JP2019027776A

JP2019027776A - Exhaust gas treatment equipment

Info

Publication number: JP2019027776A
Application number: JP2018129806A
Authority: JP
Inventors: 一知宮崎; Kazutomo Miyazaki; 哲夫駒井; Tetsuo Komai; 誠司柏木; Seiji Kashiwagi
Original assignee: Ebara Corp
Current assignee: Ebara Corp
Priority date: 2017-08-03
Filing date: 2018-07-09
Publication date: 2019-02-21
Anticipated expiration: 2038-07-09
Also published as: JP7353022B2

Abstract

To provide exhaust gas treatment equipment which can prevent thermal damage of a combustion chamber by blowing raw gas and combustion-supporting gas for a tangential direction of an internal perimeter surface of the combustion chamber and forming two mixed cylindrical mixture flame floated from the combustion chamber inner wall when processing raw gas containing hydrogen by an exhaust gas treatment equipment by incineration process.SOLUTION: Exhaust gas treatment equipment makes raw gas containing hydrogen harmless by incineration treatment. A combustion chamber 1 burning the raw gas containing hydrogen is provided as a cylindrical combustion chamber 1. The combustion chamber 1 comprises a nozzle for raw gas 3A and a nozzle for combustion-support gas 3B blowing the raw gas and the combustion-supporting gas into the tangential direction of the internal perimeter surface of the combustion chamber 1 respectively. The nozzle for raw gas 3A and the nozzle for combustion-support gas 3B are located on same plane at right angles to the axis of the combustion chamber 1.SELECTED DRAWING: Figure 1

Description

本発明は、半導体デバイス等を製造する製造装置から排出される排ガスを燃焼処理して無害化する排ガス処理装置に係り、特にＥＵＶ（Extreme Ultra Violet）露光装置から排出される排ガスを燃焼処理して無害化する排ガス処理装置に関するものである。 The present invention relates to an exhaust gas processing apparatus for detoxifying an exhaust gas discharged from a manufacturing apparatus for manufacturing a semiconductor device or the like, and in particular, an exhaust gas discharged from an EUV (Extreme Ultra Violet) exposure apparatus is subjected to a combustion process. The present invention relates to a detoxifying exhaust gas treatment apparatus.

ＭＰＵ、ＤＲＡＭ等の半導体集積回路の高集積化とそれに必要な微細化は、回路パターンを転写する露光装置光学系の短波長化と、液浸、マルチパターニング等の技術によって実現されてきた。
光学系の短波長化は技術的限界に近付いているとも言われるが、近年ＥＵＶ（Extreme Ultra Violet：極短紫外線）露光装置が実用化されようとしている。ＥＵＶとは、これまで３６５ｎｍ→２４８ｎｍ→１９３ｎｍ（現行）と数１０年をかけて段階的に進められてきた短波長化を、一気に１３．５ｎｍにまで進める技術であり、それだけに克服するべきさまざまな技術的ハードルを抱えている。 High integration and miniaturization of semiconductor integrated circuits such as MPU and DRAM have been realized by techniques such as shortening the wavelength of an exposure apparatus optical system for transferring a circuit pattern, immersion, and multi-patterning.
Although it is said that the shortening of the wavelength of the optical system is approaching the technical limit, in recent years, EUV (Extreme Ultra Violet) exposure apparatuses are being put to practical use. EUV is a technology that advances wavelength shortening, which has been carried out in steps of several decades from 365 nm to 248 nm to 193 nm (current), to 13.5 nm all at once. Have technical hurdles.

その一つに装置内の汚染対策がある。ＥＵＶ露光装置は超精密機器であり、特に光学系への異物の進入によって性能が急激に低下する。ＥＵＶ露光装置はＥＵＶを発生させる光源部と、光源部で発生させたＥＵＶでウエハの露光を行う露光部から構成されており、光源部ではターゲットへのレーザー照射によって生成するスズ（Ｓｎ）の酸化物、露光部では感光性物質（レジスト）から脱離する有機物質が、それぞれ代表的な汚染源として知られているが、これらは装置の運用上必然的に発生するものであり、発生そのものを防止することはできない。 One of them is a countermeasure against contamination in the apparatus. An EUV exposure apparatus is an ultra-precise instrument, and its performance is drastically deteriorated by the entry of foreign matter into the optical system. The EUV exposure apparatus is composed of a light source unit that generates EUV and an exposure unit that exposes a wafer with EUV generated by the light source unit. In the light source unit, oxidation of tin (Sn) generated by laser irradiation of a target is performed. Organic substances that are desorbed from photosensitive substances (resists) are known as typical sources of contamination in the object and exposed areas, but these are inevitably generated in the operation of the equipment, preventing the occurrence itself. I can't do it.

これらへの汚染対策として、水素ガスを用いる方法がある。光源部では水素ガスを数百Ｌ/分使用してスズの酸化物をガス状の水素化物として除去し、また露光部では同じく水素ガスを数十Ｌ/分使用して有機物質をガス化させて除去する。使用された水素ガスは大半が未反応ではあるが、除去された汚染物質のキャリアとして装置から排出される。ただし、露光部内を真空にする動作工程の存在や、光源部と露光部はある程度独立して動作すること、また定期的なメンテナンスといった要因のため、排出される水素ガスの量は大きく変動する。
従ってＥＵＶ露光装置からは百数十〜数百Ｌ/分という変動幅を持った水素ガスを含む処理ガス（排ガス）が排出されることになる。 As a countermeasure against contamination, there is a method using hydrogen gas. In the light source section, hydrogen gas is used at several hundred L / min to remove tin oxide as a gaseous hydride, and in the exposure section, hydrogen gas is also used at several tens L / min to gasify organic substances. To remove. Although most of the used hydrogen gas is unreacted, it is discharged from the apparatus as a carrier of removed contaminants. However, the amount of discharged hydrogen gas varies greatly due to the existence of an operation process for evacuating the inside of the exposure unit, the light source unit and the exposure unit operating to some extent independently, and periodic maintenance.
Therefore, a processing gas (exhaust gas) containing hydrogen gas having a fluctuation range of hundreds to several hundreds L / min is discharged from the EUV exposure apparatus.

特許第４９３７８８６号公報Japanese Patent No. 4937886

半導体デバイス等の製造装置から排出される処理ガス（排ガス）は、通常、排ガス処理装置によって無害化処理を行った後に大気に排出している。この無害化処理方法としては、特許文献１等に開示されているように、燃料（燃料ガス）と支燃性ガス（酸素含有ガス）とを混合して燃料を燃焼させて火炎を形成し、火炎に処理ガス（排ガス）を混合して処理ガスを燃焼処理する燃焼式排ガス処理装置が広く採用されている。
しかしながら、ＥＵＶ露光装置から排出される処理ガス（排ガス）には大量の水素ガスが含まれているため、別途燃料を供給することなく、支燃性ガス（酸素含有ガス）を供給するだけで処理ガスを燃焼処理できる可能性がある。 A processing gas (exhaust gas) discharged from a manufacturing device such as a semiconductor device is normally discharged to the atmosphere after being detoxified by the exhaust gas processing device. As this detoxification treatment method, as disclosed in Patent Document 1, etc., a fuel (fuel gas) and a combustion-supporting gas (oxygen-containing gas) are mixed to burn the fuel to form a flame, 2. Description of the Related Art Combustion-type exhaust gas treatment apparatuses that mix a processing gas (exhaust gas) with a flame and combust the processing gas are widely used.
However, since a large amount of hydrogen gas is contained in the processing gas (exhaust gas) discharged from the EUV exposure apparatus, the processing gas (oxygen-containing gas) is simply supplied without supplying a separate fuel. There is a possibility of burning the gas.

