JP2018135239A - Method for producing chlorine dioxide gas - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for producing a chlorine dioxide gas that emits no wastes difficult to handle and can produce a chlorine dioxide gas with safety and efficiency as well as with readiness in controlling the concentration of the chlorine dioxide gas to be produced.SOLUTION: A mixture gas D of chlorine A, oxygen B and an inert gas C is supplied into an inductively-coupled atmospheric pressure microplasma apparatus 10. In a plasma reaction site R generated in the inductively-coupled atmospheric pressure microplasma apparatus 10, chlorine A and oxygen B are activated to react with each other to give a chlorine dioxide gas G.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a method for producing chlorine dioxide gas.

  Since chlorine dioxide gas is a strong oxidizing agent, its strong oxidizing action serves to sterilize by changing the structure of the protein that constitutes bacteria, etc., or to decompose malodorous components. For this reason, chlorine dioxide gas has been conventionally used as a disinfectant or deodorant for deodorizing, sterilizing, sterilizing, etc. indoors in hospitals, public facilities, hotel guest rooms, egg laying grounds, etc. .

Also, various methods have been proposed for producing chlorine dioxide gas as described above.
For example, Patent Document 1 is provided with a salt water outlet for discharging water and sodium chloride as by-products as salt water as a device for generating chlorine dioxide gas by completely reacting hydrochloric acid and sodium chlorite. An apparatus for producing chlorine dioxide gas has been proposed.
Patent Document 2 proposes a method in which a predetermined amount of sodium chlorite powder and an acidic liquid are supplied into a container to cause a chemical reaction to generate chlorine dioxide gas.
In Patent Document 3, a transpiration core is immersed in an aqueous solution containing a chlorite and an organic acid, or a chlorite and an inorganic acid, or a chlorite and an organic acid and an inorganic acid. A method for releasing chlorine dioxide gas by heating has been proposed.

JP 2004-189522 A JP 2009-234877 A JP 2006-290717 A

When hydrochloric acid and sodium chlorite are mixed at a certain ratio as in the method described in Patent Document 1, chlorine dioxide is usually generated by a chemical reaction represented by the following chemical formula (1).
5NaClO ₂ + 4HCl → 4ClO ₂ + 5NaCl + 2H ₂ O (1)

  Patent Document 1 also describes that chlorine dioxide gas has a sterilizing or deodorizing action, so that it is dissolved in water and used as an aqueous solution, and is used for sterilizing pools and food processed products. Has been. On the other hand, as shown in the chemical formula (1), when hydrochloric acid and sodium chlorite are reacted, water and sodium chloride remain as by-products. In order to solve this problem, Patent Document 1 describes that chlorine dioxide gas can be continuously generated by providing a salt water discharge port for discharging water and sodium chloride. However, since the salt water as described above is treated as industrial waste, there is a problem in that the treatment requires cost and time.

  In addition, when chlorine dioxide gas is generated by the methods described in Patent Document 2 and Patent Document 3, if the molar concentration of chlorine dioxide exceeds 10%, a rapid chemical reaction may occur. Further, when the methods described in Patent Document 2 and Patent Document 3 are used, the allowable concentration of chlorine dioxide is 0.1 ppm (TLV-TWA: 8 hours a day, and 40 hours working time a week. In order to handle chlorine dioxide safely, strict concentration management is required. In addition, when the methods described in Patent Document 2 and Patent Document 3 are used, the management becomes complicated, such as adjusting the amount of sodium chlorite and acidic liquid, adjusting the temperature of the heater, and the like. There is a problem that it is difficult to control the concentration.

  Furthermore, the techniques described in Patent Documents 1 to 3 have a problem that handling is difficult because high concentration of chlorine dioxide gas is generated due to the chemical reaction.

