JP2018086732A - Double-sided Conductive Film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a double-sided conductive film capable of suppressing blocking of end parts.SOLUTION: A double-sided electroconductive film 1 is a film extended in a longitudinal direction, which includes a first conductive metal layer 6A, a first hard coat layer 3A, a transparent substrate 2, and a second conductive metal layer 6B in order. In the double-sided conductive film 1, the first hard coat layer 3A includes a first end part 7 that is sectioned at least in one side end part out of both end parts in a lateral direction. The maximum thickness of the first end part 7 is thinner than the average thickness of the first hard coat layer 3A.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a double-sided conductive film, and more particularly to a double-sided conductive film used for a film for a touch panel.

  Conventionally, it is known that an image display device includes a film for a touch panel on which a transparent conductive layer made of indium tin composite oxide (ITO) or the like is formed. In recent years, in such a transparent conductive film, there is a double-sided conductive film in which a copper layer is further provided on the surface of the ITO layer in order to achieve a narrow frame by forming a lead-out wiring at the outer edge of the touch input region. It has been proposed (see, for example, Patent Document 1).

  Patent Document 1 has a first hard coat layer, a first transparent conductor layer, and a first metal layer on one side of an amorphous polymer film, and a second hard coat on the other side of the amorphous polymer film. It has a coat layer, a second transparent conductor layer, and a second metal layer.

JP 2013-107349 A

  Generally, a double-sided conductive film is manufactured using a roll-to-roll process while winding it into a roll as a long film. For this reason, in the roll-shaped film wound up, the malfunction (blocking) which the one side of a double-sided conductive film crimps | bonds with the other side of the double-sided conductive film laminated | stacked mutually arises. In particular, in a film having a copper layer on both sides, it is necessary to form a copper layer in a vacuum, and the copper layer has poor surface slipperiness. For this reason, when the film is placed in an atmospheric pressure environment after film formation, the double-sided conductive films are further pressure-bonded to each other and blocking occurs.

  On the other hand, in patent document 1, blocking is suppressed by making a hard-coat layer contain binder resin and a some particle | grain.

  However, in Patent Document 1, blocking at the center in the width direction is suppressed, but blocking property generated at the end in the width direction of the roll film (hereinafter referred to as “end blocking”) has not been studied. There is room for improvement.

  In particular, in recent years, there is a demand for an increase in roll size (roll diameter, roll width, specifically, for example, a width of 1300 mm or more). Blocking is more likely to occur.

  The objective of this invention is providing the double-sided conductive film which can suppress edge part blocking.

  The present invention [1] is a double-sided conductive film comprising a first conductive metal layer, a first hard coat layer, a transparent substrate, and a second conductive metal layer in order, and extending in the longitudinal direction. 1 hard coat layer has a first end portion defined at at least one side end portion of both ends in the orthogonal direction orthogonal to both the longitudinal direction and the thickness direction, and the maximum thickness of the first end portion is A double-sided conductive film lower than the average thickness of the first hard coat layer is included.

  The present invention [2] includes the double-sided conductive film according to [1], wherein the thickness of the first end portion monotonously decreases toward the one side in the orthogonal direction.

In the present invention [3], the average thickness of the first hard coat layer is 3.0 μm or less,
The first hard coat layer has a second end portion that is partitioned in a range of 10 mm from the edge on the one side in the orthogonal direction to the other side in the orthogonal direction, and the maximum thickness of the second end portion is the first thickness The double-sided conductive film according to [1] or [2], which is 1.2 times or less the average thickness of one hard coat layer.

  This invention [4] contains the double-sided conductive film as described in any one of [1]-[3] whose said 1st conductive metal layer and said 2nd conductive metal layer are copper layers.

  The present invention [5] further includes a second hard coat layer disposed between the transparent substrate and the second conductive metal layer, wherein the second hard coat layer is at least at both ends in the orthogonal direction. Any one of [1] to [4], which has a third end section defined on one side end section, and the maximum thickness of the third end section is lower than the average thickness of the second hard coat layer. The double-sided conductive film described in 1. is included.

  In the invention [6], the average thickness of the second hard coat layer is 3.0 μm or less, and the second hard coat layer is within a range of 10 mm from the edge on one side in the orthogonal direction to the other side in the orthogonal direction. The double-sided conductive film according to [5], wherein the double-sided conductive film according to [5] has a fourth end portion that is divided into two portions, and the maximum thickness of the fourth end portion is 1.2 times or less the average thickness of the second hard coat layer. Contains.

  The present invention [7] includes a first transparent conductive layer disposed between the first conductive metal layer and the first hard coat layer, and between the first conductive metal layer and the second hard coat layer. The double-sided conductive film according to [5] or [6], further including a second transparent conductive layer disposed on the surface.

  This invention [8] contains the double-sided conductive film as described in any one of [1]-[7] wound by roll shape.

  The double-sided conductive film of the present invention can suppress end blocking.

FIG. 1 shows a side sectional view of an embodiment of the double-sided conductive film of the present invention. FIG. 2 shows a side sectional view of the double-sided conductive film shown in FIG. FIG. 3 is a side sectional view of a laminate of a transparent substrate and a hard coat layer in the double-sided conductive film shown in FIG. FIG. 4 shows a part of the manufacturing process of the double-sided conductive film shown in FIG. FIG. 5: shows the sectional side view of other embodiment (The form which a 2nd edge part has a convex part) of the double-sided conductive film of this invention. FIG. 6 is a side sectional view of a partial laminate of a transparent substrate and a hard coat layer in the double-sided conductive film shown in FIG. FIG. 7 shows a side sectional view of another embodiment of the double-sided conductive film of the present invention (a form in which the first end is cut out in a substantially rectangular shape). FIG. 8 shows a side sectional view of a partial laminate of a transparent substrate and a hard coat layer in the double-sided conductive film shown in FIG. FIG. 9 shows a graph in which the thickness of the first end portion in Examples and Comparative Examples is plotted.

  In FIG. 2, the vertical direction of the paper is the vertical direction (thickness direction, first direction), the upper side of the paper is the upper side (one side in the thickness direction, the first direction), and the lower side of the paper is the lower side (thickness direction). The other side, the other side in the first direction). The paper thickness direction is the longitudinal direction (conveying direction, second direction, direction perpendicular to the vertical direction), the front side of the paper is the one side in the longitudinal direction (downstream side in the conveying direction, one side in the second direction), and the back side of the paper is This is the other side in the longitudinal direction (the upstream side in the transport direction, the other side in the second direction). The left-right direction on the paper is the left-right direction (the orthogonal direction orthogonal to both the width direction, the third direction, the longitudinal direction, and the up-down direction), and the left side of the paper is the left side (one side in the width direction, one side in the third direction) The right side is the right side (the other side in the width direction, the other side in the third direction). Specifically, it conforms to the direction arrow in each figure. Other drawings also conform to FIG.

1. Double-sided conductive film The double-sided conductive film 1 has, for example, a film shape (including a sheet shape) extending in the longitudinal direction and having a predetermined thickness, as shown in FIG. The film shape is defined as a thin plate shape having a flat upper surface and a flat lower surface (hereinafter the same). The double-sided conductive film 1 is wound in a roll shape.

