JP2019203204A - Plating pretreatment method for abs resin surface, plating treatment method for abs resin surface, and abs resin-plated product - Google Patents
Plating pretreatment method for abs resin surface, plating treatment method for abs resin surface, and abs resin-plated product Download PDFInfo
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- 238000007747 plating Methods 0.000 title claims abstract description 84
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- 238000000034 method Methods 0.000 title claims description 34
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- 150000004968 peroxymonosulfuric acids Chemical class 0.000 claims description 39
- 238000007772 electroless plating Methods 0.000 claims description 11
- 238000009713 electroplating Methods 0.000 claims description 7
- 238000005868 electrolysis reaction Methods 0.000 abstract description 11
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- 235000011149 sulphuric acid Nutrition 0.000 abstract 2
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- 230000000694 effects Effects 0.000 description 4
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- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
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- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 3
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- 229910017052 cobalt Inorganic materials 0.000 description 2
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- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910001431 copper ion Inorganic materials 0.000 description 2
- 229910000365 copper sulfate Inorganic materials 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- KWIUHFFTVRNATP-UHFFFAOYSA-N glycine betaine Chemical compound C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 2
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- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
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- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本発明は、ABS系樹脂表面のめっき処理に先立って行われる前処理方法に関する。また、本発明はこの前処理を行ったABS系樹脂表面のめっき処理方法に関する。さらに本発明は、この前処理を行ったABS系樹脂表面にめっき処理して得られるABS系樹脂めっき製品に関する。 The present invention relates to a pretreatment method that is performed prior to plating of an ABS resin surface. The present invention also relates to a plating method for the surface of the ABS resin subjected to this pretreatment. Furthermore, the present invention relates to an ABS resin plating product obtained by plating the surface of the ABS resin subjected to this pretreatment.
構造材料や部品材料として金属が用いられている部位において、軽量化、低コスト化、形状の自由さ、大量生産の容易さ等のメリットを生かし、プラスチックが代替されている。現在では、装飾用のみならず、自動車の外装や内装部品、家電製品等に広く使用されている。その際、剛性、耐摩耗性、耐候性、耐熱性等を向上させるため、プラスチック表面にめっきを施すことが多い。 In parts where metal is used as a structural material or component material, plastics are substituted by taking advantage of advantages such as light weight, low cost, freedom of shape, and ease of mass production. At present, it is widely used not only for decoration but also for automobile exteriors, interior parts, and home appliances. At that time, in order to improve rigidity, wear resistance, weather resistance, heat resistance and the like, the plastic surface is often plated.
プラスチックは非導電性のため、めっきを施すにはまず導体となる金属皮膜をプラスチック上に形成する必要がある。その方法を大きく分類すると、CVD(化学気相蒸着)、PVD(物理気相蒸着)といった乾式法、無電解ニッケルめっきの湿式法がある。乾式法は真空状態での成膜がほとんどで、大量生産や大型部品への適用に向かないことから、湿式法がこれまで採用されてきた。 Since plastic is non-conductive, it is necessary to first form a metal film as a conductor on the plastic in order to perform plating. The methods are roughly classified into dry methods such as CVD (chemical vapor deposition) and PVD (physical vapor deposition), and wet methods of electroless nickel plating. Since the dry method is mostly a film formation in a vacuum state and is not suitable for mass production or application to a large part, the wet method has been adopted so far.
このようなプラスチック成形品のうちABS系樹脂は最もめっきしやすい樹脂として、金属代替の主プラスチックとして広く用いられている。このABS系樹脂のめっき前処理としての粗面化処理に、クロム酸・硫酸溶液による粗面化処理が行われている。クロム酸は化学式:H2CrO4で表され、濃硫酸との混合液であるエッチング液中では
2CrO4 2−+2H3O+→Cr2O7 2−+3H2O
の平衡が存在するものの、Crはいずれにせよ6価である。6価クロムはREACH規制及びRoHS指令の対象ではあるものの、製品内に6価クロムが残留するわけでないので、それ自体が規制を受けるわけではない。しかしながら、近年環境問題への関心が強くなり、6価クロムを使用しない環境調和型技術が強く要望されている。また、Crを含む排水は、還元、中和、凝集沈殿等の排水処理が必要となる上に、沈殿物もCrを含むために容易には廃棄できないという問題点があった。
Among such plastic molded products, ABS-based resins are widely used as main plastics for metal replacement as the most easily plated resin. A roughening treatment using a chromic acid / sulfuric acid solution is performed as a roughening treatment as a pretreatment for plating of the ABS resin. Chromic acid is represented by the chemical formula: H 2 CrO 4 , and 2CrO 4 2 + 2H 3 O + → Cr 2 O 7 2 + + 3H 2 O in an etching solution which is a mixed solution with concentrated sulfuric acid.
However, Cr is hexavalent anyway. Although hexavalent chromium is subject to REACH regulations and RoHS directives, hexavalent chromium does not remain in the product, so it is not itself regulated. However, in recent years, interest in environmental issues has increased, and there has been a strong demand for environmentally friendly technologies that do not use hexavalent chromium. In addition, the wastewater containing Cr has a problem that wastewater treatment such as reduction, neutralization, and coagulation precipitation is required, and the precipitate also contains Cr and cannot be easily discarded.