水素は可燃性ガスの中でも特に燃焼速度が速く、燃焼範囲が広い（高濃度でも低濃度でも燃焼する）特徴を持つ。そのため、水素が燃焼室内に流入した直後急速に燃焼して局所的な高温部が形成され、燃焼室が熱損傷する可能性がある。熱損傷の可能性は水素の流入量が多いほど高くなるが、一般的な手法として大量の支燃性ガス（空気）を用いて燃焼させることにより、熱損傷を防止することは可能である。ただしこの場合、大容積の燃焼室が必要になり、燃焼ガス量も多くなるため装置が大型化する。また支燃性ガス量を水素の流量に合わせて調整する必要が出てくる。これは大量の支燃性ガスに対して少量の水素ガスを混合して燃焼させようとした場合、燃焼可能な下限濃度（水素と空気の混合気の場合、水素濃度が４％）を下回れば燃焼しなくなるためである。
ところが水素の流量はＥＵＶ露光装置の運転状態に依存して変動するため、水素の流量に追随して支燃性ガス量を調整することは困難である。従って大量の水素に対して必要最小限の支燃性ガスで燃焼させる必要があり、燃焼室の熱損傷への対策が必要となる。 Hydrogen has a particularly fast combustibility among flammable gases and has a wide combustion range (burns at high and low concentrations). Therefore, immediately after hydrogen flows into the combustion chamber, it burns rapidly and a local high temperature portion is formed, and the combustion chamber may be thermally damaged. Although the possibility of thermal damage increases as the amount of inflow of hydrogen increases, it is possible to prevent thermal damage by burning using a large amount of combustion-supporting gas (air) as a general method. However, in this case, a large-capacity combustion chamber is required, and the amount of combustion gas increases, resulting in an increase in the size of the apparatus. In addition, it is necessary to adjust the amount of combustion-supporting gas according to the flow rate of hydrogen. This is because when a small amount of hydrogen gas is mixed with a large amount of combustion-supporting gas and burned, it will fall below the combustible lower limit concentration (in the case of a mixture of hydrogen and air, the hydrogen concentration is 4%). This is because it will not burn.
However, since the flow rate of hydrogen varies depending on the operating state of the EUV exposure apparatus, it is difficult to adjust the amount of the combustion-supporting gas following the flow rate of hydrogen. Therefore, it is necessary to burn a large amount of hydrogen with the minimum necessary combustion-supporting gas, and it is necessary to take measures against thermal damage to the combustion chamber.

本発明者らは、ＥＵＶ露光装置から排出される大量の水素を含む処理ガス（排ガス）を燃焼させることができ、かつ燃焼室の熱損傷を防止することができる可能性がある燃焼方式として、水素を含む処理ガスと支燃性ガスとを燃焼室の内周面の接線方向に向けて吹き込むことにより、燃焼室内壁から浮いた二種混合の円筒状混合火炎を形成する断熱混焼方式を着想したものである。
そこで、本発明は、燃焼式排ガス処理装置において水素を含む処理ガスを処理する際に、処理ガスと支燃性ガスとを燃焼室の内周面の接線方向に向けて吹き込み、燃焼室内壁から浮いた二種混合の円筒状混合火炎を形成することにより、燃焼室の熱損傷を防止することができる排ガス処理装置を提供することを目的とする。 The inventors of the present invention can burn a processing gas (exhaust gas) containing a large amount of hydrogen discharged from an EUV exposure apparatus, and can prevent thermal damage of the combustion chamber, Inspired by an adiabatic mixed combustion method that forms a cylindrical mixed flame of two types of floating floating from the combustion chamber wall by injecting a treatment gas containing hydrogen and a combustion-supporting gas toward the tangential direction of the inner peripheral surface of the combustion chamber It is a thing.
Therefore, the present invention, when processing a processing gas containing hydrogen in a combustion exhaust gas processing apparatus, blows the processing gas and a combustion-supporting gas toward the tangential direction of the inner peripheral surface of the combustion chamber, from the combustion chamber wall An object of the present invention is to provide an exhaust gas treatment apparatus capable of preventing thermal damage of a combustion chamber by forming a floating two-mixed cylindrical mixed flame.

上述の目的を達成するため、本発明の排ガス処理装置の一態様は、水素を含む処理ガスを燃焼処理して無害化する排ガス処理装置であって、水素を含む処理ガスを燃焼する燃焼室は、円筒状の燃焼室として構成され、前記燃焼室は、処理ガスと支燃性ガスとをそれぞれ燃焼室の内周面の接線方向に向けて吹き込む処理ガス用ノズルと支燃性ガス用ノズルとを備え、前記処理ガス用ノズルと支燃性ガス用ノズルは、前記燃焼室の軸線に直交する同一平面上に位置していることを特徴とする。ここで、同一平面上に位置しているとは、処理ガス用ノズルと支燃性ガス用ノズルの燃焼室内周面側の開口の一部が同一平面上に位置していることをいう。 In order to achieve the above-mentioned object, one aspect of the exhaust gas treatment apparatus of the present invention is an exhaust gas treatment apparatus for detoxifying a treatment gas containing hydrogen, wherein the combustion chamber for burning the treatment gas containing hydrogen is The combustion chamber is configured as a cylindrical combustion chamber, and the combustion chamber includes a processing gas nozzle and a combustion-supporting gas nozzle for blowing the processing gas and the combustion-supporting gas toward the tangential direction of the inner peripheral surface of the combustion chamber, respectively. The processing gas nozzle and the combustion-supporting gas nozzle are located on the same plane orthogonal to the axis of the combustion chamber. Here, being located on the same plane means that a part of the opening on the peripheral side of the combustion chamber of the process gas nozzle and the combustion-supporting gas nozzle is located on the same plane.

本発明によれば、処理ガスと支燃性ガスとを燃焼室の内周面の接線方向に向けて吹き込むことで円筒状混合火炎を形成することにより、旋回遠心力により円筒状混合火炎の外側は重くて温度の低い未燃の二種混合ガス、内側は軽くて温度の高い二種混合の燃焼後ガスの分布が形成される。したがって、円筒状混合火炎は、温度の低い未燃の二種混合ガスに覆われた自己断熱された状態となるため、燃焼火炎が直接に燃焼室の内壁に触れることはなく、燃焼室の内壁が熱損傷を受けにくい。 According to the present invention, the cylindrical mixed flame is formed by blowing the processing gas and the combustion-supporting gas toward the tangential direction of the inner peripheral surface of the combustion chamber, and thereby the outer side of the cylindrical mixed flame by the swirling centrifugal force. A heavy and low temperature unburned gas mixture is formed, and a light and high temperature mixed gas mixture is formed inside. Therefore, since the cylindrical mixed flame is in a self-insulated state covered with the unburned binary gas mixture having a low temperature, the combustion flame does not directly touch the inner wall of the combustion chamber, and the inner wall of the combustion chamber Is less susceptible to thermal damage.

