JP2019095404A - Data processing device, measurement system and data processing-purpose program - Google Patents

Abstract

To make it possible to provide data capable of correctly determining a right and wrong of a measurement object without separately performing processing for acquiring a reference value.SOLUTION: A data processing device 3 comprises a processing unit 23 generating inspection-purpose data Dc for identifying whether a discharge waveform component is included in a signal waveform of waveform data D0 in which a plurality of measurement values Ds measured at a preliminarily defined sampling cycle are recorded on the basis of the waveform data D0. The processing unit 23 is configured to: generate, on the basis of waveform data D0, region data Da (measurement value range data) for identifying whether the discharge waveform component is included or not, and waveform data D7 and D8 (comparison value data) capable of identifying whether the discharge waveform component is included or not due to comparison with the region data Da; and generate the inspection-purpose data Dc including the generated region data Da and waveform data D7 and D8.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a data processing device and a data processing program for generating discharge presence / absence identification data for identifying whether a signal waveform of waveform data contains a discharge waveform component, and such a data processing device The present invention relates to a measurement system configured to include a measurement device that generates waveform data.

  For example, the following patent documents disclose a coil test apparatus and a coil test method (hereinafter, also simply referred to as "test apparatus" and "test method") for testing the quality of a measured coil. In this test apparatus and test method, a high voltage impulse voltage is applied to the coil to be measured to generate a damped oscillation voltage waveform to measure various characteristics (damped vibration time, effective value, integrated value of absolute value of measured value, etc.) In addition, a configuration and method are used to determine the quality of the measured coil based on the measurement result. Specifically, in this test apparatus and test method, it is determined whether or not the “rear short failure” occurs based on how much the measurement result fluctuates in a plurality of measurements, and the measurement result and the reference value A configuration / method is employed which determines whether or not a "coil turn number defect" has occurred by comparing them with the above.

JP-A-6-88849 (page 5-8, FIG. 1-5)

  However, the test apparatus and test method disclosed in the above-mentioned patent documents have the following problems. Specifically, in the test apparatus and test method disclosed in the above-mentioned patent documents, a configuration is employed in which it is determined whether or not a "rear short failure" occurs in the measured coil based on the magnitude of the fluctuation range of the measurement result. It is done.

  In this case, in the case of the above-mentioned test (measurement) by this kind of apparatus and method, it is caused by the change of the measurement environment such as the temperature of the measurement object and the measurement device and the state of the power supplied to the measurement device. Measurement results may vary. For this reason, when the measurement process for one measurement target is performed multiple times, the measurement environment for each measurement process may be different, and the measurement result for each measurement process may vary. As a result, in the test apparatus and test method disclosed in the above-mentioned patent documents, the fluctuation range of the measurement result is a prescribed value due to the change in the measurement environment even though the “rear short failure” does not actually occur. There is a possibility that it may be misjudged that the “rear short failure” has occurred.

  In this case, instead of the determination based on the fluctuation range of the measurement result in a plurality of measurement processes, a “rear short failure” occurs based on the difference between the measurement result and the reference value as in the “coil turn number failure” test method. If the measurement environment is different between the time of measurement processing for acquiring the reference value and the time of measurement processing for the measurement target of the quality determination target even when it is determined whether or not the measurement result is different There is a possibility that the presence or absence of the “rear short defect” may be erroneously determined.

  Moreover, in the above-mentioned test (measurement) by this kind of apparatus and method, even if it is the same kind of measurement object (same kind of measurement coil etc.), the measurement result is slightly different for each individual Therefore, in order to obtain a reference value in consideration of these variations, it is necessary to execute a plurality of measurement processes on a plurality of non-defective measurement targets to specify the optimum value. In this case, the difference between the measurement results caused by whether or not a defect occurs in one individual (one of the measurement targets) is the magnitude of the variation of the measurement results due to the individual differences among the plurality of non-defective measurement targets. It may be as good as or even more than that. For this reason, it becomes difficult to obtain the reference value that can accurately determine the quality.

  The present invention has been made in view of such problems, and provides a data processing apparatus and a data processing program capable of providing data capable of accurately determining the quality of a measurement target without separately performing processing for acquiring a reference value. The main object of the present invention is to provide a measurement system configured to include such a data processing apparatus.

  In order to achieve the above object, according to a first aspect of the present invention, there is provided a data processing apparatus comprising: It is a data processor provided with a processing part which generates data for discharge existence specification for specifying whether a ingredient is contained, and the above-mentioned processing part is whether the above-mentioned discharge waveform ingredient is contained. Based on the waveform data, measurement value range data of a specific reference measurement value range and comparison value data capable of specifying whether the discharge waveform component is included by comparison with the measurement value range are generated. And generating the discharge presence / absence identification data including the generated measurement value range data and the comparison value data.

  The data processing apparatus according to claim 2 is the data processing apparatus according to claim 1, wherein the processing unit performs continuous N sampling (where N is a predetermined number) from among the measurement values of the waveform data. A first process of extracting a first value whose amount of change of the above natural number is equal to or more than a predetermined amount to generate first data, and measuring each of the measured values of the waveform data as a target A second process of generating second data by respectively replacing the measured values of successive M samplings (M is a predetermined natural number of 2 or more) including the values with a second averaged value A third value is generated by extracting a third value in which the amount of change in the successive N samplings is equal to or more than the predetermined amount from the second values of the second data; 3 and each of the third of the third data. Processing for generating a fourth data by calculating a fourth value obtained by converting the absolute value into a second value, and each of the measured values of the waveform data including the measured value of L is a value obtained by replacing the measurement value of two or more predefined natural numbers with an averaged value and calculating a fifth value obtained by differentiating the measurement value after replacement to generate fifth data A sixth process of generating sixth data by calculating a sixth value obtained by differentiating each of the fifth values of the fifth data, and the sixth process of each of the sixth data. A seventh process of generating seventh data by calculating a seventh value obtained by normalizing an absolute value of the first value, and an eighth process of calculating the first values of the first data in an absolute value And an eighth process for computing eighth values by calculating values, and either the vertical axis or the horizontal axis of the two-dimensional graph, which has been previously defined. And each of the fourth values of the fourth data is associated with one of the seventh data corresponding to the sampling timing of each fourth value in the other of the vertical axis and the horizontal axis of the two-dimensional graph. Ninth processing in which the seventh values are made to correspond to one another and the first corresponding points of the fourth value and the seventh value are plotted on the two-dimensional graph, and the longitudinal direction of the two-dimensional graph Each of the eighth values of the eighth data is made correspond to any one of the axis and the horizontal axis, and the other of the vertical axis and the horizontal axis of the two-dimensional graph When the seventh values of the seventh data corresponding to the sampling timing are made correspond to each other, and the eighth corresponding value and the second corresponding point of the seventh value are plotted on the two-dimensional graph, respectively. To the measured value of the discharge waveform component At least one of a first determination area in which the corresponding second corresponding point is not plotted, and a second determination area in which the second corresponding point corresponding to the measured value of the discharge waveform component is plotted. Performing a tenth process of defining the measurement value range on the two-dimensional graph in accordance with an area defining procedure defined in advance based on the arrangement of the first corresponding points on the two-dimensional graph; Region data capable of specifying the at least one region defined by the tenth process is used as the measurement value range data, and the seventh data and the eighth data are used as the comparison value data for determining the presence or absence of discharge Generate data.

  Further, in the data processing apparatus according to claim 3, in the data processing apparatus according to claim 2, the processing unit is an absolute value of each of the fifth values of the fifth data prior to the ninth process. Is calculated so that the maximum value becomes 1 and the ninth value is generated to generate ninth data, and the coefficient Ka (Ka is previously determined for each ninth value of the ninth data). Of the seventh value of the seventh data corresponding to the sampling timing of the respective ninth value, and the new seventh value An eleventh process is performed to generate new seventh data as a value.

  The data processing apparatus according to claim 4 is the data processing apparatus according to claim 2, wherein the processing unit targets each of the seventh values of the seventh data prior to the ninth process. The (Ja + 1) number of the seventh values from the seventh value before the Ja sampling (Ja is an arbitrary predetermined natural number) to the seventh value of the target with respect to the seventh value of And the (Jb + 1) number of the seventh values from the seventh value of the object to the seventh value after Jb sampling (Jb is an arbitrary predetermined natural number) with respect to the seventh value of the object The new seventh data is replaced with the maximum value among the seventh values of Jc (Jc is a natural number of 2 or more predetermined in advance) defined in advance including at least one of the values of 7 Execute the 12th process to generate.

  Further, in the data processing apparatus according to claim 5, in the data processing apparatus according to claim 2, the processing unit selects one of the seventh values of the seventh data prior to the ninth process. The seventh value smaller than the seventh value before I sampling (I is an arbitrary predetermined natural number), and the seventh value smaller than the seventh value before I sampling The seventh value before the I sampling is replaced by the larger one of the tenth value obtained by multiplying the seventh value before the I sampling by the coefficient Kb (Kb is a positive number less than or equal to 1 specified in advance) The thirteenth process to generate is executed.

  Furthermore, in the data processing apparatus according to claim 6, in the data processing apparatus according to any one of claims 2 to 5, the processing unit is configured to receive each of the seventh data before the ninth processing. The seventh value corresponding to the measured value sampled later than the measured value corresponding to the maximum value among the values of 7 before Ha sampling with respect to the seventh value of interest (Ha is The seventh value of the predetermined arbitrary natural number) includes the seventh value of the target, and the seventh value of the consecutive Hb samplings (Hb is a predetermined natural number of 2 or more) When the average value is equal to or less than an eleventh value obtained by multiplying the coefficient Kc (Kc is an arbitrary predetermined positive number), the seventh value of the object, and the seventh value before the Ha sampling Coefficient Kd (Kd is greater than There substituting one predefined arbitrary positive number) smaller one of the first 12 values of multiplied by which to perform the fourteenth process of generating a new said seventh data.

  In the data processing apparatus according to claim 7, in the data processing apparatus according to claim 6, in the fourteenth process, the processing unit is configured such that a seventh value before the Ha sampling corresponds to the Hb sampling. When the value obtained by averaging the seventh value is smaller than the thirteenth value obtained by multiplying the coefficient Ke (Ke is an arbitrary positive number defined in advance), the seventh value of the object is set to the thirteenth value. Replace with value.

  The data processing apparatus according to claim 8 is the data processing apparatus according to any one of claims 2 to 7, wherein the processing unit is configured to execute each of the seventh data in advance of the ninth processing. The seventh value corresponding to the measurement value sampled before the measurement value corresponding to the maximum value among the seven values, the seventh value of the object, and the seventh value of the object And the 14th value obtained by multiplying the seventh value before Hc sampling (Hc is any predetermined natural number) by the coefficient Kf (Ke is any predetermined predetermined positive number). A fifteenth process is performed to generate new ones of the seventh data by replacing them with one or the other.

  In the data processing apparatus according to claim 9, in the data processing apparatus according to claim 8, in the fifteenth process, the processing unit is configured to receive both the seventh value and the fourteenth value of the object. The coefficient Kg (Kg is defined in advance as a value obtained by averaging the seventh value of consecutive Hd samplings (Hd is a predetermined natural number of 2 or more) including the seventh value of the object) And the seventh value of the target is replaced with the fifteenth value when it is smaller than the fifteenth value multiplied by any positive number).

  The data processing apparatus according to claim 10 is the data processing apparatus according to any one of claims 2 to 9, wherein the processing unit passes the origin of the two-dimensional graph in the tenth process. The regression line of each first corresponding point is specified, and when the other value of the vertical axis and the horizontal axis of the two-dimensional graph in the specified regression line is 1, the vertical axis and horizontal axis of the two-dimensional graph One of the previously defined ones is specified as the sixteenth value, and the origin of the two-dimensional graph, the one previously defined one is the sixteenth value, and the other is one. A triangular area having three points of the first point and the second point of which one of the predefined values is 0 and the other value is 1 is specified, and the specified triangular area is specified. Define the at least one region

  The data processing apparatus according to claim 11 is the data processing apparatus according to claim 10, wherein the processing unit is configured to set one of the vertical axis and the horizontal axis of the two-dimensional graph to one of which is defined in advance. And each seventh value of the seventh data corresponding to the sampling timing of each first value to the other of the vertical axis and the horizontal axis of the two-dimensional graph. The values are made to correspond, and the third corresponding point of the first value and the seventh value is plotted on the two-dimensional graph, and the other values of the vertical axis and the horizontal axis are “0.5”. The third corresponding point which is equal to or less than the following seventeenth predefined value is extracted, and one of the predetermined one of the vertical axis and the horizontal axis at each of the extracted third corresponding points Standard deviation nσ (n is predefined A natural number), and the origin, the first point, and the one of the predetermined values are the sum of the standard deviation nσ and the sixteenth value, and the other value is the third one. And the first rectangular area having the four points of the fourth point of which the other value is 0 with the standard deviation nσ and the predetermined one of the predetermined points as the apex, and the specified first The at least one region is defined based on the rectangular region and the triangular region.

