JP2020109131A - Crystal of cyclic phosphonic acid sodium salt and method for manufacturing the same - Google Patents

Crystal of cyclic phosphonic acid sodium salt and method for manufacturing the same Download PDF

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JP2020109131A
JP2020109131A JP2020072782A JP2020072782A JP2020109131A JP 2020109131 A JP2020109131 A JP 2020109131A JP 2020072782 A JP2020072782 A JP 2020072782A JP 2020072782 A JP2020072782 A JP 2020072782A JP 2020109131 A JP2020109131 A JP 2020109131A
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宏昭 湯浅
Hiroaki Yuasa
宏昭 湯浅
宏紀 岡▲崎▼
Hiroki Okazaki
宏紀 岡▲崎▼
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Abstract

To provide crystals of cyclic phosphonic acid sodium salt (2ccPA) having high purity and excellent storage stability and a method for producing the crystals.SOLUTION: The present invention provides crystals of cyclic phosphonic acid sodium salt (2ccPA) represented by formula (1).SELECTED DRAWING: None

Description

本発明は、環状ホスホン酸ナトリウム塩の結晶及びその製造方法に関する。 The present invention relates to crystals of cyclic phosphonic acid sodium salt and a method for producing the same.

下記式(1)で表される環状ホスホン酸ナトリウム塩(9−オクタデセン酸(9Z)−(2−ヒドロキシ−2−オキソ−2λ−1,2−オキサホスホラン−4−イル)メチルエステルのナトリウム塩)は、一般に、2ccPAと称される化合物である。 Formula (1) represented by cyclic phosphonate sodium salt (9-octadecenoic acid (9Z) - (-1,2-2-hydroxy-2-oxo-2 [lambda] 5 oxaphospholane-4-yl) methyl ester Sodium salt) is a compound generally referred to as 2ccPA.

Figure 2020109131
Figure 2020109131

この2ccPAは、強力な鎮痛作用を有することが知られており(特許文献1)、また、癌細胞の浸潤抑制作用による抗癌剤(特許文献2)、ヒアルロン酸産生促進による変形性関節症治療薬(特許文献3)等としても期待されている。 This 2 ccPA is known to have a strong analgesic effect (Patent Document 1), an anti-cancer agent by suppressing the invasion of cancer cells (Patent Document 2), and a therapeutic agent for osteoarthritis by promoting hyaluronic acid production ( It is also expected as Patent Document 3).

従来、2ccPAは、下記反応式−1で示される製造方法により製造されてきた(特許文献2、特許文献4、非特許文献1及び非特許文献2)。 Conventionally, 2 ccPA has been produced by the production method represented by the following reaction formula-1 (Patent Document 2, Patent Document 4, Non-Patent Document 1 and Non-Patent Document 2).

Figure 2020109131
Figure 2020109131

具体的には、まず、非特許文献2に記載される製造方法で得られたヨウ素化合物(5a)と亜リン酸トリメチルとを反応させて、ホスホン酸ジメチル(6a)を得る。次いで、当該化合物(6a)にp−トルエンスルホン酸(p−TsOH)を作用させて、化合物(8a)を得る。当該化合物(8a)にオレイン酸を導入し、化合物(9a)とした後、脱メチル化を行い、さらに、ナトリウム塩とすることで、2ccPAを製造してきた。 Specifically, first, the iodine compound (5a) obtained by the production method described in Non-Patent Document 2 is reacted with trimethyl phosphite to obtain dimethyl phosphonate (6a). Then, the compound (6a) is reacted with p-toluenesulfonic acid (p-TsOH) to obtain the compound (8a). 2 ccPA has been produced by introducing oleic acid into the compound (8a) to form the compound (9a), demethylating it, and further converting it into a sodium salt.

しかしながら、上記製造方法では、各工程の反応条件の最適化ができていないことと、各工程にシリカゲルカラムクロマトグラフィーによる精製を行う必要があることから、上記5工程を経た2ccPAのトータル収率を文献記載の収率から計算すると18.7%となり収率が低く、大量合成に適していないという問題があった。また、脱メチル化工程でブロモトリメチルシラン(TMSBr)を使用しているため、副生する臭化水素により反応系中が強酸性になり、生成物が分解する恐れがあった。実際に上記脱メチル化工程は、38%と低い収率であった。 However, in the above production method, the reaction conditions in each step have not been optimized, and since it is necessary to perform purification by silica gel column chromatography in each step, the total yield of 2ccPA after the above 5 steps is When calculated from the yield described in the literature, the yield was low at 18.7%, which was not suitable for large-scale synthesis. Further, since bromotrimethylsilane (TMSBr) is used in the demethylation step, there is a risk that the reaction system becomes strongly acidic due to byproduct hydrogen bromide and the product is decomposed. In fact, the demethylation step had a low yield of 38%.

さらに、最終工程では、化合物(10a)を、水酸化ナトリウム水溶液でナトリウム塩にして、2ccPAに誘導しているが、特に精製を行わずに凍結乾燥をしているため、2ccPA固体物中に強塩基性の水酸化ナトリウムが混入する恐れがあり、水酸化ナトリウムによる2ccPAの分解が避けられず、保存安定性に問題があった。 Furthermore, in the final step, the compound (10a) is converted to a sodium salt with an aqueous solution of sodium hydroxide to induce 2ccPA. However, since the compound (10a) is lyophilized without any purification, it is strongly added to the solid of 2ccPA. There is a possibility that basic sodium hydroxide may be mixed in, the decomposition of 2ccPA by sodium hydroxide cannot be avoided, and there is a problem in storage stability.

そこで、従来より公知の方法に比し、簡便、高収率かつ高純度で、保存安定性に優れる2ccPA結晶を製造する方法を開発することが望まれている。 Therefore, it is desired to develop a method for producing a 2ccPA crystal, which is simpler, has a higher yield, a higher purity, and is excellent in storage stability as compared with conventionally known methods.

特許第5077893号公報Japanese Patent No. 5077893 特開2004−10582号公報JP 2004-10582 A 国際公開第2013/069404号International Publication No. 2013/069404 国際公開第03/104246号International Publication No. 03/104246

Biochimica et Biophysica Acta,2007,1771,p.103−112Biochimica et Biophysica Acta, 2007, 1771, p.103-112. Tetrahedoron,1991,Vol.47,No.6,p.1001−1012Tetrahedoron, 1991, Vol. 47, No. 6, p.1001-1012

本発明は、高純度でかつ保存安定性に優れる2ccPAの結晶を提供することを課題とする。 An object of the present invention is to provide a 2ccPA crystal having high purity and excellent storage stability.

また、本発明は、簡便かつ高収率で該2ccPAの結晶を製造する方法を提供することも課題とする。 Another object of the present invention is to provide a method for producing crystals of 2ccPA simply and in high yield.

本発明者らは、上記課題を解決すべく鋭意研究を重ねてきた。その結果、2ccPAの前駆体である環状ホスホン酸エステルを、シリカゲルカラムクロマトグラフィーの精製1回で高収率に製造でき、さらに、当該環状ホスホン酸エステルから、強酸又は強塩基を用いることなく2ccPAに誘導することに成功した。 The present inventors have conducted extensive research to solve the above problems. As a result, a cyclic phosphonate, which is a precursor of 2ccPA, can be produced in high yield by a single purification of silica gel column chromatography, and further, the cyclic phosphonate can be converted into 2ccPA without using a strong acid or a strong base. I succeeded in inducing.

更に、本発明者らは、このようにして得られた2ccPAの結晶が、保存安定性に優れており、本課題を解決できることを見い出した。本発明は、このような知見に基づき完成されたものである。 Furthermore, the present inventors have found that the crystals of 2ccPA thus obtained have excellent storage stability and can solve this problem. The present invention has been completed based on such findings.

すなわち、本発明は、下記に記載する2ccPAの結晶及びその製造方法を提供する。
項1.
式(1)
That is, the present invention provides a 2ccPA crystal and a method for producing the same described below.
Item 1.
Formula (1)

Figure 2020109131
Figure 2020109131

で表される環状ホスホン酸ナトリウム塩(2ccPA)の結晶。
項2.
X線粉末回折スペクトルにおいて、2θで表される回折角度として、15゜〜17゜の位置に特徴的なピークを有する、項1に記載の結晶。
項3.
X線粉末回折スペクトルにおいて、2θで表される回折角度として、9゜〜10゜の位置に特徴的なピークを有する、項1又は2に記載の結晶。
項4.
X線粉末回折スペクトルにおいて、2θで表される回折角度として、3゜〜5゜の位置に特徴的なピークを有する、項1〜3のいずれか一項に記載の結晶。
項5.
X線粉末回折スペクトルにおいて、2θで表される回折角度として、4.7゜〜5.0゜の位置に特徴的なピークを有する、項4に記載の結晶。
項6.
X線粉末回折スペクトルにおいて、2θで表される回折角度として、4.4゜〜4.6゜の位置に特徴的なピークを有する、項4に記載の結晶。
項7.
X線粉末回折スペクトルにおいて、2θで表される回折角度として、4.1゜〜4.3゜の位置に特徴的なピークを有する、項4に記載の結晶。
項8.
X線粉末回折スペクトルにおいて、2θで表される回折角度として、3.7゜〜3.9゜の位置に特徴的なピークを有する、項4に記載の結晶。
項9.
融点が187〜190℃である、項1〜8のいずれか一項に記載の結晶。
項10.
項1〜9のいずれか一項に記載の結晶の製造方法であって、
工程(H):一般式(9)
A crystal of cyclic phosphonic acid sodium salt (2 ccPA) represented by:
Item 2.
Item 2. The crystal according to Item 1, which has a characteristic peak at a position of 15° to 17° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum.
Item 3.
Item 3. The crystal according to Item 1 or 2, which has a characteristic peak at a position of 9° to 10° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum.
Item 4.
Item 4. The crystal according to any one of Items 1 to 3, which has a characteristic peak at a position of 3° to 5° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum.
Item 5.
Item 5. The crystal according to Item 4, which has a characteristic peak at a position of 4.7° to 5.0° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum.
Item 6.
Item 5. The crystal according to Item 4, which has a characteristic peak at a position of 4.4° to 4.6° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum.
Item 7.
Item 5. The crystal according to Item 4, which has a characteristic peak at a position of 4.1° to 4.3° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum.
Item 8.
Item 5. The crystal according to Item 4, which has a characteristic peak at a position of 3.7° to 3.9° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum.
Item 9.
Item 9. The crystal according to any one of Items 1 to 8, which has a melting point of 187 to 190°C.
Item 10.
Item 10. A method for producing the crystal according to any one of Items 1 to 9,
Step (H): General formula (9)

Figure 2020109131
Figure 2020109131

(式中、Rは、アルキル基、アリールアルキル基又はアリール基を示す。)
で表される環状ホスホン酸エステルと、ハロゲン化ナトリウムとを、有機溶媒中で反応させて、2ccPAを得る工程、及び
工程(I):工程(H)で得られた2ccPAを含有する溶液を減圧下で濃縮するか、又は工程(H)で得られた2ccPAを含有する溶液を冷却することにより、結晶を析出させる工程を含む、製造方法。
項11.
項10に記載の結晶の製造方法であって、さらに、
工程(J):工程(I)で得られた結晶を、水及び/又は有機溶媒に溶解して溶液を得る工程、及び
工程(K):工程(J)で得られた溶液に、貧溶媒を加えることにより、再結晶を行う工程を含む、製造方法。
項12.
請求項10又は11に記載の製造方法により得られる環状ホスホン酸ナトリウム塩(2ccPA)の結晶。
項13.
式(1)
(In the formula, R 1 represents an alkyl group, an arylalkyl group or an aryl group.)
The step of reacting a cyclic phosphonate ester represented by the formula with sodium halide in an organic solvent to obtain 2 ccPA, and step (I): the solution containing 2 ccPA obtained in step (H) is depressurized. A production method, which comprises the step of precipitating crystals by concentrating the solution below or by cooling the solution containing 2 ccPA obtained in step (H).
Item 11.
Item 10. A method for producing a crystal according to Item 10, further comprising:
Step (J): a step of dissolving the crystal obtained in step (I) in water and/or an organic solvent to obtain a solution, and step (K): adding a poor solvent to the solution obtained in step (J) A method of manufacturing, comprising the step of recrystallizing by adding.
Item 12.
A crystal of cyclic phosphonic acid sodium salt (2 ccPA) obtained by the production method according to claim 10.
Item 13.
Formula (1)

Figure 2020109131
Figure 2020109131

で表される環状ホスホン酸ナトリウム塩(2ccPA)の結晶を製造する方法であって、
工程(H):一般式(9)
A method for producing crystals of cyclic phosphonic acid sodium salt (2ccPA) represented by:
Step (H): General formula (9)

Figure 2020109131
Figure 2020109131

(式中、Rは、アルキル基、アリールアルキル基又はアリール基を示す。)
で表される環状ホスホン酸エステルと、ハロゲン化ナトリウムとを有機溶媒中で反応させる工程を含む、製造方法。
項14.
一般式(9)
(In the formula, R 1 represents an alkyl group, an arylalkyl group or an aryl group.)
The manufacturing method containing the process of making the cyclic phosphonate represented by and the sodium halide react in an organic solvent.
Item 14.
General formula (9)

Figure 2020109131
Figure 2020109131

(式中、Rは、アルキル基、アリールアルキル基又はアリール基を示す。)
で表される環状ホスホン酸エステルの製造方法であって、
工程(G):一般式(8)
(In the formula, R 1 represents an alkyl group, an arylalkyl group or an aryl group.)
A method for producing a cyclic phosphonate represented by:
Step (G): General formula (8)

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。)
で表される化合物と、オレイン酸化合物とを反応させる工程を含む、製造方法。
項15.
一般式(8)
(In the formula, R 1 is the same as the above.)
The manufacturing method including the process of making the compound represented by and the oleic acid compound react.
Item 15.
General formula (8)

Figure 2020109131
Figure 2020109131

(式中、Rは、アルキル基、アリールアルキル基又はアリール基を示す。)
で表される化合物の製造方法であって、
工程(F):一般式(7)
(In the formula, R 1 represents an alkyl group, an arylalkyl group or an aryl group.)
A method for producing a compound represented by:
Process (F): General formula (7)

Figure 2020109131
Figure 2020109131

(式中、2つのRは、同一又は異なって、アルキル基、アリールアルキル基又はアリール基を示す。)
で表される化合物に、塩基を作用させる工程を含む、製造方法。
項16.
一般式(7)
(In the formula, two R 1 s are the same or different and each represents an alkyl group, an arylalkyl group or an aryl group.)
The manufacturing method including the process of making a base act on the compound represented by.
Item 16.
General formula (7)

Figure 2020109131
Figure 2020109131

(式中、2つのRは、同一又は異なって、アルキル基、アリールアルキル基又はアリール基を示す。)
で表される化合物の製造方法であって、
工程(E):一般式(6)
(In the formula, two R 1 s are the same or different and each represents an alkyl group, an arylalkyl group or an aryl group.)
A method for producing a compound represented by:
Process (E): General formula (6)

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。2つのRは、同一又は異なって、アルキル基、シクロアルキル基又はアリール基を示す。)
で表される化合物に、酸を作用させる工程を含む、製造方法。
項17.
一般式(6)
(In the formula, R 1 is the same as the above. Two R 2 are the same or different and each represents an alkyl group, a cycloalkyl group or an aryl group.)
The manufacturing method including the process of making an acid act on the compound represented by.
Item 17.
General formula (6)

Figure 2020109131
Figure 2020109131

(式中、2つのRは、同一又は異なって、アルキル基、アリールアルキル基又はアリール基を示す。2つのRは、同一又は異なって、アルキル基、シクロアルキル基又はアリール基を示す。)
で表される化合物の製造方法であって、
工程(D):一般式(5)
(In the formula, two R 1 are the same or different and represent an alkyl group, an arylalkyl group or an aryl group. Two R 2 are the same or different and represent an alkyl group, a cycloalkyl group or an aryl group. )
A method for producing a compound represented by:
Process (D): General formula (5)

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。Xは、ハロゲン原子を示す。)
で表される化合物と、亜リン酸ジエステルとを反応させる工程を含む、製造方法。
項18.
一般式(5)
(In the formula, R 2 is the same as the above. X represents a halogen atom.)
The manufacturing method containing the process of making the compound represented by and the phosphite diester react.
Item 18.
General formula (5)

Figure 2020109131
Figure 2020109131

(式中、2つのRは、同一又は異なって、アルキル基、シクロアルキル基又はアリール基を示す。Xは、ハロゲン原子を示す。)
で表されるハロゲン化合物の製造方法であって、
工程(C):一般式(4)
(In the formula, two R 2 are the same or different and each represents an alkyl group, a cycloalkyl group or an aryl group. X represents a halogen atom.)
A method for producing a halogen compound represented by
Step (C): General formula (4)

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。Rは、置換されていてもよいアルキル基又は置換されていてもよいアリール基を示す。)
で表される化合物と、アルカリ金属ハロゲン化物及び/又はアルカリ土類金属ハロゲン化物とを、塩基の存在下で反応させる工程を含む、製造方法。
項19.
一般式(4)
(In the formula, R 2 is the same as the above. R 3 is an optionally substituted alkyl group or an optionally substituted aryl group.)
A method for producing, comprising a step of reacting the compound represented by with an alkali metal halide and/or an alkaline earth metal halide in the presence of a base.
Item 19.
General formula (4)

Figure 2020109131
Figure 2020109131

(式中、2つのRは、同一又は異なって、アルキル基、シクロアルキル基又はアリール基を示す。Rは、置換されていてもよいアルキル基又は置換されていてもよいアリール基を示す。)
で表される化合物の製造方法であって、
工程(B):一般式(3)
(In the formula, two R 2 are the same or different and each represents an alkyl group, a cycloalkyl group or an aryl group. R 3 represents an optionally substituted alkyl group or an optionally substituted aryl group. .)
A method for producing a compound represented by:
Step (B): General formula (3)

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。)
で表される化合物と、スルホニルハライド化合物とを反応させる工程を含む、製造方法。項20.
一般式(5)
(In the formula, R 2 is the same as the above.)
The manufacturing method containing the process of making the compound represented by and the sulfonyl halide compound react. Item 20.
General formula (5)

Figure 2020109131
Figure 2020109131

(式中、2つのRは、同一又は異なって、アルキル基、シクロアルキル基又はアリール基を示す。Xは、ハロゲン原子を示す。)
で表される化合物の製造方法であって、
工程(B’):一般式(3)
(In the formula, two R 2 are the same or different and each represents an alkyl group, a cycloalkyl group or an aryl group. X represents a halogen atom.)
A method for producing a compound represented by:
Step (B'): General formula (3)

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。)
で表される化合物と、ハロゲン化剤とを反応させる工程を含む、製造方法。
項21.
項10又は13に記載の結晶の製造方法であって、さらに、項14〜20のいずれか一項に記載の工程を含む、結晶の製造方法。
(In the formula, R 2 is the same as the above.)
The manufacturing method including the process of making the compound represented by and the halogenating agent react.
Item 21.
Item 10. The method for producing a crystal according to Item 10 or 13, further comprising the step according to any one of Items 14 to 20.

本発明の2ccPAの結晶は、保存安定性に優れており、該結晶を長期間保存してもほとんど分解しない。 The crystal of 2ccPA of the present invention is excellent in storage stability and hardly decomposes even if the crystal is stored for a long period of time.

本発明の製造方法に従うことにより、簡便な手段で、高純度の2ccPA結晶を高収率で製造することができる。 By following the production method of the present invention, highly pure 2ccPA crystals can be produced in high yield by a simple means.

具体的には、本発明の製造方法は、新規な製造方法を含み、特に、本発明は、各工程で単離精製を行わずに(テレスコーピング法)、2ccPAの前駆体である環状ホスホン酸エステルを製造することができる。 Specifically, the production method of the present invention includes a novel production method, and in particular, the present invention is a cyclic phosphonic acid which is a precursor of 2ccPA without isolation and purification in each step (telescoping method). Esters can be produced.

また、本発明の製造方法は、環状ホスホン酸エステルから、強酸又は強塩基を用いることなく簡便に、純度低下のリスクを低減させ、安定性に優れた2ccPA結晶を提供することができる。 Further, the production method of the present invention can easily provide a 2ccPA crystal from a cyclic phosphonate ester, which can easily reduce the risk of deterioration in purity without using a strong acid or a strong base, and has excellent stability.

実施例1で得られた2ccPAの結晶のX線粉末回折スペクトルである。2 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 1. FIG. 実施例2で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 2. 実施例3で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 3. 実施例4で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 4. 実施例5で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 5. FIG. 実施例6で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 6. 実施例7で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 7. FIG. 実施例8で得られた2ccPAの結晶のX線粉末回折スペクトルである。9 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 8. FIG. 実施例9で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 9. FIG. 実施例10で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 10. 実施例11で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 11. 実施例12で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 12. 実施例13で得られた2ccPAの結晶のX線粉末回折スペクトルである。4 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 13. FIG. 実施例14で得られた2ccPAの結晶のX線粉末回折スペクトルである。4 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 14. 実施例15で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 15. 実施例16で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 16. 実施例17で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 17. 実施例18で得られた2ccPAの結晶のX線粉末回折スペクトルである。20 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 18. 実施例19で得られた2ccPAの結晶のX線粉末回折スペクトルである。20 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 19. FIG. 実施例20で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 20. 実施例21で得られた2ccPAの結晶のX線粉末回折スペクトルである。2 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 21. 実施例22で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 22. 実施例23で得られた2ccPAの結晶のX線粉末回折スペクトルである。9 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 23. FIG. 実施例24で得られた2ccPAの結晶のX線粉末回折スペクトルである。9 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 24. FIG. 実施例25で得られた2ccPAの結晶のX線粉末回折スペクトルである。9 is an X-ray powder diffraction spectrum of the crystal of 2ccPA obtained in Example 25. 実施例26で得られた2ccPAの結晶のX線粉末回折スペクトルである。3 is an X-ray powder diffraction spectrum of the 2ccPA crystal obtained in Example 26. 安定性試験の結果を示すグラフである。It is a graph which shows the result of a stability test.

本発明の2ccPAの新規な結晶及びその製造方法を、以下詳細に説明する。 The novel crystal of 2ccPA of the present invention and the method for producing the same will be described in detail below.

本明細書中において、「含む」なる表現については、「含む」、「実質的にのみからなる」及び「のみからなる」という概念を含む。 In this specification, the expression "comprising" includes the terms "comprising", "consisting essentially of" and "consisting solely of".

1.環状ホスホン酸ナトリウム塩(2ccPA)の結晶
本発明の2ccPAの結晶は、下記式(1)で表される環状ホスホン酸ナトリウム塩(9−オクタデセン酸(9Z)−(2−ヒドロキシ−2−オキソ−2λ−1,2−オキサホスホラン−4−イル)メチルエステルのナトリウム塩、IUPAC名:4−[(Z)−オクタデック−9−エノイルオキシメチル]−2−オキソ−1,2−λ−オキサホスホラン−2−オレートナトリウム塩)の結晶である。
1. Crystal of cyclic phosphonic acid sodium salt (2ccPA) The crystal of 2ccPA of the present invention is a cyclic phosphonic acid sodium salt (9-octadecenoic acid (9Z)-(2-hydroxy-2-oxo-) represented by the following formula (1). 2 [lambda] 5-1,2-oxaphospholane-4-yl) sodium salt of methyl ester, IUPAC name: 4 - [(Z) - Okutadekku 9- enoyl oxymethyl] -2-oxo -1, 2-lambda 5 -oxaphospholane-2-olate sodium salt).

Figure 2020109131
Figure 2020109131

当該2ccPAの結晶は、例えば、株式会社リガク製のRINT−2000 Ultima IV(商品名)を用いて測定した場合、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルが、下記の格子面間隔(d)の位置に特徴的なピークを有する。 The crystal of 2 ccPA is, for example, an X-ray powder diffraction spectrum obtained by copper radiation of λ=1.54059Å through a monochromator when measured using RINT-2000 Ultima IV (trade name) manufactured by Rigaku Corporation. Has a characteristic peak at the following lattice spacing (d).

当該2ccPAの結晶は、結晶X線粉末回折スペクトルにおいて、2θで表される回折角度として、
約15゜〜17゜の位置に特徴的なピーク(以下、「ピークA」という)、
約9゜〜10゜の位置に特徴的なピーク(以下、「ピークB」という)、又は
約3゜〜5゜の位置に少なくとも1つの特徴的なピーク(以下、「ピークC〜F」という)を含んでいる。
The 2 ccPA crystal has a diffraction angle represented by 2θ in a crystal X-ray powder diffraction spectrum,
A characteristic peak at a position of about 15° to 17° (hereinafter referred to as “peak A”),
A characteristic peak at about 9° to 10° (hereinafter referred to as “peak B”) or at least one characteristic peak at about 3° to 5° (hereinafter referred to as “peak C to F”). ) Is included.

該ピークC〜Fは、さらに、下記ピークC、D、E及び/又はFを含んでいる。
約4.7゜〜5.0゜の位置に特徴的なピーク(以下、「ピークC」という)
約4.4゜〜4.6゜の位置に特徴的なピーク(以下、「ピークD」という)
約4.1゜〜4.3゜の位置に特徴的なピーク(以下、「ピークE」という)
約3.7゜〜3.9゜の位置に特徴的なピーク(以下、「ピークF」という)
当該ピークCは、
約4.7゜〜4.9゜の位置及び/又は約4.9°〜5.0゜の位置に特徴的なピークを含んでいる。
The peaks C to F further include the following peaks C, D, E and/or F.
A characteristic peak at a position of about 4.7° to 5.0° (hereinafter referred to as "peak C")
A characteristic peak at a position of approximately 4.4° to 4.6° (hereinafter referred to as “peak D”)
A characteristic peak at a position of about 4.1° to 4.3° (hereinafter referred to as "peak E")
A characteristic peak at a position of about 3.7° to 3.9° (hereinafter referred to as "peak F")
The peak C is
It includes characteristic peaks at positions of about 4.7° to 4.9° and/or at positions of about 4.9° to 5.0°.

本発明における2ccPAの結晶は、実質的に、鱗片状晶形が積層した形状を有する。 The 2 ccPA crystal in the present invention has a shape in which scale-like crystals are stacked.

本発明における2ccPAの結晶の融点は、187℃〜190℃の範囲にある。当該融点は、ビュッヒ社製融点測定装置B−545型を用いて測定される。 The melting point of the 2ccPA crystal in the present invention is in the range of 187°C to 190°C. The melting point is measured using a melting point measuring device B-545 manufactured by Büch.

本発明における2ccPAの結晶のIRスペクトルは、Perkin Elmer社のIR測定装置Spectrum One Bを用いて測定される。 The IR spectrum of the 2 ccPA crystal in the present invention is measured using an IR measuring device Spectrum One B manufactured by Perkin Elmer.

本発明における2ccPAの結晶の純度は、逆相シリカゲルカラムを用いた高速液体クロマトグラフィー(HPLC)を用いて測定される。一般に当該純度は、98%以上である。 The purity of the 2ccPA crystal in the present invention is measured by high performance liquid chromatography (HPLC) using a reversed phase silica gel column. Generally, the purity is 98% or higher.

本発明の2ccPAの結晶は、保存安定性に優れる。該2ccPAの結晶を、−20℃及び35℃で3ヶ月間密閉して保存しても、いずれも純度がほとんど低下せず、2ccPAの分解が起こりにくい。 The 2ccPA crystal of the present invention has excellent storage stability. Even if the 2 ccPA crystals are sealed and stored at −20° C. and 35° C. for 3 months, the purity is hardly lowered and the decomposition of 2 ccPA hardly occurs.

2.上記2ccPAの結晶の製造方法
本発明の2ccPAの結晶の製造方法は、下記工程(H)及び工程(I)を含むことを特徴とする。
2. Method for Producing Crystal of 2ccPA The method for producing a crystal of 2ccPA of the present invention is characterized by including the following step (H) and step (I).

工程(H):一般式(9) Step (H): General formula (9)

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。)
で表される環状ホスホン酸エステルと、ハロゲン化ナトリウムとを、有機溶媒中で反応させて、2ccPAを得る工程、及び
工程(I):工程(H)で得られた2ccPAを含有する溶液を減圧下で濃縮するか、又は工程(H)で得られた2ccPAを含有する溶液を冷却することにより、結晶を析出させる工程
を含むことを特徴とする前記製造方法。
(In the formula, R 1 is the same as the above.)
A step of reacting a cyclic phosphonate ester represented by the formula with sodium halide in an organic solvent to obtain 2 ccPA, and step (I): reducing the solution containing 2 ccPA obtained in step (H) under reduced pressure. The above-mentioned production method, which comprises a step of precipitating crystals by concentrating the solution below or by cooling the solution containing 2 ccPA obtained in the step (H).

さらに、本発明の2ccPAの結晶の製造方法は、上記工程(H)及び工程(I)に加えて、下記工程(J)及び工程(K)を含んでいてもよい。 Furthermore, the method for producing a 2ccPA crystal of the present invention may include the following step (J) and step (K) in addition to the above step (H) and step (I).

工程(J):工程(H)及び(I)で得られた結晶を、水及び/又は有機溶媒に溶解する工程、及び
工程(K):工程(J)で得られた溶液に、貧溶媒を加えることにより、再結晶を行う工程
Step (J): a step of dissolving the crystals obtained in steps (H) and (I) in water and/or an organic solvent, and step (K): adding a poor solvent to the solution obtained in step (J) Recrystallization by adding

2−1.工程(H)
工程(H)は、下記反応式−2で示す工程である。
2-1. Process (H)
Step (H) is a step represented by the following reaction formula-2.

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。)
具体的に工程(H)は、一般式(9)で表される環状ホスホン酸エステルと、ハロゲン化ナトリウムとを、有機溶媒中で反応させて、式(1)で表される2ccPAを得る工程であり、該工程(H)では、2ccPAを含む溶液が得られる。
(In the formula, R 1 is the same as the above.)
Specifically, the step (H) is a step of reacting a cyclic phosphonate represented by the general formula (9) with sodium halide in an organic solvent to obtain 2ccPA represented by the formula (1). And in the step (H), a solution containing 2 ccPA is obtained.

工程(H)で用いられる上記一般式(9)で表される環状ホスホン酸エステルは、後述する製造工程を経て製造される。 The cyclic phosphonate ester represented by the general formula (9) used in the step (H) is produced through the production steps described below.

一般式(9)で表される環状ホスホン酸エステルにおいて、Rで示されるアルキル基としては、例えば、鎖状又は分岐状の炭素数1〜10アルキル基が挙げられ、具体的には、メチル、エチル、n−プロピル、イソプロピル、n−ブチル、イソブチル、s−ブチル、t−ブチル、n−ペンチル、n−ヘキシル、n−ヘプチル、n−オクチル、n−ノニル基等が挙げられる。好ましくは炭素数1〜6アルキル基であり、より好ましくは炭素数1〜4アルキル基であり、特に好ましくはメチル基、エチル基、及びイソプロピル基である。 In the cyclic phosphonate ester represented by the general formula (9), examples of the alkyl group represented by R 1 include a linear or branched alkyl group having 1 to 10 carbon atoms, and specifically, methyl group. , Ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl groups and the like. It is preferably an alkyl group having 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, and particularly preferably a methyl group, an ethyl group, and an isopropyl group.

上記アルキル基は、ハロゲン原子(例えば、フッ素、塩素、臭素等)、炭素数1〜6のアルコキシ基、ニトロ基等の置換基を1〜5個、好ましくは1〜3個有していてもよい。 The alkyl group may have 1 to 5, preferably 1 to 3 substituents such as a halogen atom (eg, fluorine, chlorine, bromine), an alkoxy group having 1 to 6 carbon atoms, and a nitro group. Good.

で示されるアリールアルキル基としては、例えば、炭素数7〜16のアリールアルキル基(アリール部分が炭素数6〜10であり、アルキル基部分が炭素数1〜6である)が挙げられ、具体的には、ベンジル;1−フェニルエチル、2−フェニルエチル;1−フェニルプロピル、2−フェニルプロピル、3−フェニルプロピル;1−フェニルブチル、2−フェニルブチル、3−フェニルブチル、4−フェニルブチル;ナフチルメチル等が挙げられる。好ましくは、炭素数7〜11アリールアルキル基であり、より好ましくは、炭素数7〜8アリールアルキル基であり、特に好ましくは、ベンジル基である。 Examples of the arylalkyl group represented by R 1 include an arylalkyl group having 7 to 16 carbon atoms (the aryl portion has 6 to 10 carbon atoms, and the alkyl group portion has 1 to 6 carbon atoms), Specifically, benzyl; 1-phenylethyl, 2-phenylethyl; 1-phenylpropyl, 2-phenylpropyl, 3-phenylpropyl; 1-phenylbutyl, 2-phenylbutyl, 3-phenylbutyl, 4-phenyl. Butyl; naphthylmethyl and the like. It is preferably an arylalkyl group having 7 to 11 carbon atoms, more preferably an arylalkyl group having 7 to 8 carbon atoms, and particularly preferably a benzyl group.

で示される上記アリールアルキル基を構成するアリール基は、例えば、ハロゲン原子(例えば、フッ素、塩素、臭素等)、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、ニトロ基等の置換基を1〜5個、好ましくは1〜3個有していてもよい。 The aryl group constituting the above arylalkyl group represented by R 1 is, for example, a halogen atom (for example, fluorine, chlorine, bromine, etc.), an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, nitro. It may have 1 to 5, preferably 1 to 3 substituents such as groups.

で示される上記アリール基としては、例えば、単環又は2環以上のアリール基が挙げられ、具体的にはフェニル基、ナフチル基、アンスリル基、フェナンスリル基等が挙げられる。このうち好ましくは置換基を有していてもよいフェニル基である。該アリール基は、例えば、ハロゲン原子(例えば、フッ素、塩素、臭素等)、炭素数1〜6のアルキル基、炭素数1〜6のアルコキシ基、ニトロ基等の置換基を1〜5個、好ましくは1〜3個有していてもよい。 Examples of the aryl group represented by R 1 include a monocyclic or bicyclic or more aryl group, and specific examples include a phenyl group, a naphthyl group, an anthryl group, a phenanthryl group, and the like. Of these, a phenyl group which may have a substituent is preferable. The aryl group is, for example, a halogen atom (for example, fluorine, chlorine, bromine, etc.), an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, 1 to 5 substituents such as a nitro group, Preferably, it may have 1 to 3.

工程(H)で用いられるハロゲン化ナトリウムとしては、公知のものを広く使用でき、例えば、フッ化ナトリウム、塩化ナトリウム、臭化ナトリウム、ヨウ化ナトリウム等が挙げられる。これらの中でも、好ましくは、ヨウ化ナトリウムである。ハロゲン化ナトリウムは、1種単独又は2種以上混合して使用することができる。 As the sodium halide used in the step (H), known ones can be widely used, and examples thereof include sodium fluoride, sodium chloride, sodium bromide and sodium iodide. Among these, sodium iodide is preferable. The sodium halide may be used alone or in combination of two or more.

当該ハロゲン化ナトリウムの使用量は、上記一般式(9)で表される化合物1モルに対して、通常1〜5モルであり、好ましくは1〜3モルであり、より好ましくは1〜1.5モルである。 The amount of the sodium halide used is usually 1 to 5 mol, preferably 1 to 3 mol, and more preferably 1 to 1. 1 mol based on 1 mol of the compound represented by the general formula (9). It is 5 mol.

工程(H)で用いられる有機溶媒としては、本反応に悪影響を与えない溶媒であれば特に限定はない。用いられる有機溶媒としては、例えば、ケトン系溶媒(分岐または直鎖状ケトン及び環状ケトン、例えば、アセトン、メチルエチルケトン、メチルブチルケトン、メチルイソブチルケトン、DIBK(ジイソブチルケトン)、シクロヘキサノン等)、アルコール系溶媒(例えば、メタノール、エタノール等)、エーテル系溶媒(ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン(THF)、1,4−ジオキサン等)、芳香族炭化水素系溶媒(例えば、ベンゼン、トルエン、キシレン等)、脂肪族若しくは脂環式炭化水素系溶媒(n−ペンタン、n−ヘキサン、シクロヘキサン、石油エーテル等)、エステル系溶媒(酢酸エチル等)、ハロゲン化炭化水素系溶媒(塩化メチレン、クロロホルム、1,2−ジクロロエチレン等)等が挙げられる。有機溶媒は、1種単独又は2種以上を組み合わせて用いることができる。これら有機溶媒のうち、ケトン系溶媒が好ましく、特にアセトン、メチルエチルケトン及びメチルイソブチルケトンが好ましい。 The organic solvent used in step (H) is not particularly limited as long as it does not adversely affect the reaction. Examples of the organic solvent used include ketone solvents (branched or linear ketones and cyclic ketones such as acetone, methyl ethyl ketone, methyl butyl ketone, methyl isobutyl ketone, DIBK (diisobutyl ketone), cyclohexanone), alcohol solvents (Eg, methanol, ethanol, etc.), ether solvent (diethyl ether, diisopropyl ether, tetrahydrofuran (THF), 1,4-dioxane, etc.), aromatic hydrocarbon solvent (eg, benzene, toluene, xylene, etc.), fat Group or alicyclic hydrocarbon solvents (n-pentane, n-hexane, cyclohexane, petroleum ether, etc.), ester solvents (ethyl acetate, etc.), halogenated hydrocarbon solvents (methylene chloride, chloroform, 1,2- Dichloroethylene etc.) and the like. The organic solvent may be used alone or in combination of two or more. Among these organic solvents, ketone solvents are preferable, and acetone, methyl ethyl ketone and methyl isobutyl ketone are particularly preferable.

有機溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、一般式(9)で表される化合物1モルに対して、一般に2〜20リットル、好ましくは2〜5リットルである。 The amount of the organic solvent used can be appropriately selected from a wide range, and is generally 2 to 20 liters, preferably 2 to 5 liters, relative to 1 mol of the compound represented by the general formula (9). is there.

工程(H)は、窒素、アルゴン等の不活性ガスの雰囲気下で行なってもよい。 The step (H) may be performed in an atmosphere of an inert gas such as nitrogen or argon.

反応圧力は、特に制限はなく、常圧下、又は加圧下で実施できる。 The reaction pressure is not particularly limited and can be carried out under normal pressure or under pressure.

