JP2020165888A - Probe needle and probe unit - Google Patents

Probe needle and probe unit Download PDF

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JP2020165888A
JP2020165888A JP2019068557A JP2019068557A JP2020165888A JP 2020165888 A JP2020165888 A JP 2020165888A JP 2019068557 A JP2019068557 A JP 2019068557A JP 2019068557 A JP2019068557 A JP 2019068557A JP 2020165888 A JP2020165888 A JP 2020165888A
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insulating film
measured
support plate
metal conductor
probe
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岡田 洋一
Yoichi Okada
洋一 岡田
卓弥 小澤
Takuya Ozawa
卓弥 小澤
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Totoku Electric Co Ltd
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Abstract

To provide a probe needle and a probe unit which are used primarily for inspection of an electronic component and a substrate, etc., and which are of a small diameter used specifically with a narrow pitch.SOLUTION: Provided is a probe needle 10 used in inspection which is carried out by placing an edge 2a of an insulating coating 2 against a guide hole 21a of a support plate 21 on the measured object side constituting a probe unit 20 and bringing a tip 1a of a metal conductor 1 into contact with the measured object. The probe needle 10 comprises a metal conductor 1 and insulating coatings 2, 3 provided in at least a region of the metal conductor 1 except both ends, the insulating coatings 2, 3 including a thin insulating coating 3 provided on the measured object side and a thick insulating coating 2 provided in the barrel part other than the measured object side, the thick insulating coating 2 being constituted so that its edge 2a touches the guide hole 21a of the support plate 21 on the measured object side, the thin insulating coating 3 on the measured object side being constituted so that the withstand voltage is 250 V or higher.SELECTED DRAWING: Figure 2

Description

本発明は、主に電子部品及び基板等の導通検査に用いられ、特に狭ピッチで使用する細径のプローブ針及びプローブユニットに関する。 The present invention relates mainly to a small diameter probe needle and a probe unit used for continuity inspection of electronic parts, substrates, etc., and particularly used at a narrow pitch.

近年、携帯電話等に使用される高密度実装基板、又は、パソコン等に組み込まれるBGA(Ball Grid Array)やCSP(Chip Size Package)等のICパッケージ基板等、様々な回路基板が多く用いられている。このような回路基板は、実装の前後の工程において、例えば直流抵抗値の測定や導通検査等が行われ、その電気特性の良否が検査されている。電気特性の良否の検査は、電気特性を測定する検査装置に接続された検査装置用治具(以下、「プローブユニット」という。)を用いて行われ、例えば、プローブユニットに装着されたピン形状のプローブ針の先端を、その回路基板の電極(以下「被測定体」ともいう。)に接触させることにより行われている。プローブ針は、金属導体と、金属導体の少なくとも両端以外の領域に設けられた絶縁皮膜とで構成されている(例えば特許文献1を参照。)。 In recent years, various circuit boards such as high-density mounting boards used for mobile phones and IC package boards such as BGA (Ball Grid Array) and CSP (Chip Size Package) incorporated in personal computers have been widely used. There is. In such a circuit board, in the steps before and after mounting, for example, the DC resistance value is measured, the continuity is inspected, and the quality of its electrical characteristics is inspected. The quality of the electrical characteristics is inspected using an inspection device jig (hereinafter referred to as "probe unit") connected to the inspection device for measuring the electrical characteristics. For example, a pin shape attached to the probe unit. This is done by bringing the tip of the probe needle of the above into contact with an electrode (hereinafter, also referred to as “measured object”) of the circuit board. The probe needle is composed of a metal conductor and an insulating film provided in a region other than at least both ends of the metal conductor (see, for example, Patent Document 1).

また、特許文献2には、プローブユニットを用いた電気的特性の検査が繰り返し行われて絶縁皮膜端部が繰り返し案内穴に当たる場合であっても、絶縁皮膜端部が金属導体から剥がれるのを防ぐことができる絶縁皮膜付きプローブ針が提案されている。この技術は、金属導体の被測定体側の先端を被測定体の電極に接触させて被測定体の電気的特性を測定する絶縁皮膜付きプローブ針において、絶縁皮膜のうち被測定体側の絶縁皮膜を、先端側が薄く中央側が厚い2段構造とし、その2段構造の段差部を、電気的特性の測定時に用いられるガイド板の案内穴に当接する位置に形成するというものである。このとき、先端側に設けられた薄い部分の厚さが0.1μm以上4μm以下の範囲内であり、薄い部分と厚い部分との厚さの差が3μm以上25μm以下の範囲内であることが好ましいとされている。 Further, in Patent Document 2, even when the inspection of the electrical characteristics using the probe unit is repeatedly performed and the end of the insulating film repeatedly hits the guide hole, the end of the insulating film is prevented from peeling off from the metal conductor. A probe needle with an insulating coating that can be used has been proposed. This technology is used in a probe needle with an insulating film that measures the electrical characteristics of the object to be measured by bringing the tip of the metal conductor on the object to be measured into contact with the electrode of the object to be measured. The two-stage structure is thin on the tip side and thick on the center side, and the stepped portion of the two-stage structure is formed at a position where it abuts on the guide hole of the guide plate used when measuring the electrical characteristics. At this time, the thickness of the thin portion provided on the tip side is within the range of 0.1 μm or more and 4 μm or less, and the difference in thickness between the thin portion and the thick portion is within the range of 3 μm or more and 25 μm or less. It is said to be preferable.

特開2007−322369号公報Japanese Unexamined Patent Publication No. 2007-322369 特開2007−17219号公報Japanese Unexamined Patent Publication No. 2007-17219

近年、電極間の狭ピッチ化に伴い、プローブ針の細径化が進んでいる。こうしたなか、プローブユニットにおいて、多数のプローブ針の被測定体側の絶縁皮膜端部が、繰り返し支持板の案内穴に当たるので、支持板の強度アップが必要となる。高強度の支持板として金属製の支持板が考えられるが、プローブ針間を電気的に絶縁させる必要があるとともに滑り性もあまり良くないので、樹脂製の支持板で製作せざるを得ない。しかしながら、樹脂製の支持板は、金属製の支持板に比べて滑り性は良好であるが強度が低い。そのため、強度を維持するためにプローブ針間のピッチを広くしなければならず、狭ピッチ化の障害になるという問題がある。強度の高いセラミック製とすることも考えられるが、加工性及び靭性が低い等の問題がある。 In recent years, as the pitch between electrodes has become narrower, the diameter of the probe needle has been reduced. Under these circumstances, in the probe unit, the ends of the insulating film on the side to be measured of a large number of probe needles repeatedly hit the guide holes of the support plate, so that it is necessary to increase the strength of the support plate. A metal support plate can be considered as a high-strength support plate, but since it is necessary to electrically insulate the probe needles and the slipperiness is not very good, it is necessary to manufacture the support plate made of resin. However, the resin support plate has better slipperiness but lower strength than the metal support plate. Therefore, in order to maintain the strength, the pitch between the probe needles must be widened, which causes a problem of narrowing the pitch. It is conceivable that it is made of high-strength ceramic, but there are problems such as low workability and toughness.

