetermined first distance, and the first filling step moves the first piston to a predetermined first origin position. The determination period includes the second determination period, the second determination period is the entire period during which the constant pressure step is executed, and the leak determination step is the first when the constant pressure step is completed. The position of the piston, the position of the first piston when the supply process starts, the position of the first piston when the supply process ends, the position of the first piston when the first filling process starts, and the position of the first piston. It is preferable to estimate the moving distance of the first piston in the second determination period based on at least one of the moving distances of the first piston in the first filling step.

The substrate processing method includes a first filling step. Therefore, the treatment liquid can be suitably filled in the first pump chamber. In the supply step and the constant pressure step, the second valve is closed. Therefore, in the supply step, the treatment liquid can be suitably supplied to the substrate. In the constant pressure step, the pressure in the first pump chamber can be kept suitable for the target value. The feeding process moves the first piston by a predetermined first distance. That is, the moving distance of the first piston in the supply process is known. The first filling step moves the first piston to a predetermined first origin position. That is, the position of the first piston at the end of the first filling step is known. Under this condition, each of the following (a)-(e) fluctuates according to the moving distance of the first piston in the constant pressure step. The second determination period is the entire period during which the constant pressure step is executed. Therefore, in the leak determination step, the moving distance of the first piston in the second determination period can be suitably estimated based on the detection result of at least one of (a) and (e).
(A): Position of the first piston when the constant pressure process ends (b): Position of the first piston when the supply process starts (c): Position of the first piston when the supply process ends (d) : Position of the first piston when the first filling step starts (e): Movement distance of the first piston in the first filling step

In the substrate processing method described above, the volume of the second pump chamber is increased by moving the second piston with respect to the second pump chamber, and the first pump chamber and the second pump chamber are communicated with each other. A second valve is closed, a third valve that is not communicated with the first pump chamber but is communicated with the second pump chamber is opened, and the second pump chamber is filled with the treatment liquid via the third valve. The first filling step comprises closing the first valve, opening the second valve, closing the third valve, and moving the second piston with respect to the second pump chamber. Thereby, the volume of the second pump chamber is reduced, the volume of the first pump chamber is increased by moving the first piston with respect to the first pump chamber, and the volume of the first pump chamber is increased from the second pump chamber to the second pump chamber. It is preferable that the treatment liquid is sent to the first pump chamber via a valve, the second valve is closed in the supply step, and the second valve is closed in the constant pressure step. In the first filling step, the treatment liquid can be suitably filled in the first pump chamber by using the second pump chamber. In the second filling step, the treatment liquid can be suitably filled in the second pump chamber. In the supply step and the constant pressure step, the second valve is closed. Therefore, the supply process and the constant pressure process can be appropriately executed.

In the substrate processing method described above, the supply step moves the first piston by a predetermined first distance, and the first filling step moves the first piston to a predetermined first origin position. The first filling step moves the second piston until the first piston reaches the first origin position, and the second filling step moves the second piston to a predetermined second origin position. The detection step detects the position of the second piston, the determination period includes the second determination period, and the second determination period is the entire period during which the constant pressure step is executed. The leak determination step includes the position of the first piston when the constant pressure step ends, the position of the first piston when the supply step starts, and the position of the first piston when the supply step ends. The position of the first piston at the start of the first filling step, the moving distance of the first piston in the first filling step, the moving distance of the second piston in the first filling step, and the first filling step are Based on at least one of the position of the second piston at the end, the position of the second piston at the start of the second filling step, and the moving distance of the second piston in the second filling step. , It is preferable to estimate the moving distance of the first piston in the second determination period. The feeding process moves the first piston by a predetermined first distance. The first filling step moves the first piston to a predetermined first origin position. In the first filling step, the second piston is moved until the first piston reaches the first origin position. The second filling step moves the second piston to a predetermined second origin position. That is, the moving distance of the first piston in the supply process is known. The position of the first piston at the end of the first filling step is known. The moving distance of the second piston in the first filling step is determined by the moving distance of the first piston in the first filling step. The position of the second piston at the end of the second filling step is known. Under this condition, each of the above-mentioned (a)-(e) fluctuates according to the moving distance of the first piston in the constant pressure step. Further, the following (f)-(i) also fluctuate according to the moving distance of the first piston in the constant pressure step. The second determination period is the entire period during which the constant pressure step is executed. Therefore, in the leak determination step, the moving distance of the first piston in the second determination period can be suitably estimated based on the detection result of at least one of (a) and (i).
(F): Movement distance of the second piston in the first filling step (g): Position of the second piston when the first filling step ends (h): When the second filling step starts Position of the second piston (i): Movement distance of the second piston in the second filling step

In the substrate processing method described above, the first valve is closed, the second valve is closed, the third valve is opened, and the fourth valve communicating with the first pump chamber and the second pump chamber is opened. By moving the first piston with respect to the first pump chamber, the volume of the first pump chamber is reduced, the second piston is stopped with respect to the second pump chamber, and the first pump chamber is used. A return step of returning the processing liquid to the second pump chamber is provided, the supply step closes the fourth valve, the constant pressure step closes the fourth valve, and the first filling step is the first filling step. It is preferable that the four valves are closed, the second filling step closes the fourth valve, and the return step moves the first piston by a predetermined second distance. The substrate processing method includes a return step. In the return step, the processing liquid is returned from the first pump chamber to the second pump chamber. For example, even if air is mixed in the first pump chamber, the return step can return the air from the first pump chamber to the second pump chamber together with the processing liquid. Therefore, it is possible to prevent the treatment liquid mixed with air from being supplied to the substrate. Therefore, the quality of processing for the substrate can be preferably maintained. In the supply step, the constant pressure step, the first filling step, and the second filling step, the fourth valve is closed. Therefore, the supply step, the constant pressure step, the first filling step, and the second filling step can be suitably executed. The return step moves the first piston by a predetermined second distance. That is, the moving distance of the first piston in the return step is known. Under this condition, the above-mentioned (a)-(i) still fluctuate according to the moving distance of the first piston in the constant pressure step. Under this condition, the relationship between the fluctuation amount of (a)-(i) and the moving distance of the first piston in the constant pressure step is maintained. Therefore, even when the return step is executed, the leak determination step preferably determines the moving distance of the first piston in the second determination period based on the detection result of at least one of (a) and (i). Can be estimated to.

The present invention is a substrate processing apparatus, and detects the positions of a first pump chamber, a first piston that moves with respect to the first pump chamber and changes the volume of the first pump chamber, and the first piston. A first position sensor, a first pressure sensor for detecting the pressure in the first pump chamber, a first valve communicating with the first pump chamber, a nozzle communicating with the first valve, and the first valve. It includes a control unit that acquires the detection result of the 1-position sensor and the detection result of the first pressure sensor, moves the first piston, and opens and closes the first valve. In the leak determination process, the control unit acquires a change in the position of the first piston during the determination period based on the detection result of the first position sensor, and performs the constant pressure control, and the first position in the determination period. The presence or absence of leakage of the treatment liquid from the first valve is determined based on the change in the position of one piston, and in the constant pressure control, the control unit closes the first valve and the pressure in the first pump chamber. The position of the first piston is adjusted based on the detection result of the first pressure sensor so as to keep the target value, and the entire determination period is performed by the substrate processing apparatus included in the period during which the constant pressure control is executed. be.

The control unit performs leak determination processing and constant pressure control. In the leak determination process, the control unit acquires the change in the position of the first piston during the determination period based on the detection result of the first position sensor. In the leak determination process, the control unit determines whether or not there is a leak of the processing liquid from the first valve based on the change in the position of the first piston during the determination period. In constant pressure control, the control unit closes the first valve. In the constant pressure control, the control unit adjusts the position of the first piston based on the detection result of the first pressure sensor so as to keep the pressure in the first pump chamber at the target value. Therefore, if a leak occurs when the constant pressure control is executed, the constant pressure control can prolong the leak generation period. Here, the entire determination period is included in the period during which the constant pressure control is executed. Therefore, the leak determination process can suitably determine the presence or absence of a leak.

According to the present invention, the presence or absence of leakage of the treatment liquid from the first valve can be appropriately determined.

It is a figure which shows the schematic structure of the substrate processing apparatus which concerns on 1st Embodiment. It is a flowchart which shows the operation procedure of the board processing apparatus. It is a figure which shows the substrate processing apparatus in the 1st filling process. It is a figure which shows the substrate processing apparatus in a constant pressure process. It is a figure which shows the substrate processing apparatus in a supply process. It is a graph which shows the time change of the position of the 1st piston. 7 (a), 7 (b), and 7 (c) are diagrams schematically showing changes in the position of the first piston in the constant pressure process, respectively. It is a graph which illustrates the time change of the pressure of the 1st pump chamber in a constant pressure process. It is a graph which shows an example of the detection result of the 1st position sensor in the 1st determination period. 10 (a) and 10 (b) are examples of the moving distance of the first piston during the division period, respectively. It is a figure which shows the schematic structure of the substrate processing apparatus which concerns on 2nd Embodiment. It is a flowchart which shows the operation procedure of the board processing apparatus. It is a figure which shows the substrate processing apparatus in the 1st filling process. It is a figure which shows the substrate processing apparatus in the return process. It is a figure which shows the substrate processing apparatus in a constant pressure process. It is a figure which shows the substrate processing apparatus in a supply process. FIG. 17A is a graph showing a time change in the position of the first piston, and FIG. 17B is a graph showing a time change in the position of the second piston. It is a figure which shows the schematic structure of the substrate processing apparatus which concerns on a modification embodiment.

First Embodiment Hereinafter, the first embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a diagram showing a schematic configuration of a substrate processing apparatus according to a first embodiment. The substrate processing apparatus 1 according to the first embodiment is an apparatus that processes a substrate (for example, a semiconductor wafer) W.

The substrate W is, for example, a semiconductor wafer, a liquid crystal display substrate, an organic EL (Electroluminescence) substrate, an FPD (Flat Panel Display) substrate, an optical display substrate, a magnetic disk substrate, an optical disk substrate, or a magneto-optical disk substrate. , A substrate for a photomask, or a substrate for a solar cell.

1. 1. Outline of the board processing device 1 The board processing device 1 includes a processing unit 3. The processing unit 3 processes the substrate W.

The processing unit 3 includes a substrate holding unit 5 and a rotation driving unit 6. The substrate holding portion 5 holds the substrate W. Specifically, the substrate holding portion 5 holds the substrate W in a substantially horizontal posture. The substrate holding portion 5 sucks and holds, for example, the back surface (lower surface) of the substrate W. The rotation drive unit 6 is connected to the substrate holding unit 5. The rotation drive unit 6 rotates the substrate holding unit 5. As a result, the substrate W held by the substrate holding portion 5 rotates about an axis parallel to the vertical direction Z.

The processing unit 3 includes a cup 7. The cup 7 is arranged so as to surround the side of the substrate holding portion 5. The cup 7 receives and collects the processing liquid scattered from the substrate W.

The substrate processing apparatus 1 includes a processing liquid supply source 9. The treatment liquid supply source 9 stores the treatment liquid. The treatment liquid is, for example, a coating material for forming a coating film on the substrate W. The coating film material is, for example, a resist film material. The coating film is, for example, a resist film.

The processing unit 3 includes a processing liquid supply device 10. The treatment liquid supply device 10 is connected to the treatment liquid supply source 9 in communication. The processing liquid supply device 10 supplies the processing liquid to the substrate W supported by the substrate holding portion 5. The treatment liquid supply device 10 supplies the treatment liquid to, for example, the upper surface of the substrate W.

2. 2. Configuration of the processing liquid supply device 10 The treatment liquid supply device 10 includes a first pump 11 and a nozzle 41. The first pump 11 sends the processing liquid to the nozzle 41. The nozzle 41 discharges the processing liquid to the substrate W held by the substrate holding portion 5.

The first pump 11 includes a first pump chamber 12. The first pump chamber 12 is a space. The first pump chamber 12 accommodates the treatment liquid. The first pump chamber 12 is filled with the treatment liquid. The volume of the first pump chamber 12 is variable.

The first pump 11 includes a housing 13 and a diaphragm 14. The housing 13 and the diaphragm 14 partition the first pump chamber 12. The housing 13 has, for example, a cylindrical shape. The housing 13 has an internal space formed inside the housing 13. The housing 13 has an open end. The diaphragm 14 is attached to one end of the housing 13. The diaphragm 14 closes the internal space of the housing 13. The first pump chamber 12 corresponds to the internal space of the housing 13 closed by the diaphragm 14. The diaphragm 14 has flexibility. The diaphragm 14 is, for example, a rolling diaphragm. The material of the diaphragm 14 is, for example, a synthetic resin.

The first pump 11 has openings 15 and 16. The openings 15 and 16 are formed in the housing 13, respectively. The openings 15 and 16 communicate with the first pump chamber 12, respectively.

The first pump 11 includes a first piston 18. The first piston 18 moves with respect to the first pump chamber 12.

The first piston 18 has a first end. The first end of the first piston 18 is attached to the diaphragm 14. When the first piston 18 moves with respect to the first pump chamber 12, the diaphragm 14 is deformed and the volume of the first pump chamber 12 changes.

The first pump 11 includes a first drive unit 19. The first drive unit 19 is connected to the first piston 18. The first drive unit 19 moves the first piston 18. The first drive unit 19 is, for example, an electric motor. The first drive unit 19 is, for example, a stepping motor.

The first piston 18 has a second end. The second end of the first piston 18 is connected to the first drive unit 19. More specifically, the first drive unit 19 outputs rotational power. The first piston 18 and the first drive unit 19 are connected via a mechanism (not shown) that converts the rotational power of the first drive unit 19 into a linear motion of the first piston 18.

The first piston 18 reciprocates linearly. FIG. 1 shows a positive direction E1p and a negative direction E1n. The negative direction E1n is the opposite direction of the positive direction E1p. For example, when the first drive unit 19 rotates in the forward direction, the first piston 18 moves in the positive direction E1p. When the first piston 18 moves in the positive direction E1p, the first piston 18 approaches the first pump chamber 12. When the first piston 18 moves in the positive direction E1p, the volume of the first pump chamber 12 decreases. For example, when the first drive unit 19 rotates in the reverse direction, the first piston 18 moves in the negative direction E1n. When the first piston 18 moves in the negative direction E1n, the first piston 18 moves away from the first pump chamber 12. When the first piston 18 moves in the negative direction E1n, the volume of the first pump chamber 12 increases.

