JP2021060612A - Element substrate - Google Patents

Abstract

To provide an element substrate in which an adverse influence due to heat generation from a wire in a bent region is suppressed.SOLUTION: An element substrate includes a flexible base material 70 including an array region including a plurality of transistors and a bent region, a wire 116 disposed on the flexible base material and disposed ranging from the array region to the bent region, and a metal layer 108 formed in accordance with the position where the wire is disposed and overlapping with the wire through an insulating layer 96 in the bent region. The wire has narrower line width in the bent region than that outside the bent region. The metal layer is disposed in accordance with the part where the wire has the narrow line width.SELECTED DRAWING: Figure 7B

Description

The present invention relates to a device substrate.

In recent years, in display devices (element substrates) having a display area such as organic electroluminescence (EL) display devices and liquid crystal display devices, development of a flexible display capable of bending a display panel using a flexible base material. Is underway.

For example, as disclosed in Patent Document 1 below, it has been proposed to bend the mounting portion of an integrated circuit (IC) or a flexible printed circuit board (FPC) to the back side of a display area to narrow the frame.

Japanese Unexamined Patent Publication No. 2016-31499

For example, in the element substrate, the wiring is arranged on the substrate. However, the display panel may be damaged due to heat generation of the wiring in the vicinity of the bending region.

In view of the above, an object of the present invention is to provide an element substrate in which adverse effects due to heat generation of wiring in a bent region are suppressed.

The element substrate according to the present invention is arranged on a flexible base material having an array region having a plurality of transistors and a bending region, and the flexible base material, and extends from the array region to the bending region. It has a wiring to be arranged and a metal layer formed corresponding to a position where the wiring is arranged in the bending region and superposed on the wiring via an insulating layer. The wiring has a narrower line width in the bending region than the line width outside the bending region, and the metal layer is arranged corresponding to a portion where the line width of the wiring is narrow.

It is a schematic diagram which shows the schematic structure of the organic EL display device which concerns on one Embodiment of this disclosure. It is a schematic plan view which shows an example of the display panel of the organic EL display apparatus shown in FIG. It is a figure which shows an example of the cross section III-III of FIG. It is a figure which shows an example of the AA cross section of FIG. It is a figure which shows an example of the BB cross section of FIG. It is a top view which shows an example of the arrangement state of the wiring of the area C surrounded by the broken line of FIG. It is a top view which shows an example of the relationship between a wiring and a heat dissipation layer. It is sectional drawing which shows an example of the relationship between a wiring and a radiating zone. It is sectional drawing which shows the relationship between the wiring and a radiating zone in another embodiment of this disclosure.

Hereinafter, embodiments of the present disclosure will be described with reference to the drawings. It should be noted that the present disclosure is merely an example, and those skilled in the art can easily conceive of appropriate changes while maintaining the gist of the invention are naturally included in the scope of the present invention. Further, in order to clarify the explanation, the drawings may be schematically evaluated with respect to the width, thickness, shape, etc. of each part as compared with the actual embodiment, but this is just an example and the interpretation of the present invention. Is not limited to. Further, in the present specification and each figure, the same elements as those described above with respect to the above-mentioned figures may be designated by the same reference numerals and detailed description thereof may be omitted as appropriate.

FIG. 1 is a schematic diagram showing a schematic configuration of a display device (device including an element substrate) according to one embodiment of the present disclosure, using an organic EL display device as an example. The organic EL display device 2 includes a pixel array unit 4 for displaying an image and a drive unit for driving the pixel array unit 4. The organic EL display device 2 is a flexible display using a resin film as a base material, and a laminated structure such as a thin film transistor (TFT) or an organic light emitting diode (OLED) is formed on the base material made of the resin film. To. The schematic diagram shown in FIG. 1 is an example, and the present embodiment is not limited to this.

In the pixel array unit 4, the OLED 6 and the pixel circuit 8 are arranged in a matrix corresponding to the pixels. The pixel circuit 8 is composed of a plurality of TFTs 10 and 12 and a capacitor 14.

