JP2018503970A - ドーピングされた多結晶半導体膜の作製方法 - Google Patents
ドーピングされた多結晶半導体膜の作製方法 Download PDFInfo
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- JP2018503970A JP2018503970A JP2017526872A JP2017526872A JP2018503970A JP 2018503970 A JP2018503970 A JP 2018503970A JP 2017526872 A JP2017526872 A JP 2017526872A JP 2017526872 A JP2017526872 A JP 2017526872A JP 2018503970 A JP2018503970 A JP 2018503970A
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- CUXMFWLJZZPJSL-UHFFFAOYSA-N disilylsilylsilylsilylsilyl(disilyl)silane Chemical compound [SiH3][SiH]([SiH3])[SiH2][SiH2][SiH2][SiH]([SiH3])[SiH3] CUXMFWLJZZPJSL-UHFFFAOYSA-N 0.000 description 1
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- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
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- VEDJZFSRVVQBIL-UHFFFAOYSA-N trisilane Chemical compound [SiH3][SiH2][SiH3] VEDJZFSRVVQBIL-UHFFFAOYSA-N 0.000 description 1
- CGBGXWKZXHJHNU-UHFFFAOYSA-N trisilyl(trisilylsilyl)silane Chemical compound [SiH3][Si]([SiH3])([SiH3])[Si]([SiH3])([SiH3])[SiH3] CGBGXWKZXHJHNU-UHFFFAOYSA-N 0.000 description 1
- KPXBRKFCHBUVLL-UHFFFAOYSA-N trisilyl(trisilylsilylsilyl)silane Chemical compound [SiH3][Si]([SiH3])([SiH3])[SiH2][Si]([SiH3])([SiH3])[SiH3] KPXBRKFCHBUVLL-UHFFFAOYSA-N 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
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Abstract
Description
− 以下:
(i)第1のドーパントと、
(ii)SATP条件下で液体である少なくとも1つのケイ素含有前駆体か、または、少なくとも1つの溶剤およびSATP条件下で液体もしくは固体である少なくとも1つのケイ素含有前駆体と、
を含む第1の前駆体組成物を前記半導体基板の表面の1つ以上の領域に施与して、前記半導体基板の表面の、前記第1の前駆体組成物で被覆された1つ以上の領域を生じさせ;
− 任意に、以下:
(i)第2のドーパントと、
(ii)SATP条件下で液体である少なくとも1つのケイ素含有前駆体か、または、少なくとも1つの溶剤およびSATP条件下で液体もしくは固体である少なくとも1つのケイ素含有前駆体と、
を含む第2の前駆体組成物を前記半導体基板の表面の1つ以上の領域に施与して、前記半導体基板の表面の、前記第2の前駆体組成物で被覆された1つ以上の領域を生じさせ、その際、前記第1の前駆体組成物で被覆されている1つ以上の領域と前記第2の前駆体組成物で被覆されている1つ以上の領域とは、異なっておりかつ重なっていないかまたは実質的に重なっておらず、そして、前記第1のドーパントはn型ドーパントであって前記第2のドーパントはp型ドーパントであるか、またはその逆であるものとし;そして
− 前記ケイ素含有前駆体を多結晶シリコンへと転化させる、前記方法により解決される。
1. p型ドーパントを含む液体のSi系前駆体組成物を、線状の、フィンガー構造状のまたは点状の湿潤膜の形態で、シリコンウェハの片面に印刷するステップ;
2. n型ドーパントを含む液体のSi系前駆体組成物を、1.により堆積された形態に対して相補的な形態の湿潤膜の形態で、シリコンウェハの同一面に印刷するステップ;
3. この湿潤膜を単体多結晶シリコンへと変換させるステップ
を含む作製に関する。
1. p型ドーパントを含む液体のSi系前駆体組成物を、湿潤膜の形態でシリコンウェハの片面に印刷するステップ;
2. この湿潤膜を単体多結晶シリコンへと変換させるステップ;
3. n型ドーパントを含む液体のSi系前駆体組成物を、湿潤膜の形態で、シリコンウェハの別の面に印刷するステップ;
4. この湿潤膜を単体多結晶シリコンへと変換させるステップ
を含む作製に関する。
例1:
スピンコーティングにより、リン1.5%をドーピングしたネオペンタシラン30%と、溶剤トルエンおよびシクロオクタン70%と、からなるリンドーピング配合物を、5Ω・cmの抵抗率を有するn型シリコンウェハの両面に堆積させた。転化を500℃で60秒間行って、厚さ50nmの非晶質シリコン膜とした。リン原子を1000℃で30分間熱処理したところ、図1における外方拡散後の回折像から分かるように、堆積したa−Si膜が結晶化して結晶質シリコンとなった。
ポリシランを堆積させて非晶質シリコンへと転化させた後、これを2つの異なる方法によって結晶化させることができた:
