JP2020176041A - Manufacturing method of tile, and tile - Google Patents

Abstract

To obtain high-definition ornamental design by suppressing the spreading of tile's pattern, and to reduce the ink cost.SOLUTION: A manufacturing method of a tile 1 comprises a step of forming a ground layer 5, a step of printing by ink 7, and a step of burning the same. The ground layer 5 does not melt at a predefined burning temperature and contains opacifier. Since the ground layer 5 does not melt like a glaze layer, the spreading of the ink 7 (pigment) to the ground layer 5 is suppressed. Therefore high-definition ornamental design can be obtained without spreading of a pattern. In addition, since the spreading of the ink 7 (pigment) to the ground layer 5 is suppressed and a deep color can be produced by a small amount of the ink 7, ink cost can be also reduced.SELECTED DRAWING: Figure 5

Description

The present disclosure relates to a method of manufacturing tiles and tiles.

Conventionally, tiles have been manufactured as follows (see Patent Documents 1 to 4). That is, a tile was manufactured by applying an engove containing a milky white agent to a tile base, then applying a matte or bright glaze, printing on the tile base, and firing. Alternatively, a mat or bright glaze containing an opalescent agent was glazed on a tile base, printed, and fired to produce tiles.

JP-A-2004-99432 Japanese Unexamined Patent Publication No. 2005-154186 Japanese Unexamined Patent Publication No. 2005-170705 Japanese Unexamined Patent Publication No. 8-253358

However, when the glaze melts during firing, the pigment of the ink diffuses into the glaze, so that the printed pattern is blurred and high definition is lost. In addition, since the pigment diffuses into the glaze and the color becomes lighter, it is necessary to use a lot of ink to produce a darker color, which not only makes it impossible to give a more realistic pattern, but also increases the cost. It had been done.
The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for manufacturing a tile, which can suppress bleeding of a pattern, obtain a high-definition design, and reduce ink cost. ..

As a result of intensive research, the present inventors have developed a new method for manufacturing tiles. Based on this result, the following invention is provided.

[1] A step of forming a base layer on the surface of the substrate, which does not melt at a predetermined firing temperature and contains an emulsion.
The process of printing with ink on the base layer,
A method of manufacturing tiles, comprising a firing step.

According to the method for producing tiles of the present invention, the base layer does not melt like the glaze layer, so that the diffusion of the pigment into the base layer is suppressed. Therefore, a high-definition design can be obtained without blurring the pattern. In addition, since the diffusion of the pigment into the base layer is suppressed, a dark color can be produced with a small amount of ink, so that the ink cost can be reduced.

It is sectional drawing which schematically explains an example of the manufacturing method of a tile. It is sectional drawing which schematically explains an example of the manufacturing method of a tile. It is sectional drawing which schematically explains an example of the manufacturing method of a tile. It is sectional drawing which schematically explains an example of the manufacturing method of a tile. It is sectional drawing which schematically explains an example of the manufacturing method of a tile. It is sectional drawing which schematically explains an example of the manufacturing method of a tile.

Here, a desirable example of the present disclosure is shown.
[2] The method for producing tiles according to [1], wherein the base layer is formed of Engove.
With this configuration, a high-definition design can be obtained without blurring the pattern, and the ink cost can be reduced.

[3] Further, a step of applying a glaze on the decorative layer is provided.
The method for manufacturing tiles according to [1] or [2].
In this configuration, it is possible to manufacture tiles in which the decorative layer is protected by the glaze layer.

[4] Base material and
A tile including a base layer of Engobe containing a milky white agent formed on the surface of the substrate and a decorative layer formed on the base layer.
Since the tiles of this configuration have an engove base layer, the pattern of the decorative layer is not blurred and has a high-definition design.

[5] The tile according to [4], further comprising a glazed layer formed on the decorative layer.
The tiles of this configuration have a glazed layer that protects the decorative layer.

Hereinafter, the present disclosure will be described in detail. Unless otherwise specified, the notation indicating the range "x to y" shall include x and y in the range.

1. 1. Manufacturing Method of Tile 1 The manufacturing method of tile 1 includes a step of forming a base layer 5, a step of printing with ink 7, and a step of firing (see FIGS. 1 to 4).
(1) Step of Forming Base Layer 5 The step of forming the base layer 5 is a step of forming a base layer 5 that does not melt at a predetermined firing temperature and contains a milky white agent on the surface of the base 3. (See Figures 1 and 2).

