JP2019191121A - Measurement method, adjustment method, and optical system manufacturing method - Google Patents

Abstract

To provide a high-quality optical system.SOLUTION: A measurement method includes the steps of: measuring a transmission wavefront of transmission light transmitting an inspected optical system; acquiring each aberration component of a wavefront aberration of the inspected optical system on the basis of the transmission wavefront of the transmission light; acquiring a changing sensitivity degree of each aberration component of the wavefront aberration when causing an optical element of the inspected optical system a position deviation; acquiring coefficient information for enhancing a correlation between each aberration component of the wavefront aberration and an evaluation value about an image-formation performance of the inspected optical system; and obtaining an amount of position deviation of the optical element of the inspected optical system, using each aberration component of the wavefront aberration, the sensitivity degree of each aberration component and the coefficient information.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a measurement method, an adjustment method, and an optical system manufacturing method for measuring a positional deviation amount of an optical element constituting an optical system by measuring a wavefront of the optical system.

  When an error occurs in the arrangement of the optical elements constituting the optical system, the imaging performance of the optical system is degraded. In order to prevent a decrease in imaging performance of the optical system, a method of measuring the wavefront aberration of the optical system and adjusting the position of each optical element of the optical system so as to reduce the wavefront aberration is known.

  In the eccentricity measuring method disclosed in Patent Document 1, a predetermined aberration component is extracted from the wavefront data of the light emitted from the test optical system, and the eccentricity is calculated using the eccentric aberration sensitivity.

  According to the method disclosed in Patent Document 2, the adjustment amount of the test optical system for reducing the aberration component is calculated from the measured aberration component of the transmitted wavefront and the sensitivity (influence) of each adjustment location. is doing.

  The methods described in Patent Documents 1 and 2 are intended to improve the imaging performance including the value of MTF (Modulation Transfer Function) by reducing the aberration of the optical system.

Japanese Patent Laid-Open No. 2006-95316 JP 2011-9575 A

Joseph W. Goodman, Induction of Fourier Optics, Chapter 6.4, Aberrations and their effects on frequency response

  According to Non-Patent Document 1, the MTF varies depending on the aberration component. This means that the MTF is not necessarily improved even if the optical system is adjusted so as to reduce the amount of aberration represented by the square root of the aberration. Further, when the aberration components to be reduced differ depending on the use of the optical system, the desired imaging performance may not be obtained even if the aberration is uniformly reduced.

  An object of the present invention is to measure the amount of positional deviation of an optical element for realizing an optical system having desired imaging performance.

  A measuring method according to one aspect of the present invention includes a step of measuring a transmitted wavefront of transmitted light that has passed through a test optical system, and each aberration component of wavefront aberration of the test optical system based on the transmitted wavefront of the transmitted light Obtaining the sensitivity of each aberration component of the wavefront aberration that changes when the optical element of the test optical system is displaced, and evaluating the imaging performance of the test optical system Obtaining the coefficient information for enhancing the correlation between the value and each aberration component of the wavefront aberration, and using the aberration information of the wavefront aberration, the sensitivity of the aberration component, and the coefficient information, the optical system to be tested And determining the amount of positional deviation of the optical element.

  An adjustment method according to another aspect of the present invention includes a step of measuring a transmitted wavefront of transmitted light transmitted through the test optical system, and each of the wavefront aberrations of the test optical system based on the transmitted wavefront of the transmitted light. Obtaining an aberration component; obtaining a sensitivity of each aberration component of the wavefront aberration that changes when an optical element of the test optical system is displaced; and imaging performance of the test optical system Obtaining coefficient information for enhancing the correlation between the evaluation value and each aberration component of the wavefront aberration, and using each of the aberration components of the wavefront aberration, the sensitivity of each aberration component, and the coefficient information An adjustment method, comprising: obtaining a positional deviation amount of an optical element of an optical system; and adjusting a position of the optical element based on the positional deviation amount of the optical element.

  An optical system manufacturing method according to another aspect of the present invention includes assembling a test optical system, measuring a transmitted wavefront of transmitted light transmitted through the test optical system, and a transmitted wavefront of the transmitted light. Obtaining each aberration component of the wavefront aberration of the test optical system based on the above, and obtaining the sensitivity of each aberration component of the wavefront aberration that changes when the optical element of the test optical system is displaced Obtaining the coefficient information for enhancing the correlation between the evaluation value relating to the imaging performance of the test optical system and each aberration component of the wavefront aberration, and each aberration component of the wavefront aberration and each aberration component Determining the amount of positional deviation of the optical element of the optical system to be tested using the sensitivity and the coefficient information, and adjusting the position of the optical element based on the amount of positional deviation of the optical element. Features .

  According to the present invention, it is possible to measure the amount of positional deviation of an optical element for realizing an optical system having desired imaging performance.

Schematic of the measuring device in Example 1 Flowchart relating to a method for calculating the amount of misalignment in the first embodiment. Schematic diagram of measuring apparatus in Example 2 Explanatory drawing of the modification of the measuring device in Example 2. Flowchart of optical system manufacturing method in Embodiment 3

  Embodiments of the present invention will be described below with reference to the drawings.

  FIG. 1 shows a schematic diagram of a measuring apparatus 10 according to a first embodiment of the present invention. The measurement apparatus 10 according to the first embodiment includes light sources 101, 102, and 103, light projecting lenses (incident optical systems) 111, 112, and 113, light receiving lenses (output optical systems) 131, 132, and 133, and wavefront sensors 141, 142, and 143. And a computer (arithmetic unit) 150. The test optical system 120 is an optical system such as an imaging optical system of a camera or a projection optical system of a projector, and includes a plurality of optical elements. The plurality of optical elements constituting the optical system are not limited to lenses, and may include optical elements such as mirrors, diffractive optical elements, and prisms. Although the number of the plurality of optical elements constituting the test optical system 120 may be three or more, in this embodiment, a case where two optical elements 121 and 122 are provided will be described.

  The measuring apparatus 10 according to the first embodiment measures the amount of positional deviation of the optical elements that constitute the optical system 120 to be tested. The positional shift of the optical element is a positional shift due to translation of the optical element in the optical axis direction (Z-axis direction in FIG. 1), or a positional shift due to translation in a direction perpendicular to the optical axis (X-axis direction, Y-axis direction in FIG. 1). , And means a displacement due to rotation around an axis perpendicular to the optical axis (X axis and Y axis in FIG. 1).

  Light from a plurality of light sources 101, 102, 103 such as laser diodes is applied to the projection lenses 111, 112, 113 via fibers. Light emitted from the plurality of light projecting lenses 111, 112, 113 becomes parallel light and is irradiated to the test optical system 120 from different directions. A plurality of transmitted lights that have passed through the test optical system 120 are received by wavefront sensors 141, 142, and 143 such as Shack-Hartmann sensors via light receiving lenses 131, 132, and 133.

  The computer 150 connected to the plurality of wavefront sensors 141, 142, and 143 calculates the wavefront aberration components of the plurality of transmitted lights based on the signals output from the wavefront sensors, and based on the wavefront aberration components of the plurality of transmitted lights. Then, the positional deviation amount of the optical element in the test optical system 120 is calculated.

  FIG. 2 shows a flowchart regarding a method of calculating the amount of positional deviation of the optical element. In step S11, the transmitted wavefront of the test optical system 120 is measured using the plurality of wavefront sensors 141, 142, and 143. In step S12, the measured transmitted wavefront is fitted with an elliptic Zernike polynomial to obtain its coefficient. In step S13, the positional deviation amount sensitivity of the optical element whose positional deviation amount is desired to be calculated is calculated. In step S14, a weight (coefficient information) to be applied to the aberration component is calculated. In step S15, the positional deviation amount of the optical element is calculated using the wavefront aberration component, the positional deviation amount sensitivity, and the weight.

  As shown in FIG. 1, it is assumed that there are three pieces of transmitted light. Further, the amount of positional deviation A to be obtained is the amount of parallel movement ΔX, ΔY, ΔZ of the optical element 121 in the X-axis direction, Y-axis direction, and Z-axis direction, and the rotation amount ΔθX around the X-axis of the optical element 122 A case where the rotation amount is ΔθY will be described.

  A wavefront sensor is used for the measurement method in step S11. As the wavefront sensor, a Shack-Hartmann sensor, a shearing interferometer, or the like can be used.

  The Shack-Hartmann sensor divides and condenses the wavefront (phase distribution) of incident light by a plurality of microlenses constituting a microlens array. And it images as a plurality of condensing spot images. Depending on the inclination of the wavefront incident on the microlens array, the focused spot is focused and the center of gravity is shifted, and the slope of the wavefront is calculated from the amount of the center of gravity of the focused spot to calculate the two-dimensional phase distribution. .

  A Talbot interferometer, which is one example of a shearing interferometer, diffracts incident light by a two-dimensional diffraction grating and produces interference fringes caused by interference between transmitted light (0th order light) and diffracted light (for example, first order light). Take an image. The light and dark phases of the interference fringes are obtained by a known method such as a phase shift method or a Fourier transform method. Since the obtained phase corresponds to the differential wavefront of the incident light, the wavefront of the incident light is calculated by integrating this.

  The intensity distribution of transmitted light coaxial with the optical axis is circular, but the intensity distribution of transmitted light outside the optical axis is not circular. In component decomposition of the wavefront aberration in such a non-circular region, an elliptic Zernike polynomial may be used in step S12. An elliptic Zernike polynomial is a Zernike polynomial orthogonalized in an elliptic region. When the elliptic Zernike polynomial is EZ, the circular Zernike polynomial is CZ, the coordinate system in the pupil is x, y, the diameter 2a in the x-axis direction, and the diameter 2b in the axial direction, the ellipse Zernike is expressed by the following equation (2).

  Note that j in the equation represents the term number of the Zernike polynomial. When obtaining up to 36 terms of the ellipse Zernike, the wavefront aberration component acquired in step S12 is expressed by the following equation (3). In equation (3), the superscript indicates the image height number, and the subscript indicates the term number of the Zernike polynomial.

  In step S13, the positional deviation amount sensitivity S of the optical elements 121 and 122 is obtained. The positional deviation amount sensitivity S is a change amount of an aberration component when each optical element is translated or rotated by a unit amount, and can be expressed by the following equation (4).

  In step S14, a weighting coefficient (coefficient information) w to be applied to each aberration component is obtained. The weighted aberration component wE multiplied by the weight is expressed by the following equation (5).

  The weighting coefficient w is set so that the evaluation value M related to the imaging performance of the optical system is improved if the weighted aberration amount R, which is the sum of the weighted aberration components wE, is reduced. That is, the weighting coefficient (coefficient information) w is set so that the weighted aberration amount R and the evaluation value M regarding the imaging performance of the optical system have a negative correlation. The evaluation value M relating to the imaging performance of the optical system indicates the resolution represented by the MTF evaluation value, the degree of image distortion, and the like. In Example 1, the evaluation value M regarding the imaging performance of the optical system is set as the average value of the MTF as shown in Expression (6), and the weighted aberration amount R is set as the weighted aberration component as shown in Expression (7). The square root of wE.

