JP2020146828A - Electrode for noncontact machining, electrode manufacturing method, and noncontact machining device - Google Patents

Abstract

To provide an electrode capable of improving stability of noncontact machining (electric discharge machining and electrochemical machining or the like).SOLUTION: An electrode 1E for noncontact machining includes a honeycomb-shaped partition wall part 11 forming a honeycomb-shaped slit groove 21 in a workpiece 2. The partition wall part 11 includes: a machining part 12 having a machining surface 120 disposed on a workpiece 2 side; and a support part 13 for supporting the machining part 12 from an opposite side of the machining surface 120. The support part 13 includes a narrow portion 130 which is smaller than a width W11 of the machining part 12, on a longitudinal plane (refer to Fig. 12(b)) regulated by a width direction and a thickness direction of the partition wall part 11.SELECTED DRAWING: Figure 12

Description

The present invention relates to an electrode for non-contact processing, a method for manufacturing the electrode, and a non-contact processing apparatus.

Conventionally, as a non-contact processing method for forming a honeycomb-shaped slit groove in a work piece of a metal material, for example, electrolytic processing or electric discharge machining is known.

In electrolytic processing, a metal material is formed by an electrochemical reaction by applying a voltage between the workpiece and an electrode having a predetermined shape corresponding to the slit groove while the electrolytic solution is flowing. This is a non-contact machining method in which a slit groove is formed by elution. In electric discharge machining, a part of the surface of the workpiece is removed by repeating arc discharge between the workpiece and an electrode having a predetermined shape corresponding to the slit groove, and a non-contact that forms a slit groove is formed. It is a processing method.

Patent Document 1 discloses an electrode for electrolytic processing, which is a tubular electrode surrounded by an insulating sleeve and whose cross-sectional area of the electrode decreases toward the tip end side. Patent Document 2 discloses an electrode having a shape corresponding to a honeycomb-shaped slit groove, in which a dielectric film is disposed on a surface other than the processed surface of the electrode for electrolytic processing. Patent Document 3 discloses an electrode for die-sinking electric discharge machining having a shape corresponding to a honeycomb-shaped slit groove.

Special Table 2002-531279 Publication No. Special Table 2017-536993 JP-A-2002-239844

In the electrode disclosed in Patent Document 1, since the shape of the electrode is tubular so as to narrow toward the tip side, as the processing of the slit groove progresses, the peripheral side surface of the electrode and the side surface of the slit groove The clearance between them becomes narrower. Therefore, the flow of the electrolytic solution is hindered, and sludge (working waste) and gas generated by the electrochemical reaction are not properly discharged, so that the working state (for example, shape and accuracy) of the slit groove becomes unstable.

Further, in the electrodes disclosed in Patent Document 2 and Patent Document 3, since the honeycomb-shaped partition wall extends linearly toward the tip side, the side surface of the partition wall is compared with the electrode disclosed in Patent Document 1. And the clearance between the work piece and the work piece is expanding. However, since there is no means to further increase the clearance, there is a limit to improving the processed state of the slit groove.

An object of the present invention is to provide an electrode for non-contact processing, a method for manufacturing the electrode, and a non-contact processing apparatus capable of improving the stability of non-contact processing.

The electrode according to the embodiment of the present invention is
An electrode for non-contact processing provided with the honeycomb-shaped partition wall portion that forms a honeycomb-shaped slit groove in the work piece.
The partition wall
A machined portion having a machined surface arranged on the work piece side,
A support portion that supports the processed portion from the side opposite to the processed surface is provided.
The support portion
It is characterized in that it includes a narrow portion smaller than the width of the processed portion in a vertical cross section defined by the width direction and the thickness direction of the partition wall portion.

The method for manufacturing an electrode according to an embodiment of the present invention is
This is the method for manufacturing the electrodes.
A first forming step of forming a first shape pattern corresponding to the cross-sectional shape of the processed portion in a cross section orthogonal to the thickness direction on at least one first thin film.
A second forming step of forming a second shape pattern corresponding to the cross-sectional shape of the support portion in the cross section on at least one second thin film.
A joining step of laminating the second thin film formed in the second forming step on the first thin film formed in the first forming step and joining as a laminated body is included.
It is characterized by that.

The electrolytic processing apparatus according to the embodiment of the present invention is
With the above electrodes
A moving portion that relatively moves at least one of the electrode and the work piece in the thickness direction so as to maintain a gap between the electrode and the work piece.
A power supply unit that applies a predetermined voltage between the workpiece and the electrode,
It is characterized by including the moving unit and a control unit that controls the power supply unit.

According to the electrode and non-contact processing apparatus according to the embodiment of the present invention, the support portion includes a narrow portion smaller than the width of the processed portion in the vertical cross section defined by the width direction and the thickness direction of the partition wall portion. Therefore, in the narrow portion, the clearance between the support portion and the side surface of the slit groove can be increased. Therefore, the flow of the electrolytic solution for electrolytic processing and the processing liquid for electric discharge machining in the gap between the workpiece and the electrode is promoted, so that sludge, gas, air bubbles and the like can be appropriately discharged. Further, since the weight of the electrode is reduced by the amount that the narrow portion is smaller than the width of the processed portion, it is possible to suppress the deflection (particularly the central portion) of the electrode in the thickness direction. Therefore, the stability of non-contact processing can be improved.

Further, according to the electrode manufacturing method according to the embodiment of the present invention, the second shape pattern is formed on the first thin film on which the first shape pattern is formed in the joining step. Since the thin films are laminated and joined as a laminated body, the electrodes can be manufactured easily and with high accuracy.

It is the schematic which shows the electrolytic processing apparatus 100 which concerns on 1st Embodiment of this invention. The electrode 1A according to the first embodiment of the present invention is shown, (a) is a plan view showing the whole of the electrode 1A, (b) is a front view showing the whole of the electrode 1A, and (c) is a part A of the electrode 1A. It is an enlarged plan view which shows. It is a B1-B1 line sectional view of the electrode 1A which concerns on 1st Embodiment of this invention. It is a flowchart which shows the manufacturing method of the electrode 1A which concerns on 1st Embodiment of this invention. It is a flowchart which shows the electrolytic processing (electrochemical processing method) by the electrolytic processing apparatus 100 which concerns on 1st Embodiment of this invention. The details of the first electrolytic processing control by the electrolytic processing apparatus 100 according to the first embodiment of the present invention are shown, (a) is a graph showing taper processing, and (b) is a graph showing a combination of straight processing and taper processing. The details of the second electrolytic processing control by the electrolytic processing apparatus 100 according to the first embodiment of the present invention are shown, (a) is a graph showing taper processing, and (b) is a graph showing a combination of straight processing and taper processing. It is a B1-B1 line sectional view of the electrode 1B which concerns on 2nd Embodiment of this invention. The electrodes 1C and 1D according to the second embodiment of the present invention are shown, (a) is a first modified example, and (b) is a B1-B1 line sectional view showing a second modified example. It is a flowchart which shows the manufacturing method of the electrode 1B which concerns on 2nd Embodiment of this invention. It is a schematic diagram which shows the electric discharge machining apparatus 101 which concerns on 3rd Embodiment of this invention. The electrode 1E according to the third embodiment of the present invention is shown, (a) is an enlarged plan view of the electrode 1E, and (b) is a sectional view taken along line B2-B2. It is a flowchart which shows each process in the manufacturing method of the electrode 1E which concerns on 3rd Embodiment of this invention. The electrode 1F according to the 4th embodiment of the present invention is shown, (a) is an enlarged plan view of the electrode 1F, and (b) is a sectional view taken along line B3-B3. It is a cross-sectional view taken along line B3-B3 which shows electrodes 1G and 1H which concerns on 4th Embodiment of this invention, (a) is a 1st modification, and (b) is a 2nd modification. It is a flowchart which shows the manufacturing method of the electrode 1F which concerns on 4th Embodiment of this invention. The electrode 1I according to the fifth embodiment of the present invention is shown, (a) is an enlarged plan view of the electrode 1I, and (b) is a sectional view taken along line B4-B4. It is a flowchart which shows the manufacturing method of the electrode 1I which concerns on 5th Embodiment of this invention.

(1) First Embodiment The following describes the electrolytic processing apparatus 100, the electrode 1A for electrolytic processing, the method for manufacturing the electrode 1A, and the electrolytic processing method according to the first embodiment.

(Configuration of electrolytic processing equipment)
FIG. 1 is a schematic view showing an electrolytic processing apparatus 100 according to a first embodiment of the present invention.

The electrolytic processing device 100 is an example of a non-contact processing device that forms a honeycomb-shaped slit groove in the workpiece 2 by electrolytic processing. The electrolytic processing apparatus 100 is mounted on an electrode 1A for electrolytic processing having a processing surface 120 arranged on the work piece 2 side, a mounting portion 3 on which the work piece 2 is placed, and a mounting portion 3. An electrolytic solution supply unit that supplies the electrolytic solution L1 to the gap S between the workpiece 2 placed on the mounting portion 3 and the electrode 1A and the moving portion 4 that moves the electrode 1A relative to the workpiece 2. A power supply unit 6 for applying a predetermined voltage between the work 5 and the workpiece 2 mounted on the mounting unit 3 and the electrode 1A to pass a current, a moving unit 4, an electrolytic solution supply unit 5, and electric power. It includes a control unit 7 that controls the supply unit 6.

The workpiece 2 is made of any metal material or alloy material. The work piece 2 has a honeycomb-shaped slit groove formed on the work surface 20 arranged on the electrode 1A side. Further, the workpiece 2 is formed on a surface opposite to the surface 20 to be processed so that a plurality of supply holes communicate with the slit groove, whereby, for example, a honeycomb structure such as an exhaust gas purifier can be formed. It is used as a mold for extrusion molding during manufacturing.