(1.1) Base material 3
The composition of the base material 3 is not particularly limited. As the base material, basically, those conventionally used as a raw material for a molten material base can be used. For example, as an example of the composition, a composition containing at least one selected from the group consisting of feldspar, silica stone, pyrophyllite, limestone, frog-eye clay, and wood section clay is preferably adopted. For example, as the composition of the base material 3, when the entire base material is 100 parts by weight, the composition of 20 parts by weight to 60 parts by weight of feldspar clay and 40 parts by weight to 80 parts by weight of feldspar is exemplified.

(1.2) Base layer 5
The base layer 5 does not melt at a predetermined firing temperature and contains an opalescent agent.
The predetermined firing temperature means the firing temperature in the firing step. The firing temperature is not particularly limited, and is appropriately changed depending on the raw material for forming the base layer 5, the composition of the base material 3, and the like. The predetermined firing temperature is, for example, preferably 1050 ° C to 1250 ° C, more preferably 1100 ° C to 1200 ° C.
The base layer 5 contains an opalescent agent. The opalescent agent is not particularly limited, and examples thereof include zircon. This is because the color of the base material 3 is corrected by the opalescent agent to improve the finish of the decorative layer 9.
The base layer 5 is preferably formed by an engove. Engobe is also called a slip. Engobe contains clay as a main component (80% by weight or more) and improves the surface condition of the base material 3. The composition of Engobe is not particularly limited. For example, Engobe can be (a) white-baked clay or other suitable clay, (b) various forms of silicic acid (silica sand, silica stone, quartz, etc.), (c) at least two types of flux (only one type). Although it may be used, the more stable glass is formed and the clay particles are bonded more firmly). Potassium is an excellent flux and is used with lime. Potash is added as feldspar or begmite, and lime is added in the form of whitewash and sometimes gypsum. The composition of a typical Engobe is as follows.
For one flux EXAMPLE 1 _{CaO · 0.5Al 2 O 3 · 4SiO} 2
EXAMPLE 2 _{0.15K 2 O · Al 2 O 3} · 5SiO 2

For two flux EXAMPLE 3 0.7CaO 0.5Al ₂ O ₃ · 4SiO ₂
0.3K ₂ O
Engobe is prepared in the same manner as glaze. The finely ground raw material is mixed with water to make a slurry of appropriate consistency. Remove the coarse particles and sift through to mix well at the same time.

A particularly suitable composition of Engove is illustrated. In the composition below, the entire Engobe is 100 parts by weight.
Clay: 10 parts by weight to 20 parts by weight Kaolin: 10 parts by weight to 20 parts by weight Feldspar: 30 parts by weight to 50 parts by weight Calcium carbonate: 5 parts to 15 parts by weight Zyrcon: 10 parts by weight to 30 parts by weight

When forming the base layer 5, slurry is applied to the base material 3. For example, a slurry obtained by adding 40 parts by weight to 60 parts by weight of water and 0.1 parts by weight to 0.5 parts by weight of sodium tripolyphosphate as an optional component to 100 parts by weight of Engobe is applied to the substrate 3.
The specific gravity of the slurry is preferably 1.4 or more, more preferably 1.5 or more, from the viewpoints of suppressing the precipitation of solid content, accelerating the drying after application and forming a uniform layer. On the other hand, the specific gravity of the slurry is preferably 1.8 or less, more preferably 1.7 or less, from the viewpoint of handleability at the time of application, for example, a large amount of additives are required to adjust the viscosity to an appropriate level. From these viewpoints, the specific gravity of the slurry is preferably 1.4 to 1.8, more preferably 1.5 to 1.7.
The viscosity of the slurry is preferably 50 mPa · s or more, more preferably 80 mPa · s or more, from the viewpoint of suppressing the precipitation of solid content. On the other hand, the viscosity of the slurry is preferably 150 mPa · s or less, and more preferably 120 mPa · s or less, from the viewpoint of handleability at the time of coating, such as unstable discharge state and difficulty in forming a uniform coating layer. From these viewpoints, the specific gravity of the slurry is preferably 50 mPa · s to 150 mPa · s, more preferably 80 mPa · s to 120 mPa · s.
Regarding the particle size of the particles in the slurry, it is preferable that the average particle size (D50) measured by the particle size distribution measuring machine is in the following range. The average particle size (D50) is preferably 2 μm or more, and more preferably 4 μm or more, from the viewpoint of suppressing excessive penetration of Engobe into the substrate 3. On the other hand, the average particle size (D50) is preferably 8 μm or less, more preferably 6 μm or less, from the viewpoint of improving the finish of the base layer 5. From these viewpoints, the average particle size (D50) is preferably 2 μm to 8 μm, more preferably 4 μm to 6 μm. As the particle size distribution measuring machine, a laser diffraction type particle size distribution measuring machine is used.

