JP2021528561A - シールドマウントを有する堆積システム - Google Patents
シールドマウントを有する堆積システム Download PDFInfo
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3441—Dark space shields
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3447—Collimators, shutters, apertures
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Abstract
【選択図】図12
Description
Claims (15)
- 複数のカソードアセンブリと、
複数のカソードアセンブリの下の回転シールドであって、複数のカソードアセンブリのうちの1つを回転シールドのシールド孔を通して露出させ、且つ隆起した周囲フレームを含む頂面を含む回転シールドと、
隆起した周囲フレームに係合してシールドに固定されるサイズ及び形状のシールドマウントと
を備える物理的気相堆積(PVD)チャンバ。 - 複数のカソードアセンブリの各々の下のターゲットと、
上にキャリアを形成するための材料を製造するための回転ペデスタルと
をさらに備える、請求項1に記載のPVDチャンバ。 - 隆起した周囲フレームが、相補的な幾何学的形状を有するポケットを画定し、シールドマウントが、ポケットの幾何学的形状と相補的な幾何学的形状を有する、請求項1に記載のPVDチャンバ。
- ポケットの幾何学的形状が多角形である、請求項3に記載のPVDチャンバ。
- ポケットの幾何学的形状が五角形である、請求項4に記載のPVDチャンバ。
- ポケットの幾何学的形状が、凹んだ側面を有する五角形である、請求項4に記載のPVDチャンバ。
- シールドマウントが、隆起した周囲フレームによって受け取られるエッジ突起部を含む、請求項1に記載のPVDチャンバ。
- シールドマウントが多角形の形状である、請求項7に記載のPVDチャンバ。
- シールドマウントが五角形の形状である、請求項8に記載のPVDチャンバ。
- シールドマウントに固定されたコレットと、コレットに固定されたシールドモータシャフトとをさらに備える、請求項1に記載のPVDチャンバ。
- シールドモータシャフトが、磁性流体フィードスルーとシールドモータとに係合される、請求項10に記載のPVDチャンバ。
- 複数のカソードアセンブリと、
複数のカソードアセンブリの下の回転シールドであって、複数のカソードアセンブリのうちの1つを回転シールドのシールド孔を通して露出させ、且つ隆起した周囲フレームを含む頂面を含む回転シールドと、
隆起した周囲フレームに係合してシールドに固定されるサイズ及び形状のシールドマウントと、
シールドマウントに固定されたコレットと、
コレットに固定され、且つモータに固定されたシールドモータシャフトであって、モータが、シールドモータシャフト及びシールドを回転させる、シールドモータシャフトと
を備える物理的気相堆積(PVD)チャンバ。 - シールドモータシャフトに係合してシールドモータシャフトの回転運動をシールドに伝える磁性流体フィードスルー、及びコレットとシールドモータシャフトとを係合するテーパ付きセンタリングシャフトをさらに備える、請求項12に記載のPVDチャンバ。
- シールドマウントが、シールドの頂面上の周囲フレームに係合してシールドに固定される幾何学的形状を有する、請求項12に記載のPVDチャンバ。
- 請求項1から14のいずれか一項に記載のPVDチャンバ内に基板を配置することと、
モリブデンを含む第1の層及びシリコンを含む第2の層を含む複数の交互材料層を堆積させることであって、基板が極端紫外マスクブランクを含む、堆積させることと
を含む、材料層を堆積させる方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201862687232P | 2018-06-19 | 2018-06-19 | |
US62/687,232 | 2018-06-19 | ||
US16/444,570 | 2019-06-18 | ||
US16/444,570 US11236415B2 (en) | 2018-06-19 | 2019-06-18 | Deposition system with shield mount |
PCT/US2019/037875 WO2019246184A1 (en) | 2018-06-19 | 2019-06-19 | Deposition system with shield mount |
Publications (2)
Publication Number | Publication Date |
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JP2021528561A true JP2021528561A (ja) | 2021-10-21 |
JP7126572B2 JP7126572B2 (ja) | 2022-08-26 |
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JP2020570090A Active JP7126572B2 (ja) | 2018-06-19 | 2019-06-19 | シールドマウントを有する堆積システム |
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US (1) | US11236415B2 (ja) |
JP (1) | JP7126572B2 (ja) |
KR (1) | KR102578666B1 (ja) |
TW (1) | TWI821300B (ja) |
WO (1) | WO2019246184A1 (ja) |
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- 2019-06-19 JP JP2020570090A patent/JP7126572B2/ja active Active
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TW202000958A (zh) | 2020-01-01 |
KR102578666B1 (ko) | 2023-09-13 |
KR20210008572A (ko) | 2021-01-22 |
US20190382879A1 (en) | 2019-12-19 |
US11236415B2 (en) | 2022-02-01 |
JP7126572B2 (ja) | 2022-08-26 |
WO2019246184A1 (en) | 2019-12-26 |
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