JP2021088892A - Local cleaning device and flush toilet - Google Patents

Abstract

To provide a local cleaning device and a flush toilet capable of keeping a shutter clean.SOLUTION: The local cleaning device includes: a local cleaning nozzle 7 that is stored in a casing in the retracted state and discharges local wash water from the tip in the state of advanced forward through nozzle opening 3 formed on the casing; a shutter 12 that opens and closes the nozzle opening 3, and when the nozzle opening 3 is opened, at least a part of which is pulled inside the casing; and a cleaning mechanism 24 that is arranged inside the casing to execute cleaning of at least the part of shutter 12 pulled inside the casing.SELECTED DRAWING: Figure 12

Description

The present disclosure relates to a local cleaning device and a flush toilet equipped with the local cleaning device.

Conventionally, some flush toilets are provided with a local cleaning device for locally cleaning after stool. The local cleaning device includes a local cleaning nozzle that moves in and out between the inside of the toilet bowl body, the casing (cover case), and the nozzle cover through the nozzle opening in response to remote control operation (see, for example, Patent Document 1). .. Then, for example, when the local cleaning nozzle advances, the shutter that opens and closes the nozzle opening is pressed and tilted to open, and the cleaning water is discharged from the tip of the local cleaning nozzle that advances inside the toilet body to clean the local area. Can be done.

Japanese Unexamined Patent Publication No. 2016-37763

However, in the above-mentioned conventional flush toilet, when the shutter becomes dirty, it requires labor and labor to clean the shutter by wiping and cleaning.

One aspect of the local cleaning device of the present disclosure is a local cleaning nozzle that is housed in a casing in a retracted state and discharges local cleaning water from a tip portion in a state of advancing forward through a nozzle opening provided in the casing. When the nozzle opening is opened and closed and the nozzle opening is opened, at least a part of itself is drawn into the casing, and the shutter provided inside the casing and drawn into the casing. The configuration is provided with a cleaning mechanism for performing cleaning on at least a part of the shutter.

One aspect of the flush toilet of the present disclosure is configured to include the local cleaning device of the above-mentioned aspect.

In the present disclosure, "cleaning" means, for example, "an operation of cleaning a local cleaning device" in normal use.

It is a perspective view which shows the flush toilet of one embodiment. It is a side view which shows the local washing apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which the shutter closed the nozzle opening. It is a side view which shows the local washing apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which the shutter opened the nozzle opening. It is a perspective view from the upper side which shows the local cleaning apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which opened the nozzle opening, and is cleaning the shutter housed in the shutter accommodating part. It is a perspective view from the upper side which shows the local cleaning apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which is cleaning the back surface of the shutter which closed the nozzle opening. It is a perspective view from the front side which shows the local washing apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which closed the nozzle opening by a shutter. It is a perspective view from the front side which shows the local cleaning apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which opened the shutter and gradually opened the nozzle opening, and the state which is cleaning the shutter at the time of this opening. Is. It is a perspective view from the front side which shows the local cleaning apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which opened the shutter and gradually opened the nozzle opening, and the state which is cleaning the shutter at the time of this opening. Is. It is a perspective view from the front side which shows the local washing apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which opened the shutter and stored in the shutter accommodating part. It is a figure which shows the movement locus of the guide part of the local washing apparatus of the flush toilet of one Embodiment, and the shutter guided by the guide part. It is a figure which shows the guide part of the local washing apparatus of the flush toilet of one Embodiment, and the arc-shaped movement locus of the shutter guided by the guide part. It is a perspective view from the upper side which shows the local cleaning apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which opened the nozzle opening, and is cleaning the shutter housed in the shutter accommodating part. It is a side view which shows the local cleaning apparatus of the flush toilet of one Embodiment, and is the figure which shows the state which opened the nozzle opening, and is cleaning the shutter housed in the shutter accommodating part. It is a perspective view from the front side which shows the modification example of the local washing apparatus of the flush toilet of one Embodiment. It is a perspective view from the upper side which shows the modification example of the local washing apparatus of the flush toilet of one Embodiment. It is a perspective view from the front side which shows the modification example of the local washing apparatus of the flush toilet of one Embodiment. It is a perspective view from the upper side which shows the modification example of the local washing apparatus of the flush toilet of one Embodiment. It is a side view which shows the modification example of the local washing apparatus of the flush toilet of one Embodiment.

