JP2021070605A - Method for growing oxide single crystal - Google Patents

Method for growing oxide single crystal Download PDF

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JP2021070605A
JP2021070605A JP2019197602A JP2019197602A JP2021070605A JP 2021070605 A JP2021070605 A JP 2021070605A JP 2019197602 A JP2019197602 A JP 2019197602A JP 2019197602 A JP2019197602 A JP 2019197602A JP 2021070605 A JP2021070605 A JP 2021070605A
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JP7294063B2 (en
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大輔 土橋
Daisuke Dobashi
大輔 土橋
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Sumitomo Metal Mining Co Ltd
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Abstract

To provide a method for growing an oxide single crystal, capable of growing a single crystal of lithium tantalate and lithium niobate, etc., without crack even when changing a content of an additive formed of germanium, zirconium, titanium or copper while maintaining high productivity as much as possible.SOLUTION: A method for growing an oxide single crystal obtained by adding an additive formed using at least one or more kinds of elements selected from germanium, zirconium, titanium and copper to a raw material of lithium tantalate or lithium niobate when growing the oxide single crystal by a Cz method using a high frequency induction heating furnace comprises: adding the additive having a content of 3.7 mol% or more and 6 mol% or less to the raw material; and pulling a seed crystal at a pulling rate having a predetermined range later than a pulling rate of the seed crystal when growing an oxide single crystal without adding the additive to the raw material according to an amount increased from 2 mol% in the content of the additive.SELECTED DRAWING: None

Description

本発明は、酸化物単結晶の育成方法に関する。 The present invention relates to a method for growing an oxide single crystal.

従来、タンタル酸リチウム(LiTaO)単結晶や、ニオブ酸リチウム(LiNbO)単結晶は、主に移動体通信機器に用いる、電気信号ノイズ除去のための表面弾性波素子(SAWフィルター、Surface Acoustic Wave Filter)の材料として用いられている。
タンタル酸リチウム単結晶や、ニオブ酸リチウム単結晶は、産業的にはCz(Czochralski、チョクラルスキー)法によって育成される。例えば、タンタル酸リチウム単結晶は、イリジウム(Ir)製坩堝を用いて、窒素−酸素混合ガス雰囲気の高周波誘導加熱式育成炉中で育成される。Cz法とは、円筒状の坩堝内にある原料融液に種結晶を浸し、その後に種結晶を回転させながら上方に引き上げることで、種結晶と同一方位の単結晶を育成する方法である。種結晶の回転速度や引上げ速度は、育成する結晶の種類、育成時の温度環境に応じた速度に設定する。育成後は、育成炉内で所定の冷却速度で冷却し、冷却後に炉から取り出す。取り出された単結晶は、アニール、ポーリング工程を経た後に、スライス、研磨工程によって厚さ数百ミクロン程度の基板に加工され、SAWフィルターの材料として用いられる。
Conventionally, lithium tantalate (LiTaO 3 ) single crystal and lithium niobate (LiNbO 3 ) single crystal are mainly used for mobile communication equipment, and surface acoustic wave elements (SAW filter, Surface Acoustic) for removing electrical signal noise are used. It is used as a material for Wave Filter).
Lithium tantalate single crystal and lithium niobate single crystal are industrially grown by the Cz (Czochralski) method. For example, a lithium tantalate single crystal is grown in a high frequency induction heating type growing furnace in a nitrogen-oxygen mixed gas atmosphere using an iridium (Ir) crucible. The Cz method is a method of immersing a seed crystal in a raw material melt in a cylindrical crucible, and then pulling the seed crystal upward while rotating it to grow a single crystal in the same orientation as the seed crystal. The rotation speed and pulling speed of the seed crystal are set according to the type of crystal to be grown and the temperature environment at the time of growth. After growing, it is cooled in a growing furnace at a predetermined cooling rate, and after cooling, it is taken out from the furnace. The single crystal taken out is processed into a substrate having a thickness of about several hundred microns by a slicing and polishing step after undergoing an annealing and polling steps, and is used as a material for a SAW filter.

近年、SAWフィルターの小型化に伴い、SAWフィルターに用いる材料についても、様々な特性の向上が要求されてきている。
例えば、特許文献1には、圧電振動子の外形を微細に加工するために行うウェットエッチング加工における、エッチング加工速度の向上を目的として、ニオブ酸リチウム単結晶の育成方法において、原料中に酸化ゲルマニウム、酸化ジルコニウム、酸化チタン等の添加物を1mol%〜5mol%含有することが記載されている。
In recent years, with the miniaturization of SAW filters, improvement of various characteristics of materials used for SAW filters has been required.
For example, Patent Document 1 describes germanium oxide in a raw material in a method for growing a lithium niobate single crystal for the purpose of improving the etching processing speed in wet etching processing performed for finely processing the outer shape of a piezoelectric vibrator. , Zirconium oxide, titanium oxide and the like are described as containing 1 mol% to 5 mol%.

また、例えば、特許文献2には、耐応力衝撃性や耐熱衝撃性を向上させることを目的として、Cz法により育成した、鉄、銅、マンガン、チタン等を0.002wt%以上0.1wt%以下含有するタンタル酸リチウム又はニオブ酸リチウムの単結晶が記載されている。 Further, for example, Patent Document 2 describes 0.002 wt% or more and 0.1 wt% of iron, copper, manganese, titanium, etc. grown by the Cz method for the purpose of improving stress impact resistance and thermal impact resistance. The single crystals of lithium tantalate or lithium niobate contained below are described below.

