JP2020157326A - Joining method of lead free solder material - Google Patents

Joining method of lead free solder material Download PDF

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JP2020157326A
JP2020157326A JP2019057667A JP2019057667A JP2020157326A JP 2020157326 A JP2020157326 A JP 2020157326A JP 2019057667 A JP2019057667 A JP 2019057667A JP 2019057667 A JP2019057667 A JP 2019057667A JP 2020157326 A JP2020157326 A JP 2020157326A
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solder
joining
intermetallic compound
lead
bonding
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西村 哲郎
Tetsuro Nishimura
哲郎 西村
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Nihon Superior Sha Co Ltd
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Abstract

To provide a joining method and a solder joining part having high joining reliability even under a high temperature environment for forming a joining layer easily joinable, extremely small in the number of generation of voids after joining, uniform in generation of an intermetallic compound such as Cu6Sn5 and distributed in the whole joining part.SOLUTION: In a solder joining method for solder-joining by using a lead free solder material for generating a Cu6Sn5 intermetallic compound in a joining part after coating a soldering part of a base board of becoming previously a joining object by using Sn or a lead free solder alloy containing Sn as a main component, a solder joining part soldered by using the solder joining method can provide a highly reliable solder joining part small in reduction of a joining characteristic even when exposed for a long time at a high temperature of 300°C since the Cu6Sn5 intermetallic compound uniformly and abundantly exists in the solder joining part.SELECTED DRAWING: Figure 3

Description

本発明は、液相拡散接合を活用した鉛フリーはんだ材料の接合方法に関する。 The present invention relates to a method for joining a lead-free solder material utilizing liquid phase diffusion bonding.

地球環境負荷軽減のため、電子部品の接合材料としてSn-Ag-Cu系鉛フリーはんだ合金やSn-Cu-Ni系鉛フリーはんだ合金が広く普及している。
しかし、それらの鉛フリーはんだ合金の多くは融点が230℃以下であり、RoHS指令の適応除外である鉛を高濃度で含有する高温はんだに代わる鉛フリーはんだ接合材が求められている。
このようなニーズを満たす接合材として、銀粒子を主成分とする焼結タイプの接合材や金属粉末とはんだ合金粉末等を混合した液相拡散接合材料が提案されている。
ところが、前者は高価格で普及が進んでおらず、後者もボイドの発生等種々の課題が残されている。
そこで、安価でしかも高温環境下で信頼性の高い接合特性を有するはんだ材料が提案されている。
Sn-Ag-Cu-based lead-free solder alloys and Sn-Cu-Ni-based lead-free solder alloys are widely used as bonding materials for electronic components in order to reduce the burden on the global environment.
However, most of these lead-free solder alloys have a melting point of 230 ° C. or lower, and there is a demand for a lead-free solder bonding material that replaces high-temperature solder containing a high concentration of lead, which is exempt from the RoHS Directive.
As a bonding material satisfying such needs, a sintering type bonding material containing silver particles as a main component and a liquid phase diffusion bonding material in which a metal powder and a solder alloy powder are mixed have been proposed.
However, the former is expensive and has not been widely used, and the latter also has various problems such as the generation of voids.
Therefore, a solder material that is inexpensive and has highly reliable bonding characteristics in a high temperature environment has been proposed.

例えば、特許文献1では、比較的低融点のはんだ又ははんだ粉末と比較的高融点のNi含有粉末との混合物を用いたはんだ材料に関する技術が開示されている。
また、特許文献2では、Sn又はSn合金を主材としCuとSnとの金属間化合物を含有する多層プリフォームシートに関する技術が開示されている。
For example, Patent Document 1 discloses a technique relating to a solder material using a solder having a relatively low melting point or a mixture of a solder powder having a relatively high melting point and a Ni-containing powder having a relatively high melting point.
Further, Patent Document 2 discloses a technique relating to a multilayer preform sheet containing Sn or a Sn alloy as a main material and an intermetallic compound of Cu and Sn.

そして、特許文献1及び特許文献2で開示されている技術は、接合後の接合部にCu6Sn5金属間化合物を形成させることにより耐高温特性を有する鉛フリーはんだ接合材である。
しかし、特許文献1及び特許文献2で開示されている技術は、接合材料の一部または全部を単層又は多層のプリフォームシートに加工する必要があるため、高コストとなるばかりでなく、微細で複雑な形状を有する接合部への表面実装が困難という課題が残されている。
The techniques disclosed in Patent Document 1 and Patent Document 2 are lead-free solder bonding materials having high temperature resistance by forming a Cu6Sn5 intermetallic compound in the bonded portion after bonding.
However, the techniques disclosed in Patent Document 1 and Patent Document 2 are not only costly but also fine because it is necessary to process a part or all of the bonding material into a single-layer or multi-layer preform sheet. There remains the problem that it is difficult to mount the surface on a joint having a complicated shape.

