JP2019000978A - Grinding tool and manufacturing method of the same - Google Patents

Grinding tool and manufacturing method of the same Download PDF

Info

Publication number
JP2019000978A
JP2019000978A JP2018111017A JP2018111017A JP2019000978A JP 2019000978 A JP2019000978 A JP 2019000978A JP 2018111017 A JP2018111017 A JP 2018111017A JP 2018111017 A JP2018111017 A JP 2018111017A JP 2019000978 A JP2019000978 A JP 2019000978A
Authority
JP
Japan
Prior art keywords
substrate
opening
hole section
grinding tool
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2018111017A
Other languages
Japanese (ja)
Inventor
周瑞麟
Jui-Lin Chou
廖懿造
I-Tsao Liao
楊宗諭
Tsung-Yu Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kinik Co
Original Assignee
Kinik Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kinik Co filed Critical Kinik Co
Publication of JP2019000978A publication Critical patent/JP2019000978A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D18/00Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
    • B24D18/0072Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using adhesives for bonding abrasive particles or grinding elements to a support, e.g. by gluing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/06Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic metallic or mixture of metals with ceramic materials, e.g. hard metals, "cermets", cements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/04Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic
    • B24D3/14Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially inorganic ceramic, i.e. vitrified bondings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D7/00Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor
    • B24D7/06Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting otherwise than only by their periphery, e.g. by the front face; Bushings or mountings therefor with inserted abrasive blocks, e.g. segmental
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D2203/00Tool surfaces formed with a pattern

Abstract

To provide a grinding tool which enables polishing small pieces to be securely attached thereto and can be manufactured in a highly cost-effective method.SOLUTION: A polishing tool 2 includes a substrate 21 and multiple polishing small pieces 22. The substrate 21 has a first surface 211 and a second surface and multiple holes. Each hole extends through the substrate 21 and has a first opening located on a first surface 211 and a second opening located on a second surface. The second opening is larger than the first opening. The polishing small pieces 22 are respectively disposed in the holes and attached to the substrate through multiple adhesion parts. Each of the polishing small pieces 22 has: a tip protruding outward from the first surface 211; and the other portion covered by one of the adhesion parts in the corresponding hole. The first opening of the hole is smaller than the polishing small piece 22, and the polishing small pieces 22 are respectively held in the holes. Further, an embodiment described in the specification includes a manufacturing method of the polishing tool 2.SELECTED DRAWING: Figure 3

Description

本発明は、研削工具および研削工具の製造方法に関する。   The present invention relates to a grinding tool and a method for manufacturing a grinding tool.

研削および/または研磨技術は、一般に、金属、セラミックもしくはガラス部分、または半導体ウエハなどの剛性部分の望ましい表面粗さや平面を作るために用いられる。そのために、研削および/または研磨技術では、剛性表面を磨耗させることが可能な研磨部材を有する工具を使用する。   Grinding and / or polishing techniques are generally used to create the desired surface roughness or plane of a rigid portion such as a metal, ceramic or glass portion, or semiconductor wafer. To that end, grinding and / or polishing techniques use a tool having an abrasive member capable of wearing a rigid surface.

よく知られた研磨技術が、半導体製造過程で用いられる化学機械研磨(CMP)技術である。CMPは、研磨パッドと一緒に腐食性の化学スラリを使用して望ましくない残留物を取り除き、セラミック、シリコン、ガラス、サファイアまたは金属で作製され得るウエハの表面を平坦にするものである。
研磨パッドを一定期間にわたって使用した後は、研磨パッドの研削作用が低減する可能性がある。したがって、通常は追加の研削工具(「コンディショナ」とも呼ばれる)を使用して、研磨パッドの最適な研削効果を維持するために研磨パッドの表面を粗くすることがある。
A well-known polishing technique is a chemical mechanical polishing (CMP) technique used in semiconductor manufacturing processes. CMP uses a corrosive chemical slurry with a polishing pad to remove unwanted residues and to planarize the surface of a wafer that can be made of ceramic, silicon, glass, sapphire, or metal.
After using the polishing pad for a certain period of time, the grinding action of the polishing pad may be reduced. Thus, additional grinding tools (also referred to as “conditioners”) are typically used to roughen the surface of the polishing pad in order to maintain the optimum grinding effect of the polishing pad.

従来、研削工具の切削率は、研削工具に備わっている研磨部材の分布密度を上げることによって改善されることがある。これには研削工具の研磨部材を増量する必要があり、それによって研削工具の製造により多くの費用がかかる。   Conventionally, the cutting rate of a grinding tool may be improved by increasing the distribution density of an abrasive member provided in the grinding tool. This requires an increase in the amount of abrasive material in the grinding tool, which makes it more expensive to manufacture the grinding tool.

図1は、コンディショナ1を製造する従来技術を示す概略図である。金型14内に配置した研磨部材11の高さを位置決めして制御するために網板13を使用できる。次に、金型14の内部にある研磨部材11の上全体に接着剤または樹脂12を塗布できる。接着剤または樹脂12内に空気ボイドが形成されるのを低減するために圧力および真空を適用できる。
一旦接着剤または樹脂12が硬化すれば、その接着剤または樹脂を金型14から取り除いて、硬化した接着剤または樹脂12に接着している研磨部材11からなる図2に示したコンディショナ1が得られる。実際には、前述のコンディショナ1は、いくつかの欠点を有する可能性がある。例えば、硬化した接着剤または樹脂12は、腐食性の化学スラリと接触して変質を被るおそれがあり、それによって研磨部材11がはずれてしまうおそれがある。
FIG. 1 is a schematic diagram showing a conventional technique for manufacturing a conditioner 1. The mesh plate 13 can be used to position and control the height of the polishing member 11 disposed in the mold 14. Next, an adhesive or resin 12 can be applied over the entire polishing member 11 inside the mold 14. Pressure and vacuum can be applied to reduce the formation of air voids in the adhesive or resin 12.
Once the adhesive or resin 12 is cured, the conditioner 1 shown in FIG. 2 comprising the polishing member 11 bonded to the cured adhesive or resin 12 is removed from the mold 14. can get. In practice, the aforementioned conditioner 1 can have several drawbacks. For example, the cured adhesive or resin 12 may be altered by contact with a corrosive chemical slurry, which may cause the abrasive member 11 to come off.

したがって、費用対効果の高い方法で製造でき、研磨部材を確実に取り付けられ、少なくとも前述の課題に対処できる改善した研削工具に対する需要がある。   Accordingly, there is a need for an improved grinding tool that can be manufactured in a cost-effective manner, can be securely attached to an abrasive member, and can at least address the aforementioned problems.

本明細書は、研磨小片を確実に取り付けられ、費用対効果の高い方法で製造できる研削工具を説明している。研削工具は、基板および複数の研磨小片を備えている。基板は、第1の面および第2の面ならびに複数の孔を有し、各々の孔は基板を通って延在し、それぞれが第1の開口を第1の面に、第2の開口を第2の面に有し、第2の開口は第1の開口よりも大きい。研磨小片は、それぞれが孔内に配置され、複数の接着部を介して基板に取り付けられ、各々の研磨小片は、第1の面から外向きに突出する先端と、対応する孔の内部で接着部のうちの1つで覆われた残りの部分とを有し、孔の第1の開口は、研磨小片よりも小さく、研磨小片はそれぞれが孔内に保持される。   This specification describes a grinding tool to which abrasive pieces can be securely attached and manufactured in a cost-effective manner. The grinding tool includes a substrate and a plurality of polishing pieces. The substrate has a first surface and a second surface and a plurality of holes, each hole extending through the substrate, each having a first opening on the first surface and a second opening. The second opening is larger than the first opening. Each of the polishing pieces is disposed in the hole and is attached to the substrate via a plurality of bonding portions. Each polishing piece is bonded to the tip protruding outward from the first surface and inside the corresponding hole. The first opening of the hole is smaller than the abrasive piece, each of which is held in the hole.