一方、樹脂は金属と比較して熱膨張率が高いため、樹脂製の支持板を備えたプローブユニットを高温環境下での検査で使用する場合は、樹脂製の支持板の熱膨張によりプローブ針間のピッチが変化してしまい、電極への正確なコンタクトが難しいという問題ある。 On the other hand, since resin has a higher coefficient of thermal expansion than metal, when a probe unit equipped with a resin support plate is used for inspection in a high temperature environment, the probe needle is subjected to thermal expansion of the resin support plate. There is a problem that the pitch between them changes and it is difficult to make accurate contact with the electrodes.

本発明は、上記課題を解決するためになされたものであって、その目的は、主に電子部品及び基板等の検査に用いられ、特に狭ピッチで使用する細径のプローブ針及びプローブユニットを提供することにある。 The present invention has been made to solve the above problems, and an object of the present invention is to use a small-diameter probe needle and probe unit mainly used for inspecting electronic parts and substrates, and particularly used at a narrow pitch. To provide.

(1)本発明に係るプローブ針は、プローブユニットを構成する被測定体側の支持板の案内穴に絶縁皮膜の端部を当てるとともに被測定体に金属導体の先端を接触させて行う検査で使用されるプローブ針であって、前記金属導体と、該金属導体の少なくとも両端以外の領域に設けられた前記絶縁皮膜とを有し、前記絶縁皮膜は、前記被測定体側に設けられた薄い絶縁皮膜と、前記被測定体側以外の胴体部に設けられた厚い絶縁皮膜とを有し、前記厚い絶縁皮膜は、その端部が前記被測定体側の支持板の案内穴に当たるように構成されており、前記被測定体側の薄い絶縁皮膜は、耐電圧が250V以上である、ことを特徴とする。 (1) The probe needle according to the present invention is used in an inspection performed by contacting the end of the insulating film with the guide hole of the support plate on the side to be measured which constitutes the probe unit and bringing the tip of the metal conductor into contact with the body to be measured. The probe needle is provided with the metal conductor and the insulating film provided in a region other than at least both ends of the metal conductor, and the insulating film is a thin insulating film provided on the side to be measured. And a thick insulating film provided on the body portion other than the object to be measured side, and the thick insulating film is configured such that the end portion thereof hits the guide hole of the support plate on the side to be measured. The thin insulating film on the side to be measured is characterized in that it has a withstand voltage of 250 V or more.

この発明によれば、被測定体側の薄い絶縁皮膜と胴体部の厚い絶縁皮膜とからなる2段構造になっているので、案内穴の内壁に薄い絶縁皮膜が接触する。その結果、金属導体が接触する場合よりも滑り性が向上する。さらに、薄い絶縁皮膜は上記耐電圧を有するので、例えば支持板を金属製としても十分な耐電圧を有し、しかも金属製の支持板の案内穴の内壁との滑り性も担保できる。その結果、狭ピッチで使用する細径のプローブ針として好ましく使用することができる。 According to the present invention, since it has a two-stage structure composed of a thin insulating film on the side to be measured and a thick insulating film on the body portion, the thin insulating film comes into contact with the inner wall of the guide hole. As a result, the slipperiness is improved as compared with the case where the metal conductors come into contact with each other. Further, since the thin insulating film has the above-mentioned withstand voltage, for example, even if the support plate is made of metal, it has a sufficient withstand voltage, and the slipperiness with the inner wall of the guide hole of the metal support plate can be ensured. As a result, it can be preferably used as a probe needle having a small diameter used at a narrow pitch.

本発明に係るプローブ針において、前記被測定体側の薄い絶縁皮膜の厚さが1〜7μmの範囲内であり、前記先端皮以外の厚い絶縁皮膜の厚さが3〜20μmの範囲内である。こうすることにより、薄い絶縁皮膜での上記耐電圧を示すことができる。 In the probe needle according to the present invention, the thickness of the thin insulating film on the side to be measured is in the range of 1 to 7 μm, and the thickness of the thick insulating film other than the tip skin is in the range of 3 to 20 μm. By doing so, the above-mentioned withstand voltage with a thin insulating film can be shown.

本発明に係るプローブ針において、前記被測定体側の薄い絶縁皮膜の長手方向の長さL1が、前記プローブユニットが備える支持板の厚さL2よりも1.3倍長い。こうすることにより、プローブユニットで上下に繰り返すストローク長L5の2倍程度となり、例えば支持板を金属製としても、先端で露出する金属導体と金属製の支持板との接触が起きず、ショートすることもない。 In the probe needle according to the present invention, the length L1 in the longitudinal direction of the thin insulating film on the side to be measured is 1.3 times longer than the thickness L2 of the support plate included in the probe unit. By doing so, the stroke length L5 repeated up and down by the probe unit becomes about twice. For example, even if the support plate is made of metal, the metal conductor exposed at the tip does not come into contact with the metal support plate, resulting in a short circuit. There is no such thing.

本発明に係るプローブ針において、前記絶縁皮膜が、ポリウレタン、ポリエステル、ポリエステルイミド、ポリアミドイミド、ポリイミド及びフッ素樹脂から選ばれる1種又は2種以上の樹脂材料で構成された単層又は2層以上で形成されている。こうした滑り性のよい樹脂材料で絶縁皮膜を構成することにより、支持板の内壁との滑り性が良くなる。 In the probe needle according to the present invention, the insulating film is a single layer or two or more layers composed of one or more resin materials selected from polyurethane, polyester, polyesterimide, polyamideimide, polyimide and fluororesin. It is formed. By forming the insulating film with such a highly slippery resin material, the slipperiness with the inner wall of the support plate is improved.