反応温度は、通常0〜120℃であり、好ましくは50〜120℃であり、より好ましくは70〜120℃である。 The reaction temperature is usually 0 to 120°C, preferably 50 to 120°C, more preferably 70 to 120°C.

反応時間は、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは1〜24時間である。 The reaction time is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 1 to 24 hours.

反応終了後、得られる反応混合物から、過剰の試薬(例えば、ハロゲン化ナトリウム)、未反応の原料化合物等を、濃縮、晶析、ろ過等の通常の分離方法により除去し、目的とする一般式(1)で表される2ccPAを取り出すことができる。 After completion of the reaction, excess reagents (for example, sodium halide), unreacted raw material compounds and the like are removed from the resulting reaction mixture by a usual separation method such as concentration, crystallization and filtration to obtain the desired general formula. 2 ccPA represented by (1) can be taken out.

2−2.工程(I)
工程(I)は、工程(H)で得られた2ccPAを含有する溶液を減圧下で濃縮するか、又は工程(H)で得られた2ccPAを含有する溶液を冷却することにより、結晶を析出させる工程である。
2-2. Process (I)
In step (I), crystals are precipitated by concentrating the solution containing 2ccPA obtained in step (H) under reduced pressure or cooling the solution containing 2ccPA obtained in step (H). It is the process of making.

工程(I)における減圧は、結晶が析出する圧力であれば、特に制限はなく、通常大気圧未満であればよい。 The depressurization in step (I) is not particularly limited as long as it is a pressure at which crystals are precipitated, and is usually less than atmospheric pressure.

工程(I)における冷却温度は、結晶を析出させる温度であれば特に制限なく、通常、工程(H)の反応後、その溶液の温度より低い温度であり、好ましくは0〜30℃であり、10〜25℃が好ましい。 The cooling temperature in the step (I) is not particularly limited as long as it is a temperature for precipitating crystals, and is usually lower than the temperature of the solution after the reaction in the step (H), preferably 0 to 30° C., 10-25 degreeC is preferable.

冷却時間は、特に制限はなく、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは1〜2時間である。 The cooling time is not particularly limited and is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 1 to 2 hours.

得られた結晶を次に工程(J)に用いることができる。 The crystals obtained can then be used in step (J).

2−3.工程(J)
工程(J)は、工程(H)及び(I)で得られた結晶を、水及び/又は有機溶媒に溶解して溶液を得る工程である。
2-3. Process (J)
Step (J) is a step of dissolving the crystals obtained in steps (H) and (I) in water and/or an organic solvent to obtain a solution.

工程(J)で用いられる水及び/又は有機溶媒は、工程(I)で得られた結晶を溶解することができる水及び/又は有機溶媒であればよい。該有機溶媒としては、例えば、アルコール系溶媒が挙げられ、特にメタノール、エタノール、1−プロパノール、イソプロピルアルコール、又は1−ブタノールが好ましい。 The water and/or organic solvent used in step (J) may be water and/or an organic solvent capable of dissolving the crystals obtained in step (I). Examples of the organic solvent include alcohol solvents, with methanol, ethanol, 1-propanol, isopropyl alcohol, and 1-butanol being particularly preferable.

水及び/又は有機溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、2ccPA 1モルに対して、一般に0.5〜20リットル、好ましくは0.5〜2リットルである。 The amount of water and/or the organic solvent used can be appropriately selected from a wide range, and for example, is generally 0.5 to 20 liters, preferably 0.5 to 2 liters, relative to 1 mol of 2 ccPA. ..

水及び有機溶媒の混合溶媒を使用する場合、その配合比率は特に制限はなく、水と有機溶媒との配合比率は、1:99〜99:1が好ましく、30:70〜70:30がより好ましい。 When a mixed solvent of water and an organic solvent is used, the mixing ratio thereof is not particularly limited, and the mixing ratio of water and the organic solvent is preferably 1:99 to 99:1, more preferably 30:70 to 70:30. preferable.

溶解させる温度は、特に限定はなく、通常0〜100℃であり、好ましくは10〜80℃であり、より好ましくは20〜60℃である。 The temperature for dissolution is not particularly limited and is usually 0 to 100°C, preferably 10 to 80°C, and more preferably 20 to 60°C.

工程(J)の時間は、特に限定はなく、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは1〜2時間である。 The time of the step (J) is not particularly limited and is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 1 to 2 hours.

2−4.工程(K)
工程(K)は、工程(J)で得られた溶液に、貧溶媒を加えることにより、再結晶を行う工程である。
2-4. Process (K)
Step (K) is a step of performing recrystallization by adding a poor solvent to the solution obtained in step (J).

工程(K)で用いられる貧溶媒としては、工程(J)で得られた溶液から結晶を析出させることができる溶媒であればよい。具体的に、該貧溶媒としては、工程(J)で用いる溶媒(良溶媒)より貧溶媒であればよく、例えば、ケトン系溶媒(例えば、アセトン、メチルエチルケトン、メチルイソブチルケトン等)、エーテル系溶媒(ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン(THF)、1,4−ジオキサン等)、芳香族炭化水素系溶媒(例えば、ベンゼン、トルエン、キシレン等)、脂肪族若しくは脂環式炭化水素系溶媒(n−ペンタン、n−ヘキサン、シクロヘキサン、石油エーテル等)、エステル系溶媒(酢酸メチル、酢酸エチル、酢酸イソプロピル、酢酸ブチル等)、ハロゲン化炭化水素系溶媒(塩化メチレン、クロロホルム、1,2−ジクロロエチレン等)、炭素数3以上のアルコール系溶媒(例えば、1−プロパノール)等が挙げられる。 The poor solvent used in the step (K) may be any solvent capable of precipitating crystals from the solution obtained in the step (J). Specifically, the poor solvent may be a poorer solvent than the solvent (good solvent) used in the step (J), and examples thereof include a ketone solvent (eg, acetone, methyl ethyl ketone, methyl isobutyl ketone, etc.), an ether solvent. (Diethyl ether, diisopropyl ether, tetrahydrofuran (THF), 1,4-dioxane, etc.), aromatic hydrocarbon solvent (eg, benzene, toluene, xylene, etc.), aliphatic or alicyclic hydrocarbon solvent (n- Pentane, n-hexane, cyclohexane, petroleum ether, etc., ester solvents (methyl acetate, ethyl acetate, isopropyl acetate, butyl acetate, etc.), halogenated hydrocarbon solvents (methylene chloride, chloroform, 1,2-dichloroethylene, etc.) , An alcohol solvent having 3 or more carbon atoms (for example, 1-propanol), and the like.

また、この工程(K)で用いる溶媒は、工程(J)で用いる溶媒(良溶媒)より貧溶媒であればよく、例えば、工程(K)で用いる溶媒がメタノールの場合、該貧溶媒として、炭素数3以上のアルコール系溶媒(例えば、1−プロパノール)を使用することができる。有機溶媒は、1種単独又は2種以上を組み合わせて用いることができる。これら有機溶媒のうち、ケトン系溶媒が好ましく、特にアセトン、メチルエチルケトン及びメチルイソブチルケトンが好ましい。 Further, the solvent used in this step (K) may be a poorer solvent than the solvent (good solvent) used in the step (J). For example, when the solvent used in the step (K) is methanol, the poor solvent may be: An alcohol solvent having 3 or more carbon atoms (for example, 1-propanol) can be used. The organic solvent may be used alone or in combination of two or more. Among these organic solvents, ketone solvents are preferable, and acetone, methyl ethyl ketone and methyl isobutyl ketone are particularly preferable.

貧溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、2ccPA 1モルに対して、一般に1〜30リットル、好ましくは2〜5リットルである。 The amount of the poor solvent used can be appropriately selected from a wide range and is, for example, generally 1 to 30 liters, preferably 2 to 5 liters, relative to 1 mol of 2 ccPA.

貧溶媒を加える時の温度は、通常−20℃〜30℃であり、好ましくは−10℃〜20℃であり、より好ましくは0℃〜20℃である。 The temperature at which the poor solvent is added is usually -20°C to 30°C, preferably -10°C to 20°C, and more preferably 0°C to 20°C.

上記工程(H)及び工程(I)を含む製造方法により得られる、又は上記工程(H)〜工程(K)を含む製造方法により得られる、環状ホスホン酸ナトリウム塩(2ccPA)の結晶は、高純度であり、かつ保存安定性に優れるという利点を有する。 Crystals of cyclic phosphonic acid sodium salt (2 ccPA) obtained by the production method including the above step (H) and step (I) or obtained by the production method including the above steps (H) to (K) have a high It has the advantages of purity and excellent storage stability.

3.一般式(9)で表される環状ホスホン酸エステルの製造方法
本発明における一般式(9)で表される環状ホスホン酸エステルは、下記反応式−3に示す工程を経て製造できる。
3. Method for producing cyclic phosphonate represented by general formula (9) The cyclic phosphonate represented by general formula (9) in the present invention can be produced through the steps shown in the following reaction formula-3.

Figure 2020109131
Figure 2020109131

(式中、R、R、R、及びXは、前記と同じ。)
上記工程(A)から工程(G)について、以下詳細に説明する。
(In the formula, R 1 , R 2 , R 3 , and X are the same as above.)
The steps (A) to (G) will be described in detail below.

3−1.工程(A):(アセタール保護工程)
工程(A)は、下記反応式−4で示す工程である。
3-1. Step (A): (Acetal protection step)
The step (A) is a step represented by the following reaction formula-4.

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。)
具体的に工程(A)は、上記式(2)で表される2−ヒドロキシメチル−1,3−プロパンジオールと、ケトン化合物又はアセタール化合物とを、酸の存在下で反応させて、一般式(3)で表される環状アセタール化合物を製造する工程(アセタール保護工程)である。
(In the formula, R 2 is the same as the above.)
Specifically, in the step (A), 2-hydroxymethyl-1,3-propanediol represented by the above formula (2) is reacted with a ketone compound or an acetal compound in the presence of an acid to give a compound represented by the general formula: It is a step of producing the cyclic acetal compound represented by (3) (acetal protection step).

工程(A)で用いられるケトン化合物としては、ケト基を有する有機化合物であれば特に制限はない。該ケトン化合物としては、例えば、下記一般式(10)で表されるケトン化合物が挙げられる。 The ketone compound used in the step (A) is not particularly limited as long as it is an organic compound having a keto group. Examples of the ketone compound include a ketone compound represented by the following general formula (10).

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。2つのRは、互いに結合してアルキレン基を形成してもよく、該アルキレン基はさらに置換基を有していてもよい。)
工程(A)で用いられるアセタール化合物としては、特に制限はなく、例えば、下記一般式(11)で表されるアセタール化合物が挙げられる。
(In the formula, R 2 is the same as the above. Two R 2 may combine with each other to form an alkylene group, and the alkylene group may further have a substituent.)
The acetal compound used in the step (A) is not particularly limited, and examples thereof include an acetal compound represented by the following general formula (11).

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。2つのRは、互いに結合してアルキレン基を形成してもよく、該アルキレン基はさらに置換基を有していてもよい。2つのRは、同一又は異なって、アルキル基を示す。)
一般式(10)で表されるケトン化合物又は一般式(11)で表されるアセタール化合物において、Rで示されるアルキル基としては、例えば、鎖状又は分岐状の炭素数1〜10アルキル基が挙げられ、具体的には、メチル、エチル、n−プロピル、イソプロピル、n−ブチル、イソブチル、s−ブチル、t−ブチル、n−ペンチル、n−ヘキシル、n−ヘプチル、n−オクチル、n−ノニル基等が挙げられる。好ましくは炭素数1〜6アルキル基であり、より好ましくは炭素数1〜4アルキル基であり、特に好ましくはメチル基、エチル基、及びイソプロピル基である。該アルキル基は、例えば、ハロゲン原子(例えば、フッ素、塩素、臭素等)、アリール基(例えば、フェニル基、ナフチル基等)、カルボキシル基等の置換基を1〜5個、好ましくは1〜3個有していてもよい。
(In the formula, R 2 is the same as the above. Two R 2 may combine with each other to form an alkylene group, and the alkylene group may further have a substituent. Two R 4 Are the same or different and each represents an alkyl group.)
In the ketone compound represented by the general formula (10) or the acetal compound represented by the general formula (11), the alkyl group represented by R 2 is, for example, a chain or branched alkyl group having 1 to 10 carbon atoms. And specifically, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n. -Nonyl group etc. are mentioned. It is preferably an alkyl group having 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, and particularly preferably a methyl group, an ethyl group, and an isopropyl group. The alkyl group has, for example, 1 to 5, preferably 1 to 3 substituents such as a halogen atom (eg, fluorine, chlorine, bromine, etc.), an aryl group (eg, phenyl group, naphthyl group, etc.) and a carboxyl group. You may have one.

一般式(10)で表されるケトン化合物又は一般式(11)で表されるアセタール化合物において、Rで示される置換基を有していてもよいシクロアルキル基におけるシクロアルキル基としては、例えば、炭素数3〜10のシクロアルキル基が挙げられ、具体的には、シクロプロピル、シクロブチル、シクロペンチル、シクロヘキシル、シクロヘプチル、シクロオクチル基等が挙げられる。好ましくは炭素数3〜7シクロアルキル基であり、より好ましくは炭素数5〜7シクロアルキル基であり、特に好ましくはシクロヘキシル基である。該シクロアルキル基は、例えば、ハロゲン原子(例えば、フッ素、塩素、臭素等)、アルキル基(炭素数1〜6のアルキル基)、アリール基(例えば、フェニル基、ナフチル基等)、カルボキシル基等の置換基を1〜5個、好ましくは1〜3個有していてもよい。 In the ketone compound represented by the general formula (10) or the acetal compound represented by the general formula (11), the cycloalkyl group in the cycloalkyl group which may have a substituent represented by R 2 is, for example, And a cycloalkyl group having 3 to 10 carbon atoms, and specific examples thereof include a cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl group. A cycloalkyl group having 3 to 7 carbon atoms is preferable, a cycloalkyl group having 5 to 7 carbon atoms is more preferable, and a cyclohexyl group is particularly preferable. The cycloalkyl group is, for example, a halogen atom (eg, fluorine, chlorine, bromine, etc.), an alkyl group (alkyl group having 1 to 6 carbon atoms), an aryl group (eg, phenyl group, naphthyl group, etc.), a carboxyl group, etc. It may have 1 to 5, preferably 1 to 3 substituents.

一般式(10)で表されるケトン化合物又は一般式(11)で表されるアセタール化合物において、Rで示される置換基を有していてもよいアリール基におけるアリール基としては、例えば、単環又は2環以上のアリール基が挙げられ、具体的にはフェニル基、ナフチル基、アンスリル基、フェナンスリル基等が挙げられる。このうち好ましくは置換基を有していてもよいフェニル基である。該アリール基は、例えば、ハロゲン原子(例えば、フッ素、塩素、臭素等)、アルキル基(炭素数1〜6のアルキル基)、カルボキシル基等の置換基を1〜5個、好ましくは1〜3個有していてもよい。 In the ketone compound represented by the general formula (10) or the acetal compound represented by the general formula (11), the aryl group in the aryl group which may have a substituent represented by R 2 is, for example, a single group. Examples thereof include a ring or an aryl group having two or more rings, and specific examples thereof include a phenyl group, a naphthyl group, an anthryl group, and a phenanthryl group. Of these, a phenyl group which may have a substituent is preferable. The aryl group has, for example, 1 to 5, preferably 1 to 3 substituents such as a halogen atom (for example, fluorine, chlorine, bromine, etc.), an alkyl group (alkyl group having 1 to 6 carbon atoms), a carboxyl group and the like. You may have one.

上記一般式(10)又は(11)において、2つのRは、互いに結合してアルキレン基を形成していてもよく、該アルキレン基は置換基を有していてもよい。2つのRが、互いに結合してアルキレン基を形成する場合、該アルキレン基としては、例えば、−(CH−(qは、1〜6の整数)、−(CH=CH)−(rは、1、2又は3を示す)、−CH=CH−(CH−(sは、1、2又は3を示す)等が挙げられる。 In the general formula (10) or (11), two R 2 s may be bonded to each other to form an alkylene group, and the alkylene group may have a substituent. When two R 2 s are bonded to each other to form an alkylene group, examples of the alkylene group include —(CH 2 ) q — (q is an integer of 1 to 6) and —(CH═CH) r. - (r denotes 1, 2 or 3), - CH = CH- ( CH 2) s - (s shows 1, 2 or 3), and the like.

該アルキレン基は、置換基を有していてもよく、該置換基としては、例えば、アルキル基(例えば、炭素数1〜6アルキル基)、アリール基(例えば、フェニル基、ナフチル基)、オキソ基(=O)、ハロゲン原子(例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子)等が挙げられる。2価の炭化水素基上には、これらからなる群より選ばれる1〜5個の置換基を有していてもよい。 The alkylene group may have a substituent, and examples of the substituent include an alkyl group (for example, an alkyl group having 1 to 6 carbon atoms), an aryl group (for example, a phenyl group, a naphthyl group), and an oxo group. A group (=O), a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom) and the like can be mentioned. The divalent hydrocarbon group may have 1 to 5 substituents selected from the group consisting of these.

一般式(11)で表されるアセタール化合物において、Rで示されるアルキル基としては、例えば、鎖状又は分岐状の炭素数1〜10アルキル基が挙げられ、具体的には、メチル、エチル、n−プロピル、イソプロピル、n−ブチル、イソブチル、s−ブチル、t−ブチル、n−ペンチル、n−ヘキシル、n−ヘプチル、n−オクチル、n−ノニル基等が挙げられる。好ましくは炭素数1〜6アルキル基であり、より好ましくは炭素数1〜4アルキル基であり、特に好ましくはメチル基、エチル基、及びイソプロピル基である。該アルキル基は、例えば、ハロゲン原子(例えば、フッ素、塩素、臭素等)、アリール基(例えば、フェニル基、ナフチル基等)、カルボキシル基等の置換基を1〜5個、好ましくは1〜3個有していてもよい。 In the acetal compound represented by the general formula (11), examples of the alkyl group represented by R 4 include a linear or branched alkyl group having 1 to 10 carbon atoms, and specifically, methyl and ethyl. , N-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl group and the like. It is preferably an alkyl group having 1 to 6 carbon atoms, more preferably an alkyl group having 1 to 4 carbon atoms, and particularly preferably a methyl group, an ethyl group, and an isopropyl group. The alkyl group has, for example, 1 to 5, preferably 1 to 3 substituents such as a halogen atom (eg, fluorine, chlorine, bromine, etc.), an aryl group (eg, phenyl group, naphthyl group, etc.) and a carboxyl group. You may have one.

工程(A)で用いられるケトン化合物として具体的には、例えば、アセトン、2−ブタノン(メチルエチルケトン)、2−ペンタノン、3−ペンタノン、4−メチル−2−ペンタノン、メチルイソプロピルケトン、メチルイソブチルケトン、2−ヘキサノン、3−ヘキサノン、2−ヘプタノン、3−ヘプタノン、2−オクタノン、3−オクタノン、2−ノナノン、2−デカノン、4−デカノン、2−ウンデカノン、6−ウンデカノン等の炭素数3〜20の鎖状脂肪族ケトン化合物;2−メチルシクロヘキサノン、3−メチルシクロヘキサノン、3−メチルシクロペンタノン、4−アセチル−1−メチルシクロヘキセン等の炭素数6〜20の環状脂肪族ケトン化合物;アセトフェノン、1−(4−クロロフェニル)−1−エタノン、1−(2−クロロフェニル)−1−エタノン、1−(4−フルオロフェニル)−1−エタノン、1−(2−フルオロフェニル)−1−エタノン、1−(4−メチルフェニル)−1−エタノン、1−(2−メチルフェニル)−1−エタノン、1−(4−ニトロフェニル)−1−エタノン、1−(4−tert−ブチルフェニル)−1−エタノン、1−(4−メトキシフェニル)−1−エタノン、1−(4−アリルオキシカルボニルフェニル)−1−エタノン、1−フェニル−2−プロパノン、4−オキソ−4−フェニルブタン酸メチル、4−オキソ−4−フェニルブタン酸エチル、1−フェニル−2−ブタノン、4−フェニル−2−ブタノン、2−フェニルシクロペンタノン、2−フェニルシクロヘプタノン、9−アセチルアントラセン、2−アセチルビフェニル、4−アセチルビフェニル、2−アセチルナフタレン、2−アセチルフェナントレン、3−アセチルフェナントレン、9−アセチルフェナントレン等の炭素数6〜20の芳香族ケトン化合物;2−アセチル−5−ノルボルネン等のアラルキルケトン化合物等を挙げることができる。 Specific examples of the ketone compound used in the step (A) include acetone, 2-butanone (methyl ethyl ketone), 2-pentanone, 3-pentanone, 4-methyl-2-pentanone, methyl isopropyl ketone, methyl isobutyl ketone, 2-hexanone, 3-hexanone, 2-heptanone, 3-heptanone, 2-octanone, 3-octanone, 2-nonanone, 2-decanone, 4-decanone, 2-undecanone, 6-undecanone and the like having 3 to 20 carbon atoms. A chain aliphatic ketone compound having 6 to 20 carbon atoms such as 2-methylcyclohexanone, 3-methylcyclohexanone, 3-methylcyclopentanone and 4-acetyl-1-methylcyclohexene; acetophenone; -(4-chlorophenyl)-1-ethanone, 1-(2-chlorophenyl)-1-ethanone, 1-(4-fluorophenyl)-1-ethanone, 1-(2-fluorophenyl)-1-ethanone, 1 -(4-Methylphenyl)-1-ethanone, 1-(2-methylphenyl)-1-ethanone, 1-(4-nitrophenyl)-1-ethanone, 1-(4-tert-butylphenyl)-1 -Ethanone, 1-(4-methoxyphenyl)-1-ethanone, 1-(4-allyloxycarbonylphenyl)-1-ethanone, 1-phenyl-2-propanone, methyl 4-oxo-4-phenylbutanoate, Ethyl 4-oxo-4-phenylbutanoate, 1-phenyl-2-butanone, 4-phenyl-2-butanone, 2-phenylcyclopentanone, 2-phenylcycloheptanone, 9-acetylanthracene, 2-acetylbiphenyl Aromatic ketone compounds having 6 to 20 carbon atoms such as 4-acetylbiphenyl, 2-acetylnaphthalene, 2-acetylphenanthrene, 3-acetylphenanthrene, and 9-acetylphenanthrene; aralkylketone compounds such as 2-acetyl-5-norbornene Etc. can be mentioned.

これらの化合物の中でも、アセトン、2−ペンタノン、3−ペンタノン、メチルエチルケトン、メチルイソプロピルケトン、メチルイソブチルケトン、シクロブタノン、シクロペンタノン、シクロヘキサノン等が挙げられる。特に、アセトン、メチルエチルケトン、及びメチルイソブチルケトンが好ましい。 Among these compounds, acetone, 2-pentanone, 3-pentanone, methyl ethyl ketone, methyl isopropyl ketone, methyl isobutyl ketone, cyclobutanone, cyclopentanone, cyclohexanone and the like can be mentioned. Particularly, acetone, methyl ethyl ketone, and methyl isobutyl ketone are preferable.

本発明で用いられるアセタール化合物として具体的には、例えば、2, 2−ジメトキシプロパン、2, 2−ジエトキシプロパン、2, 2−ジプロポキシプロパン、2, 2−ジブトキシプロパン、1, 1−ジメトキシシクロへキサン、1, 1−ジメチルシクロペンタン、ベンゾフェノンジメチルアセタール、2, 2−ジメチル−1,3−ジオキソラン、4, 4−ジメトキシヘプタン、5, 5−ジメトキシノナン、4, 4−ジエトキシヘプタン、5, 5−ジエトキシノナン等が挙げられる。特に、2, 2−ジメトキシプロパン、2, 2−ジプロポキシプロパン、2, 2−ジブトキシプロパン、及びベンゾフェノンジメチルアセタールが好ましい。 Specific examples of the acetal compound used in the present invention include 2,2-dimethoxypropane, 2,2-diethoxypropane, 2,2-dipropoxypropane, 2,2-dibutoxypropane, 1,1- Dimethoxycyclohexane, 1,1-dimethylcyclopentane, benzophenone dimethylacetal, 2,2-dimethyl-1,3-dioxolane, 4,4-dimethoxyheptane, 5,5-dimethoxynonane, 4,4-diethoxyheptane Examples include 5,5-diethoxynonane and the like. Particularly, 2,2-dimethoxypropane, 2,2-dipropoxypropane, 2,2-dibutoxypropane, and benzophenone dimethyl acetal are preferable.

工程(A)で用いられる酸としては、公知の無機酸及び有機酸が挙げられる。無機酸としては、塩酸、硫酸等が挙げられる。有機酸としては、メタンスルホン酸、トリフロロメタンスルホン酸、ベンゼンスルホン酸、p-トルエンスルホン酸、ピリジンパラトルエンスルホネート等のスルホン酸化合物;酢酸等のカルボン酸化合物等が挙げられる。酸としては、特に塩酸、硫酸、p-トルエンスルホン酸、ピリジンパラトルエンスルホネート、酢酸等が好ましい。ここで、酢酸を使用する場合は、溶媒として兼用できる。 Examples of the acid used in the step (A) include known inorganic acids and organic acids. Examples of the inorganic acid include hydrochloric acid and sulfuric acid. Examples of the organic acid include sulfonic acid compounds such as methanesulfonic acid, trifluoromethanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid, pyridine paratoluenesulfonate, and carboxylic acid compounds such as acetic acid. As the acid, hydrochloric acid, sulfuric acid, p-toluenesulfonic acid, pyridine paratoluenesulfonate, acetic acid and the like are particularly preferable. Here, when acetic acid is used, it can also serve as a solvent.

酸の使用量としては、広い範囲内から適宜選択することができ、例えば、上記式(2)で表される2−ヒドロキシメチル−1,3−プロパンジオール1モルに対して、一般に0.01〜500モル、好ましくは0.01〜2モル、より好ましくは0.01〜1モルである。 The amount of the acid used can be appropriately selected from a wide range, and is generally 0.01 with respect to 1 mol of 2-hydroxymethyl-1,3-propanediol represented by the above formula (2). To 500 mol, preferably 0.01 to 2 mol, and more preferably 0.01 to 1 mol.

工程(A)は、無溶媒又は溶媒の存在下で実施される。溶媒を用いる場合、その溶媒としては、本反応に悪影響を与えない溶媒であれば特に限定はない。用いられる溶媒としては、例えば、アルコール系溶媒(例えば、メタノール、エタノール等)、エーテル系溶媒(ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン(THF)、1,4−ジオキサン等)、芳香族炭化水素系溶媒(例えば、ベンゼン、トルエン、キシレン等)、脂肪族若しくは脂環式炭化水素系溶媒(n−ペンタン、n−ヘキサン、シクロヘキサン、石油エーテル等)、エステル系溶媒(酢酸エチル等)、ハロゲン化炭化水素系溶媒(塩化メチレン、クロロホルム、1,2−ジクロロエチレン等)等が挙げられる。溶媒は、1種単独又は2種以上を組み合わせて用いることができる。これら溶媒のうち、メタノール、THF、1,4−ジオキサン及びトルエンが好ましく、特にTHFが好ましい。 Step (A) is carried out without solvent or in the presence of a solvent. When a solvent is used, the solvent is not particularly limited as long as it does not adversely affect the reaction. Examples of the solvent used include alcohol solvents (for example, methanol, ethanol, etc.), ether solvents (diethyl ether, diisopropyl ether, tetrahydrofuran (THF), 1,4-dioxane, etc.), aromatic hydrocarbon solvents ( For example, benzene, toluene, xylene, etc.), aliphatic or alicyclic hydrocarbon solvent (n-pentane, n-hexane, cyclohexane, petroleum ether, etc.), ester solvent (ethyl acetate, etc.), halogenated hydrocarbon solvent Examples thereof include solvents (methylene chloride, chloroform, 1,2-dichloroethylene, etc.). The solvent may be used alone or in combination of two or more. Of these solvents, methanol, THF, 1,4-dioxane and toluene are preferable, and THF is particularly preferable.

溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、一般式(2)で表される化合物1モルに対して、一般に0〜20リットル、好ましくは0〜5リットルである。 The amount of the solvent used can be appropriately selected from a wide range and is, for example, generally 0 to 20 liters, preferably 0 to 5 liters, relative to 1 mol of the compound represented by the general formula (2). ..

工程(A)は、窒素、アルゴン等の不活性ガスの雰囲気下で行うことができる。 Step (A) can be performed under an atmosphere of an inert gas such as nitrogen or argon.

反応圧力は、特に制限はなく、常圧下、又は加圧下で実施できる。 The reaction pressure is not particularly limited and can be carried out under normal pressure or under pressure.

反応温度は、通常0〜100℃であり、好ましくは10〜80℃であり、より好ましくは20〜80℃である。 The reaction temperature is generally 0 to 100°C, preferably 10 to 80°C, more preferably 20 to 80°C.

反応時間は、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは1〜10時間である。 The reaction time is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 1 to 10 hours.

反応終了後、得られる反応混合物から、過剰の試薬(ケトン化合物等)、未反応の原料化合物等を、分液、蒸留、カラム精製等の通常の分離方法により除去し、目的とする一般式(3)で表される環状アセタール化合物を取り出すことができる。また、反応終了後、濃縮のみ行い、精製及び単離工程を経ず、反応後の混合物をそのまま工程(B)に用いることもできる(テレスコーピング合成)。 After completion of the reaction, excess reagents (ketone compounds, etc.), unreacted raw material compounds, etc. are removed from the resulting reaction mixture by usual separation methods such as liquid separation, distillation, column purification, etc. The cyclic acetal compound represented by 3) can be taken out. Further, after the completion of the reaction, only concentration may be performed and the mixture after the reaction may be directly used in the step (B) without performing the purification and isolation steps (telescoping synthesis).

3−2.工程(B):(スルホニル化工程)
工程(B)は、下記反応式−5で示す工程である。
3-2. Step (B): (Sulfonylation Step)
Step (B) is a step represented by the following reaction formula-5.

Figure 2020109131
Figure 2020109131

(式中、R及びRは、前記と同じ。)
工程(B)は、上記一般式(3)で表される化合物と、スルホニルハライド化合物とを反応させて、一般式(4)で表される化合物を得る工程(スルホニル化工程)である。
(In the formula, R 2 and R 3 are the same as above.)
Step (B) is a step (sulfonylation step) of reacting the compound represented by the general formula (3) with a sulfonyl halide compound to obtain the compound represented by the general formula (4).

工程(B)としては、例えば、上記一般式(3)で表されるアルコール化合物と、スルホニルハライド化合物とを、有機溶媒中、塩基の存在下で反応させることで、一般式(4)で表されるスルホネート化合物を得る工程が挙げられる。スルホニル化合物として、例えば、メシルクロライドを用いる反応は、非特許文献2に記載の方法を参考にすることができる。 In the step (B), for example, by reacting the alcohol compound represented by the general formula (3) with a sulfonyl halide compound in the presence of a base in an organic solvent, the compound represented by the general formula (4) is represented. And a step of obtaining a sulfonate compound. For the reaction using, for example, mesyl chloride as a sulfonyl compound, the method described in Non-Patent Document 2 can be referred to.

工程(B)で用いられるスルホニルハライド化合物としては、メチルスルホニルクロリド、メチルスルホニルブロミド、メチルスルホニルヨージド等のアルキルスルホニルクロライド;フェニルスルホニルクロライド、トシルクライド等のアリールスルホニルクライド等が挙げられる。 Examples of the sulfonyl halide compound used in the step (B) include alkylsulfonyl chlorides such as methylsulfonyl chloride, methylsulfonyl bromide and methylsulfonyl iodide; arylsulfonyl chlorides such as phenylsulfonyl chloride and tosyl chloride.

スルホニルハライド化合物の使用量としては、広い範囲内から適宜選択することができ、例えば、上記式(3)で表されるメタノール化合物1モルに対して、一般に1〜500モル、好ましくは1〜10モル、より好ましくは1〜2モルである。 The amount of the sulfonyl halide compound used can be appropriately selected from a wide range, and is generally 1 to 500 mol, preferably 1 to 10 mol with respect to 1 mol of the methanol compound represented by the above formula (3). Mol, more preferably 1 to 2 mol.

工程(B)は、無溶媒又は溶媒の存在下で実施される。溶媒を用いる場合、その溶媒としては、本反応に悪影響を与えない溶媒であれば特に限定はない。用いられる溶媒としては、例えば、アルコール系溶媒(例えば、メタノール、エタノール等)、エーテル系溶媒(ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン(THF)、1,4−ジオキサン等)、芳香族炭化水素系溶媒(例えば、ベンゼン、トルエン、キシレン等)、脂肪族若しくは脂環式炭化水素系溶媒(n−ペンタン、n−ヘキサン、シクロヘキサン、石油エーテル等)、エステル系溶媒(酢酸エチル等)、ハロゲン化炭化水素系溶媒(塩化メチレン(MDC, DCM)、クロロホルム、1,2−ジクロロエチレン等)等が挙げられる。溶媒は、1種単独又は2種以上を組み合わせて用いることができる。これら溶媒のうち、THF、1,4−ジオキサン、トルエン及び塩化メチレンが好ましく、特に塩化メチレンが好ましい。 Step (B) is carried out without solvent or in the presence of a solvent. When a solvent is used, the solvent is not particularly limited as long as it does not adversely affect the reaction. Examples of the solvent used include alcohol solvents (for example, methanol, ethanol, etc.), ether solvents (diethyl ether, diisopropyl ether, tetrahydrofuran (THF), 1,4-dioxane, etc.), aromatic hydrocarbon solvents ( For example, benzene, toluene, xylene, etc.), aliphatic or alicyclic hydrocarbon solvent (n-pentane, n-hexane, cyclohexane, petroleum ether, etc.), ester solvent (ethyl acetate, etc.), halogenated hydrocarbon solvent Examples of the solvent include methylene chloride (MDC, DCM), chloroform, 1,2-dichloroethylene and the like. The solvent may be used alone or in combination of two or more. Of these solvents, THF, 1,4-dioxane, toluene and methylene chloride are preferable, and methylene chloride is particularly preferable.

溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、一般式(2)で表される化合物1モルに対して、一般に0〜20リットル、好ましくは1〜5リットルである。 The amount of the solvent used can be appropriately selected from a wide range and is, for example, generally 0 to 20 liters, preferably 1 to 5 liters, relative to 1 mol of the compound represented by the general formula (2). ..

工程(B)は、窒素、アルゴン等の不活性ガスの雰囲気下で行うことができる。 The step (B) can be performed under an atmosphere of an inert gas such as nitrogen or argon.

反応圧力は、特に制限はなく、常圧下、又は加圧下で実施できる。 The reaction pressure is not particularly limited and can be carried out under normal pressure or under pressure.

反応温度は、通常−40〜100℃であり、好ましくは−30〜80℃であり、より好ましくは−20〜20℃である。 The reaction temperature is generally -40 to 100°C, preferably -30 to 80°C, more preferably -20 to 20°C.

反応時間は、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは1〜4時間である。 The reaction time is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 1 to 4 hours.

反応終了後、得られる反応混合物から、過剰の試薬(スルホニルハライド化合物等)、未反応の原料化合物等を、分液、濃縮、カラム精製等の通常の分離方法により除去し、目的とする一般式(4)で表される環状アセタール化合物を取り出すことができる。また、反応終了後、分液及び濃縮のみ行い、精製及び単離工程を経ずに、反応後の混合物をそのまま工程(C)に用いることもできる(テレスコーピング合成)。 After completion of the reaction, excess reagents (sulfonyl halide compound, etc.), unreacted raw material compounds, etc. are removed from the resulting reaction mixture by usual separation methods such as liquid separation, concentration, column purification, etc. The cyclic acetal compound represented by (4) can be taken out. Further, after completion of the reaction, only liquid separation and concentration are performed, and the mixture after the reaction can be used as it is in the step (C) without performing the purification and isolation steps (telescoping synthesis).

3−3.工程(C):(ハロゲン化工程)
工程(C)は、下記反応式−6で示す工程である。
3-3. Process (C): (halogenation process)
Step (C) is a step represented by the following reaction formula-6.

Figure 2020109131
Figure 2020109131

(式中、R、R及びXは、前記と同じ。)
具体的に工程(C)は、上記一般式(4)で表される化合物と、アルカリ金属ハロゲン化物及び/又はアルカリ金属土類ハロゲン化物とを、塩基の存在下で反応させて、一般式(5)で表される化合物を得る工程(ハロゲン化工程)である。
(In the formula, R 2 , R 3 and X are the same as above.)
Specifically, in the step (C), the compound represented by the general formula (4) is reacted with an alkali metal halide and/or an alkali metal earth halide in the presence of a base to give a compound represented by the general formula ( This is a step (halogenation step) of obtaining the compound represented by 5).

工程(C)で用いられるアルカリ金属ハロゲン化物としては、特に制限なく、例えば、ハロゲン化リチウム(例えば、フッ化リチウム、塩化リチウム、臭化リチウム、ヨウ化リチウム等)、ハロゲン化ナトリウム(例えば、フッ化ナトリウム、塩化ナトリウム、臭化ナトリウム、ヨウ化ナトリウム等)、ハロゲン化カリウム(例えば、フッ化カリウム、塩化カリウム、臭化カリウム、ヨウ化カリウム等)、ハロゲン化セシウム(例えば、フッ化セシウム、塩化セシウム、臭化セシウム、ヨウ化セシウム等)等が挙げられる。これらの中でもヨウ化ナトリウムが好ましい。アルカリ金属ハロゲン化物は、1種単独又は2種以上を組み合わせて用いることができる。 The alkali metal halide used in the step (C) is not particularly limited, and examples thereof include lithium halide (eg, lithium fluoride, lithium chloride, lithium bromide, lithium iodide, etc.) and sodium halide (eg, fluorine). Sodium iodide, sodium chloride, sodium bromide, sodium iodide, etc., potassium halide (eg, potassium fluoride, potassium chloride, potassium bromide, potassium iodide, etc.), cesium halide (eg, cesium fluoride, chloride) Cesium, cesium bromide, cesium iodide, etc.) and the like. Among these, sodium iodide is preferable. The alkali metal halides can be used alone or in combination of two or more.