1. 固相結晶化、および
2. 液相結晶。
バックコンタクト型太陽電池を、以下のように作製した:
a. シリコンウェハの片面に、テクスチャ構造を形成させる。
j. 金属によって裏面上のp+領域とn+領域とを接触させる。
Claims (18)
- ドーピングされた多結晶半導体膜を半導体基板上に作製するための液相法において、
− 以下:
(i)第1のドーパントと、
(ii)SATP条件下で液体である少なくとも1つのケイ素含有前駆体か、または、少なくとも1つの溶剤およびSATP条件下で液体もしくは固体である少なくとも1つのケイ素含有前駆体と、
を含む第1の前駆体組成物を前記半導体基板の表面の1つ以上の領域に施与して、前記半導体基板の表面の、前記第1の前駆体組成物で被覆された1つ以上の領域を生じさせ;
− 任意に、以下:
(i)第2のドーパントと、
(ii)SATP条件下で液体である少なくとも1つのケイ素含有前駆体か、または、少なくとも1つの溶剤およびSATP条件下で液体もしくは固体である少なくとも1つのケイ素含有前駆体と、
を含む第2の前駆体組成物を前記半導体基板の表面の1つ以上の領域に施与して、前記半導体基板の表面の、前記第2の前駆体組成物で被覆された1つ以上の領域を生じさせ、その際、前記第1の前駆体組成物で被覆されている1つ以上の領域と前記第2の前駆体組成物で被覆されている1つ以上の領域とは、異なっておりかつ重なっていないかまたは実質的に重なっておらず、そして、前記第1のドーパントはn型ドーパントであって前記第2のドーパントはp型ドーパントであるか、またはその逆であるものとし;そして
− 前記ケイ素含有前駆体を多結晶シリコンへと転化させることを特徴とする、前記方法。 - 前記第1の組成物および/または任意に前記第2の組成物を、印刷法または噴霧法により前記半導体基板に施与することを特徴とする、請求項1に記載の方法。
- (a)前記少なくとも1つのn型ドーパントを、リン含有ドーパント、特にPH3、P4、P(SiMe3)3、PhP(SiMe3)2、Cl2P(SiMe3)、PPh3、PMePh2およびP(t−Bu)3、ヒ素含有ドーパント、特にAs(SiMe3)3、PhAs(SiMe3)2、Cl2As(SiMe3)、AsPh3、AsMePh2、As(t−Bu)3およびAsH3、アンチモン含有ドーパント、特にSb(SiMe3)3、PhSb(SiMe3)2、Cl2Sb(SiMe3)、SbPh3、SbMePh2およびSb(t−Bu)3ならびに上記のものの混合物から選択し;かつ/または
(b)前記少なくとも1つのp型ドーパントを、ホウ素含有ドーパント、特にB2H6、BH3・THF、BEt3、BMe3、B(SiMe3)3、PhB(SiMe3)2、Cl2B(SiMe3)、BPh3、BMePh2、B(t−Bu)3およびそれらの混合物から選択することを特徴とする、請求項1または2に記載の方法。 - 前記前駆体がポリシランであることを特徴とする、請求項1から3までのいずれか1項に記載の方法。
- 前記前駆体が、一般式SinXc[式中、Xは、H、F、Cl、Br、I、C1〜C10−アルキル、C1〜C10−アルケニル、C5〜C20−アリールであり、n≧4でかつ2n≦c≦2n+2である]を有することを特徴とする、請求項4に記載の方法。
- 前記前駆体が、ケイ素含有ナノ粒子であることを特徴とする、請求項4または5に記載の方法。
- 前記前駆体組成物が少なくとも2つの前駆体を有し、そのうち、
少なくとも1つがヒドリドシランオリゴマーであり、
少なくとも1つが一般式SinH2n+2[式中、nは3から20までである]の任意に分枝鎖状であるヒドリドシランであって、特にイソテトラシラン、2−シリルテトラシラン、ネオペンタシランまたはノナシラン異性体混合物から選択される
ことを特徴とする、請求項4から6までのいずれか1項に記載の方法。 - 前記ヒドリドシランオリゴマーが、
(a)200g/molから10,000g/molまでの重量平均分子量を有する;および/または
(b)非環式ヒドリドシランのオリゴマー化によって得られたものである;および/または
(c)最大で20個のケイ素原子を有する少なくとも1つの非環式ヒドリドシランを含む組成物を、235℃未満の温度で触媒の非存在下で熱により反応させることにより得ることができる
ことを特徴とする、請求項7に記載の方法。 - 前記前駆体から多結晶シリコンへの転化を、電磁放射線および/もしくは電子衝撃もしくはイオン衝撃を用いてならびに/または熱により行うことを特徴とする、請求項1から8までのいずれか1項に記載の方法。
- 前記多結晶シリコンへの転化を、熱により、300℃〜1200℃、好ましくは500℃〜1100℃、特に好ましくは750℃〜1050℃の範囲の温度で、特に5分〜60分の期間にわたって行うことを特徴とする、請求項9に記載の方法。
- 前記方法が、前記半導体基板上に誘電体膜を作製するステップをさらに含み、後続のステップにおいて前記誘電体膜上に前記第1および/または第2の前駆体組成物を施与することを特徴とする、請求項1から10までのいずれか1項に記載の方法。
- 前記誘電体膜がSiOxまたはAlxOyである、請求項11に記載の方法。
- 前記半導体基板がシリコンウェハであることを特徴とする、請求項1から12までのいずれか1項に記載の方法。
- 前記第1の組成物と前記第2の組成物とを、前記半導体基板の同一面に、特に互いにかみ合った構造状に施与することを特徴とする、請求項1から13までのいずれか1項に記載の方法。
- 前記第1の組成物と前記第2の組成物とを、前記半導体基板のそれぞれ反対の面に施与することを特徴とする、請求項1から14までのいずれか1項に記載の方法。
- 請求項1から15までのいずれか1項に記載の方法により製造された、半導体基板、特にシリコンウェハ。
- 太陽電池を作製するための、請求項16に記載の半導体基板の使用。
- 請求項16に記載の半導体基板を含む、太陽電池またはソーラーモジュール。
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