JP2021015039A - Processing device, processing system, and production system - Google Patents

Processing device, processing system, and production system Download PDF

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JP2021015039A
JP2021015039A JP2019129759A JP2019129759A JP2021015039A JP 2021015039 A JP2021015039 A JP 2021015039A JP 2019129759 A JP2019129759 A JP 2019129759A JP 2019129759 A JP2019129759 A JP 2019129759A JP 2021015039 A JP2021015039 A JP 2021015039A
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passivation
passivation film
flow path
defect
wall
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JP7195231B2 (en
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末松 孝章
Takaaki Suematsu
孝章 末松
将宏 伊藤
Masahiro Ito
将宏 伊藤
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Hitachi Plant Services Co Ltd
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Abstract

To provide a processing device that can reduce the work load on workers.SOLUTION: A processing device includes: a detection unit 52 that detects, based on an inspection result at an inspection device 40 that inspects presence or absence of defects in a passivation film formed on an inner wall of a flow path forming member made from passivation forming metal that forms a fluid flow path, defects of the passivation film on the inner wall; a formation start determination unit 53 that determines that it is necessary to form the passivation film on the inner wall when the detection unit 52 detects the defects; and a first control unit 54 that forms the passivation film on the inner wall by driving a construction device 20 that forms the passivation film on the inner wall of the flow path forming member by flowing the passivation forming liquid through the flow path forming member when the determination unit 53 determines that it is necessary to form the passivation film.SELECTED DRAWING: Figure 4

Description

本発明は、処理装置、処理システム及び生産システムに関する。 The present invention relates to processing equipment, processing systems and production systems.

例えば飲料品、医薬、食品等の生産システムでは、例えば原料液、培養液等が金属製の配管内部を流通する。配管は例えばステンレス等の不動態形成金属により構成され、配管内壁には不動態皮膜が形成される。不動態皮膜の形成により、配管内部での腐食が抑制される。しかし、何らかの原因により不動態皮膜に欠損が生じ、不動態皮膜内部の金属が露出することがある。欠損を起点する腐食が生じ易くなることから、生じた欠損は修復されることが好ましい。なお、ここでいう欠損とは、例えば、不動態皮膜の割れ、傷、錆、剥離、溶解等を含む。 For example, in a production system for beverages, pharmaceuticals, foods, etc., for example, raw material liquids, culture liquids, etc. circulate inside metal pipes. The pipe is made of a passivation-forming metal such as stainless steel, and a passivation film is formed on the inner wall of the pipe. Corrosion inside the pipe is suppressed by forming a passivation film. However, for some reason, the passivation film may be damaged and the metal inside the passivation film may be exposed. It is preferable that the generated defect is repaired because the corrosion originating from the defect is likely to occur. The defect referred to here includes, for example, cracking, scratching, rusting, peeling, melting, etc. of the passivation film.

欠損検査を行う技術として、特許文献1に記載の技術が知られている。特許文献1には、測定すべきステンレス鋼の被検体を直接一極とし、該被検体は同一材質よりなり活性化状態とした他の一極は被検体を溶解することができる電解液を含浸せしめた帯水性紙葉物質を介して上記被検体表面に接触せしめるとともに、該両極間の自然発生電位を測定し、該発生電位の変化から被検体の不動態化の程度を判定する金属の不動態化効果の簡易測定方法が記載されている。 As a technique for performing a defect inspection, the technique described in Patent Document 1 is known. In Patent Document 1, the stainless steel subject to be measured is directly defined as one pole, and the other pole made of the same material and in an activated state is impregnated with an electrolytic solution capable of dissolving the subject. The surface of the subject is brought into contact with the surface of the subject through the water-bearing paper material, and the spontaneous potential between the two poles is measured, and the degree of passivation of the subject is determined from the change in the generated potential. A simple method for measuring the passivation effect is described.

特公平5−23386号公報(特に請求項1参照)Japanese Patent Publication No. 5-23386 (see particular claim 1)

特許文献1に記載の技術では、欠損検査を行う部位への検査装置の設置により、欠損検査が行われる。そして、特許文献1に記載の技術において、作業員が欠損を確認した場合、欠損修復のため作業員は、配管内部への例えば不動態形成液(例えば硝酸等)の流通を行う。このため、欠損が確認されるたびに作業員による欠損修復作業が行われ、作業が煩雑である。 In the technique described in Patent Document 1, defect inspection is performed by installing an inspection device at a site where defect inspection is performed. Then, in the technique described in Patent Document 1, when the worker confirms a defect, the worker distributes, for example, a passivation-forming liquid (for example, nitric acid) to the inside of the pipe for repairing the defect. Therefore, every time a defect is confirmed, a worker repairs the defect, which is complicated.

本発明は、作業員の作業負担を軽減可能な処理装置、処理システム及び生産システムを提供することを課題とする。 An object of the present invention is to provide a processing device, a processing system and a production system capable of reducing the work load of a worker.

本発明の処理装置は、流体流路を形成する不動態形成金属製の流路形成部材の内壁に形成された不動態皮膜の欠損の有無を検査する検査装置での検査結果に基づいて、前記内壁での前記不動態皮膜の欠損を検出する検出部と、前記検出部によって前記欠損が検出されたとき、前記内壁への前記不動態皮膜の形成が必要と判定する形成開始判定部と、前記形成開始判定部によって前記不動態皮膜の形成が必要と判定されたとき、前記流路形成部材への不動態形成液の流通により前記流路形成部材の内壁に不動態皮膜を形成する施工装置の駆動により、前記内壁への前記不動態皮膜の形成を行う第1制御部と、を備える。その他の解決手段は発明を実施するための形態において後記する。 The processing apparatus of the present invention is based on the inspection result of the inspection apparatus for inspecting the presence or absence of a defect of the passivation film formed on the inner wall of the passivation-forming metal channel-forming member forming the fluid flow path. A detection unit that detects a defect in the passivation film on the inner wall, a formation start determination unit that determines that it is necessary to form the passivation film on the inner wall when the detection unit detects the defect, and the above-mentioned When the formation start determination unit determines that the passivation film needs to be formed, the construction apparatus for forming the passivation film on the inner wall of the passivation forming member by the flow of the passivation forming liquid to the flow path forming member. It includes a first control unit that forms the passivation film on the inner wall by driving. Other solutions will be described later in the form for carrying out the invention.

本発明によれば、作業員の作業負担を軽減可能な処理装置、処理システム及び生産システムを提供できる。 According to the present invention, it is possible to provide a processing device, a processing system and a production system capable of reducing the work load of a worker.

第1実施形態に係る生産システムの系統図である。It is a system diagram of the production system which concerns on 1st Embodiment. 反応部における検査装置の設置部分を拡大した図である。It is an enlarged view of the installation part of the inspection apparatus in a reaction part. 反応部における検査装置の設置部分を拡大した図であり、図2とは異なる部分を示す図である。It is an enlarged view of the installation part of the inspection apparatus in a reaction part, and is the figure which shows the part different from FIG. 処理装置のブロック図である。It is a block diagram of a processing apparatus. 応答値に基づく欠損検出方法を説明する図である。It is a figure explaining the defect detection method based on the response value. 第1実施形態に係る処理方法を示すフローチャートである。It is a flowchart which shows the processing method which concerns on 1st Embodiment. 第2実施形態に係る生産システムの系統図である。It is a system diagram of the production system which concerns on 2nd Embodiment. 第2実施形態に係る処理方法を示すフローチャートである。It is a flowchart which shows the processing method which concerns on 2nd Embodiment.

以下、本発明を実施するための形態(本実施形態)を説明する。ただし、本発明は以下の実施形態に限定されず、本発明の効果を著しく損なわない範囲で任意に変形して実施できる。本発明は、異なる実施形態同士を組み合わせて実施してもよい。異なる実施形態において、同じ部材及びステップ番号については同じ符号を付すものとし、説明の簡略化のために重複する説明は省略する。参照する各図は模式的なものであり、実際の装置構成と厳密に一致する装置構成を図示するものではない。 Hereinafter, embodiments for carrying out the present invention (the present embodiment) will be described. However, the present invention is not limited to the following embodiments, and can be arbitrarily modified and implemented as long as the effects of the present invention are not significantly impaired. The present invention may be implemented by combining different embodiments. In different embodiments, the same members and step numbers are designated by the same reference numerals, and duplicate description will be omitted for simplification of description. Each of the referenced figures is schematic and does not illustrate a device configuration that exactly matches the actual device configuration.

図1は、第1実施形態に係る生産システム100の系統図である。生産システム100は、生産装置10と、施工装置20と、検査装置40と、処理装置50とを備える。これらのうち、本実施形態の処理システム(符号は付さず)は、施工装置20と検査装置40と処理装置50とを備える。図1において、装置群(例えば生産装置10等)を構成する各装置を装置群毎に破線で囲っているが、以下で説明する装置群の装置であっても、図示の都合上、同じ破線で囲まないことがある。 FIG. 1 is a system diagram of the production system 100 according to the first embodiment. The production system 100 includes a production device 10, a construction device 20, an inspection device 40, and a processing device 50. Of these, the processing system (not designated) of the present embodiment includes a construction device 20, an inspection device 40, and a processing device 50. In FIG. 1, each device constituting the device group (for example, the production device 10 or the like) is surrounded by a broken line for each device group, but the devices of the device group described below also have the same broken line for convenience of illustration. It may not be surrounded by.