工程(C)で用いられるアルカリ金属土類ハロゲン化物としては、特に制限なく、例えば、ハロゲン化マグネシウム(例えば、フッ化マグネシウム、塩化マグネシウム、臭化マグネシウム、ヨウ化マグネシウム等)、ハロゲン化カルシウム(例えば、フッ化カルシウム、塩化カルシウム、臭化カルシウム、ヨウ化カルシウム等)、ハロゲン化ストロンチウム(例えば、フッ化ストロンチウム、塩化ストロンチウム、臭化ストロンチウム、ヨウ化ストロンチウム等)、ハロゲン化バリウム(例えば、フッ化バリウム、塩化バリウム、臭化バリウム、ヨウ化バリウム等)等が挙げられる。アルカリ金属土類ハロゲン化物は、1種単独又は2種以上を組み合わせて用いることができる。 The alkali metal earth halide used in the step (C) is not particularly limited, and examples thereof include magnesium halide (eg, magnesium fluoride, magnesium chloride, magnesium bromide, magnesium iodide, etc.) and calcium halide (eg, , Calcium fluoride, calcium chloride, calcium bromide, calcium iodide, etc., strontium halide (eg, strontium fluoride, strontium chloride, strontium bromide, strontium iodide, etc.), barium halide (eg, barium fluoride) , Barium chloride, barium bromide, barium iodide, etc.) and the like. The alkali metal earth halides may be used alone or in combination of two or more.

アルカリ金属ハロゲン化物及び/又はアルカリ金属土類ハロゲン化物の使用量としては、一般式(4)で表される化合物1モルに対して、通常は1モル以上、好ましくは1〜10モル、より好ましく1〜3モルである。 The amount of alkali metal halide and/or alkali metal earth halide used is usually 1 mol or more, preferably 1 to 10 mol, and more preferably 1 mol with respect to 1 mol of the compound represented by the general formula (4). It is 1 to 3 mol.

工程(C)で用いられる塩基としては、例えば、有機塩基及び無機塩基が挙げられる。 Examples of the base used in step (C) include organic bases and inorganic bases.

有機塩基としては、例えば、トリメチルアミン、トリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン等の炭素数1〜4のアルキル基を1〜3個、好ましくは3個有する有機アミンを挙げることができる。特に、トリエチルアミンが好ましい。 Examples of the organic base include organic amines having 1 to 3 and preferably 3 alkyl groups having 1 to 4 carbon atoms such as trimethylamine, triethylamine, tributylamine and diisopropylethylamine. In particular, triethylamine is preferable.

無機塩基としては、具体的には、炭酸水素ナトリウム、炭酸ナトリウム、炭酸水素カリウム、炭酸カリウム、炭酸カルシウム等のアルカリ金属及びアルカリ土類金属の炭酸塩を挙げることができる。特に、炭酸水素ナトリウムが好ましい。 Specific examples of the inorganic base include alkali metal and alkaline earth metal carbonates such as sodium hydrogen carbonate, sodium carbonate, potassium hydrogen carbonate, potassium carbonate and calcium carbonate. Particularly, sodium hydrogen carbonate is preferable.

塩基の使用量としては、触媒量でよく、例えば、上記一般式(4)で表されるスルホネート化合物に対して、通常は0.01モル以上、好ましくは0.01〜1モル、より好ましく0.05〜0.5モルである。 The amount of the base used may be a catalytic amount, and is usually 0.01 mol or more, preferably 0.01 to 1 mol, and more preferably 0, with respect to the sulfonate compound represented by the general formula (4). 0.05 to 0.5 mol.

工程(C)では、当該塩基を触媒量加えることにより、分解反応を防ぐことが可能となり、高収率で、一般式(5)で表されるハロゲン化合物を得ることができる。 In the step (C), the decomposition reaction can be prevented by adding a catalytic amount of the base, and the halogen compound represented by the general formula (5) can be obtained in high yield.

工程(C)は、無溶媒又は溶媒の存在下で実施される。溶媒を用いる場合、その溶媒としては、本反応に悪影響を与えない溶媒であれば特に限定はない。用いられる溶媒としては、例えば、ケトン系溶媒(例えば、アセトン、メチルエチルケトン、メチルイソブチルケトン等)、アルコール系溶媒(例えば、メタノール、エタノール等)、エーテル系溶媒(ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン(THF)、1,4−ジオキサン等)、芳香族炭化水素系溶媒(例えば、ベンゼン、トルエン、キシレン等)、脂肪族若しくは脂環式炭化水素系溶媒(n−ペンタン、n−ヘキサン、シクロヘキサン、石油エーテル等)、エステル系溶媒(酢酸エチル等)、ハロゲン化炭化水素系溶媒(塩化メチレン、クロロホルム、1,2−ジクロロエチレン等)等が挙げられる。溶媒は、1種単独又は2種以上を組み合わせて用いることができる。これら溶媒のうち、特に、アセトン、メチルエチルケトン及びメチルイソブチルケトンが好ましい。 Step (C) is carried out without solvent or in the presence of a solvent. When a solvent is used, the solvent is not particularly limited as long as it does not adversely affect the reaction. Examples of the solvent used include ketone solvents (eg, acetone, methyl ethyl ketone, methyl isobutyl ketone, etc.), alcohol solvents (eg, methanol, ethanol, etc.), ether solvents (diethyl ether, diisopropyl ether, tetrahydrofuran (THF)). , 1,4-dioxane, etc.), aromatic hydrocarbon solvents (eg, benzene, toluene, xylene, etc.), aliphatic or alicyclic hydrocarbon solvents (n-pentane, n-hexane, cyclohexane, petroleum ether, etc.) ), ester solvents (ethyl acetate, etc.), halogenated hydrocarbon solvents (methylene chloride, chloroform, 1,2-dichloroethylene, etc.) and the like. The solvent may be used alone or in combination of two or more. Of these solvents, acetone, methyl ethyl ketone and methyl isobutyl ketone are particularly preferable.

溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、一般式(4)で表される化合物1モルに対して、一般に0〜20リットル、好ましくは1〜5リットルである。 The amount of the solvent used can be appropriately selected from a wide range and is, for example, generally 0 to 20 liters, preferably 1 to 5 liters, relative to 1 mol of the compound represented by the general formula (4). ..

工程(C)は、窒素、アルゴン等の不活性ガスの雰囲気下で行うことができる。 Step (C) can be performed in an atmosphere of an inert gas such as nitrogen or argon.

反応圧力は、特に制限はなく、常圧下、又は加圧下で実施できる。 The reaction pressure is not particularly limited and can be carried out under normal pressure or under pressure.

反応温度は、通常0〜120℃であり、好ましくは10〜100℃であり、より好ましくは55〜80℃である。 The reaction temperature is generally 0 to 120°C, preferably 10 to 100°C, more preferably 55 to 80°C.

反応時間は、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは1〜18時間である。 The reaction time is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 1 to 18 hours.

本反応は、ハロゲン化反応において塩基を用いる新規な反応である。 This reaction is a novel reaction using a base in the halogenation reaction.

反応終了後、得られる反応混合物から、過剰の試薬(アルカリ金属ハロゲン化物、アルカリ金属土類、塩基等)、未反応の原料化合物等を、分液、濃縮、カラム精製等の通常の分離方法により除去し、目的とする一般式(5)で表される化合物を取り出すことができる。また、反応終了後、精製及び単離工程を経ず、反応後の混合物をそのまま工程(D)に用いることもできる(テレスコーピング合成)。 After completion of the reaction, excess reagents (alkali metal halide, alkali metal earth, base, etc.), unreacted raw material compounds, etc. are separated from the resulting reaction mixture by conventional separation methods such as liquid separation, concentration, column purification, etc. By removing, the desired compound represented by the general formula (5) can be taken out. Further, after the completion of the reaction, the mixture after the reaction can be used as it is in the step (D) without performing the purification and isolation steps (telescoping synthesis).

3−4.工程(B’):(別法ハロゲン化工程)
工程(B’)は、下記反応式−7で示す工程である。
3-4. Step (B'): (Alternative halogenation step)
Step (B′) is a step represented by the following reaction formula-7.

Figure 2020109131
Figure 2020109131

(式中、R及びXは、前記と同じ。)
具体的に工程(B’)は、上記一般式(3)で表される環状アセタール化合物と、ハロゲン化剤とを反応させる工程である。
(In the formula, R 2 and X are the same as above.)
Specifically, the step (B') is a step of reacting the cyclic acetal compound represented by the general formula (3) with a halogenating agent.

工程(B’)で用いられるハロゲン化剤としては、特に制限ない。例えば、塩素化の場合は、塩素、塩化チオニル、三塩化リン、五塩化リン、トリフェニルホスフィン−四塩化炭素、トリフェニルホスフィン−N−クロロスクシンイミド等が挙げられる。臭素化の場合は、臭素、臭化水素酸、三臭化リン、トリフェニルホスフィン−臭素、トリフェニルホスフィン−N−ブロモスクシンイミド、トリフェニルホスフィン−四臭化炭素、臭化チオニル等が挙げられる。ヨウ素化の場合は、ヨウ素、トリフェニルホスフィン−ヨウ素、トリフェニルホスフィン−N−ヨードスクシンイミド等が挙げられる。これらの中でも、トリフェニルホスフィン−ヨウ素又はトリフェニルホスフィン−四臭化炭素が好ましい。 The halogenating agent used in step (B') is not particularly limited. For example, in the case of chlorination, chlorine, thionyl chloride, phosphorus trichloride, phosphorus pentachloride, triphenylphosphine-carbon tetrachloride, triphenylphosphine-N-chlorosuccinimide and the like can be mentioned. In the case of bromination, bromine, hydrobromic acid, phosphorus tribromide, triphenylphosphine-bromine, triphenylphosphine-N-bromosuccinimide, triphenylphosphine-carbon tetrabromide, thionyl bromide and the like can be mentioned. In the case of iodination, iodine, triphenylphosphine-iodine, triphenylphosphine-N-iodosuccinimide and the like can be mentioned. Among these, triphenylphosphine-iodine or triphenylphosphine-carbon tetrabromide is preferable.

ハロゲン化剤の使用量としては、一般式(3)で表されるアルコール化合物1モルに対して、通常は1〜500モルであり、好ましくは1〜10モル、より好ましく1〜2モルである。 The amount of the halogenating agent used is usually 1 to 500 mol, preferably 1 to 10 mol, and more preferably 1 to 2 mol with respect to 1 mol of the alcohol compound represented by the general formula (3). ..

工程(B’)は、反応で生じる酸を捕捉するために、イミダゾールの存在下で反応させることができる。 Step (B') can be reacted in the presence of imidazole to scavenge the acid generated in the reaction.

イミダゾールの使用量としては、例えば、上記一般式(3)で表される環状アセタール化合物に対して、通常は1〜500モルであり、好ましくは1〜10モル、より好ましく1〜2モルである。 The amount of imidazole used is, for example, usually 1 to 500 mol, preferably 1 to 10 mol, and more preferably 1 to 2 mol, based on the cyclic acetal compound represented by the general formula (3). ..

工程(B’)は、無溶媒又は溶媒の存在下で実施される。溶媒を用いる場合、その溶媒としては、本反応に悪影響を与えない溶媒であれば特に限定はない。用いられる溶媒としては、例えば、ケトン系溶媒(例えば、アセトン、メチルエチルケトン、メチルイソブチルケトン等)、アルコール系溶媒(例えば、メタノール、エタノール等)、エーテル系溶媒(ジエチルエーテル、ジイソプロピルエーテル、シクロペンチルメチルエーテル(CPME)、テトラヒドロフラン(THF)、1,4−ジオキサン等)、芳香族炭化水素系溶媒(例えば、ベンゼン、トルエン、キシレン等)、脂肪族若しくは脂環式炭化水素系溶媒(n−ペンタン、n−ヘキサン、シクロヘキサン、石油エーテル等)、エステル系溶媒(酢酸エチル等)、ハロゲン化炭化水素系溶媒(塩化メチレン、クロロホルム、1,2−ジクロロエチレン等)等が挙げられる。溶媒は、1種単独又は2種以上を組み合わせて用いることができる。これら溶媒のうち、特に、アセトン、メチルエチルケトン及びメチルイソブチルケトンが好ましい。 Step (B') is carried out without solvent or in the presence of a solvent. When a solvent is used, the solvent is not particularly limited as long as it does not adversely affect the reaction. Examples of the solvent used include ketone solvents (eg, acetone, methyl ethyl ketone, methyl isobutyl ketone, etc.), alcohol solvents (eg, methanol, ethanol, etc.), ether solvents (diethyl ether, diisopropyl ether, cyclopentyl methyl ether ( CPME), tetrahydrofuran (THF), 1,4-dioxane, etc.), aromatic hydrocarbon solvents (eg, benzene, toluene, xylene, etc.), aliphatic or alicyclic hydrocarbon solvents (n-pentane, n-). Hexane, cyclohexane, petroleum ether, etc., ester solvents (ethyl acetate, etc.), halogenated hydrocarbon solvents (methylene chloride, chloroform, 1,2-dichloroethylene, etc.) and the like. The solvent may be used alone or in combination of two or more. Of these solvents, acetone, methyl ethyl ketone and methyl isobutyl ketone are particularly preferable.

溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、一般式(4)で表される化合物1モルに対して、一般に0〜20リットル、好ましくは1〜5リットルである。 The amount of the solvent used can be appropriately selected from a wide range and is, for example, generally 0 to 20 liters, preferably 1 to 5 liters, relative to 1 mol of the compound represented by the general formula (4). ..

工程(B’)は、窒素、アルゴン等の不活性ガスの雰囲気下で行うことができる。 The step (B') can be performed under an atmosphere of an inert gas such as nitrogen or argon.

反応圧力は、特に制限はなく、常圧下、又は加圧下で実施できる。 The reaction pressure is not particularly limited and can be carried out under normal pressure or under pressure.

反応温度は、通常0〜100℃であり、好ましくは0〜40℃であり、より好ましくは0〜20℃である。 The reaction temperature is generally 0 to 100°C, preferably 0 to 40°C, more preferably 0 to 20°C.

反応時間は、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは1〜5時間である。 The reaction time is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 1 to 5 hours.

反応終了後、得られる反応混合物から、過剰の試薬(ハロゲン化剤等)、未反応の原料化合物等を、分液、濃縮、カラム精製等の通常の分離方法により除去し、目的とする一般式(5)で表される化合物を取り出すことができる。また、反応終了後、精製及び単離工程を経ず、反応後の混合物をそのまま工程(D)に用いることもできる(テレスコーピング合成)。 After completion of the reaction, excess reagents (halogenating agent, etc.), unreacted raw material compounds, etc. are removed from the resulting reaction mixture by usual separation methods such as liquid separation, concentration, column purification, etc. The compound represented by (5) can be taken out. Further, after the completion of the reaction, the mixture after the reaction can be used as it is in the step (D) without performing the purification and isolation steps (telescoping synthesis).

3−5.工程(D):(ホスホン酸ジエステル化工程)
工程(D)は、下記反応式−8で示す工程である。
3-5. Step (D): (phosphonic acid diesterification step)
Step (D) is a step represented by the following reaction formula-8.

Figure 2020109131
Figure 2020109131

(式中、R、R及びXは、前記と同じ。)
具体的に工程(D)は、上記一般式(5)で表される化合物と、亜リン酸ジエステルとを塩基の存在下で反応させて、一般式(6)で表される化合物を得る工程(ホスホン酸ジエステル化工程)である。
(In the formula, R 1 , R 2 and X are the same as above.)
Specifically, the step (D) is a step of reacting the compound represented by the general formula (5) with a phosphite diester in the presence of a base to obtain the compound represented by the general formula (6). (Phosphonic acid diesterification step).

工程(D)で用いられる亜リン酸ジエステルとしては、下記一般式(12) Examples of the phosphite diester used in the step (D) include the following general formula (12).

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。)
で表される化合物を挙げることができる。
(In the formula, R 1 is the same as the above.)
The compound represented by can be mentioned.

一般式(12)で表される亜リン酸ジエステルにおいて、Rで示されるアルキル基、アリールアルキル基又はアリール基としては、上記一般式(9)で表される環状ホスホン酸エステルで挙げたRで示されるアルキル基、アリールアルキル基又はアリール基と同じである。 In the phosphite diester represented by the general formula (12), the alkyl group, the arylalkyl group or the aryl group represented by R 1 is R mentioned in the cyclic phosphonate ester represented by the general formula (9). It is the same as the alkyl group, arylalkyl group or aryl group represented by 1 .

該亜リン酸ジエステルとして具体的には、例えば、亜リン酸ジメチル、亜リン酸ジエチル、亜リン酸ジプロピル、亜リン酸ジブチル、亜リン酸ジイソプロピル、亜リン酸メチルエチル等の亜リン酸ジアルキル;亜リン酸ジベンジル、亜リン酸ジ(フェニルエチル)等の亜リン酸ジアリールアルキル;亜リン酸ジフェニル、亜リン酸ジトリル等の亜リン酸ジアリール等が挙げられ、好ましくは亜リン酸ジメチル、亜リン酸ジエチル、亜リン酸ジベンジル、及び亜リン酸ジフェニルである。 Specific examples of the phosphite diester include, for example, dimethyl phosphite, diethyl phosphite, dipropyl phosphite, dibutyl phosphite, diisopropyl phosphite, and dialkyl phosphite such as methylethyl phosphite; Diaryl phosphite such as dibenzyl phosphite and di(phenylethyl) phosphite; diphenyl phosphite such as diphenyl phosphite and ditolyl phosphite; and the like, preferably dimethyl phosphite and phosphorus Diethyl acid, dibenzyl phosphite, and diphenyl phosphite.

亜リン酸ジエステルの使用量としては、特に制限はなく、例えば、上記一般式(5)で表されるハロゲン化合物に対し、1〜10当量の範囲が好ましく、特に2〜2.5当量が好ましい。 The amount of the phosphite diester used is not particularly limited, and is preferably in the range of 1 to 10 equivalents, particularly preferably 2 to 2.5 equivalents, relative to the halogen compound represented by the general formula (5). ..

工程(D)で用いられる溶媒としては、有機溶媒であれば特に制限はなく、例えば、非プロトン性極性溶媒を用いることができる。該非プロトン性極性溶媒としては、例えば、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド(DMAc)、N−メチルピロリドン(NMP)、1,3−ジメチル−2−イミダゾリジノン等のアミド溶媒、ジメチルスルホキシド(DMSO)、ヘキサメチルリン酸トリアミド(HMPA)、アセトニトリル(AN)、アセトン、THF等が挙げられる。特に、DMF、DMAc及びアセトニトリルが好ましい。これらの溶媒は、1種単独又は2種以上を組み合わせて用いることができる。 The solvent used in step (D) is not particularly limited as long as it is an organic solvent, and for example, an aprotic polar solvent can be used. Examples of the aprotic polar solvent include N,N-dimethylformamide (DMF), N,N-dimethylacetamide (DMAc), N-methylpyrrolidone (NMP), 1,3-dimethyl-2-imidazolidinone and the like. Amide solvent, dimethylsulfoxide (DMSO), hexamethylphosphoric triamide (HMPA), acetonitrile (AN), acetone, THF and the like. Particularly, DMF, DMAc and acetonitrile are preferable. These solvents can be used alone or in combination of two or more.

溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、一般式(5)で表される化合物1モルに対して、一般に0〜20リットル、好ましくは1〜5リットルである。 The amount of the solvent used can be appropriately selected from a wide range and is, for example, generally 0 to 20 liters, preferably 1 to 5 liters, relative to 1 mol of the compound represented by the general formula (5). ..

工程(D)で用いられる塩基としては、例えば、有機塩基及び無機塩基が挙げられる。 Examples of the base used in step (D) include organic bases and inorganic bases.

有機塩基としては、例えば、トリメチルアミン、トリエチルアミン、トリブチルアミン、ジイソプロピルエチルアミン等の炭素数1〜4のアルキル基を1〜3個、好ましくは3個有する有機アミンを挙げることができる。特に、トリエチルアミンが好ましい。 Examples of the organic base include organic amines having 1 to 3 and preferably 3 alkyl groups having 1 to 4 carbon atoms such as trimethylamine, triethylamine, tributylamine and diisopropylethylamine. In particular, triethylamine is preferable.

無機塩基としては、具体的には、炭酸水素ナトリウム、炭酸ナトリウム、炭酸水素カリウム、炭酸カリウム、炭酸ルビジウム、炭酸カルシウム、炭酸セシウム等の、アルカリ金属及びアルカリ土類金属の炭酸塩を挙げることができる。特に、炭酸セシウム及び炭酸ルビジウムが好ましい。 Specific examples of the inorganic base include alkali metal and alkaline earth metal carbonates such as sodium hydrogen carbonate, sodium carbonate, potassium hydrogen carbonate, potassium carbonate, rubidium carbonate, calcium carbonate, and cesium carbonate. .. Particularly, cesium carbonate and rubidium carbonate are preferable.

塩基の使用量としては、特に制限はないが、上記式(5)で表される化合物に対して、1〜10当量の範囲が好ましく、特に2〜2.5当量が好ましい。 The amount of the base used is not particularly limited, but is preferably in the range of 1 to 10 equivalents, and particularly preferably 2 to 2.5 equivalents with respect to the compound represented by the above formula (5).

工程(D)は、窒素、アルゴン等の不活性ガスの雰囲気下で行うことができる。 Step (D) can be performed in an atmosphere of an inert gas such as nitrogen or argon.

反応圧力は、特に制限はなく、常圧下、又は加圧下で実施できる。 The reaction pressure is not particularly limited and can be carried out under normal pressure or under pressure.

反応温度は、通常0〜120℃であり、好ましくは20〜80℃であり、より好ましくは40〜50℃である。 The reaction temperature is generally 0 to 120°C, preferably 20 to 80°C, more preferably 40 to 50°C.

反応時間は、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは5〜8時間である。 The reaction time is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 5 to 8 hours.

反応終了後、得られる反応混合物から、過剰の試薬(亜リン酸ジエステル、塩基等)、未反応の原料化合物等を、濃縮、ろ過、カラム精製等の通常の分離方法により除去し、目的とする一般式(6)で表される化合物を取り出すことができる。また、反応終了後、濃縮及びろ過のみを行い、精製及び単離工程を経ずに、反応後の混合物をそのまま工程(E)に用いることもできる(テレスコーピング合成)。 After completion of the reaction, excess reagents (phosphorous acid diester, base, etc.), unreacted raw material compounds, etc. are removed from the resulting reaction mixture by usual separation methods such as concentration, filtration, column purification, etc. The compound represented by the general formula (6) can be taken out. Alternatively, after the reaction, only concentration and filtration may be performed, and the mixture after the reaction may be directly used in the step (E) without performing the purification and isolation steps (telescoping synthesis).

3−6.工程(E):(開環工程)
工程(E)は、下記反応式−9で示す工程である。
3-6. Step (E): (ring opening step)
Step (E) is a step represented by the following reaction formula-9.

Figure 2020109131
Figure 2020109131

(式中、R及びRは、前記と同じ。)
具体的に工程(E)は、一般式(6)で表される化合物に、酸を作用させて、一般式(7)で表される化合物を得る工程(開環工程)である。
(In the formula, R 1 and R 2 are the same as above.)
Specifically, the step (E) is a step (ring-opening step) of reacting the compound represented by the general formula (6) with an acid to obtain the compound represented by the general formula (7).

酸としては、公知の有機酸及び無機酸をいずれも使用できる。該有機酸としては、例えば、p−トルエンスルホン酸(p−TsOH)、p−トルエンスルホン酸ピリジニウム(PPTS)、カンファースルホン酸(CSA)等のスルホン酸、蟻酸、酢酸、プロピオン酸、酪酸、トリフルオロ酢酸(TFA)等の炭素数1〜4の低級脂肪酸等を挙げることができる。特に、p−TsOH及びCSAが好ましい。 As the acid, any of known organic acids and inorganic acids can be used. Examples of the organic acid include sulfonic acids such as p-toluenesulfonic acid (p-TsOH), pyridinium p-toluenesulfonate (PPTS) and camphorsulfonic acid (CSA), formic acid, acetic acid, propionic acid, butyric acid, and triacetic acid. Examples thereof include lower fatty acids having 1 to 4 carbon atoms such as fluoroacetic acid (TFA). Particularly, p-TsOH and CSA are preferable.

無機酸としては、具体的には、塩酸、硫酸、硝酸等を挙げることができる。特に、塩酸が好ましい。 Specific examples of the inorganic acid include hydrochloric acid, sulfuric acid, nitric acid and the like. Hydrochloric acid is particularly preferable.

酸の使用量としては、特に制限はなく、上記式(6)で表される化合物1モルに対して、0.01〜0.2モルの範囲が好ましく、特に0.01〜0.1モルが好ましい。 The amount of the acid used is not particularly limited and is preferably in the range of 0.01 to 0.2 mol, particularly 0.01 to 0.1 mol, relative to 1 mol of the compound represented by the formula (6). Is preferred.

工程(E)は、無溶媒又は溶媒の存在下で実施される。溶媒を用いる場合、その溶媒としては、本反応に悪影響を与えない溶媒であれば特に限定はない。用いられる溶媒としては、例えば、水、アルコール系溶媒(例えば、メタノール、エタノール、n−プロパノール、イソプロパノール、n−ブタノール等の炭素数1〜4の低級アルコール)、エーテル系溶媒(ジエチルエーテル、ジイソプロピルエーテル、テトラヒドロフラン(THF)、1,4−ジオキサン等)、芳香族炭化水素系溶媒(例えば、ベンゼン、トルエン、キシレン等)、脂肪族若しくは脂環式炭化水素系溶媒(n−ペンタン、n−ヘキサン、シクロヘキサン、石油エーテル等)、エステル系溶媒(酢酸エチル等)、ハロゲン化炭化水素系溶媒(塩化メチレン、クロロホルム、1,2−ジクロロエチレン等)等が挙げられる。溶媒は、1種単独又は2種以上を組み合わせて用いることができる。これら溶媒のうち、メタノール、THF、1,4−ジオキサン及びトルエンが好ましく、特にメタノールが好ましい。 Step (E) is carried out without solvent or in the presence of a solvent. When a solvent is used, the solvent is not particularly limited as long as it does not adversely affect the reaction. Examples of the solvent used include water, alcohol solvents (for example, lower alcohols having 1 to 4 carbon atoms such as methanol, ethanol, n-propanol, isopropanol, and n-butanol), ether solvents (diethyl ether, diisopropyl ether). , Tetrahydrofuran (THF), 1,4-dioxane, etc.), aromatic hydrocarbon solvents (eg, benzene, toluene, xylene, etc.), aliphatic or alicyclic hydrocarbon solvents (n-pentane, n-hexane, etc.). Examples thereof include cyclohexane, petroleum ether, etc., ester solvents (ethyl acetate, etc.), halogenated hydrocarbon solvents (methylene chloride, chloroform, 1,2-dichloroethylene, etc.). The solvent may be used alone or in combination of two or more. Of these solvents, methanol, THF, 1,4-dioxane and toluene are preferable, and methanol is particularly preferable.

溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、一般式(6)で表される化合物1モルに対して、一般に0〜20リットル、好ましくは1〜5リットルである。 The amount of the solvent used can be appropriately selected from a wide range and is, for example, generally 0 to 20 liters, preferably 1 to 5 liters, relative to 1 mol of the compound represented by the general formula (6). ..

工程(E)は、窒素、アルゴン等の不活性ガスの雰囲気下で行うことができる。 The step (E) can be performed in an atmosphere of an inert gas such as nitrogen or argon.

反応圧力は、特に制限はなく、常圧下、又は加圧下で実施できる。 The reaction pressure is not particularly limited and can be carried out under normal pressure or under pressure.

反応温度は、通常0〜120℃であり、好ましくは0〜80℃であり、より好ましくは0〜20℃である。 The reaction temperature is generally 0 to 120°C, preferably 0 to 80°C, more preferably 0 to 20°C.

反応時間は、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは3〜12時間である。 The reaction time is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 3 to 12 hours.

反応終了後、得られる反応混合物から、過剰の試薬(酸等)、未反応の原料化合物等を、濃縮、カラム精製等の通常の分離方法により除去し、目的とする一般式(7)で表される化合物を取り出すことができる。また、反応終了後、濃縮のみ行い、精製及び単離工程を経ずに、反応後の混合物をそのまま工程(F)に用いることができる(テレスコーピング合成)。 After the completion of the reaction, excess reagents (such as acid) and unreacted starting compounds are removed from the resulting reaction mixture by a usual separation method such as concentration and column purification, and the desired general formula (7) is obtained. The compound can be removed. Further, after the completion of the reaction, only concentration is performed, and the mixture after the reaction can be used as it is in the step (F) without performing the purification and isolation steps (telescoping synthesis).

3−7.工程(F):(環化工程)
工程(F)は、下記反応式−10で示す工程である。
3-7. Process (F): (cyclization process)
Step (F) is a step represented by the following reaction formula-10.

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。)
具体的に工程(F)は、一般式(7)で表される化合物に、塩基を作用させて、一般式(8)の化合物を得る工程(環化工程)である。
(In the formula, R 1 is the same as the above.)
Specifically, the step (F) is a step (cyclization step) of reacting the compound represented by the general formula (7) with a base to obtain the compound of the general formula (8).

工程(F)で用いられる塩基としては、公知の有機塩基及び無機塩基をいずれも使用できる。例えば、有機塩基としては、ジアザビシクロウンデセン(DBU)、ジアザビシクロノネン(DBN)、トリメチルアミン、トリエチルアミン(TEA)、トリブチルアミン、ジイソプロピルエチルアミン(DIPEA)等の3級の有機アミン;ナトリウムメトキシド(NaOMe)、ナトリウムエトキシド(NaOEt)、t−ブトキシカリウム(t−BuOK)、t−ブトキシナトリウム(t−BuONa)等の金属アルコキシド等を挙げることができる。 As the base used in the step (F), both known organic bases and inorganic bases can be used. For example, as the organic base, a tertiary organic amine such as diazabicycloundecene (DBU), diazabicyclononene (DBN), trimethylamine, triethylamine (TEA), tributylamine, diisopropylethylamine (DIPEA); sodium methoxide Examples thereof include metal alkoxides such as (NaOMe), sodium ethoxide (NaOEt), potassium t-butoxy (t-BuOK), and sodium t-butoxy (t-BuONa).

無機塩基としては、炭酸セシウム(CsCO)、炭酸ルビジウム(RbCO)等のアルカリ金属炭酸塩;水素化ナトリウム(NaH)等のアルカリ金属水素化物等を挙げることができる。 Examples of the inorganic base include alkali metal carbonates such as cesium carbonate (Cs 2 CO 3 ) and rubidium carbonate (Rb 2 CO 3 ); alkali metal hydrides such as sodium hydride (NaH).

塩基として好ましくは、DBU、DBN、TEA、DIPEA、NaOMe、NaOEt、t−BuOK、t−BuONa、CsCO及びNaHであり、より好ましくはDBU及びDBNである。 The preferred base, DBU, a DBN, TEA, DIPEA, NaOMe, NaOEt, t-BuOK, t-BuONa, Cs 2 CO 3 and NaH, more preferably DBU and DBN.

塩基の使用量としては、特に制限はなく、例えば、上記一般式(7)で表される化合物1モルに対して、0.1〜2モルの範囲が好ましく、特に、0.1〜1モルが好ましい。 The amount of the base used is not particularly limited, and is preferably in the range of 0.1 to 2 mol, particularly 0.1 to 1 mol, relative to 1 mol of the compound represented by the general formula (7). Is preferred.

工程(F)は、無溶媒又は溶媒の存在下で実施される。溶媒を用いる場合、その溶媒としては、本反応に悪影響を与えない溶媒であれば特に限定はない。用いられる溶媒としては、例えば、水、アルコール系溶媒(例えば、メタノール、エタノール、n−プロパノール、イソプロパノール、n−ブタノール等の炭素数1〜4の低級アルコール);エーテル系溶媒(ジエチルエーテル、ジイソプロピルエーテル(IPA)、テトラヒドロフラン(THF)、1,4−ジオキサン等);芳香族炭化水素系溶媒(例えば、ベンゼン、トルエン、キシレン等);脂肪族若しくは脂環式炭化水素系溶媒(n−ペンタン、n−ヘキサン、シクロヘキサン、石油エーテル等);エステル系溶媒(酢酸エチル等);ハロゲン化炭化水素系溶媒(塩化メチレン、クロロホルム、1,2−ジクロロエチレン等);アミド系溶媒(例えば、N,N−ジメチルホルムアミド(DMF)、N,N−ジメチルアセトアミド(DMAc)、N−メチルピロリドン(NMP)、1,3−ジメチル−2−イミダゾリジノン等);ジメチルスルホキシド(DMSO);ヘキサメチルリン酸トリアミド(HMPA);アセトニトリル(AN);アセトン等が挙げられる溶媒は、1種単独又は2種以上を組み合わせて用いることができる。これら溶媒のうち、DMF、DMAc、AN、アセトン、メタノール、IPA及びブタノールが好ましく、特にDMF及びDMAcが好ましい。 Step (F) is carried out without solvent or in the presence of a solvent. When a solvent is used, the solvent is not particularly limited as long as it does not adversely affect the reaction. Examples of the solvent used include water, alcohol solvents (for example, lower alcohols having 1 to 4 carbon atoms such as methanol, ethanol, n-propanol, isopropanol, n-butanol); ether solvents (diethyl ether, diisopropyl ether). (IPA), tetrahydrofuran (THF), 1,4-dioxane, etc.; aromatic hydrocarbon solvent (eg, benzene, toluene, xylene, etc.); aliphatic or alicyclic hydrocarbon solvent (n-pentane, n) -Hexane, cyclohexane, petroleum ether, etc.; ester solvents (ethyl acetate, etc.); halogenated hydrocarbon solvents (methylene chloride, chloroform, 1,2-dichloroethylene, etc.); amide solvents (for example, N,N-dimethyl) Formamide (DMF), N,N-dimethylacetamide (DMAc), N-methylpyrrolidone (NMP), 1,3-dimethyl-2-imidazolidinone, etc.); dimethyl sulfoxide (DMSO); hexamethylphosphoric triamide (HMPA) ); Acetonitrile (AN); A solvent such as acetone can be used alone or in combination of two or more. Of these solvents, DMF, DMAc, AN, acetone, methanol, IPA and butanol are preferable, and DMF and DMAc are particularly preferable.

溶媒の使用量としては、広い範囲内から適宜選択することができ、例えば、一般式(7)で表される化合物1モルに対して、一般に0〜20リットル、好ましくは1〜5リットルである。 The amount of the solvent used can be appropriately selected from a wide range and is, for example, generally 0 to 20 liters, preferably 1 to 5 liters, relative to 1 mol of the compound represented by the general formula (7). ..

また、工程(E)の反応では、反応を停止させるために、クエンチ剤を使用することができる。クエンチ剤としては、公知のクエンチ剤を使用することができ、例えば、有機酸を使用することができる。該有機酸としては、例えば、p−TsOH、CSA等のスルホン酸、蟻酸、酢酸、プロピオン酸、酪酸、トリフルオロ酢酸等の炭素数1〜4の脂肪酸が挙げられる。特に、p−TsOH及びCSAが好ましい。 Further, in the reaction of the step (E), a quenching agent can be used to stop the reaction. A known quenching agent can be used as the quenching agent, and for example, an organic acid can be used. Examples of the organic acid include sulfonic acids such as p-TsOH and CSA, and fatty acids having 1 to 4 carbon atoms such as formic acid, acetic acid, propionic acid, butyric acid, and trifluoroacetic acid. Particularly, p-TsOH and CSA are preferable.

当該クエンチ剤の使用量としては、反応で加えた有機塩基と同じモル量が好ましい。 The amount of the quenching agent used is preferably the same molar amount as the organic base added in the reaction.

工程(E)は、窒素、アルゴン等の不活性ガスの雰囲気下で行うことができる。 The step (E) can be performed in an atmosphere of an inert gas such as nitrogen or argon.

反応圧力は、特に制限はなく、常圧下、又は加圧下で実施できる。 The reaction pressure is not particularly limited and can be carried out under normal pressure or under pressure.

反応温度は、通常0〜60℃であり、好ましくは0〜40℃であり、より好ましくは15〜25℃である。 The reaction temperature is generally 0 to 60°C, preferably 0 to 40°C, more preferably 15 to 25°C.

反応時間は、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは2〜7時間である。 The reaction time is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 2 to 7 hours.

反応終了後、得られる反応混合物から、過剰の試薬(塩基等)、未反応の原料化合物等を、濃縮、カラム精製等の通常の分離方法により除去し、目的とする一般式(8)で表される化合物を取り出すことができる。また、反応終了後、濃縮のみ行い、精製及び単離工程を経ずに、反応後の混合物をそのまま工程(G)に用いることができる(テレスコーピング合成)。 After completion of the reaction, excess reagents (base, etc.), unreacted raw material compounds, etc. are removed from the resulting reaction mixture by a usual separation method such as concentration and column purification, and the desired general formula (8) is obtained. The compound can be removed. Further, after the completion of the reaction, only concentration is performed, and the mixture after the reaction can be used as it is in the step (G) without performing purification and isolation steps (telescoping synthesis).

3−8.工程(G)(エステル化工程)
工程(G)は、下記反応式−11で示す工程である。
3-8. Step (G) (esterification step)
Step (G) is a step represented by the following reaction formula-11.

Figure 2020109131
Figure 2020109131

(式中、Rは、前記と同じ。)
具体的に工程(G)は、一般式(8)で表される環状ホスホン酸化合物と、オレイン酸化合物とを反応させて、一般式(9)の化合物を得る工程(エステル化工程)であり、公知のエステル化反応を適宜適用することができる。
(In the formula, R 1 is the same as the above.)
Specifically, the step (G) is a step (esterification step) of reacting a cyclic phosphonic acid compound represented by the general formula (8) with an oleic acid compound to obtain a compound of the general formula (9). A known esterification reaction can be applied as appropriate.

オレイン酸化合物としては、例えば、オレイン酸、並びにオレイン酸ハライド、オレイン酸無水物、オレイン酸エステル等のオレイン酸誘導体を挙げることができる。これらオレイン酸化合物は、1種単独又は2種以上混合して使用することができる。 Examples of the oleic acid compound include oleic acid and oleic acid derivatives such as oleic acid halide, oleic acid anhydride, and oleic acid ester. These oleic acid compounds may be used alone or in combination of two or more.

