JP2020045421A - Epoxy resin composition and cured product thereof - Google Patents

Epoxy resin composition and cured product thereof Download PDF

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JP2020045421A
JP2020045421A JP2018174770A JP2018174770A JP2020045421A JP 2020045421 A JP2020045421 A JP 2020045421A JP 2018174770 A JP2018174770 A JP 2018174770A JP 2018174770 A JP2018174770 A JP 2018174770A JP 2020045421 A JP2020045421 A JP 2020045421A
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epoxy resin
phosphorus
resin composition
biphenyl
resin
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JP7211744B2 (en
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正浩 宗
Masahiro So
正浩 宗
健 廣田
Takeshi Hirota
健 廣田
一男 石原
Kazuo Ishihara
一男 石原
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Nippon Steel Chemical and Materials Co Ltd
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Priority to CN201910856761.XA priority patent/CN110922717A/en
Priority to TW108133160A priority patent/TWI799644B/en
Priority to KR1020190114996A priority patent/KR20200033205A/en
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/24Di-epoxy compounds carbocyclic
    • C08G59/245Di-epoxy compounds carbocyclic aromatic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B32B15/092Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising epoxy resins
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/18Layered products comprising a layer of synthetic resin characterised by the use of special additives
    • B32B27/20Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/38Layered products comprising a layer of synthetic resin comprising epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22Di-epoxy compounds
    • C08G59/30Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen
    • C08G59/304Di-epoxy compounds containing atoms other than carbon, hydrogen, oxygen and nitrogen containing phosphorus
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0366Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2260/00Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
    • B32B2260/02Composition of the impregnated, bonded or embedded layer
    • B32B2260/021Fibrous or filamentary layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2260/00Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
    • B32B2260/04Impregnation, embedding, or binder material
    • B32B2260/046Synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/30Properties of the layers or laminate having particular thermal properties
    • B32B2307/306Resistant to heat
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/30Properties of the layers or laminate having particular thermal properties
    • B32B2307/308Heat stability
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2363/00Characterised by the use of epoxy resins; Derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2463/00Characterised by the use of epoxy resins; Derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00Properties
    • C08L2201/02Flame or fire retardant/resistant
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00Properties
    • C08L2201/08Stabilised against heat, light or radiation or oxydation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/02Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • C08L2205/025Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/03Polymer mixtures characterised by other features containing three or more polymers in a blend
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/03Polymer mixtures characterised by other features containing three or more polymers in a blend
    • C08L2205/035Polymer mixtures characterised by other features containing three or more polymers in a blend containing four or more polymers in a blend

Abstract

To provide an epoxy resin composition for a printed wiring board having a low phosphorus content and having excellent heat resistance and flame retardancy.SOLUTION: A composition contains a biphenyl aralkyl epoxy resin represented by formula (1), a curing agent, and a phosphorus-containing epoxy resin.SELECTED DRAWING: None

Description

本発明は、高耐熱性、難燃性に優れるプリント配線基板または多層プリント配線基板の製造に用いられるエポキシ樹脂組成物、およびこのエポキシ樹脂組成物から得られるプリプレグ、積層板、またはプリント配線基板に関する。   The present invention relates to an epoxy resin composition used for producing a printed wiring board or a multilayer printed wiring board having high heat resistance and excellent flame retardancy, and a prepreg, a laminate, or a printed wiring board obtained from the epoxy resin composition. .

エポキシ樹脂組成物は接着性、可撓性、耐熱性、耐薬品性、絶縁性、硬化反応性に優れることから、塗料、土木接着、注型、電気電子材料、フィルム材料等多岐にわたって使用されている。特に、電気電子材料の一つであるプリント配線基板用途ではエポキシ樹脂組成物に難燃性を付与することが広く行われている。   Epoxy resin compositions have excellent adhesiveness, flexibility, heat resistance, chemical resistance, insulation, and curing reactivity, and are used in a wide variety of applications such as paint, civil engineering, casting, electrical and electronic materials, and film materials. I have. In particular, in the use of printed wiring boards as one of electric and electronic materials, it is widely used to impart flame retardancy to epoxy resin compositions.

近年の電子機器の難燃化においては、環境へ与える影響に配慮してその燃焼時に発生する有毒ガスの抑制を目的とした対応が図られている。従来の臭素化エポキシ樹脂に代表されるようなハロゲン含有化合物による難燃化から、有機リン化合物による難燃化を図った即ちハロゲンフリー難燃化である。これら対応は電子回路基板に限らず一般的にもリン難燃性として広く使用され認識されており、回路基板に関するエポキシ樹脂分野においても同様である。   2. Description of the Related Art In recent years, in order to make electronic devices flame-retardant, measures have been taken to reduce toxic gas generated during combustion in consideration of the influence on the environment. From the flame retardation by a halogen-containing compound typified by a conventional brominated epoxy resin, the flame retardation is achieved by an organic phosphorus compound, that is, halogen-free flame retardation. These measures are widely used and recognized not only for electronic circuit boards but also as phosphorus flame retardants, and the same applies to the field of epoxy resins related to circuit boards.

このような難燃性を付与したエポキシ樹脂の具体的な代表例としては、特許文献1〜4で開示されているような有機リン化合物を応用する提案がなされている。特許文献1には9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキサイドとエポキシ樹脂類とを所定のモル比で反応させて得られる熱硬化性樹脂が開示されている。   As specific representative examples of such an epoxy resin having flame retardancy, proposals have been made to apply an organic phosphorus compound as disclosed in Patent Documents 1 to 4. Patent Document 1 discloses a thermosetting resin obtained by reacting 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide with epoxy resins at a predetermined molar ratio.

特許文献1,2では難燃性を発現するリン化合物と多官能エポキシ樹脂とを反応させているため、硬化剤を使用した硬化後の耐熱性はFR−4基板相当のガラス転移温度(Tg)を得ることができるが、近年の基板の高密度実装化や自動車キャビンからボンネット駆動部周辺への搭載化が進む中で、さらなる高温対応としてFR−5相当の耐熱性であるTgが要求されているのが実態である。   In Patent Documents 1 and 2, since a phosphorus compound exhibiting flame retardancy is reacted with a polyfunctional epoxy resin, the heat resistance after curing using a curing agent has a glass transition temperature (Tg) equivalent to that of an FR-4 substrate. However, in recent years, as high-density mounting of boards and mounting from a car cabin to the vicinity of a bonnet drive part are progressing, Tg having heat resistance equivalent to FR-5 is required as a higher temperature correspondence. That is the reality.

特許文献3には従来のノボラック型エポキシ樹脂よりもさらに高Tgが得られる3官能エポキシ樹脂を併用したリン含有エポキシ樹脂を合成し、その硬化物が約180℃のTgとなる具体例が記されている。また、特許文献4にはリン化合物とヒドロキシベンズアルデヒドを反応させたリン含有オリゴマーを、多官能エポキシ樹脂と反応させて得られた高耐熱性のリン含有エポキシ樹脂として、硬化物のTgが185℃となる具体例が開示されている。これらのようなFR−5相当の耐熱基準を持つ基板として、数多くの技術が公開されており汎用化されつつある。   Patent Document 3 describes a specific example in which a phosphorus-containing epoxy resin is used in combination with a trifunctional epoxy resin capable of obtaining a higher Tg than a conventional novolak epoxy resin, and the cured product has a Tg of about 180 ° C. ing. Patent Document 4 discloses a highly heat-resistant phosphorus-containing epoxy resin obtained by reacting a phosphorus-containing oligomer obtained by reacting a phosphorus compound with hydroxybenzaldehyde with a polyfunctional epoxy resin, and having a cured product having a Tg of 185 ° C. Some specific examples are disclosed. Numerous technologies have been disclosed as substrates having a heat resistance standard equivalent to FR-5, and are being widely used.

これらいずれの文献においても、難燃性を確保するために高いリン含有率が必要となっており、低いリン含有率でも高い難燃性が発現する手法の確立が求められていた。   In any of these documents, a high phosphorus content is required in order to ensure flame retardancy, and establishment of a technique for expressing high flame retardancy even with a low phosphorus content has been demanded.

特開平11−166035号公報JP-A-11-166035 特開平11−279258号公報JP-A-11-279258 特開2002−206019号公報JP-A-2002-206019 特開2013−35921号公報JP 2013-35921 A

本発明が解決しようとする課題は、低いリン含有率であっても、硬化物において優れた耐熱性および難燃性を発現し、特にプリント配線基板用途で優れた硬化物特性を与えるエポキシ樹脂組成物を提供することにある。   The problem to be solved by the present invention is to provide an epoxy resin composition that exhibits excellent heat resistance and flame retardancy in a cured product even at a low phosphorus content, and provides excellent cured product properties particularly for printed wiring board applications. To provide things.

上記の課題を解決するために、本発明者はエポキシ樹脂について鋭意検討した結果、ビフェノール化合物とビフェニル系縮合剤から得られる構造を有するエポキシ樹脂をリン含有エポキシ樹脂に配合したときに、得られた硬化物の耐熱性および難燃性が、リン含有率の低い場合でも優れることを見出し、本発明を完成した。   In order to solve the above-described problems, the present inventors have conducted intensive studies on epoxy resins, and as a result, obtained when an epoxy resin having a structure obtained from a biphenol compound and a biphenyl-based condensing agent was added to a phosphorus-containing epoxy resin. The inventors have found that the heat resistance and flame retardancy of the cured product are excellent even when the phosphorus content is low, and completed the present invention.

すなわち、本発明はエポキシ樹脂と硬化剤を必須成分とするエポキシ樹脂組成物であって、エポキシ樹脂が下記一般式(1)で表されるビフェニルアラルキル型エポキシ樹脂と、リン含有エポキシ樹脂を含むことを特徴とするエポキシ樹脂組成物である。

Figure 2020045421

ここで、nは繰り返し数であって0以上の数を示し、その平均値は1.3〜20の数であり、R、RおよびRはそれぞれ独立に水素原子または炭素数1〜8の炭化水素基を表す。 That is, the present invention is an epoxy resin composition comprising an epoxy resin and a curing agent as essential components, wherein the epoxy resin comprises a biphenylaralkyl-type epoxy resin represented by the following general formula (1) and a phosphorus-containing epoxy resin. It is an epoxy resin composition characterized by the above-mentioned.
Figure 2020045421

Here, n is the number of repetitions and indicates a number of 0 or more, and the average value is a number of 1.3 to 20, and R 1 , R 2 and R 3 are each independently a hydrogen atom or a carbon number of 1 to 1. 8 represents a hydrocarbon group.

上記リン含有エポキシ樹脂のエポキシ当量は200〜1000g/eq.が好ましく、リン含有率は1.0〜6.0質量%が好ましい。   The phosphorus-containing epoxy resin has an epoxy equivalent of 200 to 1000 g / eq. Is preferable, and the phosphorus content is preferably 1.0 to 6.0% by mass.

また、本発明は、上記エポキシ樹脂組成物を使用したことを特徴とするプリプレグ、積層板、またはプリント配線基板である。   Further, the present invention is a prepreg, a laminated board, or a printed wiring board using the epoxy resin composition.

本発明のエポキシ樹脂組成物は、その硬化物において優れた耐熱性および難燃性を低いリン含有率でも発現するため、プリント配線基板用途に有用であり、特に高信頼性の要求の高い車載用基板に有用である。   The epoxy resin composition of the present invention exhibits excellent heat resistance and flame retardancy even at a low phosphorus content in the cured product thereof, so that it is useful for printed wiring board applications, particularly for automotive applications where high reliability is required. Useful for substrates.