生産装置10は、原料流体を用いて目的流体を生産するものである。例えば原料流体は液体原料であり、目的流体は液体生産物である。例えば、液体原料として糖類を溶解させた水及び色素液等を使用することで、例えば清涼飲料水等の飲料品を生産できる。同様にして、生産装置10によって食品も生産できる。また、液体原料として液体培地を使用し、液体生産物として培養液を得る場合、例えばバイオ医薬品を生産する微生物の培養により、培養した微生物から医薬品を生産できる。 The production apparatus 10 produces a target fluid using the raw material fluid. For example, the raw material fluid is a liquid raw material and the target fluid is a liquid product. For example, by using water in which sugars are dissolved, a pigment solution, or the like as a liquid raw material, a beverage product such as a soft drink can be produced. Similarly, food can be produced by the production apparatus 10. Further, when a liquid medium is used as a liquid raw material and a culture solution is obtained as a liquid product, a drug can be produced from the cultured microorganism, for example, by culturing a microorganism that produces a biopharmacy.

生産装置10は、原料流体を貯留するタンク18と、弁11と、原料流体を流すポンプ12と、熱媒(例えば蒸気)により原料流体を加熱する熱交換器13と、長大な流路形成部材17(図2、図3参照。図1では図示しない)により構成される反応部14と、目的流体を回収するタンク15と、弁16とを備える。これらは、図1において実線矢印で示す流路形成部材17により接続される。 The production apparatus 10 includes a tank 18 for storing the raw material fluid, a valve 11, a pump 12 for flowing the raw material fluid, a heat exchanger 13 for heating the raw material fluid with a heat medium (for example, steam), and a long flow path forming member. It includes a reaction unit 14 composed of 17 (see FIGS. 2 and 3; not shown in FIG. 1), a tank 15 for collecting a target fluid, and a valve 16. These are connected by a flow path forming member 17 indicated by a solid arrow in FIG.

流路形成部材17は原料流体又は目的流体のうちの少なくとも一方が流れる流体流路を形成するものである。流路形成部材17は、例えば配管、タンク、又はポンプのうちの少なくとも1種を含む。流路形成部材17が例えば配管である場合には、流体流路は配管内部に形成される。流路形成部材17が例えばタンク15,18等である場合には、原料流体はタンク15,18の中で流動するため、タンク15,18の内部に流体流路が形成される。流路形成部材17が例えばポンプ12である場合には、流体流路は、ポンプ12を構成する羽根車(図示しない)に流体が接触するように形成される。即ち、流体流路は、ポンプ12の内部に形成される。以下の説明では、説明の簡略化のために、流路形成部材17が配管である例を主に示す。 The flow path forming member 17 forms a fluid flow path through which at least one of the raw material fluid and the target fluid flows. The flow path forming member 17 includes, for example, at least one of a pipe, a tank, or a pump. When the flow path forming member 17 is, for example, a pipe, the fluid flow path is formed inside the pipe. When the flow path forming member 17 is, for example, tanks 15 and 18, the raw material fluid flows in the tanks 15 and 18, so that a fluid flow path is formed inside the tanks 15 and 18. When the flow path forming member 17 is, for example, a pump 12, the fluid flow path is formed so that the fluid comes into contact with an impeller (not shown) constituting the pump 12. That is, the fluid flow path is formed inside the pump 12. In the following description, for simplification of the description, an example in which the flow path forming member 17 is a pipe is mainly shown.

流路形成部材17は、不動態形成金属製であり、不動態形成金属は例えば、アルミニウム、クロム、チタン等の単体又は合金のほか、ステンレス等を含む。流路形成部材17の内壁17b(図1では図示しない。図2、図3参照)には不動態皮膜17aが形成され、流路形成部材17の腐食が抑制される。 The flow path forming member 17 is made of a passivation-forming metal, and the passivation-forming metal includes, for example, a simple substance such as aluminum, chromium, titanium, or an alloy, as well as stainless steel or the like. A passivation film 17a is formed on the inner wall 17b of the flow path forming member 17 (not shown in FIG. 1, see FIGS. 2 and 3), and corrosion of the flow path forming member 17 is suppressed.

熱交換器13で加熱された原料流体は、反応部14を流れる。反応部14の流通時、流路形成部材17の内部での反応促進により、目的流体が生産される。生産された目的流体は、タンク15に回収され、弁16の開弁により、外部に取り出される。 The raw material fluid heated by the heat exchanger 13 flows through the reaction unit 14. During the flow of the reaction unit 14, the target fluid is produced by promoting the reaction inside the flow path forming member 17. The produced target fluid is collected in the tank 15 and taken out to the outside by opening the valve 16.

生産システム100は、反応部14を構成する流路形成部材17の内壁17bでの不動態皮膜の欠損の有無を検査する検査装置40を備える。検査装置40は、流路形成部材17の内壁17bでの不動態皮膜17aの欠損の有無を非破壊で検査する非破壊検査装置(検査装置40の一例)を含む。非破壊検査装置を備えることで、流路形成部材17を破壊することなく、流路形成部材17の内壁17bでの不動態皮膜の欠損の有無を検査できる。 The production system 100 includes an inspection device 40 for inspecting the inner wall 17b of the flow path forming member 17 constituting the reaction unit 14 for a defect of the passivation film. The inspection device 40 includes a non-destructive inspection device (an example of the inspection device 40) that non-destructively inspects the presence or absence of a defect of the passivation film 17a on the inner wall 17b of the flow path forming member 17. By providing the non-destructive inspection device, it is possible to inspect whether or not the passivation film is missing on the inner wall 17b of the flow path forming member 17 without destroying the flow path forming member 17.

図2は、反応部14における検査装置40の設置部分14a(図1をあわせて参照)を拡大した図である。例えば配管等の流路形成部材17の内部には、白抜き矢印で示すように、原料流体等が流れる。流路形成部材17の内壁17bには、上記のように不動態皮膜17aが形成される。これらの点は、後記する図3においても同様である。 FIG. 2 is an enlarged view of the installation portion 14a (see also FIG. 1) of the inspection device 40 in the reaction unit 14. For example, a raw material fluid or the like flows inside a flow path forming member 17 such as a pipe, as shown by a white arrow. A passivation film 17a is formed on the inner wall 17b of the flow path forming member 17 as described above. These points are the same in FIG. 3 described later.

検査装置40は、流路形成部材17に接続される第1電極45を備える。第1電極45は、流路形成部材17の外周に電気的に接続される。第1電極45は導電性金属(検査環境中で耐食性を持つもの)により構成される。第1電極45は、例えば環状であり、例えば円管状の流路形成部材17の外表面に対し例えば溶接等により固定される。なお、例えば円管状の第1電極45の内壁17bと同じく例えば円管状の流路形成部材17の内壁17bとが同一面になるように、第1電極45の内壁17bが流路形成部材17の一部を構成するようにしてもよい。 The inspection device 40 includes a first electrode 45 connected to the flow path forming member 17. The first electrode 45 is electrically connected to the outer periphery of the flow path forming member 17. The first electrode 45 is made of a conductive metal (which has corrosion resistance in an inspection environment). The first electrode 45 is, for example, annular, and is fixed to the outer surface of the circular tubular flow path forming member 17, for example, by welding or the like. The inner wall 17b of the first electrode 45 is formed on the flow path forming member 17 so that the inner wall 17b of the circular tubular first electrode 45 and the inner wall 17b of the circular tubular first electrode 45 are flush with each other. A part may be configured.

第1電極45は、図2において破線矢印で示す電気信号線を通じて、電源装置41(図2では図示しない。図1参照)に接続される。電源装置41については、図1を参照しながら後記する。 The first electrode 45 is connected to the power supply device 41 (not shown in FIG. 2, see FIG. 1) through the electric signal line indicated by the broken line arrow in FIG. The power supply device 41 will be described later with reference to FIG.

図3は、反応部14における検査装置40の設置部分14b(図1をあわせて参照)を拡大した図であり、図2とは異なる部分を示す図である。検査装置40は、第2電極46を備える。第2電極46は、流路形成部材17で形成された流体流路を流れる導電性の欠損検査液(後記する)と接触し、かつ、流路形成部材17とは絶縁して配置されるものである。第2電極46は、外側に張り出すことで拡管した流路形成部材17の内部に配置される。これにより、流路形成部材17の内部での原料流体等の流通時、流通抵抗の過度の増大を抑制できる。 FIG. 3 is an enlarged view of the installation portion 14b (see also FIG. 1) of the inspection device 40 in the reaction unit 14, and is a diagram showing a portion different from FIG. The inspection device 40 includes a second electrode 46. The second electrode 46 is arranged so as to be in contact with the conductive defect inspection liquid (described later) flowing through the fluid flow path formed by the flow path forming member 17 and to be insulated from the flow path forming member 17. Is. The second electrode 46 is arranged inside the flow path forming member 17 which is expanded by projecting outward. As a result, it is possible to suppress an excessive increase in distribution resistance during distribution of the raw material fluid or the like inside the flow path forming member 17.

第2電極46は、流路形成部材17の内壁17bに対し、例えばゴム等の絶縁体44を介して固定される。第2電極46は導電性金属(例えば銅)により構成され、例えば平板状である。第2電極46は、図3において破線矢印で示す電気信号線を通じて、測定装置42(図2では図示しない。図1参照)に接続される。測定装置42については、図1を参照しながら後記する。 The second electrode 46 is fixed to the inner wall 17b of the flow path forming member 17 via an insulator 44 such as rubber. The second electrode 46 is made of a conductive metal (for example, copper) and has a flat plate shape, for example. The second electrode 46 is connected to the measuring device 42 (not shown in FIG. 2, see FIG. 1) through the electric signal line indicated by the broken line arrow in FIG. The measuring device 42 will be described later with reference to FIG.

