JP2019034998A - Resin composition containing benzotriazol-based polymer - Google Patents
Resin composition containing benzotriazol-based polymer Download PDFInfo
- Publication number
- JP2019034998A JP2019034998A JP2017155735A JP2017155735A JP2019034998A JP 2019034998 A JP2019034998 A JP 2019034998A JP 2017155735 A JP2017155735 A JP 2017155735A JP 2017155735 A JP2017155735 A JP 2017155735A JP 2019034998 A JP2019034998 A JP 2019034998A
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- JP
- Japan
- Prior art keywords
- group
- resin
- resin composition
- benzotriazol
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 39
- 229920000642 polymer Polymers 0.000 title description 39
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 title description 13
- -1 benzotriazol derivative compound Chemical class 0.000 claims abstract description 64
- 229920005989 resin Polymers 0.000 claims abstract description 47
- 239000011347 resin Substances 0.000 claims abstract description 47
- 229920001519 homopolymer Polymers 0.000 claims abstract description 18
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 14
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 8
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims abstract description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 5
- 125000005425 toluyl group Chemical group 0.000 claims abstract description 5
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 4
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims abstract description 4
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 17
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 claims description 4
- 125000003944 tolyl group Chemical group 0.000 claims description 3
- 239000002994 raw material Substances 0.000 abstract description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 78
- 150000001875 compounds Chemical class 0.000 description 47
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 40
- 238000005259 measurement Methods 0.000 description 29
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 26
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 24
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 18
- 239000000203 mixture Substances 0.000 description 18
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 18
- 238000000034 method Methods 0.000 description 17
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 17
- 230000015572 biosynthetic process Effects 0.000 description 16
- 238000003786 synthesis reaction Methods 0.000 description 16
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 13
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 12
- 239000012964 benzotriazole Substances 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 12
- 239000013078 crystal Substances 0.000 description 12
- 238000006116 polymerization reaction Methods 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 10
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 10
- 239000006096 absorbing agent Substances 0.000 description 9
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 9
- 229910000029 sodium carbonate Inorganic materials 0.000 description 9
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 238000004128 high performance liquid chromatography Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- AHQCTPQBXNKFJH-UHFFFAOYSA-N 4-(5-methoxybenzotriazol-2-yl)benzene-1,3-diol Chemical compound N1=C2C=C(OC)C=CC2=NN1C1=CC=C(O)C=C1O AHQCTPQBXNKFJH-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 6
- 239000003505 polymerization initiator Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- 239000004342 Benzoyl peroxide Substances 0.000 description 5
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 5
- 238000005481 NMR spectroscopy Methods 0.000 description 5
- 235000019400 benzoyl peroxide Nutrition 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 238000002835 absorbance Methods 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical class C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- SZIFAVKTNFCBPC-UHFFFAOYSA-N 2-chloroethanol Chemical compound OCCCl SZIFAVKTNFCBPC-UHFFFAOYSA-N 0.000 description 3
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- 150000001565 benzotriazoles Chemical class 0.000 description 3
- 238000005266 casting Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 229940098779 methanesulfonic acid Drugs 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- VJTAQCFWGQRRSZ-UHFFFAOYSA-N 2-[5-(2-hydroxyethoxy)benzotriazol-2-yl]-5-octoxyphenol Chemical compound OCCOC1=CC=2C(=NN(N2)C2=C(C=C(C=C2)OCCCCCCCC)O)C=C1 VJTAQCFWGQRRSZ-UHFFFAOYSA-N 0.000 description 2
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- IVTPGIYEKCIBMD-UHFFFAOYSA-N C(C)OC=1C=CC(=C(C1)O)N1N=C2C(=N1)C=CC(=C2)OCCO Chemical compound C(C)OC=1C=CC(=C(C1)O)N1N=C2C(=N1)C=CC(=C2)OCCO IVTPGIYEKCIBMD-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- NPKSPKHJBVJUKB-UHFFFAOYSA-N N-phenylglycine Chemical compound OC(=O)CNC1=CC=CC=C1 NPKSPKHJBVJUKB-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- LWMFAFLIWMPZSX-UHFFFAOYSA-N bis[2-(4,5-dihydro-1h-imidazol-2-yl)propan-2-yl]diazene Chemical compound N=1CCNC=1C(C)(C)N=NC(C)(C)C1=NCCN1 LWMFAFLIWMPZSX-UHFFFAOYSA-N 0.000 description 2
- 230000000740 bleeding effect Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 229920000609 methyl cellulose Polymers 0.000 description 2
- 239000001923 methylcellulose Substances 0.000 description 2
- 235000010981 methylcellulose Nutrition 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 229920006380 polyphenylene oxide Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 229920001897 terpolymer Polymers 0.000 description 2
- 150000003918 triazines Chemical class 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- LNAZSHAWQACDHT-XIYTZBAFSA-N (2r,3r,4s,5r,6s)-4,5-dimethoxy-2-(methoxymethyl)-3-[(2s,3r,4s,5r,6r)-3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6r)-4,5,6-trimethoxy-2-(methoxymethyl)oxan-3-yl]oxyoxane Chemical compound CO[C@@H]1[C@@H](OC)[C@H](OC)[C@@H](COC)O[C@H]1O[C@H]1[C@H](OC)[C@@H](OC)[C@H](O[C@H]2[C@@H]([C@@H](OC)[C@H](OC)O[C@@H]2COC)OC)O[C@@H]1COC LNAZSHAWQACDHT-XIYTZBAFSA-N 0.000 description 1
- AOSFMYBATFLTAQ-UHFFFAOYSA-N 1-amino-3-(benzimidazol-1-yl)propan-2-ol Chemical compound C1=CC=C2N(CC(O)CN)C=NC2=C1 AOSFMYBATFLTAQ-UHFFFAOYSA-N 0.000 description 1
- MPPPKRYCTPRNTB-UHFFFAOYSA-N 1-bromobutane Chemical compound CCCCBr MPPPKRYCTPRNTB-UHFFFAOYSA-N 0.000 description 1
- CNDHHGUSRIZDSL-UHFFFAOYSA-N 1-chlorooctane Chemical compound CCCCCCCCCl CNDHHGUSRIZDSL-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- RPZANUYHRMRTTE-UHFFFAOYSA-N 2,3,4-trimethoxy-6-(methoxymethyl)-5-[3,4,5-trimethoxy-6-(methoxymethyl)oxan-2-yl]oxyoxane;1-[[3,4,5-tris(2-hydroxybutoxy)-6-[4,5,6-tris(2-hydroxybutoxy)-2-(2-hydroxybutoxymethyl)oxan-3-yl]oxyoxan-2-yl]methoxy]butan-2-ol Chemical compound COC1C(OC)C(OC)C(COC)OC1OC1C(OC)C(OC)C(OC)OC1COC.CCC(O)COC1C(OCC(O)CC)C(OCC(O)CC)C(COCC(O)CC)OC1OC1C(OCC(O)CC)C(OCC(O)CC)C(OCC(O)CC)OC1COCC(O)CC RPZANUYHRMRTTE-UHFFFAOYSA-N 0.000 description 1
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 1
- MDKSQNHUHMMKPP-UHFFFAOYSA-N 2,5-bis(4-methoxyphenyl)-4-phenyl-1h-imidazole Chemical class C1=CC(OC)=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC(OC)=CC=2)N1 MDKSQNHUHMMKPP-UHFFFAOYSA-N 0.000 description 1
- LCPVQAHEFVXVKT-UHFFFAOYSA-N 2-(2,4-difluorophenoxy)pyridin-3-amine Chemical compound NC1=CC=CN=C1OC1=CC=C(F)C=C1F LCPVQAHEFVXVKT-UHFFFAOYSA-N 0.000 description 1
- RXAYEPUDXSKVHS-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-bis(3-methoxyphenyl)-1h-imidazole Chemical class COC1=CC=CC(C2=C(NC(=N2)C=2C(=CC=CC=2)Cl)C=2C=C(OC)C=CC=2)=C1 RXAYEPUDXSKVHS-UHFFFAOYSA-N 0.000 description 1
- NSWNXQGJAPQOID-UHFFFAOYSA-N 2-(2-chlorophenyl)-4,5-diphenyl-1h-imidazole Chemical class ClC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 NSWNXQGJAPQOID-UHFFFAOYSA-N 0.000 description 1
- AVTLBBWTUPQRAY-UHFFFAOYSA-N 2-(2-cyanobutan-2-yldiazenyl)-2-methylbutanenitrile Chemical compound CCC(C)(C#N)N=NC(C)(CC)C#N AVTLBBWTUPQRAY-UHFFFAOYSA-N 0.000 description 1
- UIHRWPYOTGCOJP-UHFFFAOYSA-N 2-(2-fluorophenyl)-4,5-diphenyl-1h-imidazole Chemical class FC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 UIHRWPYOTGCOJP-UHFFFAOYSA-N 0.000 description 1
- WCQGGJUMXRCNBX-UHFFFAOYSA-N 2-(2-hydroxy-4-octoxyphenyl)benzotriazol-5-ol Chemical compound CCCCCCCCOc1ccc(c(O)c1)-n1nc2ccc(O)cc2n1 WCQGGJUMXRCNBX-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XIOGJAPOAUEYJO-UHFFFAOYSA-N 2-(2-methoxyphenyl)-4,5-diphenyl-1h-imidazole Chemical class COC1=CC=CC=C1C1=NC(C=2C=CC=CC=2)=C(C=2C=CC=CC=2)N1 XIOGJAPOAUEYJO-UHFFFAOYSA-N 0.000 description 1
- FLJBBHRQCKCGAO-UHFFFAOYSA-N 2-(2-propan-2-yl-4,5-dihydroimidazol-1-yl)ethanol;dihydrochloride Chemical compound Cl.Cl.CC(C)C1=NCCN1CCO FLJBBHRQCKCGAO-UHFFFAOYSA-N 0.000 description 1
- RLAJUWSTNRXTQG-UHFFFAOYSA-N 2-(5-methoxybenzotriazol-2-yl)-5-octoxyphenol Chemical compound OC1=CC(OCCCCCCCC)=CC=C1N1N=C2C=C(OC)C=CC2=N1 RLAJUWSTNRXTQG-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 125000000143 2-carboxyethyl group Chemical group [H]OC(=O)C([H])([H])C([H])([H])* 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical class OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
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Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
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Abstract
Description
本発明は、紫外線吸収成分であるベンゾトリアゾール誘導体化合物の単独重合体が樹脂素材に含まれる樹脂組成物に関し、さらに詳しくは、前記単独重合体が高温状態でも揮散や分解が起こりにくい高い耐熱性を示し、かつ前記単独重合体と前記樹脂素材とが高い相溶性を示す樹脂組成物に関する。 The present invention relates to a resin composition in which a homopolymer of a benzotriazole derivative compound, which is an ultraviolet absorbing component, is contained in a resin material. More specifically, the present invention has high heat resistance in which volatilization and decomposition hardly occur even in a high temperature state. And a resin composition in which the homopolymer and the resin material exhibit high compatibility.
樹脂は自然光の紫外線の作用によって劣化を生じて、軟化、脆化または変色などの現象を伴ってその機械的強度が著しく低下することはよく知られている。このような光による劣化を防ぐため、従来より各種の紫外線吸収剤が樹脂の加工工程中に添加され、使用されている。このような紫外線吸収剤としては、例えば、ベンゾフェノン系、ベンゾトリアゾール系、ベンゾエート系、サリシレート系またはトリアジン系の化合物が知られている。 It is well known that a resin is deteriorated by the action of natural ultraviolet light, and its mechanical strength is remarkably lowered with a phenomenon such as softening, embrittlement or discoloration. In order to prevent such deterioration due to light, various ultraviolet absorbers have been conventionally used by being added during the resin processing step. As such ultraviolet absorbers, for example, benzophenone, benzotriazole, benzoate, salicylate, or triazine compounds are known.
しかし、従来より使用されている紫外線吸収剤は、樹脂加工時の高温状態でそれ自身の揮散や分解が起こることから、樹脂加工時における紫外線吸収剤の揮散による樹脂成型金型の汚染、紫外線吸収剤の熱分解による樹脂の着色等の問題があった。 However, conventional UV absorbers volatilize and decompose themselves at high temperatures during resin processing. Therefore, contamination of resin molds and UV absorption due to volatilization of UV absorbers during resin processing. There were problems such as coloring of the resin due to thermal decomposition of the agent.
これらの問題を解決するため、上記の紫外線吸収性化合物を二量化したり、紫外線吸収性化合物に嵩高い置換基を付加することによって、分子量を向上させた高耐熱性の紫外線吸収剤として、揮散や分解を防ぐ提案がされているが、このような化合物は一般的に樹脂との相溶性が不十分であることが多く、紫外線吸収剤を樹脂に添加した樹脂組成物は、紫外線吸収剤が樹脂表面にブリードアウトしてくるという問題があった。 In order to solve these problems, volatilization as a highly heat-resistant UV absorber with improved molecular weight by dimerizing the above UV-absorbing compound or adding a bulky substituent to the UV-absorbing compound However, such compounds generally have insufficient compatibility with the resin, and the resin composition in which the ultraviolet absorber is added to the resin has an ultraviolet absorber. There was a problem of bleeding out on the resin surface.
