JP2021501236A - 大気圧プラズマで高分子材料の表面を処理する方法 - Google Patents
大気圧プラズマで高分子材料の表面を処理する方法 Download PDFInfo
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Abstract
Description
可撓性高分子基材を処理する方法において、
約90W超の出力を使用して不活性ガスから大気圧プラズマビームを発生させる工程、
前記プラズマビームをプラズマ放出口から前記可撓性高分子基材の表面に向ける工程、および
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査して、処理済み基材表面を形成する工程、
を有してなる方法。
前記大気圧プラズマビームを発生させる工程が、約120Wと約220Wの間の出力を使用する工程を含む、実施形態1に記載の方法。
前記大気圧プラズマビームを発生させる工程が、約140Wと約200Wの間の出力を使用する工程を含む、実施形態1または2に記載の方法。
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、該高分子基材の表面の全表面積未満に亘り前記プラズマビームを動かす工程を含む、実施形態1から3のいずれか1つに記載の方法。
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、該高分子基材の表面の第1の部分に亘り前記プラズマビームを動かし、次いで、該高分子基材の表面の第2の部分に亘り該プラズマビームを動かす工程を含む、実施形態1から4のいずれか1つに記載の方法。
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記高分子基材に関して該プラズマビームを動かす工程を含む、実施形態1から5のいずれか1つに記載の方法。
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記プラズマビームに関して該高分子基材を動かす工程を含む、実施形態1から5のいずれか1つに記載の方法。
前記不活性ガスが、ヘリウム、ネオン、アルゴン、クリプトン、キセノン、およびラドンの少なくとも1つを含む、実施形態1から7のいずれか1つに記載の方法。
前記プラズマビームを前記可撓性高分子基材の表面に向ける工程が、該可撓性高分子基材の表面を約0.5秒超に亘り前記プラズマビームに暴露する工程を含む、実施形態1から8のいずれか1つに記載の方法。
前記プラズマビームを前記可撓性高分子基材の表面に向ける工程が、該可撓性高分子基材の表面を約0.5秒と約5.0秒の間に亘り前記プラズマビームに暴露する工程を含む、実施形態1から9のいずれか1つに記載の方法。
前記プラズマビームを前記可撓性高分子基材の表面に向ける工程が、該可撓性高分子基材の表面を約1.0秒と約3.0秒の間に亘り前記プラズマビームに暴露する工程を含む、実施形態1から10のいずれか1つに記載の方法。
前記プラズマビームを前記可撓性高分子基材の表面に向ける工程が、該可撓性高分子基材の表面を約3.0秒と約1.0分秒の間に亘り前記プラズマビームに暴露する工程を含む、実施形態1から11のいずれか1つに記載の方法。
前記プラズマビームを前記可撓性高分子基材の表面に向ける工程が、該可撓性高分子基材の表面を約5.0秒と約30秒の間に亘り前記プラズマビームに暴露する工程を含む、実施形態1から12のいずれか1つに記載の方法。
前記可撓性高分子基材が基材支持体上に位置付けられている、実施形態1から13のいずれか1つに記載の方法。
前記基材支持体が中心軸の周りに回転可能であり、前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、該可撓性高分子基材の表面が前記プラズマ放出口に対して動くように、前記基材支持体を前記中心軸の周りに回転させる工程を含む、実施形態14に記載の方法。
前記可撓性高分子基材がスプール上に位置付けられている、実施形態1から13のいずれか1つに記載の方法。
前記スプールが中心軸の周りに回転可能であり、前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記可撓性高分子基材の表面が前記プラズマ放出口に対して動くように、前記スプールを回転させ、該高分子基材を該スプールから基材支持体の周りに巻く工程を含む、実施形態16に記載の方法。
前記大気圧プラズマビームを発生させる工程が、前記不活性ガスを不活性ガス源からプラズマ発生器の電極に流す工程を含む、実施形態1から17のいずれか1つに記載の方法。
前記処理済み基材表面が、未処理の高分子基材の表面の抽出可能および浸出可能全含有量の約70%未満の抽出可能および浸出可能全含有量を有する、実施形態1から18のいずれか1つに記載の方法。
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記高分子基材の表面の同じ部分の上を約10回を超える走査を含む、実施形態1から19のいずれか1つに記載の方法。