First, a plurality of weighted aberration amounts Rk and an evaluation value Mk regarding the imaging performance of the optical system corresponding to each weighted aberration amount Rk are calculated. k is a serial number for a plurality of weighted aberration amounts R and an evaluation value M regarding the imaging performance of the optical system. If Rk is calculated using the positional deviation amount sensitivity S of the optical elements 121 and 122 and the randomly given positional deviation amount Bk, it is easy to obtain a correlation in consideration of the characteristics of the optical system 120 to be tested.
Rk = R (wEk) (8)
Ek = E ₀ + SBk (9)

E ₀ in equation (9) is a design value of the aberration component of the optical system 120 to be tested. The evaluation value Mk related to the imaging performance of the optical system can be calculated by the calculation method described in Non-Patent Document 1 if the aberration component Ek is determined.

Next, the relationship between the evaluation value Mk regarding the imaging performance of the optical system and the weighted aberration amount Rk is linearly approximated. In the following equation, a represents the slope, b represents the intercept, and n represents the number of data. Δ indicates the difference between a straight line obtained by linear approximation and each data (Rk, Mk). In general, as the weighted aberration amount R is larger, the evaluation value M regarding the imaging performance of the optical system is lower, so the inclination a becomes a negative value.
Mk = aRk + b (11)

  The weighting factor w is determined so that the difference Δ between the straight line obtained by the linear approximation and each data (Rk, Mk) becomes small. As a determination method, an existing method such as a least square method or a steepest descent method may be used. In this way, the negative correlation can be increased by bringing the relationship between the evaluation value M regarding the imaging performance of the optical system and the weighted aberration amount R closer to a linear function of monotonic decrease.

In step S15, the positional deviation amount A is calculated using the aberration component E, the weighting coefficient w, and the positional deviation amount sensitivity S. In order to determine the displacement A, the following minimization problem may be solved. That is, the misregistration amount A may be determined so that φ shown in Expression (15) is minimized. An existing method such as a least square method may be used as a method for determining the positional deviation amount A at this time.
φ = wE-SA (15)

  As is clear from the equation (15), the same result can be obtained by multiplying the positional deviation amount sensitivity S by the inverse of the weighting coefficient w ′ instead of multiplying the aberration component E by the weight w. In this case, the positional deviation amount A may be obtained so as to reduce φ ′ represented by the following equation.

φ＝Ｅ−ｗ’ＳＡ ・・・（１７）

φ = E−w′SA (17)

  Through the above steps, the amount of positional deviation of the optical elements 121 and 122 in the test optical system 120 can be obtained.

  Further, in step S16, at least one of the position and the angle of the optical element of the optical system 120 to be measured is adjusted according to the amount of displacement obtained in step S15. In this adjustment, a person may adjust the position of the optical element via an adjustment unit such as a feed screw that changes at least one of the angles while viewing a screen that indicates the amount of displacement. Further, a robot (computer) (not shown) that has received the amount of positional deviation from the adjustment device 20 may automatically adjust it by operating the adjustment unit.

  Thereby, the test optical system 120 can be adjusted to an optical system having desired imaging performance.

  In the first embodiment, a specific case is described in order to simplify the description. However, the present invention is not limited to the above-described configuration in the first embodiment.

  For example, in the first embodiment, the number of transmitted light is three, but the present invention is not limited to this. More transmitted light may be measured including the direction perpendicular to the paper surface.

  Moreover, although the structure provided with a several light source, a light projection lens, a light-receiving lens, and a wavefront sensor was demonstrated as a several transmitted light measuring method, you may drive and measure only one each.

  In the present embodiment, different light sources are used for the light sources 101, 102, and 103. For example, light from one light source is divided so that light is incident on the optical system 120 to be measured at different angles. May be.

  Further, although the light projecting lenses (incident optical systems) 111, 112, and 113 and the light receiving lenses (exit optical systems) 131, 132, and 133 are shown as single lenses, they may be configured to include a plurality of lenses. .

  Alternatively, the amount of positional deviation may be calculated using only the transmitted wavefront of the transmitted light that has passed through the optical system to be tested in one direction.