  The present invention has been made in view of the above problems, and does not discharge waste that is difficult to handle, and it is easy to control the concentration of the generated chlorine dioxide gas, so that the chlorine dioxide gas is safe and efficient. It aims at providing the manufacturing method of the chlorine dioxide gas which can produce | generate.

In order to solve the above problems, the present invention includes the following aspects.
That is, the present invention supplies a mixed gas of chlorine, oxygen, and an inert gas to an inductively coupled atmospheric pressure microplasma apparatus, and in the plasma reaction field generated by the inductively coupled atmospheric pressure microplasma apparatus, And a method for producing chlorine dioxide gas, wherein chlorine dioxide gas is produced by activating and reacting the oxygen.

  Further, the present invention supplies a mixed gas of oxygen and an inert gas to an inductively coupled atmospheric pressure microplasma apparatus, and activates the oxygen in a plasma reaction field generated by the inductively coupled atmospheric pressure microplasma apparatus. Then, a method for producing chlorine dioxide gas is provided, in which chlorine is further supplied to react with the activated oxygen to produce chlorine dioxide gas.

According to the present invention, as described above, a mixed gas of chlorine, oxygen, and an inert gas, or a mixed gas of oxygen and an inert gas is supplied to an inductively coupled atmospheric pressure microplasma device and generated in the device. By using the method of activating and reacting in the plasma reaction field, it is possible to produce chlorine dioxide gas more safely, easily and efficiently than conventional methods.
Moreover, since only chlorine, oxygen, and an inert gas are used as the raw material gas, no by-products such as sodium chloride and water are generated, so that waste treatment is unnecessary.
Furthermore, when the concentration of chlorine is adjusted, chlorine dioxide gas can be generated at a concentration that does not cause a rapid chemical reaction and that does not affect the human body. Further, since chlorine dioxide gas can be easily diluted with air, a safer manufacturing process can be realized.

In the method for producing chlorine dioxide gas of the present invention, the inert gas is more preferably a rare gas in the above configuration.
By using a rare gas as the inert gas, the concentration can be controlled more easily, and chlorine dioxide gas can be produced more safely and efficiently.

  According to the method for producing chlorine dioxide gas according to the present invention, by-products such as sodium chloride and water are not generated by the above configuration. Further, by adjusting the concentration of chlorine gas, chlorine dioxide gas having a predetermined concentration can be generated more safely, easily and efficiently.

It is a figure which illustrates typically the manufacturing method of the chlorine dioxide gas which is one Embodiment of this invention, and supplies the mixed gas of chlorine, oxygen, and an inert gas in an inductively coupled atmospheric pressure microplasma apparatus. It is the schematic which shows the example which produces | generates chlorine dioxide gas. It is a figure which illustrates typically the manufacturing method of the chlorine dioxide gas which is one Embodiment of this invention, and after supplying the mixed gas of oxygen and an inert gas in an inductively coupled atmospheric pressure microplasma apparatus, it is further chlorine It is the schematic which shows the example which mixes and produces | generates chlorine dioxide gas.

  Hereinafter, a method for producing chlorine dioxide gas, which is an embodiment to which the present invention is applied, will be described with reference to the drawings as appropriate. In addition, in the drawings used in the following description, in order to make the features easy to understand, there are cases where the portions that become the features are enlarged for the sake of convenience, and the dimensional ratios of the respective components are not always the same as the actual ones. Absent. In addition, the materials and the like exemplified in the following description are examples, and the present invention is not limited to them, and can be appropriately modified and implemented without changing the gist thereof.

<First Embodiment>
Hereinafter, a first embodiment of a method for producing chlorine dioxide gas according to the present invention will be described in detail with reference to FIG.
In the method for producing chlorine dioxide gas of the present embodiment, a mixed gas of chlorine, oxygen, and inert gas is supplied to an inductively coupled atmospheric pressure microplasma device, and plasma generated by the inductively coupled atmospheric pressure microplasma device is supplied. In this reaction field, chlorine dioxide gas is generated by activating and reacting chlorine and oxygen.

  The method for producing chlorine dioxide gas of the present embodiment is different from the method using a chemical reaction between sodium chlorite and an acidic liquid, particularly hydrochloric acid, which has been conventionally used for producing chlorine dioxide gas. In addition, a method of generating chlorine dioxide gas by activating and reacting chlorine gas and oxygen gas in a plasma reaction field generated by an inductively coupled atmospheric pressure microplasma apparatus is employed.

[Inductively coupled atmospheric pressure microplasma device]
FIG. 1 is a schematic view showing an example of an inductively coupled atmospheric pressure microplasma apparatus (hereinafter sometimes abbreviated as a microplasma apparatus) that can be used in the method for producing chlorine dioxide gas of the present embodiment.
A microplasma apparatus 10 shown in FIG. 1 includes a gas supply unit 1, a plasma generation unit 2, an electromagnetic wave energy supply unit 3, an LF / HV generator 4, a power supply unit 5, an aluminum plate 6, and a collection layer 7. Has been.

  The gas supply unit 1 supplies a mixed gas, which is a raw material for chlorine dioxide gas, to the plasma generation unit 2, and includes a chlorine supply pipe 1A, an oxygen supply pipe 1B, and an inert gas supply pipe 1C. In the illustrated example, the gas supply unit 1 is connected so that the chlorine supply pipe 1A and the oxygen supply pipe 1B join together, thereby mixing chlorine A (chlorine gas) and oxygen (oxygen gas) B to mix tubes. It can be sent to 1D. Further, the inert gas supply pipe 1C is connected in the middle of the mixing pipe 1D, and is configured to generate the mixed gas D by further mixing the inert gas C with the gas in which chlorine A and oxygen B are mixed. Has been.

  The plasma generation unit 2 generates a plasma reaction field R by electromagnetic wave energy supplied from an electromagnetic wave energy supply unit 3 to be described later and an inert gas C contained in the mixed gas D. In the illustrated example, It is configured in a cylindrical shape. A mixed tube 1D provided in the gas supply unit 1 is connected to the plasma generation unit 2, and a mixed gas composed of chlorine A, oxygen B, and inert gas C is contained in the plasma generation unit 2 serving as a plasma reaction field R. It is set as the structure which can supply D. The plasma generating unit 2 generates chlorine dioxide gas G in the plasma reaction field R with the above configuration.

  As described above, the electromagnetic wave energy supply unit 3 generates electromagnetic wave energy and supplies it to the plasma generation unit 2. The electromagnetic wave energy supply unit 3 generates electromagnetic wave energy by a low-frequency high-voltage power source supplied from an LF / HV generator 4 described later, and supplies this electromagnetic wave energy to the inside of the plasma generation unit 2 (plasma reaction field R). To do. The electromagnetic wave energy supply unit 3 in the illustrated example is configured in a cylindrical shape like the plasma generation unit 2, and is configured to cover a part of the outer peripheral surface of the plasma generation unit 2.

The LF / HV generator 4 generates a low-frequency high-voltage power supply (LF / HV) from the AC power supplied from the power supply unit 5.
The power supply unit 5 is not particularly limited. For example, a normal commercial power supply (AC power supply) can be used without any limitation.

  The aluminum plate 6 is connected to an end portion of the plasma generating portion 2 opposite to the introduction side of the mixed gas D, and a portion corresponding to the plasma generating portion 2 is a through-hole 6A. The aluminum plate 6 is installed so as to cover an upper opening of a collection layer 7 described later.

The collection layer 7 is a tank-shaped member for collecting the chlorine dioxide gas G generated by the plasma generation unit 2, and the upper opening is covered with the aluminum plate 6 as described above. As shown in FIG. 1, the collection layer 7 is configured such that chlorine dioxide gas G generated by the plasma generator 2 is introduced into the inside through a through-hole 6 </ b> A provided in the aluminum plate 6. Yes.
Further, in the illustrated example, water W is accommodated in the collection layer 7, and the chlorine dioxide gas G introduced into the inside reaches the water W, and the chlorine dioxide gas G is dissolved in the water W. Possible configuration.

