JP2019534939A5 - - Google Patents
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- Publication number
- JP2019534939A5 JP2019534939A5 JP2019510937A JP2019510937A JP2019534939A5 JP 2019534939 A5 JP2019534939 A5 JP 2019534939A5 JP 2019510937 A JP2019510937 A JP 2019510937A JP 2019510937 A JP2019510937 A JP 2019510937A JP 2019534939 A5 JP2019534939 A5 JP 2019534939A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- transition metal
- containing film
- azatoran
- precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910052723 transition metal Inorganic materials 0.000 description 17
- 150000003624 transition metals Chemical class 0.000 description 17
- 239000000203 mixture Substances 0.000 description 9
- 239000002243 precursor Substances 0.000 description 8
- 239000000356 contaminant Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201662385689P | 2016-09-09 | 2016-09-09 | |
| US62/385,689 | 2016-09-09 | ||
| PCT/US2017/026817 WO2018048481A1 (en) | 2016-09-09 | 2017-04-10 | Group 4 transition metal-containing film forming compositions for vapor deposition of group 4 transition metal-containing films |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2019534939A JP2019534939A (ja) | 2019-12-05 |
| JP2019534939A5 true JP2019534939A5 (https=) | 2020-05-14 |
| JP6941670B2 JP6941670B2 (ja) | 2021-09-29 |
Family
ID=61562782
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2019510937A Active JP6941670B2 (ja) | 2016-09-09 | 2017-04-10 | ４族遷移金属含有膜の気相成長のための４族遷移金属含有膜形成用組成物 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US11008351B2 (https=) |
| JP (1) | JP6941670B2 (https=) |
| KR (1) | KR102398823B1 (https=) |
| WO (1) | WO2018048481A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN118388554B (zh) * | 2024-06-27 | 2024-11-19 | 江苏南大光电材料股份有限公司 | Ivb族金属化合物、制备方法及应用 |
| CN118388553B (zh) * | 2024-06-27 | 2024-10-18 | 江苏南大光电材料股份有限公司 | 多胺配体基ivb族金属化合物、制备方法及应用 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5344948A (en) * | 1992-02-25 | 1994-09-06 | Iowa State University Research Foundation, Inc. | Single-source molecular organic chemical vapor deposition agents and use |
| WO2003024451A1 (de) * | 2001-09-08 | 2003-03-27 | Boehringer Ingelheim Pharma Gmbh & Co. Kg | 2-(2-phenylethyl)-benzimidazol-5-carboxamid- derivative und ihre verwendung als tryptase_ inhibitoren |
| US7098150B2 (en) * | 2004-03-05 | 2006-08-29 | Air Liquide America L.P. | Method for novel deposition of high-k MSiON dielectric films |
| KR20080101040A (ko) * | 2007-05-15 | 2008-11-21 | 주식회사 유피케미칼 | 금속 박막 또는 세라믹 박막 증착용 유기 금속 전구체화합물 및 이를 이용한 박막 증착 방법 |
| US8900422B2 (en) * | 2008-04-23 | 2014-12-02 | Intermolecular, Inc. | Yttrium and titanium high-K dielectric film |
| US9373500B2 (en) * | 2014-02-21 | 2016-06-21 | Lam Research Corporation | Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications |
| KR101465911B1 (ko) * | 2010-08-13 | 2014-11-26 | 토탈 리서치 앤드 테크놀로지 펠루이 | 개질된 촉매 지지체 |
| WO2013109401A1 (en) * | 2012-01-19 | 2013-07-25 | Christian Dussarrat | Silicon containing compounds for ald deposition of metal silicate films |
| US9187511B2 (en) * | 2012-05-01 | 2015-11-17 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Titanium-aluminum alloy deposition with titanium-tetrahydroaluminate bimetallic molecules |
| KR102093226B1 (ko) * | 2013-05-20 | 2020-03-25 | (주)디엔에프 | 규소함유 유기 금속 전구체 화합물, 이의 제조방법 및 이를 이용한 금속-규소 산화물 박막의 제조 방법 |
| US9067958B2 (en) * | 2013-10-14 | 2015-06-30 | Intel Corporation | Scalable and high yield synthesis of transition metal bis-diazabutadienes |
| EP3155025B1 (en) * | 2014-06-12 | 2018-03-14 | Total Research & Technology Feluy | Process for preparing a polyethylene in at least one continuously stirred tank reactor |
| US9663547B2 (en) * | 2014-12-23 | 2017-05-30 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Silicon- and Zirconium-containing compositions for vapor deposition of Zirconium-containing films |
| US9790591B2 (en) * | 2015-11-30 | 2017-10-17 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Titanium-containing film forming compositions for vapor deposition of titanium-containing films |
| US10106568B2 (en) * | 2016-10-28 | 2018-10-23 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films |
| US20170044664A1 (en) * | 2016-10-28 | 2017-02-16 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Hafnium-containing film forming compositions for vapor deposition of hafnium-containing films |
| US10584039B2 (en) * | 2017-11-30 | 2020-03-10 | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Titanium-containing film forming compositions for vapor deposition of titanium-containing films |
-
2017
- 2017-04-10 WO PCT/US2017/026817 patent/WO2018048481A1/en not_active Ceased
- 2017-04-10 US US16/331,204 patent/US11008351B2/en active Active
- 2017-04-10 KR KR1020197007842A patent/KR102398823B1/ko active Active
- 2017-04-10 JP JP2019510937A patent/JP6941670B2/ja active Active
-
2021
- 2021-04-07 US US17/224,513 patent/US20210221830A1/en not_active Abandoned
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