JP2021051892A - Charged particle beam device - Google Patents

Abstract

To provide a charged particle beam device capable of protecting the aperture from damage caused by an ion beam outside a sample irradiation time.SOLUTION: A charged particle beam device 10 includes an ion source 21 and ion optics 22. The ion optics 22 include a condenser lens 32 that focuses an ion beam generated from the ion source 21, a movable diaphragm 35 that regulates a current value of the ion beam, and a blocking device 33 that switches between blocking and passing of the ion beam between the condenser lens 32 and the movable diaphragm 35. The blocking device 33 includes a blocking member 33a that blocks the ion beam, and a drive mechanism 33b that moves the blocking member 33a forward and backward between the insertion position and the exit position along a direction orthogonal to the optical axis of the ion beam.SELECTED DRAWING: Figure 1

Description

The present invention relates to a charged particle beam device.

Conventionally, a focused ion beam (FIB) device that suppresses damage to a thin plate aperture provided in an ion optical system in a focused ion beam lens barrel due to irradiation of an ion beam outside the sample irradiation time has been known. ing.
For example, a focused ion beam device that deflects an ion beam out of the aperture by a blanking electrode is known (see, for example, Patent Document 1).
For example, there is known a focused ion beam device that expands the beam diameter by lowering the voltage of a condenser lens that focuses the ion beam and reduces the beam irradiation amount per unit area of the aperture (see, for example, Patent Document 2). ).
For example, a focused ion beam device that eliminates the ion beam or reduces the beam irradiation dose by lowering the voltage of the extraction electrode that draws the ion beam from the ion source or the voltage of the control electrode that constantly controls the ion beam extracted from the ion source. Is known (see, for example, Patent Document 2).
For example, there is known a focused ion beam device that lowers the beam energy by lowering the acceleration voltage of the ion beam drawn from the ion source (see, for example, Patent Document 3).
For example, there is known a focused ion beam device that reduces the energy of an ion beam incident on a throttle by applying a voltage to the throttle (see, for example, Patent Document 4).

Japanese Unexamined Patent Publication No. 63-237342 Japanese Unexamined Patent Publication No. 2008-34371 Japanese Unexamined Patent Publication No. 2013-214502 Japanese Unexamined Patent Publication No. 2009-187852

By the way, in the focused ion beam device as described above, there are problems such as a long operation time required to protect the diaphragm, an inability to sufficiently reduce the beam irradiation amount for the diaphragm, or a restriction on the layout of the optical system. There is a risk.
For example, when a blanking electrode is used, a space for arranging the blanking electrode on the upstream side of the diaphragm is required, which may limit the layout of the optical system in the lens barrel.
For example, when the voltage of the condenser lens is lowered, the beam irradiation amount to the diaphragm may not be sufficiently lowered.
For example, when the voltage of the extraction electrode or the control electrode or the acceleration voltage is lowered, the operating time required for changing the voltage may become long.
For example, when a voltage is applied to the diaphragm, the beam irradiation amount to the diaphragm may not be sufficiently reduced depending on the magnitude of the voltage.

An object of the present invention is to provide a charged particle beam device capable of protecting a diaphragm from damage caused by an ion beam outside the sample irradiation time.

In order to solve the above problems, the charged particle beam device according to the present invention has a charged particle source, an aperture for narrowing a beam of charged particles generated from the charged particle source, and an interval between the charged particle source and the aperture. It is provided with a blocking device for switching between blocking and passing the beam of the charged particles.

In the above configuration, the blocking device may include a blocking member that blocks the beam of the charged particles and a driving mechanism that advances and retreats the blocking member along a direction intersecting the traveling direction of the beam of the charged particles. ..

In the above configuration, the blocking device comprises at least a pair of blocking members and at least one driving mechanism, the at least one driving mechanism having at least the pair of blocking members of a beam of the charged particles. It may advance and retreat synchronously in opposite directions along the direction intersecting the traveling direction.

In the above configuration, the blocking device includes a blocking member that blocks the beam of the charged particles and a driving mechanism that rotates the blocking member around a rotation axis extending along a direction intersecting the traveling direction of the beam of the charged particles. And may be provided.

In the above configuration, the drive mechanism may allow the beam of the charged particles to pass through a through hole formed in the blocking member.