[Method for producing chlorine dioxide gas]
In the manufacturing method of the chlorine dioxide gas G of the present embodiment, the microplasma apparatus 10 having the above-described configuration is used. First, in the gas supply unit 1, mixing of chlorine A, oxygen B, and inert gas C is performed. Gas D is prepared.
Next, the mixed gas D obtained by the gas supply unit 1 is supplied to the plasma generation unit 2. At this time, electromagnetic wave energy is supplied from the electromagnetic wave energy supply unit 3 into the plasma generation unit 2. Thereby, in the plasma generation part 2, it will be in the state which the plasma reaction field R generate | occur | produced by the inert gas C contained in electromagnetic wave energy and the mixed gas D.
In the plasma reaction field R, chlorine A and oxygen B are activated, and a chemical reaction occurs between them. Thereby, chlorine dioxide gas G can be generated.

And after the chlorine dioxide gas G produced | generated in the plasma reaction field R in the plasma generation part 2 is introduce | transduced in said collection layer 7, piping etc. are used for the process etc. which use the chlorine dioxide gas G, for example. Or is filled in a cylinder or the like.
In addition, in this embodiment, although the structure which can dissolve the chlorine dioxide gas G in the water W stored in the collection layer 7 is shown, there is not necessarily the necessity, for example, the collection layer 7 does not contain water, and the chlorine dioxide gas G introduced therein may be collected as it is.

As chlorine A used in the manufacturing method of chlorine dioxide gas G of this embodiment, chlorine gas generally used when manufacturing chlorine dioxide gas can be used without any limitation.
In addition, as the oxygen B used in the manufacturing method of the present embodiment, oxygen gas generally used in this field can be used without any limitation.

  Further, the inert gas used for forming the plasma reaction field is not particularly limited, but the use of a rare gas makes it easier to control the concentration, and produces chlorine dioxide gas more safely and efficiently. It is preferable from the viewpoint that it becomes possible. More specifically, argon or helium can be used as the inert gas.

  In the present embodiment, the ratio of chlorine A, oxygen B, and inert gas C in the mixed gas D is not particularly limited, but the inert gas C can be supplied in an amount capable of generating good plasma P. The chlorine A and the oxygen B are preferably supplied at a ratio that can increase the yield of the chlorine dioxide gas G. More specifically, the ratio of {chlorine A: oxygen B: inert gas C} is preferably set in the range of {0.5-2: 0.5-2: 96-99}, and {0. It is more preferable to set in the range of 5: 1 to 2:97 to 98.5}.

[Function and effect]
According to the manufacturing method of the chlorine dioxide gas G of the present embodiment, as described above, the mixed gas D of chlorine A, oxygen B, and inert gas C is supplied to the microplasma apparatus 10 and generated in the plasma generator 2. By using a method in which chlorine A and oxygen B are activated and reacted in the plasma reaction field R, chlorine dioxide gas can be produced more safely, easily and efficiently than in the past.
In addition, since only chlorine, oxygen, and inert gas are used as the source gas, no by-products such as sodium chloride and water are generated, so that waste treatment is not necessary.
Furthermore, when the concentration of chlorine is adjusted, chlorine dioxide gas can be generated at a concentration that does not cause a rapid chemical reaction and that does not affect the human body. Moreover, since chlorine dioxide gas can be easily diluted with air, chlorine dioxide gas can be produced more safely, easily and efficiently.

<Second Embodiment>
Hereinafter, a second embodiment of the method for producing chlorine dioxide gas according to the present invention will be described in detail with reference to FIG.
Note that, in the following description, the same reference numerals are assigned to configurations common to the above-described first embodiment, and detailed description thereof may be omitted.

