JP2020086318A - Photosensitive resin composition, production method of patterned cured film, and patterned cured film - Google Patents

Abstract

To provide a photosensitive resin composition, from which a patterned cured film can be formed that can suppress a non-patterned portion from being liquid-repellent, a production method of the patterned cured film using the photosensitive resin composition, a patterned cured film made of a cured product of the photosensitive resin composition, a bank made of a cured film of the photosensitive resin composition, a substrate with a bank having the above bank for manufacturing an optical element, an optical element including the substrate with a bank, a display device including the optical element, a method for forming a bank using the photosensitive resin composition, and a method for manufacturing an optical element.SOLUTION: The photosensitive resin composition comprises an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a fluorine-based resin (D), in which an oxime ester compound having a predetermined structure including an N-aromatic group substituted carbazole skeleton is used as the photopolymerization initiator (C).SELECTED DRAWING: None

Description

The present invention relates to a photosensitive resin composition, a method for producing a patterned cured film, and a patterned cured film. Further, the present invention is a bank formed of a cured film of the above-mentioned photosensitive resin composition, a substrate with a bank for manufacturing an optical element including the bank, an optical element including the substrate with a bank, a display device including the optical element, The present invention relates to a method for forming a bank using the above-mentioned photosensitive resin composition and a method for manufacturing an optical element.

BACKGROUND ART Conventionally, an organic EL display element, an optical element such as a color filter, an organic TFT array, etc., has various functional layers formed in a region surrounded by a bank after forming a bank (partition wall) surrounding a pixel on a substrate. Are manufactured by stacking. As a method of easily forming such a bank, a method of forming a bank by a photolithography method using a photosensitive resin composition is known (Patent Document 1).

Further, as a method of laminating various functional layers in the area surrounded by the bank, a method of preparing an ink containing a material forming the functional layer and injecting the prepared ink into the area surrounded by the bank It has been known. In this method, an inkjet method is often used because it is easy to accurately inject a predetermined amount of ink into a predetermined location.

Further, when pixels are formed using ink, ink repellency is imparted to the banks for the purpose of preventing ink from adhering to the banks and preventing ink injected between adjacent pixels from being mixed. Is required. As a method of imparting ink repellency to a bank, for example, a method of incorporating a fluororesin into the bank is known (Patent Document 2).

JP, 2010-262940, A International Publication No. 2008-149498

However, as a result of studies by the present inventors, when a fluororesin is added to a photosensitive resin composition used for forming a bank for the purpose of imparting ink repellency to the formed bank, the photosensitive resin composition It was confirmed that in a substrate provided with a patterned cured film formed by using a material, liquid repellency may be exhibited even in a non-patterned portion which is not covered with the photosensitive resin composition.
When this patterned cured film is used as a bank in the above optical element, when the liquid repellency is exhibited in the non-patterned portion as described above, the ink for forming pixels is surrounded by the bank. There is a problem that it is not possible to inject a sufficient amount of ink into the area surrounded by the banks by being repelled inside.

Such a problem is remarkable when the ink is injected into the area surrounded by the banks by the inkjet method. In the inkjet method, ink is ejected as droplets from the inkjet head into the area surrounded by the banks. However, if the area surrounded by the banks has ink repellency, the droplets are easily surrounded by the banks. It is because it is played outside the area.

The present invention has been made in view of the above problems, and a photosensitive resin composition capable of forming a patterned cured film capable of suppressing liquid repellency in a non-patterned portion, and a pattern using the photosensitive resin composition. Method for producing a cured cured film, a patterned cured film made of a cured product of the photosensitive resin composition described above, a bank made of a cured film of the photosensitive resin composition described above, and an optical device including the bank A substrate with a bank for manufacturing an element, an optical element including the substrate with a bank, a display device including the optical element, a method for forming a bank using the photosensitive resin composition described above, and a method for manufacturing an optical element. The purpose is to provide.

The present inventors have developed a photosensitive resin composition containing an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a fluororesin (D), in which N- It has been found that the above problems can be solved by using an oxime ester compound having a predetermined structure containing an aromatic group-substituted carbazole skeleton as the photopolymerization initiator (C), and completed the present invention. More specifically, the present invention provides the following.

（式（Ｃ１）中、Ｘ^０１は、下記式（Ｃ１−１）：

で表される構造において、芳香族環上に結合する水素原子のうち、ｔ２＋ｔ３個の水素原子を除いた基であり、Ｘ^０２及びＸ^０３は、それぞれ独立に１価の有機基であり、Ｘ^０４及びＸ^０５は、それぞれ独立に水素原子、置換基を有してもよい炭素原子数１以上１１以下のアルキル基、又は置換基を有してもよいアリール基であり、ｔ０〜ｔ３は、それぞれ独立に、０又は１であり、ｔ２及びｔ３の少なくとも一方は１であり、
式（Ｃ１−１）中、Ｘ^０６は、カルバゾール環中の窒素原子にＣ−Ｎ結合で結合する１価の置換基を有してもよい芳香族基であり、Ｘ^０７及びＸ^０８は、それぞれ独立に、ニトロ基、置換基を有してもよいアロイル基、又は置換基を有してもよいヘテロアロイル基であり、ｔ４及びｔ５は、それぞれ独立に０又は１である。）
で表される光重合開始剤（Ｃ−Ｉ）を含む、感光性樹脂組成物である。 A first aspect of the present invention is a photosensitive resin composition containing an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a fluororesin (D). And the photopolymerization initiator (C) has the following formula (C1):

(In formula (C1), X ⁰¹ is the following formula (C1-1):

In the structure represented by, a hydrogen atom bonded to the aromatic ring, excluding t2+t3 hydrogen atoms, X ⁰² and X ⁰³ are each independently a monovalent organic group, ⁰⁴ and X ⁰⁵ are each independently a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent, and t0 to t3 are Each independently, 0 or 1, at least one of t2 and t3 is 1,
In formula (C1-1), X ⁰⁶ is an aromatic group which may have a monovalent substituent bonded to the nitrogen atom in the carbazole ring by a C—N bond, and X ⁰⁷ and X ⁰⁸ are They are each independently a nitro group, an aroyl group which may have a substituent, or a heteroaroyl group which may have a substituent, and t4 and t5 are each independently 0 or 1. )
It is a photosensitive resin composition containing the photoinitiator (CI) represented by.

A second aspect of the present invention is to form a coating film by applying the photosensitive resin composition according to the first aspect onto a substrate,
Exposing the coating film,
The coating film is patterned, or
This is a method for producing a patterned cured film, in which the coating film is subjected to position-selective exposure, and then the exposed coating film is developed.

A third aspect of the present invention is a patterned cured film made of a cured product of the photosensitive resin composition according to the first aspect.

A fourth aspect of the present invention is a bank made of a cured product of the photosensitive resin composition according to the first aspect used for forming a bank.

A fifth aspect of the present invention is a substrate with a bank for manufacturing an optical element, which includes the bank according to the fourth aspect.

A sixth aspect of the present invention is an optical element including the banked substrate for manufacturing an optical element according to the fifth aspect.

A seventh aspect of the present invention is a display device including the optical element according to the sixth aspect.

An eighth aspect of the present invention is to form a coating film by applying the photosensitive resin composition according to the first aspect used for bank formation onto a substrate,
Exposing the coating film,
The coating film is patterned, or
This is a method of forming a bank in which the coating film is subjected to position-selective exposure, and then the exposed coating film is developed.

A ninth aspect of the present invention is a method for manufacturing an optical element, which comprises injecting ink into a region surrounded by banks formed on a substrate by the method according to the eighth aspect to form pixels. is there.

According to the present invention, a photosensitive resin composition capable of forming a patterned cured film capable of suppressing liquid repellency in a non-patterned portion, and a method for producing a patterned cured film using the photosensitive resin composition, A patterned cured film made of a cured product of the photosensitive resin composition described above, a bank made of a cured film of the photosensitive resin composition described above, a substrate with a bank for manufacturing an optical element including the bank, It is possible to provide an optical element including a substrate with a bank, a display device including the optical element, a method for forming a bank using the photosensitive resin composition described above, and a method for manufacturing the optical element.

<<Photosensitive resin composition>>
A photosensitive resin composition containing an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a fluororesin (D). The photopolymerization initiator (C) contains an oxime ester compound represented by the following formula (C1) as the photopolymerization initiator (CI).

In the formula (C1), X ⁰¹ is a group obtained by removing t2+t3 hydrogen atoms from the hydrogen atoms bonded to the aromatic ring in the structure represented by the following formula (C1-1). X ⁰² and X ⁰³ are each independently a monovalent organic group. X ⁰⁴ and X ⁰⁵ are each independently a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent. t0 to t3 are 0 or 1 independently of each other. At least one of t2 and t3 is 1.

式（Ｃ１−１）中、Ｘ^０６は、カルバゾール環中の窒素原子にＣ−Ｎ結合で結合する１価の置換基を有してもよい芳香族基である。Ｘ^０７及びＸ^０８は、それぞれ独立に、ニトロ基、置換基を有してもよいアロイル基、又は置換基を有してもよいヘテロアロイル基である。ｔ４及びｔ５は、それぞれ独立に０又は１である。

In formula (C1-1), X ⁰⁶ is an aromatic group which may have a monovalent substituent bonded to the nitrogen atom in the carbazole ring by a C—N bond. X ⁰⁷ and X ⁰⁸ are each independently a nitro group, an aroyl group which may have a substituent, or a heteroaroyl group which may have a substituent. t4 and t5 are 0 or 1 each independently.

The photosensitive resin composition contains, in combination with the alkali-soluble resin (A) and the photopolymerizable monomer (B), a fluorine-based resin (D) and a photopolymerization initiator (C-I). The composition can be used to form a patterned cured film that can suppress lyophobicity in the non-patterned portion.
Such a patterned cured film is suitably used for forming a bank that partitions pixels in a color filter, an organic EL display element, a quantum dot display, an organic TFT array, or the like. Since the liquid repellency in the area surrounded by the bank is suppressed, when the ink for forming a pixel is injected into the area surrounded by the bank, the ink injection failure that repels the ink is less likely to occur. is there.

Further, when the above photosensitive resin composition is used, when a bank is formed by a photolithography method including position-selective exposure and development, ink for forming pixels is prevented from invading adjacent pixel regions. It is easy to achieve both a sufficient function as a partition wall and a desirable light transmittance.

Hereinafter, the essential or optional components contained in the photosensitive resin composition and the method for producing the photosensitive resin composition will be described in order.

<Alkali-soluble resin (A)>
The photosensitive resin composition contains an alkali-soluble resin (A). The alkali-soluble resin (A) is not particularly limited and can be appropriately selected from the alkali-soluble resins that have been conventionally blended in various photosensitive resin compositions.
Here, in the present specification, the alkali-soluble resin (A) refers to a resin having a functional group (for example, a phenolic hydroxyl group, a carboxy group, a sulfonic acid group, etc.) that imparts alkali solubility in the molecule.

Examples of the resin suitable as the alkali-soluble resin (A) include a resin (a-1) having a cardo structure (hereinafter, also referred to as “cardo resin (a-1)”).
When the resin (a-1) having a cardo structure is used as the alkali-soluble resin, it is easy to obtain a photosensitive resin composition having excellent resolution, and a cured film that hardly flows when heated by using the photosensitive resin composition is formed. Easy to form. Therefore, it is easy to form a cured film having a good shape.

[Resin (a-1) having a cardo structure]
As the resin (a-1) having a cardo skeleton, a resin having a cardo skeleton in its structure and having a predetermined alkali solubility can be used. The cardo skeleton refers to a skeleton in which a second ring structure and a third ring structure are bonded to one ring carbon atom forming the first ring structure. The second annular structure and the third annular structure may have the same structure or different structures.
A representative example of the cardo skeleton is a skeleton in which two aromatic rings (for example, a benzene ring) are bonded to the carbon atom at the 9-position of the fluorene ring.

The cardo resin (a-1) is not particularly limited, and a conventionally known resin can be used. Among them, the resin represented by the following formula (a-1) is preferable.

In the formula (a-1), X ^a represents a group represented by the following formula (a-2). m1 represents an integer of 0 or more and 20 or less.

In the formula (a-2), R ^a1 independently represents a hydrogen atom, a hydrocarbon group having 1 to 6 carbon atoms, or a halogen atom, and R ^a2 independently represents a hydrogen atom or a methyl group. R ^a3 independently represents a linear or branched alkylene group, m 2 represents 0 or 1, and W ^a represents a group represented by the following formula (a-3).

In formula (a-2), R ^a3 is preferably an alkylene group having 1 to 20 carbon atoms, more preferably an alkylene group having 1 to 10 carbon atoms, and an alkylene group having 1 to 6 carbon atoms. Is particularly preferable, and an ethane-1,2-diyl group, a propane-1,2-diyl group, and a propane-1,3-diyl group are the most preferable.

Ring A in formula (a-3) represents an aliphatic ring which may be condensed with an aromatic ring and may have a substituent. The aliphatic ring may be an aliphatic hydrocarbon ring or an aliphatic heterocycle.
Examples of the aliphatic ring include monocycloalkane, bicycloalkane, tricycloalkane, tetracycloalkane and the like.
Specific examples thereof include monocycloalkanes such as cyclopentane, cyclohexane, cycloheptane and cyclooctane, adamantane, norbornane, isobornane, tricyclodecane and tetracyclododecane.
The aromatic ring which may be condensed with the aliphatic ring may be an aromatic hydrocarbon ring or an aromatic heterocycle, and is preferably an aromatic hydrocarbon ring. Specifically, a benzene ring and a naphthalene ring are preferable.

The following groups are mentioned as a suitable example of the divalent group represented by Formula (a-3).

The divalent group X ^a in the formula (a-1) is a cardo group by reacting a tetracarboxylic acid dianhydride giving ^a residue Z ^a with a diol compound represented by the following formula (a-2a). It is introduced into the resin (a-1).

In formula (a-2a), R ^a1 , R ^a2 , R ^a3 , and m2 are as described for formula (a-2). The ring A in formula (a-2a) is as described for formula (a-3).

The diol compound represented by the formula (a-2a) can be produced, for example, by the following method.
First, after replacing the hydrogen atom in the phenolic hydroxyl group of the diol compound represented by the following formula (a-2b) with a group represented by -R ^a3 -OH, if necessary, according to a conventional method, Glycidylation is performed using epichlorohydrin or the like to obtain an epoxy compound represented by the following formula (a-2c).
Then, the epoxy compound represented by the formula (a-2c) is reacted with acrylic acid or methacrylic acid to obtain the diol compound represented by the formula (a-2a).
In formula (a-2b) and formula (a-2c), R ^a1 , R ^a3 , and m2 are as described for formula (a-2). The ring A in formulas (a-2b) and (a-2c) is as described for formula (a-3).
The method for producing the diol compound represented by formula (a-2a) is not limited to the above method.

Suitable examples of the diol compound represented by the formula (a-2b) include the following diol compounds.

In the formula (a-1), R ^a0 is a hydrogen atom or a group represented by —CO—Y ^a —COOH. Here, Y ^a represents a residue obtained by removing an acid anhydride group (—CO—O—CO—) from a dicarboxylic acid anhydride. Examples of dicarboxylic acid anhydrides include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylendomethylenetetrahydrophthalic anhydride, chlorendic anhydride, methyltetrahydro. Examples thereof include phthalic anhydride and glutaric anhydride.

In the formula (a-1), Z ^a represents a residue obtained by removing two acid anhydride groups from tetracarboxylic dianhydride. Examples of the tetracarboxylic dianhydride include a tetracarboxylic dianhydride represented by the following formula (a-4), pyromellitic dianhydride, benzophenonetetracarboxylic dianhydride, and biphenyltetracarboxylic dianhydride. And biphenyl ether tetracarboxylic acid dianhydride.
In addition, in the above formula (a-1), m represents an integer of 0 or more and 20 or less.

（式（ａ−４）中、Ｒ^ａ４、Ｒ^ａ５、及びＲ^ａ６は、それぞれ独立に、水素原子、炭素原子数１以上１０以下のアルキル基及びフッ素原子からなる群より選択される１種を示し、ｍ３は、０以上１２以下の整数を示す。）

(In formula (a-4), R ^a4 , R ^a5 , and R ^a6 each independently represent one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 10 carbon atoms and a fluorine atom. , M3 represents an integer of 0 or more and 12 or less.)

The alkyl group that can be selected as R ^{a4 in} formula (a-4) is an alkyl group having 1 to 10 carbon atoms. By setting the number of carbon atoms included in the alkyl group within this range, the heat resistance of the obtained carboxylic acid ester can be further improved. When R ^a4 is an alkyl group, the number of carbon atoms is preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less, still more preferably 1 or more and 4 or less, from the viewpoint of easily obtaining a cardo resin having excellent heat resistance. It is particularly preferably 1 or more and 3 or less.
When R ^a4 is an alkyl group, the alkyl group may be linear or branched.

As R ^a4 in the formula (a-4), a hydrogen atom or an alkyl group having 1 to 10 carbon atoms is more preferably each independently from the viewpoint of easily obtaining a cardo resin having excellent heat resistance. R ^{a4 in} formula (a-4) is more preferably a hydrogen atom, a methyl group, an ethyl group, an n-propyl group or an isopropyl group, and particularly preferably a hydrogen atom or a methyl group.
It is preferable that the plurality of R ^a4 in the formula (a-4) are the same group because the preparation of high-purity tetracarboxylic dianhydride is easy.

M3 in Formula (a-4) shows the integer of 0-12. By setting the value of m3 to 12 or less, the purification of the tetracarboxylic dianhydride can be facilitated.
From the viewpoint of easy purification of the tetracarboxylic dianhydride, the upper limit of m3 is preferably 5, and more preferably 3.
From the viewpoint of the chemical stability of tetracarboxylic dianhydride, the lower limit of m3 is preferably 1, and more preferably 2.
2 or 3 is particularly preferable for m3 in the formula (a-4).

The alkyl group having 1 to 10 carbon atoms which can be selected as R ^a5 and R ^a6 in the formula (a-4) is the same as the alkyl group having 1 to 10 carbon atoms which can be selected as R ^a4. ..
R ^a5 and R ^a6 are each a hydrogen atom or a carbon atom number of 1 or more and 10 or less (preferably 1 or more and 6 or less, more preferably 1 or more and 5 or less), because purification of the tetracarboxylic dianhydride is easy. It is more preferably 1 or more and 4 or less, particularly preferably 1 or more and 3 or less), and particularly preferably a hydrogen atom or a methyl group.

Examples of the tetracarboxylic acid dianhydride represented by the formula (a-4) include, for example, norbornane-2-spiro-α-cyclopentanone-α′-spiro-2″-norbornane-5,5″, 6,6"-tetracarboxylic dianhydride (also known as "norbornane-2-spiro-2'-cyclopentanone-5'-spiro-2"-norbornane-5,5",6,6" -Tetracarboxylic dianhydride"), methylnorbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-(methylnorbornane)-5,5'',6,6''-tetra Carboxylic dianhydride, norbornane-2-spiro-α-cyclohexanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride (also known as "norbornane- 2-spiro-2′-cyclohexanone-6′-spiro-2″-norbornane-5,5″,6,6″-tetracarboxylic dianhydride”), methylnorbornane-2-spiro-α- Cyclohexanone-α'-spiro-2''-(methylnorbornane)-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclopropanone-α'- Spiro-2″-norbornane-5,5″,6,6″-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclobutanone-α′-spiro-2″-norbornane-5, 5″,6,6″-tetracarboxylic dianhydride, norbornane-2-spiro-α-cycloheptanone-α′-spiro-2″-norbornane-5,5″,6,6′ '-Tetracarboxylic acid dianhydride, norbornane-2-spiro-α-cyclooctanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride , Norbornane-2-spiro-α-cyclononanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclodecanone -Α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cycloundecanone-α'-spiro-2' '-Norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclododecanone-α'-spiro-2''-norbornane-5,5' ',6,6''-Tetracarboxylic dianhydride, norbol Nan-2-spiro-α-cyclotridecanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α- Cyclotetradecanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-cyclopentadecanone-α' -Spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-(methylcyclopentanone)-α'-spiro-2' '-Norbornane-5,5'',6,6''-tetracarboxylic dianhydride, norbornane-2-spiro-α-(methylcyclohexanone)-α'-spiro-2''-norbornane-5,5 ″,6,6″-Tetracarboxylic acid dianhydride and the like can be mentioned.

The cardo resin (a-1) has a weight average molecular weight of preferably 1,000 or more and 40,000 or less, more preferably 1,500 or more and 30,000 or less, and further preferably 2,000 or more and 10,000 or less. Within the above range, sufficient heat resistance and mechanical strength can be obtained for the cured film formed using the photosensitive resin composition while obtaining good developability.

[Novolak resin (a-2)]
It is also preferable that the alkali-soluble resin (A) contains the novolac resin (a-2) from the viewpoint of easily forming a cured film that does not flow excessively by heating.
As the novolac resin (a-2), various novolac resins conventionally blended in the photosensitive resin composition can be used. As the novolac resin (a-2), those obtained by addition-condensing an aromatic compound having a phenolic hydroxyl group (hereinafter, simply referred to as “phenols”) and an aldehyde with an acid catalyst are preferable.

(Phenols)
Examples of the phenols used when producing the novolac resin (a-2) include phenol; cresols such as o-cresol, m-cresol, and p-cresol; 2,3-xylenol, 2,4-xylenol. , 2,5-xylenol, 2,6-xylenol, 3,4-xylenol, 3,5-xylenol and other xylenols; o-ethylphenol, m-ethylphenol, p-ethylphenol and other ethylphenols; 2 -Alkylphenols such as isopropylphenol, 3-isopropylphenol, 4-isopropylphenol, o-butylphenol, m-butylphenol, p-butylphenol, and p-tert-butylphenol; 2,3,5-trimethylphenol, and 3,4 , Trialkylphenols such as 5-trimethylphenol; polyhydric phenols such as resorcinol, catechol, hydroquinone, hydroquinone monomethyl ether, pyrogallol, and phloroglysinol; alkyl polyhydric phenols such as alkylresorcinol, alkylcatechol, and alkylhydroquinone (Each alkyl group has 1 to 4 carbon atoms.); α-naphthol; β-naphthol; hydroxydiphenyl; and bisphenol A. These phenols may be used alone or in combination of two or more.

Among these phenols, m-cresol and p-cresol are preferable, and it is more preferable to use m-cresol and p-cresol together. In this case, various properties such as heat resistance of the cured film formed using the photosensitive resin composition can be adjusted by adjusting the mixing ratio of the both.
The mixing ratio of m-cresol and p-cresol is not particularly limited, but the molar ratio of m-cresol/p-cresol is preferably 3/7 or more and 8/2 or less. By using m-cresol and p-cresol in such a ratio, it is easy to obtain a photosensitive resin composition capable of forming a cured film having excellent heat resistance.

A novolac resin produced by using m-cresol and 2,3,5-trimethylphenol in combination is also preferable. When such a novolac resin is used, it is particularly easy to obtain a photosensitive resin composition capable of forming a cured film having excellent heat resistance.
The mixing ratio of m-cresol and 2,3,5-trimethylphenol is not particularly limited, but is 70/30 or more and 95/5 or less in terms of a molar ratio of m-cresol/2,3,5-trimethylphenol. Is preferred.

(Aldehydes)
Examples of aldehydes used in producing the novolac resin (a-2) include formaldehyde, paraformaldehyde, furfural, benzaldehyde, nitrobenzaldehyde, and acetaldehyde. These aldehydes may be used alone or in combination of two or more.

(Acid catalyst)
Examples of the acid catalyst used in producing the novolac resin (a-2) include inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, and phosphorous acid; formic acid, oxalic acid, acetic acid, diethylsulfuric acid, and Examples thereof include organic acids such as paratoluenesulfonic acid; and metal salts such as zinc acetate. These acid catalysts may be used alone or in combination of two or more kinds.

(Molecular weight)
The polystyrene-equivalent weight average molecular weight (Mw; hereinafter also simply referred to as "weight average molecular weight") of the novolac resin (a-2) is from the viewpoint of heat resistance of a cured film formed using the photosensitive resin composition. , The lower limit is preferably 2000, more preferably 5000, particularly preferably 10,000, further preferably 15,000, most preferably 20,000, and the upper limit is preferably 50,000, more preferably 45,000, further preferably 40,000, most preferably 35,000.

As the novolak resin (a-2), it is possible to use a combination of at least two resins having different polystyrene-equivalent weight average molecular weights. By using those having different weight average molecular weights in a combination of large and small, it is possible to balance the developability of the photosensitive resin composition with the heat resistance of the cured film formed using the photosensitive resin composition.