In the above configuration, a condenser lens arranged upstream of the blocking device in the traveling direction of the beam of the charged particles to focus the beam of the charged particles, and when the beam of the charged particles is blocked by the blocking device when passing through. A control device for lowering the voltage of the condenser lens may be provided as compared with the control device.

In the above configuration, when the irradiation of the beam of the charged particles to the sample is stopped and the irradiation of the beam of the charged particles to the sample is not expected to be restarted, the blocking device blocks the beam of the charged particles. The device may be provided.

In the above configuration, the control device may prohibit the blocking device from blocking the beam of the charged particles when avoiding the occurrence of vibration accompanying the operation of the blocking device.

According to the present invention, the diaphragm is protected from damage caused by the beam of charged particles outside the sample irradiation time by providing a blocking device that switches between blocking and passing the beam of charged particles between the charged particle source and the diaphragm. Is possible.

The figure which shows the structure of the charged particle beam apparatus in embodiment of this invention. The figure which shows the structure of the cutoff device of the charged particle beam device in the 1st modification of embodiment of this invention. The figure which shows the structure of the cutoff device of the charged particle beam device in the 2nd modification of the embodiment of this invention. The figure which shows the structure of the cutoff device of the charged particle beam device in the 3rd modification of the embodiment of this invention.

Hereinafter, the charged particle beam apparatus according to the embodiment of the present invention will be described with reference to the accompanying drawings.

(Charged particle beam device)
FIG. 1 is a diagram showing a configuration of a charged particle beam device 10 according to an embodiment.
The charged particle beam device 10 is, for example, a focused ion beam device. The charged particle beam device 10 includes a sample chamber 11, a stage (sample table) 12, a stage drive mechanism 13, a detector 14, a gas supply unit 15, a focused ion beam barrel 16, a display device 17, and the like. An input device 18 and a control device 19 are provided.
The inside of the sample chamber 11 is maintained in a reduced pressure state. The stage 12 is arranged inside the sample chamber 11. The stage 12 fixes the sample S. The stage drive mechanism 13 moves and rotates the stage 12 in response to a control command from the control device 19.

The detector 14 is fixed to the sample chamber 11. The detector 14 is, for example, a secondary charged particle detector that detects secondary charged particles (secondary electrons and secondary ions) generated from the sample S by irradiation with a focused ion beam.
The gas supply unit 15 is fixed to the sample chamber 11. The gas supply unit 15 supplies the etching gas, the deposition gas, and the like to the sample S. The etching gas selectively promotes the etching of the sample S by the focused ion beam according to the material of the sample S. The deposition gas forms a deposition film of deposits such as metal or insulator on the surface of the sample S.

The focused ion beam lens barrel 16 is fixed to the sample chamber 11. The focused ion beam lens barrel 16 includes an ion source 21 and an ion optical system 22. The ion source 21 generates an ion beam. The ion optical system 22 focuses, deflects, and corrects the ion beam generated from the ion source 21. The ion optical system 22 includes, for example, an angle diaphragm 31 sequentially arranged from the ion source 21 side toward the emission end 16a side (that is, the sample S side) of the focused ion beam lens barrel 16, a condenser lens 32, and a blocking device. It includes 33, a movable diaphragm 35, a blanking electrode 36, an alignment electrode 37, a stigmeter 38, a deflector 39, and an objective lens 40. For example, the angle diaphragm 31, the condenser lens 32, the blocking device 33, and the movable diaphragm 35 are arranged outside the sample chamber 11. The blanking electrode 36, the alignment electrode 37, the stig meter 38, the deflector 39, and the objective lens 40 are arranged inside the sample chamber 11.

The angle diaphragm 31 regulates the emission angle of the ion beam generated from the ion source 21. For example, the angle diaphragm 31 includes a mechanism for changing the diameter (aperture diameter) of the opening through which the ion beam passes.
The condenser lens 32 is, for example, an electrostatic lens including three electrodes arranged along the optical axis. The condenser lens 32 focuses the ion beam that has passed through the angle diaphragm 31.
The blocking device 33 switches between blocking and passing the ion beam. The blocking device 33 includes, for example, a blocking member 33a and a drive mechanism 33b.