特許文献１および２では、（メタ）アクリロイル基を含有するベンゾトリアゾール誘導体と（メタ）アクリル酸エステルを共重合した高分子紫外線吸収剤が提案されており、紫外線吸収性の構造を高分子体の成分として組み込むことで、加工時の高温状態で紫外線吸収性成分の揮散や分解がなく、さらに加工後の紫外線吸収性成分のブリードアウトを防ぐ提案がされている。 Patent Documents 1 and 2 propose a polymer ultraviolet absorber obtained by copolymerizing a benzotriazole derivative containing a (meth) acryloyl group and a (meth) acrylic acid ester. It has been proposed that by incorporating it as a component, there is no volatilization or decomposition of the UV-absorbing component at a high temperature during processing, and furthermore, the bleeding-out of the UV-absorbing component after processing is prevented.
これらに記載された高分子紫外線吸収剤には、コンタクトレンズ、フィルム、塗料等の用途が示されている。しかしながら、いずれの文献の高分子紫外線吸収剤においても単独で成型または成膜されていることから、他の樹脂との相溶性は不十分と考えられる。このため汎用樹脂である樹脂素材にこれら高分子紫外線吸収剤を添加するような方法で使用することができず、高分子紫外線吸収剤と樹脂素材との樹脂組成物を得る事は困難であった。 The polymer ultraviolet absorbers described in these applications are used for contact lenses, films, paints and the like. However, since any of the polymer ultraviolet absorbers in any document is molded or formed alone, it is considered that the compatibility with other resins is insufficient. For this reason, it cannot be used by the method of adding these polymer ultraviolet absorbers to a resin material that is a general-purpose resin, and it was difficult to obtain a resin composition of the polymer ultraviolet absorber and the resin material. .
そこで本発明における課題は、高い耐熱性を持ちながら他の樹脂との相溶性に優れる紫外線吸収性成分を、汎用樹脂である樹脂素材に含有させた樹脂組成物を提供することである。 Then, the subject in this invention is providing the resin composition which made the resin raw material which is a general purpose resin contain the ultraviolet absorptive component excellent in compatibility with other resin, having high heat resistance.
本発明では、下記の一般式（１）で表されるベンゾトリアゾール誘導体化合物を数平均分子量２０００〜８０００の範囲で単独重合した、紫外線吸収性を有する単独重合体を、樹脂素材に含有させた樹脂組成物であることを、上記課題の主要な解決手段とする。 In the present invention, a resin material containing an ultraviolet-absorbing homopolymer obtained by homopolymerizing a benzotriazole derivative compound represented by the following general formula (1) in the range of a number average molecular weight of 2000 to 8000. The composition is the main means for solving the above-mentioned problems.
［式中、Ｒ１は水素原子、炭素数１〜８のアルキル基、フェニル基、トリル基、ホルミル基、アルキル炭素数１〜７のアルキルカルボニル基、ベンゾイル基、またはトルオイル基を表し、Ｒ２は炭素数１〜８のアルキレン基を表し、Ｒ３は水素原子、またはメチル基を表す］
[Wherein, R 1 represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a phenyl group, a tolyl group, a formyl group, an alkylcarbonyl group of an alkyl having 1 to 7 carbon atoms, a benzoyl group or a toluoyl group,, R 2 Represents an alkylene group having 1 to 8 carbon atoms, and R 3 represents a hydrogen atom or a methyl group]
上記一般式（１）で示されるベンゾトリアゾール誘導体化合物は、好ましくは、Ｒ１が炭素数２〜８のアルキル基であり、Ｒ２がエチレン基で表される化合物である。 The benzotriazole derivative compound represented by the general formula (1) is preferably a compound in which R 1 is an alkyl group having 2 to 8 carbon atoms and R 2 is an ethylene group.
本発明の樹脂組成物は、高温状態においても紫外線吸収性成分の揮散や分解がなく、紫外線吸収性成分のブリードアウトが起こらない。したがって本発明の樹脂組成物は、従来技術の課題を解決できる樹脂組成物として有用である。 The resin composition of the present invention does not volatilize or decompose the UV-absorbing component even at a high temperature, and the UV-absorbing component does not bleed out. Therefore, the resin composition of the present invention is useful as a resin composition that can solve the problems of the prior art.
以下に本発明につき詳細に説明する。本発明の樹脂組成物に用いられるベンゾトリアゾール誘導体化合物の単独重合体は、下記の一般式（１）で表されるベンゾトリアゾール誘導体化合物を数平均分子量２０００〜８０００の範囲で単独重合したものである。以下に下記一般式（１）において表される化合物について説明する。 The present invention will be described in detail below. The homopolymer of the benzotriazole derivative compound used in the resin composition of the present invention is obtained by homopolymerizing a benzotriazole derivative compound represented by the following general formula (1) in the range of a number average molecular weight of 2000 to 8000. . The compounds represented by the following general formula (1) will be described below.
一般式（１）中、Ｒ１は水素原子；メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、ｓｅｃ−ブチル基、ｔｅｒｔ−ブチル基、ヘキシル基、オクチル基、２−エチルヘキシル基等の炭素数１〜８の直鎖または分岐のアルキル基；フェニル基；トリル基；ホルミル基；アセチル基、プロピオニル基、ブチリル基、イソブチリル基、オクタノイル基、２−エチルヘキサノイル基等のアルキル炭素数１〜７の直鎖又は分岐のアルキルカルボニル基；ベンゾイル基；トルオイル基が挙げられ、Ｒ２はメチレン基、エチレン基、トリエチレン基、プロピレン基、テトラメチレン基、ヘキサメチレン基、オクタメチレン基等の炭素数１〜８の直鎖または分岐のアルキレン基が挙げられ、Ｒ３は水素原子；メチル基が挙げられる。 In general formula (1), R 1 is a hydrogen atom; methyl group, ethyl group, propyl group, isopropyl group, butyl group, isobutyl group, sec-butyl group, tert-butyl group, hexyl group, octyl group, 2-ethylhexyl. A linear or branched alkyl group having 1 to 8 carbon atoms such as a group; phenyl group; tolyl group; formyl group; alkyl such as acetyl group, propionyl group, butyryl group, isobutyryl group, octanoyl group, 2-ethylhexanoyl group A straight or branched alkylcarbonyl group having 1 to 7 carbon atoms; a benzoyl group; a toluoyl group, and R 2 represents a methylene group, an ethylene group, a triethylene group, a propylene group, a tetramethylene group, a hexamethylene group, and an octamethylene group. include linear or branched alkylene group having 1 to 8 carbon atoms such as groups, R 3 is a hydrogen atom; et al mentioned methyl That.
好ましくは、上記一般式（１）のＲ１が炭素数２〜８のアルキル基であり、Ｒ２がエチレン基で表される化合物である。 Preferably, R 1 in the general formula (1) is an alkyl group having 2 to 8 carbon atoms, and R 2 is an ethylene group.
上記一般式（１）で表されるベンゾトリアゾール誘導体の具体例としては、次に示すものを挙げることができる。２−［２−（２，４−ジヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレート、２−［２−（４−エトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレート、２−［２−（４−ブトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレート、２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレート、２−［２−（４−ベンゾイルオキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレート、４−［２−（２，４−ジヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］ブチルメタクリレート、４−［２−（４−エトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］ブチルメタクリレート、４−［２−（４−ブトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］ブチルメタクリレート、４−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］ブチルメタクリレート、４−［２−（４−ベンゾイルオキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］ブチルメタクリレート、２−［２−（２，４−ジヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルアクリレート、２−［２−（４−エトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルアクリレート、２−［２−（４−ブトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルアクリレート、２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルアクリレート、２−［２−（４−ベンゾイルオキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルアクリレート等。 Specific examples of the benzotriazole derivative represented by the general formula (1) include the following. 2- [2- (2,4-Dihydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 2- [2- (4-ethoxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy ] Ethyl methacrylate, 2- [2- (4-butoxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 2- [2- (2-hydroxy-4-octyloxyphenyl) -2H -Benzotriazol-5-yloxy] ethyl methacrylate, 2- [2- (4-benzoyloxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 4- [2- (2,4- Dihydroxyphenyl) -2H-benzotriazol-5-ylo Si] butyl methacrylate, 4- [2- (4-ethoxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] butyl methacrylate, 4- [2- (4-butoxy-2-hydroxyphenyl) -2H -Benzotriazol-5-yloxy] butyl methacrylate, 4- [2- (2-hydroxy-4-octyloxyphenyl) -2H-benzotriazol-5-yloxy] butyl methacrylate, 4- [2- (4-benzoyloxy) -2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] butyl methacrylate, 2- [2- (2,4-dihydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl acrylate, 2- [2- (4-Ethoxy-2-hydroxyphenyl) -2 -Benzotriazol-5-yloxy] ethyl acrylate, 2- [2- (4-butoxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl acrylate, 2- [2- (2-hydroxy-4) -Octyloxyphenyl) -2H-benzotriazol-5-yloxy] ethyl acrylate, 2- [2- (4-benzoyloxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl acrylate, and the like.
ここに例示する化合物の中で、特に２−［２−（４−エトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレート、２−［２−（４−ブトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレート、２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレート、２−［２−（４−エトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルアクリレート、２−［２−（４−ブトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルアクリレート、２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルアクリレートを好ましく用いることができる。 Among the compounds exemplified herein, 2- [2- (4-ethoxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 2- [2- (4-butoxy-2- Hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 2- [2- (2-hydroxy-4-octyloxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 2- [2- (4-Ethoxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl acrylate, 2- [2- (4-butoxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl acrylate , 2- [2- (2-hydroxy-4-octyloxypheny) ) -2H- benzotriazole-5-yloxy] ethyl acrylate can be preferably used.
一般式（１）で表わされるベンゾトリアゾール誘導体化合物は、たとえば、下記（化２〜化５）に示した反応式を経て合成することができる。なお、Ｘはハロゲン原子を表す。
前記ベンゾトリアゾール系重合体を数平均分子量２０００〜８０００に単独重合する方法は、特に限定されるものではなく、従来公知の種々の重合方法、例えば、ラジカル重合、イオン重合による連鎖重合反応を用いた溶液重合法、塊状（バルク）重合法、懸濁（パール）重合法、光重合法等を採用することができる。 The method of homopolymerizing the benzotriazole polymer to a number average molecular weight of 2000 to 8000 is not particularly limited, and various conventionally known polymerization methods such as chain polymerization reaction by radical polymerization and ionic polymerization are used. A solution polymerization method, a bulk (bulk) polymerization method, a suspension (pearl) polymerization method, a photopolymerization method, or the like can be employed.
溶液重合法で前記単独重合体の数平均分子量を２０００〜８０００の範囲内に制御する方法としては、たとえば溶媒に対する前記ベンゾトリアゾール誘導体化合物のモル濃度を制御することによって行なうことができる。数平均分子量が２０００以下の場合は、未反応のベンゾトリアゾール誘導体化合物が多く残存するが、未反応成分は低分子量であるため、樹脂加工時の高温状態において揮散や分解が起こるおそれがあり、また、重合性基が残存していることから、樹脂加工時の高温状態において制御できない重合反応が起こり、樹脂組成物の相溶性が損なわれるおそれがあるので、好ましくない。一方、数平均分子量８０００を境にして、それ以上の数平均分子量を持つ単独重合体は、各種樹脂素材との相溶性が不十分であるので樹脂組成物として好ましくないことが本実施例により証明された。 As a method of controlling the number average molecular weight of the homopolymer within the range of 2000 to 8000 by the solution polymerization method, for example, it can be performed by controlling the molar concentration of the benzotriazole derivative compound with respect to the solvent. When the number average molecular weight is 2000 or less, a large amount of unreacted benzotriazole derivative compound remains, but since the unreacted component has a low molecular weight, volatilization or decomposition may occur in a high temperature state during resin processing. Since the polymerizable group remains, it is not preferable because a polymerization reaction that cannot be controlled in a high temperature state during resin processing occurs and the compatibility of the resin composition may be impaired. On the other hand, this example proves that a homopolymer having a number average molecular weight higher than that at a number average molecular weight of 8000 is not preferable as a resin composition because of insufficient compatibility with various resin materials. It was done.
溶液重合法を採用してベンゾトリアゾール系重合体を得る場合において用いることができる溶媒としては、具体的には、例えば、ベンゼン、トルエン、キシレン、その他の高沸点の芳香族系溶媒；酢酸エチル、酢酸ブチル、セロソルブアセテート等のエステル系溶媒；メチルエチルケトン、メチルイソブチルケトン等のケトン系溶媒；メタノール、エタノール、２−プロパノール等のアルコール系溶媒等が挙げられるが、特に限定されるものではない。これら溶媒は、一種類のみを用いてもよく、また、二種類以上を適宜混合して用いてもよい。また、溶媒の使用量は、特に限定されるものではない。 As a solvent that can be used in the case of obtaining a benzotriazole-based polymer by employing a solution polymerization method, specifically, for example, benzene, toluene, xylene, other high-boiling aromatic solvents; ethyl acetate, Examples thereof include ester solvents such as butyl acetate and cellosolve acetate; ketone solvents such as methyl ethyl ketone and methyl isobutyl ketone; alcohol solvents such as methanol, ethanol and 2-propanol, but are not particularly limited. Only one kind of these solvents may be used, or two or more kinds may be appropriately mixed and used. Moreover, the usage-amount of a solvent is not specifically limited.