そこで、クロム酸に代わる環境調和型技術として、特許文献1には、過マンガン酸塩及び無機塩の混合液でエッチングすることが提案されている。また、特許文献2及び特許文献3には、オゾン溶解水を用いてプラスチック成形品の表面を粗化する無電解めっきの前処理方法が開示されている。
Therefore, as an environmentally conscious technique that replaces chromic acid, Patent Document 1 proposes etching with a mixed liquid of permanganate and inorganic salt.
しかし、特許文献1に記載の過マンガン酸塩及び無機塩の混合液でエッチングする方法では、ABS系樹脂の表面処理は難しく、金属との密着性が良くない、という問題点がある。さらに、マンガン(Mn)も将来的にはCrと同様にREACH規制及びRoHS指令の対象になると言われており、使用しないのが望ましい。また、特許文献2及び特許文献3に記載されたプラスチック表面のめっき前処理方法では、オゾンは分解速度が速いので、高濃度のオゾン水を製造し、かつ高濃度を維持しなければならないため、大掛かりな設備が必要となるだけでなく、局所的なオゾン濃度の差により処理にムラが生じやすい、という問題点がある。
However, the method of etching with a mixed solution of permanganate and inorganic salt described in Patent Document 1 has a problem that the surface treatment of the ABS resin is difficult and the adhesion with the metal is not good. Furthermore, manganese (Mn) is said to be subject to REACH regulations and RoHS directives in the same way as Cr in the future, and it is desirable not to use it. Moreover, in the pretreatment method for plating the plastic surface described in
本発明は上記課題に鑑みてなされたものであり、クロム及びマンガンフリーのABS系樹脂表面のめっき前処理方法であって、ABS系樹脂表面に十分に密着しためっきを形成することができるABS系樹脂表面のめっき前処理方法を提供することを目的とする。また、本発明はかかる前処理方法を施したABS系樹脂表面に良好に密着しためっき処理方法を提供することを目的とする。さらに本発明は、この前処理を行ったABS系樹脂表面にめっき処理して得られるABS系樹脂めっき製品を提供することを目的とする。 The present invention has been made in view of the above problems, and is a plating pretreatment method for a chromium- and manganese-free ABS-based resin surface, which can form a plating sufficiently adhered to the ABS-based resin surface. It aims at providing the plating pre-processing method of the resin surface. Another object of the present invention is to provide a plating method that adheres well to the surface of an ABS resin subjected to such a pretreatment method. A further object of the present invention is to provide an ABS resin plated product obtained by plating the surface of the ABS resin that has been pretreated.
上記目的を達成するために本発明は第一に、ABS系樹脂を硫酸を電気分解した溶液で処理する、ABS系樹脂表面のめっき前処理方法を提供する(発明1)。 In order to achieve the above object, the present invention first provides a plating pretreatment method for an ABS resin surface, wherein the ABS resin is treated with a solution obtained by electrolyzing sulfuric acid (Invention 1).
かかる発明(発明1)によれば、硫酸を電気分解して生じる過硫酸の強い酸化作用によりABS系樹脂表面のブタジエン成分を溶解させて、表面を粗面化することで比表面積が増大するとともに親水性の官能基が露出するので、この処理後のABS系樹脂にめっき処理を施すことにより十分に密着しためっきを得ることができる。なお、本明細書中において、ABS系樹脂とは、アクリロニトリル・ブタジエン・スチレン共重合樹脂(ABS樹脂)単独の場合のみならず、このABS樹脂と他の樹脂のブレンド樹脂、具体的にはABS樹脂とポリカーボネート(PC樹脂)との混合樹脂を含むものとする。特にABS樹脂とPC樹脂との合計100重量%に対して、PC樹脂が20〜70重量%のPC/ABS混合樹脂をも含むものとする。 According to this invention (Invention 1), the specific surface area is increased by dissolving the butadiene component on the surface of the ABS resin by the strong oxidizing action of persulfuric acid generated by electrolyzing sulfuric acid and roughening the surface. Since the hydrophilic functional group is exposed, sufficiently adherent plating can be obtained by plating the ABS resin after this treatment. In this specification, the ABS-based resin is not limited to acrylonitrile / butadiene / styrene copolymer resin (ABS resin) alone, but is a blend resin of this ABS resin and other resins, specifically, ABS resin. And a mixed resin of polycarbonate (PC resin). In particular, the PC resin includes a PC / ABS mixed resin in which the PC resin is 20 to 70% by weight with respect to 100% by weight of the ABS resin and the PC resin in total.
上記発明(発明1)においては、前記溶液の硫酸濃度が60〜87重量%であることが好ましい(発明2)。 In the said invention (invention 1), it is preferable that the sulfuric acid concentration of the said solution is 60 to 87 weight% (invention 2).