以下、本発明の実施の形態について、詳細に説明する。
本発明のエポキシ樹脂組成物はエポキシ樹脂(A)と硬化剤(B)を必須成分とし、エポキシ樹脂(A)が上記一般式(1)で表されるビフェニルアラルキル型エポキシ樹脂(a1)と、リン含有エポキシ樹脂(a2)を必須成分として含むことを特徴とするエポキシ樹脂組成物である。
Hereinafter, embodiments of the present invention will be described in detail.
The epoxy resin composition of the present invention comprises an epoxy resin (A) and a curing agent (B) as essential components, wherein the epoxy resin (A) is a biphenylaralkyl-type epoxy resin (a1) represented by the general formula (1); An epoxy resin composition comprising a phosphorus-containing epoxy resin (a2) as an essential component.

上記エポキシ樹脂(A)は、ビフェニルアラルキル型エポキシ樹脂(a1)とリン含有エポキシ樹脂(a2)を必須成分とし、それ以外の各種エポキシ樹脂(a3)を含んでもよい。耐熱性と低リン含有率での難燃性を発現するために、ビフェニルアラルキル型エポキシ樹脂(a1)は全エポキシ樹脂(A)中の5質量%以上30質量%以下が好ましく、7質量%以上25質量%以下がより好ましい。   The epoxy resin (A) contains a biphenyl aralkyl type epoxy resin (a1) and a phosphorus-containing epoxy resin (a2) as essential components, and may contain various other epoxy resins (a3). In order to exhibit heat resistance and flame retardancy at a low phosphorus content, the biphenyl aralkyl type epoxy resin (a1) is preferably 5% by mass or more and 30% by mass or less, and more preferably 7% by mass or less in the total epoxy resin (A). It is more preferably at most 25% by mass.

上記一般式(1)において、R、RおよびRはそれぞれ独立に水素原子または炭素数1〜8の炭化水素基を表す。炭素数1〜8の炭化水素基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、n−ブチル基、t−ブチル基、ヘキシル基等の炭素数1〜8のアルキル基や、シクロヘキシル基等の炭素数5〜8のシクロアルキル基や、フェニル基、トリル基、キシリル基等の炭素数6〜8のアリール基や、ベンジル基、フェネチル基、1−フェニルエチル基等の炭素数7〜8のアラルキル基が挙げられるが、これらに限定されず、それぞれ同一でも異なっていてもよい。好ましいR、R、およびRとしては、入手の容易性および硬化物としたときの耐熱性等の物性の観点から、水素原子、1−フェニルエチル基、またはメチル基である。 In the general formula (1), R 1 , R 2 and R 3 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 8 carbon atoms. Examples of the hydrocarbon group having 1 to 8 carbon atoms include an alkyl group having 1 to 8 carbon atoms such as a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a t-butyl group, and a hexyl group. C5-C8 cycloalkyl group such as cyclohexyl group, C6-C8 aryl group such as phenyl group, tolyl group, xylyl group, and carbon number such as benzyl group, phenethyl group and 1-phenylethyl group 7 to 8 aralkyl groups, but are not limited thereto, and may be the same or different. Preferred R 1 , R 2 , and R 3 are a hydrogen atom, a 1-phenylethyl group, or a methyl group from the viewpoints of easy availability and physical properties such as heat resistance when a cured product is obtained.

nは繰り返し数であって0以上の数を示し、その平均値(数平均)は1.3〜20であり、1.5〜15が好ましく、1.7〜10がより好ましく、2〜6がさらに好ましい。   n is the number of repetitions and indicates a number of 0 or more, and the average value (number average) is 1.3 to 20, preferably 1.5 to 15, more preferably 1.7 to 10, and 2 to 6 Is more preferred.

また、ビフェニルアラルキル型エポキシ樹脂(a1)のゲルパーミエーションクロマトグラフィー(GPC)で測定した重量平均分子量(Mw)は、1000〜8000が好ましく、2000〜7000がより好ましく、3000〜6000がさらに好ましい。   The weight average molecular weight (Mw) of the biphenyl aralkyl type epoxy resin (a1) measured by gel permeation chromatography (GPC) is preferably from 1,000 to 8,000, more preferably from 2,000 to 7000, still more preferably from 3,000 to 6,000.

上記nが0であるn=0成分の含有量は、溶剤溶解性の観点からGPC測定による面積%として、15%未満が好ましく、10%以下がより好ましく、6%以下がさらに好ましい。特に、積層板用途等で有機溶媒に溶解して使用する場合は、2〜5%が好ましい。また、n=5成分以上の含有量は、耐熱性向上の観点から20%以上が好ましく、25%以上がより好ましく、27%以上がさらに好ましい。なお、GPCの測定条件は実施例に記載の方法による。   The content of the n = 0 component in which n is 0 is preferably less than 15%, more preferably 10% or less, and still more preferably 6% or less, in terms of area% by GPC measurement from the viewpoint of solvent solubility. In particular, in the case of being used by dissolving in an organic solvent for laminated board use, the content is preferably 2 to 5%. The content of n = 5 or more components is preferably 20% or more, more preferably 25% or more, and even more preferably 27% or more from the viewpoint of improving heat resistance. The GPC measurement conditions are based on the method described in the examples.

上記ビフェニルアラルキル型エポキシ樹脂(a1)のエポキシ当量(g/eq.)は、200〜240が好ましく、205〜235がより好ましく、210〜230がさらに好ましい。また、軟化点は、70〜130℃が好ましく、80〜120℃がより好ましく、90〜110℃がさらに好ましい。   The epoxy equivalent (g / eq.) Of the biphenyl aralkyl type epoxy resin (a1) is preferably 200 to 240, more preferably 205 to 235, and still more preferably 210 to 230. Further, the softening point is preferably from 70 to 130C, more preferably from 80 to 120C, even more preferably from 90 to 110C.

上記ビフェニルアラルキル型エポキシ樹脂(a1)は、WO2011/074517号等に開示された方法により製造することができる。具体的には、ビフェノール化合物とビフェニル系縮合剤とをビフェノール化合物1モルに対して、ビフェニル系縮合剤を1モル未満で反応させ、得られたビフェニルアラルキル型フェノール樹脂をエポキシ化する方法である。   The biphenyl aralkyl type epoxy resin (a1) can be produced by a method disclosed in WO2011 / 074517 or the like. Specifically, this is a method of reacting the biphenol compound and the biphenyl-based condensing agent in less than 1 mol of the biphenyl-based condensing agent per 1 mol of the biphenol compound to epoxidize the obtained biphenylaralkyl-type phenol resin.

上記ビフェノール化合物としては、4,4’−ビフェノール、2,4’−ビフェノール、または2,2’−ビフェノール等が挙げられ、反応性の観点からは、4,4’−ビフェノールが好ましい。また、これらのビフェノール化合物はそれぞれの芳香環上に置換基として炭素数1〜8の炭化水素基を1個有してもよい。   Examples of the biphenol compound include 4,4'-biphenol, 2,4'-biphenol, and 2,2'-biphenol, and from the viewpoint of reactivity, 4,4'-biphenol is preferable. Further, these biphenol compounds may have one hydrocarbon group having 1 to 8 carbon atoms as a substituent on each aromatic ring.

上記ビフェニル系縮合剤としては、ビフェニル−4,4’−ジメタノール、4,4’−ビス(クロロメチル)ビフェニル、4,4’−ビス(ブロモメチル)ビフェニル、4,4’−ビス(メトキシメチル)ビフェニル、4,4’−ビス(エトキシメチル)ビフェニル、ビフェニル−2,4’−ジメタノール、2,4’−ビス(クロロメチル)ビフェニル、2,4’−ビス(ブロモメチル)ビフェニル、2,4’−ビス(メトキシメチル)ビフェニル、2,4’−ビス(エトキシメチル)ビフェニル、ビフェニル−2,2’−ジメタノール、2,2’−ビス(クロロメチル)ビフェニル、2,2’−ビス(ブロモメチル)ビフェニル、2,2’−ビス(メトキシメチル)ビフェニル、2,2’−ビス(エトキシメチル)ビフェニル等が挙げられる。反応性の観点からは、ビフェニル−4,4’−ジメタノール、4,4’−ビス(クロロメチル)ビフェニルが好ましく、イオン性不純分低減の観点からは、ビフェニル−4,4’−ジメタノール、4,4’−ビス(メトキシメチル)ビフェニルが好ましい。また、これらのビフェニル系縮合剤はそれぞれの芳香環上に置換基として炭素数1〜8の炭化水素基を1個または2個有してもよい。   Examples of the biphenyl-based condensing agent include biphenyl-4,4'-dimethanol, 4,4'-bis (chloromethyl) biphenyl, 4,4'-bis (bromomethyl) biphenyl, and 4,4'-bis (methoxymethyl). ) Biphenyl, 4,4'-bis (ethoxymethyl) biphenyl, biphenyl-2,4'-dimethanol, 2,4'-bis (chloromethyl) biphenyl, 2,4'-bis (bromomethyl) biphenyl, 2, 4'-bis (methoxymethyl) biphenyl, 2,4'-bis (ethoxymethyl) biphenyl, biphenyl-2,2'-dimethanol, 2,2'-bis (chloromethyl) biphenyl, 2,2'-bis (Bromomethyl) biphenyl, 2,2′-bis (methoxymethyl) biphenyl, 2,2′-bis (ethoxymethyl) biphenyl and the like. . From the viewpoint of reactivity, biphenyl-4,4'-dimethanol and 4,4'-bis (chloromethyl) biphenyl are preferred. From the viewpoint of reducing ionic impurities, biphenyl-4,4'-dimethanol is preferred. And 4,4′-bis (methoxymethyl) biphenyl are preferred. Further, these biphenyl-based condensing agents may have one or two hydrocarbon groups having 1 to 8 carbon atoms as substituents on each aromatic ring.

ビフェノール化合物とビフェニル系縮合剤との反応には、ビフェニル系縮合剤に対して過剰量のビフェノール化合物を使用する。ビフェニル系縮合剤の使用量は、ビフェノール化合物1モルに対し、0.1〜0.55モルが好ましく、0.3〜0.5モルがより好ましい。ビフェニル系縮合剤の使用量が多すぎると未反応の原料ビフェノール化合物は少なくなるが分子量自体が高くなり、樹脂の軟化点や溶融粘度が高くなり、成形性や作業性に支障をきたす恐れがある。一方、少なすぎると反応終了後、未反応の原料ビフェノール化合物を除く量が多くなり、工業的に好ましくない。   For the reaction between the biphenol compound and the biphenyl-based condensing agent, an excess amount of the biphenol compound is used relative to the biphenyl-based condensing agent. The amount of the biphenyl-based condensing agent to be used is preferably 0.1 to 0.55 mol, more preferably 0.3 to 0.5 mol, per 1 mol of the biphenol compound. If the amount of the biphenyl-based condensing agent is too large, the amount of the unreacted raw material biphenol compound decreases, but the molecular weight itself increases, the softening point and melt viscosity of the resin increase, and there is a possibility that the moldability and workability may be affected. . On the other hand, if the amount is too small, the amount of the unreacted raw material biphenol compound after the completion of the reaction increases, which is not industrially preferable.

通常、この反応は、公知の無機酸、有機酸等の酸触媒の存在下に行う。このような酸触媒としては、例えば、塩酸、硫酸、燐酸等の鉱酸や、ギ酸、シュウ酸、トリフルオロ酢酸、p−トルエンスルホン酸等の有機酸や、塩化亜鉛、塩化アルミニウム、塩化鉄、三フッ化ホウ素等のルイス酸や、活性白土、シリカ−アルミナ、ゼオライト等の固体酸等が挙げられる。   Usually, this reaction is carried out in the presence of a known acid catalyst such as an inorganic acid and an organic acid. Examples of such an acid catalyst include mineral acids such as hydrochloric acid, sulfuric acid, and phosphoric acid, organic acids such as formic acid, oxalic acid, trifluoroacetic acid, and p-toluenesulfonic acid, zinc chloride, aluminum chloride, and iron chloride. Examples include Lewis acids such as boron trifluoride, and solid acids such as activated clay, silica-alumina, and zeolite.