特開2007−169074号公報JP-A-2007-169974 WO2007/046176号公報WO2007 / 046176

しかしながら、特許文献1に記載のニオブ酸リチウム単結晶の育成方法は、融液から単結晶を下方向に成長させるマイクロ引下げ法を用いることを前提としており、結晶成長用坩堝のノズルが長さ10mm、幅1mmであって、育成される結晶が小さい。このため、特許文献1に記載の育成方法は、大型のデバイスの材料には用いることができない上、生産性も低い。また、特許文献1には、固相反応を利用した単結晶の育成では空孔が発生する等の問題があり、高品質の結晶を育成することが困難であることが記載されており、Cz法を用いることについての提案はない。 However, the method for growing a lithium niobate single crystal described in Patent Document 1 is premised on using a micro-pulling method for growing a single crystal downward from a melt, and the nozzle of the crystal growth crucible has a length of 10 mm. The width is 1 mm, and the crystals to be grown are small. Therefore, the growing method described in Patent Document 1 cannot be used as a material for a large device, and the productivity is low. Further, Patent Document 1 describes that it is difficult to grow a high-quality crystal due to problems such as the occurrence of pores in the growth of a single crystal using a solid-phase reaction, and Cz. There is no suggestion to use the law.

また、特許文献2に記載のものは、実施例において、添加元素として鉄を0.002wt%以上0.1wt%以下含有するタンタル酸リチウム単結晶が結晶欠陥なく育成できることが実証されているが、その他の添加元素については、0.10wt%含有するタンタル酸リチウム単結晶が育成できることが実証されているにとどまり、0.10wt%とは異なる含有量で含有するタンタル酸リチウム単結晶が結晶欠陥なく育成できることについては実証されていない。 Further, in the examples described in Patent Document 2, it has been demonstrated that a lithium tantalate single crystal containing 0.002 wt% or more and 0.1 wt% or less of iron as an additive element can be grown without crystal defects. Regarding other additive elements, it has only been demonstrated that a lithium tantalate single crystal containing 0.10 wt% can be grown, and a lithium tantalate single crystal containing a content different from 0.10 wt% has no crystal defects. It has not been proven that it can be cultivated.

しかるに、本発明者が、添加物としてチタンを含有する酸化物単結晶をCz法で育成することについて、求められる酸化物単結晶の特性に応えるべく、チタンの含有量を異ならせて試験研究を行ったところ、チタンの含有量が増加するにしたがって単結晶にクラックが生じ易くなることが判明した。 However, the present inventor conducted a test study on growing an oxide single crystal containing titanium as an additive by the Cz method, in order to meet the required characteristics of the oxide single crystal, with different titanium contents. As a result, it was found that as the titanium content increased, cracks were more likely to occur in the single crystal.

本発明は、上記問題点を鑑みてなされたものであり、高い生産性を極力維持しながら、ゲルマニウム、ジルコニウム、チタン又は銅から選択される少なくとも1種以上の元素を用いて構成される添加物の含有量を異ならせてもクラックのないタンタル酸リチウム、ニオブ酸リチウム等の単結晶をCz法により育成することの可能な酸化物単結晶の育成方法を提供することを目的としている。 The present invention has been made in view of the above problems, and is an additive composed of at least one element selected from germanium, zirconium, titanium or copper while maintaining high productivity as much as possible. It is an object of the present invention to provide a method for growing an oxide single crystal capable of growing a single crystal such as lithium tantalate or lithium niobate that does not crack even if the content of zirconium is different by the Cz method.

上記目的を達成するため、本発明による酸化物単結晶の育成方法は、高周波誘導加熱炉を用いたCz法による酸化物単結晶の育成に際し、タンタル酸リチウム又はニオブ酸リチウムの原料にゲルマニウム、ジルコニウム、チタン、銅から選択される少なくとも1種以上の元素を用いて構成される添加物を添加する酸化物単結晶の育成方法において、前記原料に前記添加物を3.7mol%以上6mol%以下の含有量となるように添加し、かつ、該添加物の含有量における2mol%からの増加量に応じて、前記原料に前記添加物を添加しないで酸化物単結晶を育成する場合における種結晶の引上げ速度よりも遅い所定範囲の引上げ速度で種結晶を引き上げることを特徴とする。 In order to achieve the above object, the method for growing an oxide single crystal according to the present invention uses germanium or zirconium as a raw material for lithium tantalate or lithium niobate when growing an oxide single crystal by the Cz method using a high-frequency induction heating furnace. In a method for growing an oxide single crystal in which an additive composed of at least one element selected from titanium and copper is added, the additive is added to the raw material in an amount of 3.7 mol% or more and 6 mol% or less. The seed crystal in the case where the oxide single crystal is grown without adding the additive to the raw material according to the amount of increase from 2 mol% in the content of the additive, which is added so as to have a content. It is characterized in that the seed crystal is pulled up at a pulling speed in a predetermined range slower than the pulling speed.

また、本発明の酸化物単結晶の育成方法においては、前記原料に前記添加物を3.7mol%以上4mol%以下の含有量となるように添加したときには、前記原料に前記添加物を添加しないで酸化物単結晶を育成する場合における種結晶の引上げ速度の1倍未満1/2倍以上の引上げ速度で種結晶を引き上げ、前記原料に前記添加物を4mol%超6mol%以下の含有量となるように添加したときには、前記原料に前記添加物を添加しないで酸化物単結晶を育成する場合における種結晶の引上げ速度の1/2倍未満1/4倍以上の引上げ速度で種結晶を引き上げるのが好ましい。 Further, in the method for growing an oxide single crystal of the present invention, when the additive is added to the raw material so as to have a content of 3.7 mol% or more and 4 mol% or less, the additive is not added to the raw material. When growing an oxide single crystal in the above, the seed crystal is pulled up at a pulling speed of less than 1 times or 1/2 times or more the pulling speed of the seed crystal, and the additive is added to the raw material in an amount of more than 4 mol% and 6 mol% or less. When added so as to be, the seed crystal is pulled up at a pulling rate of less than 1/2 times and 1/4 times or more of the pulling speed of the seed crystal when growing the oxide single crystal without adding the additive to the raw material. Is preferable.