図1に戻って、検査装置40は、上記のように、反応部14を構成する流路形成部材17の内壁17bでの不動態皮膜17aの欠損の有無を検査するものである。検査装置40は、上記の第1電極45及び第2電極46のほか、電源装置41及び測定装置42を備える。 Returning to FIG. 1, the inspection device 40 inspects the presence or absence of the passivation film 17a on the inner wall 17b of the flow path forming member 17 constituting the reaction unit 14 as described above. The inspection device 40 includes a power supply device 41 and a measuring device 42 in addition to the above-mentioned first electrode 45 and second electrode 46.

電源装置41は、第1電極45と第2電極46との間へのパルス電圧の印加又はパルス電流の通電の何れかを行うものである。電源装置41は、第1電極45及び第2電極46に対して破線で示す電気信号線により接続される。電源装置41の駆動制御は、電気信号線等を介して接続された処理装置50(後記する)により行われる。 The power supply device 41 either applies a pulse voltage or energizes a pulse current between the first electrode 45 and the second electrode 46. The power supply device 41 is connected to the first electrode 45 and the second electrode 46 by an electric signal line shown by a broken line. The drive control of the power supply device 41 is performed by the processing device 50 (described later) connected via an electric signal line or the like.

印加するパルス電圧は、例えば最大で2Vである。通電するパルス電流は、例えば最大で1Aである。パルス電圧又はパルス電流は、例えば1パルス毎に徐々に大きくできる。パルス電圧の印加時間又はパルス電流の通電時間(パルス幅)は、不動態皮膜17a(図2、図3参照)の静電容量が十分に充電される時間とすることが好ましく、例えば、10ミリ秒以上50ミリ秒以下である。パルス同士の間隔は、不動態皮膜17a(図2、図3参照)の静電容量が十分に放電される時間とすることが好ましく、例えば1秒以上10秒以下である。 The pulse voltage to be applied is, for example, 2 V at the maximum. The maximum energized pulse current is, for example, 1 A. The pulse voltage or pulse current can be gradually increased, for example, for each pulse. The application time of the pulse voltage or the energization time (pulse width) of the pulse current is preferably a time during which the capacitance of the passivation film 17a (see FIGS. 2 and 3) is sufficiently charged, for example, 10 mm. It is not less than 50 milliseconds. The interval between the pulses is preferably a time during which the capacitance of the passivation film 17a (see FIGS. 2 and 3) is sufficiently discharged, and is, for example, 1 second or more and 10 seconds or less.

測定装置42は、電源装置41によるパルス電圧の印加により生じた応答電流、又はパルス電流の通電により生じた応答電圧の何れかの応答値を測定するものである。測定装置42は、第1電極45と第2電極46との間で流れる電流、又は、第1電極45と第2電極46との間で生じる電圧のいずれかを測定可能な位置に設置される。測定装置42は、例えば、電圧計又は電流計を含む。測定装置42による測定値は、電気信号線等を介して接続された処理装置50(後記する)に送信される。 The measuring device 42 measures the response value of either the response current generated by the application of the pulse voltage by the power supply device 41 or the response voltage generated by the energization of the pulse current. The measuring device 42 is installed at a position where either the current flowing between the first electrode 45 and the second electrode 46 or the voltage generated between the first electrode 45 and the second electrode 46 can be measured. .. The measuring device 42 includes, for example, a voltmeter or an ammeter. The measured value by the measuring device 42 is transmitted to the processing device 50 (described later) connected via an electric signal line or the like.

検査装置40による不動態皮膜17aの欠損検査は、後記する施工装置20の設備を用いて行われる。そこで、説明の便宜上、まず施工装置20の構成について説明し、ついで、検査装置40による欠損検査の方法を説明する。 The defect inspection of the passivation film 17a by the inspection device 40 is performed using the equipment of the construction device 20 described later. Therefore, for convenience of explanation, the configuration of the construction device 20 will be described first, and then the method of defect inspection by the inspection device 40 will be described.

施工装置20は、流路形成部材17への不動態形成液の流通により、流路形成部材17の内壁17bに不動態皮膜17aを形成するものである。施工装置20は、弁25,21と、タンク22,23と、ポンプ24とを備える。タンク23には、流路形成部材17の内壁17bへの不動態皮膜17a形成時に使用される不動態形成液の原液が供給される。なお、詳細は後記するが、タンク23には、不動態皮膜17aの欠損検査時に使用される欠損検査液の原液も、不動態形成液の原液とは別に供給される。タンク23には、さらに、濃度調整用の用水(例えば上水等)が供給される。なお、タンク23に供給される用水は、流路形成部材17の内部置換用の用水としても使用される。 The construction device 20 forms a passivation film 17a on the inner wall 17b of the flow path forming member 17 by flowing the passivation forming liquid through the flow path forming member 17. The construction device 20 includes valves 25 and 21, tanks 22 and 23, and a pump 24. The tank 23 is supplied with a stock solution of the passivation forming liquid used when forming the passivation film 17a on the inner wall 17b of the flow path forming member 17. Although details will be described later, the stock solution of the defect test solution used at the time of the passivation film 17a defect test is also supplied to the tank 23 separately from the stock solution of the passivation forming solution. Water for adjusting the concentration (for example, clean water) is further supplied to the tank 23. The irrigation water supplied to the tank 23 is also used as irrigation water for internal replacement of the flow path forming member 17.

タンク23では、供給された不動態形成液の原液が用水により希釈される。これにより、流路形成部材17の内壁17bに不動態皮膜17aを形成するための不動態形成液が生成する。タンク23は導電率計(図示しない)を備え、導電率計の測定値により、用水による希釈率(即ち生成する不動態形成液の濃度)が制御される。 In the tank 23, the stock solution of the supplied passivation-forming solution is diluted with water. As a result, a passivation forming liquid for forming the passivation film 17a on the inner wall 17b of the flow path forming member 17 is generated. The tank 23 is provided with a conductivity meter (not shown), and the dilution rate with water (that is, the concentration of the passivation-forming liquid to be produced) is controlled by the measured value of the conductivity meter.

不動態形成液は、不動態皮膜17aを形成可能な溶液であれば任意であり、例えば硝酸、硫酸、クエン酸水溶液、アスコルビン酸水溶液等を含む。不動態形成液は、例えば、導電性を向上させる電解質(例えばホウ酸等)を含んでもよい。 The passivation-forming solution is arbitrary as long as it is a solution capable of forming the passivation film 17a, and includes, for example, nitric acid, sulfuric acid, citric acid aqueous solution, ascorbic acid aqueous solution and the like. The passivation-forming liquid may contain, for example, an electrolyte (for example, boric acid) that improves conductivity.

施工装置20による不動態皮膜17aの形成方法について説明する。生産装置10の弁11,16,21の閉弁後、タンク23に、不動態形成液の原液及び濃度調整用の用水が供給される。これにより、タンク23で不動態形成液が生成する。次いで、弁25の開弁及びポンプ12,24の駆動により、流路形成部材17(熱交換器13及びタンク15を含む)の内部に不動態形成液が流通する。不動態形成液は停止条件(後記する)を満たすまで循環し、これにより、流路形成部材17の内壁17bへの不動態皮膜17aの形成が行われる。不動態皮膜17aの形成後、流路形成部材17に残存する不動態形成液は、弁21を通じてタンク22に移され、廃棄される。 A method of forming the passivation film 17a by the construction apparatus 20 will be described. After closing the valves 11, 16 and 21 of the production apparatus 10, the tank 23 is supplied with the stock solution of the passivation-forming liquid and the water for adjusting the concentration. As a result, a passivation-forming liquid is generated in the tank 23. Next, the passivation-forming liquid flows inside the flow path forming member 17 (including the heat exchanger 13 and the tank 15) by opening the valve 25 and driving the pumps 12 and 24. The passivation-forming liquid circulates until the stopping condition (described later) is satisfied, whereby the passivation film 17a is formed on the inner wall 17b of the flow path forming member 17. After the formation of the passivation film 17a, the passivation-forming liquid remaining in the flow path forming member 17 is transferred to the tank 22 through the valve 21 and discarded.

次に、検査装置40による欠損検査の方法を説明する。不動態形成時と同様にして、タンク23に、欠損検査液の原液及び濃度調整用の用水が供給される。これにより、タンク23において、欠損検査液が生成する。欠損検査液(及びその原液)は、導電性を有する液体であれば任意であり、例えば、人工的に調製した海水等である。欠損検査液は、上記不動態形成液が導電性を有するものであれば、導電性を有する不動態形成液と同じ組成のものでもよい。また、原料流体及び目的流体が導電性を有する場合には、目的流体の生産中に検査することもできる。また、不動態形成液の流通による、不動態皮膜17aの形成工程においても、予め不動態形成液が満たされた流路形成部材17を検査装置40で測定しておくことによるベース値の調整によって、検査することもできる。 Next, a method of defect inspection by the inspection device 40 will be described. Similar to the time of passivation formation, the tank 23 is supplied with the stock solution of the defect test solution and the water for adjusting the concentration. As a result, a defect test solution is generated in the tank 23. The defect test liquid (and its stock solution) is arbitrary as long as it is a conductive liquid, and is, for example, artificially prepared seawater or the like. The defect test solution may have the same composition as the conductive passivation forming solution as long as the passivation forming solution has conductivity. In addition, when the raw material fluid and the target fluid have conductivity, they can be inspected during the production of the target fluid. Further, also in the step of forming the passivation film 17a by the flow of the passivation forming liquid, the base value is adjusted by measuring the flow path forming member 17 filled with the passivation forming liquid in advance with the inspection device 40. , Can also be inspected.