The mounting portion 3 includes a table 30 that fixes and holds the workpiece 2 in an insulated state, and a processing tank 31 that is arranged so as to surround the table 30 and can store the electrolytic solution L1. The table 30 is made of a highly insulating material such as ceramics and is configured to be movable in the horizontal direction (X direction and Y direction). The workpiece 2 may be placed on the table 30 by a gripping means such as a robot arm, or may be placed on the table 30 by the user.

The moving portion 4 is arranged above the table 30 and brings the electrode holder 40, which holds the electrode 1A in an insulated state, and the electrode 1A, which is fixedly held by the electrode holder 40, close to or separate from the table 30. As described above, the drive mechanism unit 41 for moving the electrode holder 40 in the vertical direction (Z direction) and the vibration exciting unit 42 for vibrating the electrode holder 40 in the vertical direction (Z direction) are provided.

The electrode holder 40 is configured to supply the electrolytic solution L1 to the gap S between the workpiece 2 and the electrode 1A by flowing out the electrolytic solution L1 supplied by the electrolytic solution supply unit 5 from the tip end side of the electrode 1A. Has been done. The drive mechanism unit 41 has a drive source (for example, a motor, an electromagnetic solenoid, etc.) and a transmission mechanism (for example, a ball screw, a rack and a pininon, a cam, etc.) that transmits the drive force generated by the drive source to the electrode holder 40. The electrode holder 40 is configured to be movable in the vertical direction (Z direction). The vibrating unit 42 is a device that generates vibration having a vibration frequency of about 10 to 100 Hz and an amplitude of about 5 to 100 μm, and is composed of, for example, a piezoelectric element. The vibrating unit 42 may be provided in the mounting unit 3 instead of the moving unit 4.

The electrolytic solution supply unit 5 includes a tank 50 for storing the electrolytic solution L1, a feed pipe 51 for sending the electrolytic solution L1 from the tank 50 to the electrode holder 40, and returning the electrolytic solution L1 from the processing tank 31 to the tank 50. It includes a return pipe 52, a pump 53 arranged in the feed pipe 51, a filter 54, and a flow rate adjusting valve 55.

The electrolytic solution L1 is, for example, an aqueous solution of sodium nitrate or sodium chloride, and is adjusted to, for example, a concentration of 5 to 20% by weight. The electrolytic solution L1 stored in the tank 50 is sent to the electrode holder 40 via the feed pipe 51, supplied to the gap S between the workpiece 2 and the electrode 1A via the electrode holder 40, and stored in the processing tank 31. Will be done. Then, the electrolytic solution L1 stored in the processing tank 31 is returned to the processing tank 31 via the return pipe 52, and circulates between the tank 50 and the processing tank 31.

The power supply unit 6 has a power supply unit 60 that generates a predetermined voltage and current, a first power line 61 that connects the anode side of the power supply unit 60 to the workpiece 2, and an electrode 1A on the cathode side of the power supply unit 60. It includes a second power line 62 to be connected.

The power supply unit 60 is a device that generates a pulse voltage, and is configured so that the voltage value (amplitude), width, period, and current value of the pulse voltage can be set. The power supply unit 60 may generate not only a unipolar pulse voltage but also a reverse polarity pulse voltage.

The control unit 7 performs an electrolytic processing process for forming a honeycomb-shaped slit groove in the workpiece 2 by controlling each of the moving unit 4, the electrolytic solution supply unit 5, and the power supply unit 6 individually or in parallel. The control unit 7 is composed of, for example, a processor such as a CPU, a storage unit for storing a control program and control parameters for performing electrolytic processing, and the like.

The control unit 7 sends a control command to the moving unit 4 (specifically, the drive source of the drive mechanism unit 41) so that the gap S between the workpiece 2 and the electrode 1A is a predetermined electrode distance G. With respect to the workpiece 2, depending on the depth D of the slit groove formed in the workpiece 2, so that the electrolytic processing treatment is performed while maintaining (for example, about 0.005 to 0.2 mm). The electrode moving speed Es (for example, about 0.01 to 1.0 mm / min), which is the relative speed when the electrode 1A is relatively moved, is controlled. Further, the control unit 7 sends a control command to the moving unit 4 (specifically, the vibration unit 42) so that the electrolytic processing process is performed while the electrode 1A vibrates. The vibration start timing and vibration stop timing of 42 are controlled.

The control unit 7 sends a control command to the electrolytic solution supply unit 5 (specifically, the pump 53 and the flow rate adjusting valve 55) to apply the electrolytic solution L1 to the gap S between the workpiece 2 and the electrode 1A. The flow rate and flow velocity of the electrolytic solution L1 at the time of supply (for example, about 5 to 50 m / sec) and the supply start timing and supply stop timing of the electrolytic solution L1 are controlled.

By sending a control command to the power supply unit 6 (specifically, the power supply unit 60), the control unit 7 sets the current density of the workpiece 2 on the workpiece 20 to a predetermined current density J (for example, the power supply unit 60). By changing the pulse voltage (for example, about 5 to 20 V) applied between the workpiece 2 and the electrode 1A so as to be (about 10 to 200 A / cm ² ), the workpiece 2 and the electrode 1A The interpole current value I of the current flowing between the two is controlled.

When the control unit 7 controls each unit of the moving unit 4, the electrolytic solution supply unit 5, and the power supply unit 6, for example, the position sensor of the moving unit 4, the flow rate sensor of the electrolytic solution supply unit 5, and the current of the power supply unit 6 The control command is configured to be sent to each unit based on the detected values of various sensors (not shown) such as a voltage sensor. Further, the control unit 7 is connected to an input unit (not shown) such as a switch or a keyboard or an output unit (not shown) such as a display, and user operation information for the electrolytic processing apparatus 100 is input via the input unit. At the same time, the operating state of the electrolytic processing apparatus 100 and the like are output to the user via the output unit.

(Electrode configuration)
2A and 2B show an electrode 1A according to the first embodiment of the present invention, FIG. 2A is a plan view showing the entire electrode 1A, FIG. 2B is a front view showing the entire electrode 1A, and FIG. 2C is an electrode. It is an enlarged plan view which enlarged the part A of 1A.

The outer shape of the electrode 1A is formed, for example, in the shape of a circular flat plate having a diameter of about 350 mm and a thickness of about 0.9 mm. The electrode 1A includes a peripheral wall portion 10 located on the outer periphery of a circle and a honeycomb-shaped partition wall portion 11 located inside the peripheral wall portion 10. The outer shape of the electrode 1A is not limited to a circular shape and may be changed as appropriate. Further, the outer dimensions of the electrode 1A may be changed as appropriate.

The peripheral wall portion 10 includes a plurality of mounting holes 10a arranged at predetermined intervals in the circumferential direction. The plurality of mounting holes 10a are used, for example, when the electrode 1A is fixed to the electrode holder 40 by a fixing means such as a bolt.

In the partition wall portion 11, a plurality of hexagonal cells are arranged without gaps so as to be adjacent to each other, and the length of one side of the hexagon is, for example, 0.75 mm. The honeycomb-shaped partition wall 11 is not limited to a hexagon as the shape of each cell, but may be a triangle, a quadrangle, a circle, or a combination of a plurality of polygons. At that time, the honeycomb-shaped partition wall portion 11 may be formed by geometrically arranging a plurality of types of polygons having different sizes and shapes. For example, a honeycomb structure having a HAC (High Ash Capacity) structure is manufactured. It may be possible.

The partition wall portion 11 is provided with a plurality of through holes 11a penetrating in the thickness direction of the electrode 1A in the central portion of each cell. The plurality of through holes 11a are outlets for the electrolytic solution L1 when the electrode 1A is fixedly held by the electrode holder 40 and the electrolytic solution L1 is supplied to the electrode 1A via the electrode holder 40 by the electrolytic solution supply unit 5. Functions as.

FIG. 3 is a sectional view taken along line B1-B1 of the electrode 1A according to the first embodiment of the present invention. Note that FIG. 3 shows a vertical cross section defined by the width direction and the thickness direction of the partition wall portion 11, and shows the electrode 1A when the slit groove 21 is formed in the workpiece 2 by electrolytic processing, and the workpiece. The positional relationship with 2 is shown.

When the electrode 1A is fixedly held by the electrode holder 40, the partition wall portion 11 supports the processed portion 12 having the processed surface 120 arranged on the workpiece 2 side and the processed portion 12 from the side opposite to the processed surface 120. A support portion 13 is provided.

The processed portion 12 uses the first metal as a material, and for example, a metal such as iron, copper, or titanium, an iron-based alloy such as stainless steel, a copper-based alloy such as brass, or an alloy such as a titanium alloy is used.

The support portion 13 is made of a second metal, and for example, a metal such as iron, copper, or titanium, an iron-based alloy such as stainless steel, a copper-based alloy such as brass, or an alloy such as a titanium alloy is used. The second metal used as the material of the support portion 13 is different from the first metal used as the material of the processed portion 12. Therefore, when stainless steel is used as the material of the processed portion 12, for example, iron is used as the material of the support portion 13.

The support portion 13 includes a narrow portion 130 smaller than the width W11 of the processed portion 12 in the vertical cross section shown in FIG. In the present embodiment, since the support portion 13 has the same width W21 in all the portions in the thickness direction, the narrow portion 130 corresponds to all the portions in the thickness direction.