[Modified epoxy resin (a-3)]
The alkali-soluble resin (A) is a polybasic acid anhydride (a-3c) adduct (a-3) of a reaction product of an epoxy compound (a-3a) and an unsaturated group-containing carboxylic acid (a-3b). May be included. Such an adduct is also referred to as "modified epoxy resin (a-3)".
In addition, in the specification and claims of the present application, a compound which corresponds to the above definition and which does not correspond to the resin (a-1) having a cardo structure is referred to as a modified epoxy resin (a-3). ).

Hereinafter, the epoxy compound (a-3a), the unsaturated group-containing carboxylic acid (a-3b), and the polybasic acid anhydride (a-3c) will be described.

<Epoxy compound (a-3a)>
The epoxy compound (a-3a) is not particularly limited as long as it is a compound having an epoxy group, and may be an aromatic epoxy compound having an aromatic group or an aliphatic epoxy compound not containing an aromatic group. Well, an aromatic epoxy compound having an aromatic group is preferable.
The epoxy compound (a-3a) may be a monofunctional epoxy compound or a bifunctional or higher functional polyfunctional epoxy compound, and a polyfunctional epoxy compound is preferable.

Specific examples of the epoxy compound (a-3a) include bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bisphenol AD type epoxy resin, naphthalene type epoxy resin, and biphenyl type epoxy resin. Functional epoxy resin; glycidyl ester type epoxy resin such as dimer acid glycidyl ester and triglycidyl ester; tetraglycidyl aminodiphenylmethane, triglycidyl-p-aminophenol, tetraglycidyl metaxylylenediamine, tetraglycidyl bisaminomethylcyclohexane Glycidylamine type epoxy resin; Heterocyclic epoxy resin such as triglycidyl isocyanurate; Phlorogricinol triglycidyl ether, trihydroxybiphenyl triglycidyl ether, trihydroxyphenylmethane triglycidyl ether, glycerin triglycidyl ether, 2-[4- (2,3-Epoxypropoxy)phenyl]-2-[4-[1,1-bis[4-(2,3-epoxypropoxy)phenyl]ethyl]phenyl]propane, and 1,3-bis[4- [1-[4-(2,3-Epoxypropoxy)phenyl]-1-[4-[1-[4-(2,3-epoxypropoxy)phenyl]-1-methylethyl]phenyl]ethyl]phenoxy] 2-functional epoxy resins such as 2-propanol; tetrahydroxyphenylethane tetraglycidyl ether, tetraglycidyl benzophenone, bisresorcinol tetraglycidyl ether, and tetrafunctional epoxy resins such as tetraglycidoxy biphenyl.

Moreover, as the epoxy compound (a-3a), an epoxy compound having a biphenyl skeleton is preferable.
The epoxy compound having a biphenyl skeleton preferably has at least one biphenyl skeleton represented by the following formula (a-3a-1) in the main chain.
The epoxy compound having a biphenyl skeleton is preferably a polyfunctional epoxy compound having two or more epoxy groups.
By using an epoxy compound having a biphenyl skeleton, it is easy to obtain a resin composition which has an excellent balance between sensitivity and developability and which can form a cured film having excellent adhesion to a substrate.

（式（ａ−３ａ−１）中、Ｒ^ａ７は、それぞれ独立に、水素原子、炭素原子数１以上１２以下のアルキル基、ハロゲン原子、又は置換基を有してもよいフェニル基であり、ｊは１以上４以下の整数である。）

(In formula (a-3a-1), R ^a7 is each independently a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, a halogen atom, or a phenyl group which may have a substituent, j is an integer of 1 or more and 4 or less.)

When R ^a7 is an alkyl group having 1 to 12 carbon atoms, specific examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl. Group, tert-butyl group, n-pentyl group, isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert- Examples include octyl group, n-nonyl group, isononyl group, n-decyl group, isodecyl group, n-undecyl group, and n-dodecyl group.

When R ^a7 is a halogen atom, specific examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

When R ^a7 is a phenyl group which may have a substituent, the number of substituents on the phenyl group is not particularly limited. The number of substituents on the phenyl group is 0 or more and 5 or less, preferably 0 or 1.
Examples of the substituent include an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an aliphatic acyl group having 2 to 4 carbon atoms, a halogen atom, a cyano group, and a nitro group. Groups.

（式（ａ−３ａ−２）中、Ｒ^ａ７及びｊは、式（ａ−３ａ−１）と同様であり、ｋは括弧内の構成単位の平均繰り返し数であって０以上１０以下である。） The epoxy compound (a-3a) having a biphenyl skeleton represented by the above formula (a-3a-1) is not particularly limited, but examples thereof include an epoxy compound represented by the following formula (a-3a-2). be able to.

(In formula (a-3a-2), R ^a7 and j are the same as those in formula (a-3a-1), and k is the average number of repeating structural units in parentheses and is 0 or more and 10 or less. .)

（式（ａ−３ａ−３）中、ｋは、式（ａ−３ａ−２）と同様である。） Among the epoxy compounds represented by the formula (a-3a-2), it is particularly easy to obtain a photosensitive resin composition having a good balance between sensitivity and developability. Compounds are preferred.

(In the formula (a-3a-3), k is the same as the formula (a-3a-2).)

(Unsaturated group-containing carboxylic acid (a-3b))
In preparing the modified epoxy compound (a-3), the epoxy compound (a-3a) is reacted with the unsaturated group-containing carboxylic acid (a-3b).
As the unsaturated group-containing carboxylic acid (a-3b), a monocarboxylic acid having a reactive unsaturated double bond such as an acryl group or a methacryl group in the molecule is preferable. Examples of the unsaturated group-containing carboxylic acid include acrylic acid, methacrylic acid, β-styryl acrylic acid, β-furfuryl acrylic acid, α-cyanocinnamic acid, cinnamic acid and the like. In addition, the unsaturated group-containing carboxylic acid (a-3b) may be used alone or in combination of two or more kinds.

The epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) can be reacted by a known method. As a preferred reaction method, for example, an epoxy compound (a-3a) and an unsaturated group-containing carboxylic acid (a-3b), a tertiary amine such as triethylamine, benzylethylamine, dodecyltrimethylammonium chloride, tetramethylammonium chloride, The reaction is carried out in an organic solvent at a reaction temperature of 50° C. or higher and 150° C. or higher for several hours to several tens of hours using a quaternary ammonium salt such as tetraethylammonium chloride or benzyltriethylammonium chloride, pyridine or triphenylphosphine as a catalyst. There is a method.

The ratio of the amounts of both used in the reaction of the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) is such that the epoxy equivalent of the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid ( The ratio of a-3b) to the carboxylic acid equivalent is usually 1:0.5 to 1:2, preferably 1:0.8 to 1:1.25, more preferably 1:0.9 to 1:1. .1 is particularly preferred.
When the ratio of the amount of the epoxy compound (a-3a) used to the amount of the unsaturated group-containing carboxylic acid (a-3b) used is 1:0.5 to 1:2 in the above equivalent ratio, the crosslinking efficiency is Is preferred, which is preferable.

(Polybasic acid anhydride (a-3c))
The polybasic acid anhydride (a-3c) is a carboxylic acid anhydride having two or more carboxy groups.
The polybasic acid anhydride (a-3c) is not particularly limited, and examples thereof include maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, methylhexahydroanhydride. Phthalic acid, methyltetrahydrophthalic anhydride, trimellitic anhydride, pyromellitic anhydride, benzophenonetetracarboxylic dianhydride, 3-methylhexahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, 3-ethylhexa Hydrophthalic anhydride, 4-ethylhexahydrophthalic anhydride, tetrahydrophthalic anhydride, 3-methyltetrahydrophthalic anhydride, 4-methyltetrahydrophthalic anhydride, 3-ethyltetrahydrophthalic anhydride, 4-ethyltetrahydrophthalic anhydride , A compound represented by the following formula (a-3c-1), and a compound represented by the following formula (a-3c-2). The polybasic acid anhydrides (a-3c) may be used alone or in combination of two or more.

（式（ａ−３ｃ−２）中、Ｒ^ａ８は、炭素原子数１以上１０以下の置換基を有してもよいアルキレン基を示す。）

(In formula (a-3c-2), R ^a8 represents an alkylene group having 1 to 10 carbon atoms which may have a substituent.)

As the polybasic acid anhydride (a-3c), a compound having two or more benzene rings is preferable because it is easy to obtain a photosensitive resin composition having an excellent balance between sensitivity and developability. The polybasic acid anhydride (a-3c) contains at least one of the compound represented by the above formula (a-3c-1) and the compound represented by the above formula (a-3c-2). Is more preferable.

The method of reacting the epoxy compound (a-3a) with the unsaturated group-containing carboxylic acid (a-3b) and then the polybasic acid anhydride (a-3c) can be appropriately selected from known methods.
In addition, the usage ratio is such that the molar number of OH groups in the component after the reaction of the epoxy compound (a-3a) and the unsaturated group-containing carboxylic acid (a-3b) and the polybasic acid anhydride (a-3c). The equivalent ratio of the acid anhydride group of 1) is usually 1:1 to 1:0.1, preferably 1:0.8 to 1:0.2. Within the above range, it is easy to obtain a photosensitive resin composition having good developability.

The acid value of the modified epoxy resin (a-3) is preferably 10 mgKOH/g or more and 150 mgKOH/g or less, more preferably 70 mgKOH/g or more and 110 mgKOH/g or less in terms of resin solid content. When the acid value of the resin is 10 mgKOH/g or more, sufficient solubility in the developing solution can be obtained, and when the acid value is 150 mgKOH/g or less, sufficient curability can be obtained and surface property is improved. Can be good.

The weight average molecular weight of the modified epoxy resin (a-3) is preferably 1,000 or more and 40,000 or less, more preferably 2,000 or more and 30,000 or less. When the weight average molecular weight is 1000 or more, it is easy to form a cured film having excellent heat resistance and strength. Further, when it is 40,000 or less, it is easy to obtain a photosensitive resin composition exhibiting sufficient solubility in a developing solution.

[Acrylic resin (a-4)]
Acrylic resin (a-4) is also preferable as a component constituting the alkali-soluble resin (A).
As the acrylic resin (a-4), a resin containing a structural unit derived from (meth)acrylic acid and/or a structural unit derived from another monomer such as (meth)acrylic acid ester can be used. (Meth)acrylic acid is acrylic acid or methacrylic acid. The (meth)acrylic acid ester is represented by the following formula (a-4-1) and is not particularly limited as long as it does not impair the object of the present invention.

In the above formula (a-4-1), R ^a9 is a hydrogen atom or a methyl group, and R ^a10 is a monovalent organic group. This organic group may contain a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. The organic group may be linear, branched or cyclic.

The substituent other than the hydrocarbon group in the organic group of R ^a10 is not particularly limited as long as the effects of the present invention are not impaired, and a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, a cyanato group. , Isocyanato group, thiocyanato group, isothiocyanato group, silyl group, silanol group, alkoxy group, alkoxycarbonyl group, carbamoyl group, thiocarbamoyl group, nitro group, nitroso group, carboxy group, carboxylate group, acyl group, acyloxy group, sulfino Group, sulfo group, sulfonato group, phosphino group, phosphinyl group, phosphono group, phosphonato group, hydroxyimino group, alkyl ether group, alkyl thioether group, aryl ether group, aryl thioether group, amino group (-NH ₂ , -NHR, —NRR′: R and R′ each independently represent a hydrocarbon group) and the like. The hydrogen atom contained in the above substituent may be substituted with a hydrocarbon group. The hydrocarbon group contained in the above-mentioned substituent may be linear, branched or cyclic.

Moreover, the organic group as R ^a10 may have a reactive functional group such as an acryloyloxy group, a methacryloyloxy group, an epoxy group, or an oxetanyl group.
The acyl group having an unsaturated double bond or the like, such as an acryloyloxy group or a methacryloyloxy group, is, for example, at least a part of the epoxy group in the acrylic resin (a-4) containing a structural unit having an epoxy group, It can be produced by reacting an unsaturated carboxylic acid such as acrylic acid or methacrylic acid.
Further, by reacting a structural unit derived from an unsaturated carboxylic acid such as acrylic acid or methacrylic acid, which the acrylic resin (a-4) has, with a compound having an epoxy group and an unsaturated double bond. An unsaturated double bond can be introduced into the acrylic resin (a-4). As the compound having an epoxy group and an unsaturated double bond, for example, glycidyl (meth)acrylate or a compound represented by the formulas (a-4-1a) to (a-4-1o) described later is used. You can

R ^a10 is preferably an alkyl group, an aryl group, an aralkyl group or a heterocyclic group, and these groups may be substituted with a halogen atom, a hydroxyl group, an alkyl group or a heterocyclic group. When these groups include an alkylene moiety, the alkylene moiety may be interrupted by an ether bond, a thioether bond or an ester bond.

When the alkyl group is linear or branched, the number of carbon atoms is preferably 1 or more and 20 or less, more preferably 1 or more and 15 or less, and particularly preferably 1 or more and 10 or less. Examples of suitable alkyl groups include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, isopentyl group, sec. -Pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, isononyl group, n-decyl group, An isodecyl group etc. are mentioned.

When the alkyl group is an alicyclic group, or a group containing an alicyclic group, suitable alicyclic groups contained in the alkyl group include a cyclopentyl group, and a monocyclic alicyclic group such as a cyclohexyl group or Examples thereof include polycyclic alicyclic groups such as adamantyl group, norbornyl group, isobornyl group, tricyclononyl group, tricyclodecyl group, and tetracyclododecyl group.

Specific examples of the compound represented by the formula (a-4-1) when the compound represented by the formula (a-4-1) has a chain group having an epoxy group as R ^a10 include: Examples of (meth)acrylic acid epoxyalkyl esters such as glycidyl (meth)acrylate, 2-methylglycidyl (meth)acrylate, 3,4-epoxybutyl (meth)acrylate, and 6,7-epoxyheptyl (meth)acrylate. ..

Further, the compound represented by the formula (a-4-1) may be an alicyclic epoxy group-containing (meth)acrylic acid ester. The alicyclic group constituting the alicyclic epoxy group may be monocyclic or polycyclic. Examples of the monocyclic alicyclic group include a cyclopentyl group and a cyclohexyl group. Further, examples of the polycyclic alicyclic group include a norbornyl group, an isobornyl group, a tricyclononyl group, a tricyclodecyl group, and a tetracyclododecyl group.

Specific examples of the case where the compound represented by the formula (a-4-1) is an alicyclic epoxy group-containing (meth)acrylic acid ester include, for example, the following formulas (a-4-1a) to (a-4). -1o). Among these, the compounds represented by the following formulas (a-4-1a) to (a-4-1e) are preferable and the following formulas (a-4-1a) to The compound represented by (a-4-1c) is more preferable.

In the above formula, R ^a20 represents a hydrogen atom or a methyl group, R ^a21 represents a divalent saturated aliphatic hydrocarbon group having 1 to 6 carbon atoms, and R ^a22 represents 2 having 1 to 10 carbon atoms. Represents a valent hydrocarbon group, and t represents an integer of 0 or more and 10 or less. As R ^a21 , a linear or branched alkylene group such as a methylene group, an ethylene group, a propylene group, a tetramethylene group, an ethylethylene group, a pentamethylene group, or a hexamethylene group is preferable. Examples of R ^a22 include methylene group, ethylene group, propylene group, tetramethylene group, ethylethylene group, pentamethylene group, hexamethylene group, phenylene group, cyclohexylene group, —CH ₂ —Ph—CH ₂ — (Ph is A phenylene group) is preferred.

Further, the acrylic resin (a-4) may be a polymer of a monomer other than the (meth)acrylic acid ester. Examples of such a monomer include (meth)acrylamides, unsaturated carboxylic acids, allyl compounds, vinyl ethers, vinyl esters, styrenes and the like. These monomers can be used alone or in combination of two or more kinds.

Examples of (meth)acrylamides include (meth)acrylamide, N-alkyl(meth)acrylamide, N-aryl(meth)acrylamide, N,N-dialkyl(meth)acrylamide, N,N-aryl(meth)acrylamide, N. -Methyl-N-phenyl(meth)acrylamide, N-hydroxyethyl-N-methyl(meth)acrylamide and the like can be mentioned.

Examples of unsaturated carboxylic acids include monocarboxylic acids such as crotonic acid; dicarboxylic acids such as maleic acid, fumaric acid, citraconic acid, mesaconic acid and itaconic acid; and anhydrides of these dicarboxylic acids.

As the allyl compound, allyl esters such as allyl acetate, allyl caproate, allyl caprylate, allyl laurate, allyl palmitate, allyl stearate, allyl benzoate, allyl acetoacetate, allyl lactate; allyloxyethanol; Can be mentioned.

Examples of vinyl ethers include hexyl vinyl ether, octyl vinyl ether, decyl vinyl ether, ethylhexyl vinyl ether, methoxyethyl vinyl ether, ethoxyethyl vinyl ether, chloroethyl vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether, hydroxyethyl vinyl ether. , Alkyl vinyl ethers such as diethylene glycol vinyl ether, dimethylaminoethyl vinyl ether, diethylaminoethyl vinyl ether, butylaminoethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether; vinyl phenyl ether, vinyl tolyl ether, vinyl chlorophenyl ether, vinyl-2,4-dichlorophenyl ether And vinyl aryl ethers such as vinyl naphthyl ether and vinyl anthranyl ether;

Examples of vinyl esters include vinyl butyrate, vinyl isobutyrate, vinyl trimethyl acetate, vinyl diethyl acetate, vinyl valerate, vinyl caproate, vinyl chloroacetate, vinyl dichloroacetate, vinyl methoxy acetate, vinyl butoxy acetate, vinyl phenyl. Examples thereof include acetate, vinyl acetoacetate, vinyl lactate, vinyl-β-phenylbutyrate, vinyl benzoate, vinyl salicylate, vinyl chlorobenzoate, vinyl tetrachlorobenzoate and vinyl naphthoate.

Styrenes include styrene; methylstyrene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, isopropylstyrene, butylstyrene, hexylstyrene, cyclohexylstyrene, decylstyrene, benzylstyrene, chloromethylstyrene, trifluoromethylstyrene, ethoxy. Alkyl styrene such as methyl styrene and acetoxymethyl styrene; alkoxy styrene such as methoxy styrene, 4-methoxy-3-methyl styrene and dimethoxy styrene; chloro styrene, dichloro styrene, trichloro styrene, tetrachloro styrene, pentachloro styrene, bromo styrene, Halostyrenes such as dibromostyrene, iodostyrene, fluorostyrene, trifluorostyrene, 2-bromo-4-trifluoromethylstyrene, 4-fluoro-3-trifluoromethylstyrene; and the like.

In the acrylic resin (a-4), the amount of the structural unit derived from (meth)acrylic acid and the amount of the structural unit derived from another monomer are not particularly limited as long as the object of the present invention is not impaired. The amount of the structural unit derived from (meth)acrylic acid in the acrylic resin (a-4) is 5 mol% or more and 50 mol% or more with respect to the number of moles of all the structural units of the acrylic resin (a-4). The following is preferable, and 10 mol% or more and 30 mol% or less is more preferable.

When the acrylic resin (a-4) has a structural unit having an unsaturated double bond, the amount of the structural unit having an unsaturated double bond in the acrylic resin (a-4) is equal to that of the acrylic resin (a-4). -4) With respect to the number of moles of all structural units, 1 mol% or more and 50 mol% or less is preferable, 1 mol% or more and 30 mol% or more is more preferable, and 1 mol% or more and 20 mol% or less is particularly preferable.
Since the acrylic resin (a-4) contains the structural unit having an unsaturated double bond in an amount within the above range, the acrylic resin can be incorporated into the cross-linking reaction in the resist film to be uniformized, and thus the column spacer. It is effective in improving the heat resistance and mechanical properties of.

The weight average molecular weight of the acrylic resin (a-4) is preferably 2,000 or more and 50,000 or less, and more preferably 3,000 or more and 30,000 or less. Within the above range, the film forming ability of the photosensitive resin composition and the developability after exposure tend to be easily balanced.

The content of the alkali-soluble resin (A) is 20% by mass or more and 85% by mass or less with respect to the mass (total solid content) of the photosensitive resin composition excluding the mass of the organic solvent (S) described below. It is preferably 25% by mass or more and 75% by mass or less. By setting it as the said range, it is easy to obtain the photosensitive resin composition excellent in developability.

<Photopolymerizable monomer (B)>
As the photopolymerizable monomer (B), a monomer having an ethylenically unsaturated group can be preferably used. The monomer having an ethylenically unsaturated group includes a monofunctional monomer and a polyfunctional monomer.

Examples of monofunctional monomers include (meth)acrylamide, methylol (meth)acrylamide, methoxymethyl (meth)acrylamide, ethoxymethyl (meth)acrylamide, propoxymethyl (meth)acrylamide, butoxymethoxymethyl (meth)acrylamide, N-methylol ( (Meth)acrylamide, N-hydroxymethyl(meth)acrylamide, (meth)acrylic acid, fumaric acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, crotonic acid, 2-acrylamide- 2-methylpropanesulfonic acid, tert-butylacrylamide sulfonic acid, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, cyclohexyl (meth)acrylate, 2-hydroxyethyl (Meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, 2-phenoxy-2-hydroxypropyl (meth)acrylate, 2-(meth)acryloyloxy-2-hydroxypropyl phthalate, Glycerin mono(meth)acrylate, tetrahydrofurfuryl(meth)acrylate, dimethylaminoethyl(meth)acrylate, glycidyl(meth)acrylate, 2,2,2-trifluoroethyl(meth)acrylate, 2,2,3,3 -Tetrafluoropropyl (meth)acrylate, a phthalic acid derivative half (meth)acrylate, and the like. These monofunctional monomers may be used alone or in combination of two or more.

On the other hand, as the polyfunctional monomer, ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, butylene glycol Di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,6-hexane glycol di(meth)acrylate, trimethylolpropane tri(meth)acrylate, glycerin di(meth)acrylate, pentaerythritol triacrylate, pentaerythritol Tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipenta Erythritol hexa(meth)acrylate, 2,2-bis(4-(meth)acryloxydiethoxyphenyl)propane, 2,2-bis(4-(meth)acryloxypolyethoxyphenyl)propane, 2-hydroxy-3 -(Meth)acryloyloxypropyl (meth)acrylate, ethylene glycol diglycidyl ether di(meth)acrylate, diethylene glycol diglycidyl ether di(meth)acrylate, phthalic acid diglycidyl ester di(meth)acrylate, glycerin triacrylate, glycerin poly Glycidyl ether poly(meth)acrylate, urethane (meth)acrylate (that is, a reaction product of tolylene diisocyanate, trimethylhexamethylene diisocyanate, or hexamethylene diisocyanate and the like and 2-bidroxyethyl (meth)acrylate), methylenebis(meth)acrylamide, Examples thereof include polyfunctional monomers such as (meth)acrylamide methylene ether, a condensation product of polyhydric alcohol and N-methylol(meth)acrylamide, and triacrylformal. These polyfunctional monomers may be used alone or in combination of two or more.

Among these monomers having an ethylenically unsaturated group, a trifunctional or higher polyfunctional monomer from the viewpoint of increasing the adhesion of the photosensitive resin composition to the substrate and the strength of the photosensitive resin composition after curing. Is preferable, a polyfunctional monomer having 4 or more functional groups is more preferable, and a polyfunctional monomer having 5 or more functional groups is further preferable.

The content of the photopolymerizable monomer (B) in the photosensitive resin composition is 1% by mass or more based on the mass (total solid content) of the photosensitive resin composition excluding the mass of the organic solvent (S) described below. 50 mass% or less is preferable, and 5 mass% or more and 40 mass% or less is more preferable. Within the above range, the sensitivity, developability and resolution tend to be easily balanced.

<Photopolymerization initiator (C)>
The photosensitive resin composition contains a photopolymerization initiator (C-I) represented by the following formula (C1) as the photopolymerization initiator (C).

In the formula (C1), X ⁰¹ is a group obtained by removing t2+t3 hydrogen atoms from the hydrogen atoms bonded to the aromatic ring in the structure represented by the following formula (C1-1). X ⁰² and X ⁰³ are each independently a monovalent organic group. X ⁰⁴ and X ⁰⁵ are each independently a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent. t0 to t3 are each independently 0 or 1, and at least one of t2 and t3 is 1.

In formula (C1-1), X ⁰⁶ is an aromatic group which may have a monovalent substituent bonded to the nitrogen atom in the carbazole ring by a C—N bond. X ⁰⁷ and X ⁰⁸ are each independently a nitro group, an aroyl group which may have a substituent, or a heteroaroyl group which may have a substituent. t4 and t5 are 0 or 1 each independently.