Hereinafter, with reference to FIGS. 1 to 17, a local cleaning device according to an embodiment of the present disclosure and a flush toilet equipped with the local cleaning device will be described. Here, in the present embodiment, the front-back direction when viewed from the user seated on the toilet bowl will be described as the front-back direction, the left-right direction as the width direction, and the top-bottom direction as the up-down direction.

As shown in FIG. 1, the flush toilet 1 of the present embodiment is provided on the rear side of the toilet body 4 and the toilet body 4 in the front-rear direction T1. It is configured to include a cleaning function unit 10 for discharging cleaning water, a toilet seat 11a, a toilet lid 11b, and a local cleaning device 2 for cleaning a local area after stool.

The toilet bowl body 4 is formed by including a bowl portion 4a of the toilet bowl and a rim portion 4b provided on the upper portion of the bowl portion 4a and forming an outer peripheral edge while projecting inside the toilet bowl body 4.

The cleaning function unit 10 is provided on the rear side of the toilet bowl main body 4 and is housed in the casing (cover case) 5. The cleaning function unit 10 includes, for example, an on-off valve such as a control valve for controlling the opening and closing of the cleaning water flow path by remote control operation and an electromagnetic valve. It is configured so that the jet water discharge of the wash water flowing through the bowl portion 4a and the water sealing portion 4c of 4 can be switched and the water discharge flow rate can be controlled.

The toilet seat 11a and the toilet lid 11b are detachably connected to the casing 5 and are rotatably provided around the rotation shaft O1 extending in the width direction T2 (vertical direction).

As shown in FIGS. 1, 2, and 3, the local cleaning device 2 is provided so as to be housed inside the casing 5 together with the cleaning function unit 10, and the local cleaning device 2 advances (appears) into the toilet bowl main body 4 by, for example, operating a remote control. A cleaning nozzle 7 and a shutter 12 for opening and closing the nozzle opening 3 provided in the casing 5 to prevent dirt, splashes of cleaning water, etc. from getting into the local cleaning nozzle 7 or entering the inside are provided. ing.

More specifically, the local cleaning device 2 of the present embodiment has a nozzle unit 13 arranged in the center of the left and right on the front side of the base 5a of the casing 5, and a hot water supply for supplying hot water for cleaning the local area to the nozzle unit 13. It is provided with a unit, a warm air drying unit (warm air drying mechanism) for drying a local part after cleaning with warm air, and a deodorizing unit (deodorizing mechanism).

The nozzle unit 13 includes a pair of local cleaning nozzles 7 of an anal cleaning nozzle and a bidet nozzle, and a nozzle cover 6 including a pair of local cleaning nozzles 7. The pair of local cleaning nozzles 7 of the present embodiment are gradually inclined downward toward the front, and are arranged in parallel with each other in the same direction with the axis O2. Each local cleaning nozzle 7 is provided with a discharge hole 16 at the tip portion located below to discharge cleaning water for local cleaning, and the cleaning water for local cleaning supplied from the rear end side and circulated inside is discharged. It is configured to discharge from the water in a predetermined direction.

Each of the pair of local cleaning nozzles 7 is formed in a substantially cylindrical rod shape, and can freely advance and retreat in the axis O2 direction (direction gradually inclining downward as it goes forward) with respect to the nozzle opening 3 formed in the center of the front surface of the base 5a. It is provided in. Each of these pair of local cleaning nozzles 7 advances forward from the nozzle opening 3 during cleaning and protrudes inside the toilet bowl body 4, and after cleaning, is retracted and held in the nozzle cover 6 and the casing 5 through the nozzle opening 3. Nozzle.