また、本発明の酸化物単結晶の育成方法においては、前記添加物は、チタンを用いて構成されるのが好ましい。 Further, in the method for growing an oxide single crystal of the present invention, it is preferable that the additive is composed of titanium.

本発明によれば、高い生産性を極力維持しながら、ゲルマニウム、ジルコニウム、チタン又は銅から選択される少なくとも1種以上の元素を用いて構成される添加物の含有量を異ならせてもクラックのないタンタル酸リチウム、ニオブ酸リチウム等の単結晶をCz法により育成することの可能な酸化物単結晶の育成方法が得られる。 According to the present invention, cracks can be generated even if the content of an additive composed of at least one element selected from germanium, zirconium, titanium or copper is different while maintaining high productivity as much as possible. A method for growing an oxide single crystal capable of growing a single crystal such as lithium tantalate or lithium niobate by the Cz method can be obtained.

本発明の実施形態に係る酸化物単結晶の育成方法に用いる結晶育成装置の一例を示した断面図である。It is sectional drawing which showed an example of the crystal growth apparatus used in the method of growing an oxide single crystal which concerns on embodiment of this invention.

以下、図面を参照して、本発明を実施するための形態の説明を行う。
図1は、本発明の実施形態に係る酸化物単結晶の育成方法に用いる結晶育成装置の一例を示した断面図である。結晶育成装置は、坩堝10と、坩堝台20と、断熱材30と、耐火物40と、リフレクタ50と、アフター・ヒーター60と、誘導コイル70と、引き上げ軸80と、載置台90と、チャンバー100とを備えた高周波加熱炉である。
なお、引上げ軸80の下端には種結晶保持部81が設けられ、種結晶110を保持している。また、坩堝10内には原料融液120が貯留保持されている。
Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings.
FIG. 1 is a cross-sectional view showing an example of a crystal growing apparatus used in the method for growing an oxide single crystal according to an embodiment of the present invention. The crystal growing device includes a crucible 10, a crucible stand 20, a heat insulating material 30, a refractory 40, a reflector 50, an after heater 60, an induction coil 70, a pulling shaft 80, a mounting stand 90, and a chamber. It is a high frequency heating furnace provided with 100.
A seed crystal holding portion 81 is provided at the lower end of the pulling shaft 80 to hold the seed crystal 110. Further, the raw material melt 120 is stored and held in the crucible 10.

本実施形態の結晶育成装置において、坩堝10は坩堝台20の上に載置されている。坩堝10及び坩堝台20の周囲には、円筒形の断熱材30が設けられている。断熱材30は、坩堝10が発熱体となって発する熱が外部に漏れるのを抑制するとともに、坩堝10の下端部が繰り返し使用により変形し、外側に突出し易くなるのを抑制する。また、断熱材30を囲むように、耐火物40が設けられている。耐火物40は、断熱材30の側方及び下部を囲む下部容器41と、断熱材30の上部を囲む上部容器42とを有する。
坩堝10の上方には、リフレクタ50を介して、アフター・ヒーター60が設置されている。アフター・ヒーター60は、坩堝10から引き上げられた単結晶を加熱するように構成されている。リフレクタ50は、加熱された坩堝10内の熱を反射するように、坩堝10の側面の上端の周縁部を覆うようにして設けられている。更に、坩堝10、坩堝台20、断熱材30、耐火物40、リフレクタ50及びアフター・ヒーター60を取り囲むように誘導コイル70が設けられている。また、誘導コイル70の外側にはチャンバー100が設けられ、耐火物40及び誘導コイル70の周囲全体を覆っている。
また、坩堝10の上方には、引き上げ軸80が設けられている。引き上げ軸80は、下端に種結晶保持部81を有し、図示しない引き上げ軸駆動モータにより昇降可能に構成されている。耐火物40の下方かつチャンバー100内には載置台90が設けられ、チャンバー100以外の全体を支持している。
また、結晶育成装置全体の動作を制御するための制御部と、誘導コイル70及び結晶育成装置全体に電力を供給するための電源がチャンバー100の外部に設けられている。
なお、実施形態の酸化物単結晶の育成方法に用いる結晶育成装置は、図1に示した構成に限定されるものではなく、Cz法による結晶育成ができるものであれば、どのような構成であってもよい。
In the crystal growing apparatus of the present embodiment, the crucible 10 is placed on the crucible stand 20. A cylindrical heat insulating material 30 is provided around the crucible 10 and the crucible stand 20. The heat insulating material 30 suppresses the heat generated by the crucible 10 as a heating element from leaking to the outside, and also suppresses that the lower end portion of the crucible 10 is deformed by repeated use and easily protrudes to the outside. Further, a refractory material 40 is provided so as to surround the heat insulating material 30. The refractory 40 has a lower container 41 that surrounds the sides and the lower part of the heat insulating material 30, and an upper container 42 that surrounds the upper part of the heat insulating material 30.
An after-heater 60 is installed above the crucible 10 via a reflector 50. The after heater 60 is configured to heat the single crystal pulled up from the crucible 10. The reflector 50 is provided so as to cover the peripheral edge of the upper end of the side surface of the crucible 10 so as to reflect the heat in the heated crucible 10. Further, an induction coil 70 is provided so as to surround the crucible 10, the crucible stand 20, the heat insulating material 30, the refractory 40, the reflector 50, and the after heater 60. Further, a chamber 100 is provided on the outside of the induction coil 70, and covers the entire periphery of the refractory material 40 and the induction coil 70.
Further, a pulling shaft 80 is provided above the crucible 10. The pull-up shaft 80 has a seed crystal holding portion 81 at the lower end thereof, and is configured to be able to move up and down by a pull-up shaft drive motor (not shown). A mounting table 90 is provided below the refractory 40 and in the chamber 100 to support the entire chamber except the chamber 100.
Further, a control unit for controlling the operation of the entire crystal growth apparatus and a power source for supplying electric power to the induction coil 70 and the entire crystal growth apparatus are provided outside the chamber 100.
The crystal growing apparatus used in the method for growing an oxide single crystal of the embodiment is not limited to the configuration shown in FIG. 1, and any configuration can be used as long as the crystal can be grown by the Cz method. There may be.

次に、本実施形態に係る酸化物単結晶の育成方法により育成される酸化物単結晶について説明する。
本実施形態の育成方法により育成される酸化物単結晶は、高周波誘導加熱炉を用いたCz法による酸化物単結晶の育成に際して、タンタル酸リチウム又はニオブ酸リチウムの原料にゲルマニウム、ジルコニウム、チタン、銅から選択される少なくとも1種以上の元素を用いて構成される添加物を3.7mol%以上添加することによって育成されたものである。
Next, the oxide single crystal grown by the method for growing the oxide single crystal according to the present embodiment will be described.
The oxide single crystal grown by the growing method of the present embodiment is prepared by using germanium, zirconium, titanium, etc. as raw materials for lithium tantalate or lithium niobate when growing the oxide single crystal by the Cz method using a high-frequency induction heating furnace. It is grown by adding 3.7 mol% or more of an additive composed of at least one element selected from copper.

次に本実施形態の酸化物単結晶の育成方法について、本発明を導出するに至った経緯とともに説明する。
本実施形態の酸化物単結晶の育成方法では、上述の高周波誘導加熱炉を使用する。
まず、タンタル酸リチウム又はニオブ酸リチウムの原料と添加物の原料を用意し、それぞれ所定量混合する。タンタル酸リチウム又はニオブ酸リチウムの原料に添加する添加物の形態は、金属、酸化物のいずれも可能である。但し、酸化物であるタンタル酸リチウム又はニオブ酸リチウムの融液へ溶解させることから、添加物の形態は、酸化物が望ましい。
なお、添加物は、育成された酸化物単結晶においては、添加量の全てが含有されるわけではない。育成された酸化物単結晶に取り込まれる量は、添加物の偏析係数(結晶中の添加物濃度/融液中の添加物濃度)の影響を受けて減少する。本発明者が上述の高周波誘導加熱炉を用いて、タンタル酸リチウムの原料に、ジルコニウム、ゲルマニウム、チタンから選択される少なくとも1種以上の元素を用いて構成される添加物を添加した、Cz法によるタンタル酸リチウム単結晶を育成するための試験研究を行い、添加物の偏析係数を調べたところ、ジルコニウムは約0.6、ゲルマニウムは約0.2、チタンは約0.15、銅は約0.28であった。例えば、添加物がチタンの場合、原料秤量時の濃度に対し育成した単結晶に取り込まれる濃度は、原料秤量時の濃度の約0.15になる。このため、タンタル酸リチウム又はニオブ酸リチウムの原料に添加する添加物の量は偏析係数を考慮して設定する。
Next, the method for growing the oxide single crystal of the present embodiment will be described together with the background leading to the derivation of the present invention.
In the method for growing an oxide single crystal of the present embodiment, the above-mentioned high-frequency induction heating furnace is used.
First, a raw material of lithium tantalate or lithium niobate and a raw material of an additive are prepared, and a predetermined amount of each is mixed. The form of the additive added to the raw material of lithium tantalate or lithium niobate can be either a metal or an oxide. However, the form of the additive is preferably an oxide because it is dissolved in a melt of lithium tantalate or lithium niobate which is an oxide.
It should be noted that the additive does not contain all of the added amount in the grown oxide single crystal. The amount incorporated into the grown oxide single crystal is affected by the segregation coefficient of the additive (additive concentration in the crystal / additive concentration in the melt) and decreases. The Cz method in which the present inventor added an additive composed of at least one element selected from zirconium, germanium, and titanium to a raw material of lithium tantalate using the above-mentioned high-frequency induction heating furnace. When the segregation coefficient of the additive was investigated by conducting a test study for growing a lithium tantalate single crystal, zirconium was about 0.6, germanium was about 0.2, titanium was about 0.15, and copper was about 0.15. It was 0.28. For example, when the additive is titanium, the concentration incorporated into the grown single crystal with respect to the concentration at the time of weighing the raw material is about 0.15 of the concentration at the time of weighing the raw material. Therefore, the amount of the additive added to the raw material of lithium tantalate or lithium niobate is set in consideration of the segregation coefficient.

次に、高周波加熱炉のヒーター(誘導コイル70)を加熱させ坩堝10内の原料粉を融解させる。原料が融解後、坩堝10の上方に配置した引き上げ軸80の下端の種結晶保持部81に保持された種結晶110を、坩堝10内の融解した原料融液120の表面に接触させ、引き上げ軸80を介して種結晶110を回転させながら上方に引き上げることにより、種結晶110と同一方位の円筒状のタンタル酸リチウム又はニオブ酸リチウムの単結晶を育成する。 Next, the heater (induction coil 70) of the high-frequency heating furnace is heated to melt the raw material powder in the crucible 10. After the raw material is melted, the seed crystal 110 held by the seed crystal holding portion 81 at the lower end of the pulling shaft 80 arranged above the pit 10 is brought into contact with the surface of the melted raw material melt 120 in the pit 10 to bring the pulling shaft. By pulling the seed crystal 110 upward while rotating the seed crystal 110 through the 80, a cylindrical single crystal of lithium tantalate or lithium niobate in the same orientation as the seed crystal 110 is grown.