In formula (C1-1), X ⁰⁶ is an aromatic group which may have a monovalent substituent bonded to the nitrogen atom in the carbazole ring by a C—N bond. The aromatic group may be an aryl group or a heteroaryl group. Examples of the hetero atom contained in the heteroaryl group include O, S, N, P, and Si.

The number of carbon atoms of the aromatic group which may have a substituent as X ⁰⁶ is not particularly limited. The number of carbon atoms of the aromatic group which may have a substituent as X ⁰⁶ is, for example, preferably 1 or more and 50 or less, more preferably 1 or more and 30 or less, and particularly preferably 1 or more and 20 or less. The number of carbon atoms of the aromatic group which may have a substituent does not include the number of carbon atoms of the substituent.

The heterocycle forming the heteroaryl group as X ⁰⁶ includes furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, tetrazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran. , Benzothiophene, indole, isoindole, indolizine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, and quinoxaline.

Preferable examples when X ⁰⁶ is an aryl group include a phenyl group, a naphthalene-1-yl group, a naphthalen-2-yl group, a 2-phenylphenyl group, a 3-phenylphenyl group, and a 4-phenylphenyl group. Is mentioned.

The aromatic group as X ⁰⁶ may have a substituent. Examples of the substituent which the aromatic group as X ⁰⁶ may have include an alkyl group having 1 to 20 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and 3 to 10 carbon atoms. Cycloalkyl group, cycloalkoxy group having 3 to 10 carbon atoms, saturated aliphatic acyl group having 2 to 20 carbon atoms, alkoxycarbonyl group having 2 to 20 carbon atoms, 2 to 20 carbon atoms Saturated aliphatic acyloxy group, optionally substituted phenyl group, optionally substituted phenoxy group, optionally substituted phenylthio group, optionally substituted benzoyl group A phenoxycarbonyl group which may have a substituent, a benzoyloxy group which may have a substituent, a phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, and a substituent Optionally naphthyl group, optionally substituted naphthoxy group, optionally substituted naphthyl group, optionally substituted naphthoxycarbonyl group, optionally substituted naphtho An yloxy group, a naphthylalkyl group having 11 or more and 20 or less carbon atoms which may have a substituent, a heterocyclyl group which may have a substituent, a heterocyclylcarbonyl group which may have a substituent, an amino group, Examples thereof include an amino group substituted with 1 or 2 organic groups, a morpholin-1-yl group, a piperazin-1-yl group, a halogen, a nitro group, and a cyano group.
The number of substituents that the aromatic group as X ⁰⁶ may have is not particularly limited, and may be 1 or a plurality of 2 or more. When the aromatic group as X ⁰⁶ has a plurality of substituents, the plurality of substituents may be the same or different.

Among the above groups as X ⁰⁶ , an aryl group is preferable from the viewpoint of the ease of synthesis and availability of the photopolymerization initiator (CI), and a phenyl group, naphthalen-1-yl group, and naphthalene-2- An yl group is more preferable, and a phenyl group is particularly preferable.

In formula (C1-1), X ⁰⁷ and X ⁰⁸ are each independently a nitro group, an aroyl group which may have a substituent, or a heteroaroyl group which may have a substituent.

The number of carbon atoms of the aryl group contained in the aroyl group is, for example, preferably 6 or more and 50 or less, more preferably 6 or more and 30 or less, and particularly preferably 6 or more and 20 or less. When the aryl group contained in the aroyl group has a substituent, the number of carbon atoms in the above aryl group does not include the number of carbon atoms in the substituent.
Preferable examples of the aryl group contained in the aroyl group include a phenyl group, a naphthalen-1-yl group, a naphthalen-2-yl group, a 2-phenylphenyl group, a 3-phenylphenyl group, and a 4-phenylphenyl group. Can be mentioned.

The number of carbon atoms of the heteroaryl group contained in the heteroaroyl group is, for example, preferably 1 or more and 50 or less, more preferably 1 or more and 30 or less, and particularly preferably 1 or more and 20 or less. When the heteroaryl group contained in the aroyl group has a substituent, the number of carbon atoms of the heteroaryl group does not include the number of carbon atoms of the substituent.
Suitable examples of the heterocycle forming the heteroaryl group contained in the heteroaroyl group include furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, tetrazole, pyridine, pyrazine, Examples include pyrimidine, pyridazine, benzofuran, benzothiophene, indole, isoindole, indolizine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, and quinoxaline.
The bond possessed by the heteroaryl group may be bonded to the carbon atom forming the heterocycle or the heteroatom forming the heterocycle.

The substituent which the aroyl group which may have a substituent and the heteroaroyl group which may have a substituent may have are the same as the substituent which the aromatic group as X ⁰⁶ may have. is there.
The number of substituents which the aroyl group which may have a substituent and the heteroaroyl group which may have a substituent may have is not particularly limited, and may be 1 or a plurality of 2 or more. Good. When the aroyl group which may have a substituent and the heteroaroyl group which may have a substituent have a plurality of substituents, the plurality of substituents may be the same or different.

Preferred specific examples of the aroyl group which may have a substituent and the heteroaroyl group which may have a substituent include a benzoyl group, a 2-methylbenzoyl group, a 3-methylbenzoyl group and a 4-methylbenzoyl group. , 2,3-dimethylbenzoyl group, 2,4-dimethylbenzoyl group, 2,5-dimethylbenzoyl group, 2,6-dimethylbenzoyl group, 3,4-dimethylbenzoyl group, 3,5-dimethylbenzoyl group, 2 -Methoxybenzoyl group, 3-methoxybenzoyl group, 4-methoxybenzoyl group, 2,3-dimethoxybenzoyl group, 2,4-dimethoxybenzoyl group, 2,5-dimethoxybenzoyl group, 2,6-dimethoxybenzoyl group, 3 , 4-dimethoxybenzoyl group, 3,5-dimethoxybenzoyl group, 2-chlorobenzoyl group, 3-chlorobenzoyl group, 4-chlorobenzoyl group, 2,3-dichlorobenzoyl group, 2,4-dichlorobenzoyl group, 2 ,5-dichlorobenzoyl group, 2,6-dichlorobenzoyl group, 3,4-dichlorobenzoyl group, 3,5-dichlorobenzoyl group, 2-(9H-carbazol-9-yl)benzoyl group, 3-(9H- Carbazol-9-yl)benzoyl group, 4-(9H-carbazol-9-yl)benzoyl group, thiophen-2-ylcarbonyl group, furan-2-ylcarbonyl group, pyrrole-2-ylcarbonyl group, benzothiophene- Examples thereof include a 2-ylcarbonyl group, a benzofuran-2-ylcarbonyl group, and an indol-2-ylcarbonyl group.

X ⁰¹ is not particularly limited as long as it is a group obtained by removing t2+t3 hydrogen atoms from the hydrogen atoms bonded to the aromatic ring in the structure represented by the formula (C1-1). As the group represented by the formula (C1-1), monovalent or divalent groups represented by the following formulas (C1-1a) to (C1-1c) are preferable.

In formula (C1-1a) ~ formula (C1-c), t4, t5, and ^{X 06, X 07,} and ^{X 08} are the same as the formula (C1-1). X ⁰⁹ is a divalent aromatic group bonded to the nitrogen atom in the carbazole ring by a C—N bond. Two coupling hands of X ⁰⁹ have the other bonds of bond that binds to the carbazole ring in Formula (C1-1a) and formula (C1-1c) ^is constituting the aromatic ring contained in ^{X 09} Bond to a carbon atom.
In addition, X ⁰⁷ corresponds to a divalent group obtained by removing one hydrogen atom bonded to the aromatic ring from the above-mentioned monovalent organic group containing an aromatic ring as X ⁰⁶ .

As described above, the aromatic group as X ⁰⁶ is preferably an aryl group, more preferably a phenyl group, a naphthalen-1-yl group, and a naphthalen-2-yl group, and particularly preferably a phenyl group.
Therefore, as X ⁰⁹ , phenylene groups such as o-phenylene group, m-phenylene group and p-phenylene group, naphthalene-2,6-diyl group, naphthalene-2,7-diyl group, naphthalene-1 , 2-diyl group, naphthalene-1,4-diyl group and naphthalene-1,6-diyl group are preferred, and o-phenylene group, m-phenylene group, and phenylene group such as p-phenylene group. A group is more preferable, and a p-phenylene group is particularly preferable.

In formula (C1-1a) ~ formula (C1-1c), bonding position of ^{X 07} and ^{X 08} on the carbazole ring is not particularly limited.
From the viewpoint of easy synthesis and availability of the compound represented by the formula (C1), the group represented by the formula (C1-1a), the group represented by (C1-1b), and the formula (C1-1c). As preferred examples of the group represented by the formula (), a group represented by the formula (C1-1aa), a group represented by the formula (C1-1ba), and a group represented by the formula (C1-1ca). Is mentioned.

In formula (C1), X ⁰² and X ⁰³ are each independently a monovalent organic group. Examples of suitable organic groups as X ⁰² and X ⁰³ include an alkyl group, an alkoxy group, a cycloalkyl group, a cycloalkoxy group, a saturated aliphatic acyl group, an alkoxycarbonyl group, a saturated aliphatic acyloxy group, and a substituent. A phenyl group which may have a substituent, a phenoxy group which may have a substituent, a benzoyl group which may have a substituent, a phenoxycarbonyl group which may have a substituent, and a substituent which may have a substituent. Benzoyloxy group, optionally substituted phenylalkyl group, optionally substituted naphthyl group, optionally substituted naphthoxy group, optionally substituted naphthoyl group, substituted A naphthoxycarbonyl group which may have a group, a naphthoyloxy group which may have a substituent, a naphthylalkyl group which may have a substituent, a heterocyclyl group which may have a substituent, a substituent Optionally substituted with a heterocyclylcarbonyl group, an amino group substituted with 1 or 2 organic groups, an alkyl group substituted with amino groups, substituted with an amino group substituted with 1 or 2 organic groups Examples thereof include an alkyl group, a morpholin-1-yl group, and a piperazin-1-yl group.

When X ⁰² and X ⁰³ are an alkyl group, the number of carbon atoms in the alkyl group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When X ⁰² and X ⁰³ are alkyl groups, they may be linear or branched. When X ⁰² and X ⁰³ are alkyl groups, specific examples thereof include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n. -Pentyl group, isopentyl group, sec-pentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, isooctyl group, sec-octyl group, tert-octyl group, n-nonyl group, Examples thereof include isononyl group, n-decyl group, and isodecyl group. When X ⁰² and X ⁰³ are alkyl groups, the alkyl groups may contain an ether bond (—O—) in the carbon chain. Examples of the alkyl group having an ether bond in the carbon chain include a methoxyethyl group, an ethoxyethyl group, a methoxyethoxyethyl group, an ethoxyethoxyethyl group, a propyloxyethoxyethyl group, and a methoxypropyl group.

When X ⁰² and X ⁰³ are an alkoxy group, the number of carbon atoms in the alkoxy group is preferably 1 or more and 20 or less, and more preferably 1 or more and 6 or less. When X ⁰² and X ⁰³ are alkoxy groups, they may be linear or branched. Specific examples of the case where X ⁰² and X ⁰³ are alkoxy groups include methoxy group, ethoxy group, n-propyloxy group, isopropyloxy group, n-butyloxy group, isobutyloxy group, sec-butyloxy group, tert-butyloxy group. Group, n-pentyloxy group, isopentyloxy group, sec-pentyloxy group, tert-pentyloxy group, n-hexyloxy group, n-heptyloxy group, n-octyloxy group, isooctyloxy group, sec- Examples thereof include an octyloxy group, a tert-octyloxy group, an n-nonyloxy group, an isononyloxy group, an n-decyloxy group, and an isodecyloxy group. Further, when X ⁰² and X ⁰³ are an alkoxy group, the alkoxy group may include an ether bond (—O—) in the carbon chain. Examples of the alkoxy group having an ether bond in the carbon chain include a methoxyethoxy group, an ethoxyethoxy group, a methoxyethoxyethoxy group, an ethoxyethoxyethoxy group, a propyloxyethoxyethoxy group, and a methoxypropyloxy group.

When X ⁰² and X ⁰³ are a cycloalkyl group or a cycloalkoxy group, the cycloalkyl group or the cycloalkoxy group preferably has 3 or more and 10 or less carbon atoms, and more preferably has 3 or more and 6 or less carbon atoms. Specific examples of the case where X ⁰² and X ⁰³ are cycloalkyl groups include a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group. When X ⁰² and X ⁰³ are cycloalkoxy groups, specific examples thereof include a cyclopropyloxy group, a cyclobutyloxy group, a cyclopentyloxy group, a cyclohexyloxy group, a cycloheptyloxy group, and a cyclooctyloxy group. ..

When X ⁰² and X ⁰³ are a saturated aliphatic acyl group or a saturated aliphatic acyloxy group, the saturated aliphatic acyl group or the saturated aliphatic acyloxy group preferably has 2 or more and 21 or less carbon atoms, and 2 or more and 7 or less. More preferable. When R ^c7 is a saturated aliphatic acyl group, specific examples thereof include acetyl group, propanoyl group, n-butanoyl group, 2-methylpropanoyl group, n-pentanoyl group, 2,2-dimethylpropanoyl group, n. -Hexanoyl group, n-heptanoyl group, n-octanoyl group, n-nonanoyl group, n-decanoyl group, n-undecanoyl group, n-dodecanoyl group, n-tridecanoyl group, n-tetradecanoyl group, n-pentadeca group Examples thereof include a noyl group and an n-hexadecanoyl group. When X ⁰² and X ⁰³ are saturated aliphatic acyloxy groups, specific examples thereof include acetyloxy group, propanoyloxy group, n-butanoyloxy group, 2-methylpropanoyloxy group, n-pentanoyloxy group. , 2,2-dimethylpropanoyloxy group, n-hexanoyloxy group, n-heptanoyloxy group, n-octanoyloxy group, n-nonanoyloxy group, n-decanoyloxy group, n-undecanoyloxy group Group, n-dodecanoyloxy group, n-tridecanoyloxy group, n-tetradecanoyloxy group, n-pentadecanoyloxy group, and n-hexadecanoyloxy group.

When X ⁰² and X ⁰³ are alkoxycarbonyl groups, the number of carbon atoms in the alkoxycarbonyl group is preferably 2 or more and 20 or less, and more preferably 2 or more and 7 or less. When X ⁰² and X ⁰³ are alkoxycarbonyl groups, specific examples thereof include methoxycarbonyl group, ethoxycarbonyl group, n-propyloxycarbonyl group, isopropyloxycarbonyl group, n-butyloxycarbonyl group, isobutyloxycarbonyl group, sec-butyloxycarbonyl group, tert-butyloxycarbonyl group, n-pentyloxycarbonyl group, isopentyloxycarbonyl group, sec-pentyloxycarbonyl group, tert-pentyloxycarbonyl group, n-hexyloxycarbonyl group, n- Heptyloxycarbonyl group, n-octyloxycarbonyl group, isooctyloxycarbonyl group, sec-octyloxycarbonyl group, tert-octyloxycarbonyl group, n-nonyloxycarbonyl group, isononyloxycarbonyl group, n-decyloxycarbonyl group Group, an isodecyloxycarbonyl group, and the like.

When X ⁰² and X ⁰³ are phenylalkyl groups, the number of carbon atoms in the phenylalkyl group is preferably 7 or more and 20 or less, and more preferably 7 or more and 10 or less. When X ⁰² and X ⁰³ are naphthylalkyl groups, the number of carbon atoms in the naphthylalkyl group is preferably 11 or more and 20 or less, more preferably 11 or more and 14 or less. When X ⁰² and X ⁰³ are phenylalkyl groups, specific examples include a benzyl group, a 2-phenylethyl group, a 3-phenylpropyl group, and a 4-phenylbutyl group. When X ⁰² and X ⁰³ are naphthylalkyl groups, specific examples thereof include α-naphthylmethyl group, β-naphthylmethyl group, 2-(α-naphthyl)ethyl group, and 2-(β-naphthyl)ethyl group. Is mentioned. When X ⁰² and X ⁰³ are a phenylalkyl group or a naphthylalkyl group, R ^c7 may further have a substituent on the phenyl group or the naphthyl group.

When X ⁰² and X ⁰³ are a heterocyclyl group, the heterocyclyl group is a 5- or 6-membered monocycle containing one or more N, S, and O, such monocycles, or such monocycle and a benzene ring. And is a condensed heterocyclyl group. When the heterocyclyl group is a condensed ring, the number of monocycles constituting the condensed ring is up to 3. The heterocyclyl group may be an aromatic group (heteroaryl group) or a non-aromatic group. The heterocyclic ring constituting the heterocyclyl group, furan, thiophene, pyrrole, oxazole, isoxazole, thiazole, thiadiazole, isothiazole, imidazole, pyrazole, triazole, pyridine, pyrazine, pyrimidine, pyridazine, benzofuran, benzothiophene, indole, Examples include isoindole, indolizine, benzimidazole, benzotriazole, benzoxazole, benzothiazole, carbazole, purine, quinoline, isoquinoline, quinazoline, phthalazine, cinnoline, quinoxaline, piperidine, piperazine, morpholine, piperidine, tetrahydropyran, and tetrahydrofuran. Be done. When R ^c7 is a heterocyclyl group, the heterocyclyl group may further have a substituent.

When X ⁰² and X ⁰³ are heterocyclylcarbonyl groups, the heterocyclyl group contained in the heterocyclylcarbonyl group is the same as when X ⁰² and X ⁰³ are heterocyclyl groups.

When X ⁰² and X ⁰³ are an amino group substituted with an organic group having 1 or 2, preferred examples of the organic group include an alkyl group having 1 to 20 carbon atoms and a cyclo group having 3 to 10 carbon atoms. An alkyl group, a saturated aliphatic acyl group having 2 to 21 carbon atoms, a saturated aliphatic acyloxy group having 2 to 21 carbon atoms, a phenyl group which may have a substituent, and a substituent which may have a substituent. A benzoyl group, a phenylalkyl group having 7 to 20 carbon atoms which may have a substituent, a naphthyl group which may have a substituent, a naphthoyl group which may have a substituent, and a substituent Examples thereof include a naphthylalkyl group having 11 to 20 carbon atoms and a heterocyclyl group. Specific examples of these suitable organic groups are the same as X ⁰² and X ⁰³ . Specific examples of the amino group substituted with 1 or 2 organic groups include methylamino group, ethylamino group, diethylamino group, n-propylamino group, di-n-propylamino group, isopropylamino group, n- Butylamino group, di-n-butylamino group, n-pentylamino group, n-hexylamino group, n-heptylamino group, n-octylamino group, n-nonylamino group, n-decylamino group, phenylamino group, Naphthylamino group, acetylamino group, propanoylamino group, n-butanoylamino group, n-pentanoylamino group, n-hexanoylamino group, n-heptanoylamino group, n-octanoylamino group, n- A decanoylamino group, a benzoylamino group, an α-naphthoylamino group, a β-naphthoylamino group, an N-acetyl-N-acetoxyamino group, an N-propionyl-N-propionyloxyamino group and the like can be mentioned.

When X ⁰² and X ⁰³ are an alkyl group substituted with an amino group, and an alkyl group substituted with an amino group substituted with 1 or 2 organic groups, X ⁰² and X ⁰³ are an alkyl group The alkyl group described as a specific example for is preferably an amino group, or an amino group substituted with one or two organic groups.
Preferred specific examples of the alkyl group substituted with an amino group and the alkyl group substituted with an amino group substituted with 1 or 2 of an organic group include 2-aminoethyl group and 3-amino-n-propyl. Group, 2-amino-n-propyl group, 4-amino-n-butyl group, 2-(N,N-dimethylamino)ethyl group, 3-(N,N-dimethylamino)-n-propyl group, 2 -(N,N-dimethylamino)-n-propyl group, 4-(N,N-dimethylamino)-n-butyl group, 2-(N,N-diethylamino)ethyl group, 3-(N,N- Diethylamino)-n-propyl group, 2-(N,N-diethylamino)-n-propyl group, 4-(N,N-diethylamino)-n-butyl group, 2-(N-acetyl-N-acetoxyamino) Ethyl group, 3-(N-acetyl-N-acetoxyamino)-n-propyl group, 2-(N-acetyl-N-acetoxyamino)-n-propyl group, and 4-(N-acetyl-N-acetoxy). Amino)-n-butyl group.

In the case where the phenyl group, naphthyl group, and heterocyclyl group contained in X ⁰² and X ⁰³ each further have a substituent, the substituent is an alkyl group having 1 to 6 carbon atoms, and an alkyl group having 1 to 6 carbon atoms. Alkoxy group, saturated aliphatic acyl group having 2 to 7 carbon atoms, alkoxycarbonyl group having 2 to 7 carbon atoms, saturated aliphatic acyloxy group having 2 to 7 carbon atoms, 1 to 6 carbon atoms A monoalkylamino group having an alkyl group, a dialkylamino group having an alkyl group having 1 to 6 carbon atoms, a morpholin-1-yl group, a piperazin-1-yl group, a halogen, a nitro group, a cyano group and the like. Can be mentioned.

These substituents are alkyl groups having 1 to 6 carbon atoms, alkoxy groups having 1 to 6 carbon atoms, saturated aliphatic acyl groups having 2 to 7 carbon atoms, and 2 to 7 carbon atoms. Alkoxycarbonyl group, saturated aliphatic acyloxy group having 2 to 7 carbon atoms, monoalkylamino group having an alkyl group having 1 to 6 carbon atoms, and dialkylamino having an alkyl group having 1 to 6 carbon atoms When it is a group, an ether bond (—O—) may be contained in the carbon chain of these substituents.

When the phenyl group, naphthyl group, and heterocyclyl group contained in X ⁰² and X ⁰³ further have a substituent, the number of the substituents is not limited as long as the object of the present invention is not impaired, but 1 or more and 4 or less. Is preferred. When the phenyl group, naphthyl group, and heterocyclyl group contained in X ⁰² and X ⁰³ have a plurality of substituents, the plurality of substituents may be the same or different.

As X ⁰² and X ⁰³ , a cycloalkylalkyl group, a phenoxyalkyl group which may have a substituent on the aromatic ring, and a phenylthioalkyl group which may have a substituent on the aromatic ring are also preferable. The substituent that the phenoxyalkyl group and the phenylthioalkyl group may have is as described above as the substituent that the phenyl group may have.

Among the organic groups, as X ⁰² and X ⁰³ , an alkyl group, a cycloalkyl group, a phenyl group which may have a substituent, or a cycloalkylalkyl group, which may have a substituent on the aromatic ring A good phenylthioalkyl group is preferred. As the alkyl group, an alkyl group having 1 to 20 carbon atoms is preferable, an alkyl group having 1 to 8 carbon atoms is more preferable, an alkyl group having 1 to 4 carbon atoms is particularly preferable, and a methyl group is most preferable. preferable. Among the phenyl groups which may have a substituent, a methylphenyl group is preferable, and a 2-methylphenyl group is more preferable. The number of carbon atoms of the cycloalkyl group contained in the cycloalkylalkyl group is preferably 5 or more and 10 or less, more preferably 5 or more and 8 or less, and particularly preferably 5 or 6. The number of carbon atoms of the alkylene group contained in the cycloalkylalkyl group is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2. Of the cycloalkylalkyl groups, the cyclopentylethyl group is preferred. The number of carbon atoms of the alkylene group contained in the phenylthioalkyl group which may have a substituent on the aromatic ring is preferably 1 or more and 8 or less, more preferably 1 or more and 4 or less, and particularly preferably 2. Among the phenylthioalkyl groups which may have a substituent on the aromatic ring, a 2-(4-chlorophenylthio)ethyl group is preferable.

Further, as X ⁰² and X ⁰³ , a group represented by —A ¹ —CO—O—A ² is also preferable. A ¹ is a divalent organic group, preferably a divalent hydrocarbon group, and more preferably an alkylene group. A ² is a monovalent organic group, preferably a monovalent hydrocarbon group.

When A ¹ is an alkylene group, the alkylene group may be linear or branched, and is preferably linear. When A ¹ is an alkylene group, the number of carbon atoms in the alkylene group is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and particularly preferably 1 or more and 4 or less.

Preferable examples of A ² include an alkyl group having 1 to 10 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, and an aromatic hydrocarbon group having 6 to 20 carbon atoms. Preferable specific examples of A ⁴ include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, sec-butyl group, tert-butyl group, n-pentyl group, n-hexyl group. Group, phenyl group, naphthyl group, benzyl group, phenethyl group, α-naphthylmethyl group, β-naphthylmethyl group and the like.

