JP2018104804A5 - - Google Patents
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- JP2018104804A5 JP2018104804A5 JP2016255719A JP2016255719A JP2018104804A5 JP 2018104804 A5 JP2018104804 A5 JP 2018104804A5 JP 2016255719 A JP2016255719 A JP 2016255719A JP 2016255719 A JP2016255719 A JP 2016255719A JP 2018104804 A5 JP2018104804 A5 JP 2018104804A5
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- deposition
- deposition source
- transfer chamber
- source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000008021 deposition Effects 0.000 claims 9
- 239000000463 material Substances 0.000 claims 9
- 230000008020 evaporation Effects 0.000 claims 4
- 238000001704 evaporation Methods 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- 238000010438 heat treatment Methods 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- 229910052582 BN Inorganic materials 0.000 claims 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- 241000287463 Phalacrocorax Species 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 claims 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 1
- 229910002113 barium titanate Inorganic materials 0.000 claims 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims 1
- 230000015572 biosynthetic process Effects 0.000 claims 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 1
- 239000010436 fluorite Substances 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 150000004820 halides Chemical class 0.000 claims 1
- 229910052741 iridium Inorganic materials 0.000 claims 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 239000007769 metal material Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 150000004767 nitrides Chemical class 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 1
- 229910010271 silicon carbide Inorganic materials 0.000 claims 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 1
- 229910052709 silver Inorganic materials 0.000 claims 1
- 239000004332 silver Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
Claims (7)
前記蒸着源は、蒸着材料を有する第１のルツボと、前記第１のルツボを内側に備えた第２のルツボと、を有する製造装置。 A deposition chamber having a deposition source and a means for moving the deposition source,
The deposition source, the first crucible and said first crucible and the second crucible and manufactured by that having a forming device provided inside with an evaporation material.
前記成膜室の少なくとも一は、蒸着源と、前記蒸着源を移動させる手段と、を有し、
前記蒸着源は、蒸着材料を有する第１のルツボと、前記第１のルツボを内側に備えた第２のルツボと、を有する製造装置。 A transfer chamber, a transfer chamber connected to the transfer chamber, and a plurality of film forming chambers connected to the transfer chamber,
At least one of the film formation chambers has an evaporation source and a unit for moving the evaporation source,
The deposition source, the first crucible and said first crucible and the second crucible and manufactured by that having a forming device provided inside with an evaporation material.
前記蒸着源の加熱は、前記第２のルツボに設けられた加熱手段により行う製造装置。 In claim 1 or claim 2,
The heating of the deposition source, the row cormorants manufacturing equipment by a heating means provided in said second crucible.
前記第１のルツボは赤外線放射率の高い材料からなり、
前記第２のルツボは熱伝導率の高い材料からなる製造装置。 In any one of claims 1 to 3,
The first crucible is made of a material having a high infrared emissivity,
Said second crucible Do that production equipment from a material having high thermal conductivity.
前記赤外線放射率の高い材料は、酸化物系のアルミナ、ジルコニア、チタン酸バリウム、炭化物系の炭化ケイ素、窒化物系の窒化ケイ素、窒化アルミニウム、窒化ホウ素、ハロゲン化物系の蛍石、あるいはそれらの材質の複合体である製造装置。 In claim 4,
The material having a high infrared emissivity is oxide-based alumina, zirconia, barium titanate, carbide-based silicon carbide, nitride-based silicon nitride, aluminum nitride, boron nitride, halide-based fluorite, or a mixture thereof. complexes der Ru manufacturing equipment material.
前記熱伝導率の高い材料は、銀、銅、金、白金、アルミニウム、チタン、鉄、ニッケル、イリジウム等の金属材料、またはそれらの合金である製造装置。 In claim 4 or claim 5,
The thermal conductivity of high index material, silver, copper, gold, platinum, aluminum, titanium, iron, nickel, a metal material such as iridium or alloys thereof der Ru manufacturing equipment.
前記第１のルツボと、前記第１のルツボと同様に蒸着材料を有する別の第１のルツボとを交換することによって、前記蒸着源の蒸着材料を交換する製造装置。 In any one of claims 1 to 6,
Wherein the first crucible, said by exchanging with another first crucible having a first crucible as well as the deposition material, the deposition source forming device made to be replaced deposition material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016255719A JP2018104804A (en) | 2016-12-28 | 2016-12-28 | Manufacturing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016255719A JP2018104804A (en) | 2016-12-28 | 2016-12-28 | Manufacturing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2018104804A JP2018104804A (en) | 2018-07-05 |
| JP2018104804A5 true JP2018104804A5 (en) | 2020-02-06 |
Family
ID=62786765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016255719A Withdrawn JP2018104804A (en) | 2016-12-28 | 2016-12-28 | Manufacturing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2018104804A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7444843B2 (en) | 2021-12-02 | 2024-03-06 | キヤノントッキ株式会社 | Deposition crucible and deposition equipment |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02247374A (en) * | 1989-03-20 | 1990-10-03 | Hitachi Ltd | Crucible for evaporation source and thin film formation using same |
| JP3817054B2 (en) * | 1998-02-06 | 2006-08-30 | 株式会社アルバック | Vapor source crucible and vapor deposition apparatus |
| JP4373235B2 (en) * | 2003-02-14 | 2009-11-25 | 株式会社半導体エネルギー研究所 | Film forming apparatus and film forming method |
| JP2012172185A (en) * | 2011-02-21 | 2012-09-10 | Mitsubishi Heavy Ind Ltd | Vapor deposition container, and vapor deposition device provided with the same |
| JP2014031547A (en) * | 2012-08-03 | 2014-02-20 | Canon Tokki Corp | Vapor deposition device and vapor deposition method |
-
2016
- 2016-12-28 JP JP2016255719A patent/JP2018104804A/en not_active Withdrawn
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