  The data processing apparatus according to claim 12 is the data processing apparatus according to any one of claims 2 to 9, wherein the processing unit includes all the first corresponding points in the tenth process. In addition to specifying the smallest rectangular area to be formed, the at least one area is defined based on the specified rectangular area.

  The data processing apparatus according to claim 13 is the data processing apparatus according to any one of claims 2 to 12, wherein the processing unit determines the second corresponding point and the second corresponding point based on the discharge presence / absence identification data. A determination process is performed to determine the positional relationship with at least one of the regions and determine whether the discharge waveform component is included in the signal waveform of the waveform data, and determination that can determine the determination result of the determination process Generate result data.

  The data processing apparatus according to claim 14 is the data processing apparatus according to claim 13, wherein the processing unit counts the total number of the second corresponding points when the first determination area is the at least one area. Specifying the proportion of the second corresponding point not included in the first determination area that occupies the area and occupying the total number of the second corresponding points when the second determination area is the at least one area The ratio of the second corresponding point included in the second determination area is specified, and when the specified ratio is equal to or more than the predetermined ratio, the notification process defined in advance is executed.

  Further, in the data processing apparatus according to claim 15, in the data processing apparatus according to claim 13, the processing unit is configured to obtain Ga pieces of Ga in the other direction of the vertical axis and the horizontal axis of the two-dimensional graph The Ga second rectangular areas divided into two or more defined natural numbers are specified, and when the first judgment area is the at least one area, the second judgment area is the area other than the first judgment area. While specifying the number of the second rectangular areas including the two corresponding points, and setting the second determination area as the at least one area, the second corresponding points in the second determination area And identifying the number of the second rectangular areas including the information, and when the identified number is greater than or equal to a predetermined number, execute a predetermined notification process.

  The data processing apparatus according to claim 16 is the data processing apparatus according to any one of claims 13 to 15, wherein the processing unit plots the second corresponding point and the two-dimensional graph and the at least one. And displaying the area indicating the area on the display unit together with the determination result of the determination process.

  The measurement system according to claim 17 outputs the waveform data by executing the measurement with the data processing apparatus according to any one of claims 1 to 16 and the predetermined sampling period for the measurement object. And a measuring device.

  In the data processing program according to claim 18, a discharge waveform component is included in the signal waveform of the waveform data based on the waveform data in which a plurality of measured values measured in a predetermined sampling cycle are recorded. A program for data processing that causes the processing unit of the data processing apparatus to execute processing for generating discharge presence / absence identification data for identifying whether the discharge waveform component is contained or not. Based on the waveform data, measurement value range data of a reference measurement value range and comparison value data capable of specifying whether or not the discharge waveform component is included by comparison with the measurement value range is generated on the basis of the waveform data. The processing unit is caused to execute the processing of generating the discharge presence / absence specification data including the generated measurement value range data and the comparison value data.

  In the data processing program according to claim 19, in the data processing program according to claim 18, consecutive N samplings (N is a predetermined number of 2 or more among the measurement values of the waveform data). A first process of extracting a first value whose amount of change of the natural number is a predetermined amount or more to generate first data, and the respective measured values of the waveform data as the target measured values A second process of generating second data by respectively replacing the measured values of successive M samplings (M is a predetermined natural number of 2 or more) including the second to the second averaged values; A third value is generated by extracting a third value in which the amount of change in the consecutive N samplings is equal to or more than the predetermined amount from the second values of the second data. Processing of the third data A fourth process of generating a fourth data by calculating a fourth value obtained by converting each of the third values into an absolute value, and each of the measured values of the waveform data including the measured value of interest A fifth value is calculated by replacing the measured value of consecutive L samplings (L is a predetermined natural number of 2 or more natural numbers) with an averaged value and calculating a fifth value obtained by differentiating the measured value after replacement. A fifth process of generating data, a sixth process of generating sixth data by calculating a sixth value obtained by differentiating each of the fifth values of the fifth data, and the sixth process A seventh process of generating seventh data by calculating a seventh value obtained by normalizing the absolute value of each of the sixth values of data to generate seventh data; and absolute value of each first value of the first data An eighth process of computing eighth value which has been digitized to generate eighth data, and either of the vertical axis and the horizontal axis of the two-dimensional graph The seventh corresponding to each of the predetermined values and the fourth value of the fourth data corresponding to the other of the vertical axis and the horizontal axis of the two-dimensional graph. And the second process of plotting the fourth values and the first corresponding points of the seventh values on the two-dimensional graph in correspondence with the respective seventh values of the data of And each of the eighth values of the eighth data is associated with one of the predetermined vertical axis and horizontal axis of the second data, The seventh value of the seventh data corresponding to the sampling timing of the second value, and the second corresponding point of the eighth value and the seventh value are plotted on the two-dimensional graph, respectively. Before the discharge waveform component when At least a first determination area in which the second corresponding point corresponding to the measured value is not plotted, and at least a second determination area in which the second corresponding point corresponding to the measured value of the discharge waveform component is plotted A tenth process of defining one area as the measurement value range on the two-dimensional graph in accordance with an area defining procedure defined in advance based on the arrangement of the first corresponding points on the two-dimensional graph Region data capable of being executed by the processing unit and capable of specifying the at least one region defined by the tenth processing is the measurement value range data, and the seventh data and the eighth data are the data The processing unit is caused to execute processing for generating the discharge presence / absence identification data as comparison value data.

  Furthermore, in the data processing program according to claim 20, in the data processing program according to claim 19, whether the second corresponding point is included in the at least one region based on the discharge presence / absence identification data Determination processing for determining whether or not the discharge waveform component is included in the signal waveform of the waveform data, and determining processing for generating determination result data capable of specifying the determination result of the determination processing. Have the processing unit execute it.

  In the data processing apparatus according to claim 1, the discharge waveform is obtained by comparing measured value range data of the measured value range serving as a reference for determining whether the discharge waveform component is included in the data processing unit and the measured value range data. Based on the waveform data, comparison value data capable of specifying whether or not a component is included is generated, and the generated measurement value range data and comparison value data are included to generate discharge presence / absence identification data. Specifically, for example, in the data processing apparatus according to claim 2, the processing unit sequentially executes each processing from the first processing to the tenth processing using the waveform data, and is defined by the tenth processing. Region data capable of specifying at least one of the first determination region and the second determination region as the measured value range is determined as the measured value range data, and seventh data generated by the seventh process, and The eighth data generated by the process of 8 is used as comparison value data to generate discharge presence / absence identification data. The data processing program according to claims 18 and 19 causes the processing unit of the data processing apparatus to execute the above-described respective processing.

  Therefore, according to the data processing device of claims 1 and 2 and the data processing program of claims 18 and 19, it is determined whether or not the discharge waveform component is present based on one waveform data acquired for the measurement object. The discharge waveform component exists by the comparison of the area data (measurement value range data) for determining whether there is a judgment area (the first determination area and / or the second determination area: the measurement value range) of the area data It is possible to generate seventh data and eighth data (comparison value data) whose determination can be made. For this reason, since the measurement process of multiple times becomes unnecessary and the influence of the individual difference about several measurement objects and the influence of the dispersion of the measured value resulting from the difference of the measurement environment for every measurement process are not received, it is a discharge phenomenon. In addition to sufficiently improving the determination accuracy as to whether or not a problem has occurred, there is no need to separately perform processing for generating a reference value (threshold value) for determination, and therefore, the burden on the user is sufficient. It can be reduced.

  The data processing apparatus according to claim 3, wherein the processing unit normalizes the absolute value of each fifth value of the fifth data so that the maximum value becomes 1 prior to the ninth process. To generate ninth data, each value of each ninth value of the ninth data multiplied by the coefficient Ka, and each of the seventh data corresponding to the sampling timing of each ninth value An eleventh process is performed to generate new seventh data by setting one of the values of 7 and the larger one as the new seventh value.

  Further, in the data processing device according to claim 4, the processing unit, prior to the ninth processing, sets each seventh value of the seventh data to a seventh value before the Ja sampling with respect to the target seventh value. (Jb + 1) seventh values from a value of 1 to a seventh value of interest, and (Jb + 1) from a seventh value of interest to a seventh value after Jb sampling with respect to the seventh value of interest And performing a twelfth process of generating new seventh data by replacing the maximum value among the predefined Jc seventh values including at least one of the seventh values.

  Further, in the data processing device according to claim 5, the processing unit, prior to the ninth processing, selects, among the seventh values of the seventh data, a seventh value smaller than the seventh value before I sampling. The value is replaced with the seventh value smaller than the seventh value before I sampling or the tenth value obtained by multiplying the seventh value before I sampling by the coefficient Kb, and a new seventh A thirteenth process is performed to generate 7 data.

  Therefore, according to the data processing apparatus of claims 3 to 5 and the data processing program for executing such processing, the number of singular points at which the seventh value becomes close to "0" is sufficiently reduced. As a result, it is possible to define a first determination area and / or a second determination area which can determine the presence or absence of the discharge waveform component with higher accuracy, and based on the discharge presence / absence specification data. When determining the presence or absence of the discharge waveform component, it is possible to determine the presence or absence of the discharge waveform component with higher accuracy by plotting the second corresponding point on the two-dimensional graph based on the new seventh data. It becomes.

  7. The data processing apparatus according to claim 6, wherein the processing unit, prior to the ninth processing, uses the measured value sampled after the measured value corresponding to the maximum value among the seventh values of the seventh data. The corresponding seventh value is obtained by averaging the seventh value of consecutive Hb samplings with the seventh value before Ha sampling with respect to the seventh value of interest including the seventh value of interest If the value is equal to or less than an eleventh value obtained by multiplying the coefficient Kc, either the seventh value of interest or the twelfth value obtained by multiplying the seventh value before Ha sampling by the predetermined coefficient Kd A fourteenth process is performed to generate new seventh data by replacing the smaller one.

  Therefore, according to the data processing apparatus according to claim 6, and the data processing program for executing such processing, when the waveform data in which the rate of change of the measured value gradually decreases is targeted, the rate of change is decreased. It is possible to set a change state in which the seventh value suddenly changes to a large value disproportionately to the degree of change, as an appropriate change state according to the degree of decrease in the change rate. The first determination area and / or the second determination area which can determine the presence or absence of the discharge with higher accuracy can be defined, and when determining the presence or absence of the discharge waveform component based on the discharge presence / absence specification data, By plotting the second corresponding points on the two-dimensional graph based on the new seventh data, the presence or absence of the discharge waveform component can be determined with higher accuracy.

  The data processing apparatus according to claim 7, wherein the processing unit is configured such that in the fourteenth process, the seventh value before Ha sampling is a value obtained by averaging the seventh value of Hb samplings and the coefficient Ke. When the value is smaller than 13, the seventh value of interest is replaced with the thirteenth value. Therefore, according to the data processing apparatus of the seventh aspect and the data processing program for executing such processing, the change state of the seventh value can be made more preferable.

  The data processing apparatus according to claim 8, wherein the processing unit is a measurement value sampled prior to the measurement value corresponding to the maximum value among the seventh values of the seventh data prior to the ninth process. Of the seventh value corresponding to the target, or the fourteenth value obtained by multiplying the seventh value before Hc sampling by the factor Kf with respect to the seventh value of the target To execute the fifteenth process for generating new seventh data.

  Therefore, according to the data processing apparatus according to claim 8 and the data processing program for executing such processing, the seventh value is used when the waveform data whose change rate of the measured value is gradually increased is targeted. The first determination area and / or the second determination can sufficiently reduce the number of singular points at which the value is close to “0”, whereby the presence or absence of the discharge waveform component can be determined with higher accuracy. A region can be defined, and the second corresponding point is plotted on the two-dimensional graph based on the new seventh data when determining the presence or absence of the discharge waveform component based on the discharge presence / absence specification data. Thus, the presence or absence of the discharge waveform component can be determined with higher accuracy.

  10. The data processing apparatus according to claim 9, wherein in the fifteenth process, the processing unit includes, in the fifteenth process, both the seventh value and the fourteenth value of the target including the seventh value of the target and a continuous Hd sampling portion. The seventh value of interest is replaced with the fifteenth value when the seventh value is smaller than the fifteenth value obtained by multiplying the coefficient Kg by the averaged value. Therefore, according to the data processing apparatus according to claim 9 and the data processing program for executing such processing, it is possible to further reduce the number of singular points at which the seventh value becomes a value close to “0”. it can.

  In the data processing apparatus according to claim 10, in the tenth processing, the processing unit identifies a regression line of each first corresponding point passing through the origin of the two-dimensional graph, and the two-dimensional graph in the identified regression line One of the previously defined one of the vertical and horizontal axes of the two-dimensional graph when the other one of the vertical and horizontal axes is 1 is specified as the sixteenth value, and the origin of the two-dimensional graph, One point defined as one of the predefined values is a sixteenth value, and the other value is a first point having a value of 1, and the other predefined value having a value of 0 and a second value having the other value having one vertex While specifying the triangular area to be made, at least one area is defined based on the specified triangular area.

  Therefore, according to the data processing apparatus according to claim 10 and the data processing program for executing such processing, it is very possible that the second corresponding point corresponding to the value of the discharge waveform component is plotted with extremely low probability. An area can be identified reliably and easily, and based on this triangular area, the first determination area and / or the second determination area can be easily identified to generate area data.