通常、この反応は10〜250℃で1〜20時間行う。さらに、反応の際に溶剤として、例えば、メタノール、エタノール、プロパノール、ブタノール、エチレングリコール、メチルセロソルブ、エチルセロソルブ等のアルコール類や、ジエチレングリコールジメチルエーテル、トリグライム等のエーテル類や、クロロベンゼン、ジクロロベンゼン等のハロゲン化芳香族化合物等を使用することが好ましく、これらの中でエチルセロソルブ、ジエチレングリコールジメチルエーテル、トリグライム等が特に好ましい。   Usually, this reaction is carried out at 10 to 250 ° C. for 1 to 20 hours. Further, as a solvent during the reaction, for example, alcohols such as methanol, ethanol, propanol, butanol, ethylene glycol, methyl cellosolve, ethyl cellosolve, ethers such as diethylene glycol dimethyl ether, triglyme, and halogens such as chlorobenzene, dichlorobenzene It is preferable to use a hydrogenated aromatic compound or the like, and among them, ethyl cellosolve, diethylene glycol dimethyl ether, triglyme and the like are particularly preferable.

上記方法で得られるビフェニルアラルキル型フェノール樹脂は、未反応の原料ビフェノール化合物を多く含むことがあるため、反応終了後に必要に応じて未反応の原料ビフェノール化合物を除去する工程を加えることが好ましい。未反応の原料ビフェノール化合物の含有率は溶剤溶解性の観点から、15%(GPC測定による面積%)未満が好ましく、10%以下がより好ましく、6%以下がさらに好ましく、3〜5%が特に好ましい。   Since the biphenylaralkyl-type phenol resin obtained by the above method may contain a large amount of unreacted raw material biphenol compound, it is preferable to add a step of removing the unreacted raw material biphenol compound after the reaction, if necessary. From the viewpoint of solvent solubility, the content of the unreacted raw material biphenol compound is preferably less than 15% (area% by GPC measurement), more preferably 10% or less, still more preferably 6% or less, and particularly preferably 3 to 5%. preferable.

ビフェニルアラルキル型フェノール樹脂の未反応の原料ビフェノール化合物を除去する工程では、例えば、原料ビフェノール化合物を溶解せず、生成した高分子量成分を溶解させるために、貧溶剤と良溶剤を混合した溶剤を使用し、濾過等の方法により未反応の原料ビフェノール化合物を除去することが好ましい。貧溶剤としては、原料ビフェノール化合物をほとんど溶解しないものであれば特に限定されないが、例えばベンゼン、トルエン、キシレン等の芳香族溶媒が挙げられる。良溶剤としては、上記アルコール類やエーテル類やハロゲン化芳香族化合物や、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類が挙げられる。   In the step of removing the unreacted raw material biphenol compound of the biphenyl aralkyl type phenol resin, for example, a solvent obtained by mixing a poor solvent and a good solvent is used to dissolve the generated high molecular weight component without dissolving the raw material biphenol compound. Then, it is preferable to remove the unreacted starting biphenol compound by a method such as filtration. The poor solvent is not particularly limited as long as it hardly dissolves the raw material biphenol compound, and examples thereof include aromatic solvents such as benzene, toluene, and xylene. Examples of the good solvent include the above-mentioned alcohols, ethers, halogenated aromatic compounds, and ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone.

ビフェニルアラルキル型フェノール樹脂の軟化点は、ビフェノール化合物とビフェニル系縮合剤のモル比を変えることにより容易に調整可能であるが、高分子量体成分を少なくするようにビフェノール化合物とビフェニル系縮合剤のモル比を変更すると、除去が必要な未反応の原料ビフェノール化合物の含有量が増加し、作業性が悪化するとともに収率が大きく低下するために限度がある。   The softening point of the biphenyl aralkyl type phenolic resin can be easily adjusted by changing the molar ratio of the biphenol compound and the biphenyl-based condensing agent, but the molar ratio of the biphenol compound and the biphenyl-based condensing agent is reduced so as to reduce the high molecular weight component. When the ratio is changed, the content of the unreacted raw material biphenol compound that needs to be removed increases, so that the workability deteriorates and the yield greatly decreases, so that there is a limit.

本発明で使用するビフェニルアラルキル型エポキシ樹脂(a1)は、上記ビフェニルアラルキル型フェノール樹脂とエピクロルヒドリンとを反応させることにより製造することができる。この反応は、通常のエポキシ化反応と同様に行うことができる。例えば、ビフェニルアラルキル型フェノール樹脂を過剰のエピクロルヒドリンに溶解した後、水酸化ナトリウム、水酸化カリウム等のアルカリ金属水酸化物の存在下に50〜150℃、好ましくは60〜120℃で1〜10時間反応させる方法が挙げられる。この際、アルカリ金属水酸化物の使用量は、ビフェニルアラルキル型フェノール樹脂中の水酸基1モルに対し、0.8〜1.2モル、好ましくは0.9〜1.0モルである。また、エピクロルヒドリンはビフェニルアラルキル型フェノール樹脂中の水酸基に対して過剰に用いられるが、通常ビフェニルアラルキル型フェノール樹脂中の水酸基1モルに対し、1.5〜15モル、好ましくは2〜8モルである。反応終了後、過剰のエピクロルヒドリンを留去し、残留物をトルエン、メチルイソブチルケトン等の溶剤に溶解し、濾過し、水洗して無機塩を除去し、次いで溶剤を留去することにより、ビフェニルアラルキル型エポキシ樹脂を得ることができる。なお、エポキシ化する際に、生成したエポキシ化合物のエポキシ基が開環、縮合してオリゴマー化したエポキシ化合物が少量副生する場合があるが、かかるエポキシ化合物が存在しても差し支えない。   The biphenyl aralkyl type epoxy resin (a1) used in the present invention can be produced by reacting the above biphenyl aralkyl type phenol resin with epichlorohydrin. This reaction can be performed in the same manner as a usual epoxidation reaction. For example, after dissolving a biphenylaralkyl-type phenol resin in excess epichlorohydrin, 50 to 150 ° C. in the presence of an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide, preferably 1 to 10 hours at 60 to 120 ° C. A method for causing the reaction is mentioned. At this time, the amount of the alkali metal hydroxide to be used is 0.8 to 1.2 mol, preferably 0.9 to 1.0 mol, per 1 mol of the hydroxyl group in the biphenylaralkyl-type phenol resin. Further, epichlorohydrin is used in excess with respect to the hydroxyl group in the biphenylaralkyl-type phenol resin, but is usually 1.5 to 15 mol, preferably 2 to 8 mol, per 1 mol of the hydroxyl group in the biphenylaralkyl-type phenol resin. . After completion of the reaction, excess epichlorohydrin is distilled off, and the residue is dissolved in a solvent such as toluene, methyl isobutyl ketone, filtered, washed with water to remove inorganic salts, and then the solvent is distilled off to obtain a biphenylaralkyl. Mold epoxy resin can be obtained. In the epoxidation, the epoxy group of the produced epoxy compound may be ring-opened and condensed to form a small amount of an oligomerized epoxy compound as a by-product. However, such an epoxy compound may be present.

本発明で使用するリン含有エポキシ樹脂(a2)は、単独または2種類以上使用することが好ましい。また、リン非含有エポキシ樹脂(a3)を併用してもよい。リン含有エポキシ樹脂(a2)としては、特開平04−11662号公報、特開平05−214070号公報、特開2000−309624号公報、および特開2002−265562号公報等で開示されているように、9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキシドやジフェニルホスフィンオキシド等の反応性リン化合物と、必要に応じて、1,4−ベンゾキノンや1,4−ナフトキノン等のキノン化合物とを反応させた後、エポキシ樹脂と反応させることで得られるものが特に好ましい。   The phosphorus-containing epoxy resin (a2) used in the present invention is preferably used alone or in combination of two or more. Further, a phosphorus-free epoxy resin (a3) may be used in combination. Examples of the phosphorus-containing epoxy resin (a2) include those disclosed in JP-A-04-11662, JP-A-05-214070, JP-A-2000-309624, and JP-A-2002-265562. , 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide and a reactive phosphorus compound such as diphenylphosphine oxide and, if necessary, 1,4-benzoquinone and 1,4-naphthoquinone. Those obtained by reacting with a quinone compound and then reacting with an epoxy resin are particularly preferred.

これらのリン含有エポキシ樹脂(a2)のエポキシ当量(g/eq.)は、200〜1000が好ましく、250〜800がより好ましく、270〜700がさらに好ましい。リン含有率は、1.0〜6.0質量%が好ましく、1.5〜5.5質量%がより好ましく、1.7〜5.0質量%がさらに好ましい。   The epoxy equivalent (g / eq.) Of these phosphorus-containing epoxy resins (a2) is preferably from 200 to 1,000, more preferably from 250 to 800, even more preferably from 270 to 700. The phosphorus content is preferably from 1.0 to 6.0% by mass, more preferably from 1.5 to 5.5% by mass, and still more preferably from 1.7 to 5.0% by mass.

リン非含有エポキシ樹脂(a3)を併用する場合は、リン含有エポキシ樹脂(a2)とリン非含有エポキシ樹脂(a3)とを混合したリン含有エポキシ樹脂(a23)のリン含有率が、リン含有エポキシ樹脂(a2)の好ましいリン含有率の範囲内になるように、リン含有エポキシ樹脂(a2)のリン含有率やリン含有エポキシ樹脂(a2)とリン非含有エポキシ樹脂(a3)の混合量を調整する。   When the phosphorus-free epoxy resin (a3) is used in combination, the phosphorus content of the phosphorus-containing epoxy resin (a23) in which the phosphorus-containing epoxy resin (a2) and the phosphorus-free epoxy resin (a3) are mixed is such that the phosphorus-containing epoxy resin (a23) is used. The phosphorus content of the phosphorus-containing epoxy resin (a2) and the mixing amount of the phosphorus-containing epoxy resin (a2) and the phosphorus-free epoxy resin (a3) are adjusted so as to fall within the preferred range of the phosphorus content of the resin (a2). I do.

難燃性試験UL−94のV−0を達成するためのエポキシ樹脂組成物中のリン含有率は、1.0〜5.0質量%が好ましく、1.3〜4.5質量%がより好ましい。1.5〜2.3質量%が特に好ましい。エポキシ樹脂組成物中のリン含有率が少ない場合は難燃性が不十分になる恐れがあり、多い場合は耐熱性や接着性が損なわれる恐れがある。   The phosphorus content of the epoxy resin composition for achieving V-0 of the flame retardancy test UL-94 is preferably 1.0 to 5.0% by mass, more preferably 1.3 to 4.5% by mass. preferable. 1.5 to 2.3% by weight is particularly preferred. When the phosphorus content in the epoxy resin composition is low, the flame retardancy may be insufficient, and when the phosphorus content is high, the heat resistance and adhesion may be impaired.

リン含有エポキシ樹脂(a2)の具体例としては、例えば、エポトートFX−305、エポトートFX−289B、エポトートFX−1225、YDFR−1320、TX−1328(以上、新日鉄住金化学株式会社製)等が挙げられるが、これらに限定されるものではない。   Specific examples of the phosphorus-containing epoxy resin (a2) include, for example, Epotote FX-305, Epotote FX-289B, Epotote FX-1225, YDFR-1320, and TX-1328 (all manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.). However, the present invention is not limited to these.