工程(G)で用いられるオレイン酸ハライドにおけるハライドとしては、塩素原子、臭素原子又はヨウ素原子等が挙げられる。特に該ハライドとしては、塩素原子が好ましい。 Examples of the halide in the oleic acid halide used in the step (G) include chlorine atom, bromine atom, iodine atom and the like. A chlorine atom is particularly preferable as the halide.

工程(G)で用いられるオレイン酸エステルとしては、メチルエステル、エチルエステル等が挙げられる。 Examples of the oleic acid ester used in the step (G) include methyl ester and ethyl ester.

オレイン酸化合物の使用量としては、特に制限はなく、例えば、上記一般式(8)で表される化合物1モルに対して、1〜2モルの範囲が好ましく、特に、1〜1.5モルが好ましい。 The amount of the oleic acid compound used is not particularly limited, and is preferably in the range of 1 to 2 mol, particularly 1 to 1.5 mol, relative to 1 mol of the compound represented by the general formula (8). Is preferred.

工程(G)としては、例えば、環状ホスホン酸化合物(8)と、オレイン酸とを、縮合剤の存在下で反応させる方法(工程G−1);
環状ホスホン酸化合物(8)とオレイン酸ハライドとを塩基の存在下で反応させる方法(工程G−2);
環状ホスホン酸化合物(8)とオレイン酸無水物とを反応させる方法(工程G−3);
環状ホスホン酸化合物(8)とオレイン酸エステルとを反応させる方法(工程G−4)等を挙げることができる。
As the step (G), for example, a method of reacting the cyclic phosphonic acid compound (8) with oleic acid in the presence of a condensing agent (step G-1);
A method of reacting a cyclic phosphonic acid compound (8) with an oleic acid halide in the presence of a base (step G-2);
A method of reacting a cyclic phosphonic acid compound (8) with oleic anhydride (step G-3);
Examples thereof include a method of reacting the cyclic phosphonic acid compound (8) with an oleic acid ester (step G-4).

工程G−1で用いられる縮合剤としては、公知の縮合剤であれば制限なく、例えば、ジシクロヘキシルカルボジイミド(DCC)、ジイソプロピルカルボジイミド(DIC)、1−エチル−3−(3−ジメチルアミノプロピル)カルボジイミド ハイドロクロライド(EDC)等が挙げられる。 The condensing agent used in Step G-1 is not particularly limited as long as it is a known condensing agent, and examples thereof include dicyclohexylcarbodiimide (DCC), diisopropylcarbodiimide (DIC), 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide. Hydrochloride (EDC) etc. are mentioned.

工程G−2で用いられる塩基としては、トリエチルアミン、ピリジン、N,N−ジエチルアニリン、4−ジメチルアミノピリジン、ジイソプロピルエチルアミン等の有機塩基が挙げられる。 Examples of the base used in Step G-2 include organic bases such as triethylamine, pyridine, N,N-diethylaniline, 4-dimethylaminopyridine and diisopropylethylamine.

上記工程(G−1)としては、例えば、下記の工程G−1A〜工程G−1Fを挙げることができる。 Examples of the step (G-1) include the following steps G-1A to G-1F.

工程G−1A:環状ホスホン酸化合物(8)とオレイン酸とを、上記縮合剤の存在下で反応させる方法;
工程G−1B:環状ホスホン酸化合物(8)とオレイン酸とを、2−クロロ-1-メチルピリジニウムヨージド(CMPI)の存在下で反応させる方法;
工程G−1C:環状ホスホン酸化合物(8)とオレイン酸とを、ヘキサフルオロリン酸(ベンゾトリアゾール-1-イルオキシ)トリピロリジノホスホニウム(pyBOP)の存在下で反応させる方法;
工程G−1D:環状ホスホン酸化合物(8)とオレイン酸とを、O−(7−アザベンゾトリアゾール−1−イル)−N,N,N,N−テトラメチルウロニウムヘキサフルオロホスファート(HATU)の存在下で反応させる方法;
工程G−1E:環状ホスホン酸化合物(8)とオレイン酸とを、O−(ベンゾトリアゾール−1−イル)−N,N,N,N−テトラメチルウロニウムヘキサフルオロホスファート(HBTU)の存在下で反応させる方法;
工程G−1F:環状ホスホン酸化合物(8)とオレイン酸とを、(1−シアノ−2−エトキシ−2−オキソエチリデンアミノオキシ)ジメチルアミノモルホリノカルベニウムヘキサフルオロリン酸塩(COMU)の存在下で反応させる方法
上記工程(G−2)としては、例えば、下記の工程G−2A及び工程G−2Bを挙げることができる。
Step G-1A: a method of reacting the cyclic phosphonic acid compound (8) and oleic acid in the presence of the condensing agent;
Step G-1B: a method of reacting the cyclic phosphonic acid compound (8) and oleic acid in the presence of 2-chloro-1-methylpyridinium iodide (CMPI);
Step G-1C: a method of reacting the cyclic phosphonic acid compound (8) with oleic acid in the presence of hexafluorophosphoric acid (benzotriazol-1-yloxy)tripyrrolidinophosphonium (pyBOP);
Step G-1D: The cyclic phosphonic acid compound (8) and oleic acid were combined with O-(7-azabenzotriazol-1-yl)-N,N,N,N-tetramethyluronium hexafluorophosphate (HATU). ) The reaction in the presence of;
Step G-1E: Cyclic phosphonic acid compound (8) and oleic acid were combined with O-(benzotriazol-1-yl)-N,N,N,N-tetramethyluronium hexafluorophosphate (HBTU). Method of reacting below;
Step G-1F: Cyclic phosphonic acid compound (8) and oleic acid were added in the presence of (1-cyano-2-ethoxy-2-oxoethylideneaminooxy)dimethylaminomorpholinocarbenium hexafluorophosphate (COMU). The method of reacting in step (G-2) can include, for example, the following step G-2A and step G-2B.

工程G−2A:環状ホスホン酸化合物(8)とオレイン酸ハライドとを、トリエチルアミンの存在下で反応させる方法;
工程G−2B:オレイン酸からオレイン酸ハライドを製造し、該オレイン酸ハライドと環状ホスホン酸化合物(8)とを、トリエチルアミンの存在下で反応させる方法;
上記工程G−3としては、例えば、下記の工程G−3A及び工程G−3Bを挙げることができる。
Step G-2A: a method of reacting the cyclic phosphonic acid compound (8) with an oleic acid halide in the presence of triethylamine;
Step G-2B: a method of producing an oleic acid halide from oleic acid, and reacting the oleic acid halide with the cyclic phosphonic acid compound (8) in the presence of triethylamine;
Examples of the step G-3 include the following step G-3A and step G-3B.

工程G−3A:環状ホスホン酸化合物(8)とオレイン酸無水物とを反応させる方法; 工程G−3B:オレイン酸とトシル酸クロライドとを反応させて、反応系中でオレイン酸の混合酸無水物を発生させてから、該酸無水物と環状ホスホン酸化合物(8)とを反応させる方法
縮合剤又は塩基は、環状ホスホン酸化合物(8)1モルに対して、通常は0.25モルから過剰量まで任意の割合で使用することができ、好ましくは0.5〜2モルである。これらの縮合剤又は塩基は、オレイン酸化合物又はその誘導体の種類により適宜選択される。
Step G-3A: Method of reacting cyclic phosphonic acid compound (8) with oleic acid anhydride; Step G-3B: Reacting oleic acid and tosylic acid chloride, and mixed acid anhydride of oleic acid in reaction system A method of reacting the acid anhydride with a cyclic phosphonic acid compound (8) after generating a compound, The condensing agent or base is usually 0.25 mol per 1 mol of the cyclic phosphonic acid compound (8). It can be used in any proportion up to an excess amount, preferably 0.5 to 2 mol. These condensing agents or bases are appropriately selected depending on the type of oleic acid compound or its derivative.

工程(G)は、窒素、アルゴン等の不活性ガスの雰囲気下で行うことができる。 Step (G) can be performed in an atmosphere of an inert gas such as nitrogen or argon.

反応圧力は、特に制限はなく、常圧下、又は加圧下で実施できる。 The reaction pressure is not particularly limited and can be carried out under normal pressure or under pressure.

反応温度は、通常0〜120℃であり、好ましくは0〜30℃であり、より好ましくは15〜25℃である。 The reaction temperature is generally 0 to 120°C, preferably 0 to 30°C, more preferably 15 to 25°C.

反応時間は、通常0.1〜100時間であり、好ましくは0.5〜50時間であり、より好ましくは2〜17時間である。 The reaction time is usually 0.1 to 100 hours, preferably 0.5 to 50 hours, and more preferably 2 to 17 hours.

反応終了後、得られる反応混合物から、過剰の試薬(オレイン酸化合物等)、未反応の原料化合物等を、分液、濃縮、カラム精製等の通常の分離方法により除去し、目的とする一般式(9)で表される化合物を取り出すことができる。また、反応終了後、分液及び濃縮のみを行い、精製及び単離工程を経ずに、反応後の混合物をそのまま工程(H)に用いることができる(テレスコーピング合成)。 After completion of the reaction, excess reagents (oleic acid compounds, etc.), unreacted raw material compounds, etc. are removed from the resulting reaction mixture by usual separation methods such as liquid separation, concentration, column purification, etc. The compound represented by (9) can be taken out. In addition, after completion of the reaction, only liquid separation and concentration are performed, and the mixture after the reaction can be used as it is in the step (H) without performing purification and isolation steps (telescoping synthesis).

以下に、合成例、実施例及び比較例を挙げて本発明をさらに詳しく説明するが、本発明は下記の実施例に何ら限定されるものではない。 Hereinafter, the present invention will be described in more detail with reference to Synthesis Examples, Examples and Comparative Examples, but the present invention is not limited to the following Examples.

[工程(A)]
合成例A1(工程A:R =n−プロピル)
2,2−ジ−n−プロピル−5−(ヒドロキシメチル)−1,3−ジオキサン(3b)の合成
[Process (A)]
Synthesis Example A1 (Step A: R 2 =n-propyl)
Synthesis of 2,2-di-n-propyl-5-(hydroxymethyl)-1,3-dioxane (3b)

Figure 2020109131
Figure 2020109131

2−ヒドロキシメチル−1,3プロパンジオール(2)3.0gをテトラヒドロフラン30mlに溶解させ、4−ヘプタノン4.74ml及びp−トルエンスルホン酸一水和物53.8mgを加えて、Dean−Starkで3.5時間加熱還流した。また、反応中、留去されたテトラヒドロフランは廃棄し、反応混合物中に新しいテトラヒドロフランを加えた。反応後、反応混合物にトリエチルアミン0.39mlを加えて反応を止め、テトラヒドロフランを減圧留去した。残渣に酢酸エチル30ml及び水30mlを加えて分液した。有機層を抽出した後、水層を更に2回、酢酸エチル30mlで抽出した。集めた有機層を飽和食塩水30mlで洗浄した後、硫酸マグネシウムで乾燥し、ろ過、次いで酢酸エチルを減圧留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=1:1)で精製し、アセタール化合物(3b)2.34gを収率41%で得た。
H−NMR(500MHz,CDCl):
δ:0.93(m,6H),1.35(m,4H),1.63(m,3H),1.72(m,2H),1.79(m,1H),3.76(m,4H),4.01(dd,J=11.9,4.0Hz,2H)
3.0 g of 2-hydroxymethyl-1,3 propanediol (2) was dissolved in 30 ml of tetrahydrofuran, 4.74 ml of 4-heptanone and 53.8 mg of p-toluenesulfonic acid monohydrate were added, and Dean-Stark was used. The mixture was heated under reflux for 3.5 hours. Further, during the reaction, tetrahydrofuran distilled off was discarded, and fresh tetrahydrofuran was added to the reaction mixture. After the reaction, 0.39 ml of triethylamine was added to the reaction mixture to stop the reaction, and tetrahydrofuran was distilled off under reduced pressure. 30 ml of ethyl acetate and 30 ml of water were added to the residue and the layers were separated. After extracting the organic layer, the aqueous layer was extracted twice more with 30 ml of ethyl acetate. The collected organic layer was washed with 30 ml of saturated brine, dried over magnesium sulfate, filtered, and ethyl acetate was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=1:1) to obtain 2.34 g of acetal compound (3b) in a yield of 41%.
1 H-NMR (500 MHz, CDCl 3 ):
δ: 0.93 (m, 6H), 1.35 (m, 4H), 1.63 (m, 3H), 1.72 (m, 2H), 1.79 (m, 1H), 3.76. (M, 4H), 4.01 (dd, J=11.9, 4.0Hz, 2H)

合成例A2(工程A:RSynthesis Example A2 (Step A: R Two =n−ブチル)= N-butyl)
2,2−ジブチル−5−(ヒドロキシメチル)−1,3−ジオキサン(3c)の合成Synthesis of 2,2-dibutyl-5-(hydroxymethyl)-1,3-dioxane (3c)

Figure 2020109131
Figure 2020109131

2−ヒドロキシメチル−1,3プロパンジオール(2)1.0gをテトラヒドロフラン9.5mlに溶解させ、5−ノナノン1.96ml及びp−トルエンスルホン酸一水和物17.9mgを加えて、17時間加熱還流した。反応混合物にトリエチルアミン0.13mlを加えて反応を止め、テトラヒドロフランを減圧留去した。残渣に酢酸エチル10ml及び水10mlを加えて分液した。有機層を抽出した後、水層を更に2回、酢酸エチル10mlで抽出した。集めた有機層を飽和食塩水10mlで洗浄した後、硫酸マグネシウムで乾燥し、ろ過、次いで酢酸エチルを減圧留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=1:1)で精製し、アセタール化合物(3c)156mgを収率7%で得た。
H−NMR(500MHz,CDCl):
δ:0.92(m,6H),1.31(m,8H),1.50(t,J=5.1Hz,1H),1.65(m,2H),1.74(m,2H),1.80(m,1H),3.76(m,4H),4.01(dd,J=12.1,4.1Hz,2H)
2-Hydroxymethyl-1,3 propanediol (2) 1.0 g is dissolved in tetrahydrofuran 9.5 ml, 5-nonanone 1.96 ml and p-toluenesulfonic acid monohydrate 17.9 mg are added, and it is for 17 hours. Heated to reflux. The reaction was stopped by adding 0.13 ml of triethylamine to the reaction mixture, and tetrahydrofuran was distilled off under reduced pressure. Ethyl acetate (10 ml) and water (10 ml) were added to the residue for liquid separation. After extracting the organic layer, the aqueous layer was extracted twice more with 10 ml of ethyl acetate. The collected organic layer was washed with 10 ml of saturated brine, dried over magnesium sulfate, filtered, and ethyl acetate was evaporated under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=1:1) to obtain 156 mg of acetal compound (3c) in a yield of 7%.
1 H-NMR (500 MHz, CDCl 3 ):
δ: 0.92 (m, 6H), 1.31 (m, 8H), 1.50 (t, J=5.1Hz, 1H), 1.65 (m, 2H), 1.74 (m, 2H), 1.80 (m, 1H), 3.76 (m, 4H), 4.01 (dd, J=12.1, 4.1Hz, 2H)

合成例A3(工程A:RSynthesis Example A3 (Step A: R Two =フェニル)= Phenyl)
2,2−ジフェニル−5−(ヒドロキシメチル)−1,3−ジオキサン(3d)の合成Synthesis of 2,2-diphenyl-5-(hydroxymethyl)-1,3-dioxane (3d)

Figure 2020109131
Figure 2020109131

2−ヒドロキシメチル−1,3プロパンジオール(2)1.0gをDMF48mlに溶解させ、ベンゾフェノンジメチルアセタール2.58g及びCSA656mgを加えて、40℃、減圧下22.5時間撹拌した。反応混合物中のDMFを減圧留去し、残渣に酢酸エチル10ml及び水10mlを加えて分液した。有機層を抽出した後、水層を更に2回、酢酸エチル10mlで抽出した。集めた有機層を飽和食塩水10mlで洗浄した。硫酸マグネシウムで乾燥し、ろ過、次いで酢酸エチルを減圧留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=1:1)で精製し、アセタール化合物(3d)647mgを収率25%で得た。
H−NMR(500MHz,CDCl
δ:1.94(m,1H),3.81(dd,J=7.0,5.2Hz,2H),3.91(dd,J=11.8,5.5Hz,2H),4.14(dd,J=11.8,3.8Hz,2H),7.25(m,2H),7.34(m,4H),7.51(m,4H)
1.0 g of 2-hydroxymethyl-1,3 propanediol (2) was dissolved in 48 ml of DMF, 2.58 g of benzophenone dimethyl acetal and 656 mg of CSA were added, and the mixture was stirred at 40° C. under reduced pressure for 22.5 hours. DMF in the reaction mixture was distilled off under reduced pressure, and 10 ml of ethyl acetate and 10 ml of water were added to the residue for liquid separation. After extracting the organic layer, the aqueous layer was extracted twice more with 10 ml of ethyl acetate. The collected organic layer was washed with 10 ml of saturated saline. The extract was dried over magnesium sulfate, filtered, and ethyl acetate was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=1:1) to obtain 647 mg of acetal compound (3d) in a yield of 25%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.94 (m, 1H), 3.81 (dd, J=7.0, 5.2 Hz, 2H), 3.91 (dd, J=11.8, 5.5 Hz, 2H), 4 .14 (dd, J=11.8, 3.8 Hz, 2H), 7.25 (m, 2H), 7.34 (m, 4H), 7.51 (m, 4H)

[工程(B)]
合成例B1(工程B:R =メチル)
2,2−ジメチル−5−メタンスルホニルオキシメチル−1,3−ジオキサン(4a)の合成
[Process (B)]
Synthesis Example B1 (Step B: R 2 =methyl)
Synthesis of 2,2-dimethyl-5-methanesulfonyloxymethyl-1,3-dioxane (4a)

Figure 2020109131
Figure 2020109131

2,2−ジメチル−5−(ヒドロキシメチル)−1,3−ジオキサン(3a)5.00gを、CHCl67mlに溶解させ、次いで、トリエチルアミン5.42mlを加えて、−20℃に冷却した。さらに、メシルクロライド(MsCl)2.56mlを加えて、−20℃で1時間撹拌した。反応混合物に水50mlを加えて、反応を停止させ、CHCl40mlで2回抽出した。分液した有機層を水で洗浄後、CHClを減圧下、留去し、得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=1:1)で精製し、化合物(4a)6.22gを収率92%で得た。
H−NMR(500MHz,CDCl):
δ:1.39(s,3H),1.46(s,3H),2.00(m,1H),3.04(s,3H),3.78(dd,2H,J=12,3Hz),4.08(dd,2H,J=11.5,2.5Hz),4.42(d,2H,J=7Hz)
2,2-Dimethyl-5-(hydroxymethyl)-1,3-dioxane (3a) (5.00 g) was dissolved in CH 2 Cl 2 ( 67 ml), triethylamine (5.42 ml) was added, and the mixture was cooled to -20°C. did. Further, 2.56 ml of mesyl chloride (MsCl) was added, and the mixture was stirred at -20°C for 1 hour. The reaction mixture was quenched with 50 ml of water and extracted twice with 40 ml of CH 2 Cl 2 . The separated organic layer was washed with water, CH 2 Cl 2 was evaporated under reduced pressure, and the obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=1:1) to give the compound (4a ) 6.22 g was obtained with a yield of 92%.
1 H-NMR (500 MHz, CDCl 3 ):
δ: 1.39 (s, 3H), 1.46 (s, 3H), 2.00 (m, 1H), 3.04 (s, 3H), 3.78 (dd, 2H, J=12, 3Hz), 4.08 (dd, 2H, J=11.5, 2.5Hz), 4.42 (d, 2H, J=7Hz)

合成例B2(工程B:RSynthesis Example B2 (Step B: R Two =n−プロピル)= N-propyl)
2,2−ジ−n−プロピル−5−メタンスルホニルオキシメチル−1,3−ジオキサン(4b)の合成Synthesis of 2,2-di-n-propyl-5-methanesulfonyloxymethyl-1,3-dioxane (4b)

Figure 2020109131
Figure 2020109131

合成例A1で得られた化合物(3b)1.0gを、CHCl20mlに溶解させ、さらにトリエチルアミン1.03mlを加えて、−20℃に冷却した。次いで、反応溶液にMsCl0.459mlを加えて、−20℃で1時間撹拌した。得られた反応混合物に水20mlを加えて、反応を停止させ、CHCl20mlで2回抽出し、飽和食塩水20mlで洗浄した。次いで、硫酸マグネシウムで乾燥し、ろ過した後、CHClを減圧下留去し、得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=3:1)で精製し、化合物(4b)1.27gを収率92%で得た。
H−NMR(500MHz,CDCl
δ:0.93(m,6H),1.36(m,4H),1.58(m,1H),1.76(m,2H),1.95(m,1H),3.04(s,3H),3.74(dd,J=12.4,3.3Hz,2H),4.08(dd,J=15.6,3.3Hz,2H),4.43(d,J=7.5Hz,2H)
1.0 g of the compound (3b) obtained in Synthesis Example A1 was dissolved in 20 ml of CH 2 Cl 2 , 1.03 ml of triethylamine was further added, and the mixture was cooled to -20°C. Then, 0.459 ml of MsCl was added to the reaction solution, and the mixture was stirred at -20°C for 1 hour. The reaction mixture was added with 20 ml of water to stop the reaction, extracted twice with 20 ml of CH 2 Cl 2 and washed with 20 ml of saturated saline. Then, after drying over magnesium sulfate and filtering, CH 2 Cl 2 was distilled off under reduced pressure, and the obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=3:1) to obtain the compound (4b ) 1.27 g was obtained with a yield of 92%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.93 (m, 6H), 1.36 (m, 4H), 1.58 (m, 1H), 1.76 (m, 2H), 1.95 (m, 1H), 3.04 (S, 3H), 3.74 (dd, J=12.4, 3.3 Hz, 2H), 4.08 (dd, J=15.6, 3.3 Hz, 2H), 4.43 (d, J=7.5Hz, 2H)

合成例B3(工程B:RSynthesis Example B3 (Step B: R Two =n−ブチル)= N-butyl)
2,2−ジ−n−ブチル−5−メタンスルホニルオキシメチル−1,3−ジオキサン(4c)の合成Synthesis of 2,2-di-n-butyl-5-methanesulfonyloxymethyl-1,3-dioxane (4c)

Figure 2020109131
Figure 2020109131

合成例A2で得られた化合物(3c)156mgを、CHCl2.7mlに溶解させ、さらにトリエチルアミン0.14mlを加えて、−20℃に冷却した。次いで、MsCl0.062mlを加えて、−20℃で1時間撹拌した。得られた反応混合物に水1.8mlを加えて、反応を停止させ、CHCl1.8mlで2回抽出し、有機層を飽和食塩水1.8mlで洗浄した。次いで、硫酸マグネシウムで乾燥し、ろ過した後、CHClを減圧下、留去し、得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=3:1)で精製し、化合物(4c)169mgを収率81%で得た。
H−NMR(500MHz,CDCl
δ:0.92(m,6H),1.30(m,8H),1.61(m,2H),1.78(m,2H),1.96(m,1H),3.04(s,3H),3.74(dd,J=12.6,3.6Hz,2H),4.08(dd,J=12.5,3.5Hz,2H),4.43(d,J=7.4Hz,2H)
156 mg of the compound (3c) obtained in Synthesis Example A2 was dissolved in 2.7 ml of CH 2 Cl 2, 0.14 ml of triethylamine was further added, and the mixture was cooled to -20°C. Then, 0.062 ml of MsCl was added, and the mixture was stirred at -20°C for 1 hour. 1.8 ml of water was added to the obtained reaction mixture to stop the reaction, extraction was performed twice with 1.8 ml of CH 2 Cl 2 , and the organic layer was washed with 1.8 ml of saturated saline. Then, after drying over magnesium sulfate and filtering, CH 2 Cl 2 was distilled off under reduced pressure, and the obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=3:1) to obtain a compound ( 4c) 169 mg was obtained with a yield of 81%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.92 (m, 6H), 1.30 (m, 8H), 1.61 (m, 2H), 1.78 (m, 2H), 1.96 (m, 1H), 3.04 (S, 3H), 3.74 (dd, J=12.6, 3.6 Hz, 2H), 4.08 (dd, J=12.5, 3.5 Hz, 2H), 4.43 (d, J=7.4Hz, 2H)

合成例B4(工程B:RSynthesis Example B4 (Step B: R Two =フェニル)= Phenyl)
2,2−ジフェニル−5−メタンスルホニルオキシメチル−1,3−ジオキサン(4d)の合成Synthesis of 2,2-diphenyl-5-methanesulfonyloxymethyl-1,3-dioxane (4d)

Figure 2020109131
Figure 2020109131

合成例A3で得られた化合物(3d)640mgを、CHCl9.6mlに溶解させ、さらにトリエチルアミン493μlを加えて、−20℃に冷却した。次いでMsCl220μlを加えて、−20℃で1時間撹拌した。得られた反応混合物に水6.4mlを加えて、反応を停止させ、CHCl6.4mlで2回抽出し、有機層を飽和食塩水6.4mlで洗浄した。次いで硫酸マグネシウムで乾燥し、ろ過した後、CHClを減圧下、留去し、得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=3:1)で精製し、化合物(4d)729mgを収率88%で得た。
H−NMR(500MHz,CDCl
δ:2.06(m,1H),3.03(s,3H),3.95(dd,J=12.2,3.7Hz,2H),4.18(dd,J=12.2,3.4Hz,2H),4.51(d,J=7.5Hz,2H),7.25(m,1H),7.30(m,3H),7.39(m,2H),7.49(m,4H)
640 mg of the compound (3d) obtained in Synthesis Example A3 was dissolved in 9.6 ml of CH 2 Cl 2, 493 μl of triethylamine was further added, and the mixture was cooled to −20° C. Then, 220 μl of MsCl was added, and the mixture was stirred at −20° C. for 1 hour. Water 6.4 ml was added to the obtained reaction mixture to stop the reaction, extraction was performed twice with CH 2 Cl 2 6.4 ml, and the organic layer was washed with saturated saline 6.4 ml. Then, after drying over magnesium sulfate and filtering, CH 2 Cl 2 was distilled off under reduced pressure, and the obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=3:1) to give the compound (4d ) 729 mg was obtained with a yield of 88%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 2.06 (m, 1H), 3.03 (s, 3H), 3.95 (dd, J=12.2, 3.7 Hz, 2H), 4.18 (dd, J=12.2) , 3.4 Hz, 2H), 4.51 (d, J=7.5 Hz, 2H), 7.25 (m, 1H), 7.30 (m, 3H), 7.39 (m, 2H), 7.49 (m, 4H)

[工程(C)]
合成例C1−1(工程C:R =メチル、塩基=TEA、溶媒=メチルエチルケトン)2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成
[Process (C)]
Synthesis Example C1-1 (Step C: R 2 =methyl, base=TEA, solvent=methyl ethyl ketone) Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)400.0mgを、メチルエチルケトン6mlに溶解させ、これにトリエチルアミン12μl及びヨウ化ナトリウム401.1mgを加えて、1.5時間加熱還流した。次いで、減圧下、反応混合物中のメチルエチルケトンを留去し、これにCHCl10ml及び水10mlを加えて分液した。水層をCHCl10mlで2回抽出し、有機層を5%チオ硫酸ナトリウム5ml及び1%炭酸水素ナトリウム水5mlを加えて洗浄した。さらに、水10mlで有機層を洗浄し、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=5:1)で精製し、化合物(5a)394.1gを収率86%で得た。
H−NMR(500MHz,CDCl
δ:1.41(s,3H),1.43(s,3H),1.95(m,1H),3.23(d,J=7Hz,2H),3.73(dd,J=12,6.5Hz,2H),4.01(dd,J=11.5,4Hz,2H)
400.0 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 6 ml of methyl ethyl ketone, 12 μl of triethylamine and 401.1 mg of sodium iodide were added, and the mixture was heated under reflux for 1.5 hours. Then, under reduced pressure, methyl ethyl ketone in the reaction mixture was distilled off, and CH 2 Cl 2 ( 10 ml) and water (10 ml) were added thereto for liquid separation. The aqueous layer was extracted twice with 10 ml of CH 2 Cl 2 , and the organic layer was washed by adding 5 ml of 5% sodium thiosulfate and 5 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 10 ml of water, and CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=5:1) to obtain 394.1 g of compound (5a) in a yield of 86%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.41 (s, 3H), 1.43 (s, 3H), 1.95 (m, 1H), 3.23 (d, J=7 Hz, 2H), 3.73 (dd, J=) 12, 6.5Hz, 2H), 4.01 (dd, J=11.5, 4Hz, 2H)

合成例C1−2(工程C:RSynthesis Example C1-2 (Step C: R Two =n−プロピル)= N-propyl)
2,2−ジ−n−プロピル−5−ヨードメチル−1,3−ジオキサン(5b)の合成Synthesis of 2,2-di-n-propyl-5-iodomethyl-1,3-dioxane (5b)

Figure 2020109131
Figure 2020109131

合成例B2で得られた化合物(4b)1.20gを、メチルエチルケトン14.3mlに溶解させ、さらにトリエチルアミン30μl及びヨウ化ナトリウム966mgを加えて、2時間加熱還流した。反応液中のメチルエチルケトンを減圧下留去し、CHCl15ml及び水15mlを加えて、分液した。水層をCHCl15mlで2回抽出し、有機層を5%チオ硫酸ナトリウム7.5ml及び1%炭酸水素ナトリウム水7.5mlで洗浄した。さらに、飽和食塩水15mlで有機層を洗浄した。次いで、硫酸マグネシウムで乾燥し、ろ過した後、減圧下、CHClを留去し、得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5b)1.16gを収率86%で得た。
H−NMR(500MHz,CDCl
δ:0.93(t,J=7.3Hz,6H),1.35(m,4H),1.66(m,4H),1.90(m,1H),3.25(d,J=7.2Hz,2H),3.71(dd,J=11.8,6.0Hz,2H),4.01(dd,J=11.9,3.9Hz,2H)
1.20 g of the compound (4b) obtained in Synthesis Example B2 was dissolved in 14.3 ml of methyl ethyl ketone, 30 μl of triethylamine and 966 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Methyl ethyl ketone in the reaction solution was evaporated under reduced pressure, CH 2 Cl 2 ( 15 ml) and water (15 ml) were added, and the layers were separated. The aqueous layer was extracted twice with 15 ml of CH 2 Cl 2 , and the organic layer was washed with 7.5 ml of 5% sodium thiosulfate and 7.5 ml of 1% aqueous sodium hydrogen carbonate solution. Further, the organic layer was washed with 15 ml of saturated saline. Then, after drying over magnesium sulfate and filtering, CH 2 Cl 2 was distilled off under reduced pressure, and the obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain a compound ( 5b) 1.16 g was obtained with a yield of 86%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.93 (t, J=7.3 Hz, 6H), 1.35 (m, 4H), 1.66 (m, 4H), 1.90 (m, 1H), 3.25 (d, J=7.2 Hz, 2H), 3.71 (dd, J=11.8, 6.0 Hz, 2H), 4.01 (dd, J=11.9, 3.9 Hz, 2H)

合成例C1−3(工程C:RSynthesis Example C1-3 (Step C: R Two =n−ブチル)= N-butyl)
2,2−ジ−n−ブチル−5−ヨードメチル−1,3−ジオキサン(5c)の合成Synthesis of 2,2-di-n-butyl-5-iodomethyl-1,3-dioxane (5c)

Figure 2020109131
Figure 2020109131

合成例B3で得られた化合物(4c)169mgを、メチルエチルケトン2.9mlに溶解させ、さらにトリエチルアミン3.8μl及びヨウ化ナトリウム123mgを加えて、2時間加熱還流した。次いで、反応液中のメチルエチルケトンを減圧下留去し、CHCl3ml及び水3mlを加えて分液した。次いで、水層をCHCl3mlで2回抽出し、有機層を5%チオ硫酸ナトリウム1.5ml及び1%炭酸水素ナトリウム水1.5mlで洗浄した。さらに、飽和食塩水3mlで有機層を洗浄した。次いで、硫酸マグネシウムで乾燥し、ろ過した後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5c)139mgを収率75%で得た。
H−NMR(500MHz,CDCl
δ:0.92(m,6H),1.30(m,8H),1.68(m,4H),1.91(m,1H),3.25(d,J=7.2Hz,2H),3.71(dd,J=12.0,6.2Hz,2H),4.00(dd,J=11.9,4.0Hz,2H)
169 mg of the compound (4c) obtained in Synthesis Example B3 was dissolved in 2.9 ml of methyl ethyl ketone, 3.8 μl of triethylamine and 123 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Then, methyl ethyl ketone in the reaction solution was distilled off under reduced pressure, and CH 2 Cl 2 ( 3 ml) and water (3 ml) were added to separate the layers. Then, the aqueous layer was extracted twice with 3 ml of CH 2 Cl 2 and the organic layer was washed with 1.5 ml of 5% sodium thiosulfate and 1.5 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 3 ml of saturated saline. Then, after drying with magnesium sulfate and filtering, CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 139 mg of compound (5c) in a yield of 75%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.92 (m, 6H), 1.30 (m, 8H), 1.68 (m, 4H), 1.91 (m, 1H), 3.25 (d, J=7.2Hz, 2H), 3.71 (dd, J=12.0, 6.2 Hz, 2H), 4.00 (dd, J=11.9, 4.0 Hz, 2H)

合成例C1−4(工程C:RSynthesis Example C1-4 (Step C: R Two =フェニル)= Phenyl)
2,2−ジフェニル−5−ヨードメチル−1,3−ジオキサン(5d)の合成Synthesis of 2,2-diphenyl-5-iodomethyl-1,3-dioxane (5d)

Figure 2020109131
Figure 2020109131

合成例B4で得られた化合物(4d)729mgを、メチルエチルケトン10.9mlに溶解させ、さらにトリエチルアミン14.5μl及びヨウ化ナトリウム470mgを加えて、2時間加熱還流した。反応液中のメチルエチルケトンを減圧下留去し、CHCl5ml及び水5mlを加えて分液した。水層をCHCl3mlで2回抽出し、有機層を5%チオ硫酸ナトリウム2.5ml及び1%炭酸水素ナトリウム水2.5mlで洗浄した。さらに、飽和食塩水5mlで有機層を洗浄した。次いで、硫酸マグネシウムで乾燥し、ろ過した後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5d)726mgを収率91%で得た。
H−NMR(500MHz,CDCl
δ:2.10(m,1H),3.25(d,J=7.5Hz,2H),3.84(dd,J=11.7,6.3Hz,2H),4.16(dd,J=11.7,3.8Hz,2H),7.26(m,2H),7.34(m,4H),7.50(m,4H)
729 mg of the compound (4d) obtained in Synthesis Example B4 was dissolved in 10.9 ml of methyl ethyl ketone, 14.5 μl of triethylamine and 470 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Methyl ethyl ketone in the reaction solution was distilled off under reduced pressure, and CH 2 Cl 2 ( 5 ml) and water (5 ml) were added to separate the layers. The aqueous layer was extracted twice with 3 ml of CH 2 Cl 2 , and the organic layer was washed with 2.5 ml of 5% sodium thiosulfate and 2.5 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 5 ml of saturated saline. Then, after drying with magnesium sulfate and filtering, CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 726 mg of compound (5d) in a yield of 91%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 2.10 (m, 1H), 3.25 (d, J=7.5 Hz, 2H), 3.84 (dd, J=11.7, 6.3 Hz, 2H), 4.16 (dd , J=11.7, 3.8 Hz, 2H), 7.26 (m, 2H), 7.34 (m, 4H), 7.50 (m, 4H).

合成例C2−1(工程C:溶媒=アセトン+メチルイソブチルケトン)Synthesis example C2-1 (step C: solvent = acetone + methyl isobutyl ketone)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)300mgを、アルゴン雰囲気下、アセトン3ml及びメチルイソブチルケトン3mlに溶解させ、さらにトリエチルアミン9.3μl及びヨウ化ナトリウム301mgを加えて、2時間加熱還流した。反応液中のアセトン及びメチルイソブチルケトンを減圧下留去し、これにCHCl6ml及び水6mlを加えて、分液した。水層をCHCl6mlで2回抽出し、有機層を5%チオ硫酸ナトリウム3ml及び1%炭酸水素ナトリウム水3mlで洗浄した。さらに、飽和食塩水6mlで有機層を洗浄し、硫酸マグネシウムで乾燥後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5a)266mgを収率78%で得た。 300 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 3 ml of acetone and 3 ml of methyl isobutyl ketone under an argon atmosphere, 9.3 μl of triethylamine and 301 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Acetone and methyl isobutyl ketone in the reaction solution were distilled off under reduced pressure, CH 2 Cl 2 (6 ml) and water (6 ml) were added thereto, and the layers were separated. The aqueous layer was extracted twice with 6 ml of CH 2 Cl 2 and the organic layer was washed with 3 ml of 5% sodium thiosulfate and 3 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 6 ml of saturated saline and dried over magnesium sulfate, and then CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 266 mg of compound (5a) in a yield of 78%.

合成例C2−2(工程C:溶媒=アセトン)Synthesis example C2-2 (step C: solvent=acetone)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)300mgを、アルゴン雰囲気下、アセトン6mlに溶解させ、さらにトリエチルアミン9.3μl及びヨウ化ナトリウム301mgを加えて、2時間加熱還流した。反応液中のアセトンを減圧下留去し、CHCl6ml及び水6mlを加えて、分液した。水層をCHCl6mlで2回抽出し、有機層を5%チオ硫酸ナトリウム3ml及び1%炭酸水素ナトリウム水3mlで洗浄した。さらに、飽和食塩水6mlで有機層を洗浄し、硫酸マグネシウムで乾燥後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5a)204mgを収率59%で得た。 300 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 6 ml of acetone under an argon atmosphere, 9.3 μl of triethylamine and 301 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Acetone in the reaction solution was evaporated under reduced pressure, CH 2 Cl 2 (6 ml) and water (6 ml) were added, and the layers were separated. The aqueous layer was extracted twice with 6 ml of CH 2 Cl 2 and the organic layer was washed with 3 ml of 5% sodium thiosulfate and 3 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 6 ml of saturated saline and dried over magnesium sulfate, and then CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 204 mg of compound (5a) in a yield of 59%.

