JP2020038941A - Electric module and manufacturing method thereof - Google Patents

Abstract

To provide an electric module that satisfactorily prevents liquid leakage in a region near a fused portion between a photoelectrode and a counter electrode.SOLUTION: A charge transfer body is present in an area S surrounded with a fused portion 60 in which a photoelectrode 10 and a counter electrode 20 are fused, a photoelectrode 10, a counter electrode 20, and a sealing material. In the area S, when the maximum thickness of a photoelectrode support 12 is T1, the maximum thickness of a counter electrode support 22 is T2, and the minimum thickness of the fused portion adjacent to the region S is T3, T3/(T1+T2) is 0.4 to 1.SELECTED DRAWING: Figure 3

Description

  The present invention relates to an electric module and a method for manufacturing the same.

  2. Description of the Related Art In recent years, solar cells have been attracting attention as electric modules that can directly and immediately convert light energy into electric power as a clean power source and do not emit pollutants such as carbon dioxide.

Recently, for the practical use of solar cells such as dye-sensitized solar cells, continuous production using a roll-to-roll method (hereinafter referred to as RtoR method) has been studied.
A method for producing a dye-sensitized solar cell employing the RtoR method includes, for example, providing an inorganic conductive layer provided on a surface of a photoelectrode support, and carrying a sensitizing dye on a predetermined region of the surface of the photoelectrode conductive layer. A photoelectrode is manufactured by providing a semiconductor layer, a sealing material, and a charge transfer body. Separately from this, a counter electrode conductive layer is provided on the surface of the counter electrode support, and a catalyst layer is provided on the surface of the counter electrode conductive layer to prepare a counter electrode. After that, the photoelectrode and the counter electrode are attached to each other so that the inorganic semiconductor layer and the catalyst layer face each other, thereby manufacturing a dye-sensitized solar cell. The photoelectrode and the counter electrode of the dye-sensitized solar cell have a photoelectrode conductive layer and a counter electrode conductive layer joined via a sealing material.

  For example, Patent Literature 1 discloses a method in which ultrasonic vibration is applied to opposing photoelectrodes and a predetermined portion of the opposing electrodes to fuse and seal the photoelectrode support and the counter electrode support and to insulate them. It has been disclosed.

International Publication No. 2014/030736

However, when ultrasonic vibration is applied to the photoelectrode and the counter electrode to form a fused portion, malfunction of the dye-sensitized solar cell may occur.
According to the findings of the present inventors, when ultrasonic vibration is applied, the region between the sealing material and the photoelectrode conductive layer, and the region facing the sealing material are opposed to the region near the fused portion between the photoelectrode and the counter electrode. A phenomenon (liquid leakage) in which the electrolyte flows out between the electrode conductive layer and the electrode conductive layer may occur. When liquid leakage occurs, malfunction of the solar cell is likely to occur.
The present invention provides an electric module and a method for manufacturing the same, which effectively prevent liquid leakage in a region near a fused portion between a photoelectrode and a counter electrode.

The present invention has the following aspects.
[1] a photoelectrode, a counter electrode facing the photoelectrode at a distance, a charge moving body positioned between the photoelectrode and the counter electrode, and a photoelectrode positioned between the photoelectrode and the counter electrode. An electric module having a sealing material for sealing the charge transfer body,
The photoelectrode has a photoelectrode support, a photoelectrode conductive layer located on the photoelectrode support,
The counter electrode has a counter electrode support, and a counter electrode conductive layer located on the counter electrode support,
The charge transfer member is present in a region S surrounded by a fused portion obtained by fusing the photoelectrode and the counter electrode, the photoelectrode, the counter electrode, and the sealing material,
When the maximum thickness of the photoelectrode support in the region S is T1, the maximum thickness of the counter electrode support is T2, and the minimum thickness of the fused portion adjacent to the region S is T3, T3 / ( An electric module, wherein the value represented by (T1 + T2) is 0.4 to 1.
[2] The electric module is a dye-sensitized solar cell, wherein the photoelectrode has an inorganic semiconductor layer located on the photoelectrode conductive layer, and the inorganic semiconductor layer carries a sensitizing dye. 1].
[3] A method for manufacturing an electric module according to [1] or [2], wherein the charge transfer body and the sealing material are provided on a surface of the photoelectrode on the side of the counter electrode. And bonding the photoelectrode and the counter electrode, and forming the fused portion such that a value represented by T3 / (T1 + T2) is 0.4 to 1.