The processing liquid supply device 10 includes a first pressure sensor 21. The first pressure sensor 21 detects the pressure in the first pump chamber 12. The first pressure sensor 21 is attached to, for example, the housing 13.

The processing liquid supply device 10 includes a first position sensor 22. The first position sensor 22 detects the position of the first piston 18. The first position sensor 22 is attached to, for example, the first drive unit 19.

The first position sensor 22 is, for example, an encoder. The encoder detects the rotation angle of the first drive unit 19. The encoder outputs a pulse (electric pulse signal) indicating the rotation angle of the first drive unit 19. Here, the rotation angle of the first drive unit 19 corresponds to the position of the first piston 18. The amount of rotation of the first drive unit 19 is proportional to the moving distance of the first piston 18.

The treatment liquid supply device 10 includes a pipe 31. The pipe 31 communicates and connects the first pump chamber 12 and the nozzle 41. The pipe 31 has a first end and a second end. The first end of the pipe 31 is connected to the opening 15. The second end of the pipe 31 is connected to the nozzle 41.

The treatment liquid supply device 10 includes a first valve 32. The first valve 32 is provided in the pipe 31. The first valve 32 opens and closes the flow path in the pipe 31. The flow path in the pipe 31 corresponds to the flow path between the first pump chamber 12 and the nozzle 41. The first valve 32 communicates with the first pump chamber 12 and the nozzle 41.

The first valve 32 includes a valve body 33, an inlet port 34, and an outlet port 35. The valve body 33 opens and closes the flow path. The inlet port 34 communicates with the primary side of the valve body 33. The outlet port 35 communicates with the secondary side of the valve body 33. The inlet port 34 and the outlet port 35 are connected to the pipe 31. The inlet port 34 communicates with the first pump chamber 12. The exit port 35 communicates with the nozzle 41.

The treatment liquid supply device 10 includes a pipe 36. The pipe 36 communicates and connects the treatment liquid supply source 9 and the first pump chamber 12. The pipe 36 has a first end and a second end. The first end of the pipe 36 is connected to the processing liquid supply source 9. The second end of the pipe 36 is connected to the opening 16.

The treatment liquid supply device 10 includes a second valve 37. The second valve 37 is provided in the pipe 36. The second valve 37 opens and closes the flow path in the pipe 36. The flow path in the pipe 36 corresponds to the flow path between the first pump chamber 12 and the processing liquid supply source 9. The second valve 37 communicates with the first pump chamber 12. The second valve 37 does not communicate with the nozzle 41.

The processing liquid supply device 10 includes a nozzle moving mechanism 42. The nozzle moving mechanism 42 moves the nozzle 41. The nozzle moving mechanism 42 moves the nozzle 41 to the processing position and the standby position. In FIG. 1, the nozzle 41 arranged at the processing position is shown by a broken line. In FIG. 1, the nozzle 41 arranged in the standby position is shown by a solid line.

When the nozzle 41 is located at the processing position, the nozzle 41 aims at the substrate W. For example, when the nozzle 41 is located at the processing position, the nozzle 41 is located above the substrate holding portion 5. For example, when the nozzle 41 is located at the processing position, the nozzle 41 overlaps with the substrate W held by the substrate holding portion 5 in a plan view. When the nozzle 41 is located in the standby position, the nozzle 41 does not aim at the substrate W. For example, when the nozzle 41 is located in the standby position, the nozzle 41 does not overlap with the substrate W held by the substrate holding portion 5 in a plan view. For example, when the nozzle 41 is located in the standby position, the nozzle 41 is arranged outside the cup 7.

The processing liquid supply device 10 includes a nozzle standby unit 43. The nozzle standby unit 43 is, for example, a standby pot. The nozzle standby unit 43 is arranged at the standby position of the nozzle 41. The nozzle standby portion 43 is arranged outside the cup 7. The nozzle 41 stands by at the nozzle standby unit 43. The nozzle standby unit 43 accommodates, for example, at least a part of the nozzle 41. The nozzle standby unit 43 receives, for example, the processing liquid discharged from the nozzle 41. When the nozzle 41 is arranged in the nozzle standby portion 43, the nozzle 41 can perform dummy dispense.

Here, the first valve 32 is arranged at a position higher than, for example, the first pump chamber 12. FIG. 1 shows the height difference H1 between the first pump chamber 12 and the first valve 32. The height difference H1 is the distance between the first pump chamber 12 and the first valve 32 in the vertical direction Z.

The nozzle 41 is arranged at a position higher than, for example, the first pump chamber 12. FIG. 1 shows the height difference H2 between the first pump chamber 12 and the nozzle 41. The height difference H2 is the distance between the first pump chamber 12 and the nozzle 41 in the vertical direction Z.

The treatment liquid supply device 10 includes a control unit 45. The control unit 45 is communicably connected to the rotation drive unit 6, the first drive unit 19, the first pressure sensor 21, the first position sensor 22, the first valve 32, the second valve 37, and the nozzle movement mechanism 42. Will be done. The control unit 45 acquires the detection result detected by the first pressure sensor 21 and the first position sensor 22. The control unit 45 operates the rotation drive unit 6, the first drive unit 19, and the nozzle movement mechanism 42. The control unit 45 opens and closes the first valve 32 and the second valve 37.

The processing liquid supply device 10 includes a storage unit 47. The storage unit 47 stores various types of information. The storage unit 47 is communicably connected to the control unit 45. The control unit 45 refers to the information stored in the storage unit 47.

The control unit 45 includes, for example, a processor that executes various processes (for example, a central processing unit (CPU)), a RAM (Random-Access Memory) that is a work area for arithmetic processing, and a semiconductor memory that stores various information. .. The storage unit 47 includes at least one of a semiconductor memory and a hard disk.

3. 3. Operation A basic operation example of the substrate processing apparatus 1 of the first embodiment will be described. FIG. 2 is a flowchart showing the operation procedure of the substrate processing apparatus 1.

The substrate processing apparatus 1 repeatedly performs the cycle operation C. Each cycle operation C includes a first filling step CA, a constant pressure step CC, and a supply step CS. The first filling step CA, the constant pressure step CC, and the supply step CS are executed in this order.

[Step S1: First filling step CA]
FIG. 3 is a diagram showing a substrate processing apparatus 1 in the first filling step CA. FIG. 3 briefly shows the substrate processing apparatus 1 for convenience. In the first filling step CA, the first pump chamber 12 is filled with the treatment liquid.

The control unit 45 arranges the nozzle 41 in the standby position by the nozzle moving mechanism 42. The nozzle 41 is arranged in the nozzle standby unit 43.

The control unit 45 closes the first valve 32. The control unit 45 opens the second valve 37. The control unit 45 moves the first piston 18 in the negative direction E1n. The volume of the first pump chamber 12 increases. The treatment liquid flows from the treatment liquid supply source 9 to the first pump chamber 12 through the pipe 36 and the second valve 37. The first pump chamber 12 sucks the treatment liquid through the opening 16.

FIG. 3 shows a solid line of the first piston 18 when the first filling step CA starts. FIG. 3 shows the first piston 18 at the end of the first filling step CA with a broken line. The position of the first piston 18 when the first filling step CA starts is called the position PAs. The position of the first piston 18 when the first filling step CA is completed is called the position PAe. The moving distance of the first piston 18 in the first filling step CA is referred to as a moving distance LA. The moving distance LA is the difference between the position PAs and the position PAe. The travel distance LA is an absolute value.

[Step S2: Constant pressure process CC]
FIG. 4 is a diagram showing a substrate processing device 1 in the constant pressure process CC. The constant pressure step CC keeps the pressure of the first pump chamber 12 constant.

Also in the constant pressure step CC, the nozzle 41 is arranged in the standby position.

In the constant pressure step CC, the control unit 45 performs constant pressure control. In constant pressure control, the control unit 45 closes the first valve 32 and the second valve 37. The first pump chamber 12 is closed. In the constant pressure control, the control unit 45 adjusts the position of the first piston 18 so as to keep the pressure of the first pump chamber 12 at the target value F. In the constant pressure control, the control unit 45 adjusts the position of the first piston 18 based on the detection result of the first pressure sensor 21. In the constant pressure step CC, the pressure of the first pump chamber 12 is applied to the inlet port 34 of the first valve 32.

For example, the control unit 45 feedback-controls the position of the first piston 18 based on the detection result of the first pressure sensor 21. When the detection result of the first pressure sensor 21 is lower than the target value F, the control unit 45 moves the first piston 18 in the positive direction E1p and raises the pressure of the first pump chamber 12. When the detection result of the first pressure sensor 21 is higher than the target value F, the control unit 45 moves the first piston 18 in the negative direction E1n and lowers the pressure in the first pump chamber 12.

The target value F is preferably higher than the atmospheric pressure. The target value F is preferably, for example, 5 kPa or more. The target value F is preferably, for example, 7 kPa or more. The target value F is preferably, for example, 10 kPa or more. In the present specification, the pressure is expressed as a gauge pressure with respect to atmospheric pressure.

The target value F is preferably set based on at least one of the height difference H1 and the height difference H2. For example, the target value F is set so that the target value F increases as the height difference H1 increases. For example, the target value F is set so that the target value F increases as the height difference H2 increases.

FIG. 4 shows a solid line of the first piston 18 when the constant pressure process CC starts. FIG. 4 shows the first piston 18 at the end of the constant pressure step CC by a broken line. The position of the first piston 18 when the constant pressure process CC starts is called the position PCs. The position of the first piston 18 when the constant pressure step CC is completed is called the position PCe. The moving distance of the first piston 18 in the constant pressure step CC is called a moving distance LC. The moving distance LC is the difference between the position PCs and the position PCe. The travel distance LC is an absolute value.

[Step S3: Supply process CS]
FIG. 5 is a diagram showing a substrate processing device 1 in the supply process CS. The supply process CS supplies the processing liquid to the substrate W and processes the substrate W.

The control unit 45 arranges the nozzle 41 at the processing position. The nozzle 41 moves from the standby position to the processing position. The substrate holding portion 5 holds the substrate W. The control unit 45 rotates the substrate holding unit 5 by the rotation drive unit 6. As a result, the substrate W held by the substrate holding portion 5 rotates.

The control unit 45 opens the first valve 32. The control unit 45 closes the second valve 37. The control unit 45 moves the first piston 18 in the positive direction E1p. The volume of the first pump chamber 12 is reduced. The first pump chamber 12 discharges the treatment liquid through the opening 15. The treatment liquid flows to the nozzle 41 via the pipe 31 and the first valve 32. The nozzle 41 discharges the processing liquid onto the substrate W. The cup 7 receives the processing liquid scattered from the substrate W.

FIG. 5 shows the first piston 18 at the start of the supply process CS with a solid line. FIG. 5 shows the first piston 18 at the end of the supply process CS with a broken line. The position of the first piston 18 when the supply process CS starts is called the position PSs. The position of the first piston 18 when the supply process CS is completed is called the position PSe. The moving distance of the first piston 18 in the supply process CS is referred to as a moving distance LS. The moving distance LS is the difference between the position PSs and the position PSe. The travel distance LS is an absolute value.

When the supply process CS is completed, one cycle operation C is completed. After the end of one cycle operation C, a new cycle operation C starts. That is, the first filling step CA starts.

FIG. 6 is a graph showing the temporal change of the position of the first piston 18. The time when the constant pressure step CC starts is, for example, the same as when the first filling step CA ends. The time when the supply process CS starts is, for example, the same as the time when the constant pressure process CC ends. The time when the first filling step CA starts is, for example, the same as when the supply step CS ends.

In the first filling step CA, the control unit 45 moves the first piston 18 to the first origin position P0. That is, the position PAe is always the first origin position P0.

In the constant pressure step CC, the position PCs are substantially equal to the position PAe. Therefore, the position PCs are substantially equal to the first origin position P0.

In the constant pressure step CC, the first piston 18 may be stationary, may move in the positive direction E1p, or may move in the negative direction E1n. The travel distance LC may vary among the plurality of cycle operations C. One of the causes of the variation in the moving distance LC is the leakage of the treatment liquid from the first valve 32. The leak of the treatment liquid from the first valve 32 is that the first valve 32 leaks the treatment liquid when the first valve 32 is closed. In other words, the leak of the treatment liquid from the first valve 32 is that the treatment liquid flows through the valve body 33 when the first valve 32 is closed. Hereinafter, the leak of the treatment liquid from the first valve 32 is appropriately referred to as “leak”.

7 (a), 7 (b), and 7 (c) are diagrams schematically showing changes in the position of the first piston 18 in the constant pressure step CC, respectively.

In FIG. 7A, no leak has occurred. Therefore, the treatment liquid does not flow between the first pump chamber 12 and the nozzle 41. The treatment liquid does not drip from the nozzle 41. Drops of the treatment liquid do not fall from the nozzle 41. The treatment liquid substantially fills the entire flow path in the nozzle 41. The liquid level of the processing liquid in the nozzle 41 is maintained at substantially the same height as the discharge port of the nozzle 41. The liquid level of the treatment liquid in the nozzle 41 is, for example, the lower surface of the treatment liquid in the nozzle 41.

Since the treatment liquid does not leak from the first valve 32, the treatment liquid does not flow into the first pump chamber 12 from the nozzle 41, and the treatment liquid does not flow out from the first pump chamber 12 to the nozzle 41. Therefore, the fluctuation of the pressure in the first pump chamber 12 is relatively small. Therefore, the change in the position of the first piston 18 is relatively small.

In FIG. 7B, a leak has occurred. Specifically, the first valve 32 leaks the treatment liquid through the valve body 33. The direction of the leak is from the inlet port 34 to the exit port 35. The treatment liquid flows from the first pump chamber 12 to the nozzle 41 through the first valve 32. Here, the leak in which the treatment liquid flows from the first pump chamber 12 to the nozzle 41 through the first valve 32 is called a forward leak. Since a forward leak has occurred, the treatment liquid drips from the nozzle 41. For example, drops of the treatment liquid fall from the nozzle 41. The nozzle standby unit 43 receives the processing liquid dripping from the nozzle 41.