懸濁（パール）重合法を採用してベンゾトリアゾール系重合体を得る場合において用いることができる分散剤としては、具体的には、例えば、ポリビニルアルコール、 ポリ（メタ）アクリル酸またはその塩、スチレンとマレイン酸共重合体の塩、α−メチルスチレンとアクリル酸共重合体の塩、ポリビニルピロリドン、ポリ（メタ）アクリルアミド、メチルセルロース、エチルセルロース、ヒドロキシメチルセルロース、ヒドロキシエチルセルロース、ヒドロキシプロピルメチルセルロース、ヒドロキシブチルメチルセルロース、カルボキシメチルセルロース、ゼラチン、デンプン、トラガント、ペクチン、グルー、アルギン酸またはその塩等の高分子界面活性剤；ポリエチレンオキサイド、ポリプロピレンオキサイド等のポリオキシアルキレン系分散剤；ポリオキシエチレン−アルキルエーテル、ポリオキシエチレン−アルキルフェノール、ポリオキシエチレン−多価アルコールエステル、多価アルコールと脂肪酸とのエステル、オキシエチレン・オキシプロピレンブロック縮合物等の非イオン系界面活性剤等が挙げられる。また、これら分散剤は、一種類のみを用いてもよく、また、二種類以上を適宜混合して用いてもよい。また、分散剤の使用量は、特に限定されるものではない。 Specific examples of the dispersant that can be used when the suspension (pearl) polymerization method is used to obtain a benzotriazole-based polymer include, for example, polyvinyl alcohol, poly (meth) acrylic acid or a salt thereof, and styrene. And salt of maleic acid copolymer, α-methylstyrene and acrylic acid copolymer salt, polyvinylpyrrolidone, poly (meth) acrylamide, methylcellulose, ethylcellulose, hydroxymethylcellulose, hydroxyethylcellulose, hydroxypropylmethylcellulose, hydroxybutylmethylcellulose, carboxy Polymer surfactants such as methylcellulose, gelatin, starch, tragacanth, pectin, glue, alginic acid or salts thereof; polyoxyalkyls such as polyethylene oxide and polypropylene oxide Nonionic interfaces such as polyoxyethylene-alkyl ether, polyoxyethylene-alkylphenol, polyoxyethylene-polyhydric alcohol ester, ester of polyhydric alcohol and fatty acid, oxyethylene / oxypropylene block condensate Examples include activators. Moreover, these dispersing agents may use only one type, and may mix and use two or more types suitably. Moreover, the usage-amount of a dispersing agent is not specifically limited.
また、溶液重合法、塊状重合法、懸濁重合法を採用してベンゾトリアゾール系重合体を得る際には、重合開始剤を用いることができる。重合開始剤としては、具体的には、例えば、 ２，２'−アゾビス−(２−メチルブチロニトリル) 、２,２'−アゾビスイソブチロニトリル、１，１’ −アゾビス（シクロヘキサン−１−カルボニトリル）、ベンゾイルパーオキサイド、ジ−ｔ− ブチルパーオキサイド、ｔ−ブチルパーオキシ−２−エチルヘキサノエート等の油溶性のラジカル重合開始剤；過硫酸アンモニウム、過硫酸カリウム、過硫酸ナトリウム、t−ブチルパーオキサイド、２，２−アゾビス[２−（２−イミダゾリン−２−イル）プロパン]・二塩酸塩、２，２−アゾビス[２−（２−イミダゾリン−２−イル）プロパン]・二硫酸・二水和物、２，２−アゾビス（２−アミジノプロパン）・二塩酸塩 、２，２−アゾビス〔Ｎ−（２−カルボキシエチル）−２−メチルプロピオンアミジン]水和物、２，２−アゾビス{２−[１−（２−ヒドロキシエチル）−２−イミダゾリン−２−イル]プロパン}・二塩酸塩、２，２−アゾビス[２−（２−イミダゾリン−２−イル）プロパン]、２，２−アゾビス（１−イミノ−１−ピロリジノ−２−エチルプロパン）・二塩酸塩、２、２−アゾビス{２−メチル−Ｎ−[１，１−ビス（ヒドロキシメチル）−２−ヒドロキシエチル]プロピオンアミド}、２，２−アゾビス[２−メチル−Ｎ−（２−ヒドロキシエチル）プロピオンアミド]、２，２−アゾビス（Ｎ−ヒドロキシエチルイソブチルアミド）、４，４−アゾビス（４−シアノペンタン酸）等の水溶性のラジカル重合開始剤；過硫酸塩類や有機過酸化物類の重合開始剤にナトリウムスルホオキシレートホルムアルデヒド、亜硫酸水素ナトリウム、亜硫酸水素アンモニウム、チオ硫酸ナトリウム、チオ硫酸アンモニウム、過酸化水素、ヒドロキシメタンスルフィン酸ナトリウム、Ｌ−アスコルビン酸、およびその塩、第一銅塩、第一鉄塩などの還元剤を重合開始剤に組み合わせて用いるレドックス系開始剤；ベンゾフェノン、Ｎ，Ｎ′−テトラアルキル−４，４′−ジアミノベンゾフェノン、２−ベンジル−２−ジメチルアミノ−１−（４−モルホリノフェニル）−ブタノン−１、２−メチル−１−［４−（メチルチオ）フェニル］−２−モルホリノ−プロパノン−１、４，４′−ビス（ジメチルアミノ）ベンゾフェノン（ミヒラーケトン）、４，４′−ビス（ジエチルアミノ）ベンゾフェノン、４−メトキシ−４′−ジメチルアミノベンゾフェノン等の芳香族ケトン類、アルキルアントラキノン、フェナントレンキノン等のキノン類、ベンゾイン、アルキルベンゾイン等のベンゾイン化合物、ベンゾインアルキルエーテル、ベンゾインフェニルエーテル等のベンゾインエーテル化合物、ベンジルジメチルケタール等のベンジル誘導体、２−（ｏ−クロロフェニル）−４，５−ジフェニルイミダゾール二量体、２−（ｏ−クロロフェニル）−４，５−ジ（ｍ−メトキシフェニル）イミダゾール二量体、２−（ｏ−フルオロフェニル）−４，５−ジフェニルイミダゾール二量体、２−（ｏ−メトキシフェニル）−４，５−ジフェニルイミダゾール二量体、２，４−ジ（ｐ−メトキシフェニル）−５−フェニルイミダゾール二量体、２−（２，４−ジメトキシフェニル）−４，５−ジフェニルイミダゾール二量体等の２，４，５−トリアリールイミダゾール二量体、Ｎ−フェニルグリシン、Ｎ−フェニルグリシン誘導体、９−フェニルアクリジン等のアクリジン誘導体、１，２−オクタンジオン，１−［４−（フェニルチオ）−，２−（ｏ−ベンゾイルオキシム）］等のオキシムエステル類、７−ジエチルアミノ−４−メチルクマリン等のクマリン系化合物、２，４−ジエチルチオキサントン等のチオキサントン系化合物、２，４，６−トリメチルベンゾイル−ジフェニル−ホスフィンオキサイド等のアシルホスフィンオキサイド系化合物等の光（主として紫外線）開裂型ラジカル重合開始剤が挙げられるが、特に限定されるものではない。また、これら重合開始剤は、一種類のみを用いてもよく、また、二種類以上を適宜混合して用いてもよい。また、重合開始剤の使用量は、特に限定されるものではない。 In addition, when a solution polymerization method, a bulk polymerization method, or a suspension polymerization method is employed to obtain a benzotriazole-based polymer, a polymerization initiator can be used. Specific examples of the polymerization initiator include 2,2′-azobis- (2-methylbutyronitrile), 2,2′-azobisisobutyronitrile, 1,1′-azobis (cyclohexane- 1-carbonitrile), benzoyl peroxide, di-t-butyl peroxide, oil-soluble radical polymerization initiators such as t-butylperoxy-2-ethylhexanoate; ammonium persulfate, potassium persulfate, sodium persulfate , T-butyl peroxide, 2,2-azobis [2- (2-imidazolin-2-yl) propane] dihydrochloride, 2,2-azobis [2- (2-imidazolin-2-yl) propane] Disulfuric acid dihydrate, 2,2-azobis (2-amidinopropane) dihydrochloride, 2,2-azobis [N- (2-carboxyethyl) -2-methylpropion Midine] hydrate, 2,2-azobis {2- [1- (2-hydroxyethyl) -2-imidazolin-2-yl] propane} dihydrochloride, 2,2-azobis [2- (2- Imidazolin-2-yl) propane], 2,2-azobis (1-imino-1-pyrrolidino-2-ethylpropane) dihydrochloride, 2,2-azobis {2-methyl-N- [1,1- Bis (hydroxymethyl) -2-hydroxyethyl] propionamide}, 2,2-azobis [2-methyl-N- (2-hydroxyethyl) propionamide], 2,2-azobis (N-hydroxyethylisobutyramide) Water-soluble radical polymerization initiators such as 4,4-azobis (4-cyanopentanoic acid); polymerization initiators of persulfates and organic peroxides, sodium sulfooxylate formaldehyde, sodium hydrogensulfite As a polymerization initiator, a reducing agent such as sodium, ammonium bisulfite, sodium thiosulfate, ammonium thiosulfate, hydrogen peroxide, sodium hydroxymethanesulfinate, L-ascorbic acid, and salts thereof, cuprous salts, ferrous salts, etc. Redox initiators used in combination; benzophenone, N, N′-tetraalkyl-4,4′-diaminobenzophenone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,2- Methyl-1- [4- (methylthio) phenyl] -2-morpholino-propanone-1,4,4'-bis (dimethylamino) benzophenone (Michler ketone), 4,4'-bis (diethylamino) benzophenone, 4-methoxy Aromatic ketones such as -4'-dimethylaminobenzophenone, alkyl Quinones such as anthraquinone and phenanthrenequinone, benzoin compounds such as benzoin and alkylbenzoin, benzoin ether compounds such as benzoin alkyl ether and benzoin phenyl ether, benzyl derivatives such as benzyldimethyl ketal, 2- (o-chlorophenyl) -4,5 -Diphenylimidazole dimer, 2- (o-chlorophenyl) -4,5-di (m-methoxyphenyl) imidazole dimer, 2- (o-fluorophenyl) -4,5-diphenylimidazole dimer, 2- (o-methoxyphenyl) -4,5-diphenylimidazole dimer, 2,4-di (p-methoxyphenyl) -5-phenylimidazole dimer, 2- (2,4-dimethoxyphenyl)- 2,4, such as 4,5-diphenylimidazole dimer 5-triarylimidazole dimer, N-phenylglycine, N-phenylglycine derivative, acridine derivative such as 9-phenylacridine, 1,2-octanedione, 1- [4- (phenylthio)-, 2- (o -Benzoyloxime)], coumarin compounds such as 7-diethylamino-4-methylcoumarin, thioxanthone compounds such as 2,4-diethylthioxanthone, 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide Examples thereof include, but are not particularly limited to, light (mainly ultraviolet) cleavage type radical polymerization initiators such as acylphosphine oxide compounds. Moreover, these polymerization initiators may use only 1 type, and may mix and use 2 or more types suitably. Moreover, the usage-amount of a polymerization initiator is not specifically limited.
反応温度は、特に限定されるものではないが、室温〜２００℃の範囲が好ましく、５０℃〜１５０℃の範囲がより好ましい。尚、反応時間は、反応温度、或いは、用いる原材料の種類等に応じて、数平均分子量が２０００〜８０００になるように、適宜設定すればよい。 Although reaction temperature is not specifically limited, The range of room temperature-200 degreeC is preferable, and the range of 50 degreeC-150 degreeC is more preferable. In addition, what is necessary is just to set reaction time suitably so that a number average molecular weight may be 2000-8000 according to reaction temperature or the kind of raw material to be used.
光重合法を採用してベンゾトリアゾール系重合体を得る場合において用いる光重合開始剤としては、活性エネルギー線の照射によって光重合開始作用を示す公知の光重合開始剤のいずれもが使用できる。例えば、２，２−ジメトキシ−１，２−ジフェニルエタン−１−オン、１−ヒドロキシ−シクロヘキシル−フェニル−ケトン、２−ヒドロキシ−２−メチル−１−フェニル−プロパン−１−オン、１−［４−（２−ヒドロキシエトキシ）−フェニル］−２−ヒドロキシ−２−メチル−１−プロパン−１−オン、２−ヒドロキシ−１−｛４−［４−（２−ヒドロキシ−２−メチル−プロピオニル）−ベンジル］−フェニル｝−２−メチル−プロパン−１−オン、フェニルグリオキシリックアシッドメチルエステル、２−メチル−１−［４−（メチルチオ）フェニル］−２−モルフォリノプロパン−１−オン、２−ベンジル−２−ジメチルアミノ−１−（４−モルフォリノフェニル）−ブタノン−１、２−ジメチルアミノ−２−（４−メチル−ベンジル）−１−（４−モルフォリン−４−イル−フェニル）−ブタン−１−オン、ビス（２，４，６−トリメチルベンゾイル）−フェニルフォスフィンオキサイドなどを挙げることができ、また、ベンゾフェノンおよび／または２−イソプロピルチオキサントンと重合促進剤の２−エチルヘキシル−４−ジメチルアミノベンゾエートおよび／またはエチル−４−ジメチルアミノベンゾエートといった組み合わせも使用できる。本発明で、これらの光重合開始剤を単独で用いてもよいし、または２種以上を組み合わせて用いてもよい。 As the photopolymerization initiator used in the case of obtaining a benzotriazole-based polymer by employing a photopolymerization method, any of known photopolymerization initiators that exhibit a photopolymerization initiating action upon irradiation with active energy rays can be used. For example, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl-phenyl-ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 1- [ 4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propionyl) ) -Benzyl] -phenyl} -2-methyl-propan-1-one, phenylglyoxylic acid methyl ester, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropan-1-one 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,2-dimethylamino-2- (4-methyl-benzene) And (zyl) -1- (4-morpholin-4-yl-phenyl) -butan-1-one, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, and the like. A combination of 2-isopropylthioxanthone and the polymerization accelerators 2-ethylhexyl-4-dimethylaminobenzoate and / or ethyl-4-dimethylaminobenzoate can also be used. In the present invention, these photopolymerization initiators may be used alone or in combination of two or more.
