JP2021518629A5 - - Google Patents
Info
- Publication number
- JP2021518629A5 JP2021518629A5 JP2020549047A JP2020549047A JP2021518629A5 JP 2021518629 A5 JP2021518629 A5 JP 2021518629A5 JP 2020549047 A JP2020549047 A JP 2020549047A JP 2020549047 A JP2020549047 A JP 2020549047A JP 2021518629 A5 JP2021518629 A5 JP 2021518629A5
- Authority
- JP
- Japan
- Prior art keywords
- level
- signal
- parameter
- generator
- parameter level
- Prior art date
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023081175A JP7571193B2 (ja) | 2018-03-21 | 2023-05-17 | 低角度拡散のマルチレベルパラメータおよび周波数パルス |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US15/928,039 US10224183B1 (en) | 2018-03-21 | 2018-03-21 | Multi-level parameter and frequency pulsing with a low angular spread |
| US15/928,039 | 2018-03-21 | ||
| PCT/US2019/022191 WO2019182847A1 (en) | 2018-03-21 | 2019-03-14 | Multi-level parameter and frequency pulsing with a low angular spread |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023081175A Division JP7571193B2 (ja) | 2018-03-21 | 2023-05-17 | 低角度拡散のマルチレベルパラメータおよび周波数パルス |
Publications (4)
| Publication Number | Publication Date |
|---|---|
| JP2021518629A JP2021518629A (ja) | 2021-08-02 |
| JPWO2019182847A5 JPWO2019182847A5 (https=) | 2022-04-20 |
| JP2021518629A5 true JP2021518629A5 (https=) | 2022-04-20 |
| JP7282795B2 JP7282795B2 (ja) | 2023-05-29 |
Family
ID=65495724
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2020549047A Active JP7282795B2 (ja) | 2018-03-21 | 2019-03-14 | 低角度拡散のマルチレベルパラメータおよび周波数パルス |
| JP2023081175A Active JP7571193B2 (ja) | 2018-03-21 | 2023-05-17 | 低角度拡散のマルチレベルパラメータおよび周波数パルス |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023081175A Active JP7571193B2 (ja) | 2018-03-21 | 2023-05-17 | 低角度拡散のマルチレベルパラメータおよび周波数パルス |
Country Status (4)
| Country | Link |
|---|---|
| US (4) | US10224183B1 (https=) |
| JP (2) | JP7282795B2 (https=) |
| KR (1) | KR20200124318A (https=) |
| WO (1) | WO2019182847A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109148250B (zh) * | 2017-06-15 | 2020-07-17 | 北京北方华创微电子装备有限公司 | 阻抗匹配装置和阻抗匹配方法 |
| US10224183B1 (en) * | 2018-03-21 | 2019-03-05 | Lam Research Corporation | Multi-level parameter and frequency pulsing with a low angular spread |
| US10504744B1 (en) * | 2018-07-19 | 2019-12-10 | Lam Research Corporation | Three or more states for achieving high aspect ratio dielectric etch |
| CN114041201B (zh) * | 2019-04-29 | 2024-12-06 | 朗姆研究公司 | 用于rf等离子体工具中的多级脉冲的系统和方法 |
| CN110779187B (zh) * | 2019-11-04 | 2021-03-30 | 广东美的暖通设备有限公司 | 信号发送装置、信号接收装置、通讯装置及空调器 |
| TWI889813B (zh) * | 2020-05-14 | 2025-07-11 | 日商東京威力科創股份有限公司 | 電漿處理裝置 |
| JP7588516B2 (ja) * | 2020-05-14 | 2024-11-22 | 東京エレクトロン株式会社 | プラズマ処理装置 |
| US12609283B2 (en) | 2020-06-15 | 2026-04-21 | Lam Research Corporation | Control of pulsing frequencies and duty cycles of parameters of RF signals |
| KR20260048616A (ko) * | 2020-07-15 | 2026-04-10 | 램 리써치 코포레이션 | 플라즈마 챔버의 rf 코일들의 역 동기화된 펄싱 |
| JP2024514105A (ja) * | 2021-04-07 | 2024-03-28 | ラム リサーチ コーポレーション | プラズマシース特性を制御するためのシステムおよび方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9123509B2 (en) | 2007-06-29 | 2015-09-01 | Varian Semiconductor Equipment Associates, Inc. | Techniques for plasma processing a substrate |