本明細書は、研削工具の製造方法をさらに説明している。本方法は、第1の面および第2の面ならびに複数の孔を有する基板であって、各々の孔は、基板を通って延在し、それぞれが第1の開口を第1の面に、第2の開口を第2の面に有し、第2の開口は第1の開口よりも大きい、基板を提供することと、複数の研磨小片それぞれを第2の開口を通して孔に配置し、研磨小片は全体的に第1の開口よりも大きく、第1の開口から外向きに部分的に突出していることと、複数の位置決め凹部を有する固定支持体上に基板を配置し、第1の開口から突出する研磨小片は、それぞれが位置決め凹部に部分的に受け入れられることと、複数の接着部それぞれを第2の開口を通して孔の中に適用し、それによって接着部はそれぞれ孔の内部にある研磨小片を被覆し、研磨小片を基板にしっかりと取り付けることとを含む。   The present description further describes a method of manufacturing a grinding tool. The method includes a substrate having a first surface and a second surface and a plurality of holes, each hole extending through the substrate, each having a first opening in the first surface, Providing a substrate having a second opening in the second surface, wherein the second opening is larger than the first opening, and each polishing piece is disposed in the hole through the second opening and polished. The small piece is generally larger than the first opening, partially protrudes outward from the first opening, and the substrate is disposed on a fixed support having a plurality of positioning recesses, and the first opening The abrasive pieces projecting from each of the abrasive pieces are partially received in the positioning recesses, and each of the plurality of adhesive portions is applied through the second opening into the hole, whereby the adhesive portions are each in the interior of the hole. Cover the small piece and attach the abrasive piece firmly to the substrate Including the.

コンディショナを製造する従来技術を示す概略図である。It is the schematic which shows the prior art which manufactures a conditioner. 従来のコンディショナを示す概略断面図である。It is a schematic sectional drawing which shows the conventional conditioner. 研削工具の一実施形態を示す概略上面図である。It is a schematic top view which shows one Embodiment of a grinding tool. 研削工具の一実施形態を示す断面である。It is a section showing one embodiment of a grinding tool. 研削工具の変形例の構造を示す断面図である。It is sectional drawing which shows the structure of the modification of a grinding tool. 研削工具の別の変形例の構造を示す断面図である。It is sectional drawing which shows the structure of another modification of a grinding tool. 研削工具を製造する方法工程のフローチャートである。It is a flowchart of the method process of manufacturing a grinding tool. 研削工具の製造の一中間段階の概略図である。It is the schematic of the intermediate stage of manufacture of a grinding tool. 研削工具の製造の一中間段階の概略図である。It is the schematic of the intermediate stage of manufacture of a grinding tool. 研削工具の製造の一中間段階の概略図である。It is the schematic of the intermediate stage of manufacture of a grinding tool. 研削工具の製造の一中間段階の概略図である。It is the schematic of the intermediate stage of manufacture of a grinding tool.

図3は、研削工具2の一実施形態を示す概略上面図であり、図4は、研削工具2を示す断面図である。
図3および図4を参照する。研削工具2は、基板21、および基板21にしっかりと取り付けられた複数の研磨小片22を備えていてよい。基板21は、単一の剛性体であってよい。基板21は、頑強で化学的に安定した材料でできていてよく、これには、ステンレス鋼、セラミックなどの金属材料を例示的に挙げ得る。一実施形態によれば、基板21は、研削工具2が酸性またはアルカリ性のスラリと接触した状態で使用されたときに研削工具が化学変質にあまりさらされないように、ステンレス鋼でできている。
基板21のサイズに課された特定の制限はない。一実施形態によれば、基板21は、直径が約4インチで厚みが約2mm〜約3mmである略円形の円板であってよい。基板21は、2つの相対する面211および212を有していてよく、面211は研削工具2の作業面であり、面212は研削工具2の非作業面である。研磨小片22は、基板21の面211全体にわたって分布でき、この面から外向きに突出できる。
FIG. 3 is a schematic top view showing an embodiment of the grinding tool 2, and FIG. 4 is a cross-sectional view showing the grinding tool 2.
Please refer to FIG. 3 and FIG. The grinding tool 2 may include a substrate 21 and a plurality of polishing pieces 22 firmly attached to the substrate 21. The substrate 21 may be a single rigid body. The substrate 21 may be made of a robust and chemically stable material, which may illustratively include metallic materials such as stainless steel, ceramic, and the like. According to one embodiment, the substrate 21 is made of stainless steel so that when the grinding tool 2 is used in contact with an acidic or alkaline slurry, the grinding tool is not very exposed to chemical alteration.
There is no specific limit imposed on the size of the substrate 21. According to one embodiment, the substrate 21 may be a substantially circular disc having a diameter of about 4 inches and a thickness of about 2 mm to about 3 mm. The substrate 21 may have two opposing surfaces 211 and 212, the surface 211 being the working surface of the grinding tool 2 and the surface 212 being the non-working surface of the grinding tool 2. The polishing pieces 22 can be distributed over the entire surface 211 of the substrate 21 and can protrude outwardly from this surface.

研磨小片22は、硬度の高い任意の適切な材料で作製され得る。研磨小片22に適切な材料の例として、ダイヤモンド、立方晶窒化ホウ素、酸化アルミニウム、および炭化ケイ素などを挙げ得るがこれに限定されない。研磨小片22の形状は限定されず、例示的に正六八面体(hexoctahedron)の結晶形態であってもよい。さらに、研磨小片22は、研削工具2に要求される機能に応じて任意の適切なサイズであってよい。一実施形態によれば、研磨小片22のサイズは、例示的に約20〜約30USメッシュであってよく、すなわち研磨小片22を濾過するのに使用されるメッシュスクリーンには、1平方インチあたり約20〜約30の開口があってよく、研磨小片22の平均最大幅は約800μm〜約1000μmである。一実施形態によれば、基板21には約60〜約300個の研磨小片22が備わっていてよい。   The abrasive strip 22 can be made of any suitable material with high hardness. Examples of suitable materials for the abrasive pieces 22 may include, but are not limited to, diamond, cubic boron nitride, aluminum oxide, and silicon carbide. The shape of the polishing piece 22 is not limited, and may be, for example, a regular hexahedron crystal form. Further, the polishing piece 22 may be any suitable size depending on the function required of the grinding tool 2. According to one embodiment, the size of the abrasive pieces 22 may illustratively be from about 20 to about 30 US mesh, ie, the mesh screen used to filter the abrasive pieces 22 will have about There may be 20 to about 30 openings and the average maximum width of the abrasive strips 22 is about 800 μm to about 1000 μm. According to one embodiment, the substrate 21 may be provided with about 60 to about 300 polishing pieces 22.

