JP2019012792A - Imprint device and article manufacturing method - Google Patents

Abstract

To provide an advantageous technique for reducing troubles that can be caused by an incorrect loading of a master and/or member into an imprint device which forms a pattern on the member using the master in an incorrect state.SOLUTION: In an imprint apparatus, a pattern is formed on a member by bringing a master into contact with the imprint material on the member and curing the imprint material. The imprint apparatus includes a measuring instrument that measures a height of a measurement target region of an object provided as the master or a member and a control unit that controls transportation of the object on the basis of a result measured by the measuring instrument.SELECTED DRAWING: Figure 6

Description

  The present invention relates to an imprint apparatus and an article manufacturing method.

  The imprint apparatus forms a pattern made of a cured product of the imprint material on the member by bringing the original plate into contact with the imprint material arranged on the member and curing the imprint material. After a pattern made of a cured product of the imprint material is formed on the member, the original plate is separated from the pattern. An example of such an imprint apparatus is described in Patent Document 1. In the imprint apparatus, the original plate is brought into contact with an imprint material arranged on the member, or the original plate is separated from a pattern made of a cured product of the imprint material. Therefore, the original plate tends to deteriorate. Therefore, a master master plate called a master mold can be duplicated to produce a replica master plate for mass production called a replica mold. The replica mold can be manufactured by an imprint apparatus. Specifically, the imprint apparatus for producing the replica mold cures the imprint material in a state where the master mold is in contact with the imprint material arranged on a member called a blank mold. Thereby, a replica molding in which a pattern made of a cured product of the imprint material is formed on the blank mold is obtained.

JP 2013-162045 A

  A master mold and a blank mold can be loaded on an imprint apparatus for producing a replica mold. The master mold and the blank mold can generally have the same dimensions. Therefore, a blank mold can be loaded as a master mold or a master mold can be loaded as a blank mold due to human error. In addition, due to human error, the master mold may be loaded upside down or the blank mold may be loaded upside down. Such a human error can also occur in a normal imprint apparatus that forms a pattern on a substrate such as a semiconductor substrate using a master (for example, a replica mold).

  If an original plate such as a master mold or a replica mold, or a member (member to be processed) such as a blank mold or a substrate is loaded in an improper state in a wrong state, trouble may occur in the imprint device. For example, when an original plate such as a master mold or a replica mold is loaded on the imprint apparatus as a member to which a pattern is to be transferred, or is loaded on the imprint apparatus upside down, the original plate may be damaged. In particular, the breakage of the master mold can be a big trouble with a delay in production planning. In addition, a member on which a pattern is to be formed can be loaded into the imprint apparatus in a state where an adhesion layer (adhesive layer) is applied to a region where the pattern is to be formed (pattern formation region). Therefore, when a member on which a pattern is to be formed is loaded on the imprint apparatus as an original plate or is loaded upside down on the imprint apparatus, the adhesion layer may adhere to the chuck or the transport mechanism of the imprint apparatus. . In this case, it can be a big trouble that requires cleaning.

  The present invention provides an advantageous technique for reducing trouble that can be caused by improper loading of an original and / or a member on an imprint apparatus that uses the original to form a pattern on the member. For the purpose.

  One aspect of the present invention relates to an imprint apparatus that forms a pattern on a member by bringing an original plate into contact with the imprint material on the member and curing the imprint material. The imprint apparatus includes: A measuring device that measures the height of a measurement target region of the object provided as the original plate or the member, and a control unit that controls conveyance of the object based on a result measured by the measuring device.

  According to the present invention, there is an advantageous technique for reducing trouble that can be caused by improper loading of an original and / or a member on an imprint apparatus that uses the original to form a pattern on the member. Provided.

The figure which shows the structure of the imprint apparatus of 1st and 2nd embodiment of this invention. The figure which shows typically the original load port, the conveyance mechanism, the measuring device, the positioning mechanism, and the original chuck which are the structural elements relevant to the original conveyance path. The figure which shows typically the member load port which is a component relevant to the conveyance path | route of a member, a conveyance mechanism, a measuring device, a positioning mechanism, and a member chuck | zipper. The figure which shows the structure of an original plate (master mold) typically. The figure which shows the structure of a member (blank mold) typically. The figure which shows typically a mode that the height of the measurement object area | region of an original plate is measured with a measuring device. The figure which shows typically a mode that the height of the measurement object area | region of a member is measured with a measuring device. The figure which shows the process relevant to the conveyance of the original plate until an imprint process is made after an original plate is arrange | positioned at an original plate load port. The figure which shows the process relevant to the conveyance of a member after a member is arrange | positioned in a member load port until an imprint process is made. The figure which shows typically the structure for measuring the height of the measurement object area | region of an original and a member in the imprint apparatus of 2nd Embodiment of this invention. The figure which shows typically the structure of the inversion mechanism which reverses the upper and lower sides of an original and / or a member. The figure which illustrates an article manufacturing method.

