JP2021043188A - Measuring system and centrifuge - Google Patents

Abstract

To provide a measuring system capable of measuring a state of a material to be processed during processed, and also to provide a centrifuge equipped with the measuring system.SOLUTION: A measuring system 700 includes: an illumination part 722 capable of illuminating a material M to be processed stored in a container 110 capable of performing at least one of revolution around a revolution axis and rotation around a rotation axis; a measuring part 720 for measuring the intensity of a predetermined wavelength component included in reflected light by the material M to be processed and/or fluorescence by the material M to be processed when the container 110 performs at least one of the revolution around the revolution axis and the rotation around the rotation axis; and a processing part for determining a state of the material M to be processed in accordance with the intensity of the predetermined wavelength component.SELECTED DRAWING: Figure 7

Description

The present invention relates to a measuring system for measuring shear stress acting on a material to be treated, and a centrifuge including the measuring system.

Centrifuges that process the material to be treated stored in the container by rotating the container while revolving are known. This centrifuge is used for various purposes, for example, as a stirring / defoaming device that simultaneously performs a stirring treatment and a defoaming treatment of a material to be treated (Patent Document 1). This centrifuge is also used as a ball mill for pulverizing the material to be treated (see Patent Document 2). Further, this centrifuge is also used as an emulsifying device or the like for emulsifying a material to be treated (see Patent Document 3).

Japanese Patent No. 4084493 Japanese Unexamined Patent Publication No. 2002-143706 Japanese Unexamined Patent Publication No. 2010-194470 Japanese Unexamined Patent Publication No. 2013-244475

Here, the centrifuge as described above may be requested by the user to be equipped with a mechanism for knowing the state of the material to be processed. In order to meet such a demand, for example, Patent Document 4 discloses a mechanism for obtaining temperature information of the material to be treated. However, users have requested to know other information about the material to be processed. As a method of obtaining such information, it is conceivable to measure the shear stress acting on the material to be treated, but it has been difficult to perform such measurement in the past.

The present invention has been made in view of the above circumstances. An object of the present invention is to provide a measuring system for measuring shear stress or the like acting on a material to be treated during treatment by a centrifuge, and a centrifuge equipped with the measuring system.

The present invention for solving the above problems is configured to include the following invention-specific matters or technical features.

That is, the invention according to a certain viewpoint is an illuminating unit capable of illuminating a material to be processed stored in a container capable of performing at least one of revolution around the revolution axis and rotation around the rotation axis. When the container is performing at least one of the revolution around the revolution axis and the rotation around the rotation axis, the reflected light by the material to be treated and / or the treatment is to be performed. It is a measurement system including a measuring unit for measuring the intensity of a predetermined wavelength component included in the fluorescence of the material, and a processing unit for determining the state of the material to be processed according to the intensity of the predetermined wavelength component.

Further, the predetermined wavelength component is composed of a first wavelength component and a second wavelength component, and the measuring unit is individually divided into the intensity of the first wavelength component and the intensity of the second wavelength component. Can be measured.

In addition, the processing unit has (i) the absolute value of the intensity of the first wavelength component and the intensity of the second wavelength component, (ii) the intensity of the first wavelength component, and the second. The time variation of the absolute value of the intensity of the wavelength component of, (iii) the relative value between the intensity of the first wavelength component and the intensity of the second wavelength component, (iv) the intensity of the first wavelength component and the above. The state of the material to be treated can be determined based on at least one of the temporal changes in the relative value between the intensities of the second wavelength component.

Further, the measuring portion may be arranged on a lid portion capable of closing the open end of the container.

Further, the illumination unit may be arranged on the lid unit.

Further, the invention according to a certain viewpoint includes the measurement system according to any one of the above, a revolving body that can rotate about the revolution axis, and a rotating body that is held by the revolving body and can rotate about the rotation axis. And a drive unit that applies a rotational force to at least one of the revolving body and the rotating body, and the rotating body is a centrifuge that holds the container.