図4を参照する。基板21は、複数の孔213を含んでいてよい。研磨小片22は、それぞれが孔213に配置されてよく、それぞれが複数の接着部216を介して基板21に取り付けられてよい。そのようにして取り付けられた各研磨小片22は、基板21の面211から突出する先端221と、基板21の孔213の内部にある接着部216で全体が覆われた残り部分とを有し得る。換言すれば、研磨小片22は、基板21の面211から外向きに突出しているが、基板21の面212からは突出していない。   Please refer to FIG. The substrate 21 may include a plurality of holes 213. Each of the polishing pieces 22 may be disposed in the hole 213, and each of the polishing pieces 22 may be attached to the substrate 21 via a plurality of bonding portions 216. Each of the polishing pieces 22 attached in such a manner may have a tip 221 protruding from the surface 211 of the substrate 21 and a remaining portion entirely covered with an adhesive portion 216 inside the hole 213 of the substrate 21. . In other words, the polishing piece 22 protrudes outward from the surface 211 of the substrate 21, but does not protrude from the surface 212 of the substrate 21.

各孔213は、基板21を通って延在でき、それぞれが2つの相対する面212および211に2つの開口212Aおよび211Aを形成できる。構造の一例によれば、開口212Aおよび211Aは、円形であってよく、開口212Aは開口211Aよりも大きくてよい。さらに、研磨小片22は、全体的に開口211Aよりも大きい。例えば、各開口211Aの直径は、全体的に各研磨小片22よりも小さくてよく、例えば研磨小片22の平均サイズまたは平均最大幅よりも小さくてよい。一実施形態によれば、開口212Aの直径は、1mm〜2mm、例えば1mmであってよく、開口211Aの直径は、0.4mm〜0.75mm、例えば750mであってよい。一実施形態によれば、開口211Aと開口212Aとのサイズの比率(例えば直径の比率)は、約0.2〜約0.75の間、例えば0.4〜0.375であってよい。このようにサイズが異なる構成にすると、小さい方の開口211Aは研磨小片22が通るのを阻止できるため、研磨小片22を孔213に保持できる。その結果、研磨小片22は、使用中に研削工具2から落下するのを防止され得る。研磨小片22が孔213に位置決めされれば、研磨小片22は、基板21の面211にある開口211Aから外向きに部分的に突出できる。   Each hole 213 can extend through the substrate 21 and can each form two openings 212A and 211A in two opposing faces 212 and 211. According to an example structure, the openings 212A and 211A may be circular, and the opening 212A may be larger than the opening 211A. Further, the polishing piece 22 is generally larger than the opening 211A. For example, the diameter of each opening 211 </ b> A may be generally smaller than each polishing piece 22, for example, smaller than the average size or average maximum width of the polishing pieces 22. According to one embodiment, the diameter of the opening 212A may be 1 mm to 2 mm, such as 1 mm, and the diameter of the opening 211A may be 0.4 mm to 0.75 mm, such as 750 m. According to one embodiment, the size ratio (eg, diameter ratio) between the opening 211A and the opening 212A may be between about 0.2 and about 0.75, such as 0.4 to 0.375. When the sizes are different from each other in this way, the smaller opening 211 </ b> A can prevent the polishing piece 22 from passing through, so that the polishing piece 22 can be held in the hole 213. As a result, the abrasive pieces 22 can be prevented from falling from the grinding tool 2 during use. If the polishing piece 22 is positioned in the hole 213, the polishing piece 22 can partially protrude outward from the opening 211 </ b> A in the surface 211 of the substrate 21.

一実施形態によれば、各孔213は、サイズおよび形状が異なる互いにつながっている2つの孔区画215および214を含んでよい。孔区画215は、例示的に円筒形であってよく、もう一方の孔区画214は、例示的に台形円錐のような形状であってよい。孔区画215は、開口212Aを通って面212に開口でき、面212に対して実質的に垂直な内側壁を有していてよい。孔区画214は、開口211Aを通って面211に開口でき、面211に向かって狭くなる先細り形状であってよい。例えば、孔区画214の内側壁と面211との間の材料角度は、約70〜約89度であってよい。
孔区画215の直径は、先細りした孔区画214のどこの直径よりも全体的に大きいため、孔区画215から孔区画214に向かって流れて接着部216を形成する接着材料が孔213を完全に充填でき、それによって接着部216の内部の空気ボイドが発生するのを低減できる。孔213の内部に受け入れられた研磨小片22の部分は、接着部216と接触しており、これによって実質的に研磨小片22を基板21に取り付けることが可能である。接着部216に適切な材料の例として、エポキシ樹脂、フェノール樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、ポリカーボネート樹脂、およびこれらの任意の組み合わせなどを挙げ得る。
According to one embodiment, each hole 213 may include two hole sections 215 and 214 that are connected to each other in different sizes and shapes. The hole section 215 may be illustratively cylindrical and the other hole section 214 may be illustratively shaped like a trapezoidal cone. The hole section 215 may open to the surface 212 through the opening 212A and may have an inner wall that is substantially perpendicular to the surface 212. The hole section 214 may open to the surface 211 through the opening 211 </ b> A and may have a tapered shape that narrows toward the surface 211. For example, the material angle between the inner wall of the hole compartment 214 and the surface 211 may be about 70 to about 89 degrees.
Since the diameter of the hole section 215 is generally larger than any diameter of the tapered hole section 214, the adhesive material that flows from the hole section 215 toward the hole section 214 to form the bonding portion 216 completely passes the hole 213. Filling can be performed, thereby reducing the generation of air voids inside the bonding portion 216. The portion of the polishing piece 22 received inside the hole 213 is in contact with the adhesive portion 216, so that the polishing piece 22 can be substantially attached to the substrate 21. Examples of a material suitable for the bonding portion 216 may include an epoxy resin, a phenol resin, a polyester resin, a polyamide resin, a polyimide resin, a polycarbonate resin, and any combination thereof.

図5は、研削工具3の一変形例の構造を示す断面図である。
図5を参照する。研削工具3は、基板21、基板21に取り付けられた研磨小片22、およびベース基板31を備えていてよい。ベース基板31は、研削工具3の剛性をさらに強化するために備えられてよい。基板21は、前述した同じ構造であってもよく、研磨小片22は、同様の方法で基板21に取り付けられてもよい。さらに詳細には、前述した同じ孔213が基板21に設けられて基板21の2つの相対する面211および212を通って延在してもよい。
研磨小片22は、それぞれが孔213に配置されてよく、それぞれが接着部216を介して基板21に取り付けられてよい。そのようにして取り付けられた各研磨小片22は、基板21の面211から突出する先端221と、基板21の孔213の内部にある接着部216で全体が覆われた残り部分とを有し得る。ベース基板31は、このベース基板の主要面に設けられた凹部311を有していてよく、基板21は、凹部311に配置され、外向きに突出している研磨小片22を含むベース基板31に取り付けられてよい。一実施形態によれば、ベース基板31の主要面に複数の凹部311が設けられてもよく、研磨小片22を含む複数の基板21は、それぞれが凹部311に配置されてよい。
FIG. 5 is a cross-sectional view showing the structure of a modified example of the grinding tool 3.
Please refer to FIG. The grinding tool 3 may include a substrate 21, a polishing piece 22 attached to the substrate 21, and a base substrate 31. The base substrate 31 may be provided to further enhance the rigidity of the grinding tool 3. The substrate 21 may have the same structure as described above, and the polishing piece 22 may be attached to the substrate 21 in a similar manner. More specifically, the same hole 213 described above may be provided in the substrate 21 and extend through two opposing surfaces 211 and 212 of the substrate 21.
Each of the polishing pieces 22 may be disposed in the hole 213, and each of the polishing pieces 22 may be attached to the substrate 21 via the bonding portion 216. Each of the polishing pieces 22 attached in such a manner may have a tip 221 protruding from the surface 211 of the substrate 21 and a remaining portion entirely covered with an adhesive portion 216 inside the hole 213 of the substrate 21. . The base substrate 31 may have a recess 311 provided on the main surface of the base substrate, and the substrate 21 is attached to the base substrate 31 including the polishing piece 22 disposed in the recess 311 and protruding outward. May be. According to one embodiment, a plurality of recesses 311 may be provided on the main surface of the base substrate 31, and each of the plurality of substrates 21 including the polishing pieces 22 may be disposed in the recesses 311.