The outer shape of the blocking member 33a is, for example, a circular or polygonal plate shape. The blocking member 33a is formed of, for example, the same material as the ion source 21 or the angle diaphragm 31, or a material that is not easily damaged by irradiation with an ion beam. For example, the blocking member 33a is formed of a metal having a coating layer of tungsten or gallium, glassy carbon, or the like. The blocking member 33a is at least larger than the through hole 35a of the movable diaphragm 35. The movable diaphragm 35 will be described later. The thickness of the blocking member 33a in the traveling direction of the ion beam is about several mm, for example, 1 mm or more.
The blocking member 33a is displaced between the insertion position between the condenser lens 32 and the movable diaphragm 35 and the exit position away from the insertion position. The insertion position is a position where the blocking member 33a shields the through hole 35a of the movable diaphragm 35 in the traveling direction of the ion beam, for example, a position immediately before the through hole 35a of the movable diaphragm 35 on the optical axis of the ion beam. .. The exit position is a position where the blocking member 33a releases the shielding of the through hole 35a of the movable diaphragm 35, such as a position deviated from the position immediately before the through hole 35a of the movable diaphragm 35 on the optical axis of the ion beam. is there.

The drive mechanism 33b is, for example, an air cylinder or an electric cylinder. For example, the air cylinder may be provided with a cushion mechanism or a damper mechanism for shock absorption. The drive mechanism 33b moves the blocking member 33a forward and backward between the insertion position and the exit position along a direction intersecting the traveling direction of the ion beam according to a control command from the control device 19. The direction intersecting the traveling direction of the ion beam is, for example, a direction orthogonal to the optical axis of the ion beam. The moving distance of the blocking member 33a by the drive mechanism 33b is, for example, about several mm in the range of 1 mm to 10 mm. The moving time of the blocking member 33a by the driving mechanism 33b, that is, the time required for switching between blocking and passing the ion beam is less than 1s in the range of, for example, 0.1s to 1s.

The movable diaphragm 35 regulates the current value of the ion beam by any one of a plurality of apertures (through holes) 35a having different sizes. The movable diaphragm 35 includes, for example, a diaphragm member 35b and a drive mechanism 35c.

The outer shape of the diaphragm member 35b is, for example, a plate shape in which a plurality of apertures 35a having different sizes are arranged side by side in a predetermined arrangement direction. For example, the thickness of the diaphragm member 35b in the traveling direction of the ion beam is an appropriate value in the range of several tens of μm to several hundreds of μm.
The drive mechanism 35c is, for example, an electric cylinder or the like. The drive mechanism 35c moves the diaphragm member 35b forward and backward along a direction intersecting the traveling direction of the ion beam according to a control command from the control device 19. The drive mechanism 35c aligns the center of any of a plurality of differently sized apertures 35a with the optical axis of the ion beam.

The blanking electrode 36 includes, for example, a pair of electrodes arranged so as to sandwich the optical axis from both sides in a direction intersecting the traveling direction of the ion beam. The blanking electrode 36 switches whether or not the sample S is irradiated with an ion beam. For example, the blanking electrode 36 blocks irradiation of the sample S by deflecting the ion beam, and allows irradiation of the sample S by not deflecting the ion beam.
The alignment electrode 37 includes, for example, a plurality of electrodes arranged in a tubular shape so as to surround the optical axis of the ion beam. The alignment electrode 37 aligns the deviation of the orbit of the ion beam with the optical axis of the lens system.

The stig meter 38 includes, for example, a plurality of electrodes arranged in a tubular shape so as to surround the optical axis of the ion beam. The stig meter 38 corrects the distortion of the cross-sectional shape of the ion beam by correcting the astigmatism of the ion beam.
The deflector 39 includes, for example, a plurality of electrodes arranged in a tubular shape so as to surround the optical axis of the ion beam. The deflector 39 scans the irradiation position of the ion beam with respect to the sample S.
The objective lens 40 is, for example, an electrostatic lens including three electrodes arranged along the optical axis. The objective lens 40 focuses the ion beam on the sample S.

The display device 17 is a screen for executing various information of the charged particle beam device 10, image data generated by a signal output from the detector 14, and operations such as enlargement, reduction, movement, and rotation of the image data. Etc. are displayed.
The input device 18 is, for example, a mouse, a keyboard, or the like that outputs a signal corresponding to an input operation of the operator.
The control device 19 integrally controls the operation of the charged particle beam device 10 by, for example, a signal output from the input device 18 or a signal generated by a preset automatic operation control process.