The width W21 (for example, 0.12 mm) of the narrow portion 130 is set to be smaller than the width W11 (for example, 0.18 mm) of the processed portion 12. The thickness T21 (for example, 0.6 mm) of the support portion 13 is set to be larger than the thickness T11 (for example, 0.3 mm) of the processed portion 12.

An insulating film 14 is formed on the outer surface of the support portion 13. Specifically, in the support portion 13, the first insulating film 140 is formed on both side surfaces 131 in the width direction, and the support portion 13 is second with respect to the surface 132 on the side opposite to the processed portion 12 in the thickness direction. Insulation film 141 is formed.

The insulating film 14 is formed of an insulating material having higher adhesion to the second metal than the first metal and higher chemical resistance to the electrolytic solution L1. As the material of the insulating film 14, for example, any insulating material such as epoxy resin, urethane resin, acrylic resin, polyimide resin, polyester resin, polyamide resin, polyvinylidene chloride resin, and phenol resin is used. For example, when stainless steel is used as the first metal which is the material of the processed portion 12 and iron is used as the second metal which is the material of the support portion 13, the insulating film 14 is the first metal. As a material having higher adhesion to the second metal than that, self-precipitation coating is performed using a material that chemically reacts only with iron and forms a film only on the surface of iron, thereby performing self-precipitation coating on both side surfaces of the support portion 13. It is formed on 131 and the surface 132.

When the electrode 1A is fixedly held by the electrode holder 40, the electrode 1A is arranged so that the thickness direction of the electrode 1A coincides with the direction in which the drive mechanism portion 41 moves the electrode 1A (that is, the vertical direction). The machined surface 120 of 1A is fixedly held so as to face the table 30 side (that is, downward). Therefore, the drive mechanism unit 41 lowers the electrode holder 40 to bring the processed surface 120 of the electrode 1A closer to the table 30, and raises the electrode holder 40 to process the electrode 1A with respect to the table 30. The surfaces 120 are separated.

According to the electrode 1A having the above configuration, since the support portion 13 includes a narrow portion 130 smaller than the width of the processed portion 12 in the vertical cross section defined by the width direction and the thickness direction of the partition wall portion 11, the narrow portion At 130, the clearance C12 between the support portion 13 and the side surface 22 of the slit groove 21 can be expanded.

Therefore, the flow of the electrolytic solution L1 in the gap S between the workpiece 2 and the electrode 1A is promoted, so that sludge and gas can be appropriately discharged. Further, when the support portion 13 comes into contact with the side surface 22 of the slit groove 21 and the insulating film 14 is peeled off, the possibility that a current flows through the side surface 22 of the slit groove 21 and the metal material is eluted from the side surface 22 is reduced. Therefore, damage to the electrode 1A and abnormal shape of the slit groove 21 can be suppressed. Further, since the weight of the electrode 1A is reduced by the amount that the narrow portion 130 is smaller than the width of the processed portion 12, the bending of the electrode 1A in the thickness direction (particularly the central portion) can be suppressed. Therefore, the stability of electrolytic processing can be improved.

Further, according to the electrode 1A, since the insulating film 14 is formed on both side surfaces 131 and the surface 132 of the support portion 13, energization of both side surfaces 131 and the surface 132 is prevented, and the shape abnormality of the slit groove 21 is caused. Since it can be suppressed, the stability of electrolytic processing can be improved.

Further, according to the electrode 1A, the processed portion 12 is made of a first metal, the support portion 13 is made of a second metal different from the first metal, and the insulating film 14 is made of a first metal. Since it is formed of an insulating material having a higher adhesion to the second metal than the second metal, the structure composed of the processed portion 12 and the supporting portion 13 is coated with the insulating material. The insulating film 14 can be easily formed only on the surface of the support portion 13.

(Method of manufacturing electrodes)
FIG. 4 is a flowchart showing each step in the method for manufacturing the electrode 1A according to the first embodiment of the present invention.

First, in the first forming step (step S100), a first thin film 15 made of a first metal corresponds to a cross-sectional shape of a processed portion 12 in a cross section orthogonal to the thickness direction. The shape pattern P10 is formed. Here, as the first thin film 15, a thin film having a thickness of 0.3 mm, which is made of stainless steel (SUS304) and is equal to the thickness T11 (= 0.3 mm) of the processed portion 12, is used. Then, the first shape pattern P10 is formed on the first thin film 15 by etching processing. The first thin film 15 may have a plurality of thin films, and in the case of a plurality of thin films 15, the thickness may be the same or different.

Next, in the second forming step (step S110), the support portion 13 (narrow portion) in the cross section orthogonal to the thickness direction is formed on the three second thin films 16A to 16C made of the second metal. A second shape pattern P20 corresponding to the cross-sectional shape of 130) is formed. Here, as the three second thin films 16A to 16C, three thin films having a thickness of 0.2 mm, which is made of iron and is equal to 1/3 of the thickness T21 (= 0.6 mm) of the support portion 13, are used. .. Then, the second shape pattern P20 is formed on each of the three second thin films 16A to 16C by etching.
The second thin films 16A to 16C may have one thin film, two thin films, four or more thin films, and in the case of a plurality of thin films, they may have the same thickness or different thin films.

Next, in the joining step (step S120), the three second films formed in the second forming step (step S110) are formed on the first thin film 15 formed in the first forming step (step S100). The thin films 16A to 16C of the above are laminated in order and joined as a laminated body 17A. The thin films 15 and the three second thin films 16A to 16C are bonded to each other by, for example, diffusion bonding.

Next, in the insulating film forming step (step S130), of the laminated body 17A joined by the joining step (step S120), both side surfaces 131 in the width direction of the support portion 13 and the processed portion 12 in the thickness direction Formes an insulating film 14 on the surfaces 161 and 162 of the second thin films 16A to 16C corresponding to the surface 132 on the opposite side. Here, self-precipitation coating is used as a coating method for forming the insulating film 14, and as a material for the insulating film 14 having higher adhesion to iron than stainless steel (SUS304), only iron is chemically reacted to form iron. By using a material that forms a film only on the surface, an insulating film 14 is formed on the surfaces 161 and 162 of the laminate 17A. As described above, a series of steps is completed, and the electrode 1A for electrolytic processing is manufactured.

In the first forming step (step S100) and the second forming step (step S110), for example, water laser processing is used in addition to etching processing as a processing method for forming a pattern shape on the thin film. You may. Further, different processing methods may be used in the first forming step (step S100) and the second forming step (step S110), and in the first forming step (step S100), the processing state of the slit groove 21 Since the portion corresponding to the machined surface 120 that affects the processing surface 120 is formed, for example, water laser processing is used as a processing method with high processing accuracy, and the manufacturing cost is low in the second forming step (step S110). As a processing method having a fast processing time, for example, etching processing may be used. Further, in the bonding step (step S120), for example, surface activation bonding may be used in addition to diffusion bonding as the bonding method between the thin films.

According to the method for producing the electrode 1A having the above steps, in the joining step (step S120), the first thin film 15 on which the first shape pattern P10 is formed in the first forming step (step S100) is formed. The second thin films 16A to 16C on which the second shape pattern P20 was formed in the forming step 2 (step S110) are laminated and joined as a laminated body 17A, and the laminated body is formed in the insulating film forming step (step S130). Of 17A, insulation is provided for the surfaces 161 and 162 of the second thin films 16A to 16C corresponding to both side surfaces 131 in the width direction of the support portion 13 and the surface 132 on the side opposite to the processed portion 12 in the thickness direction. Since the film 14 is formed, the electrode 1A can be manufactured easily and with high accuracy.

Further, in the insulating film forming step (step S130), the adhesiveness to the second metal (materials of the second thin films 16A to 16C) is higher than that of the first metal (material of the first thin film 15). Since the insulating film 14 is formed of the insulating material, the insulating film 14 can be easily formed only on the surfaces 161 and 162 of the second thin films 16A to 16C.

Further, the thickness of the electrode 1A can be changed to a predetermined thickness by changing the thickness and the number of the first thin film 15 and the second thin films 16A to 16C, so that the electrode 1A has high current resistance. It can be easily secured and the lack of strength due to the increase in size of the electrode 1A can be easily realized.

(Electrochemical machining method)
FIG. 5 is a flowchart showing an electrolytic processing process (electrochemical processing method) by the electrolytic processing apparatus 100 according to the first embodiment of the present invention. Here, an electrolytic processing process in which the electrolytic processing apparatus 100 forms a honeycomb-shaped slit groove 21 in the workpiece 2 will be described.

First, in the mounting step (step S10), the workpiece 2 is placed on the table 30 of the mounting portion 3 and fixedly held. At this time, the electrode holder 40 that holds the electrode 1A fixedly is raised to a standby position away from the table 30 so as not to interfere with the work of placing the workpiece 2 on the table 30.

Next, in the setting step (step S20), the control unit 7 sets control parameters for controlling each unit of the moving unit 4, the electrolytic solution supply unit 5, and the power supply unit 6, and sends them as control commands to each unit. ..

Next, in the pretreatment step (step S30), the moving unit 4 that receives the control command from the control unit 7 operates the drive mechanism unit 41 with respect to the workpiece 2 placed on the table 30. The electrode holder 40 is lowered from the standby position to a predetermined pretreatment position so that the machined surface 120 of the electrode 1A approaches.

Then, the electrolytic solution supply unit 5 that receives the control command from the control unit 7 operates the pump 53 and the flow rate adjusting valve 55 to start supplying the electrolytic solution L1 to the electrode 1A fixedly held by the electrode holder 40. To do.