図6は、研削工具4の別の変形例の構造を示す断面図である。
図6を参照する。研削工具4は、基板41、および複数の研磨小片22を備えていてよく、研磨小片はそれぞれが基板41に取り付けられる。
FIG. 6 is a cross-sectional view showing the structure of another modification of the grinding tool 4.
Please refer to FIG. The grinding tool 4 may include a substrate 41 and a plurality of polishing pieces 22, each of which is attached to the substrate 41.

基板41は、全体が単一の剛性体として形成されてよい。特に、基板41は、頑強で化学的に安定した材料でできていてよく、これには、ステンレス鋼、セラミックなどを例示的に挙げ得る。一実施形態によれば、基板41は、研削工具4が酸性またはアルカリ性のスラリと接触した状態で使用されたときに研削工具が化学変質にあまりさらされないように、ステンレス鋼でできている。
基板41のサイズに課された特定の制限はない。一実施形態によれば、基板41は、直径が約4インチの略円形の円板であってよい。さらに、基板41は、研削工具4の剛性が増すように、前述した基板21の厚みよりも大きい厚みを有していてもよい。例えば、基板41の厚みは、5mm〜6.35mmであってよい。
The substrate 41 may be formed as a single rigid body as a whole. In particular, the substrate 41 may be made of a robust and chemically stable material, which may illustratively include stainless steel, ceramic, and the like. According to one embodiment, the substrate 41 is made of stainless steel so that when the grinding tool 4 is used in contact with an acidic or alkaline slurry, the grinding tool is not very exposed to chemical alteration.
There is no specific limit imposed on the size of the substrate 41. According to one embodiment, the substrate 41 may be a substantially circular disc having a diameter of about 4 inches. Further, the substrate 41 may have a thickness larger than the thickness of the substrate 21 described above so that the rigidity of the grinding tool 4 is increased. For example, the thickness of the substrate 41 may be 5 mm to 6.35 mm.

基板41は、基板41の2つの相対する面411および412を通って延在する複数の孔413を含んでいてよい。研磨小片22は、それぞれが孔413に配置されてよく、それぞれが接着部416を介して基板41に取り付けられてよい。そのようにして取り付けられた各研磨小片22は、基板41の面411から突出する先端421と、基板41の孔413の内部にある接着部416で全体が覆われた残り部分とを有し得る。換言すれば、研磨小片22は、基板41の面411から外向きに部分的に突出しているが、基板41の面412からは突出していない。   The substrate 41 may include a plurality of holes 413 that extend through two opposing surfaces 411 and 412 of the substrate 41. Each of the polishing pieces 22 may be disposed in the hole 413, and each of the polishing pieces 22 may be attached to the substrate 41 via the bonding portion 416. Each polishing piece 22 attached in such a manner may have a tip 421 protruding from the surface 411 of the substrate 41 and a remaining portion entirely covered with an adhesive portion 416 inside the hole 413 of the substrate 41. . In other words, the polishing piece 22 partially protrudes outward from the surface 411 of the substrate 41, but does not protrude from the surface 412 of the substrate 41.

図6を参照する。基板41を通って延在している各孔413は、それぞれが2つの相対する面412および411に2つの開口412Aおよび411Aを有していてよい。構造の一例によれば、開口412Aおよび411Aは、円形であってよく、開口412Aは開口411Aよりも大きくてよい。さらに、研磨小片22は、全体的に開口411Aよりも大きい。例えば、各開口411Aの直径は、全体的に各研磨小片22よりも小さくてよく、例えば研磨小片22の平均サイズまたは平均最大幅よりも小さくてよい。一実施形態によれば、開口412Aの直径は、1mm〜2mm、例えば2mmであってよく、開口411Aの直径は、0.4mm〜0.75mm、例えば750μmであってよい。
このようにサイズが異なる構成にすると、小さい方の開口411Aは研磨小片22が通るのを阻止できるため、研磨小片22を孔413に保持できる。その結果、研磨小片22は、使用中に研削工具4から落下するのを防止され得る。研磨小片22が孔413に位置決めされれば、研磨小片22は、基板41の面411にある開口411Aから外向きに部分的に突出できる。
Please refer to FIG. Each hole 413 extending through the substrate 41 may have two openings 412A and 411A on two opposite faces 412 and 411, respectively. According to an example structure, the openings 412A and 411A may be circular, and the opening 412A may be larger than the opening 411A. Further, the polishing piece 22 is generally larger than the opening 411A. For example, the diameter of each opening 411A may be generally smaller than each polishing piece 22, and may be smaller than the average size or average maximum width of the polishing piece 22, for example. According to one embodiment, the diameter of the opening 412A may be 1 mm to 2 mm, such as 2 mm, and the diameter of the opening 411A may be 0.4 mm to 0.75 mm, such as 750 μm.
When the sizes are different from each other in this way, the smaller opening 411 </ b> A can prevent the polishing piece 22 from passing through, so that the polishing piece 22 can be held in the hole 413. As a result, the abrasive pieces 22 can be prevented from falling from the grinding tool 4 during use. If the polishing piece 22 is positioned in the hole 413, the polishing piece 22 can partially protrude outward from the opening 411 </ b> A in the surface 411 of the substrate 41.