  ADVANTAGE OF THE INVENTION According to the electric module which concerns on this invention, the liquid leak in the area | region near the fusion part of a photoelectrode and a counter electrode can be prevented favorably. As a result, operation failure of the electric module can be favorably prevented.

It is a top view of the electric module concerning one embodiment of the present invention. It is (ii)-(ii) sectional drawing shown in FIG. It is (iii)-(iii) sectional drawing shown in FIG. It is a schematic diagram of a manufacturing device of an electric module concerning one embodiment of the present invention. FIG. 5 is a cross-sectional view of a fusion splicing unit used in the manufacturing apparatus shown in FIG. 4. It is a top view of the electric module concerning other embodiments of the present invention.

  Hereinafter, an embodiment of an electric module according to the present invention will be described with reference to the drawings. In the drawings used in the following description, characteristic portions are enlarged for convenience, and the dimensional ratios and the like of the components may be different from actual ones. Further, the materials, dimensions, and the like exemplified in the following description are merely examples, and the present invention is not limited thereto, and can be appropriately changed without changing the gist thereof.

  In the following description, a film-type dye-sensitized solar cell manufactured using the RtoR method will be described as an example of the electric module according to the present invention. Here, the electric module to which the present invention is applied is not limited to a dye-sensitized solar cell, and is not limited to a dye-sensitized solar cell as long as two electrodes are bonded to each other with a sealing material interposed therebetween. All of the electric modules are included.

[Configuration of Electric Module (Dye-Sensitized Solar Cell)]
As shown in FIGS. 1 to 3, a dye-sensitized solar cell (electric module) 1 according to the present embodiment to which the present invention is applied includes a photoelectrode 10, a counter electrode 20, a charge transfer body 30, and a sealing material. 40, a conductive material 50, and a fused portion 60. The photoelectrode 10 and the opposing electrode 20 are opposed to each other at a distance.
The charge moving body 30 is located between the photoelectrode 10 and the counter electrode 20. The sealing material 40 and the fusion part 60 seal the charge transfer body 30. The charge transfer body 30 exists in a region S surrounded by the photoelectrode 10, the counter electrode 20, the sealing material 40, and the fusion part 60. The charge moving body 30 is in contact with both the photoelectrode 10 and the counter electrode 20.
The conductive material 50 is located between the photoelectrode 10 and the counter electrode 20. The sealing material 40 is located between the charge moving body 30 and the conductive material 50. The conductive material 50 is in contact with both the photoelectrode 10 and the counter electrode 20.

The photoelectrode 10 has a photoelectrode support 12, a photoelectrode conductive layer 14, and an inorganic semiconductor layer 16.
In a plane parallel to the surface of the photoelectrode support 12, the direction in which the sealing material 40 extends is defined as the direction D2, and the direction perpendicular to the direction D2 is defined as the direction D1. In FIG. 1 in which the dye-sensitized solar cell 1 is viewed in plan, two sealing members 40 sandwiching the charge transfer body 30 are parallel to each other and parallel to the direction D2.

The photoelectrode conductive layer 14 is located on the photoelectrode support 12. The inorganic semiconductor layer 16 is located on the photoelectrode conductive layer 14. That is, the photoelectrode support 12, the photoelectrode conductive layer 14, and the inorganic semiconductor layer 16 are located in this order.
The inorganic semiconductor layer 16 is in contact with the charge transfer body 30. The inorganic semiconductor layer 16 covers a part of the photoelectrode conductive layer 14. Outside the inorganic semiconductor layer 16, a part of the photoelectrode conductive layer 14 is in contact with the charge transfer body 30. The inorganic semiconductor layer 16 carries a sensitizing dye.
The inorganic semiconductor layer 16 may cover the entire surface of the photoelectrode conductive layer 14 in a region where the charge transfer body 30 exists.

The material of the photoelectrode support 12 is not particularly limited as long as it is flexible enough to be applicable to continuous production using the RtoR method and can be formed into a large-area film shape.
Examples of the material of the photoelectrode support 12 include a transparent resin material such as polyethylene terephthalate (PET), acrylic, polycarbonate, polyethylene naphthalate (PEN), or polyimide.

The photoelectrode conductive layer 14 is formed over the entire surface of the photoelectrode support 12 on the counter electrode 20 side.
The photoelectrode conductive layer 14 is not particularly limited as long as it has conductivity. The photoelectrode conductive layer 14 is a conductive layer for a conventionally known dye-sensitized solar cell. When the photoelectrode 10 forms a light incident surface, the photoelectrode conductive layer 14 has light transmittance. That is, as the photoelectrode conductive layer 14, a so-called transparent conductive layer is preferable.
Examples of the material of the photoelectrode conductive layer 14 include metals such as gold, platinum, silver, copper, chromium, tungsten, aluminum, magnesium, titanium, nickel, manganese, zinc, iron, and alloys thereof; and fluorine-doped tin oxide (FTO). ), sodium - potassium alloy, lithium, magnesium, aluminum, magnesium - silver mixture, a magnesium - indium mixture, an aluminum - lithium alloy, Al / _Al 2 _{O 3} mixture, Al / LiF mixture, CuI, indium tin oxide ( Conductive transparent inorganic materials such as ITO), SnO ₂ , aluminum zinc oxide (AZO), indium zinc oxide (IZO), and gallium zinc oxide (GZO); and conductive transparent polymers. These materials may be used alone or in combination of two or more.
The thickness of the photoelectrode conductive layer 14 is appropriately determined according to the material constituting the photoelectrode conductive layer 14. When the photoelectrode conductive layer 14 is a metal, the thickness of the photoelectrode conductive layer 14 is preferably 10 to 50 nm. When the photoelectrode conductive layer 14 is a conductive transparent inorganic material or a conductive transparent polymer, the thickness of the photoelectrode conductive layer 14 is preferably 50 nm to 500 μm.
The thickness of the photoelectrode conductive layer 14 is an average value of measured values at arbitrary 10 points in an image of a cross section orthogonal to the plane of the photoelectrode support 12.

The inorganic semiconductor layer 16 may be any semiconductor material that can adsorb the sensitizing dye. Semiconductor materials include, for example, titanium oxide, zinc oxide, indium oxide, tin oxide, oxides such as gallium oxide, tin sulfide, indium sulfide, zinc sulfide, cuprous oxide, molybdenum trioxide, vanadium pentoxide, and tungsten oxide. And the like, copper (I) thiocyanate, copper iodide, molybdenum disulfide, molybdenum diselenide, copper (I) sulfide, and the like.
The inorganic semiconductor layer 16 may be a dense layer or a porous layer. From the viewpoint of further improving the photoelectric conversion efficiency of the dye-sensitized solar cell 1, the inorganic semiconductor layer 16 is preferably a porous layer.
The thickness of the inorganic semiconductor layer 16 is preferably from 500 nm to 100 μm. The thickness of the inorganic semiconductor layer 16 is an average value of measured values at arbitrary 10 points in an image of a cross section orthogonal to the plane of the photoelectrode support 12.

  The sensitizing dye is composed of an organic dye or a metal complex dye. Examples of the organic dye include various organic dyes such as coumarin, polyene, cyanine, hemicyanine, and thiophene. Examples of the metal complex dye include a ruthenium complex and the like.

The counter electrode 20 has a counter electrode support 22 and a counter electrode conductive layer 24. The counter electrode conductive layer 24 is located on the counter electrode support 22.
The photoelectrode 10 and the counter electrode 20 face each other with the inorganic semiconductor layer 16 and the counter electrode conductive layer 24 facing each other.

  Similar to the photoelectrode support 12, the material of the counter electrode support 22 is flexible as long as it can be applied to continuous production using the RtoR method, and if it is a material that can be formed into a large area film. Not limited. Examples of the material of the counter electrode support 22 include the same resin material as that of the photoelectrode support 12.

The material of the counter electrode conductive layer 24 is a metal, a conductive transparent inorganic material, a conductive transparent polymer, or the like, like the material of the photoelectrode conductive layer 14. The counter electrode conductive layer 24 and the photoelectrode conductive layer 14 may be the same or different. When the counter electrode 20 forms a light incident surface, the counter electrode conductive layer 24 has light transmittance. In this case, a so-called transparent conductive layer is preferable as the counter electrode conductive layer 24.
The preferred thickness of the opposing electrode conductive layer 24 is the same as the preferred thickness of the photoelectrode conductive layer 14. The thickness of the opposing electrode conductive layer 24 may be the same as or different from the thickness of the photoelectrode conductive layer 14.

The catalyst layer 26 may be located on the counter electrode conductive layer 24. A plurality of catalyst layers 26 are provided on the surface of the counter electrode conductive layer 24 on the side of the photoelectrode 10 so as to be separated from each other. The catalyst layer 26 is in contact with the charge transfer body 30. Outside the catalyst layer 26, a part of the counter electrode conductive layer 24 is in contact with the charge transfer body 30.
Examples of the material of the catalyst layer 26 include PEDOT, platinum, ITO, polyaniline, and carbon.
The thickness of the catalyst layer 26 is preferably 2 nm to 500 μm. The thickness of the catalyst layer 26 is an average value of measured values at arbitrary 10 points in an image of a cross section orthogonal to the surface of the photoelectrode support 12.

The charge transfer body 30 is an electrolytic solution or a gel electrolyte. The charge transfer body 30 of the present embodiment is in contact with the inorganic semiconductor layer 16, the photoelectrode conductive layer 14, the catalyst layer 26, and the counter electrode conductive layer 24. The charge transfer body 30 has a redox couple capable of supplying electrons to the sensitizing dye.
The electrolytic solution has a dispersion medium (hereinafter sometimes referred to as an “electrolyte dispersion medium”) and a redox couple dispersed in the electrolytic solution dispersion medium. The gel electrolyte is obtained by gelling an electrolytic solution. In a method for producing a gel electrolyte, for example, a gelling agent or a thickener is added to an electrolytic solution to form a gel. The gel electrolyte charge transfer body 30 can enhance the durability of the dye-sensitized solar cell 1.

The electrolyte dispersion medium is a non-aqueous solvent, an ionic liquid, or the like. Non-aqueous solvents include acetonitrile, propionitrile and the like. The ionic liquid is dimethylpropyl imidazolium iodide, butyl methyl imidazolium iodide, or the like.
A redox couple is a combination of a supporting electrolyte and a halogen molecule.
Supporting electrolytes include metal iodides such as lithium iodide, sodium iodide and potassium iodide; iodides such as iodine salts such as tetraalkylammonium iodide, pyridinium iodide and imidazolium iodide; sodium bromide, bromide Metal bromides such as potassium; and bromine compounds such as bromide salts such as tetraalkylammonium bromide, pyridinium bromide and imidazolium bromide.
The halogen molecule is an iodine molecule, a bromine molecule, or the like.
As the combination of the supporting electrolyte and the halogen molecule, a combination of an iodide and an iodine molecule and a combination of a bromine compound and a bromine molecule are preferable.

The sealing material 40 is located between the photoelectrode 10 and the counter electrode 20. Both ends in the thickness direction of the sealing material 40 are respectively joined to the photoelectrode 10 and the counter electrode 20. The sealing material 40 seals the charge transfer body 30 together with the fusion part 60.
In the present embodiment, both ends in the thickness direction of the sealing material 40 are joined to the photoelectrode conductive layer 14 and the counter electrode conductive layer 24, respectively.
The sealing material 40 only needs to seal the charge transfer body 30, and a conventionally known sealing material such as a photocurable resin or a thermosetting resin can be used.
The thickness of the sealing material 40 is preferably 10 to 200 μm. The thickness of the sealing material 40 is an average value of measured values at arbitrary 10 points in an image of a cross section orthogonal to the surface of the photoelectrode support 12.