かかる発明(発明2)によれば、この濃度の硫酸を電気分解した過硫酸溶液によってABS系樹脂表面を好適に粗面化することで比表面積が増大し、めっきの密着性を向上させることができる。そして、硫酸濃度を上記範囲で変動させることで、ABS系樹脂表面の処理の度合いを調整することができる。 According to this invention (invention 2), the surface area of the ABS resin is suitably roughened by a persulfuric acid solution obtained by electrolyzing this concentration of sulfuric acid, thereby increasing the specific surface area and improving the adhesion of plating. it can. And the degree of the process of the ABS resin surface can be adjusted by changing the sulfuric acid concentration within the above range.
上記発明(発明1,2)においては、前記処理の温度が50〜80℃であることが好ましい(発明3)。 In the said invention (invention 1 and 2), it is preferable that the temperature of the said process is 50-80 degreeC (invention 3).
かかる発明(発明3)によれば、過硫酸の分解を抑制しつつABS系樹脂表面を好適に粗面化することで比表面積が増大し、めっきの密着性をより向上させることができる。 According to this invention (Invention 3), the surface area of the ABS resin is suitably roughened while suppressing the decomposition of persulfuric acid, whereby the specific surface area is increased and the adhesion of plating can be further improved.
上記発明(発明1〜3)においては、前記溶液の過硫酸濃度が3g/L以上であることが好ましい(発明4)。 In the said invention (invention 1-3), it is preferable that the persulfuric acid density | concentration of the said solution is 3 g / L or more (invention 4).
かかる発明(発明4)によれば、過硫酸の強い酸化作用によりABS系樹脂表面を好適に粗面化することで比表面積が増大し、めっきの密着性をさらに向上させることができる。 According to this invention (invention 4), the surface area of the ABS resin is suitably roughened by the strong oxidizing action of persulfuric acid, thereby increasing the specific surface area and further improving the adhesion of the plating.
また、本発明は第二に、上記発明(発明1〜4)のいずれかに記載のABS系樹脂表面のめっき前処理方法により処理した後、該ABS系樹脂表面に無電解めっき又は電気めっきを施す、ABS系樹脂表面のめっき処理方法を提供する(発明5)。 In addition, according to the second aspect of the present invention, after treatment by the plating pretreatment method for the ABS resin surface according to any of the above inventions (Inventions 1 to 4), electroless plating or electroplating is applied to the ABS resin surface. An ABS resin surface plating method is provided (Invention 5).
かかる発明(発明5)によれば、硫酸を電気分解して生じる過硫酸の強い酸化作用によりABS系樹脂表面のブタジエン成分を溶解させて、表面を粗面化するとともに親水性の官能基が露出するので、この処理後のABS系樹脂にめっき処理を施すことによりABS系樹脂の表面に密着性の良いクロム等のめっきを析出させることができる。 According to this invention (Invention 5), the butadiene component on the surface of the ABS resin is dissolved by the strong oxidizing action of persulfuric acid generated by electrolysis of sulfuric acid, and the surface is roughened and hydrophilic functional groups are exposed. Therefore, plating such as chromium having good adhesion can be deposited on the surface of the ABS resin by plating the ABS resin after the treatment.
さらに本発明は第三に、上記発明(発明5)に記載のABS系樹脂表面のめっき処理方法によりめっき処理を施した、ABS系樹脂めっき製品を提供する(発明6)。 Thirdly, the present invention provides an ABS-based resin-plated product that has been plated by the method for plating a surface of an ABS-based resin described in the above-mentioned invention (Invention 5) (Invention 6).
かかる発明(発明6)によれば、ABS系樹脂の表面に密着性の良いクロム等のめっきを施されたABS系樹脂めっき製品となっている。 According to this invention (invention 6), it is an ABS resin plated product in which the surface of the ABS resin is plated with good adhesion such as chromium.
本発明のABS系樹脂表面のめっき処理方法によれば、硫酸を電気分解して生じる過硫酸の強い酸化作用によりABS系樹脂表面のブタジエン成分を溶解させて、表面を粗面化することで比表面積が増大するとともに親水性の官能基が露出するので、この処理後のABS系樹脂にめっき処理を施すことにより十分に密着しためっきを得ることができる。 According to the plating method of the ABS resin surface of the present invention, the butadiene component on the ABS resin surface is dissolved by the strong oxidizing action of persulfuric acid generated by electrolysis of sulfuric acid, and the surface is roughened. Since the surface area increases and the hydrophilic functional groups are exposed, sufficiently adhered plating can be obtained by plating the ABS resin after this treatment.