欠損検査液は、ポンプ12,24の駆動により、流路形成部材17の内部を流通する。欠損検査液が流路形成部材17の内部に十分に満たされた後、ポンプ12,24の停止及び弁25の閉弁により、流路形成部材17の内部に欠損検査液が封入される。 The defect inspection liquid circulates inside the flow path forming member 17 by driving the pumps 12 and 24. After the defect inspection liquid is sufficiently filled inside the flow path forming member 17, the defect inspection liquid is sealed inside the flow path forming member 17 by stopping the pumps 12 and 24 and closing the valve 25.

次いで、上記検査装置40の装置構成において説明したように、電源装置41は、第1電極45と第2電極46との間へのパルス電圧の印加又はパルス電流の通電の何れかを行う。そして、測定装置42は、電源装置41によるパルス電圧の印加により生じた応答電流、又はパルス電流の通電により生じた応答電圧の何れかの応答値を測定する。測定された応答値は処理装置50に入力され、処理装置50は入力された応答値に基づき不動態皮膜17aの欠損の有無を判定し、欠損を検出する。 Next, as described in the device configuration of the inspection device 40, the power supply device 41 either applies a pulse voltage or energizes a pulse current between the first electrode 45 and the second electrode 46. Then, the measuring device 42 measures the response value of either the response current generated by the application of the pulse voltage by the power supply device 41 or the response voltage generated by the energization of the pulse current. The measured response value is input to the processing device 50, and the processing device 50 determines the presence or absence of a defect in the passivation film 17a based on the input response value, and detects the defect.

処理装置50は、不動態皮膜17aの欠損を検出するとともに、欠損検出時に不動態皮膜17aの施工を行うものである。処理装置50は、中央制御監視装置50a及びインターネット50bを介して、検査装置40に接続される。また、図示はしないが、処理装置50は、施工装置20にも接続される。処理装置50は、例えば遠隔地に設置される。処理装置50について、図4を参照しながら説明する。 The processing device 50 detects the defect of the passivation film 17a and constructs the passivation film 17a at the time of detecting the defect. The processing device 50 is connected to the inspection device 40 via the central control monitoring device 50a and the Internet 50b. Although not shown, the processing device 50 is also connected to the construction device 20. The processing device 50 is installed in a remote place, for example. The processing device 50 will be described with reference to FIG.

図4は、処理装置50のブロック図である。図4では、図示の簡略化のために、中央制御監視装置50a及びインターネット50bは図示していない。処理装置50は、検査開始部51と、検出部52と、形成開始判定部53と、第1制御部54と、形成停止判定部55と、第2制御部56とを備える。 FIG. 4 is a block diagram of the processing device 50. In FIG. 4, the central control monitoring device 50a and the Internet 50b are not shown for simplification of the illustration. The processing device 50 includes an inspection start unit 51, a detection unit 52, a formation start determination unit 53, a first control unit 54, a formation stop determination unit 55, and a second control unit 56.

検査開始部51は、生産システム100での目的流体(例えば飲料品等)の生産終了後、流路形成部材17の不動態皮膜17aでの欠損検査の開始を指示するものである。具体的には、検査開始部51は、検査装置40及び欠損検査液を用いた施工装置20の駆動開始により、欠損検査の開始を指示する。検査開始部51は、例えば使用者による操作開始ボタン(図示しない)の押下、生産装置10での目的流体の生産終了の検知等をトリガーとして、欠損検査を開始する。 The inspection start unit 51 instructs the start of the defect inspection on the passivation film 17a of the flow path forming member 17 after the production of the target fluid (for example, a beverage) in the production system 100 is completed. Specifically, the inspection start unit 51 instructs the start of the defect inspection by starting the operation of the inspection device 40 and the construction device 20 using the defect inspection liquid. The inspection start unit 51 starts the defect inspection, for example, by pressing the operation start button (not shown) by the user, detecting the end of production of the target fluid by the production apparatus 10, and the like.

検出部52は、上記検査装置40での検査結果に基づいて、流路形成部材17の内壁17bでの不動態皮膜17aの欠損を検出するものである。検出部52は、傾き算出部52aと、第1欠損判定部52bと、決定係数算出部52cと、第2欠損判定部52dとを備える。 The detection unit 52 detects the defect of the passivation film 17a on the inner wall 17b of the flow path forming member 17 based on the inspection result by the inspection device 40. The detection unit 52 includes a slope calculation unit 52a, a first defect determination unit 52b, a coefficient of determination calculation unit 52c, and a second defect determination unit 52d.

傾き算出部52aは、測定装置42で測定されたパルス電圧又はパルス電流に対する応答値のプロットについての近似直線の傾きを算出するものである。第1欠損判定部52bは、傾き算出部52aにより算出された傾きの、不動態皮膜17aの電位が不動態域に存在することを示す基準値との比較により、不動態皮膜17aの欠損の有無を判定するものである。傾き算出部52a及び第1欠損判定部52bを備えることで、欠損の存在により変動する傾きを基準値と比較でき、欠損の有無を判定できる。具体的な判定方法について図5を参照しながら説明する。 The slope calculation unit 52a calculates the slope of an approximate straight line for plotting the response value to the pulse voltage or pulse current measured by the measuring device 42. The first defect determination unit 52b compares the inclination calculated by the inclination calculation unit 52a with the reference value indicating that the potential of the passivation film 17a exists in the passivation region, and determines whether or not the passivation film 17a is defective. Is to be determined. By providing the inclination calculation unit 52a and the first defect determination unit 52b, the inclination that fluctuates due to the presence of the defect can be compared with the reference value, and the presence or absence of the defect can be determined. A specific determination method will be described with reference to FIG.

図5は、応答値に基づく欠損検出方法を説明する図である。図5は、一例として、パルス電圧の印加により応答電流が測定された場合を挙げ、横軸には印加したパルス電圧値、縦軸には、応答値(応答電流)から算出される応答電荷が示される。図5には、一例として、黒塗りプロットの近似直線L1(決定係数(R値)≧第3基準値A3)と、白抜きプロットの近似直線L2(決定係数(R値)<第3基準値A3)との2つの近似直線が図示される。傾き算出部52aは、近似直線L1,L2の傾きを算出する。 FIG. 5 is a diagram illustrating a defect detection method based on the response value. FIG. 5 shows, as an example, a case where the response current is measured by applying a pulse voltage. The horizontal axis represents the applied pulse voltage value, and the vertical axis represents the response charge calculated from the response value (response current). Shown. 5 shows, as an example, the approximate straight line L1 (the coefficient of determination (R 2 value) ≧ third reference value A3) of black plots the approximate straight line L2 (the coefficient of determination white plot (R 2 value) <Third Two approximate straight lines with the reference value A3) are shown. The inclination calculation unit 52a calculates the inclination of the approximate straight lines L1 and L2.

傾き算出部52aにより算出される傾きは、上記のように基準値と比較される。基準値は、傾きが下回ったときに不動態皮膜17aの厚さが所定厚さ以下と判定される第1基準値A1と、傾きが上回ったときに不動態皮膜17aの腐食が発生していると判定される第2基準値A2とを含む。 The slope calculated by the slope calculation unit 52a is compared with the reference value as described above. The reference values are the first reference value A1 in which the thickness of the passivation film 17a is determined to be equal to or less than the predetermined thickness when the inclination is lower, and the passivation film 17a is corroded when the inclination is higher. Includes the second reference value A2 determined to be.

これらのうち、第1基準値A1における「所定厚さ」は、例えば、不動態皮膜17aの通常の厚さよりも過度に薄くなっている(薄肉化)厚さである。具体的には、例えば流路形成部材17の耐食性に大きな影響を及ぼす厚さであり、例えば2nm以下である。不動態皮膜17aの厚さが通常よりも過度に薄くなっているため、不動態皮膜17aに欠損が生じていると判定できる。不動態皮膜の厚さが所定厚さ以下、即ち薄すぎる場合、不動態皮膜17aの静電容量が小さすぎ十分に充電されない。このため、測定装置42により測定される電流値が小さくなり、図5に示すグラフの傾きが小さくなる。そこで、この現象に基づく応答値の挙動に基づき、第1基準値A1が設定される。 Of these, the "predetermined thickness" in the first reference value A1 is, for example, a thickness that is excessively thinner (thinner) than the normal thickness of the passivation film 17a. Specifically, for example, the thickness has a great influence on the corrosion resistance of the flow path forming member 17, and is, for example, 2 nm or less. Since the thickness of the passivation film 17a is excessively thinner than usual, it can be determined that the passivation film 17a is defective. If the thickness of the passivation film is less than or equal to a predetermined thickness, that is, if it is too thin, the capacitance of the passivation film 17a is too small to be sufficiently charged. Therefore, the current value measured by the measuring device 42 becomes small, and the slope of the graph shown in FIG. 5 becomes small. Therefore, the first reference value A1 is set based on the behavior of the response value based on this phenomenon.