合成例C2−3(工程C:溶媒=メチルイソブチルケトン)Synthesis example C2-3 (step C: solvent = methyl isobutyl ketone)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)300mgを、アルゴン雰囲気下、メチルイソブチルケトン6mlに溶解させ、トリエチルアミン9.3μl及びヨウ化ナトリウム301mgを加えて、2時間加熱還流した。反応液中のメチルイソブチルケトンを減圧下留去し、CHCl6ml及び水6mlを加えて、分液した。水層をCHCl6mlで2回抽出し、有機層を5%チオ硫酸ナトリウム3ml及び1%炭酸水素ナトリウム水3mlで洗浄した。さらに、飽和食塩水6mlで有機層を洗浄し、硫酸マグネシウムで乾燥後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5a)190mgを収率55%で得た。 300 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 6 ml of methyl isobutyl ketone under an argon atmosphere, 9.3 μl of triethylamine and 301 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Methyl isobutyl ketone in the reaction solution was evaporated under reduced pressure, CH 2 Cl 2 (6 ml) and water (6 ml) were added, and the layers were separated. The aqueous layer was extracted twice with 6 ml of CH 2 Cl 2 and the organic layer was washed with 3 ml of 5% sodium thiosulfate and 3 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 6 ml of saturated saline and dried over magnesium sulfate, and then CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 190 mg of compound (5a) in a yield of 55%.

合成例C3−1(工程C:アルカリ金属ハロゲン化物=臭化ナトリウム)Synthesis Example C3-1 (Step C: alkali metal halide = sodium bromide)
2,2−ジメチル−5−ブロモメチル−1,3−ジオキサン(5a-1)の合成Synthesis of 2,2-dimethyl-5-bromomethyl-1,3-dioxane (5a-1)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)300mgを、アルゴン雰囲気下、メチルエチルケトン6mlに溶解させ、さらにトリエチルアミン9.3μl及び臭化ナトリウム207mgを加えて、23時間加熱還流した。反応液中のメチルエチルケトンを減圧下留去し、CHCl6ml及び水6mlを加えて、分液した。水層をCHCl6mlで2回抽出し、有機層を5%チオ硫酸ナトリウム3ml及び1%炭酸水素ナトリウム水3mlで洗浄した。さらに、飽和食塩水6mlで有機層を洗浄し、硫酸マグネシウムで乾燥後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5a−1)127mgを収率45%で得た。
H−NMR(500MHz,CDCl
δ:1.41(s,3H),1.44(s,3H),2.02(m,1H),3.51(d,J=7.1Hz,2H),3.80(dd,J=12,5.7Hz,2H),4.05(dd,J=12,4Hz,2H)
300 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 6 ml of methyl ethyl ketone under an argon atmosphere, 9.3 μl of triethylamine and 207 mg of sodium bromide were added, and the mixture was heated under reflux for 23 hours. Methyl ethyl ketone in the reaction solution was evaporated under reduced pressure, CH 2 Cl 2 (6 ml) and water (6 ml) were added, and the layers were separated. The aqueous layer was extracted twice with 6 ml of CH 2 Cl 2 and the organic layer was washed with 3 ml of 5% sodium thiosulfate and 3 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 6 ml of saturated saline and dried over magnesium sulfate, and then CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 127 mg of compound (5a-1) in a yield of 45%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.41 (s, 3H), 1.44 (s, 3H), 2.02 (m, 1H), 3.51 (d, J=7.1 Hz, 2H), 3.80 (dd, J=12,5.7 Hz, 2H), 4.05 (dd, J=12,4 Hz, 2H)

合成例C4−1(工程C:塩基=ジイソプロピルエチレンアミン)Synthesis example C4-1 (step C: base = diisopropylethyleneamine)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)300mgを、アルゴン雰囲気下、メチルエチルケトン6mlに溶解させ、さらにジイソプロピルエチレンアミン12μl及びヨウ化ナトリウム301mgを加えて、2時間加熱還流した。反応液中のメチルエチルケトンを減圧下留去し、CHCl6ml及び水6mlを加えて、分液した。水層をCHCl6mlで2回抽出し、有機層を5%チオ硫酸ナトリウム3ml及び1%炭酸水素ナトリウム水3mlで洗浄した。さらに、飽和食塩水6mlで有機層を洗浄し、硫酸マグネシウムで乾燥後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5a)262mgを収率78%で得た。 300 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 6 ml of methyl ethyl ketone under an argon atmosphere, 12 μl of diisopropylethyleneamine and 301 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Methyl ethyl ketone in the reaction solution was evaporated under reduced pressure, CH 2 Cl 2 (6 ml) and water (6 ml) were added, and the layers were separated. The aqueous layer was extracted twice with 6 ml of CH 2 Cl 2 and the organic layer was washed with 3 ml of 5% sodium thiosulfate and 3 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 6 ml of saturated saline and dried over magnesium sulfate, and then CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 262 mg of compound (5a) in a yield of 78%.

合成例C4−2(工程C:塩基=炭酸水素ナトリウム、溶媒=メチルエチルケトン)2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis Example C4-2 (Step C: base=sodium hydrogen carbonate, solvent=methyl ethyl ketone) Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)300mgを、アルゴン雰囲気下、メチルエチルケトン6mlに溶解させ、さらに炭酸水素ナトリウム5.6mg及びヨウ化ナトリウム301mgを加えて、2時間加熱還流した。反応液中のメチルエチルケトンを減圧下留去し、CHCl6ml及び水6mlを加えて、分液した。水層をCHCl6mlで2回抽出し、有機層を5%チオ硫酸ナトリウム3ml及び1%炭酸水素ナトリウム水3mlで洗浄した。さらに、飽和食塩水6mlで有機層を洗浄し、硫酸マグネシウムで乾燥後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5a)234mgを収率68%で得た。 300 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 6 ml of methyl ethyl ketone under an argon atmosphere, 5.6 mg of sodium hydrogen carbonate and 301 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Methyl ethyl ketone in the reaction solution was evaporated under reduced pressure, CH 2 Cl 2 (6 ml) and water (6 ml) were added, and the layers were separated. The aqueous layer was extracted twice with 6 ml of CH 2 Cl 2 and the organic layer was washed with 3 ml of 5% sodium thiosulfate and 3 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 6 ml of saturated saline and dried over magnesium sulfate, and then CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 234 mg of compound (5a) in a yield of 68%.

合成例C4−3(工程C:塩基=NaHCOSynthesis Example C4-3 (Step C: base = NaHCO3 Three 、溶媒=アセトン), Solvent = acetone)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)15.0gを、アセトン225mlに溶解させ、これに炭酸水素ナトリウム5.62g及びヨウ化ナトリウム20.05gを加えて、19時間加熱還流した。次いで、白色固体を濾過し、アセトンで洗浄後、減圧下アセトンを留去し、これにCHCl150mlを加え、有機層に、5%チオ硫酸ナトリウム50ml及び1%炭酸水素ナトリウム水50mlを加えて分液した。CHCl50mlで抽出し、5%食塩水で有機層を洗浄し、減圧下CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=5:1)で精製し、化合物(5a)14.00gを収率82%で得た。 15.0 g of the compound (4a) obtained in Synthesis Example B1 was dissolved in 225 ml of acetone, and 5.62 g of sodium hydrogen carbonate and 20.05 g of sodium iodide were added, and the mixture was heated under reflux for 19 hours. Then, the white solid was filtered and washed with acetone, and then acetone was distilled off under reduced pressure, 150 ml of CH 2 Cl 2 was added thereto, and 50 ml of 5% sodium thiosulfate and 50 ml of 1% aqueous sodium hydrogen carbonate solution were added to the organic layer. In addition, liquid separation was performed. It was extracted with 50 ml of CH 2 Cl 2 , the organic layer was washed with 5% brine, and CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=5:1) to obtain 14.00 g of compound (5a) in a yield of 82%.

合成例C4−4(工程C:塩基=炭酸水素カリウム)Synthesis example C4-4 (step C: base = potassium hydrogen carbonate)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)300mgを、アルゴン雰囲気下、メチルエチルケトン6mlに溶解させ、さらに炭酸水素カリウム6.7mg及びヨウ化ナトリウム301mgを加えて、2時間加熱還流した。反応液中のメチルエチルケトンを減圧下留去し、CHCl6ml及び水6mlを加えて、分液した。水層をCHCl6mlで2回抽出し、有機層を5%チオ硫酸ナトリウム3ml及び1%炭酸水素ナトリウム水3mlで洗浄した。さらに、飽和食塩水6mlで有機層を洗浄し、硫酸マグネシウムで乾燥後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5a)106mgを収率31%で得た。 300 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 6 ml of methyl ethyl ketone under an argon atmosphere, 6.7 mg of potassium hydrogen carbonate and 301 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Methyl ethyl ketone in the reaction solution was evaporated under reduced pressure, CH 2 Cl 2 (6 ml) and water (6 ml) were added, and the layers were separated. The aqueous layer was extracted twice with 6 ml of CH 2 Cl 2 and the organic layer was washed with 3 ml of 5% sodium thiosulfate and 3 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 6 ml of saturated saline and dried over magnesium sulfate, and then CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 106 mg of compound (5a) in a yield of 31%.

合成例C4−5(工程C:塩基=炭酸カリウム)Synthesis example C4-5 (step C: base = potassium carbonate)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)300mgを、アルゴン雰囲気下、メチルエチルケトン6mlに溶解させ、さらに炭酸カリウム及びヨウ化ナトリウム301mgを加えて、2時間加熱還流した。反応液中のメチルエチルケトンを減圧下留去し、CHCl6ml及び水6mlを加えて、分液した。水層をCHCl6mlで2回抽出し、有機層を5%チオ硫酸ナトリウム3ml及び1%炭酸水素ナトリウム水3mlで洗浄した。さらに、飽和食塩水6mlで有機層を洗浄し、硫酸マグネシウムで乾燥後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5a)209mgを収率61%で得た。 300 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 6 ml of methyl ethyl ketone under an argon atmosphere, potassium carbonate and 301 mg of sodium iodide were further added, and the mixture was heated under reflux for 2 hours. Methyl ethyl ketone in the reaction solution was evaporated under reduced pressure, CH 2 Cl 2 (6 ml) and water (6 ml) were added, and the layers were separated. The aqueous layer was extracted twice with 6 ml of CH 2 Cl 2 and the organic layer was washed with 3 ml of 5% sodium thiosulfate and 3 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 6 ml of saturated saline and dried over magnesium sulfate, and then CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 209 mg of compound (5a) in a yield of 61%.

合成例C4−6(工程C:塩基=炭酸ナトリウム)Synthesis example C4-6 (step C: base = sodium carbonate)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

合成例B1で得られた化合物(4a)300mgを、アルゴン雰囲気下、メチルエチルケトン6mlに溶解させ、さらに炭酸ナトリウム及びヨウ化ナトリウム301mgを加えて、2時間加熱還流した。反応液中のメチルエチルケトンを減圧下留去し、CHCl6ml及び水6mlを加えて、分液した。水層をCHCl6mlで2回抽出し、有機層を5%チオ硫酸ナトリウム3ml及び1%炭酸水素ナトリウム水3mlで洗浄した。さらに、飽和食塩水6mlで有機層を洗浄し、硫酸マグネシウムで乾燥後、減圧下、CHClを留去した。得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=10:1)で精製し、化合物(5a)270mgを収率79%で得た。 300 mg of the compound (4a) obtained in Synthesis Example B1 was dissolved in 6 ml of methyl ethyl ketone under an argon atmosphere, further sodium carbonate and 301 mg of sodium iodide were added, and the mixture was heated under reflux for 2 hours. Methyl ethyl ketone in the reaction solution was evaporated under reduced pressure, CH 2 Cl 2 (6 ml) and water (6 ml) were added, and the layers were separated. The aqueous layer was extracted twice with 6 ml of CH 2 Cl 2 and the organic layer was washed with 3 ml of 5% sodium thiosulfate and 3 ml of 1% aqueous sodium hydrogen carbonate. Further, the organic layer was washed with 6 ml of saturated saline and dried over magnesium sulfate, and then CH 2 Cl 2 was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=10:1) to obtain 270 mg of compound (5a) in a yield of 79%.

[工程(B’)]
合成例B1(工程B’:溶媒=ジクロロメタン)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成
[Process (B')]
Synthesis example B1 (step B′: solvent=dichloromethane)
Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

2,2−ジメチル−5−(ヒドロキシメチル)−1,3−ジオキサン(3a)1.00gをジクロロメタン(MDC)22.8mlに溶解させ、これにイミダゾール700.0mg及びヨウ素2.08gを加えて、0℃に冷却後、続いてトリフェニルホスフィン2.15gを加えて、25℃で2時間撹拌した。その後、水20mlでクエンチし、ジクロロメタン10mlで2回抽出し、水20mlで洗浄した。有機相を減圧下、ジクロロメタンを留去し、得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=5:1)で精製し、2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)1.38gを収率79%で得た。 1.00 g of 2,2-dimethyl-5-(hydroxymethyl)-1,3-dioxane (3a) was dissolved in 22.8 ml of dichloromethane (MDC), and 700.0 mg of imidazole and 2.08 g of iodine were added thereto. After cooling to 0° C., 2.15 g of triphenylphosphine was subsequently added, and the mixture was stirred at 25° C. for 2 hours. Then, it was quenched with 20 ml of water, extracted twice with 10 ml of dichloromethane, and washed with 20 ml of water. Dichloromethane was distilled off from the organic phase under reduced pressure, and the obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=5:1) to obtain 2,2-dimethyl-5-iodomethyl-1,3-. 1.38 g of dioxane (5a) was obtained with a yield of 79%.

合成例B2(工程B’:溶媒=THF)Synthesis example B2 (step B': solvent = THF)
2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-iodomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

2,2−ジメチル−5−(ヒドロキシメチル)−1,3−ジオキサン(3a)500.0mgをテトラヒドロフラン3.4mlに溶解させ、0℃に冷却後、これにトリフェニルホスフィン1.08g、イミダゾール279.5mg、及びヨウ素1.04gをそれぞれ加えて、25℃で2.5時間撹拌した。その後、5%チオ硫酸ナトリウム水溶液10mlで洗浄し、酢酸エチル20mlで抽出し、5%食塩水で洗浄した。有機相を硫酸マグネシウムで乾燥後、濾過、減圧下、酢酸エチルを留去し、得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=5:1)で精製し、2,2−ジメチル−5−ヨードメチル−1,3−ジオキサン(5a)639.0mgを収率73%で得た。 500.0 mg of 2,2-dimethyl-5-(hydroxymethyl)-1,3-dioxane (3a) was dissolved in 3.4 ml of tetrahydrofuran, and after cooling to 0°C, 1.08 g of triphenylphosphine and 279 of imidazole were added thereto. 0.5 mg and 1.04 g of iodine were added, and the mixture was stirred at 25° C. for 2.5 hours. Then, it was washed with 10% of 5% aqueous sodium thiosulfate solution, extracted with 20 ml of ethyl acetate, and washed with 5% saline. The organic phase was dried over magnesium sulfate, filtered, and ethyl acetate was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=5:1) to obtain 2,2-dimethyl. 639.0 mg of -5-iodomethyl-1,3-dioxane (5a) was obtained with a yield of 73%.

合成例B3(工程B’:溶媒=CPME)Synthesis example B3 (step B': solvent = CPME)
2,2−ジメチル−5−ブロモメチル−1,3−ジオキサン(5a)の合成Synthesis of 2,2-dimethyl-5-bromomethyl-1,3-dioxane (5a)

Figure 2020109131
Figure 2020109131

2,2−ジメチル−5−(ヒドロキシメチル)−1,3−ジオキサン(3a)500.0mgをテトラヒドロフラン6.8mlに溶解させ、0℃に冷却後、トリフェニルホスフィン1.08g、イミダゾール279.5mg、及びヨウ素1.04gをそれぞれ加えて、25℃で2時間撹拌した。その後、トリフェニルホスフィンオキシドを除去し、CPME10mlで洗浄後、有機相を5%チオ硫酸ナトリウム水溶液10mlで洗浄し、CPME10mlで3回抽出し、5%食塩水で洗浄した。減圧下、CPMEを留去し、得られた残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=5:1)で精製し、2,2−ジメチル−5−ブロモメチル−1,3−ジオキサン(5a)621.1mgを収率71%で得た。 500.0 mg of 2,2-dimethyl-5-(hydroxymethyl)-1,3-dioxane (3a) was dissolved in 6.8 ml of tetrahydrofuran and, after cooling to 0° C., 1.08 g of triphenylphosphine and 279.5 mg of imidazole. , And 1.04 g of iodine were added, and the mixture was stirred at 25° C. for 2 hours. Then, triphenylphosphine oxide was removed, and after washing with 10 ml of CPME, the organic phase was washed with 10 ml of a 5% sodium thiosulfate aqueous solution, extracted 3 times with 10 ml of CPME, and washed with 5% saline. CPME was distilled off under reduced pressure, and the obtained residue was purified by silica gel chromatography (n-hexane:ethyl acetate=5:1) to obtain 2,2-dimethyl-5-bromomethyl-1,3-dioxane (5a ) 621.1 mg was obtained with a yield of 71%.

合成例B4(工程B’:溶媒=ジクロロメタン)Synthesis example B4 (step B': solvent = dichloromethane)
2,2−ジメチル−5−ブロモメチル−1,3−ジオキサン(5b)の合成Synthesis of 2,2-dimethyl-5-bromomethyl-1,3-dioxane (5b)

Figure 2020109131
Figure 2020109131

2,2−ジメチル−5−(ヒドロキシメチル)−1,3−ジオキサン(3a)1.00gをジクロロメタン(MDC)22.8mlに溶解させ、これにイミダゾール700.0mg、及び四臭化炭素2.72gを加えて、氷冷後、続いてトリフェニルホスフィン2.15gを加えて、室温で4時間撹拌した。減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=5:1)で精製し、2,2−ジメチル−5−ブロモメチル−1,3−ジオキサン(5b)1.60gを定量的に得た。 2,2-Dimethyl-5-(hydroxymethyl)-1,3-dioxane (3a) (1.00 g) was dissolved in dichloromethane (MDC) 22.8 ml, and imidazole 700.0 mg and carbon tetrabromide 2. After adding 72 g and cooling with ice, 2.15 g of triphenylphosphine was subsequently added and the mixture was stirred at room temperature for 4 hours. Dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (n-hexane:ethyl acetate=5:1) to obtain 1.60 g of 2,2-dimethyl-5-bromomethyl-1,3-dioxane (5b). Obtained quantitatively.

[工程(D)]
合成例D1−1(工程D:R =メチル)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成
[Process (D)]
Synthesis example D1-1 (step D: R 2 = methyl)
Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)300.0mgを、DMF2.34mlに溶解させ、さらに炭酸セシウム763.4mg及び亜リン酸ジメチル215μlを加えて、40℃で5時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン5mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン5mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6a)255.6mgを収率92%で得た。
H−NMR(500MHz,CDCl
δ:1.42(s,6H),1.82(dd,J=18.5,6.5Hz,2H),2.15(m,1H),3.66(dd,J=11.5,7Hz,2H),3.75(d,J=10.5Hz,6H),4.01(d,J=12,3.5Hz,2H)
300.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 2.34 ml of DMF, 763.4 mg of cesium carbonate and 215 μl of dimethyl phosphite were added, and the mixture was stirred at 40° C. for 5 hours. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 5 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 5 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 255.6 mg of dimethyl phosphonate compound (6a). Was obtained with a yield of 92%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.42 (s, 6H), 1.82 (dd, J=18.5, 6.5Hz, 2H), 2.15 (m, 1H), 3.66 (dd, J=11.5) , 7Hz, 2H), 3.75 (d, J = 10.5Hz, 6H), 4.01 (d, J = 12, 3.5Hz, 2H)

合成例D1−2(工程D:RSynthesis Example D1-2 (Step D: R Two =n−プロピル)= N-propyl)
(2,2−ジ−n−プロピル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6b)の合成Synthesis of (2,2-di-n-propyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6b)

Figure 2020109131
Figure 2020109131

合成例C1−2で得られたヨウ素化合物(5b)1.06gを、DMF6.8mlに溶解させ、さらに炭酸セシウム2.21g及び亜リン酸ジメチル621μlを加えて、40℃で3時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン5mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン2.5mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=20:1)で精製し、ホスホン酸ジメチル化合物(6b)767mgを収率79%で得た。
H−NMR(500MHz,CDCl
δ:0.91(t,J=7.4Hz,6H),1.36(m,4H),1.66(m,4H),1.84(dd,J=18.7,6.9Hz,2H),2.09(m,1H),3.63(dd,J=11.7,6.6Hz,2H),3.75(d,J=10.9Hz,6H),3.99(dd、J=11.7,3.8Hz,2H)
1.06 g of the iodine compound (5b) obtained in Synthesis Example C1-2 was dissolved in 6.8 ml of DMF, 2.21 g of cesium carbonate and 621 μl of dimethyl phosphite were added, and the mixture was stirred at 40° C. for 3 hours. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 5 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 2.5 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=20:1) to give phosphonic acid dimethyl compound (6b) (767 mg). Was obtained with a yield of 79%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.91 (t, J = 7.4 Hz, 6H), 1.36 (m, 4H), 1.66 (m, 4H), 1.84 (dd, J = 18.7, 6.9Hz). , 2H), 2.09 (m, 1H), 3.63 (dd, J = 11.7, 6.6Hz, 2H), 3.75 (d, J = 10.9Hz, 6H), 3.99. (Dd, J=11.7, 3.8 Hz, 2H)

合成例D1−3(工程D:RSynthesis Example D1-3 (Step D: R Two =ブチル)= Butyl)
(2,2−ジブチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6c)の合成Synthesis of (2,2-dibutyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6c)

Figure 2020109131
Figure 2020109131

合成例C1−3で得られたヨウ素化合物(5c)139mgを、DMF1.2mlに溶解させ、さらに炭酸セシウム266mg及び亜リン酸ジメチル75μlを加えて、50℃で3時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン1mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン1mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6c)80.5mgを収率61%で得た。
H−NMR(500MHz,CDCl
δ:0.91(m,6H),1.30(m,8H),1.68(m,4H),1.83(dd,J=18.7,6.9Hz,2H),2.10(m,1H),3.63(dd.J=11.8,6.7Hz,2H),3.75(d,J=10.9Hz,6H),3.99(dd,J=11.7,3.9Hz,2H)
139 mg of the iodine compound (5c) obtained in Synthesis Example C1-3 was dissolved in 1.2 ml of DMF, 266 mg of cesium carbonate and 75 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 3 hours. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 1 ml of toluene, and the white solid was filtered. The white solid was further washed with 1 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to give 80.5 mg of dimethyl phosphonate compound (6c). Was obtained in a yield of 61%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.91 (m, 6H), 1.30 (m, 8H), 1.68 (m, 4H), 1.83 (dd, J=18.7, 6.9Hz, 2H), 2. 10 (m, 1H), 3.63 (dd.J=11.8, 6.7 Hz, 2H), 3.75 (d, J=10.9 Hz, 6H), 3.99 (dd, J=11) .7, 3.9 Hz, 2H)

合成例D1−4(工程D:RSynthesis Example D1-4 (Step D: R Two =フェニル)= Phenyl)
(2,2−ジフェニル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6d)の合成Synthesis of (2,2-diphenyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6d)

Figure 2020109131
Figure 2020109131

合成例C1−4で得られたヨウ素化合物(5d)726mgを、DMF5.7mlに溶解させ、さらに炭酸セシウム1.24g及び亜リン酸ジメチル350μlを加えて、50℃で3時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン4.2mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン2.1mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6d)621mgを収率90%で得た。
H−NMR(500MHz,CDCl
δ:1.80(dd,J=18.8,7.0Hz,2H),2.30(m,1H),3.74(d,J=10.9Hz,6H),3.77(dd,J=11.5,7.2Hz,2H),4.15(dd,J=11.5,3.8Hz,2H),7.26(m,2H),7.33(m,4H),7.50(m,4H)
726 mg of the iodine compound (5d) obtained in Synthesis Example C1-4 was dissolved in 5.7 ml of DMF, 1.24 g of cesium carbonate and 350 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 3 hours. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 4.2 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 2.1 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 621 mg of dimethyl phosphonate compound (6d). Was obtained with a yield of 90%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.80 (dd, J=18.8, 7.0 Hz, 2H), 2.30 (m, 1H), 3.74 (d, J=10.9 Hz, 6H), 3.77 (dd , J=11.5, 7.2 Hz, 2H), 4.15 (dd, J=11.5, 3.8 Hz, 2H), 7.26 (m, 2H), 7.33 (m, 4H). , 7.50 (m, 4H)

合成例D2−1(工程D:RSynthesis Example D2-1 (Step D: R Two =メチル、溶媒=DMF)= Methyl, solvent = DMF)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)500.0mgを、DMF3.9mlに溶解させ、さらに炭酸セシウム1.27g及び亜リン酸ジメチル360μlを加えて、50℃で3時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン10mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6a)406.0mgを収率87%で得た。 500.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 3.9 ml of DMF, 1.27 g of cesium carbonate and 360 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 3 hours. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 10 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 406.0 mg of dimethyl phosphonate compound (6a). Was obtained with a yield of 87%.

合成例D2−2(工程D:RSynthesis Example D2-2 (Step D: R Two =メチル、溶媒=DMAc)= Methyl, solvent = DMAc)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)500.0mgを、DMAc3.9mlに溶解させ、さらに炭酸セシウム1.27g及び亜リン酸ジメチル360μlを加えて、50℃で3時間撹拌した。減圧下、反応液中のDMAcを留去し、得られた残渣をトルエン10mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6a)438.7mgを収率94%で得た。 500.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 3.9 ml of DMAc, 1.27 g of cesium carbonate and 360 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 3 hours. The DMAc in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 10 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 438.7 mg of dimethyl phosphonate compound (6a). Was obtained with a yield of 94%.

合成例D2−3(工程D:RSynthesis Example D2-3 (Step D: R Two =メチル、溶媒=アセトニトリル)= Methyl, solvent = acetonitrile)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)500.0mgを、アセトニトリル3.9mlに溶解させ、さらに炭酸セシウム1.27g及び亜リン酸ジメチル360μlを加えて、50℃で24時間撹拌した。減圧下、反応液中のアセトニトリルを留去し、得られた残渣をトルエン20mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6a)408.8mgを収率88%で得た。 500.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 3.9 ml of acetonitrile, 1.27 g of cesium carbonate and 360 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 24 hours. .. Acetonitrile in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 20 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 408.8 mg of dimethyl phosphonate compound (6a). Was obtained with a yield of 88%.

合成例D2−4(工程D:RSynthesis Example D2-4 (Step D: R Two =メチル、溶媒=DMF/AN(1/1))= Methyl, solvent = DMF/AN (1/1))
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)500.0mgを、DMF2.0ml,アセトニトリル2.0mlに溶解させ、さらに炭酸セシウム1.27g及び亜リン酸ジメチル360μlを加えて、50℃で18時間撹拌した。減圧下、反応液中の溶媒を留去し、得られた残渣をトルエン20mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6a)404.1mgを収率87%で得た。 500.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 2.0 ml of DMF and 2.0 ml of acetonitrile, 1.27 g of cesium carbonate and 360 μl of dimethyl phosphite were added, and the mixture was heated at 50° C. Stir for 18 hours. The solvent in the reaction solution was evaporated under reduced pressure, the resulting residue was replaced with 20 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 404.1 mg of dimethyl phosphonate compound (6a). Was obtained with a yield of 87%.

合成例D3−1(工程D:RSynthesis Example D3-1 (Process D: R Two =メチル、塩基=炭酸セシウム)= Methyl, base = cesium carbonate)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)500.0mgを、DMF3.9mlに溶解させ、さらに炭酸セシウム1.27g及び亜リン酸ジメチル360μlを加えて、50℃で3時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン10mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6a)406.0mgを収率87%で得た。 500.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 3.9 ml of DMF, 1.27 g of cesium carbonate and 360 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 3 hours. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 10 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 406.0 mg of dimethyl phosphonate compound (6a). Was obtained with a yield of 87%.

合成例D3−2(工程D:RSynthesis Example D3-2 (Step D: R Two =メチル、塩基=炭酸カリウム)= Methyl, base = potassium carbonate)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)500.0mgを、DMF3.9mlに溶解させ、さらに炭酸カリウム540mg及び亜リン酸ジメチル360μlを加えて、50℃で24時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン10mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6a)139.6mgを収率30%で得た。 500.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 3.9 ml of DMF, 540 mg of potassium carbonate and 360 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 24 hours. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 10 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 139.6 mg of dimethyl phosphonate compound (6a). Was obtained in a yield of 30%.

合成例D3−3(工程D:RSynthesis Example D3-3 (Step D: R Two =メチル、塩基=炭酸ルビジウム)= Methyl, base = rubidium carbonate)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)500.0mgを、DMF3.9mlに溶解させ、さらに炭酸ルビジウム902.1mg及び亜リン酸ジメチル360μlを加えて、50℃で24時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン10mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6a)280.7mgを収率60%で得た。 500.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 3.9 ml of DMF, 902.1 mg of rubidium carbonate and 360 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 24 hours. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 10 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to give 280.7 mg of dimethyl phosphonate compound (6a). Was obtained in a yield of 60%.

合成例D3−4(工程D:RSynthesis Example D3-4 (Step D: R Two =メチル、塩基=炭酸ナトリウム)= Methyl, base = sodium carbonate)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)500.0mgを、DMF3.9mlに溶解させ、さらに炭酸ナトリウム414.0mg及び亜リン酸ジメチル360μlを加えて、50℃で24時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン10mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をトルエン5mlにメスアップし、液定量を行い、収率1.2%であった。 500.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 3.9 ml of DMF, 414.0 mg of sodium carbonate and 360 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 24 hours. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 10 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, the residue was made up to 5 ml of toluene, and liquid quantification was performed. The yield was 1.2%.

合成例D3−5(工程D:RSynthesis Example D3-5 (Step D: R Two =メチル、塩基=炭酸水素カリウム)= Methyl, base = potassium hydrogen carbonate)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)500.0mgを、DMF3.9mlに溶解させ、さらに炭酸水素カリウム391.1mg及び亜リン酸ジメチル360μlを加えて、50℃で24時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン10mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をトルエン5mlにメスアップし、液定量を行い、収率3.5%であった。 500.0 mg of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 3.9 ml of DMF, 391.1 mg of potassium hydrogencarbonate and 360 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 24 hours. .. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 10 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, the residue was made up to 5 ml of toluene, and liquid quantification was performed. The yield was 3.5%.

合成例D4−1(工程D:X=臭素)Synthesis Example D4-1 (Step D: X=bromine)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジメチルエステル(6a)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid dimethyl ester (6a)

Figure 2020109131
Figure 2020109131

合成例C3−1で得られた臭素化合物(5a−1)93.7mgを、DMF0.9mlに溶解させ、さらに炭酸セシウム292mg及び亜リン酸ジメチル82.1μlを加えて、50℃で4時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン5mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン10mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジメチル化合物(6a)89.3mgを収率84%で得た。 93.7 mg of the bromine compound (5a-1) obtained in Synthesis Example C3-1 was dissolved in 0.9 ml of DMF, 292 mg of cesium carbonate and 82.1 μl of dimethyl phosphite were added, and the mixture was stirred at 50° C. for 4 hours. did. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 5 ml of toluene, and the white solid was filtered. The white solid was further washed with 10 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to give 89.3 mg of dimethyl phosphonate compound (6a). Was obtained with a yield of 84%.

合成例D5−1(工程D:RSynthesis Example D5-1 (Process D: R 1 =エチル)= Ethyl)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジエチルエステル(6a-1)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid diethyl ester (6a-1)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)2.00gを、DMF15.6mlに溶解させ、さらに炭酸セシウム5.09g及び亜リン酸ジエチル2.01mlを加えて、50℃で3時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン20mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン30mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジエチル化合物(6a−1)2.24gを定量的に得た。
H−NMR(500MHz,CDCl
δ:1.33(t,J=7Hz,6H),1.42(s,3H),1.42(s,3H),1.76(dd,J=19,7Hz,2H),2.18(m,1H),3.66(dd,J=11.5,7.5Hz,2H),4.00(dd,J=11.5,4Hz,2H),4.10(m,4H)
2.00 g of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 15.6 ml of DMF, 5.09 g of cesium carbonate and 2.01 ml of diethyl phosphite were added, and the mixture was stirred at 50° C. for 3 hours. did. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 20 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 30 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain a diethyl phosphonate compound (6a-1) 2 .24 g was quantitatively obtained.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.33 (t, J=7 Hz, 6H), 1.42 (s, 3H), 1.42 (s, 3H), 1.76 (dd, J=19,7 Hz, 2H), 2. 18 (m, 1H), 3.66 (dd, J=11.5, 7.5 Hz, 2H), 4.00 (dd, J=11.5, 4 Hz, 2H), 4.10 (m, 4H) )

合成例D5−2(工程D:RSynthesis Example D5-2 (Step D: R 1 =n−ブチル)= N-butyl)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジエチルエステル(6a-2)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid diethyl ester (6a-2)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)2.00gを、DMF15.6mlに溶解させ、さらに炭酸セシウム5.09g及び亜リン酸ジブチル3.05mlを加えて、50℃で3時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン20mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン20mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ホスホン酸ジブチル化合物(6a−2)2.74gを定量的に得た。
H−NMR(500MHz,CDCl
δ:0.94(t,J=7.5Hz,6H),1.40(tq,J=7.5,7.5Hz,4H),1.42(s,6H),1.65(tt,J=8,8Hz,4H),1.75(dd,J=19,7Hz,2H),2.17(m,1H),3.66(dd,J=11.5,7.5Hz,2H),4.03(m,6H)
2.00 g of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 15.6 ml of DMF, 5.09 g of cesium carbonate and 3.05 ml of dibutyl phosphite were added, and the mixture was stirred at 50° C. for 3 hours. did. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 20 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 20 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain a dibutyl phosphonate compound (6a-2) 2 0.74 g was quantitatively obtained.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.94 (t, J=7.5 Hz, 6H), 1.40 (tq, J=7.5, 7.5 Hz, 4H), 1.42 (s, 6H), 1.65 (tt , J=8, 8 Hz, 4H), 1.75 (dd, J=19,7 Hz, 2H), 2.17 (m, 1H), 3.66 (dd, J=11.5, 7.5 Hz, 2H), 4.03 (m, 6H)

合成例D5−3(工程D:RSynthesis Example D5-3 (Step D: R 1 =エチル)= Ethyl)
(2,2−ジメチル−[1,3]ジオキサン−5−イルメチル)−ホスホン酸ジエチルエステル(6a-3)の合成Synthesis of (2,2-dimethyl-[1,3]dioxan-5-ylmethyl)-phosphonic acid diethyl ester (6a-3)

Figure 2020109131
Figure 2020109131

合成例C1−1で得られたヨウ素化合物(5a)1.00gを、DMF7.8mlに溶解させ、さらに炭酸セシウム2.54g及び亜リン酸ジベンジル1.74mlを加えて、50℃で3時間撹拌した。減圧下、反応液中のDMFを留去し、得られた残渣をトルエン10mlで置き換えて、白色固体を濾過した。さらにその白色固体をトルエン20mlで洗浄後、得られた濾液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(n−ヘキサン:酢酸エチル=1:2)で精製し、ホスホン酸ジベンジル化合物(6a−3)1.58gを定量的に得た。
H−NMR(500MHz,CDCl
δ:1.38(s,3H),1.39(s,3H),1.77(dd,J=19,7Hz,2H),2.11(m,1H),3.58(dd,J=11.5,7Hz,2H),3.93(dd,12,4Hz,2H),5.00(m,4H),7.34(m,10H)
1.00 g of the iodine compound (5a) obtained in Synthesis Example C1-1 was dissolved in 7.8 ml of DMF, 2.54 g of cesium carbonate and 1.74 ml of dibenzyl phosphite were added, and the mixture was stirred at 50° C. for 3 hours. did. DMF in the reaction solution was distilled off under reduced pressure, the resulting residue was replaced with 10 ml of toluene, and the white solid was filtered. Further, the white solid was washed with 20 ml of toluene, the obtained filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (n-hexane:ethyl acetate=1:2) to obtain the dibenzyl phosphonate compound (6a- 3) 1.58 g was quantitatively obtained.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.38 (s, 3H), 1.39 (s, 3H), 1.77 (dd, J=19,7 Hz, 2H), 2.11 (m, 1H), 3.58 (dd, J=11.5,7Hz,2H),3.93(dd,12,4Hz,2H),5.00(m,4H),7.34(m,10H)

[工程(E)]
合成例E1−1(工程E:R =メチル)
(2,3−ジヒドロキシプロピル)−ホスホン酸ジメチルエステル(7a)の合成
[Process (E)]
Synthesis Example E1-1 (Step E: R 2 =methyl)
Synthesis of (2,3-dihydroxypropyl)-phosphonic acid dimethyl ester (7a)

Figure 2020109131
Figure 2020109131

合成例D1−1で得られたホスホン酸ジメチル化合物(6a)5.00gを、メタノール125mlに溶解させ、さらにp−トルエンスルホン酸一水和物798.5mgを加えて、20℃で3時間撹拌した。トリエチルアミン640μlで反応を停止させ、減圧下、反応液中のメタノールを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ジオール化合物(7a)3.82gを収率92%で得た。
H−NMR(500MHz,CDCl
δ:1.93(dd,J=18.5,7Hz,2H),2.13(m,1H),2.87(dd,J=6,6Hz,2H),3.77(m,10H)
5.00 g of phosphonic acid dimethyl compound (6a) obtained in Synthesis Example D1-1 was dissolved in 125 ml of methanol, 798.5 mg of p-toluenesulfonic acid monohydrate was further added, and the mixture was stirred at 20° C. for 3 hours. did. The reaction was stopped with 640 μl of triethylamine, and the methanol in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 3.82 g of the diol compound (7a) in a yield of 92%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.93 (dd, J=18.5, 7 Hz, 2H), 2.13 (m, 1H), 2.87 (dd, J=6, 6 Hz, 2H), 3.77 (m, 10H) )

合成例E1−2(工程E:RSynthesis Example E1-2 (Step E: R Two =n−プロピル)= N-propyl)
2−(ジメチルホスホノ)メチル-1,3-プロパンジオール(7a)の合成Synthesis of 2-(dimethylphosphono)methyl-1,3-propanediol (7a)

Figure 2020109131
Figure 2020109131

合成例D1−2で得られたホスホン酸ジメチル化合物(6b)687mgを、メタノール4.7mlに溶解させ、さらにp−トルエンスルホン酸一水和物22.0mgを加えて、20℃で3時間撹拌した。減圧下、反応液中のメタノールを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=5:1)で精製し、ジオール化合物(7a)361mgを収率78%で得た。 687 mg of the dimethyl phosphonate compound (6b) obtained in Synthesis Example D1-2 was dissolved in 4.7 ml of methanol, 22.0 mg of p-toluenesulfonic acid monohydrate was further added, and the mixture was stirred at 20° C. for 3 hours. did. The methanol in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=5:1) to obtain 361 mg of the diol compound (7a) with a yield of 78%.