図1は本発明の一実施形態によるABS系樹脂表面のめっき前処理方法を適用可能な処理装置を示している。図1において処理装置1は、外周に恒温ヒータ3が設けられた処理槽2と、循環ポンプ5を備えた配管4から連続する電解セル6と、この電解セル6から処理槽2に供給する配管7とを有する。この電解セル6内には、ダイヤモンド電極よりなる陽極6A及び陰極6Bと、両者間に配置されたバイポーラ電極6Cとを備える。なお、処理槽2内には、必要に応じて槽内を攪拌するための散気管などの攪拌手段を設けても良い。
FIG. 1 shows a processing apparatus to which a plating pretreatment method for an ABS resin surface according to an embodiment of the present invention can be applied. In FIG. 1, a processing apparatus 1 includes a
このような処理装置1において、処理槽2及び電解セル6には、初期状態において所定の濃度の硫酸が充填されていて、陽極6A及び陰極6Bに直流電源ユニットから所定の電流を通電して、硫酸を電気分解することにより、ペルオキソ二硫酸等の過硫酸(酸化剤)を含む硫酸溶液(以下、本明細書中では過硫酸溶液とする)Sを生成して、この過硫酸溶液Sを配管7を経由して処理槽2に供給可能となっている。この過硫酸溶液Sは処理槽2から配管4を経由して循環ポンプ5により電解セル6に還流することで、過硫酸溶液Sが循環するように構成されている。そして、処理槽2内には、被処理対象であるABS系樹脂板8が上下方向に吊設されている。
In such a processing apparatus 1, the
この過硫酸溶液Sは、硫酸濃度が60〜87重量%、特に70〜83重量%であることが好ましい。硫酸濃度が60重量%未満では、得られる過硫酸溶液Sの硫酸濃度が薄すぎて、ABS系樹脂板8の表面を十分に粗面化することができず、もってめっきの密着性を向上効果が十分に得られない一方、87重量%を超えても、それ以上の効果の向上が得られないばかりか、取扱い性が悪くなるため好ましくない。 The persulfuric acid solution S preferably has a sulfuric acid concentration of 60 to 87% by weight, particularly 70 to 83% by weight. If the sulfuric acid concentration is less than 60% by weight, the sulfuric acid concentration of the resulting persulfuric acid solution S is too thin and the surface of the ABS resin plate 8 cannot be sufficiently roughened, thereby improving the adhesion of plating. On the other hand, if it exceeds 87% by weight, not only the improvement of the effect is not obtained, but also the handleability is unfavorable.
次に上述したような処理装置1を用いたABS系樹脂表面のめっき前処理方法について説明する。まず、処理槽2に硫酸を入れて恒温ヒータ3により加熱したら、循環ポンプ5により電解セル6に供給し、直流電源ユニットから所定の電流を通電して、硫酸を電気分解することにより、ペルオキソ二硫酸等の過硫酸溶液Sを生成し、この過硫酸溶液Sを配管7を経由して処理槽2に供給して循環する。
Next, a plating pretreatment method for the ABS resin surface using the treatment apparatus 1 as described above will be described. First, when sulfuric acid is put into the
このとき過硫酸溶液Sの温度が50〜80℃となるように恒温ヒータ3により加熱することが好ましい。過硫酸溶液Sの温度が50℃未満では、ABS系樹脂板8の表面を十分に粗面化することができず、もってめっきの密着性の向上効果が十分に得られない一方、80℃を超えると、過硫酸の分解が促進して処理効率が低下する。
At this time, it is preferable to heat by the
また、電解セル6における硫酸の電気分解は、電気分解により生成するペルオキソ二硫酸等の過硫酸の濃度が3g/L以上、特に3〜20g/Lとなる条件とすればよい。過硫酸濃度が3g/L未満では十分なめっきの密着性の向上効果が得られない一方、20g/Lを超えても上記効果の向上が得られないばかりか経済的でない。
In addition, the electrolysis of sulfuric acid in the
処理槽2内の過硫酸溶液Sが上述した温度及び過硫酸濃度になったら、脱脂したABS系樹脂板8を処理槽2に浸漬することによりABS系樹脂板8の表面を処理する。このとき過硫酸溶液Sに浸漬する際に付着する気泡を抑えるため、ABS系樹脂板8にはあらかじめ湿潤処理を施しておくのが好ましい。
When the persulfuric acid solution S in the
このABS系樹脂板8を処理槽2内の過硫酸溶液Sに5〜20分間浸漬することにより、ABS系樹脂板8の表面には親水性の官能基が露出する。これにより、ABS系樹脂のヒドロキシル基、カルボニル基、アルデヒド基及びカルボキシル基がABS系樹脂表面に現れる。これらにより、その後のめっき処理においてめっきの密着性を向上させることができる。
By immersing the ABS resin plate 8 in the persulfuric acid solution S in the
上記工程でABS系樹脂板8樹脂表面に発現した官能基を活性化させた後には、必要により中和・還元処理、コンディショナー処理等を行ってもよい。 After activating the functional group expressed on the surface of the ABS resin plate 8 resin in the above process, neutralization / reduction treatment, conditioner treatment, or the like may be performed as necessary.
以上説明した本実施形態の前処理方法により、ABS系樹脂板8表面をエッチングすることができる。そして、本実施形態のめっき前処理方法は、その後は、無電解めっき法、ダイレクトめっき法などの従来公知の樹脂へのめっき方法を適用することができる。 The surface of the ABS resin plate 8 can be etched by the pretreatment method of the present embodiment described above. And the plating pretreatment method of this embodiment can apply plating methods to conventionally well-known resin, such as an electroless plating method and a direct plating method, after that.
例えば、本実施形態の前処理方法で処理したABS系樹脂板8に対し、触媒付与処理液にて触媒を付与する。この触媒付与処理液は、一般にめっき工程の触媒付与に用いられるものであれば特に制限されないが、貴金属を含むものが好ましく、パラジウムを含むものがより好ましく、特にパラジウム/すず混合コロイド触媒溶液が好ましい。これら触媒を樹脂表面に付与するには、触媒付与処理液の液温を好ましくは10〜60℃、特に20〜50℃とし、ここにABS系樹脂板8を1〜20分間、好ましくは2〜5分間浸漬させ処理すればよい。このようにして触媒が付与された樹脂表面は、次に、無電解めっきや電気めっき(ダイレクトプレーティング)等の金属めっき処理により、樹脂表面の金属化を行う。 For example, a catalyst is imparted to the ABS resin plate 8 treated by the pretreatment method of the present embodiment with a catalyst imparting treatment liquid. The catalyst application treatment liquid is not particularly limited as long as it is generally used for catalyst application in the plating step, but preferably contains a noble metal, more preferably contains palladium, and particularly preferably a palladium / tin mixed colloid catalyst solution. . In order to apply these catalysts to the resin surface, the temperature of the catalyst application treatment liquid is preferably 10 to 60 ° C., particularly 20 to 50 ° C., and the ABS resin plate 8 is placed here for 1 to 20 minutes, preferably 2 to What is necessary is just to immerse and process for 5 minutes. The resin surface thus provided with the catalyst is then metallized by metal plating such as electroless plating or electroplating (direct plating).
樹脂表面の金属化に無電解めっきを用いる場合には、触媒付与処理液にて触媒を付与した後に、さらに塩酸または硫酸を含有する活性化処理液で処理を行ってもよい。この活性化処理液中の塩酸または硫酸の濃度は0.5mol/L以上、好ましくは1〜4mol/Lである。これら活性化処理液にて樹脂表面を処理するには、活性化処理液の液温を好ましくは0〜60℃、特に30〜45℃とし、ここにABS系樹脂板8を好ましくは1〜20分間、特に2〜5分間浸漬させ処理すればよい。 When electroless plating is used for the metallization of the resin surface, after applying the catalyst with the catalyst application treatment solution, the treatment may be performed with an activation treatment solution containing hydrochloric acid or sulfuric acid. The concentration of hydrochloric acid or sulfuric acid in the activation treatment liquid is 0.5 mol / L or more, preferably 1 to 4 mol / L. In order to treat the resin surface with these activation treatment liquids, the liquid temperature of the activation treatment liquid is preferably 0 to 60 ° C., particularly 30 to 45 ° C., and the ABS resin plate 8 is preferably 1 to 20 here. What is necessary is just to immerse and process for 2 minutes for 2 minutes especially.
上記のようにして触媒の付与、活性化処理されたABS系樹脂板8には、次に無電解めっき処理を行う。無電解めっき処理は、公知の無電解ニッケルめっき液、無電解銅めっき液、無電解コバルトめっき液等の無電解めっきを用いて常法に従って行うことができる。具体的には無電解ニッケルめっき液で樹脂表面にめっき処理を行う場合には、pH8〜10で30〜50℃の液温の無電解ニッケルめっき液にABS系樹脂板8を5〜15分間浸漬させ処理すればよい。 Next, the electroless plating process is performed on the ABS resin plate 8 to which the catalyst is applied and activated as described above. The electroless plating treatment can be performed according to a conventional method using electroless plating such as a known electroless nickel plating solution, electroless copper plating solution, and electroless cobalt plating solution. Specifically, when plating the resin surface with an electroless nickel plating solution, the ABS resin plate 8 is immersed in an electroless nickel plating solution at a pH of 8 to 10 and a temperature of 30 to 50 ° C. for 5 to 15 minutes. Process.
また、樹脂表面の金属化に電気めっき(ダイレクトプレーティング)を用いる場合には、触媒付与処理液にて触媒を付与した後に、さらに、銅イオンを含有するpH7以上の活性化処理液で処理を行ってもよい。この活性化処理液に含有される銅イオンの由来は特に制限されず、例えば、硫酸銅が挙げられる。活性化処理液にて樹脂表面を処理するには、活性化処理液の液温を好ましくは0〜60℃、特に30〜50℃とし、ここにABS系樹脂板8を好ましくは1〜20分間、特に2〜50分間浸漬させ処理すればよい。 In addition, when electroplating (direct plating) is used for metallization of the resin surface, after applying a catalyst with a catalyst application treatment solution, the treatment is further performed with an activation treatment solution containing copper ions and having a pH of 7 or higher. You may go. The origin of the copper ions contained in this activation treatment liquid is not particularly limited, and examples thereof include copper sulfate. In order to treat the resin surface with the activation treatment liquid, the temperature of the activation treatment liquid is preferably 0 to 60 ° C., particularly 30 to 50 ° C., where the ABS resin plate 8 is preferably 1 to 20 minutes. In particular, the treatment may be performed by dipping for 2 to 50 minutes.