  Hereinafter, the present invention will be described through exemplary embodiments thereof with reference to the accompanying drawings.

  FIG. 1 shows the configuration of an imprint apparatus 1 according to the first embodiment of the present invention. In this embodiment, the imprint apparatus 1 is configured as an imprint apparatus that forms a pattern on a blank mold as a member 18 using a master mold as an original plate 17. However, the imprint apparatus 1 may be configured as an imprint apparatus that forms a pattern on a substrate as the member 18 using a mold (for example, a replica mold) as the original plate 17. The imprint apparatus 1 forms a pattern made of a cured product of the imprint material on the member 18 by bringing the original plate 17 into contact with the imprint material on the member 18 and curing the imprint material.

  As the imprint material, a curable composition (which may be referred to as an uncured resin) that cures when energy for curing is applied is used. As the energy for curing, electromagnetic waves, heat, or the like can be used. The electromagnetic wave can be, for example, light having a wavelength selected from a range of 10 nm to 1 mm, for example, infrared rays, visible rays, ultraviolet rays, and the like. The curable composition may be a composition that is cured by light irradiation or by heating. Among these, the photocurable composition that is cured by light irradiation contains at least a polymerizable compound and a photopolymerization initiator, and may further contain a non-polymerizable compound or a solvent as necessary. The non-polymerizable compound is at least one selected from the group consisting of a sensitizer, a hydrogen donor, an internal release agent, a surfactant, an antioxidant, and a polymer component. The imprint material can be disposed on the substrate in the form of droplets or in the form of islands or films formed by connecting a plurality of droplets. The viscosity of the imprint material (viscosity at 25 ° C.) can be, for example, 1 mPa · s or more and 100 mPa · s or less. The blank mold as the member 18 and the master mold as the original plate 17 can be made of, for example, quartz.

  In this specification and the accompanying drawings, directions are shown in an XYZ coordinate system in which a direction parallel to the surface of the member 18 is an XY plane. In the XYZ coordinate system, the directions parallel to the X, Y, and Z axes are the X, Y, and Z directions, respectively, and rotation around the X axis, rotation around the Y axis, and rotation around the Z axis are θX and θY, respectively. , ΘZ. The control or drive related to the X axis, Y axis, and Z axis means control or drive related to the direction parallel to the X axis, the direction parallel to the Y axis, and the direction parallel to the Z axis, respectively. The control or drive related to the θX axis, θY axis, and θZ axis relates to rotation around an axis parallel to the X axis, rotation around an axis parallel to the Y axis, and rotation around an axis parallel to the Z axis. Means control or drive. The position is information that can be specified based on the coordinates of the X axis, the Y axis, and the Z axis, and the posture is information that can be specified by the values of the θX axis, the θY axis, and the θZ axis. Positioning means controlling position and / or attitude. The alignment may include control of the position and / or attitude of at least one of the member 18 and the original plate 17.

  The imprint apparatus 1 includes a master positioning mechanism 6 that positions the master 17 and a member positioning mechanism 11 that positions the member 18. The original plate positioning mechanism 6 may include an original plate chuck 7 that holds the original plate 17 and an original plate drive mechanism 8 that drives the original plate 17 by driving the original plate chuck 7. The member positioning mechanism 11 can include a member chuck 12 that holds the member 18 and a member driving mechanism 13 that drives the member 18 by driving the member chuck 12.