合成例E1−3(工程E:RSynthesis Example E1-3 (Step E: R Two =ブチル)= Butyl)
2−(ジメチルホスホノ)メチル-1,3-プロパンジオール(7a)の合成Synthesis of 2-(dimethylphosphono)methyl-1,3-propanediol (7a)

Figure 2020109131
Figure 2020109131

合成例D1−3で得られたホスホン酸ジメチル化合物(6c)80.5mgを、メタノール0.75mlに溶解させ、さらにp−トルエンスルホン酸一水和物2.4mgを加えて、20℃で3時間撹拌した。減圧下、反応液中のメタノールを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ジオール化合物(7a)37.5mgを収率76%で得た。 80.5 mg of the dimethyl phosphonate compound (6c) obtained in Synthesis Example D1-3 was dissolved in 0.75 ml of methanol, 2.4 mg of p-toluenesulfonic acid monohydrate was added, and the mixture was mixed at 20° C. for 3 days. Stir for hours. The methanol in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 37.5 mg of the diol compound (7a) with a yield of 76%.

合成例E1−4(工程E:RSynthesis Example E1-4 (Step E: R Two =フェニル)= Phenyl)
2−(ジメチルホスホノ)メチル-1,3-プロパンジオール(7a)の合成Synthesis of 2-(dimethylphosphono)methyl-1,3-propanediol (7a)

Figure 2020109131
Figure 2020109131

合成例D1−4で得られたホスホン酸ジメチル化合物(6d)621mgを、メタノール5.1mlに溶解させ、さらにp−トルエンスルホン酸一水和物16.3mgを加えて、0℃で15時間、20℃で1時間撹拌した。減圧下、反応液中のメタノールを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ジオール化合物(7a)226mgを収率67%で得た。 621 mg of the phosphonic acid dimethyl compound (6d) obtained in Synthesis Example D1-4 was dissolved in 5.1 ml of methanol, and 16.3 mg of p-toluenesulfonic acid monohydrate was added, and the mixture was heated at 0° C. for 15 hours. The mixture was stirred at 20°C for 1 hour. The methanol in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 226 mg of the diol compound (7a) with a yield of 67%.

合成例E2−1(工程E:RSynthesis Example E2-1 (Step E: R Two =エチル)= Ethyl)
2−(ジエチルホスホノ)メチル-1,3-プロパンジオール(7a-1)の合成Synthesis of 2-(diethylphosphono)methyl-1,3-propanediol (7a-1)

Figure 2020109131
Figure 2020109131

合成例D5−1で得られたホスホン酸ジエチル化合物(6a−1)2.00gを、メタノール15mlに溶解させ、さらにp−トルエンスルホン酸一水和物428.6mgを加えて、20℃で3時間撹拌し、その後、0℃で終夜撹拌した。減圧下、反応液中のメタノールを留去し、得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=5:1)で精製し、ジオール化合物(7a−1)1.69gを収率99%で得た。
H−NMR(500MHz,CDCl
δ:1.34(t,J=7Hz,6H),1.91(dd,J=18.5,7Hz,2H),2.14(m,1H),3.20(br,水酸基),3.77(d,J=5Hz,4H),4.12(m,4H)
2.00 g of the diethyl phosphonate compound (6a-1) obtained in Synthesis Example D5-1 was dissolved in 15 ml of methanol, and 428.6 mg of p-toluenesulfonic acid monohydrate was further added, followed by 3 at 20°C. Stir for hours and then at 0° C. overnight. Methanol in the reaction solution was distilled off under reduced pressure, and the obtained residue was purified by silica gel chromatography (chloroform:methanol=5:1) to obtain 1.69 g of diol compound (7a-1) in a yield of 99%. Obtained.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.34 (t, J=7 Hz, 6 H), 1.91 (dd, J=18.5, 7 Hz, 2 H), 2.14 (m, 1 H), 3.20 (br, hydroxyl group), 3.77 (d, J=5 Hz, 4H), 4.12 (m, 4H)

合成例E2−2(工程E:RSynthesis Example E2-2 (Step E: R Two =n−ブチル)= N-butyl)
2−(ジブチルホスホノ)メチル-1,3-プロパンジオール(7a-2)の合成Synthesis of 2-(dibutylphosphono)methyl-1,3-propanediol (7a-2)

Figure 2020109131
Figure 2020109131

合成例D5−2で得られたホスホン酸ジブチル化合物(6a−2)2.50gを、メタノール15.5mlに溶解させ、さらにp−トルエンスルホン酸一水和物442.5mgを加えて、20℃で8時間撹拌した。減圧下、反応液中のメタノールを留去し、得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、ジオール化合物(7a−2)2.13gを収率97%で得た。
H−NMR(500MHz,CDCl
δ:0.94(t,J=7.5Hz,6H),1.41(tq,J=7.5,7.5Hz,4H),1.66(tt,J=8,8Hz,4H),1.90(dd,J=19,7Hz,2H),2.12(m,1H),3.76(m,4H),4.04(m,4H)
2.50 g of dibutyl phosphonate compound (6a-2) obtained in Synthesis Example D5-2 was dissolved in 15.5 ml of methanol, and 442.5 mg of p-toluenesulfonic acid monohydrate was further added, and the mixture was heated at 20°C. And stirred for 8 hours. Methanol in the reaction solution was distilled off under reduced pressure, and the obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 2.13 g of the diol compound (7a-2) in a yield of 97%. Obtained.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.94 (t, J=7.5 Hz, 6H), 1.41 (tq, J=7.5, 7.5 Hz, 4H), 1.66 (tt, J=8, 8 Hz, 4H) , 1.90 (dd, J=19, 7 Hz, 2H), 2.12 (m, 1H), 3.76 (m, 4H), 4.04 (m, 4H)

合成例E2−3(工程E:RSynthesis Example E2-3 (Step E: R Two =ベンジル)= Benzyl)
2−(ジベンジルホスホノ)メチル-1,3-プロパンジオール(7a−3)の合成Synthesis of 2-(dibenzylphosphono)methyl-1,3-propanediol (7a-3)

Figure 2020109131
Figure 2020109131

合成例D5−3で得られたホスホン酸ジベンジル化合物(6a−3)1.58gを、メタノール8.1mlに溶解させ、さらにp−トルエンスルホン酸一水和物230.9mgを加えて、20℃で3時間撹拌し、その後、0℃で終夜撹拌した。減圧下、反応液中のメタノールを留去し、得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、ジオール化合物(7a−3)1.27gを収率89%で得た。
H−NMR(500MHz,CDCl
δ:1.92(dd,J=19,7Hz,2H),2.05(m,1H),3.70(m,4H),5.01(m,4H),7.34(m,10H)
1.58 g of the dibenzyl phosphonate compound (6a-3) obtained in Synthesis Example D5-3 was dissolved in 8.1 ml of methanol, and 230.9 mg of p-toluenesulfonic acid monohydrate was added, and the mixture was heated at 20°C. Stirred for 3 hours and then at 0° C. overnight. Methanol in the reaction solution was distilled off under reduced pressure, and the obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 1.27 g of the diol compound (7a-3) in a yield of 89%. Obtained.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.92 (dd, J=19,7 Hz, 2H), 2.05 (m, 1H), 3.70 (m, 4H), 5.01 (m, 4H), 7.34 (m, 10H)

[工程(F)]
合成例F1−1(工程F:塩基=DBU、溶媒=DMF)
(2−メトキシ−2−オキソ−2λ −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成
[Process (F)]
Synthesis example F1-1 (step F: base=DBU, solvent=DMF)
Synthesis of (2-methoxy-2-oxo-2λ 5 -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)200.0mgを、DMF4mlに溶解させ、さらにDBU45.3μlを加えて、20℃で3時間撹拌した。反応混合物にp−トルエンスルホン酸一水和物57.6mgで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=9:1)で精製し、環状ホスホン酸化合物(8a)147.1mgを収率88%で得た。
H−NMR(500MHz,CDCl
δ:1.73−2.07(m,3H),2.35(dd,J=5,5Hz,1H),2.68−2.88(m,1H),3.65−3.73(m,2H),3.79(dd,J=11,3.5Hz,3H),3.89−4.37(m,2H)
200.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 4 ml of DMF, 45.3 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped by adding 57.6 mg of p-toluenesulfonic acid monohydrate to the reaction mixture, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=9:1) to obtain 147.1 mg of a cyclic phosphonic acid compound (8a) with a yield of 88%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.73-2.07 (m, 3H), 2.35 (dd, J=5, 5 Hz, 1H), 2.68-2.88 (m, 1H), 3.65-3.73. (M, 2H), 3.79 (dd, J=11, 3.5 Hz, 3H), 3.89-4.37 (m, 2H)

合成例F1−2(工程F:塩基=DBU、溶媒=DMAc)Synthesis Example F1-2 (Step F: base=DBU, solvent=DMAc)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500mgを、ジメチルホルムアセトアミド10.2mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のジメチルホルムアセトアミドを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=5:1)で精製し、環状ホスホン酸化合物(8a)212mgを収率51%で得た。 500 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10.2 ml of dimethylformacetamide, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and dimethylformacetamide in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=5:1) to obtain 212 mg of a cyclic phosphonic acid compound (8a) with a yield of 51%.

合成例F1−3(工程F:塩基=DBU、溶媒=アセトニトリル(AN))Synthesis example F1-3 (step F: base=DBU, solvent=acetonitrile (AN))
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500mgを、アセトニトリル10.2mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のアセトニトリルを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、環状ホスホン酸化合物(8a)235mgを収率56%で得た。 500 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10.2 ml of acetonitrile, 113 μl of DBU was further added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and acetonitrile in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 235 mg of cyclic phosphonic acid compound (8a) with a yield of 56%.

合成例F1−4(工程F:塩基=DBU、溶媒=アセトン)Synthesis example F1-4 (step F: base=DBU, solvent=acetone)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500mgを、アセトン10.2mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のアセトンを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、環状ホスホン酸化合物(8a)224mgを収率54%で得た。 500 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10.2 ml of acetone, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and acetone in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 224 mg of cyclic phosphonic acid compound (8a) with a yield of 54%.

合成例F1−4(工程F:塩基=DBU、溶媒=メタノール)Synthesis example F1-4 (step F: base=DBU, solvent=methanol)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500mgを、メタノール10.2mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のメタノールを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、環状ホスホン酸化合物(8a)86.8mgを収率21%で得た。 500 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10.2 ml of methanol, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and methanol in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 86.8 mg of cyclic phosphonic acid compound (8a) in a yield of 21%.

合成例F1−5(工程F:塩基=DBU、溶媒=イソプロパノール)Synthesis example F1-5 (step F: base=DBU, solvent=isopropanol)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500mgを、イソプロパノール10.2mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のイソプロパノールを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、環状ホスホン酸化合物(8a)75mgを収率18%で得た。 500 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10.2 ml of isopropanol, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and isopropanol in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 75 mg of cyclic phosphonic acid compound (8a) in a yield of 18%.

合成例F1−6(工程F:塩基=DBU、溶媒=ブタノール)Synthesis example F1-6 (step F: base=DBU, solvent=butanol)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500mgを、ブタノール10.2mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のブタノールを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、環状ホスホン酸化合物(8a)121mgを収率29%で得た。 500 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10.2 ml of butanol, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and butanol in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 121 mg of the cyclic phosphonic acid compound (8a) in a yield of 29%.

合成例F1−7(工程F:塩基=DBU、溶媒=DMF/アセトニトリル)Synthesis example F1-7 (step F: base=DBU, solvent=DMF/acetonitrile)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500mgを、DMF5.1ml及びアセトニトリル5.1mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のDMF及びアセトニトリルを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、環状ホスホン酸化合物(8a)170mgを収率41%で得た。 500 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 5.1 ml of DMF and 5.1 ml of acetonitrile, 113 μl of DBU was further added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and DMF and acetonitrile in the reaction solution were distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 170 mg of the cyclic phosphonic acid compound (8a) in a yield of 41%.

合成例F2−1(工程F:塩基=DBU(0.3 eq.)、溶媒=DMF)Synthesis Example F2-1 (Step F: base = DBU (0.3 eq.), solvent = DMF)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、DMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)304.7mgを収率73%で得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and DMF was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 304.7 mg of cyclic phosphonic acid compound (8a) with a yield of 73%.

合成例F2−2(工程F:塩基=DBN(0.3 eq.)、溶媒=DMF)Synthesis example F2-2 (step F: base = DBN (0.3 eq.), solvent = DMF)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにDBN90μlを加えて、20℃で4時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)307.2mgを収率73%で得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 90 μl of DBN was further added, and the mixture was stirred at 20° C. for 4 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 307.2 mg of cyclic phosphonic acid compound (8a) with a yield of 73%.

合成例F2−3(工程F:塩基=TEA(0.3 eq.)、溶媒=DMF)Synthesis example F2-3 (step F: base = TEA (0.3 eq.), solvent = DMF)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにTEA105μlを加えて、20℃から加熱還流まで昇温させ、その後、2.5時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)216.2mgを収率52%で得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 105 μl of TEA was further added, the temperature was raised from 20° C. to reflux, and then the mixture was stirred for 2.5 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 216.2 mg of cyclic phosphonic acid compound (8a) with a yield of 52%.

合成例F2−4(工程F:塩基=DIPEA(0.3 eq.)、溶媒=DMF)Synthesis example F2-4 (step F: base = DIPEA (0.3 eq.), solvent = DMF)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにDIPEA132μlを加えて、20℃から加熱還流まで昇温させ、その後、2.5時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)226.1mgを収率54%で得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 132 μl of DIPEA was further added, the temperature was raised from 20° C. to reflux under heating, and then the mixture was stirred for 2.5 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 226.1 mg of cyclic phosphonic acid compound (8a) with a yield of 54%.

合成例F2−5(工程F:塩基=NaOMe(0.3 eq.)、溶媒=DMF)Synthesis example F2-5 (step F: base = NaOMe (0.3 eq.), solvent = DMF)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにナトリウムメトキシド40.9mgを加えて、20℃で、3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のDMFを留去した。残渣に対して、クロロホルム10mlを加えて、白色塩を濾過し、その白色固体をクロロホルム10mlで洗浄後、ろ液を濃縮した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)258.1mgを収率62%で得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 40.9 mg of sodium methoxide was further added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. 10 ml of chloroform was added to the residue, white salts were filtered, the white solid was washed with 10 ml of chloroform, and the filtrate was concentrated. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 258.1 mg of the cyclic phosphonic acid compound (8a) at a yield of 62%.

合成例F2−6(工程F:塩基=NaOEt(0.3 eq.)、溶媒=DMF)Synthesis example F2-6 (step F: base = NaOEt (0.3 eq.), solvent = DMF)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)770.7mgを、DMF15.4mlに溶解させ、さらにナトリウムエトキシド79.4mgを加えて、20℃で、3時間撹拌した。p−トルエンスルホン酸一水和物221.9mgで反応を停止し、減圧下、反応液中のDMFを留去した。残渣に対して、クロロホルム20mlを加えて、白色塩を濾過し、その白色固体をクロロホルム20mlで洗浄後、ろ液を濃縮した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)349.0mgを収率54%で得た。 770.7 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 15.4 ml of DMF, 79.4 mg of sodium ethoxide was further added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 221.9 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. 20 ml of chloroform was added to the residue, a white salt was filtered, the white solid was washed with 20 ml of chloroform, and the filtrate was concentrated. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 349.0 mg of a cyclic phosphonic acid compound (8a) with a yield of 54%.

合成例F2−7(工程F:塩基=t−BuOK(0.3 eq.)、溶媒=DMF)(2−メトキシ−2−オキソ−2λSynthesis example F2-7 (step F: base = t-BuOK (0.3 eq.), solvent = DMF) (2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにカリウムtert−ブトキシド84.9mgを加えて、20℃で、3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のDMFを留去した。残渣に対して、クロロホルム10mlを加えて、白色塩を濾過し、その白色固体をクロロホルム10mlで洗浄後、ろ液を濃縮した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)193.8mgを収率46%で得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 84.9 mg of potassium tert-butoxide was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. 10 ml of chloroform was added to the residue, white salts were filtered, the white solid was washed with 10 ml of chloroform, and the filtrate was concentrated. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 193.8 mg of cyclic phosphonic acid compound (8a) with a yield of 46%.

合成例F2−8(工程F:塩基=t−BuONa(0.3 eq.)、溶媒=DMF)(2−メトキシ−2−オキソ−2λSynthesis Example F2-8 (Step F: base = t-BuONa (0.3 eq.), solvent = DMF) (2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにナトリウムtert−ブトキシド72.7mgを加えて、20℃で、3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、析出した白色固体を濾過し、除去した。その白色固体をDMF5mlで洗浄後、ろ液を減圧下、DMFを留去した。残渣に対して、クロロホルム10mlを加えて、白色塩を濾過し、クロロホルム10mlで洗浄後、ろ液を濃縮した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)200.6mgを収率48%で得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 72.7 mg of sodium tert-butoxide was further added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and the precipitated white solid was removed by filtration. The white solid was washed with 5 ml of DMF, and the filtrate was evaporated under reduced pressure to remove DMF. 10 ml of chloroform was added to the residue, white salts were filtered, washed with 10 ml of chloroform, and the filtrate was concentrated. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 200.6 mg of cyclic phosphonic acid compound (8a) in a yield of 48%.

合成例F2−9(工程F:塩基=CsCOSynthesis Example F2-9 (Step F: base=CsCO Three (0.3 eq.)、溶媒=DMF)(0.3 eq., solvent=DMF)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらに炭酸セシウム246.6mgを加えて、20℃で、3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のDMFを留去した。残渣に対して、クロロホルム10mlを加えて、白色塩を濾過し、その白色固体をクロロホルム10mlで洗浄後、ろ液を濃縮した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)35.1mgを収率8%で得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 246.6 mg of cesium carbonate was further added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. 10 ml of chloroform was added to the residue, white salts were filtered, the white solid was washed with 10 ml of chloroform, and the filtrate was concentrated. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 35.1 mg of cyclic phosphonic acid compound (8a) in a yield of 8%.

合成例F2−10(工程F:塩基=NaH(0.3 eq.)、溶媒=DMF)Synthesis example F2-10 (step F: base = NaH (0.3 eq.), solvent = DMF)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらに水素化ナトリウム30.3mgを加えて、20℃で、3時間撹拌した。p−トルエンスルホン酸一水和物144mgで反応を停止し、減圧下、反応液中のDMFを留去した。残渣に対して、クロロホルム10mlを加えて、白色塩を濾過し、その白色固体をクロロホルム10mlで洗浄後、ろ液を濃縮した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)190.2mgを収率45%で得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 30.3 mg of sodium hydride was further added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 144 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. 10 ml of chloroform was added to the residue, white salts were filtered, the white solid was washed with 10 ml of chloroform, and the filtrate was concentrated. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 190.2 mg of cyclic phosphonic acid compound (8a) in a yield of 45%.

合成例F3−1(工程F:クエンチ剤=CSA)Synthesis example F3-1 (step F: quenching agent=CSA)
(2−メトキシ−2−オキソ−2λ(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a)

Figure 2020109131
Figure 2020109131

合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。カンファースルホン酸(CSA)175.9mgで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)554.2mgを定量的に得た。 500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 175.9 mg of camphorsulfonic acid (CSA), and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to quantitatively obtain 554.2 mg of the cyclic phosphonic acid compound (8a).

合成例F3−2(工程F:クエンチ剤=蟻酸)
合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。蟻酸30μlで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)305.6mgを収率73%で得た。
Synthesis example F3-2 (step F: quenching agent = formic acid)
500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 30 μl of formic acid, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 305.6 mg of cyclic phosphonic acid compound (8a) with a yield of 73%.

合成例F3−3(工程F:クエンチ剤=酢酸)
合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。酢酸43μlで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)289.6mgを収率69%で得た。
Synthesis example F3-3 (step F: quenching agent = acetic acid)
500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 43 μl of acetic acid, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 289.6 mg of cyclic phosphonic acid compound (8a) with a yield of 69%.

合成例F3−4(工程F:クエンチ剤=プロピオン酸)
合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。プロピオン酸57μlで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)303.0mgを収率72%で得た。
Synthesis example F3-4 (step F: quenching agent=propionic acid)
500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 57 μl of propionic acid, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 303.0 mg of cyclic phosphonic acid compound (8a) with a yield of 72%.

合成例F3−5(工程F:クエンチ剤=酪酸)
合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、さらにDBU113μlを加えて、20℃で3時間撹拌した。酪酸69μlで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)303.3mgを収率72%で得た。
Synthesis example F3-5 (step F: quenching agent = butyric acid)
500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 69 μl of butyric acid, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 303.3 mg of the cyclic phosphonic acid compound (8a) with a yield of 72%.

合成例F3−6(工程F:クエンチ剤=トリフルオロ酢酸)
合成例E1−1で得られたジオール化合物(7a)500.0mgを、DMF10mlに溶解させ、DBU113μlを加えて、20℃で3時間撹拌した。トリフルオロ酢酸58μlで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)288.4mgを収率69%で得た。
Synthesis example F3-6 (step F: quenching agent = trifluoroacetic acid)
500.0 mg of the diol compound (7a) obtained in Synthesis Example E1-1 was dissolved in 10 ml of DMF, 113 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. The reaction was stopped with 58 μl of trifluoroacetic acid, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 288.4 mg of cyclic phosphonic acid compound (8a) with a yield of 69%.

合成例F4−1(工程F:塩基=DBU、溶媒=アセトニトリル(AN))Synthesis Example F4-1 (Step F: base=DBU, solvent=acetonitrile (AN))
(2−エトキシ−2−オキソ−2λ(2-ethoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a-1)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a-1)

Figure 2020109131
Figure 2020109131

合成例E2−1で得られたジオール化合物(7a−1)1.50gを、DMF26.5mlに溶解させ、さらにDBU297μlを加えて、20℃で3時間撹拌した。さらに、この溶液にDBU200μlを加えて、20℃で2時間撹拌した。その後、p−トルエンスルホン酸一水和物630.7mgで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製した。得られたフラクションを再度、DMF25.1mlに溶解させ、DBU282μlを加えて、20℃で4時間撹拌した。さらに、この溶液にDBU282μlを追加し、20℃で3時間撹拌した。引き続き、DBU282μlを追加し、20℃で3時間撹拌し、p−トルエンスルホン酸一水和物1.08gで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a−1)781.6mgを収率69%で得た。
H−NMR(500MHz,CDCl
δ: 1.35(t,J=7Hz,3H),1.75(m,1H),1.85(br,水酸基),2.00(m,1H),2.15(br,水酸基),2.78(m,1H),3.70(m,2H),3.89−4.36(m,4H)
1.50 g of the diol compound (7a-1) obtained in Synthesis Example E2-1 was dissolved in 26.5 ml of DMF, 297 μl of DBU was further added, and the mixture was stirred at 20° C. for 3 hours. Further, 200 μl of DBU was added to this solution, and the mixture was stirred at 20° C. for 2 hours. Then, the reaction was stopped with 630.7 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1). The obtained fraction was again dissolved in 25.1 ml of DMF, 282 μl of DBU was added, and the mixture was stirred at 20° C. for 4 hours. Further, 282 μl of DBU was added to this solution, and the mixture was stirred at 20° C. for 3 hours. Subsequently, 282 μl of DBU was added, the mixture was stirred at 20° C. for 3 hours, the reaction was stopped with 1.08 g of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 781.6 mg of cyclic phosphonic acid compound (8a-1) at a yield of 69%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.35 (t, J=7 Hz, 3H), 1.75 (m, 1H), 1.85 (br, hydroxyl group), 2.00 (m, 1H), 2.15 (br, hydroxyl group). , 2.78 (m, 1H), 3.70 (m, 2H), 3.89-4.36 (m, 4H)

合成例F4−2(工程F:塩基=DBU、溶媒=アセトニトリル(AN))Synthesis Example F4-2 (Step F: base=DBU, solvent=acetonitrile (AN))
(2−エトキシ−2−オキソ−2λ(2-ethoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a-1)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a-1)

Figure 2020109131
Figure 2020109131

合成例E2−1で得られたジオール化合物(7a−1)1.50gを、DMF26.5mlに溶解させ、さらにDBU297μlを加えて、20℃で3時間撹拌した。さらに、この溶液にDBU200μlを加えて、20℃で2時間撹拌した。その後、p−トルエンスルホン酸一水和物630.7mgで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製した。得られたフラクションを再度、DMF25.1mlに溶解させ、DBU282μlを加えて、20℃で4時間撹拌した。さらに、この溶液にDBU282μlを追加し、20℃で3時間撹拌した。引き続き、DBU282μlを追加し、20℃で3時間撹拌し、p−トルエンスルホン酸一水和物1.08gで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a−1)781.6mgを収率69%で得た。 1.50 g of the diol compound (7a-1) obtained in Synthesis Example E2-1 was dissolved in 26.5 ml of DMF, 297 μl of DBU was further added, and the mixture was stirred at 20° C. for 3 hours. Further, 200 μl of DBU was added to this solution, and the mixture was stirred at 20° C. for 2 hours. Then, the reaction was stopped with 630.7 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1). The obtained fraction was again dissolved in 25.1 ml of DMF, 282 μl of DBU was added, and the mixture was stirred at 20° C. for 4 hours. Further, 282 μl of DBU was added to this solution, and the mixture was stirred at 20° C. for 3 hours. Subsequently, 282 μl of DBU was added, the mixture was stirred at 20° C. for 3 hours, the reaction was stopped with 1.08 g of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 781.6 mg of cyclic phosphonic acid compound (8a-1) at a yield of 69%.

合成例F4−3(工程F:R1=n−Bu)Synthesis example F4-3 (step F: R1=n-Bu)
(2−ブトキシ−2−オキソ−2λ(2-butoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a-2)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a-2)

Figure 2020109131
Figure 2020109131

合成例E2−2で得られたジオール化合物(7a−2)1.72gを、DMF24.4mlに溶解させ、さらにDBU911μlを加えて、60℃で5時間撹拌した。その後、p−トルエンスルホン酸一水和物1.16gで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=10:1)で精製し、環状ホスホン酸化合物(8a−2)1.03gを収率81%で得た。
H−NMR(500MHz,CDCl
δ: 0.94(t,J=7.5Hz,6H),1.40(tq,J=7.5,7.5Hz,4H),1.64−1.79(m,3H),2.00(m,1H),2.36(br,水酸基),2.69−2.89(m,1H),3.70(m,2H),3.89−4.36(m,2H),4.10(m,2H)
1.72 g of the diol compound (7a-2) obtained in Synthesis Example E2-2 was dissolved in 24.4 ml of DMF, 911 μl of DBU was further added, and the mixture was stirred at 60° C. for 5 hours. Then, the reaction was stopped with 1.16 g of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=10:1) to obtain 1.03 g of the cyclic phosphonic acid compound (8a-2) with a yield of 81%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.94 (t, J=7.5 Hz, 6H), 1.40 (tq, J=7.5, 7.5 Hz, 4H), 1.64-1.79 (m, 3H), 2 0.000 (m, 1H), 2.36 (br, hydroxyl group), 2.69-2.89 (m, 1H), 3.70 (m, 2H), 3.89-4.36 (m, 2H). ), 4.10 (m, 2H)

合成例F4−4(工程F:R1=ベンジル)Synthesis Example F4-4 (Step F: R1=benzyl)
(2−ベンジロキシ−2−オキソ−2λ(2-benzyloxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノール(8a-3)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methanol (8a-3)

Figure 2020109131
Figure 2020109131

合成例E2−3で得られたジオール化合物(7a−3)350.4mgを、DMF4mlに溶解させ、さらにDBU45μlを加えて、20℃で3時間撹拌した。その後、p−トルエンスルホン酸一水和物57.1mgで反応を停止し、減圧下、反応液中のDMFを留去した。得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=5:1)で精製し、環状ホスホン酸化合物(8a−3)188.5mgを収率78%で得た。
H−NMR(500MHz,CDCl
δ:1.65−2.06(m,2H), 2.66−2.80(m,1H),3.61−3.67(m,2H),3.88−4.36(m,2H),5.12(m,2H),7.33−7.41(m,5H)
350.4 mg of the diol compound (7a-3) obtained in Synthesis Example E2-3 was dissolved in 4 ml of DMF, 45 μl of DBU was added, and the mixture was stirred at 20° C. for 3 hours. Then, the reaction was stopped with 57.1 mg of p-toluenesulfonic acid monohydrate, and DMF in the reaction solution was distilled off under reduced pressure. The obtained residue was purified by silica gel chromatography (chloroform:methanol=5:1) to obtain 188.5 mg of cyclic phosphonic acid compound (8a-3) with a yield of 78%.
1 H-NMR (500 MHz, CDCl 3 )
δ: 1.65 to 2.06 (m, 2H), 2.66 to 2.80 (m, 1H), 3.61 to 3.67 (m, 2H), 3.88 to 4.36 (m , 2H), 5.12 (m, 2H), 7.33-7.41 (m, 5H)

[工程(G)]
合成例G1−1(工程G:溶媒=ジクロロメタン)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成
[Process (G)]
Synthesis example G1-1 (step G: solvent=dichloromethane)
Synthesis of 9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 -[1,2]oxaphosphoran-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgをジクロロメタン6.0mlに溶解させ、さらにオレイン酸510.1mg、及びDMAP66.2mgを添加し、0℃に冷却した。その後、この溶液にEDC415.4mgを加えて、室温で2.5時間撹拌した。1N塩酸10mlで反応停止し、分液後、ジクロロメタン10mlで抽出、ジクロロメタン5mlで再度抽出し、1%食塩水10mlで有機相を洗浄した。その後、減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)649.8mgを収率84%で得た。
H−NMR(500MHz,CDCl):
δ:0.88(t,J=6.5Hz,3H),1.27−1.30(m,20H,),1.60−1.76(m,3H)2.01−2.12(m,5H),2.32(t,J=7.5Hz,2H),2.83−2.97(m,1H),3.78−4.34(m,7H),5.31−5.38(m,2H)
300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of dichloromethane, 510.1 mg of oleic acid and 66.2 mg of DMAP were added, and the mixture was cooled to 0°C. Then, 415.4 mg of EDC was added to this solution, and the mixture was stirred at room temperature for 2.5 hours. The reaction was stopped with 10 ml of 1N hydrochloric acid, the layers were separated, extracted with 10 ml of dichloromethane, extracted again with 5 ml of dichloromethane, and the organic phase was washed with 10 ml of 1% saline. Then, dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain phosphonate compound (9a) (649.8 mg) at a yield of 84%.
1 H-NMR (500 MHz, CDCl 3 ):
δ: 0.88 (t, J=6.5 Hz, 3H), 1.27-1.30 (m, 20H,), 1.60-1.76 (m, 3H) 2.01-2.12 (M, 5H), 2.32 (t, J=7.5Hz, 2H), 2.83-2.97 (m, 1H), 3.78-4.34 (m, 7H), 5.31. -5.38 (m, 2H)

合成例G1−2(工程G:溶媒=トルエン)Synthesis example G1-2 (step G: solvent=toluene)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgをトルエン6.0mlに溶解させ、さらにオレイン酸510.1mg、及びDMAP66.2mgを添加し、0℃に冷却した。その後、この溶液にEDC415.4mgを加えて、室温で4時間撹拌した。1N塩酸10mlで反応停止し、メタノール2mlを添加し、分液後、トルエン10mlで3回抽出、1%食塩水10mlで有機相を洗浄した。その後、減圧下、トルエンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)369.1mgを収率47%で得た。 300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of toluene, 510.1 mg of oleic acid and 66.2 mg of DMAP were further added, and the mixture was cooled to 0°C. Then, 415.4 mg of EDC was added to this solution, and the mixture was stirred at room temperature for 4 hours. The reaction was stopped with 10 ml of 1N hydrochloric acid, 2 ml of methanol was added, and after liquid separation, extraction was performed 3 times with 10 ml of toluene, and the organic phase was washed with 10 ml of 1% saline. Then, toluene was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 369.1 mg of phosphonate compound (9a) at a yield of 47%.

合成例G1−3(工程G:溶媒=THF)Synthesis example G1-3 (step G: solvent=THF)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgをテトラヒドロフラン6.0mlに溶解させ、さらにオレイン酸510.1mg、及びDMAP66.2mgを添加し、0℃に冷却した。その後、この溶液にEDC415.4mgを加えて、室温で4時間撹拌した。減圧下、テトラヒドロフランを留去し、ジクロロメタン10ml、1N塩酸10mlをそれぞれ加えた後、分液し、ジクロロメタン10mlで2回抽出、1%食塩水10mlで有機相を洗浄した。その後、減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)509.6mgを収率66%で得た。 300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of tetrahydrofuran, 510.1 mg of oleic acid and 66.2 mg of DMAP were added, and the mixture was cooled to 0°C. Then, 415.4 mg of EDC was added to this solution, and the mixture was stirred at room temperature for 4 hours. Tetrahydrofuran was distilled off under reduced pressure, 10 ml of dichloromethane and 10 ml of 1N hydrochloric acid were added, respectively, and the layers were separated, extracted twice with 10 ml of dichloromethane, and the organic phase was washed with 10 ml of 1% saline. After that, dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 509.6 mg of phosphonate compound (9a) with a yield of 66%.

合成例G1−4(工程G:溶媒=DMF)Synthesis example G1-4 (step G: solvent=DMF)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgをN,N−ジメチルホルムアミド6.0mlに溶解させ、さらにオレイン酸510.1mg、及びDMAP66.2mgを添加し、0℃に冷却した。その後、この溶液にEDC415.4mgを加えて、室温で2.5時間撹拌した。減圧下、N,N−ジメチルホルムアミドを留去し、ジクロロメタン10ml、1N塩酸10mlをそれぞれ加えた後、分液し、ジクロロメタン10mlで2回抽出、1%食塩水10mlで有機相を洗浄した。その後、減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)603.4mgを収率78%で得た。 300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of N,N-dimethylformamide, 510.1 mg of oleic acid and 66.2 mg of DMAP were added, and the mixture was added at 0°C. Cooled to. Then, 415.4 mg of EDC was added to this solution, and the mixture was stirred at room temperature for 2.5 hours. The N,N-dimethylformamide was distilled off under reduced pressure, 10 ml of dichloromethane and 10 ml of 1N hydrochloric acid were added, respectively, and the layers were separated, extracted twice with 10 ml of dichloromethane, and the organic phase was washed with 10 ml of 1% saline. Then, dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 603.4 mg of phosphonate compound (9a) with a yield of 78%.

合成例G1−5(工程G:溶媒=酢酸エチル)Synthesis example G1-5 (step G: solvent = ethyl acetate)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgを酢酸エチル6.0mlに溶解させ、さらにオレイン酸510.1mg、及びDMAP66.2mgを添加し、0℃に冷却した。その後、この溶液にEDC415.4mgを加えて、室温で24時間撹拌した。1N塩酸10mlでクエンチ後、分液し、酢酸エチル10mlで2回抽出、1%食塩水10mlで有機相を洗浄した。その後、減圧下、酢酸エチルを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)568.1mgを収率73%で得た。 300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of ethyl acetate, 510.1 mg of oleic acid and 66.2 mg of DMAP were added, and the mixture was cooled to 0°C. Then, 415.4 mg of EDC was added to this solution, and the mixture was stirred at room temperature for 24 hours. After quenching with 10 ml of 1N hydrochloric acid, the mixture was separated, extracted twice with 10 ml of ethyl acetate, and the organic phase was washed with 10 ml of 1% saline. Then, ethyl acetate was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 568.1 mg of phosphonate compound (9a) at a yield of 73%.

合成例G2−1(工程G:縮合剤=DCC)Synthesis example G2-1 (step G: condensing agent=DCC)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgをジクロロメタン6.0mlに溶解させ、さらにオレイン酸510.1mgを添加した。その後、溶液を0℃に冷却後、DCC447.2mgを加えて、室温で23時間撹拌した。得られた白色固体をろ過することで除去し、白色固体をジクロロメタン3mlで洗浄した。その後、ろ液を減圧下、濃縮し、残渣をシリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)27.1mgを収率3.5%で得た。 300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of dichloromethane, and 510.1 mg of oleic acid was further added. Then, the solution was cooled to 0° C., 447.2 mg of DCC was added, and the mixture was stirred at room temperature for 23 hours. The obtained white solid was removed by filtration, and the white solid was washed with 3 ml of dichloromethane. Then, the filtrate was concentrated under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 27.1 mg of phosphonate compound (9a) at a yield of 3.5%.

合成例G2−2(工程G:縮合剤=DCC、添加剤=DMAP)Synthesis example G2-2 (step G: condensing agent=DCC, additive=DMAP)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgをジクロロメタン6.0mlに溶解させ、さらにオレイン酸510.1mg、及び4−DMAP66.2mgを添加し、0℃に冷却後、DCC447.2mgを加えて、室温で2時間撹拌した。得られた白色固体をろ過することで除去し、ジクロロメタン15mlで洗浄した。その後、ろ液を減圧下、濃縮し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)458.0mgを収率59%で得た。 300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of dichloromethane, 510.1 mg of oleic acid and 66.2 mg of 4-DMAP were added, and the mixture was cooled to 0°C. , DCC447.2 mg was added, and the mixture was stirred at room temperature for 2 hours. The white solid obtained was removed by filtration and washed with 15 ml of dichloromethane. Then, the filtrate was concentrated under reduced pressure and purified by silica gel chromatography (ethyl acetate only) to obtain 458.0 mg of phosphonate compound (9a) at a yield of 59%.