一方、第2基準値A2については、不動態皮膜17aの厚さは、耐食性に大きな影響がない厚さ(例えば2nm以上、好ましくは5nm以上)になっている。しかし、不動態皮膜17aの腐食が生じる可能性がある。腐食発生により不動態皮膜17aには例えばルージュ等の錆が発生し、不動態皮膜17aには既に欠損が生じ始めている。そこで、腐食発生を検出することで、欠損を検出できる。不動態皮膜17aの腐食発生により、腐食電流が検出される。このため、測定装置42により測定される電流値が大きくなり、図5に示すグラフの傾きが大きくなる。そこで、この現象に基づく応答値の挙動に基づき、第2基準値A2が設定される。 On the other hand, with respect to the second reference value A2, the thickness of the passivation film 17a is a thickness that does not significantly affect the corrosion resistance (for example, 2 nm or more, preferably 5 nm or more). However, corrosion of the passivation film 17a may occur. Due to the occurrence of corrosion, rust such as rouge is generated on the passivation film 17a, and defects have already begun to occur on the passivation film 17a. Therefore, the defect can be detected by detecting the occurrence of corrosion. A corrosion current is detected due to the occurrence of corrosion of the passivation film 17a. Therefore, the current value measured by the measuring device 42 becomes large, and the slope of the graph shown in FIG. 5 becomes large. Therefore, the second reference value A2 is set based on the behavior of the response value based on this phenomenon.

図5に示す例では、近似直線L1,L2のいずれにおいても、傾きは第1基準値A1以上第2基準値A2以下になっている。従って、第1欠損判定部52bは、近似直線L1に対応する黒プロット、及び、近似直線L2に対応する白プロットのいずれにおいても不動態皮膜17aの厚さは十分であり、かつ、腐食も発生しておらず、欠損は存在しないと判定する。 In the example shown in FIG. 5, the slope is equal to or greater than the first reference value A1 and equal to or less than the second reference value A2 in any of the approximate straight lines L1 and L2. Therefore, in the first defect determination unit 52b, the thickness of the passivation film 17a is sufficient in both the black plot corresponding to the approximate straight line L1 and the white plot corresponding to the approximate straight line L2, and corrosion also occurs. It is determined that there is no defect.

第1基準値A1及び第2基準値A2を含むことで、不動態皮膜17aの過度の薄膜化及び腐食発生に起因する欠損を検出できる。第1基準値A1及び第2基準値A2は、生産システム100の設置後通常運転前に試運転を行い、試運転中に決定できる。また、第1基準値A1及び第2基準値A2は、生産システム100を模した小型設備での実験によっても決定できる。 By including the first reference value A1 and the second reference value A2, it is possible to detect defects caused by excessive thinning of the passivation film 17a and occurrence of corrosion. The first reference value A1 and the second reference value A2 can be determined during the trial run after the production system 100 is installed and before the normal operation. Further, the first reference value A1 and the second reference value A2 can also be determined by an experiment in a small facility imitating the production system 100.

ここで、不動態皮膜17aの厚さは、通常は、流路形成部材17での欠損検査液流れ方向にほぼ同じ(同じでもよい。以下同じ)厚さである。しかし、局所的に薄い部分がある場合、不動態皮膜17aの表面が粗い場合など、上記第1基準値A1を超える傾きではあるものの、実際に欠損が生じたり将来の欠損発生の可能性が高かったりする場合がある。そこで、欠損の検出精度を向上するため、近似直線の決定係数(R値)に基づき、以下の判定が行われる。 Here, the thickness of the passivation film 17a is usually substantially the same (or the same; the same applies hereinafter) in the flow direction of the defect test liquid in the flow path forming member 17. However, there is a high possibility that defects will actually occur or that defects will occur in the future, although the inclination exceeds the first reference value A1, such as when there is a locally thin portion or when the surface of the passivation film 17a is rough. It may happen. In order to improve the detection accuracy of the defect, based on the determined coefficient of the approximate straight line (R 2 values), the following determination is made.

上記図4に示す検出部52は、さらに、決定係数算出部52cと、第2欠損判定部52dとを備える。決定係数算出部52cは、図5に示す近似直線の決定係数を算出するものである。第2欠損判定部52dは、決定係数算出部52cにより算出された決定係数の、応答値の乱れの程度を示す第3基準値A3との比較により、不動態皮膜17aの欠損の有無を判定するものである。決定係数算出部52c及び第2欠損判定部52dを備えることで、欠損発生又は欠損発生可能性大に起因する応答値のばらつきを検出し、欠損を検出できる。 The detection unit 52 shown in FIG. 4 further includes a coefficient of determination calculation unit 52c and a second defect determination unit 52d. The coefficient of determination calculation unit 52c calculates the coefficient of determination of the approximate straight line shown in FIG. The second defect determination unit 52d determines whether or not the passivation film 17a is defective by comparing the coefficient of determination calculated by the coefficient of determination calculation unit 52c with the third reference value A3, which indicates the degree of disturbance of the response value. It is a thing. By providing the coefficient of determination calculation unit 52c and the second defect determination unit 52d, it is possible to detect the variation in the response value due to the occurrence of the defect or the high possibility of the occurrence of the defect, and detect the defect.

第3基準値A3は、生産システム100の設置後通常運転前に試運転を行い、試運転中に決定できる。また、第3基準値A3は、生産システム100を模した小型設備での実験によっても決定できる。 The third reference value A3 can be determined during the trial run after the production system 100 is installed and before the normal operation. Further, the third reference value A3 can also be determined by an experiment in a small facility imitating the production system 100.

図5に示す例では、上記のように、近似直線L1,L2のいずれにおいても、傾きは第1基準値A1以上第2基準値A2以下になっている。従って、上記の第1欠損判定部52bは、いずれにおいても欠損は存在しないと判定している。そして、近似直線L1の決定係数(R値)は第3基準値A3以上であり、近似直線L1に対応するプロットのばらつきは少ないといえる。しかし、近似直線L2の決定係数(R値)は第3基準値A3未満であり、近似直線L2に対応するプロットのばらつきが大きいといえる。従って、第2欠損判定部52dは、近似直線L2に対応するプロットを取得した不動態皮膜17aでは、上記のように欠損発生又は欠損発生可能性大と判定し、欠損が検出される。 In the example shown in FIG. 5, as described above, the slope is equal to or greater than the first reference value A1 and equal to or less than the second reference value A2 in any of the approximate straight lines L1 and L2. Therefore, the first defect determination unit 52b determines that there is no defect in any of the above. The coefficient of determination of the approximate straight line L1 (R 2 value) is at the third reference value A3 above, variations in the plots corresponding to approximate straight line L1 can be said to be small. However, the coefficient of determination (R 2 value) of the approximated straight line L2 is less than the third reference value A3, it can be said that variations in the plots corresponding to approximate straight line L2 is large. Therefore, the second defect determination unit 52d determines that the defect has occurred or the possibility of the defect is high in the passivation film 17a for which the plot corresponding to the approximate straight line L2 has been acquired, and the defect is detected.

図4に戻って、形成開始判定部53は、上記検出部52によって不動態皮膜17aでの欠損が検出されたとき、流路形成部材17の内壁17bへの不動態皮膜17aの形成が必要と判定するものである。第1制御部54は、形成開始判定部53によって不動態皮膜17aの形成が必要と判定されたとき、施工装置20(図1参照)を駆動させて流路形成部材17の内壁17bへの不動態皮膜17aの形成を行うものである。形成開始判定部53及び第1制御部54と、上記の検出部52とを備えることで、不動態皮膜17aの欠損検出時に自動で欠損を修復できる。これにより、欠損の修復作業に伴う作業員の作業負担を軽減できる。 Returning to FIG. 4, the formation start determination unit 53 needs to form the passivation film 17a on the inner wall 17b of the flow path forming member 17 when the detection unit 52 detects a defect in the passivation film 17a. It is a judgment. When the formation start determination unit 53 determines that the formation of the passivation film 17a is necessary, the first control unit 54 drives the construction device 20 (see FIG. 1) to prevent the flow path forming member 17 from forming the inner wall 17b. The dynamic film 17a is formed. By providing the formation start determination unit 53, the first control unit 54, and the detection unit 52 described above, the defect can be automatically repaired when the defect of the passivation film 17a is detected. As a result, the work load of the worker associated with the repair work of the defect can be reduced.

また、処理装置50は、さらに、形成停止判定部55及び第2制御部56を備える。 Further, the processing device 50 further includes a formation stop determination unit 55 and a second control unit 56.

形成停止判定部55は、施工装置20による不動態形成液の流通開始後、不動態形成液の流通停止条件を満たしたときに不動態形成液の流通停止と判定するものである。ここでいう流通停止条件は、不動態形成液の流通開始から所定時間経過時である第1流通停止条件を含む。第1流通停止条件を含むことで、流通開始からの経過時間という簡便な指標に基づき不動態形成液の流通を停止できる。なお、ここでいう所定時間とは、流路形成部材17の長さ等によっても異なるため一概にはいえないが、例えば、不動態皮膜17aを形成しようとする内壁17bに不動態形成液が接触してから1時間程度にすることができる。 The formation stop determination unit 55 determines that the flow of the passivation forming liquid is stopped when the condition for stopping the flow of the passivation forming liquid is satisfied after the flow of the passivation forming liquid is started by the construction apparatus 20. The distribution suspension condition referred to here includes the first distribution suspension condition when a predetermined time has elapsed from the start of distribution of the passivation-forming liquid. By including the first distribution suspension condition, the distribution of the passivation-forming liquid can be suspended based on a simple index of the elapsed time from the start of distribution. The predetermined time here cannot be unequivocally determined because it differs depending on the length of the flow path forming member 17, but for example, the passivation forming liquid comes into contact with the inner wall 17b on which the passivation film 17a is to be formed. It can be about 1 hour after that.