For example, the pair of local cleaning nozzles 7 individually advance and retreat in the axis O2 direction by the nozzle advancing / retreating mechanism. The nozzle advancing / retreating mechanism of the present embodiment includes a rack, a pinion, and a motor, and is configured by integrally providing a rack on the lower surface of each local cleaning nozzle 7 and engaging the rack with a pinion attached to the rotating shaft of the motor. There is.

As a result, when the motor and the pinion rotate in one direction in response to a remote control operation or the like, the local cleaning nozzle 7 advances forward in the axis O2 direction and protrudes inside the toilet bowl body 4 through the nozzle opening 3. When the motor and pinion rotate in the other direction in response to remote control operation or the like, the local cleaning nozzle 7 is rearward in the axis O2 direction, retracts and moves inside the casing 5, and the local cleaning nozzle 7 moves through the nozzle opening 3 to the nozzle cover 6. And housed in the casing 5.

The local cleaning device 2 includes a shutter unit 20, and the shutter unit 20 has a pair of local cleaning nozzles 7 retracted into the casing 5 and the nozzle opening 3 is closed (see FIG. 2) to obtain filth and cleaning water. A shutter 12 is provided to prevent the local cleaning nozzle 7 from getting caught in the local cleaning nozzle 7 or entering the inside, and to open the nozzle opening 3 when the local cleaning nozzle 7 advances (see FIG. 3).

As shown in FIGS. 2 to 9, the shutter unit 20 of the present embodiment is provided in the casing 5, and is substantially along the axis O2 direction of the local cleaning nozzle 7 by, for example, a shutter advancing / retreating mechanism including a rack, a pinion, and a motor. The advancing / retreating member 21 that advances / retreats in the front-rear direction T1, the shutter 12 that is rotatably connected to the tip end side of the advancing / retreating member 21 by the hinge 22, and the shutter 12 that is provided inside the casing 5 and retracts together with the advancing / retreating member 21 are stored. The shutter accommodating portion 23 is provided with a cleaning mechanism 24 integrally provided with the shutter accommodating portion 23.

The advancing / retreating member 21 of the present embodiment is composed of a first advancing / retreating member 21a and a second advancing / retreating member 21b, and the tip of the first advancing / retreating member 21a that advances / retreats along the axis O2 direction of the local cleaning nozzle 7 by driving the shutter advancing / retreating mechanism. The rear end portion of the second advancing / retreating member 21b is rotatably connected to the portion by a pin. The advancing / retreating member 21 is arranged by rotatably connecting the tip end portion of the second advancing / retreating member 21b to the center of the rear end portion of the shutter 12 in the width direction T2 by a hinge 22.

The shutter advancing / retreating mechanism includes, for example, a rack, a pinion, and a motor, and the rack is integrally provided on the first advancing / retreating member 21a, and the rack is meshed with a pinion attached to the rotating shaft of the motor. The shutter unit 20 of the present embodiment is configured so that the shutter 12 can be opened by moving the nozzle 7 forward and pressing the shutter 12 even when the shutter advancing / retreating mechanism fails. preferable.

As a result, when the motor and pinion rotate in one direction in response to remote control operation or the like, the first advancing / retreating member 21a moves forward in the axis O2 direction as shown in the order of FIGS. 9, 8, 7, and 6. Then, the second advancing / retreating member 21b pin-connected to the first advancing / retreating member 21a moves forward, the shutter 12 is pushed outward from the shutter housing portion 23, and the shutter 12 rotates around the rotation axis O3 extending in the width direction T2 to form a nozzle. The opening 3 is closed.

When the motor and the pinion rotate in the other direction in response to a remote control operation or the like, the first advancing / retreating member 21a retracts and moves backward in the axis O2 direction as shown in the order of FIGS. 6, 7, 8, and 9. The second advancing / retreating member 21b pin-connected to the first advancing / retreating member 21a retracts and moves, and the shutter 12 is retracted and stored inside the shutter accommodating portion 23 while rotating around the rotation shaft O3 extending in the width direction T2.

In the present embodiment, as shown in FIGS. 5 and 9, the surface 12a of the shutter 12 is moved upward along the axis O2 direction of the local cleaning nozzle 7 in a state of being pulled in and housed in the shutter accommodating portion 23. , The back surface is arranged downward.

Here, as shown in FIG. 10, the shutter advancing / retreating mechanism preferably includes a guide portion 25 that guides the opening / closing movement of the shutter 12 (or the advancing / retreating movement of the second advancing / retreating member 21b).

As shown in FIG. 11, the guide portion 25 for guiding the opening / closing movement of the shutter 12 (and the advancing / retreating movement of the second advancing / retreating member 21b) is formed in an arc shape (combination of arcs (and straight lines)), and the shutter 12 (second). The movement locus of the advancing / retreating member 21b) may be arcuate (combination of arcs (and straight lines)). The guide portion 25 of the present embodiment is configured to guide the movement of the rotation shaft (rotation shaft O3) of the shutter 12. In other words, in the present embodiment, the guide portion 25 is configured to guide the movement of the shutter 12 rather than the rotation.

The shutter advancing / retreating mechanism advances the advancing / retreating member 21 to push the shutter 12 outward from the shutter accommodating portion 23, presses the surface 12a of the shutter 12, and closes the nozzle opening 3 (closed posture). It is equipped with a shutter closing holding mechanism for holding. The shutter closing holding mechanism may be configured to hold the shutter 12 in the closed state by a spring, for example, and the configuration is not particularly limited. It is not always necessary to hold the shutter 12 firmly and firmly in the closed state.

On the other hand, as shown in FIGS. 12 and 13 (FIGS. 4 to 9), the cleaning mechanism 24 of the present embodiment is integrally provided on the upper portion of the shutter accommodating portion 23 to form the shutter accommodating portion 23. A plurality of discharge ports 26 that open on the inner surface of the surface, a cleaning water flow path 27 that communicates with the plurality of discharge ports 26 and supplies cleaning water W1 for shutter cleaning, and a cleaning water flow path 27 that is connected to a hose or the like for cleaning. It is configured to include a washing water supply means for supplying water W1.

In the present embodiment, a plurality of discharge ports 26 are arranged so as to be aligned from one side end to the other side end of the shutter accommodating portion 23 at a predetermined interval in the width direction T2.

In the cleaning mechanism 24 configured as described above, for example, when the shutter 12 is stored in the shutter storage space of the shutter storage unit 23, the cleaning water supply means is automatically driven, and a plurality of discharge ports are passed through the cleaning water flow path 27. Cleaning water W1 for shutter cleaning is discharged from 26.

Then, as shown in FIGS. 4, 12, and 13, the discharged cleaning water W1 flows substantially the entire surface of the surface 12a facing upward of the shutter 12 from the rear end side of the shutter 12 toward the tip end, and further. By flowing from the rear end side of the shutter 12 toward the tip even on substantially the entire surface of the back surface 12b facing downward of the shutter 12, droplets (dirt and washing water droplets) adhering to the shutter 12 can be removed. Therefore, the shutter 12 can be cleaned.

At this time, in the state where the shutter 12 is housed, the surface 12a is inclined downward toward the front, so that the cleaning water W1 can easily flow on the surface 12a. Since a gap of a predetermined interval is formed between the back surface 12b of the shutter 12 and the lower surface of the shutter accommodating portion 23, the cleaning water W1 can be brought into contact with the back surface 12b and flowed.
Thereby, substantially the entire surface of the front surface and the back surface of the shutter can be cleaned by the cleaning water W1 discharged from the cleaning mechanism 24.

The cleaning water W1 may be discharged at an arbitrary timing by operating the cleaning operation button of the user to clean the shutter 12. The cleaning water W1 for shutter cleaning is not particularly limited as long as it is a liquid capable of cleaning the shutter 12, and contains not only water but also, for example, hypochlorous acid water, ozone water, and a surfactant. It may be water, liquid or the like containing a sterilizing (sterilizing) agent or detergent such as water. Further, these combinations may be used.

