JP2021515261A - センサシステム - Google Patents
センサシステム Download PDFInfo
- Publication number
- JP2021515261A JP2021515261A JP2020539831A JP2020539831A JP2021515261A JP 2021515261 A JP2021515261 A JP 2021515261A JP 2020539831 A JP2020539831 A JP 2020539831A JP 2020539831 A JP2020539831 A JP 2020539831A JP 2021515261 A JP2021515261 A JP 2021515261A
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- optical component
- conductive element
- laser
- conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 176
- 238000012544 monitoring process Methods 0.000 claims abstract description 50
- 230000005855 radiation Effects 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 22
- 238000001459 lithography Methods 0.000 claims description 19
- 239000000446 fuel Substances 0.000 claims description 16
- 230000003993 interaction Effects 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims description 3
- 229910000510 noble metal Inorganic materials 0.000 claims description 2
- 238000010586 diagram Methods 0.000 abstract description 4
- 239000000758 substrate Substances 0.000 description 13
- 230000008859 change Effects 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 7
- 239000000498 cooling water Substances 0.000 description 6
- 238000000059 patterning Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 230000004044 response Effects 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000006378 damage Effects 0.000 description 4
- 230000005670 electromagnetic radiation Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000013590 bulk material Substances 0.000 description 2
- 238000003763 carbonization Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000015654 memory Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 206010073306 Exposure to radiation Diseases 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 206010033799 Paralysis Diseases 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000007648 laser printing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/0014—Monitoring arrangements not otherwise provided for
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/004—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring coordinates of points
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/16—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using resistive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/2232—Carbon dioxide (CO2) or monoxide [CO]
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Lasers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
[0001] 本願は、2018年2月20日出願の欧州出願第18157666.1号の優先権を主張し、その全体が参照により本明細書に組み込まれる。
Claims (20)
- レーザビームの経路内に位置する光学コンポーネントと、
センサシステムと、を備え、
前記センサシステムは、
前記光学コンポーネントに配設された導電性要素であって、前記システムの使用の間、前記レーザビームは前記導電性要素上に入射する、導電性要素と、
監視システムと、を有し、
前記監視システムは、前記導電性要素の電気抵抗を表す物理量を監視するように、及び、前記物理量に基づき前記光学コンポーネントに関した前記レーザビームの位置及び前記光学コンポーネントの温度を含むリストから選択される少なくとも1つを決定するように、動作可能である、
システム。 - 前記物理量に基づく更なるコンポーネントの動作に対して行うべき調整を決定するように動作可能な、位置制御システムを更に備える、請求項1に記載のシステム。
- 前記更なるコンポーネントは、前記レーザビームを発生させるように構成されたレーザシステム、前記レーザビームを所定の部位に送達するように構成されたビームデリバリシステムのうちの、少なくとも1つのコンポーネントである、請求項2に記載のシステム。
- 前記位置制御システムは、前記物理量に基づいて前記光学コンポーネントに関した前記レーザビームの前記位置を調整するために、前記更なるコンポーネントを制御するように動作可能である、請求項2又は3に記載のシステム。
- 前記位置制御システムは、前記光学コンポーネントの空間属性、及び、前記レーザビームの前記経路上に位置する更なる光学コンポーネントの更なる空間属性、のうちの少なくとも1つを調整するように動作可能である、請求項4に記載のシステム。
- 前記物理量に応じて前記光学コンポーネントの温度を制御するように動作可能な熱制御システムを備える、請求項1から5のいずれか一項に記載のシステム。
- 前記導電性要素は、前記レーザビームの波長よりも短い幅を有する導電性材料のラインを備える、請求項1から6のいずれか一項に記載のシステム。
- 前記導電性要素は、少なくとも1つの貴金属を含む材料から形成される、請求項1から7のいずれか一項に記載のシステム。