(2)本発明に係るプローブユニットは、被測定体側に配置された支持板と、検査装置側に配置された支持板と、それら少なくとも2つの支持板それぞれが備える案内穴に装着されるプローブ針とを有し、前記被測定体側の支持板の案内穴に絶縁皮膜の端部を当てるとともに前記被測定体に金属導体の先端を接触させて行う検査に用いるプローブユニットであって、
前記プローブ針が、前記金属導体と、該金属導体の少なくとも両端以外の領域に設けられた前記絶縁皮膜とを有し、前記絶縁皮膜は、前記被測定体側に設けられた薄い絶縁皮膜と、前記被測定体側以外の胴体部に設けられた厚い絶縁皮膜とを有し、前記厚い絶縁皮膜は、その端部が前記被測定体側の支持板の案内穴に当たるように構成されており、前記被測定体側の薄い絶縁皮膜は、耐電圧が250V以上である、ことを特徴とする。
(2) The probe unit according to the present invention includes a support plate arranged on the side to be measured, a support plate arranged on the inspection device side, and a probe needle mounted in a guide hole provided in each of at least two of these support plates. This probe unit is used for inspections in which the end of the insulating film is applied to the guide hole of the support plate on the side to be measured and the tip of the metal conductor is brought into contact with the body to be measured.
The probe needle has the metal conductor and the insulating film provided in a region other than at least both ends of the metal conductor, and the insulating film includes a thin insulating film provided on the side to be measured and the insulating film. It has a thick insulating film provided on the body portion other than the body to be measured, and the thick insulating film is configured such that its end portion hits a guide hole of a support plate on the body to be measured. The thin insulating film on the body side is characterized by having a withstand voltage of 250 V or more.

本発明に係るプローブユニットにおいて、前記被測定体側の支持板が金属製である。こうすることにより、十分な耐電圧を有し、しかも金属製の支持板の案内穴の内壁との滑り性も担保できる。その結果、狭ピッチで使用する細径のプローブ針として好ましく使用することができる。 In the probe unit according to the present invention, the support plate on the side to be measured is made of metal. By doing so, it is possible to have a sufficient withstand voltage and to ensure slipperiness with the inner wall of the guide hole of the metal support plate. As a result, it can be preferably used as a probe needle having a small diameter used at a narrow pitch.

本発明に係るプローブユニットにおいて、前記被測定体側の薄い絶縁皮膜の長手方向の長さL1が、前記被測定体側の支持板の厚さL2よりも1.3倍長い。こうすることにより、プローブユニットで上下に繰り返すストローク長L5の2倍程度となり、例えば支持板を金属製としても、先端で露出する金属導体と金属製の支持板との接触が起きず、ショートすることもない。 In the probe unit according to the present invention, the length L1 of the thin insulating film on the side to be measured in the longitudinal direction is 1.3 times longer than the thickness L2 of the support plate on the side to be measured. By doing so, the stroke length L5 repeated up and down by the probe unit becomes about twice. For example, even if the support plate is made of metal, the metal conductor exposed at the tip does not come into contact with the metal support plate, resulting in a short circuit. There is no such thing.

本発明によれば、主に電子部品及び基板等の検査に用いられ、特に狭ピッチで使用する細径のプローブ針及びプローブユニットを提供することができる。特に、先端部側の薄い絶縁皮膜と胴体部の厚い絶縁皮膜とからなる2段構造になっているので、案内穴の内壁に薄い絶縁皮膜が接触するので、金属導体が接触する場合よりも滑り性が向上する。さらに、薄い絶縁皮膜は上記耐電圧を有するので、例えば支持板を金属製としても、十分な耐電圧を有し、しかも金属製の支持板の案内穴の内壁との滑り性も担保できる。その結果、狭ピッチで使用する細径のプローブ針として好ましく使用することができる。 According to the present invention, it is possible to provide a probe needle and a probe unit having a small diameter, which are mainly used for inspection of electronic parts, substrates and the like, and are particularly used at a narrow pitch. In particular, since it has a two-stage structure consisting of a thin insulating film on the tip side and a thick insulating film on the body, the thin insulating film comes into contact with the inner wall of the guide hole, so it slips more than when a metal conductor comes into contact. Improves sex. Further, since the thin insulating film has the above-mentioned withstand voltage, for example, even if the support plate is made of metal, it has a sufficient withstand voltage, and the slipperiness with the inner wall of the guide hole of the metal support plate can be ensured. As a result, it can be preferably used as a probe needle having a small diameter used at a narrow pitch.

本発明に係るプローブ針の一例を示す模式図である。It is a schematic diagram which shows an example of the probe needle which concerns on this invention. 本発明に係るプローブユニットでのプローブ針の動作形態を示す模式図である。It is a schematic diagram which shows the operation mode of the probe needle in the probe unit which concerns on this invention. 従来のプローブ針を装着したプローブユニットの動作形態を示す模式図である。It is a schematic diagram which shows the operation mode of the probe unit which attached the conventional probe needle.

以下、本発明のプローブ針及びプローブユニットについて図面を参照しつつ説明する。なお、本発明は下記の実施形態に限定されるものではない。 Hereinafter, the probe needle and the probe unit of the present invention will be described with reference to the drawings. The present invention is not limited to the following embodiments.

本発明に係るプローブ針10は、図1及び図2に示すように、プローブユニット20を構成する被測定体側の支持板21の案内穴21aに絶縁皮膜2の端部2aを当てるとともに被測定体に金属導体1の先端1aを接触させて行う検査で使用されるプローブ針10である。プローブ針10は、金属導体1と、金属導体1の少なくとも両端以外の領域に設けられた絶縁皮膜2,3とを有している。こうしたプローブ針の特徴は、絶縁皮膜2,3は、被測定体側に設けられた薄い絶縁皮膜3と、被測定体側以外の胴体部に設けられた厚い絶縁皮膜2とを有する2段構造を備えており、厚い絶縁皮膜2は、その端部2aが被測定体側の支持板21の案内穴21aに当たるように構成されており、被測定体側の薄い絶縁皮膜3は、耐電圧が250V以上であるように構成されていることにある。 As shown in FIGS. 1 and 2, the probe needle 10 according to the present invention has the end portion 2a of the insulating film 2 applied to the guide hole 21a of the support plate 21 on the side to be measured, which constitutes the probe unit 20, and the object to be measured. This is a probe needle 10 used in an inspection performed by bringing the tip 1a of a metal conductor 1 into contact with the metal conductor 1. The probe needle 10 has a metal conductor 1 and insulating films 2 and 3 provided in regions other than at least both ends of the metal conductor 1. The feature of such a probe needle is that the insulating films 2 and 3 have a two-stage structure having a thin insulating film 3 provided on the side to be measured and a thick insulating film 2 provided on the body portion other than the body to be measured. The thick insulating film 2 is configured such that its end 2a contacts the guide hole 21a of the support plate 21 on the object to be measured, and the thin insulating film 3 on the object to be measured has a withstand voltage of 250 V or more. It is to be configured like this.