US2017/009591A1公報US2017 / 09591A1 Publication 特許第6042577号公報Japanese Patent No. 6042577

本発明は、簡易に接合が可能で、はんだ接合後はボイドの発生が極めて少なく、CuSn等の金属間化合物の生成が均一且つ接合部全体に分布した接合層を形成する、高温環境下でも高い接合信頼性を有するはんだ接合方法並びに当該接合法ではんだ接合した接合部の提供を目的とする。 INDUSTRIAL APPLICABILITY According to the present invention, bonding is possible easily, voids are extremely small after solder bonding, and a bonding layer is formed in which intermetallic compounds such as Cu 6 Sn 5 are uniformly produced and distributed throughout the bonding portion. It is an object of the present invention to provide a solder joining method having high joining reliability even below, and a joint portion soldered by the joining method.

本発明者は、上記目的を達成すべく、はんだ接合部におけるCuSn金属間化合物の生成条件に着目して鋭意検討を重ねた結果、予め接合対象となる基板等の接合部にSn又はSnを主成分とする鉛フリーはんだをコートした後に、CuSn金属間化合物を生成する鉛フリーはんだ材料を用いてはんだ付けすることにより、接合層にボイドの発生がなくCuSn金属間化合物が均一且つ全体に生成することを見出し、本発明を完成するに至った。 In order to achieve the above object, the present inventor has focused on the conditions for forming a Cu 6 Sn 5 intermetallic compound in the solder joint, and as a result of repeated studies, Sn or Sn or is previously applied to the joint of the substrate or the like to be joined. By coating with lead-free solder containing Sn as the main component and then soldering using a lead-free solder material that produces a Cu 6 Sn 5 intermetallic compound, no voids are generated in the bonding layer and the Cu 6 Sn 5 metal We have found that the intermetallic compound is uniformly and totally produced, and have completed the present invention.

即ち本発明は、予め接合対象となる基板等のはんだ付け部にSn又はSnを主成分とする鉛フリーはんだ合金でコートした後に、接合部にCuSn金属間化合物を生成する鉛フリーはんだ材料を用いてはんだ接合を行うはんだ接合方法であり、当該はんだ接合方法を用いたはんだ付けしたはんだ接合部は、はんだ接合部にCuSn金属間化合物が均一且つ多く存在しているため、300℃の高温に長時間晒されても接合特性の低下が少ない高信頼性のはんだ接合部を提供することができる。 That is, in the present invention, the soldered portion of the substrate or the like to be bonded is previously coated with Sn or a lead-free solder alloy containing Sn as a main component, and then the lead-free solder that produces a Cu 6 Sn 5 metal-to-metal compound is formed on the bonded portion. This is a solder joining method in which solder joining is performed using a material. In the solder joint portion soldered using the solder joining method, Cu 6 Sn 5 metal-to-metal compounds are uniformly and abundantly present in the solder joint portion. It is possible to provide a highly reliable solder joint portion in which the joint characteristics are not deteriorated even when exposed to a high temperature of 300 ° C. for a long time.

本発明は、簡易な方法で高温特性の優れたはんだ接合並びにはんだ接合部を安価で供給することが可能なため、耐高温特性が必要な車載用パワーデバイス等への応用が期待できる。 Since the present invention can supply solder joints having excellent high temperature characteristics and solder joints at low cost by a simple method, it can be expected to be applied to in-vehicle power devices and the like that require high temperature resistance.

従来の方法でCu基板にはんだ材料を接合した外観写真。An external photograph of a solder material bonded to a Cu substrate by a conventional method. 従来の方法でCu基板にはんだ材料を接合した接合部の断面写真。A cross-sectional photograph of a joint in which a solder material is bonded to a Cu substrate by a conventional method. 本発明のはんだ付け方法でCu基板にはんだ材料を接合した接合部の断面写真。A cross-sectional photograph of a joint portion in which a solder material is bonded to a Cu substrate by the soldering method of the present invention.