本発明の好ましい態様によれば、前記支燃性ガス用ノズルに冷却水供給配管を接続し、前記支燃性ガス用ノズルから支燃性ガスを冷却水とともに前記燃焼室の内周面の接線方向に向けて吹き込むようにしたことを特徴とする。
本発明によれば、支燃性ガスとともに燃焼室に吹き込まれた冷却水の水滴はガスより重いため、冷却水の水滴は円筒状混合火炎における未燃の二種混合ガスよりもさらに壁面際を周回し、燃焼の障害にはならない。そして、冷却水の水滴は周回中に燃焼室の内壁を冷却する。これにより、処理ガス中に水素が多量に含まれる場合であっても、燃焼室内に局所的な高温部が形成されることがなく、ガス処理性能を確保しつつ燃焼室の熱損傷を防止することが可能である。 According to a preferred aspect of the present invention, a cooling water supply pipe is connected to the combustion-supporting gas nozzle, and the combustion-supporting gas and the cooling water from the combustion-supporting gas nozzle are tangent to the inner peripheral surface of the combustion chamber. It is characterized by blowing in the direction.
According to the present invention, since the water droplets of the cooling water blown into the combustion chamber together with the combustion-supporting gas are heavier than the gas, the water droplets of the cooling water are further closer to the wall surface than the unburned binary mixed gas in the cylindrical mixed flame. Rotating and does not hinder combustion. And the water droplet of cooling water cools the inner wall of a combustion chamber during a circulation. Accordingly, even when a large amount of hydrogen is contained in the processing gas, a local high temperature portion is not formed in the combustion chamber, and thermal damage of the combustion chamber is prevented while ensuring gas processing performance. It is possible.

本発明の好ましい態様によれば、前記支燃性ガス用ノズル内を流れる支燃性ガスに前記冷却水供給配管から冷却水を合流させることにより冷却水を細粒化し、細粒化した冷却水を含む支燃性ガスを前記燃焼室に吹き込むようにしたことを特徴とする。
本発明の好ましい態様によれば、前記燃焼室の上部壁に、冷却水を供給して前記上部壁を冷却する冷却ジャケットを形成したことを特徴とする。
本発明の好ましい態様によれば、前記冷却ジャケットから排出された冷却水を前記冷却水供給配管に供給するようにしたことを特徴とする。 According to a preferred aspect of the present invention, the cooling water is refined by converging the cooling water from the cooling water supply pipe to the combustion-supporting gas flowing in the combustion-supporting gas nozzle. A combustion-supporting gas containing gas is blown into the combustion chamber.
According to a preferred aspect of the present invention, a cooling jacket for supplying cooling water to cool the upper wall is formed on the upper wall of the combustion chamber.
According to a preferred aspect of the present invention, the cooling water discharged from the cooling jacket is supplied to the cooling water supply pipe.

本発明の好ましい態様によれば、前記支燃性ガス用ノズルに支燃性ガスを供給する支燃性ガス供給ラインに逆止弁を設け、前記燃焼室内の処理ガスが支燃性ガス供給ラインに逆流しないようにしたことを特徴とする。
本発明の好ましい態様によれば、前記冷却水供給配管に逆止弁を設け、前記燃焼室内の処理ガスが前記冷却水供給配管に逆流しないようにしたことを特徴とする。
本発明の好ましい態様によれば、前記水素を含む処理ガスは、ＥＵＶ露光装置から排出される排ガスであることを特徴とする。 According to a preferred aspect of the present invention, a check valve is provided in the flammable gas supply line for supplying the flammable gas to the flammable gas nozzle, and the processing gas in the combustion chamber is supplied with the flammable gas supply line It is characterized by not flowing backward.
According to a preferred aspect of the present invention, a check valve is provided in the cooling water supply pipe so that the processing gas in the combustion chamber does not flow back into the cooling water supply pipe.
According to a preferred aspect of the present invention, the processing gas containing hydrogen is exhaust gas discharged from an EUV exposure apparatus.

本発明の一態様は、水素を含む処理ガスを燃焼処理して無害化する排ガス処理方法であって、水素を含む処理ガスを燃焼する燃焼室は、円筒状の燃焼室として構成され、前記燃焼室の軸線に直交する同一平面上に位置している処理ガス用ノズルと支燃性ガス用ノズルとから、処理ガスと支燃性ガスとをそれぞれ燃焼室の内周面の接線方向に向けて吹き込んで、処理ガスと支燃性ガスの二種混合の旋回流を形成することを特徴とする。
本発明の好ましい態様によれば、前記支燃性ガス用ノズルに冷却水を供給し、前記支燃性ガス用ノズルから支燃性ガスを冷却水とともに前記燃焼室の内周面の接線方向に向けて吹き込むことを特徴とする。
本発明の好ましい態様によれば、前記支燃性ガス用ノズル内を流れる支燃性ガスに冷却水を合流させることにより冷却水を細粒化し、細粒化した冷却水を含む支燃性ガスを前記燃焼室に吹き込むことを特徴とする。 One aspect of the present invention is an exhaust gas treatment method for detoxifying a treatment gas containing hydrogen, wherein the combustion chamber for burning the treatment gas containing hydrogen is configured as a cylindrical combustion chamber, and the combustion From the processing gas nozzle and the combustion-supporting gas nozzle located on the same plane orthogonal to the chamber axis, the processing gas and the combustion-supporting gas are directed toward the tangential direction of the inner peripheral surface of the combustion chamber. It blows in and forms the swirl | vortex flow of 2 types mixing of process gas and combustion support gas, It is characterized by the above-mentioned.
According to a preferred aspect of the present invention, cooling water is supplied to the combustion-supporting gas nozzle, and the combustion-supporting gas is supplied from the combustion-supporting gas nozzle together with the cooling water in a tangential direction of the inner peripheral surface of the combustion chamber. It is characterized by blowing toward.
According to a preferred aspect of the present invention, the cooling water is refined by combining cooling water with the combustion-supporting gas flowing in the combustion-supporting gas nozzle. Is injected into the combustion chamber.

本発明の好ましい態様によれば、前記燃焼室の上部壁に冷却水を供給して前記上部壁を冷却することを特徴とする。
本発明の好ましい態様によれば、前記燃焼室の上部壁を冷却した後の冷却水を前記支燃性ガス用ノズルに供給することを特徴とする。
本発明の好ましい態様によれば、前記水素を含む処理ガスは、ＥＵＶ露光装置から排出される排ガスであることを特徴とする。 According to a preferred aspect of the present invention, cooling water is supplied to the upper wall of the combustion chamber to cool the upper wall.
According to a preferred aspect of the present invention, the cooling water after cooling the upper wall of the combustion chamber is supplied to the combustion-supporting gas nozzle.
According to a preferred aspect of the present invention, the processing gas containing hydrogen is exhaust gas discharged from an EUV exposure apparatus.