When a forward leak occurs, the treatment liquid flows out from the first pump chamber 12 to the nozzle 41. The pressure in the first pump chamber 12 is reduced by the treatment liquid flowing out of the first pump chamber 12. The control unit 45 moves the first piston 18 in the positive direction E1p and reduces the volume of the first pump chamber 12. As a result, the pressure in the first pump chamber 12 becomes high. The pressure in the first pump chamber 12 returns to the pressure at which the forward leak occurred.

Therefore, forward leaks are likely to occur continuously. The period of occurrence of forward leaks tends to be long. The amount of treatment liquid flowing due to forward leakage tends to be large. Therefore, the change in the position of the first piston 18 tends to be large.

If the control unit 45 does not perform constant pressure control, the pressure in the first pump chamber 12 after the forward leak occurs is lower than the pressure in the first pump chamber 12 before the forward leak occurs. The lower the pressure in the first pump chamber 12, the more difficult it is for the treatment liquid to flow out of the first pump chamber 12. Therefore, forward leaks are unlikely to occur continuously. The period of occurrence of forward leaks is unlikely to be long. The amount of treatment liquid that flows due to forward leakage is unlikely to increase. Therefore, the change in the position of the first piston 18 is unlikely to be large.

In FIG. 7 (c), a leak has occurred. The leak shown in FIG. 7 (c) has a different direction from the leak shown in FIG. 7 (b). Specifically, the first valve 32 leaks the processing liquid from the outlet port 35 to the inlet port 34 through the valve body 33. The treatment liquid flows from the nozzle 41 to the first pump chamber 12 through the first valve 32. Here, the leak in which the treatment liquid flows from the nozzle 41 to the first pump chamber 12 through the first valve 32 is called a reverse leak. The treatment liquid does not fill the entire flow path in the nozzle 41. For example, the liquid level of the processing liquid in the nozzle 41 rises from the discharge port of the nozzle 41.

When a reverse leak occurs, the treatment liquid flows from the nozzle 41 into the first pump chamber 12. The pressure in the first pump chamber 12 increases due to the treatment liquid flowing into the first pump chamber 12. The control unit 45 moves the first piston 18 in the negative direction E1n to increase the volume of the first pump chamber 12. As a result, the pressure in the first pump chamber 12 becomes low. The pressure in the first pump chamber 12 returns to the pressure at which the reverse leak occurred. Therefore, reverse leakage is likely to occur continuously. The period of occurrence of reverse leak tends to be long. The amount of treatment liquid flowing due to the reverse leak tends to be large. Therefore, the change in the position of the first piston 18 tends to be large.

If the control unit 45 does not perform constant pressure control, the pressure in the first pump chamber 12 after the reverse leak occurs is higher than the pressure in the first pump chamber 12 before the reverse leak occurs. Therefore, reverse leakage is unlikely to occur continuously. The period of occurrence of reverse leak is unlikely to be long. The amount of treatment liquid flowing due to the reverse leak is unlikely to increase. Therefore, the change in the position of the first piston 18 is unlikely to be large.

When a leak occurs, the quality of processing for the substrate W cannot be kept suitable. For example, when a forward leak occurs, the nozzle 41 may drop an unnecessary treatment liquid onto the substrate W after closing the first valve 32 in the supply process CS. As a result, coating defects and particles may occur on the substrate W. For example, when a reverse leak occurs, air enters the flow path between the first pump chamber 12 and the nozzle 41. As a result, a part of the resist may be dried and solidified to become particles. Further, in the supply process CS, the nozzle 41 may discharge the processing liquid mixed with air to the substrate W. Further, the amount of the processing liquid supplied by the nozzle 41 to the substrate W may not be properly controlled.

See FIG. The position PCe varies depending on the moving distance LC. The position PCe corresponds to a position where the first origin position P0 is shifted in the moving direction of the first piston in the constant pressure step CC by the moving distance LC.

In the supply process CS, the position PSs are substantially equal to the position PCe. Therefore, the position PSs fluctuates according to the moving distance LC. In the supply process CS, the control unit 45 moves the first piston 18 by the first distance L1. That is, the distance LS is always the first distance L1. The position PSe is a position where the position PSs is shifted in the positive direction E1p by the first distance L1. The position PSe varies depending on the travel distance LC.

Position PAs are substantially equal to position PSe. Therefore, the position PAs fluctuate according to the moving distance LC. As described above, the position PAe is the first origin position P0. Therefore, the moving distance LA also fluctuates according to the moving distance LC.

The target value F, the first origin position P0, and the first distance L1 described above are set in advance. Specifically, the target value F, the first origin position P0, and the first distance L1 are set before the substrate processing apparatus 1 operates as described above. The target value F, the first origin position P0, and the first distance L1 are stored in, for example, the storage unit 47. The first origin position P0 and the first distance L1 are known, respectively.

[Step S4: Detection step]
See FIG. The substrate processing apparatus 1 performs a detection step in parallel with the cycle operation C. The detection step is executed, for example, during the period when the first filling step CA, the constant pressure step CC, and the supply step CS are executed. In the detection step, the first pressure sensor 21 detects the pressure in the first pump chamber 12. The first pressure sensor 21 outputs the detection result of the first pressure sensor 21 to the control unit 45. In the detection step, the first position sensor 22 detects the position of the first piston 18. The first position sensor 22 outputs the detection result of the first position sensor 22 to the control unit 45.

[Step S5: Leak determination step]
The substrate processing apparatus 1 performs a leak determination step in parallel with the cycle operation C and the detection step. In the leak determination step, the control unit 45 performs a leak determination process. In the leak determination process, the control unit 45 acquires the change in the position of the first piston 18 in the determination period J based on the detection result obtained by the detection step. In the leak determination process, the control unit 45 determines whether or not there is a leak of the processing liquid from the first valve 32 based on the change in the position of the first piston 18 in the determination period J.

FIG. 6 illustrates the determination period J. The entire determination period J is included in the period during which the constant pressure step CC is executed. That is, the determination period J does not include the period during which the constant pressure step CC is not executed. The determination period J is at least a part of the period during which the constant pressure step CC is executed. The determination period J may be, for example, the entire period during which the constant pressure step CC is executed. Here, the period during which the constant pressure step CC is executed corresponds to the period during which the constant pressure control is executed.

The change in the position of the first piston 18 acquired by the control unit 45 includes at least one of the moving distance of the first piston 18 and the average speed of the first piston 18.

Acquiring the change in the position of the first piston 18 in the determination period J means calculating the change in the position of the first piston 18 in the determination period J and estimating the change in the position of the first piston 18 in the determination period J. Includes at least one of the things to do. To calculate the change in the position of the first piston 18 in the determination period J is to calculate the change in the position of the first piston 18 in the determination period J based on the detection result of two or more positions of the first piston 18 in the determination period J. Is to get. Estimating the change in the position of the first piston 18 in the determination period J means that the detection result of only one position of the first piston 18 in the determination period J and 1 of the first piston 18 in a period other than the determination period J. It is to acquire the change in the position of the first piston 18 in the determination period J based on at least one of the detection results of one or more positions.

4. Judgment period J
FIG. 8 is a graph illustrating the temporal change of the pressure of the first pump chamber 12 in the constant pressure step CC. The time TCs are the times when the constant pressure process CC starts. The time TCe is the time when the constant pressure process CC ends.

The determination period J includes at least one of the first determination period J1 and the second determination period J2.

The first determination period J1 is, for example, a part of the period during which the constant pressure step CC is executed. The first determination period J1 starts from the first time TJs. The control unit 45 identifies the first time TJs based on the detection result of the first pressure sensor 21. The first time TJs is the time when the pressure in the first pump chamber 12 falls within the allowable range G of the target value F for the first time after the constant pressure step CC starts. Here, the allowable range G includes the target value F. For example, the permissible range G is a range of ± 2 kPa of the target value F. For example, the permissible range G is in the range of ± 20% of the target value F.

The time length of the first determination period J1 is referred to as a time length U1. The time length U1 is, for example, 4 seconds or more. The time length U1 is, for example, 8 seconds or less.

The time length U1 defines the time TJe. The time TJe is a time when the time length U1 elapses from the first time TJs. The first determination period J1 ends at the time TJe. However, when the time TJe is later than the time TCe, the first determination period J1 ends at the time TCe.

The second determination period J2 is the entire period during which the constant pressure step CC is executed. That is, the second determination period J2 is a period from the time TCs to the time TCe. The length of time of the second determination period J2 is called the time length U2. The time length U2 corresponds to the time length of the period during which the constant pressure step CC is executed. The time length U2 corresponds to the length of time from the time TCs to the time TCe.

The above-mentioned allowable range G and the time lengths U1 and U2 are preset. The permissible range G and the time lengths U1 and U2 are stored in, for example, the storage unit 47.

5. Details of the leak determination process (leak determination process) There are various procedures for the leak determination process. Hereinafter, the first to sixth leak determination processes will be illustrated. The control unit 51 executes at least one of the first to sixth leak determination processes. For example, the control unit 51 may execute the first to sixth leak determination processes in parallel.

5-1. First leak determination process The first leak determination process determines whether or not the position of the first piston 18 continuously changes in the first determination period J1.

See FIG. The control unit 45 divides the first determination period J1 into a plurality of division periods D. The number ND of the division period D is, for example, 8 or less. The number ND of the division period D is, for example, four or more. The time lengths of each division period D are, for example, equal to each other. The time length of each division period D is, for example, 1 second.

The control unit 45 calculates the moving distance LD of the first piston 18 in each division period D based on the detection result of the position of the first piston 18 in the first determination period J1. The moving distance LD is the difference between the position of the first piston 18 when the division period D starts and the position of the first piston 18 when the division period D ends. The travel distance LD is an absolute value.

The control unit 45 compares each movement distance LD with the first threshold value K1. The control unit 45 specifies the division period D including the movement distance LD of the first threshold value K1 or more as the change period DC. The control unit 45 does not specify the division period D including the movement distance LD less than the first threshold value K1 as the change period DC.

The control unit 45 counts the number NC of the change period DC. The number NC is less than or equal to the number ND. It can be said that the position of the first piston 18 changes significantly continuously as the number NC increases. In other words, it can be said that the larger the number NC, the longer the period during which the position of the first piston 18 changes significantly.

The control unit 45 determines the presence or absence of a leak based on the number NC.

For example, the control unit 45 compares the number NC with the first reference value R1. When the number NC is equal to or greater than the first reference value R1, the control unit 45 determines that a leak has occurred.

For example, the control unit 45 calculates the ratio A of the number NC to the number ND. The control unit 45 compares the ratio A with the second reference value R2. When the ratio A is equal to or greater than the second reference value R2, the control unit 45 determines that a leak has occurred.

A specific example of the first leak determination process will be described.

FIG. 9 is a graph showing an example of the detection result of the first position sensor 22 in the first determination period J1. In FIG. 9, the position of the first piston 18 is shown by the number of pulses [pls]. It is assumed that the number of pulses increases when the first piston 18 moves in the positive direction E1p. It is assumed that the number of pulses decreases when the first piston 18 moves in the negative direction E1n.

The example shown in FIG. 9 includes the detection results of the six positions of the first piston 18 in the first determination period J1. Specifically, the positions PJs, PJ1-PJ4, and PJe are the detection results of the positions of the first piston 18 at the first time TJs and the times t2-t4 and TJe, respectively.

The control unit 45 divides the first determination period J1 into the division periods D1-D5 according to the first time TJs and the times t2-t4 and TJe. For example, the division period D1 is a period from the first time TJs to the time t1. The number ND of the division period D is, for example, 5.

FIG. 10A is a first example of the movement distance LD of the first piston 18 in the division period D. The control unit 45 calculates the movement distance LD shown in FIG. 10A based on the example of the detection result shown in FIG. Here, the moving distance LD of the first piston 18 in each division period D1-D5 is referred to as a moving distance LD1-LD5, respectively. For example, the control unit 45 calculates the difference between the position PJs and the position PJ1 as the moving distance LD1. Similarly, the control unit 45 calculates the moving distance LD2-LD5.

Further, the control unit 45 specifies the moving direction of the first piston 18 in each division period D1-D5 based on the example of the detection result shown in FIG. For example, in the division period D2, the position (number of pulses) of the first piston 18 decreases. Therefore, the control unit 45 specifies the moving direction of the first piston 18 in the division period D2 as the negative direction E1n.

Here, it is assumed that the first threshold value K1 is 50 [pls]. In the first example shown in FIG. 10A, the moving distance LD1 is less than the first threshold value K1. Therefore, the control unit 45 does not specify the division period D1 including the movement distance LD1 as the change period DC. The moving distance LD2 is equal to or higher than the first threshold value K1. Therefore, the control unit 45 specifies the division period D2 including the movement distance LD2 as the change period DC. Similarly, the travel distances LD3-LD5 are each equal to or higher than the first threshold value K1. Therefore, the control unit 45 specifies the division period D3-D5 as the change period DC, respectively. As a result, the number NC of the change period is 4. The ratio A of the number NC to the number ND is 80%.

Here, it is assumed that the first reference value R1 is 2. In the first example, the number NC is equal to or greater than the first reference value R1. Therefore, the control unit 45 determines that a leak has occurred.

Alternatively, it is assumed that the second reference value R2 is 50%. In the first example, the ratio A is equal to or greater than the second reference value R2. Therefore, the control unit 45 determines that a leak has occurred.

FIG. 10B is a second example of the movement distance LD of the first piston 18 in the division period D. The second example shown in FIG. 10B is irrelevant to the example of the detection result shown in FIG.

The control unit 45 divides the first determination period J1 into the division periods D1-D5. The control unit 45 calculates the moving distance LD1-LD5 shown in FIG. 10B based on the detection result different from the example of the detection result shown in FIG.

Here, it is assumed that the first threshold value K1 is 50 [pls]. In the second example shown in FIG. 10B, the moving distances LD1-LD3 are each equal to or greater than the first threshold value K1. Therefore, the control unit 45 specifies the division period D1-D3 as the change period DC. The travel distances LD4-LD5 are each less than the first threshold value K1. Therefore, the control unit 45 does not specify the division period D4-D5 as the change period DC. As a result, the number NC of the change period is 3. The ratio A of the number NC to the number ND is 60%.