併用できるリン非含有エポキシ樹脂(a3)としては、特に制限はなく、分子中にエポキシ基を2個以上有する通常のエポキシ樹脂が使用でき、3官能以上のエポキシ樹脂が好ましい。例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、テトラメチルビスフェノールF型エポキシ樹脂、ヒドロキノン型エポキシ樹脂、ビフェニル型エポキシ樹脂、ビスフェノールフルオレン型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、ビスチオエーテル型エポキシ樹脂、レゾルシノール型エポキシ樹脂、上記一般式(1)で表される構造以外のビフェニルアラルキル型エポキシ樹脂、ナフタレンジオール型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、芳香族変性フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、アルキルノボラック型エポキシ樹脂、ビスフェノールノボラック型エポキシ樹脂、ナフトールノボラック型エポキシ樹脂、β−ナフトールアラルキル型エポキシ樹脂、ジナフトールアラルキル型エポキシ樹脂、α−ナフトールアラルキル型エポキシ樹脂、トリスフェニルメタン型エポキシ樹脂、アルキレングリコール型エポキシ樹脂、脂肪族環状エポキシ樹脂、ジアミノジフェニルメタンテトラグリシジルアミン、アミノフェノール型エポキシ樹脂、ウレタン変性エポキシ樹脂、オキサゾリドン環含有エポキシ樹脂等が挙げられるが、これらに限定されるものではない。入手容易さの観点から、ナフタレンジオール型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、芳香族変性フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、α−ナフトールアラルキル型エポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、オキサゾリドン環含有エポキシ樹脂等が好ましい。   The phosphorus-free epoxy resin (a3) that can be used in combination is not particularly limited, and a normal epoxy resin having two or more epoxy groups in a molecule can be used, and a trifunctional or higher functional epoxy resin is preferable. For example, bisphenol A epoxy resin, bisphenol F epoxy resin, tetramethyl bisphenol F epoxy resin, hydroquinone epoxy resin, biphenyl epoxy resin, bisphenol fluorene epoxy resin, bisphenol S epoxy resin, bisthioether epoxy resin, Resorcinol type epoxy resin, biphenyl aralkyl type epoxy resin other than the structure represented by the above general formula (1), naphthalene diol type epoxy resin, phenol novolak type epoxy resin, aromatic modified phenol novolak type epoxy resin, cresol novolak type epoxy resin , Alkyl novolak epoxy resin, bisphenol novolak epoxy resin, naphthol novolak epoxy resin, β-naphthol aralkyl epoxy resin Xy resin, dinaphthol aralkyl epoxy resin, α-naphthol aralkyl epoxy resin, trisphenylmethane epoxy resin, alkylene glycol epoxy resin, aliphatic cyclic epoxy resin, diaminodiphenylmethanetetraglycidylamine, aminophenol epoxy resin, urethane Examples include a modified epoxy resin and an oxazolidone ring-containing epoxy resin, but are not limited thereto. From the viewpoint of availability, naphthalene diol type epoxy resin, phenol novolak type epoxy resin, aromatic modified phenol novolak type epoxy resin, cresol novolak type epoxy resin, α-naphthol aralkyl type epoxy resin, dicyclopentadiene type epoxy resin, oxazolidone Ring-containing epoxy resins are preferred.

本発明のエポキシ樹脂組成物における硬化剤(B)としては、特に制限はなく、従来公知の硬化剤が使用できる。例えば、フェノール樹脂系硬化剤、酸無水物系硬化剤、アミン系硬化剤、またはその他の硬化剤等の通常使用されるものが挙げられるが、これらの硬化剤は単独で使用してもよいし、2種類以上を併用してもよい。   The curing agent (B) in the epoxy resin composition of the present invention is not particularly limited, and a conventionally known curing agent can be used. For example, those usually used such as a phenolic resin-based curing agent, an acid anhydride-based curing agent, an amine-based curing agent, and other curing agents may be mentioned, but these curing agents may be used alone. Two or more types may be used in combination.

本発明のエポキシ樹脂組成物において、硬化剤(B)の使用量は、全エポキシ樹脂(A)のエポキシ基1モルに対して、硬化剤(B)の活性水素基を0.2モル以上1.5モル以下の範囲である。エポキシ基1モルに対して活性水素基が、0.2モル未満または1.5モルを超える場合は、硬化が不完全になり良好な硬化物性が得られない恐れがある。好ましい範囲は0.3モル以上1.5モル以下であり、より好ましい範囲は0.5モル以上1.5モル以下であり、さらに好ましい範囲は0.8モル以上1.2モル以下である。例えば、フェノール樹脂系硬化剤やアミン系硬化剤を用いた場合はエポキシ基に対して活性水素基をほぼ等モル配合し、酸無水物系硬化剤を用いた場合はエポキシ基1モルに対して酸無水物基を0.5〜1.2モル、好ましくは、0.6〜1.0モル配合するとよい。   In the epoxy resin composition of the present invention, the amount of the curing agent (B) used is such that the active hydrogen groups of the curing agent (B) are at least 0.2 mol and 1 mol of the epoxy groups of the entire epoxy resin (A). 0.5 mol or less. When the amount of the active hydrogen group is less than 0.2 mol or more than 1.5 mol per 1 mol of the epoxy group, curing may be incomplete and good cured physical properties may not be obtained. A preferred range is from 0.3 mol to 1.5 mol, a more preferred range is from 0.5 mol to 1.5 mol, and a still more preferred range is from 0.8 mol to 1.2 mol. For example, when a phenolic resin-based curing agent or an amine-based curing agent is used, an active hydrogen group is blended in an approximately equimolar amount with respect to an epoxy group, and when an acid anhydride-based curing agent is used, 1 mol of an epoxy group is used. The acid anhydride group may be compounded in an amount of 0.5 to 1.2 mol, preferably 0.6 to 1.0 mol.

本発明でいう活性水素基とはエポキシ基と反応性の活性水素を有する官能基(加水分解等により活性水素を生ずる潜在性活性水素を有する官能基や、同等な硬化作用を示す官能基を含む。)のことであり、具体的には、酸無水物基やカルボキシル基やアミノ基やフェノール性水酸基等が挙げられる。なお、活性水素基に関して、1モルのカルボキシル基やフェノール性水酸基は1モルと、アミノ基(NH)は2モルと計算される。また、活性水素基が明確ではない場合は、測定によって活性水素当量を求めることができる。例えば、エポキシ当量が既知のフェニルグリシジルエーテル等のモノエポキシ樹脂と活性水素当量が未知の硬化剤を反応させて、消費したモノエポキシ樹脂の量を測定することによって、使用した硬化剤の活性水素当量を求めることができる。 The active hydrogen group referred to in the present invention is a functional group having an active hydrogen reactive with an epoxy group (including a functional group having a latent active hydrogen that generates an active hydrogen by hydrolysis or the like, and a functional group having an equivalent curing action). ), And specific examples include an acid anhydride group, a carboxyl group, an amino group, and a phenolic hydroxyl group. With respect to active hydrogen groups, one mole of a carboxyl group or a phenolic hydroxyl group is calculated as one mole, and two moles of an amino group (NH 2 ) are calculated. When the active hydrogen group is not clear, the active hydrogen equivalent can be determined by measurement. For example, by reacting a monoepoxy resin such as phenylglycidyl ether having a known epoxy equivalent with a curing agent having an unknown active hydrogen equivalent, and measuring the amount of consumed monoepoxy resin, the active hydrogen equivalent of the used curing agent is measured. Can be requested.

フェノール樹脂系硬化剤としては、具体例には、ビスフェノールA、ビスフェノールF、ビスフェノールC、ビスフェノールK、ビスフェノールZ、ビスフェノールS、テトラメチルビスフェノールA、テトラメチルビスフェノールF、テトラメチルビスフェノールS、テトラメチルビスフェノールZ、ジヒドロキシジフェニルスルフィド、4,4’−チオビス(3−メチル−6−t−ブチルフェノール)等のビスフェノール類や、上記ビフェノール化合物や、カテコール、レゾルシン、メチルレゾルシン、ハイドロキノン、モノメチルハイドロキノン、ジメチルハイドロキノン、トリメチルハイドロキノン、モノ−t−ブチルハイドロキノン、ジ−t−ブチルハイドロキノン等ジヒドロキシベンゼン類や、ジヒドロキシナフタレン、ジヒドロキシメチルナフタレン、トリヒドロキシナフタレン等のヒドロキシナフタレン類や、LC−950PM60(Shin−AT&C社製)等のリン含有フェノール硬化剤や、ショウノールBRG−555(アイカ工業株式会社製)等のフェノールノボラック樹脂、DC−5(新日鉄住金化学株式会社製)等のクレゾールノボラック樹脂、芳香族変性フェノールノボラック樹脂、ビスフェノールAノボラック樹脂、レヂトップTPM−100(群栄化学工業株式会社製)等のトリスヒドロキシフェニルメタン型ノボラック樹脂、ナフトールノボラック樹脂等のフェノール類、ナフトール類および/またはビスフェノール類とアルデヒド類との縮合物、SN−160、SN−395、SN−485(新日鉄住金化学株式会社製)等のフェノール類、ナフトール類および/またはビスフェノール類とキシリレングリコールとの縮合物、フェノール類および/またはナフトール類とイソプロペニルアセトフェノンとの縮合物、フェノール類、ナフトール類および/またはビスフェノール類とジシクロペンタジエンとの反応物、フェノール類、ナフトール類および/またはビスフェノール類とビフェニル系架橋剤との縮合物等のいわゆる「ノボラック型フェノール樹脂」と言われるフェノール化合物等が挙げられる。入手容易さの観点から、フェノールノボラック樹脂、ジシクロペンタジエン型フェノール樹脂、トリスヒドロキシフェニルメタン型ノボラック樹脂、芳香族変性フェノールノボラック樹脂等が好ましい。   Specific examples of the phenolic resin-based curing agent include bisphenol A, bisphenol F, bisphenol C, bisphenol K, bisphenol Z, bisphenol S, tetramethylbisphenol A, tetramethylbisphenol F, tetramethylbisphenol S, and tetramethylbisphenol Z. , Dihydroxydiphenyl sulfide, bisphenols such as 4,4′-thiobis (3-methyl-6-t-butylphenol), the above-mentioned biphenol compounds, catechol, resorcin, methylresorcin, hydroquinone, monomethylhydroquinone, dimethylhydroquinone, trimethylhydroquinone Dihydroxybenzenes such as mono-t-butylhydroquinone, di-t-butylhydroquinone, dihydroxynaphthalene, dihydric Hydroxynaphthalenes such as xylmethylnaphthalene and trihydroxynaphthalene; phosphorus-containing phenol curing agents such as LC-950PM60 (manufactured by Shin-AT &C); and phenol novolak resins such as Shaunol BRG-555 (manufactured by Aika Kogyo). Novolak resin, aromatic modified phenol novolak resin, bisphenol A novolak resin such as DC-5 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.), and trishydroxyphenylmethane type such as resin top TPM-100 (manufactured by Gunei Chemical Industry Co., Ltd.) Phenols such as novolak resin and naphthol novolak resin; condensates of naphthols and / or bisphenols with aldehydes; phenols such as SN-160, SN-395, and SN-485 (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.) Condensates of naphthols and / or bisphenols with xylylene glycol, condensates of phenols and / or naphthols with isopropenylacetophenone, reactants of phenols, naphthols and / or bisphenols with dicyclopentadiene And phenol compounds such as phenols, naphthols and / or condensates of bisphenols and biphenyl-based cross-linking agents. From the viewpoint of availability, phenol novolak resins, dicyclopentadiene type phenol resins, trishydroxyphenylmethane type novolak resins, aromatic modified phenol novolak resins, and the like are preferable.