  The data processing apparatus according to claim 11, wherein the processing unit associates each of the first values of the first data with one of predetermined one of the vertical axis and the horizontal axis of the two-dimensional graph in advance and Each seventh value of the seventh data corresponding to the sampling timing of each first value corresponds to the other of the vertical axis and the horizontal axis, and the third corresponding point of the first value and the seventh value is 2 The third corresponding points which are plotted on the dimensional graph, respectively, and in which the other values of the vertical axis and the horizontal axis are equal to or less than a predefined seventeenth value equal to or less than “0.5” are extracted and extracted The standard deviation nσ of one of predetermined values of the vertical axis and the horizontal axis at the corresponding points of 3 is calculated, and the origin, the first point, and one of the predetermined values are the standard deviation nσ and the 16th standard deviation. And a third point whose other value is 1 in addition to the value of Specify a first rectangular area having four points of the fourth point whose standard value nσ and the other value is 0 as vertices, and based on the specified first rectangular area and triangular area, at least one of them Define the area.

  Therefore, according to the data processing apparatus of claim 11, and the data processing program for executing such processing, the first determination area and / or the second determination area is determined based on the specified first rectangular area and triangle area. Of the first determination area and / or the second determination area that can easily determine whether the signal waveform of the waveform data includes the discharge waveform component with high accuracy. Data can be easily generated.

  The data processing apparatus according to claim 12, wherein the processing unit identifies, in the tenth process, the smallest rectangular area including all the first corresponding points, and at least one of the areas based on the identified rectangular area. To define. Therefore, according to the data processing apparatus of claim 12, and the data processing program for executing such processing, the area data of the first judgment area and / or the second judgment area can be obtained by very simple processing. Can be generated.

  The data processing apparatus according to claim 13, wherein the processing unit identifies the positional relationship between the second corresponding point and at least one of the regions based on the discharge presence / absence identification data, and the discharge waveform component is a signal waveform of waveform data. A determination process is performed to determine whether or not it is included, and determination result data capable of specifying the determination result of the determination process is generated. The data processing program according to claim 20 causes the processing unit of the data processing apparatus to execute the above processing.

  Therefore, according to the data processing device of claim 13 and the data processing program of claim 20, a plurality of measurement processes become unnecessary, and the influence of individual differences on a plurality of measurement targets, or each measurement process Since the influence of variations in measured values due to the difference in measurement environment is eliminated, it is possible to sufficiently improve the determination accuracy as to whether or not the discharge phenomenon has occurred. Further, unlike determination based on comparison with a reference value (threshold value), it is possible to avoid erroneous determination due to the influence of a change in measurement environment and sufficiently improve the determination accuracy.

  The data processing apparatus according to claim 14, wherein, when the processing unit sets the first determination area as at least one area, a second corresponding point not included in the first determination area occupied in the total number of second corresponding points. The second determination area is specified as the ratio of the second corresponding point to the total number of the second corresponding points when the second determination area is at least one of the areas. When the ratio is equal to or more than a predetermined ratio, the predetermined notification process is performed.

  Further, in the data processing device according to claim 15, the processing unit specifies Ga second rectangular regions obtained by dividing the two-dimensional graph into Ga in the other direction of the vertical axis and the horizontal axis, and When the determination area is at least one of the areas, the number of second rectangular areas whose second corresponding points are included in areas other than the first determination area is specified, and the second determination area is at least one of the areas. When making it an area, the number of second rectangular areas in which the second corresponding area is included in the second determination area is specified, and when the specified number is a predetermined number or more, the notification specified in advance Execute the process

  Therefore, according to the data processing apparatus of claims 14 and 15 and a data processing program for executing such processing, it is possible to reliably determine whether the signal waveform of the waveform data includes a discharge waveform component. And it can be easily recognized.

  In the data processing apparatus according to claim 16, the processing unit causes the display unit to display the two-dimensional graph in which the second corresponding points are plotted and the area display indicating at least one of the areas along with the determination result of the determination process. Therefore, according to the data processing apparatus of claim 16 and the data processing program for executing such processing, it is possible to more reliably determine whether or not the signal waveform of the waveform data contains a discharge waveform component. It can be more easily recognized.

  In the measurement system according to claim 17, a data processing apparatus according to any one of claims 2 to 16, and a measurement apparatus which executes measurement in a predetermined sampling cycle for a measurement object and outputs waveform data. It is configured with. Therefore, according to the measurement system of claim 17, a series of processes from acquisition (generation) of waveform data to generation of discharge determination data (or generation of discharge determination data and determination result data) Can run on one system.

FIG. 1 is a block diagram showing the configuration of a measurement system 1; FIG. 6 is a signal waveform diagram showing an example of a waveform W0 of waveform data D0 output from the measuring device 2. It is a signal waveform diagram which shows an example of waveform W1 of waveform data D1. It is a signal waveform diagram which shows an example of waveform W0 of waveform data D0, and waveform W2 of waveform data D2. It is a signal waveform diagram which shows an example of waveform W3 of waveform data D3. It is a signal waveform diagram which shows an example of waveform W4 of waveform data D4. FIG. 6 is a signal waveform diagram showing an example of a waveform W0 of waveform data D0 and a waveform W0f of waveform data D0f. It is a signal waveform diagram which shows an example of waveform W5 of waveform data D5. It is a signal waveform diagram which shows an example of waveform W6 of waveform data D6. It is a signal waveform diagram which shows an example of waveform W7 of waveform data D7. It is a signal waveform diagram which shows an example of waveform W8 of waveform data D8. It is a signal waveform diagram which shows an example of waveform W9 of waveform data D9. It is a signal waveform diagram showing an example of a waveform W9a of a value generated based on the value of the waveform data D9, a waveform W7 of the waveform data D7, and a waveform W7a of a value extracted from each value of the waveform data D9a, D7. It is a signal waveform diagram which shows an example of waveform W9 of waveform data D9, waveform W7 of waveform data D7, and waveform W7b of the value extracted from each value of waveform data D9 and D7. It is a signal waveform diagram which shows an example of waveform W7c of new waveform data D7. It is a signal waveform diagram which shows an example of waveform W7d of new waveform data D7. It is a signal waveform diagram which shows an example of waveform W7e of waveform data D7 before a process, and waveform W7f of new waveform data D7. It is a figure which shows an example of the two-dimensional graph which plotted the "1st corresponding point" of the value of waveform data D4, and the value of waveform data D7. It is a figure which shows an example of the two-dimensional graph which plotted the "2nd corresponding point" of the value of waveform data D8, and the value of waveform data D7. It is a figure which shows another example of the two-dimensional graph which plotted the "2nd corresponding point" of the value of waveform data D8, and the value of waveform data D7. It is a figure which shows an example of the relationship of waveform Wa which shows the threshold value whether each value of waveform W0 of waveform data D0, W1 of waveform data D1, and waveform data D1 is a discharge waveform component. FIG. 7 is an explanatory diagram for describing a method of defining the determination areas Aa and Ab and the relationship between the defined determination areas Aa and Ab and the “first corresponding point” and the “second corresponding point”. FIG. 14 is another explanatory view for describing a method of defining the determination areas Aa and Ab and a relationship between the defined determination areas Aa and Ab and the “first corresponding point” and the “second corresponding point”. It is a figure which shows another example of the two-dimensional graph which plotted the value of waveform data D1, and the corresponding point of the value of waveform data D7. FIG. 8 is an explanatory diagram for describing a method of defining the determination areas Ac and Ad, and the relationship between the defined determination areas Ac and Ad, and “first corresponding points” and “second corresponding points”. FIG. 18 is an explanatory diagram for describing a relationship between “the second corresponding point” of the values of the waveform data D8 and the values of the waveform data D7 plotted on the two-dimensional graph, the determination regions Aa and Ab, and the rectangular regions A10 to A19. .

  Hereinafter, embodiments of a data processing apparatus, a measurement system, and a program for data processing will be described with reference to the attached drawings.

  First, the configuration of the measurement system 1 will be described. The measurement system 1 shown in FIG. 1 inspects the quality of the inspection object (measurement object) X based on the “measurement system” having the “measurement device” and the “data processing device” and the “discharge presence / absence identification data” described later. The “impulse test system” is configured to include the “test device” to be performed, and is configured to include the measurement device 2 and the data processing device 3. In this case, the inspection object X is an example of the “object to be measured”, and in this example, an example in which various processes are performed with the winding component (coil) as the inspection object X will be described.

  The measuring device 2 corresponds to a “measuring device”, and as an example, is configured to be able to execute various types of measurement processing for the inspection target X under the control of the data processing device 3. Specifically, the measurement apparatus 2 includes a measurement signal generation unit 11, an A / D conversion unit 12, a processing unit 13, a storage unit 14, and the like. The measurement signal generation unit 11 applies an impulse voltage as a measurement signal across the inspection target X according to the control of the processing unit 13. As an example, the A / D conversion unit 12 performs A / D conversion (sampling on the current value of the current flowing through the measurement target in a specified cycle (“predetermined sampling cycle: measurement cycle”) under the control of the processing unit 13 : Measurement) and the measured value Ds (sampling value: an example of “measured value”) is sequentially output to the processing unit 13. It is also possible to adopt a configuration in which the measurement value Ds is output by A / D conversion (sampling: measurement) of the voltage value across the measuring object at a designated cycle, instead of sampling of the current value.

  The processing unit 13 controls the measuring device 2 generally. Specifically, the processing unit 13 controls the measurement signal generation unit 11 to apply an impulse voltage to the measurement target, and controls the A / D conversion unit 12 to perform A / D conversion of the current value at an arbitrary cycle. Execute processing (sampling processing). Further, the processing unit 13 stores the measurement value Ds output from the A / D conversion unit 12 in the storage unit 14, and generates waveform data D0 (an example of “waveform data”) based on the measurement value Ds. The generated waveform data D 0 is output to the data processing device 3 while being stored in the storage unit 14. The storage unit 14 stores an operation program of the processing unit 13 and the measurement value Ds (waveform data D0) described above. The actual measuring device 2 is configured to include various operation switches for instructing the operating conditions of the measuring device 2, and a display unit for displaying a setting screen of the measuring conditions and a display screen of the measured values. However, illustration and description of these will be omitted.

  On the other hand, the data processing device 3 corresponds to a “data processing device”, and as described later, the inspection data Dc for inspecting the inspection object X based on the waveform data D0 acquired from the measurement device 2 (“waveform An example of “the discharge presence / absence specification data” for specifying whether or not the discharge waveform component is included in the signal waveform of the data is generated. Further, the data processing device 3 corresponds to an “inspection device”, and inspects the quality of the inspection object X based on the generated inspection data Dc. In this case, in the measurement system 1 of this example, as an example, the data processing program Dp corresponding to the “data processing program” is installed in the existing personal computer, and the data processing device 3 is configured.

  Specifically, the data processing device 3 includes an operation unit 21, a display unit 22, a processing unit 23, and a storage unit 24. The operation unit 21 includes a keyboard and a pointing device such as a mouse and a touch panel (not shown), and outputs an operation signal corresponding to an operation on these to the processing unit 23. The display unit 22 is an example of the “display unit”, and displays various display screens indicating measurement results and inspection results (results of the quality determination) according to the control of the processing unit 23.

  The processing unit 23 is an example of a “processing unit”, and controls the data processing device 3 in a comprehensive manner. Specifically, the processing unit 23 controls the measuring device 2 to execute the measuring process on the inspection object X in accordance with the data processing program Dp as described later, and the waveform output from the measuring device 2 A data generation process is performed to generate inspection data Dc based on data D0. Further, the processing unit 23 generates inspection result data Dr by executing an inspection process (a judgment process of quality) in which the quality of the inspection object X is inspected based on the inspection data Dc according to the data processing program Dp.

  The storage unit 24 stores a data processing program Dp (data of an operation program of the processing unit 23), waveform data D0 output from the measurement system 1, and various data generated by the processing unit 23.

  Next, the inspection method of the inspection object X by the measurement system 1 will be described with reference to the attached drawings. It is assumed that the work of installing the data processing program Dp in the data processing device 3 and the work of connecting the measuring device 2 and the data processing device 3 have already been completed.

  At the time of inspection of the inspection object X, first, measurement processing by the measuring device 2 on the inspection object X is executed. Specifically, the inspection target X is connected to the measurement device 2 and the operation unit 21 of the data processing device 3 is operated to instruct start of the measurement process. In response to this, the processing unit 23 controls the measuring device 2 according to the data processing program Dp to start the measurement process on the inspection object X.

  At this time, in the measuring device 2, the processing unit 13 first controls the A / D conversion unit 12 to sample (measure) the current value at the sampling cycle instructed from the data processing device 3 (processing unit 23). To start. Thereby, the measurement value Ds (current value of the current flowing through the inspection object X) of the inspection object X is sequentially output from the A / D conversion unit 12 and stored in the storage unit 14. Further, the processing unit 13 controls the measurement signal generation unit 11 to apply an impulse voltage to the inspection object X. At this time, the measured value Ds (current value) of the current flowing through the inspection object X changes as shown by a waveform W0 (an example of “a signal waveform of waveform data”) shown in FIG.