Specific preferred examples of the group represented by -A ¹ -CO-O-A ² include 2-methoxycarbonylethyl group, 2-ethoxycarbonylethyl group, 2-n-propyloxycarbonylethyl group, 2-n. -Butyloxycarbonylethyl group, 2-n-pentyloxycarbonylethyl group, 2-n-hexyloxycarbonylethyl group, 2-benzyloxycarbonylethyl group, 2-phenoxycarbonylethyl group, 3-methoxycarbonyl-n-propyl Group, 3-ethoxycarbonyl-n-propyl group, 3-n-propyloxycarbonyl-n-propyl group, 3-n-butyloxycarbonyl-n-propyl group, 3-n-pentyloxycarbonyl-n-propyl group , 3-n-hexyloxycarbonyl-n-propyl group, 3-benzyloxycarbonyl-n-propyl group, and 3-phenoxycarbonyl-n-propyl group.

式（Ｃ１ａ）及び（Ｃ１ｂ）中、Ｘ^０１０及びＸ^０１１はそれぞれ有機基である。ｔ６は０以上４以下の整数である。Ｘ^０１０及びＸ^０１１がベンゼン環上の隣接する位置に存在する場合、Ｘ^０１０及びＸ^０１１が互いに結合して環を形成してもよい。ｔ７は１以上８以下の整数である。ｔ８は１以上５以下の整数である。ｔ９は０以上（ｔ８＋３）以下の整数である。Ｘ^０１２は有機基である。 Although X ⁰² and X ⁰³ have been described above, a group represented by the following formula (C1a) or (C1b) is preferable as X ⁰² and X ⁰³ .

In formulas (C1a) and (C1b), X ⁰¹⁰ and X ⁰¹¹ are organic groups, respectively. t6 is an integer of 0 or more and 4 or less. When X ⁰¹⁰ and X ⁰¹¹ are present at adjacent positions on the benzene ring, X ⁰¹⁰ and X ⁰¹¹ may combine with each other to form a ring. t7 is an integer of 1 or more and 8 or less. t8 is an integer of 1 or more and 5 or less. t9 is an integer of 0 or more and (t8+3) or less. X ⁰¹² is an organic group.

Examples of the organic group for X ⁰¹⁰ and X ⁰¹¹ in the formula (C1a) are the same as those for X ⁰² and X ⁰³ . As X ⁰¹⁰ , an alkyl group or a phenyl group is preferable. When X ⁰¹⁰ is an alkyl group, the number of carbon atoms is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, particularly preferably 1 or more and 3 or less, and most preferably 1. That is, it is most preferable that X ⁰¹⁰ is a methyl group. When X ⁰¹⁰ and X ⁰¹¹ combine to form a ring, the ring may be an aromatic ring or an aliphatic ring. Suitable examples of the group represented by the formula (C1a) in which X ⁰¹⁰ and X ⁰¹¹ form a ring include naphthalen-1-yl group and 1,2,3,4-tetrahydro. Examples thereof include naphthalen-5-yl group. In the above formula (C1a), t6 is an integer of 0 or more and 4 or less, preferably 0 or 1, and more preferably 0.

In the above formula (C1b), X ⁰¹² is an organic group. Examples of the organic group include groups similar to the organic groups described for X ⁰² and X ⁰³ . Among the organic groups, an alkyl group is preferred. The alkyl group may be linear or branched. The number of carbon atoms in the alkyl group is preferably 1 or more and 10 or less, more preferably 1 or more and 5 or less, and particularly preferably 1 or more and 3 or less. Preferred examples of X ⁰¹² include a methyl group, an ethyl group, a propyl group, an isopropyl group, and a butyl group, and of these, a methyl group is more preferred.

In the above formula (C1b), t8 is an integer of 1 or more and 5 or less, preferably an integer of 1 or more and 3 or less, and more preferably 1 or 2. In the formula (C1b), t9 is 0 or more and (t8+3) or less, preferably an integer of 0 or more and 3 or less, more preferably an integer of 0 or more and 2 or less, and particularly preferably 0. In the above formula (C1b), t7 is an integer of 1 or more and 8 or less, preferably an integer of 1 or more and 5 or less, more preferably an integer of 1 or more and 3 or less, and particularly preferably 1 or 2.

In formula (C1), X ⁰⁴ and X ⁰⁵ are each independently a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent. is there. Preferable examples of the substituent that X ⁰⁴ and X ⁰⁵ may have when X ⁰⁴ and X ⁰⁵ are alkyl groups include a phenyl group and a naphthyl group. Further, when X ⁰⁴ and X ⁰⁵ are aryl groups, the substituent that may be possessed is an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, a halogen atom, or the like. Are preferably exemplified.

In formula (C1), as X ⁰⁴ and X ⁰⁵ , hydrogen atom, methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, phenyl group, benzyl group, methylphenyl group, naphthyl group and the like can be mentioned. It is preferably exemplified, and among these, a methyl group or a phenyl group is more preferable.

With respect to the oxime ester compound represented by the formula (C1) described above, it is easy to form a patterned cured film having a good cross-sectional shape, and therefore the sum of t2 and t3 is 1, and the sum of t4 and t5 is It is preferred that the sum is 1 or 2.

As described above, X ⁰¹ is preferably a group represented by formula (C1-1aa), a group represented by formula (C1-1ba), or a group represented by formula (C1-1ca).
When X ⁰¹ is a group represented by the formula (C1-1aa), suitable examples of the oxime ester compound represented by the formula (C1) include the following compounds.

When X ⁰¹ is a group represented by the formula (C1-1ba), the following compounds can be given as preferred specific examples of the oxime ester compound represented by the formula (C1).

When X ⁰¹ is a group represented by the formula (C1-1ca), the following compounds can be given as preferred specific examples of the oxime ester compound represented by the formula (C1).

<Photopolymerization initiator (C-II)>
The photosensitive resin composition contains, as the photopolymerization initiator (C), a photopolymerization initiator (C-II) other than the photopolymerization initiator (C-II) together with the above-mentioned photopolymerization initiator (C-II). ) May be included. The other photopolymerization initiator (C-II) is not particularly limited as long as it is a photopolymerization initiator that does not correspond to the photopolymerization initiator (CI).

Suitable examples of the photopolymerization initiator (C-II) include oxime ester compounds having a structure not corresponding to the above formula (C1); 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butane. -1-one, 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-dimethylaminophenyl)butane-1. -One, 2-(4-methylbenzyl)-2-diethylamino-1-(4-morpholinophenyl)butan-1-one, 2-methyl-1-phenyl-2-morpholinopropan-1-one, 2-methyl Α-aminoketone compounds such as -1-[4-(hexyl)phenyl]-2-morpholinopropan-1-one and 2-ethyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one 1-phenyl-2-hydroxy-2-methylpropan-1-one, 1-(4-isopropylphenyl)-2-hydroxy-2-methylpropan-1-one, 4-(2-hydroxyethoxy)phenyl- Α-Hydroxyketone photoinitiators such as (2-hydroxy-2-propyl)ketone and 1-hydroxycyclohexylphenyl ketone; benzoin such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether and benzyl methyl ketal Photopolymerization initiator; benzophenone such as benzophenone, benzoylbenzoic acid, methyl benzoylbenzoate, 4-phenylbenzophenone, hydroxybenzophenone, acrylated benzophenone, 4-benzoyl, 4'-methyldiphenyl sulfide, 4,4'-bisdiethylaminobenzophenone -Based photopolymerization initiators; thioxanthone-based photopolymerization initiators such as thioxanthone, 2-chlorothioxanthone, 2-methylthioxanthone, isopropylthioxanthone and 2,4-diisopropylthioxanthone; 2,4,6-trichloro-s-triazine, 2- Phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6 -Bis(trichloromethyl)-s-triazine, 2-pipenyl-4.6-bis(trichloromethyl)-s-triazine, 2,4-bis(trichloromethyl)-6-styryl-s-triazine, 2-( Naphth-1-yl)-4,6- Bis(trichloromethyl)-s-triazine, 2-(4-methoxy-naphth-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2,4-trichloromethyl-(piperonyl)-6 -Triazine, 2,4-trichloromethyl-(4'-methoxystyryl)-6-triazine, 2-[4-(4-methoxystyryl)phenyl]-4,6-bis(trichloromethyl)-1,3. Triazine-based photopolymerization initiator such as 5-triazine; carbazole-based photopolymerization initiator; 2,2′-bis(2-chlorophenyl)-4,4′,5,5′-tetrakis(4-ethoxycarbonylphenyl)- 1,2′-biimidazole, 2,2′-bis(2-bromophenyl)-4,4′,5,5′-tetrakis(4-ethoxycarbonylphenyl)-1,2′-biimidazole, 2, 2'-bis(2-chlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4', 5,5'-Tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2' -Biimidazole, 2,2'-bis(2-bromophenyl)-4,4,5,5'-tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4-dibromophenyl) )-4,4',5,5'-Tetraphenyl-1,2'-biimidazole, 2,2'-bis(2,4,6-tribromophenyl)-4,4',5,5' -Biimidazole-based photopolymerization initiators such as tetraphenyl-1,2'-biimidazole; benzimidazoline-based photopolymerization initiators represented by the following formulas and the like are exemplified.

The ratio of the mass of the photopolymerization initiator (C-I) to the mass of the photopolymerization initiator (C) is not particularly limited as long as the object of the present invention is not impaired. The mass ratio of the photopolymerization initiator (C-I) to the mass of the photopolymerization initiator (C) is preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 80% by mass or more, and 90 It is even more preferably at least mass%, and particularly preferably 100 mass%.

The content of the photopolymerization initiator (C) is preferably 0.1% by mass or more and 30% by mass or less, and 0.5% by mass or more and 20% by mass or less with respect to the total mass of the solid content of the photosensitive resin composition. More preferable. By setting the content of the photopolymerization initiator (C) within the above range, it is possible to obtain a photosensitive resin composition which has good curability and is less likely to cause defective pattern shape.

<Fluorine resin (D)>
The photosensitive resin composition contains a fluororesin (D). When the photosensitive resin composition contains a fluorine-based resin (D), the photosensitive resin composition is used when pixels are formed using ink in a color filter, an organic EL display element, a quantum dot display, an organic TFT array, or the like. The banks formed by objects easily eject ink. As a result, it is possible to prevent the ink from adhering to the bank and the ink from admixing with the adjacent pixels when the ink is injected into the area surrounded by the bank.

The fluorine-based resin (D) is a resin containing a fluorine atom, and is not particularly limited as long as it is a resin that can impart ink repellency to various inks to the bank formed using the photosensitive resin composition. The fluorine-based resin (D) may be a homopolymer of a monomer containing a fluorine atom or a copolymer of a monomer containing a fluorine atom and a monomer not containing a fluorine atom.

Preferable examples of the fluorine-based resin (D) include a copolymer obtained by at least copolymerizing (d1) a monomer having an ethylenically unsaturated group and a fluorine atom, and (d2) (meth)acrylic acid. .. When such a fluorine-based resin (D) is used, it is easy to form a bank having excellent liquid repellency with respect to the pixel forming ink by using the photosensitive resin composition.

[(D1) Monomer having ethylenically unsaturated group and fluorine atom]
The monomer having an ethylenically unsaturated group and a fluorine atom (hereinafter, also referred to as “(d1) monomer”) is not particularly limited as long as it has an ethylenically unsaturated group and a fluorine atom. Examples of such (d1) monomer include compounds represented by the following formula (d1-1). These (d1) monomers can be used alone or in combination of two or more.

In formula (d1-1), X ¹ and X ² are each independently a hydrogen atom or a fluorine atom. X ³ is a hydrogen atom, a fluorine atom, a methyl group, or a perfluoromethyl group. X ⁴ and X ⁵ are each independently a hydrogen atom, a fluorine atom, or a perfluoromethyl group. Rf is a fluorine-containing alkyl group having 1 to 40 carbon atoms, or a fluorine-containing alkyl group having 2 to 100 carbon atoms and having an ether bond. a is an integer of 0 or more and 3 or less. b and c are each independently 0 or 1.

When Rf is a fluorine-containing alkyl group, the number of carbon atoms thereof is preferably 2 or more and 20 or less, more preferably 3 or more and 10 or less, and particularly preferably 4 or more and 6 or less. When Rf is a fluorine-containing alkyl group having an ether bond, the number of carbon atoms thereof is preferably 2 or more and 50 or less, more preferably 3 or more and 20 or less, and particularly preferably 4 or more and 6 or less.

The content of the structural unit derived from the monomer (d1) is preferably 30 mol% or more and 80 mol% or less, and 40 mol% or more and 60 mol% or less with respect to the number of moles of all the structural units of the fluororesin (D). Is more preferable. When the content of the structural unit derived from the monomer (d1) in the fluororesin (D) is within the above range, it is easy to form a bank having excellent ink repellency by using the photosensitive resin composition, and The compatibility of the fluororesin (D) with other components in the resin composition tends to be good.

The monomer (d1) preferably has a group represented by —(CF ₂ ) _t F. t is an integer of 1 or more and 10 or less, more preferably an integer of 1 or more and 8 or less, and further preferably an integer of 2 or more and 6 or less. When the monomer (d1) has the above group, it is easy to form a bank having excellent ink repellency by using the photosensitive resin composition.

[(D2) (meth)acrylic acid]
In order to improve the developability of the photosensitive resin composition, the fluororesin (D) preferably contains a structural unit derived from (d2)(meth)acrylic acid which is a monomer having a carboxy group.

The content of the structural unit derived from (d2) (meth)acrylic acid is preferably 0.1 mol% or more and 20 mol% or less based on the number of moles of all the structural units of the fluororesin (D). When the content of the structural unit derived from (d2) (meth)acrylic acid in the fluororesin (D) is within the above range, the developability is good, and a bank having excellent ink repellency can be formed. It is easy to obtain a resin composition.

If necessary, the fluorine-based resin (D) may be copolymerized with a monomer other than the above-mentioned (d1) monomer and (d2) monomer. Examples of such other monomer include various monomers described below.

[(D3) Monomer having ethylenically unsaturated group and epoxy group]
The fluororesin (D) is preferably a copolymer obtained by copolymerizing a monomer having an ethylenically unsaturated group and an epoxy group (hereinafter, also referred to as “(d3) monomer”). By copolymerizing the monomer (d3), it is possible to further improve the ink repellency of the bank formed of the photosensitive resin composition.

Examples of the (d3) monomer include glycidyl (meth)acrylate, alicyclic epoxy compounds represented by the following formulas (d3-1) to (d3-3), a carboxy group of (meth)acrylic acid and a difunctional or higher functional group. Monomers obtained by reacting with epoxy groups of epoxy compounds, monomers obtained by reacting hydroxyl groups or carboxy groups of acrylic monomers having a hydroxyl group or carboxy group in the side chain with epoxy groups of bifunctional or higher epoxy compounds, etc. Is mentioned. Of these, glycidyl (meth)acrylate is preferable. These (d3) monomers can be used alone or in combination of two or more kinds.

In Formula (d3-2) and Formula (d3-3), R ^1d is a hydrogen atom or a methyl group. u is an integer of 1 or more and 10 or less. v and w are each independently an integer of 1 or more and 3.

When the fluororesin contains a structural unit derived from the monomer (d3), the content of the structural unit in the fluororesin (D) is 1 with respect to the number of moles of all the structural units of the fluororesin (D). It is preferably in the range of mol% to 40 mol%, more preferably in the range of 5 mol% to 15 mol%. When the content of the structural unit derived from the monomer (d3) in the fluororesin (D) is within the above range, it is easy to obtain a photosensitive resin composition capable of forming a bank having good ink repellency.

[(D4) Monomer having structure represented by formula (d4-1)]
The fluororesin (D) is a copolymer obtained by further copolymerizing an ethylenically unsaturated group and a monomer having a structure represented by the following formula (d4-1) (hereinafter, also referred to as “(d4) monomer”). It is preferably a polymer. By copolymerizing the monomer (d4), it is easy to obtain a photosensitive resin composition having excellent developability, and it is possible to improve the compatibility of the fluororesin (D) with other components in the photosensitive resin composition. ..

The (d4) monomer more preferably has an ethylenically unsaturated group and a structure represented by the following formula (d4-2).

In formula (d4-1) and formula (d4-2), R ^2d is an alkylene group having 1 to 5 carbon atoms. The alkylene group may be linear or branched. As the alkylene group, an alkylene group having 1 to 3 carbon atoms is preferable, and an ethylene group is most preferable. R ^3d is a hydrogen atom, a hydroxyl group, or an alkyl group having 1 to 20 carbon atoms which may have a substituent. The alkyl group may be linear or branched. As the alkyl group, an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is most preferable. Examples of the substituent include a carboxy group, a hydroxyl group, and an alkoxy group having 1 to 5 carbon atoms. x is an integer of 1 or more. As x, an integer of 1 or more and 60 or less is preferable, and an integer of 1 or more and 12 or less is more preferable.

Examples of such (d4) monomer include compounds represented by the following formula (d4-3). These (d4) monomers can be used alone or in combination of two or more kinds.

In formula (d4-3), R ^4d is a hydrogen atom or a methyl group. R ^2d , R ^3d , and x have the same meanings as those in the formulas (d4-1) and (d4-2).

(D4) The content of the structural unit derived from the monomer is preferably 1 mol% or more and 40 mol% or less, and also 5 mol% or more 25% with respect to the number of moles of all the structural units of the fluororesin (D). The following is more preferable. When the content of the structural unit derived from the monomer (d4) is within the above range, the developability of the photosensitive resin composition and the (D) fluorine-based resin and other components in the photosensitive resin composition Compatibility tends to be good.

[(D5) Monomer having silicon atom]
The fluororesin (D) is preferably a copolymer obtained by copolymerizing a monomer having a silicon atom (hereinafter, also referred to as “(d5) monomer”). The monomer (d5) is not particularly limited as long as it has an ethylenically unsaturated group and at least one alkoxy group bonded to a silicon atom. By copolymerizing this (d5) monomer, it is possible to further improve the ink repellency of the bank formed of the photosensitive resin composition.

Examples of such (d5) monomer include compounds represented by the following formula (d5-1). These (d5) monomers may be used alone or in combination of two or more.

In formula (d5-1), R ^5d is a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and preferably a hydrogen atom or a methyl group. R ^6d is an alkylene group having 1 to 20 carbon atoms or a phenylene group, and preferably an alkylene group having 1 to 10 carbon atoms. R ^7d and R ^8d are each independently an alkyl group having 1 to 10 carbon atoms or a phenyl group, and preferably an alkyl group having 1 to 3 carbon atoms. When plural R ^7d's are bonded to Si, the plural R ^7d's may be the same or different. If a plurality of ^{(OR 8d)} are bonded to Si, the plurality of ^{(OR 8d)} may be different even in the same. p is 0 or 1, and is preferably 1. q is an integer of 1 to 3, preferably 2 or 3, and more preferably 3.

The content of the structural unit derived from the monomer (d5) is preferably 20 mol% or less, and more preferably 10 mol% or less, based on the number of moles of all the structural units of the fluororesin (D). When the content of the structural unit derived from the monomer (d5) is within the above range, the ink repellency and the compatibility with other components of the colored photosensitive resin composition tend to be good.

As the monomer other than the above-mentioned monomers, various monomers having an ethylenically unsaturated group can be used, and among them, an acrylic monomer is preferable. Suitable examples of acrylic monomers include 2-hydroxyethyl methacrylate (HEMA), N-hydroxymethyl acrylamide (N-MAA), methyl methacrylate (MAA), cyclohexyl methacrylate (CHMA), isobornyl methacrylate (IBMA), and the like. Can be mentioned. The content of the constituent units derived from these other monomers in the fluororesin (D) is preferably 0 mol% or more and 25 mol% or less with respect to the number of moles of all the constituent units of the fluororesin (D).

As a method of reacting the monomer (d1) and the monomer (d2) and optionally other monomers, a known method can be used.

The weight average molecular weight of the fluororesin (D) is preferably 2,000 or more and 50,000 or less, and more preferably 5,000 or more and 20,000 or less. When the weight average molecular weight of the fluororesin (D) is 2,000 or more, the heat resistance and strength of the bank formed using the photosensitive resin composition can be improved. When the weight average molecular weight of the fluororesin (D) is 50,000 or less, the developability of the photosensitive resin composition can be improved.

The content of the fluororesin (D) in the photosensitive resin composition is preferably 0.1% by mass or more and 10% by mass, or 0.2% by mass or more and 5% by mass, based on the solid content of the photosensitive resin composition. The following is more preferable. When the photosensitive resin composition contains the fluororesin (D) in such an amount, it is possible to impart excellent sensitivity, developability, and resolution to the photosensitive resin composition, and at the same time, the photosensitive resin composition It is easy to give good ink repellency to the ink for forming pixels to the bank formed by using.

<Colorant (E)>
The photosensitive resin composition may further contain a colorant (E). Since the photosensitive resin composition contains the colorant (E), it is preferably used for forming a colored film such as RGB in a color filter of a liquid crystal display. The photosensitive resin composition also preferably contains a light shielding agent (E1) as the colorant (E). By using the light-shielding agent (E1), a light-shielding bank that partitions pixels in a color filter, an organic EL display element, a quantum dot display, an organic TFT array, or the like can be formed. In addition, in the present application, a description will be given by including a black matrix forming a color filter in a liquid crystal display in a bank.

The colorant (E) contained in the photosensitive resin composition is not particularly limited, but is classified into Pigment in the color index (CI; issued by The Society of Dyers and Colorists), for example. It is preferable to use a compound having the following color index (C.I.) number.

Examples of suitable yellow pigments include C.I. I. Pigment Yellow 1 (hereinafter, “C.I. Pigment Yellow” is the same, and only the numbers are described.) 3, 11, 12, 13, 14, 15, 16, 17, 20, 24, 31, 53. , 55, 60, 61, 65, 71, 73, 74, 81, 83, 86, 93, 95, 97, 98, 99, 100, 101, 104, 106, 108, 109, 110, 113, 114, 116. , 117, 119, 120, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 166, 167, 168, 175, 180. , And 185.

Examples of suitable orange pigments include C.I. I. Pigment Orange 1 (hereinafter, “C.I. Pigment Orange” is the same, and only the numbers are described.) 5, 13, 14, 16, 17, 24, 34, 36, 38, 40, 43, 46 , 49, 51, 55, 59, 61, 63, 64, 71, and 73.

Examples of suitable purple pigments include C.I. I. Pigment Violet 1 (hereinafter, “C.I. Pigment Violet” is the same, and only the number will be described), 19, 23, 29, 30, 32, 36, 37, 38, 39, 40, and 50. Can be mentioned.

Examples of suitable red pigments include C.I. I. Pigment Red 1 (hereinafter, “C.I. Pigment Red” is the same, and only the numbers are described.) 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 14, 15, 16, 17, 18, 19, 21, 22, 23, 30, 31, 32, 37, 38, 40, 41, 42, 48:1, 48:2, 48:3, 48:4, 49: 1, 49:2, 50:1, 52:1, 53:1, 57, 57:1, 57:2, 58:2, 58:4, 60:1, 63:1, 63:2, 64: 1, 81:1, 83, 88, 90:1, 97, 101, 102, 104, 105, 106, 108, 112, 113, 114, 122, 123, 144, 146, 149, 150, 151, 155, 166, 168, 170, 171, 172, 174, 175, 176, 177, 178, 179, 180, 185, 187, 188, 190, 192, 193, 194, 202, 206, 207, 208, 209, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, 242, 243, 245, 254, 255, 264, and 265.

Examples of suitable blue pigments include C.I. I. Pigment Blue 1 (hereinafter, “CI Pigment Blue” is the same, and only the numbers are described.) 2, 15, 15:3, 15:4, 15:6, 16, 22, 60, 64. , And 66.

Examples of pigments having other hues that can be preferably used include C.I. I. Pigment Green 7, C.I. I. Pigment Green 36, C.I. I. Pigment Green 37, a green pigment, C.I. I. Pigment Brown 23, C.I. I. Pigment Brown 25, C.I. I. Pigment Brown 26, C.I. I. Pigment Brown 28 and the like, C.I. I. Pigment Black 1, C.I. I. Pigment Black 7 and other black pigments.

Further, when the light-shielding property is imparted to the photosensitive resin composition, the photosensitive resin composition preferably contains a black pigment as the light-shielding agent (E1). The photosensitive resin composition containing a black pigment is suitably used for forming a black matrix or a black column spacer in a liquid crystal display panel and forming a bank for partitioning a light emitting layer in an organic EL element.

Examples of black pigments include carbon black, perylene pigments, lactam pigments, titanium black, copper, iron, manganese, cobalt, chromium, nickel, zinc, calcium, silver and other metal oxides, complex oxides, metal sulfides. Various pigments can be used regardless of organic substances or inorganic substances such as organic substances, metal sulfates or metal carbonates. Among these black pigments, carbon black is preferable because it is easily available and a cured film having excellent light-shielding properties and high electric resistance is easily formed.
The hue of the black pigment is not limited to black, which is an achromatic color in chromatic theory, and may be purplish black, bluish black, or reddish black.