本発明は、予め接合対象となる基板等のはんだ付け部にSn又はSnを主成分とする鉛フリーはんだ合金でコートした後に、接合部にCuSn金属間化合物を生成する鉛フリーはんだ材料を用いてはんだ接合を行うはんだ接合方法である。
接合のステップとして、接合対象となる基板等の接合部にSn又はSnを主成分とする鉛フリーはんだ合金で予めコートすることを第1ステップとする。
そして、第2ステップとして、第1ステップで基板等にSn又はSnを主成分とする鉛フリーはんだ合金でコートしたはんだ接合箇所の上にCuSnを生成する鉛フリーはんだ接合材料を塗布し、その後、リフロー炉等で加熱しはんだ接合する接合方法である。
INDUSTRIAL APPLICABILITY The present invention is a lead-free solder material that produces a Cu 6 Sn 5 metal-to-metal compound on a joint after coating the soldered part of a substrate or the like to be joined with a lead-free solder alloy containing Sn or Sn as a main component in advance. This is a solder joining method in which solder is joined using.
As a joining step, the first step is to precoat the joint portion of the substrate or the like to be joined with Sn or a lead-free solder alloy containing Sn as a main component.
Then, as the second step, a lead-free solder bonding material that produces Cu 6 Sn 5 is applied on the solder joint portion coated with Sn or a lead-free solder alloy containing Sn as a main component on the substrate or the like in the first step. After that, it is a joining method in which the solder is joined by heating in a reflow furnace or the like.

本発明のはんだ接合方法に用いるコート成分は、Sn又はSnを主成分とする鉛フリーはんだ合金であり、本発明の効果を有する範囲に於いて特に制限はないが、Sn単独がより好ましい。
コートの方法として、メッキによる方法が例示できるが蒸着やスパッタ等でも構わないが、コートするSn又はSnを主成分とする鉛フリーはんだ合金の厚みは、10μm以上が好ましい。
また、本発明のはんだ接合に用いる基板は、本発明の効果を有する範囲に於いて特に制限はなく、素材が窒化アルミやSiC等のセラミックでCuやNi、Au等のメッキ等を施したものでも良く、素材がCuのリードフレーム等でも構わない。
The coating component used in the solder joining method of the present invention is a lead-free solder alloy containing Sn or Sn as a main component, and is not particularly limited as long as it has the effect of the present invention, but Sn alone is more preferable.
As a coating method, a plating method can be exemplified, but vapor deposition, sputtering, or the like may be used, but the thickness of Sn or a lead-free solder alloy containing Sn as a main component to be coated is preferably 10 μm or more.
Further, the substrate used for the solder bonding of the present invention is not particularly limited as long as the effect of the present invention is obtained, and the material is a ceramic such as aluminum nitride or SiC plated with Cu, Ni, Au or the like. However, the material may be a Cu lead frame or the like.

本発明のはんだ接合方法に用いる接合部にCuSn金属間化合物を生成する鉛フリーはんだ材料は、本発明の効果を有する範囲に於いて特に制限はない。
例えば、Cu及びNiからなる合金やSn−Cu−Niからなるはんだ合金が例示でき、種類の異なる組成の合金やはんだ粉末を今後しても構わない。
また、粒径も本発明の効果を有する範囲に於いて特に制限はなく、1〜35μmが好ましい。
更に、当該接合部にCuSn金属間化合物を生成する鉛フリーはんだ材料は、合金粉末やはんだ合金粉末にロジン等の樹脂成分、チキソ剤、活性剤、及び溶剤等からなるフラックスを加えたはんだペーストに加工した鉛フリーはんだ材料が好ましく、はんだ付け後に残渣が残らない活性剤及び溶剤(バインダー含む)からなるフラックスを用いたはんだペーストがより好ましい。
The lead-free solder material that produces a Cu 6 Sn 5 intermetallic compound at the joint portion used in the solder joining method of the present invention is not particularly limited as long as it has the effect of the present invention.
For example, an alloy composed of Cu and Ni and a solder alloy composed of Sn—Cu—Ni can be exemplified, and alloys and solder powders having different compositions may be used in the future.
The particle size is also not particularly limited as long as it has the effect of the present invention, and is preferably 1 to 35 μm.
Further, in the lead-free solder material that produces a Cu 6 Sn 5 intermetallic compound at the joint, a flux composed of a resin component such as rosin, a thixo agent, an activator, a solvent, etc. is added to the alloy powder or the solder alloy powder. A lead-free solder material processed into a solder paste is preferable, and a solder paste using a flux composed of an activator and a solvent (including a binder) that does not leave a residue after soldering is more preferable.