| JP5319150B2 (ja) * | 2008-03-31 | 2013-10-16 | 東京エレクトロン株式会社 | プラズマ処理装置及びプラズマ処理方法及びコンピュータ読み取り可能な記憶媒体 |
| WO2013112481A1 (en) * | 2012-01-23 | 2013-08-01 | NuLEDs, Inc. | Powering and/or controlling leds using a network infrastructure |
| US9390893B2 (en) * | 2012-02-22 | 2016-07-12 | Lam Research Corporation | Sub-pulsing during a state |
| US9462672B2 (en) | 2012-02-22 | 2016-10-04 | Lam Research Corporation | Adjustment of power and frequency based on three or more states |
| US9197196B2 (en) | 2012-02-22 | 2015-11-24 | Lam Research Corporation | State-based adjustment of power and frequency |
| US9171699B2 (en) | 2012-02-22 | 2015-10-27 | Lam Research Corporation | Impedance-based adjustment of power and frequency |
| TWI599272B (zh) | 2012-09-14 | 2017-09-11 | 蘭姆研究公司 | 根據三個或更多狀態之功率及頻率調整 |
| US9336995B2 (en) | 2013-04-26 | 2016-05-10 | Mks Instruments, Inc. | Multiple radio frequency power supply control of frequency and phase |
| US9711332B2 (en) * | 2013-05-09 | 2017-07-18 | Lam Research Corporation | Systems and methods for tuning an impedance matching network in a step-wise fashion for multiple states of an RF generator |
| JP6324223B2 (ja) * | 2014-06-09 | 2018-05-16 | 住友重機械イオンテクノロジー株式会社 | イオン注入装置及びイオン注入方法 |
| US9536749B2 (en) | 2014-12-15 | 2017-01-03 | Lam Research Corporation | Ion energy control by RF pulse shape |
| US9721758B2 (en) * | 2015-07-13 | 2017-08-01 | Mks Instruments, Inc. | Unified RF power delivery single input, multiple output control for continuous and pulse mode operation |
| US10128082B2 (en) * | 2015-07-24 | 2018-11-13 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and techniques to treat substrates using directional plasma and point of use chemistry |
| US9761414B2 (en) * | 2015-10-08 | 2017-09-12 | Lam Research Corporation | Uniformity control circuit for use within an impedance matching circuit |
| US10879044B2 (en) * | 2017-04-07 | 2020-12-29 | Lam Research Corporation | Auxiliary circuit in RF matching network for frequency tuning assisted dual-level pulsing |
| US10395894B2 (en) * | 2017-08-31 | 2019-08-27 | Lam Research Corporation | Systems and methods for achieving peak ion energy enhancement with a low angular spread |
| US10624178B2 (en) * | 2017-11-30 | 2020-04-14 | Lutron Technology Company Llc | Multiple location load control system |
| US10224183B1 (en) * | 2018-03-21 | 2019-03-05 | Lam Research Corporation | Multi-level parameter and frequency pulsing with a low angular spread |
-
2018
- 2018-03-21 US US15/928,039 patent/US10224183B1/en active Active
-
2019
- 2019-02-13 US US16/275,008 patent/US10573494B2/en active Active
- 2019-03-14 JP JP2020549047A patent/JP7282795B2/ja active Active
- 2019-03-14 KR KR1020207030165A patent/KR20200124318A/ko active Pending
- 2019-03-14 WO PCT/US2019/022191 patent/WO2019182847A1/en not_active Ceased
-
2020
- 2020-02-06 US US16/783,721 patent/US11462390B2/en active Active
-
2022
- 2022-09-09 US US17/942,040 patent/US12068131B2/en active Active
-
2023
- 2023-05-17 JP JP2023081175A patent/JP7571193B2/ja active Active
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