Further, the invention according to a certain viewpoint includes a step of illuminating a material to be processed stored in a container capable of performing at least one of revolution around the revolution axis and rotation around the rotation axis. When the container is revolving around the revolution axis and at least one of the rotations around the rotation axis, the reflected light by the material to be treated and / or the fluorescence by the material to be treated is emitted. The method for determining the state of the material to be processed includes a step of measuring the intensity of a predetermined wavelength component including the step and a step of determining the state of the material to be processed according to the intensity of the predetermined wavelength component.

According to the present invention, it is possible to provide a measuring system for measuring shear stress or the like acting on a material to be treated during treatment by a centrifuge, and a centrifuge including the measuring system.

It is sectional drawing which shows the schematic structure of the centrifuge which concerns on one Embodiment of this invention. It is the schematic sectional drawing of the measurement system which concerns on one Embodiment of this invention. It is a block diagram of the measurement system which concerns on one Embodiment of this invention. It is the schematic sectional drawing of the measurement system which concerns on one Embodiment of this invention. It is the schematic sectional drawing of the measurement system which concerns on one Embodiment of this invention. It is the schematic sectional drawing of the measurement system which concerns on one Embodiment of this invention. It is the schematic sectional drawing of the measurement system which concerns on other embodiment of this invention. It is a block diagram of the measurement system which concerns on other embodiment of this invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the embodiments described below are merely examples, and there is no intention of excluding the application of various modifications and techniques not specified below. The present invention can be implemented with various modifications (for example, combining each embodiment) without departing from the spirit of the present invention. In the present invention, each numerical value is substantially determined. For example, in the case where the first numerical value and the second numerical value are equal, in the present invention, if the effect equivalent to the effect exerted when both values are mathematically exactly equal is exhibited, both are exhibited. Even if there is a difference in the values of, both values are treated as equal. Further, in the description of the following drawings, the same or similar parts are represented by the same or similar reference numerals. The drawings are schematic and do not necessarily match the actual dimensions and ratios. Even between drawings, there may be parts where the relationship and ratio of dimensions are different from each other.

FIG. 1 is a cross-sectional view showing a schematic configuration of a centrifuge according to an embodiment of the present invention. As shown in the figure, the centrifuge 1 includes a revolving body 10, a rotating body 20, a support substrate 30, a driving unit 40, and a control unit 50. In addition, the centrifuge 1 includes a balance weight and the like (not shown).

The revolving body 10 includes a shaft portion 11, a first arm 12, and a second arm 13. The revolution body 10 is rotatably supported by the support substrate 30 with the shaft portion 11, and is rotated around the revolution axis L1 which is a virtual straight line by the drive portion 40.

The first arm 12 is configured to extend in the first direction orthogonal to the revolution axis L1 and bend in the middle, and the rotating body 20 is attached to the first arm 12. The second arm 13 extends in a second direction opposite to the first direction, and is attached with the balance weight for balancing the revolution body 10 during rotation and improving quietness and the like.

The rotating body 20 includes a shaft portion 21 and a holder portion 22. The rotating body 20 is held so that the shaft portion 21 can be rotatably held toward the tip side of the bent portion of the first arm 12 of the revolving body 10, and is rotated about the rotation axis L2, which is a virtual straight line, by the driving portion 40. Be made to. Based on the above arrangement, the rotation axis L2 has a predetermined inclination angle with respect to the revolution axis L1.

The holder portion 22 is formed in a bottomed tubular shape, and the end surface opposite to the shaft portion 21 is open. The holder portion 22 receives and holds the container 110 shown in FIG. 2 from the bottom portion through the opened portion.

The drive unit 40 includes, for example, a motor, a gear, a pulley, a belt, and the like that transmit the rotational force generated by the motor to the shaft portion 11 and the shaft portion 21. The control unit 50 controls the operation of the entire centrifuge 1 such as controlling the operation of the drive unit 40.

The centrifuge 1 configured as described above rotates while rotating the revolution body 10 around the revolution axis L1 in a state where the container 110 containing the material M to be processed is held in the holder portion 22 of the rotation body 20. The rotating body 20 is rotated around the axis L2. As a result, the container 110 revolves around the revolution axis L1 and rotates around the rotation axis L2, so that the material M to be processed stored in the container 110 is processed (note that in the centrifuge 1). It is also possible to rotate the revolution body 10 around the revolution axis L1 and the rotation body 20 about the rotation axis L2, and even in this case, the rotation body 20 can be rotated. It is possible to process the material M to be processed stored in the container 110 mounted on the rotating body 20).