- 前記導電性要素は、前記光学コンポーネント上又は前記光学コンポーネント内に配設された複数の導電性要素のうちの1つであり、
前記監視システムは、前記複数の導電性要素の各々の電気抵抗を表す物理量を監視するように、及び、前記物理量に基づいて前記光学コンポーネントに関した前記レーザビームの位置を決定するように、動作可能である、請求項1から8のいずれか一項に記載のシステム。 - 前記複数の導電性要素のうちの少なくとも1つは、前記複数の導電性要素のうちの第2の導電性要素から電気的に絶縁される、請求項9に記載のシステム。
- 前記複数の導電性要素のうちの少なくとも1つは、前記レーザビームの入射の経路に沿った第1の深さにおいて提供され、
前記複数の導電性要素のうちの少なくとも別の1つは、前記レーザビームの入射の前記経路に沿った第2の深さにおいて提供される、請求項9又は10に記載のシステム。 - 前記複数の導電性要素は、前記光学コンポーネントにおいて前記レーザビームの入射方向に沿って見た場合、格子パターンを形成する、請求項9から11のいずれか一項に記載のシステム。
- 前記格子パターンは、前記レーザビームの入射の経路に沿って第1の方向に延在し第1の深さに配設された第1の複数の導電性要素、及び、前記レーザビームの入射の経路に沿って第2の方向に延在し第2の深さに配設された第2の複数の導電性要素、を備える、請求項12に記載のシステム。
- 前記光学コンポーネントは、前記レーザビームを発生させるように構成されたレーザ、前記レーザビームを放射源へ送達するように構成されたビームデリバリシステム、放射源、及び/又は、リソグラフィ装置、のうちのいずれか1つの機能コンポーネントである、請求項1から13のいずれか一項に記載のシステム。
- 前記光学コンポーネントは、ミラー、レンズ、及びウィンドウを含むリストから選択される少なくとも1つを備える、請求項1から14のいずれか一項に記載のシステム。
- 前記光学コンポーネントは、複数の光学コンポーネントのうちの1つであり、
前記センサシステムは、前記複数の光学コンポーネントの各々にそれぞれ配設された少なくとも1つの導電性コンポーネントを備え、
前記監視システムは、前記複数の光学コンポーネントの各々に関した前記レーザビームの位置を決定するように構成される、請求項1から15のいずれか一項に記載のシステム。 - レーザと、
前記レーザによって生成されたレーザビームの、燃料ターゲットとの相互作用を介してプラズマを生成するための、レーザ生成プラズマ(LPP)放射源と、
請求項1から16のいずれか一項に記載のシステムと、
を備える、放射システム。 - リソグラフィ装置と、
請求項17に記載の放射システムと、
を備える、リソグラフィシステム。 - 請求項1から16のいずれか一項に記載のシステムにおいて使用するように構成された、光学コンポーネント。
- 光学コンポーネントの動作使用中に、レーザビームに露光される光学コンポーネントに配設された導電性要素の電気抵抗を表す物理量を監視することと、
前記物理量に基づき、前記光学コンポーネントに関した前記レーザビームの位置及び前記光学コンポーネントの温度を含むリストから選択される少なくとも1つを決定することと、
を含む、方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP18157666.1 | 2018-02-20 | ||
EP18157666 | 2018-02-20 | ||
PCT/EP2019/051790 WO2019162038A1 (en) | 2018-02-20 | 2019-01-24 | Sensor system |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2021515261A true JP2021515261A (ja) | 2021-06-17 |
JP7334165B2 JP7334165B2 (ja) | 2023-08-28 |
Family
ID=61256589
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2020539831A Active JP7334165B2 (ja) | 2018-02-20 | 2019-01-24 | センサシステム |
Country Status (7)
Country | Link |
---|---|
US (1) | US11258224B2 (ja) |
JP (1) | JP7334165B2 (ja) |
KR (1) | KR102628236B1 (ja) |
CN (1) | CN111742454A (ja) |
NL (1) | NL2022443A (ja) |
TW (1) | TWI805685B (ja) |
WO (1) | WO2019162038A1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20230261260A1 (en) | 2020-09-18 | 2023-08-17 | Lg Energy Solution, Ltd. | Composition for gel polymer electrolyte and lithium secondary battery including gel polymer electrolyte formed therefrom |
EP4080286A1 (en) * | 2021-04-21 | 2022-10-26 | ASML Netherlands B.V. | Mirror for performing metrology in a laser beam system, laser beam system, euv radiation source and lithographic apparatus |
KR20230165243A (ko) * | 2021-04-08 | 2023-12-05 | 에이에스엠엘 네델란즈 비.브이. | 레이저 빔 시스템에서 계측을 수행하기 위한 미러, 레이저 빔 시스템, euv 방사선 소스 및 리소그래피 장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3939706A (en) * | 1974-04-10 | 1976-02-24 | The Boeing Company | High energy sensor |
JP2015190934A (ja) * | 2014-03-28 | 2015-11-02 | ファナック株式会社 | レーザ光の強度分布を計測するビームプロファイラ、レーザ発振器、およびレーザ加工装置 |
JP2016509343A (ja) * | 2013-01-22 | 2016-03-24 | エーエスエムエル ネザーランズ ビー.ブイ. | 極端紫外線光源用熱監視装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4692623A (en) | 1986-02-13 | 1987-09-08 | The United States Of America As Represented By The Secretary Of The Army | Precision laser beam positioner and spatially resolved laser beam sampling meter |
DE3840278A1 (de) | 1988-11-30 | 1990-05-31 | Diehl Gmbh & Co | Einrichtung zur erfassung eines laserstrahls |