  The double-sided conductive film 1 is, for example, a component such as a base material for a touch panel provided in the image display device, that is, not an image display device. That is, the double-sided conductive film 1 is a component for producing an image display device and the like, does not include an image display element such as an LCD module, and includes a transparent substrate 2, a hard coat layer 3, and an optical adjustment layer 4 described later. The device is composed of a transparent conductive layer 5 and a conductive metal layer 6, and is a device that can be distributed industrially and used industrially.

  Specifically, as shown in FIG. 2, the double-sided conductive film 1 includes a transparent substrate 2, a hard coat layer 3, an optical adjustment layer 4, a transparent conductive layer 5, and a conductive metal layer on both sides thereof. 6 in order. More specifically, the double-sided conductive film 1 is formed on the transparent substrate 2, the first hard coat layer 3A disposed on the upper surface (one surface) of the transparent substrate 2, and the upper surface of the first hard coat layer 3A. The first optical adjustment layer 4A disposed, the first transparent conductive layer 5A disposed on the upper surface of the first optical adjustment layer 4A, and the first conductive metal layer 6A disposed on the upper surface of the first transparent conductive layer 5A The second hard coat layer 3B disposed on the lower surface (the other surface) of the transparent substrate 2, the second optical adjustment layer 4B disposed on the lower surface of the second hard coat layer 3B, and the second optical adjustment layer 4B. A second transparent conductive layer 5B disposed on the lower surface and a second conductive metal layer 6B disposed on the lower surface of the second transparent conductive layer 5B are provided. That is, the double-sided conductive film 1 includes, in order from the bottom, the second conductive metal layer 6B, the second transparent conductive layer 5B, the second optical adjustment layer 4B, the second hard coat layer 3B, the transparent substrate 2, and the first hard coat. A layer 3A, a first optical adjustment layer 4A, a first transparent conductive layer 5A, and a first conductive metal layer 6A are provided.

  The double-sided conductive film 1 preferably has a transparent substrate 2, a hard coat layer 3 (first hard coat layer 3A and second hard coat layer 3B), and an optical adjustment layer 4 (first optical adjustment layer 4A and first hard coat layer 3A). 2 optical adjustment layer 4B), transparent conductive layer 5 (first transparent conductive layer 5A and second transparent conductive layer 5B), and conductive metal layer 6 (first conductive metal layer 6A and second conductive metal layer 6B). Become. Hereinafter, each layer will be described in detail.

2. Transparent base material The transparent base material 2 is a base material which ensures the mechanical strength of the double-sided conductive film 1. The transparent substrate 2 supports the transparent conductive layer 5 and the conductive metal layer 6 together with the hard coat layer 3 and the optical adjustment layer 4.

  The transparent substrate 2 is a polymer film having transparency, for example. Examples of the material of the polymer film include polyester resins such as polyethylene terephthalate (PET), polybutylene terephthalate, and polyethylene naphthalate, for example, (meth) acrylic resins (acrylic resin and / or methacrylic resin) such as polymethacrylate, Olefin resins such as polyethylene, polypropylene, cycloolefin polymer (COP), for example, polycarbonate resin, polyether sulfone resin, polyarylate resin, melamine resin, polyamide resin, polyimide resin, cellulose resin, polystyrene resin, norbornene resin, etc. It is done. The polymer film can be used alone or in combination of two or more.

  From the viewpoint of transparency, heat resistance, mechanical strength, and the like, preferably, an olefin resin is used, and more preferably, COP is used.

  The thickness of the transparent substrate 2 is, for example, 2 μm or more, preferably 20 μm or more, from the viewpoint of mechanical strength, scratch resistance, and dot characteristics when the double-sided conductive film 1 is used as a touch panel film. For example, it is 300 μm or less, preferably 150 μm or less.

  The thickness of the transparent substrate 2 can be measured using, for example, a micro gauge thickness gauge.

  The distance (width) in the left-right direction of the transparent substrate 2 and thus the entire double-sided conductive film 1 is, for example, 1300 mm or more, preferably 1597 mm or more, and, for example, 2000 mm or less, preferably 1610 mm or less, more preferably. Is 1603 mm or less.

  In addition, the easily bonding layer, the adhesive bond layer, the separator, etc. may be provided in the upper surface and / or lower surface of the transparent base material 2 as needed.

3. First Hard Coat Layer When the first hard coat layer 3A is formed by laminating a plurality of double-sided conductive films 1, the surface of the double-sided conductive film 1 (that is, the top surface of the first conductive metal layer 6A and the second This is a scratch protective layer for making it difficult to cause scratches on the lower surface of the conductive metal layer 6B. It is also an anti-blocking layer for imparting blocking resistance to the double-sided conductive film 1.

  The first hard coat layer 3 </ b> A has a film shape, and is disposed, for example, on the entire upper surface of the transparent substrate 2 so as to be in contact with the upper surface of the transparent substrate 2. More specifically, the first hard coat layer 3A is in contact with the upper surface of the transparent substrate 2 and the lower surface of the first optical adjustment layer 4A between the transparent substrate 2 and the first optical adjustment layer 4A. Have been placed.

  The first hard coat layer 3 </ b> A includes a first end portion 7 and a first central portion 8.

  The first end 7 is partitioned at both ends in the left-right direction (width direction). That is, the first end portion 7 includes a first left end portion 7a defined by a left end portion (one side end portion) and a first right end portion 7b defined by a right end portion (the other end portion). ing.

  The thickness of the first end portion 7 monotonously decreases toward the edge in the left-right direction. That is, the thickness of the first left end portion 7a monotonously decreases toward the left side, and the thickness of the first right end portion 7b monotonously decreases toward the right side. That is, the first hard coat layer 3 </ b> A has a chamfered shape in which the upper end portion of the left and right direction end portions is cut out in a substantially triangular shape in a longitudinal sectional view.

  The maximum thicknesses of the first left end portion 7a and the first right end portion 7b are respectively lower than the average thickness (described later) of the first hard coat layer 3A. Specifically, for example, it is 2.5 μm or less, preferably 2.0 μm or less, more preferably 1.5 μm or less, and for example, 0.1 μm or more, preferably 0.5 μm or more.

  The width of the first left end portion 7a and the first right end portion 7b (the distance in the left-right direction from the edge) is set to 100, for example, when the distance in the left-right direction of the first hard coat layer 3A (the entire width) is 100. 1 or more, preferably 0.2 or more, for example, 1.0 or less, preferably 0.5 or less. More specifically, each of these widths is, for example, 3 mm or more, preferably 5 mm or more, and for example, 10 mm or less, preferably 7 mm or less. Most preferably, it is 6 mm.

  The average thickness of each of the first left end 7a and the first right end 7b is, for example, 2.0 μm or less, preferably 1.5 μm or less, more preferably 1.2 μm or less. It is 1 μm or more, preferably 0.5 μm or more.

  The maximum thickness of the first end portion 7 is the maximum thickness when the thickness of the first hard coat layer 3A is measured at an interval of 1 mm from the edge toward the inner side in the left-right direction (excluding the edge (position of 0 mm)). . The average thickness of the first end 7 is an average value when the thickness of the first hard coat layer 3A is measured at an interval of 1 mm from the edge toward the inner side in the left-right direction (edge (position of 0 mm) is except).

