JP2018107366A - Substrate processing apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of preventing roll up of particles on the periphery of a transport robot.SOLUTION: A transport path 30 is extended along multiple substrate processing sections. A transport robot TR for transporting substrates for the multiple substrate processing sections is provided in the transport path 30. Multiple air outlets 51a, 51b, 51c, 51d, 51e are provided below the transport path 30, and exhaust flow rate of each air outlet can be controlled individually. Exhaust flow rate of an air outlet closest to the position of the transport robot TR on the transport path 30, out of these multiple air outlets, is made larger than the exhaust flow rate of other air outlets. Even if a transport robot TR becoming an obstruct to exhaust exists on the transport path 30, atmosphere on the periphery of the transport robot TR can be exhausted strongly, and roll up of particles can be prevented on the periphery of the transport robot TR.SELECTED DRAWING: Figure 3

Description

  The present invention provides a substrate processing for processing a substrate by sequentially transporting a thin plate precision electronic substrate (hereinafter simply referred to as “substrate”) such as a semiconductor wafer or a glass substrate for a liquid crystal display device to a plurality of substrate processing units. Relates to the device.

  As an example of this type of apparatus, a substrate processing apparatus (so-called coater / developer) that performs a resist coating process on a substrate, exposes the substrate on which the resist film is formed with a separate exposure machine, and develops the exposed substrate. )It has been known. Patent Document 1 discloses a plurality of substrate processing units together with a plurality of substrate processing units such as a spin coater that performs a resist coating process on a substrate, a spin developer that performs a development process on an exposed substrate, and a heat treatment unit that performs a heat treatment on the substrate. A substrate processing apparatus equipped with a transfer robot for transferring a substrate to a part is disclosed.

JP 2009-10291 A

  In a substrate processing apparatus as disclosed in Patent Document 1, a substrate is sequentially transferred to a plurality of substrate processing units while a transfer robot reciprocates on a transfer path provided along the plurality of substrate processing units. ing. When the transfer robot moves, particles may be generated from the drive mechanism of the transfer robot. Therefore, an exhaust mechanism is provided below the transfer path so that the atmosphere around the transfer robot on the transfer path is discharged outside the device. ing.

  However, in the vicinity of the transfer robot on the transfer path, the transfer robot itself becomes an obstacle to exhaust, and smooth exhaust cannot be performed, and particles may roll up. When particles are rolled up around the transfer robot, there is a problem that the particles adhere to the substrate being transferred by the transfer robot and contaminate the substrate.

  The present invention has been made in view of the above problems, and an object of the present invention is to provide a substrate processing apparatus that can prevent particles from rolling up around the transfer robot.

  In order to solve the above-mentioned problem, the invention of claim 1 is a substrate processing apparatus for transferring a substrate to a plurality of substrate processing units and processing the substrate, and transferring the substrate along the plurality of substrate processing units. A transfer robot installed on the road and configured to transfer a substrate to the plurality of substrate processing units; a drive mechanism for moving the transfer robot along the transfer path; and a plurality of shapes formed below the transfer path A plurality of exhaust units that are provided corresponding to the exhaust ports on a one-to-one basis and exhaust the atmosphere on the conveyance path through the plurality of exhaust ports, and an exhaust control that individually controls the exhaust flow rates of the plurality of exhaust units. A reference exhaust flow rate in which the exhaust flow rate at the exhaust port closest to the position of the transfer robot on the transfer path is the exhaust flow rate for other exhaust ports among the plurality of exhaust ports Bigger than 1 and controls the plurality of vent so that the exhaust flow rate.

  According to a second aspect of the present invention, in the substrate processing apparatus according to the first aspect of the invention, the exhaust control unit is an exhaust port that is second closest to the position of the transfer robot on the transfer path among the plurality of exhaust ports. The plurality of exhaust sections are controlled so that the exhaust flow rate at the second exhaust flow rate is larger than the reference exhaust flow rate.

  According to a third aspect of the present invention, in the substrate processing apparatus according to the second aspect of the invention, the first exhaust flow rate is larger than the second exhaust flow rate.

  According to the first to third aspects of the present invention, since the exhaust flow rate at the exhaust port closest to the position of the transfer robot on the transfer path among the plurality of exhaust ports is larger than the exhaust flow rate for the other exhaust ports, Even if there is a transfer robot that becomes an obstacle to exhaust on the road, the atmosphere around the transfer robot can be exhausted strongly, and particles can be prevented from rolling up around the transfer robot.