本発明の好ましい態様によれば、前記燃焼室には、処理ガスおよび支燃性ガスの吹き込み位置から前記燃焼室の軸線方向に離間した位置で、水供給ノズルから水を供給し、前記燃焼室の内周面上に水膜を形成することを特徴とする。
本発明の好ましい態様によれば、前記水供給ノズルから水を水溜め部の内周面の接線方向に向けて噴出することにより、前記水溜め部に、半径方向外側から内側に向かって斜め下方に傾斜した水面を有する旋回流からなる水膜を形成することを特徴とする。 According to a preferred aspect of the present invention, the combustion chamber is supplied with water from a water supply nozzle at a position spaced in the axial direction of the combustion chamber from the blowing position of the processing gas and the combustion-supporting gas, and the combustion chamber A water film is formed on the inner peripheral surface of the film.
According to a preferred aspect of the present invention, water is ejected from the water supply nozzle toward the tangential direction of the inner peripheral surface of the water reservoir portion, so that the water reservoir portion is inclined downward from the radially outer side toward the inner side. A water film composed of a swirling flow having a water surface inclined to the surface is formed.

本発明によれば、処理ガスと支燃性ガスとを燃焼室の内周面の接線方向に向けて吹き込むことで円筒状混合火炎を形成することにより、旋回遠心力により円筒状混合火炎の外側は重くて温度の低い未燃の二種混合ガス、内側は軽くて温度の高い二種混合の燃焼後ガスの分布が形成される。したがって、円筒状混合火炎は、温度の低い未燃の二種混合ガスに覆われた自己断熱された状態となるため、燃焼火炎が直接に燃焼室の内壁に触れることはなく、燃焼室の内壁が熱損傷を受けにくい。
また、本発明によれば、支燃性ガスとともに燃焼室に吹き込まれた冷却水の水滴はガスより重いため、冷却水の水滴は円筒状混合火炎における未燃の二種混合ガスよりもさらに壁面際を周回し、燃焼の障害にはならない。そして、冷却水の水滴は周回中に燃焼室の内壁近傍を冷却する。これにより、処理ガス中に水素が多量に含まれる場合であっても、処理ガス中の水素が急速に燃焼して燃焼室内に局所的な高温部が形成されることがなく、燃焼室の熱損傷を防止することが可能である。 According to the present invention, the cylindrical mixed flame is formed by blowing the processing gas and the combustion-supporting gas toward the tangential direction of the inner peripheral surface of the combustion chamber, and thereby the outer side of the cylindrical mixed flame by the swirling centrifugal force. A heavy and low temperature unburned gas mixture is formed, and a light and high temperature mixed gas mixture is formed inside. Therefore, since the cylindrical mixed flame is in a self-insulated state covered with the unburned binary gas mixture having a low temperature, the combustion flame does not directly touch the inner wall of the combustion chamber, and the inner wall of the combustion chamber Is less susceptible to thermal damage.
Further, according to the present invention, since the water droplets of the cooling water blown into the combustion chamber together with the combustion-supporting gas are heavier than the gas, the water droplets of the cooling water are further on the wall surface than the unburned binary mixed gas in the cylindrical mixed flame. It does not hinder the combustion. The water droplets of the cooling water cool the vicinity of the inner wall of the combustion chamber during circulation. Thus, even when a large amount of hydrogen is contained in the processing gas, the hydrogen in the processing gas does not burn rapidly and a local high-temperature portion is not formed in the combustion chamber, and the heat in the combustion chamber It is possible to prevent damage.

図１は、本発明の排ガス処理装置の燃焼室の構成例を示す模式的断面図である。FIG. 1 is a schematic cross-sectional view showing a configuration example of a combustion chamber of an exhaust gas treatment apparatus of the present invention. 図２は、図１のII−II線断面図である。2 is a cross-sectional view taken along line II-II in FIG. 図３は、支燃性ガスに冷却水を注入する構成を備えた燃焼室を示す模式的断面図である。FIG. 3 is a schematic cross-sectional view showing a combustion chamber having a configuration for injecting cooling water into the combustion-supporting gas. 図４は、図３のＡ部の拡大図である。FIG. 4 is an enlarged view of a portion A in FIG. 図５は、図３のＶ−Ｖ線断面図である。5 is a cross-sectional view taken along line VV in FIG. 図６は、燃焼室の天板に冷却ジャケットを備えた実施例を示す模式的断面図である。FIG. 6 is a schematic cross-sectional view showing an embodiment in which a cooling jacket is provided on the top plate of the combustion chamber. 図７は、図１に示す排ガス処理装置の支燃性ガス供給ラインに逆止弁を設置した実施形態を示す模式的断面図である。FIG. 7 is a schematic cross-sectional view showing an embodiment in which a check valve is installed in the combustion-supporting gas supply line of the exhaust gas treatment apparatus shown in FIG. 図８は、図３に示す排ガス処理装置の支燃性ガス供給ラインおよび冷却水供給ラインにそれぞれ逆止弁を設置した実施形態を示す模式的断面図である。FIG. 8 is a schematic cross-sectional view showing an embodiment in which check valves are respectively installed in the combustion-supporting gas supply line and the cooling water supply line of the exhaust gas treatment apparatus shown in FIG. 図９は、図６に示す排ガス処理装置の支燃性ガス供給ラインおよび冷却水供給ラインにそれぞれ逆止弁を設置した実施形態を示す模式的断面図である。FIG. 9 is a schematic cross-sectional view showing an embodiment in which check valves are respectively installed in the combustion-supporting gas supply line and the cooling water supply line of the exhaust gas treatment apparatus shown in FIG.

以下、本発明に係る排ガス処理装置の実施形態について図１乃至図９を参照して説明する。図１乃至図９において、同一または相当する構成要素には、同一の符号を付して重複した説明を省略する。実施形態においては、ＥＵＶ露光装置から排出される排ガスを燃焼処理して無害化する排ガス処理装置を説明する。
図１は、本発明の排ガス処理装置の燃焼室の構成例を示す模式的断面図である。燃焼室１は、一端（図示例では上端）が閉塞され他端（図示例では下端）が開口した円筒容器状の燃焼室として構成されている。円筒容器状の燃焼室１には、閉塞端部近傍で処理ガス（排ガス）と支燃性ガス（酸素含有ガス）とが吹き込まれるようになっている。
燃焼室１の閉塞端部には、点火用兼種火供給用のパイロットバーナ２が設置されており、パイロットバーナ２には燃料と空気が供給されるようになっている。なお、図１においては、燃焼室１の下方にある洗浄部などは図示を省略している。 Hereinafter, an embodiment of an exhaust gas treatment apparatus according to the present invention will be described with reference to FIGS. 1 to 9. 1 to 9, the same or corresponding components are denoted by the same reference numerals, and redundant description is omitted. In the embodiment, an exhaust gas treatment apparatus for detoxifying the exhaust gas discharged from the EUV exposure apparatus will be described.
FIG. 1 is a schematic cross-sectional view showing a configuration example of a combustion chamber of an exhaust gas treatment apparatus of the present invention. The combustion chamber 1 is configured as a cylindrical container-like combustion chamber having one end (upper end in the illustrated example) closed and the other end (lower end in the illustrated example) opened. A processing gas (exhaust gas) and a combustion-supporting gas (oxygen-containing gas) are blown into the cylindrical container-like combustion chamber 1 in the vicinity of the closed end.
At the closed end of the combustion chamber 1, a pilot burner 2 for supplying both ignition and seed fire is installed, and fuel and air are supplied to the pilot burner 2. In FIG. 1, the illustration of the cleaning unit below the combustion chamber 1 is omitted.