ノボラック型フェノール樹脂の場合、フェノール類としては、フェノール、クレゾール、キシレノール、ブチルフェノール、アミルフェノール、ノニルフェノール、ブチルメチルフェノール、トリメチルフェノール、フェニルフェノール等が挙げられ、ナフトール類としては、1−ナフトール、2−ナフトール等が挙げられ、その他、上記ビフェノール化合物やビスフェノール類が挙げられる。アルデヒド類としては、ホルムアルデヒド、アセトアルデヒド、プロピルアルデヒド、ブチルアルデヒド、バレルアルデヒド、カプロンアルデヒド、ベンズアルデヒド、クロルアルデヒド、ブロムアルデヒド、グリオキザール、マロンアルデヒド、スクシンアルデヒド、グルタルアルデヒド、アジピンアルデヒド、ピメリンアルデヒド、セバシンアルデヒド、アクロレイン、クロトンアルデヒド、サリチルアルデヒド、フタルアルデヒド、ヒドロキシベンズアルデヒド等が例示される。ビフェニル系架橋剤としてビス(メチロール)ビフェニル、ビス(メトキシメチル)ビフェニル、ビス(エトキシメチル)ビフェニル、ビス(クロロメチル)ビフェニル等が挙げられる。   In the case of a novolak type phenol resin, phenols include phenol, cresol, xylenol, butyl phenol, amyl phenol, nonyl phenol, butyl methyl phenol, trimethyl phenol, phenyl phenol, etc., and naphthols include 1-naphthol, 2-naphthol Naphthol; and the above-mentioned biphenol compounds and bisphenols. Aldehydes include formaldehyde, acetaldehyde, propylaldehyde, butyraldehyde, valeraldehyde, caproaldehyde, benzaldehyde, chloraldehyde, bromaldehyde, glyoxal, malonaldehyde, succinaldehyde, glutaraldehyde, adipaldehyde, pimeraldehyde, sebacaldehyde , Acrolein, crotonaldehyde, salicylaldehyde, phthalaldehyde, hydroxybenzaldehyde and the like. Biphenyl-based crosslinking agents include bis (methylol) biphenyl, bis (methoxymethyl) biphenyl, bis (ethoxymethyl) biphenyl, bis (chloromethyl) biphenyl and the like.

酸無水物系硬化剤としては、具体的には、メチルテトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸、無水ピロメリット酸、無水フタル酸、無水トリメリット酸、メチルナジック酸等が挙げられる。   Specific examples of the acid anhydride-based curing agent include methyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, pyromellitic anhydride, phthalic anhydride, trimellitic anhydride, methylnadic acid, and the like.

アミン系硬化剤としては、具体的には、ジエチレントリアミン、トリエチレンテトラミン、メタキシレンジアミン、イソホロンジアミン、ジアミノジフェニルメタン、ジアミノジフェニルスルフォン、ジアミノジフェニルエーテル、ベンジルジメチルアミン、2,4,6−トリス(ジメチルアミノメチル)フェノール、ジシアンジアミド、ダイマー酸等の酸類とポリアミン類との縮合物であるポリアミドアミン等のアミン系化合物等が挙げられる。   Specific examples of the amine-based curing agent include diethylenetriamine, triethylenetetramine, metaxylenediamine, isophoronediamine, diaminodiphenylmethane, diaminodiphenylsulfone, diaminodiphenylether, benzyldimethylamine, 2,4,6-tris (dimethylaminomethyl ) Amine compounds such as polyamidoamine which is a condensate of acids such as phenol, dicyandiamide, dimer acid and polyamines.

その他の硬化剤として、具体的には、トリフェニルホスフィン等のホスフィン化合物、テトラフェニルホスホニウムブロミド等のホスホニウム塩、2−メチルイミダゾール、2−フェニルイミダゾール、2−エチル−4−メチルイミダゾール、2−ウンデシルイミダゾール、1−シアノエチル−2−メチルイミダゾール等のイミダゾール類、イミダゾール類とトリメリット酸、イソシアヌル酸またはホウ酸等との塩であるイミダゾール塩類、トリメチルアンモニウムクロリド等の4級アンモニウム塩類、ジアザビシクロ化合物、ジアザビシクロ化合物とフェノール類やフェノールノボラック樹脂類等との塩類、3フッ化ホウ素とアミン類やエーテル化合物等との錯化合物、芳香族ホスホニウム塩、またはヨードニウム塩等が挙げられる。   As other curing agents, specifically, phosphine compounds such as triphenylphosphine, phosphonium salts such as tetraphenylphosphonium bromide, 2-methylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, 2-un Decyl imidazole, imidazoles such as 1-cyanoethyl-2-methylimidazole, imidazoles which are salts of imidazoles with trimellitic acid, isocyanuric acid or boric acid, quaternary ammonium salts such as trimethylammonium chloride, diazabicyclo compounds, Salts of diazabicyclo compounds with phenols and phenol novolak resins, complex compounds of boron trifluoride with amines and ether compounds, aromatic phosphonium salts, iodonium salts and the like can be mentioned.

エポキシ樹脂組成物には必要に応じて硬化促進剤を使用することができる。使用できる硬化促進剤の例としては2−メチルイミダゾール、2−エチルイミダゾール、2−エチル−4−メチルイミダゾール等のイミダゾール類、2−(ジメチルアミノメチル)フェノール、1,8−ジアザ−ビシクロ(5,4,0)ウンデセン−7等の第3級アミン類、トリフェニルホスフィン、トリシクロヘキシルホスフィン、トリフェニルホスフィントリフェニルボラン等のホスフィン類、オクチル酸スズ等の金属化合物が挙げられる。硬化促進剤は本発明のエポキシ樹脂組成物中のエポキシ樹脂成分100質量部に対して0.02〜5質量部が必要に応じて用いられる。硬化促進剤を用いることにより、硬化温度を下げたり、硬化時間を短縮したりすることができる。   A curing accelerator can be used as needed in the epoxy resin composition. Examples of curing accelerators that can be used include imidazoles such as 2-methylimidazole, 2-ethylimidazole, 2-ethyl-4-methylimidazole, 2- (dimethylaminomethyl) phenol, 1,8-diaza-bicyclo (5 Tertiary amines such as (4,0,0) undecene-7; phosphines such as triphenylphosphine, tricyclohexylphosphine and triphenylphosphinetriphenylborane; and metal compounds such as tin octylate. The curing accelerator is used in an amount of 0.02 to 5 parts by mass, as needed, with respect to 100 parts by mass of the epoxy resin component in the epoxy resin composition of the present invention. By using a curing accelerator, the curing temperature can be lowered and the curing time can be shortened.

エポキシ樹脂組成物には、粘度調整用として有機溶媒または反応性希釈剤を使用することができる。   In the epoxy resin composition, an organic solvent or a reactive diluent can be used for adjusting the viscosity.

有機溶媒としては、例えば、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド等のアミド類や、エチレングリコールモノメチルエーテル、ジメトキシジエチレングリコール、エチレングリコールジエチルエーテル、ジエチレングリコールジエチルエーテル、トリエチレングリコールジメチルエーテル等のエーテル類や、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類や、メタノール、エタノール、1−メトキシ−2−プロパノール、2−エチル−1−ヘキサノール、ベンジルアルコール、エチレングリコール、プロピレングリコール、ブチルジグリコール、パインオイル等のアルコール類や、酢酸ブチル、酢酸メトキシブチル、メチルセロソルブアセテート、セロソルブアセテート、エチルジグリコールアセテート、プロピレングリコールモノメチルエーテルアセテート、カルビトールアセテート、ベンジルアルコールアセテート等の酢酸エステル類や、安息香酸メチル、安息香酸エチル等の安息香酸エステル類や、メチルセロソルブ、セロソルブ、ブチルセロソルブ等のセロソルブ類や、メチルカルビトール、カルビトール、ブチルカルビトール等のカルビトール類や、ベンゼン、トルエン、キシレン等の芳香族炭化水素類や、ジメチルスルホキシド、アセトニトリル、N−メチルピロリドン等が挙げられるが、これらに限定されるものではない。   Examples of the organic solvent include amides such as N, N-dimethylformamide and N, N-dimethylacetamide, and ethers such as ethylene glycol monomethyl ether, dimethoxydiethylene glycol, ethylene glycol diethyl ether, diethylene glycol diethyl ether, and triethylene glycol dimethyl ether. And ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone, methanol, ethanol, 1-methoxy-2-propanol, 2-ethyl-1-hexanol, benzyl alcohol, ethylene glycol, propylene glycol and butyl diglycol , Alcohols such as pine oil, butyl acetate, methoxybutyl acetate, methyl cellosolve acetate, cellosolve acetate Acetates such as ethyl diglycol acetate, propylene glycol monomethyl ether acetate, carbitol acetate and benzyl alcohol acetate; benzoates such as methyl benzoate and ethyl benzoate; and cellosolves such as methyl cellosolve, cellosolve and butyl cellosolve And carbitols such as methyl carbitol, carbitol, and butyl carbitol; aromatic hydrocarbons such as benzene, toluene and xylene; dimethyl sulfoxide, acetonitrile, and N-methylpyrrolidone. It is not limited.

反応性希釈剤としては、例えば、アリルグリシジルエーテル、ブチルグリシジルエーテル、2−エチルヘキシルグリシジルエーテル、フェニルグリシジルエーテル、トリルグリシジルエーテル等の単官能グリシジルエーテル類や、レゾルシノールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、1,4−ブタンジオールジグリシジルエーテル、1,6−ヘキサンジオールジグリシジルエーテル、シクロヘキサンジメタノールジグリシジルエーテル、プロピレングリコールジグリシジルエーテル等の二官能グリシジルエーテル類や、グリセロールポリグリシジルエーテル、トリメチロールプロパンポリグリシジルエーテル、トリメチロールエタンポリグリシジルエーテル、ペンタエリスリトールポリグリシジルエーテル等の多官能グリシジルエーテル類や、ネオデカン酸グリシジルエステル等のグリシジルエステル類や、フェニルジグリシジルアミン、トリルジグリシジルアミン等のグリシジルアミン類が挙げられるが、これらに限定されるものではない。   Examples of the reactive diluent include monofunctional glycidyl ethers such as allyl glycidyl ether, butyl glycidyl ether, 2-ethylhexyl glycidyl ether, phenyl glycidyl ether, and tolyl glycidyl ether; resorcinol diglycidyl ether; neopentyl glycol diglycidyl ether. Glycidyl ethers such as 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, cyclohexane dimethanol diglycidyl ether, propylene glycol diglycidyl ether, glycerol polyglycidyl ether, and trimethylolpropane Polyglycidyl ether, trimethylolethane polyglycidyl ether, pentaerythritol polyglycidyl ether Polyfunctional glycidyl ethers or, or glycidyl esters such as neodecanoic acid glycidyl ester, phenyl diglycidyl amine, although glycidyl amines such as tolyl diglycidyl amines, but not limited thereto.

これらの有機溶媒または反応性希釈剤は、単独または複数種類を混合したものを、不揮発分として90質量%以下で使用することが好ましく、その適正な種類や使用量は用途によって適宜選択される。例えば、プリント配線基板用途では、メチルエチルケトン、アセトン、1−メトキシ−2−プロパノール等の沸点が160℃以下の極性溶媒であることが好ましく、その使用量は不揮発分で40〜80質量%が好ましい。また、接着フィルム用途では、例えば、ケトン類、酢酸エステル類、カルビトール類、芳香族炭化水素類、ジメチルホルムアミド、ジメチルアセトアミド、N−メチルピロリドン等を使用することが好ましく、その使用量は不揮発分で30〜60質量%が好ましい。   These organic solvents or reactive diluents are preferably used alone or as a mixture of two or more kinds at a non-volatile content of 90% by mass or less, and the appropriate kind and amount used are appropriately selected depending on the application. For example, for use in printed wiring boards, polar solvents having a boiling point of 160 ° C. or lower, such as methyl ethyl ketone, acetone, and 1-methoxy-2-propanol, are preferably used, and the amount used is preferably 40 to 80% by mass in terms of nonvolatile components. Further, in the adhesive film application, for example, it is preferable to use ketones, acetates, carbitols, aromatic hydrocarbons, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, etc. Is preferably 30 to 60% by mass.