  The first central portion 8 is partitioned adjacent to the first end portion 7. That is, the 1st center part 8 is divided between the 1st left end part 7a and the 1st right end part 7b so that these may be adjoined (continuous). The average thickness of the first central portion 8 is substantially the same as the average thickness of the first hard coat layer 3A.

  The average thickness of the first hard coat layer 3A is the average thickness in the entire left-right direction (the entire width) of the first hard coat layer 3A, and is, for example, 3.0 μm or less, preferably 2.0 μm or less, more preferably 1.8 μm or less, and for example, 0.7 μm or more, preferably 1.0 μm or more.

  As for the average thickness of the first hard coat layer 3A, 10 points are selected at the center in the left-right direction so as to be equidistant from the left end edge to the right end edge of the double-sided conductive film 1, and the first hard coat layer 3A at the 10 points. It is obtained by measuring the thickness and calculating the average value of 10 thicknesses.

  The thickness at each measurement point of the first hard code layer 3 can be calculated based on the waveform of the interference spectrum using an instantaneous multi-photometry system (“MCPD2000” manufactured by Otsuka Electronics Co., Ltd.).

  Moreover, the 2nd end part 9 is divided in the left-right direction both ends of 3 A of 1st hard-coat layers. The second end portion 9 is a section including the entire first end portion 7 and a part of the first central portion 8 (left end portion or right end portion). The second left end portion 9a and the second right end portion 9b are Have.

  The second left end portion 9a is partitioned with a width of 10 mm in the right direction from the left end edge so as to include the entire first left end portion 7a and the left end portion of the first central portion 8 at the left end portion.

  The second right end portion 9b is partitioned with a width of 10 mm in the left direction from the right end edge so as to include the entire first right end portion 7b and the right end portion of the first central portion at the right end portion.

  The maximum thickness of the second left end portion 9a and the second right end portion 9b is, for example, 1.2 times or less, preferably 1.0 times or less, with respect to the average thickness of the first hard coat layer 3A. For example, it is 0.1 times or more, preferably 0.5 times or more.

  The average thickness of the second left end portion 9a and the second right end portion 9b is, for example, 2.0 μm or less, preferably 1.5 μm or less, more preferably 1.3 μm or less. It is 1 μm or more, preferably 0.5 μm or more.

  The maximum thickness of the second end portion 9 is the maximum thickness when the thickness of the first hard coat layer 3A is measured in a range of 10 mm at an interval of 1 mm from the edge toward the inner side in the left-right direction (the edge (position of 0 mm ) Is excluded). The average thickness of the second end portion 9 is an average value when the thickness of the first hard coat layer 3A is measured within a range of 10 mm at intervals of 1 mm from the edge toward the inner side in the left-right direction (edge (0 mm Excluding position)).

  The first hard coat layer 3A is formed from, for example, a hard coat composition.

  The hard coat composition contains a resin, and preferably comprises a resin.

  Examples of the resin include a curable resin and a thermoplastic resin (for example, a polyolefin resin), and a curable resin is preferable.

  Examples of the curable resin include an active energy ray-curable resin that is cured by irradiation with active energy rays (specifically, ultraviolet rays, electron beams, etc.), for example, a thermosetting resin that is cured by heating, and the like. Preferably, an active energy ray curable resin is used.

  Examples of the active energy ray-curable resin include a polymer having a functional group having a polymerizable carbon-carbon double bond in the molecule. Examples of such a functional group include a vinyl group and a (meth) acryloyl group (methacryloyl group and / or acryloyl group).

  Specific examples of the active energy ray curable resin include (meth) acrylic ultraviolet curable resins such as urethane acrylate and epoxy acrylate.

  Examples of the curable resin other than the active energy ray curable resin include urethane resin, melamine resin, alkyd resin, siloxane polymer, and organic silane condensate.

  The resins can be used alone or in combination of two or more.

  The hard coat composition can contain particles.

  Examples of the particles include inorganic particles and organic particles. Examples of the inorganic particles include silica particles, for example, metal oxide particles made of zirconium oxide, titanium oxide, zinc oxide, tin oxide, and the like, for example, carbonate particles such as calcium carbonate. Examples of the organic particles include crosslinked acrylic resin particles. The particles can be used alone or in combination of two or more.

  The particles are preferably organic particles, more preferably crosslinked acrylic resin particles, from the viewpoint of suppressing blocking at the center in the left-right direction.

  Examples of the shape of the particles include a spherical shape, a plate shape, a needle shape, and a crushed shape, and preferably a spherical shape.

  The mode particle diameter of the particles is, for example, 0.5 μm or more, preferably 1.0 μm or more, and, for example, 2.5 μm or less, preferably 1.5 μm or less.

  The mode particle diameter refers to a particle diameter showing the maximum value of the particle distribution. For example, using a flow particle image analyzer (manufactured by Sysmex, product name “FPTA-3000S”), a predetermined condition (Sheath liquid: (Ethyl acetate, measurement mode: HPF measurement, measurement method: total count). As the measurement sample, particles obtained by diluting the particles to 1.0% by weight with ethyl acetate and uniformly dispersing them using an ultrasonic cleaner are used.

  The content ratio of the particles is, for example, 0.01 parts by mass or more, preferably 0.02 parts by mass or more, and for example, 5 parts by mass or less, preferably 1 part by mass with respect to 100 parts by mass of the resin. It is as follows.

  The hard coat composition can further contain known additives such as a leveling agent, a thixotropic agent, and an antistatic agent.

4). First Optical Adjustment Layer The first optical adjustment layer 4A is a double-sided conductive film 1 in order to ensure excellent transparency in the double-sided conductive film 1 while suppressing the visual recognition of the wiring pattern in the first transparent conductive layer 5A. It is a layer for adjusting the optical physical properties (for example, refractive index).

  The first optical adjustment layer 4A has a film shape, and is disposed, for example, on the entire upper surface of the first hard coat layer 3A so as to be in contact with the upper surface of the first hard coat layer 3A. More specifically, the first optical adjustment layer 4A includes an upper surface of the first hard coat layer 3A and a lower surface of the first transparent conductive layer 5A between the first hard coat layer 3A and the first transparent conductive layer 5A. It is arranged to come into contact.

  The first optical adjustment layer 4A is disposed along the surface shape of the first hard coat layer 3A. Specifically, the first optical adjustment layer 4A is substantially uniform in the thickness direction, the central portion in the left-right direction extends linearly in the left-right direction, and the both ends in the left-right direction move toward the respective edges. It has a shape that goes straight down to intersect the direction.

  The first optical adjustment layer 4A is formed from an optical adjustment composition.

  The optical adjustment composition contains, for example, a resin. The optical adjustment composition preferably contains a resin and particles, and more preferably consists of a resin and particles.

  Although it does not specifically limit as resin, The same thing as resin used with a hard-coat composition is mentioned. The resins can be used alone or in combination of two or more. Preferably, a curable resin, more preferably an active energy ray curable resin is used.

  The content ratio of the resin is, for example, 10% by mass or more, preferably 25% by mass or more, and, for example, 95% by mass or less, preferably 60% by mass or less with respect to the optical adjustment composition.

