JP2015133209A - Charged particle beam device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a charged particle beam device capable of suppressing an effect due to vibration caused by operations of a pump and a valve even when a next sample is carried into a load lock chamber simultaneously with charged particle beam irradiation.SOLUTION: In a charged particle beam device according to the present invention, a valve connecting between a preliminary exhaust chamber and the outside thereof acquires a detection value from a vibration sensor that detects vibration of a sample chamber, and controls a valve opening/closing actuator so that the vibration of the sample chamber is suppressed.

Description

  The present invention relates to a charged particle beam apparatus.

  In a charged particle beam apparatus represented by a scanning electron microscope (SEM), a sample chamber (main vacuum chamber) for placing a sample is evacuated, and then a charged particle beam (electron in SEM is an electron). It is necessary to irradiate the sample with a beam. On the other hand, in SEM for inspecting semiconductor devices and the like, it is required to inspect more samples per unit time. Therefore, an SEM having a preliminary exhaust chamber (hereinafter sometimes referred to as a load lock chamber) has been proposed.

  A partition is provided between the sample chamber and the load lock chamber so that the sample can be exchanged between the sample chamber and the load lock chamber while the sample chamber is maintained at a high vacuum. A flexible valve is provided. By performing evacuation or leakage in the load lock chamber while processing the sample in the sample chamber, the processing in the sample chamber can be performed without interruption. Thereby, the throughput of the apparatus can be increased.

  The load lock chamber and the vacuum exhaust pump, and the load lock chamber and an inert gas tank (used to release the load lock chamber to atmospheric pressure) are connected using an open / close valve. A vacuum gauge is provided in the load lock chamber. After the vacuum value measured by the vacuum gauge reaches a predetermined value, the valve between the vacuum exhaust pump and the inert gas tank is opened and closed to bring the load lock chamber into a high vacuum state or an atmospheric pressure state. . As a result, the sample in the air atmosphere can be transported to the sample chamber in a short time.

  In order to operate the charged particle beam apparatus efficiently, it is desirable to perform in parallel the processing in the sample chamber and the operation of bringing the next measurement sample into the load lock chamber. However, if the atmosphere is released or the evacuation operation is performed when the sample is carried into the load lock chamber, the sample chamber vibrates with the operation of the vacuum pump or the valve, and the inspection accuracy decreases. This phenomenon is also called image disorder.

  Patent Document 1 below describes a vacuum exhaust system structure in which the vibration of the pump is not transmitted to the charged particle beam apparatus main body in relation to the above-described problem.

JP 2007-165232 A

  By using the technique described in Patent Document 1, even if the load lock chamber is evacuated or released to atmospheric pressure while the sample is being processed, it is considered that the vibration associated therewith can be suppressed. However, in this document, it is necessary to provide a special structure for suppressing the vibration of the pump.

  On the other hand, as another method for avoiding image obstruction, it is conceivable to temporarily stop charged particle beam irradiation in the sample chamber at the timing when a valve or a vacuum pump operates in the load lock chamber. Similarly, it is conceivable that the operation of the valve or the vacuum pump is temporarily stopped while the inspection is performed in the sample chamber. However, these methods all lower the operating efficiency of the charged particle beam apparatus, resulting in a decrease in productivity.

  The present invention has been made in view of the problems as described above, and even if the next sample is carried into the load lock chamber in parallel with the charged particle beam irradiation, the influence of vibration caused by the operation of the pump and the valve is not affected. An object of the present invention is to provide a charged particle beam apparatus that can be suppressed.

  In the charged particle beam apparatus according to the present invention, the valve connecting the preliminary exhaust chamber and the outside acquires the detection value from the vibration sensor that detects the vibration of the sample chamber, so that the vibration of the sample chamber is suppressed, Controls the valve opening / closing actuator.

  According to the charged particle beam apparatus according to the present invention, even if the next sample is carried into the load lock chamber in parallel with the charged particle beam irradiation, vibrations generated in the sample chamber due to the operation of the valve and the pump are suppressed. be able to.

1 is a configuration diagram of a charged particle beam device 10 according to Embodiment 1. FIG. 2 is a configuration diagram of a vacuum valve 105. FIG. 6 is a block diagram of a computing unit 104 in Embodiment 2. FIG. It is a block diagram of the arithmetic unit 104 in Embodiment 3. It is a block diagram of the arithmetic unit 104 in Embodiment 4.

