JP2020016659A - 小型流体分析デバイスおよび製造方法 - Google Patents
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Abstract
Description
シリコン基板201を提供する工程、酸化マスク202を提供する工程、酸化マスク202をパターニングして酸化マスク202中に微細な構造を形成する工程、を含む微細な構造203を提供する工程と、
酸化物202を保護するために保護層204を提供する工程と、
粗い構造205のリソグラフィを行う工程と、
粗い構造205のエッチングを行う工程と、
粗い構造205を保護するために酸化物206を成長する工程であって、微細な構造203の上の保護層204は酸化物の成長を妨げる工程と、
保護層204を除去し、微細な構造203をエッチングする工程と、
酸化物206を除去する工程と、
を行うことにより作製されても良い。
Claims (17)
- 流体サンプルを分析するためのデバイス(100)であって、このデバイスは、
マイクロ流体素子(102)を通って、毛細管力により、流体サンプルが伝達されるように設計された、流体基板(101)中に埋め込まれたマイクロ流体素子(102)、およびマイクロ流体素子(102)に接続された流体サンプルを提供する手段、を含む流体基板(101)と、
流体基板(101)に取り付けられ、少なくとも部分的に流体基板(101)を覆い、少なくとも部分的にマイクロ流体素子(102)を閉じる蓋(103)と、を含み、
流体基板(101)はシリコン流体基板であり、蓋(103)はCMOSチップであるデバイス(100)。 - 流体サンプルがデバイス(100)中に存在する場合、蓋(103)の少なくとも一部は流体サンプルに接触する請求項1に記載のデバイス(100)。
- 蓋(103)は、トランジスタ層を含み、トランジスタ層は、少なくとも1つの電気部品と電気的に接続され、電気部品は以下に示す:生物学的感知回路、検出目的の電極、流体取り扱い目的の電極、データ通信目的の回路、無線データ通信目的の回路、温度センサ、温度コントロールのためのヒータ電極、流体センサおよび流体粘性コントロールのための電極、の少なくとも1つである請求項1または2に記載のデバイス(100)。
- 流体サンプルを提供する手段は、シリコンから形成され、マイクロ流体素子(102)に接続された内部流体チャネル(105)を含む集積された針(104)であり、針(104)は、流体基板(101)の突出部分であり、皮膚組織に向かって押しつけた場合に、皮膚組織を突き抜けるように配置される請求項1〜3のいずれかに記載のデバイス(100)。
- 流体基板(101)は、切り欠き(106)を含み、切り欠き(106)中に針(104)が配置される請求項4に記載のデバイス(100)。
- 流体基板(104)は、取り外し可能なように流体基板(101)に取り付けられた、針(104)を保護するための保護構造(107)を含む請求項4に記載のデバイス(100)。
- 流体サンプルを提供する手段は、注入口(109)である請求項1〜3のいずれかに記載のデバイス(100)。
- 流体基板(101)は、更に、流体サンプルがデバイス(100)中に存在する場合に、流体サンプルの光学的励起と検出を可能にする少なくとも1つの光導波路を含む請求項1〜7のいずれかに記載のデバイス(100)。
- 流体基板(101)または蓋(103)は、マイクロ流体素子(102)の少なくとも1つの領域または蓋(103)の少なくとも1つの領域に、生化学的試薬を適用するための少なくとも1つのスルーホールを含む請求項1〜8のいずれかに記載のデバイス(100)。
- リソグラフィでパターニングされたポリマーを用いて、蓋(103)が流体基板(101)に接合される請求項1〜9のいずれかに記載のデバイス(100)。
- 更に、蓋(103)から電気信号を読み出すために蓋(103)に電気的に接続された金属コンタクトを含む請求項1〜10のいずれかに記載のデバイス(100)。
- 流体基板(101)および/または蓋(103)の少なくとも一部は透明材料から作製され、流体サンプルがマイクロ流体素子(102)中に存在する場合に、流体サンプルの光学検査を可能にする請求項1〜11のいずれかに記載のデバイス(100)。
- デバイス(100)の形状は、携帯通信デバイスへの挿入を可能にする請求項1〜12のいずれかに記載のデバイス(100)。
- 流体サンプルを分析するためのデバイス(100)の製造方法であって、この方法は、
流体基板(101)を提供する工程と、
蓋(103)を提供する工程と、
少なくとも部分的に流体基板(101)を閉じるように、流体基板(101)を蓋(103)に取り付ける工程と、を含み、
流体基板(101)はシリコン流体基板で、蓋(103)はCMOSチップであり、
CMOS互換接合プロセスを用いて、流体基板(101)は蓋(103)に取り付けられる方法。 - 流体基板(101)を提供する工程は、
シリコン基板(201)を提供し、酸化マスク(202)を提供し、酸化マスクをパターニングして酸化マスク(202)中に微細構造(203)を形成する工程と、
酸化マスク(202)を保護するために保護層(204)を提供する工程と、
粗い構造(205)をパターニングする工程と、
粗い構造(205)をエッチングする工程と、
粗い構造(205)を保護するために酸化物(206)を成長させる工程と、
保護層(204)を除去して、微細構造(203)をエッチングする工程と、
酸化物(206)を除去する工程と、を含む請求項14に記載の方法。 - 流体基板と流体サンプルとの表面相互作用を修正するために、流体基板(101)と蓋(103)の表面は、部分的または完全に被覆される請求項14に記載の方法。
- 顕微鏡を実施するための、請求項1〜13のいずれかにかかるデバイスの使用。
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