JP2020020616A - X-ray diffraction measuring system and X-ray diffraction measuring device - Google Patents

Abstract

To provide an X-ray diffraction measuring device for irradiating a measurement object flowing on a conveyance line with an X-ray at a plurality of incidence angles and finding a residual stress by a sinψ method, which is constructed to a compact size and simple structure.SOLUTION: X-ray diffraction measuring devices 1-1 to 1-4 are arranged in plurality along the movement direction of a conveyance line LN. With the X-ray diffraction measuring devices 1-1 to 1-4, an X-ray tube is arranged so that the center axis is approximately parallel to the plane of a measurement object OB and approximately perpendicular to the movement direction of the conveyance line LN, the angles formed by a reference plane including the center axis of the X-ray tube and the optical axis of an emitted X-ray and the plane of the measurement object OB are respectively different, and a line linking X-ray irradiation points matches the movement direction of the conveyance line LN. With the X-ray diffraction measuring devices 1-1 to 1-4, an X-ray imager is arranged in such a way that the light receiving plane is approximately parallel to the reference plane and the peak in X-ray intensity distribution on a line where the light receiving plane and the reference plane intersect when a diffracted X-ray is generated at a standard angle of diffraction is at a prescribed position.SELECTED DRAWING: Figure 2

Description

The present invention relates to an X-ray diffraction measurement method that irradiates a measurement object flowing on a transport line with X-rays at a plurality of incident angles, captures an X-ray diffraction image, and determines the residual stress of the measurement object by a sin ² ψ method. The present invention relates to an apparatus system and an X-ray diffraction measurement apparatus.

As an X-ray diffraction measuring device that irradiates an X-ray to a measurement object flowing on a transport line and captures an X-ray diffraction image to obtain a residual stress of the measurement object, as disclosed in Patent Document 1, for example, An X-ray diffraction measuring device that irradiates an X-ray at a plurality of incident angles to a measurement target at one time and obtains a residual stress by a sin ² ψ method has been devised. The irradiation position of the X-ray applied to the measurement object flowing on the transport line changes, but if the X-ray irradiation and the imaging of the X-ray diffraction image (detection of the diffraction angle) are performed instantaneously, the measurement object Can obtain an X-ray diffraction image (diffraction angle) at a point determined by the above, so that the residual stress can be measured even with a measurement object flowing on the transport line.

JP-A-5-107124

However, although the X-ray source is illustrated as being very small in the drawing of Patent Document 1, the X-ray tube actually used in the X-ray diffraction measurement device is much larger, and is provided with a plurality of X-ray tubes. Attempts to irradiate the measurement object with X-rays at a plurality of angles of incidence at one time have a problem that the X-ray diffraction measurement device has a complicated structure and is large in size. For this reason, an X-ray diffraction measuring device for measuring the residual stress of the measurement object flowing on the transport line by the sin ² ψ method has not been realized.

The present invention has been made to solve this problem, and an object of the present invention is to irradiate a measurement object flowing on a transport line with X-rays at a plurality of incident angles, capture an X-ray diffraction image, and obtain sin ² ψ X-ray diffraction measuring system and X-ray diffraction measuring system for obtaining the residual stress of an object to be measured by an X-ray method An object of the present invention is to provide a diffraction measurement device.

In order to achieve the above object, a feature of the present invention is that an X-ray emitting unit that emits X-rays to a measurement target placed on a transport line flowing in a certain direction, and diffracted by the measurement target. A plurality of X-ray diffraction measuring devices each including an X-ray imaging device that receives X-rays and detects an intensity distribution of the diffracted X-rays; diffraction detected by the X-ray imaging device in each of the X-ray diffraction measuring devices In an X-ray diffraction measurement system including a computer device, which inputs and stores the X-ray intensity distribution as data for calculating residual stress by the sin ² ψ method, the X-ray emission of each X-ray diffraction measurement device The means comprises: an X-ray tube arranged so that a central axis is substantially parallel to a plane of the object to be measured and substantially perpendicular to a moving direction of the transport line; and an X-ray emitted from the X-ray tube is formed at a predetermined angle with respect to the central axis. Parallel X-rays with optical axis Each of the X-ray diffraction measuring apparatuses has a reference plane including the central axis of the X-ray tube and the optical axis of the X-ray emitted from the collimator. And the line connecting the points where the X-rays emitted from the collimators of the respective X-ray diffraction measuring devices irradiate the object to be measured are arranged in parallel with the moving direction of the transport line. The X-ray imager in each X-ray diffraction measuring device has a light receiving plane substantially perpendicular to the reference plane, and generates a diffracted X-ray at a standard diffraction angle on the measurement object by the X-ray emitted from the collimator. In this case, the X-ray diffraction measurement system is arranged such that the peak in the intensity distribution of the diffracted X-ray on the line where the light receiving plane and the reference plane intersect is located at a predetermined position.

According to this, each X-ray diffraction measuring apparatus includes an X-ray tube, a collimator, and an X-ray imager in a single plane, a central axis of the X-ray tube, a central axis of the collimator, and a light receiving plane of the X-ray imager. Since they are arranged so as to include the lines inside, a small and simple structure can be achieved. Even if all the X-ray diffraction measurement apparatuses have the same structure, the angle formed by the reference plane and the plane of the measurement object in each X-ray diffraction measurement apparatus is different, and the emitted X-rays are The residual stress can be obtained by the sin ² ψ method by making the line connecting the points irradiated to the direction parallel to the moving direction of the transport line. That is, since the measurement object placed on the transport line is moving, if the X-ray emission timing of each X-ray diffraction apparatus is appropriate, the measurement object is emitted from each X-ray diffraction measurement apparatus. X-rays can be applied to the same point on the measurement object. If the angle formed between the reference plane and the plane of the measurement object in each X-ray diffraction measurement device is different, the direction of the normal to the diffraction surface of the measurement object for each X-ray diffraction measurement device is the same plane. If the X-ray diffraction angle and the angle between the reference plane and the plane of the object to be measured can be obtained for each X-ray diffraction measurement device, the residual stress should be obtained by the sin ² ψ method. Can be. The X-ray diffraction angle for each X-ray diffraction measuring device is obtained by calculating the peak position of the intensity profile in the line direction where the light receiving plane of the X-ray imager and the reference plane intersect based on the data of the intensity distribution of the diffracted X-ray input to the computer device. Can be calculated using known parameters.