FIG. 2 is a schematic cross-sectional view showing a measurement system according to an embodiment of the present invention. As shown in the figure, the measurement system 100 includes a container 110 and a measurement unit 120. In addition, the measurement system 100 includes each configuration and the like shown in FIG.

The container 110 is formed in a bottomed tubular shape that opens in one direction, and stores the material M to be processed. The container 110 generally has a bottomed cylindrical shape, and may be configured such that a lid (not shown) is attached to the opening. The container 110 is mounted on the holder portion 22 shown in FIG. 1 so that the center line CL, which is a virtual straight line passing through the center thereof, overlaps the rotation axis L2 (at this time, the container 110 is mounted via an adapter (not shown). It may be mounted on the holder portion 22).

The measuring unit 120 is provided in the container 110, and at least the detection surface 122 for detecting the shear stress acting on the material M to be processed is arranged so as to be able to (directly) contact the material M to be processed stored in the container 110. To. That is, the measuring unit 120 is arranged so that the detection surface 122 is exposed on the internal space side of the container 110.

Further, the measuring unit 120 is provided on at least one of the bottom portion 112 and the side wall portion 114 of the container 110 (FIG. 2 shows a case where the measuring unit 120 is provided on the bottom portion 112 and the side wall portion 114). .. A plurality of measuring units 120 may be provided on at least one of the bottom portion 112 and the side wall portion 114. In this way, when a plurality of measuring units 120 are provided on the bottom portion 112 and / or the side wall portion 114, the detection surface 122 of the measuring unit 120 is centered on the center line CL of the container 110 with respect to the center line CL. It is preferably arranged on a virtual circumference located on a vertical virtual plane. By arranging in this way, when the container 110 is held by the holder portion 22 of the rotating body 20, the detection surface 122 can be arranged at a constant distance with respect to the rotation axis L2, and the measuring portion 120 is used. The measured measurement can be performed stably.

Further, the detection surface 122 of the measuring unit 120 may have a center C of the bottom 112 of the container 110, depending on the amount of the material M to be processed in the container 110 (specifically, when the amount of the material M to be processed is large). It can be assumed that it will be provided in. However, in general, the detection surface 122 (measurement unit 120) is in the vicinity of the corner portion 116 of the container 110 (the corner portion 116 is a portion where the bottom portion 112 and the side wall portion 114 of the container 110 are in contact with each other). It is preferable to be arranged in. This is because, as shown in FIG. 1, the container 110 is rotated (rotated) about the rotation axis L2 inclined with respect to the revolution axis L1, and due to this, the container 110 is housed in the container 110. This is because the material M to be treated is collected near the corner 116 of the container 110 during the treatment. That is, by arranging the detection surface 122 (measurement unit 120) in the vicinity of the corner portion 116 of the container 110, the measurement using the measurement unit 120 can be stably performed.

Specifically, when the measuring unit 120 is provided on the bottom portion 112, the detection surface 122 is arranged at a position closer to the corner portion 116 than the center C of the bottom portion 112. Further, when the measuring unit 120 is arranged on the side wall portion 114, the detection surface 122 is arranged at a position closer to the corner portion 116 than the open end 118 of the side wall portion 114.

Here, the measuring unit 120 detects and measures the shear stress acting on the material M to be treated on the detection surface 122 as described above. Further, the measuring unit 120 may also detect and measure the pressure acting on the material M to be processed, the temperature of the material M to be processed, and the like on the detection surface 122. The shear stress acting on the material M to be treated in the present application is a force acting on the material M to be treated so as to slide with respect to the detection surface 122 in a direction parallel to the detection surface 122. Further, the pressure acting on the material to be treated M as referred to in the present application is a force acting on the material M to be treated in a direction perpendicular to the detection surface 122 and toward the detection surface 122.