合成例G2−3(工程G:縮合剤=DIC)Synthesis example G2-3 (step G: condensing agent=DIC)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgをジクロロメタン6.0mlに溶解させ、さらにオレイン酸510.1mgを添加し、0℃に冷却後、DIC339μlを加えて、室温で3日間撹拌した。得られた白色固体をろ過することで除去し、ジクロロメタン5mlで洗浄した。その後、ろ液を減圧下、濃縮し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)137.8mgを収率18%で得た。 300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of dichloromethane, 510.1 mg of oleic acid was further added, and after cooling to 0° C., DIC339 μl was added and the mixture was cooled to room temperature. And stirred for 3 days. The white solid obtained was removed by filtration and washed with 5 ml of dichloromethane. Then, the filtrate was concentrated under reduced pressure and purified by silica gel chromatography (ethyl acetate only) to obtain 137.8 mg of phosphonate compound (9a) with a yield of 18%.

合成例G2−4(工程G:縮合剤=DIC、添加剤=DMAP)Synthesis example G2-4 (step G: condensing agent=DIC, additive=DMAP)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgをジクロロメタン6.0mlに溶解させ、さらにオレイン酸510.1mg、及び4−DMAP66.2mgを添加し、0℃に冷却した。その後、この溶液にDIC339μlを加えて、室温で24時間撹拌した。得られた白色固体をろ過することで除去し、ジクロロメタン5mlで洗浄した。その後、ろ液を減圧下、濃縮し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)569.9mgを収率73%で得た。 300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of dichloromethane, 510.1 mg of oleic acid and 66.2 mg of 4-DMAP were added, and the mixture was cooled to 0°C. .. Then, 339 μl of DIC was added to this solution, and the mixture was stirred at room temperature for 24 hours. The white solid obtained was removed by filtration and washed with 5 ml of dichloromethane. Thereafter, the filtrate was concentrated under reduced pressure and purified by silica gel chromatography (ethyl acetate only) to obtain 569.9 mg of a phosphonate compound (9a) with a yield of 73%.

合成例G3−1(工程G:オレイン酸クロリドを用いた反応)Synthesis example G3-1 (step G: reaction using oleic acid chloride)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

合成例F1−1で得られた環状ホスホン酸化合物(8a)300.0mgをジクロロメタン6.0mlに溶解させ、さらにトリエチルアミン376μlを添加し、0℃に冷却後、オレイン酸クロリド717μlを加えて、室温で5.5時間撹拌した。水10mlでクエンチ後、ジクロロメタン10mlで2回抽出し、有機相を1%食塩水で洗浄した。減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)658.4mgを収率85%で得た。 300.0 mg of the cyclic phosphonic acid compound (8a) obtained in Synthesis Example F1-1 was dissolved in 6.0 ml of dichloromethane, 376 μl of triethylamine was further added, and after cooling to 0° C., 717 μl of oleic acid chloride was added, and the mixture was stirred at room temperature. The mixture was stirred for 5.5 hours. After quenching with 10 ml of water, the mixture was extracted twice with 10 ml of dichloromethane, and the organic phase was washed with 1% saline. Dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 658.4 mg of phosphonate compound (9a) at a yield of 85%.

合成例G3−2(工程G:調製オレイン酸クロリドを用いた反応)Synthesis Example G3-2 (Step G: Reaction Using Prepared Oleic Acid Chloride)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

オレイン酸510.1mgをトルエン6.0mlに溶解させ、さらにN,N−ジメチルホルムアミド7μl及び塩化チオニル156μlを添加し、40℃で2時間撹拌した。その後、減圧下、トルエンを留去した。さらにトルエン5mlを加えて、再度、減圧下トルエンを留去し、ジクロロメタン3.0mlに溶解させた。一方、環状ホスホン酸化合物(8a)300.0mgをジクロロメタン3.0mlに溶解させ、さらにトリエチルアミン376μlを添加し、氷冷後、調製した酸クロリドのジクロロメタン3.0mlを滴下して加え、室温で3時間撹拌した。水10mlでクエンチ後、ジクロロメタン10mlで2回抽出し、有機相を1%食塩水で洗浄した。減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)571.2mgを収率73%で得た。 Oleic acid (510.1 mg) was dissolved in toluene (6.0 ml), N,N-dimethylformamide (7 µl) and thionyl chloride (156 µl) were added, and the mixture was stirred at 40°C for 2 hours. Then, toluene was distilled off under reduced pressure. Further, 5 ml of toluene was added, the toluene was distilled off again under reduced pressure, and the residue was dissolved in 3.0 ml of dichloromethane. On the other hand, 300.0 mg of the cyclic phosphonic acid compound (8a) was dissolved in 3.0 ml of dichloromethane, and 376 μl of triethylamine was further added. Stir for hours. After quenching with 10 ml of water, the mixture was extracted twice with 10 ml of dichloromethane, and the organic phase was washed with 1% saline. Dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 571.2 mg of phosphonate compound (9a) with a yield of 73%.

合成例G3−3(工程G:調製オレイン酸クロリドを用いた反応)Synthesis Example G3-3 (Step G: Reaction Using Prepared Oleic Acid Chloride)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

オレイン酸510.1mgをトルエン6.0mlに溶解させ、さらにN,N−ジメチルホルムアミド7μl及び二塩化オキサリル190μlを添加し、40℃で3.5時間撹拌し、減圧下、トルエンを留去した。さらにトルエン5mlを加えて、再度、減圧下トルエンを留去し、ジクロロメタン3.0mlに溶解させた。一方、環状ホスホン酸化合物(8a)300.0mgをジクロロメタン3.0mlに溶解させ、さらにトリエチルアミン376μlを添加し、氷冷後、調製した酸クロリドのジクロロメタン3.0mlを滴下して加え、室温で2時間撹拌した。水10mlでクエンチ後、ジクロロメタン10mlで2回抽出し、有機相を水10mlで洗浄した。減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)515.6mgを収率66%で得た。 510.1 mg of oleic acid was dissolved in 6.0 ml of toluene, 7 μl of N,N-dimethylformamide and 190 μl of oxalyl dichloride were further added, and the mixture was stirred at 40° C. for 3.5 hours, and toluene was distilled off under reduced pressure. Further, 5 ml of toluene was added, the toluene was distilled off again under reduced pressure, and the residue was dissolved in 3.0 ml of dichloromethane. On the other hand, 300.0 mg of the cyclic phosphonic acid compound (8a) was dissolved in 3.0 ml of dichloromethane, 376 μl of triethylamine was further added, and after cooling with ice, 3.0 ml of dichloromethane of the acid chloride prepared was added dropwise, and the mixture was added at room temperature to Stir for hours. After quenching with 10 ml of water, the mixture was extracted twice with 10 ml of dichloromethane, and the organic phase was washed with 10 ml of water. Dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 515.6 mg of phosphonate compound (9a) at a yield of 66%.

合成例G4−1(工程G:p−トルエンスルホン酸クロリドを用いた反応)Synthesis example G4-1 (step G: reaction using p-toluenesulfonic acid chloride)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

オレイン酸510.1mgをジクロロメタン3.0mlに溶解させ、さらにN−メチルイミダゾール(NMM)430μlを加えた後、0℃に冷却後、0℃で1時間撹拌した。その後、環状ホスホン酸化合物(8a)300.0mgのジクロロメタン溶液3.0mlを滴下して加え、0℃で1.5時間撹拌した。水10mlでクエンチ後、ジクロロメタン10mlで2回抽出後、有機相を1%食塩水で洗浄した。減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)603.8mgを収率78%で得た。 Oleic acid (510.1 mg) was dissolved in dichloromethane (3.0 ml), N-methylimidazole (NMM) (430 μl) was further added, and the mixture was cooled to 0° C. and stirred at 0° C. for 1 hour. Thereafter, 3.0 ml of a dichloromethane solution of 300.0 mg of the cyclic phosphonic acid compound (8a) was added dropwise, and the mixture was stirred at 0°C for 1.5 hours. After quenching with 10 ml of water and extraction with 10 ml of dichloromethane twice, the organic phase was washed with 1% saline. Dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 603.8 mg of phosphonate compound (9a) with a yield of 78%.

合成例G4−2(工程G:向山試薬を用いた反応)Synthesis Example G4-2 (Step G: reaction using Mukaiyama reagent)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

環状ホスホン酸化合物(8a)421.9mg及びオレイン酸717.4mgをジクロロメタン8.5mlに溶解させ、さらにトリエチルアミン845μl及び2−クロロ−1−メチルピリジニウムヨージド(CMPI)778.7mgを加え3時間加熱還流した。水10mlでクエンチ後、ジクロロメタン10mlで2回抽出した。減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)263.8mgを収率34%で得た。 421.9 mg of cyclic phosphonic acid compound (8a) and 717.4 mg of oleic acid were dissolved in 8.5 ml of dichloromethane, and 845 μl of triethylamine and 778.7 mg of 2-chloro-1-methylpyridinium iodide (CMPI) were added and heated for 3 hours. Refluxed. After quenching with 10 ml of water, the mixture was extracted twice with 10 ml of dichloromethane. Dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 263.8 mg of phosphonate compound (9a) with a yield of 34%.

合成例G4−3(工程G:pyBopを用いた反応)Synthesis example G4-3 (step G: reaction using pyBop)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

環状ホスホン酸化合物(8a)200.0mg及びオレイン酸340.1mgをジクロロメタン4.0mlに溶解させ、さらにジイソプロピルエチルアミン420μlを添加し、氷冷後、pyBop752mgを加え、室温で6時間撹拌した。次いで、1規定塩酸5mlでクエンチ後、ジクロロメタン10ml、5mlで2回抽出した。有機相を水10mlで洗浄し、減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)513.8mgを収率99%で得た。 200.0 mg of cyclic phosphonic acid compound (8a) and 340.1 mg of oleic acid were dissolved in 4.0 ml of dichloromethane, 420 μl of diisopropylethylamine was further added, and after cooling with ice, 752 mg of pyBop was added and stirred at room temperature for 6 hours. Then, after quenching with 5 ml of 1N hydrochloric acid, the mixture was extracted twice with 10 ml of dichloromethane and 5 ml. The organic phase was washed with 10 ml of water, dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 513.8 mg of phosphonate compound (9a) with a yield of 99%. ..

合成例G4−4(工程G:HATUを用いた反応)Synthesis Example G4-4 (Step G: Reaction using HATU)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

環状ホスホン酸化合物(8a)300.0mg及びオレイン酸510.1mgをジクロロメタン6.0mlに溶解させ、さらにジイソプロピルエチルアミン630μlを添加し、氷冷後、HATU824.0mgを加え、室温で24時間撹拌した。次いで、1規定塩酸10mlでクエンチ後、ジクロロメタン10mlで2回抽出した。有機相を水10mlで洗浄し、減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)513.2mgを収率68%で得た。 Cyclic phosphonic acid compound (8a) (300.0 mg) and oleic acid (510.1 mg) were dissolved in dichloromethane (6.0 ml), diisopropylethylamine (630 μl) was further added, and after cooling with ice, HATU824.0 mg was added and the mixture was stirred at room temperature for 24 hours. Then, after quenching with 10 ml of 1N hydrochloric acid, the mixture was extracted twice with 10 ml of dichloromethane. The organic phase was washed with 10 ml of water, dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 513.2 mg of the phosphonate compound (9a) with a yield of 68%. ..

合成例G4−5(工程G:HBTUを用いた反応)Synthesis Example G4-5 (Step G: reaction using HBTU)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

環状ホスホン酸化合物(8a)300.0mg及びオレイン酸510.1mgをジクロロメタン6.0mlに溶解させ、さらにジイソプロピルエチルアミン630μlを添加し、氷冷後、HBTU822.0mgを加え、室温で6.5時間撹拌した。次いで1規定塩酸10mlでクエンチ後、ジクロロメタン10mlで2回抽出した。有機相を水10mlで洗浄し、減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)612.0mgを収率79%で得た。 Cyclic phosphonic acid compound (8a) (300.0 mg) and oleic acid (510.1 mg) were dissolved in dichloromethane (6.0 ml), diisopropylethylamine (630 μl) was added, and the mixture was ice-cooled, HBTU822.0 mg was added, and the mixture was stirred at room temperature for 6.5 hr. did. Then, after quenching with 10 ml of 1N hydrochloric acid, the mixture was extracted twice with 10 ml of dichloromethane. The organic phase was washed with 10 ml of water, dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to obtain 612.0 mg of phosphonate compound (9a) in a yield of 79%. ..

合成例G4−6(工程G:COMUを用いた反応)Synthesis example G4-6 (step G: reaction using COMU)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

環状ホスホン酸化合物(8a)300.0mg及びオレイン酸510.1mgをジクロロメタン6.0mlに溶解させ、さらにジイソプロピルエチルアミン630μlを添加し、氷冷後、COMU928.1mgを加え、室温で24時間撹拌した。次いで1規定塩酸10mlでクエンチ後、ジクロロメタン10mlで2回抽出した。有機相を水10mlで洗浄し、減圧下、ジクロロメタンを留去し、シリカゲルクロマトグラフィー(酢酸エチルのみ)で精製することで、ホスホン酸エステル化合物(9a)778.2mgを定量的に得た。 Cyclic phosphonic acid compound (8a) (300.0 mg) and oleic acid (510.1 mg) were dissolved in dichloromethane (6.0 ml), diisopropylethylamine (630 μl) was further added, and after ice cooling, COMU928.1 mg was added, and the mixture was stirred at room temperature for 24 hours. Then, after quenching with 10 ml of 1N hydrochloric acid, the mixture was extracted twice with 10 ml of dichloromethane. The organic phase was washed with 10 ml of water, dichloromethane was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (ethyl acetate only) to quantitatively obtain 778.2 mg of phosphonate compound (9a).

合成例G5(テレスコーピング法)Synthesis example G5 (telescoping method)
9−オクタデセン酸(9Z)−(2−メトキシ−2−オキソ−2λ9-octadecenoic acid (9Z)-(2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステル(9a)の合成Synthesis of -[1,2]oxaphospholan-4-yl)methyl ester (9a)

Figure 2020109131
Figure 2020109131

(工程B)
化合物(3a)30.0gをCHCl456mlに溶解させ、トリエチルアミン42.7mlを加えて、−20℃に冷却した。これに、MsCl19.1mlを加えて、−20℃で1時間撹拌した。水250mlで反応を停止させ、分液後、CHCl150mlで水層を抽出し、有機層を水200mlで洗浄した。
(工程C)
有機層を減圧下濃縮し、得られた残渣をメチルエチルケトン684mlに溶解させ、トリエチルアミン1.42ml及びヨウ化ナトリウム46.14gを加えて、加熱還流下2.5時間反応させた。反応液を冷却後、減圧下、メチルエチルケトンを留去し、CHCl300ml及び水300mlを加え、分液した。水層をCHCl150mlで2回抽出後、有機層を2.5%チオ硫酸ナトリウム及び0.5%重層水300mlで洗浄した。その後、分液し、次いで水300mlで洗浄し、有機層を減圧下、濃縮した。
(工程D)
得られた残渣をDMF410mlに溶解させ、さらに炭酸セシウム133.73g及び亜リン酸ジメチル37.64mlを加えて、50℃で3時間反応させた。減圧下、反応液中のDMFを留去し、トルエン300mlを加えて、白色固体を濾過した。
(工程E)
白色固体をトルエン150mlで洗浄後、濾液を減圧下濃縮し、得られた残渣をメタノール410mlに溶解させた。さらに、この溶液にp−トルエンスルホン酸一水和物1.95gを加えて、20℃で2時間撹拌した。
(工程F)
反応液を減圧下濃縮し、得られた残渣をDMF821mlに溶解させた。DBU9.21mlを加えて、20℃で3時間撹拌した。さらに、この溶液にp−トルエンスルホン酸一水和物11.71gで反応を停止し、減圧下、DMFを留去した。
(工程G)
得られた残渣をCHCl684mlに溶解させ、さらにオレイン酸57.97g、DMAP7.52g及びEDC47.21gを加えて、20℃で12時間反応させた。次いで、1規定塩酸300mlを加えて、分液した。CHCl300mlで水層を2回抽出し、有機層を水300mlで洗浄後、有機層を濃縮した。得られた残渣をシリカゲルクロマトグラフィー(酢酸エチルのみで溶出)で精製し、化合物(9a)61.99gを70%(全工程)で得た。
(Process B)
30.0 g of the compound (3a) was dissolved in 456 ml of CH 2 Cl 2, 42.7 ml of triethylamine was added, and the mixture was cooled to -20°C. MsCl19.1ml was added to this and it stirred at -20 degreeC for 1 hour. The reaction was stopped with 250 ml of water, and after liquid separation, the aqueous layer was extracted with 150 ml of CH 2 Cl 2 and the organic layer was washed with 200 ml of water.
(Process C)
The organic layer was concentrated under reduced pressure, the obtained residue was dissolved in 684 ml of methyl ethyl ketone, 1.42 ml of triethylamine and 46.14 g of sodium iodide were added, and the mixture was reacted under heating under reflux for 2.5 hours. After cooling the reaction solution, methyl ethyl ketone was distilled off under reduced pressure, 300 ml of CH 2 Cl 2 and 300 ml of water were added, and the layers were separated. The aqueous layer was extracted twice with 150 ml of CH 2 Cl 2 , and the organic layer was washed with 300 ml of 2.5% sodium thiosulfate and 0.5% multistory water. Then, the mixture was separated, washed with 300 ml of water, and the organic layer was concentrated under reduced pressure.
(Process D)
The obtained residue was dissolved in DMF (410 ml), cesium carbonate (133.73 g) and dimethyl phosphite (37.64 ml) were added, and the mixture was reacted at 50° C. for 3 hours. DMF in the reaction solution was distilled off under reduced pressure, 300 ml of toluene was added, and the white solid was filtered.
(Process E)
The white solid was washed with 150 ml of toluene, the filtrate was concentrated under reduced pressure, and the obtained residue was dissolved in 410 ml of methanol. Furthermore, 1.95 g of p-toluenesulfonic acid monohydrate was added to this solution, and the mixture was stirred at 20° C. for 2 hours.
(Process F)
The reaction solution was concentrated under reduced pressure, and the obtained residue was dissolved in 821 ml of DMF. DBU (9.21 ml) was added, and the mixture was stirred at 20° C. for 3 hours. Further, the reaction was stopped with 11.71 g of p-toluenesulfonic acid monohydrate, and DMF was distilled off under reduced pressure.
(Process G)
The obtained residue was dissolved in 684 ml of CH 2 Cl 2, 57.97 g of oleic acid, 7.52 g of DMAP and 47.21 g of EDC were added, and the mixture was reacted at 20° C. for 12 hours. Then, 300 ml of 1N hydrochloric acid was added to separate the layers. The aqueous layer was extracted twice with 300 ml of CH 2 Cl 2 , the organic layer was washed with 300 ml of water, and then the organic layer was concentrated. The obtained residue was purified by silica gel chromatography (eluted only with ethyl acetate) to obtain 61.99 g of compound (9a) in 70% (all steps).

[工程(H)]
実施例1 2ccPAの結晶の製造(良溶媒:水、貧溶媒:アセトン)
合成例G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、14時間反応させた。反応後、反応液を濃縮し、次いで水5mlに60℃で溶解させ、20℃に冷却した。その後、この溶液にアセトン20mlを滴下し、1時間熟成した。結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度98.874%の2ccPA 651.0mgを得た。
[Process (H)]
Example 1 Production of 2 ccPA crystals (good solvent: water, poor solvent: acetone)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of Synthesis Example G5 was dissolved in 11.6 ml of methyl ethyl ketone, 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 14 hours. .. After the reaction, the reaction solution was concentrated, then dissolved in 5 ml of water at 60°C, and cooled to 20°C. Then, 20 ml of acetone was added dropwise to this solution and aged for 1 hour. The crystals were filtered, washed with 30 ml of acetone and dried under reduced pressure to obtain 651.0 mg of 2ccPA having a purity of 98.874%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
16.1724 98
9.6675 28
4.9186 21
4.8335 23
4.5164 100
4.1835 14
3.7921 10
IRスペクトル(cm-1):2920、2851、1728、1204、1176、1098、1012、774、744、721
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
16.1724 98
9.6675 28
4.9186 21
4.8335 23
4.5164 100
4.1835 14
3.7921 10
IR spectrum (cm -1 ): 2920, 2851, 1728, 1204, 1176, 1098, 1012, 774, 744, 721
Melting point: 189°C

実施例2 2ccPAの結晶の製造(良溶媒:メタノール、貧溶媒:アセトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、13時間反応させた。反応後、反応液を濃縮し、次いでメタノール2.5mlに40℃で溶解させ、10℃に冷却した。その後、この溶液にアセトン2.5mlを滴下した。20℃に昇温後、アセトン7.5mlを滴下し、1時間熟成した。その後、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度98.880%の2ccPA 907.6mgを得た。
Example 2 Production of 2 ccPA crystals (good solvent: methanol, poor solvent: acetone)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 13 hours. After the reaction, the reaction solution was concentrated, then dissolved in 2.5 ml of methanol at 40°C and cooled to 10°C. Then, 2.5 ml of acetone was added dropwise to this solution. After the temperature was raised to 20° C., 7.5 ml of acetone was dropped and the mixture was aged for 1 hour. Then, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 907.6 mg of 2ccPA having a purity of 98.880%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9390 100
9.5838 23
4.9294 22
4.7972 18
4.4982 95
4.1913 19
3.7953 9
IRスペクトル(cm-1):2920、2851、1733、1209、1166、1097、1013、774、738、722
融点:188℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9390 100
9.5838 23
4.9294 22
4.7792 18
4.4982 95
4.1913 19
3.79539
IR spectrum (cm -1 ): 2920, 2851, 1733, 1209, 1166, 1097, 1013, 774, 738, 722
Melting point: 188°C

実施例3 2ccPAの結晶の製造(良溶媒:メタノール、貧溶媒:メチルエチルケトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、13時間反応させた。反応後、反応液を濃縮し、次いでメタノール2.5mlに40℃で溶解させ、10℃に冷却した。その後、この溶液にメチルエチルケトン2.5mlを滴下した。20℃に昇温後、メチルエチルケトン7.5mlを滴下し、1時間熟成した。その後、結晶を濾過し、メチルエチルケトン30mlで洗浄し、減圧下で乾燥させて、純度98.944%の2ccPA 862.8mgを得た。
Example 3 Production of 2 ccPA crystals (good solvent: methanol, poor solvent: methyl ethyl ketone)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, and 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 13 hours. After the reaction, the reaction solution was concentrated, then dissolved in 2.5 ml of methanol at 40°C and cooled to 10°C. Then, 2.5 ml of methyl ethyl ketone was added dropwise to this solution. After the temperature was raised to 20° C., 7.5 ml of methyl ethyl ketone was dropped and the mixture was aged for 1 hour. Then, the crystals were filtered, washed with 30 ml of methyl ethyl ketone, and dried under reduced pressure to obtain 862.8 mg of 2ccPA having a purity of 98.944%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.8817 92
9.5631 22
4.9186 24
4.7869 20
4.4937 100
4.1835 19
3.7794 9
IRスペクトル(cm-1):2920、2851、1727、1205、1175、1099、1024、773、742、721
融点:187℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.8817 92
9.56312 22
4.9186 24
4.7869 20
4.4937 100
4.1835 19
3.7794 9
IR spectrum (cm -1 ): 2920, 2851, 1727, 1205, 1175, 1099, 1024, 773, 742, 721
Melting point: 187°C

実施例4 2ccPAの結晶の製造(良溶媒:メタノール、貧溶媒:メチルイソブチルケトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、12時間反応させた。反応後、反応液を濃縮し、次いでメタノール2.5mlに40℃で溶解させ、10℃に冷却した。その後、この溶液にメチルイソブチルケトン2.5mlを滴下した。20℃に昇温後、メチルイソブチルケトン7.5mlを滴下し、1時間熟成した。その後、結晶を濾過し、メチルイソブチルケトン30mlで洗浄し、減圧下で乾燥させて、純度99.300%の2ccPA 819.1mgを得た。
Example 4 Production of 2 ccPA crystals (good solvent: methanol, poor solvent: methyl isobutyl ketone)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 12 hours. After the reaction, the reaction solution was concentrated, then dissolved in 2.5 ml of methanol at 40°C and cooled to 10°C. Then, 2.5 ml of methyl isobutyl ketone was added dropwise to this solution. After the temperature was raised to 20° C., 7.5 ml of methyl isobutyl ketone was dropped and the mixture was aged for 1 hour. Then, the crystals were filtered, washed with 30 ml of methyl isobutyl ketone and dried under reduced pressure to obtain 819.1 mg of 2 ccPA having a purity of 99.300%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.8817 100
9.5631 23
4.9294 10
4.7920 10
4.4982 44
4.1874 10
3.8017 5
IRスペクトル(cm-1):2920、2851、1735、1210、1165、1096、1012、776、738、722
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.8817 100
9.5631 23
4.9294 10
4.7920 10
4.4982 44
4.1874 10
3.80175
IR spectrum (cm -1 ): 2920, 2851, 1735, 1210, 1165, 1096, 1012, 776, 738, 722
Melting point: 189°C

実施例5 2ccPAの結晶の製造(良溶媒:メタノール、貧溶媒:メチルエチルケトン:アセトン=1:1)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、13.5時間反応させた。反応後、反応液を濃縮し、次いでメタノール2.5mlに40℃で溶解させ、10℃に冷却した。その後、この溶液にアセトンとメチルエチルケトンとの混合液2.5mlを滴下した。20℃に昇温後、アセトンとメチルエチルケトンとの混合液7.5mlを滴下し、1時間熟成した。その後、結晶を濾過し、アセトンとメチルエチルケトンの混合液30mlで洗浄し、減圧下で乾燥させて、純度98.880%の2ccPA 853.8mgを得た。
Example 5 Production of 2 ccPA crystals (good solvent: methanol, poor solvent: methyl ethyl ketone: acetone = 1:1)
1.0 g of cyclic phosphonate (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 13.5 hours. .. After the reaction, the reaction solution was concentrated, then dissolved in 2.5 ml of methanol at 40°C and cooled to 10°C. Then, 2.5 ml of a mixed solution of acetone and methyl ethyl ketone was added dropwise to this solution. After the temperature was raised to 20° C., 7.5 ml of a mixed solution of acetone and methyl ethyl ketone was dropped, and the mixture was aged for 1 hour. Then, the crystals were filtered, washed with 30 ml of a mixed solution of acetone and methyl ethyl ketone, and dried under reduced pressure to obtain 853.8 mg of 2ccPA having a purity of 98.880%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.8817 100
9.5631 23
4.9186 14
4.7869 13
4.4937 57
4.1874 14
3.7921 7
IRスペクトル(cm-1):2920、2851、1733、1209、1166、1097、1013、775、738、722
d (lattice plane spacing) Relative intensity (I/I 0 )
15.8817 100
9.5631 23
4.9186 14
4.7869 13
4.4937 57
4.1874 14
3.7921 7
IR spectrum (cm -1 ): 2920, 2851, 1733, 1209, 1166, 1097, 1013, 775, 738, 722

実施例6 2ccPAの結晶の製造(良溶媒:エタノール、晶析温度10℃)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、13時間反応させた。反応後、反応液を濃縮し、次いでエタノール7.5mlに60℃で溶解させ、10℃に冷却し、1時間熟成した。その後、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度98.890%の2ccPA 846.6mgを得た。
Example 6 Production of 2 ccPA crystals (good solvent: ethanol, crystallization temperature 10° C.)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, and 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 13 hours. After the reaction, the reaction solution was concentrated, then dissolved in 7.5 ml of ethanol at 60°C, cooled to 10°C, and aged for 1 hour. Then, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 846.6 mg of 2ccPA having a purity of 98.890%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.8248 100
9.5425 24
4.9078 18
4.7920 17
4.4937 78
4.1796 15
3.7762 8
IRスペクトル(cm-1):2920、2851、1728、1207、1167、1097、1013、774、741、721
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.8248 100
9.5425 24
4.9078 18
4.7920 17
4.4937 78
4.1796 15
3.7762 8
IR spectrum (cm -1 ): 2920, 2851, 1728, 1207, 1167, 1097, 1013, 774, 741, 721
Melting point: 189°C

実施例7 2ccPAの結晶の製造(良溶媒:エタノール、晶析温度20℃)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、16時間反応させた。反応後、反応液を濃縮し、次いでエタノール6mlに65℃で溶解させ、20℃に冷却し、1時間熟成した。その後、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度98.997%の2ccPA 783.3mgを得た。
Example 7 Production of 2 ccPA crystals (good solvent: ethanol, crystallization temperature 20° C.)
1.0 g of the cyclic phosphonic acid ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 16 hours. After the reaction, the reaction solution was concentrated, then dissolved in 6 ml of ethanol at 65°C, cooled to 20°C, and aged for 1 hour. Then, the crystals were filtered, washed with 30 ml of acetone and dried under reduced pressure to obtain 783.3 mg of 2ccPA having a purity of 98.997%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
16.0548 100
9.6046 24
4.9294 7
4.8075 9
4.5073 29
4.2070 7
3.7857 4
IRスペクトル(cm-1):2920、2851、1728、1211、1175、1096、1013、775、745、722
融点:190℃
d (lattice plane spacing) Relative intensity (I/I 0 )
16.0548 100
9.60446 24
4.9294 7
4.80759
4.5073 29
4.2070 7
3.7857 4
IR spectrum (cm -1 ): 2920, 2851, 1728, 1211, 1175, 1096, 1013, 775, 745, 722
Melting point: 190°C

実施例8 2ccPAの結晶の製造(良溶媒:エタノール、貧溶媒:アセトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、13時間反応させた。反応後、反応液を濃縮し、次いでエタノール6mlに60℃で溶解させ、20℃に冷却した。この溶液に、アセトン6mlを滴下後、2時間熟成した。その後、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度99.054%の2ccPA 786.4mgを得た。
Example 8 Production of 2 ccPA crystals (good solvent: ethanol, poor solvent: acetone)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, and 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 13 hours. After the reaction, the reaction solution was concentrated, dissolved in 6 ml of ethanol at 60°C, and cooled to 20°C. Acetone (6 ml) was added dropwise to this solution, followed by aging for 2 hours. Then, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 786.4 mg of 2ccPA having a purity of 99.054%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9967 100
9.6046 24
4.9349 19
4.8023 17
4.5073 76
4.1913 13
3.8017 7
IRスペクトル(cm-1):2920、2851、1727、1212、1172、1096、1024、776、746、721
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9967 100
9.60446 24
4.9349 19
4.802 17
4.5073 76
4.1913 13
3.8017 7
IR spectrum (cm -1 ): 2920, 2851, 1727, 1212, 1172, 1096, 1024, 776, 746, 721
Melting point: 189°C

実施例9 2ccPAの結晶の製造(良溶媒:メタノール:エタノール=1:1、貧溶媒:アセトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、13.5時間反応させた。反応後、反応液を濃縮し、次いでメタノールとエタノールの混合液2.5mlに60℃で溶解させ、10℃に冷却し、アセトン2.5mlを滴下後、20℃に昇温、アセトン7.5mlを滴下、1時間熟成し、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させ、純度98.812%の2ccPA 954.2mgを得た。
Example 9 Production of 2 ccPA crystals (good solvent:methanol:ethanol=1:1, poor solvent:acetone)
1.0 g of cyclic phosphonate (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 13.5 hours. .. After the reaction, the reaction solution was concentrated, then dissolved in 2.5 ml of a mixed solution of methanol and ethanol at 60° C., cooled to 10° C., 2.5 ml of acetone was added dropwise, and the temperature was raised to 20° C., 7.5 ml of acetone Was added dropwise and aged for 1 hour. The crystals were filtered, washed with 30 ml of acetone and dried under reduced pressure to obtain 954.2 mg of 2ccPA having a purity of 98.812%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.8817 100
9.5631 24
4.9294 8
4.7920 8
4.4982 37
4.1913 10
3.8017 5
IRスペクトル(cm-1):2920、2851、1734、1210、1165、1097、1012、775、738、722
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.8817 100
9.56331 24
4.9294 8
4.7920 8
4.498 37
4.1913 10
3.80175
IR spectrum (cm -1 ): 2920, 2851, 1734, 1210, 1165, 1097, 1012, 775, 738, 722
Melting point: 189°C

実施例10 2ccPAの結晶の製造(良溶媒:1−プロパノール、晶析温度10℃) G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、13時間反応させた。反応後、反応液を濃縮し、次いで1−プロパノール7.5mlに60℃で溶解させ、10℃に冷却し、1時間熟成した。その後、結晶を濾過、アセトン70mlで洗浄し、減圧下で乾燥させて、純度98.419%の2ccPA 645.0mgを得た。 Example 10 Production of 2 ccPA crystals (good solvent: 1-propanol, crystallization temperature 10° C. ) 1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone. 522.3 mg of sodium iodide was added to the mixture, and the mixture was reacted under heating and reflux for 13 hours. After the reaction, the reaction solution was concentrated, then dissolved in 7.5 ml of 1-propanol at 60°C, cooled to 10°C, and aged for 1 hour. Then, the crystals were filtered, washed with 70 ml of acetone, and dried under reduced pressure to obtain 645.0 mg of 2ccPA having a purity of 98.419%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9967 100
9.6046 24
4.9024 7
4.8075 12
4.5027 32
4.1835 7
3.7636 6
IRスペクトル(cm-1):2920、2851、1727、1207、1170、1098、1014、774、745、721
融点:190℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9967 100
9.60446 24
4.90247
4.8075 12
4.5027 32
4.1835 7
3.7636 6
IR spectrum (cm -1 ): 2920, 2851, 1727, 1207, 1170, 1098, 1014, 774, 745, 721
Melting point: 190°C

実施例11 2ccPAの結晶の製造(良溶媒:1−プロパノール、晶析温度20℃) G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、14時間反応させた。反応後、反応液を濃縮し、次いで1−プロパノール6.0mlに50℃で溶解させ、20℃に冷却し、1時間熟成した。その後、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度98.750%の2ccPA 866.5mgを得た。
得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。
Example 11 Production of 2 ccPA crystals (good solvent: 1-propanol, crystallization temperature 20° C. ) 1.0 g of the cyclic phosphonate (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone. 522.3 mg of sodium iodide was added to the mixture, and the mixture was reacted under heating under reflux for 14 hours. After the reaction, the reaction solution was concentrated, then dissolved in 6.0 ml of 1-propanol at 50°C, cooled to 20°C, and aged for 1 hour. Then, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 866.5 mg of 2 ccPA having a purity of 98.750%.
The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
16.0548 100
9.6255 24
4.9403 11
4.8023 12
4.5073 51
4.1992 11
3.7985 6
IRスペクトル(cm-1):2920、2851、1727、1205、1174、1098、1023、773、743、721
融点:188℃
d (lattice plane spacing) Relative intensity (I/I 0 )
16.0548 100
9.6255 24
4.9403 11
4.802 12
4.5073 51
4.1992 11
3.7985 6
IR spectrum (cm -1 ): 2920, 2851, 1727, 1205, 1174, 1098, 1023, 773, 743, 721
Melting point: 188°C

実施例12 2ccPAの結晶の製造(良溶媒:1−プロパノール、貧溶媒:アセトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、15.5時間反応させた。反応後、反応液を濃縮し、次いで1−プロパノール6.0mlに60℃で溶解させ、20℃に冷却した。この溶液に、アセトン6.0ml滴下し、20℃で1時間熟成した。その後、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させ、純度98.902%の2ccPA 866.9mgを得た。
Example 12 Production of 2 ccPA crystals (good solvent: 1-propanol, poor solvent: acetone)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 15.5 hours. .. After the reaction, the reaction solution was concentrated, then dissolved in 6.0 ml of 1-propanol at 60°C, and cooled to 20°C. Acetone (6.0 ml) was added dropwise to this solution, and the mixture was aged at 20° C. for 1 hour. Then, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 866.9 mg of 2ccPA having a purity of 98.902%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
16.0548 100
9.6255 23
4.9349 9
4.8075 10
4.5073 35
4.1952 7
3.7857 4
IRスペクトル(cm-1):2920、2851、1727、1206、1175、1097、1023、774、744、721
融点:187℃
d (lattice plane spacing) Relative intensity (I/I 0 )
16.0548 100
9.6255 23
4.9349 9
4.875 10
4.5073 35
4.1952 7
3.7857 4
IR spectrum (cm -1 ): 2920, 2851, 1727, 1206, 1175, 1097, 1023, 774, 744, 721
Melting point: 187°C

実施例13 2ccPAの結晶の製造(良溶媒:イソプロピルアルコール、晶析温度20℃)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、15時間反応させた。反応後、反応液を濃縮し、次いで1−プロパノール6.0mlに65℃で溶解させ、20℃に冷却し、1時間熟成した。その後、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度98.588%の2ccPA 942.2mgを得た。
Example 13 Production of 2 ccPA crystals (good solvent: isopropyl alcohol, crystallization temperature 20° C.)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 15 hours. After the reaction, the reaction solution was concentrated, then dissolved in 6.0 ml of 1-propanol at 65°C, cooled to 20°C, and aged for 1 hour. Then, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 942.2 mg of 2ccPA having a purity of 98.588%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9390 80
9.5631 20
4.9186 26
4.7972 21
4.4982 100
4.1874 17
3.7953 9
IRスペクトル(cm-1):2920、2851、1727、1212、1175、1095、1023、776、746、722
融点:188℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9390 80
9.563 20
4.9186 26
4.797 21
4.4982 100
4.1874 17
3.79539
IR spectrum (cm -1 ): 2920, 2851, 1727, 1212, 1175, 1095, 1023, 776, 746, 722
Melting point: 188°C