本発明の樹脂組成物に用いられる樹脂素材としては、例えばポリエチレン、ポリプロピレン、ポリブテン、ポリペンテン、ポリ-３−メチルブチレン、ポリメチルペンテンなどのα−オレフィン重合体またはエチレン−酢酸ビニル共重合体、エチレン−プロピレン共重合体などのポリオレフィン、ポリ塩化ビニル、ポリ臭化ビニル、ポリフッ化ビニル、塩素化ポリエチレン、塩素化ポリプロピレン、臭素化ポリエチレン、塩化ゴム、塩化ビニル−酢酸ビニル共重合体、塩化ビニル−エチレン共重合体、塩化ビニル−プロピレン共重合体、塩化ビニル−スチレン共重合体、塩化ビニル−イソブチレン共重合体、塩化ビニル−塩化ビニリデン共重合体、塩化ビニル−スチレン−無水マレイン酸三元共重合体、塩化ビニル−スチレン−アクリロニトリル三元共重合体、塩化ビニル−ブタジエン共重合体、塩化ビニル−イソブチレン共重合体、塩化ビニル−塩素化プロピレン共重合体、塩化ビニル−塩化ビニリデン−酢酸ビニル三元共重合体、塩化ビニル−アクリル酸エステル共重合体、塩化ビニル−マレイン酸エステル共重合体、塩化ビニル−メタクリル酸エステル共重合体、塩化ビニル−アクリロニトリル共重合体、内部可塑性ポリ塩化ビニルなどの含ハロゲン合成樹脂、石油樹脂、クマロン樹脂、ポリスチレン、スチレンと他の単量体（無水マレイン酸、ブタジエン、アクリロニトリルなど）との共重合体、アクリロニトリル−ブタジエン−スチレン樹脂、アクリル酸エステル−ブタジエン−スチレン樹脂、メタクリル酸エステル−ブタジエン−スチレン樹脂などのスチレン系樹脂、ポリ酢酸ビニル、ポリビニルアルコール、ポリビニルホルマール、ポリビニルブチラール、アクリル樹脂、メタクリレート樹脂、ポリアクリロニトリル、ポリフェニレンオキシド、ポリカーボネート、変性ポリフェニレンオキシド、ポリアセタール、フェノール樹脂、尿素樹脂、メラミン樹脂、エポキシ樹脂、シリコン樹脂、ポリエチレンテレフタレート、強化ポリエチレンテレフタレート、ポリブチレンテレフタレート、ポリスルホン系樹脂、ポリエーテルスルホン、ポリフェニレンスルフィド、ポリエーテルケトン、ポリエーテルイミド、ポリオキシベンゾイル、ポリイミド、ポリマレイミド、ポリアミドイミド、アルキド樹脂、アミノ樹脂、ビニル樹脂、水溶性樹脂、粉体塗料用樹脂、ポリアミド樹脂、ポリウレタン樹脂、ポリチオウレタン樹脂、不飽和ポリエステル樹脂等を挙げることができる。 Examples of the resin material used in the resin composition of the present invention include α-olefin polymers such as polyethylene, polypropylene, polybutene, polypentene, poly-3-methylbutylene, and polymethylpentene, ethylene-vinyl acetate copolymers, and ethylene. -Polyolefins such as propylene copolymer, polyvinyl chloride, polyvinyl bromide, polyvinyl fluoride, chlorinated polyethylene, chlorinated polypropylene, brominated polyethylene, chlorinated rubber, vinyl chloride-vinyl acetate copolymer, vinyl chloride-ethylene Copolymer, vinyl chloride-propylene copolymer, vinyl chloride-styrene copolymer, vinyl chloride-isobutylene copolymer, vinyl chloride-vinylidene chloride copolymer, vinyl chloride-styrene-maleic anhydride terpolymer , Vinyl chloride-styrene-acrylonitrile Ternary copolymer, vinyl chloride-butadiene copolymer, vinyl chloride-isobutylene copolymer, vinyl chloride-chlorinated propylene copolymer, vinyl chloride-vinylidene chloride-vinyl acetate terpolymer, vinyl chloride-acrylic Acid-containing copolymers, vinyl chloride-maleic ester copolymers, vinyl chloride-methacrylic ester copolymers, vinyl chloride-acrylonitrile copolymers, halogen-containing synthetic resins such as internal plastic polyvinyl chloride, petroleum resins, coumarone Resin, polystyrene, copolymer of styrene and other monomers (maleic anhydride, butadiene, acrylonitrile, etc.), acrylonitrile-butadiene-styrene resin, acrylate ester-butadiene-styrene resin, methacrylate ester-butadiene-styrene Styrenic resin such as resin, Vinyl acetate, polyvinyl alcohol, polyvinyl formal, polyvinyl butyral, acrylic resin, methacrylate resin, polyacrylonitrile, polyphenylene oxide, polycarbonate, modified polyphenylene oxide, polyacetal, phenol resin, urea resin, melamine resin, epoxy resin, silicone resin, polyethylene terephthalate, Reinforced polyethylene terephthalate, polybutylene terephthalate, polysulfone resin, polyethersulfone, polyphenylene sulfide, polyetherketone, polyetherimide, polyoxybenzoyl, polyimide, polymaleimide, polyamideimide, alkyd resin, amino resin, vinyl resin, water-soluble Resin, resin for powder coating, polyamide resin, polyurethane resin, polythiourea And unsaturated polyester resins.
その中でも、樹脂素材としてポリスチレン、ポリカーボネートおよびポリメタクリル酸メチルの群からいずれかを選択した本発明の樹脂組成物では、高い相溶性、及び耐熱性を示すことが本発明の実施例により証明された。 Among them, the resin composition of the present invention selected from the group consisting of polystyrene, polycarbonate and polymethyl methacrylate as the resin material has been proved by the examples of the present invention to exhibit high compatibility and heat resistance. .
本発明の樹脂組成物は、数平均分子量が２０００〜８０００の範囲にある前記ベンゾトリアゾール誘導体化合物単独重合体が前記樹脂素材に含まれたものであればよく、紫外線吸収剤として、前記単独重合体のみが含まれたものでも使用できるが、前記単独重合体の他に紫外線吸収剤と組み合わせて使用することもできる。前記ベンゾトリアゾール系単独重合体以外の紫外線吸収剤としては、一般に市場で入手できるもので紫外領域を吸収できるものであれば特に限定されない。例えば、ベンゾトリアゾール誘導体、ベンゾフェノン誘導体、サリシレート誘導体、シアノアクリレート誘導体、トリアジン誘導体等が用いられる。これらの紫外線吸収剤は、一種類のみを用いてもよく、また、二種類以上を適宜混合して用いてもよい。 The resin composition of the present invention may be any one in which the benzotriazole derivative compound homopolymer having a number average molecular weight in the range of 2000 to 8000 is contained in the resin material, and the homopolymer as an ultraviolet absorber. In addition to the homopolymer, it can also be used in combination with an ultraviolet absorber. The ultraviolet absorber other than the benzotriazole homopolymer is not particularly limited as long as it is generally available on the market and can absorb the ultraviolet region. For example, benzotriazole derivatives, benzophenone derivatives, salicylate derivatives, cyanoacrylate derivatives, triazine derivatives and the like are used. These ultraviolet absorbers may be used alone or in a suitable mixture of two or more.
本発明の樹脂組成物は、前記ベンゾトリアゾール系重合体が前記樹脂素材に対して０.０１〜２０重量％の範囲で含まれていることが好ましく、さらには０.１〜２重量％の範囲で含まれていることがいっそう好ましい。 In the resin composition of the present invention, the benzotriazole-based polymer is preferably contained in the range of 0.01 to 20% by weight, more preferably in the range of 0.1 to 2% by weight, based on the resin material. It is more preferable that it is contained.
本発明のベンゾトリアゾール系重合体を含有する樹脂組成物は、射出成形、ブロー成形、押出成形など、一般的な樹脂成型法により成形できる。また、フィルムやシートを成形する場合には、前記に加えて、溶液流延法やキャスト法を用いることができる。 The resin composition containing the benzotriazole polymer of the present invention can be molded by a general resin molding method such as injection molding, blow molding or extrusion molding. In addition to the above, when casting a film or sheet, a solution casting method or a casting method can be used.
以下に本発明を実施例により詳述するが、本発明はこれらの様態のみに限定されるものではない。 EXAMPLES The present invention will be described in detail below with reference to examples, but the present invention is not limited to only these aspects.
（中間体合成例１）
［前駆体；２−［５−（２−ヒドロキシエトキシ）−２Ｈ−ベンゾトリアゾール−２−イル］−５−オクチルオキシフェノールの合成］
[Precursor; Synthesis of 2- [5- (2-hydroxyethoxy) -2H-benzotriazol-2-yl] -5-octyloxyphenol]
１０００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、常法にて合成した４−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）ベンゼン−１，３−ジオールを１７６．０ｇ（０．６８４モル）、メチルイソブチルケトン３５０ｍｌ、１−クロロオクタン１４２．０ｇ（０．９５５モル）、炭酸ナトリウム６２．０ｇ（０．５８５モル）、ヨウ化カリウム５．２ｇを入れて、１２０〜１３０℃で１２時間還流脱水した。水２００ｍｌを加え、静置して下層部の水層を分離して除去し、温水２００ｍｌで洗浄した。メチルイソブチルケトン３５０ｍｌを減圧で回収し、イソプロピルアルコール４５０ｍｌを加え、析出した結晶をろ過し、イソプロピルアルコール２００ｍｌで洗浄し、乾燥して、２−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）−５−オクチルオキシフェノールを２１６．９ｇ得た。 A 1000 ml four-necked flask was equipped with a condenser with a ball, a thermometer, and a stirring device, and 176 of 4- (5-methoxy-2H-benzotriazol-2-yl) benzene-1,3-diol synthesized by a conventional method was obtained. 0.0 g (0.684 mol), methyl isobutyl ketone 350 ml, 1-chlorooctane 142.0 g (0.955 mol), sodium carbonate 62.0 g (0.585 mol), potassium iodide 5.2 g, The mixture was refluxed and dehydrated at 120 to 130 ° C. for 12 hours. 200 ml of water was added, the mixture was allowed to stand, and the lower aqueous layer was separated and removed, followed by washing with 200 ml of warm water. 350 ml of methyl isobutyl ketone was recovered under reduced pressure, 450 ml of isopropyl alcohol was added, the precipitated crystals were filtered, washed with 200 ml of isopropyl alcohol and dried to give 2- (5-methoxy-2H-benzotriazol-2-yl) 216.9 g of -5-octyloxyphenol was obtained.
１０Ｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、２−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）−５−オクチルオキシフェノールを２１６．９ｇ（０．５８７モル）、４７％臭化水素酸１２５．８ｇ（０．７３１モル）、スルホラン１８００ｍｌを入れて１００〜１０５℃で４８時間撹拌した。トルエン８００ｍｌ、水３５００ｍｌを加えて、静置して下層の水層を分離して除去し、温水１３００ｍｌで２回洗浄し、トルエン８００ｍｌを減圧で回収した。イソプロピルアルコール８００ｍｌ、水２００ｍｌを加えて、５℃まで冷却し、析出する結晶をろ過し、イソプロピルアルコール水溶液（８０％ Ｖ／Ｖ）２００ｍｌで洗浄し、乾燥して、２−（５−ヒドロキシ−２Ｈ−ベンゾトリアゾール−２−イル）−５−オクチルオキシフェノールを１２６．６ｇ得た。 A condenser with a ball, a thermometer, and a stirrer were attached to a 10 L four-necked flask, and 216.9 g (0.587 mol) of 2- (5-methoxy-2H-benzotriazol-2-yl) -5-octyloxyphenol was attached. ), 475.8 g of hydrobromic acid (0.731 mol) and 1800 ml of sulfolane were added and stirred at 100 to 105 ° C. for 48 hours. Toluene (800 ml) and water (3500 ml) were added, and the mixture was allowed to stand. The lower aqueous layer was separated and removed, washed with warm water (1300 ml) twice, and toluene (800 ml) was collected under reduced pressure. Add 800 ml of isopropyl alcohol and 200 ml of water, cool to 5 ° C., filter the precipitated crystals, wash with 200 ml of an aqueous isopropyl alcohol solution (80% V / V), dry and 2- (5-hydroxy-2H -126.6g of -benzotriazol-2-yl) -5-octyloxyphenol was obtained.
