WO2019045047A1 - Plating pretreatment method for abs resin surface, plating treatment method for abs resin surface, and abs resin plated product - Google Patents

Plating pretreatment method for abs resin surface, plating treatment method for abs resin surface, and abs resin plated product Download PDF

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Publication number
WO2019045047A1
WO2019045047A1 PCT/JP2018/032342 JP2018032342W WO2019045047A1 WO 2019045047 A1 WO2019045047 A1 WO 2019045047A1 JP 2018032342 W JP2018032342 W JP 2018032342W WO 2019045047 A1 WO2019045047 A1 WO 2019045047A1
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Prior art keywords
plating
abs resin
abs
treatment
sulfuric acid
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PCT/JP2018/032342
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French (fr)
Japanese (ja)
Inventor
永井 達夫
裕都喜 山本
泰望 山本
康男 橋本
美代子 泉谷
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栗田工業株式会社
株式会社Jcu
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Application filed by 栗田工業株式会社, 株式会社Jcu filed Critical 栗田工業株式会社
Priority to US16/642,375 priority Critical patent/US20200190682A1/en
Priority to CN201880055459.8A priority patent/CN111032910A/en
Priority to EP18849843.0A priority patent/EP3677703A4/en
Publication of WO2019045047A1 publication Critical patent/WO2019045047A1/en

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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00Electrolytic production of inorganic compounds or non-metals
    • C25B1/01Products
    • C25B1/28Per-compounds
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/22Roughening, e.g. by etching
    • C23C18/24Roughening, e.g. by etching using acid aqueous solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C25B11/036Bipolar electrodes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/042Electrodes formed of a single material
    • C25B11/043Carbon, e.g. diamond or graphene
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00Operating or servicing cells
    • C25B15/08Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C25B15/081Supplying products to non-electrochemical reactors that are combined with the electrochemical cell, e.g. Sabatier reactor
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/70Assemblies comprising two or more cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/54Electroplating of non-metallic surfaces
    • C25D5/56Electroplating of non-metallic surfaces of plastics
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54Contact plating, i.e. electroless electrochemical plating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/08Deposition of black chromium, e.g. hexavalent chromium, CrVI
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt

Definitions

  • the present invention relates to a pretreatment method performed prior to plating of an ABS-based resin surface.
  • the present invention also relates to a plating treatment method of the surface of the ABS-based resin which has been subjected to this pretreatment.
  • the present invention relates to an ABS-based resin plated product obtained by plating the surface of the ABS-based resin subjected to the pretreatment.
  • plastics are being replaced by taking advantage of weight reduction, cost reduction, freedom of shape, ease of mass production, and the like. At present, it is widely used not only for decoration but also for exterior and interior parts of automobiles, home appliances, and the like. At that time, in order to improve the rigidity, the abrasion resistance, the weather resistance, the heat resistance and the like, the plastic surface is often plated.
  • plastic Since plastic is nonconductive, it is necessary to first form a metal film on the plastic to be a conductor in order to perform plating.
  • the methods can be broadly classified into dry methods such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and wet methods of electroless nickel plating. Since the dry method is mostly film formation in a vacuum state and is not suitable for mass production or application to large parts, the wet method has been adopted so far.
  • an ABS-based resin is widely used as a resin that is most easily plated and as a main plastic for metal substitution.
  • a surface roughening treatment with a chromic acid / sulfuric acid solution is performed for the surface roughening treatment as the plating pretreatment of the ABS resin.
  • Chromic acid is represented by the chemical formula: H 2 CrO 4
  • etching solution which is a mixed solution with concentrated sulfuric acid, 2CrO 4 2- + 2H 3 O + ⁇ Cr 2 O 7 2- + 3H 2 O
  • Cr's equilibrium exists Cr is in any case hexavalent.
  • hexavalent chromium is subject to the REACH regulations and the RoHS directive, it is not restricted by itself because hexavalent chromium does not remain in the product.
  • waste water containing Cr requires waste water treatment such as reduction, neutralization, coagulation sedimentation, etc., and the precipitate also contains Cr, so that it can not be easily discarded.
  • Patent Document 1 proposes etching with a mixed solution of permanganate and an inorganic salt. Further, Patent Document 2 and Patent Document 3 disclose a pretreatment method of electroless plating in which the surface of a plastic molded product is roughened using ozone-dissolved water.
  • the present invention has been made in view of the above problems, and is a plating pretreatment method for a chromium and manganese free ABS resin surface, which is capable of forming a plating sufficiently in contact with the ABS resin surface. It aims at providing the plating pretreatment method of the resin surface. Another object of the present invention is to provide a plating method which adheres well to the surface of an ABS resin to which such pretreatment method has been applied. Another object of the present invention is to provide an ABS-based resin plated product obtained by plating on the surface of the ABS-based resin which has been subjected to this pretreatment.
  • the present invention first provides a method for pre-plating a surface of an ABS-based resin, wherein the ABS-based resin is treated with a solution obtained by electrolyzing sulfuric acid (Invention 1).
  • an ABS-based resin refers not only to acrylonitrile-butadiene-styrene copolymer resin (ABS resin) alone, but also to a blend resin of this ABS resin and another resin, specifically an ABS resin.
  • ABS resin acrylonitrile-butadiene-styrene copolymer resin
  • PC resin polycarbonate
  • PC resin contains 20 to 70% by weight of PC / ABS mixed resin with respect to 100% by weight in total of ABS resin and PC resin.
  • the sulfuric acid concentration of the solution is preferably 60 to 87% by weight (Invention 2).
  • the specific surface area is increased by suitably roughening the surface of the ABS-based resin with a persulfuric acid solution obtained by electrolyzing sulfuric acid at this concentration, and the adhesion of plating is improved. it can. Then, by varying the concentration of sulfuric acid within the above range, the degree of treatment of the surface of the ABS-based resin can be adjusted.
  • the temperature of the treatment is preferably 50 to 80 ° C. (Invention 3).
  • the specific surface area can be increased by appropriately roughening the surface of the ABS-based resin while suppressing the decomposition of the persulfuric acid, and the adhesion of the plating can be further improved.
  • the persulfate concentration of the solution is preferably 3 g / L or more (Invention 4).
  • the specific surface area can be increased by suitably roughening the surface of the ABS-based resin by the strong oxidizing action of persulfuric acid, and the adhesion of plating can be further improved.
  • the butadiene component on the surface of the ABS-based resin is dissolved by the strong oxidizing action of the persulfuric acid generated by electrolyzing sulfuric acid to roughen the surface and at the same time the hydrophilic functional group is exposed. Since plating is performed on the ABS resin after this treatment, plating of chromium or the like with good adhesion can be deposited on the surface of the ABS resin.
  • the present invention thirdly provides an ABS-based resin plated product (invention 6), which is plated by the plating method of the surface of the ABS-based resin described in the above invention (Invention 5).
  • invention 6 it is an ABS resin-plated product in which the surface of the ABS resin is plated with chromium or the like with good adhesion.
  • the butadiene component on the surface of ABS resin is dissolved by the strong oxidizing action of the persulfuric acid generated by electrolyzing sulfuric acid, thereby roughening the surface. Since the surface area is increased and the hydrophilic functional group is exposed, plating can be performed on the ABS-based resin after this treatment to obtain sufficiently close plating.
  • FIG. 1 shows a processing apparatus to which a plating pretreatment method for an ABS-based resin surface according to an embodiment of the present invention can be applied.
  • the processing apparatus 1 includes an electrolytic cell 6 continuous from a processing tank 2 provided with a constant temperature heater 3 on the outer periphery thereof, a pipe 4 provided with a circulating pump 5, and a pipe supplying the processing cell 2 from the electrolytic cell 6.
  • the electrolysis cell 6 is provided with an anode 6A and a cathode 6B formed of diamond electrodes, and a bipolar electrode 6C disposed between the two.