本発明に係るプローブユニット20は、図2に示すように、被測定体側に配置された支持板21と、検査装置側に配置された支持板22と、それら少なくとも2つの支持板21,22それぞれが備える案内穴21a,22aに装着されるプローブ針10とを有し、被測定体側の支持板21の案内穴21aに絶縁皮膜2の端部2aを当てるとともに、被測定体に金属導体1の先端1aを接触させて行う検査に用いるプローブユニットである。そして、プローブ針10が、金属導体1と、該金属導体の少なくとも両端以外の領域に設けられた絶縁皮膜2,3とを有する2段構造を備えている。絶縁皮膜2,3は、被測定体側に設けられた薄い絶縁皮膜3と、被測定体側以外の胴体部に設けられた厚い絶縁皮膜2とを有し、厚い絶縁皮膜2は、その端部2aが被測定体側の支持板21の案内穴21aに当たるように構成されており、被測定体側の薄い絶縁皮膜3は、耐電圧が250V以上であるように構成されている。 As shown in FIG. 2, the probe unit 20 according to the present invention includes a support plate 21 arranged on the side to be measured, a support plate 22 arranged on the inspection device side, and at least two of these support plates 21 and 22, respectively. The probe needle 10 is attached to the guide holes 21a and 22a provided in the above, and the end portion 2a of the insulating film 2 is applied to the guide hole 21a of the support plate 21 on the side to be measured, and the metal conductor 1 is attached to the body to be measured. This is a probe unit used for inspection performed by contacting the tip 1a. The probe needle 10 has a two-stage structure having a metal conductor 1 and insulating films 2 and 3 provided in regions other than at least both ends of the metal conductor. The insulating films 2 and 3 have a thin insulating film 3 provided on the side to be measured and a thick insulating film 2 provided on the body portion other than the body to be measured, and the thick insulating film 2 has an end portion 2a thereof. Is configured to hit the guide hole 21a of the support plate 21 on the side to be measured, and the thin insulating film 3 on the side to be measured is configured to have a withstand voltage of 250 V or more.

こうしたプローブ針10及びプローブユニット20は、被測定体側の薄い絶縁皮膜3と胴体部の厚い絶縁皮膜2とからなる2段構造になっているので、案内穴21aの内壁に薄い絶縁皮膜3が接触する。その結果、金属導体1が接触する場合よりも滑り性が向上する。さらに、薄い絶縁皮膜3は上記耐電圧を有するので、例えば支持板21を金属製としても十分な耐電圧を有し、しかも金属製の支持板21の案内穴21aの内壁との滑り性も担保できる。 Since the probe needle 10 and the probe unit 20 have a two-stage structure composed of a thin insulating film 3 on the side to be measured and a thick insulating film 2 on the body portion, the thin insulating film 3 comes into contact with the inner wall of the guide hole 21a. To do. As a result, the slipperiness is improved as compared with the case where the metal conductor 1 comes into contact with the metal conductor 1. Further, since the thin insulating film 3 has the above-mentioned withstand voltage, for example, even if the support plate 21 is made of metal, it has a sufficient withstand voltage, and the slipperiness of the metal support plate 21 with the inner wall of the guide hole 21a is also ensured. it can.

以下、各構成要素について説明する。 Hereinafter, each component will be described.

<プローブ針>
プローブ針10は、プローブユニット20を構成する被測定体側の支持板21の案内穴21aに絶縁皮膜2の端部2aを当てるとともに被測定体に金属導体1の先端1aを接触させて行う検査で使用されるものである。このプローブ針10は、金属導体1と、金属導体1の少なくとも両端以外の領域に設けられた絶縁皮膜2,3とを有している。
<Probe needle>
The probe needle 10 is an inspection performed by contacting the end portion 2a of the insulating film 2 with the guide hole 21a of the support plate 21 on the side to be measured, which constitutes the probe unit 20, and bringing the tip 1a of the metal conductor 1 into contact with the object to be measured. It is what is used. The probe needle 10 has a metal conductor 1 and insulating films 2 and 3 provided in regions other than at least both ends of the metal conductor 1.

(金属導体)
金属導体1は、所定の長さに加工されてなるピン形状の導体であり、高い導電性と高い弾性率を有する金属線(「金属ばね線」ともいう。)を切断加工されている。金属導体1に用いられる金属としては、広い弾性域を持つ金属を挙げることができ、例えば銀銅合金、錫銅合金、ベリリウム銅合金等の銅合金、タングステン、レニウムタングステン、鋼(例えば高速度鋼:SKH)等を好ましく用いることができる。
(Metal conductor)
The metal conductor 1 is a pin-shaped conductor that is processed to a predetermined length, and is formed by cutting a metal wire (also referred to as a “metal spring wire”) having high conductivity and high elastic modulus. Examples of the metal used for the metal conductor 1 include metals having a wide elastic range, such as copper alloys such as silver-copper alloys, tin-copper alloys, and beryllium-copper alloys, tungsten, renium tungsten, and steel (for example, high-speed steel). : SKH) and the like can be preferably used.

金属導体1は、通常、上記の金属が所定の径の線状導体となるまで冷間又は熱間伸線等の塑性加工が施される。金属導体1の外径D1は、近年の狭ピッチ化の要請から、プローブユニット20において隣り合う各プローブ針10の間隔に応じて、10〜110μmの範囲内、好ましくは20〜90μmの範囲内から任意に選択することができる。 The metal conductor 1 is usually subjected to plastic working such as cold or hot wire drawing until the metal becomes a linear conductor having a predetermined diameter. The outer diameter D1 of the metal conductor 1 is within the range of 10 to 110 μm, preferably within the range of 20 to 90 μm, depending on the distance between the adjacent probe needles 10 in the probe unit 20 due to the recent demand for narrower pitch. It can be selected arbitrarily.

プローブ針10をプローブユニット20に装着し易くし、且つ、プローブユニット20の使用時においてプローブ針10の先端1aが支持板21の案内穴21aに引っかかることによりプローブ針10の動きが妨げられるのを防止する観点からは、金属導体1の真直度が高いことが好ましく、具体的には真直度が曲率半径Rで1000mm以上であることが好ましい。 The probe needle 10 can be easily attached to the probe unit 20, and the tip 1a of the probe needle 10 is caught in the guide hole 21a of the support plate 21 when the probe unit 20 is used, so that the movement of the probe needle 10 is hindered. From the viewpoint of prevention, the straightness of the metal conductor 1 is preferably high, and specifically, the straightness is preferably 1000 mm or more with a radius of curvature R.