<Embodiment 1: Device configuration>
FIG. 1 is a configuration diagram of a charged particle beam apparatus 10 according to Embodiment 1 of the present invention. The charged particle beam device 10 is a device that irradiates the sample 17 with the charged particle beam 14, and includes a sample chamber 59, a load lock chamber 58, a sample transport device 24, and a display device 30.

  The sample chamber 59 stores the charged particle beam source 12, the sample stage 19, the sample chamber pressure gauge 60, and the secondary electron detector 62. The charged particle beam source 12 irradiates the sample 17 with the charged particle beam 14. The sample stage 19 moves the sample 17. The sample chamber pressure gauge 60 measures the atmospheric pressure in the sample chamber 59. The secondary electron detector 62 detects the secondary electrons 13 and outputs a detection signal to the display device 30.

  The load lock chamber 58 temporarily stores the sample 17 conveyed from outside the charged particle beam apparatus 10. The sample transport device 24 transports the sample 17 in the load lock chamber 58 into the sample chamber 59. The display device 30 generates and displays an observation image of the sample 17 using a detection signal of the secondary electrons 13 generated from the sample 17 by irradiating the charged particle beam 14 onto the sample 17.

  The sample chamber 59 is connected to the sample chamber evacuation pump 56 by a sample chamber evacuation valve 57, and is always kept in a high vacuum state. That is, the sample chamber evacuation valve 57 remains normally open. When the sample chamber 59 is released to the atmosphere, such as when maintaining the charged particle beam apparatus 10, the sample chamber evacuation valve 57 is closed to release the sample chamber 59 to the atmosphere.

<Embodiment 1: Basic operation>
The sample 17 is first carried into the load lock chamber 58. In order to carry the sample 17 into the load lock chamber 58, the load lock chamber 58 must be released to the atmosphere. Therefore, first, the sample chamber gate valve 52 is closed so that the vacuum state of the sample chamber 59 is maintained. Next, the load lock chamber vacuum exhaust valve 53 is closed, and the vacuum exhaust by the load lock chamber vacuum exhaust pump 51 is stopped. Thereafter, the air release valve 55 is opened, and the inert gas tank 54 is filled with the inert gas into the load lock chamber 58. As a result, the pressure in the load lock chamber 58 rises and the atmosphere is released.

  When the load lock chamber 58 is released to the atmosphere, the atmosphere release valve 55 is closed and the load lock chamber gate valve 50 is opened. Thereafter, the sample 17 is carried into the load lock chamber 58. When the sample 17 is carried into the load lock chamber 58, the load lock chamber gate valve 50 is closed. Next, the load lock chamber vacuum exhaust valve 53 is opened, and vacuum exhaust by the load lock chamber vacuum exhaust pump 51 is started. The load lock chamber pressure gauge 61 confirms that the load lock chamber 58 is in a vacuum state, and the sample chamber gate valve 52 is opened.

  The sample transport device 24 fixes the sample 17 on the sample stage 19 in the sample chamber 59. Thereafter, the sample transport device 24 sequentially moves the sample stage 19 according to the inspection conditions. After the sample stage 19 moves to a desired position, the charged particle beam 14 is irradiated to the sample 17 on the sample stage 19. The secondary electron detector 62 detects the secondary electrons 13 emitted when the charged particle beam 14 is irradiated on the sample 17. The display device 30 generates and displays an observation image of the sample 17 using the detection signal of the secondary electrons 13.

<Embodiment 1: Issues related to parallel operation>
In order to realize high productivity, it is desirable to prepare for the next sample 17 to be carried into the sample chamber 59 immediately after the processing in the sample chamber 59 is completed. Therefore, the next sample 17 is carried into the load lock chamber 58 while the charged particle beam 14 is being irradiated on the sample 17 in the sample chamber 59 (while the measurement / inspection of the sample 17 is being performed). Keep it.

  In order to carry the sample 17 into the load lock chamber 58, it is necessary to operate the atmospheric release valve 55, the load lock chamber gate valve 50, and the load lock chamber vacuum exhaust valve 53. However, the vibration generated by the valve opening / closing operation and the change in atmospheric pressure in the load lock chamber 58 is transmitted to the sample chamber 59, which may degrade the processing accuracy.

  In order to avoid this, it is conceivable that the evacuation / atmosphere release operation of the load lock chamber 58 is temporarily interrupted while the charged particle beam 14 is irradiated on the sample 17. Alternatively, it is conceivable that the charged particle beam irradiation with respect to the sample 17 is temporarily interrupted while the load lock chamber 58 performs the evacuation / atmospheric release operation. Accordingly, vibration generated by the valve opening / closing operation or the change in atmospheric pressure in the load lock chamber 58 can be suppressed from being transmitted to the sample chamber 59, but this temporary interruption causes a decrease in the productivity of the charged particle beam device 10.

