JP2019049612A - 光変調器及びその製造方法 - Google Patents
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- 230000003287 optical effect Effects 0.000 title claims abstract description 124
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 238000000034 method Methods 0.000 title description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 230000001939 inductive effect Effects 0.000 claims description 15
- 230000001965 increasing effect Effects 0.000 claims description 8
- 239000013078 crystal Substances 0.000 claims description 3
- 239000012535 impurity Substances 0.000 abstract description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 21
- 239000010703 silicon Substances 0.000 description 21
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 18
- 230000000694 effects Effects 0.000 description 16
- 239000000203 mixture Substances 0.000 description 10
- 239000000969 carrier Substances 0.000 description 6
- 230000001976 improved effect Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000005253 cladding Methods 0.000 description 4
- 238000004891 communication Methods 0.000 description 4
- 230000031700 light absorption Effects 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000005693 optoelectronics Effects 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000006698 induction Effects 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 230000005374 Kerr effect Effects 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000010363 phase shift Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000008093 supporting effect Effects 0.000 description 1
- 238000000038 ultrahigh vacuum chemical vapour deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
- G02F1/025—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction in an optical waveguide structure
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12133—Functions
- G02B2006/12142—Modulator
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/015—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
- G02F1/0151—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction modulating the refractive index
- G02F1/0152—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction modulating the refractive index using free carrier effects, e.g. plasma effect
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/06—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 integrated waveguide
- G02F2201/063—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 integrated waveguide ridge; rib; strip loaded
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2203/00—Function characteristic
- G02F2203/50—Phase-only modulation
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- Physics & Mathematics (AREA)
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
【解決手段】光位相変調器100は、基板上に横方向に形成されたSiからなるPN接合106と、p型に不純物ドーピングされ、PN接合106と電気的に接続されるように、PN接合106上に積層される少なくとも1層からなるSi1−xGex層108とを含むリブ型導波路構造110を備え、リブ型導波路構造110は、光の伝搬方向に沿って実質的に一様な構造を有し、基板と平行且つ光の伝搬方向と垂直な方向において、PN接合106の接合界面106aの位置がSi1−xGex層108の中心からオフセットしている。
【選択図】図1
Description
Claims (15)
- 基板上に横方向に形成されたSi又はSi1−yGeyからなるPN接合又はPIN接合と、
第1の導電タイプ又は第2の導電タイプを呈するように不純物ドーピングされ、前記PN接合又は前記PIN接合と電気的に接続されるように、前記PN接合又は前記PIN接合上に積層される少なくとも1層からなるSi1−xGex層と
を含むリブ型導波路構造を備え、
前記リブ型導波路構造は、光の伝搬方向に沿って実質的に一様な構造を有し、
前記基板と平行且つ前記光の伝搬方向と垂直な方向において、前記PN接合又は前記PIN接合の接合界面の位置が前記Si1−xGex層の中心からオフセットしていることを特徴とする光位相変調器。 - 前記PN接合又は前記PIN接合の接合界面の位置は、前記PN接合又は前記PIN接合の電気容量が大きくなるように、前記PN接合又は前記PIN接合を構成するp型領域又はn型領域の方向へオフセットしていることを特徴とする請求項1に記載の光位相変調器。
- 前記リブ型導波路構造に隣接する、前記第1の導電タイプの第1の電極及び前記第2の導電タイプの第2の電極を備え、
前記第1の電極及び前記第2の電極に電圧を印加することにより、前記リブ型導波路構造におけるキャリア密度が変化されることを特徴とする請求項1又は2に記載の光位相変調器。 - 前記少なくとも1層からなるSi1−xGex層が格子歪を有することを特徴とする請求項1乃至3のいずれか1項に記載の光位相変調器。
- 前記基板上に横方向に形成されたPN接合又はPIN接合が、SiからなるPN接合又はPIN接合と、Si1−yGeyからなるPN接合又はPIN接合との積層構造からなることを特徴とする請求項1及至4のいずれか1項に記載の光位相変調器。
- 前記基板上に横方向に形成されたSiおよびSi1−yGeyの積層構造からなるPN接合又はPIN接合が、リブ型導波路構造を備えることを特徴とする請求項5に記載の光位相変調器。
- 前記少なくとも1層からなるSi1−xGex層が、
前記PN接合又は前記PIN接合上に積層されたSi1−x1Gex1層と、
前記Si1−x1Gex1層上に積層されたSi1−x2Gex2層と
を備え、x2はx1より小さいことを特徴とする請求項1乃至6のいずれか1項に記載の光位相変調器。 - 前記少なくとも1層からなるSi1−xGex層が、上部あるいは側面に形成された歪誘起膜を備えることを特徴とする請求項1乃至7のいずれか1項に記載の光位相変調器。
- 前記基板上に横方向に形成されたPN接合もしくはPIN接合、又はその上に電気的に接続されるように積層された少なくとも1層からなるSi1−xGex層において、前記第1の導電タイプのドーピング濃度は前記第2の導電タイプのドーピング濃度よりも小さいことを特徴とする請求項1乃至8のいずれか1項に記載の光位相変調器。
- 前記第1の導電タイプがp型であり、前記第2の導電タイプがn型であることを特徴とする請求項9に記載の光位相変調器。
- 前記PN接合が、前記光の伝搬方向に延在する単一のp型領域及び単一のn型領域からなる単一のPN接合によって構成されることを特徴とする請求項1乃至10のいずれか1項に記載の光位相変調器。
- 前記Si1−xGex層において0≦x<0.6であることを特徴とする請求項1乃至11のいずれか1項に記載の光位相変調器。
- 前記基板の結晶方位は<110>であることを特徴とする請求項1乃至12のいずれか1項に記載の光位相変調器。
- 請求項1乃至13のいずれか1項に記載の光位相変調器を備える光強度変調器。
- 横方向に形成されたSi又はSi1−yGeyからなるPN接合又はPIN接合を形成するステップと、
前記PN接合又は前記PIN接合に隣接する領域を第1の導電タイプ及び第2の導電タイプでドープして、第1の導電タイプの第1の電極及び第2の導電タイプの第2の電極を形成するステップと、
前記PN接合又は前記PIN接合上に、前記第1の導電タイプ又は前記第2の導電タイプを呈するように不純物ドーピングされ、前記PN接合又は前記PIN接合と電気的に接続される少なくとも1層からなるSi1−xGex層を形成するステップと
を備え、
前記PN接合又はPIN接合と前記Si1−xGex層とによって、光の伝搬方向に沿って実質的に一様な構造を有するリブ型導波路構造が形成され、
基板と平行且つ前記光の伝搬方向と垂直な方向において、前記PN接合又は前記PIN接合の接合界面の位置が前記Si1−xGex層の中心からオフセットしていることを特徴とする光位相変調器の製造方法。
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US11506496B2 (en) * | 2019-07-10 | 2022-11-22 | Anello Photonics, Inc. | System architecture for integrated photonics optical gyroscopes |
WO2021065578A1 (ja) * | 2019-10-04 | 2021-04-08 | 国立大学法人東京工業大学 | 光変調素子 |
US11940678B2 (en) * | 2020-07-14 | 2024-03-26 | Intel Corporation | Stressed silicon modulator |
WO2022043166A1 (en) | 2020-08-28 | 2022-03-03 | Polariton Technologies Ag | A plasmonic device and a method for fabricating a plasmonic device |
CN117406471A (zh) * | 2022-07-07 | 2024-01-16 | 苏州湃矽科技有限公司 | 硅光调制器 |
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