上述のようにして触媒の付与、活性化処理されたABS系樹脂板8には、続いて硫酸銅浴等の汎用の電気銅めっき浴に浸漬し、通常の条件、例えば、1〜5A/dm2で2〜10分間処理すればよい。ちなみに、これまでの各工程間には、十分な水洗や湯洗を行うこととする。上述したようにしてABS系樹脂板8の表面に無電解めっきや電気めっき等の金属めっきを施し、金属化したABS系樹脂板8の表面には、さらに必要に応じて各種電気銅めっきや電気ニッケルめっき、電気クロムめっきを施すことも可能である。それら金属めっきはめっきとして皮膜が得られれば良く、例えば、ニッケル、銅、クロム、コバルト、すず、亜鉛、鉄、銀、金及びそれらの合金などが挙げられる。 The ABS-based resin plate 8 subjected to the catalyst application and activation treatment as described above is subsequently immersed in a general-purpose electrolytic copper plating bath such as a copper sulfate bath, and is subjected to normal conditions, for example, 1 to 5 A / dm. 2 for 2 to 10 minutes. By the way, between each process so far, we will perform sufficient water washing and hot water washing. As described above, the surface of the ABS resin plate 8 is subjected to metal plating such as electroless plating or electroplating, and the surface of the metalized ABS resin plate 8 is further subjected to various types of copper electroplating and electric as required. Nickel plating and electrochrome plating can also be applied. These metal platings only need to obtain a film as plating, and examples thereof include nickel, copper, chromium, cobalt, tin, zinc, iron, silver, gold, and alloys thereof.
このような処理をABS系樹脂板8を交換しながら連続して行えばよいが、処理槽2内の過硫酸溶液Sの過硫酸は処理に伴い分解し、過硫酸濃度は減少するので、循環ポンプ5を連続駆動して電解セル6から新たな過硫酸溶液Sを配管7から処理槽2に補充し続けることが望ましい。また、硫酸濃度が低下したら処理槽2に硫酸を、硫酸濃度が上昇したら処理槽2に水を適宜補充すればよい。硫酸濃度系を処理槽2に設置し、この作業を自動で行うこともできる。
Such treatment may be performed continuously while replacing the ABS resin plate 8, but the persulfuric acid in the persulfuric acid solution S in the
なお、上述したような本実施形態の前処理に先立ってABS系樹脂板8には、必要に応じて濡れ性を付与する処理を施してもよい。この処理は、例えばABS系樹脂板8を湿潤処理槽に十分に浸漬させ、樹脂基板表面に濡れ性を付与することにより行えばよい。また、上記湿潤処理槽には界面活性剤を含有させても良い。界面活性剤としては特に限定はされないが、例えば、アミン塩型界面活性剤、第4級アミン塩型界面活性剤、アミノ酸型界面活性剤、ベタイン型界面活性剤、カルボン酸塩型界面活性剤、スルホン酸塩型界面活性剤、硫酸エステル塩型界面活性剤、リン酸エステル型界面活性剤、エーテル型界面活性剤、エステル型界面活性剤、含窒素型界面活性剤、含フッ素型界面活性剤等を用いることができる。これらの界面活性剤は1種または2種以上用いることができる。 Prior to the pretreatment of the present embodiment as described above, the ABS resin plate 8 may be subjected to a treatment for imparting wettability as necessary. This treatment may be performed, for example, by sufficiently immersing the ABS resin plate 8 in a wet treatment tank and imparting wettability to the resin substrate surface. Further, a surfactant may be contained in the wet treatment tank. Although it does not specifically limit as surfactant, For example, amine salt type surfactant, quaternary amine salt type surfactant, amino acid type surfactant, betaine type surfactant, carboxylate type surfactant, Sulfonate-type surfactant, sulfate ester-type surfactant, phosphate ester-type surfactant, ether-type surfactant, ester-type surfactant, nitrogen-containing surfactant, fluorine-containing surfactant, etc. Can be used. These surfactants can be used alone or in combination of two or more.
このようにして前処理を施したABS系樹脂板8には、通常の方法により無電解めっき又は電気めっきを施すことができる。これによりABS系樹脂板8の表面に密着性の良いクロム等のめっきが施されたABS系樹脂めっき製品を得ることができる。 The ABS resin plate 8 that has been pretreated in this manner can be subjected to electroless plating or electroplating by an ordinary method. As a result, an ABS resin plated product in which the surface of the ABS resin plate 8 is plated with chromium or the like having good adhesion can be obtained.
以上、本発明のABS系樹脂表面のめっき処理方法について、前記実施形態に基づいて説明してきたが、本発明は前記実施例に限定されず種々の変形実施が可能である。例えば、本実施形態のようなバッチ処理でなく連続処理にも適用可能である。また、ABS系樹脂板は、本実施形態のように板に限らず種々の形状の成形体に適用可能であることはいうまでもない。 As mentioned above, although the plating method of the ABS type resin surface of this invention has been demonstrated based on the said embodiment, this invention is not limited to the said Example, A various deformation | transformation implementation is possible. For example, the present invention can be applied not only to batch processing as in the present embodiment but also to continuous processing. Needless to say, the ABS resin plate is applicable not only to the plate as in the present embodiment but also to molded products having various shapes.