  Further, another feature of the present invention is that each X-ray diffraction measurement device includes a housing having therein an X-ray emission unit and an X-ray imager, and the housing is configured to detect X-rays emitted from a collimator. At the irradiation point, when a diffracted X-ray is generated at a standard diffraction angle at the irradiation point, two visible parallel lines are formed at the irradiation point where the peak of the intensity distribution of the diffracted X-ray becomes a predetermined position on the X-ray imager. A visible light emitting unit that emits visible parallel light so that the lights intersect is provided.

  According to this, the position of each X-ray diffraction measurement device is adjusted so that the two visible parallel light irradiation points become one, and the irradiation point that becomes one of the respective X-ray diffraction measurement devices becomes If the X-ray diffraction measurement devices are arranged on one line parallel to the moving direction of the transport line, each X-ray diffraction measurement device can be set at an appropriate position, so that the position adjustment of each X-ray diffraction measurement device can be easily performed. It can be carried out.

  Another feature of the present invention is that the housing of each X-ray diffraction measuring device has a plane portion substantially parallel or substantially perpendicular to the center axis of the X-ray tube, and the plane portion has a tilt angle with respect to the direction of gravity. In which the angle meter for measuring the tilt angle in the direction of the central axis of the X-ray tube and the tilt angle in the direction perpendicular to the central axis of the X-ray tube is attached.

  According to this, if the plane of the object to be measured is substantially perpendicular to the direction of gravity, the posture of the X-ray diffraction measuring device is adjusted so that the inclination angle in the direction of the central axis of the X-ray tube indicated by the goniometer becomes zero. Then, the central axis of the X-ray tube can be made substantially parallel to the plane of the measurement object. Further, if the attitude of the X-ray diffraction measuring device is adjusted so that the inclination angle in the direction perpendicular to the center axis direction of the X-ray tube indicated by the goniometer becomes a set value, the angle formed by the reference plane and the plane of the object to be measured can be changed. Can be set value. Thereby, the posture of each X-ray diffraction measuring device can be easily adjusted.

Further, another feature of the present invention is that an X-ray emitting unit that simultaneously emits X-rays from a plurality of directions to a measurement target placed on a transport line flowing in a certain direction, and an X-ray emitting unit. For each of the emitted X-rays, a plurality of X-ray imagers for receiving the X-ray diffracted by the measurement object and detecting the intensity distribution of the diffracted X-rays, and for each of the emitted X-rays, A computer for inputting and storing the intensity distribution of the diffracted X-rays detected by the X-ray imager as data for calculating the residual stress by the sin ² ψ method, The emission means is arranged such that the central axis is substantially parallel to the plane of the object to be measured and substantially perpendicular to the moving direction of the transport line, and has an X-ray tube having a plurality of X-ray emission ports; Each emitted X-ray is defined as the central axis. It comprises a plurality of collimators for emitting parallel X-rays having an optical axis forming a predetermined angle to a measurement object, and each X-ray exit port and each collimator are located at the center axis of the X-ray tube. The angle at which each reference plane including the optical axis of the X-ray emitted from each collimator and the plane of the measurement object is different, and the X-ray emitted from each collimator is irradiated on the measurement object. Are arranged so as to be parallel to the moving direction of the transport line. Each of the plurality of X-ray imagers has a light receiving plane substantially perpendicular to a corresponding one of the respective reference planes, and a respective collimator. When a diffraction X-ray is generated at a standard diffraction angle on a measurement object by an X-ray emitted from a corresponding one of the above, the intensity of the diffraction X-ray on a line at which the light receiving plane and the corresponding reference plane intersect Peak in fabric lies in the fact that the X-ray diffraction measurement apparatus characterized by being arranged to have a predetermined position.

According to this, the X-ray diffraction measurement apparatus includes a plurality of collimators and an X-ray imager, but has one X-ray tube, and the plurality of collimators and the X-ray imagers are collectively arranged in limited places. Therefore, the device can have a small and simple structure. Then, in each of the emitted X-rays, each reference plane is formed at a different angle from the plane of the measurement object, and a line connecting the points at which each of the emitted X-rays is irradiated on the measurement object is If the direction is parallel to the moving direction of the transfer line, the residual stress can be obtained by the sin ² ψ method. In other words, since the measurement target placed on the transport line is moving, the intervals between the points where the respective X-rays are irradiated on the measurement target are made equal intervals, and the X-ray emission timing is appropriately set. Each of the emitted X-rays can be applied to the same point on the measurement object. Since the direction of the normal to the diffraction surface of the object to be measured is different for each emitted X-ray, the diffraction angle of the X-ray for each emitted X-ray, the respective reference plane, and the measurement object If the angle formed by the plane of the object is obtained, the residual stress can be obtained by the sin ² ψ method. Therefore, according to this, since only one X-ray diffraction measuring device is required, the cost of the device can be greatly reduced. In this case, since the direction of the normal to the diffraction surface of the object to be measured for each emitted X-ray is not parallel to the same plane, the residual stress calculated by the sin ² ψ method is the normal to the diffraction surface. Is lower than when the directions are parallel to the same plane. However, since the angle change in the direction in which the direction of the normal to the diffraction surface is projected onto the plane of the object to be measured is small, the accuracy of measuring the residual stress is sufficient for ordinary industrial use.

BRIEF DESCRIPTION OF THE DRAWINGS It is the whole X-ray-diffraction measurement apparatus schematic diagram of the X-ray-diffraction measurement system which concerns on one Embodiment of this invention. FIG. 2 is a diagram illustrating an X-ray diffraction measurement system in which a plurality of the X-ray diffraction measurement devices illustrated in FIG. 1 are arranged in a moving direction of a transport line. It is a figure which shows theoretically that a residual stress can be measured by the X-ray diffraction measuring system which concerns on one Embodiment of this invention, (a) is a figure showing a normal sin < ² > method, (b) is implementation of this invention. It is a figure showing the sin ² ψ method in a form. It is an external view of the X-ray-diffraction measuring apparatus which concerns on another embodiment of this invention. FIG. 8 is a diagram showing directions in which the normal direction of the diffraction surface at each X-ray irradiation point is projected on the plane of the measurement object in the X-ray diffraction measurement apparatus according to another embodiment of the present invention.

  A configuration of an X-ray diffraction measurement system according to an embodiment of the present invention will be described with reference to FIGS. As shown in FIG. 2, the X-ray diffraction measurement system has X-ray diffraction measurement devices 1-1 to 1-4 arranged along the moving direction of a transport line LN. 1-1 to 1-4 have the same structure, and detect diffracted X-rays generated by irradiating X-rays to a measurement object OB placed on a transport line LN as shown in FIG. It is. FIG. 1 is a view of the X-ray diffraction measuring apparatus 1 viewed from the moving direction of the transport line LN, and the direction perpendicular to the paper is the moving direction of the transport line LN. The object to be measured OB is a long flat plate, and the material may be any material as long as it can perform X-ray diffraction measurement. The line emission direction and the direction of the diffracted X-ray are shown.