また、別の実施形態では、不動態形成液が導電性を有し、流通停止条件は、不動態形成液の流通中の検査装置40による不動態皮膜17aでの欠損の有無の検査中、検出部52により欠損が検出されなくなった時である第2流通停止条件を含む。この場合においては、不動態形成液が導電性を有するため、導電性の欠損検査液を流通させる場合と同様にして、不動態液形成液を用いた欠損検出が行われる。従って、施工装置20による不動態皮膜17aの形成中に検査装置40による欠損検査を同時に行うことができる。 Further, in another embodiment, the passivation-forming liquid has conductivity, and the flow stop condition is detected during the inspection for the presence or absence of defects in the passivation film 17a by the inspection device 40 during the flow of the passivation-forming liquid. The second distribution suspension condition is included when the defect is no longer detected by the part 52. In this case, since the passivation-forming liquid has conductivity, defect detection using the passivation liquid-forming liquid is performed in the same manner as in the case of circulating the conductive defect inspection liquid. Therefore, the defect inspection by the inspection device 40 can be performed at the same time during the formation of the passivation film 17a by the construction device 20.

第2流通停止条件を含むことで、欠損の不存在(即ち修復)を確認してから不動態形成液の流通を停止できるため、施工装置20による施工の信頼性を向上できる。なお、不動態皮膜17aの形成と欠陥検査とは、欠陥検査液を兼ねる不動態形成液を循環させながら行ってもよく、欠陥検査液を兼ねる不動態形成液を流路形成部材17に封入することで行ってもよい。 By including the second distribution suspension condition, the distribution of the passivation forming liquid can be stopped after confirming the absence (that is, repair) of the defect, so that the reliability of construction by the construction apparatus 20 can be improved. The formation of the passivation film 17a and the defect inspection may be performed while circulating the passivation forming liquid that also serves as the defect inspection liquid, and the passivation forming liquid that also serves as the defect inspection liquid is sealed in the flow path forming member 17. You may go by.

第2制御部56は、形成停止判定部55による不動態形成液の流通停止の判定時に、流路形成部材17で形成された流体流路への不動態形成液の流通を停止するように施工装置20を制御するものである。第2制御部56及び上記の形成停止判定部55を備えることで、流通停止条件を満たしたときに不動態形成を自動で停止できる。 The second control unit 56 is constructed so as to stop the flow of the passivation forming liquid to the fluid flow path formed by the flow path forming member 17 when the formation stop determination unit 55 determines that the flow of the passivation forming liquid is stopped. It controls the device 20. By providing the second control unit 56 and the above-mentioned formation stop determination unit 55, the passivation formation can be automatically stopped when the distribution stop condition is satisfied.

なお、不動態形成液の流通停止後には、再度、検査装置40を用いた欠損検査を行うことができる。これにより、流路形成部材17の内壁17bに不動態皮膜17aが形成された(即ち欠損が発生していない)ことを確認できる。もし欠損が依然発生していれば、上記の説明と同様にして、再度、施工装置20による不動態皮膜17aの形成を行うことができる。 After the flow of the passivation-forming liquid is stopped, the defect inspection using the inspection device 40 can be performed again. From this, it can be confirmed that the passivation film 17a is formed (that is, no defect occurs) on the inner wall 17b of the flow path forming member 17. If the defect still occurs, the passivation film 17a can be formed again by the construction apparatus 20 in the same manner as described above.

なお、処理装置50は、いずれも図示しないが、CPUと、ROMと、RAMと、I/Fとを備える。そして、ROMに記録されたプログラムがCPUによって実行されることで、処理装置50が具現化される。同様に、中央制御監視装置50aも、いずれも図示しないが、CPUと、ROMと、RAMと、I/Fとを備える。そして、ROMに記録されたプログラムがCPUによって実行されることで、中央制御監視装置50aが具現化される。 Although not shown, the processing device 50 includes a CPU, a ROM, a RAM, and an I / F. Then, the processing device 50 is embodied by executing the program recorded in the ROM by the CPU. Similarly, the central control monitoring device 50a also includes a CPU, a ROM, a RAM, and an I / F, although none of them are shown. Then, the central control monitoring device 50a is realized by executing the program recorded in the ROM by the CPU.

図6は、第1実施形態に係る処理方法を示すフローチャートである。図6に示すフローチャートは、図1に示す生産システム100において、図4に示す処理装置50によって実行される。そこで、以下、図1、図4等を適宜参照しながら図6の説明を行う。 FIG. 6 is a flowchart showing a processing method according to the first embodiment. The flowchart shown in FIG. 6 is executed by the processing device 50 shown in FIG. 4 in the production system 100 shown in FIG. Therefore, FIG. 6 will be described below with reference to FIGS. 1, 4 and the like as appropriate.

生産システム100において、例えば飲料品等の生産が終了する。その後、検査開始部51は、上記のように施工装置20を介した欠損検査液の流路形成部材17への封入を行う(ステップS1)。そして、検査開始部51は、電源装置41の駆動制御を行い、測定装置42は応答値を測定する。測定された応答値は、傾き算出部52a及び決定係数算出部52cに入力される。傾き算出部52aにより算出された傾きは、第1欠損判定部52bに入力される。また、決定係数算出部52cにより算出された決定係数は、第2欠損判定部52dに入力される。 In the production system 100, for example, the production of beverages and the like is completed. After that, the inspection start unit 51 fills the flow path forming member 17 with the defect inspection liquid via the construction device 20 as described above (step S1). Then, the inspection start unit 51 controls the drive of the power supply device 41, and the measuring device 42 measures the response value. The measured response value is input to the slope calculation unit 52a and the coefficient of determination calculation unit 52c. The inclination calculated by the inclination calculation unit 52a is input to the first defect determination unit 52b. Further, the coefficient of determination calculated by the coefficient of determination calculation unit 52c is input to the second defect determination unit 52d.

第1欠損判定部52b及び第2欠損判定部52dは、それぞれ、不動態皮膜17aの欠損の有無を判定する(ステップS2)。欠損有無の判定の結果、欠損が検出されなければ(No)、流路形成部材17の内部が用水に置換され、制御が終了する。一方で、欠損が検出されれば(Yes)、形成開始判定部53は、第1制御部54を通じた施工装置20の駆動制御により、不動態形成液の流路形成部材17への流通を開始する(ステップS3)。これとともに、形成開始判定部53は、不動態形成液の流通開始を形成停止判定部55に送信する。 The first defect determination unit 52b and the second defect determination unit 52d each determine the presence or absence of a defect in the passivation film 17a (step S2). If no defect is detected as a result of determining the presence or absence of a defect (No), the inside of the flow path forming member 17 is replaced with water, and the control ends. On the other hand, if a defect is detected (Yes), the formation start determination unit 53 starts the distribution of the passivation forming liquid to the flow path forming member 17 by the drive control of the construction device 20 through the first control unit 54. (Step S3). At the same time, the formation start determination unit 53 transmits the distribution start of the passivation forming liquid to the formation stop determination unit 55.

形成停止判定部55は、流通停止条件を満たすか否かを判定する(ステップS4)。判定は、例えば、5分おきに行うことができ、流通停止条件が満たされるまで繰り返される(No)。流通停止条件が満たされた場合(Yes)、形成停止判定部55は、第2制御部56を通じた施工装置20の駆動制御により、不動態形成液の流路形成部材17への流通を停止する(ステップS5)。 The formation stop determination unit 55 determines whether or not the distribution stop condition is satisfied (step S4). The determination can be made, for example, every 5 minutes and is repeated until the distribution suspension condition is satisfied (No). When the flow stop condition is satisfied (Yes), the formation stop determination unit 55 stops the flow of the passivation forming liquid to the flow path forming member 17 by the drive control of the construction device 20 through the second control unit 56. (Step S5).

次いで、検査開始部51による欠損検査液の封入、及び、検出部52による欠損有無の判定が再度行われ(ステップS6、S7)、欠損が検出されなければ(No)、流路形成部材17の内部が用水に置換され、制御が終了する。一方で、欠損が検出されれば(Yes)、上記のステップS3以降が再度繰り返される。 Next, the inspection start unit 51 fills the defect inspection liquid, and the detection unit 52 determines the presence or absence of the defect again (steps S6 and S7). If no defect is detected (No), the flow path forming member 17 The inside is replaced with irrigation water, and control ends. On the other hand, if a defect is detected (Yes), the above steps S3 and subsequent steps are repeated again.

本実施形態の処理方法によれば、不動態皮膜17aの欠損検出時に自動で欠損を修復できる。これにより、欠損の修復作業に伴う作業員の作業負担を軽減できる。 According to the treatment method of the present embodiment, the defect can be automatically repaired when the defect of the passivation film 17a is detected. As a result, the work load of the worker associated with the repair work of the defect can be reduced.

なお、上記の例では、目的流体の生産終了後に欠損検査が行われた。ただし、原料流体又は目的流体の少なくとも一方が導電性であり、導電性を有する流体が流れる流路形成部材17の不動態皮膜17aの欠損検査を行う場合、例えば、目的流体の生産中に欠損検査を行うこともできる。目的流体の生産中に不動態皮膜17aの欠損検査を行うことで、生産装置10の運転停止に伴う利益減少を抑制できる。 In the above example, a defect inspection was performed after the production of the target fluid was completed. However, when at least one of the raw material fluid and the target fluid is conductive and the passivation film 17a of the flow path forming member 17 through which the conductive fluid flows is inspected for defects, for example, the defect inspection is performed during the production of the target fluid. Can also be done. By inspecting the passivation film 17a for defects during the production of the target fluid, it is possible to suppress a decrease in profit due to the shutdown of the production apparatus 10.