(1.3) Coating method and coating amount The coating method for applying the slurry in order to form the base layer 5 on the surface of the substrate 3 is not particularly limited.
The coating method can be appropriately selected from general coating methods such as a spray method, a roll coating method, a dipping method, a gravure coating method, a die coating method, and a curtain coating method.
The coating amount is not particularly limited. The amount of coating is preferably 2 g or more, and more preferably 3 g or more, per 100 mm × 100 mm area from the viewpoint of correcting the color of the base material 3 and improving the finish by the decorative layer 9. On the other hand, the coating amount is preferably 6 g or less, more preferably 5 g or less, from the viewpoint of manufacturing cost. From these viewpoints, the coating amount is preferably 2 g to 6 g, more preferably 3 g to 5 g.

(1.4) Temperature of the base material 3 at the time of coating The temperature of the base material 3 at the time of coating is not particularly limited. The temperature of the base material 3 at the time of coating is preferably 50 ° C. or higher, more preferably 60 ° C. or higher, from the viewpoint of increasing the drying rate of the slurry and increasing the productivity. On the other hand, the temperature of the base material 3 at the time of application is usually 90 ° C. or lower from the viewpoint of sufficiently leveling the slurry on the surface of the base material 3 and then drying it.

(2) Step of Printing with Ink 7 This step is a step of printing with ink 7 (inorganic pigment ink) on the base layer 5 (see FIG. 3). The decorative layer 9 is formed by firing the ink 7 (see FIG. 4).
The printing is not particularly limited, and various types of printing can be adopted. Such printing includes, for example, inkjet printing, screen printing, dispenser printing, letterpress printing (flexo printing), sublimation printing, offset printing, laser printer printing (toner printing), concave printing (gravure printing), contact printing, micro. Contact printing and the like can be mentioned.

The ink 7 contains an inorganic pigment and a dispersion medium as essential components. From the viewpoint of dispersibility and color development, the average particle size of the inorganic pigment is preferably 0.2 to 5.0 μm.

The inorganic pigment component is not particularly limited. Examples of the inorganic pigment component include titanium oxide, zinc sulfide, black iron oxide, black copper oxide, black chromium oxide, yellow iron oxide, yellow nickel titanium, cadmium sulfide, selenium, and cadmium selenium. Lead chromate, lead molybdate, red iron oxide, cobalt oxide, chromium hydroxide-containing, chromium oxide, gold, lead antimony, nickel oxide, manganese oxide, neodium oxide, erbium oxide, cerium oxide, aluminum oxide, aluminum, bronze, Mica, carbon black, calcium carbonate, barium sulfate, zinc oxide, antimony trioxide, chadomium sulfide, dark blue, ultramarine, etc. can be used, but the present invention is not limited to these. They can also be used as single products, mixtures, double salts, or complex salts.

The dispersion medium for dispersing the inorganic pigment in the ink 7 is not particularly limited, but an organic solvent is preferably used. Water can also be used as the dispersion medium. By using the dispersant in the ink 7 of the inorganic pigment, the dispersibility of the inorganic pigment is improved.

(3) Baking Step This step is a step of firing at a predetermined temperature after printing. The firing temperature is as described in the column of "(1.2) Base layer 5". That is, the firing temperature is not particularly limited, and is appropriately changed depending on the raw material for forming the base layer 5, the composition of the base material 3, and the like. The predetermined firing temperature is, for example, preferably 1050 ° C to 1250 ° C, more preferably 1100 ° C to 1200 ° C.