  As shown in FIG. 1, an X-ray diffraction measuring apparatus 1 includes an X-ray tube 10 that emits X-rays, a collimator 13 that allows the X-rays emitted from the X-ray tube 10 to pass through, and a measurement object OB. An X-ray imager 14 that receives a diffracted X-ray generated at the X-ray irradiation point and measures the X-ray intensity distribution, and two laser beams are emitted at predetermined positions on the optical axis of the X-ray emitted from the collimator 13 Laser irradiators 20 and 30 that emit laser light so as to intersect are accommodated. The housing 40 also has various circuits connected to the X-ray tube 10, the X-ray imager 14, and the laser irradiators 20 and 30 for controlling operations and inputting detection signals. In FIG. 1, various circuits surrounded by a two-dot chain line outside the housing 40 are accommodated in a two-dot chain line inside the housing 40. In FIG. 1, a circuit board, electric wires, fixtures, an air cooling fan, and the like are omitted.

  The housing 40 is formed in a substantially rectangular parallelepiped shape, the bottom surface, the upper surface, and the side surface are substantially parallel to the central axis of the X-ray tube 10, and the front surface and the rear surface are substantially perpendicular to the central axis of the X-ray tube 10. I have. Although omitted in FIGS. 1 and 2, the housing 40 is fixed from above by a supporting device, and the supporting device can be adjusted in the height direction in FIGS. 1 and 2. The tilt can be adjusted around three axes perpendicular to each surface. Therefore, by operating the support device, the X-ray diffraction measurement device 1 can adjust the position and the attitude with respect to the measurement object OB.

  The X-ray tube 10 is formed in a long shape, is fixed to the housing 40 at an upper part in the housing 40, receives a high voltage from a high-voltage power supply 65, and is controlled by an X-ray control circuit 52. Then, X-rays are emitted from the X-ray emission port 11. When an operation start command is input from a controller 61 included in a computer device 60 described later, the X-ray control circuit 52 controls the X-ray tube 10 so that the X-ray tube 10 emits X-rays of a constant intensity. The drive current and the drive voltage supplied from the voltage power supply 65 are controlled. Further, the X-ray tube 10 includes a cooling device (not shown), and the X-ray control circuit 52 also controls a drive signal supplied to the cooling device. Thereby, the temperature of the X-ray tube 10 is kept constant.

  The optical axis of the X-ray emitted from the X-ray tube 10 is perpendicular to the central axis of the X-ray tube 10 (the front and rear surfaces of the housing 40) so that the X-ray is incident on the measurement object OB at a predetermined incident angle. ) And a predetermined angle. The X-rays emitted from the X-ray tube 10 are diffused X-rays. Many X-rays are incident on the collimator 13 which is a cylindrical pipe, and are emitted from the tip of the collimator 13 so that X-rays parallel to the central axis of the collimator 13 are formed. Become a line. The collimator 13 has a tip slightly protruding from a hole formed in the bottom surface of the housing 40 and is fixed to the bottom surface of the housing 40, and an opposite tip is fixed to the plate 12. The collimator 13 is fixed so that the central axis thereof coincides with the optical axis of the X-ray emitted from the X-ray tube 10, and is aligned with a direction perpendicular to the central axis of the X-ray tube 10 (the front and rear surfaces of the housing 40). The angle.

  The X-rays emitted from the tip of the collimator 13 are irradiated on the object OB to be measured, and diffracted X-rays are generated at the irradiation points. The generated diffracted X-rays enter the housing 40 through a hole 40c formed in the bottom surface of the housing 40 and are received by the X-ray imaging device 14. The diffracted X-rays become high-intensity X-rays at a position where the angle of the emitted X-rays with respect to the optical axis meets the Bragg condition. In the present embodiment, the target of the X-ray tube 10 is chromium, and the measurement object OB is used. Is made of iron, so that when strong diffraction occurs on the 211 plane, the diffraction angle at that time is 156.4 °. Therefore, the angle formed by the optical axis of the emitted X-ray and the line connecting the irradiation point of the emitted X-ray and the point for detecting the high-intensity X-ray is 23.6 °, and the normal direction of the X-ray imager 14 is the collimator. 13 is fixed to the plate 12 so as to have an angle of 23.6 ° with the central axis of the plate 13. The X-ray imager 14 has a line that intersects a plane (hereinafter, referred to as a reference plane) including the central axis of the X-ray tube 10 and the optical axis of the output X-ray (the central axis of the collimator 13). When the irradiation point of the outgoing X-ray is at a predetermined distance from the tip of the collimator 13, the peak position of the intensity of the diffracted X-ray in the direction of the center line becomes the center position of the X-ray imager 14. Fixed to the plate 12.

  The X-ray imaging device 14 is a solid-state imaging device made up of an X-ray CCD, an X-ray CMOS, or the like. When an operation signal is input from the signal extraction circuit 54, a signal having an intensity corresponding to the X-ray intensity is output for each pixel to a signal extraction circuit. Output to 54. When an operation start command is input from a controller 61, which will be described later, the signal extraction circuit 54 outputs an operation signal to the X-ray imaging device 14, converts the input signal intensity of each pixel into digital data, and outputs digital data indicating the pixel position. Output to the controller 61. Therefore, when the controller 61 outputs an operation command to the X-ray control circuit 52 and the signal extraction circuit 54, data of the X-ray intensity distribution in the X-ray imaging device 14 is input to the controller 61 and stored.

  When the attitude of the X-ray diffraction measuring apparatus 1 is adjusted such that the central axis of the X-ray tube 10 is parallel to the plane of the object OB, the direction of the normal to the diffraction surface of the object OB is X. The tube is perpendicular to the central axis of the tube. That is, the angle formed by the plane perpendicular to the central axis of the X-ray tube 10 and the optical axis of the emitted X-ray, the plane perpendicular to the central axis of the X-ray tube 10, the irradiation point of the emitted X-ray, and the X-ray having a high intensity The angles formed by the lines connecting the points to be detected are both equal at 11.8 °. Further, the reference plane is perpendicular to the bottom surface and the top surface of the housing 40, and the collimator 13 is fixed at an angle of 11.8 ° with respect to the bottom surface of the housing 40.