  As the particles, a suitable material can be selected according to the refractive index required by the first optical adjustment layer 4A, and examples thereof include inorganic particles and organic particles. Examples of the inorganic particles include silica particles, for example, metal oxide particles made of zirconium oxide, titanium oxide, zinc oxide, oxidation, and the like, for example, carbonate particles such as calcium carbonate. Examples of the organic particles include crosslinked acrylic resin particles. The particles can be used alone or in combination of two or more.

The particles are preferably inorganic particles, more preferably metal oxide particles, and still more preferably zirconium oxide particles (ZnO ₂ ).

  The average particle diameter (median diameter) of the particles is, for example, 10 nm or more, preferably 20 nm or more, and for example, 100 nm or less, preferably 50 nm or less.

  The content ratio of the particles is, for example, 5% by mass or more, preferably 40% by mass or more, and, for example, 90% by mass or less, preferably 75% by mass or less with respect to the optical adjustment composition.

  The refractive index of the first optical adjustment layer 4A is, for example, 1.50 or more, preferably 1.60 or more, and for example, 1.80 or less, preferably 1.75 or less.

  The refractive index can be measured by, for example, an Abbe refractometer.

  The thickness of the first optical adjustment layer 4A is, for example, 50 nm or more, preferably 75 nm or more, and, for example, 300 nm or less, preferably 200 nm or less. By setting the thickness of the first optical adjustment layer 4A within the above range, the first optical adjustment layer 4A can be formed with a uniform thickness so as to follow the surface shape of the first hard coat layer 3A.

  The thickness of the first optical adjustment layer 4A can be measured by, for example, a spectroscopic ellipsometer.

5. First Transparent Conductive Layer The first transparent conductive layer 5A is a transparent conductive layer that is formed in a wiring pattern in a subsequent process, for example, to form a pattern portion in a touch input region of a touch panel.

  The first optical adjustment layer 4A has a film shape. For example, the first optical adjustment layer 4A is disposed on the entire upper surface of the first optical adjustment layer 4A so as to be in contact with the upper surface of the first optical adjustment layer 4A. More specifically, the first transparent conductive layer 5A includes an upper surface of the first optical adjustment layer 4A and a lower surface of the first conductive metal layer 6A between the first optical adjustment layer 4A and the first conductive metal layer 6A. It is arranged to come into contact.

  The first transparent conductive layer 5A is disposed along the surface shape of the first optical adjustment layer 4A. Specifically, the first transparent conductive layer 5A is formed in substantially the same shape as the first hard coat layer 3A. That is, the first transparent conductive layer 5A is substantially uniform in the thickness direction, the center portion in the left-right direction extends linearly in the left-right direction, and intersects the left-right direction as both end portions in the left-right direction go to the respective edges. As shown, it has a shape that goes straight down.

  The material of the first transparent conductive layer 5A is, for example, at least selected from the group consisting of In, Sn, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, and W. A metal oxide containing one kind of metal can be given. If necessary, the metal oxide may be further doped with a metal atom shown in the above group.

  Examples of the material of the first transparent conductive layer 5A include indium-containing oxides such as indium tin composite oxide (ITO), for example, antimony-containing oxides such as antimony tin composite oxide (ATO), and the like. Indium-containing oxides, more preferably ITO.

When ITO is used as the material of the first transparent conductive layer 5A, the tin oxide (SnO ₂ ) content is, for example, 0.5% by mass or more with respect to the total amount of tin oxide and indium oxide (In ₂ O ₃ ). The amount is preferably 3% by mass or more, and for example, 15% by mass or less, preferably 13% by mass or less. By setting the content of tin oxide to the above lower limit or more, the durability of the ITO layer can be further improved. By making the content of tin oxide not more than the above upper limit, crystal conversion of the ITO layer can be facilitated, and the stability of transparency and specific resistance can be improved.

  “ITO” in this specification may be a composite oxide containing at least indium (In) and tin (Sn), and may contain additional components other than these. Examples of the additional component include metal elements other than In and Sn. Specifically, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, W, Fe , Pb, Ni, Nb, Cr, Ga and the like.

  The thickness of 5 A of 1st transparent conductive layers is 10 nm or more, for example, Preferably, it is 20 nm or more, for example, is 50 nm or less, Preferably, it is 30 nm or less. By setting the thickness of the first transparent conductive layer 5A within the above range, the first transparent conductive layer 5A can be formed with a uniform thickness so as to follow the surface shape of the first optical adjustment layer 4A.

  The thickness of the first transparent conductive layer 5A can be measured by, for example, fluorescent X-rays or a spectroscopic ellipsometer.

  The first transparent conductive layer 5A may be crystalline or amorphous, or may be a mixture of crystalline and amorphous. The first transparent conductive layer 5A is preferably made of a crystalline material, more specifically, a crystalline ITO layer. Thereby, the transparency of the first transparent conductive layer 5A can be improved, and the specific resistance value of the first transparent conductive layer 5A can be further reduced.

  The fact that the first transparent conductive layer 5A is crystalline means that, for example, when the first transparent conductive layer 5A is an ITO layer, it is immersed in hydrochloric acid (concentration 5% by mass) at 20 ° C. for 15 minutes, then washed and dried. It can be determined by measuring the resistance between terminals of about 15 mm. In this specification, the ITO layer is assumed to be crystalline when the resistance between terminals of 15 mm is 10 kΩ or less after immersion, washing and drying in hydrochloric acid (20 ° C., concentration: 5 mass%).

6). First Conductive Metal Layer The first conductive metal layer 6A is formed into a wiring pattern in a later process, and for example, a conductive material for forming a pattern portion (for example, a lead wiring) on the outer edge of the touch input region of the touch panel. Is a layer.

  The first conductive metal layer 6A is the uppermost layer of the double-sided conductive film 1, has a film shape, and contacts the upper surface of the first transparent conductive layer 5A over the entire upper surface of the first transparent conductive layer 5A. So that it is arranged.

  The first conductive metal layer 6A is disposed along the surface shape of the first transparent conductive layer 5A. Specifically, the first conductive metal layer 6A is formed in substantially the same shape as the first transparent conductive layer 5A. That is, the first conductive metal layer 6A is substantially uniform in the thickness direction, the center portion in the left-right direction extends linearly in the left-right direction, and intersects the left-right direction as both end portions in the left-right direction go to the respective edge. As shown, it has a shape that goes straight down.

  Examples of the material of the first conductive metal layer 6A include metals such as copper, silver, gold, nickel, and alloys thereof. In addition, the metal oxides mentioned in the first transparent conductive layer 5A can also be used.

  From the viewpoint of conductivity and the like, copper and silver are preferable, and copper is more preferable.

  When the first conductive metal layer 6A is a material that easily oxidizes, such as copper, the surface of the first conductive metal layer 6A may be oxidized. Specifically, when the first conductive metal layer 6A is a copper layer, the first conductive metal layer 6A may be a copper layer including copper oxide on a part or all of the surface.

  The thickness of the first conductive metal layer 6A is, for example, 10 nm or more, preferably 20 nm or more, more preferably 25 nm or more, and for example, 300 nm or less, preferably 250 nm or less. By setting the thickness of the first conductive metal layer 6A within the above range, the first conductive metal layer 6A can be formed with a uniform thickness so as to follow the surface shape of the first transparent conductive layer 5A.