以下に実施例及び比較例を示し、本発明をより具体的に説明する。ただし、本発明はこれらの記載により何ら限定されるものではない。なお、以下の実施例及び比較例においては、過硫酸濃度測定及び密着性試験は次のようにして行った。 Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples. However, the present invention is not limited by these descriptions. In the following examples and comparative examples, the persulfuric acid concentration measurement and the adhesion test were performed as follows.
<過硫酸濃度測定方法>
まず、ヨウ素滴定により処理液(過硫酸溶液S)中に含まれる全酸化剤濃度を測定する。このヨウ素滴定とは、過硫酸溶液SにKIを加えてI2を遊離させ、そのI2をチオ硫酸ナトリウム標準溶液で滴定してI2の量を求め、そのI2の量から酸化剤濃度を求めるものである。次に、過硫酸溶液Sの過酸化水素濃度のみを過マンガン酸カリウム滴定により求め、ヨウ素滴定値から過マンガン酸カリウム滴定値を差し引くことにより過硫酸濃度を算出した。
<Persulfuric acid concentration measurement method>
First, the total oxidant concentration contained in the treatment liquid (persulfuric acid solution S) is measured by iodine titration. And the iodometric titration, persulfate solution S added KI to release I 2, to determine the amount of I 2 was titrated the I 2 with sodium thiosulfate standard solution, oxidizing agent concentration from the amount of the I 2 Is what you want. Next, only the hydrogen peroxide concentration in the persulfuric acid solution S was determined by titration with potassium permanganate, and the persulfate concentration was calculated by subtracting the potassium permanganate titration value from the iodine titration value.
<めっき密着性試験>
この試験は、試料を加熱急冷する熱衝撃によって密着性を調べるもので、70℃と−30℃、すなわち温度差100℃をそれぞれの温度を1時間保ち40サイクル実施した後、めっき表面の剥離、クラック、膨れ等の有無などの状況を観察し、下記分類1から3までの3段階で評価する。
分類1:めっきの剥離、クラックやしわ、ふくれが全くない。
分類2:めっきの剥離、クラックやしわ、ふくれが試料面積の25%未満存在する。
分類3:めっきの剥離、クラックやしわ、ふくれが試料面積の25%以上存在する。
<Plating adhesion test>
In this test, the adhesion is examined by thermal shock by heating and quenching the sample. After carrying out 40 cycles at 70 ° C. and −30 ° C., that is, at a temperature difference of 100 ° C. for 1 hour, peeling of the plating surface, Observe the presence or absence of cracks, blisters, etc., and evaluate in three stages from classification 1 to 3 below.
Classification 1: No peeling of plating, cracks, wrinkles, or blisters.
Classification 2: Plating peeling, cracks, wrinkles, and blisters are present in less than 25% of the sample area.
Classification 3: Plating peeling, cracks, wrinkles and blisters are present in 25% or more of the sample area.
[実施例1]
図1に示す装置を用いて、ABS系樹脂板8の表面処理を行った。処理槽の仕様及び条件は次の通りである。
[Example 1]
The surface treatment of the ABS resin plate 8 was performed using the apparatus shown in FIG. The specifications and conditions of the treatment tank are as follows.
<処理槽>
処理槽2の容積:40L
ABS系樹脂板8の大きさ:500mm×500mm×厚さ5mm
<過硫酸溶液Sの性状と表面処理条件>
硫酸濃度:75重量%
過硫酸濃度:10g/L
処理温度:75℃
処理時間:15分
<過硫酸生成用電解セル6及び電解条件>
セル容積:0.5L
陽極及び陰極:ダイヤモンド電極(直径150mm)
バイポーラ電極材質:陽極、陰極と同じ
電流密度:50A/dm2
液循環量:2.5L/min
硫酸濃度:75重量%
過硫酸濃度:10g/L
処理温度:75℃
<Treatment tank>
Volume of treatment tank 2: 40L
ABS resin plate 8 size: 500 mm × 500 mm × thickness 5 mm
<Properties and surface treatment conditions of persulfuric acid solution S>
Sulfuric acid concentration: 75% by weight
Persulfuric acid concentration: 10 g / L
Processing temperature: 75 ° C
Treatment time: 15 minutes <
Cell volume: 0.5L
Anode and cathode: Diamond electrode (diameter 150mm)
Bipolar electrode material: Same as anode and cathode Current density: 50 A / dm 2
Liquid circulation rate: 2.5 L / min
Sulfuric acid concentration: 75% by weight
Persulfuric acid concentration: 10 g / L
Processing temperature: 75 ° C
まず、界面活性剤の入った湿潤処理槽に10分間ABS系樹脂板8を浸漬し、次に過硫酸溶液Sを満たした処理槽2内に10分間浸漬した後、処理槽2から取り出し、水道水で洗浄した後、活性化工程及び触媒付与工程を経て無電解ニッケルめっきを施した。その後最終的にはクロムめっきを施した。めっき工程の処理条件を表1及び表2に示す。そして、クロムめっきしたABS系樹脂板8のめっきの密着性を上記方法にて評価した。結果を電解硫酸処理条件とともに表3に示す。
First, the ABS resin plate 8 is immersed for 10 minutes in a wet processing tank containing a surfactant, and then immersed for 10 minutes in the
[実施例2〜7]
電解硫酸処理条件を表3に示すように種々設定を変更した以外は実施例1と同様にしてクロムめっきを施し、めっきの密着性を評価した。結果を電解硫酸処理条件とともに表3にあわせて示す。
[Examples 2 to 7]
Chromium plating was performed in the same manner as in Example 1 except that various settings of the electrolytic sulfuric acid treatment conditions were changed as shown in Table 3, and the adhesion of the plating was evaluated. The results are shown in Table 3 together with the electrolytic sulfuric acid treatment conditions.