It is a top view of the whole substrate processing apparatus concerning the present invention. It is a side view of the conveyance robot provided on the conveyance path. It is a figure which shows typically exhaust operation | movement when a conveyance robot is located just above an exhaust port. It is a figure which shows typically exhaust operation | movement when a conveyance robot is located in the position close | similar to an adjacent exhaust port from right above an exhaust port. It is a figure which shows typically exhaust operation | movement when a conveyance robot is located in the middle of the adjacent exhaust port.

  Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

  FIG. 1 is a plan view of an entire substrate processing apparatus 1 according to the present invention. The substrate processing apparatus 1 includes an indexer block 10 and a processing block 20. The indexer block 10 and the processing block 20 are provided adjacent to each other. 1 and 2 have an XYZ orthogonal coordinate system in which the Z-axis direction is the vertical direction and the XY plane is the horizontal plane in order to clarify the directional relationship.

  The indexer block 10 carries an unprocessed substrate W received from outside the apparatus into the processing block 20 and unloads the substrate W that has been processed in the processing block 20 outside the apparatus. The indexer block 10 takes a mounting table 11 on which a plurality of carriers C (four in this embodiment) are placed side by side, and takes out an unprocessed substrate W from each carrier C and also transfers a processed substrate W to each carrier C. And an indexer robot 12 for storage.

  A carrier C storing a plurality of unprocessed substrates W is loaded into the mounting table 11 of the indexer block 10 by an unmanned transport mechanism such as an AGV (automated guided vehicle). Further, the carrier C storing the processed plurality of substrates W is also carried out by AGV or the like. In addition to the FOUP (front opening unified pod) that stores the substrate W in a sealed space, the carrier C may be an OC (open cassette) that exposes the standard mechanical interface (SMIF) pod or the storage substrate W to the outside air. There may be.

  As indicated by an arrow AR1, the indexer robot 12 is configured to be horizontally movable along the arrangement direction (Y-axis direction) of the carrier C by a drive mechanism (not shown). The indexer robot 12 includes a holding arm 14. The holding arm 14 is capable of moving up and down in the vertical direction (Z-axis direction), turning around the axis along the vertical direction, and sliding along the turning radius. It is configured. Therefore, the holding arm 14 performs horizontal movement along the Y-axis direction, vertical movement, turning movement in the horizontal plane, and advance / retreat movement along the turning radius direction. As a result, the indexer robot 12 can access the carrier C on the mounting table 11 by using the holding arm 14 to take out the unprocessed substrate W and store the processed substrate W, and to the processing block 20. The substrate W can be exchanged.

  A processing block 20 is arranged adjacent to the indexer block 10. A partition for separating the atmosphere is provided between the indexer block 10 and the processing block 20, and a path for delivering the substrate between both blocks is provided in a part of the partition (both shown in the figure). (Omitted).

  In the processing block 20, a heat treatment unit group and a liquid processing unit group are arranged opposite to each other across the conveyance path 30 for the conveyance robot TR to move. A heat treatment unit group is arranged on the (+ Y) side of the transport path 30 and a liquid treatment unit group is arranged on the (−Y) side. As the heat treatment portion group, heat treatment portions 21, 22, and 23 are provided. Each of the heat treatment units 21, 22 and 23 includes a hot plate for heating the substrate W or a cool plate for cooling the substrate W. Further, a spinner 24 is provided as the liquid processing unit group. The spinner 24 includes a spin coater that discharges a coating liquid such as a photoresist or a spin developer that supplies a developer to the surface of the substrate W that is rotatably held by the spin chuck 25.

  In the processing block 20, a transport path 30 extends in the X-axis direction along a plurality of substrate processing units including the heat processing units 21, 22, and 23 and the spinner 24. A transport robot TR is provided on the transport path 30. FIG. 2 is a side view of the transfer robot TR provided on the transfer path 30. A guide rail 34 and a ball screw 35 are provided in the transport path 30 in parallel along the longitudinal direction (X-axis direction). A ball screw 35 is screwed into the base portion 31 of the transport robot TR, and a guide rail 34 is slidably inserted. When the drive motor 36 rotates the ball screw 35 in the forward or reverse direction, the transport robot TR is guided by the guide rail 34 and reciprocated along the transport path 30 in the X-axis direction as indicated by an arrow AR2 in FIG. To do. Note that the drive mechanism of the transport robot TR may be another mechanism such as a belt drive mechanism or a linear drive mechanism.