  Next, as an example, when the time indicated by the processing unit 23 has passed from the time immediately before the application of the impulse voltage to the inspection object X is started, the processing unit 13 executes the A / D conversion unit 12 within this time. Are recorded to generate waveform data D0, and the generated waveform data D0 is stored in the storage unit 14. Further, the processing unit 13 outputs the generated waveform data D0 to the data processing device 3. Further, in the data processing device 3, the processing unit 23 stores the waveform data D 0 output from the measuring device 2 in the storage unit 24 in association with the inspection target X. This completes the measurement process for the inspection object X.

  On the other hand, in the data processing device 3, when the acquisition of the waveform data D0 is completed, the processing unit 23 follows the data processing program Dp, and uses the inspection data Dc for inspecting whether the inspection object X is good or defective. Start the "data generation process" to generate.

  In the “data generation process”, the processing unit 23 first measures the measured value (“the first value or more”) by which the amount of change in consecutive N samplings from among the measured values Ds of the waveform data D0 is predetermined. “One example” of “1.” is extracted to generate the waveform data D1 (one example of “first data”). Specifically, as an example, the processing unit 23 performs a filtering process using a high-pass filter, a one-dimensional Laplacian filter, or the like, and the amount of change in N = 2 samplings continuously from among the measured values Ds of the waveform data D0. Extract a measured value Ds exceeding a prescribed amount to generate waveform data D1. Thereby, as shown by the waveform W1 shown in FIG. 3, the waveform of the abrupt change corresponding to the component of the discharge phenomenon generated in the inspection object X at the time of generation of the waveform data D0 (at the time of measurement processing) The measured values of the components are acquired as waveform data D1, and the "first process" is completed.

  In addition, the processing unit 23 sets each measurement value Ds of the waveform data D0 to a value (an example of a “second value”) obtained by averaging the measurement values Ds for M continuous samples including the measurement value Ds of interest. A “second process” is performed to generate waveform data D2 (an example of “second data”) by replacing each. Specifically, as an example, the processing unit 23 sets the measurement value Ds of the nth sample among the measurement values Ds of the waveform data D0 as the measurement value Dsn, and sets the value of “M” to “3”. When specified, the sum of the measurement value Ds (n-1) before one sampling of the measurement value Dsn, the measurement value Ds (n + 1) after one sampling of the measurement value Dsn, and the measurement value Dsn is “M = The waveform data D2 is generated by calculating the value divided by 3 "(the average value of measured values Ds for three consecutive samplings) as the" second value ".

  Thereby, as shown by a waveform W2 indicated by a broken line in FIG. 4, in the waveform data D0, the steep change corresponding to the component of the discharge phenomenon or the component such as large noise extracted in the above "first processing" The waveform data D2 of the measurement value in which the influence of the waveform component is sufficiently reduced is generated, and the "second processing" is completed. In the same figure, in order to facilitate understanding of the "second process", part of the time axis direction of the waveform W0 shown in FIG. 2 is enlarged, and calculation is performed based on the measured value Ds of the waveform W0. The waveform W2 of the desired value is shown superimposed on the waveform W0. Further, the “second process” is not limited to the process of obtaining the three-point average value of M = 3 as in the above example, but is a process of obtaining the average value of a plurality of values other than M = 3, Hamming An averaging process using a window or the like may be executed as the “second process”.

  Subsequently, the processing unit 23 extracts a measurement value (an example of the “third value”) having an amount of change in consecutive N samplings equal to or more than a predetermined amount from each measurement value of the waveform data D2. A "third process" for generating waveform data D3 (an example of "third data") is executed. Specifically, the processing unit 23 performs the filtering process using the same filter as the filter used in the above-described “first process”, so that the measured value of the waveform data D2 is continuously measured out of N = 2 samplings. A measured value whose variation exceeds a prescribed amount is extracted to generate waveform data D3. Thus, in the “first process”, the waveform data D2 in which the influence of the “waveform component of the abrupt change” is sufficiently reduced in the above “second process” as in the waveform W3 shown in FIG. Filtered waveform data D3 is generated using the same filter as the used filter, and the "third process" is completed.

  Next, the processing unit 23 calculates a value (an example of the “fourth value”) obtained by converting each measurement value of the waveform data D3 into an absolute value to generate the waveform data D4 (an example of the “fourth data”). Execute the "fourth process". Thereby, waveform data D4 having a waveform like the waveform W4 shown in FIG. 6 is generated, and the "fourth process" is completed.

  Subsequently, the processing unit 23 replaces each measurement value Ds of the waveform data D0 with a value obtained by averaging the measurement values Ds for continuous L sampling including the measurement value Ds of the object, and the measurement value after replacement is A “fifth process” is performed to calculate waveform data D5 (an example of “fifth data”) by calculating a differentiated value (an example of “fifth value”). Specifically, as an example, the processing unit 23 first measures the target measured value Ds from the measured value Ds before 5 sampling of the target measured value Ds to the measured value Ds after 5 sampling of the target measured value Ds. The waveform data D0f is generated by replacing the average value of the measurement values Ds for L = 5 + 5 + 1 = 11 samplings. As a result, as shown by a waveform W0f shown in FIG. 7, waveform data D0f of a measured value having a small degree of variation for each sampling is generated.

  In the same figure, in order to facilitate understanding of the "fifth process", part of the time axis direction in the waveform W0 shown in FIG. 2 is enlarged, and calculation is performed based on the measured value Ds of the waveform W0. The waveform W0f of the averaged value is shown superimposed on the waveform W0. In addition, when generating the waveform data D0f, instead of the processing of replacing with the average value for 11 samplings described above, processing for replacing with average values for a plurality of samplings other than 11 sampling, averaging processing using a Hamming window, etc. It may be executed.

  Next, the processing unit 23 generates a waveform data D5 by computing a value (first order differential value: fifth value) obtained by differentiating each measurement value of the waveform data D0f. Thereby, waveform data D5 like the waveform W5 shown in FIG. 8 is generated, and the "fifth process" is completed. In the fifth process, instead of the above process of differentiating the value of the waveform data D0f, the process of replacing the value of the waveform data D0f with the value indicating the rate of change by the least squares method is performed. You can also

  Subsequently, the processing unit 23 calculates a value (second-order differential value: sixth value) obtained by differentiating each value (fifth value) of the waveform data D5 to obtain waveform data D6 (an example of “sixth data” Generate). Thereby, waveform data D6 like the waveform W6 shown in FIG. 9 is generated, and the "sixth process" is completed. Also in this "sixth process", instead of the above process of differentiating the value of the waveform data D5, the process of replacing the value of the waveform data D5 with the "value indicating the rate of change" by the least squares method etc. You can also

  Next, the processing unit 23 calculates a value (an example of the “seventh value”) obtained by normalizing the absolute value of each value of the waveform data D6 to generate the waveform data D7 (an example of the “seventh data”) To perform the "seventh process". Thereby, waveform data D7 like the waveform W7 shown in FIG. 10 is generated, and the "seventh process" is completed.

  Subsequently, the processing unit 23 generates a waveform data D8 (an example of an “eighth data”) by calculating a value (an example of the “eighth value”) obtained by converting each measured value of the waveform data D1 into an absolute value. To perform the "eighth process". Thereby, waveform data D8 like the waveform W8 shown in FIG. 11 is generated, and the "eighth process" is completed.

  Next, prior to the start of the “ninth process” described later, the processing unit 23 selects any one of the processes from the “11th process” to the “13th process” described below, or any process. A plurality is performed to reduce the number of singular points as described below existing in each value of the waveform data D7 before processing. Specifically, in the waveform data D7 generated by the above-described “seventh process”, as shown in FIG. 10, when the change rates of the respective values of the corresponding waveform data D6 are binary values in the same degree continuously. (When the slope of the waveform W6 is continuously the same for two samplings), a singular point is generated whose value (seventh value) is close to "0" (very small value). This singular point (a value close to “0”) inhibits the accurate determination in the subsequent pass / fail determination, and thus new waveform data in which the singular point is reduced by processing each value according to a predetermined condition. It is preferred to produce D7.

  In this case, as one of the processes for reducing the singular point, the “11th process” described below is performed. First, the absolute value of each value (fifth value) of the waveform data D5 is normalized so that the maximum value becomes “1” (an example of the “ninth value”) to calculate the waveform data D9. (An example of “ninth data”) is generated. Thus, waveform data D9 such as the waveform W9 shown in FIG. 12 is generated. Next, the processing unit 23 calculates a value (the value of the waveform W9a shown in FIG. 13) obtained by multiplying each value (ninth value) of the waveform data D9 by the coefficient Ka (as an example, Ka = 0.1) One of the larger one of the value (the seventh value: the value of the waveform W7 shown in FIG. 13) of the waveform data D7 corresponding to the sampling timing of the value (the ninth value) of the data D9 is a new value (a new value A new waveform data D7 is generated as a seventh value). At this time, waveform data D7 (new waveform data D7) such as the waveform W7a indicated by a thick line in FIG. 13 is generated, and the "11th process" is completed.

  In addition, about "coefficient Ka" used in "the 11th process", it can be set as arbitrary positive numbers other than "0.1" below "1". In addition, instead of the above-mentioned "the eleventh process", each value (the ninth value) of the waveform data D9 is not multiplied by the coefficient Ka (that is, the ninth value: the value of the waveform W9 shown in FIG. 14) Or the value of the waveform data D7 (the seventh value: the value of the waveform W7 shown in FIG. 14) corresponding to the sampling timing of the value of the waveform data D9 (the ninth value), whichever is larger, It is also possible to execute a process of generating new waveform data D7 as a value (a new seventh value). At this time, new waveform data D7 such as a waveform W7b indicated by a thick line in the same drawing is generated.

  In addition, as another one of the processing for reducing the singularity, the “12th processing” described below is performed. In this "12th process", each value (seventh value) of the waveform data D7 is set to (Ja + 1) values from the value before Ja sampling to the target value with respect to the target value, Each is replaced with the maximum value among the predefined Jc seventh values including at least one of (Jb + 1) values from the value to the value after the Jb sampling with respect to the target value, and new waveform data is generated. Generate D7.

  Specifically, as an example, each value (seventh value) of the waveform data D7 is set to (Ja + 1) values from the value before Ja = 2 sampling to the target value and the target value, Replace with the maximum value among the predefined Ja + Jb + 1 = Jc = 5 values including both (Jb + 1) values from the value of the target to the value after the target value Jb = 2 after sampling. Waveform data D7 is generated. At this time, new waveform data D7 such as the waveform W7c shown in FIG. 15 is generated. Note that “Ja” and “Jb” can be defined as any natural number other than “2”, and “Jc” can also be any natural number other than “5”.

  Furthermore, as yet another process of reducing singular points, the “13th process” described below is performed. In the “13th process”, among the values (seventh values) of the waveform data D7, a value smaller than the value before the I sampling is its value (seventh value) and the value before the I sampling Is replaced by the larger one of a value (an example of “the tenth value”) obtained by multiplying the coefficient Kb (an example, Kb = 0.9) to generate new pre-waveform data D7. At this time, new waveform data D7 such as the waveform W7d shown in FIG. 16 is generated. The “coefficient Kb” used in the “third process” can be an arbitrary positive number other than “0.9” in “1” or less.

  Further, when the inspection data Dc is generated based on the waveform data D0 of the damped vibration waveform as in this example, the “fourteenth process” described below is performed prior to the start of the “ninth process” described later. It is preferable to carry out. In this case, in the waveform data D7 generated based on the damped oscillation waveform such as the waveform data D0, the amount of change in the waveform decreases with the passage of time after the value (the seventh value) reaches the maximum value. . Therefore, regarding each value after the maximum value (seventh value), when the amount of change becomes extremely large, it is not a normal transient phenomenon, but the measured value Ds including the discharge waveform component is measured during the measurement process. By processing the value of the waveform data D7 so that it can be determined, it is possible to improve the determination accuracy. Therefore, the values after the maximum value among the values of the waveform data D7 are processed as follows.

  Specifically, in the "fourteenth process", a value corresponding to the measured value Ds sampled after the measured value Ds corresponding to the maximum value among the respective values (seventh values) of the waveform data D7. A value (seventh value) before Ha sampling (as an example, one sampling) for the target value (seventh value) for the (seventh value) is continuous including the target value Coefficient Kc (for example, Kc = 1.0) to the value obtained by averaging the value (seventh value) of Hb sampling (for example, Hb = 101 sampling for Ha = 1 including the value before sampling) When it is below the multiplied value (11th value) (that is, when the value obtained by multiplying the coefficient Kc by the average value of the Hb sampling values is larger than the value before Ha sampling of the target value: target value The value of the included Hb sampling rapidly increases And the value before the Ha sampling is replaced with the smaller one (the 12th value) of the value before the Ha sampling multiplied by a predetermined coefficient Kd (for example, 1.4) to newly Waveform data D7 is generated.

  At this time, the value before the Ha sampling (the seventh value) is a coefficient Ke (an example: Ke = 0.1) as a value obtained by averaging the above-mentioned values for the Hb sampling (the seventh value). When it is smaller than the value (an example of the “13th value”) multiplied by, the target value (the 7th value) is replaced with the value (the 13th value) obtained by multiplying the averaged value by the coefficient Ke This can reduce the number of singularities. The values after the maximum value of the values of the waveform data D7 (that is, each value whose change amount should gradually decrease) are indicated by a solid line in FIG. 17 by executing such a “fourteenth process”. When the value is rapidly increased as in the value of the waveform W7e, the amount of increase is limited and replaced by the waveform W7f indicated by a broken line in the same drawing, whereby new waveform data D7 is generated.

  The “factor Kc” used in the “fourteenth process” can be any positive number other than “1”, and the “factor Kd” is “1. It may be any positive number other than 4 ", and" coefficient Ke "may be any positive number other than" 0.1 ". In addition, "value before Ha sampling" can be "value before sampling by 2 or more" and "value obtained by averaging Hb sampling" can also be "sampling by 100 sampling or less". It can be an averaged value or a value obtained by averaging a plurality of samplings of 102 samplings or more.

  Furthermore, when the inspection data Dc is generated based on the waveform data D0 of the damped vibration waveform as in this example, the “fifteenth process” described below is also performed prior to the start of the “ninth process” described later. It is preferable to carry out. In this case, the waveform data D7 is a vibration waveform such as the waveform data D0, and the waveform data D7 generated based on the plurality of measurement values Ds including the measurement value Ds from before the application of the voltage to the inspection object X Before the time when the value) reaches the maximum value, the amount of change in the waveform tends to increase gradually with the passage of time. Therefore, for each value (seventh value) before the maximum value, when the amount of change is extremely small locally disproportionately with the degree of increase in the rate of change, such an extremely small amount due to the influence of noise or the like It is possible to increase the determination accuracy by processing the value of the waveform data D7 so as to consider that a change in change rate has occurred and sufficiently reduce the influence of such change. Therefore, regarding the value before the maximum value among the values of the waveform data D7, the following processing is performed.

  Specifically, in the “fifteenth process”, the process corresponds to the measurement value Ds sampled before the measurement value Ds corresponding to the maximum value among the respective values (seventh values) of the waveform data D7. For the value (seventh value), the factor Kf (the seventh value) before Hc sampling (as an example, Hc = 1 sampling) for the target value and the target seventh value As one example, new waveform data D7 is generated by replacing the larger one with the value (an example of the “fourteenth value”) multiplied by Ke = 0.9.

  At this time, both the target value (seventh value) and the value before the Hc sampling (seventh value) multiplied by the coefficient Kf (the fourteenth value) are continuous including the target value. A value ("15th value") obtained by multiplying a value obtained by averaging values (seventh values) of Hd samplings (as an example, Hd = 101 samplings) to be multiplied by a coefficient Kg (as an example, Kg = 1). When the value is smaller than one example), the target value can be replaced with a value (fifteenth value) obtained by multiplying the value obtained by averaging the Hd sampling values by the coefficient Kg. By executing such a “fifteenth process”, when the amount of increase in value is excessively small for the value before the maximum value among the values of the waveform data D7, the amount of increase is an inherent amount of increase Are replaced with the values reinforced corresponding to the new waveform data D7 is generated.

  The “coefficient Kg” used in the “fifteenth process” can be any positive number other than “1”. In addition, "value before Hc sampling" can be "value before sampling more than 2 samplings", and "value obtained by averaging Hd sampling" can also be "sampling more than 100 samplings" A value obtained by averaging “a” or “a value obtained by averaging a plurality of samplings of 102 samplings or more” can be used.

  On the other hand, when the processing unit 23 completes the above-described "Eleventh processing" to "Thirteenth processing", or a predetermined processing of "Fourteenth processing" and "Fifteenth processing". , "9th process" is started. When it is specified not to execute each process from “Eleventh Process” to “Fifteenth Process”, “Ninth Process” is started when “Eighth Process” described above is completed. Do.

  Specifically, in the “ninth process”, as shown in FIG. 18, the processing unit 23 associates the value (fourth value) of the waveform data D4 with the vertical axis of the two-dimensional graph, as an example. Along with (“one of the vertical axis and the horizontal axis defined in advance” as the “vertical axis”), the horizontal axis of the two-dimensional graph represents the waveform data D7 corresponding to the sampling timing of each value of the waveform data D4. Each value (the seventh value) is made to correspond (an example in which “the other of the vertical axis and the horizontal axis” is the “horizontal axis”), corresponding values of the values of the waveform data D4 and the values of the waveform data D7 One example of “corresponding points of 1” is plotted on a two-dimensional graph. In the same figure, the corresponding points (first corresponding points) of the two values are indicated by "-".

  In this case, the value of the waveform data D4 generated in the above-described "fourth process", that is, the change amount to be determined as a "discharge component" among the measured values Ds of the waveform data D0 The value (the fourth value) obtained by averaging and converting the value significantly changed with time to the value of the waveform data D7 generated in the “seventh process” or the value of the waveform data D7 With respect to the value of new waveform data D7 subjected to various processing, that is, a value that has changed significantly in a short time to the same extent as the amount of change to be determined as a discharge component among measured values Ds of waveform data D0. Are averaged and the second derivative of the absolute value is plotted on the two-dimensional graph as the "first corresponding point", the corresponding point of the second derivative of the absolute value (the seventh value) .

  That is, even if the discharge waveform component is included in the waveform W0 of the waveform data D0, each “first corresponding point” on the two-dimensional graph is a value in which the influence of the discharge waveform component is excluded (fourth The “corresponding points” based on the value of and the seventh value) will be plotted in the area to be plotted. Therefore, based on the arrangement on the two-dimensional graph of each "first corresponding point" plotted in the above-mentioned "ninth process", the processing unit 23 follows the "region defining procedure" defined in advance. Defines the “determination area” (execution of “the tenth process”).

  Although the specific procedure of the “tenth process” will be described in detail later, in the measurement system 1 (data processing device 3) of this example, the waveform W0 of the waveform data D0 includes a discharge waveform component. A determination region Aa (an example of a “first determination region” as a “measurement value range”) in which a “second corresponding point” described later of the value corresponding to the discharge waveform component is not plotted when being When a discharge waveform component is included in the waveform W0 of the waveform data D0, a determination region Ab (as a “measurement value range”) in which a “second corresponding point” described later of the value corresponding to the discharge waveform component is plotted A process of defining at least one of “one example of the“ second determination area ”” of the above is performed as “the tenth process”.

  Subsequently, the processing unit 23 generates area data Da (an example of “area data” as “measurement value range data”) that can specify the determination area Aa and / or the determination area Ab defined by the “tenth process”. Along with the generation, the generated area data Da and the waveform data D7, D8 (an example of “comparison value data”) are associated with the inspection target X and recorded, and the inspection data Dc (an example of “discharge presence / absence specification data”) It is generated and stored in the storage unit 14. Thus, the "data generation process" is completed.

  Next, the processing unit 23 determines whether the waveform W0 of the waveform data D0 measured for the inspection object X includes a discharge waveform component based on the generated inspection data Dc (that is, the inspection object X is Execute the inspection process to determine whether the product is non-defective or defective.

  Specifically, the processing unit 23 first defines the determination area Aa and / or the determination area Ab on the two-dimensional graph based on the area data Da recorded in the inspection data Dc. Further, the processing unit 23 plots “second corresponding points” on the two-dimensional graph, based on the waveform data D7 and D8 recorded in the inspection data Dc. At this time, in the measurement system 1 (data processing device 3) of this example, as an example, the vertical axis of the two-dimensional graph is made to correspond to each value (eighth value) of the waveform data D8 An example in which one of the axes is defined in advance as “the vertical axis”, each value (seventh value) of the waveform data D7 corresponding to the sampling timing of the value of the waveform data D8 on the horizontal axis of the two-dimensional graph Corresponding to each other (an example in which “the other of the vertical axis and the horizontal axis” is “horizontal axis”), the corresponding point (second corresponding point) of the value of the waveform data D8 and the value of the waveform data D7 on the two-dimensional graph Plot each on

  Further, in the measurement system 1 (data processing device 3) of the present example, as shown in FIGS. 19 and 20, the two-dimensional graph described above and the determination area Aa and / or the determination area Ab defined on the two-dimensional graph Every time a new "second corresponding point" is plotted while displaying on the display unit 22, a symbol or a symbol indicating the "second corresponding point" is displayed on a two-dimensional graph. Note that, in the examples of both figures, an example in which “■” which is an example of a symbol indicating “the second corresponding point” is displayed (plotted) on a two-dimensional graph is illustrated.

  In this case, the waveform data D8 is a measured value in which the amount of change in consecutive N samplings from among the measured values Ds of the waveform data D0 in the “first process” described above is a predetermined amount or more (first Value: Similar to the value constituting the discharge waveform component, the value is constituted by a value obtained by converting the steep change in N sampling) into an absolute value in the “eighth process”.

  Therefore, when each measured value Ds of the waveform data D0 which is the source of the waveform data D8 does not change sharply within N sampling, that is, no discharge waveform component is included in the waveform W0 of the waveform data D0. Sometimes, as shown in FIG. 19, all “second corresponding points” are plotted in the determination area Aa (outside of the determination area Ab). On the other hand, when each measured value Ds of the waveform data D0 which is the source of the waveform data D8 changes sharply within N sampling, that is, when a discharge waveform component is included in the waveform W0 of the waveform data D0. As shown in FIG. 20, some "second corresponding points" (corresponding points of the waveform data D7, 8 corresponding to the measured value Ds of the discharge waveform component) are outside the judgment area Aa (within the judgment area Ab). It will be plotted.

  Therefore, when the processing unit 23 completes the plotting of all the "second corresponding points", first, the positional relationship between the "second corresponding point" described above and the determination area Aa and / or the determination area Ab Identify At this time, when all the "second corresponding points" are plotted in the determination area Aa (when all the "second corresponding points" are plotted outside the determination area Ab), the processing unit 23 determines that the waveform W0 of the waveform data D0 does not include the discharge waveform component. In addition, when some “second corresponding points” are plotted outside the determination area Aa (when some “second corresponding points” are plotted in the determination area Ab), the processing unit 23 determines that the waveform W0 of the waveform data D0 includes a discharge waveform component.

  Further, the processing unit 23 is shown in FIG. 21 in place of the two-dimensional graphs shown in FIGS. 19 and 20 (or together with the two-dimensional graphs shown in both figures) according to an instruction from the user by the operation of the operation unit 21. A two-dimensional graph is displayed on the display unit 22. In the two-dimensional graph, the waveform W0 of the waveform data D0, the waveform W1 of the waveform data D1, and the waveform Wa corresponding to the boundary between the determination area Aa, the determination area Ab, and the boundary are displayed. Therefore, as shown in the figure, when a part of the waveform W1 of the waveform data D1 is drawn above the waveform Wa, a part of the waveform W0 corresponding to that part is the discharge waveform component, and the waveform data With respect to a portion drawn lower than the waveform Wa in the waveform W1 of D1, it is possible to intuitively recognize that the portion of the waveform W0 corresponding to the portion is not a discharge waveform component.

  After this, the processing unit 23 sets the determination result of the determination process of the presence or absence of the discharge waveform component as the inspection target X together with the result of the determination process regarding the other inspection item performed separately from the determination process of the presence or absence of the discharge waveform component described above. It associates and records and generates inspection result data Dr. In addition, when it is determined that there is no defect in all the inspection items, the item that the inspection object X is good is recorded in the inspection result data Dr, and when it is determined that there is a defect in any inspection item, the inspection object X Records that the item is a defective product in the inspection result data Dr. Thus, a series of inspection processes for the inspection object X are completed.

  Next, “the tenth process (process for defining the determination areas Aa and Ab on a two-dimensional graph)” of the series of processes for the inspection object X will be described in detail with reference to the attached drawings. .

  When defining the determination area Aa (or the determination area Ab) in the above-described “tenth process”, the processing unit 23 first plots “the ninth process” as shown in FIGS. While specifying the position of the first corresponding point (the position of each “◇” in both figures), the “regression line of each first corresponding point” passing through the origin P0 of the two-dimensional graph is specified. At this time, as an example, a two-dot chain line L shown in both figures is specified as a "regression line". Next, the processing unit 23 generates a two-dimensional graph when the value of the horizontal axis (an example of “the other of the vertical axis and the horizontal axis”) of the two-dimensional graph in the identified regression line (two-dot chain line L) is “1”. The value (in the present example, about 0.08: an example of the “16th value”) is specified as the value of the vertical axis (an example of either the vertical axis or the horizontal axis, which is previously defined).

  Subsequently, the point P1 of the origin P0 of the two-dimensional graph, the value of the vertical axis is “16th value” and the value of the horizontal axis is “1” (an example of “first point”), and the value of the vertical axis is A triangular area A1 having three points of point 2 (an example of a "second point") whose value of the horizontal axis is "1" and "1" is a vertex is specified, and a determination area is determined based on the specified triangular area A1. Aa and / or a determination area Ab is defined.

  Specifically, as shown in FIG. 24, the processing unit 23 sets the value of the waveform data D1 on the vertical axis of the two-dimensional graph (an example of “one of the vertical axis and the horizontal axis defined in advance”). Value of 7), and the horizontal axis of the two-dimensional graph (an example of “the other of the vertical axis and the The values of the waveform data D1 and the corresponding points of the values of the waveform data D7 (an example of the “third corresponding point”) are plotted on a two-dimensional graph in correspondence with the values of the values. In the same figure, the corresponding points (third corresponding points) of the two values are indicated by "■".

  In this case, the “third corresponding point” based on the value of the damped oscillation waveform (the waveform of the transient phenomenon) such as the waveform data D0 has many values with small change rates, so in the example of the two-dimensional graph of FIG. A number of "third corresponding points" are plotted at a position on the origin side in the horizontal axis direction. In addition, since each "third corresponding point" plotted on the origin side in the horizontal axis direction has a small "first value" itself, the distribution is in the vertical axis direction on the two-dimensional graph. It will be in a dense state without large separation.

  Therefore, as an example, processing unit 23 has a value of the horizontal axis “0.1 (“ an example of a predefined seventeenth value with the other value of the vertical axis and the horizontal axis being “0.5” or less ”). Or less, that is, the “third corresponding point” corresponding to the normal measurement value Ds that occupies most of each “third corresponding point” (discharge waveform component or large noise When the component is present, the "third corresponding point" corresponding to the measured value Ds excluding such a unique measured value Ds is extracted. In addition, about said "17th value", it can be set as arbitrary positive numbers other than "0.1" below "0.5".

  Next, the processing unit 23 calculates the standard deviation nσ of the value of the vertical axis at each of the extracted “third corresponding points”. In this case, for “n”, an arbitrary natural number is defined in advance according to the number of measurement values Ds (the number of samplings). Specifically, as an example, when the number of measured values Ds in the waveform data D0 is "10,000" and a discharge waveform component does not exist in the waveform W0 of the waveform data D0, the standard deviation nσ = 3σ The measured value Ds included in the range is "10,000 × about 99.73% 9,9 9,973 value" and "10,000-9,973 = 27 value" may be outside the standard deviation nσ range. And the standard deviation nσ = 4σ, the measured value Ds is “10,000 × about 99.994% 約 9,999.4” and “10,000-9,999.4 = 0”. 6 values may fall outside the range of the standard deviation nσ.

  Moreover, the measured value Ds included in the range of the standard deviation nσ = 5σ is “10,000 × about 99.9999% ≒ 9,999.99” and “10,000-9,999.99 = 0”. 01 value may fall outside the range of the standard deviation nσ, and the measurement value Ds included in the range of the standard deviation nσ = 6σ is “10,000 × about 99.999999% ≒ 99.99.9999” "Value of 10,000-9,999.999999 = 0.000001" may be out of the range of the standard deviation nσ. Therefore, in this “tenth process”, the erroneous determination that the discharge waveform component exists is caused by calculating the standard deviation nσ (n ≧ 3), preferably the standard deviation 5σ or the standard deviation 6σ. It becomes possible to define a judgment area Aa (or a judgment area Ab) with a sufficiently low possibility.

  Subsequently, as shown in FIGS. 22 and 23, the processing unit 23 determines that the values of the origin P0 and the point P1 described above have the standard deviation nσ and the “sixteenth value (about 0.08 in this example). Point P3 (an example of a “third point”) having a horizontal axis value of “1”, and a point P4 having a standard deviation nσ (vertical deviation) and a horizontal axis value of “0” (4) A rectangular area A2 (an example of a “first rectangular area”) having four points of “an example of the“ fourth point ”” as apexes is specified. When the processing unit 23 defines the determination area Aa, the processing unit 23 sets an area obtained by adding the above triangular area A1 and the rectangular area A2 as the determination area Aa, and when defining the determination area Ab, 2 An area excluding the triangular area A1 and the rectangular area A2 in the dimensional graph is set as a determination area Ab, and data capable of specifying the determination area Aa and / or the determination area Ab is recorded as the area data Da in the inspection data Dc. Thus, the “tenth process” for defining the determination area Aa and / or the determination area Ab is completed.

  In this case, as shown in FIG. 22, when the waveform W0 of the waveform data D0 does not include the discharge waveform component, the value of the waveform data D8 and the value of the waveform data D7 recorded in the inspection data Dc When the two corresponding points (the points indicated by “■” shown in the same figure) are plotted on the two-dimensional graph, all “second corresponding points” are plotted in the determination area Aa (outside the determination area Ab) Be done. On the other hand, as shown in FIG. 23, when the discharge waveform component is included in the waveform W0 of the waveform data D0, the values of the waveform data D8 and the values of the waveform data D7 recorded in the inspection data Dc When plotting the “second corresponding points (the points of“ ■ ”shown in the same figure”) on the two-dimensional graph, some “second corresponding points” (corresponding to the measured value Ds of the discharge waveform component) “The second corresponding point” is plotted outside the determination area Aa (in the determination area Ab). Therefore, by defining the determination area Aa and / or the determination area Ab according to the above-described procedure, the discharge waveform of the waveform W0 of the waveform data D0 is obtained based on such area data Da and the waveform data D7 and D8. Whether or not a component is contained can be suitably determined.

  On the other hand, the “tenth process” for defining “at least one of the first determination area and the second determination area” is not limited to the above procedure, and “at least one area” is defined as follows. It can also be defined simply. Specifically, the processing unit 23 first positions the “first corresponding points” plotted in the “ninth process” as shown in FIG. 25 as “the tenth process” (each “in FIG. And the smallest square area A3 (an example of the "smallest square area") in which all the "first corresponding points" specified are included. Next, as an example, the standard deviation nσ is calculated according to the same procedure as the procedure specified in defining the above-described determination regions Aa and Ab.

  Subsequently, the rectangular area A3 is enlarged by the standard deviation nσ in the vertical axis direction of the two-dimensional graph, and the enlarged rectangular area is a determination area which is another example of the “first determination area” as the “measurement value range”. An area excluding the determination area Ac in the two-dimensional graph is defined as Ac, which is another example of the “second determination area” as the “measurement value range”, and these determination areas Ac and / or Alternatively, data capable of specifying the determination area Ad is recorded as the area data Da in the inspection data Dc. Thus, the “tenth process” for defining the determination area Ac and / or the determination area Ad is completed.

  Next, the “determination process” (determination as to whether or not the discharge waveform component is included in the waveform W0 of the waveform data D0) in the above-described series of processes for the inspection object X will be described with reference to the attached drawings. Will be described in detail.

  When it is determined whether the discharge waveform component is included in the waveform W0 of the waveform data D0 based on the region data Da and the waveform data D7 and D8 in the inspection data Dc, the determination region Aa or When the determination area Ac is defined too narrowly (when the determination area Ab and the determination area Ad are defined too widely), noise components and the like that are not discharge waveform components may be erroneously determined as discharge waveform components. . Therefore, in the measurement system 1 (data processing device 3) of this example, when the presence or absence of the discharge waveform component is determined in the "determination process", the following "informing process" is performed to determine the determination areas Aa to Ad. A configuration is adopted that allows the user to know whether or not

  Specifically, as an example, when the processing unit 23 first sets the determination area Aa and the determination area Ac (first determination area) as the “at least one area”, the processing unit 23 sets the total number of “second corresponding points” to When specifying the proportion of “second corresponding points” not included in the determination area Aa or the determination area Ac, and setting the determination area Ab or the determination area Ad (second determination area) as “at least one of the areas” The ratio of the “second corresponding point” included in the determination area Ab or the determination area Ad to the total number of “second corresponding points” is specified. That is, the ratio of the "second corresponding point determined to correspond to the discharge waveform component" to each "second corresponding point" is specified.

  Next, when the specified percentage is “predetermined percentage (10% as an example)” or more, a message “The number of points determined to be a discharge waveform component has exceeded 10%” is displayed on the display unit 22 (An example of “predefined notification processing”). Therefore, when the user who sees this message determines that there is not a large number of discharge phenomena occurring during measurement of the waveform data D0, the determination areas Aa and Ac are too narrowly defined (determination area Ab , Ad is too widely defined), and the adjustment areas Aa, Ac, and / or the areas of the evaluation areas Ab, Ad are manually adjusted, or each coefficient in the above-described series of procedures is changed to newly The judgment areas Aa and Ac and / or the judgment areas Ab and Ad are defined. In addition, said "predetermined ratio" can be prescribed | regulated to arbitrary ratios other than "10%" within the range larger than "0%" and smaller than "100%."

  Further, as the “informing process”, the following process can be performed instead of the above process. Specifically, as an example, in the “determination process”, as shown in FIG. 26, the processing unit 23 first sets the two-dimensional graph in the direction of the horizontal axis (an example of “the other of the vertical axis and the horizontal axis”) The Ga = 10 divided rectangular regions A10 to A19 (an example of the “second rectangular region”) divided into 10 pieces (example of “Ga = 10 pieces”) are specified. Next, when setting the determination area Aa as “at least one area”, the processing unit 23 specifies the number of rectangular areas A10 to A19 in which “second corresponding points” are included in areas other than the determination area Aa. When the determination area Ab is set to "at least one area", the number of rectangular areas A10 to A19 in which "second corresponding points" are included in the determination area Ab is specified. That is, the number of areas in which “the second corresponding points determined to correspond to the discharge waveform component” among the rectangular areas A10 to A19 are specified. At this time, in the example shown in the figure, the corresponding area is identified as one of the rectangular areas A10.

  Subsequently, the processing unit 23 locates a point determined as “discharge waveform component” when the number of specified regions is “prescribed number (for example, Ga = 10/2 = 5)” or more. A message that “the area has exceeded 50%” is displayed on the display unit 22 (another example of “predefined notification processing”). In the example shown in the figure, the determination result as described above is displayed on the display unit 22 without displaying the message as described above because the number of specified areas is only one. If a message like the above is displayed, the user who sees the message narrows down the judgment area Aa when judging that there should not be a large number of discharge phenomena occurring at the time of measurement of the waveform data D0. Too large (the determination area Ab is defined too broadly), and manually adjusting the size of the determination area Aa and / or the determination area Ab, or changing each coefficient in the above-described series of procedures. A new determination area Aa and / or a determination area Ab is defined. In addition, above-mentioned "Ga piece" can be prescribed | regulated to two or more arbitrary natural numbers except ten pieces. In addition, the “predefined number” can also be defined to an arbitrary natural number of Ga or less other than five.

  As described above, in the data processing device 3, the comparison between the "measurement value range data" of the "measurement value range" and the "measurement value range data" serving as a reference for specifying whether the discharge waveform component is included or not. Generates "comparison value data" that can specify whether the discharge waveform component is included or not based on the waveform data D0, and includes the generated "measurement value range data" and "comparison value data" for inspection Generate data Dc. Specifically, the processing unit 23 sequentially executes each processing from the “first processing” to the “tenth processing” using the waveform data D0, and “measurement” defined by the “tenth processing” At least one of the areas as the value range (in this example, the determination area Aa as the “first determination area” (or the determination area Ac), and the determination area Ab as the “second determination area” (or the determination Region data Da (measurement value range data) which can specify “both in region Ad)”, waveform data D7 generated by “seventh process”, and waveform data D8 (compared by “eighth process”) The inspection data Dc is generated including the value data). Also, the data processing program Dp causes the processing unit 23 of the data processing device 3 to execute the above-described processing.

  Therefore, according to data processing device 3 and data processing program Dp, region data Da for determining whether a discharge waveform component is present or not based on one waveform data D0 acquired for inspection object X It is possible to generate waveform data D7 and D8 capable of determining whether or not a discharge waveform component exists by comparison with the determination region (determination regions Aa to Ad) of the region data Da. For this reason, the measurement process is not required a plurality of times, and the influence of the individual difference of a plurality of "measurement objects" and the influence of the variation of the measured value Ds due to the difference of the measurement environment for each measurement process are eliminated. Not only is it possible to sufficiently improve the determination accuracy of whether or not the discharge phenomenon has occurred, there is no need to separately perform processing for generating a reference value (threshold) for determination, which causes the burden on the user. Can be reduced enough.

  Further, in the data processing device 3, the processing unit 23 normalizes the absolute value of each "fifth value" of the waveform data D5 so that the maximum value becomes "1" prior to the "ninth process". Calculating the “9th value” to generate the waveform data D9, and multiplying each “9th value” by the coefficient Ka and the waveform data corresponding to the sampling timing of each “9th value” An “eleventh process” is performed to generate new waveform data D <b> 7 by setting one of the “seventh values” of D <b> 7 whichever is larger as a new “seventh value”.

  Further, in the data processing device 3, the processing unit 23 performs each “seventh value” of the waveform data D7 prior to the “seventh process” before Ja sampling with respect to the “seventh value” of interest. The (Ja + 1) pieces of “seventh values” from the “seventh value” to the target “seventh value” and the target “seventh value” to the target “seventh value” Replace with the maximum value among the predefined Jc "seventh values" including at least one of (Jb + 1) "seventh values" up to the "seventh value" after Jb sampling The “12th process” is performed to generate new waveform data D7.

  Further, in the data processing device 3, the processing unit 23 is smaller than the “seventh value” before I sampling among the “seventh values” of the waveform data D7 prior to the “seventh process”. A “10th value” obtained by multiplying the “7th value” by “the 7th value” smaller than the “7th value” before I sampling and the “7th value” before I sampling by the coefficient Kb The “13th process” is executed to generate new waveform data D7 in place of the larger one.

  Therefore, according to the data processing device 3 and the data processing program Dp, the number of singular points at which the “seventh value” becomes a value close to “0” can be sufficiently reduced, whereby the discharge waveform While it is possible to define the determination area Aa and / or the determination area Ab that can determine the presence or absence of the component with higher accuracy, new waveform data can be determined when determining the presence or absence of the discharge waveform component based on the inspection data Dc. By plotting the “second corresponding point” on the two-dimensional graph based on D7, it becomes possible to determine the presence or absence of the discharge waveform component with higher accuracy.

  Further, in the data processing device 3, the processing unit 23 is sampled after the measured value Ds corresponding to the maximum value among the "seventh values" of the waveform data D7 prior to the "seventh process". The “seventh value” corresponding to the measured value Ds is continuous to the “seventh value” of the object, including the “seventh value” of the object before the Ha sampling. When the value is equal to or less than the “11th value” obtained by multiplying the coefficient Kc by the value obtained by averaging the “7th value” for Hb sampling, the “7th value” of interest and “7th value before Ha sampling” The “fourteenth process” is executed to generate new waveform data D 7 by replacing it with the smaller one of “12th value” obtained by multiplying “value of“ 12 ”by a predetermined coefficient Kd.

  Therefore, according to the data processing device 3 and the data processing program Dp, when the waveform data D0 in which the rate of change of the measured value gradually decreases is targeted, the degree of decrease in the rate of change is disproportionately A change state in which the value of “7” suddenly changes to a large value can be made an appropriate change state according to the degree of decrease in the change rate, thereby making the presence or absence of the discharge waveform component more accurate. While determination area Aa and / or determination area Ab that can be determined can be defined, when determining the presence or absence of a discharge waveform component based on inspection data Dc, on a two-dimensional graph based on new waveform data D7 By plotting “the second corresponding point” on the other hand, the presence or absence of the discharge waveform component can be determined with higher accuracy.

  Furthermore, in the data processing device 3, in the “fourteenth process”, the processing unit 23 sets the “seventh value” before the Ha sampling to a value obtained by averaging the “seventh value” for the Hb sampling. When the value is smaller than the “13th value” multiplied by the coefficient Ke, the “7th value” of interest is replaced with the “13th value”. Therefore, according to the data processing device 3 and the data processing program Dp, the change state of the "seventh value" can be made more preferable.

  Further, in the data processing device 3, the processing unit 23 samples the value before the measured value Ds corresponding to the maximum value of the “seventh values” of the waveform data D7 prior to the “ninth process”. The “seventh value” corresponding to the measured value Ds, the “seventh value” of the object, and the “seventh value” before Hc sampling for the “seventh value” of the object are coefficients Kf To generate a new waveform data D7 by replacing it with the larger one of the "fourteenth values" multiplied by.

  Therefore, according to the data processing device 3 and the data processing program Dp, the “seventh value” is a value close to “0” when the waveform data D0 in which the change rate of the measured value gradually increases. It is possible to sufficiently reduce the number of singular points that are to be determined, thereby defining the determination area Aa and / or the determination area Ab where the presence or absence of the discharge waveform component can be determined with higher accuracy, and When determining the presence or absence of the discharge waveform component based on the data Dc, the “second corresponding point” is plotted on the two-dimensional graph based on the new waveform data D7 to further increase the presence or absence of the discharge waveform component It is possible to determine

  Furthermore, in the data processing device 3, in the “fifteenth process”, the processing unit 23 determines that both the “seventh value” and the “fifteenth value” of the object are the “seventh value” of the object. The target "seventh value" is set to the "fifteenth value" when it is smaller than the "fifteenth value" obtained by multiplying the coefficient Kg by the value obtained by averaging the "seventh value" for consecutive Hd samplings including Replace with "value". Therefore, according to the data processing device 3 and the data processing program Dp, it is possible to further reduce the number of singular points at which the “seventh value” becomes a value close to “0”.

  Further, in the data processing device 3, in the “tenth process”, the processing unit 23 sets a regression line of each “first corresponding point” passing through the origin P 0 of the two-dimensional graph (two points in FIGS. The dashed line L) is identified, and the value of the vertical axis when the value of the horizontal axis of the identified regression line is "1" is identified as the "sixteenth value", and the origin P0 of the two-dimensional graph , Point P1 whose value of the horizontal axis is "1" and whose value of the horizontal axis is "0" and whose value of the horizontal axis is "1" and whose value of the horizontal axis is "1" are three points: While specifying the triangle area A1 to be a vertex, "at least one area" is defined based on the specified triangle area A1.

  Therefore, according to data processing device 3 and data processing program Dp, it is possible to reliably and easily specify triangle area A1 which is extremely unlikely to be plotted with the "second corresponding point" corresponding to the value of the discharge waveform component. Based on this triangular area A1, the determination area Aa and / or the determination area Ab can be easily specified to generate the area data Da.

  Furthermore, in the data processing device 3, the processing unit 23 associates each “first value” of the waveform data D1 with the vertical axis of the two-dimensional graph, and each “first value” along the horizontal axis of the two-dimensional graph. The “third value” of the “first value” and the “third value” of the “seventh value” are plotted on the two-dimensional graph in correspondence with each “seventh value” of the waveform data D7 corresponding to the sampling timing of While extracting the “third corresponding point” having the value of the horizontal axis equal to or less than the predefined “17th value” equal to or less than “0.5” and extracting each “third corresponding point” The standard deviation nσ of the values on the vertical axis is calculated, and the origin P0, point P1, the point P3 on the vertical axis is the sum of the standard deviation nσ and the “16th value”, and the point P3 on the horizontal axis is “1”, And a rectangular area A2 having four points of the point P4 whose values of the vertical axis are standard deviation nσ and whose values of the horizontal axis are “0” are specified as vertexes, Defines the "at least one region" based on the boss was a rectangular area A2 and the triangular region A1.

  Therefore, according to the data processing device 3 and the data processing program Dp, the determination area Aa and / or the determination area Ab can be easily specified based on the specified rectangular area A2 and triangular area A1, and the waveform data D0 It is possible to easily generate the area data Da of the determination area Aa and / or the determination area Ab that can determine with high accuracy whether the discharge waveform component is included in the waveform W0.

  Further, in the data processing device 3, the processing unit 23 specifies the smallest rectangular area A3 including all the “first corresponding points” in the “tenth process” and specifies the smallest rectangular area A3. Define "at least one region" on the basis. Therefore, according to the data processing device 3 and the data processing program Dp, the area data Da of the determination area Ac and / or the determination area Ad can be generated by very simple processing.

  Furthermore, in the data processing device 3, the processing unit 23 specifies the positional relationship between the "second corresponding point" and the "at least one of the regions" based on the inspection data Dc, and sets it as the waveform W0 of the waveform data D0. A “determination process” is performed to determine whether a discharge waveform component is included, and inspection result data Dr capable of specifying the determination result of the “determination process” is generated. Also, the data processing program Dp causes the processing unit 23 of the data processing device 3 to execute the above-described processing.

  Therefore, according to the data processing device 3 and the data processing program Dp, a plurality of measurement processes become unnecessary, and the influence of individual differences in a plurality of "measurement objects" or the difference in measurement environment for each measurement process Since the influence of the variation in the measurement value Ds resulting therefrom is eliminated, it is possible to sufficiently improve the determination accuracy as to whether or not the discharge phenomenon has occurred. Further, unlike determination based on comparison with a reference value (threshold value), it is possible to avoid erroneous determination due to the influence of a change in measurement environment and sufficiently improve the determination accuracy.

  Further, in the data processing device 3, when the processing unit 23 sets the determination area Aa (or the determination area Ac) as the “at least one area”, the determination area Aa (or the total number of “second corresponding points”) When specifying the ratio of “second corresponding points” not included in the determination area Ac) and setting the determination area Ab (or the determination area Ad) as “at least one of the areas”, “second corresponding point” The ratio of the “second corresponding point” included in the determination area Ab (or the determination area Ad) occupying the total number of the groups is specified, and when the specified ratio is equal to or more than the previously defined ratio, Execute "Process".

  Further, in the data processing device 3, the processing unit 23 specifies Ga rectangular areas A10 to A19 obtained by dividing the two-dimensional graph into Ga in the direction of the horizontal axis, and determines the determination area Aa (or the determination area Ac). When the “at least one of the areas” is designated, the number of rectangular areas A10 to A19 in which the “second corresponding point” is included in the areas other than the determination area Aa (or the determination area Ac) is specified and When Ab (or determination area Ad) is "at least one area", the number of rectangular areas A10 to A19 in which "second corresponding points" are included in the determination area Ab (or determination area Ad) is specified When the specified number is equal to or more than the number defined in advance, the "informing process" defined in advance is executed.

  Therefore, according to the data processing device 3 and the data processing program Dp, the determination result as to whether or not the waveform W0 of the waveform data D0 includes a discharge waveform component can be recognized surely and easily.

  Further, in the data processing device 3, the processing unit 23 sets a two-dimensional graph in which the “second corresponding point” is plotted and “area display” indicating “at least one area” together with the determination result of the “determination process”. It is displayed on the display unit 22. Therefore, according to the data processing device 3 and the data processing program Dp, the determination result as to whether or not the waveform W0 of the waveform data D0 includes a discharge waveform component can be recognized more surely and more easily.

  In addition, the measurement system 1 includes the data processing device 3 described above, and the measurement device 2 that performs measurement at a predetermined sampling period for the measurement target (examination target X) and outputs the waveform data D0. Is configured. Therefore, according to the measurement system 1, a series of processes from acquisition (generation) of the waveform data D0 to generation of the inspection data Dc (or generation of the inspection data Dc and the inspection result data Dr) are performed by one system. It can be done.

  Note that the configurations of the “data processing device” and the “measurement system” and the procedure of processing by the “data processing program” are the configuration of the data processing device 3 described above and the measurement system configured to include the data processing device 3 The present invention is not limited to the example of the configuration 1 or the example of the contents of the description of the data processing program Dp. For example, when plotting “first corresponding point” to “third corresponding point”, “one of the vertical axis and the horizontal axis defined in advance” is set as the “vertical axis”, and “the vertical axis and the horizontal axis An example in which the “other axis” is “horizontal axis” has been described, but “one of the vertical axis and the horizontal axis defined in advance” is “horizontal axis”, and “the other of the vertical axis and horizontal axis” is “vertical It may be plotted as "axis".

  Also, the configuration in which the data processing device 3 executes both the generation process of the inspection data Dc and the “determination process whether or not the discharge waveform component exists” based on the inspection data Dc has been described as an example. It is also possible to adopt a configuration in which the “determination process” based on the inspection data Dc is executed in the “data processing device” separate from the data processing device 3 that generates the inspection data Dc. Furthermore, although the configuration in which the determination result of the “determination process” is displayed on the display unit 22 which is a component of the data processing device 3 has been described as an example, the determination result is displayed on the display device (display unit) as an external device It is also possible to adopt a configuration that

  Although an example in which the measurement system 1 is configured to include the measurement apparatus 2 and the data processing apparatus 3 separate from the measurement apparatus 2 has been described, an apparatus in which the "measurement apparatus" and the "data processing apparatus" are integrated Can also be configured as a "measurement system". In addition, although the example of processing and inspecting the data on the winding parts as the "object to be measured" has been described, the object of data processing by the "data processing apparatus" and the object of inspection by the "measurement system" It is not limited, and data processing and inspection processing can be performed based on various electronic components such as capacitors and resistors, and "waveform data" between arbitrary inspection points on the circuit board.