図7は、第2実施形態に係る生産システム200の系統図である。生産システム200は、上記の生産システム100の装置に加えて、流路形成部材17の定置洗浄(CIP洗浄)を行う洗浄装置60を備える。なお、洗浄装置60の装置構成は、図示の例では、使用する原液が異なること以外は施工装置20の装置構成を兼ねる。 FIG. 7 is a system diagram of the production system 200 according to the second embodiment. The production system 200 includes, in addition to the device of the production system 100 described above, a cleaning device 60 that performs clean-in-place cleaning (CIP cleaning) of the flow path forming member 17. In the illustrated example, the device configuration of the cleaning device 60 also serves as the device configuration of the construction device 20 except that the stock solution used is different.

生産システム200は、流路形成部材17で形成された流体流路への導電性の洗浄液の流通により、流路形成部材17の内壁17bの洗浄を行う洗浄装置60を備える。また、図示はしないが、処理装置50は、洗浄装置60の駆動により流路形成部材17のCIP洗浄を行う洗浄実行部を備える。 The production system 200 includes a cleaning device 60 that cleans the inner wall 17b of the flow path forming member 17 by flowing a conductive cleaning liquid through the fluid flow path formed by the flow path forming member 17. Further, although not shown, the processing device 50 includes a cleaning execution unit that performs CIP cleaning of the flow path forming member 17 by driving the cleaning device 60.

流路形成部材17の洗浄は、上記不動態形成液に代えて洗浄液を使用すること以外は、不動態皮膜17aの形成と同じ方法により行うことができる。導電性の洗浄液は、特に制限されないが、例えば強アルカリ(水酸化ナトリウム水溶液等)であって、必要に応じて電解質を添加したものである。ただし、電解質添加により導電性を付与した強酸(例えば硝酸)を使用することで、不動態形成液、欠損検査液、及び洗浄液の全てを兼ねることもできる。 The flow path forming member 17 can be washed by the same method as that for forming the passivation film 17a, except that a cleaning liquid is used instead of the passivation forming liquid. The conductive cleaning liquid is not particularly limited, but is, for example, a strong alkali (sodium hydroxide aqueous solution or the like) to which an electrolyte is added as necessary. However, by using a strong acid (for example, nitric acid) to which conductivity is imparted by adding an electrolyte, it is possible to combine all of the passivation forming solution, the defect test solution, and the cleaning solution.

洗浄液は、洗浄液の原液として、洗浄時にタンク23に供給される。供給された洗浄液の原液は用水により希釈され、洗浄液がタンク23に生成する。洗浄液は、ポンプ12,24の駆動により、流路形成部材17の内部に封入される。 The cleaning liquid is supplied to the tank 23 at the time of cleaning as a stock solution of the cleaning liquid. The stock solution of the supplied cleaning liquid is diluted with irrigation water, and the cleaning liquid is generated in the tank 23. The cleaning liquid is sealed inside the flow path forming member 17 by driving the pumps 12 and 24.

図8は、第2実施形態に係る処理方法を示すフローチャートである。図8に示すフローチャートは、図7に示す生産システム200において、図4に示す処理装置50(ただし図示しない洗浄実行部を備える)によって実行される。 FIG. 8 is a flowchart showing a processing method according to the second embodiment. The flowchart shown in FIG. 8 is executed in the production system 200 shown in FIG. 7 by the processing device 50 (provided that the cleaning execution unit is not shown) shown in FIG.

生産システム200において、例えば飲料品等の生産が終了する。その後、洗浄実行部は、流路形成部材17のCIP洗浄を行う(ステップS8)。具体的には、洗浄実行部(図示しない。上記の処理装置50に備えられる)は、タンク23への洗浄液原液及び用水の供給により、タンク23において導電性の洗浄液が生成する。洗浄実行部は、ポンプ12,24の駆動等により洗浄液を流路形成部材17の内部に封入する。これにより、流路形成部材17の内壁17bに付着した汚れが剥がれ、洗浄液に移行する。 In the production system 200, for example, the production of beverages and the like ends. After that, the cleaning execution unit performs CIP cleaning of the flow path forming member 17 (step S8). Specifically, the cleaning execution unit (not shown, provided in the above-mentioned processing device 50) generates a conductive cleaning liquid in the tank 23 by supplying the cleaning liquid stock solution and the irrigation water to the tank 23. The cleaning execution unit encloses the cleaning liquid inside the flow path forming member 17 by driving the pumps 12 and 24 and the like. As a result, the dirt adhering to the inner wall 17b of the flow path forming member 17 is peeled off and transferred to the cleaning liquid.

ここで、洗浄液は、上記のように導電性を有する。従って、生産システム200では、導電性の洗浄液は、生産システム100において説明した導電性の欠損検査液を兼ねる。そこで、洗浄実行部による洗浄中、検査開始部51は検査装置40の駆動により、不動態皮膜17aの欠損検査を開始する。そして、検出部52は、洗浄液による洗浄中に、流路形成部材17の内壁17bでの不動態皮膜17aの欠損を検出する(ステップS2)。 Here, the cleaning liquid has conductivity as described above. Therefore, in the production system 200, the conductive cleaning liquid also serves as the conductive defect inspection liquid described in the production system 100. Therefore, during cleaning by the cleaning execution unit, the inspection start unit 51 starts a defect inspection of the passivation film 17a by driving the inspection device 40. Then, the detection unit 52 detects the defect of the passivation film 17a on the inner wall 17b of the flow path forming member 17 during cleaning with the cleaning liquid (step S2).

欠損が検出されれば(Yes)、洗浄を終えるか否かが判定される(ステップS9)。洗浄終了と判定される指標は、例えば、流路形成部材17全域への洗浄液の封入後、所定時間経過等である。洗浄終了判定前までは(No。例えば所定時間経過前)、ステップS9が繰り返される。一方で、洗浄終了が判定されれば(Yes)、洗浄実行部は、封入した洗浄液を廃液としてタンク22に流す。次いで、上記の生産システム100と同様にして、不動態皮膜17aの形成及び欠損の再検査が行われる(ステップS3〜S7)。 If a defect is detected (Yes), it is determined whether or not to finish the cleaning (step S9). The index for determining the end of cleaning is, for example, the elapse of a predetermined time after the cleaning liquid is sealed in the entire area of the flow path forming member 17. Step S9 is repeated until the cleaning end determination is made (No. For example, before the elapse of a predetermined time). On the other hand, if it is determined that the cleaning is completed (Yes), the cleaning execution unit flows the enclosed cleaning liquid as waste liquid into the tank 22. Then, in the same manner as in the production system 100 described above, the formation of the passivation film 17a and the re-examination of defects are performed (steps S3 to S7).

また、上記ステップS2において欠損が検出されなければ(No)、上記ステップS9と同様にして洗浄を終えるか否かが判定される(ステップS10)。洗浄終了判定により(Yes)、洗浄実行部は、封入した洗浄液を廃液としてタンク22に流す。次いで、流路形成部材17の内部が用水で置換される。 If no defect is detected in step S2 (No), it is determined whether or not the cleaning is completed in the same manner as in step S9 (step S10). According to the determination of the end of cleaning (Yes), the cleaning execution unit flows the enclosed cleaning liquid as waste liquid into the tank 22. Next, the inside of the flow path forming member 17 is replaced with water.

以上の生産システム200によれば、流路形成部材17の洗浄中に不動態皮膜17aの欠損検査を行うことができる。これにより、生産システム200での生産時間以外の時間であるメンテナンス時間を短縮できる。 According to the above production system 200, the defect inspection of the passivation film 17a can be performed during the cleaning of the flow path forming member 17. As a result, the maintenance time, which is the time other than the production time in the production system 200, can be shortened.

10 生産装置
100 生産システム
11 弁
12 ポンプ
13 熱交換器
14 反応部
14a 設置部分
14b 設置部分
15 タンク
16 弁
17 流路形成部材
17a 不動態皮膜
17b 内壁
18 タンク
20 施工装置
200 生産システム
21 弁
22 タンク
23 タンク
24 ポンプ
25 弁
40 検査装置
41 電源装置
42 測定装置
44 絶縁体
45 第1電極
46 第2電極
50 処理装置
50a 中央制御監視装置
50b インターネット
51 検査開始部
52 検出部
52a 傾き算出部
52b 第1欠損判定部
52c 決定係数算出部
52d 第2欠損判定部
53 形成開始判定部
54 第1制御部
55 形成停止判定部
56 第2制御部
60 洗浄装置
A1 第1基準値
A2 第2基準値
A3 第3基準値
10 Production equipment 100 Production system 11 Valve 12 Pump 13 Heat exchanger 14 Reaction part 14a Installation part 14b Installation part 15 Tank 16 Valve 17 Flow path forming member 17a Immobility coating 17b Inner wall 18 Tank 20 Construction equipment 200 Production system 21 Valve 22 Tank 23 Tank 24 Pump 25 Valve 40 Inspection device 41 Power supply device 42 Measuring device 44 Insulator 45 First electrode 46 Second electrode 50 Processing device 50a Central control monitoring device 50b Internet 51 Inspection start unit 52 Detection unit 52a Tilt calculation unit 52b First Defect determination unit 52c Determination coefficient calculation unit 52d Second defect determination unit 53 Formation start determination unit 54 First control unit 55 Formation stop determination unit 56 Second control unit 60 Cleaning device A1 First reference value A2 Second reference value A3 Third Standard value

Claims (13)