  Laser irradiators 20 and 30 are attached to the bottom surface of housing 40. Laser irradiators 20 and 30 emit laser light having a set intensity when drive signals are input from laser control circuits 58 and 50. I do. The laser irradiators 20 and 30 fix the laser light sources 22 and 32 to the cylindrical frames 21 and 31 with fixtures 23 and 33, respectively. The laser light emitted from the laser light sources 22 and 32 is collimated by the collimating lenses 24 and 34 and emitted. The laser light emitted from the laser irradiators 20 and 30 intersects at a point on the optical axis of the emitted X-ray at a predetermined distance from the tip of the collimator 13, and the operator can use the laser light at the measurement object OB. By adjusting the position of the X-ray diffraction measuring apparatus 1 so that the irradiation points of the two laser beams coincide with each other, the irradiation point of the emitted X-ray can be set at a predetermined distance from the tip of the collimator 13. As described above, the predetermined distance is a distance at which the peak position of the intensity of the diffracted X-ray becomes the center position of the X-ray imaging device 14. Further, if the irradiation point of the laser beam, which has become one of the respective X-ray diffraction measurement apparatuses 1, is set to be on one line parallel to the moving direction of the transport line LN, the controller 61 described later controls X-rays emitted from the respective X-ray diffraction measurement apparatuses 1 can be irradiated to the same point on the measurement object OB.

  A goniometer 41 is attached to the upper surface of the housing 40. When an operation signal is input from the tilt angle detection circuit 56, the goniometer 41 outputs a signal corresponding to the detected tilt of the upper surface of the housing 40 with respect to the direction of gravity. Is output to the inclination angle detection circuit 56. The tilt angle detection circuit 56 starts operating when an operation start command is input from the controller 61, and outputs a signal input from the goniometer 41 to the controller 61 as tilt angle digital data. Since the controller 61 displays the tilt angle on the display device 63 from the input digital data of the tilt angle, the operator can know the tilt angle from the value displayed on the display device 63. The angle meter 41 has a housing so that the detected inclination angle is the inclination angle A of the central axis of the X-ray tube 10 with respect to the gravity direction and the inclination angle B of the central axis of the X-ray tube 10 with respect to the vertical direction of gravity. 40 is set on the upper surface. Therefore, if the inclination of the plane of the measurement object OB is set to 0, the operator sets the X-ray diffraction measurement apparatus 1 so that the inclination angle A becomes 0 and the inclination angle B becomes the set angle. By adjusting the posture, the central axis of the X-ray tube 10 becomes parallel to the plane of the measurement object OB, and the angle of the reference plane with respect to the plane of the measurement object OB can be set to the set angle. As described above, the operator matches the irradiation points of the laser beams emitted from the laser irradiators 20 and 30 and sets the angle displayed on the display device 63 to 0 and the set angle, so that the X-ray The position and orientation of the diffraction measurement device 1 can be adjusted.

  The computer device 60 includes a controller 61, an input device 62, and a display device 63. The controller 61 is an electronic control device mainly including a microcomputer including a CPU, a ROM, a RAM, a large-capacity storage device, and executes a program stored in the large-capacity storage device to execute the X-ray diffraction measurement device 1. In addition to controlling the operations of -1 to 1-4, an operation is performed using the input digital data. The input device 62 is connected to the controller 61 and is used by an operator for inputting various parameters, operation instructions, and the like. The display device 63 is also connected to the controller 61 and displays various setting conditions, operating conditions, measurement results, and the like of the X-ray diffraction measurement system.

  As shown in FIG. 2, an end detection sensor 67 for detecting the front end of the measurement object OB is attached near the side surface of the transport line LN. The edge detection sensor 67 detects that the tip of the measurement object OB has arrived at the laser beam line portion by detecting the presence or absence of the laser beam emitted from the vicinity of the side surface on the opposite side of the transport line LN. When there is no light reception, a signal indicating “tip detection” is output to the controller 61. After inputting a measurement start command from the input device 62, the controller 61 starts time measurement when a signal indicating "tip detection" is input, and is emitted from each of the X-ray diffraction measurement devices 1-1 to 1-4. When the X-ray irradiation point reaches a preset measurement point, the X-ray control circuit 52 and the signal extraction circuit 54 of each of the X-ray diffraction measuring devices 1-1 to 1-4 start and stop operating. Is output. It is necessary that the X-rays emitted from the X-ray diffraction measurement devices 1-1 to 1-4 be applied to the same point of the measurement object OB. Parameters necessary for control, such as the distance of the measurement point from the tip of the measurement object OB, the distance from the laser beam line portion to the X-ray irradiation point of each of the X-ray diffraction measuring devices 1-1 to 1-4, It is remembered.

The position and orientation of each of the X-ray diffraction measurement devices 1-1 to 1-4 are adjusted as described above, but as shown in FIG. The position and orientation are adjusted by changing the incident direction of the line, more specifically, the angle of the reference plane to the plane of the measurement object OB. The angle of the reference plane with respect to the plane of the measurement object OB is stored in the controller 61. In addition, other parameters necessary for calculating the residual stress, such as the distance from the X-ray irradiation point to the X-ray imager 14, the standard diffraction angle 2 ° of the object OB, the Young's modulus and the Poisson's ratio, are also provided to the controller 61. Is stored. When digital data representing the intensity distribution of X-rays input from the signal extraction circuit 54 of each of the X-ray diffraction measurement devices 1-1 to 1-4 is input, the controller 61 processes these data and outputs the data in the horizontal direction in FIG. The peak position of the X-ray intensity profile in the direction is detected, and the diffraction angle 2 角 is calculated from this peak position. Then, the residual stress is calculated by the sin ² ψ method using the diffraction angle 2Θ in each of the X-ray diffraction measurement devices 1-1 to 1-4 and the parameters stored in advance, and the calculation result is referred to as the measurement object OB. Are displayed on the display device 63 in association with the measurement points of the above.