  The test optical system 120 may be an optical system used in an optical apparatus other than a camera or a projector, and is particularly suitable for measuring a positional deviation amount of an optical element of an optical system being assembled. In the first embodiment, the coefficient of the elliptic Zernike polynomial is shown as the aberration component, but other aberration components can be used. For example, the coefficient may be a normal Zernike polynomial coefficient, other orthogonal functions, longitudinal aberration amount, lateral aberration amount, and field curvature amount.

  The evaluation value M regarding the imaging performance of the optical system should be set appropriately depending on the purpose of use of the optical system 120 to be tested. For example, the following equation may be used when the low frequency region is more important than the frequency c.

  Further, when it is sufficient to evaluate the MTF of the vertical and horizontal (x, y) 2 cross sections, the following equation may be used as the evaluation value M regarding the imaging performance of the optical system.

  The relationship between the evaluation value M regarding the imaging performance of the optical system and the weighted aberration amount R may be obtained by a quadratic function, or the weight coefficient w is simply specified by specifying only the constraint condition that both have a negative correlation. You may decide.

  Further, the weighted aberration amount Rk may be calculated using the sensitivity of the optical elements in the plurality of optical systems. In these cases, the use of machine learning for determining the weighting coefficient w may increase the correlation between the evaluation value related to the imaging performance of the optical system and the weighted aberration amount. In the case of using machine learning, reinforcement learning that determines the weighting factor w so as to increase the evaluation point itself may be used with the correlation between the evaluation value M regarding the imaging performance of the optical system and the weighted aberration amount R as the evaluation point. .

  The weighted aberration amount Rk may be generated from the elliptical Zernike coefficient set at random without using the positional deviation amount sensitivity S. In this case, a more general correlation between the weighted aberration amount R and the evaluation value M regarding the imaging performance of the optical system can be created.

  As described above, according to the present invention, it is possible to measure the amount of positional deviation of an optical element for realizing an optical system having desired imaging performance. Further, an optical system having desired imaging performance can be obtained by adjusting at least one of the position and the angle of the optical element based on the positional deviation amount of the optical element.

  FIG. 3 shows a schematic configuration diagram of the measuring apparatus 20 according to the second embodiment of the present invention. The same numbers are used for members that are the same as those in FIG. The measuring device 20 includes light sources 101, 102, 103, light projecting lenses 111, 112, 113, reflection mirrors 201, 202, 203, light projecting / receiving lenses 211, 212, 213, beam splitters 221, 222, 223, a wavefront sensor 230, A computer 240 is provided.

  Light from a plurality of light sources 101, 102, 103 such as laser diodes is applied to the projection lenses 111, 112, 113 via fibers. Light emitted from the plurality of light projecting lenses 111, 112, and 113 is converted into parallel light and irradiated onto the test lens 120 via the beam splitters 221, 222, and 223 and the light projecting and receiving system lenses 211, 212, and 213. The plurality of transmitted lights that have passed through the test optical system 120 are reflected by the reflection mirrors 201, 202, and 203 and pass through the test optical system 120 again. The plurality of transmitted lights that have been transmitted again through the test optical system 120 are received by the wavefront sensor 230 via the light projecting / receiving lenses 211, 212, and 213 and the beam splitters 221, 222, and 223. The computer 240 connected to the wavefront sensor 230, based on the signal output from the wavefront sensor 230, the wavefront aberration components of the plurality of transmitted light received on the wavefront sensor and the optical elements 121 and 122 in the optical system 120 to be tested. Calculate the amount of misalignment.

  When the focal length of the test optical system 120 is long (when the angle of view is small), half mirrors 204 and 205 that reflect a part of incident light and transmit a part thereof can be used as shown in FIG. good. The mirror 206 may be a half mirror, but is preferably a mirror that reflects all incident light.

  The flowchart regarding the calculation method of the positional deviation amount of the second embodiment is the same as the flowchart of the first embodiment of FIG.