The material M to be treated may be any material that behaves as a fluid, and its composition and use are not particularly limited. As the material M to be treated, a material containing only a fluid component (resin or the like), a material containing a granular component (powder-like component) in addition to the fluid component, or the like can be applied. For example, the material M to be treated includes an adhesive, a sealant, a liquid crystal material, a mixed material containing an LED phosphor and a resin, a solder paste, a dental impression material, a dental cement (filling agent, etc.), and a liquid chemical. Etc. can be applied. Further, as the material M to be treated, it is also possible to apply a granular (powdered) material and a medium for pulverizing the material (for example, zirconia balls). Alternatively, a fluid to be emulsified can be applied as the material M to be treated.

FIG. 3 is a block diagram of a measurement system according to an embodiment of the present invention. As shown in the figure, the measurement system 100 includes a first portion 200 and a second portion 300.

The first portion 200 includes the container 110 described above and the measuring unit 120. In addition, the first portion 200 includes a first communication unit 202 and a power supply unit 204. Further, the first portion 200 may include a processing unit (not shown), a storage unit, and the like.

The first communication unit 202 receives each information measured by the measurement unit 120 (specifically, the shear stress and pressure acting on the material M to be processed, the temperature of the material M to be processed, and the like), and receives the wireless communication line. (Note that, in the present application, a visible light communication line, an infrared communication line, etc. are also included in the wireless communication line). As the wireless communication line, a known wireless communication line can be used. The first communication unit 202 may be configured to receive predetermined information transmitted from the second communication unit 302, which will be described later, by using a wireless communication line.

The power supply unit 204 is configured to be able to supply power to the measurement unit 120, the first communication unit 202, and the like. For example, the power supply unit 204 may use a battery.

The first communication unit 202, the power supply unit 204, the processing unit, the storage unit, and the like may be provided in the container 110, and the lid unit, the holder unit 22, and the container 110 attached to the container 110 may be provided in the container unit 22. It may be provided in an adapter or the like (not shown) used for mounting the container.

The second part 300 has a configuration corresponding to the calculation unit referred to in the present invention, and is a second communication unit 302, a processing unit 304, an input unit 306 (for example, a user interface such as a keyboard), and an output unit 308 (for example). , Display, printer, etc.). The second portion 300 may include a storage unit, a power supply unit, and the like (not shown), and may be configured by, for example, a notebook computer, a tablet terminal, a smart phone, or the like. Further, the second portion 300 may be configured to be incorporated in the centrifuge 1.

The second communication unit 302 receives the information transmitted by the first communication unit 202. The second communication unit 302 may be configured to be able to transmit predetermined information by using a wireless communication line.

The processing unit 304 receives information from the second communication unit 302 and performs a predetermined process. For example, the processing unit 304 may output the received information such as shear stress and pressure acting on the material to be processed M, and the temperature of the material M to be processed to the output unit 308.

Further, the processing unit 304 may calculate the viscosity of the material M to be processed based on the received information. For example, the processing unit 304 calculates the viscosity of the material M to be processed using the mathematical formula (1).

In the above equation, τ [Pa] is a shear stress (shear stress measured by the measuring unit 120) acting on the material M to be treated. Pv [W / m ³ ] is a stirring power. μ [Pa · s] is the viscosity of the material M to be treated.

Here, the stirring power may be obtained by using any method, but may be obtained by using, for example, the mathematical formula (2).

In the above equation, ρ is the density [kg / m ³ ] of the material M to be treated. h is the input height [m] of the material M to be treated (see FIG. 2). r is the radius [m] of the container 110 (see FIG. 2). ω is the rotation angular velocity [rad / s] (see FIG. 1). R is the orbital radius [m] (see FIG. 1). Ω is the revolution angular velocity [rad / s] (see FIG. 1). Further, k, a, b, c, d, e, f, and g are coefficients, for example, 0 <k <1, 0 <a <1, -1 <b <0, 0 <c <1, 0 <d <1, -2 ≦ e ≦ 2 (where e ≠ 0), 0 <f <1, 0 <g ≦ 2. The formula (2) also includes the viscosity of the material M to be treated, but the formula (2) in which the viscosity of the material M to be treated remains unknown is substituted into the formula (1) for calculation. , It is possible to determine the viscosity of the material M to be treated.