図6に示した実施形態では、各孔413は、互いにつながっている3つの孔区画415、417および414を含んでいてよく、孔区画417は、2つの孔区画415と414との間に位置し、両区画とつながっている。孔区画415は、開口412Aを通って面412に開口でき、孔区画414は、開口411Aを通って面411に開口できる。孔区画415は、例示的に、内側壁が面412に対して実質的に垂直な円筒形であってよい。孔区画417は、円筒形で、直径がその軸に沿って全体的に一様であってよく、この直径は例示的に約1mmであってよい。
孔区画414は、例示的に、面411に向かって狭くなる先細り形状であってよい(例えば台形円錐)。例えば、孔区画414の内側壁と面411との間の材料角度は、約70〜約89度であってよい。孔区画415の直径は、孔区画417の直径よりも全体的に大きく、孔区画417は孔区画414よりも全体的に大きいため、孔区画415から孔区画417を通って孔区画414に向かって流れる接着材料は、孔413を完全に充填でき、それによって接着部416の内部の空気ボイドが発生するのを低減できる。
孔413の内部に受け入れられた研磨小片22の部分は、接着部416と接触しており、これによって実質的に研磨小片22を基板41に取り付けることが可能である。
In the embodiment shown in FIG. 6, each hole 413 may include three hole sections 415, 417 and 414 that are connected to each other, the hole section 417 being located between the two hole sections 415 and 414. And connected to both compartments. The hole section 415 can open to the surface 412 through the opening 412A, and the hole section 414 can open to the surface 411 through the opening 411A. The hole section 415 may illustratively be cylindrical with the inner wall being substantially perpendicular to the surface 412. The hole section 417 may be cylindrical and the diameter may be generally uniform along its axis, which may illustratively be about 1 mm.
The hole section 414 may illustratively have a tapered shape that narrows toward the surface 411 (eg, a trapezoidal cone). For example, the material angle between the inner wall of the hole section 414 and the surface 411 can be about 70 to about 89 degrees. Since the diameter of the hole section 415 is generally larger than the diameter of the hole section 417 and the hole section 417 is generally larger than the hole section 414, the hole section 415 passes through the hole section 417 toward the hole section 414. The flowing adhesive material can completely fill the holes 413, thereby reducing the occurrence of air voids inside the adhesive 416.
The portion of the polishing piece 22 received inside the hole 413 is in contact with the adhesive portion 416, so that the polishing piece 22 can be substantially attached to the substrate 41.

図7は、前述した研削工具2、3または4を製造する例示的な方法工程のフローチャートである。図8〜図11は、図7に示した方法工程に従って研削工具を製造する様々な中間段階を示す概略図である。
図7および図8を参照する。孔213を含む基板21は、研削工具2または3を製造する最初の工程S110で提供されてよい。各孔213は、それぞれが2つの開口212Aおよび211Aを介して基板21の2つの相対する面212および211に開口し、開口212Aは開口211Aよりも大きい。
FIG. 7 is a flowchart of exemplary method steps for manufacturing the grinding tool 2, 3 or 4 described above. 8 to 11 are schematic diagrams showing various intermediate stages of manufacturing a grinding tool according to the method steps shown in FIG.
Please refer to FIG. 7 and FIG. The substrate 21 including the holes 213 may be provided in the first step S110 of manufacturing the grinding tool 2 or 3. Each hole 213 opens into two opposing surfaces 212 and 211 of the substrate 21 via two openings 212A and 211A, respectively, and the opening 212A is larger than the opening 211A.

一実施形態によれば、孔213ならびに開口212Aおよび211Aは、機械加工具を用いて基板21に穿孔することで形成されてもよい。例えば、工程S110は、基板21の面212を通って大きい方の孔区画215および開口212Aを穿孔し、その後、基板21の面211を通って小さい方の孔区画214および開口211Aを穿孔することを含んでよい。孔213を含む基板21を製造するために他の技術を用いてもよいことは理解されるであろう。例えば、別の実施形態では、粉末冶金によって孔213を含む基板21を直接形成してもよく、粉末冶金は金属粉末をプレス、焼結して孔213を含む基板21を形成することを含み得る。   According to one embodiment, the holes 213 and the openings 212A and 211A may be formed by drilling the substrate 21 using a machining tool. For example, step S110 drills the larger hole section 215 and opening 212A through the surface 212 of the substrate 21, and then drills the smaller hole section 214 and opening 211A through the surface 211 of the substrate 21. May be included. It will be appreciated that other techniques may be used to manufacture the substrate 21 that includes the holes 213. For example, in another embodiment, the substrate 21 including the holes 213 may be formed directly by powder metallurgy, which may include pressing and sintering metal powder to form the substrate 21 including the holes 213. .

図7および図9を参照する。工程S120で研磨小片22は、それぞれが開口212Aを通して挿入され、基板21の孔213の中に配置されてよい。開口211Aは研磨小片22よりも小さいため、研磨小片22は、それぞれが孔213の孔区画214に保持され得る。   Please refer to FIG. 7 and FIG. In step S120, each of the polishing pieces 22 may be inserted through the opening 212A and disposed in the hole 213 of the substrate 21. Since the opening 211 </ b> A is smaller than the polishing piece 22, each of the polishing pieces 22 can be held in the hole section 214 of the hole 213.

図7および図10を参照する。次の工程S130では、研磨小片22を含む基板21は、固定支持体5上に配置されて、基板21の面211が固定支持体5と接触した状態になることが可能である。固定支持体5は、深さが正確に制御された複数の位置決め凹部51を含んでいてよく、基板21は、固定支持体5上に配置されて、研磨小片22(特に研磨小片の先端221)が開口211Aから突出してそれぞれが位置決め凹部51に少なくとも部分的に受け入れられ、位置決め凹部51の底と接触できる。その結果、孔213内での研磨小片22の位置は、研磨小片22の先端221が基板21の面211から所望の高さに突出できるように調整され得る。特に、それによって研磨小片22の先端221どうしは、同じ高さになり、基板21の面211から突出して実質的に等しい高さになることが可能で、研磨小片22の残りの部分は孔213の内部に位置する。例えば、位置決め凹部51の深さは、約0.01mm〜約0.3mmであってよく、研磨小片22の先端221は、基板21の面211から高さ約100μmの所に外側に突出できる。研磨小片22の高さが設定できる研削工具は、対象物の面を均一に研磨するためのコンディショナとして有利に使用され得る。   Please refer to FIG. 7 and FIG. In the next step S <b> 130, the substrate 21 including the polishing piece 22 can be placed on the fixed support 5 and the surface 211 of the substrate 21 can be in contact with the fixed support 5. The fixed support 5 may include a plurality of positioning recesses 51 whose depths are accurately controlled, and the substrate 21 is disposed on the fixed support 5 and has a polishing piece 22 (particularly, a tip 221 of the polishing piece). Protrudes from the opening 211A and is received at least partially in the positioning recess 51 and can contact the bottom of the positioning recess 51. As a result, the position of the polishing piece 22 in the hole 213 can be adjusted so that the tip 221 of the polishing piece 22 can protrude from the surface 211 of the substrate 21 to a desired height. In particular, the tips 221 of the polishing pieces 22 can thereby be of the same height and protrude from the surface 211 of the substrate 21 to have substantially the same height, and the remaining portions of the polishing pieces 22 are formed in the holes 213. Located inside. For example, the depth of the positioning recess 51 may be about 0.01 mm to about 0.3 mm, and the tip 221 of the polishing piece 22 can protrude outward from the surface 211 of the substrate 21 to a height of about 100 μm. A grinding tool in which the height of the polishing piece 22 can be set can be advantageously used as a conditioner for uniformly polishing the surface of the object.