Here, it will be described that when the diffraction angle 2Θ in each of the X-ray diffraction measurement devices 1-1 to 1-4 is obtained, the residual stress can be calculated by the sin ² ψ method. Figure 3 is a diagram showing the measurement of residual stress by sin ² [psi method, (a) is a measurement of the residual stress by conventional sin ² [psi method, according to (b) is sin ² [psi method in the present embodiment It is a measurement of residual stress. In the ordinary sin ² ψ method, as shown in FIG. 3A, the sample surface, which is the plane of the measurement object OB, is rotated around the plane perpendicular to the paper surface to change the incident angle of the output X-rays to the sample surface. The diffraction angle 2 ° is obtained for each angle ψ between the normal direction of the diffraction surface and the normal direction of the sample surface. The Bragg equation of 2d sin Θ = nλ holds for the Bragg angle 半 分, which is half the diffraction angle 2Θ, and the diffraction plane interval d. When the angle す formed by the normal direction of the diffraction plane and the normal direction of the sample surface changes, the diffraction plane becomes Since the distance d changes, the diffraction angle 2 ° also changes. In this change, sin ² ψ and the diffraction angle ²が have a linear relationship in a graph, and the slope of this straight line is proportional to the residual stress. Therefore, the residual stress is determined from the slope of the relationship line between sin ²回 折 and the diffraction angle ² Θ. This is the sin ² ψ method. In other words, rotating the sample surface around the plane perpendicular to the plane of the paper means, in other words, a plane including a line connecting the optical axis of the emitted X-ray, the irradiation point of the emitted X-ray, and the point for detecting a high-intensity X-ray (this embodiment). In this case, the angle す formed by the normal direction of the diffraction surface and the normal direction of the sample surface is changed so as not to change the same as the reference plane.

However, the angle ψ formed by the normal direction of the diffraction surface and the normal direction of the sample surface is changed by rotating the sample surface around a direction parallel to the paper surface of FIG. 3A and perpendicular to the normal direction of the diffraction surface. Even if this is done, the Bragg equation holds for the Bragg angle Θ and the diffraction plane distance d, and a linear relationship holds for the sin ² ψ and the diffraction angle 2Θ, the slope of which is also proportional to the residual stress. That is, the angle of the plane (equal to the reference plane in the present embodiment) including the line connecting the optical axis of the output X-ray, the irradiation point of the output X-ray, and the point for detecting the high-intensity X-ray is changed with respect to the sample surface. The normal direction of the diffraction surface is changed with respect to the normal direction of the sample surface. If the plane parallel to the normal direction of the diffraction surface including the normal line of the sample surface at the X-ray irradiation point at that time is constant, sin ^The residual stress can be measured by the 2ψ method. FIG. 3B is a diagram showing such a change in the direction of the normal to the diffraction surface, and is a diagram showing the rightward direction of FIG. Each of the X-ray diffraction measurement apparatuses 1-1 to 1-4 has different angles of the reference plane with respect to the plane of the measurement object OB, and includes the normal line of the measurement object OB at the X-ray irradiation point and the diffraction surface method. Since the plane parallel to the line direction is the same in all the X-ray diffraction measurement apparatuses 1-1 to 1-4, as shown in FIG. The residual stress can be calculated by the sin ² ψ method from the diffraction angle ²得 obtained by each of the X-ray diffraction measuring devices 1-1 to 1-4.

As can be understood from the above description, in the above embodiment, an X-ray emission unit that emits X-rays to the measurement object OB mounted on the transport line LN flowing in a certain direction, and the measurement object OB And a plurality of X-ray diffraction measuring devices 1 each having an X-ray imager 14 for receiving the X-ray diffracted by the X-ray diffraction detector and detecting the intensity distribution of the diffracted X-rays. In an X-ray diffraction measurement system including a computer device 60 that inputs and stores the intensity distribution of diffracted X-rays detected by the imager 14 as data for calculating residual stress by the sin ² ψ method, The X-ray emission means in the X-ray diffraction measurement apparatus 1 includes an X-ray tube 10 arranged such that the central axis is substantially parallel to the plane of the object OB and substantially perpendicular to the moving direction of the transport line LN. Out of 10 The collimator 13 converts the emitted X-rays into parallel X-rays having an optical axis that forms a predetermined angle with the central axis and emits the X-rays to the measurement object OB. The reference plane including the central axis of the X-ray tube 10 and the optical axis of the X-ray emitted from the collimator 13 has an angle different from the plane of the measurement object OB, and the reference plane emitted from the collimator 13 of each X-ray diffraction measurement apparatus 1. The line connecting the points at which the X-rays to be irradiated onto the measurement object OB are arranged so as to be parallel to the moving direction of the transport line LN, and the X-ray imaging devices 14 in the respective X-ray diffraction measurement apparatuses 1 When the light receiving plane is substantially perpendicular to the reference plane, and diffraction X-rays are generated at a standard diffraction angle on the measurement object OB by the X-ray emitted from the collimator 13, diffraction on a line where the light receiving plane and the reference plane intersect is performed. X-ray intensity Peak in the distribution is arranged so that the predetermined position.

According to this, each X-ray diffraction measuring apparatus 1 includes the X-ray tube 10, the collimator 13, and the X-ray imager 14 in one plane with the central axis of the X-ray tube 10, the central axis of the collimator 13, and the X-ray tube. Since the arrangement is made so as to include the line in the light receiving plane of the line image pickup device 14, the structure can be made small and simple. Then, even when all the X-ray diffraction measurement apparatuses 1 have the same structure, the angle formed by the reference plane and the plane of the measurement object OB in each X-ray diffraction measurement apparatus 1 is different so that the emitted X-rays If the line connecting the points irradiated to the object to be measured OB coincides with the moving direction of the transport line LN, the residual stress can be obtained by the sin ² ψ method. That is, since the measurement object OB placed on the transport line LN is moving, if the X-ray emission timing of each X-ray diffraction measurement device 1 is appropriate, each X-ray diffraction measurement device 1 X-rays emitted from the target object OB can be irradiated to the same point. If the angle formed by the reference plane and the plane of the measurement object OB in each X-ray diffraction measurement apparatus 1 is different, the normal of the diffraction surface normal of the measurement object OB for each X-ray diffraction measurement apparatus 1 is determined. Since the directions are different on the same plane, if the X-ray diffraction angle and the angle between the reference plane and the plane of the measurement object OB can be obtained for each X-ray diffraction measurement apparatus 1, the residual angle is obtained by the sin ² ψ method. Stress can be determined.

  Further, in the above embodiment, each X-ray diffraction measurement apparatus 1 includes the housing 40 having therein the X-ray emission unit and the X-ray imaging device 14, and the housing 40 is emitted from the collimator 13. An X-ray irradiation point, where when a diffraction X-ray is generated at a standard diffraction angle at the irradiation point, the peak of the intensity distribution of the diffracted X-ray becomes a predetermined position of the X-ray imaging device 14 and the irradiation point is 2 Laser irradiators 20 and 30 that emit visible parallel light so that two visible parallel lights cross each other are attached.