As the carbon black, known carbon black such as channel black, furnace black, thermal black, lamp black and the like can be used, but it is preferable to use channel black having excellent light-shielding properties. Alternatively, resin-coated carbon black may be used.

Since resin-coated carbon black has lower conductivity than carbon black without resin coating, when used as a black matrix of a liquid crystal display device such as a liquid crystal display, there is little leakage of current and high reliability. It is possible to manufacture a display with low power consumption.

As the carbon black, carbon black that has been subjected to a treatment for introducing an acidic group is also preferable. The acidic group introduced into carbon black is a functional group exhibiting acidity according to Bronsted's definition. Specific examples of the acidic group include a carboxy group, a sulfonic acid group, a phosphoric acid group and the like. The acidic group introduced into carbon black may form a salt. The cation that forms a salt with an acidic group is not particularly limited as long as it does not hinder the object of the present invention. Examples of the cation include various metal ions, cations of nitrogen-containing compounds, ammonium ions, and the like, and alkali metal ions such as sodium ions, potassium ions, and lithium ions, and ammonium ions are preferable.

Among the carbon blacks that have been subjected to the treatment for introducing an acidic group described above, from the viewpoint of achieving high resistance of the light-shielding cured film formed using the photosensitive resin composition, a carboxylic acid group and a carboxylic acid are used. Carbon black having one or more functional groups selected from the group consisting of a base, a sulfonate group, and a sulfonate group is preferable.

The method of introducing an acidic group into carbon black is not particularly limited. Examples of the method of introducing an acidic group include the following methods.
1) A method of introducing a sulfonic acid group into carbon black by a direct substitution method using concentrated sulfuric acid, fuming sulfuric acid, chlorosulfonic acid or the like, or an indirect substitution method using sulfite, hydrogen sulfite or the like.
2) A method of diazo coupling carbon black with an organic compound having an amino group and an acidic group.
3) A method of reacting an organic compound having a halogen atom and an acidic group with carbon black having a hydroxyl group by Williamson's etherification method.
4) A method of reacting an organic compound having a halocarbonyl group and an acidic group protected by a protecting group with carbon black having a hydroxyl group.
5) A method in which a Friedel-Crafts reaction is performed on carbon black using an organic compound having a halocarbonyl group and an acidic group protected by a protecting group, and then deprotection is performed.

Among these methods, the method 2) is preferable because the acidic group introduction treatment is easy and safe. The organic compound having an amino group and an acidic group used in the method 2) is preferably a compound in which an amino group and an acidic group are bonded to an aromatic group. Examples of such compounds include aminobenzene sulfonic acids such as sulfanilic acid and aminobenzoic acids such as 4-aminobenzoic acid.

The number of moles of acidic groups introduced into carbon black is not particularly limited as long as the object of the present invention is not impaired. The number of moles of acidic groups introduced into carbon black is preferably 1 mmol or more and 200 mmol or less, and more preferably 5 mmol or more and 100 mmol or less with respect to 100 g of carbon black.

The carbon black introduced with an acidic group may be coated with a resin.
When a photosensitive resin composition containing carbon black coated with a resin is used, a light-shielding cured film having excellent light-shielding properties and insulating properties and low surface reflectance can be easily formed. Note that the coating treatment with the resin does not cause any adverse effect on the dielectric constant of the light-shielding cured film formed using the photosensitive resin composition. Examples of resins that can be used to coat carbon black include phenol resins, melamine resins, xylene resins, diallyl phthalate resins, glyptal resins, epoxy resins, thermosetting resins such as alkylbenzene resins, polystyrene, polycarbonate, polyethylene terephthalate, and poly Examples thereof include thermoplastic resins such as butylene terephthalate, modified polyphenylene oxide, polysulfone, polyparaphenylene terephthalamide, polyamideimide, polyimide, polyaminobismaleimide, polyethersulfopolyphenylene sulfone, polyarylate and polyetheretherketone. The coating amount of the resin on the carbon black is preferably 1% by mass or more and 30% by mass or less based on the total of the mass of the carbon black and the mass of the resin.

Further, as the black pigment, a perylene pigment can also be preferably used. Specific examples of the perylene-based pigment include a perylene-based pigment represented by the following formula (e-1), a perylene-based pigment represented by the following formula (e-2), and a perylene-based pigment represented by the following formula (e-3). Perylene pigments. Among commercially available products, product names K0084 and K0086 manufactured by BASF and pigment blacks 21, 30, 31, 32, 33, 34 and the like can be preferably used as the perylene-based pigment.

式（ｅ−１）中、Ｒ^ｅ１及びＲ^ｅ２は、それぞれ独立に炭素原子数１以上３以下のアルキレン基を表し、Ｒ^ｅ３及びＲ^ｅ４は、それぞれ独立に、水素原子、水酸基、メトキシ基、又はアセチル基を表す。

In formula (e-1), R ^e1 and R ^e2 each independently represent an alkylene group having 1 to 3 carbon atoms, and R ^e3 and R ^e4 are each independently a hydrogen atom, a hydroxyl group, a methoxy group, Or represents an acetyl group.

式（ｅ−２）中、Ｒ^ｅ５及びＲ^ｅ６は、それぞれ独立に、炭素原子数１以上７以下のアルキレン基を表す。

In formula (e-2), R ^e5 and R ^e6 each independently represent an alkylene group having 1 to 7 carbon atoms.

式（ｅ−３）中、Ｒ^ｅ７及びＲ^ｅ８は、それぞれ独立に、水素原子、炭素原子数１以上２２以下のアルキル基であり、Ｎ，Ｏ、Ｓ、又はＰのヘテロ原子を含んでいてもよい。Ｒ^ｅ７及びＲ^ｅ８がアルキル基である場合、当該アルキル基は、直鎖状であっても、分岐鎖状であってもよい。

In formula (e-3), R ^e7 and R ^e8 are each independently a hydrogen atom, an alkyl group having 1 to 22 carbon atoms, and containing a hetero atom of N, O, S, or P. Good. When R ^e7 and R ^e8 are alkyl groups, the alkyl groups may be linear or branched.

The compound represented by the formula (e-1), the compound represented by the formula (e-2), and the compound represented by the formula (e-3) are described in, for example, JP-A-62-1753. It can be synthesized using the method described in JP-B-63-26784. That is, perylene-3,5,9,10-tetracarboxylic acid or its dianhydride and amines are used as raw materials, and a heating reaction is performed in water or an organic solvent. Then, the target product can be obtained by reprecipitating the obtained crude product in sulfuric acid or recrystallizing it in water, an organic solvent or a mixed solvent thereof.

In order to favorably disperse the perylene pigment in the photosensitive resin composition, the average particle size of the perylene pigment is preferably 10 nm or more and 1000 nm or less.

Further, a lactam pigment can be contained as the light shielding agent (E1). Examples of lactam pigments include compounds represented by the following formula (e-4).

In the formula (e-4), X ^e represents a double bond, and each is a geometric isomer, which is independently an E form or a Z form, and R ^e9 is independently a hydrogen atom, a methyl group, a nitro group, or methoxy. A group, a bromine atom, a chlorine atom, a fluorine atom, a carboxy group, or a sulfo group, R ^e10's each independently represent a hydrogen atom, a methyl group, or a phenyl group, and R ^e11's each independently represent a hydrogen atom. , Methyl group or chlorine atom.
The compound represented by the formula (e-4) can be used alone or in combination of two or more kinds.
R ^e9 is preferably bonded to the 6-position of the dihydroindolone ring from the viewpoint of easy production of the compound represented by the formula (e-4), and R ^e11 is bonded to the 4-position of the dihydroindolone ring. Preferably. From the same viewpoint, R ^e9 , R ^e10 , and R ^e11 are preferably hydrogen atoms.
The compound represented by the formula (e-4) has EE isomers, ZZ isomers, and EZ isomers as geometric isomers, but it may be a single compound of any of these isomers, May be a mixture of.
The compound represented by the formula (e-4) can be produced, for example, by the method described in International Publication No. 2000/24736 and International Publication No. 2010/081624.

In order to satisfactorily disperse the lactam pigment in the photosensitive resin composition, the average particle diameter of the lactam pigment is preferably 10 nm or more and 1000 nm or less.

Further, fine particles containing a silver tin (AgSn) alloy as a main component (hereinafter referred to as “AgSn alloy fine particles”) are also preferably used as a black pigment. The AgSn alloy fine particles only need to contain an AgSn alloy as a main component, and may contain Ni, Pd, Au or the like as another metal component.
The average particle diameter of the AgSn alloy fine particles is preferably 1 nm or more and 300 nm or less.

When the AgSn alloy is represented by the chemical formula AgxSn, the range of x in which a chemically stable AgSn alloy is obtained is 1≦x≦10, and the range of x in which chemical stability and blackness are simultaneously obtained is 3≦x≦4.
Here, when the mass ratio of Ag in the AgSn alloy is calculated in the range of x,
When x=1, Ag/AgSn=0.4762
When x=3, 3·Ag/Ag3Sn=0.7317
When x=4, 4·Ag/Ag4Sn=0.7843
When x=10, 10·Ag/Ag10Sn=0.908
Becomes
Therefore, this AgSn alloy becomes chemically stable when Ag is contained in an amount of 47.6% by mass or more and 90% by mass or less, and Ag is contained in an amount of 73.17% by mass or more and 78.43% by mass or less. Chemical stability and blackness can be effectively obtained with respect to the amount.

The AgSn alloy fine particles can be produced by using an ordinary fine particle synthesis method. Examples of the fine particle synthesis method include a gas phase reaction method, a spray pyrolysis method, an atomization method, a liquid phase reaction method, a freeze-drying method, and a hydrothermal synthesis method.

The AgSn alloy fine particles have a high insulating property, but the surface may be covered with an insulating film in order to further improve the insulating property depending on the use of the photosensitive resin composition. As a material of such an insulating film, a metal oxide or an organic polymer compound is suitable.
As the metal oxide, a metal oxide having an insulating property, for example, silicon oxide (silica), aluminum oxide (alumina), zirconium oxide (zirconia), yttrium oxide (yttria), titanium oxide (titania), or the like is preferably used. Be done.
Further, as the organic polymer compound, a resin having an insulating property, for example, polyimide, polyether, polyacrylate, polyamine compound or the like is preferably used.

The thickness of the insulating film is preferably 1 nm or more and 100 nm or less, and more preferably 5 nm or more and 50 nm or less in order to sufficiently enhance the insulating property of the surface of the AgSn alloy fine particles.
The insulating film can be easily formed by a surface modification technique or a surface coating technique. In particular, it is preferable to use an alkoxide such as tetraethoxysilane or aluminum triethoxide because an insulating film having a uniform thickness can be formed at a relatively low temperature.

As the black pigment, the above-mentioned perylene pigment, lactam pigment, and AgSn alloy fine particles may be used alone or in combination.
In addition, the black pigment may contain a dye having a hue such as red, blue, green, or yellow for the purpose of adjusting the color tone. The dye of another hue of the black pigment can be appropriately selected from known dyes. For example, the above-mentioned various pigments can be used as the dye having other hue than the black pigment. The amount of the dye of another hue of the black pigment used is preferably 15% by mass or less, and more preferably 10% by mass or less, based on the total mass of the black pigment.

A black composition containing two or more kinds of black or chromatic pigments and/or dyes in combination can be used together with the above-described black pigment or in place of the black pigment.
The content of carbon black in the black composition is preferably 3% by mass or less. By using a black composition having a carbon black content of 3% by mass or less, it is easy to suppress the generation of floating substances and development residues after development.
The content of carbon black in the black composition is more preferably 2% by mass or less, further preferably 1% by mass or less, and particularly preferably 0% by mass.

The hue of the pigment and dye contained in the black composition is not particularly limited. The black composition may include a black pigment and/or dye. The black composition may be a combination of multiple black colorants. In this case, as the black colorant, for example, perylene black, aniline black, a black azo compound or the like can be used.
The black composition may be blended with two or more kinds of pigments and/or dyes having a hue other than black so that the composition exhibits a black color.

Since it is possible to finely adjust the hue of black and it is easy to suppress the generation of floating matters and development residues after development, the black composition has a plurality of types than a colorant composed of a single type of colorant. The combination of the chromatic colorants is preferable.

The black composition is preferably, for example, a combination of two or more kinds of organic pigments selected from organic pigments of five colors of blue, purple, yellow, red, and orange.
By combining two or more organic pigments among the above five organic pigments, a pseudo-blackened hue can be obtained. Here, the "pseudo black" is ideally a chromatic black color, but may be any hue that is acceptable in the application of the black film formed using the black composition.

The ratio (mass ratio) of the organic pigment of each hue in the black composition exhibiting a pseudo black is preferably (blue organic pigment)/(yellow organic pigment+orange organic pigment)/(red organic pigment+purple organic pigment)= (30 mass% or more and 60 mass% or less)/(0 mass% or more and 50 mass% or less)/(5 mass% or more and 70 mass% or less).

Known organic pigments that have been conventionally used can be used as the above five-color organic pigments.
Examples of blue organic pigments include C.I. I. Pigment Blue 15:3, C.I. I. Pigment Blue 15:4, C.I. I. Pigment Blue 15:6, and C.I. I. Pigment Blue 60 can be mentioned.
Examples of purple organic pigments include C.I. I. Pigment Violet 19, and C.I. I. Pigment Violet 23 can be mentioned.
Examples of the yellow organic pigment include C.I. I. Pigment Yellow 83, C.I. I. Pigment Yellow 110, C.I. I. Pigment Yellow 128, C.I. I. Pigment Yellow 138, C.I. I. Pigment Yellow 139, C.I. I. Pigment Yellow 150, C.I. I. Pigment Yellow 151, C.I. I. Pigment Yellow 154, C.I. I. Pigment Yellow 155, C.I. I. Pigment Yellow 180, and C.I. I. Pigment Yellow 181 can be mentioned.
Examples of orange organic pigments include C.I. I. Pigment Orange 38, C.I. I. Pigment Orange 43, C.I. I. Pigment Orange 64, C.I. I. Pigment Orange 69, C.I. I. Pigment Orange 71, and C.I. I. Pigment Orange 73 can be mentioned.
Examples of red organic pigments include C.I. I. Pigment Red 122, C.I. I. Pigment Red 166, C.I. I. Pigment Red 177, C.I. I. Pigment Red 179, C.I. I. Pigment Red 242, C.I. I. Pigment Red 224, C.I. I. Pigment Red 254, C.I. I. Pigment Red 256, C.I. I. Pigment Red 264, and C.I. I. Pigment Red 272 may be mentioned.

Among them, the blue organic pigment is C.I. I. Pigment Blue 15:3, C.I. I. Pigment Blue 15:4, and C.I. I. Pigment Blue 15:6, which is at least one selected from the group consisting of C.I. I. Pigment Violet 23, and the yellow organic pigment is C.I. I. Pigment Yellow 83 and/or C.I. I. Pigment Yellow 139, and the orange organic pigment is C.I. I. Pigment Orange 43 and/or C.I. I. Pigment Orange 64, and the red organic pigment is C.I. I. Pigment Red 254 and/or C.I. I. Pigment Red 256 is preferable.
By using these organic pigments in combination, it is easy to form a black cured film having a good black hue and an excellent optical density (OD value).
It

In order to obtain a pseudo-black black composition, it is preferable to combine at least one selected from blue organic pigments, yellow organic pigments, and orange organic pigments. These organic pigments and red organic pigments are preferably combined. And more preferably at least one organic pigment selected from purple organic pigments.
Specific combinations of pigments belonging to organic pigments of respective colors include, for example,
C. I. Pigment Blue 15:4 and C.I. I. Pigment Yellow 139 and C.I. I. Pigment Red 254,
C. I. Pigment Blue 15:6 and C.I. I. Pigment Orange 64 and C.I. I. Pigment Violet 23,
C. I. Pigment Blue 15:4 or 15:3 and C.I. I. Pigment Yellow 83 and C.I. I. Pigment Violet 23 and C.I. I. Pigment Red 254, and
C. I. Pigment Blue 15:6 and C.I. I. Pigment Violet 23 and C.I. I. Pigment Red 256 and the like are preferable.

In order to uniformly disperse the colorant (E) in the photosensitive resin composition, a dispersant may be further used. As such a dispersant, it is preferable to use a polyethyleneimine-based, urethane resin-based, or acrylic resin-based polymer dispersant. In particular, when carbon black is used as the colorant (E), it is preferable to use an acrylic resin-based dispersant as the dispersant.
Note that a corrosive gas caused by the dispersant may be generated from the cured film. Therefore, it is also an example of a preferred embodiment that the pigment is subjected to dispersion treatment without using a dispersant.

In the photosensitive resin composition, a pigment and a dye may be used in combination. This dye may be appropriately selected from known materials.
Examples of dyes applicable to the photosensitive resin composition include azo dyes, metal complex salt azo dyes, anthraquinone dyes, triphenylmethane dyes, xanthene dyes, cyanine dyes, naphthoquinone dyes, quinoneimine dyes, methine dyes, and phthalocyanine dyes. Can be mentioned.
In addition, these dyes can be used as a colorant (E) by dispersing (forming chloride) in an organic solvent or the like.
In addition to these dyes, for example, JP2013-225132A, JP2014-178477A, JP2013-137543A, JP2011-38085A, JP2014-197206A, and the like. The described dyes and the like can also be preferably used.

The amount of the colorant (E) used in the photosensitive resin composition can be appropriately selected within a range that does not impair the object of the present invention. Typically, the amount of the colorant (E) used is preferably 2% by mass or more and 75% by mass or less, and 3% by mass or more and 70% by mass or less based on the total mass of the solid content of the photosensitive resin composition. More preferable.

Particularly, when the black matrix is formed using the photosensitive resin composition, the amount of the light-shielding agent (E1) in the photosensitive resin composition is adjusted so that the OD value per 1 μm of the black matrix film is 4 or more. It is preferable to adjust. When the OD value per 1 μm of the coating in the black matrix is 4 or more, a sufficient display contrast can be obtained when used in the black matrix of a liquid crystal display.

When a pigment is used as the colorant (E), it is preferable that the pigment is dispersed in the presence or absence of a dispersant at a suitable concentration and then added to the photosensitive resin composition.
In the present specification, the amount of the above-mentioned pigment used can be defined as a value including the existing dispersant.

<Imidazole generator (F)>
The photosensitive resin composition may include an imidazole generator (F) that generates an imidazole compound represented by the following formula (F1) upon exposure. When the photosensitive resin composition contains such an imidazole generator (F), the photosensitive resin composition is easily cured well by exposure, and a cured film having a good cross-sectional shape and patterned is easily formed. ..

式（Ｆ１）中、Ｒ^ｆ１、Ｒ^ｆ２、及びＲ^ｆ３は、それぞれ独立に水素原子、ハロゲン原子、水酸基、メルカプト基、スルフィド基、シリル基、シラノール基、ニトロ基、ニトロソ基、スルホナト基、ホスフィノ基、ホスフィニル基、ホスホナト基、又は有機基である。

In formula (F1), R ^f1 , R ^f2 , and R ^f3 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfonate group, a phosphino group. A group, a phosphinyl group, a phosphonate group, or an organic group.

In the imidazole compound represented by the formula (F1), examples of the organic group for R ^f1 , R ^f2 , and R ^f3 include an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group, and an aralkyl group. Be done. The organic group may contain a bond or a substituent other than a hydrocarbon group such as a hetero atom. The organic group may be linear, branched or cyclic. The organic group is usually monovalent, but when forming a cyclic structure, it can be a divalent or higher organic group.

R ^f1 and R ^f2 may be bonded to each other to form a cyclic structure, and may further include a bond of a hetero atom. Examples of the cyclic structure include a heterocycloalkyl group and a heteroaryl group, which may be a condensed ring.

The bond contained in the organic group of R ^f1 , R ^f2 , and R ^f3 is not particularly limited as long as the effects of the present invention are not impaired, and the organic group contains a hetero atom such as an oxygen atom, a nitrogen atom, or a silicon atom. It may include a bond. Specific examples of the bond containing a hetero atom include an ether bond, a thioether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, an amide bond, a urethane bond, an imino bond (-N=C(-R)-, -C(= NR)-:R represents a hydrogen atom or a monovalent organic group), a carbonate bond, a sulfonyl bond, a sulfinyl bond, an azo bond and the like.

When the organic group as R ^f1 , R ^f2 , and R ^f3 is a substituent other than a hydrocarbon group, R ^f1 , R ^f2 , and R ^f3 are not particularly limited as long as the effects of the present invention are not impaired. Specific examples of R ^f1 , R ^f2 , and R ^f3 include a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, a cyanato group, an isocyanato group, a thiocyanato group, an isothiocyanato group, a silyl group, a silanol group, Alkoxy group, alkoxycarbonyl group, carbamoyl group, thiocarbamoyl group, nitro group, nitroso group, carboxylate group, acyl group, acyloxy group, sulfino group, sulfonato group, phosphino group, phosphinyl group, phosphonate group, alkyl ether group, alkenyl group Examples thereof include an ether group, an alkylthioether group, an alkenylthioether group, an arylether group, and an arylthioether group. The hydrogen atom contained in the above substituent may be substituted with a hydrocarbon group. The hydrocarbon group contained in the above-mentioned substituent may be linear, branched or cyclic.

R ^f1 , R ^f2 , and R ^f3 are each a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, an alkoxy group having 1 to 12 carbon atoms, and halogen. Atoms are preferred and hydrogen atoms are more preferred.

The imidazole generator (F) is not particularly limited as long as it is a compound capable of generating the imidazole compound represented by the formula (F1) upon exposure.
As the imidazole generator (F), for example, in a known photosensitive amine generator, a group derived from an amine generated by the amine generator is replaced with a group derived from an imidazole compound represented by the formula (F1). The compound can be used.

From the viewpoint of compatibility with the components contained in the photosensitive resin composition, examples of a suitable imidazole generator (F) include compounds represented by the following formula (F1-1).

式（Ｆ１−１）中、Ｒ^ｆ１、Ｒ^ｆ２、及びＲ^ｆ３は、式（Ｆ１）と同様である。
Ｒ^ｆ１１及びＲ^ｆ１２は、それぞれ独立に水素原子、ハロゲン原子、水酸基、メルカプト基、スルフィド基、シリル基、シラノール基、ニトロ基、ニトロソ基、スルフィノ基、スルホ基、スルホナト基、ホスフィノ基、ホスフィニル基、ホスホノ基、ホスホナト基、又は有機基である。Ｒ^ｆ１３、Ｒ^ｆ１４、Ｒ^ｆ１５、Ｒ^ｆ１６、及びＲ^ｆ１７は、それぞれ独立に水素原子、ハロゲン原子、水酸基、メルカプト基、スルフィド基、シリル基、シラノール基、ニトロ基、ニトロソ基、スルフィノ基、スルホ基、スルホナト基、ホスフィノ基、ホスフィニル基、ホスホノ基、ホスホナト基、アミノ基、アンモニオ基、又は有機基である。Ｒ^ｆ１３、Ｒ^ｆ１４、Ｒ^ｆ１５、Ｒ^ｆ１６、及びＲ^ｆ１７は、それらの２つ以上が結合して環状構造を形成していてもよく、ヘテロ原子の結合を含んでいてもよい。
で表される化合物が挙げられる。

In formula (F1-1), R ^f1 , R ^f2 , and R ^f3 are the same as in formula (F1).
R ^f11 and R ^f12 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonate group, a phosphino group, a phosphinyl group. , A phosphono group, a phosphonato group, or an organic group. R ^f13 , R ^f14 , R ^f15 , R ^f16 and R ^f17 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group. A group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonate group, an amino group, an ammonio group, or an organic group. Two or more of R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 may be bonded to each other to form a cyclic structure, or may include a heteroatom bond.
The compound represented by

Examples of the organic group for R ^f11 and R ^f12 include the organic groups exemplified for R ^f1 , R ^f2 , and R ^f3 in the formula (F1). The organic group as R ^f11 and R ^f12 may include a hetero atom in the organic group, as in the case of R ^f1 , R ^f2 , and R ^f3 . The organic group may be linear, branched or cyclic.