金属導体1の先端側の端部1a及び/又は後端側の端部1bの形状は、図示しないが、半球形状、円錐形状、先端に半球形状を有する円錐形状、先端に平坦形状を有する円錐形状、等から選ばれるいずれかとすることができる。ここでいう「半球形状」、「円錐形状」は、正確な半球や円錐を含むが、略円錐や略半球も含む。 The shapes of the end portion 1a and / or the end portion 1b on the rear end side of the metal conductor 1 are not shown, but are hemispherical, conical, conical with a hemispherical shape at the tip, and flat at the tip. It can be any one selected from the shape, etc. The "hemispherical shape" and "conical shape" referred to here include an accurate hemisphere and a cone, but also include a substantially conical shape and a substantially hemisphere.

金属導体1の端部1a,1bにおいては、金属導体1と、被測定体又は検査装置のリード線との接触抵抗値の上昇を抑制するために、めっき層が端部1a,1bに設けられていてもよい。めっき層を形成する金属としては、ニッケル、金、ロジウム等の金属や金合金等の合金を挙げることができる。めっき層は、単層であってもよいし複層であってもよい。複層のめっき層としては、ニッケルめっき層上に金めっき層が形成されたものを好ましく挙げることができる。めっき層は、通常、絶縁皮膜2,3を形成した金属導体1を切断した後、絶縁皮膜2,3の剥離加工と金属導体1の端部加工を行った後に形成される。 At the ends 1a and 1b of the metal conductor 1, plating layers are provided at the ends 1a and 1b in order to suppress an increase in the contact resistance value between the metal conductor 1 and the lead wire of the object to be measured or the inspection device. You may be. Examples of the metal forming the plating layer include metals such as nickel, gold and rhodium, and alloys such as gold alloys. The plating layer may be a single layer or a plurality of layers. As the multi-layered plating layer, one in which a gold plating layer is formed on a nickel plating layer can be preferably mentioned. The plating layer is usually formed after cutting the metal conductor 1 on which the insulating films 2 and 3 are formed, then peeling the insulating films 2 and 3 and processing the end portion of the metal conductor 1.

(絶縁皮膜)
絶縁皮膜2,3は、図1及び図2に示すように、金属導体1の少なくとも両端以外の領域に設けられている。絶縁皮膜2,3の構成は、被測定体側に設けられた薄い絶縁皮膜3と、被測定体側以外の胴体部に設けられた厚い絶縁皮膜2とを有しており、少なくとも2段構造になっている。ここで、「有している」、「少なくとも」とは、薄い絶縁皮膜3や厚い絶縁皮膜2とは異なる厚さの絶縁皮膜(図示しない)を有していても良く、3段構造以上になっていてもよいことを意味している。
(Insulation film)
As shown in FIGS. 1 and 2, the insulating films 2 and 3 are provided in a region other than at least both ends of the metal conductor 1. The structure of the insulating films 2 and 3 includes a thin insulating film 3 provided on the side to be measured and a thick insulating film 2 provided on the body portion other than the side to be measured, and has at least a two-stage structure. ing. Here, "having" and "at least" may have an insulating film (not shown) having a thickness different from that of the thin insulating film 3 and the thick insulating film 2, and may have a three-stage structure or more. It means that it may be.

絶縁皮膜2,3が、ポリウレタン、ポリエステル、ポリエステルイミド、ポリアミドイミド、ポリイミド及びフッ素樹脂から選ばれる1種又は2種以上の樹脂材料で構成されている。そして、上記1種又は2種以上の樹脂材料により、単層又は2層以上で形成されている。こうした滑り性のよい樹脂材料で絶縁皮膜2,3を構成することにより、支持板21,22の案内穴21a,22aの内壁との滑り性が良くなる。なお、より耐熱性が要求される場合には、ポリエステルイミド、ポリアミドイミド等で形成されることが好ましい。 The insulating films 2 and 3 are composed of one or more resin materials selected from polyurethane, polyester, polyesterimide, polyamideimide, polyimide and fluororesin. Then, it is formed of a single layer or two or more layers by the above-mentioned one or more kinds of resin materials. By forming the insulating films 2 and 3 with such a highly slippery resin material, the slipperiness of the support plates 21 and 22 with the inner walls of the guide holes 21a and 22a is improved. When more heat resistance is required, it is preferably formed of polyesterimide, polyamideimide, or the like.

絶縁皮膜2,3の形成は、通常、長尺の金属導体1上に連続エナメル焼き付け方法によって行うことが好ましいが、もちろん他の方法で形成したものであってもよい。このとき、厚い絶縁皮膜2と薄い絶縁皮膜3の作り分けは、レーザー照射でのアブレーションを利用し、被測定体側の絶縁皮膜にレーザー照射して、薄い絶縁皮膜3からなる長さL1の部分が残るようにして形成することができる。検査装置側の絶縁皮膜は、全て剥離すればよく、薄い絶縁皮膜3を形成しなくてもよい。なお、薄い絶縁皮膜3と厚い絶縁皮膜2との作り分けは、こうしたレーザー照射を用いた方法以外の方法で行ってもよく、特に限定されない。 The insulating films 2 and 3 are usually preferably formed on a long metal conductor 1 by a continuous enamel baking method, but of course, they may be formed by another method. At this time, the thick insulating film 2 and the thin insulating film 3 are made separately by using ablation by laser irradiation to irradiate the insulating film on the side to be measured with a laser, and the portion of length L1 composed of the thin insulating film 3 is formed. It can be formed so that it remains. All the insulating film on the inspection device side may be peeled off, and it is not necessary to form a thin insulating film 3. The thin insulating film 3 and the thick insulating film 2 may be made separately by a method other than the method using laser irradiation, and are not particularly limited.

厚い絶縁皮膜2は、被測定体側以外の胴体部に設けられており、金属導体1上に設けられて被測定体の電気特性を検査する際のプローブ針同士の接触を防いで短絡を防止するように作用する。そして、厚い絶縁皮膜2は、その端部2aが被測定体側の支持板21の案内穴21aに当たるように構成されている。厚い絶縁皮膜2の厚さは、プローブ針同士の接触時のショート等が起こらない必要な厚さが金属導体1の線径を考慮して設けられていればよく、3〜20μmの範囲内であることが好ましい。 The thick insulating film 2 is provided on the body portion other than the side to be measured, and is provided on the metal conductor 1 to prevent contact between the probe needles when inspecting the electrical characteristics of the object to be measured to prevent a short circuit. Acts like. The thick insulating film 2 is configured such that its end portion 2a abuts on the guide hole 21a of the support plate 21 on the side to be measured. The thickness of the thick insulating film 2 may be such that a necessary thickness that does not cause a short circuit when the probe needles come into contact with each other is provided in consideration of the wire diameter of the metal conductor 1 within the range of 3 to 20 μm. It is preferable to have.