  • the processing tank 2 and the electrolytic cell 6 are filled with sulfuric acid having a predetermined concentration in the initial state, and a predetermined current is supplied to the anode 6A and the cathode 6B from the DC power supply unit.
  • a sulfuric acid solution (hereinafter referred to as a persulfuric acid solution in the present specification) S containing persulfuric acid (oxidizing agent) such as peroxodisulfuric acid is produced by electrolyzing sulfuric acid, and the persulfuric acid solution S is It can be supplied to the processing tank 2 via 7.
  • the persulfuric acid solution S is configured to be circulated by circulating the persulfuric acid solution S from the treatment tank 2 to the electrolytic cell 6 by the circulation pump 5 via the pipe 4. And in the processing tank 2, the ABS-type resin board 8 which is a process target is suspended by the up-down direction.
  • the persulfuric acid solution S preferably has a sulfuric acid concentration of 60 to 87% by weight, particularly 70 to 83% by weight. If the concentration of sulfuric acid is less than 60% by weight, the concentration of sulfuric acid in the obtained persulfuric acid solution S is too thin to roughen the surface of the ABS-based resin plate 8 sufficiently, thereby improving the adhesion of plating. However, even if it exceeds 87% by weight, no further improvement of the effect can not be obtained, and the handleability is unfavorably deteriorated.
  • the constant temperature heater 3 it is preferable to heat by the constant temperature heater 3 so that the temperature of the persulfuric acid solution S becomes 50 to 80.degree.
  • the temperature of the persulfuric acid solution S is less than 50 ° C., the surface of the ABS-based resin plate 8 can not be roughened sufficiently, and while the effect of improving the adhesion of plating can not be sufficiently obtained, 80 ° C.
  • it exceeds decomposition of persulfate is promoted and processing efficiency is reduced.
  • the electrolysis of sulfuric acid in the electrolytic cell 6 may be performed under conditions such that the concentration of persulfuric acid such as peroxodisulfuric acid generated by the electrolysis is 3 g / L or more, particularly 3 to 20 g / L. If the persulfate concentration is less than 3 g / L, sufficient improvement in the adhesion of the plating can not be obtained. If the concentration is more than 20 g / L, the above effect can not be improved and it is not economical.
  • the surface of the ABS resin sheet 8 is treated by immersing the degreased ABS resin sheet 8 in the processing tank 2.
  • the ABS resin plate 8 is preferably subjected to a wet treatment in advance.
  • neutralization / reduction treatment, conditioner treatment, etc. may be performed if necessary.
  • the surface of the ABS resin plate 8 can be etched by the pretreatment method of the present embodiment described above. And the plating pre-processing method of this embodiment can apply the plating method to conventionally well-known resin, such as an electroless plating method and direct plating method, after that.
  • a catalyst is applied to the ABS resin plate 8 treated by the pretreatment method of the present embodiment using a catalyst application treatment solution.
  • the treatment liquid for applying a catalyst is not particularly limited as long as it is generally used for applying a catalyst in a plating step, but one containing a noble metal is preferable, one containing palladium is more preferable, and a mixed palladium / tin catalyst solution is particularly preferable.
  • the temperature of the catalyst application treatment solution is preferably 10 to 60 ° C., particularly 20 to 50 ° C.
  • the ABS resin plate 8 is used for 1 to 20 minutes, preferably 2 to 20 minutes. It may be treated by immersion for 5 minutes.
  • the resin surface to which the catalyst has been applied in this manner is then metallized on the resin surface by metal plating such as electroless plating and electroplating (direct plating).
  • the catalyst When electroless plating is used to metallize the resin surface, the catalyst may be applied with a catalyst application treatment solution and then treated with an activation treatment solution containing hydrochloric acid or sulfuric acid.
  • the concentration of hydrochloric acid or sulfuric acid in this activation treatment solution is 0.5 mol / L or more, preferably 1 to 4 mol / L.
  • the liquid temperature of the activation treatment liquid is preferably set to 0 to 60 ° C., particularly 30 to 45 ° C., and the ABS resin plate 8 is preferably 1 to 20 here. Immersion treatment may be carried out for a minute, especially for 2 to 5 minutes.
  • electroless plating is performed on the ABS-based resin plate 8 to which the catalyst has been applied and activated as described above.
  • the electroless plating treatment can be carried out according to a conventional method using electroless plating such as known electroless nickel plating solution, electroless copper plating solution, electroless cobalt plating solution and the like.
  • electroless plating such as known electroless nickel plating solution, electroless copper plating solution, electroless cobalt plating solution and the like.
  • the ABS resin plate 8 is immersed in the electroless nickel plating solution with a pH of 8 to 10 and a temperature of 30 to 50 ° C. for 5 to 15 minutes. You may do it.
  • the liquid temperature of the activation treatment liquid is preferably set to 0 to 60 ° C., particularly 30 to 50 ° C., and the ABS resin plate 8 is preferably used here for 1 to 20 minutes. In particular, it may be treated by immersion for 2 to 50 minutes.
  • the ABS resin plate 8 subjected to the catalyst application and activation treatment as described above is subsequently immersed in a general-purpose copper electroplating bath such as a copper sulfate bath under ordinary conditions, for example, 1 to 5 A / dm. 2 may be treated for 2 to 10 minutes. By the way, it is decided to carry out sufficient water washing and hot water washing between each process so far.
  • a general-purpose copper electroplating bath such as a copper sulfate bath under ordinary conditions, for example, 1 to 5 A / dm. 2 may be treated for 2 to 10 minutes.
  • the surface of the ABS resin plate 8 is plated with metal such as electroless plating or electroplating, and the surface of the metallized ABS resin plate 8 is further subjected to various kinds of electric copper plating or electricity as required. It is also possible to apply nickel plating or electrochromic plating.
  • the metal plating should just be able to obtain a film as plating, and examples thereof include nickel, copper, chromium, cobalt
  • Such treatment may be continuously performed while replacing the ABS resin plate 8, but the persulfuric acid of the persulfuric acid solution S in the processing tank 2 is decomposed with the processing, and the persulfuric acid concentration is reduced. It is desirable to continuously drive the pump 5 to continuously replenish the processing tank 2 with fresh persulfate solution S from the electrolytic cell 6 through the pipe 7. Further, when the concentration of sulfuric acid decreases, the processing tank 2 may be appropriately supplemented with sulfuric acid, and when the concentration of sulfuric acid increases, the processing tank 2 may be appropriately supplemented with water.
  • a sulfuric acid concentration system can be installed in the processing tank 2 and this operation can be performed automatically.
  • This treatment may be performed, for example, by sufficiently immersing the ABS resin plate 8 in a wet treatment tank to impart wettability to the surface of the resin substrate.
  • the wetting treatment tank may contain a surfactant.
  • the surfactant is not particularly limited.
  • an amine salt surfactant for example, an amine salt surfactant, a quaternary amine salt surfactant, an amino acid surfactant, a betaine surfactant, a carboxylate surfactant, Sulfonate surfactants, sulfate ester surfactants, phosphate surfactants, ether surfactants, ester surfactants, nitrogen-containing surfactants, fluorine-containing surfactants, etc.
  • These surfactants can be used alone or in combination of two or more.
  • Electroless plating or electroplating can be applied to the ABS-based resin plate 8 thus pretreated by a conventional method. As a result, it is possible to obtain an ABS-based resin plated product in which the surface of the ABS-based resin plate 8 is plated with chromium or the like having good adhesion.
  • the present invention is not limited to the above-mentioned example, and various modification implementation is possible.
  • it is applicable not only to batch processing like this embodiment but to continuous processing.
  • the ABS-based resin plate is applicable not only to the plate as in the present embodiment but also to molded articles of various shapes.
  • ⁇ Plating adhesion test> the adhesion is examined by thermal shock of heating and quenching the sample, and peeling of the plated surface is performed after 70 cycles and -30 ° C, that is, a temperature difference of 100 ° C is maintained for 1 hour for 40 cycles. The situation such as the presence or absence of a crack, swelling, etc. is observed and it evaluates in three steps from the following classification 1-3.