次に、本発明の実施の形態について説明する。
本発明のはんだ接合方法の第1ステップとして以下の手順で基板にSnをコートした。
(a)試料
・基板:無酸素銅板(20×20×0.5mm)
・コート材料:99.9%Sn
・フラックス:NS‐334(日本スペリア社製)
・マスキング材料:カプトンテープ(50μm)
(b)装置
・ホットプレート
(c)手順
(1)メッキ部分として中央部に5×5mmの空間ができるようにカプトンテープで
銅板周囲を覆う。
(2)周囲をカプトンテープで覆った銅板にフラックスを少量添加し、250℃に加
熱したホットプレート上に置く。
(3)フラックスが蒸発したら直ぐに99.9%Sn0.019gをマスキングして
いない銅板上に置き、Snが溶融し、銅板がSnメッキされたことを確認する。
(Sn0.019gはメッキエリア5×5mmに均一にメッキした場合に厚みが100μmとなるように設定した重量である。)
(4)メッキが確認できたら、銅板をホットプレートからとり、冷却後、カプトンテ
ープを剥がし、第1ステップであるSnコートをした試料とする。
約100μm厚みのSnメッキが銅板上にコートされたことを確認した。
Next, an embodiment of the present invention will be described.
As the first step of the solder joining method of the present invention, Sn was coated on the substrate by the following procedure.
(A) Sample / substrate: Oxygen-free copper plate (20 x 20 x 0.5 mm)
-Coating material: 99.9% Sn
-Flux: NS-334 (manufactured by Nippon Superior Co., Ltd.)
-Masking material: Kapton tape (50 μm)
(B) Equipment-Hot plate (c) Procedure (1) Cover the circumference of the copper plate with Kapton tape so that a space of 5 x 5 mm is created in the center as the plated part.
(2) Add a small amount of flux to a copper plate whose circumference is covered with Kapton tape, and place it on a hot plate heated to 250 ° C.
(3) Immediately after the flux evaporates, 99.9% Sn 0.019 g is placed on an unmasked copper plate, and it is confirmed that Sn is melted and the copper plate is Sn-plated.
(Sn 0.019 g is a weight set so that the thickness becomes 100 μm when the plating area is uniformly plated in 5 × 5 mm.)
(4) When the plating is confirmed, the copper plate is removed from the hot plate, cooled, and the capton tape is peeled off to prepare a Sn-coated sample, which is the first step.
It was confirmed that Sn plating having a thickness of about 100 μm was coated on the copper plate.

本発明のはんだ接合方法の第2ステップとして、接合部にCuSn金属間化合物を生成する鉛フリーはんだ材料は表1組成のはんだペーストを用いて、はんだ接合を行った。 As the second step of the solder bonding method of the present invention, the lead-free solder material that produces a Cu 6 Sn 5 intermetallic compound at the joint was solder-bonded using the solder paste having the composition shown in Table 1.

Figure 2020157326
Figure 2020157326

表1に示すはんだペーストは下記の手順で作製した。
(1)1及び2の粉末を配合量の比率で均一に混合する。
(2)予め3〜5を混合し均一に溶解した状態で(1)と混合し、均一に混合し、
はんだペーストとする。
The solder paste shown in Table 1 was prepared by the following procedure.
(1) The powders 1 and 2 are uniformly mixed in a blending amount ratio.
(2) Mix 3 to 5 in advance and mix with (1) in a uniformly dissolved state, and mix uniformly.
Use as a solder paste.

本発明のはんだ接合方法の第2ステップは以下の手順で行った。
(1)実施例1として、ステップ1で作製したSnメッキした銅板のSnメッキ上に表
1のはんだペーストを少量塗布する。
比較例1として、Snメッキをしない銅板上に表1のはんだペーストを少量塗布
する。
(2)250℃に加熱したホットプレート上に(1)を置き、銅板が約230℃になる
ことを確認し3分間加熱し、はんだ接合する。
(3)(2)をホットプレート上から取り出し、室温にて冷却し、実施例1及び比較例
1の接合試料とする。
The second step of the solder joining method of the present invention was carried out by the following procedure.
(1) As Example 1, a small amount of the solder paste shown in Table 1 is applied onto the Sn plating of the Sn-plated copper plate produced in step 1.
As Comparative Example 1, a small amount of the solder paste shown in Table 1 is applied onto a copper plate that is not Sn-plated.
(2) Place (1) on a hot plate heated to 250 ° C, check that the copper plate reaches about 230 ° C, heat for 3 minutes, and solder.
(3) (2) is taken out from the hot plate and cooled at room temperature to prepare a bonded sample of Example 1 and Comparative Example 1.