１０００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、２−（５−ヒドロキシ−２Ｈ−ベンゾトリアゾール−２−イル）−５−オクチルオキシフェノールを１２６．６ｇ（０．３５６モル）、メチルイソブチルケトン４５０ｍｌ、２−クロロエタノール３５．８ｇ（０．４４５モル）、炭酸ナトリウム２３．５ｇ（０．２２２モル）、ヨウ化カリウム１７．８ｇを入れて、１１３〜１１８℃で１０時間還流脱水した。２５０ｍｌの水を加え、静置して下層部の水層を分離して除去し、温水１５０ｍｌで洗浄した。メチルイソブチルケトン４５０ｍｌを減圧で回収後にイソプロピルアルコール５００ｍｌを加えて１０℃まで冷却し、析出した結晶をろ過し、イソプロピルアルコール５０ｍｌで洗浄し、乾燥して、２−［５−（２−ヒドロキシエトキシ）−２Ｈ−ベンゾトリアゾール−２−イル］−５−オクチルオキシフェノールを９５．３ｇ得た。収率３５％（４−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）ベンゼン−１，３−ジオールから）であった。 A 1000 ml four-necked flask is equipped with a condenser with a ball, a thermometer, and a stirring device, and 126.6 g (0.356 mol) of 2- (5-hydroxy-2H-benzotriazol-2-yl) -5-octyloxyphenol is attached. ), 450 ml of methyl isobutyl ketone, 35.8 g (0.445 mol) of 2-chloroethanol, 23.5 g (0.222 mol) of sodium carbonate, and 17.8 g of potassium iodide, and at 113 to 118 ° C. for 10 hours. Reflux dehydration. 250 ml of water was added, the mixture was allowed to stand, and the lower aqueous layer was separated and removed, followed by washing with 150 ml of warm water. After recovering 450 ml of methyl isobutyl ketone under reduced pressure, 500 ml of isopropyl alcohol was added and cooled to 10 ° C., and the precipitated crystals were filtered, washed with 50 ml of isopropyl alcohol and dried to give 2- [5- (2-hydroxyethoxy). 95.3 g of -2H-benzotriazol-2-yl] -5-octyloxyphenol was obtained. The yield was 35% (from 4- (5-methoxy-2H-benzotriazol-2-yl) benzene-1,3-diol).
（中間体合成例２）
［化合物（ａ）；２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレートの合成］
[Compound (a); Synthesis of 2- [2- (2-hydroxy-4-octyloxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate]
１０００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、２−［５−（２−ヒドロキシエトキシ）−２Ｈ−ベンゾトリアゾール−２−イル］−５−オクチルオキシフェノールを９５．３ｇ（０．２３９モル）、トルエン５５０ｍｌ、メタクリル酸５０．６ｇ（０．５８８モル）、メタンスルホン酸２９．８ｇ（０．３１０モル）を入れて、１１０〜１１５℃で４時間還流脱水した。水２００ｍｌ、炭酸ナトリウム３２．８ｇ（０．３０９モル）を加え、静置して下層部の水層を分離して除去し、活性炭１．８ｇを加え、還流撹拌して脱色させた。熱時にろ過し、そのろ液からトルエン５５０ｍｌを減圧で回収した後にイソプロピルアルコール７５０ｍｌを加え、析出した結晶をろ過し、イソプロピルアルコール１００ｍｌで洗浄した後、減圧下４０℃で乾燥し、白色結晶を８８．１ｇ得た。全量をイソプロピルアルコールで再結晶して、減圧下４０℃で乾燥し、化合物（ａ）を７７．８ｇ得た。収率７０％（２−［５−（２−ヒドロキシエトキシ）−２Ｈ−ベンゾトリアゾール−２−イル］−５−オクチルオキシフェノールから）であった。融点は９２℃。 A 1000 ml four-necked flask is equipped with a condenser with a ball, a thermometer, and a stirring device, and 95.3 g of 2- [5- (2-hydroxyethoxy) -2H-benzotriazol-2-yl] -5-octyloxyphenol is attached. (0.239 mol), 550 ml of toluene, 50.6 g (0.588 mol) of methacrylic acid, and 29.8 g (0.310 mol) of methanesulfonic acid were added, followed by reflux dehydration at 110 to 115 ° C. for 4 hours. 200 ml of water and 32.8 g (0.309 mol) of sodium carbonate were added, and the mixture was allowed to stand to separate and remove the lower aqueous layer. 1.8 g of activated carbon was added, and the mixture was refluxed and decolorized. Filtration was performed while hot, and 550 ml of toluene was recovered from the filtrate under reduced pressure. Then, 750 ml of isopropyl alcohol was added. The precipitated crystals were filtered, washed with 100 ml of isopropyl alcohol, and then dried at 40 ° C. under reduced pressure. 0.1 g was obtained. The entire amount was recrystallized from isopropyl alcohol and dried at 40 ° C. under reduced pressure to obtain 77.8 g of compound (a). The yield was 70% (from 2- [5- (2-hydroxyethoxy) -2H-benzotriazol-2-yl] -5-octyloxyphenol). Melting point is 92 ° C.
また、ＨＰＬＣ分析により、化合物（ａ）の純度を測定した。
＜測定条件＞
装置：Ｌ−２１３０（（株）日立ハイテクノロジーズ製）
使用カラム：ＳＵＭＩＰＡＸ ＯＤＳ Ａ−２１２ ６×１５０ｍｍ ５μｍ
カラム温度：４０℃
移動相： メタノール／水＝９９／１
流速：１．０ｍｌ／ｍｉｎ
＜測定結果＞
ＨＰＬＣ面百純度：９９．９％
なお、以下の化合物（ｂ）も化合物（ａ）と同様の測定条件でＨＰＬＣ分析を行った。
Moreover, the purity of the compound (a) was measured by HPLC analysis.
<Measurement conditions>
Device: L-2130 (manufactured by Hitachi High-Technologies Corporation)
Column used: SUMPAX ODS A-212 6 × 150 mm 5 μm
Column temperature: 40 ° C
Mobile phase: Methanol / water = 99/1
Flow rate: 1.0 ml / min
<Measurement results>
HPLC area purity: 99.9%
The following compound (b) was also subjected to HPLC analysis under the same measurement conditions as for compound (a).
また、化合物（ａ）の紫外〜可視吸収スペクトルを測定したところ、最大吸収波長λｍａｘは３５０ｎｍであり、この時の吸光度εは３０９００であった。スペクトルの測定条件は次のとおりである。
＜測定条件＞
装置：ＵＶ−２４５０（(株)島津製作所製)
測定波長：２５０〜 ４５０ｎｍ
溶媒：クロロホルム
濃度：１０ｐｐｍ
セル：１ｃｍ石英
なお、以下の化合物（ｂ）、（ｃ）、（ｄ）も化合物（ａ）と同様の測定条件で紫外〜可視吸収スペクトルの測定を行った。
Further, when the ultraviolet to visible absorption spectrum of the compound (a) was measured, the maximum absorption wavelength λmax was 350 nm, and the absorbance ε at this time was 30900. The spectrum measurement conditions are as follows.
<Measurement conditions>
Apparatus: UV-2450 (manufactured by Shimadzu Corporation)
Measurement wavelength: 250-450 nm
Solvent: Chloroform Concentration: 10 ppm
Cell: 1 cm quartz The following compounds (b), (c), and (d) were also measured for ultraviolet to visible absorption spectra under the same measurement conditions as for the compound (a).
また、化合物（ａ）のＮＭＲ解析を行った結果、上記構造を支持する結果が得られた。測定条件は次のとおりである。
＜測定条件＞
装置：ＪＥＯＬ ＡＬ−３００
共鳴周波数：３００ＭＨｚ（１Ｈ−ＮＭＲ）
溶媒：クロロホルム−ｄ
１Ｈ−ＮＭＲの内部標準物質として、テトラメチルシランを用い、ケミカルシフト値はδ値（ｐｐｍ）、カップリング定数はＨｅｒｔｚで示した。またｓはｓｉｎｇｌｅｔ、ｄはｄｏｕｂｌｅｔ、ｔはｔｒｉｐｌｅｔ、ｄｄはｄｏｕｂｌｅ ｄｏｕｂｌｅｔ、ｍはｍｕｌｔｉｐｌｅｔ、ｂはｂｒｏａｄの略とする。以下の化合物（ｂ）、（ｃ）、（ｄ）においても同様である。得られたＮＭＲスペクトルの内容は以下のとおりである。
δ＝１１．３（ｓ，ＯＨ），８．１９（ｄ，１Ｈ，Ｊ＝９．９Ｈｚ，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ），７．７８（ｄｄ，１Ｈ，Ｊ＝９．９２Ｈｚ，Ｊ＝０．９６Ｈｚ，Ｊ＝０．８７Ｈｚ，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ)，７．０−７．３（ｍ，２Ｈ，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ，ｐｈｅｎｏｌ−Ｈ），６．６７（ｄ，１Ｈ，Ｊ＝２．９１Ｈｚ，ｐｈｅｎｏｌ−Ｈ），６．５９（ｄｄ，１Ｈ，Ｊ＝１０．２Ｈｚ，Ｊ＝２．９４Ｈｚ，Ｊ＝３．０６Ｈｚ，＝ＣＨ２−Ｈ），６．１７（ｓ，１Ｈ，ｐｈｅｎｏｌ−Ｈ），５．６１（ｔ，１Ｈ，＝ＣＨ２−Ｈ），４．５７（ｔ，２Ｈ，Ｏ−ＣＨ２−ＣＨ２−Ｏ−Ｈ），４．３２（ｔ，２Ｈ，Ｏ−ＣＨ２−ＣＨ２−Ｏ−Ｈ），４．００（ｔ，２Ｈ，ｐＨ−Ｏ−ＣＨ２−Ｈ)，１．８０（ｍ，２Ｈ，ＣＨ２−Ｈ），１．２−１．６（ｍ，１０Ｈ，（ＣＨ２）５−Ｈ），０．８９（ｓ，３Ｈ，ＣＨ３−Ｈ）
Further, as a result of conducting NMR analysis of the compound (a), a result supporting the above structure was obtained. The measurement conditions are as follows.
<Measurement conditions>
Device: JEOL AL-300
Resonance frequency: 300 MHz (1H-NMR)
Solvent: chloroform-d
Tetramethylsilane was used as an internal standard of 1H-NMR, the chemical shift value was represented by δ value (ppm), and the coupling constant was represented by Hertz. S is a singlet, d is a doublet, t is a triplet, dd is a double doublet, m is a multiplet, and b is abbreviated. The same applies to the following compounds (b), (c), and (d). The contents of the obtained NMR spectrum are as follows.
δ = 11.3 (s, OH), 8.19 (d, 1H, J = 9.9 Hz, benzotriazole-H), 7.78 (dd, 1H, J = 9.92 Hz, J = 0.96 Hz, J = 0.87 Hz, benzotriazole-H), 7.0-7.3 (m, 2H, benzotriazole-H, phenol-H), 6.67 (d, 1H, J = 2.91 Hz, phenol-H) 6.59 (dd, 1H, J = 10.2 Hz, J = 2.94 Hz, J = 3.06 Hz, = CH 2 -H), 6.17 (s, 1H, phenol-H), 5.61. (T, 1H, ═CH 2 —H), 4.57 (t, 2H, O—CH 2 —CH 2 —O—H), 4.32 (t, 2H, O—CH 2 —CH 2 —O) -H), 4.00 (t, 2H , pH-O-CH 2 -H), 1.8 (M, 2H, CH 2 -H ), 1.2-1.6 (m, 10H, (CH 2) 5-H), 0.89 (s, 3H, CH 3 -H)
（中間体合成例３）
［化合物（ｂ）；２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルアクリレートの合成］
[Compound (b); Synthesis of 2- [2- (2-hydroxy-4-octyloxyphenyl) -2H-benzotriazol-5-yloxy] ethyl acrylate]
メタクリル酸をアクリル酸とした以外は中間体合成例２と同様にして、化合物（ｂ）を収率４３％（２−［５−（２−ヒドロキシエトキシ）−２Ｈ−ベンゾトリアゾール−２−イル］−５−オクチルオキシフェノールから）で得た。融点８６℃、ＨＰＬＣ面百純度９８．７％、最大吸収波長λｍａｘが３５１ｎｍの時の吸光度εは２９７００であった。 Compound (b) was obtained in the same manner as in Intermediate Synthesis Example 2 except that methacrylic acid was acrylic acid, and the yield of compound (b) was 43% (2- [5- (2-hydroxyethoxy) -2H-benzotriazol-2-yl]. -5-octyloxyphenol). The absorbance ε was 29,700 when the melting point was 86 ° C., the HPLC surface purity was 98.7%, and the maximum absorption wavelength λmax was 351 nm.
また、化合物（ｂ）のＮＭＲ解析を行った結果、上記構造を支持する結果が得られた。測定条件は次のとおりである。
＜測定条件＞
装置： ＶＡＲＩＡＮ Ｍｅｒｃｕｒｙ３００
共振周波数：３００ＭＨｚ（１Ｈ−ＮＭＲ）
溶媒：クロロホルム−ｄ
得られたＮＭＲスペクトルの内容は以下のとおりである。なお、以下の化合物（ｃ）、（ｄ）も化合物（ｂ）と同様の測定条件でＮＭＲ測定を行った。
δ＝１１．３（ｂ，ＯＨ），８．２１（ｄ，１Ｈ，Ｊ＝９．０７Ｈｚ，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ），７．７９（ｄ，１Ｈ，Ｊ＝９．０７Ｈｚ，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ），7．１８（ｄ，１Ｈ，Ｊ＝２．３Ｈｚ，ｐｈｅｎｏｌ−Ｈ），７．１６（ｄ，１Ｈ，Ｊ＝２．３Ｈｚ，ｐｈｅｎｏｌ−Ｈ），７．１５（ｄ，１Ｈ，Ｊ＝１．８１，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ，），６．６７（ｓ，１Ｈ，ｐｈｅｎｏｌ−Ｈ），６．６０（ｍ，１Ｈ，＝ＣＨ２−Ｈ），６．２０（ｑ，１Ｈ，ＣＨ＝−Ｈ），５．８９（ｄｄ，１Ｈ，Ｊ＝１０．５Ｈｚ，Ｊ＝０．６６Ｈｚ，Ｊ＝０．７５Ｈｚ，＝ＣＨ２−Ｈ），４．３２（ｔ，２Ｈ，Ｏ−ＣＨ２−ＣＨ２−Ｏ−Ｈ），４．００（ｔ，２Ｈ，Ｏ−ＣＨ２−ＣＨ２−Ｏ−Ｈ），０．８−２（ｍ，１７Ｈ，ｎ−Ｃ８Ｈ１７−Ｈ）
Further, as a result of conducting NMR analysis of the compound (b), a result supporting the above structure was obtained. The measurement conditions are as follows.