  With respect to the step of obtaining the weighting coefficient corresponding to step S14 in FIG. 2, a method of setting the weight so as to improve image blur and image distortion will be described. Since there is a corresponding aberration in image blur and image distortion, the weight of the aberration coefficient may be increased. For example, when a part of the screen is blurred, the weight of the defocus component (four terms of the ellipse Zernike) is set large. When emphasizing wavefront undulations, only the defocus component may be set to a difference value from a specific image height. The evaluation may be performed by excluding the items 1 to 3 of the ellipse Zernike that is likely to change depending on the measurement system.

  For example, when it is desired to suppress the asymmetric component of the image blur, the weights of the coma aberration component (7th and 8th terms of the elliptical Zernike) and the astigmatism component (5th and 6th terms of the elliptical Zernike) may be increased. As described above, the evaluation value related to the imaging performance of the optical system according to the present invention includes concepts such as image blurring and image distortion in addition to the resolution represented by the MTF evaluation value.

  As described above, according to the measurement apparatus of the second embodiment of the present invention, it is possible to measure the positional deviation amount of the optical element for realizing the optical system having the desired imaging performance. Further, an optical system having desired imaging performance can be obtained by adjusting at least one of the position and the angle of the optical element based on the positional deviation amount of the optical element. In addition, it is possible to adjust to suppress a desired aberration component according to the use of the optical system.

  FIG. 5 is a flowchart relating to a method of manufacturing an optical system according to Example 3 of the present invention. In step S20, an optical system is assembled by combining a plurality of optical elements. Next, in step S <b> 21, for example, the amount of positional deviation of the optical elements constituting the optical system 120 to be measured is measured using the measurement apparatus 10 of the first embodiment. In step S22, at least one of the position and the angle of the optical element is adjusted based on the measurement result of the positional deviation amount of the optical element. In step 23, the imaging performance of the optical system after adjusting the positional deviation of the optical element is evaluated. In step 23, if the desired imaging performance is obtained, the adjustment is terminated. If the desired imaging performance is not obtained in step S23, the process returns to step S20, where some of the optical elements are replaced or the lens barrel that houses the optical elements is replaced, and then the test optical system is reassembled. A high-quality optical system can be manufactured by performing the above-described procedure for all adjustable optical elements among the optical elements constituting the test optical system 120. When there are a plurality of optical elements that can be adjusted for the optical system 120 to be tested, if the imaging performance of the optical system reaches a desired standard by performing the above adjustment for some of the optical elements, It is not necessary to adjust the positional deviation according to the above procedure for the optical element.

101, 102, 103 Light source 111, 112, 113 Incident optical system 120 Optical system under test 131, 132, 133 Output optical system 141, 142, 143 Wavefront sensor 150 Computer (calculation unit)

Claims (12)