  The original plate positioning mechanism 6 and the member positioning mechanism 11 constitute a drive mechanism that drives at least one of the original plate 17 and the member 18 so that the relative position between the original plate 17 and the member 18 is adjusted. The adjustment of the relative position by the drive mechanism includes a drive for contacting the original plate 17 with the imprint material on the member 18 and separating the original plate 17 from a cured product of the imprint material. The original plate positioning mechanism 6 has an original plate 17 arranged on a plurality of axes (for example, three axes of Z axis, θX axis, θY axis, preferably six axes of X axis, Y axis, Z axis, θX axis, θY axis, θZ axis). ). The member positioning mechanism 11 includes a member 18 having a plurality of axes (for example, three axes of X axis, Y axis, and θZ axis, preferably six axes of X axis, Y axis, Z axis, θX axis, θY axis, and θZ axis). ).

  The imprint apparatus 1 may include a shape correction mechanism 9 that corrects the shape of the pattern area (area having a pattern) of the original 17. The shape correction mechanism 9 can correct the shape of the pattern area of the original 17 by applying a force to the side surface of the original 17. The imprint apparatus 1 may include a curing unit 2 that cures the imprint material in a state where the imprint material on the member 18 and the original plate 17 are in contact with each other. The curing unit 2 can include, for example, a light source 4 that generates light 3 as energy for curing, and an optical system 5 that adjusts the light 3 from the light source 4.

  In addition, the imprint apparatus 1 can include a dispenser 14, an alignment measuring instrument 16, a deformation mechanism 50, a base surface plate 19, a bridge surface plate 20, a column 21, and a control unit 10. The dispenser 14 disposes the imprint material 15 in the pattern formation region of the member 18 by discharging the imprint material 15 onto the member 18 in a state where the member 18 is driven by the member positioning mechanism 11. The alignment measuring device 16 measures the relative position and relative rotation between the pattern formation region of the member 18 and the pattern region of the original plate 17 by measuring the positions of the alignment marks provided on the member 18 and the original plate 17.

  The deformation mechanism 50 deforms the original plate 17 into a convex shape toward the member 18 by controlling the pressure in the pressure control space 22 formed by the cavity provided in the original plate 17 and the original chuck 7, or Control the amount of deformation. The base surface plate 19 supports the member positioning mechanism 11. The bridge surface plate 20 supports the original plate positioning mechanism 6, the curing unit 2, and the dispenser 14. The support column 21 supports the bridge surface plate 20.

  The control unit 10 includes an original plate positioning mechanism 6, a member positioning mechanism 11, a curing unit 2, a dispenser 14, an alignment measuring device 16 and a deformation mechanism 50, and conveyance mechanisms 26 and 30 described later, positioning mechanisms (pre-aligners) 27 and 31, and the like. To control. The control unit 10 is, for example, a PLD (abbreviation of Programmable Logic Device) such as FPGA (abbreviation of Field Programmable Gate Array), or an ASIC (abbreviation of Application Specific Integrated Circuit) or an ASIC (abbreviation of Generalized Integrated Circuit). It can be constituted by a computer or a combination of all or part of them.

  FIG. 2 schematically shows the original load port 25, the conveyance mechanism 26, the measuring device 39, the positioning mechanism (prealigner) 27, and the original chuck 7 which are components related to the conveyance path of the original 17. The original 17 disposed in the original load port 25 is loaded (taken in) into the housing 24 of the imprint apparatus 1 by the transport mechanism 26. The original 17 loaded in the housing 24 of the imprint apparatus 1 by the transport mechanism 26 is transported to a measurement position by the measuring instrument 39, and the height of the measurement target area of the original 17 is measured by the measuring instrument 39. Based on the result measured by the measuring instrument 39, the control unit 10 determines whether or not the original 17 is a correct original and is loaded from the original load port 25 in a correct posture. When the control unit 10 determines that the original plate 17 is a correct original plate and has been loaded from the original load port 25 in the correct posture, the original plate 17 is conveyed to the positioning mechanism 27 by the conveying mechanism 26 and is then moved by the positioning mechanism 27. Positioned. Thereafter, the original 17 is conveyed to the original chuck 7 of the original positioning mechanism 6 by the conveying mechanism 26 and is held by the original chuck 7.