<Measurement conditions>
Equipment: VARIAN Mercury300
Resonant frequency: 300 MHz (1H-NMR)
Solvent: chloroform-d
The contents of the obtained NMR spectrum are as follows. The following compounds (c) and (d) were subjected to NMR measurement under the same measurement conditions as for the compound (b).
δ = 11.3 (b, OH), 8.21 (d, 1H, J = 9.07 Hz, benzotriazole-H), 7.79 (d, 1H, J = 9.07 Hz, benzotriazole-H), 7 .18 (d, 1H, J = 2.3 Hz, phenol-H), 7.16 (d, 1H, J = 2.3 Hz, phenol-H), 7.15 (d, 1H, J = 1.81) , benzotriazole-H,), 6.67 (s, 1H, phenol-H), 6.60 (m, 1H, = CH 2 -H), 6.20 (q, 1H, CH = -H), 5 .89 (dd, 1H, J = 10.5 Hz, J = 0.66 Hz, J = 0.75 Hz, = CH 2 —H), 4.32 (t, 2H, O—CH 2 —CH 2 —O—) H), 4.00 (t, 2H , O-CH 2 -CH 2 -O-H), 0.8 2 (m, 17H, n-C8H17-H)
（中間体合成例４）
［化合物（ｃ）；２−［２−（４−ブトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレートの合成］
[Compound (c); Synthesis of 2- [2- (4-butoxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate]
２００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、４−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）ベンゼン−１，３−ジオールを１７．０ｇ（０．０６６モル）、メチルイソブチルケトン３５ｍｌ、１−ブロモブタン９．２ｇ（０．０６７モル）、炭酸ナトリウム５．６ｇ（０．０５３モル）、ヨウ化カリウム４．９ｇを入れて１０５〜１１５℃で４時間還流撹拌した。水３５ｍｌを加え、静置して下層部の水層を分離して除去し、温水３５ｍｌで洗浄した。メチルイソブチルケトン３５ｍｌを減圧で回収後にイソプロピルアルコール１００ｍｌを加え、析出した結晶をろ過し、イソプロピルアルコール２０ｍｌで洗浄し、乾燥して、５−ブトキシ−２−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを１５．０ｇ得た。 A 200 ml four-necked flask was equipped with a condenser with a ball, a thermometer, and a stirring device, and 17.0 g (0.066) of 4- (5-methoxy-2H-benzotriazol-2-yl) benzene-1,3-diol was added. Mol), 35 ml of methyl isobutyl ketone, 9.2 g (0.067 mol) of 1-bromobutane, 5.6 g (0.053 mol) of sodium carbonate, and 4.9 g of potassium iodide, and refluxed at 105 to 115 ° C. for 4 hours. Stir. 35 ml of water was added, and the mixture was allowed to stand to separate and remove the lower aqueous layer, followed by washing with 35 ml of warm water. After recovering 35 ml of methyl isobutyl ketone under reduced pressure, 100 ml of isopropyl alcohol was added, and the precipitated crystals were filtered, washed with 20 ml of isopropyl alcohol, dried, and 5-butoxy-2- (5-methoxy-2H-benzotriazole-2 -Yl) 15.0 g of phenol was obtained.
５００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、５−ブトキシ−２−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを１５．０ｇ（０．０４８モル）、４７％臭化水素酸９．９ｇ（０．０５８モル）、スルホラン１４５ｍｌを入れて１００〜１０５℃で４８時間撹拌した。トルエン７０ｍｌ、水２００ｍｌを加えて、静置して下層の水層を分離して除去し、温水１００ｍｌで２回洗浄し、トルエン７０ｍｌを減圧で回収した。イソプロピルアルコール３０ｍｌ、水１５ｍｌを加えて、５℃まで冷却し、析出する結晶をろ過し、イソプロピルアルコール水溶液（７０％ Ｖ／Ｖ）２０ｍｌで洗浄し、乾燥して、５−ブトキシ−２−（５−ヒドロキシ−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを６．２ｇ得た。 A 500 ml four-necked flask is equipped with a condenser with a ball, a thermometer, and a stirring device, and 15.0 g (0.048 mol) of 5-butoxy-2- (5-methoxy-2H-benzotriazol-2-yl) phenol 47% hydrobromic acid (9.9 g, 0.058 mol) and sulfolane (145 ml) were added, and the mixture was stirred at 100 to 105 ° C. for 48 hours. 70 ml of toluene and 200 ml of water were added and left standing to separate and remove the lower aqueous layer, washed twice with 100 ml of warm water, and 70 ml of toluene was recovered under reduced pressure. 30 ml of isopropyl alcohol and 15 ml of water were added and cooled to 5 ° C., and the precipitated crystals were filtered, washed with 20 ml of aqueous isopropyl alcohol (70% V / V), dried, and 5-butoxy-2- (5 6.2 g of -hydroxy-2H-benzotriazol-2-yl) phenol was obtained.
２００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、５−ブトキシ−２−（５−ヒドロキシ−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを６．２ｇ（０．０２１モル）、メチルイソブチルケトン５０ｍｌ、２−クロロエタノール７．４ｇ（０．０９２モル）、炭酸ナトリウム４．９ｇ（０．０４６モル）、ヨウ化カリウム０．２ｇを入れて１１３〜１１８℃で１０時間還流脱水した。水５０ｍｌを加え、静置して下層部の水層を分離して除去し、温水５０ｍｌで洗浄した。メチルイソブチルケトン５０ｍｌを減圧で回収後にイソプロピルアルコール２５ｍｌを加えて５℃まで冷却し、析出した結晶をろ過し、イソプロピルアルコール１５ｍｌで洗浄し、乾燥して、５−ブトキシ−２−（５−（２−ヒドロキシエトキシ）−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを３．４ｇ得た。 A 200 ml four-necked flask was equipped with a ball condenser, thermometer, and stirring device, and 6.2 g (0.021 mol) of 5-butoxy-2- (5-hydroxy-2H-benzotriazol-2-yl) phenol was attached. , 50 ml of methyl isobutyl ketone, 7.4 g (0.092 mol) of 2-chloroethanol, 4.9 g (0.046 mol) of sodium carbonate, and 0.2 g of potassium iodide, and refluxed at 113 to 118 ° C. for 10 hours. did. 50 ml of water was added, the mixture was allowed to stand, and the lower aqueous layer was separated and removed, followed by washing with 50 ml of warm water. After recovering 50 ml of methyl isobutyl ketone under reduced pressure, 25 ml of isopropyl alcohol is added and cooled to 5 ° C., and the precipitated crystals are filtered, washed with 15 ml of isopropyl alcohol and dried to give 5-butoxy-2- (5- (2 3.4 g of -hydroxyethoxy) -2H-benzotriazol-2-yl) phenol was obtained.
２００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、５−ブトキシ−２−（５−（２−ヒドロキシエトキシ）−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを３．４ｇ（０．０１０モル）、トルエン４０ｍｌ、メタクリル酸１．７ｇ（０．０２０モル）、メタンスルホン酸０．２ｇ（０．００２モル）を入れて、１１０〜１１５℃で４時間還流脱水した。水３０ｍｌ、炭酸ナトリウム０．７ｇ（０．００７モル）を加え、静置して下層部の水層を分離して除去し、活性炭０．１ｇを加え、還流撹拌して脱色させた。熱時にろ過し、ろ液からトルエン４０ｍｌを減圧で回収した後にイソプロピルアルコール３０ｍｌを加え、析出した結晶をろ過し、イソプロピルアルコール１５ｍｌで洗浄した後、減圧下４０℃で乾燥し、白色結晶を２．７ｇ得た。この２．７ｇをイソプロピルアルコールで再結晶して、減圧下４０℃で乾燥し、化合物（ｃ）を２．２ｇ得た。収率８％（４−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）ベンゼン−１，３−ジオールから）であった。融点１０１℃、最大吸収波長λｍａｘが３５１ｎｍの時の吸光度εは２９１００であった。 A 200 ml four-necked flask was equipped with a ball condenser, a thermometer, and a stirring device, and 3.4 g of 5-butoxy-2- (5- (2-hydroxyethoxy) -2H-benzotriazol-2-yl) phenol ( 0.010 mol), toluene 40 ml, methacrylic acid 1.7 g (0.020 mol), and methanesulfonic acid 0.2 g (0.002 mol) were added and reflux dehydrated at 110-115 ° C. for 4 hours. 30 ml of water and 0.7 g (0.007 mol) of sodium carbonate were added and left standing to separate and remove the lower aqueous layer, 0.1 g of activated carbon was added, and the mixture was stirred under reflux to decolorize. Filtration was performed while hot, and 40 ml of toluene was collected from the filtrate under reduced pressure, 30 ml of isopropyl alcohol was added, the precipitated crystals were filtered, washed with 15 ml of isopropyl alcohol, and then dried at 40 ° C. under reduced pressure to give 2. 7 g was obtained. 2.7 g of this was recrystallized from isopropyl alcohol and dried at 40 ° C. under reduced pressure to obtain 2.2 g of compound (c). The yield was 8% (from 4- (5-methoxy-2H-benzotriazol-2-yl) benzene-1,3-diol). When the melting point was 101 ° C. and the maximum absorption wavelength λmax was 351 nm, the absorbance ε was 29100.
また、ＨＰＬＣ分析により、化合物（ｃ）の純度を測定した。
＜測定条件＞
装置：Ｌ−２１３０（（株）日立ハイテクノロジーズ製）
使用カラム：Ｉｎｅｒｔｓｉｌ ＯＤＳ−３ ４．６×１５０ｍｍ ５μｍ
カラム温度：２５℃
移動相： アセトニトリル／水＝９／１（リン酸３ｍｌ／Ｌ）
流速：１．０ｍｌ／ｍｉｎ
＜測定結果＞
ＨＰＬＣ面百純度：９８．７％
なお、以下の化合物（ｄ）も化合物（ｃ）と同様の測定条件でＨＰＬＣ測定を行った。
Moreover, the purity of the compound (c) was measured by HPLC analysis.
<Measurement conditions>
Device: L-2130 (manufactured by Hitachi High-Technologies Corporation)
Column used: Inertsil ODS-3 4.6 × 150 mm 5 μm
Column temperature: 25 ° C
Mobile phase: acetonitrile / water = 9/1 (phosphoric acid 3 ml / L)
Flow rate: 1.0 ml / min
<Measurement results>
HPLC area purity: 98.7%
The following compound (d) was also subjected to HPLC measurement under the same measurement conditions as for compound (c).
また、化合物（ｃ）のＮＭＲ解析を行った結果、上記構造を支持する結果が得られた。得られたＮＭＲスペクトルの内容は以下のとおりである。
δ＝１１．３（ｂ，ＯＨ），８．２１（ｄ，１Ｈ，Ｊ＝９．２４Ｈｚ，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ），７．８０（ｄｄ，１Ｈ，Ｊ＝９．１Ｈｚ，Ｊ＝０．６６Ｈｚ，Ｊ＝０．６６Ｈｚ，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ），７．１８（ｄ，１Ｈ，Ｊ＝２．３１Ｈｚ，ｐｈｅｎｏｌ−Ｈ），６．６８（ｄ，１Ｈ，Ｊ＝２．６４Ｈｚ，ｐｈｅｎｏｌ−Ｈ），６．６０（ｄｄ，１Ｈ，Ｊ＝９．２Ｈｚ，Ｊ＝２．６４Ｈｚ，Ｊ＝２．６４Ｈｚ，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ，），６．１８（ｓ，１Ｈ，＝ＣＨ２−Ｈ），５．６２（ｍ，１Ｈ，＝ＣＨ２−Ｈ），０．９−２．１（ｍ，３Ｈ，９Ｈ，ＣＨ３，ｎ−Ｃ４Ｈ９−Ｈ）
Further, as a result of conducting NMR analysis of the compound (c), a result supporting the above structure was obtained. The contents of the obtained NMR spectrum are as follows.
δ = 11.3 (b, OH), 8.21 (d, 1H, J = 9.24 Hz, benzotriazole-H), 7.80 (dd, 1H, J = 9.1 Hz, J = 0.66 Hz, J = 0.66 Hz, benzotriazole-H), 7.18 (d, 1H, J = 2.31 Hz, phenol-H), 6.68 (d, 1H, J = 2.64 Hz, phenol-H), 6 .60 (dd, 1H, J = 9.2 Hz, J = 2.64 Hz, J = 2.64 Hz, benzotriazole-H,), 6.18 (s, 1H, ═CH 2 —H), 5.62 ( m, 1H, = CH 2 -H ), 0.9-2.1 (m, 3H, 9H, CH 3, n-C4H9-H)
（中間体合成例５）
［化合物（ｄ）；２−［２−（４−エトキシ−２−ヒドロキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレートの合成］
[Compound (d); Synthesis of 2- [2- (4-Ethoxy-2-hydroxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate]
２００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、４−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）ベンゼン−１，３−ジオールを１０．０ｇ（０．０３９モル）、メチルイソブチルケトン４０ｍｌ、ブロモエタン６．４ｇ（０．０５９モル）、炭酸ナトリウム３．３ｇ（０．０３１モル）、ヨウ化カリウム３．０ｇを入れて９５〜１１０℃で６時間還流撹拌した。水２０ｍｌを加え、静置して下層部の水層を分離して除去し、温水２０ｍｌで洗浄した。メチルイソブチルケトン４０ｍｌを減圧で回収後にイソプロピルアルコール１００ｍｌを加え、析出した結晶をろ過し、イソプロピルアルコール２５ｍｌで洗浄し、乾燥して、５−エトキシ−２−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを８．２ｇ得た。 A 200 ml four-necked flask was equipped with a condenser with a ball, a thermometer, and a stirring device, and 10.0 g (0.039) of 4- (5-methoxy-2H-benzotriazol-2-yl) benzene-1,3-diol was attached. Mol), 40 ml of methyl isobutyl ketone, 6.4 g (0.059 mol) of bromoethane, 3.3 g (0.031 mol) of sodium carbonate, and 3.0 g of potassium iodide, and the mixture was refluxed and stirred at 95 to 110 ° C. for 6 hours. . 20 ml of water was added, the mixture was allowed to stand, and the lower aqueous layer was separated and removed, and washed with 20 ml of warm water. After recovering 40 ml of methyl isobutyl ketone under reduced pressure, 100 ml of isopropyl alcohol is added, and the precipitated crystals are filtered, washed with 25 ml of isopropyl alcohol, dried, and 5-ethoxy-2- (5-methoxy-2H-benzotriazole-2 -Yl) 8.2 g of phenol was obtained.