  • Category 2 Peeling, cracks, wrinkles and blisters of less than 25% of the sample area.
  • Category 3 Plating peeling, cracks, wrinkles, and blisters 25% or more of the sample area.
  • Example 1 The surface treatment of the ABS resin plate 8 was performed using the apparatus shown in FIG.
  • the specifications and conditions of the treatment tank are as follows.
  • the ABS resin plate 8 is immersed for 10 minutes in a wetting treatment tank containing a surfactant, and then immersed for 10 minutes in the treatment tank 2 filled with the persulfuric acid solution S, and then removed from the treatment tank 2 After washing with water, electroless nickel plating was applied through an activation step and a catalyst application step. Thereafter, chromium plating was finally performed.
  • the processing conditions of the plating step are shown in Tables 1 and 2. Then, the adhesion of the plating of the chromium-plated ABS-based resin plate 8 was evaluated by the above method. The results are shown in Table 3 together with electrolytic sulfuric acid treatment conditions.
  • Examples 2 to 7 Chromium plating was performed in the same manner as in Example 1 except that various settings were changed as shown in Table 3 for electrolytic sulfuric acid treatment conditions, and the adhesion of the plating was evaluated. The results are shown in Table 3 together with electrolytic sulfuric acid treatment conditions.
  • Example 1 Chromium plating was performed in the same manner as in Example 1 except that a sulfuric acid solution having a sulfuric acid concentration of 75% by weight was used instead of the electrolytic sulfuric acid solution, and the adhesion of the plating was evaluated. The results are shown in Table 3 together with the processing conditions.
  • Comparative Example 2 Chrome plating was performed in the same manner as in Example 1 except that a mixed solution of sulfuric acid and hydrogen peroxide was used instead of the electrolytic sulfuric acid solution, and the adhesion of the plating was evaluated. The results are shown in Table 3 together with the processing conditions.
  • processing apparatus processing tank 3 constant temperature heater 4 piping 5 circulation pump 6 electrolysis cell 6A anode 6B cathode 6C bipolar electrode 7 piping 8 ABS resin plate S persulfate solution

Abstract

A treatment device 1 has: a treatment tank 2 provided with a constant temperature heater 3 on the outer periphery; an electrolytic cell 6 continuing from a pipe 4 provided with a circulation pump 5; and a pipe 7 for supply to the treatment tank 2 from the electrolytic cell 6. Within the electrolytic cell 6 are provided a positive electrode 6A and a negative electrode 6B formed from diamond electrodes and a bipolar electrode 6C disposed between the two. The treatment tank 2 and the electrolytic cell 6 are filled with a prescribed concentration of sulfuric acid. The treatment device is configured such that a persulfate solution S such as peroxydisulfuric acid is generated by electrolysis of the sulfuric acid by making a prescribed current flow from a direct current power supply unit to the positive electrode 6A and the negative electrode 6B, and this persulfate solution S can be supplied to the treatment tank 2 via the pipe 7. A plating pretreatment method for Cr and Mn-free ABS resin surfaces that can form plating sufficiently adhering to an ABS resin surface can be applied to this treatment device 1.

Description

ABS系樹脂表面のめっき前処理方法、ABS系樹脂表面のめっき処理方法、及びABS系樹脂めっき製品Pre-plating treatment method for ABS resin surface, plating method for ABS resin surface, and ABS resin-plated product
 本発明は、ABS系樹脂表面のめっき処理に先立って行われる前処理方法に関する。また、本発明はこの前処理を行ったABS系樹脂表面のめっき処理方法に関する。さらに本発明は、この前処理を行ったABS系樹脂表面にめっき処理して得られるABS系樹脂めっき製品に関する。 The present invention relates to a pretreatment method performed prior to plating of an ABS-based resin surface. The present invention also relates to a plating treatment method of the surface of the ABS-based resin which has been subjected to this pretreatment. Furthermore, the present invention relates to an ABS-based resin plated product obtained by plating the surface of the ABS-based resin subjected to the pretreatment.
 構造材料や部品材料として金属が用いられている部位において、軽量化、低コスト化、形状の自由さ、大量生産の容易さ等のメリットを生かし、プラスチックが代替されている。現在では、装飾用のみならず、自動車の外装や内装部品、家電製品等に広く使用されている。その際、剛性、耐摩耗性、耐候性、耐熱性等を向上させるため、プラスチック表面にめっきを施すことが多い。 In areas where metal is used as a structural material or component material, plastics are being replaced by taking advantage of weight reduction, cost reduction, freedom of shape, ease of mass production, and the like. At present, it is widely used not only for decoration but also for exterior and interior parts of automobiles, home appliances, and the like. At that time, in order to improve the rigidity, the abrasion resistance, the weather resistance, the heat resistance and the like, the plastic surface is often plated.
 プラスチックは非導電性のため、めっきを施すにはまず導体となる金属皮膜をプラスチック上に形成する必要がある。その方法を大きく分類すると、CVD(化学気相蒸着)、PVD(物理気相蒸着)といった乾式法、無電解ニッケルめっきの湿式法がある。乾式法は真空状態での成膜がほとんどで、大量生産や大型部品への適用に向かないことから、湿式法がこれまで採用されてきた。 Since plastic is nonconductive, it is necessary to first form a metal film on the plastic to be a conductor in order to perform plating. The methods can be broadly classified into dry methods such as chemical vapor deposition (CVD), physical vapor deposition (PVD), and wet methods of electroless nickel plating. Since the dry method is mostly film formation in a vacuum state and is not suitable for mass production or application to large parts, the wet method has been adopted so far.
 このようなプラスチック成形品のうちABS系樹脂は最もめっきしやすい樹脂として、金属代替の主プラスチックとして広く用いられている。このABS系樹脂のめっき前処理としての粗面化処理に、クロム酸・硫酸溶液による粗面化処理が行われている。クロム酸は化学式:HCrOで表され、濃硫酸との混合液であるエッチング液中では
  2CrO 2-+2H→Cr 2-+3H
の平衡が存在するものの、Crはいずれにせよ6価である。6価クロムはREACH規制及びRoHS指令の対象ではあるものの、製品内に6価クロムが残留するわけでないので、それ自体が規制を受けるわけではない。しかしながら、近年環境問題への関心が強くなり、6価クロムを使用しない環境調和型技術が強く要望されている。また、Crを含む排水は、還元、中和、凝集沈殿等の排水処理が必要となる上に、沈殿物もCrを含むために容易には廃棄できないという問題点があった。
Among such plastic molded products, an ABS-based resin is widely used as a resin that is most easily plated and as a main plastic for metal substitution. A surface roughening treatment with a chromic acid / sulfuric acid solution is performed for the surface roughening treatment as the plating pretreatment of the ABS resin. Chromic acid is represented by the chemical formula: H 2 CrO 4 , and in the etching solution which is a mixed solution with concentrated sulfuric acid, 2CrO 4 2- + 2H 3 O + → Cr 2 O 7 2- + 3H 2 O
Although Cr's equilibrium exists, Cr is in any case hexavalent. Although hexavalent chromium is subject to the REACH regulations and the RoHS directive, it is not restricted by itself because hexavalent chromium does not remain in the product. However, in recent years there has been a growing interest in environmental issues and there is a strong demand for environmentally friendly technologies that do not use hexavalent chromium. In addition, waste water containing Cr requires waste water treatment such as reduction, neutralization, coagulation sedimentation, etc., and the precipitate also contains Cr, so that it can not be easily discarded.
 そこで、クロム酸に代わる環境調和型技術として、特許文献1には、過マンガン酸塩及び無機塩の混合液でエッチングすることが提案されている。また、特許文献2及び特許文献3には、オゾン溶解水を用いてプラスチック成形品の表面を粗化する無電解めっきの前処理方法が開示されている。 Therefore, as an environment-friendly technology that replaces chromic acid, Patent Document 1 proposes etching with a mixed solution of permanganate and an inorganic salt. Further, Patent Document 2 and Patent Document 3 disclose a pretreatment method of electroless plating in which the surface of a plastic molded product is roughened using ozone-dissolved water.
特開2008-31513号公報JP 2008-31513A 特開2002-121678号公報JP 2002-121678 A 特開2012-52214号公報JP 2012-52214 A
 しかし、特許文献1に記載の過マンガン酸塩及び無機塩の混合液でエッチングする方法では、ABS系樹脂の表面処理は難しく、金属との密着性が良くない、という問題点がある。さらに、マンガン(Mn)も将来的にはCrと同様にREACH規制及びRoHS指令の対象になると言われており、使用しないのが望ましい。また、特許文献2及び特許文献3に記載されたプラスチック表面のめっき前処理方法では、オゾンは分解速度が速いので、高濃度のオゾン水を製造し、かつ高濃度を維持しなければならないため、大掛かりな設備が必要となるだけでなく、局所的なオゾン濃度の差により処理にムラが生じやすい、という問題点がある。 However, in the method of etching with a mixed solution of permanganate and inorganic salt described in Patent Document 1, there is a problem that surface treatment of ABS resin is difficult and adhesion with metal is not good. Furthermore, manganese (Mn) is also said to be subject to the REACH regulation and the RoHS directive in the same manner as Cr in the future, and it is desirable not to use it. In addition, in the method for pre-plating a plastic surface described in Patent Document 2 and Patent Document 3, since ozone has a high decomposition rate, high concentration ozone water must be produced and high concentration maintained. Not only large-scale equipment is required, but there is also a problem that unevenness in processing is likely to occur due to local differences in ozone concentration.
 本発明は上記課題に鑑みてなされたものであり、クロム及びマンガンフリーのABS系樹脂表面のめっき前処理方法であって、ABS系樹脂表面に十分に密着しためっきを形成することができるABS系樹脂表面のめっき前処理方法を提供することを目的とする。また、本発明はかかる前処理方法を施したABS系樹脂表面に良好に密着しためっき処理方法を提供することを目的とする。さらに本発明は、この前処理を行ったABS系樹脂表面にめっき処理して得られるABS系樹脂めっき製品を提供することを目的とする。 The present invention has been made in view of the above problems, and is a plating pretreatment method for a chromium and manganese free ABS resin surface, which is capable of forming a plating sufficiently in contact with the ABS resin surface. It aims at providing the plating pretreatment method of the resin surface. Another object of the present invention is to provide a plating method which adheres well to the surface of an ABS resin to which such pretreatment method has been applied. Another object of the present invention is to provide an ABS-based resin plated product obtained by plating on the surface of the ABS-based resin which has been subjected to this pretreatment.
 上記目的を達成するために本発明は第一に、ABS系樹脂を硫酸を電気分解した溶液で処理する、ABS系樹脂表面のめっき前処理方法を提供する(発明1)。 In order to achieve the above object, the present invention first provides a method for pre-plating a surface of an ABS-based resin, wherein the ABS-based resin is treated with a solution obtained by electrolyzing sulfuric acid (Invention 1).
 かかる発明(発明1)によれば、硫酸を電気分解して生じる過硫酸の強い酸化作用によりABS系樹脂表面のブタジエン成分を溶解させて、表面を粗面化することで比表面積が増大するとともに親水性の官能基が露出するので、この処理後のABS系樹脂にめっき処理を施すことにより十分に密着しためっきを得ることができる。なお、本明細書中において、ABS系樹脂とは、アクリロニトリル・ブタジエン・スチレン共重合樹脂(ABS樹脂)単独の場合のみならず、このABS樹脂と他の樹脂のブレンド樹脂、具体的にはABS樹脂とポリカーボネート(PC樹脂)との混合樹脂を含むものとする。特にABS樹脂とPC樹脂との合計100重量%に対して、PC樹脂が20~70重量%のPC/ABS混合樹脂をも含むものとする。 According to this invention (Invention 1), the butadiene component of the surface of the ABS resin is dissolved by the strong oxidizing action of the persulfuric acid generated by electrolyzing sulfuric acid to roughen the surface, and the specific surface area is increased. Since the hydrophilic functional group is exposed, plating can be performed on the ABS-based resin after this treatment to obtain sufficiently close plating. In the present specification, an ABS-based resin refers not only to acrylonitrile-butadiene-styrene copolymer resin (ABS resin) alone, but also to a blend resin of this ABS resin and another resin, specifically an ABS resin. And polycarbonate (PC resin) mixed resin. In particular, PC resin contains 20 to 70% by weight of PC / ABS mixed resin with respect to 100% by weight in total of ABS resin and PC resin.
 上記発明(発明1)においては、前記溶液の硫酸濃度が60~87重量%であることが好ましい(発明2)。 In the above invention (Invention 1), the sulfuric acid concentration of the solution is preferably 60 to 87% by weight (Invention 2).
 かかる発明(発明2)によれば、この濃度の硫酸を電気分解した過硫酸溶液によってABS系樹脂表面を好適に粗面化することで比表面積が増大し、めっきの密着性を向上させることができる。そして、硫酸濃度を上記範囲で変動させることで、ABS系樹脂表面の処理の度合いを調整することができる。 According to this invention (Invention 2), the specific surface area is increased by suitably roughening the surface of the ABS-based resin with a persulfuric acid solution obtained by electrolyzing sulfuric acid at this concentration, and the adhesion of plating is improved. it can. Then, by varying the concentration of sulfuric acid within the above range, the degree of treatment of the surface of the ABS-based resin can be adjusted.
 上記発明(発明1,2)においては、前記処理の温度が50~80℃であることが好ましい(発明3)。 In the above inventions (Inventions 1 and 2), the temperature of the treatment is preferably 50 to 80 ° C. (Invention 3).
 かかる発明(発明3)によれば、過硫酸の分解を抑制しつつABS系樹脂表面を好適に粗面化することで比表面積が増大し、めっきの密着性をより向上させることができる。 According to this invention (Invention 3), the specific surface area can be increased by appropriately roughening the surface of the ABS-based resin while suppressing the decomposition of the persulfuric acid, and the adhesion of the plating can be further improved.
 上記発明(発明1~3)においては、前記溶液の過硫酸濃度が3g/L以上であることが好ましい(発明4)。 In the above inventions (Inventions 1 to 3), the persulfate concentration of the solution is preferably 3 g / L or more (Invention 4).
 かかる発明(発明4)によれば、過硫酸の強い酸化作用によりABS系樹脂表面を好適に粗面化することで比表面積が増大し、めっきの密着性をさらに向上させることができる。 According to this invention (Invention 4), the specific surface area can be increased by suitably roughening the surface of the ABS-based resin by the strong oxidizing action of persulfuric acid, and the adhesion of plating can be further improved.
 また、本発明は第二に、上記発明(発明1~4)のいずれかに記載のABS系樹脂表面のめっき前処理方法により処理した後、該ABS系樹脂表面に無電解めっき又は電気めっきを施す、ABS系樹脂表面のめっき処理方法を提供する(発明5)。 Second, according to the present invention, after the plating pretreatment method of the ABS resin surface according to any of the above inventions (Inventions 1 to 4), electroless plating or electroplating is performed on the ABS resin surface. The plating method for ABS resin surface is provided (Invention 5).
 かかる発明(発明5)によれば、硫酸を電気分解して生じる過硫酸の強い酸化作用によりABS系樹脂表面のブタジエン成分を溶解させて、表面を粗面化するとともに親水性の官能基が露出するので、この処理後のABS系樹脂にめっき処理を施すことによりABS系樹脂の表面に密着性の良いクロム等のめっきを析出させることができる。 According to this invention (Invention 5), the butadiene component on the surface of the ABS-based resin is dissolved by the strong oxidizing action of the persulfuric acid generated by electrolyzing sulfuric acid to roughen the surface and at the same time the hydrophilic functional group is exposed. Since plating is performed on the ABS resin after this treatment, plating of chromium or the like with good adhesion can be deposited on the surface of the ABS resin.