  The base 31 is provided with a turntable 32 that can turn around an axis along the vertical direction. On the turntable 32, two holding arms 33a and 33b capable of holding the substrate W are mounted so as to be independently slidable in the horizontal direction. The two holding arms 33a and 33b are provided at positions close to each other in the vertical direction. The base unit 31 is provided with a drive unit that rotates the turntable 32, and the turntable 32 has a built-in drive unit that slides the holding arms 33a and 33b in the turning radius direction of the turntable 32 (both shown). (Omitted). Accordingly, each of the holding arms 33a and 33b performs horizontal movement along the X-axis direction, vertical movement, turning movement in the horizontal plane, and forward / backward movement along the turning radial direction. As a result, the transfer robot TR allows the two holding arms 33a and 33b to individually access any of the plurality of substrate processing units, and exchanges the substrate W between them. The substrate W can be exchanged.

  As shown in FIG. 2, a plurality (five in this embodiment) of exhaust ports 51 a, 51 b, 51 c, 51 d, and 51 e are formed below the conveyance path 30. The formation positions of the five exhaust ports 51a, 51b, 51c, 51d, and 51e are not particularly limited. For example, the stop positions that are stopped when the transfer robot TR transfers the substrate W to and from each substrate processing unit. It may be provided below, or may be formed at equal intervals along the longitudinal direction of the conveyance path 30.

  Five exhaust fans 52a, 52b, 52c, 52d, 52e are provided in a one-to-one correspondence with the five exhaust ports 51a, 51b, 51c, 51d, 51e. As the exhaust fans 52a, 52b, 52c, 52d, and 52e rotate, the atmosphere on the transport path 30 is discharged from the corresponding exhaust ports 51a, 51b, 51c, 51d, and 51e. The exhaust flow rates from the exhaust ports 51a, 51b, 51c, 51d, 51e are defined by the rotational speeds of the corresponding exhaust fans 52a, 52b, 52c, 52d, 52e. That is, as the rotational speed of the exhaust fans 52a, 52b, 52c, 52d, and 52e increases, the exhaust flow rate from the corresponding exhaust ports 51a, 51b, 51c, 51d, and 51e also increases. In addition, when it is not necessary to particularly distinguish the exhaust ports 51a, 51b, 51c, 51d, and 51e, the exhaust ports 51 are simply collectively referred to, and similarly, the exhaust fans 52a, 52b, 52c, 52d, and 52e need not be particularly distinguished. In this case, the exhaust fan 52 is collectively referred to.

  A fan filter unit (not shown) is installed above the conveyance path 30, and clean clean air is sent downward from the fan filter unit. By sending clean air from the upper side to the lower side of the conveyance path 30 and discharging the atmosphere on the conveyance path 30 from the exhaust port 51, a downflow that flows from the upper side to the lower side is formed in the conveyance path 30. . As a result, particles present in the transport path 30 are discharged from the exhaust port 51.

  Further, the substrate processing apparatus 1 is provided with two controllers, a robot controller 91 and a main controller 92. The configuration of the robot controller 91 and the main controller 92 as hardware is the same as that of a general computer. That is, each of the robot controller 91 and the main controller 92 includes a CPU that is a circuit that performs various arithmetic processes, a ROM that is a read-only memory that stores basic programs, a RAM that is a read / write memory that stores various information, and a control It has a magnetic disk for storing software and data.

  The robot controller 91 is a control unit mainly for controlling the operation of the transport robot TR. Further, the robot controller 91 acquires position information along the X-axis direction of the transport robot TR on the transport path 30 based on a measurement value of an encoder (not shown) attached to the drive motor 36.

  On the other hand, the main controller 92 is a control unit for managing the entire substrate processing apparatus 1 and is also an upper controller of the robot controller 91. The main controller 92 gives instructions to the subordinate robot controller 91 and controls the rotational speeds of the five exhaust fans 52a, 52b, 52c, 52d, 52e individually, thereby providing the five exhaust ports 51a, 51b, The exhaust gas flow rates in 51c, 51d, and 51e are individually controlled. The main controller 92 is also connected to an operation panel (not shown) provided on the outer wall surface of the substrate processing apparatus 1. The operator of the substrate processing apparatus 1 can input commands and parameters from the operation panel to the main controller 92 and can confirm information displayed on the operation panel by the main controller 92. In FIG. 1, the robot controller 91 and the main controller 92 are provided in the indexer block 10. However, the present invention is not limited to this, and the installation positions of both controllers may be appropriate.