The drive unit includes a scanning line drive circuit 20, a video line drive circuit 22, a drive power supply circuit 24, and a control device 26, and drives the pixel circuit 8 to control the light emission of the OLED 6.

The scanning line drive circuit 20 is connected to scanning signal lines 28 provided for each horizontal arrangement (pixel row) of pixels. The scanning line drive circuit 20 sequentially selects scanning signal lines 28 according to a timing signal input from the control device 26, and applies a voltage for turning on the lighting TFT 10 to the selected scanning signal lines 28.

The video line drive circuit 22 is connected to a video signal line 30 provided for each vertical arrangement (pixel array) of pixels. The video line drive circuit 22 receives a video signal from the control device 26, and sets a voltage corresponding to the video signal of the selected pixel line according to the selection of the scan signal line 28 by the scan line drive circuit 20 for each video signal line. Output to 30. The voltage is written to the capacitor 14 via the lighting TFT 10 at the selected pixel row. The drive TFT 12 supplies the OLED 6 with a current corresponding to the written voltage, whereby the OLED 6 having pixels corresponding to the selected scanning signal line 28 emits light.

The drive power supply circuit 24 is connected to a drive power supply line 32 provided for each pixel row, and supplies a current to the OLED 6 via the drive power supply line 32 and the drive TFT 12 of the selected pixel row.

Here, the lower electrode of the OLED 6 is connected to the drive TFT 12. On the other hand, the upper electrode of each OLED 6 is composed of an electrode common to all pixel OLEDs 6. When the lower electrode is configured as an anode (anode), a high potential is input, and the upper electrode becomes a cathode (cathode) and a low potential is input. When the lower electrode is configured as a cathode (cathode), a low potential is input, and the upper electrode becomes an anode (anode) and a high potential is input.

FIG. 2 is a schematic plan view showing an example of a display panel of the organic EL display device shown in FIG. The pixel array unit 4 shown in FIG. 1 is provided in the display area 42 of the display panel 40, and the OLED 6 is arranged in the pixel array unit 4 as described above. As described above, the upper electrodes constituting the OLED 6 are formed in common with each pixel and cover the entire display area 42.

A component mounting area 46 is provided on one side of the rectangular display panel 40, and wiring connected to the display area 42 is arranged. A driver IC 48 constituting a drive unit is mounted on the component mounting area 46, or an FPC 50 is connected to the component mounting area 46. The FPC 50 is connected to a control device 26 or other circuits 20, 22, 24, etc., or an IC is mounted on the control device 26.

FIG. 3 is a diagram showing an example of a cross section III-III of FIG. The display panel 40 has a structure in which a circuit layer 74 on which a TFT 72 or the like is formed, a sealing layer 106 for sealing the OLED 6 and the OLED 6 and the like are laminated on a base material 70 made of a resin film. As the resin film constituting the base material 70, for example, a polyimide-based resin film is used. A protective layer (not shown) is formed on the sealing layer 106. In the present embodiment, the pixel array unit 4 is a top emission type, and the light generated by the OLED 6 is emitted to the side opposite to the base material 70 side (upward in FIG. 3). When the colorization method in the organic EL display device 2 is a color filter method, for example, a color filter is arranged between the sealing layer 106 and the protective layer (not shown) or on the opposite substrate side. To. By passing the white light generated by the OLED 6 through this color filter, for example, red (R), green (G), and blue (B) light is produced.

The pixel circuit 8, the scanning signal line 28, the video signal line 30, the drive power supply line 32, and the like described above are formed in the circuit layer 74 of the display area 42. At least a part of the drive unit can be formed on the base material 70 as a circuit layer 74 in a region adjacent to the display region 42. As described above, the driver IC 48 and the FPC 50 constituting the drive unit can be connected to the wiring 116 of the circuit layer 74 in the component mounting area 46.