流体流路を形成する不動態形成金属製の流路形成部材の内壁に形成された不動態皮膜の欠損の有無を検査する検査装置での検査結果に基づいて、前記内壁での前記不動態皮膜の欠損を検出する検出部と、
前記検出部によって前記欠損が検出されたとき、前記内壁への前記不動態皮膜の形成が必要と判定する形成開始判定部と、
前記形成開始判定部によって前記不動態皮膜の形成が必要と判定されたとき、前記流路形成部材への不動態形成液の流通により前記流路形成部材の内壁に不動態皮膜を形成する施工装置を駆動させて、前記内壁への前記不動態皮膜の形成を行う第1制御部と、を備える
処理装置。
Passivation formation that forms a fluid flow path The passivation film on the inner wall is based on the inspection results of an inspection device that inspects the presence or absence of defects in the passivation film formed on the inner wall of the metal flow path forming member. Detection unit that detects the defect of
When the defect is detected by the detection unit, the formation start determination unit that determines that the formation of the passivation film on the inner wall is necessary, and
A construction device that forms a passivation film on the inner wall of the flow path forming member by flowing the passivation forming liquid to the flow path forming member when the formation start determination unit determines that the passivation film needs to be formed. A processing device including a first control unit for forming the passivation film on the inner wall.
前記不動態形成液の流通開始後、前記不動態形成液の流通停止条件を満たしたときに前記不動態形成液の流通停止と判定する形成停止判定部と、
前記形成停止判定部による不動態形成液の流通停止の判定時に、前記流路形成部材で形成された前記流体流路への前記不動態形成液の流通を停止するように前記施工装置を制御する第2制御部と、を備える
請求項1に記載の処理装置。
After the start of the flow of the passivation-forming liquid, the formation stop determination unit that determines that the flow of the passivation-forming liquid is stopped when the conditions for stopping the flow of the passivation-forming liquid are satisfied,
When the formation stop determination unit determines that the flow of the passivation forming liquid is stopped, the construction device is controlled so as to stop the flow of the passivation forming liquid to the fluid flow path formed by the flow path forming member. The processing apparatus according to claim 1, further comprising a second control unit.
前記流通停止条件は、前記不動態形成液の流通開始から所定時間経過時である第1流通停止条件を含む
請求項2に記載の処理装置。
The processing apparatus according to claim 2, wherein the distribution suspension condition includes a first distribution suspension condition when a predetermined time has elapsed from the start of distribution of the passivation-forming liquid.
前記不動態形成液は導電性を有し、
前記流通停止条件は、前記不動態形成液の流通中の前記検査装置による前記欠損の有無の検査中、前記検出部により前記欠損が検出されなくなった時である第2流通停止条件を含む
請求項2又は3に記載の処理装置。
The passivation-forming liquid has conductivity and
The claim including the second distribution suspension condition, which is a time when the defect is no longer detected by the detection unit during the inspection for the presence or absence of the defect by the inspection device during the flow of the passivation forming liquid. The processing apparatus according to 2 or 3.
流体流路を形成する不動態形成金属製の流路形成部材への不動態形成液の流通により、前記流路形成部材の内壁に不動態皮膜を形成する施工装置と、
前記内壁での前記不動態皮膜の欠損の有無を検査する検査装置と、
処理装置と、を備え、
前記処理装置は、
前記検査装置での検査結果に基づいて前記内壁での前記不動態皮膜の欠損を検出する検出部と、
前記検出部によって前記欠損が検出されたとき、前記内壁への前記不動態皮膜の形成が必要と判定する形成開始判定部と、
前記形成開始判定部によって前記不動態皮膜の形成が必要と判定されたとき、前記施工装置の駆動により前記内壁への前記不動態皮膜の形成を行う第1制御部と、を備える
処理システム。
Passivation forming that forms a fluid flow path A construction device that forms a passivation film on the inner wall of the flow path forming member by flowing a passivation forming liquid through a metal flow path forming member.
An inspection device that inspects the inner wall for defects of the passivation film, and
Equipped with a processing device,
The processing device
A detection unit that detects a defect in the passivation film on the inner wall based on the inspection result of the inspection device, and a detection unit.
When the defect is detected by the detection unit, the formation start determination unit that determines that the formation of the passivation film on the inner wall is necessary, and
A processing system including a first control unit that forms the passivation film on the inner wall by driving the construction apparatus when the formation start determination unit determines that the formation of the passivation film is necessary.
前記検査装置は、前記内壁での前記不動態皮膜の欠損の有無を非破壊で検査する非破壊検査装置を含む
請求項5に記載の処理システム。
The processing system according to claim 5, wherein the inspection device includes a non-destructive inspection device that non-destructively inspects the presence or absence of defects in the passivation film on the inner wall.
前記検査装置は、
前記流路形成部材に接続される第1電極と、
前記流路形成部材で形成された前記流体流路を流れる導電性の欠損検査液と接触し、かつ、前記流路形成部材とは絶縁して配置される第2電極と、
前記第1電極と前記第2電極との間へのパルス電圧の印加又はパルス電流の通電の何れかを行う電源装置と、
前記パルス電圧の印加により生じた応答電流、又は前記パルス電流の通電により生じた応答電圧の何れかの応答値を測定する測定装置と、を備える
請求項5又は6に記載の処理システム。
The inspection device
The first electrode connected to the flow path forming member and
A second electrode formed of the flow path forming member, which is in contact with the conductive defect inspection liquid flowing through the fluid flow path and is arranged so as to be insulated from the flow path forming member.
A power supply device that either applies a pulse voltage or energizes a pulse current between the first electrode and the second electrode.
The processing system according to claim 5 or 6, further comprising a measuring device for measuring a response value of either a response current generated by applying the pulse voltage or a response voltage generated by energization of the pulse current.
前記検出部は、
前記パルス電圧又は前記パルス電流に対する応答値のプロットについての近似直線の傾きを算出する傾き算出部と、
前記傾き算出部により算出された傾きの、前記不動態皮膜の電位が不動態域に存在することを示す基準値との比較により、前記不動態皮膜の欠損の有無を判定する第1欠損判定部と、を備える
請求項7に記載の処理システム。
The detection unit
A slope calculation unit that calculates the slope of an approximate straight line for plotting the response value to the pulse voltage or the pulse current,
The first defect determination unit for determining the presence or absence of a defect in the passivation film by comparing the inclination calculated by the inclination calculation unit with a reference value indicating that the potential of the passivation film exists in the passivation region. The processing system according to claim 7, further comprising.
前記基準値は、
前記傾きが下回ったときに前記不動態皮膜の厚さが所定厚さ以下と判定される第1基準値と、
前記傾きが上回ったときに前記不動態皮膜の腐食が発生していると判定される第2基準値とを含む
請求項8に記載の処理システム。
The reference value is
A first reference value in which the thickness of the passivation film is determined to be equal to or less than a predetermined thickness when the inclination falls below
The processing system according to claim 8, further comprising a second reference value for determining that the passivation film is corroded when the inclination is exceeded.
前記検出部は、
前記近似直線の決定係数を算出する決定係数算出部と、
前記決定係数算出部により算出された前記決定係数の、前記応答値の乱れの程度を示す第3基準値との比較により、前記不動態皮膜の欠損の有無を判定する第2欠損判定部とを備える
請求項8又は9に記載の処理システム。
The detection unit
The coefficient of determination calculation unit that calculates the coefficient of determination of the approximate straight line and
By comparing the coefficient of determination calculated by the coefficient of determination calculation unit with the third reference value indicating the degree of disturbance of the response value, the second defect determination unit for determining the presence or absence of the defect of the passivation film is used. The processing system according to claim 8 or 9.
前記流路形成部材は、配管、タンク、又はポンプのうちの少なくとも1種を含む
請求項5〜10の何れか1項に記載の処理システム。
The processing system according to any one of claims 5 to 10, wherein the flow path forming member includes at least one of a pipe, a tank, and a pump.
原料流体を用いて目的流体を生産する生産装置と、
前記原料流体又は前記目的流体のうちの少なくとも一方が流れる流体流路を形成する不動態形成金属製の流路形成部材への不動態形成液の流通により、前記流路形成部材の内壁に不動態皮膜を形成する施工装置と、
前記内壁での前記不動態皮膜の欠損の有無を検査する検査装置と、
処理装置と、を備え、
前記処理装置は、
前記検査装置での検査結果に基づいて前記内壁での前記不動態皮膜の欠損を検出する検出部と、
前記検出部によって前記欠損が検出されたとき、前記内壁への前記不動態皮膜の形成が必要と判定する形成開始判定部と、
前記形成開始判定部によって前記不動態皮膜の形成が必要と判定されたとき、前記施工装置の駆動により前記内壁への前記不動態皮膜の形成を行う第1制御部と、を備える
生産システム。
A production device that produces the target fluid using the raw material fluid,
Passivation forming on the inner wall of the flow path forming member by the flow of the passivation forming liquid to the flow path forming member made of a passivation forming metal forming a flow path through which at least one of the raw material fluid or the target fluid flows. Construction equipment that forms a film and
An inspection device that inspects the inner wall for defects of the passivation film, and
Equipped with a processing device,
The processing device
A detection unit that detects a defect in the passivation film on the inner wall based on the inspection result of the inspection device, and a detection unit.
When the defect is detected by the detection unit, the formation start determination unit that determines that the formation of the passivation film on the inner wall is necessary, and
A production system including a first control unit that forms the passivation film on the inner wall by driving the construction apparatus when the formation start determination unit determines that the formation of the passivation film is necessary.
前記流路形成部材で形成された前記流体流路への導電性の洗浄液の流通により、前記内壁の洗浄を行う洗浄装置を備え、
前記検出部は、前記洗浄液による洗浄中に、前記内壁での前記不動態皮膜の欠損を検出する
請求項12に記載の生産システム。
A cleaning device for cleaning the inner wall by flowing a conductive cleaning liquid through the fluid flow path formed by the flow path forming member is provided.
The production system according to claim 12, wherein the detection unit detects a defect of the passivation film on the inner wall during cleaning with the cleaning liquid.
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