  According to this, the positions of the respective X-ray diffraction measurement apparatuses 1 are adjusted so that the irradiation points of the two laser lights become one, and the positions of the laser lights that have become one of the respective X-ray diffraction measurement apparatuses 1 are adjusted. If the irradiation point is on one line parallel to the moving direction of the transport line LN, each X-ray diffraction measurement device 1 can be located at an appropriate position. 1 can be easily adjusted.

  Further, in the above embodiment, the casing 40 of each X-ray diffraction measuring apparatus 1 has a plane portion substantially parallel or substantially perpendicular to the center axis of the X-ray tube 10, and the plane portion is inclined with respect to the direction of gravity. A goniometer 41 for measuring an angle, which measures a tilt angle in the direction of the central axis of the X-ray tube 10 and a tilt angle in a direction perpendicular to the central axis of the X-ray tube 10 is attached.

  According to this, if the plane of the measurement object OB is substantially perpendicular to the direction of gravity, X-ray diffraction is performed such that the inclination angle of the X-ray tube 10 indicated by the goniometer 41 in the central axis direction becomes zero. By adjusting the attitude of the measuring device 1, the central axis of the X-ray tube 10 can be made substantially parallel to the plane of the measurement object OB. Further, if the attitude of the X-ray diffraction measuring apparatus 1 is adjusted so that the tilt angle in the direction perpendicular to the central axis direction of the X-ray tube 10 indicated by the goniometer 41 becomes a set value, the plane of the reference plane and the plane of the object OB are measured Can be set to a set value. Thereby, the posture of each X-ray diffraction measurement device 1 can be easily adjusted.

(Modification)
In the above embodiment, the X-ray diffraction measuring devices 1-1 to 1-4 having the same structure are arranged in the moving direction of the transport line LN, and the reference plane is measured for each of the X-ray diffraction measuring devices 1-1 to 1-4. The residual stress was calculated from the diffraction angle 2 ° obtained for each of the X-ray diffraction measuring devices 1-1 to 1-4 so that the angle formed with the plane of the object OB was different. However, the X-ray emitting means emits X-rays in a plurality of directions in one X-ray diffraction measuring apparatus, and the angle formed by the reference plane for each emitted X-ray with the plane of the measurement object OB is different. If there is an X-ray imager 14 that receives diffracted X-rays for each emitted X-ray, the residual stress can be calculated similarly. FIG. 4 is a diagram showing the external appearance of the X-ray diffraction measurement device 2 with the housing removed. In FIG. 4, in order to make the structure easy to understand, the collimators 73-1 to 73-4 and the X-ray imagers 74-1 to 74-4 (74-4 is hidden by the X-ray tube 70 in FIG. 4). The plate on which the is attached has been removed. In addition, circuit boards, electric wires, fixtures, air cooling fans, and the like are also excluded.

  The X-ray tube 70 is fixed to the housing at the top of the housing, and emits X-rays when supplied with a high voltage from a high-voltage power supply. -4, and the X-rays generated by the target inside the X-ray tube 70 travel in a wide range of directions, so that the X-ray emission ports 71-1 to 71-4 (71-4 X-rays which are hidden in FIG. 4) are emitted with substantially the same intensity. Then, collimators 73-1 to 73-4 on which X-rays emitted from the respective X-ray emission ports 71-1 to 71-4 are incident are arranged, and the central axes of the collimators 73-1 to 73-4 are the collimators 73-1 to 73-4. X-rays emitted from the tips of -1 to 73-4 are applied to predetermined portions of the measurement object OB. The optical axes of the X-rays emitted from the X-ray emission ports 71-1 to 71-4 are also substantially the same as the central axes of the collimators 73-1 to 73-4. The location where the emitted X-ray is irradiated on the measurement object OB is on one line parallel to the moving direction of the transport line LN, as in the above embodiment, and the intervals between the X-ray irradiation points are the same. Has become. Therefore, by setting the X-ray emission timing appropriately, the X-ray irradiation point on the measurement object OB can be set to the same point for each emitted X-ray. In addition, when the X-ray is irradiated near the front end or the rear end of the measurement object OB, there may be an X-ray irradiated on the transport line LN, but the intensity data of the diffracted X-ray may be detected. So this is not a problem.

  X-ray imaging devices 74-1 to 74-4 (74-4 are hidden by the X-ray tube 70 in FIG. 4) that receive diffracted X-rays generated by the respective X-rays emitted from the collimators 73-1 to 73-4. Are attached such that the line intersecting each reference plane of the emitted X-ray is the center line, and the peak of the X-ray intensity profile in this line direction is the center point. In the case of this modification, the optical axes of the respective emitted X-rays intersect at a point near the central axis of the X-ray tube 70. The angle formed by the optical axis of the emitted X-ray with respect to a plane perpendicular to the central axis becomes smaller as the irradiation point of the X-ray becomes farther from the X-ray diffraction measurement device 2. For this reason, the peak point of the intensity profile of the diffracted X-ray is farther from the plane perpendicular to the central axis of the X-ray tube 70 including the X-ray irradiation point as the X-ray irradiation point is farther from the X-ray diffraction measuring device 2. Occurs in position. This is shown in FIG. 5, in which the emitted X-rays are shown by solid lines and the diffracted X-rays that generate peaks are shown by dotted lines. Therefore, the mounting position of the X-ray imagers 74-1 to 74-4 is set to a position farther from the tip of the X-ray tube 70 as the irradiation point of the X-ray corresponds to a position farther from the X-ray diffraction measuring device 2. Have been.