US8766212B2 (en) | 2006-07-19 | 2014-07-01 | Asml Netherlands B.V. | Correction of spatial instability of an EUV source by laser beam steering |
US9110249B2 (en) * | 2007-10-02 | 2015-08-18 | Telescent Inc. | In-line fiber optic monitors responsive to optical intensity |
EP2365390A3 (en) * | 2010-03-12 | 2017-10-04 | ASML Netherlands B.V. | Lithographic apparatus and method |
US9289850B2 (en) * | 2011-04-08 | 2016-03-22 | Mitsubishi Electric Corporation | Laser machining device |
WO2016087177A1 (en) * | 2014-12-01 | 2016-06-09 | Asml Netherlands B.V. | Projection system |
-
2019
- 2019-01-24 US US16/969,071 patent/US11258224B2/en active Active
- 2019-01-24 WO PCT/EP2019/051790 patent/WO2019162038A1/en active Application Filing
- 2019-01-24 CN CN201980014272.8A patent/CN111742454A/zh active Pending
- 2019-01-24 NL NL2022443A patent/NL2022443A/en unknown
- 2019-01-24 JP JP2020539831A patent/JP7334165B2/ja active Active
- 2019-01-24 KR KR1020207025345A patent/KR102628236B1/ko active IP Right Grant
- 2019-01-31 TW TW108103734A patent/TWI805685B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3939706A (en) * | 1974-04-10 | 1976-02-24 | The Boeing Company | High energy sensor |
JP2016509343A (ja) * | 2013-01-22 | 2016-03-24 | エーエスエムエル ネザーランズ ビー.ブイ. | 極端紫外線光源用熱監視装置 |
JP2015190934A (ja) * | 2014-03-28 | 2015-11-02 | ファナック株式会社 | レーザ光の強度分布を計測するビームプロファイラ、レーザ発振器、およびレーザ加工装置 |
Also Published As
Publication number | Publication date |
---|---|
TW201942681A (zh) | 2019-11-01 |
US20210066877A1 (en) | 2021-03-04 |
TWI805685B (zh) | 2023-06-21 |
KR102628236B1 (ko) | 2024-01-23 |
US11258224B2 (en) | 2022-02-22 |
JP7334165B2 (ja) | 2023-08-28 |
WO2019162038A1 (en) | 2019-08-29 |
CN111742454A (zh) | 2020-10-02 |
NL2022443A (en) | 2019-08-27 |
KR20200120923A (ko) | 2020-10-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9497840B2 (en) | System and method for creating and utilizing dual laser curtains from a single laser in an LPP EUV light source | |
JP2021515261A (ja) | センサシステム | |
US9241395B2 (en) | System and method for controlling droplet timing in an LPP EUV light source | |
US9167679B2 (en) | Beam position control for an extreme ultraviolet light source | |
US8809823B1 (en) | System and method for controlling droplet timing and steering in an LPP EUV light source | |
JP2008119716A (ja) | レーザ加工装置およびレーザ加工装置における焦点維持方法 | |
JP2013536581A (ja) | 周波数変換レーザシステムの動的波面制御 | |
US10588211B2 (en) | Radiation source having debris control | |
JP6871740B2 (ja) | 露光プロセスにおける露光誤差を補償するための方法 | |
US11226564B2 (en) | EUV light source and apparatus for lithography | |
JP2021500602A (ja) | プラズマをモニタするためのシステム | |
JP2016525232A (ja) | 光学アセンブリ | |
US10845706B2 (en) | Mirror array | |
JP2008119714A (ja) | レーザ加工装置 | |
JP2007184576A (ja) | リソグラフィ装置およびデバイス製造方法 | |
TW201403255A (zh) | 微影裝置 | |
CN112041752A (zh) | 用于测试诸如收集器反射镜的反射镜的系统及测试诸如收集器反射镜的反射镜的方法 | |
EP4063955A1 (en) | Lithographic apparatus and method for illumination uniformity correction | |
KR20240016985A (ko) | 광학 조립체의 캐비티 길이를 능동적으로 제어하기 위한 시스템 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200918 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20220117 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20221228 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230116 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230413 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230718 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230816 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7334165 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |