JP2019067985A5 - - Google Patents
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- JP2019067985A5 JP2019067985A5 JP2017194109A JP2017194109A JP2019067985A5 JP 2019067985 A5 JP2019067985 A5 JP 2019067985A5 JP 2017194109 A JP2017194109 A JP 2017194109A JP 2017194109 A JP2017194109 A JP 2017194109A JP 2019067985 A5 JP2019067985 A5 JP 2019067985A5
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- Prior art keywords
- low resistance
- resistance region
- semiconductor film
- manufacturing
- region
- Prior art date
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- 239000004065 semiconductor Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
Description
図11は、半導体装置102を製造する一工程を表している。半導体装置102の製造方法では、フォトレジストPr1,Pr2,Pr3を用いて、第2絶縁膜16のパターニングを行う際に半導体膜15(低抵抗領域15b−1)のエッチングを調整すればよい。過剰なエッチングがなされないようにすることで、低抵抗領域15b−1の半導体膜15が、第2領域10−2(低抵抗領域15b−2)の半導体膜15と同じ厚みtで形成される。
FIG. 11 shows one process for manufacturing the semiconductor device 102. In the method for manufacturing the semiconductor device 102 , the etching of the semiconductor film 15 (low resistance region 15b-1) may be adjusted when patterning the second insulating film 16 using the photoresists Pr1, Pr2, and Pr3. By preventing excessive etching, the semiconductor film 15 in the low resistance region 15b-1 is formed with the same thickness t as the semiconductor film 15 in the second region 10-2 (low resistance region 15b-2). .
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017194109A JP6732713B2 (en) | 2017-10-04 | 2017-10-04 | Semiconductor device and display device |
CN201711444009.1A CN108305874B (en) | 2017-01-12 | 2017-12-27 | Semiconductor device with a plurality of semiconductor chips |
US15/863,009 US10431603B2 (en) | 2017-01-12 | 2018-01-05 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017194109A JP6732713B2 (en) | 2017-10-04 | 2017-10-04 | Semiconductor device and display device |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2019067985A JP2019067985A (en) | 2019-04-25 |
JP2019067985A5 true JP2019067985A5 (en) | 2019-09-19 |
JP6732713B2 JP6732713B2 (en) | 2020-07-29 |
Family
ID=66337956
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017194109A Active JP6732713B2 (en) | 2017-01-12 | 2017-10-04 | Semiconductor device and display device |
Country Status (1)
Country | Link |
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JP (1) | JP6732713B2 (en) |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10150198A (en) * | 1996-11-18 | 1998-06-02 | Mitsubishi Electric Corp | Thin film transistor and its manufacture |
JP4092851B2 (en) * | 2000-04-19 | 2008-05-28 | セイコーエプソン株式会社 | Electro-optical device, method of manufacturing electro-optical device, and electronic apparatus |
JP4731718B2 (en) * | 2001-04-27 | 2011-07-27 | 株式会社半導体エネルギー研究所 | Display device |
JP4429576B2 (en) * | 2001-09-10 | 2010-03-10 | 株式会社半導体エネルギー研究所 | Semiconductor device |
JP2004363300A (en) * | 2003-06-04 | 2004-12-24 | Sharp Corp | Liquid crystal display |
JP2007334317A (en) * | 2006-05-16 | 2007-12-27 | Semiconductor Energy Lab Co Ltd | Liquid crystal display device and semiconductor device |
JP2011221119A (en) * | 2010-04-06 | 2011-11-04 | Seiko Epson Corp | Electro-optic device, electronic equipment, and manufacturing method of electro-optic device |
US20120319113A1 (en) * | 2011-06-17 | 2012-12-20 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
US9099560B2 (en) * | 2012-01-20 | 2015-08-04 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
JP6506545B2 (en) * | 2013-12-27 | 2019-04-24 | 株式会社半導体エネルギー研究所 | Semiconductor device |
US9443876B2 (en) * | 2014-02-05 | 2016-09-13 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, display device including the semiconductor device, display module including the display device, and electronic device including the semiconductor device, the display device, and the display module |
US9640669B2 (en) * | 2014-03-13 | 2017-05-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, display device including the semiconductor device, display module including the display device, and electronic appliance including the semiconductor device, the display device, and the display module |
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2017
- 2017-10-04 JP JP2017194109A patent/JP6732713B2/en active Active
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