(4) Arbitrary Step The tile 1 manufacturing method may further include a step of glaze 11 on the ink 7 (hereinafter, also referred to as “glaze step”) (see FIGS. 3 and 5). The glaze 11 becomes an upper glaze layer 13 (corresponding to a “glaze layer”) by firing (see FIG. 6). In addition, in the manufacturing method of the tile 1 including this optional step, it is the manufacturing method of the flow of FIGS. The manufacturing method including this glazed step may be a manufacturing method in which (A) a step of forming the base layer 5, a step of printing with ink 7, a glazed step, and a baking step are performed in order, or (B) a base layer. The manufacturing method may be a manufacturing method in which the step of forming the fifth, the step of printing with the ink 7, the first firing step, the glazing step, and the second firing step are performed in this order. When the production method (B) is adopted, the firing temperature of the first firing step is, for example, 1050 ° C to 1250 ° C, and the firing temperature of the second firing step is higher than the firing temperature of the first firing step. Set low. In this way, a desired color can be obtained by setting the firing temperature in the second firing step to be lower than the firing temperature in the first firing step.
The glaze 11 (glaze) is not particularly limited.
The suitable composition of the glaze 11 is illustrated. In the following composition, the total solid content of the glaze 11 is 100 parts by weight.
Frit: 5 parts by weight to 40 parts by weight Feldspar: 5 parts by weight to 40 parts by weight Kaolin: 1 part by weight to 10 parts by weight Silica sand: 10 parts by weight to 40 parts by weight Alumina: 10 parts by weight to 20 parts by weight Calcium carbonate: 5 parts by weight Parts to 25 parts by weight Calcium carbonate can be partially or wholly replaced with either or both of feldspar carbonate and strontium carbonate.

2. Tile 1
The laminated structure of the tile 1 has the configuration shown in FIG. 4 or 6.
That is, the tile 1 in the first aspect includes a base material 3, a base layer 5 formed on the surface of the base material 3, and a decorative layer 9 formed on the base layer 5 (see FIG. 4). .. Further, the tile 1 in the second aspect is formed on the base material 3, the base layer 5 formed on the surface of the base material 3, the decorative layer 9 formed on the base layer 5, and the decorative layer 9. The formed upper glaze layer 13 is provided (see FIG. 6). The base layer 5 is formed of an engove containing an opalescent agent.
Regarding "base material 3", "base layer 5", and "engobe", what has been described in "1. Manufacturing method of tile 1" is applied to "2. Tile 1" as it is.
The “decorative layer 9” is a layer formed by firing the ink 7 described in “1. Method for manufacturing tile 1”. The "decorative layer 9" contains the inorganic pigment component of the ink 7.
The "upper glaze layer 13" is formed by melting the glaze 11 described in "1. Manufacturing method of tile 1".
The thickness of the base material 3 is not particularly limited. The thickness of the base material 3 is preferably 4 mm to 13 mm, for example, from the viewpoint of the strength of the tile 1. The thickness of the base layer 5 is not particularly limited. The thickness of the base layer 5 is preferably 40 μm to 140 μm from the viewpoint of preventing the ink 7 from seeping into the base material 3 and from the viewpoint of manufacturing cost. The thickness of the upper glaze layer 13 is preferably 20 μm to 120 μm from the viewpoint of protecting the decorative layer 9.

3. 3. Effect of the present embodiment According to the manufacturing method of the tile 1 of the present embodiment, the base layer 5 does not melt like the glaze layer, so that the diffusion of the ink 7 (pigment) into the base layer 5 is suppressed. Therefore, a high-definition design can be obtained without blurring the pattern. Further, since the diffusion of the ink 7 (pigment) to the base layer 5 is suppressed, a dark color can be produced with a small amount of the ink 7, so that the ink cost can be reduced.
The tile 1 of the present embodiment has a high-definition design without the pattern bleeding due to the base layer 5. Further, when the tile 1 having this configuration is manufactured, the ink cost is reduced, which is advantageous in terms of cost.

Hereinafter, a more specific description will be given with reference to Examples. In the following explanation, "%" is based on weight.

1. 1. Preparation of substrate 2 kg was prepared with a mixture of 40% Kibushi clay and 60% feldspar, 50% of water and 0.3% of sodium tripolyphosphate were added, and the mixture was finely pulverized for 8 hours using a pot mill. The average particle size (D50) by the laser diffraction type particle size distribution measuring machine (Microtrack) was 8 μm. After drying the obtained slurry, water was added so as to have a water content of 7%, and granules were obtained by netdecine.
A uniaxial pressure molding was performed at a molding pressure of 28 MPa by a hydraulic press to obtain a molded product having a size of 100 × 100 × 6 mm, which was dried at 80 ° C. for 24 hours.