図２は、図１のII−II線断面図である。図２に示すように、処理ガス（排ガス）を吹き込む処理ガス用ノズル３Ａと、支燃性ガス（酸素含有ガス）を吹き込む支燃性ガス用ノズル３Ｂとが燃焼室１の内周面の接線方向に向けて設置されている。図２に示す例においては、処理ガス用ノズル３Ａと支燃性ガス用ノズル３Ｂは各２個ずつ設置されているが、各ノズル３Ａ，３Ｂの個数は、燃焼室のサイズや設置スペース等に応じて適宜変更可能である。処理ガスを吹き込む処理ガス用ノズル３Ａと、支燃性ガスを吹き込む支燃性ガス用ノズル３Ｂは、円筒状の燃焼室１の軸線に直交する同一平面上に位置している。ここで、同一平面上に位置しているとは、処理ガス用ノズル３Ａと支燃性ガス用ノズル３Ｂの燃焼室内周面側の開口の一部が同一平面上に位置していることをいう。 2 is a cross-sectional view taken along line II-II in FIG. As shown in FIG. 2, the process gas nozzle 3 A for blowing process gas (exhaust gas) and the flame support gas nozzle 3 B for blowing combustion gas (oxygen-containing gas) are tangent to the inner peripheral surface of the combustion chamber 1. It is installed in the direction. In the example shown in FIG. 2, two each of the process gas nozzle 3A and the combustion-supporting gas nozzle 3B are installed, but the number of the nozzles 3A and 3B depends on the size of the combustion chamber, the installation space, and the like. It can be changed as appropriate. The processing gas nozzle 3 A for blowing the processing gas and the supporting gas nozzle 3 B for blowing the supporting gas are located on the same plane orthogonal to the axis of the cylindrical combustion chamber 1. Here, being positioned on the same plane means that a part of the opening on the combustion chamber peripheral surface side of the processing gas nozzle 3A and the combustion-supporting gas nozzle 3B is positioned on the same plane. .

図１に示すように、燃焼室１には、処理ガスと支燃性ガスとが吹き込まれる位置よりやや下方の位置に、燃焼室１の内壁面上に濡れ壁（水膜）を形成するための水を供給する水供給ノズル５が設置されている。水供給ノズル５は、燃焼室１の側壁から半径方向外側に拡がっている水溜め部６に設置されている。水溜め部６は、燃焼室１の側壁より半径方向外側に延びて水溜め部６の底面を形成する環状の底板６ａと、底板６ａの外周端より略垂直方向に延びて水溜め部６の側壁を形成する円筒状の側板６ｂとから構成されている。水供給ノズル５は側板６ｂに固定されている。水供給ノズル５は水溜め部６の内周面の接線方向に向けて水を噴出するように配置されている。水供給ノズル５から水を水溜め部６の内周面の接線方向に向けて噴出することにより、水溜め部６には、半径方向外側から内側に向かって斜め下方に傾斜した水面を有する旋回流からなる水膜が形成される。そして、傾斜した水面を有する旋回流（水膜）の下端かつ半径方向内端、すなわち水溜め部６の底板６ａの半径方向内端から水膜は燃焼室１の内壁に沿って流れ落ちていき、燃焼室１の内壁に濡れ壁（水膜）が形成される。 As shown in FIG. 1, in the combustion chamber 1, a wet wall (water film) is formed on the inner wall surface of the combustion chamber 1 at a position slightly below the position where the processing gas and the combustion-supporting gas are blown. A water supply nozzle 5 for supplying the water is installed. The water supply nozzle 5 is installed in a water reservoir 6 that extends radially outward from the side wall of the combustion chamber 1. The water reservoir portion 6 extends radially outward from the side wall of the combustion chamber 1 to form a bottom surface of the water reservoir portion 6, and extends substantially vertically from the outer peripheral end of the bottom plate 6 a to extend the water reservoir portion 6. It is comprised from the cylindrical side plate 6b which forms a side wall. The water supply nozzle 5 is fixed to the side plate 6b. The water supply nozzle 5 is arranged so as to eject water toward the tangential direction of the inner peripheral surface of the water reservoir 6. By swirling water from the water supply nozzle 5 toward the tangential direction of the inner peripheral surface of the water reservoir 6, the water reservoir 6 has a water surface inclined obliquely downward from the outside in the radial direction toward the inside. A water film consisting of a flow is formed. Then, the water film flows down along the inner wall of the combustion chamber 1 from the lower end and the radial inner end of the swirling flow (water film) having an inclined water surface, that is, from the radial inner end of the bottom plate 6a of the water reservoir 6, A wet wall (water film) is formed on the inner wall of the combustion chamber 1.

次に、図１および２に示すように構成された燃焼室１において、処理ガス用ノズル３Ａと支燃性ガス用ノズル３Ｂとから、処理ガスと支燃性ガスとを燃焼室１の内周面の接線方向に向けて、火炎の燃焼速度以上の流速で吹き込む。これにより、燃焼室１の内壁から浮いた二種混合の円筒状混合火炎が形成される。円筒状混合火炎は燃焼室１の軸線方向に沿って形成される。二種のガスを共に接線方向に吹き込むことで、旋回遠心力により円筒状混合火炎の外側は重くて温度の低い未燃の二種混合ガス、内側は軽くて温度の高い二種混合の燃焼後ガスの分布が形成される。したがって、円筒状混合火炎は、温度の低い未燃の二種混合ガスに覆われた自己断熱された状態となるため、燃焼火炎が直接に燃焼室１の内壁に触れることはなく、燃焼室の内壁が熱損傷を受けにくい。また、円筒状混合火炎は、この自己断熱された状態ゆえに、放熱による温度低下がなく、燃焼効率の高いガス処理が行われる。また、処理ガスは通常Ｎ_２ガス等により希釈されて排ガス処理装置へ流入するので、このＮ_２ガスを含む処理ガスを支燃性ガスと混焼することで、緩慢な燃焼となり、局所的な高温部が形成されないため、ＮＯｘの発生が抑制される。 Next, in the combustion chamber 1 configured as shown in FIGS. 1 and 2, the processing gas and the combustion-supporting gas are passed from the processing gas nozzle 3 A and the combustion-supporting gas nozzle 3 B to the inner periphery of the combustion chamber 1. Inject in the tangential direction of the surface at a flow rate higher than the flame combustion rate. As a result, a two-mixed cylindrical mixed flame floating from the inner wall of the combustion chamber 1 is formed. The cylindrical mixed flame is formed along the axial direction of the combustion chamber 1. By blowing both gases in the tangential direction, the swirl centrifugal force causes the outside of the cylindrical mixed flame to be uncombusted and mixed with a heavy and low temperature outside the cylindrical mixed flame, and after the light and high temperature mixed with a mixed gas A gas distribution is formed. Therefore, since the cylindrical mixed flame is in a self-insulated state covered with the unburned binary gas mixture having a low temperature, the combustion flame does not directly touch the inner wall of the combustion chamber 1 and the combustion chamber The inner wall is not easily damaged by heat. Further, since the cylindrical mixed flame is in a self-insulated state, there is no temperature drop due to heat dissipation, and gas treatment with high combustion efficiency is performed. In addition, since the processing gas is normally diluted with N ₂ gas and flows into the exhaust gas processing apparatus, the processing gas containing this N ₂ gas is mixed with the combustion-supporting gas, so that it becomes a slow combustion, and the local high temperature Since no part is formed, the generation of NOx is suppressed.