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記高分子基材の表面の同じ部分の上を約40回を超える走査を含む、実施形態1から20のいずれか1つに記載の方法。
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記高分子基材の表面の同じ部分の上を約60回を超える走査を含む、実施形態1から21のいずれか1つに記載の方法。
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記高分子基材の表面の同じ部分の上を約80回を超える走査を含む、実施形態1から22のいずれか1つに記載の方法。
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記高分子基材の表面の同じ部分の上を約20回と約90回の間の走査を含む、実施形態1から23のいずれか1つに記載の方法。
実施形態1から24のいずれか1つに記載の方法により処理された可撓性高分子基材。
実施形態25に記載の可撓性高分子基材から作られたバイオプロセスバッグ。
102、104 シート
202 底部
204 上部
280 側壁
200、300 装置
202 基材支持体
206 プラズマ放出口
210 不活性ガス源
222 プラズマ発生器
228 接地電極
232 誘電体層
234 基材
236 制御装置
238 中央処理装置(CPU)
240 メモリ
242 支援回路
302 第1のスプール
304 第2のスプール
322 可撓性高分子基材
324 処理済みの可撓性高分子基材
600 背景測定値
610 ガラス試料
620、630、640 Metalloceneフイルム
650、660、670、680 10Lのプラスチックバッグ
690 ビス(2,4−ジ−tert−ブチルフェニル)ホスフェート(bDtBPP)標準
Claims (10)
- 可撓性高分子基材を処理する方法において、
約90W超の出力を使用して不活性ガスから大気圧プラズマビームを発生させる工程、
前記プラズマビームをプラズマ放出口から前記可撓性高分子基材の表面に向ける工程、および
前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査して、処理済み基材表面を形成する工程、
を有してなる方法。 - 前記大気圧プラズマビームを発生させる工程が、約120Wと約220Wの間、または約140Wと約200Wの間の出力を使用する工程を含む、請求項1記載の方法。
- 前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記高分子基材に関して該プラズマビームを動かす工程、または前記プラズマビームに関して該高分子基材を動かす工程を含む、請求項1または2記載の方法。
- 前記プラズマビームを前記可撓性高分子基材の表面に向ける工程が、該可撓性高分子基材の表面を約0.5秒超に亘り前記プラズマビームに暴露する工程を含む、請求項1から3いずれか1項記載の方法。
- 前記プラズマビームを前記可撓性高分子基材の表面に向ける工程が、該可撓性高分子基材の表面を約0.5秒と約5.0秒の間、約1.0秒と約3.0秒の間、約3.0秒と約1.0分秒の間、または約5.0秒と約30秒の間に亘り前記プラズマビームに暴露する工程を含む、請求項1から4いずれか1項記載の方法。
- 前記可撓性高分子基材が、中心軸の周りに回転可能である基材支持体上に位置付けられており、前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、該可撓性高分子基材の表面が前記プラズマ放出口に対して動くように、前記基材支持体を前記中心軸の周りに回転させる工程を含む、請求項1から5いずれか1項記載の方法。
- 前記可撓性高分子基材が、中心軸の周りに回転可能であるスプール上に位置付けられており、前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記可撓性高分子基材の表面が前記プラズマ放出口に対して動くように、前記スプールを回転させ、該高分子基材を該スプールから基材支持体の周りに巻く工程を含む、請求項1から5いずれか1項記載の方法。
- 前記処理済み基材表面が、未処理の高分子基材の表面の抽出可能および浸出可能全含有量の約70%未満の抽出可能および浸出可能全含有量を有する、請求項1から7いずれか1項記載の方法。
- 前記高分子基材の表面の少なくとも一部の上に前記プラズマビームを走査する工程が、前記高分子基材の表面の同じ部分の上を約10回を超える走査、前記高分子基材の表面の同じ部分の上を約40回を超える走査、前記高分子基材の表面の同じ部分の上を約60回を超える走査、前記高分子基材の表面の同じ部分の上を約80回、または前記高分子基材の表面の同じ部分の上を約20回と約90回の間の走査を含む、請求項1から8いずれか1項記載の方法。
- 請求項1から9いずれか1項記載の方法により処理された可撓性高分子基材から作られたバイオプロセスバッグ。
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