Further, since the angle formed by the optical axis of the X-ray with respect to the plane perpendicular to the central axis of the X-ray tube 70 including the X-ray irradiation point changes depending on the X-ray irradiation point, diffraction at each X-ray irradiation point is performed. The direction of the surface normal is not in one plane. In FIG. 5, the direction in which the direction of the normal to the diffraction surface at the irradiation point of each X-ray is projected on the paper surface (the direction projected on the plane of the measurement object) is indicated by an arrow. The direction of the normal to the diffraction surface at the irradiation point is shifted from the dashed line in FIG. 5 as the irradiation point of the X-ray is farther from the X-ray diffraction measurement device 2. The dashed line in FIG. 5 is a line viewed from above on a plane perpendicular to the central axis of the X-ray tube 70 including the X-ray irradiation point. In the above embodiment, the direction of the normal to the diffraction surface at all the X-ray irradiation points (all the X-ray diffraction measuring devices 1-1 to 1-4) can be set to be within one plane. In this case, by emitting a plurality of X-rays from one X-ray tube 70, the direction of the normal to the diffraction surface cannot be within one plane. Therefore, the measurement accuracy of the residual stress by the sin ² ψ method is slightly inferior to that of the above embodiment. However, as shown in FIG. 5, the deviation of the direction of the normal to the diffraction surface at the irradiation point of each X-ray from the one-dot chain line in the direction projected onto the paper is small. In terms of actually calculated values, the point at which the center axis of the X-ray tube 70 intersects with the optical axis of each emitted X-ray (the point at which X-rays are generated) and the center of the X-ray tube 70 including the irradiation point of X-rays Assuming that the distance to a plane perpendicular to the axis is L, a line obtained by projecting the central axis of the X-ray tube 70 on the paper (the plane perpendicular to the plane of the object OB including the central axis of the X-ray tube 70 is At an X-ray irradiation point located at a distance of 3 L from a line intersecting the plane of the object OB), the direction of the normal of the diffraction surface projected onto the paper surface (the plane of the measurement object OB) is formed by a one-dot chain line. The angle is 5.6 ° at an X-ray irradiation point at a distance of 3.3 °, 6L, and 7.0 ° at an X-ray irradiation point at a distance of 9L. Therefore, if the distance of the X-ray irradiation point from the X-ray diffraction measurement device 2 is set within the set range, the deterioration of the residual stress measurement accuracy is slight, and ordinary industrial measurement can be sufficiently performed. be able to.

  Note that, also in this modification, the laser irradiators 20, 30 and the goniometer 41 in the above embodiment are attached similarly, and the purpose of use is the same as in the above embodiment. The laser irradiator is a point on the optical axis of the X-ray emitted from the collimator 73-4, and the generation position of the diffracted X-ray is an X-ray imager 74-4 (hidden by the X-ray tube 70 in FIG. 4). Are mounted so as to intersect at a point where the X-ray intensity profile has a peak at the center point of. In addition, the manner in which the goniometer is attached is the same as in the above embodiment. By setting the value indicated by the goniometer to 0 in both directions, the central axis of the X-ray tube 70 becomes parallel to the plane of the measurement object OB, The angle formed by the reference plane of the X-ray emitted from each of the collimators 73-1 to 73-4 and the plane of the measurement object OB becomes a set angle, and the laser beam irradiation point by the laser irradiator becomes one. If so, each X-ray irradiation point will be on one line.

As described above, in the modified example, the X-ray emitting unit that simultaneously emits X-rays from a plurality of directions to the measurement object OB placed on the transport line LN that flows in a certain direction, and the X-ray emitting unit. For each of the emitted X-rays, a plurality of X-ray imagers 74-1 to 74-4 for receiving X-rays diffracted by the measurement object OB and detecting the intensity distribution of the diffracted X-rays, The intensity distribution of diffracted X-rays detected by the X-ray imagers 74-1 to 74-4 for each emitted X-ray is input and stored as data for calculating residual stress by the sin ²に よ り method. In the X-ray diffraction measurement apparatus 2 including the computer device 60, the X-ray emission unit is arranged such that the central axis is substantially parallel to the plane of the measurement object OB and substantially perpendicular to the moving direction of the transport line LN. X-ray emission ports 71-1 to 71-4 An X-ray tube 70 having a plurality of X-rays, and each X-ray emitted from each of the X-ray emission ports 71-1 to 71-4 is measured as a parallel X-ray having an optical axis forming a predetermined angle with the central axis. It comprises a plurality of collimators 73-1 to 73-4 that emit light to the object OB. Each of the X-ray emission ports 71-1 to 71-4 and each of the collimators 73-1 to 73-4 are X The angles formed by the respective reference planes including the central axis of the ray tube 70 and the optical axes of the X-rays emitted from the respective collimators 73-1 to 73-4 with the plane of the measurement object OB are different, and the respective collimators A plurality of X-ray imagers are arranged so that a line connecting points where X-rays emitted from 73-1 to 73-4 are irradiated on the measurement object OB is parallel to the moving direction of the transport line LN. Each of 74-1 to 74-4 The light receiving plane is substantially perpendicular to the corresponding one of the respective reference planes, and the X-rays emitted from the corresponding ones of the respective collimators 73-1 to 73-4 at the standard diffraction angle on the measurement object OB. When a diffracted X-ray is generated, the peak is located at a predetermined position in the intensity distribution of the diffracted X-ray on a line where the light receiving plane and the corresponding reference plane intersect.

  According to this, the X-ray diffraction measuring apparatus 2 includes a plurality of collimators 73-1 to 73-4 and a plurality of X-ray imagers 74-1 to 74-4, but has one X-ray tube 70 and a plurality of collimators. The devices 73-1 to 73-4 and the X-ray imaging devices 74-1 to 74-4 can be collectively arranged at limited locations, so that the device can be made compact and simple. Therefore, according to this, since only one X-ray diffraction measuring device is required, the cost of the device can be greatly reduced.

  Furthermore, implementation of the present invention is not limited to the above-described embodiment and modified examples, and various changes can be made without departing from the purpose of the present invention.

  In the above embodiment, the number of the X-ray diffraction measuring devices is four. However, if the number of the X-ray diffraction measuring devices is plural, the number may be appropriately determined in consideration of cost and measurement accuracy. In the above-described modification, four X-rays are emitted from one X-ray diffraction measuring apparatus. However, if the number of the emitted X-rays is plural, the number of X-rays can be appropriately determined in consideration of cost and measurement accuracy. Good.

  Further, in the above-described embodiment and the modified example, the X-ray diffraction measurement is performed so that the center position of the X-ray imager becomes the peak position of the X-ray intensity profile when the diffraction X-ray is generated at the standard diffraction angle on the measurement object OB. Assume that the position of the apparatus is adjusted, and two laser irradiators are provided for this position adjustment. However, if the peak of the X-ray intensity profile can be detected in all of the target measurement objects OB, the peak position when the diffracted X-ray is generated at the standard diffraction angle is shifted from the center position of the X-ray imaging device. There may be.

  Further, in the above-described embodiment and the modified example, the laser light is emitted from the two laser irradiators so as to intersect at a predetermined point on the optical axis of the emitted X-ray. However, the irradiation is performed with visible parallel light. If it is provided, it is not necessary to use laser light, and it may be one that converts LED light or SLD light into parallel light and emits it.