薄い絶縁皮膜3は、被測定体側に設けられており、その薄い絶縁皮膜3の先端から金属導体1の先端1aが突出するように設けられている。薄い絶縁皮膜3は、耐電圧が250V以上であるように構成されている。この耐電圧で形成された薄い絶縁皮膜3は、少なくとも約1μm以上の厚さで形成されていることが好ましい。なお、耐電圧の観点からは、薄い絶縁皮膜3の厚さの上限は特に限定されないが、支持板21の案内穴21aに、薄い絶縁皮膜3が形成されている部分を挿入する必要もあることから、その薄い絶縁皮膜3の厚さは、7μm以下であることが好ましい。 The thin insulating film 3 is provided on the side to be measured, and is provided so that the tip 1a of the metal conductor 1 projects from the tip of the thin insulating film 3. The thin insulating film 3 is configured to have a withstand voltage of 250 V or more. The thin insulating film 3 formed with this withstand voltage is preferably formed with a thickness of at least about 1 μm or more. From the viewpoint of withstand voltage, the upper limit of the thickness of the thin insulating film 3 is not particularly limited, but it is also necessary to insert a portion where the thin insulating film 3 is formed into the guide hole 21a of the support plate 21. Therefore, the thickness of the thin insulating film 3 is preferably 7 μm or less.

薄い絶縁皮膜3の長手方向(プローブ針の長尺方法)の長さL1は、図2に示すように、プローブユニット20が備える支持板21の厚さL2よりも1.3倍長くすることが好ましい。1.3倍長くすることにより、薄い絶縁皮膜3の長さL1は、プローブユニット20で上下に繰り返すストローク長L5の2倍程度となるので、例えば支持板21を金属製としても、先端で露出する金属導体1と金属製の支持板21との接触が起きず、ショートすることもない。 As shown in FIG. 2, the length L1 of the thin insulating film 3 in the longitudinal direction (long method of the probe needle) may be 1.3 times longer than the thickness L2 of the support plate 21 included in the probe unit 20. preferable. By making it 1.3 times longer, the length L1 of the thin insulating film 3 becomes about twice the stroke length L5 repeated up and down by the probe unit 20, so that even if the support plate 21 is made of metal, it is exposed at the tip. The metal conductor 1 and the metal support plate 21 do not come into contact with each other, and there is no short circuit.

こうしたプローブ針10は、被測定体側の薄い絶縁皮膜3と胴体部の厚い絶縁皮膜2とからなる2段構造になっているので、案内穴21aの内壁に薄い絶縁皮膜3が接触することになる。そのため、案内穴21aの内壁に金属導体1が接触する場合よりも滑り性を向上させることができる。さらに、薄い絶縁皮膜3は上記耐電圧を有するので、例えば支持板21を金属製としても十分な耐電圧を有し、しかも金属製やセラミックス製の支持板21の案内穴21aの内壁との滑り性も担保できるという利点がある。 Since such a probe needle 10 has a two-stage structure composed of a thin insulating film 3 on the side to be measured and a thick insulating film 2 on the body portion, the thin insulating film 3 comes into contact with the inner wall of the guide hole 21a. .. Therefore, the slipperiness can be improved as compared with the case where the metal conductor 1 comes into contact with the inner wall of the guide hole 21a. Further, since the thin insulating film 3 has the above-mentioned withstand voltage, for example, even if the support plate 21 is made of metal, it has a sufficient withstand voltage, and the support plate 21 made of metal or ceramics slides with the inner wall of the guide hole 21a. There is an advantage that sex can be guaranteed.

<プローブユニット>
プローブユニット20は、図2に示すように、被測定体側に配置された支持板21と、検査装置側に配置された支持板22と、それら少なくとも2つの支持板21,22それぞれが備える案内穴21a,22aに装着される上記本発明に係るプローブ針10とを有している。このプローブユニット20では、被測定体側の支持板21の案内穴21aに絶縁皮膜2の端部2aが当たって、プローブ針10が落下するのを防いだ状態で、被測定体に金属導体1の先端1aを接触させて検査を行う装置である。プローブユニット20には、複数本から数千本のプローブ針10が装着されている。
<Probe unit>
As shown in FIG. 2, the probe unit 20 includes a support plate 21 arranged on the side to be measured, a support plate 22 arranged on the inspection device side, and guide holes provided in each of the at least two support plates 21 and 22. It has a probe needle 10 according to the present invention mounted on 21a and 22a. In the probe unit 20, the metal conductor 1 is placed on the object to be measured in a state where the end portion 2a of the insulating film 2 hits the guide hole 21a of the support plate 21 on the object to be measured and the probe needle 10 is prevented from falling. This is a device for inspecting by contacting the tip 1a. The probe unit 20 is equipped with a plurality of to several thousand probe needles 10.

検査装置側の支持板22は、厚い絶縁皮膜2が設けられた胴体部の外径D2(プローブ針10の外径)よりも若干大きい内径D5の案内穴22aを有している。その案内穴22aは、一本一本のプローブ針10の金属導体1をリード線にガイドする。 The support plate 22 on the inspection device side has a guide hole 22a having an inner diameter D5 slightly larger than the outer diameter D2 (outer diameter of the probe needle 10) of the body portion provided with the thick insulating film 2. The guide hole 22a guides the metal conductor 1 of each probe needle 10 to the lead wire.

被測定体側の支持板21は、薄い絶縁皮膜3が設けられた部分の外径D3よりも若干大きい内径D4の案内穴21aを有している。その案内穴21aは、一本一本のプローブ針10の先端をガイドし、被測定体に金属導体1の先端1aを正確に接触させるようにガイドする。そして、その案内穴21aの内壁には、金属導体1が接触せず、耐電圧が250V以上の薄い絶縁皮膜3だけが接触する。その結果、被測定体側の支持板21が金属製であったとしても、十分な耐電圧を有し、しかも良好な滑り性を確保できる。 The support plate 21 on the side to be measured has a guide hole 21a having an inner diameter D4 slightly larger than the outer diameter D3 of the portion provided with the thin insulating film 3. The guide hole 21a guides the tips of the probe needles 10 one by one, and guides the tip 1a of the metal conductor 1 to the object to be measured so as to be in accurate contact with the tip 1a. Then, the metal conductor 1 does not contact the inner wall of the guide hole 21a, and only the thin insulating film 3 having a withstand voltage of 250 V or more contacts. As a result, even if the support plate 21 on the side to be measured is made of metal, it has a sufficient withstand voltage and can secure good slipperiness.