  In the method for producing chlorine dioxide gas of the present embodiment, a mixed gas of oxygen and an inert gas is supplied to an inductively coupled atmospheric pressure microplasma apparatus, and in a plasma reaction field generated by the inductively coupled atmospheric pressure microplasma apparatus. In this method, after activating oxygen, chlorine is further supplied to react with the activated oxygen to generate chlorine dioxide gas. That is, in the method for producing chlorine dioxide gas of the present embodiment, oxygen and inert gas are supplied to an inductively coupled atmospheric pressure microplasma device and activated, and then chlorine is supplied, so that chlorine passes through the plasma reaction field. It differs from the manufacturing method of the first embodiment in that it is mixed without any problems.

[Inductively coupled atmospheric pressure microplasma device]
The schematic diagram of FIG. 2 shows an example of a microplasma apparatus that can be used in the method for producing chlorine dioxide gas of the present embodiment.
2 includes a first gas supply unit 21, a second gas supply unit 22, a plasma generation unit 2, an electromagnetic wave energy supply unit 3, an LF / HV generator 4, a power supply unit 5, an aluminum plate 6, and The trapping layer 7 is provided and schematically configured. That is, the microplasma apparatus 20 used in the manufacturing method of the present embodiment replaces the gas supply section 1 used in the microplasma apparatus 10 of the first embodiment with the first gas supply section 21 and the second gas supply. It differs from the microplasma apparatus 10 in that the part 22 is provided.

  The first gas supply unit 21 supplies oxygen B and inert gas C to the plasma generation unit 2 and includes an oxygen supply pipe 21B and an inert gas supply pipe 21C. The first gas supply unit 21 in the example shown in FIG. 2 is connected so that the oxygen supply pipe 21B and the inert gas supply pipe 21C merge, thereby mixing and mixing oxygen B and the inert gas C. It is comprised so that it can send out to the pipe | tube 21D. The mixing tube 21D is connected to the upstream side of the plasma generating unit 2 that generates the chlorine dioxide gas G, that is, the side opposite to the chlorine dioxide gas G discharge side in FIG.

  The second gas supply unit 22 supplies chlorine A to the plasma generation unit 2. As shown in FIG. 2, the second gas supply unit 22 directly enters the plasma generation unit 2 without joining the oxygen supply pipe 21B and the inert gas supply pipe 21C that supply oxygen B and the inert gas C. It is connected. In the illustrated example, the second gas supply unit 22 is connected to the vicinity of the chlorine dioxide gas G discharge side in the plasma generation unit 2. That is, the second gas supply unit 22 is connected to the downstream side of the plasma generation unit 2 and supplies chlorine A at a position where it does not pass through the plasma generation field R.

  That is, the microplasma apparatus 20 used in the present embodiment generates chlorine dioxide gas G by activating only oxygen B without activating the plasma for chlorine A, and then mixing them. is there.

[Method for producing chlorine dioxide gas]
In the method for producing chlorine dioxide gas G of the present embodiment, the microplasma apparatus 20 having the above-described configuration is used. First, the gas supply unit 21 prepares a mixed gas D composed of oxygen B and inert gas C. To do.
Next, oxygen B and inert gas C obtained by the gas supply unit 21 are supplied to the plasma generation unit 2. At this time, as in the case of the first embodiment, the electromagnetic wave energy is supplied from the electromagnetic wave energy supply unit 3 into the plasma generation unit 2, so that the inert gas C contained in the mixed gas D and the electromagnetic wave energy. Thus, the plasma reaction field R is generated.
Then, after oxygen B is activated in the plasma reaction field R, chlorine A is supplied on the downstream side of the plasma generation unit 2 and mixed with the activated oxygen B, whereby a chemical reaction occurs between them. . Thereby, chlorine dioxide gas G can be generated.