  FIG. 3 schematically shows a member load port 29, a transport mechanism 30, a measuring instrument 40, a positioning mechanism (prealigner) 31 and a member chuck 12 that are components related to the transport path of the member 18. The member 18 disposed in the member load port 29 is loaded into the housing 24 of the imprint apparatus 1 by the transport mechanism 30. The member 18 loaded into the housing 24 of the imprint apparatus 1 by the transport mechanism 30 is transported to a measurement position by the measuring instrument 40, and the height of the measurement target area of the member 18 is measured by the measuring instrument 40. The control unit 10 determines whether or not the member 18 is a correct member and loaded from the member load port 29 in a correct posture based on the result measured by the measuring instrument 40. When the control unit 10 determines that the member 18 is a correct member and has been loaded from the member load port 29 in a correct posture, the member 18 is transported to the positioning mechanism 31 by the transport mechanism 30 and is then moved by the positioning mechanism 31. Positioned. Thereafter, the member 18 is transported to the member chuck 12 of the member positioning mechanism 11 by the transport mechanism 30 and is held by the member chuck 12.

  FIG. 4 illustrates the structure of the original plate 17 (master mold). FIG. 4A is a perspective view of the original plate 17, and FIG. 4B is a cross-sectional view of the original plate 17. The original plate 17 has a pattern surface 35, and a pattern 34 is formed in the pattern area of the pattern surface 35. The pattern 34 can be constituted by a recess formed in the pattern surface 35. The original plate 17 has a holding surface 36 held by the original plate chuck 7 on the opposite side of the pattern surface 35. Further, the original plate 17 has a cavity 32 on the holding surface 36 side. The cavity 32 forms a pressure control space 22 together with the original chuck 7. The measurement target region MTRA that is a region whose height is measured by the measuring instrument 39 can be a region having the cavity 32 in the original 17.

  FIG. 5 illustrates the structure of the member 18 (blank mold). FIG. 5A is a perspective view of the member 18, and FIG. 5B is a cross-sectional view of the member 18. The member 18 has a pattern forming surface 37, and the pattern of the original plate 17 is transferred to the pattern forming surface 37 by using an original plate 17 by an imprint material. Thereby, a replica mold is obtained. The member 18 has a holding surface 38 held by the member chuck 12 on the opposite side of the pattern forming surface 37. Further, the member 18 has a cavity 33 on the holding surface 38 side. The cavity 33 forms a pressure control space together with the original chuck when the member 18 is used as a replica mold, and can be used to deform the member 18. The measurement target region MTRB, which is a region whose height is measured by the measuring instrument 40, can be a region having the cavity 33 in the member 18. The member 18 can be loaded into the imprint apparatus 1 with the adhesion layer applied to the pattern forming surface 37.

  FIG. 6 schematically shows how the measuring instrument 39 measures the height of the measurement target area MTRA of the original 17. Here, the height is a position in the Z-axis direction. As shown in FIG. 1, the original plate 17 is used in a posture in which the pattern surface 35 faces downward (a direction facing the member 18). Therefore, the original 17 should be provided to the original load port 25 with the pattern surface 35 facing downward (in the direction facing the member 18) and loaded into the housing 24 of the imprint apparatus 1. However, there is a possibility that the original 17 is provided to the original load port 25 in a posture in which the pattern surface 35 faces upward due to human error or the like. Further, there is a possibility that the member 18 is provided to the original load port 25 instead of the original 17 due to human error.

  Therefore, the measuring instrument 39 measures the height of the measurement target area MTRA (or an area corresponding to the measurement target area MTRA in an unknown object) of the original 17. Then, based on the measurement result, the control unit 10 determines whether or not the original 17 is a correct original and is loaded from the original load port 25 in a correct posture.

  FIG. 6A schematically shows a state of measurement by the measuring instrument 39 when the original 17 is a correct original and is loaded from the original load port 25 in a correct posture. In this example, the measuring instrument 39 measures the distance D1 between the reference position of the measuring instrument 39 and the measurement target area MTRA (the surface closest to the measuring instrument 39) of the original 17 as the height of the measurement target area MTRA. For example, the measuring instrument 39 obliquely enters the measurement light into the measurement target area MTRA, and measures the height of the measurement target area MTRA based on the position where the measurement light reflected by the measurement target area MTRA enters the measurement instrument 39. sell. Although the measurement light can be reflected on the surface on the cavity 32 side of the two surfaces of the measurement target region MTRA, the measuring device 39 can be configured to be able to ignore such measurement light. When the measurement result by the measuring instrument 39 (height of the measurement target region MTRA) satisfies the acceptance criteria (when it is within the acceptance range), the control unit 10 is the original master 17 and is in the correct posture. It can be determined that the original is loaded from the original load port 25.