なお、Cz法による酸化物単結晶の育成においては、種結晶の回転速度や引上速度は、育成する結晶の種類、育成時の温度環境に応じた速度に設定する。 In the growth of the oxide single crystal by the Cz method, the rotation speed and the pulling speed of the seed crystal are set to the speeds according to the type of the crystal to be grown and the temperature environment at the time of growth.

ところで、Cz法による酸化物単結晶の育成において酸化物単結晶の原料に添加物を添加する場合、セル状結晶成長に起因したクラックが発生する虞がある。セル状とは細胞(Cell)のように小さく分かれた形状を指し、セル状結晶成長とは、細胞のように小さく分かれて結晶が成長する状態をいう。それぞれのセル形状が変化することで、結晶中に欠陥が入ったり、セル同士の境界に不純物が優先的に集まったりする状態となり、それによりクラックなどが発生し、得られる酸化物単結晶の品質低下に大きな影響を与える。 By the way, when an additive is added to the raw material of the oxide single crystal in the growth of the oxide single crystal by the Cz method, cracks due to cell-like crystal growth may occur. Cell-like refers to a shape that is divided into small pieces like a cell, and cell-like crystal growth means a state in which crystals are divided into small pieces like a cell and grow. As the shape of each cell changes, defects enter the crystal or impurities preferentially gather at the boundaries between cells, which causes cracks and the like, and the quality of the obtained oxide single crystal. It has a great influence on the decline.

本発明者は、上述の高周波誘導加熱炉を用いて、タンタル酸リチウム原料に添加物としてチタンを添加してCz法によりタンタル酸リチウム単結晶を育成する試験研究を、種結晶の回転速度や引上げ速度、育成時の温度等が同じ育成条件下で、求められる酸化物単結晶の特性に応えるべく、チタンの含有量を異ならせて行った。その結果、タンタル酸リチウム原料にチタンを添加した原料粉中のチタンの含有量が所定量(2mol%)を超えると、セル状結晶成長によりクラックが発生し、タンタル酸リチウム原料にチタンを添加してCz法によりタンタル酸リチウム単結晶を育成する場合、原料粉中のチタンの含有量の増加によりセル状結晶が成長し易くなることが認められた。
ここで、本発明者は、セル状結晶の成長を抑えるために、種結晶の引上げ速度を遅くすることを考えたが、種結晶の引上げ速度を遅くしすぎると、生産性が悪くなるという課題が生じた。
ところで、上記試験では、チタンの含有量が2mol%以下の場合、2mol%を超えた場合のいずれも同じ育成条件下で育成を行っており、種結晶の引上げ速度は、タンタル酸リチウム原料にチタンを添加しないでタンタル酸リチウム単結晶を育成する場合の種結晶の引上げ速度と同じ速度である。チタンの含有量が2mol%までは、チタンを添加しないでタンタル酸リチウム単結晶を育成する場合の種結晶の引上げ速度と同じ速度でクラックの無いタンタル酸リチウム単結晶を育成できることが認められた。
そこで、本発明者は、高い生産性を極力維持しながらクラックのない酸化物単結晶をCz法により育成すべく、更に考察検討を重ねた末に、酸化物単結晶の原料にチタンを添加しないで酸化物単結晶を育成するときの種結晶の引上げ速度を基準として、チタンの含有量が2mol%を超えたときの増加量に応じて所定の速度調整をすることを着想し、本発明を導出するに至った。
The present inventor conducted a test study in which titanium was added as an additive to a lithium tantalate raw material using the above-mentioned high-frequency induction heating furnace to grow a lithium tantalate single crystal by the Cz method, and the rotation speed and increase of the seed crystal were carried out. Under the same growing conditions such as the speed and the temperature at the time of growing, the titanium content was different in order to meet the required characteristics of the oxide single crystal. As a result, when the content of titanium in the raw material powder obtained by adding titanium to the lithium tantalate raw material exceeds a predetermined amount (2 mol%), cracks occur due to cell-like crystal growth, and titanium is added to the lithium tantalate raw material. When the lithium tantalate single crystal was grown by the Cz method, it was found that the cell-like crystal was easily grown due to the increase in the titanium content in the raw material powder.
Here, the present inventor has considered slowing down the pulling speed of the seed crystal in order to suppress the growth of the cell-like crystal, but if the pulling speed of the seed crystal is too slow, the productivity will deteriorate. Has occurred.
By the way, in the above test, the seed crystals are grown under the same growing conditions when the titanium content is 2 mol% or less and when the titanium content exceeds 2 mol%, and the pulling speed of the seed crystal is titanium tantalate as a raw material. It is the same speed as the pulling speed of the seed crystal when growing a lithium tantalate single crystal without adding. It was confirmed that crack-free lithium tantalate single crystals could be grown at the same rate as the seed crystal pulling rate when growing lithium tantalate single crystals without adding titanium up to a titanium content of up to 2 mol%.
Therefore, the present inventor does not add titanium to the raw material of the oxide single crystal after further consideration and examination in order to grow a crack-free oxide single crystal by the Cz method while maintaining high productivity as much as possible. Based on the pulling speed of the seed crystal when growing the oxide single crystal in the above, the present invention is based on the idea of adjusting the predetermined speed according to the increase amount when the titanium content exceeds 2 mol%. It came to be derived.

本実施形態の酸化物単結晶の育成方法では、タンタル酸リチウム又はニオブ酸リチウムの原料にゲルマニウム、ジルコニウム、チタン、銅から選択される少なくとも1種以上の元素を用いて構成される添加物を、3.7mol%以上6mol%以下の所定の含有量となるように添加し、かつ、添加物の含有量における2mol%からの増加量に応じて、添加物を添加しない場合における種結晶の引上げ速度よりも遅い所定範囲の引上げ速度で種結晶を引き上げることを特徴としている。 In the method for growing an oxide single crystal of the present embodiment, an additive composed of at least one element selected from germanium, zirconium, titanium, and copper as a raw material for lithium tantalate or lithium niobate is used. The rate of pulling up the seed crystal when the seed crystal is added so as to have a predetermined content of 3.7 mol% or more and 6 mol% or less and the additive is not added according to the amount of increase from 2 mol% in the content of the additive. It is characterized by pulling up the seed crystal at a slower pulling speed in a predetermined range.