エポキシ樹脂組成物は、特性を損ねない範囲で他の熱硬化性樹脂、熱可塑性樹脂を配合してもよい。例えば、フェノール樹脂、アクリル樹脂、石油樹脂、インデン樹脂、クマロンインデン樹脂、フェノキシ樹脂、ポリウレタン樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、ポリアミドイミド樹脂、ポリエーテルイミド樹脂、ポリフェニレンエーテル樹脂、変性ポリフェニレンエーテル樹脂、ポリエーテルスルホン樹脂、ポリスルホン樹脂、ポリエーテルエーテルケトン樹脂、ポリフェニレンスルフィド樹脂、ポリビニルホルマール樹脂等が挙げられるがこれらに限定されるものではない。   The epoxy resin composition may contain another thermosetting resin or a thermoplastic resin as long as the properties are not impaired. For example, phenolic resin, acrylic resin, petroleum resin, indene resin, coumarone indene resin, phenoxy resin, polyurethane resin, polyester resin, polyamide resin, polyimide resin, polyamideimide resin, polyetherimide resin, polyphenylene ether resin, modified polyphenylene ether Examples include, but are not limited to, resins, polyether sulfone resins, polysulfone resins, polyether ether ketone resins, polyphenylene sulfide resins, polyvinyl formal resins, and the like.

エポキシ樹脂組成物には、得られる硬化物の難燃性の向上を目的に、公知の各種難燃剤を併用することができる。併用できる難燃剤としては、例えば、リン系難燃剤、窒素系難燃剤、シリコーン系難燃剤、無機系難燃剤等が挙げられ、特にリン系難燃剤が好ましい。これらの難燃剤は単独でも、2種類以上でも併用してよい。   Various known flame retardants can be used in combination with the epoxy resin composition for the purpose of improving the flame retardancy of the obtained cured product. Examples of the flame retardant that can be used in combination include a phosphorus-based flame retardant, a nitrogen-based flame retardant, a silicone-based flame retardant, and an inorganic flame retardant, and a phosphorus-based flame retardant is particularly preferable. These flame retardants may be used alone or in combination of two or more.

リン系難燃剤は、無機リン系化合物、有機リン系化合物のいずれも使用できる。無機リン系化合物としては、例えば、赤リン、リン酸一アンモニウム、リン酸二アンモニウム、リン酸三アンモニウム、ポリリン酸アンモニウム等のリン酸アンモニウム類、リン酸アミド等の無機系含窒素リン化合物が挙げられる。有機リン系化合物としては、例えば、脂肪族リン酸エステル、リン酸エステル化合物、例えば、PX−200(大八化学工業株式会社製)等の縮合リン酸エステル類、ホスホン酸化合物、ホスフィン酸化合物、ホスフィンオキシド化合物、例えばPPQ(北興化学工業株式会社製)、ホスホラン化合物、フォスファゼン等の有機系含窒素リン化合物等の汎用有機リン系化合物や、ホスフィン酸の金属塩の他、9,10−ジヒドロ−9−オキサ−10−ホスファフェナントレン−10−オキシド(DOPO)、10−(2,5−ジヒドロオキシフェニル)−10H−9−オキサ−10−ホスファフェナントレン−10−オキシド、10−(2,7−ジヒドロオキシナフチル)−10H−9−オキサ−10−ホスファフェナントレン−10−オキシド等の環状有機リン化合物や、それらをフェノール樹脂等の化合物と反応させた誘導体であるリン含有硬化剤等が挙げられる。   As the phosphorus-based flame retardant, any of inorganic phosphorus-based compounds and organic phosphorus-based compounds can be used. Examples of the inorganic phosphorus-based compound include inorganic phosphorus-containing phosphorus compounds such as red phosphorus, monoammonium phosphate, diammonium phosphate, triammonium phosphate, ammonium phosphate and the like, and phosphate amides and the like. Can be Examples of the organic phosphorus compound include aliphatic phosphate esters, phosphate ester compounds, for example, condensed phosphate esters such as PX-200 (manufactured by Daihachi Chemical Industry Co., Ltd.), phosphonic acid compounds, phosphinic acid compounds, General-purpose organic phosphorus compounds such as phosphine oxide compounds such as PPQ (manufactured by Hokko Chemical Industry Co., Ltd.), phosphorane compounds, and organic nitrogen-containing phosphorus compounds such as phosphazene; metal salts of phosphinic acid; and 9,10-dihydro- 9-oxa-10-phosphaphenanthrene-10-oxide (DOPO), 10- (2,5-dihydroxyphenyl) -10H-9-oxa-10-phosphaphenanthrene-10-oxide, 10- (2 7-dihydrooxynaphthyl) -10H-9-oxa-10-phosphaphenanthrene-10-oxo And cyclic organic phosphorus compounds such as de, phosphorus-containing curing agent such as those of a derivative with a compound such as phenol resin.

難燃剤の配合量としては、リン系難燃剤の種類、エポキシ樹脂組成物の成分、所望の難燃性の程度によって適宜選択される。リン系難燃剤を配合する場合においても、例えば、エポキシ樹脂組成物中の有機成分(有機溶媒を除く)中のリン含有率は、全リン化合物(リン含有エポキシ樹脂とリン系難燃剤)の合計量として、好ましくは0.2質量%以上4質量%以下であり、より好ましくは0.4質量%以上3.5質量%以下であり、さらに好ましくは0.6質量%以上3質量%以下である。リン含有率が少ないと難燃性の確保が難しくなる恐れがあり、多すぎると耐熱性に悪影響を与える恐れがあり、本発明の課題も達成できない。また、水酸化マグネシウム等の難燃助剤を併用してもよい。   The blending amount of the flame retardant is appropriately selected depending on the type of the phosphorus-based flame retardant, the components of the epoxy resin composition, and the desired degree of flame retardancy. Even when a phosphorus-based flame retardant is blended, for example, the phosphorus content in the organic component (excluding the organic solvent) in the epoxy resin composition is the sum of all the phosphorus compounds (the phosphorus-containing epoxy resin and the phosphorus-based flame retardant). The amount is preferably from 0.2% by mass to 4% by mass, more preferably from 0.4% by mass to 3.5% by mass, still more preferably from 0.6% by mass to 3% by mass. is there. If the phosphorus content is low, it may be difficult to ensure flame retardancy. If the phosphorus content is too high, the heat resistance may be adversely affected, and the object of the present invention cannot be achieved. Further, a flame retardant aid such as magnesium hydroxide may be used in combination.

エポキシ樹脂組成物には必要に応じて充填材を用いることができる。具体的には、溶融シリカ、結晶シリカ、アルミナ、窒化ケイ素、水酸化アルミニウム、ベーマイト、水酸化マグネシウム、タルク、マイカ、炭酸カルシウム、ケイ酸カルシウム、水酸化カルシウム、炭酸マグネシウム、炭酸バリウム、硫酸バリウム、窒化ホウ素、炭素、炭素繊維、ガラス繊維、アルミナ繊維、シリカアルミナ繊維、炭化ケイ素繊維、ポリエステル繊維、セルロース繊維、アラミド繊維、セラミック繊維、微粒子ゴム、熱可塑性エラストマー、顔料等が挙げられる。一般的に充填材を用いる理由としては耐衝撃性の向上効果が挙げられる。また、水酸化アルミニウム、ベーマイト、水酸化マグネシウム等の金属水酸化物を用いた場合は、難燃助剤として作用し難燃性が向上する効果がある。これら充填材の配合量はエポキシ樹脂組成物100質量部に対し、1〜150質量部が好ましく、10〜70質量部がより好ましい。配合量が多いと積層板用途として必要な接着性が低下する恐れがあり、さらに硬化物が脆く、十分な機械物性を得られなくなる恐れがある。また配合量が少ないと、硬化物の耐衝撃性の向上等、充填剤の配合効果がでない恐れがある。   A filler can be used in the epoxy resin composition as needed. Specifically, fused silica, crystalline silica, alumina, silicon nitride, aluminum hydroxide, boehmite, magnesium hydroxide, talc, mica, calcium carbonate, calcium silicate, calcium hydroxide, magnesium carbonate, barium carbonate, barium sulfate, Examples include boron nitride, carbon, carbon fiber, glass fiber, alumina fiber, silica-alumina fiber, silicon carbide fiber, polyester fiber, cellulose fiber, aramid fiber, ceramic fiber, fine particle rubber, thermoplastic elastomer, and pigment. Generally, the reason for using a filler is an effect of improving impact resistance. When a metal hydroxide such as aluminum hydroxide, boehmite, or magnesium hydroxide is used, it acts as a flame-retardant aid and has the effect of improving flame retardancy. The amount of these fillers is preferably from 1 to 150 parts by mass, more preferably from 10 to 70 parts by mass, per 100 parts by mass of the epoxy resin composition. If the amount is too large, the adhesiveness required for a laminated board may be reduced, and the cured product may be brittle, and sufficient mechanical properties may not be obtained. On the other hand, if the compounding amount is small, there is a possibility that the compounding effect of the filler such as an improvement in impact resistance of the cured product is not obtained.

エポキシ樹脂組成物を板状基板等とする場合、その寸法安定性、曲げ強度等の点で繊維状のものが好ましい充填材として挙げられる。より好ましくはガラス繊維を網目状に編み上げたガラス繊維基板が挙げられる。   When the epoxy resin composition is used as a plate-like substrate or the like, a fibrous filler is preferred as a filler in terms of dimensional stability, bending strength and the like. More preferably, a glass fiber substrate in which glass fibers are woven in a mesh shape is used.

エポキシ樹脂組成物は、さらに必要に応じてシランカップリング剤、酸化防止剤、離型剤、消泡剤、乳化剤、揺変性付与剤、平滑剤、難燃剤、顔料等の核種添加剤を配合することができる。これらの添加剤はエポキシ樹脂組成物100質量部に対し、0.01〜20質量部の範囲が好ましい。   The epoxy resin composition further incorporates nuclide additives such as a silane coupling agent, an antioxidant, a release agent, an antifoaming agent, an emulsifier, a thixotropic agent, a smoothing agent, a flame retardant, and a pigment, if necessary. be able to. These additives are preferably in the range of 0.01 to 20 parts by mass based on 100 parts by mass of the epoxy resin composition.

エポキシ樹脂組成物は繊維状基材に含浸させることによりプリント配線基板等で用いられるプリプレグを作成することができる。繊維状基材としてはガラス等の無機繊維や、ポリエステル樹脂等、ポリアミン樹脂、ポリアクリル樹脂、ポリイミド樹脂、芳香族ポリアミド樹脂等の有機質繊維の織布または不織布を用いることができるがこれに限定されるものではない。エポキシ樹脂組成物からプリプレグを製造する方法としては、特に限定するものではなく、例えば、エポキシ樹脂組成物を溶剤で粘度調整して作成した樹脂ワニスに繊維状基材を浸漬して含浸した後、加熱乾燥して樹脂成分を半硬化(Bステージ化)して得られるものであり、例えば、100〜200℃で1〜40分間加熱乾燥することができる。ここで、プリプレグ中の樹脂量は、30〜80質量%とすることが好ましい。   By impregnating the fibrous base material with the epoxy resin composition, a prepreg used for a printed wiring board or the like can be prepared. As the fibrous base material, an inorganic fiber such as glass, a polyester resin or the like, a polyamine resin, a polyacrylic resin, a polyimide resin, an organic fiber such as an aromatic polyamide resin, or a woven or nonwoven fabric of an organic fiber can be used. Not something. The method for producing the prepreg from the epoxy resin composition is not particularly limited, for example, after impregnating a resin varnish prepared by adjusting the viscosity of the epoxy resin composition with a solvent, It is obtained by heating and drying to obtain a semi-cured (B-staged) resin component. For example, it can be heated and dried at 100 to 200 ° C. for 1 to 40 minutes. Here, the amount of the resin in the prepreg is preferably 30 to 80% by mass.