Here, it is assumed that the first reference value R1 is 2. In the second example, the number NC is equal to or greater than the first reference value R1. Therefore, the control unit 45 determines that a leak has occurred.

Alternatively, it is assumed that the second reference value R2 is 50%. In the first example, the ratio A is equal to or greater than the second reference value R2. Therefore, the control unit 45 determines that a leak has occurred.

The first threshold value K1, the first reference value R1 and the second reference value R2 described above are set in advance. The first threshold value K1, the first reference value R1 and the second reference value R2 are stored in, for example, the storage unit 47.

5-2. Second leak determination process In the second leak determination process, the change in the position of the first piston 18 that reduces the volume of the first pump chamber 12 and the position of the first piston 18 that increases the volume of the first pump chamber 12 Distinguish from changes in. As a result, the second leak determination process specifies the direction of the leak in addition to the determination of the presence or absence of the leak. The same process as the first leak determination process will be briefly described as appropriate.

The control unit 45 divides the first determination period J1 into a plurality of division periods D. The control unit 45 calculates the moving distance LD of the first piston 18 in each division period D based on the detection result of the position of the first piston 18 in the first determination period J1. The control unit 45 specifies the division period D in which the movement distance LD is equal to or greater than the first threshold value K1 as the change period DC.

Further, the control unit 45 classifies the change period DC into a positive change period DCp and a negative change period DCn. The positive change period DCp is a change period DC in which the first piston 18 moves in the positive direction E1p. That is, the positive change period DCp is the change period DC in which the first piston 18 reduces the volume of the first pump chamber 12. The negative change period DCn is a change period DC in which the first piston 18 moves in the negative direction E1n. That is, the negative change period DCn is a change period DC in which the first piston 18 increases the volume of the first pump chamber 12.

The control unit 45 counts the number NCp of the positive change period DCp. The control unit 45 counts the number NCn of the negative change period DCn. The sum of the number NCp and the number NCn is equal to the number NC.

The control unit 45 determines the presence or absence of a leak based on the number NCp and the number NCn.

For example, the control unit 45 compares the number NCp with the third reference value R3. When the number NCp is equal to or greater than the third reference value R3, the control unit 45 determines that a leak has occurred and that the first valve 32 leaks the processing liquid from the first pump chamber 12 to the nozzle 41. That is, when the number NCp is equal to or greater than the third reference value R3, the control unit 45 determines that a forward leak has occurred. The control unit 45 compares the number NCn with the fourth reference value R4. When the number NCn is 4th reference value R4 or more, the control unit 45 determines that a leak has occurred and that the first valve 32 leaks the processing liquid from the nozzle 41 to the first pump chamber 12. That is, when the number NCn is equal to or greater than the fourth reference value R4, the control unit 45 determines that a reverse leakage has occurred.

For example, the control unit 45 calculates the ratio Ap of the number NCp to the number ND. The control unit 45 compares the ratio Ap with the fifth reference value R5. When the ratio Ap is equal to or greater than the fifth reference value R5, the control unit 45 determines that a forward leak has occurred. For example, the control unit 45 calculates the ratio An of the number NCn to the number ND. The control unit 45 compares the ratio An with the sixth reference value R6. When the ratio An is equal to or greater than the sixth reference value R6, the control unit 45 determines that a reverse leak has occurred.

A case where the second leak determination process is applied to the first example shown in FIG. 10A will be described.

The control unit 45 divides the first determination period J1 into the division periods D1-D5. The number ND of the division period D is 5. The control unit 45 calculates the moving distance LD1-LD5. Here, it is assumed that the first threshold value K1 is 50 [pls]. The control unit 45 specifies the division period D2-D5 as the change period DC, respectively. The number ND of the change period DC is 4. In the division periods D2 and D4, the first piston 18 moves in the negative direction E1n. Therefore, the control unit 45 specifies the division periods D2 and D4 as the negative change period DCn. In the division periods D3 and D5, the first piston 18 moves in the positive direction E1p. Therefore, the control unit 45 specifies the division periods D3 and D5 as the positive change period DCp. As a result, the number NCp of the positive change period DCp is two. The ratio Ap of the number NCp to the number ND is 40%. The number NCn of the negative change period DCn is 2. The ratio An of the number NCn to the number ND is 40%.

Here, it is assumed that the third reference value R3 and the fourth reference value R4 are 2, respectively. In the first example, the number NCp is equal to or greater than the third reference value R3. Therefore, the control unit 45 determines that a forward leak has occurred. The number NCn is equal to or greater than the fourth reference value R4. Therefore, the control unit 45 determines that a reverse leak has occurred.

Alternatively, it is assumed that the fifth reference value R5 and the sixth reference value R6 are 50%, respectively. In the first example, the ratio Ap is less than the fifth reference value R5. Therefore, the control unit 45 does not determine that a forward leak has occurred. The ratio An is less than the sixth reference value R6. Therefore, the control unit 45 does not determine that a reverse leak has occurred.

A case where the second leak determination process is applied to the second example shown in FIG. 10B will be described.

The control unit 45 divides the first determination period J1 into the division periods D1-D5. The number ND of the division period D is 5. The control unit 45 calculates the moving distance LD1-LD5. Here, it is assumed that the first threshold value K1 is 50 [pls]. The control unit 45 specifies the division periods D1-D3 as the change period DC, respectively. The number ND of the change period DC is three. In the division period D1-D2, the first piston 18 moves in the positive direction E1p. Therefore, the control unit 45 specifies the division period D1-D2 as the positive change period DCp. In the division period D3, the first piston 18 moves in the negative direction E1n. Therefore, the control unit 45 specifies the division period D3 as the negative change period DCn. As a result, the number NCp of the positive change period DCp is 2. The ratio Ap of the number NCp to the number ND is 40%. The number NCn of the negative change period DCn is 1. The ratio Ap of the number NCp to the number ND is 20%.

Here, it is assumed that the third reference value R3 and the fourth reference value R4 are 2, respectively. In the second example, the number NCp is equal to or greater than the third reference value R3. Therefore, the control unit 45 determines that a forward leak has occurred. The number NCn is less than the fourth reference value R4. Therefore, the control unit 45 does not determine that a reverse leak has occurred.

Alternatively, it is assumed that the fifth reference value R5 and the sixth reference value R6 are 50%, respectively. In the first example, the ratio Ap is less than the fifth reference value R5. Therefore, the control unit 45 does not determine that a forward leak has occurred. The ratio An is less than the sixth reference value R6. Therefore, the control unit 45 does not determine that a reverse leak has occurred.

The above-mentioned third to sixth reference values R3-R6 are set in advance. The third to sixth reference values R3-R6 are stored in, for example, the storage unit 47.

5-3. Third leak determination process The third leak determination process eliminates an excessive change in the position of the first piston 18 in the first determination period J1. The same process as the first leak determination process will be briefly described as appropriate.

The control unit 45 divides the first determination period J1 into a plurality of division periods D. The control unit 45 calculates the moving distance LD of the first piston 18 in each division period D based on the detection result of the position of the first piston 18 in the first determination period J1. The control unit 45 specifies the division period D in which the movement distance LD is equal to or greater than the first threshold value K1 as the change period DC.

Further, the control unit 45 compares the moving distance LD in the change period DC with the second threshold value K2. The second threshold value K2 is larger than the first threshold value K1. The control unit 45 specifies the change period DC including the movement distance LD of the second threshold value K2 or more as the abnormal period DA. The control unit 45 does not specify the change period DC including the movement distance LD less than the second threshold value K2 as the abnormal period DA.

The control unit 45 counts the number NA of the abnormal period DA. The number NA is a number NC or less. The control unit 45 counts the number NDa of the division period D excluding the abnormal period DA. The control unit 45 counts the number NCa of the change period DC excluding the abnormal period DA.

The control unit 45 determines the presence or absence of a leak based on the number NCa.

For example, when the number NCa is equal to or greater than the first reference value R1, the control unit 45 determines that a leak has occurred.

For example, the control unit 45 calculates the ratio Aa of the number NCa to the number NDa. When the ratio Aa is equal to or greater than the second reference value R2, the control unit 45 determines that a leak has occurred.

A case where the third leak determination process is applied to the first example shown in FIG. 10A will be described.

The control unit 45 divides the first determination period J1 into the division periods D1-D5. The number ND of the division period D is 5. The control unit 45 calculates the moving distance LD1-LD5. Here, it is assumed that the first threshold value K1 is 50 [pls] and the second threshold value K2 is 500 [pls]. The control unit 45 specifies the division period D2-D5 as the change period DC, respectively. The number ND of the change period DC is 4. The moving distance LD2 is less than the second threshold value K2. Therefore, the control unit 45 does not specify the division period D2 including the movement distance LD2 as the abnormal period DA. Similarly, the travel distances LD3-LD5 are each less than the second threshold value K2. Therefore, the control unit 45 does not specify the division period D3-D5 as the abnormal period DA. The number NA of the abnormal period DA is zero. The number NDa of the division period D excluding the abnormal period DA is 5. The number NCa of the change period DC excluding the abnormal period DA is 4. The ratio Aa of the number NCa to the number NDa is 80%.

Here, it is assumed that the first reference value R1 is 2. In the first example, the number NCa is equal to or greater than the first reference value R1. Therefore, the control unit 45 determines that a leak has occurred.

Alternatively, it is assumed that the second reference value R2 is 50%. In the first example, the ratio Aa is equal to or greater than the second reference value R2. Therefore, the control unit 45 determines that a leak has occurred.

A case where the third leak determination process is applied to the second example shown in FIG. 10B will be described.

The control unit 45 divides the first determination period J1 into the division periods D1-D5. The number ND of the division period D is 5. The control unit 45 calculates the moving distance LD1-LD5. Here, it is assumed that the first threshold value K1 is 50 [pls] and the second threshold value K2 is 500 [pls]. The control unit 45 specifies the division periods D1-D3 as the change period DC, respectively. The number ND of the change period DC is three. The moving distance LD1 is equal to or greater than the second threshold value K2. Therefore, the control unit 45 specifies the division period D1 including the movement distance LD1 as the abnormal period DA. The travel distances LD2-LD3 are each less than the second threshold value K2. Therefore, the control unit 45 does not specify the division period D2-D3 as the abnormal period DA. The number NA of the abnormal period DA is one. The number NDa of the division period D excluding the abnormal period DA is four. The number NCa of the change period DC excluding the abnormal period DA is two. The ratio Aa of the number NCa to the number NDa is 50%.

Here, it is assumed that the first reference value R1 is 2. In the second example, the number NCa is equal to or greater than the first reference value R1. Therefore, the control unit 45 determines that a leak has occurred.

Alternatively, it is assumed that the second reference value R2 is 50%. In the second example, the ratio Aa is equal to or greater than the second reference value R2. Therefore, the control unit 45 determines that a leak has occurred.

The above-mentioned second threshold value K2 is set in advance. The second threshold value K2 is stored in, for example, the storage unit 47.

5-4. Fourth leak determination process The fourth leak determination process determines the presence or absence of a leak based on the moving distance of the first piston 18 in the determination period J. The determination period J is at least one of the first determination period J1 and the second determination period J2.

The moving distance of the first piston 18 in the first determination period J1 is referred to as a moving distance LJ. The moving distance LJ is the difference between the position of the first piston 18 at the first time TJs and the position of the first piston 18 at the time TJe. The travel distance LJ is an absolute value.

The control unit 45 calculates the moving distance LJ based on the detection result of the position of the first piston 18 at the first time TJs and the detection result of the position of the first piston 18 at the time TJe. The detection result of the position of the first piston 18 at the first time TJs corresponds to the position PJs shown in FIG. The detection result of the position of the first piston 18 at the time TJe corresponds to the position PJe shown in FIG.

The control unit 45 determines the presence or absence of a leak based on the moving distance LJ.

For example, the control unit 45 compares the moving distance LJ with the third threshold value K3. When the moving distance LJ is equal to or greater than the third threshold value K3, the control unit 45 determines that a leak has occurred.

The moving distance of the first piston 18 in the second determination period J2 corresponds to the moving distance LC of the first piston 18 in the constant pressure step CC. Hereinafter, the moving distance of the first piston 18 in the second determination period J2 is appropriately referred to as a moving distance LC. As described above, the moving distance LC is the difference between the position of the first piston 18 at the time TCs and the position of the first piston 18 at the time TCe. The travel distance LC is an absolute value.

The control unit 45 calculates the moving distance LC based on the detection result of the position of the first piston 18 at the time TCs and the detection result of the position of the first piston 18 at the time TCe. The detection result of the position of the first piston 18 at the time TCs corresponds to the position PCs shown in FIG. The detection result of the position of the first piston 18 at the time TCe corresponds to the position PCe shown in FIG.

The control unit 45 determines the presence or absence of a leak based on the moving distance LC.

For example, the control unit 45 compares the moving distance LC with the fourth threshold value K4. When the moving distance LC is equal to or greater than the fourth threshold value K4, the control unit 45 determines that a leak has occurred.

The above-mentioned third threshold value K3 and fourth threshold value K4 are preset. The third threshold value K3 and the fourth threshold value K4 are stored in, for example, the storage unit 47.

5-5. Fifth leak determination process The fifth leak determination process determines the presence or absence of a leak based on the average speed of the first piston 18 in the determination period J. The determination period J is at least one of the first determination period J1 and the second determination period J2.

The speed of the first piston 18 in the first determination period J1 is referred to as an average speed VJ. The average velocity VJ is obtained by dividing the moving distance LJ by the time length U1 of the first determination period J1. The average velocity VJ corresponds to the slope of the virtual line IL shown in FIG. The virtual line IL is a virtual straight line connecting the positions PJs and the positions PJe.

The control unit 45 calculates the moving distance LJ based on the detection result of the position of the first piston 18 at the first time TJs and the detection result of the position of the first piston 18 at the time TJe. The control unit 45 acquires the average speed VJ from the moving distance LJ and the time length U1.

The control unit 45 determines the presence or absence of a leak based on the average speed VJ.