The control device 19 is a blocking device when the irradiation of the sample S with a series of ion beams for processing or observation is completed, or when the irradiation of the ion beam is stopped and the irradiation of the ion beam with the sample S is not expected to be resumed. The ion beam is blocked by 33. When the irradiation is not expected to be restarted, for example, the irradiation of the ion beam to the sample S is stopped for a predetermined time or longer. The predetermined time is, for example, about several minutes in the range of 5 min to 10 min. When the irradiation restart is not expected, for example, an operation other than the irradiation restart of the ion beam on the sample S can be executed by a signal output from the input device 18 or a signal generated by a preset automatic operation control process. If instructed. The operation other than the irradiation restart is, for example, the setting of the processing frame.
The control device 19 prohibits the blocking device 33 from blocking the ion beam when the blocking device 33 avoids the occurrence of vibration due to the operation of the drive mechanism 33b in the passing state of the ion beam. The case of avoiding the occurrence of vibration is, for example, the case where the sample S is irradiated by another charged particle beam lens barrel such as an electron beam lens barrel fixed to the sample chamber 11.

As described above, the charged particle beam device 10 of the embodiment includes a blocking device 33 that switches between blocking and passing the ion beam between the condenser lens 32 and the movable diaphragm 35, whereby the movable diaphragm is provided outside the sample irradiation time. The movable diaphragm 35 can be protected from damage caused by the ion beam without having to change the position and orientation of the 35. The cutoff device 33 includes a drive mechanism 33b for moving the cutoff member 33a forward and backward along the direction orthogonal to the optical axis, so that the ion beam can be changed as compared with the case where the voltage such as the extraction voltage, the control voltage, or the acceleration voltage is changed. You can quickly switch between blocking and passing. Since the thickness of the blocking member 33a in the traveling direction of the ion beam is about several mm, the focused ion beam lens barrel 16 is compared with an optical device such as a blanking electrode 36 having a size of about several tens of mm, for example. It is possible to suppress restrictions on the layout of the optical system inside. The movable diaphragm 35 can be shielded from the ion beam without the need to dispose a specific optical device such as the blanking electrode 36 on the upstream side of the movable diaphragm 35.
Since the blocking member 33a is made of the same material as the ion source 21 or the angle throttle 31, or a material that is not easily damaged by irradiation with an ion beam, impurities due to suspended particles such as sputtered particles and gas are an ion source. It is possible to suppress the invasion into the inside of the 21.

By providing a control device 19 for blocking the ion beam by the blocking device 33 when the irradiation of the sample S with a series of ion beam for processing or observation is completed, the blocking member 33a is repeated excessively during processing or observation. It is possible to suppress the adverse effect of vibration generated by being moved on processing or observation.
Unlike the sluice valve, for example, the blocking member 33a does not require a vacuum sealing material, so that the vacuum sealing material is not consumed and dust is not generated from the vacuum sealing material due to contact.

(Modification example)
Hereinafter, a modified example of the embodiment will be described.
In the above-described embodiment, the blocking device 33 includes one blocking member 33a that moves forward and backward, but is not limited to this, and includes at least one pair of blocking members 33a that move backward and backward synchronously in opposite directions. You may.
FIG. 2 is a diagram showing a configuration of a blocking device 33 of the charged particle beam device 10 in the first modification of the embodiment.
As shown in FIG. 2, the charged particle beam device 10 of the first modification includes a pair of blocking devices 33. The pair of blocking devices 33 are arranged so as to face each other in a direction intersecting the traveling direction of the ion beam. The outer shape of each blocking member 33a of the pair of blocking devices 33 is, for example, an L-shaped bent plate when viewed from the moving direction of each blocking member 33a and the direction orthogonal to the optical axis of the ion beam. The pair of blocking members 33a are arranged so that their tip portions overlap each other when viewed from the traveling direction of the ion beam without contacting each other at the insertion position. The mutual drive mechanisms 33b of the pair of blocking devices 33, for example, move the blocking members 33a back and forth synchronously in opposite directions along the direction orthogonal to the optical axis of the ion beam. In addition, one drive mechanism 33b may operate a pair of blocking members 33a as described above via a link mechanism or the like.
According to the first modification, by providing a pair of blocking devices 33 having momentums of the same magnitude in opposite directions, the momentum of the pair of blocking devices 33 can be reduced to zero as a whole. The vibrations when driving each other can be canceled out.