Among them, R ^f11 and R ^f12 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 4 to 13 carbon atoms, or a cycloalkyl group having 4 to 13 carbon atoms. Alkenyl group, aryloxyalkyl group having 7 to 16 carbon atoms, aralkyl group having 7 to 20 carbon atoms, alkyl group having 2 to 11 carbon atoms having a cyano group, and 1 carbon atom having a hydroxyl group An alkyl group having 10 or less, an alkoxy group having 1 to 10 carbon atoms, an amide group having 2 to 11 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, an acyl group having 1 to 10 carbon atoms, Substituted with an ester group having 2 to 11 carbon atoms (-COOR, -OCOR: R represents a hydrocarbon group), an aryl group having 6 to 20 carbon atoms, an electron donating group and/or an electron withdrawing group. An aryl group having 6 to 20 carbon atoms, a benzyl group substituted with an electron-donating group and/or an electron-withdrawing group, a cyano group, and a methylthio group are preferable. More preferably, both R ^f11 and R ^f12 are hydrogen atoms, or R ^f11 is a methyl group and R ^f12 is a hydrogen atom.

In formula (F1-1), R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group. , A nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group.

^Examples of the organic group as R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 include the organic groups exemplified for R ^f1 , R ^f2 , and R ^f3 in the formula (F1). The organic group as R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 may have a hetero atom in the organic group, as in the case of R ^f1 , R ^f2 , and R ^f3 . The organic group may be linear, branched or cyclic.

Two or more of R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 may be bonded to each other to form a cyclic structure, or may include a heteroatom bond. Examples of the cyclic structure include a heterocycloalkyl group and a heteroaryl group, which may be a condensed ring. For example, R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 are two or more of them bonded to each other, and R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 are bonded to benzene. The ring atoms may be shared to form a condensed ring such as naphthalene, anthracene, phenanthrene, and indene.

Among the above, R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, or a cycloalkyl group having 4 to 13 carbon atoms. A cycloalkenyl group having 4 to 13 carbon atoms, an aryloxyalkyl group having 7 to 16 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, and an alkyl having 2 to 11 carbon atoms having a cyano group Group, an alkyl group having 1 to 10 carbon atoms having a hydroxyl group, an alkoxy group having 1 to 10 carbon atoms, an amide group having 2 to 11 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, carbon An acyl group having 1 to 10 carbon atoms, an ester group having 2 to 11 carbon atoms, an aryl group having 6 to 20 carbon atoms, and 6 carbon atoms substituted with an electron-donating group and/or an electron-withdrawing group. It is preferably a benzyl group, a cyano group, a methylthio group or a nitro group substituted with 20 or more aryl groups, electron-donating groups and/or electron-withdrawing groups.

Further, as R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 , two or more of them are bonded, and R ^f13 , R ^f14 , R ^f15 , R ^f16 , and R ^f17 are bonded. It is also preferable that the atoms of the benzene ring are shared to form a condensed ring of naphthalene, anthracene, phenanthrene, indene or the like.

Among the compounds represented by the above formula (F1-1), the compound represented by the following formula (F1-2) is preferable.

式（Ｆ１−２）中、Ｒ^ｆ１、Ｒ^ｆ２、及びＲ^ｆ３は、式（Ｆ１）と同様である。Ｒ^ｆ１１〜Ｒ^ｆ１６は式（Ｆ１−１）と同様である。Ｒ^ｆ１８は、水素原子又は有機基を示す。式（Ｆ１−２）において、Ｒ^ｆ１３及びＲ^ｆ１４が水酸基となることはない。Ｒ^ｆ１３、Ｒ^ｆ１４、Ｒ^ｆ１５、及びＲ^ｆ１６は、それらの２つ以上が結合して環状構造を形成していてもよく、ヘテロ原子の結合を含んでいてもよい。

In formula (F1-2), R ^f1 , R ^f2 , and R ^f3 are the same as in formula (F1). R ^{f11 to} R ^f16 are the same as in formula (F1-1). R ^f18 represents a hydrogen atom or an organic group. In Formula (F1-2), R ^f13 and R ^f14 do not become a hydroxyl group. Two or more of R ^f13 , R ^f14 , R ^f15 , and R ^f16 may be bonded to each other to form a cyclic structure, or may include a bond of a hetero atom.

Since the compound represented by formula (F1-2) has the substituent —O—R ^f18 , the compound has particularly ^good affinity with each component contained in the photosensitive resin composition.

In formula (F1-2), R ^f18 is a hydrogen atom or an organic group. When R ^f18 is an organic group, examples of the organic group include the organic groups exemplified for R ^f1 , R ^f2 , and R ^f3 in the formula (F1). The organic group may contain a hetero atom in the organic group. The organic group may be linear, branched or cyclic. As R ^f18 , a hydrogen atom or an alkyl group having 1 to 12 carbon atoms is preferable, and a methyl group is more preferable.

Specific examples of compounds particularly suitable as the compound represented by formula (F1-1) are shown below.

The compound represented by the following formula (F1-2) is also preferable as the imidazole generator (F).

式（Ｆ１−２）中、Ｒ^ｆ１、Ｒ^ｆ２、及びＲ^ｆ３は、式（Ｆ１）と同様である。Ｒ^ｆ２１は、水素原子、又は１価の有機基である。Ｒ^ｆ２２は置換基を有してもよい芳香族基である。Ｒ^ｆ２１は他方のＲ^ｆ２１又はＲ^ｆ２２と結合して環状構造を形成してもよい。

In formula (F1-2), R ^f1 , R ^f2 , and R ^f3 are the same as in formula (F1). R ^f21 is a hydrogen atom or a monovalent organic group. R ^f22 is an aromatic group which may have a substituent. R ^f21 may ^combine with the other R ^f21 or R ^f22 to form a cyclic structure.

In formula (F1-2), R ^f21 is a hydrogen atom or a monovalent organic group. The monovalent organic group is not particularly limited and may be, for example, an alkyl group which may have a substituent or an aromatic group which may have a substituent. When R ^f21 is an alkyl group, the alkyl group may have an ester bond or the like in the chain.

The alkyl group may be the same as R ^f24 and the like in the formula (F1-2-1) described later, for example. The number of carbon atoms in the alkyl group is preferably 1 or more and 40 or less, more preferably 1 or more and 30 or less, particularly preferably 1 or more and 20 or less, and most preferably 1 or more and 10 or less.
The substituent that the alkyl group may have may be the same as the substituent that the alkylene group that is R ^f25 in the formula (F1-2-1) described later may have, for example.

The aromatic group which may have a substituent is the same as R ^f22 in the formula (F1-2-1) described later, an aryl group is preferable, and a phenyl group is more preferable. The aromatic group which may have a substituent as R ^f21 may be the same as or different from R ^f22 .
In formula (F1-2), one R ^f21 is preferably a hydrogen atom, one R ^f21 is a hydrogen atom, and the other R ^f21 has an alkyl group or a substituent which may have a substituent. It is more preferably an aromatic group that may be used.
In formula (F1-2), R ^f21 may ^combine with the other R ^f21 or R ^f22 to form a cyclic structure. For example, when at least one R ^f21 is an alkyl group which may have a substituent, R ^f21 may ^combine with the other R ^f21 or R ^f22 to form a cyclic structure.

The compound represented by the formula (F1-2) may be a compound represented by the following formula (F1-2-1).

式（Ｆ１−２−１）中、Ｒ^ｆ１、Ｒ^ｆ２、及びＲ^ｆ３は、式（Ｆ１）と同様である。Ｒ^ｆ２３は水素原子又はアルキル基である。Ｒ^ｆ２２は置換基を有してもよい芳香族基である。Ｒ^ｆ２４は置換基を有してもよいアルキレン基である。Ｒ^ｆ２４はＲ^ｆ２２と結合して環状構造を形成してもよい。

In formula (F1-2-1), R ^f1 , R ^f2 , and R ^f3 are the same as formula (F1). R ^f23 is a hydrogen atom or an alkyl group. R ^f22 is an aromatic group which may have a substituent. R ^f24 is an alkylene group which may have a substituent. R ^f24 may combine with R ^f22 to form a cyclic structure.

In formula (F1-2-1), R ^f23 is a hydrogen atom or an alkyl group. When R ^f23 is an alkyl group, the alkyl group may be a straight chain alkyl group or a branched chain alkyl group. The number of carbon atoms of the alkyl group is not particularly limited, but is preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and more preferably 1 or more and 5 or less.

Specific examples of the alkyl group suitable as R ^f23 include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an n-pentyl group, Isopentyl group, tert-pentyl group, n-hexyl group, n-heptyl group, n-octyl group, 2-ethyl-n-hexyl group, n-nonyl group, n-decyl group, n-undecyl group, n-dodecyl group Group, n-tridecyl group, n-tetradecyl group, n-pentadecyl group, n-hexadecyl group, n-heptadecyl group, n-octadecyl group, n-nonadecyl group, and n-icosyl group.

In formula (F1-2-1), R ^f22 is an aromatic group which may have a substituent. The aromatic group which may have a substituent may be an aromatic hydrocarbon group which may have a substituent, or an aromatic heterocyclic group which may have a substituent.

The type of aromatic hydrocarbon group is not particularly limited as long as the object of the present invention is not impaired. The aromatic hydrocarbon group may be a monocyclic aromatic group, may be formed by condensing two or more aromatic hydrocarbon groups, and may be two or more aromatic hydrocarbon groups. May be formed by binding with a single bond. As the aromatic hydrocarbon group, a phenyl group, a naphthyl group, a biphenylyl group, an anthryl group and a phenanthrenyl group are preferable.

The type of aromatic heterocyclic group is not particularly limited as long as it does not hinder the object of the present invention. The aromatic heterocyclic group may be a monocyclic group or a polycyclic group. As the aromatic heterocyclic group, a pyridyl group, a furyl group, a thienyl group, an imidazolyl group, a pyrazolyl group, an oxazolyl group, a thiazolyl group, an isoxazolyl group, an isothiazolyl group, a benzoxazolyl group, a benzothiazolyl group and a benzimidazolyl group are preferable.

The phenyl group, the polycyclic aromatic hydrocarbon group, or the substituent which the aromatic heterocyclic group may have, is a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group. , Sulfino groups, sulfo groups, sulfonato groups, phosphino groups, phosphinyl groups, phosphono groups, phosphonato groups, amino groups, ammonio groups, and organic groups. When the phenyl group, the polycyclic aromatic hydrocarbon group or the aromatic heterocyclic group has a plurality of substituents, the plurality of substituents may be the same or different.

When the substituent that the aromatic group has is an organic group, examples of the organic group include an alkyl group, an alkenyl group, a cycloalkyl group, a cycloalkenyl group, an aryl group, and an aralkyl group. This organic group may contain a bond or a substituent other than a hydrocarbon group such as a hetero atom in the organic group. Further, this organic group may be linear, branched, cyclic, or a combination of these structures. This organic group is usually monovalent, but when forming a cyclic structure, it can be a divalent or higher valent organic group.

When an aromatic group has a substituent on adjacent carbon atoms, the two substituents attached on adjacent carbon atoms may combine to form a cyclic structure. Examples of the cyclic structure include an aliphatic hydrocarbon ring and an aliphatic ring containing a hetero atom.

When the substituent that the aromatic group has is an organic group, the bond contained in the organic group is not particularly limited as long as the effects of the present invention are not impaired, and the organic group is an oxygen atom, a nitrogen atom, a silicon atom, or the like. And may contain a bond containing a heteroatom. Specific examples of the bond containing a hetero atom include an ether bond, a thioether bond, a carbonyl bond, a thiocarbonyl bond, an ester bond, an amide bond, a urethane bond, an imino bond (-N=C(-R)-, -C(= NR)-:R represents a hydrogen atom or an organic group), a carbonate bond, a sulfonyl bond, a sulfinyl bond, an azo bond and the like.

When the organic group is a substituent other than the hydrocarbon group, the type of the substituent other than the hydrocarbon group is not particularly limited as long as the object of the present invention is not impaired. Specific examples of the substituent other than the hydrocarbon group include a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a cyano group, an isocyano group, a cyanato group, an isocyanato group, a thiocyanato group, an isothiocyanato group, a silyl group, a silanol group, an alkoxy group. , Alkoxycarbonyl group, amino group, monoalkylamino group, dialkylaluminum group, monoarylamino group, diarylamino group, carbamoyl group, thiocarbamoyl group, nitro group, nitroso group, carboxylate group, acyl group, acyloxy group, sulfino Examples thereof include a group, a sulfonate group, a phosphino group, a phosphinyl group, a phosphonate group, an alkyl ether group, an alkenyl ether group, an alkylthioether group, an alkenylthioether group, an aryl ether group and an arylthioether group. The hydrogen atom contained in the above substituent may be substituted with a hydrocarbon group. The hydrocarbon group contained in the above-mentioned substituent may be linear, branched or cyclic.

The phenyl group, the polycyclic aromatic hydrocarbon group, or the aromatic heterocyclic group has a substituent having an alkyl group having 1 to 12 carbon atoms, an aryl group having 1 to 12 carbon atoms, and 1 carbon atom. The above alkoxy groups having 12 or less, the aryloxy groups having 1 to 12 carbon atoms, the arylamino groups having 1 to 12 carbon atoms, and the halogen atoms are preferable.

As R ^f22 , an imidazole compound represented by Formula (F1-2) or Formula (F1-2-1) can be inexpensively and easily synthesized, and the solubility of the imidazole compound in water or an organic solvent is good. A phenyl group, a furyl group, and a thienyl group, each of which may have a substituent, are preferable.

In formula (F1-2-1), R ^f24 is an alkylene group which may have a substituent. The substituent that the alkylene group may have is not particularly limited as long as the object of the present invention is not impaired. Specific examples of the substituent that the alkylene group may have include a hydroxyl group, an alkoxy group, an amino group, a cyano group, and a halogen atom. The alkylene group may be a linear alkylene group or a branched alkylene group, and a linear alkylene group is preferable. The number of carbon atoms of the alkylene group is not particularly limited, preferably 1 or more and 20 or less, more preferably 1 or more and 10 or less, and particularly preferably 1 or more and 5 or less. The carbon atom number of the alkylene group does not include the carbon atom of the substituent bonded to the alkylene group.

The alkoxy group as a substituent bonded to the alkylene group may be a straight chain alkoxy group or a branched chain alkoxy group. The number of carbon atoms of the alkoxy group as a substituent is not particularly limited, preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and particularly preferably 1 or more and 3 or less.

The amino group as a substituent bonded to the alkylene group may be a monoalkylamino group or a dialkylamino group. The alkyl group contained in the monoalkylamino group or the dialkylamino group may be a linear alkyl group or a branched alkyl group. The number of carbon atoms of the alkyl group contained in the monoalkylamino group or the dialkylamino group is not particularly limited, is preferably 1 or more and 10 or less, more preferably 1 or more and 6 or less, and particularly preferably 1 or more and 3 or less.

Specific examples of the alkylene group suitable as R ^f24 include methylene group, ethane-1,2-diyl group, n-propane-1,3-diyl group, n-propane-2,2-diyl group, n-butane. -1,4-diyl group, n-pentane-1,5-diyl group, n-hexane-1,6-diyl group, n-heptane-1,7-diyl group, n-octane-1,8-diyl group Group, n-nonane-1,9-diyl group, n-decane-1,10-diyl group, n-undecane-1,11-diyl group, n-dodecane-1,12-diyl group, n-tridecane- 1,13-diyl group, n-tetradecane-1,14-diyl group, n-pentadecane-1,15-diyl group, n-hexadecane-1,16-diyl group, n-heptadecane-1,17-diyl group , N-octadecane-1,18-diyl group, n-nonadecane-1,19-diyl group, and n-icosane-1,20-diyl group.

Among the imidazole compounds represented by the above formula (F1-2), the compounds represented by the following formula (F1-2-2) are preferable because they are inexpensive and can be easily synthesized.

式（Ｆ１−２−２）中、Ｒ^ｆ１、Ｒ^ｆ２、及びＲ^ｆ３は、式（Ｆ１）と同様である。Ｒ^ｆ２１は、式（Ｆ１−２）と同じであり、Ｒ^ｆ２５、Ｒ^ｆ２６、Ｒ^ｆ２７、Ｒ^ｆ２８、及びＲ^ｆ２９は、それぞれ独立に、水素原子、ハロゲン原子、水酸基、メルカプト基、スルフィド基、シリル基、シラノール基、ニトロ基、ニトロソ基、スルフィノ基、スルホ基、スルホナト基、ホスフィノ基、ホスフィニル基、ホスホノ基、ホスホナト基、アミノ基、アンモニオ基、又は有機基である。ただし、Ｒ^ｆ２５、Ｒ^ｆ２６、Ｒ^ｆ２７、Ｒ^ｆ２８、及びＲ^ｆ２９のうち少なくとも１つは水素原子以外の基である。Ｒ^ｆ２５、Ｒ^ｆ２６、Ｒ^ｆ２７、Ｒ^ｆ２８、及びＲ^ｆ２９のうち少なくとも２つが結合して環状構造を形成してもよい。Ｒ^ｆ２１はＲ^ｆ２７と結合して環状構造を形成してもよい。

In formula (F1-2-2), R ^f1 , R ^f2 , and R ^f3 are the same as in formula (F1). R ^f21 is the same as formula (F1-2), and R ^f25 , R ^f26 , R ^f27 , R ^f28 , and R ^f29 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, A silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonate group, an amino group, an ammonio group, or an organic group. However, at least one of R ^f25 , R ^f26 , R ^f27 , R ^f28 , and R ^f29 is a group other than a hydrogen atom. At least two of R ^f25 , R ^f26 , R ^f27 , R ^f28 , and R ^f29 may combine to form a cyclic structure. R ^f21 may combine with R ^f27 to form a cyclic structure.

R ^f25 , R ^f26 , R ^f27 , R ^f28 , and R ^f29 are the same as the formula (F1-2-3) described later. In formula (F1-2-2), R ^f21 may combine with R ^f27 to form a cyclic structure. For example, if R ^f21 is an alkyl group which may have a substituent, R ^f21 may form a cyclic structure bonded to R ^f27.

Among the imidazole compounds represented by the above formula (F1-2-1) or formula (F1-2-2), they can be synthesized inexpensively and easily and have excellent solubility in water and organic solvents. The compound represented by Formula (F1-2-3) is preferable, and the compound represented by Formula (F1-2-3) and R ^f24 is a methylene group is more preferable.

式（Ｆ１−２−３）中、Ｒ^ｆ１、Ｒ^ｆ２、及びＲ^ｆ３は、式（Ｆ１）と同様である。Ｒ^ｆ２３、及びＲ^ｆ２４は、式（Ｆ１−２−１）と同様である。Ｒ^ｆ２５、Ｒ^ｆ２６、Ｒ^ｆ２７、Ｒ^ｆ２８、及びＲ^ｆ２９は、それぞれ独立に、水素原子、ハロゲン原子、水酸基、メルカプト基、スルフィド基、シリル基、シラノール基、ニトロ基、ニトロソ基、スルフィノ基、スルホ基、スルホナト基、ホスフィノ基、ホスフィニル基、ホスホノ基、ホスホナト基、アミノ基、アンモニオ基、又は有機基である。ただし、Ｒ^ｆ２５、Ｒ^ｆ２６、Ｒ^ｆ２７、Ｒ^ｆ２８、及びＲ^ｆ２９のうち少なくとも１つは水素原子以外の基である。Ｒ^ｆ２５、Ｒ^ｆ２６、Ｒ^ｆ２７、Ｒ^ｆ２８、及びＲ^ｆ２９のうち少なくとも２つが結合して環状構造を形成してもよい。Ｒ^ｆ２４はＲ^ｆ２７と結合して環状構造を形成してもよい。

In formula (F1-2-3), R ^f1 , R ^f2 , and R ^f3 are the same as in formula (F1). R ^f23 and R ^f24 are the same as in formula (F1-2-1). R ^f25 , R ^f26 , R ^f27 , R ^f28 , and R ^f29 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, It is a sulfo group, a sulfonato group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonato group, an amino group, an ammonio group, or an organic group. However, at least one of R ^f25 , R ^f26 , R ^f27 , R ^f28 , and R ^f29 is a group other than a hydrogen atom. At least two of R ^f25 , R ^f26 , R ^f27 , R ^f28 , and R ^f29 may combine to form a cyclic structure. R ^f24 may combine with R ^f27 to form a cyclic structure.

If ^{R f25, R f26, R f27} , R f28, and ^{R f29} is an organic group, the organic group, ^{R f22} in Formula (F1-2-1) is the same as the organic group having as a substituent. R ^f25 , R ^f26 , R ^f27 , and R ^f28 are preferably hydrogen atoms.

Among them, at least one of R ^f25 , R ^f26 , R ^f27 , R ^f28 , and R ^f29 is preferably the ^following substituent, and R ^f29 is particularly preferably the following substituent. When R ^f29 is the following substituent, R ^f25 , R ^f26 , R ^f27 , and R ^f28 are preferably hydrogen atoms.
^{-OR f30}
(R ^f30 is a hydrogen atom or an organic group.)

If R ^f30 is an organic group, the organic group, ^{R f22} in Formula (F1-2-1) is the same as the organic group having as a substituent. As R ^f30 , an alkyl group is preferable, an alkyl group having 1 to 8 carbon atoms is more preferable, an alkyl group having 1 to 3 carbon atoms is particularly preferable, and a methyl group is most preferable.

式（Ｆ１−２−４）において、Ｒ^ｆ１、Ｒ^ｆ２、及びＲ^ｆ３は、式（Ｆ１）と同様である。Ｒ^ｆ２３は、式（Ｆ１−２−１）と同様である。Ｒ^ｆ３１、Ｒ^ｆ３２、Ｒ^ｆ３３、Ｒ^ｆ３４、及びＲ^ｆ３５は、それぞれ独立に、水素原子、水酸基、メルカプト基、スルフィド基、シリル基、シラノール基、ニトロ基、ニトロソ基、スルフィノ基、スルホ基、スルホナト基、ホスフィノ基、ホスフィニル基、ホスホノ基、ホスホナト基、アミノ基、アンモニオ基、又は有機基である。ただし、Ｒ^ｆ３１、Ｒ^ｆ３２、Ｒ^ｆ３３、Ｒ^ｆ３４、及びＲ^ｆ３５のうち少なくとも１つは水素原子以外の基である。 Among the compounds represented by the above formula (F1-2-3), the compound represented by the following formula (F1-2-4) is preferable.

In formula (F1-2-4), R ^f1 , R ^f2 , and R ^f3 are the same as in formula (F1). R ^f23 is the same as the formula (F1-2-1). R ^f31 , R ^f32 , R ^f33 , R ^f34 , and R ^f35 are each independently a hydrogen atom, a hydroxyl group, a mercapto group, a sulfide group, a silyl group, a silanol group, a nitro group, a nitroso group, a sulfino group, a sulfo group, It is a sulfonate group, a phosphino group, a phosphinyl group, a phosphono group, a phosphonate group, an amino group, an ammonio group, or an organic group. However, at least one of R ^f31 , R ^f32 , R ^f33 , R ^f34 , and R ^f35 is a group other than a hydrogen atom.

Among the compounds represented by formula (F1-2-4), at least one of R ^f31 , R ^f32 , R ^f33 , R ^f34 , and R ^f35 is a group represented by the aforementioned —O—R ^f30. It is preferable that R ^f35 is a group represented by —O—R ^f30 . When R ^f35 is a group represented by —O—R ^f30 , R ^f32 , R ^f33 , R ^f34 , and R ^f35 are preferably hydrogen atoms.

The following compounds are mentioned as a suitable specific example of the imidazole compound represented by Formula (F1-2) or Formula (F1-2-1).

The content of the imidazole generator (F) in the photosensitive resin composition is not particularly limited as long as the object of the present invention is not impaired. The content of the imidazole generator (F) is typically 0.01 part by mass or more and 2.5 parts by mass or more with respect to 100 parts by mass of the total amount of the alkali-soluble resin (A) and the photopolymerizable monomer (B). A mass part is preferable and 0.01-0.5 mass part is more preferable. When the content of the imidazole generator (F) in the photosensitive resin composition is within such a range, it is easy to form a patterned cured film having a good cross-sectional shape.

<Sensitizer (G)>
The photosensitive resin composition may contain a sensitizer (G) together with the above photopolymerization initiator. Since the photosensitive resin composition contains the sensitizer (G), it is well cured even when using a light source with low irradiation energy such as LED exposure.

As the sensitizer (G), a compound conventionally used for the purpose of sensitizing a photopolymerization initiator in a photosensitive resin composition can be used without particular limitation.