<Embodiment 1: Valve configuration>
FIG. 2 is a configuration diagram of the vacuum valve 105. The vacuum valve 105 can be employed as at least one of the load lock chamber gate valve 50, the load lock chamber vacuum exhaust valve 53, and the atmosphere release valve 55. All these three valves may have the same configuration as the vacuum valve 105, or only one or two valves may have the same configuration.

  The vacuum valve 105 includes an actuator 100, a gate valve 101, an opening sensor 102, a vibration sensor 103, and a calculator 104. These components are not necessarily configured integrally with the vacuum valve 105, and any one or more components can be provided outside the vacuum valve 105.

  The gate valve 101 connects or seals the load lock chamber 58 to the outside by an opening / closing operation. The actuator 100 opens and closes the gate valve 101. The opening sensor 102 detects the opening or opening / closing speed of the gate valve 101. The vibration sensor 103 detects the vibration of the sample chamber 59.

  The calculator 104 acquires the opening target value 106. The opening target value 106 is a target value of the opening of the gate valve 101 set in advance to such an extent that vibrations caused by fluctuations in atmospheric pressure in the load lock chamber 58 can be suppressed within an allowable range. The specific value of the opening target value 106 can be appropriately determined in advance by, for example, experiments or simulations. The computing unit 104 acquires the detection value by the opening sensor 102 and the detection value by the vibration sensor 103 together with the opening target value 106, and using these values, the vibration of the sample chamber 59 detected by the vibration sensor 103 is predetermined. The actuator 100 is controlled so as to be within the permissible range.

  Further, the opening / closing operation itself of the gate valve 101 also becomes a vibration source of the sample chamber 59. Therefore, the arithmetic unit 104 acquires the opening / closing speed target value of the gate valve 101 instead of or in combination with the opening degree target value 106, and uses this to detect the vibration of the sample chamber 59 detected by the vibration sensor 103. The actuator 100 can also be controlled so that is within a predetermined allowable range.

<Embodiment 1: Summary>
As described above, the charged particle beam apparatus 10 according to the first embodiment includes the vacuum valve 105 as at least one of the load lock chamber gate valve 50, the load lock chamber vacuum exhaust valve 53, and the atmosphere release valve 55. The vacuum valve 105 controls the opening degree or opening / closing speed of the gate valve 101 so that the vibration of the sample chamber 59 is suppressed. Thereby, even if the load lock chamber 58 is evacuated or released to the atmosphere while the charged particle beam 14 is irradiated to the sample 17 in the sample chamber 59, the vibration of the sample chamber 59 is suppressed within an allowable range. Can do.

<Embodiment 2>
In the first embodiment, the configuration example has been described in which the vibration of the sample chamber 59 caused by the atmospheric pressure fluctuation in the load lock chamber 58 or the valve opening / closing operation is suppressed. As a parameter having a correlation with another vibration source of the sample chamber 59 or the vibration of the sample chamber 59, a fluctuation in atmospheric pressure in the sample chamber 59 can be considered. Therefore, in the second embodiment of the present invention, in addition to the configuration described in the first embodiment, a configuration example in which the valve opening degree is controlled so as to suppress the change in atmospheric pressure in the sample chamber 59 within the allowable range will be described. Since the charged particle beam apparatus 10 according to the second embodiment performs the above-described control in addition to the control operation described in the first embodiment, the following description will focus on differences from the first embodiment.

  FIG. 3 is a block diagram of the computing unit 104 in the second embodiment. In the second embodiment, the computing unit 104 includes a compensator 107 and a differentiator 108. When the computing unit 104 is instructed to control the valve, the computing unit 104 starts a control computation.

  The computing unit 104 obtains a difference between the opening target value 106 and the value detected by the opening sensor 102 and outputs this as a deviation signal 109. The compensator 107 calculates an operation signal for the actuator 100 based on the deviation signal 109. For example, the compensator 107 can obtain the scanning signal by PID (Proportional Integral Derivative) control calculation. In parallel with this, the arithmetic unit 104 acquires the pressure signal 111 as a detection value by the sample chamber pressure gauge 60. The differentiator 108 obtains the pressure change rate 112 in the sample chamber 59 using the pressure signal 111. The computing unit 104 multiplies the atmospheric pressure change speed 112 by a control gain 110 set so as not to impair the stability as the negative feedback control system. The computing unit 104 subtracts the result from the output of the compensator 107. Thus, the valve opening / closing operation is controlled so that the pressure change rate in the sample chamber 59 is suppressed within a predetermined range. The computing unit 104 outputs the result as an operation signal for the actuator 100.