Next, in the moving step (step S40), the moving unit 4 operates the drive mechanism unit 41 to move the electrode holder 40 from the pretreatment position to the electrode where the gap S between the workpiece 2 and the electrode 1A is a predetermined distance. It is lowered to the machining start position where the distance is G. Further, the moving unit 4 operates the vibrating unit 42 to vibrate the electrode holder 40 in the vertical direction.

Further, in parallel with the moving step (step S40), the power supply unit 6 that receives the control command from the control unit 7 in the power supply process (step S50) operates the power supply unit 60 to operate the work piece 2. A pulse voltage is applied between the electrode 1A and the electrode 1A. At this time, since the electrolytic solution supply unit 5 has started supplying the electrolytic solution L1 in the pretreatment step (step S30), the electrolytic solution L1 is electrolyzed from the through hole 11a of the electrode 1A into the gap S between the workpiece 2 and the electrode 1A. The liquid L1 is in a supplied state.

Therefore, a current flows between the workpiece 2 and the electrode 1A via the electrolytic solution L1 according to the pulse voltage applied between the workpiece 2 and the electrode 1A, so that the machined surface of the electrode 1A The metal material is eluted from the work surface 20 of the work piece 2 in the portion facing 120, and the slit groove 21 is formed in the work piece 2.

Further, according to the depth D of the slit groove 21 formed in the workpiece 2, the moving portion 4 gradually lowers the electrode holder 40 so as to maintain a predetermined interpole distance G, and the power supply portion. The slit groove 21 is gradually and deeply formed by changing the pulse voltage so that 6 has a predetermined current density J. Then, when the moving portion 4 lowers the electrode holder 40 to a predetermined machining end position, a slit groove 21 having a predetermined depth Dt is finally formed.

Here, the moving step (step S40) and the power supply step (step S50) are performed in parallel, so that the electrode moving speed Es when moving the electrode 1A in the moving step (step S40) and the power supply It is controlled in synchronization with the electrode current value I when the pulse voltage is changed in the step (step S50). As a specific control thereof, the electrolytic processing apparatus 100 performs a first electrolytic processing control (details will be described later in FIG. 6) or a second electrolytic processing control (details will be described later in FIG. 7). ..

FIG. 6 shows the details of the first electrolytic processing control by the electrolytic processing apparatus 100 according to the first embodiment of the present invention, (a) shows taper processing, and (b) shows a combination of straight processing and taper processing. It is a graph. In FIG. 6, the horizontal axis represents the depth D of the slit grooves 21A and 21B during electrolytic machining, and the vertical axis represents the electrode moving speed Es and the interpole current value I during electrolytic machining.

In the first electrolytic machining control shown in FIG. 6A, the electrode moving speed Es is gradually reduced as the depth D of the slit groove 21A becomes deeper while the interpole current value I is constant. As a result, the workpiece 2 is formed with a tapered slit groove 21A such that the groove width of the slit groove 21A becomes wider as the depth D of the slit groove 21A becomes deeper, and the slit groove 21A communicates with the supply hole 23.

In the first electrolytic processing control shown in FIG. 6B, the electrode moving speed Es and the interpole current value I are kept constant until the depth D of the slit groove 21 reaches the switching depth D1, and the slit groove 21B After the depth D reaches the switching depth D1, the electrode moving speed Es is gradually reduced as the depth D of the slit groove 21B becomes deeper while the interpole current value I is kept constant. As a result, in the workpiece 2, the portion where the depth D is shallower than the switching depth D1 is straight, and the portion where the depth D is deeper than the switching depth D1 is the depth D of the slit groove 21B. A tapered slit groove 21B is formed so that the width of the slit groove 21B becomes wider as the depth becomes deeper, and the slit groove 21B communicates with the supply hole 23.

FIG. 7 shows the details of the second electrolytic machining control by the electrolytic machining apparatus 100 according to the first embodiment of the present invention, (a) shows taper machining, and (b) shows a combination of straight machining and taper machining. It is a graph. In FIG. 7, as in FIG. 6, the horizontal axis represents the depth D of the slit grooves 21A and 21B during electrolytic machining, and the vertical axis represents the electrode moving speed Es and the interpole current value I during electrolytic machining. ..

In the second electrolytic machining control shown in FIG. 7A, the electrode moving speed Es is kept constant, and the deeper the depth D of the slit groove 21A is, the more the interpole current value I is gradually increased. As a result, the workpiece 2 is formed with a tapered slit groove 21A as in FIG. 6A, and is communicated with the supply hole 23.

In the second electrolytic processing control shown in FIG. 7B, the electrode moving speed Es and the interpole current value I are kept constant until the depth D of the slit groove 21B reaches the switching depth D2, and the slit groove 21B After the depth D reaches the switching depth D2, the electrode moving speed Es is kept constant, and as the depth D of the slit groove 21B becomes deeper, the pole current value I is gradually increased. As a result, in the workpiece 2, the portion where the depth D is shallower than the switching depth D2 is straight and the portion where the depth D is deeper than the switching depth D2 is tapered, as in FIG. 6A. The shaped slit groove 21B is formed.

When the electrode moving speed Es is gradually reduced in the first electrolytic processing control, not only the electrode moving speed Es may be gradually reduced with a constant inclination as shown in FIG. 6, but the inclination may be changed stepwise. However, it may be changed in a curve. Further, when the interpole current value I is gradually increased in the second electrolytic machining control, as shown in FIG. 7, not only the inclination is increased with a constant inclination, but also the inclination is changed stepwise. It may be changed in a curve.

Returning to the description of FIG. 5, in the post-processing step (step S60) following the moving step (step S40) and the power supply step (step S50), the power supply unit 6 stops the application of the pulse voltage and stops the application of the pulse voltage. The electrolytic solution supply unit 5 stops the supply of the electrolytic solution L1. Further, the moving unit 4 stops the operation of the vibrating unit 42 and raises the electrode holder 40 to the standby position by the drive mechanism unit 41. As described above, the electrolytic processing process by a series of steps is completed, and the electrode 1A forms a honeycomb-shaped slit groove 21 in the workpiece 2 and communicates with the supply hole 23.

According to the electrolytic processing apparatus 100 having the above configuration and the electrolytic processing method having the above steps, the first electrolytic processing control or the second electrolytic processing control is performed, so that the depth of the slit groove in the workpiece 2 is It can be formed in the tapered slit grooves 21A and 21B so that the groove width of the slit grooves 21A and 21B becomes wider as D becomes deeper. Therefore, when the workpiece 2 is used, for example, as a mold for extrusion molding of a honeycomb structure, the molding material supplied from the supply hole 23 can easily pass through the tapered slit grooves 21A and 21B, and the slit groove Since the fluidity and crimping strength of the molding material flowing into the 21A and 21B are improved, the strength of the extruded honeycomb structure can be improved.

(2) Second Embodiment The following describes the electrolytic processing apparatus 100, the electrode 1B for electrolytic processing, the method for manufacturing the electrode 1B, and the electrolytic processing method according to the second embodiment. Since the electrolytic processing apparatus 100 and the electrolytic processing method are the same as those in the first embodiment, the description thereof will be omitted.

(Electrode configuration)
FIG. 8 is a sectional view taken along line B1-B1 of the electrode 1B according to the second embodiment of the present invention. Note that FIG. 8 shows a vertical cross section defined by the width direction and the thickness direction of the partition wall portion 11 as in FIG. 3, and is an electrode when a slit groove 21 is formed in the workpiece 2 by electrolytic processing. The positional relationship between 1B and the workpiece 2 is shown.

In the electrode 1A according to the first embodiment, as shown in FIG. 3, the width W21 of the support portion 13 is the same width in all the portions in the thickness direction, whereas the electrode 1A according to the second embodiment has the same width. In 1B, as shown in FIG. 8, the widths W23 and W24 of the support portion 13 become smaller as they are separated from the processed portion 12 along the thickness direction.

In the vertical cross section shown in FIG. 8, the support portion 13 includes a non-narrow portion 133 having the same width as the width W12 of the processed portion 12, and a narrow portion 130 smaller than the width W23 of the non-narrow portion 133. The narrow portion 130 is arranged at a position farther from the processed portion 12 than the non-narrow portion 133.

The width W24 (for example, 0.12 mm) of the narrow portion 130 is set smaller than the width W23 (for example, 0.18 mm) of the non-narrow portion 133. The width W23 (for example, 0.18 mm) of the non-narrow portion 133 is set to be equal to the width W12 (for example, 0.18 mm) of the processed portion 12.

The thickness T22 (for example, 0.75 mm) of the support portion 13 is set to be larger than the thickness T12 (for example, 0.15 mm) of the processed portion 12. The thickness T23 (for example, 0.15 mm) of the non-narrow portion 133 is set smaller than the thickness T24 (for example, 0.6 mm) of the narrow portion 130.

The support portion 13 has first insulating films 140A and 140B formed on both side surfaces 131A of the non-narrow portion 133 and both side surfaces 131B of the narrow portion 130 as both side surfaces 131 in the width direction. Further, the support portion 13 has a surface 132 on the opposite side of the processed portion 12 in the thickness direction, and is provided with second insulating films 141A and 141B with respect to the surface 132A of the non-narrow portion 133 and the surface 132B of the narrow portion 130. Are formed respectively.

(Modified example of electrode configuration)
9A and 9B show electrodes 1C and 1D according to a second embodiment of the present invention, FIG. 9A is a sectional view taken along line B1-B1 showing a first modified example and FIG. 9B is a second modified example. ..

Similar to the electrodes 1B shown in FIG. 8, the electrodes 1C and 1D according to the first and second modifications become smaller as the widths W25 and W26 of the support portion 13 are separated from the processed portion 12 along the thickness direction. It is a thing.