Further, the stirring power may be obtained based on the power consumption [W] of the drive unit 40 for rotating the revolving body 10 and the rotating body 20 of the centrifuge 1. In addition, the stirring power is the temperature rise of the material M to be treated [° C./s] (the temperature rise may be based on the temperature of the material M to be treated measured by the measuring unit 120) or centrifugation. A torque meter (not shown) may be incorporated in the machine 1 and obtained based on the rotational torque [Nm] of the rotating body 20 measured by the torque meter.

Further, the processing unit 304 may obtain the average shear rate of the material M to be processed based on the calculated viscosity of the material M to be processed. For example, the processing unit 304 may obtain the average shear rate of the material M to be processed by using the mathematical formula (3).

In the above equation, γ _av is the average shear rate [1 / s] of the material M to be treated.

The processing unit 304 may output the calculated viscosity and average shear rate of the material M to be processed to the output unit 308. Further, the processing unit 304 is based on the received information such as the shear stress and pressure acting on the material M to be processed, the temperature of the material M to be processed, and the calculated viscosity and / or average shear rate of the material M to be processed. Then, the centrifuge 1 may be controlled (for example, the rotation speed of the revolving body 10 or the rotating body 20 is controlled, the error of the centrifuge 1 is detected, and the like). When controlling the centrifuge 1, the second portion 300 may use the second communication unit 302 to instruct the centrifuge 1, or may use a separate communication unit (not shown). (In these cases, the centrifuge 1 receives the instruction from the second portion 300 by the control unit 50, and the control unit 50 controls the drive unit 40 and the like).

As described above, the measuring system 100 can measure the shear stress acting on the material M to be treated in the centrifuge 1. The measurement system 100 can also measure the pressure acting on the material M to be treated and the temperature of the material M to be treated. Further, based on these, it is also possible to calculate the viscosity and the average shear rate of the material M to be treated during the treatment in the centrifuge 1. This information can be shown to the user via the output unit 308 and can also be used to control the centrifuge 1. Therefore, it is possible to provide the user of the centrifuge 1 with many conveniences such as being able to present the state (various information) of the material M to be processed during processing.

It should be noted that the above-described embodiment is an example for explaining the present invention, and the present invention is not intended to be limited to these embodiments. The present invention can be implemented in various forms as long as it does not deviate from the gist thereof.

For example, the measurement system may be configured as shown in FIG. As shown in the figure, the measurement system 400 differs from the measurement system 100 in that it includes a covering portion 402.

The covering portion 402 covers the measuring portion 120, and may be configured by utilizing the bottom portion 112 and / or the side wall portion 114 of the container 110 as shown in the figure. In this case, the bottom portion 112 or the side wall portion 114, which is the covering portion 402, is configured to be deformable by the shear stress or pressure acting on the material M to be treated during the treatment by the centrifuge 1. For example, the bottom portion 112 or the side wall portion 114, which is the covering portion 402, may be configured to be thinner than the other portions of the bottom portion 112 or the side wall portion 114. By doing so, it becomes possible to measure the shear stress and pressure acting on the material M to be treated by the centrifuge 1 on the detection surface 122 (measurement unit 120) via the covering portion 402. .. Such a configuration is particularly effective when the measuring unit 120 does not have resistance to the material M to be processed.

Further, the covering portion 402 may be configured as a member (attached) provided (attached) on the inner surface of the bottom portion 112 or the side wall portion 114 of the container 110 so as to cover the measuring portion 120, and is also shown in FIG. As such, it may be configured as a second container 404 inserted inside the container 110. As described above, the member provided on the inner surface of the bottom portion 112 or the side wall portion 114 of the container 110 and the second container 404 act on the material M to be treated during the treatment by the centrifuge 1 in terms of shear stress and pressure. It is configured to be deformable by. Specifically, the member provided on the inner surface of the bottom portion 112 or the side wall portion 114 of the container 110 and the second container 404 may be made of a flexible material such as rubber, and the material is a material to be treated. It is considered to be resistant to M.