On the other hand, as shown in FIGS. 4 and 5, the cleaning mechanism 24 discharges cleaning water W1 onto the surface 12a of the shutter 12 to clean the surface 12a while the cleaning mechanism 24 is housed in the shutter storage unit 23. The cleaning water W1 may be discharged to the back surface 12b of the shutter 12 in a state where the shutter 12 is pulled out from the shutter 12 to clean the back surface 12b.

As shown in FIGS. 6 to 9, the cleaning mechanism 24 is in an open posture by pulling the shutter 12 into the shutter housing 23 by driving the shutter advancing / retreating mechanism from the closed posture in which the shutter 12 is pushed out from the shutter housing 23. While moving to, or while moving from the open posture to the closed posture, the cleaning water W1 is discharged to the front surface 12a of the shutter 12 according to the operation and posture of the shutter 12, and the front surface 12a and the back surface 12b of the shutter 12 are sequentially moved to. It may be configured to be clean.

In FIGS. 4 and 5, the cleaning mechanism 24 is arranged at the rear end of the shutter 12 with the shutter 12 housed, and in FIGS. 6 to 9, the cleaning mechanism 24 is arranged on the front side of the shutter 12. ..

The cleaning mechanism 24 receives the detection result of the user detecting means that detects the user (person) who has entered the toilet room, and cleans the shutter 12 in the closed posture at the stage before using the flush toilet 1, and the shutter 12 May be configured to be pre-wet with cleaning water W1. In other words, the person detected by the user detecting means may be configured to perform a pre-cleaning operation for pre-cleaning the shutter before using the flush toilet 1. It is preferable to wet both the front and back surfaces 12a and 12b, but only the front surface 12a to which dirt easily adheres may be wetted, or only the back surface 12b may be wetted. At the same time, the nozzle 7 may be pre-cleaned and the pot surface of the toilet bowl may be pre-cleaned.

The cleaning mechanism 24 discharges the cleaning water W1 from the common discharge port 26 in a state where the shutter 12 is stored in the shutter storage unit 23 and / or when the shutter 12 is pushed out from the shutter storage unit 23, and only the shutter 12 is used. Instead, it may be configured to clean the inner surface of the shutter accommodating portion 23. However, the discharge ports 26 may not be common, and each discharge port may be provided. In this configuration, the cleaning water W1 can be cleaned by flowing the cleaning water W1 to the back surface 12b of the shutter 12 along the bottom surface of the shutter accommodating portion 23 in a state where the shutter 12 is pushed out.

Then, in the local cleaning device 2 of the present embodiment and the flush toilet 1 provided with the local cleaning device 2, first, a nozzle advancing / retreating mechanism for advancing / retreating the local cleaning nozzle 7 and a shutter advancing / retreating mechanism for opening / closing the shutter 12 are provided. The shutter 12 can be freely opened and closed so that the local cleaning nozzle 7 does not come into contact with the shutter 12.

As a result, it is possible to eliminate the inconvenience that dirt or the like adheres to the shutter 12 and the local cleaning nozzle 7 due to the contact of the local cleaning nozzle 7. The shutter 12 of the present embodiment is configured to open and close in a non-contact manner with the local cleaning nozzle 7 in conjunction with the advancement and retreat of the local cleaning nozzle 7.

The local cleaning device 2 and the flush toilet 1 of the present embodiment include a cleaning mechanism 24, discharge cleaning water W1 for shutter cleaning toward the shutter 12, and remove droplets and the like adhering to the shutter 12. , The shutter 12 can be sterilized (sterilized) or the like.

As a result, the nozzle opening 3 of the local cleaning nozzle 7 can be opened and closed, and the shutter 12 (or the local cleaning nozzle 7) to which droplets and the like easily adhere can be kept in a clean state.

The cleaning mechanism 24 discharges cleaning water W1 onto the surface 12a of the shutter 12 stored in the shutter storage 23 to clean the surface 12a, and with the shutter 12 pulled out from the shutter storage 23, the cleaning mechanism 24 is placed on the back surface 12b of the shutter 12. By discharging the cleaning water W1 to clean the back surface 12b, the entire shutter (both sides) can be suitably cleaned with a simple configuration, and the shutter 12 can be kept in a clean state. By using the common discharge port 26, the entire shutter (both sides) can be suitably cleaned, so that the size of the cleaning mechanism 24 can be reduced.