As shown in FIG. 3, a base layer 80 formed of an inorganic insulating material is arranged on the base material 70. As the inorganic insulating material, for example, silicon nitride (SiNy), silicon oxide (SiOx), and a composite thereof are used.

In the display region 42, a semiconductor region 82 serving as a channel portion and a source / drain portion of the top gate type TFT 72 is formed on the base material 70 via the base layer 80. The semiconductor region 82 is formed of, for example, polysilicon (p—Si). The semiconductor region 82 is formed, for example, by providing a semiconductor layer (p—Si film) on the base material 70, patterning the semiconductor layer, and selectively leaving a portion used in the circuit layer 74.

A gate electrode 86 is arranged on the channel portion of the TFT 72 via a gate insulating film 84. The gate insulating film 84 is typically formed of TEOS. The gate electrode 86 is formed by patterning, for example, a metal film formed by sputtering or the like. An interlayer insulating layer 88 is arranged on the gate electrode 86 so as to cover the gate electrode 86. The interlayer insulating layer 88 is formed of, for example, the above-mentioned inorganic insulating material. Impurities are introduced into the semiconductor region 82 (p-Si), which is the source / drain portion of the TFT 72, by ion implantation, and a source electrode 90a and a drain electrode 90b electrically connected to them are formed to form the TFT 72. Will be done.

An interlayer insulating film 92 is arranged on the TFT 72. Wiring 94 is arranged on the surface of the interlayer insulating film 92. The wiring 94 is formed by, for example, patterning a metal film formed by sputtering or the like. The metal film forming the wiring 94 and the metal film used for forming the gate electrode 86, the source electrode 90a, and the drain electrode 90b include, for example, the wiring 116 and the scanning signal line 28 and the video signal line 30 shown in FIG. The drive power supply line 32 can be formed with a multi-layer wiring structure. A flattening film 96 and a passivation film 98 are formed on the flattening film 96 and a passivation film 98 by a resin material or the like, and an OLED 6 is formed on the passivation film 98 in the display region 42. The passivation film 98 is formed of, for example, an inorganic insulating material such as SiNy.

The OLED 6 includes a lower electrode 100, an organic material layer 102 and an upper electrode 104. Specifically, the organic material layer 102 includes a hole transport layer, a light emitting layer, an electron transport layer, and the like. The OLED 6 is typically formed by laminating the lower electrode 100, the organic material layer 102, and the upper electrode 104 in this order from the base material 70 side. In the present embodiment, the lower electrode 100 is the anode (anode) of the OLED 6, and the upper electrode 104 is the cathode (cathode).

Assuming that the TFT 72 shown in FIG. 3 is a drive TFT 12 having n channels, the lower electrode 100 is connected to the source electrode 90a of the TFT 72. Specifically, after the flattening film 96 is formed, the contact hole 110 for connecting the lower electrode 100 to the TFT 72 is formed, and for example, the conductor portion formed on the surface of the flattening film 96 and in the contact hole 110. By patterning the 111, the lower electrode 100 connected to the TFT 72 is formed for each pixel. The lower electrode is formed of, for example, a transparent conductive material such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide), or a metal such as Ag or Al.

Ribs 112 that separate pixels are arranged on the structure. For example, after the lower electrode 100 is formed, the rib 112 is formed at the pixel boundary, and the organic material layer 102 and the upper electrode 104 are laminated on the effective region of the pixel (the exposed region of the lower electrode 100) surrounded by the rib 112. To. The upper electrode 104 is formed of, for example, an ultrathin alloy of Mg and Ag or a permeable conductive material such as ITO or IZO.

A sealing layer 106 is arranged on the upper electrode 104 so as to cover the entire display region 42. The sealing layer 106 has a laminated structure including a first sealing film 161, a sealing flattening film 160, and a second sealing film 162 in this order. The first sealing film 161 and the second sealing film 162 are formed of an inorganic material (for example, an inorganic insulating material). Specifically, it is formed by forming a SiNy film by a chemical vapor deposition (CVD) method. The sealing flattening film 160 is formed by using an organic material (for example, a resin material such as a curable resin composition). On the other hand, the sealing layer 106 is not arranged in the bending region 120 and the component mounting region 46.