プリプレグを硬化するには、一般にプリント配線基板を製造するときに用いられる積層板の硬化方法を用いることができるが、これに限定されるものではない。例えば、プリプレグを用いて積層板を形成する場合、プリプレグを一枚または複数枚積層し、片側または両側に金属箔を配置して積層物を構成し、この積層物を加熱・加圧して積層一体化する。ここで金属箔としては、銅、アルミニウム、真鍮、ニッケル等の単独、合金、複合の金属箔を用いることができる。そして、作成した積層物を加圧加熱することでプリプレグを硬化させ、積層板を得ることができる。その時、加熱温度を160〜220℃、加圧圧力を50〜500N/cm、加熱加圧時間を40〜240分間とすることが好ましく、目的とする硬化物を得ることができる。加熱温度が低いと硬化反応が十分に進行せず、高いとエポキシ樹脂組成物の分解が始まる恐れがある。また、加圧圧力が低いと得られる積層板の内部に気泡が残留し、電気的特性が低下する場合があり、高いと硬化する前に樹脂が流れてしまい、所望厚みの硬化物が得られない恐れがある。さらに、加熱加圧時間が短いと十分に硬化反応が進行しない恐れがあり、長いとプリプレグ中のエポキシ樹脂組成物の熱分解が起こる恐れがあり、好ましくない。また、上記積層板にアディティブ法やサブトラクティブ法等にて回路形成を施して、プリント配線基板を得ることができる。 In order to cure the prepreg, a method of curing a laminate generally used when manufacturing a printed wiring board can be used, but the method is not limited thereto. For example, when forming a laminate using prepreg, one or more prepregs are laminated, metal foil is arranged on one or both sides to form a laminate, and the laminate is heated and pressed to form a laminate. Become Here, as the metal foil, a single, alloy, or composite metal foil of copper, aluminum, brass, nickel, or the like can be used. Then, the prepreg is cured by heating and pressurizing the produced laminate, and a laminate can be obtained. At that time, the heating temperature is preferably 160 to 220 ° C., the pressure is preferably 50 to 500 N / cm 2 , and the heating and pressing time is preferably 40 to 240 minutes, so that the desired cured product can be obtained. If the heating temperature is low, the curing reaction does not proceed sufficiently, and if the heating temperature is high, decomposition of the epoxy resin composition may start. In addition, if the pressure is low, bubbles may remain inside the obtained laminate, and the electrical characteristics may decrease.If the pressure is high, the resin flows before curing, and a cured product having a desired thickness is obtained. There is no fear. Further, if the heating and pressurizing time is short, the curing reaction may not proceed sufficiently, and if it is long, the epoxy resin composition in the prepreg may be thermally decomposed, which is not preferable. Further, a circuit may be formed on the laminate by an additive method, a subtractive method, or the like to obtain a printed wiring board.

また、上記積層板を内層材として、多層積層板を得ることもできる。例えば、まず積層板にアディティブ法やサブトラクティブ法等にて回路形成を行い、その回路表面を酸溶液で黒化処理することで内層材が得られる。得られた内層材の、片側または両側の回路形成面に、上記プリプレグを一枚または複数枚と、その外側に金属箔を配置して積層体を形成する。その積層体を加熱加圧して一体成型することにより多層積層板となる。絶縁層の形成には、プリプレグのかわりに絶縁接着シート、樹脂付き金属箔等も使用できる。なお、金属箔は積層板に用いたものと同様のものが用いられる。また加熱加圧成形は、上記条件と同様にして行うことができる。得られた多層積層板の表面に、アディティブ法やサブトラクティブ法にてバイアホール形成や回路形成を行い、多層プリント配線基板が得られる。また、この多層プリント配線基板を内層材として上記工法を繰り返すことにより、さらなる多層プリント配線基板を得ることができる。   Further, a multilayer laminate can be obtained by using the laminate as an inner layer material. For example, first, a circuit is formed on the laminate by an additive method, a subtractive method, or the like, and the circuit surface is blackened with an acid solution to obtain an inner layer material. One or a plurality of the prepregs are arranged on one or both sides of the circuit forming surface of the obtained inner layer material, and a metal foil is arranged outside the prepreg to form a laminate. The laminate is heated and pressed to be integrally molded to form a multilayer laminate. For forming the insulating layer, an insulating adhesive sheet, a metal foil with resin, or the like can be used instead of the prepreg. Note that the same metal foil as that used for the laminate is used. Heat-press molding can be performed in the same manner as described above. Via holes and circuits are formed on the surface of the obtained multilayer laminate by an additive method or a subtractive method to obtain a multilayer printed wiring board. Further, by repeating the above method using this multilayer printed wiring board as an inner layer material, a further multilayer printed wiring board can be obtained.

エポキシ樹脂組成物は、公知のエポキシ樹脂組成物と同様な方法で硬化することによってエポキシ樹脂硬化物を得ることができる。硬化物を得るための方法としては、公知のエポキシ樹脂組成物と同様の方法をとることができ、注型、注入、ポッティング、ディッピング、ドリップコーティング、トランスファ一成形、圧縮成形等や樹脂シート、樹脂付き銅箔、プリプレグ等の形態とし積層して加熱加圧硬化することで積層板とする等の方法が好適に用いられる。その際の硬化温度は通常、100〜300℃の範囲であり、硬化時間は通常、1時間〜5時間程度である。   The epoxy resin composition can be cured by a method similar to a known epoxy resin composition to obtain a cured epoxy resin. As a method for obtaining a cured product, a method similar to a known epoxy resin composition can be used, and casting, injection, potting, dipping, drip coating, transfer molding, compression molding, and the like, resin sheet, resin For example, a method of forming a laminated plate by laminating in the form of an attached copper foil, prepreg, or the like, and curing by heating and pressurizing is preferably used. The curing temperature at that time is usually in the range of 100 to 300 ° C., and the curing time is usually about 1 to 5 hours.

エポキシ樹脂組成物を作製し、これを積層体とし、加熱硬化して積層板としたときのエポキシ樹脂硬化物は優れた耐熱性と難燃性を発現させることができる。   When an epoxy resin composition is prepared, a laminate is formed, and then cured by heating to form a laminate, the epoxy resin cured product can exhibit excellent heat resistance and flame retardancy.

実施例および比較例を挙げて本発明を具体的に説明するが、本発明はこれらに限定されるものではない。特に断りがない限り「部」は質量部を表し、「%」は質量%を表す。また、測定方法はそれぞれ以下の方法により測定した。   The present invention will be specifically described with reference to Examples and Comparative Examples, but the present invention is not limited to these. Unless otherwise specified, "parts" represents parts by mass, and "%" represents% by mass. The measurement was performed by the following methods.

エポキシ当量:JIS K 7236規格に準拠して測定を行い、単位は「g/eq.」で表した。具体的には自動電位差滴定装置(平沼産業株式会社製、COM−1600ST)を用いて、溶媒としてクロロホルムを使用し、臭素化テトラエチルアンモニウム酢酸溶液を加え、0.1mol/L過塩素酸−酢酸溶液で滴定した。   Epoxy equivalent: Measured in accordance with JIS K 7236 standard, and the unit was represented by “g / eq.”. Specifically, using an automatic potentiometric titrator (COM-1600ST, manufactured by Hiranuma Sangyo Co., Ltd.), using chloroform as a solvent, adding a brominated tetraethylammonium acetic acid solution, and adding a 0.1 mol / L perchloric acid-acetic acid solution Was titrated.

軟化点:JIS K 7234規格、環球法に準拠して測定した。具体的には、自動軟化点装置(株式会社メイテック製、ASP−MG4)を使用した。   Softening point: Measured according to JIS K 7234 standard, ring and ball method. Specifically, an automatic softening point apparatus (ASP-MG4, manufactured by Meitec Co., Ltd.) was used.

GPC測定:本体(東ソー株式会社製、HLC−8220GPCにカラム(東ソー株式会社製、TSKgelG4000HXL、TSKgelG3000HXL、TSKgelG2000HXL)を直列に備えたものを使用し、カラム温度は40℃にした。また、溶離液にはテトラヒドロフラン(THF)を使用し、1mL/分の流速とし、検出器は示差屈折率検出器を使用した。測定試料はサンプル0.1gを10mLのTHFに溶解し、マイクロフィルターで濾過したものを50μL使用した。データ処理は、東ソー株式会社製GPC−8020モデルIIバージョン6.00を使用した。得られたクロマトグラムによりn=0成分量、n=5以上の成分量を算出し、標準の単分散ポリスチレン(東ソー株式会社製、A−500、A−1000、A−2500、A−5000、F−1、F−2、F−4、F−10、F−20、F−40、F−80、F−128)で求めた検量線により数平均分子量(Mn)、重量平均分子量(Mw)、分散度(Mw/Mn)を測定した。 GPC measurement:. Use body (manufactured by Tosoh Corporation, column HLC-8220GPC (manufactured by Tosoh Corporation, TSKgelG4000H XL, TSKgelG3000H XL, those having a TSKgelG2000H XL) in series, column temperature was 40 ° C. Further, The eluent used was tetrahydrofuran (THF), the flow rate was 1 mL / min, the detector used was a differential refractive index detector, and the measurement sample was 0.1 g of a sample dissolved in 10 mL of THF. For data processing, GPC-8020 model II version 6.00 manufactured by Tosoh Corporation was used, and n = 0 component amount and n = 5 or more component amount were calculated from the obtained chromatogram. , Standard monodisperse polystyrene (manufactured by Tosoh Corporation, A-500, A 1000, A-2500, A-5000, F-1, F-2, F-4, F-10, F-20, F-40, F-80, F-128) The molecular weight (Mn), the weight average molecular weight (Mw), and the degree of dispersion (Mw / Mn) were measured.

ガラス転移温度:IPC−TM−650 2.4.25.cに準じて示差走査熱量測定装置(株式会社日立ハイテクサイエンス製、EXSTAR6000 DSC6200)にて20℃/分の昇温条件で測定を行った時のDSC・Tgm(ガラス状態とゴム状態の接線に対して変異曲線の中間温度)の温度で表した。   Glass transition temperature: IPC-TM-650 2.4.25. DSC · Tgm (with respect to the tangent line between the glass state and the rubber state) when the measurement was performed with a differential scanning calorimeter (EXSTAR6000 DSC6200, manufactured by Hitachi High-Tech Science Co., Ltd.) at a temperature rise of 20 ° C./min. (The middle temperature of the mutation curve).

難燃性:UL94に準じ、垂直法により評価した。評価はV−0、V−1、V−2で記した。   Flame retardancy: Evaluated by the vertical method according to UL94. The evaluation was described by V-0, V-1, and V-2.

銅箔剥離強さおよび層間接着力:JIS C 6481規格に準じて測定し、層間接着力は7層目と8層目の間で引き剥がし測定した。   Copper foil peel strength and interlayer adhesive strength: Measured according to JIS C 6481 standard, and interlayer adhesive strength was measured by peeling between the seventh and eighth layers.