Measuring the transmitted wavefront of the transmitted light that has passed through the test optical system;
Obtaining each aberration component of the wavefront aberration of the optical system under test based on the transmitted wavefront of the transmitted light;
Obtaining the sensitivity of each aberration component of the wavefront aberration that changes when the optical element of the test optical system is displaced; and
Obtaining coefficient information for enhancing the correlation between the evaluation value relating to the imaging performance of the optical system to be examined and each aberration component of the wavefront aberration;
And a step of obtaining a positional deviation amount of the optical element of the optical system under test using each aberration component of the wavefront aberration, sensitivity of each aberration component and the coefficient information.   The measurement method according to claim 1, wherein transmission wavefronts of a plurality of transmitted lights that are transmitted through the test optical system in a plurality of different directions are measured.   3. The measurement method according to claim 1, wherein each aberration component of the wavefront aberration is a coefficient of an elliptic Zernike polynomial.   The measurement method according to claim 1, wherein the coefficient information varies depending on the magnitude of each aberration component of the wavefront aberration.   The measurement method according to claim 1, wherein the evaluation value related to the imaging performance of the test optical system is an MTF of the test optical system. Measuring the transmitted wavefront of the transmitted light that has passed through the test optical system;
Obtaining each aberration component of the wavefront aberration of the optical system under test based on the transmitted wavefront of the transmitted light;
Obtaining the sensitivity of each aberration component of the wavefront aberration that changes when the optical element of the test optical system is displaced; and
Obtaining coefficient information for enhancing the correlation between the evaluation value relating to the imaging performance of the optical system to be examined and each aberration component of the wavefront aberration;
Obtaining a positional deviation amount of the optical element of the optical system to be tested using each aberration component of the wavefront aberration, sensitivity of each aberration component and the coefficient information;
An adjustment method comprising the step of adjusting the position of the optical element based on a positional deviation amount of the optical element. A light source;
An incident optical system for allowing light from the light source to enter the test optical system;
An outgoing optical system on which transmitted light that has passed through the test optical system enters; and
A wavefront sensor that receives the transmitted light via the exit optical system;
An arithmetic unit that calculates each aberration component of the wavefront aberration of the optical system under test based on the output of the wavefront sensor;
The calculation unit includes sensitivity of each aberration component of the wavefront aberration that changes when the optical element of the test optical system is displaced, an evaluation value regarding the imaging performance of the test optical system, and the wavefront aberration The coefficient information for increasing the correlation of each aberration component of the optical component, and the positional deviation of the optical element of the optical system to be tested using each aberration component of the wavefront aberration, the sensitivity of each aberration component, and the coefficient information A measuring device characterized by calculating a quantity. The incident optical system has a plurality of lenses that allow light from the light source to enter the test optical system from a plurality of directions;
The measuring apparatus according to claim 7, wherein the emission optical system includes a plurality of lenses that transmit a plurality of transmitted light beams that have passed through the test optical system. The incident optical system has a plurality of lenses that allow light from the light source to enter the test optical system from a plurality of different directions.
The measuring apparatus according to claim 7, wherein the emission optical system includes a plurality of mirrors that reflect a plurality of transmitted light beams that have passed through the test optical system and cause the light to enter the test optical system.   The measuring apparatus according to claim 9, wherein the plurality of mirrors include a mirror that transmits a part of incident light. A light source;
An incident optical system for allowing light from the light source to enter the test optical system;
An outgoing optical system on which transmitted light that has passed through the test optical system enters; and
A wavefront sensor that receives the transmitted light via the exit optical system;
An arithmetic unit that calculates each aberration component of the wavefront aberration of the optical system under test based on the output of the wavefront sensor;
The calculation unit includes sensitivity of each aberration component of the wavefront aberration that changes when the optical element of the test optical system is displaced, an evaluation value regarding the imaging performance of the test optical system, and the wavefront aberration The coefficient information for increasing the correlation of each aberration component of the optical component, and the positional deviation of the optical element of the optical system to be tested using each aberration component of the wavefront aberration, the sensitivity of each aberration component, and the coefficient information Calculate the quantity,
An adjustment apparatus comprising: an adjustment unit that adjusts a position of the optical element based on a positional deviation amount of the optical element. Assembling the test optical system;
Measuring a transmitted wavefront of transmitted light that has passed through the test optical system;
Obtaining each aberration component of the wavefront aberration of the optical system under test based on the transmitted wavefront of the transmitted light;
Obtaining the sensitivity of each aberration component of the wavefront aberration that changes when the optical element of the test optical system is displaced; and
Obtaining coefficient information for enhancing the correlation between the evaluation value relating to the imaging performance of the optical system to be examined and each aberration component of the wavefront aberration;
Obtaining a positional deviation amount of the optical element of the optical system to be tested using each aberration component of the wavefront aberration, sensitivity of each aberration component and the coefficient information;
A method of manufacturing an optical system, comprising the step of adjusting a position of the optical element based on a positional deviation amount of the optical element.

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