In the electrode 1C according to the first modification shown in FIG. 9A, the support portion 13 is smaller than the width W12 of the processed portion 12 than the width W25 of the first narrow portion 130A and the first narrow portion 130A. It also includes a small second narrow portion 130B. The second narrow portion 130B is arranged at a position farther from the processed portion 12 than the first narrow portion 130A.

The width W26 (for example, 0.12 mm) of the second narrow portion 130B is set smaller than the width W25 (for example, 0.15 mm) of the first narrow portion 130A. The width W25 (for example, 0.15 mm) of the first narrow portion 130A is set smaller than the width W12 (for example, 0.18 mm) of the processed portion 12.

The thickness T22 (for example, 0.75 mm) of the support portion 13 is set to be larger than the thickness T12 (for example, 0.15 mm) of the processed portion 12. The thickness T25 (for example, 0.15 mm) of the first narrow portion 130A is set smaller than the thickness T26 (for example, 0.6 mm) of the second narrow portion 130B.

In the support portion 13, the first insulating films 140A and 140B are formed on both side surfaces 131A of the first narrow portion 130A and both side surfaces 131B of the second narrow portion 130B as both side surfaces 131 in the width direction, respectively. Has been done. Further, the support portion 13 has a surface 132 on the side opposite to the processed portion 12 in the thickness direction, and is second to the surface 132A of the first narrow portion 130A and the surface 132B of the second narrow portion 130B. Insulating films 141A and 141B are formed, respectively.

In the electrode 1D according to the second modification shown in FIG. 9B, the support portion 13 is smaller than the width W12 of the processed portion 12 than the first narrow portion 130A and the width W25 of the first narrow portion 130A. It also includes a second narrow portion 130B, which is also small, and a third narrow portion 130C, which is smaller than the width W26 of the second narrow portion 130B. The first narrow portion 130A, the second narrow portion 130B, and the third narrow portion 130C are arranged at positions separated from the processing portion 12 in this order.

The width W25 of the first narrow portion 130A (for example, 0.15 mm), the width W26 of the second narrow portion 130B (for example, 0.12 mm), and the width W27 of the third narrow portion 130C (for example, 0. 09 mm) is set to decrease in this order. The width W25 (for example, 0.15 mm) of the first narrow portion 130A is set smaller than the width W12 (for example, 0.18 mm) of the processed portion 12.

The thickness T22 (for example, 0.75 mm) of the support portion 13 is set to be larger than the thickness T12 (for example, 0.15 mm) of the processed portion 12. The thickness T25 of the first narrow portion 130A (eg 0.15 mm) and the thickness T26 of the second narrow portion 130B (eg 0.15 mm) are the thickness T27 of the third narrow portion 130C (eg 0.15 mm). It is set smaller than 0.45 mm).

The support portion 13 serves as both side surfaces 131 in the width direction with respect to both side surfaces 131A of the first narrow portion 130A, both side surfaces 131B of the second narrow portion 130B, and both side surfaces 131C of the third narrow portion 130C. The first insulating films 140A to 140C are formed respectively. Further, the support portion 13 has a surface 132A of the first narrow portion 130A, a surface 132B of the second narrow portion 130B, and a third narrow portion as the surface 132 on the side opposite to the processed portion 12 in the thickness direction. Second insulating films 141A to 141C are formed on the surface 132C of 130C, respectively.

As shown in FIGS. 9A and 9B, in the electrodes 1C and 1D according to the first and second modified examples, the width of the support portion 13 is separated from the processed portion 12 along the thickness direction. The widthwise side surface of the support portion 13 is formed in a stepped shape, but it may be formed in a curved shape.

According to the electrodes 1B to 1D having the above configuration, the support portion 13 includes narrow portions 130 and 130A to 130C smaller than the width of the processed portion 12 in the vertical cross section, and the widths W23 to W27 of the support portion 13 are thick. Since the distance from the processed portion 12 along the longitudinal direction becomes smaller, the clearance C12 between the support portion 13 and the side surface 22 of the slit groove 21 can be further expanded while ensuring the strength of the electrodes 1B to 1D. ..

Therefore, the flow of the electrolytic solution L1 in the gap S between the workpiece 2 and the electrodes 1B to 1D is promoted, so that sludge and gas can be appropriately discharged. Further, when the support portion 13 comes into contact with the side surface 22 of the slit groove 21 and the insulating film 14 is peeled off, the possibility that a current flows through the side surface 22 of the slit groove 21 and the metal material is eluted from the side surface 22 is reduced. Therefore, damage to the electrodes 1B to 1D and abnormal shape of the slit groove 21 can be suppressed. Further, since the weight of the electrode 1A is reduced by the amount that the narrow portions 130 and 130A to 130C are smaller than the width of the processed portion 12, the deflection (particularly the central portion) of the electrodes 1B to 1D in the thickness direction is suppressed. Can be done. Therefore, the stability of electrolytic processing can be improved.

Further, according to the electrodes 1B to 1D, since the insulating film 14 is formed on both side surfaces 131A to 131C and the surfaces 132A to 132C of the support portion 13, the both side surfaces 131A to 131C and the surfaces 132A to 132C are energized. Since it can be prevented and the shape abnormality of the slit groove 21 can be suppressed, the stability of the electrolytic processing can be improved.

(Method of manufacturing electrodes)
FIG. 10 is a flowchart showing a method for manufacturing the electrode 1B according to the second embodiment of the present invention.

First, in the first forming step (step S200), a first shape pattern P11 corresponding to the cross-sectional shape of the processed portion 12 in the cross section is formed on the first thin film 15 made of the first metal. .. Here, as the first thin film 15, a thin film having a thickness of 0.15 mm, which is made of stainless steel (SUS304) and is equal to the thickness T12 (= 0.15 mm) of the processed portion 12, is used. Then, for example, the first shape pattern P11 is formed on the first thin film 15 by etching processing.

Next, in the second forming step (step S210), four second thin films 16A to 16D made of the second metal are cross-sectioned at each stage in which the width of the support portion 13 in the cross section is reduced. A plurality of second shape patterns P21A and P21B corresponding to the shape are formed, respectively. Here, the four second thin films 16A to 16D are made of iron and have a thickness of 0.15 mm, which is equal to the thickness T23 (= 0.15 mm) of the non-narrow portion 133, and a narrow portion. Three thin films having a thickness of 0.2 mm, which is equal to 1/3 of the thickness T24 (= 0.6 mm) of 130, are used. Then, for example, by etching, a second shape pattern P21A corresponding to the cross-sectional shape of the non-narrow portion 133 in the cross section is formed on one second thin film 16A, and the three second thin films 16B to A second shape pattern P21B corresponding to the cross-sectional shape of the narrow portion 130 in the cross section is formed on 16D.

Next, in the joining step (step S220), the four second films formed in the second forming step (step S210) are formed on the first thin film 15 formed in the first forming step (step S200). The thin films 16A to 16D of the above are laminated in order and bonded as a laminated body 17B. The thin films 15 and the four second thin films 16A to 16D are bonded to each other by, for example, diffusion bonding.

Next, in the insulating film forming step (step S230), the support portion 13 of the laminated body 17B joined by the joining step (step S220) by using the self-precipitation coating as in the first embodiment. The insulating film 14 is formed on the surfaces 161 and 162 of the second thin films 16A to 16D corresponding to the side surfaces 131 in the width direction and the surface 132 on the side opposite to the processed portion 12 in the thickness direction. As described above, a series of steps is completed, and the electrode 1B for electrolytic processing is manufactured. The electrodes 1C and 1D according to the first and second modified examples are also formed by changing the second shape pattern formed on the second thin films 16A to 16D in the second forming step (step S210). , Manufactured in the same way.

According to the method for manufacturing the electrode 1B having the above steps, in the joining step (step S220), the first thin film 15 on which the first shape pattern P11 is formed in the first forming step (step S200) is formed. In the forming step 2 (step S210), the second thin films 16A to 16D on which the second shape patterns P21A and P21B were formed are laminated in order, joined as a laminated body 17B, and in the insulating film forming step (step S230). On the surfaces 161 and 162 of the second thin films 16A to 16D corresponding to both side surfaces 131 in the width direction of the support portion 13 and the surface 132 on the side opposite to the processed portion 12 in the thickness direction of the laminated body 17B. On the other hand, since the insulating film 14 is formed, the electrode 1B can be manufactured easily and with high accuracy.

Further, in the insulating film forming step (step S230), the adhesiveness to the second metal (materials of the second thin films 16A to 16D) is higher than that of the first metal (material of the first thin film 15). Since the insulating film 14 is formed of the insulating material, the insulating film 14 can be easily formed only on the surfaces 161 and 162 of the second thin films 16A to 16D.

Further, the thickness of the electrode 1B can be changed to a predetermined thickness by changing the thickness and the number of the first thin films 15 and the second thin films 16A to 16D, so that the electrode 1B has high current resistance. It can be easily secured and the lack of strength due to the increase in size of the electrode 1B can be easily realized.

In the first and second embodiments, the coating method for forming the insulating film 14 in the insulating film forming steps (steps S130 and S230) has been described as self-precipitation coating, but the present invention is limited to this. Instead, electrodeposition coating may be used, or other coating methods may be used.