The conductive material 50 is located between the sealing materials 40 adjacent in the direction D1. The conductive material 50 is in contact with the photoelectrode conductive layer 14 and the counter electrode conductive layer 24.
The material of the conductive material 50 is not particularly limited as long as it is a conductive material, and examples thereof include a known conductive material, conductive paste, or a mixture of conductive fine particles and an adhesive.
When the dye-sensitized solar cell 1 is cut out in a desired pattern, the conductive material 50 can be easily cut from the point that the conductive material 50 is made of an adhesive such as an epoxy resin or a phenol resin. A conductive paste mixed with fine particles is preferable. The conductive material 50 may include a binder made of the same material as the sealing material 40.

In FIG. 1 in which the dye-sensitized solar cell 1 is viewed in plan, a region where the photoelectrode conductive layer 14, the counter electrode conductive layer 24, and the sealing material 40 overlap each other has a band-shaped first insulating portion (insulating portion) 41 or Two insulating parts (insulating parts) 42 are present.
The first insulating part 41 is a cut part penetrating the photoelectrode conductive layer 14. The first insulating portion 41 separates and electrically insulates the photoelectrode conductive layer 14.
The second insulating part 42 is a cut part penetrating the counter electrode conductive layer 24. The second insulating portion 42 separates and electrically insulates the counter electrode conductive layer 24.
In the direction D1, the first insulating portions 41 and the second insulating portions 42 exist alternately.

The fusion portion 60 is a portion where the photoelectrode 10 and the counter electrode 20 are pressed by applying an external force. For example, as shown in FIG. 5 described below, in a state where the photoelectrode 10 and the counter electrode 20 are bonded, ultrasonic vibration is applied to join the photoelectrode support 12 and the counter electrode support 22. Although not shown, the photoelectrode conductive layer 14, the inorganic semiconductor layer 16, the counter electrode conductive layer 24, the catalyst layer 26, and the like may slightly remain in the fused portion 60. Are separated by the action of ultrasonic vibration, and the fused portion 60 is electrically insulated.
As shown in FIG. 1, the fusion parts 60 exist at predetermined intervals in the direction D2.

As shown in FIG. 3, the maximum thickness of the photoelectrode support 12 in a region S surrounded by the photoelectrode 10, the counter electrode 20, the sealing material 40, and the fusion portion 60 is T 1, Assuming that the maximum thickness is T2 and the minimum thickness of the fused portion 60 adjacent to the region S is T3, the ratio represented by T3 / (T1 + T2) is 0.4 to 1.
When a plurality of fusion parts 60 exist in one dye-sensitized solar cell 1, it means that all the fusion parts 60 are within the range of T3 / (T1 + T2).
The maximum thickness T1 of the photoelectrode support 12, the maximum thickness T2 of the opposing electrode support 22, and the minimum thickness T3 of the fused portion 60 are measured values in a cross section orthogonal to the plane of the photoelectrode support 12.
When the value of T3 / (T1 + T2) is 0.4 or more, liquid leakage hardly occurs in a region near the fused portion 60, and when the value is 1 or less, the insulation of the fused portion is excellent. The value of T3 / (T1 + T2) is preferably 0.4 or more and less than 1, more preferably 0.5 to 0.9, and even more preferably 0.6 to 0.8.
The value of T3 / (T1 + T2) can be adjusted according to the conditions for forming the fused portion 60. For example, when the external force applied to the photoelectrode 10 and the counter electrode 20 at the time of fusion increases, the value of T3 / (T1 + T2) decreases.

T1 is preferably from 10 to 500 μm, more preferably from 50 to 150 μm. T2 is preferably from 10 to 500 µm, more preferably from 50 to 150 µm. T1 and T2 may be the same or different. When T1 and T2 are equal to or more than the lower limit of the above range, sufficient product strength is easily obtained, and when it is equal to or less than the upper limit, the product can be sufficiently thinned.
Since T1 and T2 are not affected by the ultrasonic vibration, the thickness of the photoelectrode support 12 and the thickness of the counter electrode support 22 before assembling the electric module can be regarded as the same. The thickness of the support or the like before assembly can be measured with a contact-type micrometer, and the average value of the measured values of the thickness at any 10 points is adopted.

[Method of manufacturing electric module]
The manufacturing method of the electric module of the present embodiment uses the manufacturing apparatus 100 illustrated in FIG. 4 to seal the sealing material 40 and the conductive material 50 on the photoelectrode 10 that is continuously conveyed along the predetermined direction D3. And a charge transfer body 30, and after bonding the counter electrode 20 which is continuously conveyed along a predetermined direction D4, a fused portion 60 is formed to form a dye sensitizer having the structure shown in FIGS. This is a method for continuously manufacturing the solar cell 1.

First, while continuously transporting the photoelectrode support 12 in a predetermined direction by using a device adopting an RtoR method (not shown), the photoelectrode support 12 is formed by using a known sputtering method, a printing method, or the like. 12, a photoelectrode conductive layer 14 is formed. Next, the inorganic semiconductor layer 16 is formed at a predetermined position of the photoelectrode conductive layer 14 by using a known aerosol deposition method (AD method). Next, the photoelectrode 10 is obtained by adsorbing the sensitizing dye to the inorganic semiconductor layer 16 by a known method. The photoelectrode 10 is wound into a roll with the inorganic semiconductor layer 16 facing outward.
After the formation of the photoelectrode conductive layer 14 and before the formation of the inorganic semiconductor layer 16, it may be once wound into a roll. After the formation of the photoelectrode 10, the next step may be performed without winding.

Separately from this, while continuously transporting the counter electrode support 22 in a predetermined direction using an apparatus that employs an RtoR method (not shown), the counter electrode support 22 is formed by using a known sputtering method, a printing method, or the like. The counter electrode conductive layer 24 is formed on the surface of the electrode support 22. Next, the catalyst layer 26 is formed at a predetermined position of the counter electrode conductive layer 24 by using a known sputtering method, a printing method, or the like to obtain the counter electrode 20. The counter electrode 20 is wound up in a roll shape with the catalyst layer 26 inside.
After the formation of the counter electrode conductive layer 24 and before the formation of the catalyst layer 26, it may be temporarily wound into a roll. After forming the counter electrode 20, the next step may be performed without winding.

Next, as shown in FIG. 4, the roll-shaped photoelectrode 10 and the counter electrode 20 are installed in the manufacturing apparatus 100.
The first insulating portion 41 is formed by using an insulating portion forming device (not shown) while feeding and transporting the photoelectrode 10 in the D3 direction. Examples of the insulating portion forming device include a processing device having a die cut roll, a laser processing device, and the like.
Next, a sealing material is applied to the photoelectrode 10 being conveyed using the sealing material application device 101 to form an uncured sealing material 40. Subsequently, the material of the conductive material 50 is applied using the conductive material application device 102 to form the conductive material 50. Subsequently, an electrolytic solution is applied using the electrolytic solution application device 103 to form the charge transfer body 30.

  On the other hand, the second insulating portion 42 is formed using an insulating portion forming device (not shown) while the counter electrode 20 is being fed out and transported in the D4 direction. The insulating part forming apparatus is the same as described above.

Next, between the pair of pressing rolls 111 and 112, the photoelectrode 10 on which the charge moving body 30 is formed and the counter electrode 20 on which the second insulating portion 42 is formed are introduced in a superposed state. The press rolls 111 and 112 press the photoelectrode 10 and the counter electrode 20 that pass between them.
Subsequently, immediately after passing through the pressing rolls 111 and 112, the uncured sealing material 40 is cured by using a curing device (not shown), and the photoelectrode 10 and the sealing material 40 are bonded together. The electrode 20 and the sealing material 40 are bonded together. For example, when the uncured sealing material 40 is a photocurable resin, the sealing material 40 is cured by irradiating ultraviolet rays using a UV lamp as a curing device. In this way, the photoelectrode 10 and the counter electrode 20 are bonded via the sealing material 40.