  The thickness of the first conductive metal layer 6A can be measured by, for example, fluorescent X-rays or a spectroscopic ellipsometer.

7). Second Hard Coat Layer The second hard coat layer 3 </ b> B is disposed on the entire lower surface of the transparent substrate 2 so as to be in contact with the lower surface of the transparent substrate 2. More specifically, the second hard coat layer 3B is in contact with the lower surface of the transparent substrate 2 and the upper surface of the second optical adjustment layer 4B between the transparent substrate 2 and the second optical adjustment layer 4B. Have been placed.

  The second hard coat layer 3B is the same layer as the first hard coat layer 3A, and has the same configuration, for example, from the same material as the first hard coat layer 3A. Therefore, the second hard coat layer 3B also has a third end portion 10 (third left end portion 10a, third right end portion 10b) having the same shape and the same dimensions as the first end portion 7, and the first central portion 8. The second central portion 11 has the same shape and the same dimensions as the second end portion 9, and the fourth end portion 12 has the same shape and the same dimensions as the second end portion 9 (the fourth left end portion 12a and the fourth right end portion 12b). doing. As an example, the average thickness of the second hard coat layer 3B is, for example, 3.0 μm or less, and the maximum thickness of the third end portion 10 is lower than the average thickness of the second hard coat layer 3B. The maximum thickness of 12 is, for example, 1.2 times or less the average thickness of the second hard coat layer 3B.

8). Second Optical Adjustment Layer The second optical adjustment layer 4B is disposed on the entire lower surface of the second hard coat layer 3B so as to be in contact with the lower surface of the second hard coat layer 3B. More specifically, the second optical adjustment layer 4B includes a lower surface of the second hard coat layer 3B and an upper surface of the second transparent conductive layer 5B between the second hard coat layer 3B and the second transparent conductive layer 5B. It is arranged to come into contact.

  The second optical adjustment layer 4B is the same layer as the first optical adjustment layer 4A, and has, for example, the same configuration from the same material as the first optical adjustment layer 4A. Therefore, the second optical adjustment layer 4B also has the same shape and the same dimensions as the first optical adjustment layer 4A.

9. Second Transparent Conductive Layer The second transparent conductive layer 5B is disposed on the entire lower surface of the second optical adjustment layer 4B so as to be in contact with the lower surface of the second optical adjustment layer 4B. More specifically, the second transparent conductive layer 5B includes a lower surface of the second optical adjustment layer 4B and an upper surface of the second conductive metal layer 6B between the second optical adjustment layer 4B and the second conductive metal layer 6B. It is arranged to come into contact.

  The second transparent conductive layer 5B is the same layer as the first transparent conductive layer 5A, and has the same configuration, for example, from the same material as the first transparent conductive layer 5A. Therefore, the second transparent conductive layer 5B also has the same shape and the same dimensions as the first transparent conductive layer 5A.

10. Second conductive metal layer The second conductive metal layer 6B is the lowermost layer of the double-sided conductive film 1, and is in contact with the lower surface of the second transparent conductive layer 5B on the entire lower surface of the second transparent conductive layer 5B. Has been placed.

  The second conductive metal layer 6B is the same layer as the first conductive metal layer 6A, and has, for example, the same configuration from the same material as the first conductive metal layer 6A. Therefore, the second conductive metal layer 6B also has the same shape and the same dimensions as the first conductive metal layer 6A.

11. Manufacturing method of double-sided conductive film To manufacture double-sided conductive film 1, for example, in a roll-to-roll process, hard coat layer 3, optical adjustment layer 4, transparent conductive layer 5, and conductive on both sides of transparent substrate 2. The metal layer 6 is provided in order. That is, while the transparent base material 2 that is long in the longitudinal direction is fed from the feed roll and transported downstream in the transport direction, the first hard coat layer 3A is formed on the top surface of the transparent base material 2, and the second hard coat layer is formed on the bottom surface thereof. 3B, then, the first optical adjustment layer 4A is provided on the upper surface of the first hard coat layer 3A, the second optical adjustment layer 4B is provided on the lower surface of the second hard coat layer 3B, and then the upper surface of the first optical adjustment layer 4A. The second transparent conductive layer 5B is provided on the lower surface of the first transparent conductive layer 5A and the second optical adjustment layer 4B, and then the first conductive metal layer 6A and the second transparent conductive layer 5B are provided on the upper surface of the first transparent conductive layer 5A. The 2nd conductive metal layer 6B is provided in the lower surface, and the double-sided conductive film 1 is wound up with a winding roll. Details will be described below.

  First, the long transparent base material 2 wound by the sending roll is prepared, and the transparent base material 2 is conveyed toward the conveyance downstream side so that it may be wound by the sending roll.

  Then, from the viewpoint of adhesion between the transparent base material 2 and the hard coat layer 3, for example, sputtering, corona discharge, flame, ultraviolet irradiation, electron beam irradiation, chemical conversion, Etching such as oxidation or undercoating can be performed. Moreover, the transparent base material 2 can be dust-removed and cleaned by solvent cleaning, ultrasonic cleaning, or the like.

  Next, hard coat layers 3 are provided on both surfaces of the transparent substrate 2. For example, wet coating of the hard coat composition on both surfaces of the transparent substrate 2 forms the first hard coat layer 3A on the upper surface of the transparent substrate 2 and the second hard coat layer 3B on the lower surface of the transparent substrate 2. To do.

  Specifically, for example, a coating solution obtained by diluting the hard coat composition with a solvent is prepared, and subsequently, the coating solution is applied to both surfaces of the transparent substrate 2 to form the hard coat coating film 13. Dry the coating solution.

  Examples of the solvent include an organic solvent and an aqueous solvent (specifically, water), and an organic solvent is preferable. Examples of the organic solvent include alcohol compounds such as methanol, ethanol, and isopropyl alcohol; ketone compounds such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; ester compounds such as ethyl acetate and butyl acetate; and propylene glycol monomethyl ether. Examples of the ether compound include aromatic compounds such as toluene and xylene. These solvents can be used alone or in combination of two or more. Preferably, an ester compound and an ether compound are used.

  The solid content concentration in the coating solution is, for example, 1% by mass or more, preferably 10% by mass or more, and for example, 30% by mass or less, preferably 20% by mass or less.

  As a coating method, it can select suitably according to a coating liquid and the transparent base material 2. FIG. Examples include dip coating, air knife coating, curtain coating, roller coating, wire bar coating, gravure coating, and inkjet.

  When the hard coat coating film 13 is formed, a coating film end corresponding to the shape of the end of the hard coating layer 3 is formed. That is, in the hard coat coating film 13 forming the first hard coat layer 3A, the first coating film end portion (not shown) corresponding to the first end portion 7 is formed, and the second hard coat layer 3B is formed. In the second coating film to be formed, a second coating film end portion (not shown) corresponding to the third end portion 10 is formed.

  For example, as shown in FIG. 4, first, a hard coat coating film 13 having a uniform thickness is formed by using a roller coating method or the like as shown in FIG. 14 is brought into contact with the hard coat coating 13 to remove the coating solution at the left and right end portions of the upper surface of the hard coat coating 13.