  FIG. 6B schematically shows a state of measurement by the measuring instrument 39 when the original plate 17 is a correct original plate but is loaded from the original load port 25 in an incorrect posture (upside down). . In such a case, the measuring instrument 39 is adjusted to output a measurement result that does not satisfy the acceptance criteria. Measurement errors are also considered as a kind of measurement result. In the example shown in FIG. 6B, the measurement light from the measuring instrument 39 is reflected by the surface on the cavity 32 side out of the two surfaces of the measurement target region MTRA, and the reflected measurement light returns to the measuring instrument 39. Measurement error occurs. The control unit 10 can determine that the original 17 has been loaded in an incorrect state when the measurement result by the measuring instrument 39 (height of the measurement target region MTRA) does not satisfy the acceptance criteria.

  The control part 10 performs an error process, when the measurement result by the measuring device 39 does not satisfy the acceptance criteria. The error processing may include, for example, processing for stopping handling the loaded original plate 17 as a correct original plate. Alternatively, the error processing can include processing for inverting the posture of the loaded original plate 17 as described later.

  FIG. 7 schematically shows how the measuring instrument 40 measures the height of the measurement target region MTRB of the member 18. Here, the height is a position in the Z-axis direction. As shown in FIG. 1, the member 18 is used in a posture in which the pattern forming surface 37 faces upward (in the direction facing the original plate 17). Therefore, the member 18 should be provided to the member load port 29 with the pattern forming surface 37 facing upward (direction facing the original plate 17) and loaded into the housing 24 of the imprint apparatus 1. However, due to human error or the like, the member 18 may be provided to the member load port 29 in a posture in which the pattern forming surface 37 faces downward. Further, the original plate 17 may be provided to the member load port 29 instead of the member 18 due to human error or the like.

  Therefore, the measuring instrument 40 measures the height of the measurement target region MTRB of the member 18 (or a region corresponding to the measurement target region MTRB in an unknown object). Based on the measurement result, the control unit 10 determines whether the member 18 is a correct member and is loaded from the member load port 29 in a correct posture.

  FIG. 7A schematically shows a state of measurement by the measuring instrument 40 when the member 18 is a correct member and loaded from the member load port 29 in a correct posture. In this example, the measuring instrument 40 measures the distance D2 between the reference position of the measuring instrument 40 and the measurement target region MTRB (surface closest to the measuring instrument 40) of the member 18 as the height of the measurement target region MTRB. For example, the measuring instrument 40 obliquely enters the measurement light into the measurement target area MTRB, and measures the height of the measurement target area MTRB based on the position where the measurement light reflected by the measurement target area MTRB enters the measurement instrument 40. sell. Although the measurement light can be reflected on the surface on the cavity 33 side of the two surfaces of the measurement target region MTRB, the measuring instrument 40 can be configured to be able to ignore such measurement light. When the measurement result by the measuring instrument 40 (height of the measurement target region MTRB) satisfies the acceptance criteria (when it is within the acceptance range), the control unit 10 is the correct member and has the correct posture. It can be determined that the member is loaded from the member load port 29.

  FIG. 7B schematically shows a state of measurement by the measuring instrument 40 when the member 18 is a correct member but is loaded from the member load port 29 in an incorrect posture (upside down). . In such a case, the measuring instrument 40 is adjusted to output a measurement result that does not satisfy the acceptance criteria. Measurement errors are also considered as a kind of measurement result. In the example shown in FIG. 7B, the measurement light from the measuring instrument 40 is reflected by the surface on the cavity 33 side out of the two surfaces of the measurement target region MTRB, and the reflected measurement light returns to the measuring instrument 40. Measurement error occurs. The control unit 10 can determine that the member 18 is loaded in an incorrect state when the measurement result (the height of the measurement target region MTRB) by the measuring instrument 40 does not satisfy the acceptance criteria.

  The control part 10 performs an error process, when the measurement result by the measuring device 40 does not satisfy the acceptance criteria. Error handling may include, for example, processing to stop handling the loaded member 18 as a correct member. Alternatively, the error processing can include processing for reversing the posture of the loaded member 18 as described later.