The covering portion 402 is configured to be deformed as easily as possible by the shear stress or pressure acting on the material M to be treated during the treatment by the centrifuge 1 in order to reduce the influence on the measurement by the measuring portion 120. Is preferable. In addition, when the temperature of the material M to be treated is also measured by the measuring unit 120, the covering unit 402 is configured so that the thermal resistance is as small as possible so that the temperature of the material M to be processed can be transmitted to the measuring unit 120. Is preferable. For example, these can be realized by making the covering portion 402 as thin as possible.

Further, the measurement system may be configured as shown in FIG. As shown in the figure, the measuring system 500 differs from the measuring system 100 in that it includes a corner portion 502.

The corner portion 502 is a portion where the bottom portion 112 and the side wall portion 114 of the container 110 are in contact with each other (more strictly, a portion connecting the bottom portion 112 and the side wall portion 114), and is an inclined surface. As shown in the figure, the corner portion 502 may connect the bottom portion 112 and the side wall portion 114 with a straight line in the cross section of the container 110, and may connect the bottom portion 112 and the side wall portion 114 with a curved line. You may. The corner portion 502 configured in this way can be substantially treated as the bottom portion 112, and can also be treated as the side wall portion 114. Then, in the measurement system 500, the detection surface 122 (measurement unit 120) is arranged at the corner portion 502.

Here, as described above, the container 110 is rotated (rotated) about the rotation axis L2 inclined with respect to the revolution axis L1, and due to this, the container 110 is stored in the container 110 to be processed. The material M is collected in the vicinity of the corner 502 of the container 110 during the treatment. From this, the measuring system 500 can more reliably measure the shear stress and the like acting on the material M to be treated during the treatment in the centrifuge 1.

(Other embodiments)
The measurement system 700 can be used as another mechanism for knowing the state of the material M to be processed during processing. FIG. 7 is a schematic cross-sectional view showing the measurement system 700. The measurement system 700 includes a lid portion 710, a measurement unit 720, and an illumination unit 722. In the following, the configurations with the same reference numerals as the above-described configurations have common functions unless otherwise specified.

The lid portion 710 closes the open end 118 of the container 110, and is configured to be removable from the container 110.
The measuring unit 720 is arranged on the lid unit 710 in a state in which the light reflected by the material M to be processed housed in the container 110 can be received. For example, the measuring unit 720 is arranged on the surface of the lid unit 710 facing the inside of the container 110. The measuring unit 720 measures the intensity of a predetermined wavelength component (wavelength range) included in the received light. The wavelength component measured by the measuring unit 720 may be one or may be plural. For example, the measuring unit 720 measures the intensity of the red component, the intensity of the green component, and the intensity of the blue component contained in the received light.

The illumination unit 722 is arranged on the lid unit 710 so that the material M to be processed stored in the container 110 can be illuminated. For example, the lighting unit 722 is arranged on the surface of the lid unit 710 facing the inside of the container 110. The illumination unit 722 usually emits visible light, and may be, for example, an LED that emits white light. In addition, the illumination unit 722 may emit visible light only in a specific wavelength range.

FIG. 8 is a block diagram showing the measurement system 700. As shown in the figure, the measurement system 700 includes a first portion 800 and a second portion 300.
The first portion 800 includes the lid portion 710, the measurement unit 720, and the illumination unit 722 described above. In addition, the first portion 800 includes a first communication unit 202 and a power supply unit 204. Further, the first portion 800 may include a processing unit (not shown), a storage unit, and the like.

The measurement system 700 configured as described above can determine the state of the material M to be processed during the processing in the centrifuge 1. Specifically, in the measurement system 700, the material M to be processed is illuminated by the illumination unit 722, and the light reflected by the material M to be processed (light reflected by the material M to be processed) is received by the measurement unit 720. The measuring unit 720 measures the intensity of a predetermined wavelength component included in the received light, for example, the intensity of the red component, the intensity of the green component, and the intensity of the blue component. The first communication unit 202 receives each information (specifically, the intensity of each wavelength component) measured by the measurement unit 720, and transmits the information via the wireless communication line.