<Embodiment 2: Summary>
As described above, the charged particle beam apparatus 10 according to the second embodiment controls the valve opening / closing operation while suppressing the atmospheric pressure change in the sample chamber 59 within a predetermined range by the negative feedback effect of the atmospheric pressure change rate 112. Since the change in the atmospheric pressure in the sample chamber 59 becomes a factor that causes the sample chamber 59 to vibrate, the vibration of the sample chamber 59 can be suppressed by suppressing this.

  In the second embodiment, even when the state feedback control is configured by combining the multiplication processing of the compensator 107, the differentiator 108, and the control gain 110, the same effect as in the second embodiment can be exhibited.

<Embodiment 3>
When the sample transport device 24 stops the sample stage 19, the sample 17 should also be stationary. However, when the sample chamber 59 is vibrated, the sample stage 19 that should originally be stationary moves slightly. , Image damage may occur. Therefore, in the third embodiment of the present invention, a configuration example for suppressing fine movement of the sample stage 19 will be described in addition to the configurations described in the first and second embodiments. Since other configurations are the same as those in the first and second embodiments, the following description will focus on the differences.

  FIG. 4 is a block diagram of the computing unit 104 in the third embodiment. In the third embodiment, a displacement meter 113 that detects the displacement of the sample stage 19 and outputs a displacement signal 116 as the detected value is provided in the sample chamber 59.

  The computing unit 104 acquires the displacement signal 116 from the displacement meter 113 when the valve control computation is started. The differentiator 108 obtains the acceleration 115 of the sample stage 19 by second-order differentiation of the displacement signal 116. The computing unit 104 multiplies the acceleration 115 by a control gain 110 that does not impair the stability of the negative feedback control system. The computing unit 104 subtracts the result from the output of the compensator 107. Accordingly, the valve opening / closing operation is controlled so that the acceleration of the sample stage 19 is suppressed within a predetermined range. The computing unit 104 outputs the result as an operation signal for the actuator 100.

<Embodiment 3: Summary>
As described above, the charged particle beam apparatus 10 according to the third embodiment performs the valve opening / closing operation while directly suppressing the acceleration of the sample stage 19 (that is, the vibration of the sample stage 19) by the negative feedback effect of the acceleration 115. Control. Since the sample 17 is fixed on the sample stage 19, by suppressing the vibration of the sample stage 19, the vibration of the sample 17 can be suppressed and the image obstruction can be suppressed.

  In the third embodiment, even when the state feedback control is configured by combining the multiplication processing of the compensator 107, the differentiator 108, and the control gain 110, the same effect as in the third embodiment can be exhibited.

  In the third embodiment, the differentiator 108 obtains the acceleration of the sample stage 19 by second-order differentiation of the displacement signal 116, but instead of or in combination with this, the displacement signal 116 is first-order differentiated. Thus, the moving speed of the sample stage 19 can be obtained, and negative feedback control can be performed using this. Since the moving speed of the sample stage 19 corresponds to the vibration of the sample stage 19, the same effect as in the third embodiment can be exhibited.

  In the third embodiment, the computing unit 104 obtains the acceleration or moving speed of the sample stage 19 by differentiating the detection value obtained by the displacement meter 113. However, a sensor that detects the acceleration or moving speed of the sample stage 19 itself is used. It may be provided.

<Embodiment 4>
In the first to third embodiments, when the time for irradiating the charged particle beam 14 to the same portion of the sample 17 is sufficiently shorter than the vibration frequency of the sample chamber 59, the influence of the vibration of the sample chamber 59 is limited. It is considered to be appropriate. On the other hand, when the irradiation time of the charged particle beam 14 is sufficiently long, it is considered that the influence of the vibration of the sample chamber 59 is remarkably generated. Therefore, it is desirable that the control gain 110 can be adjusted according to the irradiation time of the charged particle beam 14.

  Further, when the observation image of the sample 17 is generated using the detection signal of the secondary electrons 13, the influence of the vibration of the sample chamber 59 on the observation image may be allowed depending on the imaging magnification of the observation image. For example, when the imaging magnification is relatively low, even if slight vibration occurs, the vibration does not appear so much in the observation image, and therefore the influence of the vibration may be acceptable depending on the accuracy required for the observation image. . Therefore, it is desirable that the control gain 110 can be adjusted according to the imaging magnification of the observation image.