図7および図11を参照する。基板21は固定支持体5上の位置に維持されている間に、工程S140で接着部216はそれぞれ、研磨小片22を基板21にしっかりと取り付ける接着ディスペンサ6を用いて開口212Aを通って孔213の中に適用され得る。開口212Aを通して挿入される接着材の量は、接着部216が孔213を完全に充填して孔213の内部にある研磨小片22の部分を被覆できるように制御され得る。接着部216に適切な材料の例として、エポキシ、フェノール樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、ポリカーボネート樹脂、およびこれらの任意の組み合わせを挙げ得る。   Please refer to FIG. 7 and FIG. While the substrate 21 is maintained at a position on the fixed support 5, in step S <b> 140, each of the adhesive portions 216 passes through the opening 212 </ b> A using the adhesive dispenser 6 that securely attaches the polishing piece 22 to the substrate 21. Can be applied inside. The amount of adhesive inserted through the opening 212A can be controlled so that the adhesive 216 can completely fill the hole 213 and cover the portion of the abrasive strip 22 inside the hole 213. Examples of suitable materials for the bonding portion 216 may include epoxy, phenolic resin, polyester resin, polyamide resin, polyimide resin, polycarbonate resin, and any combination thereof.

本明細書に記載した工程S110、S120、S130およびS140は、孔413を設けた基板41に基づいて研削工具4を製造するためにも同様に適用され得ることが理解されるであろう。この場合、孔413を含む基板41は、最初の工程S110で提供されてよい。例えば、工程S110は、基板41に孔区画415を穿孔し、その後、孔区画415とつながっている孔区画417を穿孔し、最終的に孔区画415および417と連通する孔区画414を穿孔することを含んでよい。
このようにして形成された孔区画415および414は、それぞれが基板41の2つの相対する面412および411に開口412Aおよび411Aを有し得る。続いて、工程S120で研磨小片22は、それぞれが開口412Aに挿入されて基板41の孔413に配置されてよい。次に工程S130を実施して研磨小片22を孔413に適切に位置決めできる。最終的に、工程S140で接着部416を、それぞれ開口412Aを通して孔413の中に適用して研磨小片22を基板41にしっかりと取り付けることが可能である。
It will be appreciated that the steps S110, S120, S130 and S140 described herein can be similarly applied to manufacture the grinding tool 4 based on the substrate 41 provided with the holes 413. In this case, the substrate 41 including the holes 413 may be provided in the first step S110. For example, step S110 drills the hole section 415 in the substrate 41, then drills the hole section 417 connected to the hole section 415, and finally drills the hole section 414 communicating with the hole sections 415 and 417. May be included.
The hole sections 415 and 414 formed in this way can each have openings 412A and 411A in two opposite faces 412 and 411 of the substrate 41. Subsequently, in step S <b> 120, the polishing pieces 22 may be inserted into the openings 412 </ b> A and disposed in the holes 413 of the substrate 41. Next, Step S <b> 130 is performed to properly position the polishing piece 22 in the hole 413. Finally, in step S140, the bonding portions 416 can be applied to the holes 413 through the openings 412A, respectively, to firmly attach the polishing pieces 22 to the substrate 41.

一実施形態によれば、方法工程は、中に研磨小片22が固定されている基板21をベース基板31に取り付けて図5に示した研削工具3を形成することをさらに含んでいてもよい。ベース基板31は凹部311を含んでいてもよく、基板21は、凹部311内に位置決めされ取り付けられてよい。   According to one embodiment, the method steps may further include attaching a substrate 21 having a polishing piece 22 secured therein to a base substrate 31 to form the grinding tool 3 shown in FIG. The base substrate 31 may include a recess 311, and the substrate 21 may be positioned and attached within the recess 311.

本明細書に記載した構造および方法の利点は、費用対効果の高い方法で研削工具を製造する能力を含む点である。研削工具は、実質的に空気ボイドのない接着部を含む基板に固定される研磨小片を備えることが可能で、それによって研磨小片の確実な取り付けを実現できる。   An advantage of the structures and methods described herein includes the ability to manufacture grinding tools in a cost effective manner. The grinding tool can comprise an abrasive strip that is secured to a substrate that includes a substantially air void-free bond, thereby providing a secure attachment of the abrasive strip.

研削工具の製作およびその製造過程を、特定の実施形態の文脈で説明してきた。これらの実施形態は、例示的なものであって限定的なものではないことを意味している。多くの変形、修正、追加、および改善が可能である。これらおよびその他の変形、修正、追加、および改善は、以下の請求項に規定した本発明の範囲内に収まり得る。   The manufacture of the grinding tool and its manufacturing process have been described in the context of a particular embodiment. These embodiments are meant to be illustrative and not limiting. Many variations, modifications, additions and improvements are possible. These and other variations, modifications, additions and improvements may fall within the scope of the invention as defined in the following claims.

Claims (20)