The second communication unit 302 receives the information transmitted by the first communication unit 202 and outputs the information to the processing unit 304. The processing unit 304 determines the state of the material M to be processed based on the information received from the second communication unit 302. This is based on the fact that some of the materials M to be treated have a color that changes depending on the state, a light reflectance (reflection amount), and the like. For example, when the material M to be treated is a two-component adhesive or a two-component sealing material, the colors of the main agent and the curing agent are generally different, so that the color changes depending on the state (stirring state). Further, when the material M to be treated is a resin (particularly a high-viscosity resin), the amount of light reflected changes depending on the state (defoaming condition) because the scattering of light by the bubbles differs depending on the defoaming condition. To do. Further, even when the material M to be treated is an emulsified liquid or a suspension liquid, the color and the amount of light reflected change depending on the state of treatment. From these facts, the processing unit 304 can determine the state of the material M to be processed based on the intensity of each wavelength component reflected by the material M to be processed. For example, during the processing of the material M to be treated, the processing unit 304 has (i) at least two absolute values of the intensity of the red component, the intensity of the green component, and the intensity of the blue component, and (ii) the intensity of the red component. Time variation of at least two absolute values of green component intensity and blue component intensity, (iii) relative value between at least two of red component intensity, green component intensity, and blue component intensity, (iii). iv) The state of the material M to be treated is determined based on at least one of the intensity of the red component, the intensity of the green component, and the temporal change of the relative value between at least two of the intensities of the blue component. For example, the processing unit 304 makes this determination by referring to a table showing the relationship between the above (i) to (iv) stored in a storage unit (not shown) and the state of the material M to be processed. It is also assumed that the processing unit 304 makes this determination by using machine learning or the like. The processing unit 304 outputs the determination result of the state of the material M to be processed to the output unit 308, and / or controls the centrifuge 1 according to the determination result of the processing status of the material M to be processed. The processing unit 304 may output the intensity of each wavelength component, which is the received information, to the output unit 308.

As described above, the measurement system 700 can provide the user with information (state) of the material M to be processed being processed by the centrifuge 1, and can also control the centrifuge 1 based on the information. Therefore, the centrifuge Many conveniences can be provided to one user.

The measuring unit 720 is capable of receiving the light reflected by the material M to be processed stored in the container 110, and the lighting unit 722 receives the material M to be processed stored in the container 110. It is also assumed that the container is arranged in a place other than the lid 710, provided that it can be illuminated. For example, after satisfying the above conditions, the measuring unit 720 and the lighting unit 722 may be arranged on a lid portion (not shown) of the holder portion 22.
Further, when the measuring unit 720 measures only one wavelength component, the processing unit 304 measures the absolute value of the intensity of the one wavelength component and / or its time change during the processing of the material M to be processed. The state of the material M to be treated may be determined based on the above.

It is also assumed that the illumination unit 722 emits ultraviolet light or infrared light in addition to visible light or without emitting visible light. In this case, the measuring unit 720 also receives the fluorescence due to the material M to be processed, and measures the intensity of the wavelength component including the fluorescence due to the material M to be processed contained in the received light. This is based on the fact that some of the materials M to be treated are fluorescent. For example, when a predetermined substance contained in the material M to be treated fluoresces, the fluorescence intensity changes as a result of the distribution of the predetermined substance changing depending on the state (stirring state) of the material M to be treated (the state of stirring). As a specific example, if the predetermined substance is unevenly distributed in the material M to be treated, the fluorescence intensity becomes unstable, but as the treatment of the material M to be treated progresses, the predetermined substance becomes the material M to be treated. Since it is uniformly distributed in the inside, the fluorescence intensity is constant.) From this, the processing unit 304 is based on the absolute value of the intensity of the wavelength component including fluorescence by the material M to be processed and / or the time change of the intensity of the wavelength component including fluorescence during the processing of the material M to be processed. The state of the material M to be treated can be determined. The measuring unit 720 measures a plurality of intensity of the wavelength component including fluorescence due to the material M to be processed contained in the received light (for example, the intensity of the first wavelength component including fluorescence due to the material M to be processed and the object to be processed. It is also assumed that the intensity of the second wavelength component including fluorescence by the treated material M) is measured), and in this case, the processing unit 304 may (i) fluoresce by the treated material M during the treatment of the processed material M. At least two absolute values of the intensity of the wavelength component including, (iii) time variation of at least two absolute values of the intensity of the wavelength component including fluorescence by the material M to be treated, and (iii) fluorescence by the material M to be treated. To at least one of (iv) a time change of a relative value between at least two of the intensity of the wavelength component including fluorescence due to the material M to be treated, and a relative value between at least two of the intensity of the wavelength component containing. Based on this, the state of the material M to be treated is determined. The processing unit 304 may make this determination by referring to a table, using machine learning, or the like, as in the case of making a determination based on the light reflected by the material M to be processed described above.