上述の通り、セル状結晶成長が添加物の濃度の影響を受けており、添加物の濃度が高くなるにしたがい、セル状結晶が成長し易くなる。セル状結晶の成長を抑えるためには、種結晶の引上げ速度を遅くすることが考えられるが、種結晶の引上げ速度を遅くすると、生産性が悪くなる。そこで、高い生産性を極力維持しながらセル状結晶の成長を抑えるために、原料に添加する添加物の濃度における2mol%からの増加量に応じて、添加物を添加しない場合における種結晶の引上げ速度よりも遅い所定範囲の引上げ速度で種結晶を引き上げる。例えば、チタンを添加物とした場合、秤量時の添加量が2mol%までは、種結晶の引上げ速度は、添加物を添加しない場合と同じ引上げ速度で引き上げることが可能であるが、秤量時の添加量が4mol%の場合は、種結晶の引上げ速度は、添加物を添加しない場合の速度の1/2、秤量時の添加量が6mol%の場合は、添加物を添加しない場合の引上げ速度の1/4まで減速した引上げ速度で引き上げることでセル状結晶の成長が抑えられ、高い生産性を極力維持しながらクラックの無い酸化物単結晶を得ることができる。 As described above, the cell-like crystal growth is affected by the concentration of the additive, and as the concentration of the additive increases, the cell-like crystal grows more easily. In order to suppress the growth of the cellular crystal, it is conceivable to slow down the pulling speed of the seed crystal, but if the pulling speed of the seed crystal is slowed down, the productivity deteriorates. Therefore, in order to suppress the growth of cell-like crystals while maintaining high productivity as much as possible, the seed crystal is pulled up when no additive is added according to the amount of increase from 2 mol% in the concentration of the additive added to the raw material. The seed crystal is pulled up at a pulling speed in a predetermined range slower than the speed. For example, when titanium is used as an additive, the seed crystal can be pulled up at the same pulling speed as when no additive is added until the amount added at the time of weighing is up to 2 mol%, but at the time of weighing. When the addition amount is 4 mol%, the pulling speed of the seed crystal is 1/2 of the speed when no additive is added, and when the addition amount at the time of weighing is 6 mol%, the pulling speed when no additive is added. By pulling up at a pulling speed reduced to 1/4 of the above, the growth of cell-like crystals is suppressed, and a crack-free oxide single crystal can be obtained while maintaining high productivity as much as possible.

このような条件下で、所望の大きさまで酸化物単結晶を育成後、育成した酸化物単結晶を融液から切り離し、その後、育成炉のパワーを所定の速度で低下させることで徐冷し、炉内温度が室温近傍となった後に育成炉内から酸化物単結晶を取り出す。取り出された酸化物単結晶は、温度勾配がある育成炉内の環境で結晶育成、冷却がなされたために、結晶内に温度差に起因する熱歪(残留歪)が内在している。その残留歪を取り除くために、均熱炉内でアニール、徐冷を行う。これにより、SAWフィルターに用いる材料として好適な酸化物単結晶が得られる。 Under such conditions, the oxide single crystal is grown to a desired size, the grown oxide single crystal is separated from the melt, and then the power of the growing furnace is reduced at a predetermined rate to slowly cool the single crystal. After the temperature inside the furnace is close to room temperature, the oxide single crystal is taken out from the growing furnace. Since the extracted oxide single crystal was grown and cooled in an environment in a growing furnace having a temperature gradient, thermal strain (residual strain) due to a temperature difference is inherent in the crystal. In order to remove the residual strain, annealing and slow cooling are performed in a soaking furnace. As a result, an oxide single crystal suitable as a material used for the SAW filter can be obtained.

実施例1
高周波誘導加熱炉内に図1に示す構成の高周波加熱炉を構築し、タンタル酸リチウム単結晶の育成を行った。Ir(イリジウム)製坩堝内にタンタル酸リチウム原料をチャージした。ツルボ径はφ50mmとした。このとき、タンタル酸リチウム原料に対し酸化チタンをチタンの含有量が4mol%となるように添加して原料粉を作製した。その後、加熱炉を加熱して原料粉を融解し、引き上げ軸下端の種結晶保持部に保持された種結晶先端部を原料融液に浸し、引き上げ軸を介して回転させながら上方に引き上げることにより、φ25mm直胴長25mmのタンタル酸リチウム単結晶を得た。なお、種結晶の回転数は15rpmから育成終盤にかけて6rpmに減速させた。また、種結晶の引上げ速度は1.1mm/hrとした。
このタンタル酸リチウム単結晶をICP−MS法により分析した結果、タンタル酸リチウム単結晶中に含有するチタンは0.59mol%であった。
また、育成したタンタル酸リチウム単結晶を目視観察したところ、クラックの発生は認められなかった。
Example 1
A high-frequency heating furnace having the configuration shown in FIG. 1 was constructed in the high-frequency induction heating furnace, and a lithium tantalate single crystal was grown. A raw material of lithium tantalate was charged in a crucible made of Ir (iridium). The diameter of the vine was φ50 mm. At this time, titanium oxide was added to the lithium tantalate raw material so that the titanium content was 4 mol% to prepare a raw material powder. After that, the heating furnace is heated to melt the raw material powder, the tip of the seed crystal held in the seed crystal holding portion at the lower end of the pulling shaft is immersed in the raw material melt, and the raw material is pulled upward while rotating via the pulling shaft. , A lithium tantalate single crystal having a diameter of 25 mm and a straight body length of 25 mm was obtained. The rotation speed of the seed crystal was decelerated from 15 rpm to 6 rpm from the final stage of growth. The pulling speed of the seed crystal was 1.1 mm / hr.
As a result of analyzing this lithium tantalate single crystal by the ICP-MS method, the titanium contained in the lithium tantalate single crystal was 0.59 mol%.
Moreover, when the grown lithium tantalate single crystal was visually observed, no crack was observed.