For example, in the insulating film forming step (steps S130 and S230), of the laminated bodies 17A and 17B, the portion corresponding to the processed surface 120 is covered with masking tape or the like and electrodeposition coating is performed to obtain the masking tape. The insulating film 14 is applied to the uncovered portion, that is, the portion of the processed portion 12 and the support portion 13 corresponding to both side surfaces 131 in the width direction and the surface 132 on the opposite side of the processed portion 12 in the thickness direction. It may be formed and then the masking tape may be peeled off. Further, in the insulating film forming step (steps S130 and S230), the entire surfaces of the laminated bodies 17A and 17B are electrodeposited, and then the insulating film formed on the portion corresponding to the machined surface 120 is polished or the like. It may be removed. The material of the insulating film 14 in this case does not necessarily have the property of having higher adhesion to the second metal than the first metal, and by performing electrodeposition coating, the first metal and the second metal can be used. Any insulating material can be used as long as the insulating film 14 can be formed on the surface of the metal.

Further, in the first and second embodiments, it has been described that the first metal used as the material of the processed portion 12 and the second metal used as the material of the support portion 13 are different metals. The first metal used as the material of the processed portion 12 and the second metal used as the material of the support portion 13 may be the same metal, and the materials of the processed portion 12 and the support portion 13 include, for example, iron. A specific one type of metal may be used from metals such as copper and titanium, iron-based alloys such as stainless steel, copper-based alloys such as brass, and alloys such as titanium alloy. In this case, in the insulating film forming step (steps S130 and S230), the laminated bodies 17A and 17B formed of one type of metal are electrodeposited in the same manner as described above to obtain an insulating film. 14 may be formed. Further, the material of the insulating film 14 in this case is any material as long as the insulating film 14 can be formed on the surface of one kind of metal to be the material of the laminates 17A and 17B by electrodeposition coating. Any insulating material can be used.

(3) Third Embodiment In the first and second embodiments, electrolytic discharge machining has been described as an example of the non-contact machining method using the electrodes 1A to 1D, but in the third embodiment, the electrode 1E is used. As another example of the non-contact machining method used, electric discharge machining will be described. The electric discharge machining apparatus 101 according to the third embodiment, the electrode 1E for electric discharge machining, and the method for manufacturing the electrode 1E will be described below.

(Configuration of electric discharge machine)
FIG. 11 is a schematic view showing an electric discharge machine 101 according to a third embodiment of the present invention.

The electric discharge machine 101 is an example of a non-contact machine that forms a honeycomb-shaped slit groove in the workpiece 2 by electric discharge machining. The electric discharge machining apparatus 101 is mounted on an electrode 1E for electric discharge machining having a machining surface 120 arranged on the workpiece 2 side, a mounting portion 3 on which the workpiece 2 is mounted, and a mounting portion 3. A machining fluid supply unit that supplies the machining fluid L2 to the gap S between the workpiece 2 placed on the mounting portion 3 and the electrode 1E and the moving portion 4 that moves the electrode 1E relative to the workpiece 2. A power supply unit 6 for applying a predetermined voltage between the 8 and the workpiece 2 mounted on the mounting unit 3 and the electrode 1E, a moving unit 4, a machining fluid supply unit 8, and a power supply unit 6 are provided. It includes a control unit 7 for controlling. Since the basic configuration of the electric discharge machine 101 is the same as each part of the electrolytic discharge machine 100 according to the first and second embodiments, the differences between the two will be mainly described here.

The machining fluid supply unit 8 includes a tank 80 for storing the machining fluid L2, a feed pipe 81 for sending the machining fluid L2 from the tank 80 to the electrode holder 40, and a machining fluid L2 for returning the machining fluid L2 from the machining tank 31 to the tank 80. It includes a return pipe 82, a pump 83 arranged in the feed pipe 81, a filter 84, and a flow rate adjusting valve 85.

The electrode holder 40 is configured to supply the machining fluid L2 to the gap S between the workpiece 2 and the electrode 1E by flowing out the machining fluid L2 supplied by the machining fluid supply unit 8 from the tip end side of the electrode 1E. Has been done. The processing liquid L2 may be sent to the processing tank 31 instead of or in addition to being supplied to the electrode holder 40.

The control unit 7 performs an electric discharge machining process for forming a honeycomb-shaped slit groove in the workpiece 2 by controlling each unit of the moving unit 4, the processing liquid supply unit 8, and the power supply unit 6 independently or in parallel.

The control unit 7 sends a control command to the moving unit 4 (specifically, the drive source of the drive mechanism unit 41) so that the gap S between the workpiece 2 and the electrode 1E is a predetermined distance G. The relative speed at which the electrode 1E is moved relative to the workpiece 2 according to the depth D of the slit groove formed in the workpiece 2 so that the electric discharge machining process is performed while maintaining the above. A certain electrode moving speed Es is controlled.

The control unit 7 sends a control command to the machining fluid supply unit 8 (specifically, the pump 83 and the flow rate adjusting valve 85) to supply the machining fluid L2 to the gap S between the workpiece 2 and the electrode 1E. The flow rate and flow velocity of the machining fluid L2 at the time of supply, and the supply start timing and supply stop timing of the machining fluid L2 are controlled.

The control unit 7 sends a control command to the power supply unit 6 (specifically, the power supply unit 60) to apply a pulse voltage between the workpiece 2 and the electrode 1E to be machined. The arc discharge generated between the object 2 and the electrode 1E is controlled.

When the control unit 7 controls each unit of the moving unit 4, the machining fluid supply unit 8, and the power supply unit 6, for example, the position sensor of the moving unit 4, the flow sensor of the machining fluid supply unit 8, and the current of the power supply unit 6 The control command is configured to be sent to each unit based on the detected values of various sensors (not shown) such as a voltage sensor.

(Electrode configuration)
12A and 12B show an electrode 1E according to a third embodiment of the present invention, FIG. 12A is an enlarged plan view of the electrode 1E, and FIG. 12B is a sectional view taken along line B2-B2.

The electrode 1E for electric discharge machining according to the third embodiment has a peripheral wall portion 10 located on the outer periphery of a circle and a honeycomb shape located inside the peripheral wall portion 10, similarly to the electrode 1A according to the first embodiment. It is provided with a partition wall portion 11 (see FIGS. 2 (a) and 2 (b)). That is, since the basic configuration of the electrode 1E for electric discharge machining according to the third embodiment is the same as each part of the electrode 1A for electrolytic discharge machining according to the first embodiment, the differences between the two are described here. I will explain mainly.

The partition wall portion 11 includes a processed portion 12 and a support portion 13 configured in the same manner as in the first embodiment, and a pattern hole 18 formed from the processed surface 120 toward the support portion 13. In the electrode 1E according to the third embodiment, the insulating film 14 is not formed on the support portion 13.

The processed portion 12 uses the first metal as a material, and for example, a metal such as copper, copper tungsten, or copper graphite is used. As the first metal, it is preferable to use a metal suitable for electric discharge machining.

The support portion 13 is made of a second metal, and for example, a metal such as copper, copper tungsten, or copper graphite, an iron-based alloy such as stainless steel, a copper-based alloy such as brass, or an alloy such as a titanium alloy is used. As the second metal, it is preferable to use a metal suitable for ensuring the strength of the electrode 1E.

The first metal used as the material of the processed portion 12 and the second metal used as the material of the support portion 13 may be different metals or the same metal. Further, as the first metal and the second metal, one kind of metal may be used, or a plurality of kinds of metals may be used. Here, it is assumed that the first metal used as the material of the processed portion 12 is copper and the second metal used as the material of the support portion 13 is stainless steel.

As shown in FIG. 12B, the pattern hole 18 is formed so as to penetrate the processed portion 12 and the support portion 13 in the thickness direction of the electrode 1E. As shown in FIG. 12A, the cross-sectional shape of the pattern hole 18 in the cross section is formed so as to straddle the two sides of the hexagons constituting each cell. The pattern hole 18 functions as a flow path for forced circulation or natural circulation of the processing liquid L2, for example, by jetting or sucking the processing liquid L2 or switching between the two.

According to the electrode 1E having the above configuration, since the support portion 13 includes a narrow portion 130 smaller than the width of the processed portion 12 in the vertical cross section, the support portion 13 and the side surface 22 of the slit groove 21 are provided in the narrow portion 130. The clearance C12 between and can be increased.

Therefore, the flow of the processing liquid L2 in the gap S between the workpiece 2 and the electrode 1E is promoted, so that sludge and air bubbles can be appropriately discharged. Further, since the weight of the electrode 1E is reduced by the amount that the narrow portion 130 is smaller than the width of the processed portion 12, the deflection of the electrode 1E in the thickness direction (particularly the central portion) can be suppressed. Therefore, the stability of electric discharge machining can be improved.

Further, according to the electrode 1E, since the partition wall portion 11 includes the pattern hole 18 formed for the processed portion 12 and the support portion 13, the surface area of the electrode 1E is increased by the amount of the pattern hole 18 formed. The flow of the processing liquid L2 is also promoted through the pattern holes 18. Therefore, it is possible to improve the cooling performance at the time of electric discharge machining and the discharge performance of sludge and air bubbles.

(Method of manufacturing electrodes)
FIG. 13 is a flowchart showing each step in the method for manufacturing the electrode 1E according to the third embodiment of the present invention. In addition, each step (step S300, S310, S320) of the manufacturing method of electrode 1E which concerns on 3rd Embodiment is each step (step S100, S110, S120) of manufacturing method of electrode 1A which concerns on 1st Embodiment. In order to deal with the above, here, the differences between the two will be mainly described.

First, in the first forming step (step S300), the first thin film 15 made of a first metal (for example, copper) has a first shape corresponding to the cross-sectional shape of the processed portion 12 in the cross section. The pattern P12 is formed. The first shape pattern P12 also corresponds to the cross-sectional shape of the pattern hole 18 in the cross section.