For example, the control unit 45 compares the average velocity VJ with the fifth threshold value K5. When the average speed VJ is equal to or higher than the fifth threshold value K5, the control unit 45 determines that a leak has occurred.

The average speed of the first piston 18 in the second determination period J2 is referred to as an average speed VC. The average velocity VC is obtained by dividing the travel distance LC by the time length U2 of the second determination period J2.

The control unit 45 calculates the moving distance LC based on the detection result of the position of the first piston 18 at the time TCs and the detection result of the position of the first piston 18 at the time TCe. The control unit 45 acquires the average speed VJ from the moving distance LC and the time length U2.

The control unit 45 determines the presence or absence of a leak based on the average speed VC.

For example, the control unit 45 compares the average velocity VC with the sixth threshold value K6. When the average speed VC is equal to or higher than the sixth threshold value K6, the control unit 45 determines that a leak has occurred.

The above-mentioned fifth threshold value K5 and sixth threshold value K6 are preset. The fifth threshold value K5 and the sixth threshold value K6 are stored in, for example, the storage unit 47.

5-6. Sixth leak determination process The sixth leak determination process estimates the moving distance LC of the first piston 18 in the second determination period J2.

See FIG. As described above, the cycle operation C is executed under the following first condition.
[First condition]
The supply process CS moves the first piston 18 by the first distance L1.
The first filling step CA moves the first piston 18 to the first origin position P0.

In other words, the travel distance LS is equal to the first distance L1. The position PAe is equal to the first origin position P0.

Under the first condition, the position PCe, PSs, PSe, PAs and the travel distance LA each vary depending on the travel distance LC. That is, each fluctuation amount of the position PCe, PSs, PSe, PAs and the movement distance LA is substantially equal to the movement distance LC. Therefore, the travel distance LC can be estimated from at least one of the position PCe, PSs, PSe, PAs, and the travel distance LA.

For example, the control unit 45 estimates the travel distance LC based on the position PCe. Specifically, the control unit 45 acquires the position PCe based on the detection result of one position of the first piston 18 when the constant pressure step CC ends. The control unit 45 estimates the difference between the position PCe and the first origin position P0 as the moving distance LC.

For example, the control unit 45 estimates the travel distance LC based on the position PSs. Specifically, the control unit 45 acquires the position PSs based on the detection result of the position of the first piston 18 when the supply process CS starts. The control unit 45 estimates the difference between the position PSs and the first origin position P0 as the moving distance LC.

For example, the control unit 45 estimates the travel distance LC based on the position PSe. Specifically, the control unit 45 acquires the position PSe based on the detection result of the position of the first piston 18 when the supply process CS ends. The control unit 45 estimates the difference between the position PSe and the first reference position RP1 as the moving distance LC. Here, the first reference position RP1 is a position in which the first origin position P0 is shifted to the positive direction E1p by the first distance L1.

For example, the control unit 45 estimates the travel distance LC based on the position PAs. Specifically, the control unit 45 acquires the position PAs based on the detection result of the position of the first piston 18 when the first filling step CA starts. The control unit 45 estimates the difference between the position PAs and the first reference position RP1 as the moving distance LC.

For example, the control unit 45 estimates the travel distance LC based on the travel distance LA. Specifically, the control unit 45 has a detection result of the position of the first piston 18 when the first filling step CA starts and a detection result of the position of the first piston 18 when the first filling step CA ends. The travel distance LA is acquired based on. The control unit 45 estimates the difference between the moving distance LA and the first distance L1 as the moving distance LC.

After that, the control unit 45 determines the presence or absence of a leak based on the estimated movement distance LC. For example, as in the fourth leak determination process, the control unit 45 compares the estimated travel distance LC with the fourth threshold value K4.

Alternatively, the control unit 45 obtains the average velocity VJ by dividing the estimated travel distance LC by the time length U2. Then, the control unit 45 determines the presence or absence of a leak based on the average speed VC. For example, as in the fifth leak determination process, the control unit 45 compares the average speed VC with the sixth threshold value K6.

The above-mentioned first reference position RP1 is preset. The first reference position RP1 is stored in, for example, the storage unit 47.

6. Effect The substrate processing method of the first embodiment includes a supply process CS. Therefore, the supply process CS can appropriately process the substrate.

The substrate processing method includes a detection step, a leak determination step, and a constant pressure step CC. The detection step detects the position of the first piston 18. The leak determination step acquires a change in the position of the first piston 18 in the determination period J based on the detection result obtained by the detection step. The leak determination step determines the presence or absence of a leak based on the change in the position of the first piston 18 in the determination period J. The constant pressure step CC closes the first valve 32. The constant pressure step CC adjusts the position of the first piston 18 so as to keep the pressure of the first pump chamber 12 at the target value F. Therefore, if a leak occurs in the constant pressure process CC, the constant pressure process CC can prolong the leak generation period. If a leak occurs in the constant pressure process CC, the constant pressure process CC can continuously generate the leak. Here, the entire determination period J is included in the period in which the constant pressure step is executed. Therefore, the leak determination step can suitably determine the presence or absence of a leak.

The first valve 32 includes an inlet port 34 and an outlet port 35. The inlet port 34 communicates with the first pump chamber 12. The exit port 35 communicates with the nozzle 41. The constant pressure step CC applies the pressure of the first pump chamber 12 to the inlet port 34 of the first valve 32. Therefore, the constant pressure step CC keeps the pressure received by the inlet port 34 of the first valve 32 at the target value F. Therefore, if the first valve 32 leaks the treatment liquid in the constant pressure process CC, the constant pressure process CC can suitably lengthen the leak generation period.

The target value F is higher than the atmospheric pressure. Therefore, in the constant pressure step CC, the leak can be suitably manifested. Therefore, the leak determination step CC can suitably determine the presence or absence of a leak.

The target value F is set so that the target value F increases as at least one of the height difference H1 and the height difference H2 increases. For example, the target value F is set so that the target value F increases as the height difference H1 increases. In this case, the constant pressure step CC can appropriately reveal the leak regardless of the height difference H1. For example, the target value F is set so that the target value F increases as the height difference H2 increases. In this case, the constant pressure step CC can appropriately reveal the leak regardless of the height difference H2. Therefore, in the leak determination step, the presence or absence of a leak can be suitably determined.

In the supply process CS, the nozzle 41 is arranged at the processing position. In the constant pressure step CC, the nozzle 41 is arranged in the standby position. In the constant pressure step CC, the leak becomes apparent in the state where the nozzle 41 is arranged in the standby position. Therefore, the quality of processing for the substrate W can be preferably maintained.

In the leak determination step (for example, the second leak determination process), the change in the position of the first piston 18 that reduces the volume of the first pump chamber 12 and the change of the position of the first piston 18 that increases the volume of the first pump chamber 12 Distinguish from changes in position. Therefore, in the leak determination step, the direction of the leak can be suitably specified.

The leak determination step (for example, the first-fourth and sixth-eighth determination processes) determines the presence or absence of a leak based on the moving distance of the first piston 18 in the determination period J. Therefore, the leak determination step can appropriately determine the presence or absence of a leak.

The moving distance of the first piston 18 in the determination period J is an absolute value. Therefore, regardless of the direction of the leak, the leak determination step can determine the presence or absence of the leak.

The leak determination step (for example, the fifth to eighth leak determination processes) determines the presence or absence of a leak based on the average speed of the first piston 18 in the determination period J. Therefore, the leak determination step can appropriately determine the presence or absence of a leak.

The determination period J includes the first determination period J1. The first determination period J1 starts from the first time TJs. The first time TJs is the time when the pressure in the first pump chamber 12 falls within the allowable range G of the target value F for the first time after the constant pressure step CC starts. The first determination period J1 does not include the period before the first time TJs. In the period before the first time TJs, the constant pressure step CC moves the first piston 18 in order to bring the pressure of the first pump chamber 12 closer to the target value F. Therefore, the leak determination step can accurately determine the presence or absence of a leak. The first determination period TJs starts from the first time. That is, the first determination period includes the period immediately after the first time TJs. Leaks are likely to occur in the period immediately following the first time TJs. Therefore, in the leak determination step, the presence or absence of a leak can be determined more accurately.

The time length U1 of the first determination period J1 is, for example, 8 seconds or less. As described above, the first determination period J1 is relatively short. Therefore, the leak determination step can quickly determine the presence or absence of a leak.

The leak determination step (for example, the first leak determination process) divides the first determination period J1 into a plurality of division periods D. The leak determination step calculates the moving distance LD of the first piston 18 in each division period D. In the leak determination step, the division period D in which the moving distance LD of the first piston 18 is equal to or greater than the first threshold value K1 is specified as the change period DC. The leak determination process determines the presence or absence of a leak based on the number NC of the change period DC. By using the number NC of the change period DC, the leak determination step can suitably determine whether or not the change in the position of the first piston 18 is continuously occurring. For example, by using the number NC, the leak determination step preferably obtains a continuous change in the position of the first piston 18 due to the leak and a sudden change in the position of the first piston 18 not caused by the leak. Can be determined. As described above, the constant pressure step CC can prolong the leak generation period. Therefore, the presence or absence of a leak can be accurately determined by the combination of the constant pressure process CC and the leak determination process.

The number ND of the division period D is, for example, 8 or less. As described above, the number ND is relatively small. Therefore, the leak determination step can easily determine the presence or absence of a leak.

The number ND of the division period D is, for example, four or more. Therefore, the leak determination step can suitably determine the continuous change in the position of the first piston 18 due to the leak.

The leak determination step (for example, the first determination process) determines the presence or absence of a leak based on the ratio A of the number NC of the change period DC to the number ND of the division period D. Therefore, the leak determination step can appropriately determine the presence or absence of a leak.

In the leak determination step (for example, the third leak determination process), the change period DC in which the movement distance LD of the first piston 18 is greater than or equal to the second threshold value K2 larger than the first threshold value K1 is specified as the abnormal period DA. The leak determination step determines the presence or absence of a leak based on the number NCa of the change period DC excluding the abnormal period DA. Here, in the abnormal period DA, the first piston 18 moves excessively. Excessive movement of the first piston is unlikely to be due to a leak. In the leak determination step, the number NA of the abnormal period DA is removed from the number NC of the change period DC. Therefore, in the leak determination step, the presence or absence of a leak can be determined more accurately.

The leak determination step (for example, the second leak determination process) classifies the change period DC into a positive change period DCp and a negative change period DCn. The leak determination step determines the presence or absence of a leak based on the number NCp of the positive change period DCp and the number NCn of the negative change period DCn. In this way, the leak determination step determines the presence or absence of a leak in consideration of the direction of the leak. Therefore, in the leak determination step, the presence or absence of a leak can be determined more accurately. For example, the leak determination step can suitably determine the presence or absence of a forward leak. In the leak determination step, the presence or absence of a reverse leak can be suitably determined.

The substrate processing method includes a first filling step CA. Therefore, the treatment liquid can be suitably filled in the first pump chamber 12.

The supply process CS closes the second valve 37. Therefore, the supply process CS can suitably supply the treatment liquid to the substrate W. The constant pressure step CC closes the second valve 37. Therefore, in the constant pressure step CC, the pressure of the first pump chamber 12 can be suitably maintained at the target value F.

The substrate processing method is executed under the first condition described above. Therefore, in the leak determination step (for example, the sixth leak determination process), the travel distance LC can be suitably estimated based on the detection result of at least one of the position PCe, PSs, PSe, PAs and the travel distance LA.

The substrate processing device 1 includes a first pump chamber 12, a first piston 18, a first pressure sensor 21, a first position sensor 22, a first valve 32, a nozzle 41, and a control unit 45. The control unit 45 performs leak determination processing and constant pressure control. In the leak determination process, the control unit 45 acquires the change in the position of the first piston 18 in the determination period J based on the detection result of the first position sensor 22. In the leak determination process, the control unit 45 determines the presence or absence of a leak based on the change in the position of the first piston 18 in the determination period J. In constant pressure control, the control unit 45 closes the first valve 32. In the constant pressure control, the control unit 45 adjusts the position of the first piston 18 based on the detection result of the first pressure sensor 21 so as to keep the pressure of the first pump chamber 12 at the target value F. Therefore, if a leak occurs when the constant pressure control is executed, the constant pressure control can prolong the leak generation period. If a leak occurs when the constant pressure control is executed, the constant pressure control can continuously generate the leak. Here, the entire determination period J is included in the period during which the constant pressure control is executed. Therefore, the control unit 45 can suitably determine the presence or absence of a leak by the leak determination process.

Second Embodiment Hereinafter, the second embodiment of the present invention will be described with reference to the drawings. The same components as those in the first embodiment are designated by the same reference numerals, and detailed description thereof will be omitted.

FIG. 11 is a diagram showing a schematic configuration of the substrate processing apparatus 1 according to the second embodiment. The substrate processing device 1 according to the second embodiment is substantially the same as the first embodiment in terms of the configuration other than the treatment liquid supply device 10. The substrate processing device 1 according to the second embodiment is different from the first embodiment in the configuration of the processing liquid supply device 10.

1. 1. Configuration of Treatment Liquid Supply Device 10 The first pump 11 includes openings 17 in addition to openings 15 and 16. The opening 17 is formed in the housing 13. The opening 17 communicates with the first pump chamber 12.

The treatment liquid supply device 10 includes a second pump 51. The second pump 51 has substantially the same configuration as the first pump 11.

The second pump 51 includes a second pump chamber 52, a housing 53, a diaphragm 54, openings 55, 56, 57, a second piston 58, and a second drive unit 59. The second pump chamber 52, the housing 53, the diaphragm 54, the openings 55, 56, 57, the second piston 58, and the second drive unit 59 are the first pump chamber 12, the housing 13, the diaphragm 14, and the openings 15, 16, respectively. , 17, the first piston 18, and the first drive unit 19.

FIG. 11 shows the positive direction E2p and the negative direction E2n. The negative direction E2n is the opposite direction of the positive direction E2p. The second piston 58 moves in the positive direction E2p and the negative direction E2n. When the second piston 58 moves in the positive direction E2p and the negative direction E2n, the second piston 58 moves with respect to the second pump chamber 52. When the second piston 58 moves in the positive direction E2p, the volume of the second pump chamber 52 decreases. When the second piston 58 moves in the negative direction E2n, the volume of the second pump chamber 52 increases.

