JP2021039302A5 - - Google Patents

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JP2021039302A5
JP2021039302A5 JP2019161966A JP2019161966A JP2021039302A5 JP 2021039302 A5 JP2021039302 A5 JP 2021039302A5 JP 2019161966 A JP2019161966 A JP 2019161966A JP 2019161966 A JP2019161966 A JP 2019161966A JP 2021039302 A5 JP2021039302 A5 JP 2021039302A5
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JP7427885B2 (ja
JP2021039302A (ja
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JP2019161966A 2019-09-05 2019-09-05 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物 Active JP7427885B2 (ja)

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JP2019161966A JP7427885B2 (ja) 2019-09-05 2019-09-05 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物

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JP2019161966A JP7427885B2 (ja) 2019-09-05 2019-09-05 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物

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JP2021039302A JP2021039302A (ja) 2021-03-11
JP2021039302A5 true JP2021039302A5 (https=) 2022-09-02
JP7427885B2 JP7427885B2 (ja) 2024-02-06

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JP2019161966A Active JP7427885B2 (ja) 2019-09-05 2019-09-05 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物

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JP7815022B2 (ja) * 2022-05-09 2026-02-17 東京応化工業株式会社 ネガ型感光性樹脂組成物、硬化物及びパターン化された硬化物の製造方法

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US5912102A (en) * 1994-12-28 1999-06-15 Nippon Zeon Co., Ltd. Positive resist composition
JP6302643B2 (ja) * 2013-11-08 2018-03-28 東京応化工業株式会社 ポジ型レジスト組成物、及びレジストパターン形成方法、並びに、メタル層からなるパターンの形成方法、及び貫通電極の製造方法
JP7147768B2 (ja) * 2017-09-11 2022-10-05 Ｕｂｅ株式会社 フォトレジスト用フェノール樹脂組成物及びフォトレジスト組成物

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