4 is a diagram showing an example of an AA cross section of FIG. 2, FIG. 5 is a diagram showing an example of a BB cross section of FIG. 2, and FIG. 6 is a wiring of a region C surrounded by a broken line in FIG. It is a top view which shows an example of the arrangement state of.

Specifically, FIG. 4 shows a schematic cross-sectional view around the frame area 44. The frame area 44 is an area surrounding the display area 42, and is different from the display area 42 in that, for example, the TFT 72 and the OLED 6 are not included. Electrical wiring and the like are formed in the circuit layer 74 of the frame region 44. Then, the sealing layer 106 is arranged on the circuit layer 74 via the passivation film 98. A dam 97 surrounding the display area 42 is formed in the frame region 44, and a first sealing film 161 and a second sealing film 162 are formed so as to cover the dam 97. The sealing flattening film 160 is housed inside the dam 97 (on the display region 42 side).

Specifically, FIG. 5 shows a schematic cross-sectional view along the video signal line 30 around the bending region 120. As shown in FIG. 3, the display panel 40 can be manufactured by keeping the base material 70 flat, but when it is stored in the housing of the organic EL display device 2, for example, it is outside the display area 42. A bending region 120 is provided so that the component mounting region 46 is arranged on the back side of the display region 42.

In the bending region 120, it is preferable to omit or thin the layers (for example, the base layer 80, the interlayer insulating layer 88, the interlayer insulating film 92, and the passivation film 98) formed of the inorganic insulating material. This is because the layer formed of the inorganic insulating material tends to be easily damaged by bending. In the illustrated example, in the bending region 120, the wiring 116 is arranged on the base layer 80 that has been thinned (specifically, a thin region 80a is partially formed by etching or the like).

In the bending region 120, the wiring 116 (scanning signal line 28, video signal line 30, drive power supply line 32) has a curved bending shape as shown in FIG. 6 so as to correspond to the bending of the display panel 40. As the bending shape, for example, a grid / mesh type or the like is adopted in addition to the waveform shown in the illustrated example.

The drive power supply line 32 is usually linear, and the wiring width is set to be as wide as several hundred μm to several mm, but the wiring width of the bending region 120 is, for example, as narrow as several μm to ten and several μm. Is set to. As shown in FIG. 6, the width of the drive power supply line 32 is switched from wide to narrow with the bending region 120 as a boundary.

FIG. 7A is a plan view showing an example of the relationship between the wiring and the heat radiation layer, and FIG. 7B is a cross-sectional view showing an example of the relationship between the wiring and the radiation layer. In the bending region 120, a heat radiating layer 108 is formed on the wiring 116 (drive power supply line 32) via a flattening film (resin film) 96. The heat radiating layer 108 is made of, for example, a metal material. The heat radiating layer 108 can be formed, for example, when forming the electrodes of the OLED 6. Specifically, when the lower electrode (anode) 100 is formed, it can be formed of a metal (for example, Ag, Al) constituting the lower electrode.

The heat radiating layer 108 is formed along a direction intersecting the wiring direction of the wiring 116. In the illustrated example, for example, from the viewpoint of suppressing cracking due to bending, a plurality of heat radiating layers 108 are formed in parallel at predetermined intervals. In this case, the width of the heat radiating layer 108 is set to, for example, several μm to several tens of μm. The length of the heat radiating layer 108 is set to exceed, for example, the width of the drive power supply line 32. Unlike the illustrated example, for example, one heat radiating layer may be formed to be wide, or a heat radiating layer having a predetermined pattern may be formed. The heat radiating layer 108 is preferably formed at least corresponding to a portion where the wiring width is switched from wide to narrow.