Next, as shown in FIG. 5, fusion is performed at a predetermined position using a fusion section forming apparatus including an ultrasonic application section 115 for applying ultrasonic vibration and a pedestal 116 opposed to the ultrasonic application section 115. The part 60 is formed.
A plurality of projections and depressions are formed on the distal end 115a of the ultrasonic wave applying section 115 and the distal end 116a of the pedestal 116, respectively. The two concavities and convexities have shapes that mesh with each other. The distance between the ultrasonic wave application unit 115 and the pedestal 116 is variable.
The distal end 115a of the ultrasonic wave applying section 115 and the distal end 116a of the pedestal 116 are brought into contact with the bonded counter electrode 20 and the photoelectrode 10, respectively, to reduce the distance between the ultrasonic applying section 115 and the pedestal 116. . When pressure is applied while applying ultrasonic vibration in this manner, vibration energy is transmitted to structures such as the photoelectrode support 12, the counter electrode support 22, and the sealing material 40 existing therebetween. Friction heat is generated, and the structure having a low melting point melts and flows. In addition, when a rigid body such as a metal exists in the structure, the rigid body is broken by ultrasonic vibration, and diffuses (moves) if the broken particle size is relatively small.
As a result, the structure such as the sealing material 40 existing between the photoelectrode support 12 and the counter electrode support 22 is extruded to a portion adjacent to the fusion portion 60, as shown in FIG. The fused portion 60 is formed by fusing the photoelectrode support 12 and the counter electrode support 22 together.

  Through the above steps, the dye-sensitized solar cell 1 shown in FIGS. 1 to 3 can be manufactured. Thereafter, the long dye-sensitized solar cell 1 is cut along the length direction (D1 direction) of the fused portion 60 so as to divide one fused portion 60, and is actually used. A dye-sensitized solar cell having a size may be cut out.

[Modification]
In the embodiment shown in FIG. 1, the fusion portion 60 is formed parallel to the direction D1 (perpendicular to the direction D2). However, as in the dye-sensitized solar cell 2 illustrated in FIG. It may be formed obliquely to the direction D1. When the dye-sensitized solar cell 2 is cut along the fused portion 61, a trapezoidal or parallelogram dye-sensitized solar cell is obtained.
6, the same components as those in FIG. 1 are denoted by the same reference numerals. The example of FIG. 6 also has the same structure as the structure shown in FIG. 2, but illustration of some components is omitted.
The angle θ between the fusion portion 61 and the direction D1 is determined by the angle between the direction in which the photoelectrode 10 and the counter electrode 20 are transported (the direction D2) and the ultrasonic wave application portion 115 in the step of forming the fusion portion 61. The angle θ is not particularly limited, and can be set according to a desired shape. For example, 0 to 45 ° is preferable. A plurality of θs present in the dye-sensitized solar cell 2 may be the same or different.

Hereinafter, examples of the present invention will be described in detail, but the present invention is not limited to only these examples.

[Examples 1 to 4, Comparative Examples 1 and 2]
The dye-sensitized solar cell (electric module) 1 shown in FIGS. 1 to 3 was manufactured by using the following materials in the procedure of the method for manufacturing an electric module described in the above embodiment. In each example, the ultrasonic welding conditions were adjusted so that the minimum thickness T3 of the welded portion became a value shown in Table 1. Specifically, the distance between the tip of the ultrasonic wave application unit and the tip of the pedestal was adjusted. The electrolyte was colored to observe the leakage.
-Photoelectrode support and counter electrode support: PET.
-Photoelectrode conductive layer and counter electrode conductive layer: FTO.
-Inorganic semiconductor layer: a porous layer made of titanium oxide.
・ Sensitizing dye: ruthenium-based dye ・ Catalyst layer: platinum ・ Charge transfer agent: electrolytic solution obtained by adding a colorant to acetonitrile
-Sealing material: UV-curable resin.
-Conductive material: Micropearl (registered trademark) AU-250 manufactured by Sekisui Chemical Co., Ltd.
In the photoelectrode, the thickness (T1) of the photoelectrode support was 125 μm, the thickness of the photoelectrode conductive layer was 100 nm, and the thickness of the inorganic semiconductor layer was 10 μm.
In the counter electrode, the thickness (T2) of the counter electrode support was 125 μm, the thickness of the counter electrode conductive layer was 100 nm, and the thickness of the catalyst layer was 10 nm.
The width of the sealing material was 2 mm, and the thickness of the sealing material was 50 μm.