  Then, as in the case of the first embodiment, after the chlorine dioxide gas G generated in the plasma generation unit 2 is introduced into the collection layer 7, for example, a step of using the chlorine dioxide gas G Or the like, or is filled in a cylinder or the like.

As chlorine A, oxygen B, and inert gas C used in the method for producing chlorine dioxide gas G of the present embodiment, the same ones as described in the first embodiment can be used.
Moreover, in this embodiment, although the mixing form and timing of chlorine A, oxygen B, and the inert gas C are different from those in the first embodiment, these ratios are the same as those in the first embodiment. be able to.

[Function and effect]
According to the manufacturing method of the chlorine dioxide gas G of the present embodiment, as described above, the mixed gas D of chlorine A, oxygen B, and inert gas C is supplied to the microplasma apparatus 10 and generated in the plasma generator 2. By activating oxygen B in the plasma reaction field R and supplying chlorine A to react, chlorine dioxide gas can be safely, easily and efficiently as in the case of the first embodiment. Can be manufactured.
Further, as described above, since only chlorine, oxygen, and inert gas are used as the raw material gas, no by-products such as sodium chloride and water are generated, so that waste disposal becomes unnecessary.
Furthermore, as described above, when the concentration of chlorine is adjusted, chlorine dioxide gas can be generated at a concentration that does not cause a rapid chemical reaction and that does not affect the human body. Moreover, since chlorine dioxide gas can be easily diluted with air, chlorine dioxide gas can be produced more safely, easily and efficiently.

  Hereinafter, although the Example demonstrates the manufacturing method of the chlorine dioxide gas which concerns on this invention in more detail, this invention is not limited to these.

<Example 1>
In Example 1, an inductively coupled atmospheric pressure microplasma apparatus 10 as shown in FIG. 1 is used, and a mixed gas D composed of chlorine A, oxygen B, and argon gas, which is an inert gas C, is supplied to the plasma generator 2. The chlorine dioxide gas G obtained was dissolved in water W, and the chlorine dioxide gas G was analyzed using the water W.

At this time, in the mixed gas D, the ratio of {chlorine A: oxygen B: inert gas C} was set to {0.5: 1: 98.5}.
In addition, the supply speed of the mixed gas D to the plasma generation unit 2 was set to 120 L / hr.
Moreover, as plasma generation conditions, the voltage and current of the low-frequency high-voltage power source supplied to the electromagnetic wave energy supply unit 3 were 100 V and 0.12 A.

And about the chlorine dioxide gas G melt | dissolved in the water W, the commercially available water quality measuring device (brand name: pack test) using the same coloring principle as the diethyl-p-phenylenediamine (DPD) method of a general water test (Registered trademark); manufactured by Kyoritsu Riken Corporation).
As a result, it was confirmed that chlorine dioxide gas was generated by supplying a mixed gas D composed of chlorine A, oxygen B, and argon gas to the plasma generating unit 2 and passing it through the plasma reaction field R.

  On the other hand, in Example 1, as a comparative experiment, a mixed gas of chlorine gas and argon gas and a mixed gas of oxygen gas and argon gas were separately supplied to the microplasma device, and plasma was supplied. Experiments were conducted through the reaction field, but no chlorine dioxide gas was produced in any case.

<Example 2>
In the second embodiment, an inductively coupled atmospheric pressure microplasma apparatus 20 as shown in FIG. 2 is used to supply a mixed gas D composed of oxygen B and argon gas, which is an inert gas C, to the plasma generating unit 2. Then, chlorine A was mixed with the mixed gas D that passed through the plasma reaction field R to generate chlorine dioxide gas G.
The obtained chlorine dioxide gas G was dissolved in water W, and the chlorine dioxide gas G was analyzed using the water W in the same manner as in Example 1.