2. Preparation of slurry containing engobe 2 kg of slurry containing 15% frog clay, 15% kaolin, 40% feldspar, 10% calcium carbonate, and 20% zircon was prepared, and 50% of water and 0.3% of sodium tripolyphosphate were added. The slurry was finely pulverized for 8 hours using a pot mill, and the obtained slurry was adjusted to a specific gravity of 1.6 and a viscosity of 100 mPa · s to obtain a slurry containing feldspar. The particle size was measured with the same particle size distribution measuring machine as the substrate, and the average particle size (D50) was 5 μm.

3. 3. Preparation of glaze 2 kg of frit 30%, kaolin 5%, silica sand 30%, alumina 20%, calcium carbonate 15%, water volume 50%, tripolyphosphate sodium 0.3% added, 8 using a pot mill The slurry was finely pulverized for a time, and the obtained slurry was adjusted to a specific gravity of 1.6 and a viscosity of 100 mPa · s to make a glaze. The particle size was measured with the same particle size distribution measuring machine as the substrate, and the average particle size (D50) was 2 μm.

4. Preparation of Specimen and Evaluation thereof Specimen A was obtained by directly inkjet printing after cooling the dried substrate to room temperature (25 ° C.).
A dry substrate maintained at 80 ° C. is spray-coated with engove-containing mud (coating amount 4 g / per molded product), cooled to room temperature (25 ° C.), inkjet printed, and then glaze is spray-coated (coating amount). 3 g / per molded product) was used as the test body B.
Engobe-containing mud is spray-applied (applied amount 4 g / per molded body) to a dry substrate maintained at 80 ° C., and then glaze is spray-applied (applied amount 3 g / per molded body), and then at room temperature (applied amount 3 g / per molded body). The test piece C was cooled to 25 ° C.) and spray-printed.
Specimens A, B, and C are held in an electric furnace at a heating rate of 10 ° C./min and a maximum temperature of 1140 ° C. for 1 hour, then fired under the condition of allowing to cool naturally, cooled to room temperature, and then printed. I checked the status.
The ink used for inkjet printing is a pigment ink in which metal oxide fine particles are dispersed in an organic solvent.

5. Evaluation results The results are shown in Table 1.
The evaluation in Table 1 was as follows.

"○" ... No ink bleeding after printing. No ink bleeding after firing.
“△”… No ink bleeding after printing. There is ink bleeding after firing.
“×”… There is ink bleeding after printing. There is ink bleeding after firing.

In the test piece A, the printed ink did not penetrate into the substrate, and the ink was bleeding while floating on the substrate, so that the desired printing state could not be obtained. In the test body B, there was no ink bleeding even after printing and firing, and a good printing state as intended was obtained. No ink bleeding was observed in the test body C after printing, but it was in a bleeding state after firing, although it was not as bleeding as the test body A.

The substrate surface does not function as an ink receiving layer like the test body A, while the engove layer (corresponding to the base layer) of the test body B or the glaze layer of the test body C functions as an ink receiving layer. It could be confirmed. Further, since the Engove layer of the test piece B is not melted and vitrified, the pigment particles in the ink are not diffused into the Engobe layer, so that a clear printed state can be obtained without bleeding. On the other hand, in the test body C, the glaze layer is melted and vitrified by firing, and the pigment particles in the ink are diffused into the vitrified glaze layer, so that the glaze layer looks blurred and the printed state is the test body B. It is thought that it was inferior. Therefore, it was found that a clear printed state can be obtained without ink bleeding by performing inkjet printing on the Engove layer, which is densified even in the firing process but does not melt and become vitrified.

The present invention is not limited to the embodiments detailed above, and various modifications or modifications can be made within the scope of the claims of the present invention.

1 ... tile 3 ... base material 5 ... base layer 7 ... ink 9 ... decorative layer 11 ... glaze 13 ... upper glaze layer (glaze layer)

Claims (5)

A step of forming a base layer on the surface of the substrate that does not melt at a predetermined firing temperature and contains an opalescent agent.
The process of printing with ink on the base layer,
A method of manufacturing tiles, comprising a firing step. The method for manufacturing tiles according to claim 1, wherein the base layer is formed of Engove. Further, a step of applying glaze on the ink is provided.
The method for manufacturing tiles according to claim 1 or 2. The substrate and
An underlayer of Engobe containing an opalescent agent formed on the surface of the substrate,
A tile comprising a decorative layer formed on the base layer. The tile according to claim 4, further comprising a glazed layer formed on the decorative layer.

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