The processing liquid supply device 10 includes a second position sensor 62. The second position sensor 62 detects the position of the second piston 58. The second position sensor 62 is attached to, for example, the second drive unit 59. The second position sensor 62 has substantially the same structure as the first position sensor 22.

The treatment liquid supply device 10 includes a pipe 71. The pipe 71 communicates the first pump chamber 12 and the second pump chamber 52. The pipe 71 has a first end and a second end. The first end of the pipe 71 is connected to the opening 16. The second end of the pipe 71 is connected to the opening 55.

The treatment liquid supply device 10 includes a filter 81. The filter 81 is provided in the pipe 71. The filter 81 filters the treatment liquid.

The filter 81 includes a filter main body 82 and a plurality (for example, three) connection ports 83, 84, 85. The filter main body 82 includes a filter medium, a primary side flow path, and a secondary side flow path (all not shown). The filter medium is, for example, a porous membrane. The primary side flow path is a flow path of the treatment liquid formed on the primary side of the filter medium. The secondary side flow path is a flow path of the treatment liquid formed on the secondary side of the filter medium. The connection port 83 communicates with the primary flow path. The connection port 84 communicates with the secondary flow path. The connection ports 83 and 84 are connected to the pipe 71, respectively. The connection port 83 communicates with the second pump chamber 52. The connection port 84 communicates with the first pump chamber 12. The connection port 85 is a port for discharging the gas in the filter main body 82. The connection port 85 can also discharge the processing liquid in the filter main body 82.

The treatment liquid supply device 10 includes two valves 72a and 72b. The valves 72a and 72b are provided in the pipe 71, respectively. The valve 72a is arranged between the first pump chamber 12 and the filter 81. The valve 72b is arranged between the second pump chamber 52 and the filter 81. The valves 72a and 72b each open and close the flow path in the pipe 71. The flow path in the pipe 71 corresponds to the first flow path between the first pump chamber 12 and the second pump chamber 52.

When the valves 72a and 72b are not distinguished, they are simply collectively referred to as "second valve 72". The second valve 72 communicates with the first pump chamber 12 and the second pump chamber 52. The second valve 72 does not communicate with the nozzle 41.

The treatment liquid supply device 10 includes a pipe 73. The pipe 73 communicates and connects the treatment liquid supply source 9 and the second pump chamber 52. The pipe 73 has a first end and a second end. The first end of the pipe 73 is connected to the treatment liquid supply source 9. The second end of the pipe 73 is connected to the opening 56.

The treatment liquid supply device 10 includes a third valve 74. The third valve 74 is provided in the pipe 73. The third valve 74 opens and closes the flow path in the pipe 73. The flow path in the pipe 73 corresponds to the flow path between the second pump chamber 52 and the processing liquid supply source 9. The third valve 74 communicates with the second pump chamber 52. The third valve 74 does not communicate with the first pump chamber 12. The third valve 74 does not communicate with the nozzle 41.

The treatment liquid supply device 10 includes a pipe 75. The pipe 75 communicates and connects the first pump chamber 12 and the second pump chamber 52. The pipe 75 is provided in parallel with the pipe 71. The pipe 75 has a first end and a second end. The first end of the pipe 75 is connected to the opening 17. The second end of the pipe 75 is connected to the opening 57.

The treatment liquid supply device 10 includes a fourth valve 76. The fourth valve 76 is provided in the pipe 75. The fourth valve 76 opens and closes the flow path in the pipe 75. The flow path in the pipe 75 corresponds to a second flow path between the first pump chamber 12 and the second pump chamber 52. The fourth valve 76 communicates with the first pump chamber 12 and the second pump chamber 52. The fourth valve 76 does not communicate with the nozzle 41.

The treatment liquid supply device 10 includes a pipe 77. The pipe 77 is connected to the filter 81 in communication. The pipe 77 has a first end and a second end. The first end of the pipe 77 is connected to the connection port 85. The second end of the pipe 77 is connected to a processing liquid recovery unit (not shown).

The treatment liquid supply device 10 includes a fifth valve 78. The fifth valve 78 is provided in the pipe 77. The fifth valve 78 opens and closes the flow path in the pipe 77. The flow path in the pipe 77 corresponds to a flow path branched from the first flow path.

The control unit 45 is communicably connected to the second drive unit 59, the second position sensor 62, the second valve 72, the third valve 74, the fourth valve 76, and the fifth valve 78. The control unit 45 acquires the detection result detected by the second position sensor 62. The control unit 45 operates the second drive unit 59. The control unit 45 opens and closes the second valve 72, the third valve 74, the fourth valve 76, and the fifth valve 78.

2. 2. Operation A basic operation example of the substrate processing apparatus 1 of the second embodiment will be described. FIG. 12 is a flowchart showing the operation procedure of the substrate processing apparatus 1.

The substrate processing apparatus 1 repeatedly performs the cycle operation C. Each cycle operation C includes a first filling step CA, a return step CR, a constant pressure step CC, a supply step CS, and a second filling step CB. The first filling step CA, the return step CR, the constant pressure step CC, and the supply step CS are executed in this order. The second filling step CB is performed after the return step CR and before the first filling step CA.

[Step S11: First Filling Step CA]
FIG. 13 is a diagram showing a substrate processing apparatus 1 in the first filling step CA. FIG. 13 briefly shows the substrate processing apparatus 1 for convenience. The first filling step CA sends the processing liquid from the second pump chamber 52 to the first pump chamber 12 through the first flow path.

The control unit 45 arranges the nozzle 41 in the standby position. The nozzle 41 is arranged in the nozzle standby unit 43.

The control unit 51 closes the first valve 32. The control unit 51 opens the second valve 72. The control unit 51 closes the third valve 74. The control unit 51 closes the fourth valve 76. The control unit 51 closes the fifth valve 78. The control unit 51 moves the second piston 58 in the forward direction E2p. The volume of the second pump chamber 52 is reduced. The control unit 51 moves the first piston 18 in the negative direction E1n. The volume of the first pump chamber 12 increases. The second pump chamber 52 discharges the treatment liquid through the opening 55. The treatment liquid flows from the second pump chamber 52 to the first pump chamber 12 through the pipe 71, the second valve 72, and the filter 81. The first pump chamber 12 sucks the treatment liquid through the opening 16. As a result, the first pump chamber 12 is filled with the treatment liquid.

FIG. 13 shows the first piston 18 and the second piston 58 when the first filling step CA starts with a solid line. FIG. 13 shows the first piston 18 and the second piston 58 at the end of the first filling step CA with broken lines. The position of the second piston 58 when the first filling step CA starts is called the position QAs. The position of the second piston 58 when the first filling step CA is completed is called the position QAe. The moving distance of the second piston 58 in the first filling step CA is referred to as a moving distance MA. The moving distance MA is the difference between the position QAs and the position QAe. The travel distance MA is an absolute value.

[Step S12: Return step CR]
FIG. 14 is a diagram showing a substrate processing device 1 in the return step CR. In the return step CR, the processing liquid is returned from the first pump chamber 12 to the second pump chamber 52 through the second flow path. The return step CR is also referred to as a purge step.

Also in the return step CR, the nozzle 41 is arranged in the standby position.

The control unit 51 closes the first valve 32. The control unit 51 closes the second valve 72. The control unit 51 opens the third valve 74. The control unit 51 opens the fourth valve 76. The control unit 51 moves the first piston 18 in the positive direction E1p. The volume of the first pump chamber 12 is reduced. The control unit 51 makes the second piston 58 stationary with respect to the second pump chamber 52. The volume of the second pump chamber 52 does not change. The first pump chamber 12 discharges the treatment liquid through the opening 15. If the first pump chamber 12 contains air bubbles or air, the first pump chamber 12 discharges air bubbles or air together with the treatment liquid. The treatment liquid flows from the first pump chamber 12 to the second pump chamber 52 through the pipe 75 and the fourth valve 76. Further, the treatment liquid flows out from the second pump chamber 52 to the pipe 73 through the opening 56.

FIG. 14 shows the first piston 18 and the second piston 58 when the return step CR starts with a solid line. FIG. 14 shows the first piston 18 at the end of the return step CR with a broken line. The position of the first piston 18 when the return step CR starts is called the position PRs. The position of the first piston 18 when the return step CR is completed is called the position PRE. The moving distance of the first piston 18 in the return step CR is called a moving distance LR. The moving distance LR is the difference between the position PRs and the position PRE. The travel distance LR is an absolute value. The travel distance LR is smaller than the travel distance LA.

[Step S13: Constant pressure step CC]
FIG. 15 is a diagram showing a substrate processing device 1 in the constant pressure process CC. The constant pressure step CC keeps the pressure of the first pump chamber 12 constant.

Also in the constant pressure step CC, the nozzle 41 is arranged in the standby position.

The control unit 45 performs constant pressure control. In the constant pressure control, the control unit 45 closes the first valve 32, the second valve 72, and the fourth valve 76. The first pump chamber 12 is closed. In the constant pressure control, the control unit 45 adjusts the position of the first piston 18 so as to keep the pressure of the first pump chamber 12 at the target value F. In the constant pressure control, the control unit 45 adjusts the position of the first piston 18 based on the detection result of the first pressure sensor 21. In the constant pressure step CC, the pressure of the first pump chamber 12 is applied to the inlet port 34 of the first valve 32.

FIG. 15 shows a solid line of the first piston 18 when the constant pressure process CC starts. FIG. 15 shows the first piston 18 at the end of the constant pressure step CC by a broken line.

[Step S13: Supply process CS]
FIG. 16 is a diagram showing a substrate processing device 1 in the supply process CS. The supply process CS supplies the processing liquid to the substrate W.

The control unit 45 arranges the nozzle 41 at the processing position. The substrate holding portion 5 holds the substrate W. The control unit 45 rotates the substrate W held by the substrate holding unit 5.

The control unit 45 opens the first valve 32. The control unit 45 closes the second valve 72. The control unit 45 closes the fourth valve 76. The control unit 45 moves the first piston 18 in the positive direction E1p. The volume of the first pump chamber 12 is reduced. The first pump chamber 12 discharges the treatment liquid through the opening 15. The treatment liquid flows to the nozzle 41 via the pipe 31 and the first valve 32. The nozzle 41 discharges the processing liquid onto the substrate W. The cup 7 receives the processing liquid scattered from the substrate W.

FIG. 16 shows the first piston 18 at the start of the supply process CS with a solid line. FIG. 16 shows the first piston 18 at the end of the supply process CS with a broken line.

[Step S15: Second filling step CB]
See FIG. FIG. 15 shows the second filling step CB in addition to the constant pressure step CC for convenience. In the second filling step CB, the processing liquid is filled in the second pump chamber 52.

The control unit 45 closes the second valve 72. The control unit 45 opens the third valve 74. The control unit 45 closes the fourth valve 76. The control unit 45 moves the second piston 58 in the negative direction E2n. The volume of the second pump chamber 52 increases. The treatment liquid flows from the treatment liquid supply source 9 to the second pump chamber 52 through the pipe 73 and the third valve 74. The second pump chamber 52 sucks the treatment liquid through the opening 56. As a result, the second pump chamber 52 is filled with the treatment liquid.

In FIG. 15, the second piston 58 at the start of the second filling step CB is shown by a solid line. FIG. 15 shows the second piston 58 at the end of the second filling step CB by a broken line. The position of the second piston 58 when the second filling step CB starts is called the position QBs. The position of the second piston 58 when the second filling step CB is completed is called the position QBe. The moving distance of the second piston 58 in the second filling step CB is referred to as a moving distance MB. The moving distance MB is the difference between the position QBs and the position QBe. The travel distance MB is an absolute value.

When both the supply step CS and the second filling step CB are completed, one cycle operation C is completed. After the end of one cycle operation C, a new cycle operation C starts. That is, the first filling step CA starts.

FIG. 17A is a graph showing the temporal change of the position of the first piston 18. FIG. 17B is a graph showing the temporal change of the position of the second piston 58.

See FIG. 17 (a). The time when the return step CR starts is, for example, the same as when the first filling step CA ends. The time when the constant pressure step CC starts is, for example, the same as when the return step CR ends. The time when the first filling step CA starts is, for example, the same as when the supply step CS ends.

In the first filling step CA, the control unit 45 moves the first piston 18 to the first origin position P0. That is, the position PAe is always the first origin position P0.

In the return step CR, the position PRs are substantially equal to the position PAe. Therefore, the position PRs are substantially equal to the first origin position P0. In the return step CR, the control unit 45 moves the first piston 18 by the second distance L2. That is, the moving distance LR is always the second distance L2. The position PRE is a position where the first origin position P0 is shifted to the positive direction E1p by the second distance L2.

In the constant pressure process, the position PCs are substantially equal to the position PRE. The travel distance LC may vary among the plurality of cycle operations C. The position PCe varies depending on the moving distance LC.

In the feeding process, the position PSs are substantially equal to the position PCe. Therefore, the position PSs fluctuates according to the moving distance LC. In the supply process CS, the control unit 45 moves the first piston 18 by the first distance L1. The position PSe is a position where the position PSs is shifted to the positive direction E1p by the first distance L1. The position PSe varies depending on the travel distance LC.

In the first filling step CA, the position PAs are substantially equal to the position PSe. Therefore, the position PAs fluctuate according to the moving distance LC. The position PAe is the first origin position P0 as described above. Therefore, the moving distance LA also fluctuates according to the moving distance LC.

See FIG. 17 (b). The time when the second filling step CB starts is, for example, the same as when the return step CR ends. The time when the second filling step CB starts is, for example, the same as when the constant pressure step CC starts.

When the first filling step CA starts, the position QAs is always the second origin position Q0. In the first filling step CA, the control unit 45 moves the second piston 58 until the first piston 18 reaches the first origin position P0. The travel distance MA is determined by the travel distance LA. The travel distance MA is proportional to the travel distance LA. For example, the travel distance MA is the same as the travel distance LA. As described above, the travel distance LA varies depending on the travel distance LC. Therefore, the travel distance MA fluctuates according to the travel distance LC. The position QAe also fluctuates according to the moving distance LC.