  The mold 14 includes protrusions 15 at both left and right ends of the lower surface of the mold 14 so as to correspond to the shape of the hard coat layer 3. The protrusion 15 is formed in a triangular shape that protrudes downward toward the edge in the left-right direction.

  Moreover, when forming the hard coat coating film 13, the coating liquid edge is formed by reducing the amount of the coating liquid at the left and right ends and reducing the thickness of the left and right ends of the hard coat coating 13. You can also. In particular, when the ink jet method is used, the particle size of the coating liquid ejected from the ink jet may be adjusted so as to be small only at the left and right end portions.

  A drying temperature is 50 degreeC or more, for example, Preferably, it is 60 degreeC or more, More preferably, it is 70 degreeC or more, for example, 200 degrees C or less, Preferably, it is 150 degrees C or less, More preferably, it is 100 degrees C or less.

  The drying time is, for example, 0.5 minutes or more, preferably 1 minute or more, for example, 60 minutes or less, preferably 20 minutes or less.

  Thereafter, when the hard coat composition contains an active energy ray-curable resin, the active energy ray-curable resin is cured by irradiating the active energy ray after the coating liquid is dried.

  In addition, when a hard-coat composition contains a thermosetting resin, a thermosetting resin can be thermoset by this drying process with drying of a solvent.

  Thereby, the first hard coat layer 3 </ b> A having the first end 7 and the first central portion 8 is formed on the upper surface of the transparent substrate 2, and the third end 10 and the second end are formed on the lower surface of the transparent substrate 2. A second hard coat layer 3B having a central portion 11 is formed.

  Next, the optical adjustment layers 4 are provided on both surfaces of the hard coat layer 3 formed on both surfaces of the transparent substrate 2. For example, the first optical adjustment layer is formed on the upper surface of the first hard coat layer 3A by wet-coating the optical adjustment composition on the surface of the hard coat layer 3 (first hard coat layer 3A, second hard coat layer 3B). 4A, the second optical adjustment layer 4B is formed on the lower surface of the second hard coat layer 3B.

  Specifically, for example, if necessary, a coating solution in which the optical adjustment composition is diluted with a solvent is prepared, and then the coating solution is applied to the upper surface of the first hard coat layer 3A and the lower surface of the second hard coat layer 3B. Apply and dry the coating solution.

  The conditions such as preparation, application and drying of the optical adjustment composition are the same as the conditions such as preparation, application and drying exemplified in the hard coat composition.

  When the optical adjustment composition contains an active energy ray-curable resin, the active energy ray-curable resin is cured by irradiating the active energy ray after the coating liquid is dried.

  In addition, when resin of an optical adjustment composition contains a thermosetting resin, a thermosetting resin can be thermoset by this drying process with the drying of a solvent.

  As a result, the first optical adjustment layer 4A is formed with a uniform thickness on the upper surface of the first hard coat layer 3A so as to follow the shapes of the first end portion 7 and the first central portion 8, and the second hard coat layer The second optical adjustment layer 4 </ b> B is formed on the lower surface of 3 </ b> B with a uniform thickness so as to follow the shapes of the third end portion 10 and the second central portion 11.

  Next, the transparent conductive layer 5 is provided on both surfaces of the optical adjustment layer 4. For example, the first transparent conductive layer 5A is formed on the upper surface of the first optical adjustment layer 4A, and the second transparent conductive layer 5B is formed on the lower surface of the second optical adjustment layer 4B by a dry method.

  Examples of the dry method include a vacuum deposition method, a sputtering method, and an ion plating method. Preferably, a sputtering method is used. By this method, the thin transparent conductive layer 5 can be formed.

  In the sputtering method, a target and an adherend (the transparent base material 2 on which the optical adjustment layer 4 and the hard coat layer 3 are laminated) are arranged opposite to each other in a vacuum chamber, and a gas is supplied and a voltage is applied from a power source. Gas ions are accelerated and irradiated onto the target, the target material is ejected from the target surface, and the target material is stacked on the adherend surface.

  Examples of the sputtering method include a bipolar sputtering method, an ECR (electron cyclotron resonance) sputtering method, a magnetron sputtering method, and an ion beam sputtering method. A magnetron sputtering method is preferable.

  When employing the sputtering method, examples of the target material include the above-described metal oxides that constitute the transparent conductive layer 5, and preferably ITO. The tin oxide concentration of ITO is, for example, 0.5% by mass or more, preferably 3% by mass or more, and, for example, 15% by mass or less, preferably from the viewpoint of durability and crystallization of the ITO layer. 13 mass% or less.

  Examples of the gas include an inert gas such as Ar. Moreover, reactive gas, such as oxygen gas, can be used together as needed. When the reactive gas is used in combination, the flow rate ratio (sccm) of the reactive gas is not particularly limited. For example, the flow rate ratio of the sputtering gas and the reactive gas is, for example, 0.1 flow% or more and 5 flow% or less. It is.

  The atmospheric pressure during sputtering is, for example, 1 Pa or less, preferably 0.1 Pa or more and 0.7 Pa or less, from the viewpoint of suppressing a decrease in sputtering rate, discharge stability, or the like.

  The power source may be, for example, any one of a DC power source, an AC power source, an MF power source, and an RF power source, or a combination thereof.

  Thus, the first transparent conductive layer 5A is formed with a uniform thickness on the upper surface of the first optical adjustment layer 4A so as to follow the shapes of the first end portion 7 and the first central portion 8, and the second optical adjustment layer On the lower surface of 4B, the second transparent conductive layer 5B is formed with a uniform thickness so as to follow the shapes of the third end portion 10 and the second central portion 11.

  Next, the conductive metal layer 6 is provided on both surfaces of the transparent conductive layer 5. For example, the first conductive metal layer 6A is formed on the upper surface of the first transparent conductive layer 5A and the second conductive metal layer 6B is formed on the lower surface of the second transparent conductive layer 5B by a dry method.

  Examples of the dry method include the same ones as described above in the formation of the transparent conductive layer 5, and preferably a sputtering method.

  The conditions of the sputtering method in the conductive metal layer 6 are the same as the conditions exemplified in the formation of the transparent conductive layer 5.

  In addition, as a target material, the above-mentioned metal etc. which comprise the conductive metal layer 6 are mentioned, Preferably, copper is mentioned.

  As a result, the first conductive metal layer 6A is formed with a uniform thickness on the upper surface of the first transparent conductive layer 5A so as to conform to the shapes of the first end 7 and the first central portion 8, and the second transparent conductive layer On the lower surface of 5B, the second conductive metal layer 6B is formed with a uniform thickness so as to follow the shapes of the third end portion 10 and the second central portion 11.

  Subsequently, the obtained long double-sided conductive film 1 is wound up on a winding roll.

  As a result, a roll-shaped double-sided conductive film 1 is obtained.

  In addition, a crystal conversion process can be implemented with respect to the transparent conductive layer 5 (1st transparent conductive layer 5A and 2nd transparent conductive layer 5B) of the double-sided conductive film 1 as needed.

  Specifically, heat treatment is performed on the double-sided conductive film 1 in the air.

  The heat treatment can be performed using, for example, an infrared heater or an oven.

  The heating temperature is, for example, 100 ° C. or more, preferably 120 ° C. or more, and for example, 200 ° C. or less, preferably 160 ° C. or less. By setting the heating temperature within the above range, crystal conversion can be ensured while suppressing thermal damage of the transparent substrate 2 and impurities generated from the transparent substrate 2.