  FIG. 8 shows processing related to conveyance of the original plate 17 from when the original plate 17 is placed in the original plate load port 25 until imprint processing is performed. This process is controlled by the control unit 10. In S901, the original 17 stored in the carrier is placed in the original load port 25 by the operator. In S902, the carrier is opened by the original load port 25, and the original 17 is held (held) by the hand of the transport mechanism 26. In S <b> 903, the original 17 is transported to the measuring instrument 39 by the transport mechanism 26. Here, the transport mechanism 26 transports and positions the original 17 to a position where the height of the measurement target area MTRA of the original 17 can be measured by the measuring instrument 39.

  In step S904, the measuring device 39 measures the height of the measurement target area MTRA of the original 17 while the original 17 is held by the hand of the transport mechanism 26. In S905, it is determined whether or not the measurement result by the measuring instrument 39 satisfies the acceptance criteria. If satisfied, the process proceeds to S906, and if not satisfied, the process proceeds to S910. In S906, the original 17 is transferred to the positioning mechanism 27 by the transfer mechanism 26, and in S907, the original 17 is positioned by the positioning mechanism 27. In S908, the original 17 is transferred to the original chuck 7 of the original positioning mechanism 6. Is done. In S909, imprint processing is performed. In the imprint process, an imprint material is disposed on the member 18, the original plate 17 is brought into contact with the imprint material, and the imprint material is cured to form a pattern made of a cured product of the imprint material, This is a process of separating the original plate 17 from the pattern. In S910, error processing is performed. The error processing may include, for example, processing for stopping handling the loaded original plate 17 as a correct original plate. More specifically, the error process can include a process of stopping the conveyance of the original 17 or a process of returning the original 17 to the carrier.

  FIG. 9 shows processing related to the conveyance of the member 18 from when the member 18 is placed in the member load port 29 until imprint processing is performed. This process is controlled by the control unit 10. In S1001, the member 18 accommodated in the carrier is placed in the member load port 29 by the operator. In S1002, the carrier is opened by the member load port 29, and the member 18 is gripped (held) by the hand of the transport mechanism 30. In S <b> 1003, the member 18 is transported to the measuring instrument 40 by the transport mechanism 30. Here, the transport mechanism 30 transports and positions the member 18 to a position where the measuring instrument 40 can measure the height of the measurement target region MTRB of the member 18.

  In S1004, the height of the measurement target region MTRB of the member 18 is measured by the measuring instrument 40 while the member 18 is held by the hand of the transport mechanism 30. In S1005, it is determined whether or not the measurement result by the measuring instrument 40 satisfies the acceptance criteria. If satisfied, the process proceeds to S1006, and if not satisfied, the process proceeds to S1010. In S1006, the member 18 is transported to the positioning mechanism 31 by the transport mechanism 30, and in S1007, the member 18 is positioned by the positioning mechanism 31, and in S1008, the member 18 is transported to the member chuck 12 of the member positioning mechanism 11. Is done. In S1009, imprint processing is performed. In S1010, error processing is performed. Error handling may include, for example, processing to stop handling the loaded member 18 as a correct member. More specifically, the error process may include a process of stopping the conveyance of the member 18 or a process of returning the member 18 to the carrier.

  As described above, in the present embodiment, the height of the measurement target region of the object provided as the original plate 17 or the member 18 is measured by the measuring instruments 39 and 40, and based on the results measured by the measuring instruments 39 and 40. The conveyance of the object is controlled by the control unit 10. Thereby, troubles that may be caused by loading the original 17 and / or the member 18 in an incorrect state on the imprint apparatus 1 that forms a pattern using the original 17 on the member 18 can be reduced.

  The imprint apparatus 1 according to the second embodiment of the present invention will be described below. Matters not mentioned in the second embodiment can follow the first embodiment. FIG. 10 schematically shows a configuration for measuring the height of the measurement target area of the original and the member in the imprint apparatus 1 of the second embodiment. The imprint apparatus 1 according to the second embodiment has the configuration shown in FIG. 1, and as shown in FIG. 10, the height of the measurement target region of the object provided as the original plate 17 or the member 18 is set. A measuring instrument 42 for measuring is provided. The measuring instrument 42 measures the height of the measurement target region MTRA of the first object provided as the original plate 17 and the height of the measurement target flow region MTRB of the second object provided as the member 18. The measuring instrument 42 is, for example, a common sensor for measuring the height of the measurement target region MTRA of the first object provided as the original plate 17 and the height of the measurement target region MTRB of the second object provided as the member 18. 43 may be included.