While the cleaning mechanism 24 moves from the closed posture to the open posture, or from the open posture to the closed posture, the cleaning mechanism 24 is placed on the front surface 12a and the back surface 12b of the shutter 12 depending on the operation and posture of the shutter 12. By sequentially discharging the cleaning water W1 and cleaning the front surface 12a and the back surface 12b of the shutter 12 in order, the shutter 12 can be cleaned in conjunction with the opening / closing movement of the shutter 12.

As a result, the local cleaning nozzle 7 can be used to quickly clean and remove droplets and the like adhering to the shutter 12, and the shutter 12 can be sterilized quickly. No additional cleaning time is required. Further, since the cleaning water W1 can be discharged from a short distance to substantially the entire surface of the shutter 12, an excellent cleaning effect can be obtained. Therefore, the shutter 12 can be cleaned effectively and efficiently.

The cleaning mechanism 24 receives the detection result of detecting the user (person) who has entered the toilet room, and cleans the shutter 12 in the closed posture before using the flush toilet 1 to pre-wet the shutter 12. With such a configuration, it is possible to prevent droplets and the like from adhering to the shutter 12. By cleaning the shutter 12 after use, it is possible to easily remove droplets and the like. This makes it possible to keep the shutter 12 in a clean state more effectively.

The cleaning mechanism 24 discharges the cleaning water W1 from the discharge port 26 in a state where the shutter 12 is stored in the shutter storage unit 23 and / or when the shutter 12 is pushed out from the shutter storage unit 23, and not only the shutter 12 but also the shutter 12 It is configured to clean the inner surface of the shutter accommodating portion 23.

As a result, the shutter 12 can be cleaned and cleaned, and the shutter accommodating portion 23 provided in the casing 5 can also be cleaned. Therefore, it is possible to prevent the droplets removed from the shutter 12 from remaining in the shutter accommodating portion 23, and it is possible to keep the shutter accommodating portion 23 in a clean state together with the shutter 12.

In the local cleaning device 2 and the flush toilet 1 of the present embodiment, the shutter advancing / retreating mechanism includes a guide unit 25 that guides the opening / closing movement and advancing / retreating movement of the shutter 12 and the second advancing / retreating member 21b, whereby the shutter 12 and the second advancing / retreating mechanism are provided. The movement locus of the member 21b can be stabilized, and the shutter 12 and the second advancing / retreating member 21b can be suitably opened / closed and advanced / retreated.

The guide portion 25 that guides the opening / closing movement and the advancing / retreating movement of the shutter 12 and the second advancing / retreating member 21b is formed in an arc shape (combination of arcs), and the movement locus of the shutter 12 and the second advancing / retreating member 21b is formed in an arc shape (combination of arcs). ), The moving area of the shutter 12 and the second advancing / retreating member 21b, that is, the occupied area required for opening / closing the shutter 12 can be reduced, space can be saved, and the shutter 12 and the second advancing / retreating member can be moved more smoothly. The member 21b can be opened / closed and moved back and forth.

In the local cleaning device 2 and the flush toilet 1 of the present embodiment, the shutter advancing / retreating mechanism presses the surface 12a of the shutter 12 and includes a shutter holding portion that holds the shutter 12 in a closed posture in which the nozzle opening 3 is closed. It is possible to prevent the shutter 12 in the closed posture with the nozzle opening 3 closed from swinging and swinging around the rotation shaft O3 due to the action of gravity or the like, and the nozzle opening 3 can be closed firmly. ..

The shutter holding portion releases the state of holding the shutter 12 in the closed posture with the nozzle opening 3 closed by a manual operation of the user, and the shutter 12 in the closed posture is rotatable around the rotation shaft O2. It is configured so that it can be switched to (swingable).