なお、図2に示すように、符号L3は、プローブ針10が最も後退した時に支持板21の案内穴21a内に入り込む金属導体1の長さであり、符号L4は、プローブ針10が最も前進した時に支持板下面からはみ出る長さである。また、符号L5は、プローブ針10が最も後退した時の支持板21の上面と厚い絶縁皮膜3の端部3aとの距離(長さ)である。図2(A)に示すように、プローブ針10が最も後退した時であっても、支持板21の案内穴21a内に入り込む金属導体1の長さL3は、支持板21の厚さの0%〜30%程度の長さであることが好ましく、0%〜20%程度の長さであることが好ましい。こうすることにより、金属導体1の先端1aが、案内穴21aの内壁に接触してショートすることがない。また、その後にプローブ針10が被測定体側に前進るると、図2(B)の態様を経て、厚い絶縁皮膜2の端部2aが支持板21の上面に当たって、図2(C)のようにプローブ針10が最も前進した態様に至る。図2(C)の態様において、支持板21の下面からはみ出る長さL4は、特に限定されないが、概ね、支持板21の厚さL2の10〜30%程度であることが好ましい。 As shown in FIG. 2, reference numeral L3 is the length of the metal conductor 1 that enters the guide hole 21a of the support plate 21 when the probe needle 10 is most retracted, and reference numeral L4 is the length of the metal conductor 1 in which the probe needle 10 is most advanced. It is the length that protrudes from the lower surface of the support plate when it is used. Further, reference numeral L5 is a distance (length) between the upper surface of the support plate 21 and the end portion 3a of the thick insulating film 3 when the probe needle 10 is most retracted. As shown in FIG. 2A, the length L3 of the metal conductor 1 that enters the guide hole 21a of the support plate 21 is 0 of the thickness of the support plate 21 even when the probe needle 10 is most retracted. The length is preferably about% to 30%, and the length is preferably about 0% to 20%. By doing so, the tip 1a of the metal conductor 1 does not come into contact with the inner wall of the guide hole 21a and short-circuit. After that, when the probe needle 10 advances toward the object to be measured, the end portion 2a of the thick insulating film 2 hits the upper surface of the support plate 21 through the aspect of FIG. 2B, as shown in FIG. 2C. The probe needle 10 reaches the most advanced mode. In the aspect of FIG. 2C, the length L4 protruding from the lower surface of the support plate 21 is not particularly limited, but is generally preferably about 10 to 30% of the thickness L2 of the support plate 21.

プローブユニット20は、被測定体の電気特性を検査する際、プローブ針10と被測定体とが対応するように位置制御される。電気特性の検査は、プローブユニット20を上下にストロークさせ、プローブ針10の弾性力を利用して被測定体にプローブ針10の先端1aを所定の圧力で押し当てることにより行われる。このとき、プローブ針10の後端1bはリード線(図示しない)に接触し、被測定体からの電気信号がそのリード線を通って検査装置(図示しない。)に送られる。 The position of the probe unit 20 is controlled so that the probe needle 10 and the object to be measured correspond to each other when inspecting the electrical characteristics of the object to be measured. The inspection of the electrical characteristics is performed by stroking the probe unit 20 up and down and pressing the tip 1a of the probe needle 10 against the object to be measured with a predetermined pressure by utilizing the elastic force of the probe needle 10. At this time, the rear end 1b of the probe needle 10 comes into contact with a lead wire (not shown), and an electric signal from the object to be measured is sent to an inspection device (not shown) through the lead wire.

こうしたプローブユニット20によれば、被測定体側の支持板21の案内穴21aの内壁に薄い絶縁皮膜3が接触するので、金属導体1が接触する場合よりも滑り性が向上する。その結果、プローブユニット20内で摺動性が向上し、被検査体への接触安定性が向上し、接触不具合が解消される。さらに、耐電圧も確保されるので、例えば支持板21を金属製としても十分な耐電圧を有し、しかも金属製の支持板21の案内穴21aの内壁との滑り性も担保できる。特に金属製の支持板21とすることにより、支持板21の強度が向上し、プローブ針10の狭ピッチ化が可能となる。また、金属製やセラミックス製の支持板21は、樹脂製の支持板21に比べて熱膨張率が低下し、高温での使用が可能となるという利点がある。なお、金属製の支持板21は、その全てが金属製であってもよいし一部が金属製であってもよく、特に限定されない。 According to such a probe unit 20, since the thin insulating film 3 comes into contact with the inner wall of the guide hole 21a of the support plate 21 on the side to be measured, the slipperiness is improved as compared with the case where the metal conductor 1 comes into contact. As a result, the slidability in the probe unit 20 is improved, the contact stability to the object to be inspected is improved, and the contact defect is eliminated. Further, since the withstand voltage is also secured, for example, even if the support plate 21 is made of metal, it has a sufficient withstand voltage, and the slipperiness of the metal support plate 21 with the inner wall of the guide hole 21a can be ensured. In particular, by using the metal support plate 21, the strength of the support plate 21 is improved, and the pitch of the probe needle 10 can be narrowed. Further, the metal or ceramic support plate 21 has an advantage that the coefficient of thermal expansion is lower than that of the resin support plate 21 and the support plate 21 can be used at a high temperature. The metal support plate 21 may be entirely made of metal or partly made of metal, and is not particularly limited.

1 金属導体
1a 先端側で露出する金属導体
1b 後端側で露出する金属導体
2 胴体部の厚い絶縁皮膜
2a 案内穴に当たる絶縁皮膜の端部
3 被測定体側の薄い絶縁皮膜
10 プローブ針
20 プローブユニット
21 被測定体側の支持板
21a 案内穴
22 検査装置側の支持板
22a 案内穴
100 従来のプローブ針
L1 薄い絶縁皮膜の長さ
L2 被測定体側の支持板の厚さ
L3 プローブ針が最も後退した時に支持板内に入り込む金属導体の長さ
L4 プローブ針が最も前進した時に支持板下面からはみ出る長さ
L5 プローブ針が最も後退した時の支持板上面と厚い絶縁皮膜の端部との距離(長さ)
D1 金属導体の外径
D2 厚い絶縁皮膜が設けられた胴体部の外径
D3 薄い絶縁皮膜が設けられた部分の外径
D4 被測定体側の支持板の案内穴の内径
D5 検査装置側の支持板の案内穴の内径