研削工具であって、
第1の面および第2の面ならびに複数の孔を有する基板であって、各々の前記孔は、前記基板を通って延在し、それぞれが第1の開口を第1の面に、第2の開口を第2の面に有し、前記第2の開口は前記第1の開口よりも大きい、基板と、
複数の研磨小片であって、それぞれが前記孔内に配置され、複数の接着部を介して前記基板に取り付けられ、各々の前記研磨小片は、前記第1の面から外向きに突出する先端と、対応する前記孔の内部で前記接着部のうちの1つで覆われた残りの部分とを有する、複数の研磨小片と、を含む研削工具において、
前記孔の前記第1の開口は、前記研磨小片よりも小さく、前記研磨小片はそれぞれが前記孔内に保持されることを特徴とする、
研削工具。
A grinding tool,
A substrate having a first surface and a second surface and a plurality of holes, each of the holes extending through the substrate, each having a first opening on the first surface and a second surface A second surface, wherein the second opening is larger than the first opening, and
A plurality of polishing pieces, each disposed in the hole and attached to the substrate via a plurality of adhesive portions, each polishing piece having a tip protruding outward from the first surface; A plurality of abrasive pieces having a remaining portion covered with one of the adhesive portions within the corresponding hole, and a grinding tool comprising:
The first opening of the hole is smaller than the polishing piece, and each of the polishing pieces is held in the hole,
Grinding tool.
各々の前記孔は、互いにつながっている少なくとも第1の孔区画および第2の孔区画を含み、前記第1の孔区画は、前記第1の開口を通って前記第1の面に開口し、前記第2の孔区画は、前記第2の開口を通って前記第2の面に開口することを特徴とする、請求項1に記載の研削工具。   Each of the holes includes at least a first hole section and a second hole section connected to each other, the first hole section opening to the first surface through the first opening; The grinding tool according to claim 1, wherein the second hole section opens to the second surface through the second opening. 各々の前記孔は、前記第1の孔区画と第2の孔区画との間に第3の孔区画をさらに含み、前記第3の孔区画は、それぞれが前記第1の孔区画および第2の孔区画とつながっていることを特徴とする、請求項2に記載の研削工具。   Each of the holes further includes a third hole section between the first hole section and the second hole section, wherein each of the third hole sections includes the first hole section and the second hole section. The grinding tool according to claim 2, wherein the grinding tool is connected to the hole section. 前記第1の孔区画は、前記第1の面に向かって狭くなる先細り形状であることを特徴とする、請求項2に記載の研削工具。   The grinding tool according to claim 2, wherein the first hole section has a tapered shape that narrows toward the first surface. 前記第1の孔区画の内側壁と前記第1の面との間の材料角度は、約70〜約89度であることを特徴とする、請求項4に記載の研削工具。   The grinding tool according to claim 4, wherein the material angle between the inner wall of the first hole section and the first surface is about 70 to about 89 degrees. 前記第2の孔区画は、前記第2の面に対して実質的に垂直な内側壁を有することを特徴とする、請求項2に記載の研削工具。   The grinding tool according to claim 2, wherein the second hole section has an inner wall substantially perpendicular to the second surface. 前記第1の開口の直径は0.4mm〜0.75mmであり、前記第2の開口の直径は1mm〜2mmであることを特徴とする、請求項1に記載の研削工具。   The grinding tool according to claim 1, wherein the diameter of the first opening is 0.4 mm to 0.75 mm, and the diameter of the second opening is 1 mm to 2 mm. 前記基板は、単一の剛性体であることを特徴とする、請求項1に記載の研削工具。   The grinding tool according to claim 1, wherein the substrate is a single rigid body. 前記基板は、金属材料またはセラミックで作製されることを特徴とする、請求項1に記載の研削工具。   The grinding tool according to claim 1, wherein the substrate is made of a metal material or ceramic. 前記研磨小片は、ダイヤモンド、立方晶窒化ホウ素、酸化アルミニウムまたは炭化ケイ素で作製されることを特徴とする、請求項1に記載の研削工具。   The grinding tool according to claim 1, wherein the polishing piece is made of diamond, cubic boron nitride, aluminum oxide or silicon carbide. 前記研磨小片は、正六八面体(hexoctahedron)の結晶形態であり、前記研磨小片の平均最大幅は約800μm〜約1000μmであることを特徴とする、請求項1に記載の研削工具。   The grinding tool according to claim 1, wherein the polishing pieces are in the form of a hexahedron crystal, and the average maximum width of the polishing pieces is about 800m to about 1000m. 凹部を含む面を有するベース基板をさらに備え、前記基板は、前記凹部内に配置され、前記ベース基板に取り付けられることを特徴とする、請求項1に記載の研削工具。   The grinding tool according to claim 1, further comprising a base substrate having a surface including a recess, wherein the substrate is disposed in the recess and attached to the base substrate. 前記接着部は、エポキシ、フェノール樹脂、ポリエステル樹脂、ポリアミド樹脂、ポリイミド樹脂、ポリカーボネート樹脂、およびこれらの任意の組み合わせなどであることを特徴とする、請求項1に記載の研削工具。   2. The grinding tool according to claim 1, wherein the adhesive portion is an epoxy, a phenol resin, a polyester resin, a polyamide resin, a polyimide resin, a polycarbonate resin, or any combination thereof. 研削工具の製造方法であって、
第1の面および第2の面ならびに複数の孔を有する基板であって、各々の前記孔は、前記基板を通って延在し、それぞれが第1の開口を第1の面に、第2の開口を第2の面に有し、前記第2の開口は前記第1の開口よりも大きい、基板を提供することと、
複数の研磨小片それぞれを前記第2の開口を通して前記孔に配置し、前記研磨小片は全体的に前記第1の開口よりも大きく、前記第1の開口から外向きに部分的に突出していることと、
複数の位置決め凹部を有する固定支持体上に前記基板を配置し、前記第1の開口から突出する前記研磨小片は、それぞれが前記位置決め凹部に部分的に受け入れられることと、
複数の接着部それぞれを前記第2の開口を通して前記孔の中に適用し、それによって前記接着部はそれぞれ前記孔の内部にある前記研磨小片を被覆し、前記研磨小片を前記基板にしっかりと取り付けることと、を含む、
方法。
A method for manufacturing a grinding tool, comprising:
A substrate having a first surface and a second surface and a plurality of holes, each of the holes extending through the substrate, each having a first opening on the first surface and a second surface Providing a substrate having a second opening on the second surface, wherein the second opening is larger than the first opening;
Each of a plurality of polishing pieces is disposed in the hole through the second opening, and the polishing piece is generally larger than the first opening and partially protrudes outward from the first opening. When,
Disposing the substrate on a fixed support having a plurality of positioning recesses, each of the polishing pieces protruding from the first opening being partially received in the positioning recess;
Each of a plurality of adhesive portions is applied through the second opening and into the hole, whereby the adhesive portions each cover the abrasive pieces inside the holes and securely attach the abrasive pieces to the substrate. Including,
Method.
前記研磨小片を含む前記基板を、凹部を含む面を有するベース基板に取り付けることをさらに含み、前記基板は、前記ベース基板の前記凹部内に配置されることを特徴とする、請求項14に記載の方法。   15. The method according to claim 14, further comprising attaching the substrate including the polishing piece to a base substrate having a surface including a recess, and the substrate is disposed in the recess of the base substrate. the method of. 前記固定支持体の前記位置決め凹部は、正確に制御された深さを有し、前記基板を前記固定支持体上に配置する前記工程では、前記研磨小片が前記基板の前記第1の面から所望の高さに突出できるように、前記研磨小片の前記孔内での前記位置を調整することを特徴とする、請求項14に記載の方法。   The positioning recess of the fixed support has a precisely controlled depth, and in the step of placing the substrate on the fixed support, the polishing piece is desired from the first surface of the substrate. The method according to claim 14, wherein the position of the polishing piece in the hole is adjusted so that the polishing piece can protrude to a height of 15 mm. 第1の面および第2の面ならびに複数の孔を有する基板を提供する前記工程は、前記基板に前記孔を穿孔することを含み、各々の前記孔は、互いにつながっている第1の孔区画および第2の孔区画を含み、前記第1の孔区画は、先細り形状で、前記第1の開口を通って前記第1の面に開口し、前記第2の孔区画は、筒状で、前記第2の開口を通って前記第2の面に開口することを特徴とする、請求項14に記載の方法。   The step of providing a substrate having first and second surfaces and a plurality of holes includes drilling the holes in the substrate, wherein each of the holes is connected to each other in a first hole section. And the second hole section, the first hole section has a tapered shape, opens to the first surface through the first opening, and the second hole section has a cylindrical shape, 15. The method of claim 14, wherein the second surface is opened through the second opening. 第1の面および第2の面ならびに複数の孔を有する基板を提供する前記工程は前記基板に前記孔を穿孔することを含み、各々の前記孔は、互いにつながっている第1の孔区画、第2の孔区画および第3の孔区画を含み、前記第1の孔区画は、先細り形状で、前記第1の開口を通って前記第1の面に開口し、前記第2の孔区画は、前記第2の開口を通って前記第2の面に開口し、前記第3の孔区画は、前記第1の孔区画と第2の孔区画との間に位置することを特徴とする、請求項14に記載の方法。   The step of providing a substrate having a first surface and a second surface and a plurality of holes includes drilling the holes in the substrate, each of the holes being connected to each other; Including a second hole section and a third hole section, wherein the first hole section has a tapered shape, opens to the first surface through the first opening, and the second hole section includes , Opening through the second opening into the second surface, the third hole section being located between the first hole section and the second hole section, The method according to claim 14. 前記基板は、単一の剛性体であることを特徴とする、請求項14に記載の方法。   The method according to claim 14, wherein the substrate is a single rigid body. 前記基板は、金属材料またはセラミックで作製されることを特徴とする、請求項14に記載の方法。   The method according to claim 14, wherein the substrate is made of a metallic material or ceramic.
JP2018111017A 2017-06-12 2018-06-11 Grinding tool and manufacturing method of the same Pending JP2019000978A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
TW106119428 2017-06-12
TW106119428A TWI636854B (en) 2017-06-12 2017-06-12 Grinding tool and method of fabricating the same