５００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、５−エトキシ−２−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを８．２ｇ（０．０２９モル）、４７％臭化水素酸６．２ｇ（０．０３６モル）、スルホラン８２ｍｌを入れて１００〜１０５℃で３３時間撹拌させた。トルエン５０ｍｌ、水１６５ｍｌを加えて、静置して下層の水層を分離して除去し、温水８０ｍｌで洗浄し、トルエン５０ｍｌを減圧で回収した。イソプロピルアルコール３５ｍｌ、水１５ｍｌを加えて、５℃まで冷却し、析出する結晶をろ過し、イソプロピルアルコール水溶液（７０％ Ｖ／Ｖ）２０ｍｌで洗浄し、乾燥して、５−エトキシ−２−（５−ヒドロキシ−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを４．６ｇ得た。 A 500 ml four-necked flask was equipped with a condenser with a ball, a thermometer, and a stirring device, and 8.2 g (0.029 mol) of 5-ethoxy-2- (5-methoxy-2H-benzotriazol-2-yl) phenol was attached. 47% hydrobromic acid (6.2 g, 0.036 mol) and sulfolane (82 ml) were added and stirred at 100 to 105 ° C. for 33 hours. Toluene (50 ml) and water (165 ml) were added and allowed to stand to separate and remove the lower aqueous layer, washed with warm water (80 ml), and toluene (50 ml) was recovered under reduced pressure. Add 35 ml of isopropyl alcohol and 15 ml of water, cool to 5 ° C., filter the precipitated crystals, wash with 20 ml of an aqueous isopropyl alcohol solution (70% V / V), dry and dry 5-ethoxy-2- (5 4.6 g of -hydroxy-2H-benzotriazol-2-yl) phenol was obtained.
２００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、５−エトキシ−２−（５−ヒドロキシ−２Ｈ−ベンゾトリアゾール−２−イル）フェノールを４．６ｇ（０．０１７モル）、メチルイソブチルケトン３５ｍｌ、２−クロロエタノール１．７ｇ（０．０２１モル）、炭酸ナトリウム１．１ｇ（０．０１０モル）、ヨウ化カリウム０．９ｇを入れて、１１３〜１１８℃で８時間還流脱水した。水３０ｍｌを加え、静置して下層部の水層を分離して除去し、温水３０ｍｌで洗浄した。メチルイソブチルケトン３５ｍｌを減圧で回収し、５−エトキシ−２−［５−（２−ヒドロキシエトキシ）−２Ｈ−ベンゾトリアゾール−２−イル］フェノールの固形分を５．０ｇ得た。 A 200 ml four-necked flask is equipped with a condenser with a ball, a thermometer, and a stirring device, and 4.6 g (0.017 mol) of 5-ethoxy-2- (5-hydroxy-2H-benzotriazol-2-yl) phenol is attached. , 35 ml of methyl isobutyl ketone, 1.7 g (0.021 mol) of 2-chloroethanol, 1.1 g (0.010 mol) of sodium carbonate and 0.9 g of potassium iodide, and refluxed at 113 to 118 ° C. for 8 hours. Dehydrated. 30 ml of water was added, the mixture was allowed to stand, and the lower aqueous layer was separated and removed, followed by washing with 30 ml of warm water. 35 ml of methyl isobutyl ketone was recovered under reduced pressure to obtain 5.0 g of a solid content of 5-ethoxy-2- [5- (2-hydroxyethoxy) -2H-benzotriazol-2-yl] phenol.
３００ｍｌの４つ口フラスコに玉付きコンデンサー、温度計、撹拌装置を取り付け、５−エトキシ−２−［５−（２−ヒドロキシエトキシ）−２Ｈ−ベンゾトリアゾール−２−イル］フェノールの固形分を５．０ｇ（０．０１６モル）、トルエン１００ｍｌ、メタクリル酸２．７ｇ（０．０３１モル）、メタンスルホン酸２．０ｇ（０．０２１モル）を入れて、１１０〜１１５℃で４時間還流脱水した。水８０ｍｌ、炭酸ナトリウム１．９ｇ（０．０１８モル）を加え、静置して下層部の水層を分離して除去し、活性炭０．１ｇを加え、還流撹拌して脱色させた。熱時ろ過し、ろ液からトルエン１００ｍｌを減圧で回収した後にイソプロピルアルコール３０ｍｌを加え、析出した結晶をろ過し、イソプロピルアルコール２０ｍｌで洗浄した後、減圧下４０℃で乾燥し、白色結晶を３．２ｇ得た。この３．２ｇをイソプロピルアルコールで再結晶して、減圧下４０℃で乾燥し、化合物（ｄ）を１．６ｇ得た。収率１１％（４−（５−メトキシ−２Ｈ−ベンゾトリアゾール−２−イル）ベンゼン−１，３−ジオールから）であった。融点１５６℃、ＨＰＬＣ面百純度９８．１％、最大吸収波長λｍａｘが３５０ｎｍの時の吸光度εは２９０００であった。 A 300 ml four-necked flask is equipped with a condenser with a ball, a thermometer, and a stirrer, and the solid content of 5-ethoxy-2- [5- (2-hydroxyethoxy) -2H-benzotriazol-2-yl] phenol is 5 0.0 g (0.016 mol), 100 ml of toluene, 2.7 g (0.031 mol) of methacrylic acid, and 2.0 g (0.021 mol) of methanesulfonic acid were added and dehydrated at 110 to 115 ° C. for 4 hours. . 80 ml of water and 1.9 g (0.018 mol) of sodium carbonate were added and left standing to separate and remove the lower aqueous layer, 0.1 g of activated carbon was added, and the mixture was stirred and refluxed to decolorize. After hot filtration, 100 ml of toluene was recovered from the filtrate under reduced pressure, 30 ml of isopropyl alcohol was added, the precipitated crystals were filtered, washed with 20 ml of isopropyl alcohol, and then dried at 40 ° C. under reduced pressure to obtain white crystals. 2 g was obtained. 3.2 g of this was recrystallized from isopropyl alcohol and dried at 40 ° C. under reduced pressure to obtain 1.6 g of compound (d). The yield was 11% (from 4- (5-methoxy-2H-benzotriazol-2-yl) benzene-1,3-diol). The absorbance ε was 29000 when the melting point was 156 ° C., the HPLC area purity was 98.1%, and the maximum absorption wavelength λmax was 350 nm.
また、化合物（ｄ）のＮＭＲ解析を行った結果、上記構造を支持する結果が得られた。得られたＮＭＲスペクトルの内容は以下のとおりである。
δ＝１１．３（ｂ，ＯＨ），８．２１（ｄ，１Ｈ，Ｊ＝９．０７Ｈｚ，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ），７．７９（ｄ，１Ｈ，Ｊ＝９．７２，ｂｅｎｚｏｔｒｉａｚｏｌｅ−Ｈ），７．１６（ｍ，１Ｈ，ｐｈｅｎｏｌ−Ｈ），６．６８（ｄ，１Ｈ，Ｊ＝２．６４Ｈｚ，ｐｈｅｎｏｌ−Ｈ），６．５９（ｄｄ，１Ｈ，Ｊ＝９．２，Ｊ＝２．８，Ｊ＝２．６４，ｐｈｅｎｏｌ−Ｈ，），６．１７（ｓ，１Ｈ，Ｃ＝ＣＨ２−Ｈ），５．６１（ｔ，１Ｈ，＝ＣＨ２−Ｈ），４．５８（ｍ，２Ｈ，Ｏ−ＣＨ２−ＣＨ２−Ｏ−Ｈ），４．３２（ｔ，２Ｈ，Ｏ−ＣＨ２−ＣＨ２−Ｏ−Ｈ），４．０８（ｑ，２Ｈ，−ＣＨ２−ＣＨ３−Ｈ），１．６７（ｓ，３Ｈ，Ｃ＝ＣＨ２−ＣＨ３−Ｈ），１．５７（ｔ，３Ｈ，ＣＨ２−ＣＨ３−Ｈ）
Further, as a result of conducting NMR analysis of the compound (d), a result supporting the above structure was obtained. The contents of the obtained NMR spectrum are as follows.
δ = 11.3 (b, OH), 8.21 (d, 1H, J = 9.07 Hz, benzotriazole-H), 7.79 (d, 1H, J = 9.72, benzotriazole-H), 7 .16 (m, 1H, phenol-H), 6.68 (d, 1H, J = 2.64 Hz, phenol-H), 6.59 (dd, 1H, J = 9.2, J = 2.8) , J = 2.64, phenol-H ,), 6.17 (s, 1H, C = CH 2 -H), 5.61 (t, 1H, = CH 2 -H), 4.58 (m, 2H, O—CH 2 —CH 2 —O—H), 4.32 (t, 2H, O—CH 2 —CH 2 —O—H), 4.08 (q, 2H, —CH 2 —CH 3). -H), 1.67 (s, 3H , C = CH 2 -CH 3 -H), 1.57 (t, 3H, CH 2 -CH 3 -H)
（合成例１）
［重合体（ａ）；化合物（ａ）の濃度０．０２５Ｍの単独重合］
１００ｍｌのガラス管に、化合物（ａ）；２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレートを０．２３４ｇ（０．０００５モル）、ベンゼン２０ｍｌ、ベンゾイルパーオキサイド０．０９７ｇ（０．０００４モル）を入れて、凍結乾燥した後に封管した。ガラス管を９０℃のオイルバスに入れて２４時間重合させた。重合溶液を１００ｍｌフラスコへ移し、エバポレーターでベンゼンを留去した。そこへクロロホルム１０ｍｌを加えて生成物を溶解させ、その溶液を２００ｍｌのアセトンの中へ滴下した。析出したポリマーをろ過し、アセトン１００ｍｌで洗浄した後、減圧下室温で乾燥し、淡黄色固体の重合体（ａ）を０．１４７ｇ得た。
(Synthesis Example 1)
[Polymer (a); homopolymerization of compound (a) at a concentration of 0.025M]
In a 100 ml glass tube, 0.234 g (0.0005 mol) of compound (a); 2- [2- (2-hydroxy-4-octyloxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 20 ml of benzene and 0.097 g (0.0004 mol) of benzoyl peroxide were added, freeze-dried and sealed. The glass tube was placed in a 90 ° C. oil bath and polymerized for 24 hours. The polymerization solution was transferred to a 100 ml flask, and benzene was distilled off with an evaporator. Thereto was added 10 ml of chloroform to dissolve the product, and the solution was dropped into 200 ml of acetone. The precipitated polymer was filtered, washed with 100 ml of acetone, and then dried at room temperature under reduced pressure to obtain 0.147 g of a light yellow solid polymer (a).
また、重合体（ａ）の分子量を測定した結果、重量平均分子量（Ｍｗ）は１１２００、数平均分子量（Ｍｎ）は３３３０、多分散度（Ｍｗ／Ｍｎ）は３．３６であった。測定条件は次のとおりである。なお、以下の重合体（ｂ）、（ｃ）、（ｄ）も重合体（ａ）と同様の測定条件で分子量測定を行った。
＜測定条件＞
装置：ＬＣ−１０ＡＤ（（株）島津製作所製）
溶離液：クロロホルム
カラム：Ｓｈｏｄｅｘ Ｋ−８０７Ｌ、Ｓｈｏｄｅｘ Ｋ８０５Ｌ、Ｓｈｏｄｅｘ Ｋ−８０４Ｌ（昭和電工（株）製）
吸収スペクトル削除
As a result of measuring the molecular weight of the polymer (a), the weight average molecular weight (Mw) was 11,200, the number average molecular weight (Mn) was 3330, and the polydispersity (Mw / Mn) was 3.36. The measurement conditions are as follows. The following polymers (b), (c) and (d) were also subjected to molecular weight measurement under the same measurement conditions as the polymer (a).