Next, in the second forming step (step S310), the support portion 13 (narrow portion 130) in the cross section is formed on the three second thin films 16A to 16C made of the second metal (for example, stainless steel). ), The second shape pattern P22 corresponding to the cross-sectional shape is formed. The second shape pattern P22 also corresponds to the cross-sectional shape of the pattern hole 18 in the cross section.

Next, in the joining step (step S320), the three second films formed in the second forming step (step S310) are formed on the first thin film 15 formed in the first forming step (step S300). The thin films 16A to 16C of the above are laminated in order and joined as a laminated body 17C. The thin films 15 and the three second thin films 16A to 16C are bonded to each other by, for example, diffusion bonding. As described above, a series of steps is completed, and the electrode 1E for electric discharge machining is manufactured.

According to the method for manufacturing the electrode 1E having the above steps, the electrode 1E can be manufactured easily and with high accuracy. Further, by changing the thickness and the number of the first thin film 15 and the second thin films 16A to 16C, for example, the processed portion 12 and the support are provided according to the amount of wear of the electrode 1E during electric discharge machining and the strength of the electrode 1E. An electrode 1E in which the thickness of the portion 13 is set to a predetermined thickness can be manufactured.

(4) Fourth Embodiment Hereinafter, the electric discharge machining apparatus 101, the electrode 1F for electric discharge machining, and the manufacturing method of the electrode 1F according to the fourth embodiment will be described. Since the configuration of the electric discharge machine 101 is the same as that of the third embodiment, the description thereof will be omitted.

(Electrode configuration)
14A and 14B show an electrode 1F according to a fourth embodiment of the present invention, FIG. 14A is an enlarged plan view of the electrode 1F, and FIG. 14B is a sectional view taken along line B3-B3. Since the basic configuration of the electrode 1F according to the fourth embodiment is the same as each part of the electrode 1B according to the second embodiment, the differences between the two will be mainly described here.

The partition wall portion 11 includes a processed portion 12 and a support portion 13 configured in the same manner as in the second embodiment, and a pattern hole 18 formed from the processed surface 120 toward the support portion 13. In the electrode 1F according to the fourth embodiment, as shown in FIG. 14B, the widths W23 and W24 of the support portion 13 become smaller as they are separated from the processed portion 12 along the thickness direction, and the support portion 13 is supported. The insulating film 14 is not formed on the portion 13.

As shown in FIG. 14B, the pattern hole 18 is formed so as to penetrate the processed portion 12 and the support portion 13 in the thickness direction of the electrode 1F. Further, as shown in FIG. 14A, the cross-sectional shape of the pattern hole 18 in the cross section is formed for each side of the hexagon constituting each cell.

(Modified example of electrode configuration)
15A and 15B show electrodes 1G and 1H according to a fourth embodiment of the present invention, FIG. 15A is a sectional view taken along line B3-B3 showing a first modified example and FIG. 15B is a second modified example. ..

In the electrodes 1G and 1H according to the first and second modifications, the widths W25, W26, and W27 of the support portion 13 are the processed portions 12 along the thickness direction, similarly to the electrodes 1F shown in FIG. 14 (b). The farther away it is, the smaller it becomes.

In the electrode 1G according to the first modification shown in FIG. 15A, the support portion 13 is smaller than the width W12 of the processed portion 12 than the first narrow portion 130A and the width W25 of the first narrow portion 130A. It also includes a small second narrow portion 130B.

In the electrode 1H according to the second modification shown in FIG. 15B, the support portion 13 is smaller than the width W12 of the processed portion 12 than the width W25 of the first narrow portion 130A and the first narrow portion 130A. It also includes a second narrow portion 130B, which is also small, and a third narrow portion 130C, which is smaller than the width W26 of the second narrow portion 130B.

As shown in FIGS. 15A and 15B, in the electrodes 1G and 1H according to the first and second modified examples, the width of the support portion 13 is separated from the processed portion 12 along the thickness direction. The widthwise side surface of the support portion 13 is formed in a stepped shape, but it may be formed in a curved shape.

According to the electrodes 1F to 1H having the above configuration, the support portion 13 includes narrow portions 130 and 130A to 130C smaller than the width of the processed portion 12 in the vertical cross section, and the widths W23 to W27 of the support portion 13 are thick. Since the distance from the machined portion 12 along the longitudinal direction becomes smaller, the clearance C12 between the support portion 13 and the side surface 22 of the slit groove 21 can be further expanded while ensuring the strength of the electrodes 1F to 1H. ..

Therefore, the flow of the processing liquid L2 in the gap S between the workpiece 2 and the electrodes 1F to 1H is promoted, so that sludge and air bubbles can be appropriately discharged. Further, since the weights of the electrodes 1F to 1H are reduced by the amount that the narrow portions 130 and 130A to 130C are smaller than the width of the processed portion 12, the deflection of the electrodes 1F to 1H in the thickness direction (particularly the central portion) is suppressed. can do. Therefore, the stability of electric discharge machining can be improved.

Further, according to the electrodes 1F to 1H, since the partition wall portion 11 includes the pattern hole 18 formed for the processed portion 12 and the support portion 13, the surface area of the electrodes 1F to 1H is increased by the amount of the pattern hole 18 formed. Is increased, and the flow of the processing liquid L2 is promoted even through the pattern holes 18. Therefore, it is possible to improve the cooling performance at the time of electric discharge machining and the discharge performance of sludge and air bubbles.

(Method of manufacturing electrodes)
FIG. 16 is a flowchart showing a method for manufacturing the electrode 1F according to the fourth embodiment of the present invention. Each step of the electrode 1F manufacturing method according to the fourth embodiment (steps S400, S410, S420) is a step of each step of the electrode 1B manufacturing method according to the second embodiment (steps S200, S210, S220). In order to deal with the above, here, the differences between the two will be mainly described.

First, in the first forming step (step S400), the first thin film 15 made of a first metal (for example, copper) has a first shape corresponding to the cross-sectional shape of the processed portion 12 in the cross section. The pattern P13 is formed. The first shape pattern P13 also corresponds to the cross-sectional shape of the pattern hole 18 in the cross section.

Next, in the second forming step (step S410), the width of the support portion 13 in the cross section is reduced in the four second thin films 16A to 16D made of the second metal as a material (for example, stainless steel). A plurality of second shape patterns P23A and P23B corresponding to the cross-sectional shapes of each stage are formed. The second shape patterns P23A and P23B also correspond to the cross-sectional shape of the pattern hole 18 in the cross section.

Next, in the joining step (step S420), the four second films formed in the second forming step (step S410) are formed on the first thin film 15 formed in the first forming step (step S400). The thin films 16A to 16D of the above are laminated in order and joined as a laminated body 17D. As described above, a series of steps is completed, and the electrode 1F for electric discharge machining is manufactured. The electrodes 1G and 1H according to the first and second modified examples are also formed by changing the second shape pattern formed on the second thin films 16A to 16D in the second forming step (step S410). , Manufactured in the same way.

According to the method for manufacturing the electrodes 1F to 1H having the above steps, the electrodes 1F to 1H can be manufactured easily and with high accuracy. Further, by changing the thickness and the number of the first thin films 15 and the second thin films 16A to 16D, for example, the electrodes 1F to 1H are processed according to the amount of wear during electric discharge machining and the strength of the electrodes 1F to 1H. The electrode 1I in which the thickness of the portion 12 and the support portion 13 is set to a predetermined thickness can be manufactured.

(5) Fifth Embodiment The following describes the electric discharge machining apparatus 101, the electrode 1I for electric discharge machining, and the manufacturing method of the electrode 1I according to the fifth embodiment. Since the configuration of the electric discharge machine 101 is the same as that of the third embodiment, the description thereof will be omitted.

(Electrode configuration)
17A and 17B show an electrode 1I according to a fifth embodiment of the present invention, FIG. 17A is an enlarged plan view of the electrode 1I, and FIG. 17B is a sectional view taken along line B4-B4. Since the basic configuration of the electrode 1I according to the fifth embodiment is the same as each part of the electrode 1F according to the fourth embodiment, the differences between the two will be mainly described here.

The partition wall portion 11 includes a processed portion 12 and a support portion 13 configured in the same manner as in the fourth embodiment, and a pattern groove 19 formed from the processed surface 120 toward the support portion 13.

As shown in FIG. 17B, the pattern groove 19 is formed in a groove shape having a predetermined depth from the machined surface 120 toward the support portion 13. Further, as shown in FIG. 17A, the cross-sectional shape of the pattern groove 19 in the cross section is formed for each side of the hexagon constituting each cell. The pattern groove 19 may be extended in the width direction as shown by the broken line in FIG. 17B, and may have, for example, a communication passage 190 communicating with the side surface 131B of the narrow portion 130.

According to the electrode 1I having the above configuration, the support portion 13 includes a narrow portion 130 smaller than the width of the processed portion 12 in the vertical cross section, and the widths W23 and W24 of the support portion 13 are processed along the thickness direction. Since the distance from the portion 12 becomes smaller, the clearance C12 between the support portion 13 and the side surface 22 of the slit groove 21 can be further expanded while ensuring the strength of the electrode 1I.

Therefore, the flow of the processing liquid L2 in the gap S between the workpiece 2 and the electrode 1I is promoted, so that sludge and air bubbles can be appropriately discharged. Further, since the weight of the electrode 1I is reduced by the amount that the narrow portion 130 is smaller than the width of the processed portion 12, the deflection of the electrode 1I in the thickness direction (particularly the central portion) can be suppressed. Therefore, the stability of electric discharge machining can be improved.