実施例2
タンタル酸リチウム原料に対し酸化チタンをチタンの含有量が6mol%となるように添加して原料粉を作製し、育成時の種結晶の引上げ速度を0.55mm/hrとした。それ以外は、実施例1と同様の育成方法で、φ25mm直胴長25mmのタンタル酸リチウム単結晶を得た。
このタンタル酸リチウム単結晶をICP−MS法により分析した結果、タンタル酸リチウム単結晶中に含有するチタンは0.83mol%であった。
また、育成したタンタル酸リチウム単結晶を目視観察したところ、クラックの発生は認められなかった。
Example 2
Titanium oxide was added to the lithium tantalate raw material so that the titanium content was 6 mol% to prepare a raw material powder, and the pulling speed of the seed crystal during growth was set to 0.55 mm / hr. Other than that, a lithium tantalate single crystal having a diameter of 25 mm and a straight body length of 25 mm was obtained by the same growing method as in Example 1.
As a result of analyzing this lithium tantalate single crystal by the ICP-MS method, the titanium contained in the lithium tantalate single crystal was 0.83 mol%.
Moreover, when the grown lithium tantalate single crystal was visually observed, no crack was observed.

参考例1
タンタル酸リチウム原料のみの原料粉を作製し、育成時の種結晶の引上げ速度を2.2mm/hrとした。それ以外は、実施例1と同様の育成方法で、φ25mm直胴長25mmのタンタル酸リチウム単結晶を得た。
このタンタル酸リチウム単結晶をICP−MS法により分析した結果、タンタル酸リチウム単結晶中に含有するチタンは0mol%であった。
また、育成したタンタル酸リチウムの単結晶を目視観察したところ、クラックの発生は認められなかった。
Reference example 1
A raw material powder containing only a lithium tantalate raw material was prepared, and the pulling speed of the seed crystal during growth was set to 2.2 mm / hr. Other than that, a lithium tantalate single crystal having a diameter of 25 mm and a straight body length of 25 mm was obtained by the same growing method as in Example 1.
As a result of analyzing this lithium tantalate single crystal by the ICP-MS method, the titanium contained in the lithium tantalate single crystal was 0 mol%.
Moreover, when the grown single crystal of lithium tantalate was visually observed, no crack was observed.

参考例2
タンタル酸リチウム原料に対し酸化チタンをチタンの含有量が2mol%となるように添加して原料粉を作製し、育成時の種結晶の引上げ速度を2.2mm/hrとした。それ以外は、実施例1と同様の育成方法で、φ25mm直胴長25mmのタンタル酸リチウム単結晶を得た。
このタンタル酸リチウム単結晶をICP−MS法により分析した結果、タンタル酸リチウム単結晶中に含有するチタンは0.58mol%であった。
また、育成したタンタル酸リチウム単結晶を目視観察したところ、クラックの発生は認められなかった。
Reference example 2
Titanium oxide was added to the lithium tantalate raw material so that the titanium content was 2 mol% to prepare a raw material powder, and the pulling speed of the seed crystal during growth was set to 2.2 mm / hr. Other than that, a lithium tantalate single crystal having a diameter of 25 mm and a straight body length of 25 mm was obtained by the same growing method as in Example 1.
As a result of analyzing this lithium tantalate single crystal by the ICP-MS method, the titanium contained in the lithium tantalate single crystal was 0.58 mol%.
Moreover, when the grown lithium tantalate single crystal was visually observed, no crack was observed.

比較例1
タンタル酸リチウム原料に対し酸化チタンをチタンの含有量が4mol%となるように添加して原料粉を作製し、育成時の種結晶の引上げ速度を2.2mm/hrとした。それ以外は、実施例1と同様の育成方法でタンタル酸リチウム単結晶を育成した。
このタンタル酸リチウム単結晶をICP−MS法により分析した結果、タンタル酸リチウム単結晶中に含有するチタンは0.58mol%であった。
また、育成したタンタル酸リチウム単結晶を目視観察したところ、クラックの発生が認められた。
Comparative Example 1
Titanium oxide was added to the lithium tantalate raw material so that the titanium content was 4 mol% to prepare a raw material powder, and the pulling speed of the seed crystal during growth was set to 2.2 mm / hr. Other than that, the lithium tantalate single crystal was grown by the same growing method as in Example 1.
As a result of analyzing this lithium tantalate single crystal by the ICP-MS method, the titanium contained in the lithium tantalate single crystal was 0.58 mol%.
Moreover, when the grown lithium tantalate single crystal was visually observed, the occurrence of cracks was observed.

比較例2
タンタル酸リチウム原料に対し酸化チタンをチタンの含有量が6mol%となるように添加して原料粉を作製し、育成時の種結晶の引上げ速度を1.1mm/hrとした。それ以外は、実施例1と同様の育成方法でタンタル酸リチウム単結晶を育成した。
このタンタル酸リチウム単結晶をICP−MS法により分析した結果、タンタル酸リチウム単結晶中に含有するチタンは0.82mol%であった。
また、育成したタンタル酸リチウム単結晶を目視観察したところ、比較例1と同様にクラックの発生が認められた。
Comparative Example 2
Titanium oxide was added to the lithium tantalate raw material so that the titanium content was 6 mol% to prepare a raw material powder, and the pulling speed of the seed crystal during growth was set to 1.1 mm / hr. Other than that, the lithium tantalate single crystal was grown by the same growing method as in Example 1.
As a result of analyzing this lithium tantalate single crystal by the ICP-MS method, the titanium contained in the lithium tantalate single crystal was 0.82 mol%.
Moreover, when the grown lithium tantalate single crystal was visually observed, the occurrence of cracks was observed as in Comparative Example 1.