 さらに本発明は第三に、上記発明(発明5)に記載のABS系樹脂表面のめっき処理方法によりめっき処理を施した、ABS系樹脂めっき製品を提供する(発明6)。 Furthermore, the present invention thirdly provides an ABS-based resin plated product (invention 6), which is plated by the plating method of the surface of the ABS-based resin described in the above invention (Invention 5).
 かかる発明(発明6)によれば、ABS系樹脂の表面に密着性の良いクロム等のめっきを施されたABS系樹脂めっき製品となっている。 According to this invention (invention 6), it is an ABS resin-plated product in which the surface of the ABS resin is plated with chromium or the like with good adhesion.
 本発明のABS系樹脂表面のめっき処理方法によれば、硫酸を電気分解して生じる過硫酸の強い酸化作用によりABS系樹脂表面のブタジエン成分を溶解させて、表面を粗面化することで比表面積が増大するとともに親水性の官能基が露出するので、この処理後のABS系樹脂にめっき処理を施すことにより十分に密着しためっきを得ることができる。 According to the plating method of the present invention on the surface of ABS resin, the butadiene component on the surface of ABS resin is dissolved by the strong oxidizing action of the persulfuric acid generated by electrolyzing sulfuric acid, thereby roughening the surface. Since the surface area is increased and the hydrophilic functional group is exposed, plating can be performed on the ABS-based resin after this treatment to obtain sufficiently close plating.
本発明の一実施形態によるABS系樹脂表面のめっき前処理方法を適用可能な処理装置の構成を示す概略図である。It is the schematic which shows the structure of the processing apparatus which can apply the pre-plating processing method of the ABS-type resin surface by one Embodiment of this invention.
 図1は本発明の一実施形態によるABS系樹脂表面のめっき前処理方法を適用可能な処理装置を示している。図1において処理装置1は、外周に恒温ヒータ3が設けられた処理槽2と、循環ポンプ5を備えた配管4から連続する電解セル6と、この電解セル6から処理槽2に供給する配管7とを有する。この電解セル6内には、ダイヤモンド電極よりなる陽極6A及び陰極6Bと、両者間に配置されたバイポーラ電極6Cとを備える。なお、処理槽2内には、必要に応じて槽内を攪拌するための散気管などの攪拌手段を設けても良い。 FIG. 1 shows a processing apparatus to which a plating pretreatment method for an ABS-based resin surface according to an embodiment of the present invention can be applied. In FIG. 1, the processing apparatus 1 includes an electrolytic cell 6 continuous from a processing tank 2 provided with a constant temperature heater 3 on the outer periphery thereof, a pipe 4 provided with a circulating pump 5, and a pipe supplying the processing cell 2 from the electrolytic cell 6. And 7. The electrolysis cell 6 is provided with an anode 6A and a cathode 6B formed of diamond electrodes, and a bipolar electrode 6C disposed between the two. In addition, in the processing tank 2, you may provide stirring means, such as an aeration pipe for stirring the inside of a tank as needed.
 このような処理装置1において、処理槽2及び電解セル6には、初期状態において所定の濃度の硫酸が充填されていて、陽極6A及び陰極6Bに直流電源ユニットから所定の電流を通電して、硫酸を電気分解することにより、ペルオキソ二硫酸等の過硫酸(酸化剤)を含む硫酸溶液(以下、本明細書中では過硫酸溶液とする)Sを生成して、この過硫酸溶液Sを配管7を経由して処理槽2に供給可能となっている。この過硫酸溶液Sは処理槽2から配管4を経由して循環ポンプ5により電解セル6に還流することで、過硫酸溶液Sが循環するように構成されている。そして、処理槽2内には、被処理対象であるABS系樹脂板8が上下方向に吊設されている。 In such a processing apparatus 1, the processing tank 2 and the electrolytic cell 6 are filled with sulfuric acid having a predetermined concentration in the initial state, and a predetermined current is supplied to the anode 6A and the cathode 6B from the DC power supply unit. A sulfuric acid solution (hereinafter referred to as a persulfuric acid solution in the present specification) S containing persulfuric acid (oxidizing agent) such as peroxodisulfuric acid is produced by electrolyzing sulfuric acid, and the persulfuric acid solution S is It can be supplied to the processing tank 2 via 7. The persulfuric acid solution S is configured to be circulated by circulating the persulfuric acid solution S from the treatment tank 2 to the electrolytic cell 6 by the circulation pump 5 via the pipe 4. And in the processing tank 2, the ABS-type resin board 8 which is a process target is suspended by the up-down direction.
 この過硫酸溶液Sは、硫酸濃度が60~87重量%、特に70~83重量%であることが好ましい。硫酸濃度が60重量%未満では、得られる過硫酸溶液Sの硫酸濃度が薄すぎて、ABS系樹脂板8の表面を十分に粗面化することができず、もってめっきの密着性を向上効果が十分に得られない一方、87重量%を超えても、それ以上の効果の向上が得られないばかりか、取扱い性が悪くなるため好ましくない。 The persulfuric acid solution S preferably has a sulfuric acid concentration of 60 to 87% by weight, particularly 70 to 83% by weight. If the concentration of sulfuric acid is less than 60% by weight, the concentration of sulfuric acid in the obtained persulfuric acid solution S is too thin to roughen the surface of the ABS-based resin plate 8 sufficiently, thereby improving the adhesion of plating. However, even if it exceeds 87% by weight, no further improvement of the effect can not be obtained, and the handleability is unfavorably deteriorated.
 次に上述したような処理装置1を用いたABS系樹脂表面のめっき前処理方法について説明する。まず、処理槽2に硫酸を入れて恒温ヒータ3により加熱したら、循環ポンプ5により電解セル6に供給し、直流電源ユニットから所定の電流を通電して、硫酸を電気分解することにより、ペルオキソ二硫酸等の過硫酸溶液Sを生成し、この過硫酸溶液Sを配管7を経由して処理槽2に供給して循環する。 Next, a plating pretreatment method of the ABS resin surface using the processing apparatus 1 as described above will be described. First, when sulfuric acid is put in the treatment tank 2 and heated by the constant temperature heater 3, it is supplied to the electrolytic cell 6 by the circulation pump 5 and supplied with a predetermined current from the DC power supply unit to electrolyze sulfuric acid. A persulfuric acid solution S such as sulfuric acid is generated, and the persulfuric acid solution S is supplied to the treatment tank 2 via the pipe 7 and circulated.
 このとき過硫酸溶液Sの温度が50~80℃となるように恒温ヒータ3により加熱することが好ましい。過硫酸溶液Sの温度が50℃未満では、ABS系樹脂板8の表面を十分に粗面化することができず、もってめっきの密着性の向上効果が十分に得られない一方、80℃を超えると、過硫酸の分解が促進して処理効率が低下する。 At this time, it is preferable to heat by the constant temperature heater 3 so that the temperature of the persulfuric acid solution S becomes 50 to 80.degree. When the temperature of the persulfuric acid solution S is less than 50 ° C., the surface of the ABS-based resin plate 8 can not be roughened sufficiently, and while the effect of improving the adhesion of plating can not be sufficiently obtained, 80 ° C. When it exceeds, decomposition of persulfate is promoted and processing efficiency is reduced.
 また、電解セル6における硫酸の電気分解は、電気分解により生成するペルオキソ二硫酸等の過硫酸の濃度が3g/L以上、特に3~20g/Lとなる条件とすればよい。過硫酸濃度が3g/L未満では十分なめっきの密着性の向上効果が得られない一方、20g/Lを超えても上記効果の向上が得られないばかりか経済的でない。 The electrolysis of sulfuric acid in the electrolytic cell 6 may be performed under conditions such that the concentration of persulfuric acid such as peroxodisulfuric acid generated by the electrolysis is 3 g / L or more, particularly 3 to 20 g / L. If the persulfate concentration is less than 3 g / L, sufficient improvement in the adhesion of the plating can not be obtained. If the concentration is more than 20 g / L, the above effect can not be improved and it is not economical.