DESCRIPTION OF SYMBOLS 1 measurement system 2 measurement device 3 data processing device 21 operation unit 22 display unit 23 processing unit 24 storage unit Aa to Ad determination region A1 triangular region A2, A10 to A19 rectangular region A3 rectangular region Ds measured value D0, D0f, D1 to D9 Waveform data Da area data Dc data for inspection Dp data processing program Dr inspection result data P0 origin P1 to P4 points W0, W0f, W1 to W7, W7a to W7f, W8, W9, Wa waveform X inspection target

Claims (20)

Based on waveform data in which a plurality of measured values measured in a predetermined sampling cycle are recorded, for determining whether or not a signal waveform of the waveform data includes a discharge waveform component A data processing apparatus comprising a processing unit for generating data, the data processing apparatus comprising:
The processing unit determines whether the discharge waveform component is included by comparing measured value range data of a measured value range serving as a specific reference of whether or not the discharge waveform component is included, and the measured value range. A data processing apparatus that generates comparison value data that can specify whether or not the discharge value determination data is generated based on the waveform data and including the generated measurement value range data and the comparison value data. The processing unit is
A first value is extracted by extracting a first value of which the variation in continuous N sampling (N is a predetermined natural number of 2 or more) is equal to or greater than a predetermined amount from each of the measured values of the waveform data. A first process of generating data of
Each of the measured values of the waveform data is a second value obtained by averaging the measured values of consecutive M samplings (M is a predetermined natural number of 2 or more) including the measured value of interest A second process of replacing to generate second data;
A third value is generated by extracting a third value in which the amount of change in the consecutive N samplings is equal to or more than the predetermined amount from the second values of the second data. Processing and
A fourth process of generating fourth data by calculating a fourth value obtained by subjecting each of the third values of the third data to an absolute value;
The measurement values of the waveform data are replaced with the average value of the measurement values of consecutive L samplings (L is a predetermined natural number of 2 or more) including the measurement value of interest, and after replacement A fifth process of calculating a fifth value obtained by differentiating the measurement value of the second to generate fifth data;
A sixth process of generating sixth data by calculating a sixth value obtained by differentiating the fifth value of the fifth data;
A seventh process of generating seventh data by calculating a seventh value obtained by normalizing the absolute value of each of the sixth values of the sixth data;
An eighth process of generating an eighth data by calculating an eighth value obtained by subjecting each first value of the first data to an absolute value;
Each of the fourth values of the fourth data is made to correspond to either one of the predetermined vertical axis and horizontal axis of the two-dimensional graph, and the other of the vertical axis and horizontal axis of the two-dimensional graph The seventh values of the seventh data corresponding to the sampling timings of 4 values correspond to each other, and the fourth corresponding value and the first corresponding point of the seventh value are respectively displayed on the two-dimensional graph. The ninth process to plot,
Each of the eighth values of the eighth data is associated with one of the predetermined vertical and horizontal axes of the two-dimensional graph and the other of the vertical and horizontal axes of the two-dimensional graph. The seventh values of the seventh data corresponding to the sampling timings of the eighth values correspond to each other, and the second corresponding points of the eighth values and the seventh values are the two-dimensional graph A first determination region in which the second corresponding point corresponding to the measured value of the discharge waveform component is not plotted when plotted on the top, and the second correspondence region corresponding to the measured value of the discharge waveform component At least one region of the second determination region in which the points are plotted is set on the two-dimensional graph according to a region definition procedure defined in advance based on the arrangement of the first corresponding points on the two-dimensional graph. measured value Run a tenth process of defining a circumference,
Region data that can specify the at least one region defined by the tenth process is the measurement value range data, and the seventh data and the eighth data are the comparison value data, and the discharge presence / absence is specified The data processing apparatus according to claim 1, wherein the data processing apparatus generates data for processing.   The processing unit, prior to the ninth processing, calculates a ninth value obtained by normalizing the absolute value of each of the fifth values of the fifth data so that the maximum value becomes 1. Of the respective ninth values of the ninth data and a coefficient Ka (Ka is a predetermined positive number less than or equal to 1) multiplied by the respective ninth values, and sampling of the respective ninth values An eleventh process is executed to generate new seventh data with one larger one of the seventh data corresponding to the timing and the seventh value as a new seventh value. Data processor as described.   The processing unit, prior to the ninth processing, sets each of the seventh values of the seventh data to the target seventh value before Ja sampling (Ja is an arbitrary predetermined value. Jb sampling of (Ja + 1) pieces of the seventh value from the seventh value of the natural numbers) to the seventh value of the object and the seventh value of the object from the seventh value of the object Predefined Jc (Jc is predetermined) including at least one of (Jb + 1) the seventh values to the seventh value after (Jb is an arbitrary predetermined natural number) 3. The data processing apparatus according to claim 2, wherein a twelfth process of generating new seventh data by replacing the maximum value among the seventh values of two or more natural numbers) with each other is executed.   The processing unit, prior to the ninth processing, selects, from the seventh value before I sampling (I is an arbitrary predetermined natural number), of the seventh values of the seventh data. Is smaller than the seventh value before the I sampling, and the seventh value before the I sampling is a coefficient Kb (Kb is 1 or less defined in advance 3. The data processing apparatus according to claim 2, wherein a thirteenth process of generating new seventh data by replacing the tenth value multiplied by the positive number of 10) with the larger one of the tenth values is executed.   The processing unit corresponds to the measurement value corresponding to the measurement value sampled after the measurement value corresponding to the maximum value among the seventh values of the seventh data prior to the ninth process. The seventh value of Ha prior to Ha sampling (Ha is an arbitrary predetermined natural number) with respect to the seventh value of interest is continuous including the seventh value of interest of interest. An eleventh value obtained by averaging the seventh value of the Hb sampling (Hb is a predetermined natural number of 2 or more) and the coefficient Kc (Kc is a predetermined arbitrary positive number) When the value is less than the value, the seventh value of the subject and the seventh value before the Ha sampling are multiplied by a predetermined coefficient Kd (Kd is any predetermined positive number larger than Kc). Replace the 12th value with the smaller one The data processing apparatus according to any one of claims 2 to 5 to perform fourteenth process of generating data.   In the fourteenth process, the processing unit may set the seventh value before the Ha sampling to a value obtained by averaging the seventh value for the Hb sampling as a coefficient Ke (Ke is any predetermined value. 7. The data processing apparatus according to claim 6, wherein the seventh value of the target is replaced with the thirteenth value when it is smaller than a thirteenth value multiplied by a positive number).   The processing unit corresponds to the measurement value sampled prior to the measurement value corresponding to the maximum value of the seventh values of the seventh data prior to the ninth process. A factor Kf (the seventh value) is set to the seventh value before the Hc sampling (Hc is an arbitrary predetermined natural number) with respect to the seventh value of the target and the seventh value of the target. 8. The method according to claim 2, wherein a Ke is replaced with a 14th value multiplied by an arbitrary predetermined positive number), whichever is larger, to execute a 15th process of generating new 7th data. The data processing apparatus according to any one of the above.   In the fifteenth process, the processing unit is configured such that both the seventh value and the fourteenth value of the target include the seventh value of the target and the continuous Hd sampling portion (Hd is predetermined The value obtained by averaging the seventh value of the two or more natural numbers) is smaller than the fifteenth value obtained by multiplying the coefficient K.sub.g (K.sub.g is an arbitrary predetermined positive number), The data processing apparatus according to claim 8, wherein the seventh value is replaced with the fifteenth value.   In the tenth process, the processing unit identifies a regression line of the first corresponding points passing through the origin of the two-dimensional graph, and the vertical axis of the two-dimensional graph in the identified regression line and One of the previously defined one of the vertical axis and the horizontal axis of the two-dimensional graph when the other value of the horizontal axis is 1 is specified as a sixteenth value, and the origin of the two-dimensional graph, The predetermined one value is the sixteenth value and the other value is the first point of 1, and the predetermined one value is 0 and the other value is the second point. The data processing apparatus according to any one of claims 2 to 9, wherein a triangular area having three points of (3) as vertices is specified, and the at least one area is defined based on the specified triangular area.   The processing unit associates each of the first values of the first data with one of the predetermined vertical axis and horizontal axis of the two-dimensional graph in advance, and the vertical axis and the vertical axis of the two-dimensional graph. The seventh values of the seventh data corresponding to the sampling timings of the first values correspond to the other of the horizontal axis, and the third corresponding points of the first value and the seventh value Are plotted on the two-dimensional graph, and the third corresponding points whose other values of the vertical axis and the horizontal axis are less than or equal to a predefined seventeenth value of “0.5” or less are extracted. Calculating the standard deviation nσ (n is an arbitrary natural number defined in advance) of one of the predetermined values of the vertical axis and the horizontal axis at each of the extracted third corresponding points, and the origin , Said first point, said pre-defined one side Is the sum of the standard deviation nσ and the sixteenth value, and the third point of the other value is 1 and the previously defined one value is the standard deviation nσ of the other value of 0 The data processing apparatus according to claim 10, wherein a first rectangular area having four points of four points as vertices is specified, and the at least one area is defined based on the specified first rectangular area and the triangular area. .   The processing unit specifies a minimum rectangular area including all the first corresponding points in the tenth process, and defines the at least one area based on the specified rectangular area. The data processing device according to any one of 2 to 9.   Does the processing unit specify the positional relationship between the second corresponding point and the at least one region based on the discharge presence / absence identification data, and the discharge waveform component is included in the signal waveform of the waveform data? The data processing apparatus according to any one of claims 2 to 12, wherein the data processing apparatus executes determination processing for determining whether or not it is not, and determination result data capable of specifying the determination result of the determination processing is generated.   The processing unit specifies a ratio of the second corresponding points not included in the first determination area in the total number of the second corresponding points when the first determination area is the at least one area. In addition, when the second determination area is the at least one area, the ratio of the second corresponding point included in the second determination area to the total number of the second corresponding points is specified and specified. The data processing apparatus according to claim 13, wherein when the ratio is equal to or more than a predetermined ratio, the notification process defined in advance is executed.   The processing unit specifies Ga second rectangular regions obtained by dividing the two-dimensional graph into Ga pieces (Ga is a predetermined natural number of 2 or more) in the other direction of the vertical axis and the horizontal axis. When the first determination area is the at least one area, the number of the second rectangular areas in which the second corresponding points are included in areas other than the first determination area is specified, When the second determination area is the at least one area, the number of the second rectangular areas in which the second corresponding point is included in the second determination area is specified, and the specified number is determined in advance. The data processing apparatus according to claim 13, wherein when the number is greater than or equal to a defined number, a notification process defined in advance is performed.   The display processing unit according to any one of claims 13 to 15, wherein the processing unit causes the display unit to display the two-dimensional graph obtained by plotting the second corresponding points and a region display indicating the at least one region together with the determination result of the determination process. The data processing apparatus according to claim 1. The data processing apparatus according to any one of claims 1 to 16.
And a measuring device configured to execute the measurement at the predetermined sampling period for the measurement target and output the waveform data. Based on waveform data in which a plurality of measured values measured in a predetermined sampling cycle are recorded, for determining whether or not a signal waveform of the waveform data includes a discharge waveform component A data processing program that causes a processing unit of a data processing apparatus to execute processing for generating data,
Whether or not the discharge waveform component is included can be identified by comparing measured value range data of the measured value range serving as a specific reference of whether or not the discharge waveform component is included, and the measured value range. A data processing program that causes the processing unit to generate comparison value data based on the waveform data and generate the discharge presence / absence identification data including the generated measurement value range data and the comparison value data. . A first value is extracted by extracting a first value of which the variation in continuous N sampling (N is a predetermined natural number of 2 or more) is equal to or greater than a predetermined amount from each of the measured values of the waveform data. A first process of generating data of
Each of the measured values of the waveform data is a second value obtained by averaging the measured values of consecutive M samplings (M is a predetermined natural number of 2 or more) including the measured value of interest A second process of replacing to generate second data;
A third value is generated by extracting a third value in which the amount of change in the consecutive N samplings is equal to or more than the predetermined amount from the second values of the second data. Processing and
A fourth process of generating fourth data by calculating a fourth value obtained by subjecting each of the third values of the third data to an absolute value;
The measurement values of the waveform data are replaced with the average value of the measurement values of consecutive L samplings (L is a predetermined natural number of 2 or more) including the measurement value of interest, and after replacement A fifth process of calculating a fifth value obtained by differentiating the measurement value of the second to generate fifth data;
A sixth process of generating sixth data by calculating a sixth value obtained by differentiating the fifth value of the fifth data;
A seventh process of generating seventh data by calculating a seventh value obtained by normalizing the absolute value of each of the sixth values of the sixth data;
An eighth process of generating an eighth data by calculating an eighth value obtained by subjecting each first value of the first data to an absolute value;
Each of the fourth values of the fourth data is made to correspond to either one of the predetermined vertical axis and horizontal axis of the two-dimensional graph, and the other of the vertical axis and horizontal axis of the two-dimensional graph The seventh values of the seventh data corresponding to the sampling timings of 4 values correspond to each other, and the fourth corresponding value and the first corresponding point of the seventh value are respectively displayed on the two-dimensional graph. The ninth process to plot,
Each of the eighth values of the eighth data is associated with one of the predetermined vertical and horizontal axes of the two-dimensional graph and the other of the vertical and horizontal axes of the two-dimensional graph. The seventh values of the seventh data corresponding to the sampling timings of the eighth values correspond to each other, and the second corresponding points of the eighth values and the seventh values are the two-dimensional graph A first determination region in which the second corresponding point corresponding to the measured value of the discharge waveform component is not plotted when plotted on the top, and the second correspondence region corresponding to the measured value of the discharge waveform component At least one region of the second determination region in which the points are plotted is set on the two-dimensional graph according to a region definition procedure defined in advance based on the arrangement of the first corresponding points on the two-dimensional graph. measured value And a tenth process of defining a circumference with executing the processing unit,
Region data that can specify the at least one region defined by the tenth process is the measurement value range data, and the seventh data and the eighth data are the comparison value data, and the discharge presence / absence is specified The program for data processing according to claim 18, making the processing unit execute a process of generating data for processing.   Whether or not the discharge waveform component is included in the signal waveform of the waveform data by determining whether or not the second corresponding point is included in the at least one region based on the discharge presence / absence identification data 20. The data processing program according to claim 19, causing the processing unit to execute a determination process of determining the determination result and a process of generating determination result data capable of specifying the determination result of the determination process.

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