(Evaluation of liquid leakage prevention effect)
In each example, any ten fused portions of the obtained dye-sensitized solar cell were visually observed to determine whether or not there was a phenomenon (liquid leakage) in which the electrolyte solution flowed out to the sealing material side. The liquid leakage prevention effect was evaluated according to the following evaluation criteria. Table 1 shows the results.
[Evaluation criteria]
A: There are no fused parts that leak.
B: One or two fused parts leaked.
C: Three or four fused parts leaked.
D: Five or more fused parts leaked.

(Evaluation of insulation properties of the fused part)
In each example, an insulation test was performed on the ten fused portions, for which the presence or absence of the liquid leakage was examined, by the following method.
[Method of insulation test]
The dye-sensitized solar cell was cut so that the opposing electrode conductive layers on both sides sandwiching one fused portion were exposed, and a tester rod was applied to each of the opposing electrode conductive layers on both sides to check the conductivity.
When the display of the tester showed "overload", it was determined that the insulation was good, and when it showed anything other than "overload", it was determined that the insulation was poor. Based on the results of the determination for the ten fused parts, the insulation was evaluated according to the following evaluation criteria. Table 1 shows the results.
[Evaluation criteria]
A: There are no fused parts where insulation is defective.
B: One or two fused portions having defective insulation.
C: Three or four fused portions having poor insulation.
D: Five or more fused portions having poor insulation.

(Evaluation of peel strength)
In each example, the peel strength between the photoelectrode support and the counter electrode support was determined for each of the ten fused parts, for which the presence or absence of the liquid leakage was checked, based on a T-shaped peel strength test method. And a motorized stand (model number: MX2-500NL, manufacturer and distributor: Imada Co., Ltd.) and a digital force gauge (model number: ZTS-100N; manufacturer and distributor: Imada Corporation). If the peel strength was 6 N / 10 mm or more, it was determined to be acceptable. From the viewpoint of durability, it is preferable that the peel strength is high.
Table 1 shows the average value of the measurement results of the ten fused parts.

As shown in the results of Table 1, Examples 1 to 4 in which T3 / (T1 + T2) was 0.4 to 1 had a good effect of preventing the electrolyte from leaking.
On the other hand, Comparative Example 1 in which T3 / (T1 + T2) was less than 0.4 was inferior in the effect of preventing liquid leakage.

DESCRIPTION OF SYMBOLS 1 Dye-sensitized solar cell (electric module), 10 photoelectrodes, 12 photoelectrode supports, 14 photoelectrode conductive layers, 20 counter electrodes, 22 counter electrode supports, 24 counter electrode conductive layers, 30 charge transfer bodies, 40 Sealing material 60 fusion spliced part

Claims (3)

A photoelectrode, a counter electrode spaced apart from and facing the photoelectrode, a charge moving body positioned between the photoelectrode and the counter electrode, and a charge moving body positioned between the photoelectrode and the counter electrode. A sealing material for sealing, and an electric module having a fused portion obtained by fusing the photoelectrode and the counter electrode,
The photoelectrode has a photoelectrode support, and a photoelectrode conductive layer located on the photoelectrode support,
The counter electrode has a counter electrode support, and a counter electrode conductive layer located on the counter electrode support,
The charge transfer body is present in a region S surrounded by the photoelectrode, the counter electrode, the sealing material, and the fusion bonding portion,
When the maximum thickness of the photoelectrode support in the region S is T1, the maximum thickness of the counter electrode support is T2, and the minimum thickness of the fused portion adjacent to the region S is T3, T3 / ( An electric module, wherein the value represented by (T1 + T2) is 0.4 to 1.   The electric module according to claim 1, wherein the electric module is a dye-sensitized solar cell, wherein the photoelectrode has an inorganic semiconductor layer located on the photoelectrode conductive layer, and the inorganic semiconductor layer carries a sensitizing dye. An electrical module as described. It is a manufacturing method of an electric module which manufactures the electric module of Claim 1 or Claim 2, Comprising:
The charge transfer body and the sealing material are provided on a surface of the photoelectrode on the side of the counter electrode, and the photoelectrode and the counter electrode are bonded to each other, and the value represented by T3 / (T1 + T2) is 0. 4. A method for manufacturing an electric module, wherein the fused portion is formed so as to be 4 to 1.

Images