  The measurement position by the measuring instrument 42 is set so that the transport mechanism 26 can place the measurement target area MTRA of the original 17 at the measurement position, and the transport mechanism 30 can place the measurement target area MTRB of the member 18 at the measurement position. Is done. The control unit 10 determines whether the object measured by the measuring instrument 42 is an object scheduled to be the original plate 17 or an object scheduled to be the member 18 by setting a parameter value. Can be managed.

  For example, the sensor 43 may be configured to measure the height of the upper surface in the measurement target region of the measurement target object (the original plate 17 or the member 18). In this case, when the original 17 has been conveyed to the measurement position in a correct posture, the height of the surface of the original 17 on the cavity 32 side is measured by the sensor 43. Therefore, the normal height range of the surface of the original plate 17 on the cavity 32 side is set as the acceptance criterion. Further, when the member 18 has been conveyed to the measurement position in a correct posture, the height of the pattern forming surface 37 of the member 18 is measured by the sensor 43. Therefore, the normal height range of the pattern forming surface 37 of the member 18 is set as the acceptance criterion.

  On the contrary, the sensor 43 can be configured to measure the height of the lower surface in the measurement target region of the measurement target object (the original plate 17 or the member 18). In this case, when the original 17 has been conveyed to the measurement position in a correct posture, the height of the pattern surface 35 of the original 17 is measured by the sensor 43. Therefore, the normal height range of the pattern surface 35 of the original plate 17 is set as the acceptance criterion. Further, when the member 18 has been conveyed to the measurement position in a correct posture, the height of the surface of the member 18 on the cavity 33 side is measured by the sensor 43. Therefore, the normal height range of the surface of the member 18 on the cavity 33 side is set as the acceptance criterion.

  Therefore, the control unit 10 determines whether or not the measurement target object satisfies the acceptance criterion based on the parameter value and the measurement result of the height of the measurement target region (including the measurement error) by the sensor 43. be able to.

  Hereinafter, as an error process that can be provided in the first embodiment and the second embodiment, an example in which a process of inverting the original plate 17 and / or the member 18 provided upside down is performed will be described. FIG. 11 illustrates a reversing mechanism 44 that reverses the original plate 17 and / or the member 18 up and down. FIG. 11 shows an example in which the upside down original plate 17 is turned upside down as an example. The reversing mechanism 44 may include gripping mechanisms 46-a and 46-b that grip an article as the original plate 17 or the member 18, and a rotation mechanism 45 that rotates the gripping mechanisms 46-a and 46-b by 180 degrees. . The reversing mechanism 44 may further include holding mechanisms 47-a and 47-b that temporarily hold the reversed article. FIG. 11A shows a state in which the original plate 17 to be reversed is gripped by the gripping mechanisms 46-a and 46-b. FIG. 11B shows a state in which the original plate 17 is reversed by the rotation mechanism 45. FIG. 11C shows a state where the inverted original plate 17 is temporarily held by the holding mechanisms 47-a and 47-b. The inverted original plate 17 is transferred to the positioning mechanism 27 by the transfer mechanism 26 and transferred to the original plate chuck 7 after positioning.

  Similarly, the upside down member 18 can also be turned upside down by the reversing mechanism 44, transported to the positioning mechanism 31 by the transport mechanism 30, and transported to the member chuck 12 after positioning.

  The pattern of the cured product formed using the imprint apparatus is used permanently on at least a part of various articles or temporarily used when manufacturing various articles. Articles include electric circuit elements, optical elements, MEMS, recording elements, sensors, molds, and the like. Examples of the electric circuit elements include volatile or nonvolatile semiconductor memories such as DRAM, SRAM, flash memory, and MRAM, and semiconductor elements such as LSI, CCD, image sensor, and FPGA. Examples of the mold include an imprint mold.

  The pattern of the cured product is used as it is as a constituent member of at least a part of the article or temporarily used as a resist mask. After etching or ion implantation or the like is performed in the substrate processing step, the resist mask is removed.

  So far, the method of forming a pattern on the blank mold as the member 18 using the master mold as the original plate 17 by the imprint apparatus 1 has been described. However, as described above, the imprint apparatus 1 may be configured as an imprint apparatus that forms a pattern on a substrate as the member 18 using a mold (for example, a replica mold) as the original plate 17. An article manufacturing method will be described which includes a step of forming a pattern on a substrate as a member 18 using a mold (for example, a replica mold) as an original plate 17 and manufacturing an article from the substrate after the step.