In the bending region 120, for example, the bending of the wiring 116 extends the wiring length and increases the wiring resistance. Further, since the wiring 116 is arranged in parallel on the thinned base layer 80, the wiring can be narrowed as described above. Therefore, in the bending region 120, an adverse effect due to heat generation is likely to occur. In particular, heat can be locally generated at a portion where the width is narrow and switches to a bent shape (specifically, a portion where the wiring width is switched to a narrow width and then advanced by several mm). On the other hand, the base layer 80 and the flattening film 96 have a small heat capacity. As described above, by arranging the heat radiating layer 108, heat radiating can be promoted and adverse effects due to heat generation can be suppressed. Further, according to the formation of the heat radiating layer 108, it is possible to contribute to the reduction of the manufacturing cost and the thinning of the panel as compared with the form in which a separate member such as a heat radiating sheet is provided.

In the illustrated example, the thickness of the resin film 96 arranged on the wiring 116 is thinner than the thickness of the flattening film 96 of the display area 42. The thickness of the resin film 96 arranged on the wiring 116 can be appropriately determined in consideration of, for example, the bending state of the display panel 40, the degree of heat dissipation of the wiring 116, and the like.

FIG. 8 is a cross-sectional view of a bending region according to another embodiment of the present disclosure. The present embodiment differs from the above embodiment in that the heat radiating layer 108 is arranged closer to the base material 70 than the wiring 116. Specifically, the heat radiating layer 108 is formed on the base layer 80, the interlayer insulating film 92 is formed so as to cover the heat radiating layer 108, and the wiring 116 is arranged on the interlayer insulating film 92. In this case, the heat dissipation layer 108 can be formed, for example, when the gate electrode 86 is formed in the display region 42.

The present invention is not limited to the above embodiment, and various modifications are possible. For example, it can be replaced with a configuration that is substantially the same as the configuration shown in the above embodiment, a configuration that exhibits the same action and effect, or a configuration that can achieve the same purpose.

2 Organic EL display device, 4 pixel array unit, 6 OLED, 8 pixel circuit, 10 lighting TFT, 12 drive TFT, 14 capacitor, 20 scanning line drive circuit, 22 video line drive circuit, 24 drive power supply circuit, 26 control device, 28 scanning signal line, 30 video signal line, 32 drive power supply line, 40 display panel, 42 display area, 44 frame area, 46 component mounting area, 48 driver IC, 50 FPC, 70 base material, 72 TFT, 80 base layer, 82 semiconductor region, 84 gate insulating film, 86 gate electrode, 88 interlayer insulating layer, 90a source electrode, 90b drain electrode, 92 interlayer insulating film, 94 wiring, 96 flattening film, 98 passivation film, 100 lower electrode, 102 organic material Layers, 104 upper electrodes, 106 sealing layers, 108 heat dissipation layers, 110 contact holes, 111 conductors, 112 ribs, 116 wirings, 120 bending regions.

Claims (6)

A flexible substrate having an array region having a plurality of transistors and a bending region,
Wiring arranged on the flexible substrate and arranged from the array region to the bending region.
In the bending region, a metal layer formed corresponding to a position where the wiring is arranged and superposed on the wiring via an insulating layer is provided.
The wiring has a narrower line width inside the bending region than the line width outside the bending region.
The metal layer is an element substrate that is arranged corresponding to a portion where the line width of the wiring is narrow. The element substrate according to claim 1, wherein a plurality of the metal layers are juxtaposed at predetermined intervals in the bending direction. The wiring includes a power line and
The element substrate according to claim 1, wherein the metal layer is arranged so as to overlap with at least the power supply line. The element substrate according to claim 1, wherein the wiring has a bent shape in the bent region. The element substrate according to claim 1, wherein in the bending region, the extending direction of the wiring and the extending direction of the metal layer intersect each other. The element substrate according to claim 1, wherein the insulating layer is made of a material having a heat capacity smaller than that of the material for forming the metal layer.

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