In the first modification described above, a pair of blocking devices 33 having the same momentum in opposite directions are provided, but the present invention is not limited to this.
FIG. 3 is a diagram showing a configuration of a blocking device 33 of the charged particle beam device 10 in the second modification of the embodiment.
As shown in FIG. 3, the charged particle beam device 10 of the second modification includes a pair of blocking devices 33 arranged so as to be displaced in the traveling direction of the ion beam. The mutual blocking members 33a of the pair of blocking devices 33 are arranged so that the tip portions of the pair of blocking devices 33 do not come into contact with each other at the insertion position and are overlapped with each other when viewed from the traveling direction of the ion beam. The mutual drive mechanisms 33b of the pair of blocking devices 33, for example, are mutually synchronously blocking members 33a between the insertion position and the exit position along a direction parallel to each other orthogonal to the optical axis of the ion beam. Move forward and backward.

In the above-described embodiment, the blocking device 33 includes a blocking member 33a that moves forward and backward, but the blocking member 33 is not limited to this, and the blocking member rotates around a rotation axis extending along a direction intersecting the traveling direction of the ion beam. May be provided.
FIG. 4 is a diagram showing a configuration of a blocking device 41 of the charged particle beam device 10 in the third modification of the embodiment.
As shown in FIG. 4, the charged particle beam device 10 of the third modification includes a blocking device 41. The blocking device 41 includes, for example, a blocking member 41a and a drive mechanism 41b.

The outer shape of the blocking member 41a is, for example, a columnar shape. A through hole 41c through which an ion beam passes in a direction orthogonal to the central axis is formed at the tip of the blocking member 41a. The diameter Φa of the blocking member 41a and the diameter Φb of the through hole 41c are values corresponding to the diameter of the through hole 35a of the movable diaphragm 35. At least the diameter Φa of the blocking member 41a is larger than the diameter of the through hole 35a of the movable diaphragm 35. For example, the diameter Φa of the blocking member 41a is about 3 mm, and the diameter Φb of the through hole 41c of the blocking member 41a is about 2 mm. The blocking member 41a is arranged so that the central axis is orthogonal to the optical axis of the ion beam and the center of the through hole 41c coincides with the optical axis in the passing state of the ion beam.

The drive mechanism 41b is, for example, a magnetic coupling type rotary introduction machine or the like. The drive mechanism 41b rotates the blocking member 41a around the rotation axis O extending along the direction intersecting the traveling direction of the ion beam according to the control command from the control device 19. For example, the rotation axis O of the drive mechanism 41b and the central axis of the blocking member 41a are the same. The drive mechanism 41b switches between blocking and passing the ion beam by rotating the blocking member 41a around the central axis by at least a predetermined angle θ. The predetermined angle θ is a rotation angle corresponding to the diameter Φa of the blocking member 41a and the diameter Φb of the through hole 41c. For example, when the diameter Φa of the blocking member 41a is about 3 mm and the diameter Φb of the through hole 41c is about 2 mm, the predetermined angle θ is about 45 °. For example, when the rotation speed of the blocking member 41a is 500 rpm by the drive mechanism 41b of the magnetic coupling type rotation introducer, the time required for rotation at a predetermined angle θ of 45 ° is 100 ms or less.

The drive mechanism 41b aligns the center of the through hole 41c of the blocking member 41a with the optical axis, and causes the through hole 41c of the blocking member 41a to face the through hole 35a of the movable diaphragm 35 in the traveling direction of the ion beam. An ion beam is passed through the through hole 41c of 41a. The drive mechanism 41b blocks the through hole 35a of the movable diaphragm 35 by rotating the blocking member 41a around the central axis by at least a predetermined angle θ from the state where the center of the through hole 41c of the blocking member 41a is aligned with the optical axis. The member 41a shields the ion beam from the ion beam.
In the third modification described above, the outer shape of the blocking member 41a is cylindrical, but the outer shape is not limited to this, and the outer shape of the blocking member 41a may be plate-shaped. The plate-shaped blocking member 41a switches between blocking and passing the ion beam by rotating between the insertion position and the exit position around the rotation axis set at the end.

In the above-described embodiment, the control device 19 may reduce the current density of the ion beam by lowering the voltage of the condenser lens 32 when the ion beam is blocked by the blocking device 33 as compared with the time of sample irradiation. By reducing the current density of the ion beam, the beam irradiation amount per unit area of the blocking member 33a can be reduced, and damage to the blocking member 33a can be suppressed.