  As shown in FIG. 12A, a substrate 1z such as a silicon wafer on which a workpiece 2z such as an insulator is formed is prepared. Subsequently, the substrate 1z is formed on the surface of the workpiece 2z by an inkjet method or the like. A printing material 3z is applied. Here, a state is shown in which the imprint material 3z in the form of a plurality of droplets is applied on the substrate.

  As shown in FIG. 12B, the imprint mold (original plate) 4z is opposed to the imprint material 3z on the substrate with the side on which the concave / convex pattern is formed facing. As shown in FIG. 12C, the substrate 1 provided with the imprint material 3z is brought into contact with the mold 4z, and pressure is applied. The imprint material 3z is filled in a gap between the mold 4z and the workpiece 2z. In this state, when light is irradiated as energy for curing through the mold 4z, the imprint material 3z is cured.

  As shown in FIG. 12D, when the imprint material 3z is cured and then the mold 4z and the substrate 1z are separated, a pattern of a cured product of the imprint material 3z is formed on the substrate 1z. This cured product pattern has a shape in which the concave portion of the mold corresponds to the convex portion of the cured product, and the concave portion of the mold corresponds to the convex portion of the cured product, that is, the concave / convex pattern of the die 4z is transferred to the imprint material 3z. It will be done.

  As shown in FIG. 12 (e), when etching is performed using the pattern of the cured product as an anti-etching mask, a portion of the surface of the workpiece 2z where there is no cured product or remains thin is removed, and the grooves 5z and Become. As shown in FIG. 12 (f), when the pattern of the cured product is removed, an article in which the groove 5z is formed on the surface of the workpiece 2z can be obtained. Although the cured product pattern is removed here, it may be used as, for example, a film for interlayer insulation contained in a semiconductor element or the like, that is, a constituent member of an article without being removed after processing.

1: imprint apparatus, 6: original plate positioning mechanism, 7: original plate chuck, 8: original plate drive mechanism, 17: original plate, 10: control unit, 11: member positioning mechanism, 12: member chuck, 13: member drive mechanism, 17 : Original plate, 12: member, 25: original plate load port, 29: member load port, 26, 30: transport mechanism, 39, 40, 43: measuring instrument

Claims (12)

An imprint apparatus for forming a pattern on the member by bringing the original plate into contact with the imprint material on the member and curing the imprint material,
A measuring instrument for measuring the height of the measurement target region of the object provided as the original plate or the member;
A control unit that controls conveyance of the object based on a result measured by the measuring instrument;
An imprint apparatus comprising: The measuring instrument measures the height of the measurement target region of the first object provided as the original plate and the height of the measurement target region of the second object provided as the member,
The control unit controls conveyance of the first object based on a measurement result of the first object by the measuring device, and conveys the second object based on a measurement result of the second object by the measuring device. Control,
The imprint apparatus according to claim 1. The control unit executes error processing when a measurement result of the first object by the measuring instrument does not satisfy a first acceptance criterion.
The imprint apparatus according to claim 2. The error process includes a process of stopping handling the first object as the original plate,
The imprint apparatus according to claim 3. The error processing includes processing for inverting the posture of the first object.
The imprint apparatus according to claim 3. The control unit performs error processing when a measurement result of the second object by the measuring instrument does not satisfy a second acceptance criterion.
The imprint apparatus according to claim 2, wherein the apparatus is an imprint apparatus. The error process includes a process of stopping handling the second object as the member.
The imprint apparatus according to claim 6. The error processing includes processing for inverting the posture of the second object.
The imprint apparatus according to claim 6. The measuring instrument includes a common sensor for measuring the height of the first measurement target region of the first object and the height of the second measurement target region of the second object.
The imprint apparatus according to claim 2, wherein: A transport mechanism for positioning the first object at a measurement position by the sensor and a transport mechanism for positioning the second object at the measurement position;
The imprint apparatus according to claim 9. A transport mechanism for positioning the object so that the measuring instrument can measure the height of the measurement target region of the object;
The imprint apparatus according to claim 1, wherein the apparatus is an imprint apparatus. Forming a pattern on a member using the imprint apparatus according to any one of claims 1 to 11, and
A step of processing the member on which the pattern is formed in the step;
An article manufacturing method comprising manufacturing an article from a member subjected to the treatment.

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