  The heating time is appropriately determined according to the heating temperature, and is, for example, 10 minutes or longer, preferably 30 minutes or longer, and for example, 5 hours or shorter, preferably 3 hours or shorter.

  Thereby, the double-sided conductive film 1 provided with the crystallized transparent conductive layer 5 is obtained.

  In addition, in the said process, you may wind around a winding roll for every formation of each layer. Moreover, even if it carries out continuously without winding to formation of the hard-coat layer 3, the optical adjustment layer 4, the transparent conductive layer 5, and the conductive metal layer 6, and it winds around a winding roll after formation of the conductive metal layer 6 Good.

  If necessary, the transparent conductive layer 5 and / or the conductive metal layer 6 may be formed in a stripe pattern or the like by a known etching technique before or after the crystal conversion treatment.

  The double-sided conductive film 1 thus obtained has a first surface end portion 16 (16a, 16b) corresponding to the first end portion 6 (6a, 6b) on the upper surface and a third end on the lower surface. And a second surface end portion 17 (17a, 17b) corresponding to the portion 10 (10a, 10b). That is, the double-sided conductive film 1 has a shape in which the left end portion and the right end portion of the upper surface thereof and the left end portion and the right end portion of the lower surface thereof are chamfered.

  The double-sided conductive film 1 includes a first conductive metal layer 6A, a first transparent conductive layer 5A, a first optical adjustment layer 4A, a first hard coat layer 3A, a transparent substrate 2, a second hard coat layer 3B, The second optical adjustment layer 4B, the second transparent conductive layer 5B, and the second conductive metal layer 6B are provided in this order. Further, the first hard coat layer 3A has a first left end portion 7a and a first right end portion 7b which are partitioned at left and right end portions, and the maximum thickness of the first left end portion 7a and the first right end portion 7b is It is lower than the average thickness of one hard coat layer 3A. Further, the second hard coat layer 3B has a third left end portion 10a and a third right end portion 10b that are partitioned at the left and right end portions, and the maximum thickness of the third left end portion 10a and the third right end portion 10b is the first thickness. 2 Lower than the average thickness of the hard coat layer 3B.

  For this reason, since the close_contact | adherence of these edge parts can be suppressed when the several double-sided conductive film 1 is laminated | stacked (when wound in roll shape), edge part blocking can be suppressed.

  This is presumably due to the following mechanism. That is, conventionally, when the first hard coat layer 3A is formed by coating and drying, the first hard coat layer 3A flows as a result of the coating liquid flowing outward in the width direction (left end side and right end side) during transportation. The edge part of the left-right direction (width direction) of the coating film 13 becomes thicker than a center part, and by extension, the edge part of the double-sided conductive film 1 becomes thicker than a center part (projects in the thickness direction). And when this double-sided conductive film 1 is wound up in a roll form in a vacuum, a particularly strong pressure is applied to the thick part of the end part due to its own weight, the pressure when returning to the atmosphere, etc. It is inferred that blocking will occur. On the other hand, in the present invention, the maximum thickness of the first end 7 of the first hard coat layer 3A is made smaller than the thickness of the first central portion 8 of the first hard coat layer 3A, and the second hard coat layer The maximum thickness of the third end portion 10 of 3B is made smaller than the thickness of the second central portion 11 of the second hard coat layer 3B. As a result, it can be inferred that contact between the end portions of the surface (upper surface and lower surface) of the double-sided conductive film 1 can be suppressed, pressure applied to the end portions of the double-sided conductive film 1 can be reduced, and end-side blocking can be suppressed. Is done.

  This double-sided conductive film 1 is used for a base material for a touch panel provided in an image display device, for example. Examples of the form of the touch panel include various types such as a capacitive type and a resistive film type, and are particularly suitably used for a capacitive type touch panel.

12 In the embodiment of FIGS. 2 and 3, the maximum thickness of the second end 9 and the maximum thickness of the fourth end 12 exceed the average thickness of the first hard coat layer 3A or the second hard coat layer 3B. For example, as shown in FIGS. 5 and 6, the maximum thickness of the second end portion 9 and the maximum thickness of the fourth end portion 12 are the average of the first hard coat layer 3A or the second hard coat layer 3B. The thickness may be exceeded.

  Specifically, in FIGS. 5 and 6, in the first hard coat layer 3 </ b> A, the second end portion 9 other than the first end portion 7 (in the vicinity of the end edge) with respect to the first central portion 8. It protrudes slightly so as to protrude upward. Also in the second hard coat layer 3B, the portion other than the third end portion 10 in the fourth end portion 12 (the vicinity of the end edge) is slightly protruded downward with respect to the second central portion 11. Protruding.

  The maximum thickness of the second end portion 9 or the fourth end portion 12, that is, the maximum thickness in the vicinity of the end edge is preferably 1.2 times the average thickness of the first hard coat layer 3A or the second hard coat layer 3B. And preferably exceeding 1.0 times.

  In addition, the surface of the double-sided conductive film 1 (that is, the upper surface of the first conductive metal layer 6A and the lower surface of the second conductive metal layer 6B) also corresponds to the surface shape of the hard coat layer 3 in the vicinity of the edge. It slightly protrudes so as to protrude upward or downward with respect to the flat portion at the center in the width direction.

  5 and 6, for example, when the hard coat layer 3 is formed, the mold 14 and the protruding portion 15 of the mold 14 are connected to the end of the hard coat film 13 with respect to the hard coat film 13. However, it can be manufactured by arranging the mold 14 so as not to contact the hard coat coating film 13 in the left-right direction central portion.

  This embodiment also has the same operational effects as the embodiment of FIGS. In addition, the shape of the end can be more stably produced as compared with the embodiment of FIGS.

  In the embodiment of FIGS. 2 and 3, the first end 7 and the third end 10 have a shape cut out in a triangular shape. For example, the first end 7 and the third end 10 are shown in FIGS. As described above, the first end 7 and the third end 10 may have a shape that is cut out into a substantially rectangular shape.

  The embodiment shown in FIGS. 7 and 8 has the same effect as that shown in FIGS.

  2, 5 and 7, the double-sided conductive film 1 is provided with the second hard coat layer 3B on the lower surface of the transparent substrate 2. For example, although not shown, The hard coat layer 3B may not be provided.

  Preferably, the double-sided conductive film 1 includes the second hard coat layer 3 </ b> B on the lower surface of the transparent substrate 2 from the viewpoint of further suppressing edge blocking.

  The double-sided conductive film 1 includes the first optical adjustment layer 4A, the second optical adjustment layer 4B, the first transparent conductive layer 5A, and the second transparent conductive layer 5B. At least one layer or all of the optical adjustment layer 4A, the second optical adjustment layer 4B, the first transparent conductive layer 5A, and the second transparent conductive layer 5B may not be provided. Specifically, the double-sided conductive film 1 may include only the second conductive metal layer 6B, the transparent substrate 2, the first hard coat layer 3A, and the first conductive metal layer 6A.

  Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples. In addition, this invention is not limited to an Example and a comparative example at all. In addition, specific numerical values such as a blending ratio (content ratio), physical property values, and parameters used in the following description are described in the above-mentioned “Mode for Carrying Out the Invention”, and a blending ratio corresponding to them ( Substituting the upper limit value (numerical value defined as “less than” or “less than”) or the lower limit value (number defined as “greater than” or “exceeded”) such as content ratio), physical property values, parameters, etc. be able to.

Example 1
As a long transparent substrate, a long cycloolefin polymer film (COP film, manufactured by Nippon Zeon Co., Ltd., “ZEONOR”) having a thickness of 100 μm and a width of 1600 mm was prepared.

  A coating liquid of a hard coat composition containing an ultraviolet curable resin (manufactured by DIC, trade name “Unidic RS-29”) and a solvent (ethyl acetate) is dried to 1.4 μm using a gravure coater. In addition, a hard coat film was formed on both surfaces of the transparent substrate. Then, the edge part of the hard-coat coating film was removed by making the metal mold | die of FIG. 4 contact the edge part of the width direction of a hard-coat coating film of both surfaces. Subsequently, the hard coat coating film was heated and dried at 80 ° C. for 1 minute, and then immediately irradiated with ultraviolet rays (integrated light amount 300 mJ) using an ozone type high pressure mercury lamp to be cured. Thereby, hard coat layers (first hard coat layer and second hard coat layer) were formed on both surfaces of the transparent substrate (see FIG. 6).

  Next, a refractive index adjusting composition (manufactured by JSR, trade name “OPSTAR Z7412”) was applied to both surfaces of the transparent base material on which the hard coat layer was formed, using a gravure coater, and dried by heating at 60 ° C. for 1 minute. . After drying, the dried coating film was cured by irradiating with ultraviolet rays (integrated light amount 250 mJ) using an ozone type high pressure mercury lamp. As a result, optical adjustment layers (first optical adjustment layer and second optical adjustment layer) having a thickness of 75 to 135 nm and a refractive index of 1.60 to 1.65 were formed on both surfaces of the transparent substrate.

  Next, an ITO sintered body target (indium oxide: tin oxide = 90: 10 (mass ratio)) and a copper target were mounted on a parallel plate type winding magnetron sputtering apparatus, respectively. While conveying the transparent base material on which the hard coat layer and the optical adjustment layer are formed in a vacuum, an argon gas and an oxygen gas are introduced, and an ITO layer and a copper layer are applied to both surfaces of the transparent base material by DC sputtering. Were sequentially formed. Thereby, an ITO layer (first transparent conductive layer, second transparent conductive layer) having a thickness of 27 nm and a copper layer (first conductive metal layer, second conductive metal layer) having a thickness of 27 nm are formed on both surfaces of the transparent substrate. Then, it wound up in roll shape in the vacuum.

  As a result, a roll-shaped double-sided conductive film was produced (see FIGS. 1 and 5).

Comparative Example 1
A roll-shaped double-sided conductive film was produced in the same manner as in Example 1 except that the mold was not brought into contact with the hard coat coating film when the hard coat layer was formed.

(Evaluation)
The following measurement was implemented about the double-sided conductive film obtained by the Example and the comparative example.

(1) Measurement of film thickness The thickness of the hard code layer was calculated based on the waveform of the interference spectrum using an instantaneous multiphotometry system ("MCPD2000" manufactured by Otsuka Electronics Co., Ltd.) according to the following method.

  For the average thickness A of the entire width direction of the hard coat layer, 10 points were selected at the center in the left-right direction so as to be equidistant from the left end edge to the right end edge, and the average value of the thicknesses of 10 points was measured. That is, with the left edge being the first point and the right edge being the twelfth point, twelve points are set at equal intervals in the left-right direction, and the thickness of 10 points from the second point to the 11th point is measured. Was calculated.

  The thickness of the end portion of the hard coat layer was measured at 1 mm intervals within 10 mm from the left end edge. In this example, the range of 6 mm from the left edge of the hard coat layer is the first end, the average of the thickness of 6 points from the edge to 1 to 6 mm is the average thickness of the first end, The maximum of 6 points was defined as the maximum thickness of the first end. On the other hand, within the range of 10 mm from the left edge of the hard coat layer is the second end, the average of the thickness of 10 points from the left edge to the 10 mm point is the average thickness of the second end, the maximum of the 10 points is the first The maximum thickness C at the two ends was set.

  The results are shown in Table 1 and FIG. In addition, in Table 1, although it showed about the 1st hard coat layer, it was the same result also about the 2nd hard coat layer. The same result was obtained for the right edge of the first and second hard coat layers.

(2) Evaluation of edge part blocking The double-sided conductive film was rewound from the roll-shaped double-sided conductive film, and the surface of the film end face was observed. The case where blocking did not occur was evaluated as ○, and the case where blocking occurred was evaluated as ×. The results are shown in Table 1.

DESCRIPTION OF SYMBOLS 1 Double-sided conductive film 2 Transparent base material 3A 1st hard coat layer 3B 2nd hard coat layer 5A 1st transparent conductive layer 5B 2nd transparent conductive layer 6A 1st conductive metal layer 6B 2nd conductive metal layer 7a 1st left end part 9a Second left end portion 10a Third left end portion 12a Fourth left end portion

Claims (8)

A double-sided conductive film comprising a first conductive metal layer, a first hard coat layer, a transparent substrate, and a second conductive metal layer in order, and extending in the longitudinal direction,
The first hard coat layer has a first end section defined at at least one side end of both ends in the orthogonal direction orthogonal to both the longitudinal direction and the thickness direction;
The double-sided conductive film, wherein a maximum thickness of the first end portion is lower than an average thickness of the first hard coat layer.   2. The double-sided conductive film according to claim 1, wherein the thickness of the first end portion monotonously decreases toward one side in the orthogonal direction. An average thickness of the first hard coat layer is 3.0 μm or less;
The first hard coat layer has a second end portion that is partitioned into a range of 10 mm from the edge on the one side in the orthogonal direction to the other side in the orthogonal direction,
The double-sided conductive film according to claim 1 or 2, wherein a maximum thickness of the second end portion is 1.2 times or less of an average thickness of the first hard coat layer.   The double-sided conductive film according to any one of claims 1 to 3, wherein the first conductive metal layer and the second conductive metal layer are copper layers. A second hard coat layer disposed between the transparent substrate and the second conductive metal layer;
The second hard coat layer has a third end portion defined at at least one end portion of both end portions in the orthogonal direction;
The double-sided conductive film according to any one of claims 1 to 4, wherein a maximum thickness of the third end portion is lower than an average thickness of the second hard coat layer. An average thickness of the second hard coat layer is 3.0 μm or less;
The second hard coat layer has a fourth end portion that is partitioned into a range of 10 mm from the edge on the one side in the orthogonal direction to the other side in the orthogonal direction,
The double-sided conductive film according to claim 5, wherein the maximum thickness of the fourth end portion is 1.2 times or less of the average thickness of the second hard coat layer. A first transparent conductive layer disposed between the first conductive metal layer and the first hard coat layer;
The double-sided conductive film according to claim 5, further comprising a second transparent conductive layer disposed between the first conductive metal layer and the second hard coat layer.   The double-sided conductive film according to any one of claims 1 to 7, wherein the double-sided conductive film is wound in a roll shape.

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