JP2021039302A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2021039302A5 JP2021039302A5 JP2019161966A JP2019161966A JP2021039302A5 JP 2021039302 A5 JP2021039302 A5 JP 2021039302A5 JP 2019161966 A JP2019161966 A JP 2019161966A JP 2019161966 A JP2019161966 A JP 2019161966A JP 2021039302 A5 JP2021039302 A5 JP 2021039302A5
- Authority
- JP
- Japan
- Prior art keywords
- width
- novolac
- sio
- etching
- adhesion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019161966A JP7427885B2 (ja) | 2019-09-05 | 2019-09-05 | フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019161966A JP7427885B2 (ja) | 2019-09-05 | 2019-09-05 | フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2021039302A JP2021039302A (ja) | 2021-03-11 |
| JP2021039302A5 true JP2021039302A5 (https=) | 2022-09-02 |
| JP7427885B2 JP7427885B2 (ja) | 2024-02-06 |
Family
ID=74847064
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019161966A Active JP7427885B2 (ja) | 2019-09-05 | 2019-09-05 | フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP7427885B2 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7815022B2 (ja) * | 2022-05-09 | 2026-02-17 | 東京応化工業株式会社 | ネガ型感光性樹脂組成物、硬化物及びパターン化された硬化物の製造方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5912102A (en) * | 1994-12-28 | 1999-06-15 | Nippon Zeon Co., Ltd. | Positive resist composition |
| JP6302643B2 (ja) * | 2013-11-08 | 2018-03-28 | 東京応化工業株式会社 | ポジ型レジスト組成物、及びレジストパターン形成方法、並びに、メタル層からなるパターンの形成方法、及び貫通電極の製造方法 |
| JP7147768B2 (ja) * | 2017-09-11 | 2022-10-05 | Ｕｂｅ株式会社 | フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物 |
-
2019
- 2019-09-05 JP JP2019161966A patent/JP7427885B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2018084740A5 (https=) | ||
| JP2017518645A5 (https=) | ||
| JP2009505424A5 (https=) | ||
| WO2010018430A8 (en) | A hardmask process for forming a reverse tone image | |
| JP2020107947A5 (https=) | ||
| JP2016153424A5 (https=) | ||
| JP2010213262A5 (https=) | ||
| JP2014149409A5 (https=) | ||
| JP2019212872A5 (https=) | ||
| JP2018127649A5 (https=) | ||
| JP2009524697A5 (https=) | ||
| ATE535575T1 (de) | Polyamid-nanokomposite mit hyperverzweigten polyetheraminen | |
| JP2014158035A5 (https=) | ||
| WO2016042408A3 (en) | Compositions for etching titanium nitride having compatability with silicon germanide and tungsten | |
| JP2017152541A5 (https=) | ||
| TW200506532A (en) | Antireflective film material, and antireflective film and pattern formation method using the same | |
| JP2012099598A5 (https=) | ||
| JP2013232513A5 (https=) | ||
| WO2017137142A8 (en) | A polymer, composition, forming sacrificial layer and method for semiconductor device therewith | |
| SG11201903267UA (en) | High etch resistance spin-on carbon hard mask composition and patterning method using same | |
| JP2021039302A5 (https=) | ||
| JP2018526252A5 (https=) | ||
| JP2018509309A5 (https=) | ||
| JP2019169729A5 (https=) | ||
| JP2016060081A5 (https=) |