At this time, as the ratio of the mixed gas D, the ratio of {oxygen B: inert gas C} is set to {1:99}, and further, chlorine A supplied later is included {chlorine A: oxygen B: The ratio of the inert gas C} was {1: 2: 97}.
Further, the supply rate of the mixed gas D to the plasma generating unit 2 was set to 60 L / hr.
Moreover, as plasma generation conditions, the voltage and current of the low-frequency high-voltage power source supplied to the electromagnetic wave energy supply unit 3 were 100 V and 0.12 A.

  Then, as a result of analyzing and evaluating the chlorine dioxide gas G dissolved in the water W by the same method as described above, the mixed gas D composed of oxygen B and argon gas is supplied to the plasma generating unit 2 and passed through the plasma reaction field R. It was confirmed that chlorine dioxide gas was generated even when mixed with chlorine A that did not pass through plasma reaction field R. Thereby, it was confirmed that chlorine dioxide gas was generated even in a reaction between activated oxygen B and non-activated chlorine A.

  On the other hand, in Example 2, as a comparative experiment, a mixed gas of a mixed gas of chlorine gas and argon gas is supplied to the plasma generation unit, and further, an oxygen gas is mixed with the mixed gas that has passed through the plasma reaction field. In this case, chlorine dioxide gas was not generated.

<Experimental example>
In this experimental example, chlorine was not used in a reaction field generated by using an inductively coupled atmospheric pressure microplasma apparatus but in a plasma reaction field generated by a commercially available ozonizer (Sumitomo Seimitsu Kogyo Co., Ltd .: SG-01A). A mixed gas consisting of gas, oxygen gas, and argon gas was supplied to check whether chlorine dioxide gas was generated. As an analytical evaluation method, the same method as in Examples 1 and 2 was used.

  As a result, it was confirmed that chlorine dioxide gas was not generated when the above mixed gas was passed through the plasma reaction field generated by the ozonizer.

  The method for producing chlorine dioxide gas of the present invention does not discharge waste that is difficult to handle, can easily control the concentration of generated chlorine dioxide gas, and can generate chlorine dioxide gas safely and efficiently. it can. Therefore, the method for producing chlorine dioxide gas according to the present invention produces, for example, a sterilizing agent or deodorant for deodorizing, sterilizing, sterilizing, or the like indoors in a hospital, public facility, hotel guest room, egg laying room, etc. In that case, it is very suitable.

1 ... Gas supply part,
1A: Chlorine supply pipe,
1B ... oxygen supply pipe,
1C: inert gas supply pipe,
1D ... Mixing tube,
21 ... 1st gas supply part,
21B ... oxygen supply pipe,
21C ... inert gas supply pipe,
21D ... mixing tube,
22 ... Second gas supply unit,
2 ... Plasma generation unit 3 ... Electromagnetic energy supply unit,
4 ... LF / HV generator,
5 ... power supply,
6 ... Aluminum plate,
6A ... through hole,
7 ... collection layer,
10, 20 ... microplasma device,
A ... Chlorine (chlorine gas),
B ... Oxygen (oxygen gas),
C: inert gas,
D ... mixed gas,
G: Chlorine dioxide gas,
R: Plasma reaction field,
W ... water

Claims (3)

  A mixed gas of chlorine, oxygen, and inert gas is supplied to an inductively coupled atmospheric pressure microplasma apparatus, and the chlorine and oxygen are activated in a plasma reaction field generated by the inductively coupled atmospheric pressure microplasma apparatus. A method for producing chlorine dioxide gas, wherein chlorine dioxide gas is produced by reacting with each other.   A mixed gas of oxygen and an inert gas is supplied to the inductively coupled atmospheric pressure microplasma apparatus, and after activating the oxygen in the plasma reaction field generated by the inductively coupled atmospheric pressure microplasma apparatus, chlorine is further added. A method for producing chlorine dioxide gas, wherein chlorine dioxide gas is produced by supplying and reacting with the activated oxygen.   The method for producing chlorine dioxide gas according to claim 1 or 2, wherein the inert gas is a rare gas.

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