 処理槽2内の過硫酸溶液Sが上述した温度及び過硫酸濃度になったら、脱脂したABS系樹脂板8を処理槽2に浸漬することによりABS系樹脂板8の表面を処理する。このとき過硫酸溶液Sに浸漬する際に付着する気泡を抑えるため、ABS系樹脂板8にはあらかじめ湿潤処理を施しておくのが好ましい。 When the persulfuric acid solution S in the processing tank 2 reaches the above-described temperature and persulfuric acid concentration, the surface of the ABS resin sheet 8 is treated by immersing the degreased ABS resin sheet 8 in the processing tank 2. At this time, in order to suppress air bubbles attached when immersed in the persulfuric acid solution S, the ABS resin plate 8 is preferably subjected to a wet treatment in advance.
 このABS系樹脂板8を処理槽2内の過硫酸溶液Sに5~20分間浸漬することにより、ABS系樹脂板8の表面には親水性の官能基が露出する。これにより、ABS系樹脂のヒドロキシル基、カルボニル基、アルデヒド基及びカルボキシル基がABS系樹脂表面に現れる。これらにより、その後のめっき処理においてめっきの密着性を向上させることができる。 By immersing the ABS-based resin plate 8 in the persulfuric acid solution S in the processing tank 2 for 5 to 20 minutes, hydrophilic functional groups are exposed on the surface of the ABS-based resin plate 8. Thereby, the hydroxyl group, the carbonyl group, the aldehyde group and the carboxyl group of the ABS resin appear on the surface of the ABS resin. By these, the adhesiveness of plating can be improved in subsequent plating processes.
 上記工程でABS系樹脂板8樹脂表面に発現した官能基を活性化させた後には、必要により中和・還元処理、コンディショナー処理等を行ってもよい。 After activating the functional group expressed on the resin surface of the ABS-based resin plate 8 in the above process, neutralization / reduction treatment, conditioner treatment, etc. may be performed if necessary.
 以上説明した本実施形態の前処理方法により、ABS系樹脂板8表面をエッチングすることができる。そして、本実施形態のめっき前処理方法は、その後は、無電解めっき法、ダイレクトめっき法などの従来公知の樹脂へのめっき方法を適用することができる。 The surface of the ABS resin plate 8 can be etched by the pretreatment method of the present embodiment described above. And the plating pre-processing method of this embodiment can apply the plating method to conventionally well-known resin, such as an electroless plating method and direct plating method, after that.
 例えば、本実施形態の前処理方法で処理したABS系樹脂板8に対し、触媒付与処理液にて触媒を付与する。この触媒付与処理液は、一般にめっき工程の触媒付与に用いられるものであれば特に制限されないが、貴金属を含むものが好ましく、パラジウムを含むものがより好ましく、特にパラジウム/すず混合コロイド触媒溶液が好ましい。これら触媒を樹脂表面に付与するには、触媒付与処理液の液温を好ましくは10~60℃、特に20~50℃とし、ここにABS系樹脂板8を1~20分間、好ましくは2~5分間浸漬させ処理すればよい。このようにして触媒が付与された樹脂表面は、次に、無電解めっきや電気めっき(ダイレクトプレーティング)等の金属めっき処理により、樹脂表面の金属化を行う。 For example, a catalyst is applied to the ABS resin plate 8 treated by the pretreatment method of the present embodiment using a catalyst application treatment solution. The treatment liquid for applying a catalyst is not particularly limited as long as it is generally used for applying a catalyst in a plating step, but one containing a noble metal is preferable, one containing palladium is more preferable, and a mixed palladium / tin catalyst solution is particularly preferable. . In order to apply these catalysts to the resin surface, the temperature of the catalyst application treatment solution is preferably 10 to 60 ° C., particularly 20 to 50 ° C., and the ABS resin plate 8 is used for 1 to 20 minutes, preferably 2 to 20 minutes. It may be treated by immersion for 5 minutes. The resin surface to which the catalyst has been applied in this manner is then metallized on the resin surface by metal plating such as electroless plating and electroplating (direct plating).
 樹脂表面の金属化に無電解めっきを用いる場合には、触媒付与処理液にて触媒を付与した後に、さらに塩酸または硫酸を含有する活性化処理液で処理を行ってもよい。この活性化処理液中の塩酸または硫酸の濃度は0.5mol/L以上、好ましくは1~4mol/Lである。これら活性化処理液にて樹脂表面を処理するには、活性化処理液の液温を好ましくは0~60℃、特に30~45℃とし、ここにABS系樹脂板8を好ましくは1~20分間、特に2~5分間浸漬させ処理すればよい。 When electroless plating is used to metallize the resin surface, the catalyst may be applied with a catalyst application treatment solution and then treated with an activation treatment solution containing hydrochloric acid or sulfuric acid. The concentration of hydrochloric acid or sulfuric acid in this activation treatment solution is 0.5 mol / L or more, preferably 1 to 4 mol / L. In order to treat the resin surface with these activation treatment liquids, the liquid temperature of the activation treatment liquid is preferably set to 0 to 60 ° C., particularly 30 to 45 ° C., and the ABS resin plate 8 is preferably 1 to 20 here. Immersion treatment may be carried out for a minute, especially for 2 to 5 minutes.
 上記のようにして触媒の付与、活性化処理されたABS系樹脂板8には、次に無電解めっき処理を行う。無電解めっき処理は、公知の無電解ニッケルめっき液、無電解銅めっき液、無電解コバルトめっき液等の無電解めっきを用いて常法に従って行うことができる。具体的には無電解ニッケルめっき液で樹脂表面にめっき処理を行う場合には、pH8~10で30~50℃の液温の無電解ニッケルめっき液にABS系樹脂板8を5~15分間浸漬させ処理すればよい。 Next, electroless plating is performed on the ABS-based resin plate 8 to which the catalyst has been applied and activated as described above. The electroless plating treatment can be carried out according to a conventional method using electroless plating such as known electroless nickel plating solution, electroless copper plating solution, electroless cobalt plating solution and the like. Specifically, when plating the resin surface with an electroless nickel plating solution, the ABS resin plate 8 is immersed in the electroless nickel plating solution with a pH of 8 to 10 and a temperature of 30 to 50 ° C. for 5 to 15 minutes. You may do it.
 また、樹脂表面の金属化に電気めっき(ダイレクトプレーティング)を用いる場合には、触媒付与処理液にて触媒を付与した後に、さらに、銅イオンを含有するpH7以上の活性化処理液で処理を行ってもよい。この活性化処理液に含有される銅イオンの由来は特に制限されず、例えば、硫酸銅が挙げられる。活性化処理液にて樹脂表面を処理するには、活性化処理液の液温を好ましくは0~60℃、特に30~50℃とし、ここにABS系樹脂板8を好ましくは1~20分間、特に2~50分間浸漬させ処理すればよい。 When electroplating (direct plating) is used to metallize the resin surface, after applying a catalyst with a catalyst application treatment solution, treatment is further performed with a pH 7 or more activation treatment solution containing copper ions. You may go. The origin of the copper ion contained in this activation treatment solution is not particularly limited, and examples thereof include copper sulfate. In order to treat the resin surface with the activation treatment liquid, the liquid temperature of the activation treatment liquid is preferably set to 0 to 60 ° C., particularly 30 to 50 ° C., and the ABS resin plate 8 is preferably used here for 1 to 20 minutes. In particular, it may be treated by immersion for 2 to 50 minutes.