上述したように、本発明によれば、燃焼室１の内壁から浮いた二種混合の円筒状混合火炎による自己断熱効果により、燃焼室１の内壁は熱損傷を受けにくいようになっているが、処理ガス中に３００Ｌ／ｍｉｎ以上の水素が含まれている場合、処理ガスと支燃性ガスの二種混合の円筒状混合火炎であっても、燃焼室１内に局所的な高温部が形成され、燃焼室１が熱損傷に至る可能性がある。このような場合は、支燃性ガスに冷却水を適量注入することにより、ガス処理性能を確保しつつ燃焼室１の熱損傷を防止することが可能である。以下、この構成について説明する。 As described above, according to the present invention, the inner wall of the combustion chamber 1 is less susceptible to thermal damage due to the self-insulating effect of the two-mixed cylindrical mixed flame that floats from the inner wall of the combustion chamber 1. In the case where hydrogen of 300 L / min or more is contained in the processing gas, a local high-temperature portion is present in the combustion chamber 1 even in the case of a cylindrical mixed flame of two kinds of processing gas and supporting gas. There is a possibility that the combustion chamber 1 will be thermally damaged. In such a case, it is possible to prevent thermal damage to the combustion chamber 1 while ensuring gas processing performance by injecting an appropriate amount of cooling water into the combustion-supporting gas. Hereinafter, this configuration will be described.

図３は、支燃性ガスに冷却水を注入する構成を備えた燃焼室を示す模式的断面図である。図３に示すように、支燃性ガスに冷却水を合流させ、冷却水の水滴を含む支燃性ガスを燃焼室１に吹き込むようにしている。冷却水には、市水を用いるが、アルカリ水（水酸化ナトリウム、水酸化カリウム等の水溶液）を用いてもよい。 FIG. 3 is a schematic cross-sectional view showing a combustion chamber having a configuration for injecting cooling water into the combustion-supporting gas. As shown in FIG. 3, cooling water is joined to the combustion-supporting gas, and combustion-supporting gas containing water droplets of the cooling water is blown into the combustion chamber 1. City water is used as the cooling water, but alkaline water (an aqueous solution such as sodium hydroxide or potassium hydroxide) may be used.

図４は、図３のＡ部の拡大図である。図５は、図３のＶ−Ｖ線断面図である。図４に示すように、支燃性ガス用ノズル３Ｂには、冷却水供給配管１０が接続されており、支燃性ガスに冷却水を合流させ、冷却水の水滴を含む支燃性ガスを燃焼室１に吹き込むようにしている。支燃性ガス用ノズル３Ｂと冷却水供給配管１０とが合流する合流部での支燃性ガスの流速は数十ｍ／ｓであり、この支燃性ガスの流れに冷却水が合流する際に、冷却水は細かい水滴となり（霧吹きと同じ原理による）、水滴は燃焼室内のガスの旋回流に乗って支燃性ガスポート周辺の壁面と燃焼室の天板の下面を流れる。 FIG. 4 is an enlarged view of a portion A in FIG. 5 is a cross-sectional view taken along line VV in FIG. As shown in FIG. 4, the cooling water supply pipe 10 is connected to the combustion-supporting gas nozzle 3 B, and the cooling water is joined to the combustion-supporting gas, and the combustion-supporting gas including water droplets of the cooling water is supplied. The combustion chamber 1 is blown. The flow rate of the combustion-supporting gas at the junction where the combustion-supporting gas nozzle 3B and the cooling water supply pipe 10 merge is several tens of m / s. When the cooling water joins the flow of this combustion-supporting gas In addition, the cooling water becomes fine water droplets (by the same principle as spraying), and the water droplets ride on the swirl flow of the gas in the combustion chamber and flow on the wall surface around the combustion-supporting gas port and the lower surface of the top plate of the combustion chamber.

図３および図４に示すように、冷却水の水滴を含む支燃性ガスと、処理ガスとを燃焼室１の内周面の接線方向に向けて吹き込むと、燃焼室１の内壁から浮いた二種混合の円筒状混合火炎が形成される。円筒状混合火炎は燃焼室１の軸線方向に沿って形成される。二種のガスを共に接線方向に吹き込むことで、旋回遠心力により円筒状混合火炎の外側は重くて温度の低い未燃の二種混合ガス、内側は軽くて温度の高い燃焼後ガスの分布が形成される。したがって、円筒状混合火炎は、温度の低い未燃の二種混合ガスに覆われた自己断熱された状態となるため、燃焼火炎が直接に燃焼室１の内壁に触れることはなく、燃焼室の内壁が熱損傷を受けにくい。また、円筒状混合火炎は、この自己断熱された状態ゆえに、放熱による温度低下がなく、燃焼効率の高いガス処理が行われる。
一方、冷却水の水滴はガスよりも重いため、図５に示すように、冷却水の水滴は円筒状混合火炎における未燃の二種混合ガスよりもさらに壁面際を周回し（図５において点線の円で示す）、燃焼の障害にはならない。そして、冷却水の水滴は周回中に、燃焼室１の内壁近傍を冷却する。これにより、処理ガス中に水素が多量に含まれる場合であっても、処理ガス中の水素が急速に燃焼して燃焼室１内に局所的な高温部が形成されることがなく、燃焼室１の熱損傷を防止することが可能である。 As shown in FIG. 3 and FIG. 4, when the combustion-supporting gas including water droplets of the cooling water and the processing gas are blown toward the tangential direction of the inner peripheral surface of the combustion chamber 1, they float from the inner wall of the combustion chamber 1. A cylindrical mixed flame of two kinds is formed. The cylindrical mixed flame is formed along the axial direction of the combustion chamber 1. By blowing both gases in the tangential direction, the swirling centrifugal force causes a heavy and low temperature unburned gas mixture on the outside of the cylindrical mixed flame, and a light and high temperature post-combustion gas distribution on the inside. It is formed. Therefore, since the cylindrical mixed flame is in a self-insulated state covered with the unburned binary gas mixture having a low temperature, the combustion flame does not directly touch the inner wall of the combustion chamber 1 and the combustion chamber The inner wall is not easily damaged by heat. Further, since the cylindrical mixed flame is in a self-insulated state, there is no temperature drop due to heat dissipation, and gas treatment with high combustion efficiency is performed.
On the other hand, since the water droplets of the cooling water are heavier than the gas, as shown in FIG. 5, the water droplets of the cooling water orbit around the wall surface further than the unburned binary mixed gas in the cylindrical mixed flame (dotted line in FIG. 5). It is not an obstacle to combustion). Then, the water droplets of the cooling water cool the vicinity of the inner wall of the combustion chamber 1 during circulation. As a result, even when a large amount of hydrogen is contained in the processing gas, the hydrogen in the processing gas does not burn rapidly and a local high temperature portion is not formed in the combustion chamber 1, so that the combustion chamber It is possible to prevent thermal damage of 1.