In the return step CR, the second piston 58 is substantially kept at position QAe.

In the second filling step CB, the position QBs are substantially equal to the position QAe. Therefore, the position QBs fluctuate according to the moving distance LC. In the second filling step CB, the control unit 45 moves the second piston 58 to the second origin position Q0. That is, the position QBe is always the second origin position Q0. The travel distance MB is substantially equal to the travel distance MA. Therefore, the travel distance MB also fluctuates according to the travel distance LC.

The above-mentioned second origin position Q0 and the second distance L2 are preset. The second origin position Q0 and the second distance L2 are stored in, for example, the storage unit 47. The second origin position Q0 and the second distance L2 are known, respectively.

[Step S16: Detection step]
See FIG. The substrate processing apparatus 1 performs a detection step in parallel with the cycle operation C. The detection step is performed, for example, over a period in which the first filling step CA, the return step CR, the constant pressure step CC, the supply step CS, and the second filling step CB are executed. In the detection step, the first pressure sensor 21 detects the pressure in the first pump chamber 12. In the detection step, the first position sensor 22 detects the position of the first piston 18. In the detection step, the second position sensor 62 detects the position of the second piston 58. The first pressure sensor 21 outputs the detection result of the first pressure sensor 21 to the control unit 45. The first position sensor 22 outputs the detection result of the first position sensor 22 to the control unit 45. The second position sensor 62 outputs the detection result of the second position sensor 62 to the control unit 45.

[Step S17: Leak determination step]
The substrate processing apparatus 1 performs a leak determination step in parallel with the cycle operation C and the detection step. In the leak determination step, the control unit 45 performs a leak determination process. In the leak determination process, the control unit 45 acquires a change in the position of the first piston 18 in the determination period J based on the detection result obtained by the detection step. In the leak determination process, the control unit 45 determines the presence or absence of a leak based on the change in the position of the first piston 18 in the determination period J.

See FIG. 17 (a). FIG. 17A exemplifies the determination period J. The entire determination period J is included in the period during which the constant pressure step CC is executed. That is, the determination period J does not include the period during which the constant pressure step CC is not executed. The determination period J is at least a part of the period during which the constant pressure step CC is executed. The determination period J includes at least one of the first determination period J1 and the second determination period J2.

3. 3. Details of the leak determination step (leak determination process) In the second embodiment, the first to fifth leak determination processes described in the first embodiment can be applied. In the second embodiment, the sixth leak determination process described in the first embodiment can be applied after being slightly modified. Further, in the second embodiment, the moving distance of the first piston 18 in the second determination period J2 can be estimated based on the detection result of the position of the second piston 58. The seventh and eighth leak determination processes are exemplified.

3-1. Seventh Leak Determination Process The seventh leak determination process is a modification of the sixth leak determination process for the second embodiment. The seventh leak determination process estimates the moving distance LC of the first piston 18 in the second determination period J2.

As described above, the cycle operation C is executed under the following second condition.
[Second condition]
The supply process CS moves the first piston 18 by the first distance L1.
The first filling step CA moves the first piston 18 to the first origin position P0.
The first filling step CA moves the second piston 58 until the first piston 18 reaches the first origin position P0.
The second filling step CB moves the second piston 58 to the second origin position Q0.
The return step CR moves the first piston 18 by the second distance L2.

In other words, the travel distance LS is equal to the first distance L1. The position PAe is equal to the first origin position P0. The travel distance MA is determined by the travel distance LA. The position QBe is equal to the second origin position Q0. The travel distance LR is equal to the second distance L2.

Even under the second condition, the position PCe, PSs, PSe, PAs and the travel distance LA each vary depending on the travel distance LC. Therefore, the travel distance LC can be estimated from at least one of the position PCe, PSs, PSe, PAs, and the travel distance LA.

For example, the control unit 45 estimates the travel distance LC based on the position PCe. Specifically, the control unit 45 acquires the position PCe based on the detection result of one position of the first piston 18 when the constant pressure step CC ends. The control unit 45 estimates the difference between the position PCe and the second reference position RP2 as the moving distance LC. Here, the second reference position RP2 is a position where the first origin position P0 is shifted to the positive direction E1p by the second distance L2.

For example, the control unit 45 estimates the travel distance LC based on the position PSs. Specifically, the control unit 45 acquires the position PSs based on the detection result of the position of the first piston 18 when the supply process CS starts. The control unit 45 estimates the difference between the position PSs and the second reference position RP2 as the moving distance LC.

For example, the control unit 45 estimates the travel distance LC based on the position PSe. Specifically, the control unit 45 acquires the position PSe based on the detection result of the position of the first piston 18 when the supply process CS ends. The control unit 45 estimates the difference between the position PSe and the third reference position RP3 as the moving distance LC. Here, the third reference position RP3 is a position where the first origin position P0 is shifted to the positive direction E1p by the third distance L3. The third distance L3 is the sum of the first distance L1 and the second distance L2.

For example, the control unit 45 estimates the travel distance LC based on the position PAs. Specifically, the control unit 45 acquires the position PAs based on the detection result of the position of the first piston 18 when the first filling step CA starts. The control unit 45 estimates the difference between the position PAs and the third reference position RP3 as the moving distance LC.

For example, the control unit 45 estimates the travel distance LC based on the travel distance LA. Specifically, the control unit 45 has a detection result of the position of the first piston 18 when the first filling step CA starts and a detection result of the position of the first piston 18 when the first filling step CA ends. , The travel distance LA is acquired. The control unit 45 estimates the difference between the moving distance LA and the third distance L3 as the moving distance LC.

The control unit 45 determines the presence or absence of a leak based on the estimated travel distance LC. For example, as in the fourth leak determination process, the control unit 45 compares the estimated travel distance LC with the fourth threshold value K4.

Alternatively, the control unit 45 obtains the average velocity VC by dividing the estimated travel distance LC by the time length U2. Then, the control unit 45 determines the presence or absence of a leak based on the average speed VC. For example, as in the fifth leak determination process, the control unit 45 compares the average speed VC with the sixth threshold value K6.

The second reference position RP2, the third reference position RP3, and the third distance L3 described above are preset. The second reference position RP2, the third reference position RP3, and the third distance L3 are stored in, for example, the storage unit 47.

3-2. Eighth leak determination process The eighth leak determination process estimates the moving distance LC of the first piston 18 in the second determination period J2 based on the detection result of the position of the second piston 58.

Under the second condition, the positions QAe and QBs and the travel distances MA and MB each vary according to the travel distance LC. Therefore, the travel distance LC can be estimated from at least one of the position QAe, QBs, and the travel distance MA, MB.

For example, the control unit 45 estimates the movement distance LC based on the position QAe. Specifically, the control unit 45 acquires the position QAe based on the detection result of the position of the second piston 58 when the first filling step CA ends. The control unit 45 estimates the difference between the position QSe and the reference position RQ1 as the moving distance LC. Here, the reference position RQ1 is a position where the second origin position Q0 is shifted to the positive direction E2p by a distance M3. The following relationship is established between the distance M3 and the third distance L3. The amount of change in the volume of the second pump chamber 52 when the second piston 58 moves by the distance M3 is equal to the amount of change in the volume of the first pump chamber 12 when the first piston 18 moves by the third distance L3. .. The distance M3 is, for example, the third distance L3 multiplied by a proportionality constant. The distance M3 is, for example, equal to the third distance L3.

For example, the control unit 45 estimates the movement distance LC based on the position QBs. Specifically, the control unit 45 acquires the position QBs based on the detection result of the position of the second piston 58 when the second filling step CB starts. The control unit 45 estimates the difference between the position QBs and the reference position RQ1 as the moving distance LC.

For example, the control unit 45 estimates the travel distance LC based on the travel distance MA. Specifically, the control unit 45 has a detection result of the position of the second piston 58 when the first filling step CA starts and a detection result of the position of the second piston 58 when the first filling step CA ends. , To obtain the travel distance MA. The control unit 45 estimates the difference between the travel distance MA and the distance M3 as the travel distance LC.

For example, the control unit 45 estimates the travel distance LC based on the travel distance MB. Specifically, the control unit 45 has a detection result of the position of the second piston 58 when the second filling step CB starts and a detection result of the position of the second piston 58 when the second filling step CB ends. , To obtain the travel distance MB. The control unit 45 estimates the difference between the travel distance MB and the distance M3 as the travel distance LC.

The control unit 45 determines the presence or absence of a leak based on the estimated travel distance LC. For example, as in the fourth leak determination process, the control unit 45 compares the estimated travel distance LC with the fourth threshold value K4.

Alternatively, the control unit 45 acquires the average velocity VC from the estimated travel distance LC and the time length U2. Then, the control unit 45 determines the presence or absence of a leak based on the average speed VC. For example, as in the fifth leak determination process, the control unit 45 compares the average speed VC with the sixth threshold value K6.

The above-mentioned reference position RQ1 and distance M3 are preset. The reference position RQ1 and the distance M3 are stored in, for example, the storage unit 47.

4. Effect According to the second embodiment, the same effect as that of the first embodiment is obtained. Further, according to the second embodiment, the following effects are obtained.

The substrate processing method of the second embodiment includes a second filling step CB. Therefore, in the second filling step CB, the treatment liquid can be suitably filled in the second pump chamber 52.

The first filling step CA sends the processing liquid from the second pump chamber 52 to the first pump chamber 12 via the second valve 72. Therefore, in the first filling step CA, the first pump chamber 12 can be suitably filled with the treatment liquid by using the second pump chamber 52.

The supply process CS closes the second valve 72. The constant pressure step CC closes the second valve 72. Therefore, the supply process CS and the constant pressure process CC can be appropriately executed.

The substrate processing method includes a return step CR. Therefore, the quality of processing for the substrate W can be preferably maintained.

The supply step CS, the constant pressure step CC, the first filling step CA, and the second filling step CB close the fourth valve 76. Therefore, the supply step CS, the constant pressure step CC, the first filling step CA, and the second filling step CB can be suitably executed.

The substrate processing method of the second embodiment is executed under the second condition described above. Therefore, in the leak determination step (for example, the 7th-8th leak determination process), the detection result of at least one of the position PCe, PSs, PSe, PAs, the moving distance LA, the position QAe, QBs and the moving distance MA, MB. The travel distance LC can be suitably estimated based on the above.

As specified in the second condition, the return step CR moves the first piston 18 by the second distance L2. Therefore, even when the substrate processing method includes the return step CR, the position PCe, PSs, PSe, PAs, and the moving distance LA vary depending on the moving distance LC, as in the first embodiment. do. Therefore, in the leak determination step, a seventh leak determination process similar to the sixth leak determination process described in the first embodiment can be preferably used.

The present invention is not limited to the first and second embodiments, and can be modified as follows.

(1) The second determination process and the third determination process may be combined. For example, in the leak determination step, the number NCpa of the positive change period DCp excluding the abnormal period DA and the number NCpn of the negative change period DCn excluding the abnormal period DA may be counted. Then, in the leak determination step, the presence or absence of a leak may be determined based on the number NCpa and the number NCpn.

(2) In the second determination process, the leak determination step classified the change period DC into a positive change period DCp and a negative change period DCn. That is, both the moving distance LD in the positive change period DCp and the moving distance LD in the negative change period DCn are equal to or higher than the first threshold value K1. However, it is not limited to this. For example, in the leak determination step, the division period D in which the moving distance LD of the first piston 18 is equal to or greater than the seventh threshold value K7 in the positive direction E1p may be specified as the positive change period DCp. For example, in the leak determination step, the division period D in which the moving distance LD of the first piston 18 is equal to or greater than the eighth threshold value K8 in the negative direction E1n may be specified as the negative change period DCn. Here, the eighth threshold value K8 is different from the seventh threshold value K7. According to this, the leak determination step can determine the presence / absence of a forward leak and the presence / absence of a reverse leak with higher accuracy.

(3) In the first determination process, the number NC was compared with one first reference value R1. However, it is not limited to this. For example, the number NC may be compared with a plurality of reference values. For example, in the leak determination step, the number NC may be compared with the seventh reference value R7 and the eighth reference value R8. Here, the eighth reference value R8 is larger than the seventh reference value R7. Then, when the number NC is less than the seventh reference value R7, the leak determination step determines that no leak has occurred (level 1). When the number NC is the 7th reference value R7 or more and less than the 8th reference value R8, the leak determination step determines that a leak may have occurred (level 2). When the number NC is 8th reference value R8 or more, the leak determination step determines that there is a high possibility that a leak has occurred (level 3). As described above, in the leak determination step, the presence or absence of a leak may be determined using three or more levels.

(4) In the first determination process, the ratio A was compared with the second reference value R2. However, it is not limited to this. For example, it is not necessary to compare the ratio A with the second reference value R2. For example, the leak determination step may specify the probability of occurrence of a leak based on the ratio A. For example, in the leak determination step, the presence or absence of a leak may be determined using the probability of occurrence of a leak.

(5) In the first embodiment, the order of each step included in the cycle operation C may be appropriately changed. In the first embodiment, the first filling step CA, the constant pressure step CC, and the supply step CS were executed in this order. However, it is not limited to this. For example, the first filling step CA, the supply step CS, and the constant pressure step CC may be executed in this order. Similarly, in the second embodiment, the order of each step included in the cycle operation C may be appropriately changed.

(6) The substrate processing method of the second embodiment includes a return step CR. However, it is not limited to this. For example, the return step CR may be omitted. In this case, in the 7th to 8th determination processes, the second distance L2 is regarded as zero.

(7) In the first embodiment, when the leak determination step determines that a leak has occurred, the subsequent cycle operation C (supply step CS) may be stopped. As a result, it is possible to prevent the quality of processing for the substrate W from deteriorating. Alternatively, if the leak determination step determines that a leak has occurred, the nozzle standby unit 43 may execute dummy discharge from the nozzle 41. Thereby, the liquid level of the processing liquid in the nozzle 41 can be appropriately corrected. On the other hand, if the leak determination step determines that no leak has occurred, the dummy dispense may be omitted. As a result, the consumption of the processing liquid can be effectively reduced while maintaining the processing quality for the substrate W.