図1に比較例1のはんだペースト接合後の外観写真を示す。
図1では、銅板1上にはんだ2が接合されているように見えるが、実際には接合されておらず、基板を立てるとはんだが銅板から剥がれ落ちた。
次に、比較例1について、はんだが銅板から外れていない状態のものを用意し、その断面を観察した結果を図2に示す。
銅板11上に金属間化合物3と思える付着物が接合されているが、その上は空隙4が発生しており接合できていないことが判明した。
また、空隙の上にははんだ層21が存在するが、はんだ粉末や金属粉末と思える粒子状のものがみられ、接合層全体に金属間化合物見られない。
FIG. 1 shows an external photograph of Comparative Example 1 after solder paste bonding.
In FIG. 1, it seems that the solder 2 is bonded on the copper plate 1, but it is not actually bonded, and when the substrate is erected, the solder is peeled off from the copper plate.
Next, for Comparative Example 1, a solder in a state where the solder is not detached from the copper plate was prepared, and the result of observing the cross section thereof is shown in FIG.
An intermetallic compound 3 was bonded to the copper plate 11, but it was found that voids 4 were formed on the copper plate 11 and could not be bonded.
Further, although the solder layer 21 is present above the voids, particulate matter that seems to be solder powder or metal powder is observed, and no intermetallic compound is found in the entire joint layer.

対して、本発明のはんだ接合方法を用いた実施例1の接合断面を示す図3では、銅板11の上に金属間化合物3が接合界面に隙間なく均一に生成し、接合部のはんだ層21には金属間化合物が均一にしかも接合層全体に多く見られる。
また、図3の3に示す金属間化合物及びはんだ層21に広く分布する金属間化合物を調べたところ、CuSn金属間化合物であることが判明した。
On the other hand, in FIG. 3, which shows the joining cross section of Example 1 using the solder joining method of the present invention, the intermetallic compound 3 is uniformly formed on the copper plate 11 without any gap at the joining interface, and the solder layer 21 at the joining portion is formed. Intermetallic compounds are uniformly found in the entire bonding layer.
Further, when the intermetallic compound shown in FIG. 3-3 and the intermetallic compound widely distributed in the solder layer 21 were examined, it was found to be a Cu 6 Sn 5 intermetallic compound.

このことより、本発明のはんだ接合方法によりCuSn金属間化合物を生成する鉛フリーはんだ材料を用いたはんだ接合は高融点のCuSn金属間化合物がボイドの発生もなく接合界面に生成するばかりでなく、接合層に均一且つ一面に生成することから、高い耐熱性と、高い接合信頼性を有するはんだ接合が可能であることが判明した。 From this, in the solder bonding using the lead-free solder material that produces the Cu 6 Sn 5 intermetallic compound by the solder bonding method of the present invention, the high melting point Cu 6 Sn 5 intermetallic compound is formed at the bonding interface without the generation of voids. It was found that solder bonding with high heat resistance and high bonding reliability is possible because it is not only produced but also formed uniformly and on one surface in the bonding layer.

本発明のはんだ接合方法は、上述の通り、銀粒子と比較して極めて安価な鉛フリーはんだ材料や金属粒子を用いることができ、しかも、簡易な方法で高温特性の優れたはんだ接合並びにはんだ接合部を供給することが可能なため、耐高温特性が必要な車載用パワーデバイス等への応用が期待できる。 As described above, the solder bonding method of the present invention can use lead-free solder materials and metal particles, which are extremely inexpensive compared to silver particles, and is a simple method for solder bonding and solder bonding having excellent high temperature characteristics. Since it is possible to supply parts, it can be expected to be applied to in-vehicle power devices that require high temperature resistance.

1 銅板
11 銅板
2 はんだ
21 はんだ層
3 金属間化合物
4 空隙


1 Copper plate 11 Copper plate 2 Solder 21 Solder layer 3 Intermetallic compound 4 Void


Claims (2)

液相拡散接合を用いたはんだ接合を行う方法に於いて、第1ステップとして基板にSn又はSnを主成分とする鉛フリーはんだ合金でコートする方法を用い、第2ステップとして、第1ステップでコートを施した基板にCuSn金属間化合物が生成する鉛フリーはんだ材料を塗布するステップを行う方法を用いることを特徴とするはんだ接合方法。 In the method of performing solder bonding using liquid phase diffusion bonding, a method of coating a substrate with Sn or a lead-free solder alloy containing Sn as a main component is used as the first step, and as the second step, in the first step. A solder bonding method comprising a method of applying a lead-free solder material produced by a Cu 6 Sn 5 intermetallic compound to a coated substrate. 請求項1の方法によりはんだ付けしたことを特徴とするはんだ接合部。



A solder joint portion characterized by being soldered by the method of claim 1.



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