  Next, the operation of the substrate processing apparatus 1 will be described. In the substrate processing apparatus 1, the unprocessed substrate W taken out from the carrier C by the indexer robot 12 is transferred to the transport robot TR of the processing block 20. Subsequently, the transport robot TR sequentially transports the substrate W to a plurality of substrate processing units (heat treatment units 21, 22, 23 and the spinner 24), and each substrate processing unit performs a predetermined process on the substrate W. A series of substrate processing for the substrate W proceeds. The substrate W for which a series of substrate processing has been completed is transferred from the transport robot TR to the indexer robot 12 of the indexer block 10 and stored in the carrier C by the indexer robot 12.

  In the course of performing the above series of substrate processing, the transfer robot TR repeats reciprocating movement on the transfer path 30. When the transfer robot TR moves on the transfer path 30, particles may be generated from the drive mechanism (drive motor 36, guide rail 34, and ball screw 35) of the transfer robot TR. For this reason, in the substrate processing apparatus 1, by sending clean air from the upper side to the lower side of the conveyance path 30 and operating the exhaust fan 52 to discharge the atmosphere on the conveyance path 30 from the exhaust port 51, Particles generated from the drive mechanism are discharged out of the apparatus. Hereinafter, the description of the exhaust operation by the five exhaust ports 51a, 51b, 51c, 51d, and 51e will be continued.

  FIG. 3 is a diagram schematically illustrating an exhaust operation when the transport robot TR is located immediately above the exhaust port 51b. Position information of the transport robot TR on the transport path 30 is acquired by the robot controller 91 and transmitted from the robot controller 91 to the upper main controller 92. Based on the position information of the transfer robot TR on the transfer path 30 transmitted from the robot controller 91, the main controller 92 directly transfers the transfer robot TR to any one of the five exhaust ports 51a, 51b, 51c, 51d, 51e. Determine if is located.

  For example, when the transport robot TR is positioned immediately above the exhaust port 51b in the course of the transport operation, the other four exhaust ports 51a, 51c, 51d, 51e except the exhaust port 51b are controlled by the main controller 92. Thus, the exhaust flow rate is set to a reference exhaust flow rate that is a predetermined standard exhaust flow rate. Specifically, the main controller 92 controls the rotational speed of the exhaust fans 52a, 52c, 52d, and 52e so that the exhaust flow rate from the exhaust ports 51a, 51c, 51d, and 51e becomes the reference exhaust flow rate. The reference exhaust flow rate is an exhaust flow rate sufficient to discharge particles from the conveyance path 30 if there is no particular obstacle above the exhaust port 51. Note that when the transfer robot TR is located immediately above the exhaust port 51b, the time when the transfer robot TR is stopped immediately above the exhaust port 51b and when it passes over the exhaust port 51b during movement. This concept includes both of the above, and the same applies to the following.

  On the other hand, the main controller 92 controls the rotational speed of the exhaust fan 52b so that the exhaust flow rate at the exhaust port 51b, which is located immediately below the transfer robot TR, is larger than the reference exhaust flow rate. Even if the transport robot TR exhausts from the exhaust port 51b located immediately above at the reference exhaust flow rate, the transport robot TR itself becomes an obstacle to exhaust and cannot perform smooth exhaust, so that the particles are wound. Rising may occur. As in the present embodiment, by increasing the exhaust flow rate at the exhaust port 51b where the transfer robot TR is located immediately above the exhaust flow rates at the other four exhaust ports 51a, 51c, 51d, 51e, the transfer robot The atmosphere around the TR can be strongly exhausted from the exhaust port 51b, and the rolling-up of particles around the transport robot TR can be prevented.

  Next, FIG. 4 is a diagram schematically illustrating an exhaust operation when the transport robot TR is positioned closer to the exhaust port 51b than the middle between the adjacent exhaust ports 51b and 51c. This figure shows a state in which, for example, the transport robot TR has moved slightly from directly above the exhaust port 51b toward the adjacent exhaust port 51c. In FIG. 4, among the five exhaust ports 51a, 51b, 51c, 51d, 51e, the exhaust port 51b is closest to the position of the transport robot TR on the transport path 30, and the second closest exhaust port is the exhaust port 51b. 51c. Based on the position information on the transfer path 30 of the transfer robot TR transmitted from the robot controller 91, the main controller 92 specifies the exhaust port closest to the position of the transfer robot TR and the second closest exhaust port. In the example of FIG. 4, a single exhaust port 51 c that is second closest to the position of the transport robot TR on the transport path 30 exists. In the example of FIG. 3 described above, there is no second exhaust port that is the second closest to the position of the transfer robot TR (the two exhaust ports 51a and 51c that are the second closest to the position of the transfer robot TR are present). ).