[エポキシ樹脂]
A1:合成例2で得られたビフェノールアラルキル型エポキシ樹脂
A2:トリフェノールメタン型エポキシ樹脂(日本化薬株式会社製、EPPN−501H、エポキシ当量166)
A3:リン含有エポキシ樹脂(新日鉄住金化学株式会社製、FX−1225、エポキシ当量318、リン含有率2.5%)
A4:リン含有エポキシ樹脂(新日鉄住金化学株式会社製、YDFR−1320、エポキシ当量763、リン含有率5.0%)
[Epoxy resin]
A1: Biphenol aralkyl type epoxy resin obtained in Synthesis Example 2 A2: Triphenol methane type epoxy resin (Nippon Kayaku Co., Ltd., EPPN-501H, epoxy equivalent 166)
A3: phosphorus-containing epoxy resin (FX-1225, epoxy equivalent 318, phosphorus content 2.5%, manufactured by Nippon Steel & Sumikin Chemical Co., Ltd.)
A4: Phosphorus-containing epoxy resin (manufactured by Nippon Steel & Sumikin Chemical Co., Ltd., YDFR-1320, epoxy equivalent: 763, phosphorus content: 5.0%)

[硬化剤]
B1:フェノールノボラック樹脂(アイカ工業株式会社製、ショウノールBRG−557、フェノール性水酸基当量105、軟化点80℃)
B2:ジシアンジアミド(日本カーバイド工業株式会社製、DICY、活性水素当量21)
B3:フェノール樹脂(群栄化学工業株式会社製、レヂトップTPM−100、フェノール水酸基当量98、軟化点108℃)
[Curing agent]
B1: Phenol novolak resin (manufactured by Aika Kogyo Co., Ltd., Shaunol BRG-557, phenolic hydroxyl equivalent weight 105, softening point 80 ° C.)
B2: Dicyandiamide (manufactured by Nippon Carbide Industry Co., Ltd., DICY, active hydrogen equivalent 21)
B3: Phenol resin (manufactured by Gunei Chemical Co., Ltd., resin top TPM-100, phenol hydroxyl equivalent 98, softening point 108 ° C)

[硬化促進剤]
C1:2−エチル−4−メチルイミダゾール(四国化成工業株式会社製、キュアゾール2E4MZ)
[Curing accelerator]
C1: 2-ethyl-4-methylimidazole (Curesol 2E4MZ, manufactured by Shikoku Chemicals Co., Ltd.)

合成例1
撹拌機、温度計、窒素導入管、および冷却管を備えた反応装置に、4,4’−ビフェノール246部、ジエチレングリコールジメチルエーテル380部、4,4’−ビスクロロメチルビフェニル133部を仕込み、窒素気流下、撹拌しながら170℃まで昇温して2時間反応させた。反応後、減圧下にてジエチレングリコールジメチルエーテルを全量留去し、トルエン311部、メチルイソブチルケトン104部を仕込み撹拌混合し、室温まで冷却した後、析出した未反応の原料4,4’−ビフェノールを濾別して除いた後、トルエンおよびメチルイソブチルケトンを留去し、ビフェニルアラルキル型フェノール樹脂187部を得た。フェノール性水酸基当量は155であり、軟化点は130℃であった。
Synthesis Example 1
A reaction apparatus equipped with a stirrer, a thermometer, a nitrogen inlet tube, and a cooling tube was charged with 246 parts of 4,4'-biphenol, 380 parts of diethylene glycol dimethyl ether, and 133 parts of 4,4'-bischloromethylbiphenyl, and the nitrogen gas flow was started. Under agitation, the temperature was raised to 170 ° C. and reacted for 2 hours. After the reaction, the entire amount of diethylene glycol dimethyl ether was distilled off under reduced pressure, 311 parts of toluene and 104 parts of methyl isobutyl ketone were charged and mixed by stirring. After cooling to room temperature, the unreacted raw material 4,4′-biphenol precipitated was filtered. After separately removing, toluene and methyl isobutyl ketone were distilled off to obtain 187 parts of a biphenylaralkyl-type phenol resin. The phenolic hydroxyl equivalent was 155 and the softening point was 130 ° C.

合成例2
撹拌機、温度計、窒素導入管、および冷却管を備えた反応装置に、合成例1で得られたビフェニルアラルキル型フェノール樹脂127部を入れ、エポクロルヒドリン448部、ジエチレングリコールジメチルエーテル67部を加えて60℃に加温した。110mmHgの減圧下、58〜62℃の温度に保ちながら、49%水酸化ナトリウム水溶液64部を4時間で滴下した。この間、エピクロルヒドリンは水と共沸させて、留出してくる水は順次系外へと除去した。反応終了後、5mmHg、180℃でエピクロルヒドリンを回収し、トルエン560部を加えて生成物を溶解した。180部の水を加えて副生した食塩を溶解し、静置して下層の食塩水を分離除去した。リン酸水溶液にて中和した後、水洗液が中性になるまで樹脂溶液を水洗し、濾過した。5mmHgの減圧下、180℃に加温して、トルエンを留去し、ビフェニルアラルキル型エポキシ樹脂(A1)95部を得た。エポキシ当量は218、軟化点は97℃、n=0成分は4.3面積%、n=5成分以上は30.5面積%、Mnは1440、Mwは3200、Mw/Mnは2.22であった。
Synthesis Example 2
In a reactor equipped with a stirrer, a thermometer, a nitrogen inlet tube, and a cooling tube, 127 parts of the biphenylaralkyl-type phenol resin obtained in Synthesis Example 1 was put, and 448 parts of epochlorohydrin and 67 parts of diethylene glycol dimethyl ether were added. To 60 ° C. Under a reduced pressure of 110 mmHg, 64 parts of a 49% aqueous sodium hydroxide solution was added dropwise over 4 hours while maintaining the temperature at 58 to 62 ° C. During this time, epichlorohydrin was azeotroped with water, and the distilled water was sequentially removed from the system. After completion of the reaction, epichlorohydrin was recovered at 5 mmHg and 180 ° C., and 560 parts of toluene was added to dissolve the product. 180 parts of water was added to dissolve the salt by-produced, and the mixture was allowed to stand, and the lower layer of salt solution was separated and removed. After neutralization with a phosphoric acid aqueous solution, the resin solution was washed with water until the washing solution became neutral, and filtered. The mixture was heated to 180 ° C. under a reduced pressure of 5 mmHg, and toluene was distilled off to obtain 95 parts of a biphenylaralkyl-type epoxy resin (A1). Epoxy equivalent is 218, softening point is 97 ° C., n = 0 component is 4.3 area%, n = 5 component or more is 30.5 area%, Mn is 1440, Mw is 3200, Mw / Mn is 2.22. there were.

実施例1
A1を10部、A3を90部、B1を35部、C1を0.05部で配合し、MEK、プロピレングリコールモノメチルエーテル、N,N−ジメチルホルムアミドで調整した混合溶剤に溶解してエポキシ樹脂組成物ワニスを得た。得られたエポキシ樹脂組成物ワニスをガラスクロス(日東紡績株式会社製、WEA 7628 XS13、0.18mm厚)に含浸した。含浸したガラスクロスを150℃の熱風循環オーブン中で9分間乾燥してプリプレグを得た。得られたプリプレグ8枚と、上下に銅箔(三井金属鉱業株式会社製、3EC−III、厚み35μm)を重ね、130℃×15分+190℃×80分の温度条件で2MPaの真空プレスを行い、1.6mm厚の積層板を得た。積層板のガラス転移温度、銅箔剥離強さ、層間接着力、および難燃性の結果を表1に示す。
Example 1
10 parts of A1, 90 parts of A3, 35 parts of B1 and 0.05 part of C1 were mixed and dissolved in a mixed solvent prepared with MEK, propylene glycol monomethyl ether, and N, N-dimethylformamide to form an epoxy resin composition I got a varnish. The obtained epoxy resin composition varnish was impregnated into a glass cloth (WEA 7628 XS13, 0.18 mm thick, manufactured by Nitto Boseki Co., Ltd.). The impregnated glass cloth was dried in a hot air circulating oven at 150 ° C. for 9 minutes to obtain a prepreg. The obtained eight prepregs and copper foil (3EC-III, manufactured by Mitsui Mining & Smelting Co., Ltd., thickness 35 μm) are stacked on top and bottom, and 2 MPa vacuum press is performed under a temperature condition of 130 ° C. × 15 minutes + 190 ° C. × 80 minutes A laminate having a thickness of 1.6 mm was obtained. Table 1 shows the results of the glass transition temperature, copper foil peel strength, interlayer adhesive strength, and flame retardancy of the laminate.

実施例2〜7
エポキシ樹脂としてA1〜A4を、硬化剤としてB1〜B3を、硬化促進剤としてC1を、表1の配合量(部)で配合し、実施例1と同様の操作を行い、積層板および試験片を得た。この際、硬化促進剤の使用量はワニスゲルタイムを300秒程度に調整できる量とした。実施例1と同様の試験を行い、その結果を表1に示す。なお、表中のリン含有率はエポキシ樹脂組成物としての値である。
Examples 2 to 7
A1 to A4 as an epoxy resin, B1 to B3 as a curing agent, and C1 as a curing accelerator were blended in the blending amounts (parts) shown in Table 1, and the same operation as in Example 1 was performed. I got At this time, the amount of the curing accelerator used was such that the varnish gel time could be adjusted to about 300 seconds. The same test as in Example 1 was performed, and the results are shown in Table 1. In addition, the phosphorus content in the table is a value as an epoxy resin composition.

Figure 2020045421
Figure 2020045421

比較例1〜8
エポキシ樹脂としてA2〜A4を、硬化剤としてB1〜B3を、硬化促進剤としてC1を、表2の配合量(部)で配合し、実施例1と同様の操作を行い、積層板および試験片を得た。実施例1と同様の試験を行い、その結果を表2に示す。
Comparative Examples 1 to 8
A2 to A4 as an epoxy resin, B1 to B3 as a curing agent, and C1 as a curing accelerator were blended in the blending amounts (parts) shown in Table 2, and the same operation as in Example 1 was performed. I got The same test as in Example 1 was performed, and the results are shown in Table 2.

Figure 2020045421
Figure 2020045421

これらの結果から明らかなとおり、ビフェニルアラルキル型エポキシ樹脂とリン含有エポキシ樹脂を使用したエポキシ樹脂組成物は、高い耐熱性と難燃性を併せ持つエポキシ樹脂組成物が得られる。
As is apparent from these results, an epoxy resin composition using a biphenylaralkyl-type epoxy resin and a phosphorus-containing epoxy resin provides an epoxy resin composition having both high heat resistance and flame retardancy.

Claims (5)

エポキシ樹脂と硬化剤を必須成分とするエポキシ樹脂組成物であって、エポキシ樹脂が下記一般式(1)で表されるビフェニルアラルキル型エポキシ樹脂と、リン含有エポキシ樹脂を含むことを特徴とするエポキシ樹脂組成物。
Figure 2020045421

(ここで、nは繰り返し数であって0以上の数を示し、その平均値は1.3〜20の数であり、R、RおよびRはそれぞれ独立に水素原子または炭素数1〜8の炭化水素基を表す。)
An epoxy resin composition comprising an epoxy resin and a curing agent as essential components, wherein the epoxy resin comprises a biphenylaralkyl type epoxy resin represented by the following general formula (1) and a phosphorus-containing epoxy resin. Resin composition.
Figure 2020045421

(Here, n is the number of repetitions and represents a number of 0 or more, and the average value is a number of 1.3 to 20, and R 1 , R 2, and R 3 each independently represent a hydrogen atom or a carbon atom. ~ 8 hydrocarbon groups.)
リン含有エポキシ樹脂は、エポキシ当量が200〜1000g/eq.であり、リン含有率が1.0〜6.0質量%である請求項1に記載のエポキシ樹脂組成物。   The phosphorus-containing epoxy resin has an epoxy equivalent of 200 to 1000 g / eq. The epoxy resin composition according to claim 1, wherein the phosphorus content is 1.0 to 6.0% by mass. 請求項1または2に記載のエポキシ樹脂組成物を用いたことを特徴とするプリプレグ。   A prepreg comprising the epoxy resin composition according to claim 1. 請求項1または2に記載のエポキシ樹脂組成物を用いたことを特徴とする積層板。   A laminate comprising the epoxy resin composition according to claim 1. 請求項1または2に記載のエポキシ樹脂組成物を用いたことを特徴とするプリント配線基板。
A printed wiring board, comprising the epoxy resin composition according to claim 1.
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