実施例14 2ccPAの結晶の製造(良溶媒:イソプロピルアルコール、貧溶媒:アセトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、14時間反応させた。反応後、反応液を濃縮し、次いでイソプロピルアルコール6.0mlに60℃で溶解させ、20℃に冷却した。この溶液に、アセトン6.0mlを滴下し、20℃で1時間熟成した。その後、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させ、純度98.761%の2ccPA 915.8mgを得た。
Example 14 Production of 2 ccPA crystals (good solvent: isopropyl alcohol, poor solvent: acetone)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, 522.3 mg of sodium iodide was added thereto, and the mixture was reacted under heating under reflux for 14 hours. After the reaction, the reaction solution was concentrated, then dissolved in 6.0 ml of isopropyl alcohol at 60°C, and cooled to 20°C. To this solution, 6.0 ml of acetone was added dropwise, and the mixture was aged at 20° C. for 1 hour. Then, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 915.8 mg of 2ccPA having a purity of 98.761%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.939 86
9.5838 21
4.9132 25
4.7920 21
4.4937 100
4.1874 17
3.7762 8
IRスペクトル(cm-1):2921、2851、1727、1212、1175、1095、1023、776、745、722
融点:187℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.939 86
9.5838 21
4.9132 25
4.7920 21
4.4937 100
4.1874 17
3.7762 8
IR spectrum (cm -1 ): 2921, 2851, 1727, 1212, 1175, 1095, 1023, 776, 745, 722
Melting point: 187°C

実施例15 2ccPAの結晶の製造(良溶媒:1-ブタノール、貧溶媒:アセトン) G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、12時間反応させた。反応後、反応液を濃縮し、次いで1−ブタノール6.0mlに65℃で溶解させ、20℃に冷却した。この溶液に、アセトン6.0mlを滴下し、20℃で3.5時間熟成した。その後、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度98.773%の2ccPA 598.9mgを得た。 Example 15 Production of crystals of 2 ccPA (good solvent: 1-butanol, poor solvent: acetone ) 1.0 g of cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone. 522.3 mg of sodium iodide was added, and the mixture was reacted under heating under reflux for 12 hours. After the reaction, the reaction solution was concentrated, then dissolved in 6.0 ml of 1-butanol at 65°C, and cooled to 20°C. To this solution, 6.0 ml of acetone was added dropwise and aged at 20° C. for 3.5 hours. Then, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 598.9 mg of 2ccPA having a purity of 98.773%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9967 100
9.6046 25
4.9024 8
4.8075 12
4.4982 36
4.1719 7
3.7293 6
IRスペクトル(cm-1):2920、2851、1728、1206、1175、1097、1013、774、745、721
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9967 100
9.60446 25
4.90248
4.8075 12
4.4982 36
4.1197 7
3.7293 6
IR spectrum (cm -1 ): 2920, 2851, 1728, 1206, 1175, 1097, 1013, 774, 745, 721
Melting point: 189°C

実施例16 2ccPAの結晶の製造(反応溶媒、晶析溶媒:アセトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、アセトン11.6mlに溶解させ、ヨウ化ナトリウム522.3mgを加えて、加熱還流下、48時間反応させた。室温まで冷却し、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度86.921%の2ccPA 898.0mgを得た。
Example 16 Production of 2 ccPA crystals (reaction solvent, crystallization solvent: acetone)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of acetone, 522.3 mg of sodium iodide was added, and the mixture was reacted under heating under reflux for 48 hours. After cooling to room temperature, the crystals were filtered, washed with 30 ml of acetone and dried under reduced pressure to obtain 898.0 mg of 2ccPA having a purity of 86.921%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
16.0548 100
9.6255 23
4.9349 27
4.8075 21
4.5073 99
4.1992 15
3.8145 8
IRスペクトル(cm-1):2920、2851、1727、1211、1175、1095、1023、776、746、722
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
16.0548 100
9.6255 23
4.9349 27
4.80752
4.5073 99
4.1992 15
3.8145 8
IR spectrum (cm -1 ): 2920, 2851, 1727, 1211, 1175, 1095, 1023, 776, 746, 722
Melting point: 189°C

実施例17 2ccPAの結晶の製造(反応溶媒、晶析溶媒:メチルエチルケトン、貧溶媒:アセトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、アセトン11.6mlに溶解させ、ヨウ化ナトリウム522.3mgを加えて、加熱還流下、15時間反応させた。室温まで冷却し、アセトン11.6mlを滴下、結晶を濾過し、アセトン30mlで洗浄し、減圧下で乾燥させて、純度98.429%の2ccPA 950.7mgを得た。
Example 17 Production of 2 ccPA crystals (reaction solvent, crystallization solvent: methyl ethyl ketone, poor solvent: acetone)
1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of acetone, 522.3 mg of sodium iodide was added, and the mixture was reacted under heating under reflux for 15 hours. After cooling to room temperature, 11.6 ml of acetone was added dropwise, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 950.7 mg of 2ccPA having a purity of 98.429%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.7684 67
9.5425 16
4.8282 27
4.4802 100
4.1757 16
3.7263 10
IRスペクトル(cm-1):2920、2851、1727、1211、1175、1096、1015、775、744、722
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.7684 67
9.5425 16
4.828 27
4.4802 100
4.1757 16
3.7263 10
IR spectrum (cm -1 ): 2920, 2851, 1727, 1211, 1175, 1096, 1015, 775, 744, 722
Melting point: 189°C

実施例18 2ccPAの結晶の製造(反応溶媒、晶析溶媒:メチルイソブチルケトン)
G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、アセトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、6時間反応させた。10℃まで冷却し、1時間熟成後、結晶を濾過、アセトン30mlで洗浄し、減圧下で乾燥させて、純度20.777%の2ccPA 950.7mgを得た。
Example 18 Production of 2 ccPA crystals (reaction solvent, crystallization solvent: methyl isobutyl ketone)
1.0 g of the cyclic phosphonic acid ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of acetone, and 522.3 mg of sodium iodide was added to this, and the mixture was reacted for 6 hours under heating under reflux. After cooling to 10° C. and aging for 1 hour, the crystals were filtered, washed with 30 ml of acetone, and dried under reduced pressure to obtain 950.7 mg of 2ccPA having a purity of 20.777%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9390 100
9.5838 26
4.9132 6
4.8023 8
4.4937 23
4.1641 6
3.7730 4
IRスペクトル(cm-1):2921、2852、1731、1208、1174、1094、1011、778、745、722
融点:187℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9390 100
9.5838 26
4.9132 6
4.802,338
4.4937 23
4.164 16
3.7730 4
IR spectrum (cm -1 ): 2921, 2852, 1731, 1208, 1174, 1094, 1011, 778, 745, 722
Melting point: 187°C

実施例19 2ccPAの結晶の製造(良溶媒:メタノール、貧溶媒:酢酸エチル) G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、13時間反応させた。反応後、反応液を濃縮し、次いでメタノール2.5mlに40℃で溶解させ、10℃に冷却後、酢酸エチル2.5mlを滴下した。20℃に昇温後、酢酸エチル7.5mlを滴下し、1時間熟成した。その後、結晶を濾過し、酢酸エチル30mlで洗浄し、減圧下で乾燥させて、純度98.204%の2ccPA 719.8mgを得た。 Example 19 Production of 2 ccPA crystals (good solvent: methanol, poor solvent: ethyl acetate ) 1.0 g of cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, and iodine was added thereto. 522.3 mg of sodium iodide was added, and the mixture was reacted under heating and reflux for 13 hours. After the reaction, the reaction solution was concentrated, dissolved in 2.5 ml of methanol at 40° C., cooled to 10° C., and 2.5 ml of ethyl acetate was added dropwise. After the temperature was raised to 20° C., 7.5 ml of ethyl acetate was added dropwise and the mixture was aged for 1 hour. Then, the crystals were filtered, washed with 30 ml of ethyl acetate, and dried under reduced pressure to obtain 719.8 mg of 2ccPA having a purity of 98.204%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9390 100
9.5838 22
4.9186 16
4.7920 13
4.4937 62
4.1835 13
3.7921 7
IRスペクトル(cm-1):2920、2851、1728、1208、1166、1097、1013、773、738、722
融点:190℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9390 100
9.5838 22
4.9186 16
4.7920 13
4.4937 62
4.1835 13
3.7921 7
IR spectrum (cm -1 ): 2920, 2851, 1728, 1208, 1166, 1097, 1013, 773, 738, 722
Melting point: 190°C

実施例20 2ccPAの結晶の製造(良溶媒:メタノール、貧溶媒:酢酸ブチル) G5の製法で得られた環状ホスホン酸エステル(9a)1.0gを、メチルエチルケトン11.6mlに溶解させ、これにヨウ化ナトリウム522.3mgを加えて、加熱還流下、13時間反応させた。反応後、反応液を濃縮し、次いでメタノール2.5mlに40℃で溶解させ、10℃に冷却後、酢酸ブチル2.5mlを滴下した。20℃に昇温後、酢酸ブチル7.5mlを滴下し、1時間熟成後、結晶を濾過し、酢酸ブチル30mlで洗浄し、減圧下で乾燥させ、純度98.350%の2ccPA 548.0mgを得た。 Example 20 Production of 2 ccPA crystals (good solvent: methanol, poor solvent: butyl acetate ) 1.0 g of the cyclic phosphonate ester (9a) obtained by the production method of G5 was dissolved in 11.6 ml of methyl ethyl ketone, and iodine was added thereto. 522.3 mg of sodium iodide was added, and the mixture was reacted under heating and reflux for 13 hours. After the reaction, the reaction solution was concentrated, dissolved in 2.5 ml of methanol at 40° C., cooled to 10° C., and 2.5 ml of butyl acetate was added dropwise. After heating to 20° C., 7.5 ml of butyl acetate was added dropwise, and after aging for 1 hour, the crystals were filtered, washed with 30 ml of butyl acetate, and dried under reduced pressure to obtain 548.0 mg of 2ccPA having a purity of 98.350%. Obtained.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9390 100
9.5838 23
4.9240 9
4.7920 9
4.4982 36
4.1874 9
3.7921 5
IRスペクトル(cm-1):2920、2851、1735、1210、1165、1097、1012、776、738、722
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9390 100
9.5838 23
4.9240 9
4.7920 9
4.4982 36
4.1874 9
3.7921 5
IR spectrum (cm -1 ): 2920, 2851, 1735, 1210, 1165, 1097, 1012, 776, 738, 722
Melting point: 189°C

実施例21 2ccPAの再精製(良溶媒:メタノール、貧溶媒:メチルエチルケトン)
実施例2で得た2ccPA3.00gをメタノール7.3mlに40℃で溶解させ、溶解液を10℃まで冷却し、1時間撹拌後、メチルエチルケトン7.3mlを滴下した。その後、20℃に昇温させ、再度メチルエチルケトン22mlを滴下し、20℃で1時間熟成後、結晶をろ過し、メチルエチルケトン36mlで洗浄し、純度99.511%の2ccPA2.55gを得た。
Example 21 Repurification of 2 ccPA (good solvent: methanol, poor solvent: methyl ethyl ketone)
3.00 g of 2 ccPA obtained in Example 2 was dissolved in 7.3 ml of methanol at 40° C., the solution was cooled to 10° C., stirred for 1 hour, and then 7.3 ml of methyl ethyl ketone was added dropwise. Then, the temperature was raised to 20° C., 22 ml of methyl ethyl ketone was dropped again, and after aging at 20° C. for 1 hour, the crystals were filtered and washed with 36 ml of methyl ethyl ketone to obtain 2.55 g of 2ccPA having a purity of 99.511%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
16.0548 100
9.6255 24
4.9186 14
4.7920 14
4.4982 67
4.1835 14
3.7985 8
IRスペクトル(cm-1):2920、2851、1735、1210、1165、1096、1012、776、738、722
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
16.0548 100
9.6255 24
4.9186 14
4.7920 14
4.498 67
4.1835 14
3.7985 8
IR spectrum (cm -1 ): 2920, 2851, 1735, 1210, 1165, 1096, 1012, 776, 738, 722
Melting point: 189°C

実施例22 2ccPAの再精製(良溶媒:メタノール、貧溶媒:酢酸エチル)
実施例2で得た2ccPA3.00gをメタノール7.3mlに40℃で溶解させ、溶解液を10℃まで冷却し、1時間撹拌後、酢酸エチル7.3mlを滴下した。その後、20℃に昇温させ、再度酢酸エチル22mlを滴下し、20℃で1時間熟成した。その後、結晶をろ過し、酢酸エチル36mlで洗浄し、純度99.610%の2ccPA2.52gを得た。
Example 22 Repurification of 2ccPA (good solvent: methanol, poor solvent: ethyl acetate)
3.00 g of 2 ccPA obtained in Example 2 was dissolved in 7.3 ml of methanol at 40° C., the solution was cooled to 10° C., stirred for 1 hour, and then 7.3 ml of ethyl acetate was added dropwise. Then, the temperature was raised to 20° C., 22 ml of ethyl acetate was added again, and the mixture was aged at 20° C. for 1 hour. Then, the crystals were filtered and washed with 36 ml of ethyl acetate to obtain 2.52 g of 2ccPA having a purity of 99.610%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
16.0548 100
9.6255 24
4.9294 17
4.7972 15
4.5073 74
4.1874 15
3.7985 8
IRスペクトル(cm-1):2920、2851、1735、1210、1165、1097、1012、776、738、722
融点:187℃
d (lattice plane spacing) Relative intensity (I/I 0 )
16.0548 100
9.6255 24
4.9294 17
4.7972 15
4.5073 74
4.1874 15
3.7985 8
IR spectrum (cm -1 ): 2920, 2851, 1735, 1210, 1165, 1097, 1012, 776, 738, 722
Melting point: 187°C

実施例23 2ccPAの再精製(良溶媒:メタノール、貧溶媒:1−プロパノール) 実施例2で得た2ccPA3.00gをメタノール7.3mlに40℃で溶解させ、溶解液を10℃まで冷却し、1時間撹拌後、1−プロパノール7.3mlを滴下した。その後、20℃に昇温させ、再度1−プロパノール22mlを滴下し、20℃で1時間熟成した。その後、結晶をろ過し、1−プロパノール36mlで洗浄し、純度99.628%の2ccPA1.67gを得た。 Example 23 Repurification of 2 ccPA (good solvent: methanol, poor solvent: 1-propanol) 3.00 g of 2 ccPA obtained in Example 2 was dissolved in 7.3 ml of methanol at 40°C, and the solution was cooled to 10°C. After stirring for 1 hour, 7.3 ml of 1-propanol was added dropwise. Then, the temperature was raised to 20° C., 22 ml of 1-propanol was dropped again, and the mixture was aged at 20° C. for 1 hour. Then, the crystal was filtered and washed with 36 ml of 1-propanol to obtain 1.67 g of 2 ccPA having a purity of 99.628%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
16.0548 100
9.6255 24
4.9186 15
4.8075 15
4.4982 67
4.1835 13
3.8049 7
IRスペクトル(cm-1):2920、2851、1734、1210、1166、1097、1012、775、738、722
融点:187℃
d (lattice plane spacing) Relative intensity (I/I 0 )
16.0548 100
9.6255 24
4.9186 15
4.8075 15
4.498 67
4.1835 13
3.80497
IR spectrum (cm -1 ): 2920, 2851, 1734, 1210, 1166, 1097, 1012, 775, 738, 722
Melting point: 187°C

実施例24 2ccPAの再精製(良溶媒:メタノール、貧溶媒:酢酸メチル)
実施例2で得た2ccPA3.00gをメタノール7.3mlに40℃で溶解させ、溶解液を10℃まで冷却し、1時間撹拌後、酢酸メチル7.3mlを滴下した。その後、20℃に昇温させ、再度酢酸メチル22mlを滴下し、20℃で1時間熟成した。その後、結晶をろ過し、酢酸メチル36mlで洗浄し、純度99.559%の2ccPA2.49gを得た。
Example 24 Repurification of 2ccPA (good solvent: methanol, poor solvent: methyl acetate)
3.00 g of 2 ccPA obtained in Example 2 was dissolved in 7.3 ml of methanol at 40° C., the solution was cooled to 10° C., and after stirring for 1 hour, 7.3 ml of methyl acetate was added dropwise. Then, the temperature was raised to 20° C., 22 ml of methyl acetate was added again, and the mixture was aged at 20° C. for 1 hour. Then, the crystals were filtered and washed with 36 ml of methyl acetate to obtain 2.49 g of 2ccPA having a purity of 99.559%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9967 100
9.6046 23
4.9240 11
4.8023 10
4.4982 44
4.1874 10
3.7985 5
IRスペクトル(cm-1):2920、2851、1735、1210、1165、1097、1012、776、738、722
融点:189℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9967 100
9.60423
4.9240 11
4.823 10
4.4982 44
4.1874 10
3.7985 5
IR spectrum (cm -1 ): 2920, 2851, 1735, 1210, 1165, 1097, 1012, 776, 738, 722
Melting point: 189°C

実施例25 2ccPAの再精製(良溶媒:メタノール、貧溶媒:酢酸イソプロピル) 実施例2で得た2ccPA3.00gをメタノール7.3mlに40℃で溶解させ、溶解液を10℃まで冷却し、1時間撹拌後、酢酸イソプロピル7.3mlを滴下した。その後、20℃に昇温させ、再度酢酸イソプロピル22mlを滴下し、20℃で1時間熟成した。その後、結晶をろ過し、酢酸イソプロピル36mlで洗浄し、純度99.549%の2ccPA2.37gを得た。 Example 25 Repurification of 2 ccPA (good solvent: methanol, poor solvent: isopropyl acetate) 3.00 g of 2 ccPA obtained in Example 2 was dissolved in 7.3 ml of methanol at 40° C. and the solution was cooled to 10° C. After stirring for an hour, 7.3 ml of isopropyl acetate was added dropwise. Then, the temperature was raised to 20° C., 22 ml of isopropyl acetate was added again, and the mixture was aged at 20° C. for 1 hour. Then, the crystals were filtered and washed with 36 ml of isopropyl acetate to obtain 2.37 g of 2ccPA having a purity of 99.549%.

得られた2ccPA白色結晶のX線粉末回折スペクトルを測定したところ、以下の通りであった。このX線粉末回折スペクトルは、モノクロメーターを通したλ=1.54059Åの銅放射線で得られるX線粉末回折スペクトルである。 The X-ray powder diffraction spectrum of the obtained 2 ccPA white crystal was measured and the result was as follows. This X-ray powder diffraction spectrum is an X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å passed through a monochromator.

d(格子面間隔) 相対強度(I/I
15.9390 100
9.5838 22
4.9186 10
4.7869 10
4.4937 45
4.1796 10
3.7985 5
IRスペクトル(cm-1):2920、2851、1735、1210、1165、1097、1012、776、738、722
融点:187℃
d (lattice plane spacing) Relative intensity (I/I 0 )
15.9390 100
9.5838 22
4.9186 10
4.7869 10
4.4937 45
4.1796 10
3.7985 5
IR spectrum (cm -1 ): 2920, 2851, 1735, 1210, 1165, 1097, 1012, 776, 738, 722
Melting point: 187°C

実施例26(2ccPAの合成:反応溶媒アセトン)Example 26 (2ccPA synthesis: reaction solvent acetone)

Figure 2020109131
Figure 2020109131

環状ホスホン酸エステル化合物(9a)200mgを、アセトン2.3mlに溶解させ、これにヨウ化ナトリウム104.5mgを加えて、加熱還流下、23時間反応させた。20℃まで冷却後、生じた白色固体を濾過した。結晶をアセトンで洗浄後、2ccPA(1)の白色結晶を174.2mg(融点189.6℃)得た。
H−NMR(500MHz,CDCl
δ:0.79(t,J=6.5Hz),1.19−1.23(m,20H),1.36(m,1H),1.51(br,2H),1.79(m,1H),1.93(br,4H),2.26(t,J=7.5Hz,2H),2.72(m,1H),3.65−4.10(m,4H),5.20−5.28(m,2H)
200 mg of the cyclic phosphonate compound (9a) was dissolved in 2.3 ml of acetone, and 104.5 mg of sodium iodide was added thereto, and the mixture was reacted for 23 hours under heating under reflux. After cooling to 20°C, the resulting white solid was filtered. After the crystals were washed with acetone, 174.2 mg (melting point 189.6° C.) of white crystals of 2ccPA(1) were obtained.
1 H-NMR (500 MHz, CDCl 3 )
δ: 0.79 (t, J=6.5 Hz), 1.19-1.23 (m, 20H), 1.36 (m, 1H), 1.51 (br, 2H), 1.79 ( m, 1H), 1.93 (br, 4H), 2.26 (t, J=7.5 Hz, 2H), 2.72 (m, 1H), 3.65-4.10 (m, 4H). , 5.20-5.28 (m, 2H)

[文献処方に従った合成検討]
比較例1:ホスホン酸ジメチルエステルの合成、アルブゾブ反応
[Synthesis study according to literature prescription]
Comparative Example 1: Synthesis of phosphonic acid dimethyl ester, Arbuzob reaction

Figure 2020109131
Figure 2020109131

ヨウ素化合物(5a)15.00gを亜リン酸トリメチル105mlに溶解させ、14時間加熱還流した。その後、再度亜リン酸トリメチル210mlを加えて、6時間加熱還流した。濃縮後、得られた残渣をシリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、ホスホン酸ジメチル化合物(6a)8.34gを収率60%で得たが、構造不明の副生成物が混入していた。 15.00 g of the iodine compound (5a) was dissolved in 105 ml of trimethyl phosphite, and the mixture was heated under reflux for 14 hours. Then, 210 ml of trimethyl phosphite was added again, and the mixture was heated under reflux for 6 hours. After concentration, the obtained residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 8.34 g of dimethyl phosphonate compound (6a) in a yield of 60%, but a by-product of unknown structure Was mixed.

比較例2:(2−メトキシ−2−オキソ−2λComparative Example 2: (2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メタノールの合成、環化反応Synthesis of [[1,2]oxaphosphoran-4-yl)methanol, cyclization reaction

Figure 2020109131
Figure 2020109131

比較例1で得られたホスホン酸ジメチル化合物(6a)8.34gをトルエン417ml、及びメタノール14.1mlに溶解させ、p−トルエンスルホン酸一水和物1.53gを加えて、3時間加熱還流した。減圧下、トルエン及びメタノールを留去し、シリカゲルクロマトグラフィー(クロロホルム:メタノール=15:1)で精製し、環状ホスホン酸化合物(8a)2.44gを収率42%で得た。 8.34 g of the dimethyl phosphonate compound (6a) obtained in Comparative Example 1 was dissolved in 417 ml of toluene and 14.1 ml of methanol, 1.53 g of p-toluenesulfonic acid monohydrate was added, and the mixture was heated under reflux for 3 hours. did. Toluene and methanol were distilled off under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=15:1) to obtain 2.44 g of the cyclic phosphonic acid compound (8a) in a yield of 42%.

比較例3:(9−オクタデセン酸−2−メトキシ−2−オキソ−2λComparative Example 3: (9-octadecenoic acid-2-methoxy-2-oxo-2λ) 5 −[1,2]オキサホスホラン−4−イル)メチルエステルの合成、縮合反応Synthesis and condensation reaction of -[1,2]oxaphosphoran-4-yl)methyl ester

Figure 2020109131
Figure 2020109131

比較例2で得られた環状ホスホン酸化合物(8a)2.42g、及びオレイン酸4.11g、4−ジメチルアミノピリジン534.0mgをジクロロメタン48.6mlに溶解させた。これを氷冷後、EDC3.35g、オレイン酸1.23g、EDC2.23g、及びジクロロメタン808mlを加えて、24時間室温で撹拌した。メタノール571mlで希釈後、水300mlを加えた。分液後、水相を酢酸エチル300ml、100mlで2回抽出し、有機相を硫酸マグネシウムで乾燥後、減圧下、酢酸エチル、メタノールを留去し、得られた残渣をシリカゲルクロマトグラフィー(酢酸エチルのみ)で精製し、環状ホスホン酸エステル化合物(9a)2.65gを収率42%で得た。 2.42 g of the cyclic phosphonic acid compound (8a) obtained in Comparative Example 2, 4.11 g of oleic acid, and 534.0 mg of 4-dimethylaminopyridine were dissolved in 48.6 ml of dichloromethane. After cooling this with ice, 3.35 g of EDC, 1.23 g of oleic acid, 2.23 g of EDC, and 808 ml of dichloromethane were added, and the mixture was stirred at room temperature for 24 hours. After diluting with 571 ml of methanol, 300 ml of water was added. After separation, the aqueous phase was extracted twice with 300 ml and 100 ml of ethyl acetate, the organic phase was dried over magnesium sulfate, and then ethyl acetate and methanol were distilled off under reduced pressure. The obtained residue was subjected to silica gel chromatography (ethyl acetate). Only) to obtain 2.65 g of a cyclic phosphonate compound (9a) with a yield of 42%.

比較例4:(9−オクタデセン酸−2−メトキシ−2−オキソ−2λComparative Example 4: (9-octadecenoic acid-2-methoxy-2-oxo-2λ) 5 −[1,2]オキサホスホラン−4−イル)メチルエステルプロトン型の合成、脱メチル化反応-[1,2]oxaphosphoran-4-yl)methyl ester proton type synthesis, demethylation reaction

Figure 2020109131
Figure 2020109131

比較例3で合成した環状ホスホン酸エステル化合物(9a)2.51gをジクロロメタン303mlに溶解させ、−15℃に冷却後、ブロモトリメチルシラン2.31mlを加えて、−15℃で4.5時間撹拌した。反応液を氷水200mlに注ぎ込み、ジエチルエーテル750mlで抽出し、分液後、再度ジエチルエーテル200mlで2回抽出した。有機相を硫酸ナトリウムで乾燥し、減圧下、溶媒を留去後、シリカゲルクロマトグラフィー(クロロホルム:メタノール=5:1)で精製し、化合物(10a:2ccPAのプロトン型)367.6mgを収率15%で得た。 2.51 g of cyclic phosphonate compound (9a) synthesized in Comparative Example 3 was dissolved in 303 ml of dichloromethane, cooled to -15°C, 2.31 ml of bromotrimethylsilane was added, and the mixture was stirred at -15°C for 4.5 hours. did. The reaction solution was poured into 200 ml of ice water, extracted with 750 ml of diethyl ether, separated, and again extracted with 200 ml of diethyl ether twice. The organic phase was dried over sodium sulfate, the solvent was distilled off under reduced pressure, and the residue was purified by silica gel chromatography (chloroform:methanol=5:1) to obtain 367.6 mg of a compound (proton type of 10a:2ccPA) in a yield of 15 Obtained in %.

比較例5:(9−オクタデセン酸−2−メトキシ−2−オキソ−2λComparative Example 5: (9-octadecenoic acid-2-methoxy-2-oxo-2λ 5 −[1,2]オキサホスホラン−4−イル)メチルエステルナトリウム塩の合成Synthesis of -[1,2]oxaphosphoran-4-yl)methyl ester sodium salt

Figure 2020109131
Figure 2020109131

比較例4で得られた化合物(10a)418.6mgをジエチルエーテル30mlに溶解させ、0.05Mの水酸化ナトリウム水溶液20mlを加えて、撹拌後、分液した。水相を凍結乾燥することで、2ccPA(1)250.8mgを収率57%で得た(純度67.934%)。 418.6 mg of the compound (10a) obtained in Comparative Example 4 was dissolved in 30 ml of diethyl ether, 20 ml of a 0.05 M aqueous sodium hydroxide solution was added, and the mixture was stirred and then separated. By freeze-drying the aqueous phase, 250.8 mg of 2ccPA(1) was obtained with a yield of 57% (purity 67.934%).

試験例1:35℃安定性試験
実施例3で得られた2ccPAの結晶(本発明)、比較例5で得られた2ccPA(文献処方)及び2ccPAのアモルファスをそれぞれ35℃で1ヶ月間保存して、安定性試験を実施した。結果を下記表1に示す。
Test Example 1: 35° C. Stability Test 2 ccPA crystals obtained in Example 3 (invention), 2 ccPA obtained in Comparative Example 5 (reference formulation) and 2 ccPA amorphous were stored at 35° C. for 1 month, respectively. The stability test was carried out. The results are shown in Table 1 below.

上記2ccPAのアモルファスは、実施例3で得られた2ccPA 300mgを水5mlに溶解させ、凍結乾燥したものを使用した。 As the amorphous of 2 ccPA, 300 mg of 2 ccPA obtained in Example 3 was dissolved in 5 ml of water and freeze-dried.

安定性試験は、本発明の2ccPAの結晶、文献処方及び2ccPAのアモルファスをそれぞれ約15mg秤量し、5mlのアセトニトリル/水(1/1)で希釈し、その希釈液5μlを1週間ごとに島津製作所LC-2010CHTで分析した。 The stability test was carried out by weighing about 15 mg each of the crystals of 2 ccPA of the present invention, the literature formulation and amorphous of 2 ccPA, diluting with 5 ml of acetonitrile/water (1/1), and diluting 5 μl of the diluted solution every 1 week by Shimadzu Corporation. It was analyzed by LC-2010 CHT.

Figure 2020109131
Figure 2020109131

上記表1の結果のとおり、比較例1〜5の文献処方で製造した2ccPAは、純度が悪く、不安定であり、2ccPAのアモルファスは、純度がよいが、1週間ごとに分解が進み、不安定であった。 As shown in the results of Table 1 above, 2 ccPA produced by the literature formulations of Comparative Examples 1 to 5 had poor purity and was unstable, and the amorphous form of 2 ccPA had good purity, but decomposition proceeded every week, and It was stable.

一方、本発明の製造方法で得られた2ccPAの結晶は、高純度であり、かつ、安定な結晶であった。56日後でも99.493%の純度を維持し、従来の製造方法で得られた2ccPAに比べて、優れた保存安定性を有していた。 On the other hand, the crystals of 2ccPA obtained by the production method of the present invention were highly pure and stable. Even after 56 days, the purity of 99.493% was maintained, and the storage stability was superior to that of 2ccPA obtained by the conventional production method.

Claims (8)

式(1)
Figure 2020109131
で表される環状ホスホン酸ナトリウム塩(2ccPA)の結晶。
Formula (1)
Figure 2020109131
A crystal of cyclic phosphonic acid sodium salt (2 ccPA) represented by:
X線粉末回折スペクトルにおいて、2θで表される回折角度として、15゜〜17゜の位置に特徴的なピークを有する、請求項1に記載の結晶。 The crystal according to claim 1, which has a characteristic peak at a position of 15° to 17° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum. X線粉末回折スペクトルにおいて、2θで表される回折角度として、9゜〜10゜の位置に特徴的なピークを有する、請求項1又は2に記載の結晶。 The crystal according to claim 1, which has a characteristic peak at a position of 9° to 10° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum. X線粉末回折スペクトルにおいて、2θで表される回折角度として、3゜〜5゜の位置に特徴的なピークを有する、請求項1〜3のいずれか一項に記載の結晶。 The crystal according to any one of claims 1 to 3, which has a characteristic peak at a position of 3° to 5° as a diffraction angle represented by 2θ in an X-ray powder diffraction spectrum. モノクロメーターを通したλ=1.54059Å の銅放射線で得られるX線粉末回折スペクトルにおいて、d(格子面間隔)15.7684〜16.1724に最大強度を有する、請求項1に記載の結晶。 The crystal according to claim 1, which has a maximum intensity at d (lattice plane interval) of 15.7684 to 16.1724 in an X-ray powder diffraction spectrum obtained by copper radiation of λ=1.54059Å through a monochromator. モノクロメーターを通したλ=1.54059Å の銅放射線で得られるX線粉末回折スペクトルにおいて、d(格子面間隔)15.7684〜16.1724に特徴的なピークを有する、請求項1に記載の結晶。 The X-ray powder diffraction spectrum obtained with copper radiation of λ=1.54059Å through a monochromator, having a characteristic peak at d (lattice plane spacing) of 15.7684 to 16.1724. crystal. モノクロメーターを通したλ=1.54059Å の銅放射線で得られるX線粉末回折スペクトルにおいて、下記d(格子面間隔)にピークを有する、請求項1に記載の結晶。
d(格子面間隔)
15.7684 〜 16.1724
9.5425 〜 9.6675
4.9024 〜 4.9403
4.7869 〜 4.8335
4.4802 〜 4.5164
4.1641 〜 4.2070
3.7263 〜 3.8145
The crystal according to claim 1, which has a peak at d (lattice plane interval) below in an X-ray powder diffraction spectrum obtained by copper radiation of λ=1.54059Å through a monochromator.
d (lattice spacing)
15.7684 to 16.1724
9.5425-9.6675
4.9024 to 4.9403
4.7869-4.8335
4.4802-4.5164
4.1641 to 4.2070
3.7263 to 3.8145
モノクロメーターを通したλ=1.54059Å の銅放射線で得られるX線粉末回折スペクトルにおいて、d(格子面間隔)が、下記(a)〜(y)の要件のいずれかを満たす、請求項1に記載の結晶。
(a) d(格子面間隔)
16.1724
9.6675
4.9186
4.8335
4.5164
4.1835
3.7921

(b) d(格子面間隔)
15.9390
9.5838
4.9294
4.7972
4.4982
4.1913
3.7953

(c) d(格子面間隔)
15.8817
9.5631
4.9186
4.7869
4.4937
4.1835
3.7794

(d) d(格子面間隔)
15.8817
9.5631
4.9294
4.7920
4.4982
4.1874
3.8017

(e) d(格子面間隔)
15.8817
9.5631
4.9186
4.7869
4.4937
4.1874
3.7921

(f) d(格子面間隔)
15.8248
9.5425
4.9078
4.7920
4.4937
4.1796
3.7762

(g) d(格子面間隔)
16.0548
9.6046
4.9294
4.8075
4.5073
4.2070
3.7857

(h) d(格子面間隔)
15.9967
9.6046
4.9349
4.8023
4.5073
4.1913
3.8017

(i) d(格子面間隔)
15.8817
9.5631
4.9294
4.7920
4.4982
4.1913
3.8017

(j) d(格子面間隔)
15.9967
9.6046
4.9024
4.8075
4.5027
4.1835
3.7636

(k) d(格子面間隔)
16.0548
9.6255
4.9403
4.8023
4.5073
4.1992
3.7985

(l) d(格子面間隔)
16.0548
9.6255
4.9349
4.8075
4.5073
4.1952
3.7857

(m) d(格子面間隔)
15.9390
9.5631
4.9186
4.7972
4.4982
4.1874
3.7953

(n) d(格子面間隔)
15.939
9.5838
4.9132
4.7920
4.4937
4.1874
3.7762

(o) d(格子面間隔)
15.9967
9.6046
4.9024
4.8075
4.4982
4.1719
3.7293

(p) d(格子面間隔)
16.0548
9.6255
4.9349
4.8075
4.5073
4.1992
3.8145

(q) d(格子面間隔)
15.7684
9.5425
4.8282
4.4802
4.1757
3.7263

(r) d(格子面間隔)
15.9390
9.5838
4.9132
4.8023
4.4937
4.1641
3.7730

(s) d(格子面間隔)
15.9390
9.5838
4.9186
4.7920
4.4937
4.1835
3.7921

(t) d(格子面間隔)
15.9390
9.5838
4.9240
4.7920
4.4982
4.1874
3.7921

(u) d(格子面間隔)
16.0548
9.6255
4.9186
4.7920
4.4982
4.1835
3.7985

(v) d(格子面間隔)
16.0548
9.6255
4.9294
4.7972
4.5073
4.1874
3.7985

(w) d(格子面間隔)
16.0548
9.6255
4.9186
4.8075
4.4982
4.1835
3.8049

(x) d(格子面間隔)
15.9967
9.6046
4.9240
4.8023
4.4982
4.1874
3.7985

(y) d(格子面間隔)
15.9390
9.5838
4.9186
4.7869
4.4937
4.1796
3.7985
In the X-ray powder diffraction spectrum obtained by the copper radiation of λ=1.54059Å through a monochromator, d (lattice plane spacing) satisfies any of the following requirements (a) to (y): The crystal according to.
(A) d (lattice plane spacing)
16.1724
9.6675
4.9186
4.8335
4.5164
4.1835
3.7921

(B) d (lattice spacing)
15.9390
9.5838
4.9294
4.7972
4.4982
4.1913
3.7953

(C) d (lattice plane spacing)
15.8817
9.5631
4.9186
4.7869
4.4937
4.1835
3.7794

(D) d (lattice spacing)
15.8817
9.5631
4.9294
4.7920
4.4982
4.1874
3.8017

(E) d (lattice plane spacing)
15.8817
9.5631
4.9186
4.7869
4.4937
4.1874
3.7921

(F) d (lattice plane spacing)
15.8248
9.5425
4.9078
4.7920
4.4937
4.1796
3.7762

(G) d (lattice spacing)
16.0548
9.6046
4.9294
4.8075
4.5073
4.2070
3.7857

(H) d (lattice plane spacing)
15.9967
9.6046
4.9349
4.8023
4.5073
4.1913
3.8017

(I) d (lattice plane spacing)
15.8817
9.5631
4.9294
4.7920
4.4982
4.1913
3.8017

(J) d (lattice plane spacing)
15.9967
9.6046
4.9024
4.8075
4.5027
4.1835
3.7636

(K) d (lattice spacing)
16.0548
9.6255
4.9403
4.8023
4.5073
4.1992
3.7985

(L) d (grating plane spacing)
16.0548
9.6255
4.9349
4.8075
4.5073
4.1952
3.7857

(M) d (lattice spacing)
15.9390
9.5631
4.9186
4.7972
4.4982
4.1874
3.7953

(N) d (lattice plane spacing)
15.939
9.5838
4.9132
4.7920
4.4937
4.1874
3.7762

(O) d (lattice plane spacing)
15.9967
9.6046
4.9024
4.8075
4.4982
4.1719
3.7293

(P) d (lattice spacing)
16.0548
9.6255
4.9349
4.8075
4.5073
4.1992
3.8145

(Q) d (lattice plane spacing)
15.7684
9.5425
4.828
4.4802
4.1757
3.7263

(R) d (lattice plane spacing)
15.9390
9.5838
4.9132
4.8023
4.4937
4.1641
3.7730

(S) d (lattice plane spacing)
15.9390
9.5838
4.9186
4.7920
4.4937
4.1835
3.7921

(T) d (lattice plane spacing)
15.9390
9.5838
4.9240
4.7920
4.4982
4.1874
3.7921

(U) d (lattice spacing)
16.0548
9.6255
4.9186
4.7920
4.4982
4.1835
3.7985

(V) d (lattice plane spacing)
16.0548
9.6255
4.9294
4.7972
4.5073
4.1874
3.7985

(W) d (grating spacing)
16.0548
9.6255
4.9186
4.8075
4.4982
4.1835
3.8049

(X) d (lattice plane spacing)
15.9967
9.6046
4.9240
4.8023
4.4982
4.1874
3.7985

(Y) d (lattice plane spacing)
15.9390
9.5838
4.9186
4.7869
4.4937
4.1796
3.7985
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