 上述のようにして触媒の付与、活性化処理されたABS系樹脂板8には、続いて硫酸銅浴等の汎用の電気銅めっき浴に浸漬し、通常の条件、例えば、1~5A/dmで2~10分間処理すればよい。ちなみに、これまでの各工程間には、十分な水洗や湯洗を行うこととする。上述したようにしてABS系樹脂板8の表面に無電解めっきや電気めっき等の金属めっきを施し、金属化したABS系樹脂板8の表面には、さらに必要に応じて各種電気銅めっきや電気ニッケルめっき、電気クロムめっきを施すことも可能である。それら金属めっきはめっきとして皮膜が得られれば良く、例えば、ニッケル、銅、クロム、コバルト、すず、亜鉛、鉄、銀、金及びそれらの合金などが挙げられる。 The ABS resin plate 8 subjected to the catalyst application and activation treatment as described above is subsequently immersed in a general-purpose copper electroplating bath such as a copper sulfate bath under ordinary conditions, for example, 1 to 5 A / dm. 2 may be treated for 2 to 10 minutes. By the way, it is decided to carry out sufficient water washing and hot water washing between each process so far. As described above, the surface of the ABS resin plate 8 is plated with metal such as electroless plating or electroplating, and the surface of the metallized ABS resin plate 8 is further subjected to various kinds of electric copper plating or electricity as required. It is also possible to apply nickel plating or electrochromic plating. The metal plating should just be able to obtain a film as plating, and examples thereof include nickel, copper, chromium, cobalt, tin, zinc, iron, silver, gold and alloys thereof.
 このような処理をABS系樹脂板8を交換しながら連続して行えばよいが、処理槽2内の過硫酸溶液Sの過硫酸は処理に伴い分解し、過硫酸濃度は減少するので、循環ポンプ5を連続駆動して電解セル6から新たな過硫酸溶液Sを配管7から処理槽2に補充し続けることが望ましい。また、硫酸濃度が低下したら処理槽2に硫酸を、硫酸濃度が上昇したら処理槽2に水を適宜補充すればよい。硫酸濃度系を処理槽2に設置し、この作業を自動で行うこともできる。 Such treatment may be continuously performed while replacing the ABS resin plate 8, but the persulfuric acid of the persulfuric acid solution S in the processing tank 2 is decomposed with the processing, and the persulfuric acid concentration is reduced. It is desirable to continuously drive the pump 5 to continuously replenish the processing tank 2 with fresh persulfate solution S from the electrolytic cell 6 through the pipe 7. Further, when the concentration of sulfuric acid decreases, the processing tank 2 may be appropriately supplemented with sulfuric acid, and when the concentration of sulfuric acid increases, the processing tank 2 may be appropriately supplemented with water. A sulfuric acid concentration system can be installed in the processing tank 2 and this operation can be performed automatically.
 なお、上述したような本実施形態の前処理に先立ってABS系樹脂板8には、必要に応じて濡れ性を付与する処理を施してもよい。この処理は、例えばABS系樹脂板8を湿潤処理槽に十分に浸漬させ、樹脂基板表面に濡れ性を付与することにより行えばよい。また、上記湿潤処理槽には界面活性剤を含有させても良い。界面活性剤としては特に限定はされないが、例えば、アミン塩型界面活性剤、第4級アミン塩型界面活性剤、アミノ酸型界面活性剤、ベタイン型界面活性剤、カルボン酸塩型界面活性剤、スルホン酸塩型界面活性剤、硫酸エステル塩型界面活性剤、リン酸エステル型界面活性剤、エーテル型界面活性剤、エステル型界面活性剤、含窒素型界面活性剤、含フッ素型界面活性剤等を用いることができる。これらの界面活性剤は1種または2種以上用いることができる。 In addition, you may perform the process which provides wettability to the ABS-type resin board 8 as needed prior to the pre-processing of this embodiment which was mentioned above. This treatment may be performed, for example, by sufficiently immersing the ABS resin plate 8 in a wet treatment tank to impart wettability to the surface of the resin substrate. In addition, the wetting treatment tank may contain a surfactant. The surfactant is not particularly limited. For example, an amine salt surfactant, a quaternary amine salt surfactant, an amino acid surfactant, a betaine surfactant, a carboxylate surfactant, Sulfonate surfactants, sulfate ester surfactants, phosphate surfactants, ether surfactants, ester surfactants, nitrogen-containing surfactants, fluorine-containing surfactants, etc. Can be used. These surfactants can be used alone or in combination of two or more.
 このようにして前処理を施したABS系樹脂板8には、通常の方法により無電解めっき又は電気めっきを施すことができる。これによりABS系樹脂板8の表面に密着性の良いクロム等のめっきが施されたABS系樹脂めっき製品を得ることができる。 Electroless plating or electroplating can be applied to the ABS-based resin plate 8 thus pretreated by a conventional method. As a result, it is possible to obtain an ABS-based resin plated product in which the surface of the ABS-based resin plate 8 is plated with chromium or the like having good adhesion.
 以上、本発明のABS系樹脂表面のめっき処理方法について、前記実施形態に基づいて説明してきたが、本発明は前記実施例に限定されず種々の変形実施が可能である。例えば、本実施形態のようなバッチ処理でなく連続処理にも適用可能である。また、ABS系樹脂板は、本実施形態のように板に限らず種々の形状の成形体に適用可能であることはいうまでもない。 As mentioned above, although the plating processing method of the ABS system resin surface of the present invention was explained based on the above-mentioned embodiment, the present invention is not limited to the above-mentioned example, and various modification implementation is possible. For example, it is applicable not only to batch processing like this embodiment but to continuous processing. Further, it is needless to say that the ABS-based resin plate is applicable not only to the plate as in the present embodiment but also to molded articles of various shapes.
 以下に実施例及び比較例を示し、本発明をより具体的に説明する。ただし、本発明はこれらの記載により何ら限定されるものではない。なお、以下の実施例及び比較例においては、過硫酸濃度測定及び密着性試験は次のようにして行った。 The present invention will be described more specifically by showing Examples and Comparative Examples below. However, the present invention is not limited at all by these descriptions. In the following examples and comparative examples, the persulfate concentration measurement and the adhesion test were performed as follows.
<過硫酸濃度測定方法>
 まず、ヨウ素滴定により処理液(過硫酸溶液S)中に含まれる全酸化剤濃度を測定する。このヨウ素滴定とは、過硫酸溶液SにKIを加えてIを遊離させ、そのIをチオ硫酸ナトリウム標準溶液で滴定してIの量を求め、そのIの量から酸化剤濃度を求めるものである。次に、過硫酸溶液Sの過酸化水素濃度のみを過マンガン酸カリウム滴定により求め、ヨウ素滴定値から過マンガン酸カリウム滴定値を差し引くことにより過硫酸濃度を算出した。
<Method for measuring persulfate concentration>
First, the total oxidizing agent concentration contained in the treatment solution (persulfuric acid solution S) is measured by iodine titration. And the iodometric titration, persulfate solution S added KI to release I 2, to determine the amount of I 2 was titrated the I 2 with sodium thiosulfate standard solution, oxidizing agent concentration from the amount of the I 2 Seeks Next, only the hydrogen peroxide concentration of the persulfate solution S was determined by potassium permanganate titration, and the persulfate concentration was calculated by subtracting the potassium permanganate titration value from the iodine titration value.
<めっき密着性試験>
 この試験は、試料を加熱急冷する熱衝撃によって密着性を調べるもので、70℃と-30℃、すなわち温度差100℃をそれぞれの温度を1時間保ち40サイクル実施した後、めっき表面の剥離、クラック、膨れ等の有無などの状況を観察し、下記分類1から3までの3段階で評価する。
 分類1:めっきの剥離、クラックやしわ、ふくれが全くない。
 分類2:めっきの剥離、クラックやしわ、ふくれが試料面積の25%未満存在する。
 分類3:めっきの剥離、クラックやしわ、ふくれが試料面積の25%以上存在する。
<Plating adhesion test>
In this test, the adhesion is examined by thermal shock of heating and quenching the sample, and peeling of the plated surface is performed after 70 cycles and -30 ° C, that is, a temperature difference of 100 ° C is maintained for 1 hour for 40 cycles. The situation such as the presence or absence of a crack, swelling, etc. is observed and it evaluates in three steps from the following classification 1-3.