Further, according to the electrode 1I, since the partition wall portion 11 includes the pattern groove 19 formed for the processed portion 12 and the support portion 13, the surface area of the electrodes 1F to 1H is increased by the amount of the pattern groove 19 formed. At the same time, the flow of the processing liquid L2 is promoted through the pattern groove 19. Therefore, it is possible to improve the cooling performance at the time of electric discharge machining and the discharge performance of sludge and air bubbles.

(Method of manufacturing electrodes)
FIG. 18 is a flowchart showing a method for manufacturing the electrode 1I according to the fifth embodiment of the present invention. In addition, each step (step S500, S510, S520) of the manufacturing method of electrode 1I which concerns on 5th Embodiment is each step (step S400, S410, S420) of manufacturing method of electrode 1F which concerns on 4th Embodiment. In order to deal with the above, here, the differences between the two will be mainly described.

First, in the first forming step (step S500), the first thin film 15 made of a first metal (for example, copper) has a first shape corresponding to the cross-sectional shape of the processed portion 12 in the cross section. The pattern P14 is formed. The first shape pattern P14 also corresponds to the cross-sectional shape of the pattern groove 19 in the cross section.

Next, in the second forming step (step S510), the width of the support portion 13 in the cross section is formed on the fourth second thin films 16A to 16D made of the second metal as a material (for example, stainless steel). A plurality of second shape patterns P24A to P24C corresponding to the cross-sectional shapes of each of the smaller stages are formed. The second shape patterns P24A and P24B also correspond to the cross-sectional shape of the pattern groove 19 in the cross section.

Next, in the joining step (step S520), the four second films formed in the second forming step (step S510) are formed on the first thin film 15 formed in the first forming step (step S500). The thin films 16A to 16D of the above are laminated in order and bonded as a laminated body 17E. As described above, a series of steps is completed, and the electrode 1I for electric discharge machining is manufactured.

According to the method for manufacturing the electrode 1I having the above steps, the electrode 1I can be manufactured easily and with high accuracy. Further, by changing the thickness and the number of the first thin films 15 and the second thin films 16A to 16D, for example, the processed portion 12 and the support are supported according to the amount of wear of the electrode 1I during electric discharge machining and the strength of the electrode 1I. The electrode 1I in which the thickness of the portion 13 is set to a predetermined thickness can be manufactured.

(6) Other Embodiments Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments and can be appropriately modified without departing from the technical idea of the present invention.

For example, in the first to fifth embodiments, it has been described that a metal is used as a material for the processed portion 12 and the support portion 13, but for example, a non-metal having conductivity such as graphite may be used. Good.

Further, in the first to fifth embodiments, when the electrolytic processing device 100 or the electric discharge machining device 101 relatively moves the electrodes 1A to 1I with respect to the workpiece 2 mounted on the mounting portion 3. It has been described that the moving unit 4 includes a driving mechanism unit 41 for moving the electrode holder 40 for fixing and holding the electrodes 1A to 1I in the vertical direction (Z direction), whereby the electrode 1A is moved by the driving mechanism unit 41. On the other hand, instead of the moving unit 4 moving the electrodes 1A to 1I, the mounting unit 3 moves the table 30 that holds the workpiece 2 fixedly in the vertical direction (Z direction). The work piece 2 may be moved by the table drive mechanism unit, or both the electrodes 1A to 1I and the work piece 2 may be moved by both the drive mechanism unit 41 and the table drive mechanism unit. Good.

Further, in the third to fifth embodiments, the electrodes 1E to 1I for electric discharge machining have been described as having the pattern hole 18 or the pattern groove 19. On the other hand, the electrodes 1A to 1D for electrolytic processing according to the first and second embodiments may be provided with the pattern hole 18 or the pattern groove 19. Further, the size, shape and number of the pattern holes 18 or the pattern grooves 19 may be appropriately changed in both the electrode for electric discharge machining and the electrode for electrolytic machining. Further, the flow path formed by the pattern hole 18 or the pattern groove 19 may extend not only parallel to the thickness direction of the electrode but also diagonally or perpendicularly to the thickness direction of the electrode. However, the shape may be curved, merged or branched, as well as a linear shape.

Further, in the third to fifth embodiments, the first thin film 15 made of a first metal (for example, copper) and a plurality of first thin films made of a second metal (for example, stainless steel) are used as materials. It has been described that the thin films 16A to 16D of 2 are laminated to produce electrodes 1E to 1I for electric discharge machining. On the other hand, as the first and second thin films, thin films made of a plurality of types of metals may be laminated in a predetermined order. For example, as the first thin film corresponding to the processed portion 12, copper may be used. As a second thin film corresponding to the support portion 13, a plurality of thin films made of copper and a material and a plurality of thin films made of stainless steel are laminated one by one. Alternatively, a plurality of sheets may be alternately laminated. As a result, the shear stress generated at the joint portion between the thin films due to the difference in the coefficient of thermal expansion can be reduced. At that time, when comparing the coefficients of thermal expansion of a plurality of types of metals, it is preferable that the difference between them is smaller than a predetermined value.

1A to 1I ... Electrode, 2 ... Work piece, 3 ... Placement part, 4 ... Moving part, 5 ... Electrolyte solution supply part,
6 ... Power supply unit, 7 ... Control unit, 8 ... Processing liquid supply unit,
10 ... peripheral wall portion, 10a ... mounting hole, 11 ... partition wall portion, 11a ... through hole,
12 ... Processing part, 13 ... Support part, 14 ... Insulation film,
15 ... 1st thin film, 16A-16D ... 2nd thin film,
17A to 17E ... Laminated body, 18 ... Pattern hole, 19 ... Pattern groove,
20 ... Surface to be processed, 21 ... Slit groove, 21A, 21B ... Slit groove,
22 ... side, 23 ... supply hole,
30 ... table, 31 ... processing tank,
40 ... Electrode holder, 41 ... Drive mechanism, 42 ... Vibration
50 ... tank, 51 ... feed piping, 52 ... return piping,
53 ... Pump, 54 ... Filter, 55 ... Flow control valve,
60 ... power supply unit, 61 ... first power line, 62 ... second power line,
80 ... tank, 81 ... feed piping, 82 ... return piping,
83 ... pump, 84 ... filter, 85 ... flow control valve,
100 ... Electrochemical machining equipment, 101 ... Electric discharge machining equipment, 120 ... Machining surface,
130 ... narrow part, 130A ... first narrow part, 130B ... second narrow part,
130C ... Third narrow part, 131, 131A to 131C ... Side surface,
132, 132A-132C ... Surface, 133 ... Non-narrow part,
140, 140A-140C ... First insulating film,
141, 141A-141C ... Second insulating film,
161, 162 ... surface, 190 ... continuous passage,
L1 ... Electrolyte, L2 ... Processing liquid

Claims (9)

An electrode for non-contact processing provided with the honeycomb-shaped partition wall portion that forms a honeycomb-shaped slit groove in the work piece.
The partition wall
A machined portion having a machined surface arranged on the work piece side,
A support portion that supports the processed portion from the side opposite to the processed surface is provided.
The support portion
In the vertical cross section defined by the width direction and the thickness direction of the partition wall portion, a narrow portion smaller than the width of the processed portion is provided.
An electrode characterized by that. The width of the support portion becomes smaller as the distance from the processed portion increases along the thickness direction.
The electrode according to claim 1. The partition wall includes a pattern hole or a pattern groove formed from the machined surface toward the support portion.
The electrode according to claim 1 or 2, wherein the electrode is characterized by the above. The electrode is an electrode for electric discharge machining.
The electrode according to any one of claims 1 to 3, wherein the electrode is characterized in that. The electrode is an electrode for electrolytic processing, and is
In the support portion, an insulating film is formed on both side surfaces in the width direction and the surface on the side opposite to the processed portion in the thickness direction.
The electrode according to any one of claims 1 to 3, wherein the electrode is characterized in that. The processed portion is made of a first metal as a material.
The support portion is made of a second metal different from the first metal.
The insulating film is formed of an insulating material having higher adhesion to the second metal than the first metal.
The electrode according to claim 5. The method for manufacturing an electrode according to any one of claims 1 to 4.
A first forming step of forming a first shape pattern corresponding to the cross-sectional shape of the processed portion in a cross section orthogonal to the thickness direction on at least one first thin film.
A second forming step of forming a second shape pattern corresponding to the cross-sectional shape of the support portion in the cross section on at least one second thin film.
A joining step of laminating the second thin film formed in the second forming step on the first thin film formed in the first forming step and joining as a laminated body is included.
A method for manufacturing an electrode. The method for manufacturing an electrode according to claim 5 or 6.
A first forming step of forming a first shape pattern corresponding to the cross-sectional shape of the processed portion in a cross section orthogonal to the thickness direction on at least one first thin film.
A second forming step of forming a second shape pattern corresponding to the cross-sectional shape of the support portion in the cross section on at least one second thin film.
A joining step of laminating the second thin film formed in the second forming step on the first thin film formed in the first forming step and joining them as a laminated body.
Of the laminates joined by the joining step, on the surface of the second thin film corresponding to both side surfaces in the width direction of the support portion and the surface opposite to the processed portion in the thickness direction. On the other hand, the step of forming an insulating film for forming the insulating film is included.
A method for manufacturing an electrode. The electrode according to any one of claims 1 to 6,
A moving portion that relatively moves at least one of the electrode and the work piece in the thickness direction so as to maintain a gap between the electrode and the work piece.
A power supply unit that applies a predetermined voltage between the workpiece and the electrode,
A control unit that controls the moving unit and the power supply unit is provided.
A non-contact processing device characterized in that.

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