Publications (1)

Publication Number Publication Date
JP2019000978A true JP2019000978A (en) 2019-01-10

Family

ID=64562083

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2018111017A Pending JP2019000978A (en) 2017-06-12 2018-06-11 Grinding tool and manufacturing method of the same

Country Status (4)

Country Link
US (1) US20180354095A1 (en)
JP (1) JP2019000978A (en)
CN (1) CN109015339B (en)
TW (1) TWI636854B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109822452B (en) * 2019-03-29 2020-04-03 深圳市宏通新材料有限公司 Porous metal-based diamond grinding and polishing plate
CN110465898A (en) * 2019-07-24 2019-11-19 广州市三研磨材有限公司 The manufacturing method of piece is thinned in a kind of diamond
CN111687224A (en) * 2020-06-24 2020-09-22 瓯锟科技温州有限公司 Transmission mechanism of large-roll-diameter multi-roll compound rolling mill
TWI780883B (en) * 2021-08-31 2022-10-11 中國砂輪企業股份有限公司 Chemical mechanical polishing pad conditioner and manufacture method thereof

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001048113A (en) * 1999-08-04 2001-02-20 Idemitsu Petrochem Co Ltd Method and apparatus for manufacturing granular asphalt
JP2003168814A (en) * 2001-09-18 2003-06-13 Dainippon Printing Co Ltd Rear face protection sheet for solar battery module and solar battery module using the same
JP2004524173A (en) * 2001-02-21 2004-08-12 スリーエム イノベイティブ プロパティズ カンパニー Abrasive article having optimally oriented abrasive particles and method of making same
JP2005177979A (en) * 2003-11-27 2005-07-07 Okutekku:Kk Dressing tool
JP2005219152A (en) * 2004-02-04 2005-08-18 Ebara Corp Dresser and method of manufacturing the same
JP2008114334A (en) * 2006-11-06 2008-05-22 Mezoteku Dia Kk Cmp conditioner and manufacturing method therefor
JP2013043259A (en) * 2011-08-25 2013-03-04 Nippon Steel & Sumikin Materials Co Ltd Dresser for polishing cloth
JP2013230535A (en) * 2012-05-01 2013-11-14 Shingijutsu Kaihatsu Kk Polishing tool for high efficiency precision working and method for manufacturing thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4508514B2 (en) * 2001-03-02 2010-07-21 旭ダイヤモンド工業株式会社 CMP conditioner and method of manufacturing the same
TW200708375A (en) * 2005-08-24 2007-03-01 Kinik Co Ceramic polishing pad conditioner/dresser having plastic base and manufacturing method thereof
JP4854445B2 (en) * 2006-09-25 2012-01-18 三菱マテリアル株式会社 CMP conditioner and method of manufacturing the same
KR20090078647A (en) * 2008-01-15 2009-07-20 이화다이아몬드공업 주식회사 Conditioner for chemical mechanical planarization pad.
JP2010149221A (en) * 2008-12-25 2010-07-08 Kyocera Corp Tool and method for dressing
CN101927457A (en) * 2009-06-26 2010-12-29 宋健民 Combined finisher
CN201516579U (en) * 2009-07-29 2010-06-30 钻面奈米科技股份有限公司 Precision grinding tool
KR20130004776A (en) * 2011-07-04 2013-01-14 주식회사 계산이엔씨 Offensive odor tereatment apparatus using low pressure aqueous ozone solution
US9242342B2 (en) * 2012-03-14 2016-01-26 Taiwan Semiconductor Manufacturing Company, Ltd. Manufacture and method of making the same
CN203390712U (en) * 2013-04-08 2014-01-15 宋健民 Chemical mechanical polishing dresser
TWI580524B (en) * 2014-02-18 2017-05-01 中國砂輪企業股份有限公司 Chemical mechanical polishing conditioner with high performance and method for manufacturing the same
TWI542444B (en) * 2014-09-11 2016-07-21 China Grinding Wheel Corp A polishing pad dresser with a brush holder
TWI593514B (en) * 2014-12-17 2017-08-01 中國砂輪企業股份有限公司 Grinding tool and method of manufacturing the same

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001048113A (en) * 1999-08-04 2001-02-20 Idemitsu Petrochem Co Ltd Method and apparatus for manufacturing granular asphalt
JP2004524173A (en) * 2001-02-21 2004-08-12 スリーエム イノベイティブ プロパティズ カンパニー Abrasive article having optimally oriented abrasive particles and method of making same
JP2003168814A (en) * 2001-09-18 2003-06-13 Dainippon Printing Co Ltd Rear face protection sheet for solar battery module and solar battery module using the same
JP2005177979A (en) * 2003-11-27 2005-07-07 Okutekku:Kk Dressing tool
JP2005219152A (en) * 2004-02-04 2005-08-18 Ebara Corp Dresser and method of manufacturing the same
JP2008114334A (en) * 2006-11-06 2008-05-22 Mezoteku Dia Kk Cmp conditioner and manufacturing method therefor
JP2013043259A (en) * 2011-08-25 2013-03-04 Nippon Steel & Sumikin Materials Co Ltd Dresser for polishing cloth
JP2013230535A (en) * 2012-05-01 2013-11-14 Shingijutsu Kaihatsu Kk Polishing tool for high efficiency precision working and method for manufacturing thereof

Also Published As

Publication number Publication date
CN109015339A (en) 2018-12-18
CN109015339B (en) 2020-09-18
TWI636854B (en) 2018-10-01
TW201902624A (en) 2019-01-16
US20180354095A1 (en) 2018-12-13

Similar Documents

Publication Publication Date Title
JP2019000978A (en) Grinding tool and manufacturing method of the same
US9969054B2 (en) Grinding tool and method of manufacturing the same
US20160303704A1 (en) Grinding Tool
US7467989B2 (en) Ceramic polishing pad dresser and method for fabricating the same
KR20120088729A (en) Abrasive article with solid core and methods of making the same
JP2007044863A (en) Conditioner for wafer polishing pad and its manufacturing method
US20140127983A1 (en) Chemical mechanical polishing conditioner and manufacturing methods thereof
JP5701211B2 (en) Electroformed thin cutting saw and core drill impregnated with abrasive
JP2019059020A (en) Working grindstone
US10183378B2 (en) Grinding tool
JP2007152440A (en) Method for machining hard and brittle material
JP2010125567A (en) Cmp pad conditioner
US20170232579A1 (en) Aluminum diamond cutting tool
JP4463084B2 (en) Dressing tools
JP2020055071A (en) Manufacturing method of grinding wheel
JP2007229879A (en) Grinding cup wheel
JP2016087735A (en) Abrasive cloth dresser and manufacturing the same
KR20200057398A (en) CMP pad conditioner with individually attached tips and method for producing the same
TW201600242A (en) Polishing pad conditioner
JP7336864B2 (en) cutting blade
JP2003175465A (en) Cutting tool with diamond coating
JP5512362B2 (en) Wire tool
JP2022044425A (en) Cutting blade
TWI619578B (en) Pad conditioner
JP2021074851A (en) Grinding stone, grinding stone manufacturing method and work-piece processing method

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20180613

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20190514

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20190805

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20191029

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20200120

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20200616