The sensitizer (G) is preferably a compound having at least one selected from the group consisting of an alkoxy group, a substituted carbonyloxy group, and an oxo group (═O) as a substituent. The compound having the substituent is preferably a condensed polycyclic aromatic hydrocarbon compound or a condensed polycyclic aromatic heterocyclic compound.
The condensed polycyclic aromatic hydrocarbon compound or the condensed polycyclic aromatic heterocyclic compound may have a substituent other than an alkoxy group, a substituted carbonyloxy group, and an oxo group (═O). Examples of the substituent include an alkyl group having 1 to 20 carbon atoms, a halogenated alkyl group having 1 to 20 carbon atoms, an alkoxyalkyl group having 2 to 20 carbon atoms, and 2 to 20 carbon atoms. And aliphatic acyl groups having 7 to 11 carbon atoms (aroyl groups), cyano groups, nitro groups, nitroso groups, halogen atoms, hydroxyl groups, mercapto groups, and the like.

The alkoxy group may be linear or branched. The number of carbon atoms of the alkoxy group is not particularly limited, but is preferably 1 or more and 20 or less, more preferably 1 or more and 12 or less, and particularly preferably 1 or more and 6 or less.
Preferable examples of the alkoxy group include methoxy group, ethoxy group, n-propyloxy group, isopropyloxy, n-butyloxy, isobutyloxy group, tert-butyloxy group, n-pentyloxy group, n-hexyloxy group, n. -Heptyloxy group, n-octyloxy group, 2-ethylhexyl group, n-nonyloxy group, n-decyloxy group and the like.

Substituted carbonyl group is a group represented by ^{-O-CO-A g. Ag} is not particularly limited as long as the sensitizer (G) has a desired sensitizing action, and may be various organic groups. As A, an alkyl group having 1 to 20 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkoxy group having 1 to 20 carbon atoms, and an aryloxy group having 6 to 10 carbon atoms are preferable. ..

The aryl group or aryloxy group may have one or more substituents. The type of substituent is not particularly limited as long as it does not impair the object of the present invention. When the aryl group or aryloxy group has a plurality of substituents, the plurality of substituents may be the same or different.
Preferable examples of the substituent include an alkoxy group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, and 6 to 10 carbon atoms. An aryloxy group, an aliphatic acyl group having 2 to 7 carbon atoms, an aromatic acyl group (aroyl group) having 7 to 11 carbon atoms, a cyano group, a nitro group, a nitroso group, a halogen atom, a hydroxyl group, and Examples thereof include a mercapto group.

When ^Ag is an alkyl group or an alkoxy group, these groups may be linear or branched.
Preferable examples of the alkyl group include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, isobutyl group, tert-butyl group, n-pentyl group, n-hexyl group, n-heptyl group. , N-octyl group, and 2-ethylhexyl group.
Preferable examples of the aryl group include phenyl group, o-tolyl group, m-tolyl group, p-tolyl group, α-naphthyl group and β-naphthyl group.
Preferable examples of the alkoxy group include methoxy group, ethoxy group, n-propyloxy group, isopropyloxy group, n-butyloxy group, isobutyloxy group, tert-butyloxy group, n-pentyloxy group, n-hexyloxy group. , N-heptyloxy group, n-octyloxy group, and 2-ethylhexyloxy group.

In a condensed polycyclic aromatic hydrocarbon compound or a condensed polycyclic aromatic heterocyclic compound substituted by one or more selected from the group consisting of an alkoxy group, a substituted carbonyloxy group, and an oxo group (═O), The number of rings constituting the condensed ring is not particularly limited as long as the desired sensitizing action can be obtained. The number of rings is preferably 2 or more, more preferably 3 or more, particularly preferably 3 or more and 6 or less, and most preferably 3 or 4.
The monocycle forming the condensed polycycle does not necessarily have to be an aromatic ring as long as the condensed polycyclic aromatic hydrocarbon compound or the condensed polycyclic aromatic heterocyclic compound has aromaticity.

Preferred examples of the condensed polycyclic aromatic hydrocarbon compound or the condensed polycycle contained in the condensed polycyclic aromatic heterocyclic compound include an acenaphthylene ring, a phenanthrene ring, an anthracene ring, a naphthacene ring, a xanthene ring, and thiol. A xanthene ring is mentioned. Among these rings, anthracene ring, naphthacene ring, and thioxanthene ring are preferable.

Specific examples of the compound containing an anthracene ring which is preferably used as the sensitizer (G) include 9,10-bis(acetyloxy)anthracene, 9,10-bis(propionyloxy)anthracene, 9 ,10-Bis(n-propylcarbonyloxy)anthracene,9,10-bis(isopropylcarbonyloxy)anthracene,9,10-bis(n-butylcarbonyloxy)anthracene,9,10-bis(isobutylcarbonyloxy)anthracene , 9,10-bis(n-pentylcarbonyloxy)anthracene, 9,10-bis(n-hexylcarbonyloxy)anthracene, 9,10-bis(n-heptylcarbonyloxy)anthracene, 9,10-bis(2 -Ethylhexanoyloxy)anthracene, 9,10-bis(n-octylcarbonyloxy)anthracene, 9,10-bis(n-nonylcarbonyloxy)anthracene, 9,10-bis(n-decylcarbonyloxy)anthracene, 9,10-bis(benzoyloxy)anthracene, 9,10-bis(4-methylbenzoyloxy)anthracene, 9,10-bis(2-naphthoyloxy)anthracene, 2-methyl-9,10-bis(acetyl) Oxy)anthracene, 2-methyl-9,10-bis(propionyloxy)anthracene, 2-methyl-9,10-bis(n-propylcarbonyloxy)anthracene, 2-methyl-9,10-bis(isopropylcarbonyloxy) ) Anthracene, 2-methyl-9,10-bis(n-butylcarbonyloxy)anthracene, 2-methyl-9,10-bis(isobutylcarbonyloxy)anthracene, 2-methyl-9,10-bis(n-pentyl) Carbonyloxy)anthracene, 2-methyl-9,10-bis(n-hexylcarbonyloxy)anthracene, 2-methyl-9,10-bis(benzoyloxy)anthracene, 2-methyl-9,10-bis(4- Methylbenzoyloxy)anthracene, 2-methyl-9,10-bis(2-naphthoyloxy)anthracene, 1-methyl-9,10-bis(acetyloxy)anthracene, 1-methyl-9,10-bis(propionyl) Oxy)anthracene, 1-methyl-9,10-bis(n-propylcarbonyloxy)anthracene, 1-methyl-9,10-bis(isopropylcarbonyloxy)anthracene 1,1-methyl-9,10-bis(n-butylcarbonyloxy)anthracene, 1-methyl-9,10-bis(isobutylcarbonyloxy)anthracene, 1-methyl-9,10-bis(n-pentylcarbonyl) Oxy)anthracene, 1-methyl-9,10-bis(n-hexylcarbonyloxy)anthracene, 1-methyl-9,10-bis(benzoyloxy)anthracene, 1-methyl-9,10-bis(4-methyl) Benzoyloxy)anthracene, 1-methyl-9,10-bis(2-naphthoyloxy)anthracene, 2-ethyl-9,10-bis(acetyloxy)anthracene, 2-ethyl-9,10-bis(propionyloxy) ) Anthracene, 2-ethyl-9,10-bis(n-propylcarbonyloxy)anthracene, 2-ethyl-9,10-bis(isobutylcarbonyloxy)anthracene, 2-ethyl-9,10-bis(n-butyl) Carbonyloxy)anthracene, 2-ethyl-9,10-bis(isobutylcarbonyloxy)anthracene, 2-ethyl-9,10-bis(n-pentylcarbonyloxy)anthracene, 2-ethyl-9,10-bis(n -Hexylcarbonyloxy)anthracene, 2-ethyl-9,10-bis(benzoyloxy)anthracene, 2-ethyl-9,10-bis(4-ethyl-benzoyloxy)anthracene, 2-ethyl-9,10-bis (2-naphthoyloxy)anthracene, 1-ethyl-9,10-bis(acetyloxy)anthracene, 1-ethyl-9,10-bis(propionyloxy)anthracene, 1-ethyl-9,10-bis(n -Propylcarbonyloxy)anthracene, 1-ethyl-9,10-bis(isopropylcarbonyloxy)anthracene, 1-ethyl-9,10-bis(n-butylcarbonyloxy)anthracene, 1-ethyl-9,10-bis (Isobutylcarbonyloxy)anthracene, 1-ethyl-9,10-bis(n-pentylcarbonyloxy)anthracene, 1-ethyl-9,10-bis(n-hexylcarbonyloxy)anthracene, 1-ethyl-9,10 -Bis(benzoyloxy)anthracene, 1-ethyl-9,10-bis(4-ethyl-benzoyloxy)anthracene, 1-ethyl-9,10-bis(2-naphthoyloxy)anthracene, 1-(tert- Butyl)-9,1 0-bis(n-propylcarbonyloxy)anthracene, 1-(tert-butyl)-9,10-bis(isopropylcarbonyloxy)anthracene, 1-(tert-butyl)-9,10-bis(n-butylcarbonyl) Oxy)anthracene, 1-(tert-butyl)-9,10-bis(isobutylcarbonyloxy)anthracene, 1-(tert-butyl)-9,10-bis(n-pentylcarbonyloxy)anthracene, 1-(tert. -Butyl)-9,10-bis(n-hexylcarbonyloxy)anthracene, 1-(tert-butyl)-9,10-bis(benzoyloxy)anthracene, 1-(t-butyl)-9,10-bis (4-(tert-butyl)-benzoyloxy)anthracene, 1-(tert-butyl)-9,10-bis(2-naphthoyloxy)anthracene, 2-(tert-butyl)-9,10-bis( n-propylcarbonyloxy)anthracene, 2-(tert-butyl)-9,10-bis(isopropylcarbonyloxy)anthracene, 2-(tert-butyl)-9,10-bis(n-butylcarbonyloxy)anthracene, 2-(tert-butyl)-9,10-bis(isobutylcarbonyloxy)anthracene, 2-(tert-butyl)-9,10-bis(n-pentylcarbonyloxy)anthracene, 2-(tert-butyl)- 9,10-bis(n-hexylcarbonyloxy)anthracene, 2-(tert-butyl)-9,10-bis(benzoyloxy)anthracene, 2-(tert-butyl)-9,10-bis(4-( t-butyl)-benzoyloxy)anthracene, 2-(tert-butyl)-9,10-bis(2-naphthoyloxy)anthracene, 2-pentyl-9,10-bis(n-propylcarbonyloxy)anthracene, 2-pentyl-9,10-bis(isopropylcarbonyloxy)anthracene, 2-pentyl-9,10-bis(n-butylcarbonyloxy)anthracene, 2-pentyl-9,10-bis(isobutylcarbonyloxy)anthracene, 2-pentyl-9,10-bis(n-pentylcarbonyloxy)anthracene, 2-pentyl-9,10-bis(n-hexylcarbonyloxy)anthracene, 2-pentyl-9,10-bis(benzoyloxy)anthracene , 2-pentyl- Examples thereof include 9,10-bis(4-(tert-butyl)-benzoyloxy)anthracene and 2-pentyl-9,10-bis(2-naphthoyloxy)anthracene.

Anthracene compounds substituted with a halogen atom are also preferable as the sensitizer (G). Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom.

Specific examples of the anthracene compound substituted with a halogen atom, which is preferable as the sensitizer (G), include 2-chloro-9,10-bis(acetyloxy)anthracene and 2-chloro-9,10-. Bis(propionyloxy)anthracene, 2-chloro-9,10-bis(n-propylcarbonyloxy)anthracene, 2-chloro-9,10-bis(isopropylcarbonyloxy)anthracene, 2-chloro-9,10-bis (N-Butylcarbonyloxy)anthracene, 2-chloro-9,10-bis(isobutylcarbonyloxy)anthracene, 2-chloro-9,10-bis(n-pentylcarbonyloxy)anthracene, 2-chloro-9,10 -Bis(n-hexylcarbonyloxy)anthracene, 2-chloro-9,10-bis(benzoyloxy)anthracene, 2-chloro-9,10-bis(4-methylbenzoyloxy)anthracene, 2-chloro-9, 10-bis(2-naphthoyloxy)anthracene, 1-chloro-9,10-bis(acetyloxy)anthracene, 1-chloro-9,10-bis(propionyloxy)anthracene, 1-chloro-9,10- Bis(n-propylcarbonyloxy)anthracene, 1-chloro-9,10-bis(isopropylcarbonyloxy)anthracene, 1-chloro-9,10-bis(n-butylcarbonyloxy)anthracene, 1-chloro-9, 10-bis(isobutylcarbonyloxy)anthracene, 1-chloro-9,10-bis(n-pentylcarbonyloxy)anthracene, 1-chloro-9,10-bis(n-hexylcarbonyloxy)anthracene, 1-chloro- 9,10-bis(benzoyloxy)anthracene, 1-chloro-9,10-bis(4-methylbenzoyloxy)anthracene, 1-chloro-9,10-bis(2-naphthoyloxy)anthracene, 2-fluoro -9,10-bis(acetyloxy)anthracene, 2-fluoro-9,10-bis(propionyloxy)anthracene, 2-fluoro-9,10-bis(n-propylcarbonyloxy)anthracene, 2-fluoro-9 ,10-Bis(isopropylcarbonyloxy)anthracene, 2-fluoro-9,10-bis(n-butylcarbonyloxy)anthracene, 2-fluoro-9,10-bis(isobutylcarbonyloxy)anthracene , 2-fluoro-9,10-bis(n-pentylcarbonyloxy)anthracene, 2-fluoro-9,10-bis(n-hexylcarbonyloxy)anthracene, 2-fluoro-9,10-bis(benzoyloxy) Anthracene, 2-fluoro-9,10-bis(4-methylbenzoyloxy)anthracene, 2-fluoro-9,10-bis(2-naphthoyloxy)anthracene, 1-fluoro-9,10-bis(acetyloxy ) Anthracene, 1-fluoro-9,10-bis(propionyloxy)anthracene, 1-fluoro-9,10-bis(n-propylcarbonyloxy)anthracene, 1-fluoro-9,10-bis(isopropylcarbonyloxy) Anthracene, 1-fluoro-9,10-bis(n-butylcarbonyloxy)anthracene, 1-fluoro-9,10-bis(isobutylcarbonyloxy)anthracene, 1-fluoro-9,10-bis(n-pentylcarbonyl) Oxy)anthracene, 1-fluoro-9,10-bis(n-hexylcarbonyloxy)anthracene, 1-fluoro-9,10-bis(benzoyloxy)anthracene, 1-fluoro-9,10-bis(4-methyl) Benzoyloxy)anthracene, 1-fluoro-9,10-bis(2-naphthoyloxy)anthracene, 2-bromo-9,10-bis(acetyloxy)anthracene, 2-bromo-9,10-bis(propionyloxy) ) Anthracene, 2-bromo-9,10-bis(n-propylcarbonyloxy)anthracene, 2-bromo-9,10-bis(isopropylcarbonyloxy)anthracene, 2-bromo-9,10-bis(n-butyl) Carbonyloxy)anthracene, 2-bromo-9,10-bis(isobutylcarbonyloxy)anthracene, 2-bromo-9,10-bis(n-pentylcarbonyloxy)anthracene, 2-bromo-9,10-bis(n -Hexylcarbonyloxy)anthracene, 2-bromo-9,10-bis(benzoyloxy)anthracene, 2-bromo-9,10-bis(4-methylbenzoyloxy)anthracene, 2-bromo-9,10-bis( 2-naphthoyloxy)anthracene, 1-bromo-9,10-bis(acetyloxy)anthracene, 1-bromo-9,10-bis(propionyloxy)anthracene, 1-bromo-9,10-bi Sus(n-propylcarbonyloxy)anthracene, 1-bromo-9,10-bis(isopropylcarbonyloxy)anthracene, 1-bromo-9,10-bis(n-butylcarbonyloxy)anthracene, 1-bromo-9, 10-bis(isobutylcarbonyloxy)anthracene, 1-bromo-9,10-bis(n-pentylcarbonyloxy)anthracene, 1-bromo-9,10-bis(n-hexylcarbonyloxy)anthracene, 1-bromo- Examples include 9,10-bis(benzoyloxy)anthracene, 1-bromo-9,10-bis(4-methylbenzoyloxy)anthracene, and 1-bromo-9,10-bis(2-naphthoyloxy)anthracene. Be done.

Anthracene compounds substituted with an alkoxy group are also preferable as the sensitizer (G).
Specific examples of the anthracene compound substituted with an alkoxy group, which is preferable as the sensitizer (G), include 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, and 9,10-bis(n-). Propyloxy)anthracene, 9,10-bis(n-butyloxy)anthracene, 9,10-bis(n-pentyloxy)anthracene, 9,10-bis(isopentyloxyoxy)anthracene, 9,10-bis(n -Hexyloxy)anthracene, 9,10-bis(n-heptyloxy)anthracene, 9,10-bis(n-octyloxy)anthracene, 9,10-bis(2-ethylhexyloxy)anthracene, 9-methoxyanthracene, 9-ethoxyanthracene, 9-(n-propyloxy)anthracene, 9-(n-butyloxy)anthracene, 9-(n-pentyloxy)anthracene, 9-(isopentyloxyoxy)anthracene, 9-(n-hexyl) Oxy)anthracene, 9-(n-heptyloxy)anthracene, 9-(n-octyloxy)anthracene, 9-(2-ethylhexyloxy)anthracene, 2-methyl-9,10-dimethoxyanthracene, 2-methyl-9. , 10-diethoxyanthracene, 2-methyl-9,10-bis(n-propyloxy)anthracene, 2-methyl-9,10-bis(n-butyloxy)anthracene, 2-methyl-9,10-bis( n-pentyloxy)anthracene, 2-methyl-9,10-bis(isopentyloxyoxy)anthracene, 2-methyl-9,10-bis(n-hexyloxy)anthracene, 2-methyl-9,10-bis (N-heptyloxy)anthracene, 2-methyl-9,10-bis(n-octyloxy)anthracene, 2-methyl-9,10-bis(2-ethylhexyloxy)anthracene, 2-ethyl-9,10- Dimethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, 2-ethyl-9,10-bis(n-propyloxy)anthracene, 2-ethyl-9,10-bis(n-butyloxy)anthracene, 2- Ethyl-9,10-bis(n-pentyloxy)anthracene, 2-ethyl-9,10-bis(isopentyloxyoxy)anthracene, 2-ethyl-9,10-bis(n-hexyloxy)anthracene, 2 -Ethyl-9,10-bis(n-he Butyloxy)anthracene, 2-ethyl-9,10-bis(n-octyloxy)anthracene, 2-ethyl-9,10-bis(2-ethylhexyloxy)anthracene, 2-methyl-9-methoxyanthracene, 2-methyl -9-Ethoxyanthracene, 2-methyl-9-(n-propyloxy)anthracene, 2-methyl-9-(n-butyloxy)anthracene, 2-methyl-9-(n-pentyloxy)anthracene, 2-methyl -9-(Isopentyloxyoxy)anthracene, 2-methyl-9-(n-hexyloxy)anthracene, 2-methyl-9-(n-heptyloxy)anthracene, 2-methyl-9-(n-octyloxy) ) Anthracene, 2-methyl-9-(2-ethylhexyloxy)anthracene, 2-ethyl-9-methoxyanthracene, 2-ethyl-9-ethoxyanthracene, 2-ethyl-9-(n-propyloxy)anthracene, 2 -Ethyl-9-(n-butyloxy)anthracene, 2-ethyl-9-(n-pentyloxy)anthracene, 2-ethyl-9-(isopentyloxyoxy)anthracene, 2-ethyl-9-(n-hexyl) Oxy)anthracene, 2-ethyl-9-(n-heptyloxy)anthracene, 2-ethyl-9-(n-octyloxy)anthracene, 2-ethyl-9-(2-ethylhexyloxy)anthracene, 2-chloro- 9,10-Dimethoxyanthracene, 2-chloro-9,10-diethoxyanthracene, 2-chloro-9,10-bis(n-propyloxy)anthracene, 2-chloro-9,10-bis(n-butyloxy) Anthracene, 2-chloro-9,10-bis(n-pentyloxy)anthracene, 2-chloro-9,10-bis(isopentyloxyoxy)anthracene, 2-chloro-9,10-bis(n-hexyloxy) ) Anthracene, 2-chloro-9,10-bis(n-heptyloxy)anthracene, 2-chloro-9,10-bis(n-octyloxy)anthracene, 2-chloro-9,10-bis(2-ethylhexyl) (Oxy)anthracene, 2-bromo-9,10-dimethoxyanthracene, 2-bromo-9,10-diethoxyanthracene, 2-bromo-9,10-bis(n-propyloxy)anthracene, 2-bromo-9, 10-bis(n-butyloxy)anthracene, 2-bromo-9,10-bis (N-Pentyloxy)anthracene, 2-bromo-9,10-bis(isopentyloxyoxy)anthracene, 2-bromo-9,10-bis(n-hexyloxy)anthracene, 2-bromo-9,10- Bis(n-heptyloxy)anthracene, 2-bromo-9,10-bis(n-octyloxy)anthracene, 2-bromo-9,10-bis(2-ethylhexyloxy)anthracene, 2-chloro-9-methoxy Anthracene, 2-chloro-9-ethoxyanthracene, 2-chloro-9-(n-propyloxy)anthracene, 2-chloro-9-(n-butyloxy)anthracene, 2-chloro-9-(n-pentyloxy) Anthracene, 2-chloro-9-(isopentyloxyoxy)anthracene, 2-chloro-9-(n-hexyloxy)anthracene, 2-chloro-9-(n-heptyloxy)anthracene, 2-chloro-9- (N-octyloxy)anthracene, 2-chloro-9-(2-ethylhexyloxy)anthracene, 2-bromo-9-methoxyanthracene, 2-bromo-9-ethoxyanthracene, 2-bromo-9-(n-propyl). Oxy)anthracene, 2-bromo-9-(n-butyloxy)anthracene, 2-bromo-9-(n-pentyloxy)anthracene, 2-ethyl-9-(isopentyloxyoxy)anthracene, 2-bromo-9. -(N-Hexyloxy)anthracene, 2-bromo-9-(n-heptyloxy)anthracene, 2-bromo-9-(n-octyloxy)anthracene, and 2-bromo-9-(2-ethylhexyloxy) Anthracene and the like can be mentioned.

Among the anthracene compounds described above, 9,10-bis(acetyloxy)anthracene, 9,10-bis(propionyloxy)anthracene, 9 and 10-bis(acetyloxy)anthracene are preferred from the viewpoint of ease of production and performance as a sensitizer (G). ,10-Bis(n-propylcarbonyloxy)anthracene,9,10-bis(isopropylcarbonyloxy)anthracene,9,10-bis(n-butylcarbonyloxy)anthracene,9,10-bis(isobutylcarbonyloxy)anthracene , 9,10-bis(n-hexanoyloxy)anthracene, 9,10-bis(n-heptanoyloxy)anthracene, 9,10-bis(n-octanoyloxy)anthracene, 9,10-bis(2 -Ethylhexanoyloxy)anthracene, 9,10-bis(n-nonanoyloxy)anthracene, 9,10-diethoxyanthracene, 9,10-dipropoxyanthracene, and 9,10-dibutoxyanthracene are preferred.