[比較例1]
電解硫酸溶液の代わりに、硫酸濃度75重量%の硫酸溶液を用いた以外は実施例1と同様にしてクロムめっきを施し、めっきの密着性を評価した。結果を処理条件とともに表3にあわせて示す。
[Comparative Example 1]
Chromium plating was performed in the same manner as in Example 1 except that a sulfuric acid solution having a sulfuric acid concentration of 75% by weight was used instead of the electrolytic sulfuric acid solution, and the adhesion of the plating was evaluated. The results are shown in Table 3 together with the processing conditions.
[比較例2]
電解硫酸溶液の代わりに、硫酸と過酸化水素との混合溶液を用いた以外は実施例1と同様にしてクロムめっきを施し、めっきの密着性を評価した。結果を処理条件とともに表3にあわせて示す。
[Comparative Example 2]
Chromium plating was performed in the same manner as in Example 1 except that a mixed solution of sulfuric acid and hydrogen peroxide was used instead of the electrolytic sulfuric acid solution, and the adhesion of the plating was evaluated. The results are shown in Table 3 together with the processing conditions.
表3から明らかなとおり本発明のABS系樹脂の表面のめっき処理方法によると、優れためっき密着性が得られることがわかる。なお、比較例2のABS系樹脂の表面のめっき処理方法では、過酸化水素の消費により処理の長期安定性に問題があった。 As is apparent from Table 3, according to the plating treatment method for the surface of the ABS resin of the present invention, it can be seen that excellent plating adhesion can be obtained. In addition, in the plating method for the surface of the ABS resin of Comparative Example 2, there was a problem in the long-term stability of the treatment due to consumption of hydrogen peroxide.
1 処理装置
2 処理槽
3 恒温ヒータ
4 配管
5 循環ポンプ
6 電解セル
6A 陽極
6B 陰極
6C バイポーラ電極
7 配管
8 ABS系樹脂板
S 過硫酸溶液
DESCRIPTION OF SYMBOLS 1
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Citations (6)
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JPH01275769A (en) * | 1988-04-28 | 1989-11-06 | Nippon Ozon Kk | Pretreatment of stock before electroless plating |
JPH02277778A (en) * | 1989-04-19 | 1990-11-14 | Nisshinbo Ind Inc | Production of structure made of synthetic resin coated with metal |
WO2007122869A1 (en) * | 2006-04-18 | 2007-11-01 | Okuno Chemical Industries Co., Ltd. | Composition for etching treatment of resin molded article |
JP2010138434A (en) * | 2008-12-10 | 2010-06-24 | Okuno Chem Ind Co Ltd | Method for electrolytically treating etchant |
JP2012132066A (en) * | 2010-12-21 | 2012-07-12 | Chlorine Engineers Corp Ltd | Conductive diamond electrode, sulfuric acid electrolysis method and sulfuric acid electrolysis apparatus using the same |
JP2015518083A (en) * | 2012-01-23 | 2015-06-25 | マクダーミッド アキューメン インコーポレーテッド | Etching of plastic using acidic solution containing trivalent manganese |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH01275769A (en) * | 1988-04-28 | 1989-11-06 | Nippon Ozon Kk | Pretreatment of stock before electroless plating |
JPH02277778A (en) * | 1989-04-19 | 1990-11-14 | Nisshinbo Ind Inc | Production of structure made of synthetic resin coated with metal |
WO2007122869A1 (en) * | 2006-04-18 | 2007-11-01 | Okuno Chemical Industries Co., Ltd. | Composition for etching treatment of resin molded article |
JP2010138434A (en) * | 2008-12-10 | 2010-06-24 | Okuno Chem Ind Co Ltd | Method for electrolytically treating etchant |
JP2012132066A (en) * | 2010-12-21 | 2012-07-12 | Chlorine Engineers Corp Ltd | Conductive diamond electrode, sulfuric acid electrolysis method and sulfuric acid electrolysis apparatus using the same |
JP2015518083A (en) * | 2012-01-23 | 2015-06-25 | マクダーミッド アキューメン インコーポレーテッド | Etching of plastic using acidic solution containing trivalent manganese |
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