Category 1: There is no peeling, cracking, wrinkling or swelling of plating.
Category 2: Peeling, cracks, wrinkles and blisters of less than 25% of the sample area.
Category 3: Plating peeling, cracks, wrinkles, and blisters 25% or more of the sample area.
[実施例1]
 図1に示す装置を用いて、ABS系樹脂板8の表面処理を行った。処理槽の仕様及び条件は次の通りである。
Example 1
The surface treatment of the ABS resin plate 8 was performed using the apparatus shown in FIG. The specifications and conditions of the treatment tank are as follows.
<処理槽>
  処理槽2の容積:40L
  ABS系樹脂板8の大きさ:500mm×500mm×厚さ5mm
<過硫酸溶液Sの性状と表面処理条件>
  硫酸濃度:75重量%
  過硫酸濃度:10g/L
  処理温度:75℃
  処理時間:15分
<過硫酸生成用電解セル6及び電解条件>
  セル容積:0.5L
  陽極及び陰極:ダイヤモンド電極(直径150mm)
  バイポーラ電極材質:陽極、陰極と同じ
  電流密度:50A/dm
  液循環量:2.5L/min
  硫酸濃度:75重量%
  過硫酸濃度:10g/L
  処理温度:75℃
<Treatment tank>
Volume of treatment tank 2: 40 L
Size of ABS resin plate 8: 500 mm × 500 mm × thickness 5 mm
<Properties of persulfate solution S and surface treatment conditions>
Sulfuric acid concentration: 75% by weight
Persulfate concentration: 10 g / L
Processing temperature: 75 ° C
Treatment time: 15 minutes <electrolysis cell 6 for generating persulfate and electrolysis conditions>
Cell volume: 0.5 L
Anode and cathode: Diamond electrode (diameter 150 mm)
Bipolar electrode material: same as anode and cathode Current density: 50A / dm 2
Liquid circulation rate: 2.5 L / min
Sulfuric acid concentration: 75% by weight
Persulfate concentration: 10 g / L
Processing temperature: 75 ° C
 まず、界面活性剤の入った湿潤処理槽に10分間ABS系樹脂板8を浸漬し、次に過硫酸溶液Sを満たした処理槽2内に10分間浸漬した後、処理槽2から取り出し、水道水で洗浄した後、活性化工程及び触媒付与工程を経て無電解ニッケルめっきを施した。その後最終的にはクロムめっきを施した。めっき工程の処理条件を表1及び表2に示す。そして、クロムめっきしたABS系樹脂板8のめっきの密着性を上記方法にて評価した。結果を電解硫酸処理条件とともに表3に示す。 First, the ABS resin plate 8 is immersed for 10 minutes in a wetting treatment tank containing a surfactant, and then immersed for 10 minutes in the treatment tank 2 filled with the persulfuric acid solution S, and then removed from the treatment tank 2 After washing with water, electroless nickel plating was applied through an activation step and a catalyst application step. Thereafter, chromium plating was finally performed. The processing conditions of the plating step are shown in Tables 1 and 2. Then, the adhesion of the plating of the chromium-plated ABS-based resin plate 8 was evaluated by the above method. The results are shown in Table 3 together with electrolytic sulfuric acid treatment conditions.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
[実施例2~7]
 電解硫酸処理条件を表3に示すように種々設定を変更した以外は実施例1と同様にしてクロムめっきを施し、めっきの密着性を評価した。結果を電解硫酸処理条件とともに表3にあわせて示す。
[Examples 2 to 7]
Chromium plating was performed in the same manner as in Example 1 except that various settings were changed as shown in Table 3 for electrolytic sulfuric acid treatment conditions, and the adhesion of the plating was evaluated. The results are shown in Table 3 together with electrolytic sulfuric acid treatment conditions.
[比較例1]
 電解硫酸溶液の代わりに、硫酸濃度75重量%の硫酸溶液を用いた以外は実施例1と同様にしてクロムめっきを施し、めっきの密着性を評価した。結果を処理条件とともに表3にあわせて示す。
Comparative Example 1
Chromium plating was performed in the same manner as in Example 1 except that a sulfuric acid solution having a sulfuric acid concentration of 75% by weight was used instead of the electrolytic sulfuric acid solution, and the adhesion of the plating was evaluated. The results are shown in Table 3 together with the processing conditions.
[比較例2]
 電解硫酸溶液の代わりに、硫酸と過酸化水素との混合溶液を用いた以外は実施例1と同様にしてクロムめっきを施し、めっきの密着性を評価した。結果を処理条件とともに表3にあわせて示す。
Comparative Example 2
Chrome plating was performed in the same manner as in Example 1 except that a mixed solution of sulfuric acid and hydrogen peroxide was used instead of the electrolytic sulfuric acid solution, and the adhesion of the plating was evaluated. The results are shown in Table 3 together with the processing conditions.
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
 表3から明らかなとおり本発明のABS系樹脂の表面のめっき処理方法によると、優れためっき密着性が得られることがわかる。なお、比較例2のABS系樹脂の表面のめっき処理方法では、過酸化水素の消費により処理の長期安定性に問題があった。 As apparent from Table 3, according to the plating treatment method of the surface of the ABS-based resin of the present invention, it is understood that excellent plating adhesion can be obtained. In addition, in the plating processing method of the surface of the ABS-type resin of the comparative example 2, there existed a problem in the long-term stability of a process by consumption of hydrogen peroxide.
1 処理装置
2 処理槽
3 恒温ヒータ
4 配管
5 循環ポンプ
6 電解セル
6A 陽極
6B 陰極
6C バイポーラ電極
7 配管
8 ABS系樹脂板
S 過硫酸溶液
1 processing apparatus 2 processing tank 3 constant temperature heater 4 piping 5 circulation pump 6 electrolysis cell 6A anode 6B cathode 6C bipolar electrode 7 piping 8 ABS resin plate S persulfate solution

Claims (6)

  1.  ABS系樹脂を硫酸を電気分解した溶液で処理する、ABS系樹脂表面のめっき前処理方法。 A plating pretreatment method of ABS resin surface, wherein ABS resin is treated with a solution obtained by electrolyzing sulfuric acid.
  2.  前記溶液の硫酸濃度が60~87重量%である、請求項1に記載のABS系樹脂表面のめっき前処理方法。 The method according to claim 1, wherein the concentration of sulfuric acid in the solution is 60 to 87 wt%.
  3.  前記処理の温度が50~80℃である、請求項1又は2に記載のABS系樹脂表面のめっき前処理方法。 The plating pretreatment method according to claim 1 or 2, wherein the temperature of the treatment is 50 to 80 属 C.
  4.  前記溶液の過硫酸濃度が3g/L以上である、請求項1~3のいずれかに記載のABS系樹脂表面のめっき前処理方法。 The plating pretreatment method of ABS resin surface according to any one of claims 1 to 3, wherein the persulfate concentration of the solution is 3 g / L or more.
  5.  請求項1~4のいずれかに記載のABS系樹脂表面のめっき前処理方法により処理した後、該ABS系樹脂表面に無電解めっき又は電気めっきを施す、ABS系樹脂表面のめっき処理方法。 A plating treatment method of ABS resin surface, wherein electroless plating or electroplating is performed on the ABS resin surface after treating the ABS resin surface by the plating pretreatment method according to any one of claims 1 to 4.
  6.  請求項5に記載のABS系樹脂表面のめっき処理方法によりめっき処理を施した、ABS系樹脂めっき製品。 An ABS resin-plated product, which has been plated by the plating method of ABS resin surface according to claim 5.
PCT/JP2018/032342 2017-09-01 2018-08-31 Plating pretreatment method for abs resin surface, plating treatment method for abs resin surface, and abs resin plated product WO2019045047A1 (en)

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