  In the fourth embodiment of the present invention, a configuration example in which the control gain 110 is adjusted according to the irradiation time of the charged particle beam 14 or the imaging magnification of the observation image will be described in view of the above circumstances. Since other configurations are the same as those in the first to third embodiments, the following description will focus on differences.

  FIG. 5 is a block diagram of the computing unit 104 in the fourth embodiment. In the fourth embodiment, the computing unit 104 acquires the irradiation time 117 of the charged particle beam 14 and the imaging magnification 118 of the observation image in addition to the configurations described in the first to third embodiments. These values are set by the user of the charged particle beam apparatus 10 via an interface, for example, and the computing unit 104 acquires the set values. In FIG. 5, the same configuration as that in FIG. 3 is assumed as an example.

  The computing unit 104 adjusts the control gain 110 according to the irradiation time 117. For example, when the irradiation time 117 is long, the influence of the vibration of the sample chamber 59 becomes relatively large. Therefore, it is considered that the allowable range of vibration of the sample chamber 59 is small according to the irradiation time 117, and control is performed so that stronger control is performed. The gain 110 is adjusted. The relationship between the irradiation time 117, the allowable range of vibration, and the adjustment amount of the control gain 110 can be appropriately determined in advance through experiments or simulations.

  The computing unit 104 adjusts the control gain 110 according to the imaging magnification 118 instead of or in combination with the irradiation time 117. For example, the allowable amount of vibration of the sample chamber 59 can be obtained by multiplying the allowable amount of image shift caused in the observation image by the vibration of the sample chamber 59 by the imaging magnification 118. The computing unit 104 can adjust the control gain 110 so that the vibration of the sample chamber 59 falls within the allowable range.

  Although the configuration example for adjusting the control gain 110 has been described in the fourth embodiment, the same processing can be performed in the configuration described in the first embodiment.

<Embodiment 4: Summary>
As described above, the charged particle beam apparatus 10 according to the fourth embodiment obtains an allowable range of vibration of the sample chamber 59 according to the irradiation time 117 or the imaging magnification 118, and adjusts the control gain 110 based on this. As a result, the atmosphere releasing operation and the evacuation operation of the load lock chamber 58 can be optimized according to the actual processing conditions of the charged particle beam device 10, and the charged particle beam device 10 with higher productivity can be provided.

<Embodiment 5>
The observation image of the sample 17 is generated by combining observation images (frame images) generated in a plurality of time frames. When the sample chamber 59 is vibrating, the influence of the vibration appears in each frame image. Since the observation image obtained by synthesizing the frame images has the influence of vibration in each frame image superimposed thereon, the influence of vibration becomes more conspicuous as a result. On the other hand, it is considered that the influence of the vibration of the sample chamber 59 in each frame image is smaller than that in the composite image.

  The charged particle beam apparatus 10 can reduce the amount of suppressing the vibration of the sample chamber 59 using the above characteristics. That is, the arithmetic unit 104 controls the valve opening / closing operation to the extent that the influence of the vibration of the sample chamber 59 in each frame image generated by the display device 30 is sufficiently suppressed. Since the influence of vibration in individual frame images is small, the control amount at this time can be set smaller than the control amount corresponding to the composite image.

  The display device 30 generates a frame image in which the influence of vibration of the sample chamber 59 is suppressed. However, although the influence of vibration is suppressed in each frame image, the influence of vibration across the frame images remains. However, it is considered that the image shift between the frame images can be interpolated by image processing. This is because image shift caused by fine movement in each frame image is removed. Therefore, the display device 30 interpolates the image shift between the frame images, for example, by superimposing the observation images at the same position by pattern matching under the premise that the image shift in each frame image is removed. Can do.

  The present invention is not limited to the embodiments described above, and includes various modifications. The above embodiment has been described in detail for easy understanding of the present invention, and is not necessarily limited to the one having all the configurations described. A part of the configuration of one embodiment can be replaced with the configuration of another embodiment. The configuration of another embodiment can be added to the configuration of a certain embodiment. Further, with respect to a part of the configuration of each embodiment, another configuration can be added, deleted, or replaced.

  12: charged particle beam source, 19: sample stage, 24: sample transport device, 30: display device, 50: load lock chamber gate valve, 51: load lock chamber vacuum exhaust pump, 53: load lock chamber vacuum exhaust valve, 55 : Atmospheric release valve, 58: Load lock chamber, 59: Sample chamber, 60: Sample chamber pressure gauge, 100: Actuator, 101: Gate valve, 102: Opening sensor, 103: Vibration sensor, 104: Calculator, 113: Displacement meter.