  Further, in the above embodiment and the modified example, the goniometer is attached to the upper surface of the housing of the X-ray diffraction measuring device. However, if the plane is substantially parallel or substantially perpendicular to the central axis of the X-ray tube, Since it is possible to detect the tilt angle in the direction of the central axis and the tilt angle in the direction perpendicular to the central axis of the X-ray tube, the surface to be attached may be any other surface.

  In the above-described embodiment and the modified example, two laser irradiators are mounted to adjust the position of the X-ray diffraction measuring apparatus so that two laser light irradiation points become one. Is limited, and the two laser irradiators may be omitted if the position of the X-ray diffraction measurement device can be kept constant by an appropriate support mechanism. Further, in the above-described embodiment and the modification, the goniometer is attached, and the posture of the X-ray diffraction measuring apparatus is adjusted so that the detected inclination becomes an appropriate value. However, the measuring object OB is limited. It is not necessary to use a goniometer as long as the posture of the X-ray diffraction measuring device can be kept constant by an appropriate support mechanism.

  In the above embodiments and modifications, the computer device measures the residual stress using the data input from the X-ray imaging device. However, if the measurement efficiency is not regarded as important, the computer device performs the process until the data is input, or Until the diffraction angle is calculated, the calculation of the residual normal stress may be performed by another device. In this case, as a method of inputting data to another device, various methods such as a method via a recording medium, a method of transferring the data using a network line or the like can be considered. In addition, some or all of the calculations may be performed manually if more time is required.

1, 2, X-ray diffraction measuring device, 10 X-ray tube, 11 X-ray exit port, 12 plate, 13 collimator, 14 X-ray imager, 20, 30 laser irradiator, 21, 31 ... Frame, 22, 32: Laser light source, 23, 33: Fixture, 24, 34: Collimating lens, 40: Housing, 41: Angle meter, 50, 58: Laser control circuit, 52: X-ray control circuit 54, a signal extraction circuit, 56, a tilt angle detection circuit, 60, a computer device, 61, a controller, 62, an input device, 63, a display device, 65, a high voltage power supply, 67, an edge detection sensor, 70, an X-ray tube , 71-1 to 71-4: X-ray exit, 73-1 to 73-4: Collimator, 74-1 to 74-4: X-ray imager, OB: Measurement object, LN: Transport line

Claims (4)

X-ray emission means for emitting X-rays to a measurement object placed on a transport line flowing in a certain direction,
An X-ray diffraction measuring device including an X-ray diffraction device that receives an X-ray diffracted by the measurement target and detects an X-ray intensity distribution of the diffracted X-ray,
A computer device for inputting and storing the intensity distribution of the diffracted X-rays detected by the X-ray imaging device in each of the X-ray diffraction measuring devices as data for calculating residual stress by a sin ² ψ method; X-ray diffraction measurement system,
The X-ray emitting means in each of the X-ray diffraction measurement devices includes: an X-ray tube arranged so that a central axis is substantially parallel to a plane of the measurement object and substantially perpendicular to a moving direction of the transport line; A collimator that emits X-rays emitted from the tube into parallel X-rays having an optical axis that forms a predetermined angle with the central axis and emits the measurement object.
Each of the X-ray diffraction measurement devices is different in the angle formed by the reference plane including the central axis of the X-ray tube and the optical axis of the X-ray emitted from the collimator with the plane of the measurement object. A line connecting the points at which the X-rays emitted from the collimator of the X-ray diffraction measurement device irradiate the object to be measured is arranged so as to be parallel to the moving direction of the transport line,
An X-ray imager in each of the X-ray diffraction measurement apparatuses has a light receiving plane substantially perpendicular to the reference plane, and diffracted X-rays at a standard diffraction angle on the measurement object by X-rays emitted from the collimator. An X-ray diffraction measurement system, wherein when it occurs, a peak in an intensity distribution of diffracted X-rays on a line where the light receiving plane and the reference plane intersect is arranged at a predetermined position. The X-ray diffraction measurement system according to claim 1,
Each of the X-ray diffraction measurement devices includes a housing including therein the X-ray emission unit and the X-ray imager,
The casing is an irradiation point of the X-ray emitted from the collimator, and when a diffraction X-ray is generated at a standard diffraction angle at the irradiation point, the peak of the intensity distribution of the diffraction X-ray is the X-ray. An X-ray diffraction measurement system, comprising: a visible light emitting unit that emits visible parallel light so that two visible parallel lights intersect at an irradiation point at a predetermined position of the line imager. In the X-ray diffraction measurement system according to claim 1 or 2,
The housing of each of the X-ray diffraction measurement devices has a plane portion that is substantially parallel or substantially perpendicular to the center axis of the X-ray tube,
The plane portion is a goniometer that measures a tilt angle with respect to the direction of gravity, and a goniometer that measures a tilt angle in a central axis direction of the X-ray tube and a tilt angle in a direction perpendicular to the central axis of the X-ray tube. An X-ray diffraction measurement system, which is attached. An X-ray emitting unit that simultaneously emits X-rays from a plurality of directions for a measurement target placed on a transport line flowing in a certain direction,
For each X-ray emitted from the X-ray emission unit, a plurality of X-ray imagers that receive X-rays diffracted by the measurement object and detect the intensity distribution of the diffracted X-rays,
A computer device for inputting and storing the intensity distribution of diffracted X-rays detected by the X-ray imaging device for each of the emitted X-rays as data for calculating residual stress by a sin ² ψ method; In an X-ray diffraction measuring device provided with
The X-ray emitting means is arranged so that a central axis is substantially parallel to a plane of the object to be measured and substantially perpendicular to a moving direction of a transport line, and has an X-ray tube having a plurality of X-ray emission ports; A plurality of collimators for emitting each of the X-rays emitted from the X-ray emission port to the measurement object as parallel X-rays having an optical axis forming a predetermined angle with the central axis,
Each of the X-ray emission ports and each of the collimators has a reference plane including a central axis of the X-ray tube and an optical axis of the X-ray emitted from each of the collimators, and a plane of the measurement object. The angle formed is different, and a line connecting points where the X-rays emitted from the respective collimators are irradiated on the measurement object is arranged so as to be parallel to the moving direction of the transport line,
Each of the plurality of X-ray imagers has a light-receiving plane substantially perpendicular to a corresponding one of the respective reference planes, and an X-ray emitted from a corresponding one of the respective collimators is used for the measurement object. When a diffracted X-ray is generated at a standard diffraction angle, the peak in the intensity distribution of the diffracted X-ray on a line where the light receiving plane and the corresponding reference plane intersect is arranged at a predetermined position. An X-ray diffraction measuring device, characterized by the following.

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