In the above-described embodiment, the alignment electrode 37 and the stig meter 38 are arranged on the downstream side in the traveling direction of the ion beam with respect to the movable diaphragm 35, but the present invention is not limited to this. Each of the alignment electrode 37 and the stig meter 38 may be arranged between the condenser lens 32 and the movable aperture 35.

In the above-described embodiment, the blocking device 33 moves the plate-shaped blocking member 33a between the insertion position and the exit position, but the present invention is not limited to this. For example, the blocking device 33 may switch between a state in which the through hole is arranged at the insertion position and a state in which a portion other than the through hole is arranged at the insertion position with respect to the blocking member 33a in which the through hole is formed. May be moved.

In the above-described embodiment, the charged particle beam device 10 is a focused ion beam device, but the present invention is not limited to this. For example, the charged particle beam device 10 may be a composite type charged particle beam device of a focused ion beam device and an electron beam device. Alternatively, it may be an ion beam device equipped with a gas gas ion source.
Since the shutoff device 33 does not require a vacuum seal portion such as a sluice valve, the shutoff device 33 does not require a seal material such as an O-ring. Therefore, the breaking device 33 can be reduced in size and weight, and contributes to vibration suppression and high speed driving.

The embodiments of the present invention are presented as examples and are not intended to limit the scope of the invention. These embodiments can be implemented in various other forms, and various omissions, replacements, and changes can be made without departing from the gist of the invention. These embodiments and modifications thereof are included in the scope and gist of the invention, as well as in the scope of the invention described in the claims and the equivalent scope thereof.

O ... rotating axis, 10 ... charged particle beam device, 11 ... sample chamber, 12 ... stage (sample stand), 13 ... stage drive mechanism, 14 ... detector, 15 ... gas supply unit, 16 ... focused ion beam lens barrel, 17 ... Display device, 18 ... Input device, 19 ... Control device, 21 ... Ion source (charged particle source), 22 ... Ion optical system, 32 ... Condenser lens, 33 ... Breaking device, 33a ... Breaking member, 33b ... Drive mechanism , 35 ... movable diaphragm (throttle), 35a ... aperture (through hole), 35b ... diaphragm member, 35c ... drive mechanism, 41 ... shutoff device, 41a ... shutoff member, 41b ... drive mechanism, 41c ... through hole.

Claims (8)

With a charged particle source,
A diaphragm that narrows the beam of charged particles generated from the charged particle source,
A charged particle beam device comprising a blocking device for switching between blocking and passing a beam of the charged particles between the charged particle source and the aperture. The blocking device is
A blocking member that blocks the beam of the charged particles and
The charged particle beam device according to claim 1, further comprising a driving mechanism for advancing and retreating the blocking member along a direction intersecting the traveling direction of the beam of the charged particles. The blocking device is
It comprises at least a pair of the blocking members and at least one of the driving mechanisms.
2. The driving mechanism is characterized in that at least the pair of blocking members advance and retreat synchronously in opposite directions along a direction intersecting the traveling direction of the beam of the charged particles. The charged particle beam device according to. The blocking device is
A blocking member that blocks the beam of the charged particles and
The charged particle beam device according to claim 1, further comprising a drive mechanism for rotating the blocking member around a rotation axis extending along a direction intersecting the traveling direction of the beam of the charged particles. The charged particle beam device according to any one of claims 2 to 4, wherein the driving mechanism allows a beam of the charged particles to pass through a through hole formed in the blocking member. A condenser lens arranged upstream of the blocking device in the traveling direction of the beam of the charged particles and focusing the beam of the charged particles.
The charge according to any one of claims 1 to 5, further comprising a control device that lowers the voltage of the condenser lens when the beam of the charged particles is cut off by the blocking device as compared with the case of passing through the beam. Particle beam device. A control device for blocking the beam of the charged particles by the blocking device is provided when the irradiation of the beam of the charged particles to the sample is stopped and the irradiation of the beam of the charged particles to the sample is not expected to be restarted. The charged particle beam apparatus according to any one of claims 1 to 6, wherein the charged particle beam device is characterized. The charged particle beam device according to claim 7, wherein the control device prohibits the blocking device from blocking the beam of the charged particles when the occurrence of vibration accompanying the operation of the blocking device is avoided.

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