Claims (8)

A charged particle beam apparatus for irradiating a sample with a charged particle beam,
A charged particle beam source for emitting the charged particle beam,
A sample chamber in which the sample and the charged particle beam source are disposed;
A preliminary exhaust chamber adjacent to the sample chamber;
A vacuum pump for exhausting the gas in the preliminary exhaust chamber;
A gas flow path for opening the preliminary exhaust chamber to atmospheric pressure;
A gate valve that opens and closes an inlet for carrying the sample into the preliminary exhaust chamber;
A vacuum exhaust valve for opening and closing a connection between the preliminary exhaust chamber and the vacuum pump;
An air release valve for opening and closing a connection between the preliminary exhaust chamber and the gas flow path;
A vibration sensor for detecting the vibration of the sample chamber;
With
At least one of the gate valve, the vacuum exhaust valve, and the atmosphere release valve is
An actuator that opens and closes a valve,
An arithmetic unit for controlling the operation of the actuator;
With
The computing unit is
The charged particle beam apparatus characterized by acquiring the detected value from the vibration sensor and controlling the operation of the actuator so that the vibration of the sample chamber is suppressed. The charged particle beam device comprises:
An opening sensor for detecting the opening or opening / closing speed of the valve;
The computing unit is
Obtain the detected value from the opening sensor,
The target value of the opening degree of the valve or the target value of the opening / closing speed of the valve is set in advance so that the vibration of the sample chamber is suppressed within a predetermined range,
The operation of the actuator is controlled so that the opening of the valve approaches the target value of the opening of the valve, or the operation of the actuator is controlled so that the opening / closing speed of the valve approaches the target value of the opening / closing speed of the valve. The charged particle beam device according to claim 1, wherein the charged particle beam device is controlled. The charged particle beam device comprises:
A pressure gauge for detecting the atmospheric pressure in the sample chamber;
The computing unit is
2. The charged particle beam apparatus according to claim 1, wherein the detected value is acquired from the pressure gauge, and the operation of the actuator is further controlled so that the rate of change of the atmospheric pressure in the sample chamber is within a predetermined range. . The charged particle beam device comprises:
A sample stage on which the sample is placed;
A sample transport device for moving the sample stage;
A speedometer for detecting the moving speed or acceleration of the sample,
With
The computing unit is
When the sample transport device is stationary, the detection value is acquired from the speedometer, and the operation of the actuator is further controlled so that the moving speed or acceleration of the sample stage is within a predetermined range. The charged particle beam apparatus according to claim 1. The charged particle beam device comprises:
An observation image of the sample is generated using secondary particles generated from the sample by irradiating the charged particle beam to the sample,
The computing unit is
Obtaining an observation magnification of the observation image as an operation parameter of the charged particle beam device;
The charged particle beam apparatus according to claim 1, wherein a correspondence relationship between an amount of vibration to be suppressed in the sample chamber and the observation magnification is calculated, and the operation of the actuator is controlled according to the correspondence relationship. . The computing unit is
A range allowed as the vibration width of the sample chamber is calculated by multiplying the vibration width allowed in the observation image by the observation magnification, and the vibration of the sample chamber falls within the range. The charged particle beam device according to claim 5, wherein the operation of the actuator is controlled. The computing unit is
The time when the charged particle beam source irradiates the charged particle beam to a predetermined portion of the sample is acquired as an operation parameter of the charged particle beam device,
The charged particle beam apparatus according to claim 1, wherein a correspondence relationship between an amount of vibration of the sample chamber to be suppressed and the time is calculated, and the operation of the actuator is controlled according to the correspondence relationship. The charged particle beam device comprises:
An observation image generator that generates an observation image of the sample using secondary particles generated from the sample by irradiating the sample with the charged particle beam;
The computing unit is
For each frame image of the observation image generated by the observation image generator, control the operation of the actuator so that the vibration of the sample chamber is suppressed within a preset allowable range for the frame image,
The observation image generator includes:
Regarding the image shift caused in the frame image due to the vibration of the sample chamber, it is considered that the arithmetic unit is suppressed by suppressing the vibration of the sample chamber,
The charged particle beam apparatus according to claim 1, wherein an image shift caused between the frame images due to vibration of the sample chamber is suppressed by performing an interpolation process between the frame images.

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