図６は、燃焼室の天板に冷却ジャケットを備えた実施例を示す模式的断面図である。図６に示すように、燃焼室１は天板の内部に冷却ジャケット１１を備えており、冷却ジャケット１１には冷却水が供給されて天板が間接冷却されるようになっている。冷却ジャケット１１から排出された冷却水は、冷却水供給配管１０に供給されて燃焼室１内に吹き込まれる（図４参照）。すなわち、冷却水は、燃焼室天板の間接冷却に用いた後に燃焼室内に吹き込まれ、燃焼室の上部内壁近傍を冷却する。 FIG. 6 is a schematic cross-sectional view showing an embodiment in which a cooling jacket is provided on the top plate of the combustion chamber. As shown in FIG. 6, the combustion chamber 1 includes a cooling jacket 11 inside the top plate, and cooling water is supplied to the cooling jacket 11 so that the top plate is indirectly cooled. The cooling water discharged from the cooling jacket 11 is supplied to the cooling water supply pipe 10 and blown into the combustion chamber 1 (see FIG. 4). That is, the cooling water is blown into the combustion chamber after being used for indirect cooling of the combustion chamber top plate, and cools the vicinity of the upper inner wall of the combustion chamber.

本発明者らは、図６に示す排ガス処理装置を用いて、水素ガスの処理試験を行った。処理試験は、支燃性ガスのみを供給する場合（冷却水なしの場合）と支燃性ガスと冷却水とを供給する場合（冷却水ありの場合）で行い、ガス処理中の燃焼室の外壁の温度を熱電対１２により測定した。
まず試験を行うにあたって、排ガス処理装置に流入する処理ガスをＥＵＶ露光装置の排ガスと想定し、その組成と流量を以下の表１のように設定した。

表１の条件の水素最大時に対して必要最小限な支燃性ガス量（空気量）を設定し、その支燃性ガス量（空気量）を固定したままでも水素最小時に燃焼可能な濃度になるかどうかの試算を行った結果が表２である。

水素最小時でも水素濃度は燃焼可能な下限濃度である４％を上回っており、既知のデータ上では水素の量が変動しても、支燃性ガス量を固定したままで燃焼可能であることが分かった。 The present inventors conducted a hydrogen gas treatment test using the exhaust gas treatment apparatus shown in FIG. The treatment test is performed when supplying only the combustion-supporting gas (without cooling water) and when supplying the combustion-supporting gas and cooling water (with cooling water). The temperature of the outer wall was measured with a thermocouple 12.
First, in conducting the test, the processing gas flowing into the exhaust gas processing apparatus was assumed to be the exhaust gas of the EUV exposure apparatus, and the composition and flow rate were set as shown in Table 1 below.

The minimum necessary amount of combustion-supporting gas (air amount) is set for the maximum hydrogen conditions listed in Table 1, and the concentration is such that combustion is possible when hydrogen is minimum even when the amount of combustion-supporting gas (air amount) is fixed. Table 2 shows the results of the trial calculation.

Even when hydrogen is at its minimum, the hydrogen concentration exceeds the lower limit of combustible concentration of 4%. Based on the known data, even if the amount of hydrogen fluctuates, it must be combustible with the amount of supporting gas fixed. I understood.

次に実際の排ガス処理装置に表２の条件で処理ガスと支燃性ガスを供給し、安定した燃焼が可能であることと、燃焼室温度が安全な温度に保たれることを検証した。検証結果を表３に示す。

表３から分かるように、冷却水なしの場合でも円筒状混合火炎による自己断熱効果により燃焼室温度上昇はかなり抑えられるが、水素最大時（６２０Ｌ／ｍｉｎ）には円筒状混合火炎による自己断熱効果に加えて冷却水ありの場合が好ましい。 Next, processing gas and combustion-supporting gas were supplied to an actual exhaust gas treatment device under the conditions shown in Table 2, and it was verified that stable combustion was possible and that the combustion chamber temperature was kept at a safe temperature. Table 3 shows the verification results.

As can be seen from Table 3, the temperature increase of the combustion chamber can be considerably suppressed by the self-insulating effect of the cylindrical mixed flame even without cooling water, but the self-insulating effect of the cylindrical mixed flame at the maximum hydrogen (620 L / min). In addition to the above, the case with cooling water is preferable.

図７は、図１に示す排ガス処理装置の支燃性ガス供給ラインに逆止弁を設置した実施形態を示す模式的断面図である。図７に示すように、支燃性ガス用ノズル３Ｂに支燃性ガスを供給する支燃性ガス供給ラインＬ１に逆止弁ＣＶ１を設置することにより、燃焼室１内の未燃焼の処理ガスが支燃性ガス供給ラインＬ１に逆流しないようにしている。 FIG. 7 is a schematic cross-sectional view showing an embodiment in which a check valve is installed in the combustion-supporting gas supply line of the exhaust gas treatment apparatus shown in FIG. As shown in FIG. 7, an unburned processing gas in the combustion chamber 1 is provided by installing a check valve CV1 in the combustion-supporting gas supply line L1 that supplies combustion-supporting gas to the combustion-supporting gas nozzle 3B. Is prevented from flowing back to the combustion-supporting gas supply line L1.

図８は、図３に示す排ガス処理装置の支燃性ガス供給ラインおよび冷却水供給ラインにそれぞれ逆止弁を設置した実施形態を示す模式的断面図である。図８に示すように、支燃性ガス用ノズル３Ｂに支燃性ガスを供給する支燃性ガス供給ラインＬ１に逆止弁ＣＶ１を設置するとともに支燃性ガス用ノズル３Ｂに冷却水を供給する冷却水供給ラインＬ２に逆止弁ＣＶ２を設置することにより、燃焼室１内の未燃焼の処理ガスが支燃性ガス供給ラインＬ１および冷却水供給ラインＬ２に逆流しないようにしている。 FIG. 8 is a schematic cross-sectional view showing an embodiment in which check valves are respectively installed in the combustion-supporting gas supply line and the cooling water supply line of the exhaust gas treatment apparatus shown in FIG. As shown in FIG. 8, a check valve CV1 is installed in the combustion-supporting gas supply line L1 for supplying combustion-supporting gas to the combustion-supporting gas nozzle 3B, and cooling water is supplied to the combustion-supporting gas nozzle 3B. By installing a check valve CV2 in the cooling water supply line L2, the unburned processing gas in the combustion chamber 1 is prevented from flowing back into the combustion-supporting gas supply line L1 and the cooling water supply line L2.