(8) In the first embodiment, the position of the first piston 18 is represented by the number of pulses. However, it is not limited to this. For example, the position of the first piston 18 may be expressed by the distance from the first origin position P0.

(9) The relationship between the height differences H1 and H2 and the target value F will be described. FIG. 18 is a diagram showing a schematic configuration of the substrate processing apparatus 1 according to the modified embodiment. FIG. 18 briefly shows the substrate processing apparatus 1. The same components as those in the first embodiment are designated by the same reference numerals, and detailed description thereof will be omitted.

The substrate processing apparatus 1 includes two processing units 3a and 3b. "A" is appropriately added to the code of the element of the processing unit 3a. "B" is appropriately added to the code of the element of the processing unit 3b.

The processing unit 3a includes a chamber 4a. The chamber 4a accommodates the nozzle 41a and the like. The processing unit 3b includes a chamber 4b. The chamber 4b accommodates the nozzle 41b and the like. The chambers 4a and 4b are laminated in the vertical direction Z. The chamber 4b is located below the chamber 4a.

The processing unit 3a includes a processing liquid supply device 10a. The treatment liquid supply device 10a includes a first pump chamber 12a. The processing unit 3b includes a processing liquid supply device 10b. The treatment liquid supply device 10b includes a first pump chamber 12b. The first pump chambers 12a and 12b are arranged outside the chambers 4a and 4b, respectively. The first pump chambers 12a and 12b are arranged below the chambers 4a and 4b, respectively. The first pump chamber 12b is arranged at substantially the same height as the first pump chamber 12a.

The first valve 32a is arranged at substantially the same height as the chamber 4a. The first valve 32b is arranged at substantially the same height as the chamber 4b.

The height difference H1a between the first pump chamber 12a and the first valve 32a is larger than the height difference H1b between the first pump chamber 12b and the first valve 32b. The height difference H2a between the first pump chamber 12a and the nozzle 41a is larger than the height difference H2b between the first pump chamber 12b and the nozzle 41b.

The constant pressure step CC adjusts the position of the first piston 18a so as to keep the pressure of the first pump chamber 12a at the target value Fa. The constant pressure step CC adjusts the position of the first piston 18b so as to keep the pressure of the first pump chamber 12b at the target value Fb. Here, the target value Fb is smaller than the target value Fa. For example, the target value Fa is 20 kPa. For example, the target value Fa is 10 kPa.

In this way, the target value F is set so that the target value F increases as the height difference H1 increases. Therefore, regardless of whether the height difference H1 is large or small, the constant pressure step CC can appropriately reveal the leak. Further, the target value F is set so that the target value F increases as the height difference H2 increases. Therefore, regardless of whether the height difference H2 is large or small, the constant pressure step CC can appropriately reveal the leak.

(10) In the first and second embodiments, a coating film material is exemplified as the treatment liquid. However, it is not limited to this. The treatment liquid may be, for example, at least one of a chemical liquid, a solvent and pure water.

(11) For each of the first and second embodiments described above and the modified embodiments described in (1) to (10) above, each configuration may be further replaced or combined with the configuration of another modified embodiment as appropriate. May be changed to.

1 ... Board processing device 12 ... 1st pump chamber 18 ... 1st piston 21 ... 1st pressure sensor 22 ... 1st position sensor 32 ... 1st valve 33 ... Valve body 34 ... Inlet port 35 ... Outlet port 37 ... 2nd valve 41… Nozzle 44… Nozzle standby unit 45… Control unit 47… Storage unit 52… 2nd pump chamber 58… 2nd piston 62… 2nd position sensor 72… 2nd valve 74… 3rd valve 76… 4th valve 78… 6th valve A ... Ratio of change period to division period CA ... 1st filling process CB ... 2nd filling process CC ... Constant pressure process CR ... Return process CS ... Supply process D, D1-D5 ... Division period DA ... Abnormal period DC ... Change period DCp ... Positive change period DCn ... Negative change period E1n ... Positive direction of the first piston E1p ... Negative direction of the first piston E2n ... Positive direction of the second piston E2p ... Negative direction of the second piston F, Fa, Fb ... Target value G ... Allowable range H1, H1a, H1b ... Height difference between the first pump chamber and the first valve H2, H2a, H2b ... Height difference between the first pump chamber and the nozzle J ... Judgment period J1 ... 1st judgment period J2 ... 2nd judgment period (period during which the constant pressure process is executed)
K1-K8 ... 1st to 8th threshold LC ... Movement distance of the first piston in the constant pressure process (movement distance of the first piston in the second determination period)
LD, LD1-LD5 ... Movement distance of the first piston in the division period LA ... Movement distance of the first piston in the first filling process LJ ... Movement distance of the first piston in the first determination period LR ... Movement distance LS ... Movement distance of the first piston in the supply process L1 ... First distance L2 ... Second distance MA ... Movement distance of the second piston in the first filling process MB ... Movement distance of the second piston in the second filling process NA … Number of abnormal periods NC… Number of change periods NCa… Number of change periods excluding abnormal periods NCp… Number of positive change periods NCn… Number of negative change periods ND… Number of division periods NDa… Number of division periods excluding abnormal periods Number PAs… Position of the first piston when the first filling process starts PAe… Position of the first piston when the first filling process ends PCs… Position of the first piston when the constant pressure process starts PCe… The constant pressure process Position of the first piston at the end PRs ... Position of the first piston when the return process starts PRE ... Position of the first piston when the return process ends PSs ... Position of the first piston when the supply process starts PSe … Position of the first piston when the supply process ends P0… First origin position QAs… Position of the second piston when the first filling process starts QAe… Position of the second piston when the first filling process ends QBs ... Position of the second piston when the second filling process starts QBe ... Position of the second piston when the second filling process ends Q0 ... Second origin position R1-R6 ... 1st-6th reference value RP1- RP3 ... 1st-1st reference position RQ1 ... Reference position TJs ... 1st time U1 ... Time length of 1st judgment period U2 ... Time length of 2nd judgment period VJ ... Average speed VC of 1st piston in 1st judgment period … Average speed of the first piston in the second judgment period

Claims (20)

It is a board processing method
By moving the first piston with respect to the first pump chamber, the volume of the first pump chamber is reduced, the first valve communicating with the first pump chamber is opened, and the first pump chamber is used as the first valve. A supply process in which the processing liquid is sent to the nozzle via a valve and the processing liquid is discharged from the nozzle to the substrate.
The detection step of detecting the position of the first piston and
The change in the position of the first piston in the determination period is acquired based on the detection result obtained by the detection step, and the treatment liquid from the first valve is obtained based on the change in the position of the first piston in the determination period. Leak determination process to determine the presence or absence of leaks and
A constant pressure step of closing the first valve and adjusting the position of the first piston so as to keep the pressure of the first pump chamber at a target value.
Equipped with
The entire determination period is a substrate processing method included in the period in which the constant pressure step is executed. In the substrate processing method according to claim 1,
The first valve is
An inlet port communicating with the first pump chamber and
The outlet port that communicates with the nozzle and
Equipped with
The constant pressure step is a substrate processing method in which the pressure of the first pump chamber is applied to the inlet port of the first valve. In the substrate processing method according to claim 1 or 2,
The target value is a substrate processing method higher than atmospheric pressure. In the substrate processing method according to any one of claims 1 to 3,
The target value increases as at least one of the height difference between the first pump chamber and the first valve and the height difference between the first pump chamber and the nozzle increases. , The target value is set by the substrate processing method. In the substrate processing method according to any one of claims 1 to 4,
In the supply step, the nozzle is placed at the processing position.
The constant pressure step is a substrate processing method in which the nozzle is arranged in a standby position. In the substrate processing method according to any one of claims 1 to 5,
The leak determination step distinguishes between a change in the position of the first piston that reduces the volume of the first pump chamber and a change in the position of the first piston that increases the volume of the first pump chamber. Method. In the substrate processing method according to any one of claims 1 to 6,
The leak determination step is a substrate processing method for determining the presence or absence of leakage of the processing liquid from the first valve based on the moving distance of the first piston in the determination period. In the substrate processing method according to any one of claims 1 to 7,
The leak determination step is a substrate processing method for determining the presence or absence of leakage of the processing liquid from the first valve based on the average speed of the first piston during the determination period. In the substrate processing method according to any one of claims 1 to 8,
The determination period includes the first determination period.
A substrate processing method in which the first determination period starts from the first time when the pressure in the first pump chamber becomes within the allowable range of the target value for the first time after the constant pressure step starts. In the substrate processing method according to claim 9,
The substrate processing method in which the time length of the first determination period is 4 seconds or more and 8 seconds or less. In the substrate processing method according to claim 9 or 10.
The leak determination step is
The first determination period is divided into a plurality of division periods.
The moving distance of the first piston in each division period is calculated.
The division period in which the movement distance of the first piston is equal to or greater than the first threshold value is specified as a change period.
A substrate processing method for determining the presence or absence of leakage of the treatment liquid from the first valve based on the number of change periods. In the substrate processing method according to claim 11,
The substrate processing method in which the number of division periods is 8 or less. In the substrate processing method according to claim 11 or 12,
The leak determination step is a substrate processing method for determining the presence or absence of leakage of the treatment liquid from the first valve based on the ratio of the number of change periods to the number of division periods. In the substrate processing method according to any one of claims 11 to 13,
The leak determination step is
The change period in which the moving distance of the first piston is equal to or greater than the second threshold value larger than the first threshold value is specified as an abnormal period.
A substrate processing method for determining the presence or absence of leakage of the treatment liquid from the first valve based on the number of change periods excluding the abnormal period. In the substrate processing method according to any one of claims 11 to 14,
The leak determination step is
The change period is classified into either a positive change period in which the first piston decreases the volume of the first pump chamber and a negative change period in which the first piston increases the volume of the first pump chamber. ,
A substrate processing method for determining the presence or absence of leakage of the processing liquid from the first valve based on the number of positive change periods and the number of negative change periods. In the substrate processing method according to any one of claims 1 to 15,
The volume of the first pump chamber is increased by closing the first valve, opening the second valve communicating with the first pump chamber, and moving the first piston with respect to the first pump chamber. The first filling step of filling the first pump chamber with the treatment liquid via the second valve, and
Equipped with
In the supply step, the second valve is closed.
In the constant pressure step, the second valve is closed.
In the supply step, the first piston is moved by a predetermined first distance.
In the first filling step, the first piston is moved to a predetermined first origin position.
The determination period includes the second determination period.
The second determination period is the entire period during which the constant pressure step is executed.
The leak determination step is
The position of the first piston at the end of the constant pressure step,
The position of the first piston at the start of the supply process,
The position of the first piston at the end of the supply process,
The position of the first piston at the start of the first filling step, and
A substrate processing method for estimating the moving distance of the first piston in the second determination period based on at least one of the moving distances of the first piston in the first filling step. In the substrate processing method according to any one of claims 1 to 15,
By moving the second piston with respect to the second pump chamber, the volume of the second pump chamber is increased, the second valve communicating with the first pump chamber and the second pump chamber is closed, and the second pump chamber is closed. A second filling step of opening a third valve that communicates with the second pump chamber without communicating with the pump chamber and filling the second pump chamber with the processing liquid via the third valve.
Equipped with
In the first filling step, the second pump chamber is closed by closing the first valve, opening the second valve, closing the third valve, and moving the second piston with respect to the second pump chamber. The volume of the first pump chamber is increased by reducing the volume of the first pump chamber and moving the first piston with respect to the first pump chamber, and the first pump chamber is connected to the first pump chamber via the second valve. Send the processing liquid to the pump room and
In the supply step, the second valve is closed.
The constant pressure step is a substrate processing method for closing the second valve. In the substrate processing method according to claim 17,
In the supply step, the first piston is moved by a predetermined first distance.
In the first filling step, the first piston is moved to a predetermined first origin position.
In the first filling step, the second piston is moved until the first piston reaches the first origin position.
In the second filling step, the second piston is moved to a predetermined second origin position.
The detection step detects the position of the second piston and
The determination period includes the second determination period.
The second determination period is the entire period during which the constant pressure step is executed.
The leak determination step is
The position of the first piston at the end of the constant pressure step,
The position of the first piston at the start of the supply process,
The position of the first piston at the end of the supply process,
The position of the first piston at the start of the first filling step,
The moving distance of the first piston in the first filling step,
The moving distance of the second piston in the first filling step,
The position of the second piston at the end of the first filling step,
The position of the second piston at the start of the second filling step, and
The moving distance of the second piston in the second filling step,
A substrate processing method for estimating the moving distance of the first piston in the second determination period based on at least one of the above. In the substrate processing method according to claim 18,
The first valve is closed, the second valve is closed, the third valve is opened, the fourth valve communicating with the first pump chamber and the second pump chamber is opened, and the first pump chamber is opened. By moving the first piston, the volume of the first pump chamber is reduced, the second piston is made stationary with respect to the second pump chamber, and the first pump chamber is processed into the second pump chamber. The return process to return the liquid and
Equipped with
In the supply step, the fourth valve is closed.
In the constant pressure step, the fourth valve is closed.
In the first filling step, the fourth valve is closed.
In the second filling step, the fourth valve is closed.
The return step is a substrate processing method for moving the first piston by a predetermined second distance. It is a board processing device
The first pump room and
A first piston that moves relative to the first pump chamber and changes the volume of the first pump chamber,
The first position sensor that detects the position of the first piston and
A first pressure sensor that detects the pressure in the first pump chamber,
The first valve communicating with the first pump chamber and
A nozzle communicating with the first valve and
A control unit that acquires the detection result of the first position sensor and the detection result of the first pressure sensor, moves the first piston, and opens and closes the first valve.
Equipped with
The control unit
Leak judgment processing and
Perform constant pressure control and
In the leak determination process, the control unit acquires a change in the position of the first piston during the determination period based on the detection result of the first position sensor, and changes in the position of the first piston during the determination period. Based on the above, the presence or absence of leakage of the treatment liquid from the first valve is determined.
In the constant pressure control, the control unit closes the first valve and adjusts the position of the first piston based on the detection result of the first pressure sensor so as to keep the pressure in the first pump chamber at the target value. death,
The entire determination period is included in the period during which the constant pressure control is executed.

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