  When the transfer robot TR is located closer to the exhaust port 51b than the middle between the adjacent exhaust ports 51b and 51c, the main controller 92 determines that the exhaust flow rate at the exhaust port 51b closest to the transfer robot TR is the reference exhaust flow rate. The number of rotations of the exhaust fan 52b is controlled so as to be larger. The main controller 92 controls the rotation speed of the exhaust fan 52c so that the exhaust flow rate at the exhaust port 51c closest to the transport robot TR is also larger than the reference exhaust flow rate. However, the main controller 92 controls the rotational speeds of the exhaust fan 52b and the exhaust fan 52c so that the exhaust flow rate at the exhaust port 51b closest to the transfer robot TR is larger than the exhaust flow rate at the second closest exhaust port 51c. To do. The exhaust flow rates at the other three exhaust ports 51a, 51d, and 51e except the exhaust ports 51b and 51c are set to the same reference exhaust flow rate as described above.

  By setting the exhaust flow rate at the exhaust port 51b closest to the transfer robot TR and the exhaust port 51c closest to the second to be higher than the exhaust flow rates at the other three exhaust ports 51a, 51d, 51e, the atmosphere around the transfer robot TR is changed. It is possible to exhaust strongly from the exhaust port 51b and the exhaust port 51c, and to prevent the particles from rolling up around the transfer robot TR. In particular, by making the exhaust flow rate at the exhaust port 51b closest to the transfer robot TR larger than the exhaust flow rate at the second closest exhaust port 51c, it is possible to more effectively prevent the particles from rolling up around the transfer robot TR. Can do.

  Furthermore, FIG. 5 is a diagram schematically illustrating an exhaust operation when the transport robot TR is positioned between the adjacent exhaust ports 51b and 51c. This figure shows a state that occurs in the process in which the transport robot TR moves from directly above the exhaust port 51b toward the adjacent exhaust port 51c. In FIG. 5, of the five exhaust ports 51a, 51b, 51c, 51d, 51e, the two exhaust ports 51b, 51c closest to the position of the transport robot TR on the transport path 30 are the transport robot TR. The distance from the exhaust port 51b to the exhaust port 51c is equal. The main controller 92 specifies the two exhaust ports closest to the position of the transfer robot TR based on the position information on the transfer path 30 of the transfer robot TR transmitted from the robot controller 91. In the example of FIG. 5, there are two exhaust ports closest to the position of the transfer robot TR on the transfer path 30, while no single exhaust port closest to the position of the transfer robot TR exists.

  When the transfer robot TR is positioned between the adjacent exhaust ports 51b and 51c, the main controller 92 determines that the exhaust flow rates at the two exhaust ports 51b and 51c closest to the transfer robot TR are higher than the reference exhaust flow rate. Also, the rotational speed of the exhaust fans 52b and 52c is controlled so as to increase. When the transport robot TR is positioned between the exhaust port 51b and the exhaust port 51c, the exhaust flow rate at the exhaust port 51b is equal to the exhaust flow rate at the exhaust port 51c. That is, under the control of the main controller 92, the rotational speed of the exhaust fan 52b and the rotational speed of the exhaust fan 52c are the same. The exhaust flow rates at the other three exhaust ports 51a, 51d, and 51e except the exhaust ports 51b and 51c are set to the same reference exhaust flow rate as described above.

  By making the exhaust flow rate at the two exhaust ports 51b, 51c closest to the transfer robot TR larger than the exhaust flow rate at the other three exhaust ports 51a, 51d, 51e, the atmosphere around the transfer robot TR is strongly increased. 51 b and the exhaust port 51 c can be exhausted, and the particles can be prevented from rolling up around the transfer robot TR. The above description of FIGS. 3 to 5 is for the case where the transport robot TR is located from directly above the exhaust port 51b to the middle between the exhaust port 51b and the exhaust port 51c. The same applies to the case where it is located in the vicinity of the exhaust port 51.