図９は、図６に示す排ガス処理装置の支燃性ガス供給ラインおよび冷却水供給ラインにそれぞれ逆止弁を設置した実施形態を示す模式的断面図である。図９に示すように、支燃性ガス用ノズル３Ｂに支燃性ガスを供給する支燃性ガス供給ラインＬ１に逆止弁ＣＶ１を設置するとともに冷却ジャケット１１から支燃性ガス用ノズル３Ｂに冷却水を供給する冷却水供給ラインＬ２に逆止弁ＣＶ２を設置することにより、燃焼室１内の未燃焼の処理ガスが支燃性ガス供給ラインＬ１および冷却水供給ラインＬ２に逆流しないようにしている。 FIG. 9 is a schematic cross-sectional view showing an embodiment in which check valves are respectively installed in the combustion-supporting gas supply line and the cooling water supply line of the exhaust gas treatment apparatus shown in FIG. As shown in FIG. 9, a check valve CV1 is installed in the combustion-supporting gas supply line L1 for supplying combustion-supporting gas to the combustion-supporting gas nozzle 3B, and the cooling jacket 11 is connected to the combustion-supporting gas nozzle 3B. By installing a check valve CV2 in the cooling water supply line L2 for supplying cooling water, unburned processing gas in the combustion chamber 1 is prevented from flowing back into the combustion-supporting gas supply line L1 and the cooling water supply line L2. ing.

図７乃至図９に示す実施形態で使用される逆止弁ＣＶ１，ＣＶ２は、管路内の流れを一方向のみ許す目的に用いられる弁で、弁体はその上流側と下流側の圧力差による力をうけて作動し、圧力差が正流の場合とは逆になると弁体が弁座に速やかに押しつけられ逆流を防止する弁であり、平板上の弁体がスイングするスイング式逆止弁やボール状の弁体が往復動するボール式逆止弁が好ましい。 The check valves CV1 and CV2 used in the embodiment shown in FIGS. 7 to 9 are valves used for the purpose of allowing the flow in the pipe only in one direction, and the valve body is a pressure difference between the upstream side and the downstream side. Swing type check that swings the valve body on the flat plate and operates by receiving the force of the valve, and when the pressure difference is opposite to the normal flow, the valve body is quickly pressed against the valve seat to prevent backflow. A ball check valve in which a valve or a ball-shaped valve body reciprocates is preferable.

これまで本発明の実施形態について説明したが、本発明は上述の実施形態に限定されず、その技術思想の範囲内において、種々の異なる形態で実施されてよいことは勿論である。 Although the embodiment of the present invention has been described so far, the present invention is not limited to the above-described embodiment, and it is needless to say that the present invention may be implemented in various different forms within the scope of the technical idea.

１燃焼室
２パイロットバーナ
３Ａ処理ガス用ノズル
３Ｂ支燃性ガス用ノズル
５水供給ノズル
６水溜め部
６ａ底板
６ｂ側板
１０冷却水供給配管
１１冷却ジャケット
１２熱電対
Ｌ１支燃性ガス供給ライン
Ｌ２冷却水供給ライン
ＣＶ１逆止弁
ＣＶ２逆止弁 DESCRIPTION OF SYMBOLS 1 Combustion chamber 2 Pilot burner 3A Nozzle for process gas 3B Nozzle for combustion support gas 5 Water supply nozzle 6 Water reservoir 6a Bottom plate 6b Side plate 10 Cooling water supply piping 11 Cooling jacket 12 Thermocouple L1 Flame support gas supply line L2 Cooling Water supply line CV1 Check valve CV2 Check valve

Claims

An exhaust gas treatment apparatus for detoxifying a treatment gas containing hydrogen by combustion treatment,
The combustion chamber for burning the processing gas containing hydrogen is configured as a cylindrical combustion chamber,
The combustion chamber includes a processing gas nozzle and a combustion-supporting gas nozzle for blowing the processing gas and the combustion-supporting gas toward the tangential direction of the inner peripheral surface of the combustion chamber, respectively.
The exhaust gas processing apparatus, wherein the processing gas nozzle and the combustion-supporting gas nozzle are located on the same plane orthogonal to the axis of the combustion chamber.

A cooling water supply pipe is connected to the combustion-supporting gas nozzle, and the combustion-supporting gas is blown from the combustion-supporting gas nozzle together with cooling water toward the tangential direction of the inner peripheral surface of the combustion chamber. The exhaust gas treatment apparatus according to claim 1.

The cooling water is refined by combining the cooling water from the cooling water supply pipe with the combustion supporting gas flowing in the nozzle for the combustion supporting gas, and the combustion supporting gas containing the refined cooling water is burned. The exhaust gas treatment apparatus according to claim 2, wherein the exhaust gas treatment apparatus is blown into the chamber.

The exhaust gas treatment apparatus according to claim 2, wherein a cooling jacket for cooling the upper wall by supplying cooling water is formed on the upper wall of the combustion chamber.

The exhaust gas treatment apparatus according to claim 4, wherein the cooling water discharged from the cooling jacket is supplied to the cooling water supply pipe.

A check valve is provided in the combustion-supporting gas supply line for supplying combustion-supporting gas to the combustion-supporting gas nozzle so that the processing gas in the combustion chamber does not flow backward to the combustion-supporting gas supply line. The exhaust gas treatment apparatus according to claim 1.

The exhaust gas processing apparatus according to claim 2, wherein a check valve is provided in the cooling water supply pipe so that the processing gas in the combustion chamber does not flow backward to the cooling water supply pipe.

The exhaust gas processing apparatus according to any one of claims 1 to 7, wherein the processing gas containing hydrogen is exhaust gas discharged from an EUV exposure apparatus.

An exhaust gas treatment method for detoxifying a treatment gas containing hydrogen by combustion treatment,
The combustion chamber for burning the processing gas containing hydrogen is configured as a cylindrical combustion chamber,
From the processing gas nozzle and the combustion-supporting gas nozzle located on the same plane orthogonal to the axis of the combustion chamber, the processing gas and the combustion-supporting gas are respectively tangential to the inner peripheral surface of the combustion chamber. An exhaust gas treatment method characterized by forming a swirling flow of two kinds of mixture of a treatment gas and a combustion-supporting gas.

The cooling water is supplied to the combustion-supporting gas nozzle, and the combustion-supporting gas is blown together with the cooling water from the combustion-supporting gas nozzle toward the tangential direction of the inner peripheral surface of the combustion chamber. Item 10. The exhaust gas treatment method according to Item 9.

The cooling water is refined by merging the cooling water with the combustion-supporting gas flowing in the combustion-supporting gas nozzle, and the combustion-supporting gas containing the finely divided cooling water is blown into the combustion chamber. The exhaust gas treatment method according to claim 10.

The exhaust gas treatment method according to claim 10, wherein cooling water is supplied to an upper wall of the combustion chamber to cool the upper wall.

13. The exhaust gas treatment method according to claim 12, wherein cooling water after cooling the upper wall of the combustion chamber is supplied to the combustion-supporting gas nozzle.

14. The exhaust gas processing method according to claim 9, wherein the processing gas containing hydrogen is exhaust gas discharged from an EUV exposure apparatus.

The combustion chamber is supplied with water from a water supply nozzle at a position spaced in the axial direction of the combustion chamber from the blowing position of the processing gas and the combustion-supporting gas, and a water film is formed on the inner peripheral surface of the combustion chamber. The exhaust gas treatment method according to any one of claims 9 to 13, wherein the exhaust gas treatment method is formed.

By ejecting water from the water supply nozzle toward the tangential direction of the inner peripheral surface of the water reservoir, the water reservoir has a swirl flow having a water surface inclined obliquely downward from the outside in the radial direction toward the inside. The exhaust gas treatment method according to claim 15, wherein a water film is formed.