<Measurement conditions>
Apparatus: LC-10AD (manufactured by Shimadzu Corporation)
Eluent: Chloroform Column: Shodex K-807L, Shodex K805L, Shodex K-804L (manufactured by Showa Denko KK)
Absorption spectrum deletion
（合成例２）
［重合体（ｂ）；化合物（ａ）の濃度０．０５０Ｍの単独重合］
１００ｍｌのガラス管に、化合物（ａ）；２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレートを０．４６８ｇ（０．００１モル）、ベンゼン２０ｍｌ、ベンゾイルパーオキサイド０．０９７ｇ（０．０００４モル）を入れて、凍結乾燥した後に封管した。ガラス管を９０℃のオイルバスに入れて２４時間重合させた。重合溶液を１００ｍｌフラスコへ移し、エバポレーターでベンゼンを留去した。そこへクロロホルム１０ｍｌを加えて生成物を溶解させ、その溶液を２００ｍｌのアセトンの中へ滴下した。析出したポリマーをろ過し、アセトン１００ｍｌで洗浄した後、減圧下室温で乾燥し、淡黄色固体の重合体（ｂ）を０．３３７ｇ得た。
(Synthesis Example 2)
[Polymer (b); homopolymerization of compound (a) at a concentration of 0.050M]
In a 100 ml glass tube, 0.468 g (0.001 mol) of compound (a); 2- [2- (2-hydroxy-4-octyloxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 20 ml of benzene and 0.097 g (0.0004 mol) of benzoyl peroxide were added, freeze-dried and sealed. The glass tube was placed in a 90 ° C. oil bath and polymerized for 24 hours. The polymerization solution was transferred to a 100 ml flask, and benzene was distilled off with an evaporator. Thereto was added 10 ml of chloroform to dissolve the product, and the solution was dropped into 200 ml of acetone. The precipitated polymer was filtered, washed with 100 ml of acetone, and dried at room temperature under reduced pressure to obtain 0.337 g of a light yellow solid polymer (b).
また、重合体（ｂ）の分子量を測定した結果、重量平均分子量（Ｍｗ）は１４６００、数平均分子量（Ｍｎ）は６４７０、多分散度（Ｍｗ／Ｍｎ）は２．２５であった。 As a result of measuring the molecular weight of the polymer (b), the weight average molecular weight (Mw) was 14600, the number average molecular weight (Mn) was 6470, and the polydispersity (Mw / Mn) was 2.25.
（比較合成例１）
［重合体（ｃ）；化合物（ａ）の濃度０．０７５Ｍの単独重合］
１００ｍｌのガラス管に、化合物（ａ）；２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレートを０．７０２ｇ（０．００１５モル）、ベンゼン２０ｍｌ、ベンゾイルパーオキサイド０．０９７ｇ（０．０００４モル）を入れて、凍結乾燥した後に封管した。ガラス管を９０℃のオイルバスに入れて２４時間重合させた。重合溶液を１００ｍｌフラスコへ移し、エバポレーターでベンゼンを留去した。そこへクロロホルム１５ｍｌを加えて生成物を溶解させ、その溶液を３００ｍｌのアセトンの中へ滴下した。析出したポリマーをろ過し、アセトン１００ｍｌで洗浄した後、減圧下室温で乾燥し、淡黄色固体の重合体（ｃ）を０．５９７ｇ得た。
(Comparative Synthesis Example 1)
[Polymer (c); homopolymerization of compound (a) at a concentration of 0.075M]
In a 100 ml glass tube, 0.702 g (0.0015 mol) of compound (a); 2- [2- (2-hydroxy-4-octyloxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 20 ml of benzene and 0.097 g (0.0004 mol) of benzoyl peroxide were added, freeze-dried and sealed. The glass tube was placed in a 90 ° C. oil bath and polymerized for 24 hours. The polymerization solution was transferred to a 100 ml flask, and benzene was distilled off with an evaporator. Thereto was added 15 ml of chloroform to dissolve the product, and the solution was dropped into 300 ml of acetone. The precipitated polymer was filtered, washed with 100 ml of acetone, and then dried at room temperature under reduced pressure to obtain 0.597 g of a light yellow solid polymer (c).
また、重合体（ｃ）の分子量を測定した結果、重量平均分子量（Ｍｗ）は２５７００、数平均分子量（Ｍｎ）は１００００、多分散度（Ｍｗ／Ｍｎ）は２．５７であった。 As a result of measuring the molecular weight of the polymer (c), the weight average molecular weight (Mw) was 25700, the number average molecular weight (Mn) was 10,000, and the polydispersity (Mw / Mn) was 2.57.
（比較合成例２）
［重合体（ｄ）；化合物（ａ）の濃度０．１Ｍの単独重合］
１００ｍｌのガラス管に、化合物（ａ）；２−［２−（２−ヒドロキシ−４−オクチルオキシフェニル）−２Ｈ−ベンゾトリアゾール−５−イルオキシ］エチルメタクリレートを０．９３６ｇ（０．００２モル）、ベンゼン２０ｍｌ、ベンゾイルパーオキサイド０．０９７ｇ（０．０００４モル）を入れて、凍結乾燥した後に封管した。ガラス管を９０℃のオイルバスに入れて２４時間重合させた。重合溶液を１００ｍｌフラスコへ移し、エバポレーターでベンゼンを留去した。そこへクロロホルム２０ｍｌを加えて生成物を溶解させ、その溶液を４００ｍｌのアセトンの中へ滴下した。析出したポリマーをろ過し、アセトン１００ｍｌで洗浄した後、減圧下室温で乾燥し、淡黄色固体の重合体（ｄ）を０．８６１ｇ得た。
また、重合体（ｄ）の分子量を測定した結果、重量平均分子量（Ｍｗ）は５４９００、数平均分子量（Ｍｎ）は１７１００、多分散度（Ｍｗ／Ｍｎ）は３．２１であった。
(Comparative Synthesis Example 2)
[Polymer (d); homopolymerization of compound (a) at a concentration of 0.1M]
In a 100 ml glass tube, 0.936 g (0.002 mol) of compound (a); 2- [2- (2-hydroxy-4-octyloxyphenyl) -2H-benzotriazol-5-yloxy] ethyl methacrylate, 20 ml of benzene and 0.097 g (0.0004 mol) of benzoyl peroxide were added, freeze-dried and sealed. The glass tube was placed in a 90 ° C. oil bath and polymerized for 24 hours. The polymerization solution was transferred to a 100 ml flask, and benzene was distilled off with an evaporator. Thereto was added 20 ml of chloroform to dissolve the product, and the solution was dropped into 400 ml of acetone. The precipitated polymer was filtered, washed with 100 ml of acetone, and then dried at room temperature under reduced pressure to obtain 0.861 g of a light yellow solid polymer (d).
As a result of measuring the molecular weight of the polymer (d), the weight average molecular weight (Mw) was 54900, the number average molecular weight (Mn) was 17100, and the polydispersity (Mw / Mn) was 3.21.
（実施例１）
[樹脂組成物の作製]
合成例１で得られた重合体（ａ）と、ポリスチレン、ポリカーボネート、またはポリメタクリル酸メチルと、ジクロロメタンを表１で示す比率で混合し、紫外線吸収剤を含有した樹脂組成物の溶液を得た。得られた紫外線吸収剤を含有した樹脂組成物の溶液２０ｍｌを、直径１２ｃｍのシャーレに移し、２５℃での常圧乾燥を４８時間実施して溶媒を除去し、膜厚２０μｍの紫外線吸収剤を１％または２０％含んだ樹脂組成物を得た。また、比較として、重合体（ｃ）及び重合体（ｄ）と、従来の一般的な紫外線吸収剤である化合物（ｅ）；２−（２Ｈ−ベンゾトリアゾール−２−イル］−４−メチルフェノールを含有する樹脂組成物も同様に作製した。
Example 1
[Preparation of resin composition]
The polymer (a) obtained in Synthesis Example 1, polystyrene, polycarbonate, or polymethyl methacrylate and dichloromethane were mixed at a ratio shown in Table 1 to obtain a resin composition solution containing an ultraviolet absorber. . 20 ml of the resin composition solution containing the obtained ultraviolet absorber was transferred to a petri dish having a diameter of 12 cm, dried at 25 ° C. under atmospheric pressure for 48 hours to remove the solvent, and an ultraviolet absorber having a thickness of 20 μm was removed. A resin composition containing 1% or 20% was obtained. For comparison, the polymer (c) and the polymer (d) and the compound (e) which is a conventional general ultraviolet absorber; 2- (2H-benzotriazol-2-yl] -4-methylphenol A resin composition containing was also prepared in the same manner.
[耐熱性の測定]
上記で得られた紫外線吸収剤を２０％含んだ樹脂組成物の耐熱性を、示差熱熱重量同時測定装置を用いて測定した結果を、表２に示す。
[Measurement of heat resistance]
Table 2 shows the results of measuring the heat resistance of the resin composition containing 20% of the ultraviolet absorbent obtained above using a differential thermothermal gravimetric simultaneous measurement apparatus.
[光沢度の測定]
上記で得られた紫外線吸収剤を１％含んだ樹脂組成物表面の光沢度を表３に示す。樹脂素材と紫外線吸収剤の相溶性が不十分な場合、紫外線吸収剤が樹脂組成物表面にブリードアウトしてくることから、樹脂組成物表面にざらつきが出て、光沢度が低下する。よって光沢度は、樹脂素材と紫外線吸収剤の相溶性の指標となる。
[Glossiness measurement]
Table 3 shows the glossiness of the surface of the resin composition containing 1% of the ultraviolet absorber obtained above. When the compatibility between the resin material and the ultraviolet absorber is insufficient, the ultraviolet absorber bleeds out on the surface of the resin composition, and thus the surface of the resin composition becomes rough and the glossiness decreases. Therefore, the glossiness is an index of the compatibility between the resin material and the ultraviolet absorber.
表２より、数平均分子量が２０００〜８０００であるベンゾトリアゾール系重合体（ａ）を含む樹脂組成物は、一般的な紫外線吸収剤である化合物（ｅ）を含む樹脂組成物と比較して、各種の樹脂素材で５％重量減少温度が高く、高温時の揮散や分解が起こりにくく高い耐熱性があることがわかる。また、表３より、数平均分子量が２０００〜８０００であるベンゾトリアゾール系重合体（ａ）を含む樹脂組成物は、数平均分子量が８０００以上であるベンゾトリアゾール系重合体（ｃ）及び重合体（ｄ）や、一般的な紫外線吸収剤である化合物（ｅ）を含む樹脂組成物と比較して、各種の樹脂素材で同等又は優れた光沢度を示していることから、各種の樹脂素材でブリードアウトが起こりにくい性質をもつことがわかり、有用な樹脂組成物であることがわかる。なお、耐熱性、および光沢度の測定条件は、以下の通りである。 From Table 2, the resin composition containing the benzotriazole polymer (a) having a number average molecular weight of 2000 to 8000 is compared with the resin composition containing the compound (e) which is a general ultraviolet absorber. It can be seen that various resin materials have a high 5% weight loss temperature and are highly resistant to volatilization and decomposition at high temperatures. Moreover, from Table 3, the resin composition containing a benzotriazole polymer (a) having a number average molecular weight of 2000 to 8000 is a benzotriazole polymer (c) having a number average molecular weight of 8000 or more and a polymer ( d) and a resin composition containing a compound (e), which is a general ultraviolet absorber, show the same or superior glossiness with various resin materials. It turns out that it has the property which does not occur out easily, and it turns out that it is a useful resin composition. In addition, the measurement conditions of heat resistance and glossiness are as follows.
＜耐熱性測定条件＞
装置：ＴＧ／ＤＴＡ６３００（セイコーインスツル（株）製)
測定温度：１００〜５００℃
昇温速度：１０℃／分
測定雰囲気：窒素
<Heat resistance measurement conditions>
Apparatus: TG / DTA6300 (manufactured by Seiko Instruments Inc.)
Measurement temperature: 100-500 ° C
Temperature increase rate: 10 ° C / min Measurement atmosphere: Nitrogen
＜光沢度測定条件＞
装置：ＵＮＩ ＧＬＯＳＳ６０（コニカミノルタセンシング（株）製)
測定角度：６０°
<Glossiness measurement conditions>
Equipment: UNI GLOSS 60 (Konica Minolta Sensing Co., Ltd.)
Measurement angle: 60 °
本発明の樹脂組成物は、耐熱性が高いことから、加工工程における紫外線吸収性成分である前記単独重合体の揮散や分解がなく、さらに前記樹脂素材と前記単独重合体との相溶性が高いことから、ブリードアウトが起こりにくく、紫外線吸収用途の樹脂組成物として好適に利用できる。 Since the resin composition of the present invention has high heat resistance, there is no volatilization or decomposition of the homopolymer that is an ultraviolet absorbing component in the processing step, and the compatibility between the resin material and the homopolymer is high. Therefore, bleeding out hardly occurs, and it can be suitably used as a resin composition for ultraviolet absorption.
Claims (3)
［式中、Ｒ１は水素原子、炭素数１〜８のアルキル基、フェニル基、トリル基、ホルミル基、アルキル炭素数１〜７のアルキルカルボニル基、ベンゾイル基、またはトルオイル基を表し、Ｒ２は炭素数１〜８のアルキレン基を表し、Ｒ３は水素原子またはメチル基を表す］ A resin composition in which a homopolymer of a benzotriazole derivative compound represented by the following general formula (1) is contained in a resin material, and the number average molecular weight of the homopolymer is in a range of 2000 to 8000. object.
[Wherein, R 1 represents a hydrogen atom, an alkyl group having 1 to 8 carbon atoms, a phenyl group, a tolyl group, a formyl group, an alkylcarbonyl group of an alkyl having 1 to 7 carbon atoms, a benzoyl group or a toluoyl group,, R 2 Represents an alkylene group having 1 to 8 carbon atoms, and R 3 represents a hydrogen atom or a methyl group]
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2021080318A (en) * | 2019-11-14 | 2021-05-27 | 国立大学法人福井大学 | Benzotriazole copolymer and ultraviolet absorber including the same |
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| JP7362049B2 (en) | 2019-11-14 | 2023-10-17 | 国立大学法人福井大学 | Benzotriazole copolymer and ultraviolet absorber using the same |
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