  In summary, in this embodiment, the exhaust flow rate at the exhaust port closest to the position of the transfer robot TR on the transfer path 30 among the multiple exhaust ports 51a, 51b, 51c, 51d, 51e is the exhaust flow rate at the other exhaust ports. The reference exhaust flow rate is set to be larger. Further, when there is a second closest exhaust port at the position of the transport robot TR on the transport path 30, the exhaust flow rate at the second closest exhaust port is also set to be larger than the reference exhaust flow rate. . However, the exhaust flow rate at the exhaust port closest to the position of the transfer robot TR is larger than the exhaust flow rate at the second closest exhaust port.

  In this way, even if there is a transport robot TR that becomes an obstacle to exhaustion on the transport path 30, the atmosphere around the transport robot TR can be exhausted strongly, and particles are rolled up around the transport robot TR. Can be prevented. As a result, it is possible to prevent particles from adhering to the substrate W transported by the transport robot TR.

  Further, in order to individually adjust the exhaust flow rate at the plurality of exhaust ports 51a, 51b, 51c, 51d, and 51e by the main controller 92, for example, the operation of uniformly adjusting the exhaust flow rate at each exhaust port when the transfer robot TR is replaced. Becomes unnecessary, and the downtime of the substrate processing apparatus 1 can be reduced.

  While the embodiments of the present invention have been described above, the present invention can be modified in various ways other than those described above without departing from the spirit of the present invention. For example, in the above-described embodiment, the five exhaust ports 51a, 51b, 51c, 51d, and 51e are formed below the conveyance path 30, but the number of the exhaust ports 51 is not limited to five. There may be more than one.

  In the above-described embodiment, the five exhaust fans 52a, 52b, 52c, 52d, and 52e are provided in one-to-one correspondence with the five exhaust ports 51a, 51b, 51c, 51d, and 51e. However, the present invention is not limited to this. For example, an exhaust pipe is branched from one exhaust pump to each exhaust port, and a flow rate adjusting valve is provided in each branch pipe to individually control the exhaust flow rate at each exhaust port. Also good.

  Further, in addition to the control of the exhaust flow rate at the exhaust port 51, the air delivery amount from the fan filter unit provided above the transport path 30 may be controlled. That is, if the air delivery amount at the position closest to the position of the transfer robot TR on the transfer path 30 is made larger than that at other positions, it is possible to more effectively prevent the particles from rolling up around the transfer robot TR. .

  The configuration of the substrate processing apparatus 1 is not limited to the form shown in FIGS. 1 and 2, and a transfer path is extended along a plurality of substrate processing units, and a transfer robot TR is placed on the transfer path. Any configuration may be employed as long as the substrate W is provided to each substrate processing unit. Further, as the plurality of substrate processing units, various processing units (for example, a cleaning processing unit, an edge exposure processing unit, etc.) other than those shown in the above embodiment can be incorporated.

DESCRIPTION OF SYMBOLS 1 Substrate processing apparatus 10 Indexer block 11 Mounting table 12 Indexer robot 20 Processing block 21, 22, 23 Heat processing part 24 Spinner 30 Conveyance path 34 Guide rail 35 Ball screw 36 Drive motor 51a, 51b, 51c, 51d, 51e Exhaust port 52a, 52b , 52c, 52d, 52e Exhaust fan 91 Robot controller 92 Main controller TR Transfer robot W Substrate

Claims (3)

A substrate processing apparatus for transferring a substrate to a plurality of substrate processing units and processing the substrate,
A transfer robot installed on a transfer path extending along the plurality of substrate processing units, and transferring a substrate to the plurality of substrate processing units;
A drive mechanism for moving the transfer robot along the transfer path;
A plurality of exhaust portions provided in a one-to-one correspondence with a plurality of exhaust ports formed below the transport path, and exhausting the atmosphere on the transport path through the plurality of exhaust ports;
An exhaust control unit for individually controlling the exhaust flow rates of the plurality of exhaust units;
With
The exhaust control unit includes a first exhaust gas whose exhaust flow rate at an exhaust port closest to the position of the transfer robot on the transfer path is larger than a reference exhaust flow rate that is an exhaust flow rate for the other exhaust ports among the plurality of exhaust ports. A substrate processing apparatus that controls the plurality of exhaust units so as to have a flow rate. The substrate processing apparatus according to claim 1,
The exhaust control unit includes the plurality of exhaust ports so that an exhaust flow rate at an exhaust port second closest to the position of the transfer robot on the transfer path is a second exhaust flow rate larger than the reference exhaust flow rate. A substrate processing apparatus for controlling an exhaust part of the substrate. The substrate processing apparatus according to claim 2,
The substrate processing apparatus, wherein the first exhaust flow rate is larger than the second exhaust flow rate.

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