Specific examples of the compound containing a naphthacene ring and suitably used as the sensitizer (G) include:
2-methyl-5,11-dioxo-6,12-bis(acetyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(propionyloxy)naphthacene, 2-methyl-5,11- Dioxo-6,12-bis(n-propylcarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(isopropylcarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6. 12-bis(n-butylcarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(isobutylcarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis( n-pentylcarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(n-hexylcarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(n- Heptylcarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(acetyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(propionyloxy)naphthacene, 2- Ethyl-5,11-dioxo-6,12-bis(n-propylcarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(isopropylcarbonyloxy)naphthacene, 2-ethyl-5. 11-dioxo-6,12-bis(n-butylcarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(isobutylcarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo- 6,12-bis(n-pentylcarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(n-hexylcarbonyloxy)naphthacene, and 2-ethyl-5,11-dioxo-6. An alkylcarbonyloxy group-substituted naphthacene compound such as 12-bis(n-heptylbonyloxy)naphthacene;
2-Methyl-5,11-dioxo-6,12-bis(benzoyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(o-toluoyloxy)naphthacene, 2-methyl-5 ,11-Dioxo-6,12-bis(m-toluoyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(p-toluoyloxy)naphthacene, 2-methyl-5,11 -Dioxo-6,12-bis(α-naphthoyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(β-naphthoyloxy)naphthacene, 2-ethyl-5,11-dioxo -6,12-bis(benzoyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(o-toluoyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12- Bis(m-toluoyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(p-toluoyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis( aroyloxy group-substituted naphthacene compounds such as α-naphthoyloxy)naphthacene and 2-ethyl-5,11-dioxo-6,12-bis(β-naphthoyloxy)naphthacene;
2-methyl-5,11-dioxo-6,12-bis(methoxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(ethoxycarbonyloxy)naphthacene, 2-methyl-5 11-dioxo-6,12-bis(n-propyloxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(isopropyloxycarbonyloxy)naphthacene, 2-methyl-5,11- Dioxo-6,12-bis(n-butyloxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(isobutyloxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo- 6,12-bis(n-pentyloxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(n-hexyloxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo- 6,12-bis(n-heptyloxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(n-octyloxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo- 6,12-bis(methoxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(ethoxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis( n-Propyloxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(isopropyloxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(n- Butyloxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(isobutyloxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(n-pentyloxy) Carbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(n-hexyloxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(n-heptyloxy) Carbonyloxy)naphthacene, and an alkoxycarbonyloxy group-substituted naphthacene compound such as 2-ethyl-5,11-dioxo-6,12-bis(n-octyloxycarbonyloxy)naphthacene;
2-Methyl-5,11-dioxo-6,12-bis(phenoxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(o-tolyloxycarbonyloxy)naphthacene, 2-methyl -5,11-Dioxo-6,12-bis(m-tolyloxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(p-tolyloxycarbonyloxy)naphthacene, 2-methyl -5,11-Dioxo-6,12-bis(α-naphthyloxycarbonyloxy)naphthacene, 2-methyl-5,11-dioxo-6,12-bis(β-naphthyloxycarbonyloxy)naphthacene, 2-ethyl -5,11-Dioxo-6,12-bis(phenoxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(o-tolyloxycarbonyloxy)naphthacene, 2-ethyl-5. 11-dioxo-6,12-bis(m-tolyloxycarbonyloxy)naphthacene, 2-ethyl-5,11-dioxo-6,12-bis(p-tolyloxycarbonyloxy)naphthacene, 2-ethyl-5. Aroyloxycarbonyl such as 11-dioxo-6,12-bis(α-naphthyloxycarbonyloxy)naphthacene and 2-ethyl-5,11-dioxo-6,12-bis(β-naphthyloxycarbonyloxy)naphthacene An oxy group-substituted naphthacene compound may be mentioned.

Among the compounds containing a naphthacene ring, 5,11-dioxo-6,12-bis(methoxycarbonyloxy)naphthacene, 5,11-dioxo-6,12-bis(ethoxycarbonyloxy)naphthacene, 5,11- Dioxo-6,12-bis(isopropyloxycarbonyloxy)naphthacene, 5,11-dioxo-6,12-bis(isobutyloxycarbonyloxy)naphthacene, 5,11-dioxo-6,12-bis(n-butylcarbonyl) Oxy)naphthacene, 5,11-dioxo-6,12-bis(n-pentylcarbonyloxy)naphthacene and 5,11-dioxo-6,12-bis(n-heptanoyloxy)naphthacene are preferred.

Specific examples of the compound containing a thioxanthene ring that is preferably used as the sensitizer (G) include thioxanthen-9-one, 2-methyl-9H-thioxanthen-9-one, and 2-isopropyl-9H-. Examples thereof include thioxanthen-9-one, 1,4-dimethylthioxanthen-9-one, and 3-methyl-9-oxo-9H-thioxanthen-2-yl acetate.

The content of the sensitizer (G) is preferably 5 parts by mass or more and 60 parts by mass or less, and 15 parts by mass or more and 50 parts by mass or less with respect to 100 parts by mass of the photopolymerization initiator (C) in the photosensitive resin composition. Is more preferable. When the photosensitive resin composition contains a sensitizer within the above range, the curing reaction due to exposure particularly progresses uniformly, and it is easy to form a patterned cured film having a particularly favorable edge angle.

<Organic solvent (S)>
The photosensitive resin composition may typically contain an organic solvent (S) for the purpose of adjusting coating properties. Examples of the organic solvent (S) include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n. -Propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n- Butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, etc. ) Alkylene glycol monoalkyl ethers; (poly)alkylenes such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate and propylene glycol monoethyl ether acetate. Glycol monoalkyl ether acetates; other ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran; ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone; methyl 2-hydroxypropionate, Lactic acid alkyl esters such as ethyl 2-hydroxypropionate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxypropionic acid Ethyl, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methoxybutylacetate, 3-methyl-3-methoxybutylacetate, 3-methyl-3-methoxybutyrate. Lepropionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-pentyl formate, isopentyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate. , Other esters such as methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate and ethyl 2-oxobutanoate; aromatic hydrocarbons such as toluene and xylene; N-methylpyrrolidone , N,N-dimethylformamide, N,N-dimethylacetamide, and other amides. These solvents may be used alone or in combination of two or more.

The amount of the organic solvent (S) used can be appropriately determined depending on the application of the photosensitive resin composition. The amount of the organic solvent (S) used is, for example, an amount such that the solid content concentration of the photosensitive resin composition is in the range of 1% by mass or more and 50% by mass or less.

<Other ingredients>
The photosensitive resin composition may contain various other additives other than the above, if necessary. Specific examples include dispersion aids, fillers, fillers, adhesion promoters, antioxidants, ultraviolet absorbers, coagulation inhibitors, thermal polymerization inhibitors, defoamers and surfactants.

Examples of the thermal polymerization inhibitor used in the photosensitive resin composition include hydroquinone and hydroquinone monoethyl ether. Examples of the defoaming agent include silicone-based and fluorine-based compounds, and examples of the surfactant include anion-based, cation-based and nonionic compounds.

<Method for preparing photosensitive resin composition>
The photosensitive resin composition is prepared by uniformly mixing the desired amounts of the above components. When the prepared photosensitive resin composition does not contain an insoluble component such as a pigment, it may be filtered using a filter so that the photosensitive resin composition becomes uniform.

<<Method for producing patterned cured film>>
A patterned cured film can be produced by using the photosensitive resin composition described above.
The patterned cured film is typically
Forming a coating film by coating the above-mentioned photosensitive resin composition on a substrate;
Exposing the coating film,
The coating film is patterned, or
It is manufactured by a method in which the coating film is subjected to position-selective exposure, and then the exposed coating film is developed.

The base material (substrate or support) can be selected according to various uses, for example, quartz, glass, optical film, ceramic material, vapor deposition film, magnetic film, reflection film, metal such as Ni, Cu, Cr, Fe, etc. Substrates, paper, polymer substrates such as SOG (Spin On Glass), polyester films, polycarbonate films, polyimide films, TFT array substrates, PDP electrode plates, glass or transparent plastic substrates, conductive substrates such as ITO or metals, insulation There is no particular limitation on the organic base material, semiconductor manufacturing substrate such as silicon, silicon nitride, polysilicon, silicon oxide, and amorphous silicon. Further, for example, in the case of forming a laminated structure on a substrate, any layer which is already formed on the substrate and serves as a lower structure is also included in the concept as a base material to which the photosensitive resin composition is applied. The shape of the substrate is not particularly limited, and may be plate-shaped or roll-shaped. The base material may have irregularities on the surface by various patterns, for example. In addition, a light transmissive or non-light transmissive base material can be selected as the base material.

The method for forming the patterned coating film on the substrate is not particularly limited. When forming a patterned coating film, a patterned coating film is typically formed by a printing method such as an inkjet method or a screen printing method.
When forming a patterned coating film by a printing method, it is preferable that the viscosity of the photosensitive resin composition is adjusted to an optimum viscosity according to the selected printing method. Examples of the method for adjusting the viscosity include dilution with an organic solvent (S) and addition of a viscosity modifier.

There is no particular limitation on the thickness of the coating film. The thickness of the coating film is preferably 0.05 μm or more, more preferably 1 μm or more, further preferably 7 μm or more, and particularly preferably 10 μm or more. There is no particular upper limit to the thickness of the coating film, but it is, for example, 50 μm or less, preferably 20 μm or less.

Next, the coating film is dried if necessary. The drying method is not particularly limited. As a drying method, for example, (1) a method of drying at a temperature of 80° C. or higher and 120° C. or lower, preferably 90° C. or higher and 100° C. or lower for 60 seconds or more and 120 seconds or less on a hot plate, (2) room temperature And leaving it in a warm air heater or infrared heater for several tens of minutes to several hours to remove the solvent.

By exposing the patterned coating film to light, a patterned cured film is formed.

The light source for exposure is not particularly limited, and examples thereof include a high pressure mercury lamp, an ultrahigh pressure mercury lamp, a xenon lamp, a carbon arc lamp, and an LED. Using such a light source, ArF excimer laser, KrF excimer laser, F ₂ excimer laser, extreme ultraviolet (EUV), vacuum ultraviolet (VUV), electron beam, X-ray, soft X-ray, g-ray, i-ray is used for coating film. The coating film can be exposed by irradiating radiations such as H, H, J, and K rays or electromagnetic waves.

Exposure dose varies depending on the composition of the photosensitive resin composition, for example, preferably from 10 mJ / cm ² or more 2000 mJ / cm ² or less, 100 mJ / cm ² or more 1500 mJ / cm ² or less, more preferably, 200 mJ / cm ² or more 1200 mJ / cm ² or less is more preferable. The exposure illuminance varies depending on the composition of the photosensitive resin composition, but is preferably in the range of 1 mW/cm ² or more and 50 mW/cm ² or less.

The cured film cured by exposure may be heated. The temperature for heating is not particularly limited, and is preferably 180°C or higher and 280°C or lower, more preferably 200°C or higher and 260°C or lower, and particularly preferably 220°C or higher and 250°C or lower. The heating time is typically 1 minute or more and 60 minutes or less, more preferably 10 minutes or more and 50 minutes or less, and particularly preferably 20 minutes or more and 40 minutes or less.

On the other hand, in the case of performing position selective exposure on the coating film, an unpatterned coating film is formed on the substrate surface. Typically, the photosensitive resin composition is applied to the entire surface of the substrate or substantially the front surface.
The coating method is not particularly limited. As a preferable coating method, a contact transfer type coating apparatus such as a roll coater, a reverse coater or a bar coater, or a non-contact type coating apparatus such as a spinner (rotary coating apparatus), a dispenser, an inkjet, a spray, a screen printing or a curtain flow coater. The method used may be mentioned.
The coating film thus formed may be dried if necessary, like the patterned coating film. The drying method is the same as the method described for the patterned coating film.

The unpatterned coating film formed as described above is position-selectively exposed through a negative-type mask having a light-transmitting portion having a shape corresponding to the pattern shape of the cured film. ..
The exposure method is the same as the above-described exposure method for the patterned coating film, except that a negative mask is used.

Next, the exposed coating film is developed with a developing solution to form a patterned cured film. The developing method is not particularly limited, and for example, a dipping method, a spray method or the like can be used. Examples of the developer include organic solvents such as monoethanolamine, diethanolamine and triethanolamine, and aqueous solutions of sodium hydroxide, potassium hydroxide, sodium carbonate, ammonia, quaternary ammonium salts and the like.

The patterned cured film obtained after the development may be heated in the same manner as the above-mentioned method of performing the exposure method for the patterned coating film.

≪Bank formation method≫
The method for forming a bank using the photosensitive resin composition described above is not particularly limited. The bank is usually formed as a partition that divides pixels in optical elements such as color filters, organic EL display elements, quantum dot displays, and organic TFT arrays.
Therefore, in the bank forming method, a substrate is selected according to each optical element. In addition, it is usually preferable that the bank is light-shielding. Therefore, the photosensitive resin composition for forming the bank is preferably a photosensitive resin composition containing the light shielding agent (E1) as the colorant (E).

The method for forming the bank is the same as the method for producing the patterned cured film described above, except that the substrate is selected according to each optical element. In this way, by forming a bank on the substrate for manufacturing an optical element, a substrate with a bank for manufacturing an optical element is manufactured.

<< Manufacturing method of optical element >>
Various optical elements are manufactured using the substrate with a bank for manufacturing an optical element manufactured by the method described above. The method for manufacturing the optical element is not particularly limited. Preferably, the optical element is manufactured by forming a pattern of banks on the substrate by the above method and then injecting ink into the region surrounded by the banks on the substrate to form pixels.

When a bank is formed using the photosensitive resin composition described above, the liquid repellency in the region surrounded by the bank is suppressed. Therefore, the area surrounded by the banks can be sufficiently covered with the pixel forming ink. Thereby, for example, the problem of halation in the organic EL display element can be solved.

As the solvent used when forming the ink for forming pixels, water, an organic solvent, or a mixed solvent thereof can be used. The organic solvent is not particularly limited as long as it can be removed from the film formed after the ink is injected. Specific examples of the organic solvent include toluene, xylene, anisole, mesitylene, tetralin, cyclohexylbenzene, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, methanol, ethanol, isopropyl alcohol, ethyl acetate, and butyl acetate. Further, a surfactant, an antioxidant, a viscosity modifier, an ultraviolet absorber, etc. can be added to the ink.

As a method of injecting the ink into the area surrounded by the banks, the inkjet method is preferable because a small amount of ink can be easily injected into a predetermined portion. The ink used for forming the pixels is appropriately selected according to the type of optical element to be manufactured. When the ink is injected by the inkjet method, the viscosity of the ink is not particularly limited as long as the ink can be satisfactorily ejected from the inkjet head, but is preferably 4 mPa·s or more and 20 mPa·s or less, more preferably 5 mPa·s or more and 10 mPa·s or less. . The viscosity of the ink can be adjusted by adjusting the solid content in the ink, changing the solvent, adding a viscosity modifier, and the like.

The type of optical element is not particularly limited as long as it is an optical element including a bank. Suitable optical elements include color filters, organic EL display elements, quantum dot displays or organic TFT arrays.

Various display devices are manufactured according to a known method using the optical element manufactured by the method described above.

Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples.

[Examples 1 to 13 and Comparative Examples 1 to 19]

In Examples and Comparative Examples, RE1 and RE2, which are cardo resins synthesized according to the following method, were used as the alkali-soluble resin (A) (component (A)). RE2 is a resin obtained by reacting a copolymer of 55 mol% of benzyl methacrylate and 45 mol% of methacrylic acid with 15 mol% of 3,4-epoxycyclohexylmethyl acrylate with respect to all the constituent units of the copolymer. is there.

The method for producing the cardo resin as RE1 will be described below.
First, in a 500 mL four-necked flask, 235 g of a bisphenolfluorene type epoxy resin (epoxy equivalent 235), tetramethylammonium chloride 110 mg, 2,6-di-tert-butyl-4-methylphenol 100 mg, and acrylic acid 72.0 g. Was charged, and the mixture was heated and dissolved at 90 to 100° C. while blowing air at a rate of 25 mL/min. Next, the temperature of the solution was gradually increased in a cloudy state and heated to 120° C. to completely dissolve the solution. At this time, the solution gradually became transparent and viscous, but the stirring was continued as it was. During this period, the acid value was measured, and heating and stirring were continued until it was less than 1.0 mgKOH/g. It took 12 hours for the acid value to reach the target value. Then, the mixture was cooled to room temperature to obtain a bisphenolfluorene type epoxy acrylate represented by the following formula, which was colorless and transparent and solid.

Next, 600 g of 3-methoxybutyl acetate was added to and dissolved in 307.0 g of the above-obtained bisphenolfluorene-type epoxy acrylate, and then 80.5 g of biphenyltetracarboxylic dianhydride and 1 g of tetraethylammonium bromide were added. The mixture was mixed, and the temperature was gradually raised to react at 110 to 115° C. for 4 hours. After confirming the disappearance of the acid anhydride group, 38.0 g of 1,2,3,6-tetrahydrophthalic anhydride was mixed and reacted at 90° C. for 6 hours to obtain a cardo resin. The disappearance of the acid anhydride group was confirmed by IR spectrum.

In the examples and comparative examples, dipentaerythritol hexaacrylate was used as the photopolymerizable monomer (B) (component (B)).

In the examples and comparative examples, the compounds described below were used as the photopolymerization initiator (C) (component (C)). In the examples, the following PI1 to PI7, which are oxime ester compounds represented by the above formula (C1), were used. In Comparative Examples, the following PI8 to PI10, which are oxime ester compounds not corresponding to the oxime ester compound represented by the formula (C1), were used.

In Examples and Comparative Examples, a fluorine-based resin containing the following units in the following ratios was used as the fluorine-based resin (D) (component (D)). In the formula below, the lower right number of each unit represents the content (mol%) of each unit in the fluororesin.

In Examples and Comparative Examples, as the colorant (E) ((E) component), an organic pigment mixed dispersion liquid (CI Pigment Blue 15:6/CI Pigment) corresponding to the light shielding agent (E1) was used. Violet 23/CI Pigment Red 256=40% by mass/20% by mass/40% by mass, solid content concentration 15% by mass) was used. The amount of the colorant (D) described in Table 1 described later is not the amount of the dispersion liquid, but the amount of solid content (the amount of pigment and dispersant) in the dispersion liquid.

In the examples and comparative examples, the following compounds were used as the imidazole generator (F).

Alkali-soluble resin (A) in the type and amount shown in Table 1, photopolymerizable monomer (B) in the amount shown in Table 1, and photopolymerization initiator (C) 3.5 in the type shown in Table 1. Parts by mass, 1 part by mass of the fluororesin (D) described in Table 1, the amount of the colorant (E) described in Table 1, and 0.5 parts by mass of the imidazole generator (F), The solid content concentration was uniformly dissolved and dispersed in the organic solvent (S) so as to be 15% by mass to obtain the photosensitive resin compositions of Examples and Comparative Examples. As the organic solvent (S), a mixed solvent of 15% by mass of diethylene glycol methyl ethyl ether and 85% by mass of propylene glycol monomethyl ether acetate was used.

Using each of the obtained photosensitive resin compositions of Examples and Comparative Examples, according to the following method, pixel repelling (liquid repellency of the non-patterned portion), cross-sectional shape, and methoxybenzene contact angle (of the cured film) Liquid repellency).

[Pixel flip evaluation]
The photosensitive resin composition was spin-coated on a glass substrate (10 cm×10 cm) and heated at 90° C. for 120 seconds to form a coating film having a thickness of 1.0 μm on the surface of the glass substrate. Then, using a proximity exposure apparatus (product name: TME-150RTO, manufactured by Topcon Co., Ltd.), exposure was performed with a dose of 100 mJ/cm ² through a negative mask (width 10 μm, 200 μm square matrix pattern). . The exposed film was developed with a 0.04 mass% KOH aqueous solution at 26° C. for 50 seconds and then baked at 230° C. for 30 minutes to form a matrix pattern.
After methoxybenzene was dropped on the glass substrate on which the matrix pattern was formed, the inside of the matrix was observed with a scanning electron microscope. Next, the area (μm ² ) of the portion (repelled portion) in the matrix where methoxybenzene was not applied was measured from the scanning electron microscope image. The ratio (%) of the repelled area (μm ² ) to the matrix internal area (200×200 μm ² ) was calculated, and the degree of pixel repelling was evaluated based on this ratio (%). The evaluation criteria for pixel flipping are as follows. Table 1 shows the evaluation results of pixel flipping.
◯: The ratio of the area of the flipped portion to the internal area of the matrix is 0% or more and less than 5%.
Δ: The ratio of the area of the flipped portion to the internal area of the matrix is 5% or more and less than 20%.
X: The ratio of the area of the flipped portion to the internal area of the matrix is 20% or more.

[Cross-sectional shape evaluation]
The photosensitive resin composition was spin-coated on a glass substrate (10 cm×10 cm) and heated at 90° C. for 120 seconds to form a coating film having a thickness of 1.0 μm on the surface of the glass substrate. Then, using a proximity exposure device (product name: TME-150RTO, manufactured by Topcon Co., Ltd.), exposure was performed at a dose of 100 mJ/cm ² through a negative mask (line and space pattern having a width of 10 μm). The exposed film is developed with a 0.04 mass% KOH aqueous solution at 26° C. for 50 seconds, and then baked at 230° C. for 30 minutes, and the bonding angle (taper angle) between the pattern and the substrate is measured by a scanning electron microscope. ) Was measured. Table 1 shows the measured taper angles. Based on the measured taper angle, the cross-sectional shape was evaluated according to the following criteria.
◯: 45 degrees or more and 90 degrees or less △: 30 degrees or more and 44 degrees or less x: 29 degrees or less or 91 degrees or more

[Contact angle]
The photosensitive resin composition was spin-coated on a glass substrate (10 cm×10 cm) and heated at 90° C. for 120 seconds to form a coating film having a thickness of 1.0 μm on the surface of the glass substrate. After that, a proximity exposure device (product name: TME-150RTO, manufactured by Topcon Co., Ltd.) was used and exposed at an exposure amount of 100 mJ/cm ² . 50 μL of methoxybenzene was dropped on the surface of the exposed film, and the contact angle was measured using DROP MASTER-700. When the contact angle was 50°C or more, it was evaluated as ◯, and when the contact angle was less than 50°C, it was evaluated as x.

According to Table 1, the alkali-soluble resin (A), the photopolymerizable monomer (B), the photopolymerization initiator (C), and the fluororesin (D) are contained and are represented by the above formula (C1). When the photosensitive resin composition of the example containing a photopolymerization initiator (C-I), which is an oxime ester compound having a structure as described above, is used as the photopolymerization initiator (C), the liquid-repellent property in the non-patterned area is small with less repelling of pixels It can be seen that the expression of sex can be suppressed.
Further, the patterned cured film formed using the photosensitive resin composition of the example shows a taper angle within a range suitable as a bank for manufacturing an optical element, and an organic solvent such as methoxybenzene. Was equipped with liquid repellency.

On the other hand, the photopolymerization initiator (C-I), which is a oxime ester compound having a structure represented by the above formula (C1), is added to the photopolymerization initiator (C) although it contains a fluororesin (D) which is a liquid repellent component. It is understood that when a photosensitive resin composition of a comparative example not included as “)” is used, a large amount of pixel flipping occurs and it is difficult to suppress the development of liquid repellency in the non-patterned portion.
Further, the patterned cured film formed using the photosensitive resin composition of Comparative Example shows a low taper angle unsuitable as a bank for manufacturing an optical element, and also with an organic solvent such as methoxybenzene. There was a case where the liquid repellency of was low.

Claims (15)

A photosensitive resin composition comprising an alkali-soluble resin (A), a photopolymerizable monomer (B), a photopolymerization initiator (C), and a fluororesin (D), wherein the photopolymerization initiator ( C) is the following formula (C1):

(In formula (C1), X ⁰¹ is the following formula (C1-1):

In the structure represented by, a hydrogen atom bonded to the aromatic ring, excluding t2+t3 hydrogen atoms, X ⁰² and X ⁰³ are each independently a monovalent organic group, ⁰⁴ and X ⁰⁵ are each independently a hydrogen atom, an alkyl group having 1 to 11 carbon atoms which may have a substituent, or an aryl group which may have a substituent, and t0 to t3 are Each independently, 0 or 1, at least one of t2 and t3 is 1,
In formula (C1-1), X ⁰⁶ is an aromatic group which may have a monovalent substituent bonded to the nitrogen atom in the carbazole ring by a C—N bond, and X ⁰⁷ and X ⁰⁸ are They are each independently a nitro group, an aroyl group which may have a substituent, or a heteroaroyl group which may have a substituent, and t4 and t5 are each independently 0 or 1. )
The photosensitive resin composition containing the photoinitiator (CI) represented by. The photosensitive resin composition according to claim 1, wherein the sum of t2 and t3 is 1, and the sum of t4 and t5 is 1 or 2. Furthermore, the photosensitive resin composition of any one of Claim 1 or 2 containing a coloring agent (E). The photosensitive resin composition according to claim 3, wherein the colorant (E) is a light shielding agent (E1). The photosensitive resin composition according to claim 4, which is for forming a bank. Forming a coating film by applying the photosensitive resin composition according to any one of claims 1 to 5 onto a substrate;
Exposing the coating film,
The coating film is patterned, or
A method for producing a patterned cured film, wherein position-selective exposure is performed on the coating film, and then development is performed on the exposed coating film. A patterned cured film comprising a cured product of the photosensitive resin composition according to claim 1. A bank comprising a cured product of the photosensitive resin composition for forming a bank according to claim 5. A bank-provided substrate for manufacturing an optical element, comprising the bank according to claim 8 on the substrate. An optical element comprising the substrate with a bank for manufacturing an optical element according to claim 9. A display device comprising the optical element according to claim 10. Forming a coating film by coating the photosensitive resin composition according to claim 5 on a substrate;
Exposing the coating film,
The coating film is patterned, or
A method of forming a bank, wherein position-selective exposure is performed on the coating film, and then development is performed on the exposed coating film. A method of manufacturing an optical element, comprising injecting ink into a region surrounded by the bank formed on a substrate by the method according to claim 12 to form a pixel. The method of manufacturing an optical element according to claim 13, wherein the ink is injected into a region surrounded by the bank by an inkjet method. The method for manufacturing an optical element according to claim 13 or 14, wherein the optical element is a color filter, an organic EL display element, a quantum dot display, or an organic TFT array.