実施例、参考例、比較例のタンタル酸リチウム単結晶の製造方法のそれぞれにおける、タンタル酸リチウム原料に対するチタン添加量、種結晶の引上げ速度、タンタル酸リチウム単結晶中のチタン含有量、クラック発生有無を次の表1に示す。

Figure 2021070605
In each of the methods for producing a lithium tantalate single crystal of Examples, Reference Examples, and Comparative Examples, the amount of titanium added to the lithium tantalate raw material, the pulling speed of the seed crystal, the titanium content in the lithium tantalate single crystal, and the presence or absence of cracks Is shown in Table 1 below.
Figure 2021070605

10 坩堝
20 坩堝台
30 断熱材
40〜42 耐火物
50 リフレクタ
60 アフター・ヒーター
70 誘導コイル
80 引き上げ軸
81 種結晶保持部
90 載置台
100 チャンバー
110 種結晶
120 原料融液
10 Crucible 20 Crucible stand 30 Insulation material 40-42 Refractory 50 Reflector 60 After heater 70 Induction coil 80 Pull-up shaft 81 Seed crystal holder 90 Mounting stand 100 Chamber 110 Seed crystal 120 Raw material melt

Claims (3)

高周波誘導加熱炉を用いたCz法による酸化物単結晶の育成に際し、タンタル酸リチウム又はニオブ酸リチウムの原料にゲルマニウム、ジルコニウム、チタン、銅から選択される少なくとも1種以上の元素を用いて構成される添加物を添加する酸化物単結晶の育成方法において、
前記原料に前記添加物を3.7mol%以上6mol%以下の含有量となるように添加し、かつ、該添加物の含有量における2mol%からの増加量に応じて、前記原料に前記添加物を添加しないで酸化物単結晶を育成する場合における種結晶の引上げ速度よりも遅い所定範囲の引上げ速度で種結晶を引き上げることを特徴とする酸化物単結晶の育成方法。
When growing an oxide single crystal by the Cz method using a high-frequency induction heating furnace, it is composed of at least one element selected from germanium, zirconium, titanium, and copper as a raw material for lithium tantalate or lithium niobate. In the method for growing an oxide single crystal to which an additive is added,
The additive is added to the raw material so as to have a content of 3.7 mol% or more and 6 mol% or less, and the additive is added to the raw material according to the amount of increase from 2 mol% in the content of the additive. A method for growing an oxide single crystal, which comprises pulling up a seed crystal at a pulling speed in a predetermined range slower than the pulling speed of the seed crystal when growing the oxide single crystal without adding.
前記原料に前記添加物を3.7mol%以上4mol%以下の含有量となるように添加したときには、前記原料に前記添加物を添加しないで酸化物単結晶を育成する場合における種結晶の引上げ速度の1倍未満1/2倍以上の引上げ速度で種結晶を引き上げ、
前記原料に前記添加物を4mol%超6mol%以下の含有量となるように添加したときには、前記原料に前記添加物を添加しないで酸化物単結晶を育成する場合における種結晶の引上げ速度の1/2倍未満1/4倍以上の引上げ速度で種結晶を引き上げることを特徴とする請求項1に記載の酸化物単結晶の育成方法。
When the additive is added to the raw material so as to have a content of 3.7 mol% or more and 4 mol% or less, the pulling speed of the seed crystal in the case of growing an oxide single crystal without adding the additive to the raw material. Pull up the seed crystal at a pulling speed of less than 1 times and 1/2 times or more of
When the additive is added to the raw material so as to have a content of more than 4 mol% and 6 mol% or less, the pulling rate of the seed crystal in the case of growing an oxide single crystal without adding the additive to the raw material is 1. The method for growing an oxide single crystal according to claim 1, wherein the seed crystal is pulled up at a pulling rate of less than / 2 times and 1/4 times or more.
前記添加物は、チタンを用いて構成されることを特徴とする請求項1又は2のいずれかに記載の酸化物単結晶の育成方法。 The method for growing an oxide single crystal according to claim 1 or 2, wherein the additive is composed of titanium.
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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06157198A (en) * 1990-12-28 1994-06-03 Ibiden Co Ltd Ti-containing lithium niobate thin film and its production
WO2007046176A1 (en) * 2005-10-19 2007-04-26 Yamaju Ceramics Co., Ltd. Ferroelectric single crystal, surface acoustic filter making use of the same and process for producing the filter
CN1974888A (en) * 2006-11-11 2007-06-06 南开大学 Zr dopped lithium niobate crystal
US20170253994A1 (en) * 2016-03-01 2017-09-07 Nankai University Bismuth and magnesium co-doped lithium niobate crystal, preparation method thereof and application thereof

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06157198A (en) * 1990-12-28 1994-06-03 Ibiden Co Ltd Ti-containing lithium niobate thin film and its production
WO2007046176A1 (en) * 2005-10-19 2007-04-26 Yamaju Ceramics Co., Ltd. Ferroelectric single crystal, surface acoustic filter making use of the same and process for producing the filter
US20090230817A1 (en) * 2005-10-19 2009-09-17 Yamaju Ceramics Co., Ltd. Ferroelectric single crystal, surface acoustic wave filter comprising the same, and production method thereof
CN1974888A (en) * 2006-11-11 2007-06-06 南开大学 Zr dopped lithium niobate crystal
US20170253994A1 (en) * 2016-03-01 2017-09-07 Nankai University Bismuth and magnesium co-doped lithium niobate crystal, preparation method thereof and application thereof

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