Further, it is assumed that the processing performed by the processing unit 304 described above is performed in a processing unit (not shown) provided in the first portion 800. In this case, the processing unit receives each information measured by the measuring unit 720, performs the same processing as described above, and outputs the information to the first communication unit 202.

In addition, although various embodiments are disclosed in the present specification, specific features (technical matters) in one embodiment are added to other embodiments or other embodiments while being appropriately improved. It can be replaced with specific features in embodiments, such embodiments are also included in the gist of the invention.

The present invention can be widely used in the field of a rotating / revolving centrifuge.

1: Centrifugal machine, 10: Revolving structure, 11: Shaft, 12: 1st arm, 13: 2nd arm, 20: Rotating body, 21: Shaft, 22: Holder, 30: Support substrate, 100: Measurement System, 110: Container, 112: Bottom, 114: Side wall, 116: Corner, 118: Open end, 120: Measuring part, 122: Detection surface, 200: First part, 202: First communication part, 204: Power supply unit, 300: 2nd part, 302: 2nd communication unit, 304: Processing unit, 306: Input unit, 308: Output unit, 400: Measurement system, 402: Coating unit, 404: 2nd container, 500: Measurement System, 502: Corner part, 700: Measurement system, 710: Lid part, 720: Measurement part, 722: Lighting part, 800: First part, C: Center, CL: Center line, L1: Revolution axis, L2: Rotation Axis, M: Material to be treated

Claims (7)

A lighting unit that can illuminate the material to be processed stored in a container that can perform at least one of the revolution around the revolution axis and the rotation around the rotation axis.
When the container is performing at least one of the revolution around the revolution axis and the rotation around the rotation axis, the reflected light by the material to be treated and / or the material to be treated. A measuring unit that measures the intensity of a predetermined wavelength component contained in the fluorescence of
A processing unit that determines the state of the material to be processed according to the intensity of the predetermined wavelength component, and
A measurement system. The predetermined wavelength component includes a first wavelength component and a second wavelength component, and the measuring unit individually measures the intensity of the first wavelength component and the intensity of the second wavelength component. The measurement system according to claim 1. The processing unit has (i) the absolute value of the intensity of the first wavelength component and the intensity of the second wavelength component, (ii) the intensity of the first wavelength component, and the second wavelength. Time variation of the absolute value of the intensity of the component, (iii) relative value between the intensity of the first wavelength component and the intensity of the second wavelength component, (iv) the intensity of the first wavelength component and the second The measuring system according to claim 2, wherein the state of the material to be treated is determined based on at least one of the time changes of the relative value between the intensities of the wavelength components of the above. The measuring system according to any one of claims 1 to 3, wherein the measuring unit is arranged on a lid that can close the open end of the container. The measuring system according to claim 4, wherein the lighting unit is arranged on the lid unit. The measurement system according to any one of claims 1 to 5.
A revolution body that can rotate around the revolution axis and
A rotating body that is held by the revolving body and can rotate about the rotation axis,
A drive unit that applies a rotational force to at least one of the revolving body and the rotating body,
With
The rotating body is a centrifuge that holds the container. A step of illuminating the material to be processed stored in a container capable of performing at least one of the revolution around the revolution axis and the rotation around the rotation axis.
When the container is performing at least one of the revolution around the revolution axis and the rotation around the rotation axis, the reflected light by the material to be treated and / or the fluorescence by the material to be treated. And the step of measuring the intensity of a predetermined wavelength component contained in
A step of determining the state of the material to be treated according to the intensity of the predetermined wavelength component, and
A method for determining the state of the material to be treated.

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