As a result, regardless of the advancement and retreat of the local cleaning nozzle 7, the shutter 12 pushed outward from the shutter storage portion 23 by the user's manual operation or the like can be freely moved around the axis O3 so as to open and close the nozzle opening 3. It becomes possible to rotate. As a result, the user can freely open and close the shutter 12, and for example, the local cleaning nozzle 7 is not disabled due to a power failure of the shutter 12, and the handleability can be improved.

The present disclosure is not limited to the above-described embodiment, and can be appropriately modified without departing from the spirit of the present invention.

For example, in the present embodiment, the entire shutter 12 has been described and illustrated as being pulled into the casing 5 and stored. Unlike this, a part of the shutter 12 may be arranged inside the casing 5 in the open posture. Even in this case, it is possible to obtain the same effect as that of the present embodiment.

In the present embodiment, the cleaning mechanism 24 is configured to discharge the cleaning water W1 to the shutter 12 and the shutter accommodating portion 23 to clean the shutter 12 and the shutter accommodating portion 23. Unlike this, the cleaning mechanism 24 may be configured to keep the shutter 12 and the shutter accommodating portion 23 in a clean state by, for example, irradiating with UV (ultraviolet rays) and sterilizing (sterilizing, sterilizing) the shutter 12. The shutter 12 and the shutter accommodating portion 23 may be maintained in a clean state by using the discharge water of the washing water W1 and the irradiation of UV as in the present embodiment in combination.
Also in this case, the same operation as that of the present embodiment is performed in the same manner as in the present embodiment, that is, by irradiating the shutter 12 in the closed posture and the open posture with UV or irradiating the UV in conjunction with the opening / closing movement. It is possible to obtain an effect.

As shown in FIGS. 14 and 15, two local cleaning nozzles 7 and 8 for bidet cleaning and anal cleaning and two local cleaning nozzles 7 and 8 for bidet cleaning and anal cleaning are used to advance and retreat, respectively. Two nozzle openings 3 may be provided, and two shutters 12 for opening and closing these two nozzle openings 3 may be provided. Also in this case, as in the present embodiment, each shutter 12 may be configured to be cleaned by the cleaning mechanism 24. With such a configuration, when one local cleaning nozzle 7 (8) is used, it is possible to prevent droplets or the like from entering the casing 5 from the nozzle opening 3 on the other local cleaning nozzle 8 (7) side. In the present embodiment, the description has been made assuming that there are two openings 3 for nozzles, but one of the openings may be an opening for warm air drying or deodorization. It may be configured to include three or more openings and a shutter 12.

As shown in FIGS. 16 and 17, a deodorizing mechanism and / or a warm air drying mechanism is provided inside the casing 5, and the shutter 12 is half-opened when the deodorizing mechanism and / or the warm air drying mechanism is operated. You may. In FIGS. 16 and 17, reference numeral 30 indicates an air intake port (opening) of the deodorizing mechanism or a warm air outlet (opening) of the warm air drying mechanism. In this case, it is possible to prevent splashes or the like from entering the inside of the casing 5 when the deodorizing mechanism and / or the warm air drying mechanism is operated. Basically, the opening for warm air drying and the opening for deodorization are provided separately, and when the opening for warm air drying and the opening for deodorization are provided, the hot air is placed on one side of the nozzle (7, 8). One opening for drying and one opening for deodorization, and the other opening on the other side.

In the present embodiment, the nozzle advancing / retreating mechanism for advancing / retreating the local cleaning nozzles 7 and 8 and the shutter advancing / retreating mechanism for opening / closing the shutter 12 are each composed of a rack and pinion mechanism. The shutter advance / retreat mechanism may be any as long as it can advance / retreat the local cleaning nozzles 7 and 8 and the advance / retreat member 21, and is not limited to the rack and pinion mechanism as in the present embodiment. For example, it may be composed of a piston cylinder (linear actuator) or the like.

In the present embodiment, the nozzle advancing / retreating mechanism and the shutter advancing / retreating mechanism are individually provided, but the nozzle advancing / retreating mechanism and the shutter advancing / retreating mechanism may be configured by also using the components.