1 Metal conductor 1a Metal conductor exposed on the front end side 1b Metal conductor exposed on the rear end side 2 Thick insulating film on the body 2a End of the insulating film that hits the guide hole 3 Thin insulating film on the object to be measured 10 Probe needle 20 Probe unit 21 Support plate on the side to be measured 21a Guide hole 22 Support plate on the inspection device side 22a Guide hole 100 Conventional probe needle L1 Length of thin insulating film L2 Thickness of support plate on the side to be measured L3 When the probe needle is most retracted Length of metal conductor that enters the support plate L4 Length that protrudes from the lower surface of the support plate when the probe needle is most advanced L5 Distance (length) between the upper surface of the support plate and the end of the thick insulating film when the probe needle is most retracted )
D1 Outer diameter of metal conductor D2 Outer diameter of fuselage with thick insulation film D3 Outer diameter of part with thin insulation film D4 Inner diameter of guide hole of support plate on the side to be measured D5 Support plate on inspection device side Inner diameter of guide hole


Claims (7)

プローブユニットを構成する被測定体側の支持板の案内穴に絶縁皮膜の端部を当てるとともに被測定体に金属導体の先端を接触させて行う検査で使用されるプローブ針であって、
前記金属導体と、該金属導体の少なくとも両端以外の領域に設けられた前記絶縁皮膜とを有し、前記絶縁皮膜は、前記被測定体側に設けられた薄い絶縁皮膜と、前記被測定体側以外の胴体部に設けられた厚い絶縁皮膜とを有し、前記厚い絶縁皮膜は、その端部が前記被測定体側の支持板の案内穴に当たるように構成されており、前記被測定体側の薄い絶縁皮膜は、耐電圧が250V以上である、ことを特徴とするプローブ針。
A probe needle used in inspections performed by contacting the end of the insulating film with the guide hole of the support plate on the side of the object to be measured that constitutes the probe unit and contacting the tip of the metal conductor with the object to be measured.
It has the metal conductor and the insulating film provided in a region other than at least both ends of the metal conductor, and the insulating film is a thin insulating film provided on the side to be measured and a film other than the side to be measured. It has a thick insulating film provided on the body portion, and the thick insulating film is configured such that its end portion hits a guide hole of a support plate on the side to be measured, and a thin insulating film on the side to be measured. Is a probe needle having a withstand voltage of 250 V or more.
前記被測定体側の薄い絶縁皮膜の厚さが1〜7μmの範囲内であり、前記先端皮以外の厚い絶縁皮膜の厚さが3〜20μmの範囲内である、請求項1に記載のプローブ針。 The probe needle according to claim 1, wherein the thickness of the thin insulating film on the side to be measured is in the range of 1 to 7 μm, and the thickness of the thick insulating film other than the tip skin is in the range of 3 to 20 μm. .. 前記被測定体側の薄い絶縁皮膜の長手方向の長さL1が、前記プローブユニットが備える支持板の厚さL2よりも1.3倍長い、請求項1又は2に記載のプローブ針。 The probe needle according to claim 1 or 2, wherein the length L1 in the longitudinal direction of the thin insulating film on the side to be measured is 1.3 times longer than the thickness L2 of the support plate included in the probe unit. 前記絶縁皮膜が、ポリウレタン、ポリエステル、ポリエステルイミド、ポリアミドイミド、ポリイミド及びフッ素樹脂から選ばれる1種又は2種以上の樹脂材料で構成された単層又は2層以上で形成されている、請求項1〜3のいずれか1項に記載のプローブ針。 Claim 1 The insulating film is formed of a single layer or two or more layers made of one or more resin materials selected from polyurethane, polyester, polyesterimide, polyamideimide, polyimide and fluororesin. The probe needle according to any one of 3 to 3. 被測定体側に配置された支持板と、検査装置側に配置された支持板と、それら少なくとも2つの支持板それぞれが備える案内穴に装着されるプローブ針とを有し、前記被測定体側の支持板の案内穴に絶縁皮膜の端部を当てるとともに前記被測定体に金属導体の先端を接触させて行う検査に用いるプローブユニットであって、
前記プローブ針が、前記金属導体と、該金属導体の少なくとも両端以外の領域に設けられた前記絶縁皮膜とを有し、前記絶縁皮膜は、前記被測定体側に設けられた薄い絶縁皮膜と、前記被測定体側以外の胴体部に設けられた厚い絶縁皮膜とを有し、前記厚い絶縁皮膜は、その端部が前記被測定体側の支持板の案内穴に当たるように構成されており、前記被測定体側の薄い絶縁皮膜は、耐電圧が250V以上である、ことを特徴とするプローブユニット。
It has a support plate arranged on the side to be measured, a support plate arranged on the inspection device side, and a probe needle attached to a guide hole provided in each of the at least two support plates, and supports the body to be measured. A probe unit used for inspections performed by contacting the end of the insulating film with the guide hole of the plate and bringing the tip of the metal conductor into contact with the object to be measured.
The probe needle has the metal conductor and the insulating film provided in a region other than at least both ends of the metal conductor, and the insulating film includes a thin insulating film provided on the side to be measured and the insulating film. It has a thick insulating film provided on the body portion other than the body to be measured, and the thick insulating film is configured such that its end portion hits a guide hole of a support plate on the body to be measured. A probe unit characterized in that the thin insulating film on the body side has a withstand voltage of 250 V or more.
前記被測定体側の支持板が金属製である、請求項5に記載のプローブユニット。 The probe unit according to claim 5, wherein the support plate on the side to be measured is made of metal. 前記被測定体側の薄い絶縁皮膜の長手方向の長さL1が、前記被測定体側の支持板の厚さL2よりも1.3倍長い、請求項5又は6に記載のプローブユニット。



The probe unit according to claim 5 or 6, wherein the length L1 in the longitudinal direction of the thin insulating film on the side to be measured is 1.3 times longer than the thickness L2 of the support plate on the side to be measured.



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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02115175U (en) * 1989-03-03 1990-09-14
JP2007017219A (en) * 2005-07-06 2007-01-25 Totoku Electric Co Ltd Probe needle with insulating coating, and its manufacturing method
JP2010091494A (en) * 2008-10-10 2010-04-22 Totoku Electric Co Ltd Probe needle
JP2010107420A (en) * 2008-10-31 2010-05-13 Mitsubishi Cable Ind Ltd Probe pin and method for insulating the same
JP2013002931A (en) * 2011-06-15 2013-01-07 Tokyo Electron Ltd Probe supporting board and manufacturing method for the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02115175U (en) * 1989-03-03 1990-09-14
JP2007017219A (en) * 2005-07-06 2007-01-25 Totoku Electric Co Ltd Probe needle with insulating coating, and its manufacturing method
JP2010091494A (en) * 2008-10-10 2010-04-22 Totoku Electric Co Ltd Probe needle
JP2010107420A (en) * 2008-10-31 2010-05-13 Mitsubishi Cable Ind Ltd Probe pin and method for insulating the same
JP2013002931A (en) * 2011-06-15 2013-01-07 Tokyo Electron Ltd Probe supporting board and manufacturing method for the same

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