In the present embodiment, it is assumed that the discharge ports 26 of the cleaning mechanism 24 are aligned and arranged at a predetermined interval in the width direction T2. The number and position of the cleaning mechanism 24, the discharge port 26, and the UV irradiation means need not be particularly limited.

In the present embodiment, the description has been made assuming that both the front surface 12a and the back surface 12b of the shutter 12 are cleaned, but only the front surface 12a of the shutter 12 and only the back surface 12b of the shutter 12 may be cleaned.

Further, as shown in FIG. 18, only a part of the shutter 12 is pulled into the casing 5 and stored, and the cleaning water W1 is discharged from the cleaning mechanism 24 to the stored portion of the shutter 12, and the entire surface of the shutter 12 ( The front surface 12a and the back surface 12b) may be configured to be cleaned. In this case, the structure can be miniaturized and simplified as compared with the case where all the shutters 12 are housed. Incidentally, in FIG. 18, the cleaning mechanism 24 is arranged above the base end portion of the shutter 12, and is configured to be pressed by the nozzle 7 to open the shutter 12. Unlike this, it is not necessary to press the nozzle 7 to open the shutter 12. The position of the cleaning mechanism 24 does not have to be limited as shown in FIG. 18, and may be appropriately set so that the shutter 12 can be appropriately cleaned.

1 Flush toilet, 2 Local cleaning device, 3 Nozzle opening, 4 Toilet bowl body, 5 Casing (cover case), 7 Local cleaning nozzle, 10 Cleaning function unit, 11 Toilet seat, 12 Shutter, 12a front surface, 12b back surface, 13 nozzles Unit, 16 discharge hole, 20 shutter unit (shutter opening / closing mechanism), 21 advancing / retreating member, 22 hinge, 23 shutter storage part, 24 cleaning mechanism, 25 guide part, 26 discharge port, 27 cleaning water flow path, 30 opening, O1 axis , O2 axis, O3 axis, T1 front-back direction, T2 width direction, W1 Cleaning water for shutter cleaning

Claims (10)

A local cleaning nozzle that is housed in a casing in the retracted state and discharges local cleaning water from the tip portion in a state of advancing forward through a nozzle opening provided in the casing.
When the nozzle opening is opened and closed and the nozzle opening is opened, at least a part of the shutter is drawn into the casing.
A cleaning mechanism provided inside the casing and performing cleaning for at least a part of the shutter drawn into the casing.
A local cleaning device. The cleaning mechanism discharges a cleaning liquid toward the shutter to perform cleaning.
The local cleaning device according to claim 1. The cleaning mechanism
It is configured to clean the front and back surfaces of the shutter, respectively.
The local cleaning apparatus according to claim 1 or 2. The cleaning mechanism
With the shutter open, the surface of the shutter is cleaned.
It is configured to clean the back surface of the shutter when the shutter is closed.
The local cleaning device according to any one of claims 1 to 3. Two shutters are provided to open and close the two openings provided in the casing, respectively.
A cleaning mechanism for cleaning each of the two shutters is provided.
The local cleaning device according to any one of claims 1 to 4. A guide portion for guiding the shutter to move inside the casing is provided.
The local cleaning device according to any one of claims 1 to 5. Equipped with a user detection means to detect people
The cleaning mechanism
It is configured to perform a pre-cleaning operation that pre-cleans the shutter before it is used by a person detected by the user detecting means.
The local cleaning device according to any one of claims 1 to 6. A shutter accommodating portion for accommodating the shutter in an open state is provided inside the casing.
The cleaning mechanism
It is configured to clean the shutter accommodating portion together with the shutter.
The local cleaning device according to any one of claims 1 to 7. The shutter is configured to open and close in a non-contact manner with the local cleaning nozzle in conjunction with the advancement and retreat of the local cleaning nozzle.
The local cleaning device according to any one of claims 1 to 8. The local cleaning apparatus according to any one of claims 1 to 9 is provided.
Flush toilet.

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