JP2018064091A5 - - Google Patents

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Publication number
JP2018064091A5
JP2018064091A5 JP2017188984A JP2017188984A JP2018064091A5 JP 2018064091 A5 JP2018064091 A5 JP 2018064091A5 JP 2017188984 A JP2017188984 A JP 2017188984A JP 2017188984 A JP2017188984 A JP 2017188984A JP 2018064091 A5 JP2018064091 A5 JP 2018064091A5
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JP
Japan
Prior art keywords
substrate
fluid control
control features
template
imprint field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2017188984A
Other languages
English (en)
Japanese (ja)
Other versions
JP2018064091A (ja
Filing date
Publication date
Priority claimed from US15/292,645 external-priority patent/US10035296B2/en
Application filed filed Critical
Publication of JP2018064091A publication Critical patent/JP2018064091A/ja
Publication of JP2018064091A5 publication Critical patent/JP2018064091A5/ja
Withdrawn legal-status Critical Current

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JP2017188984A 2016-10-13 2017-09-28 インプリント材料の拡がりを制御する方法 Withdrawn JP2018064091A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/292,645 US10035296B2 (en) 2016-10-13 2016-10-13 Methods for controlling spread of imprint material
US15/292,645 2016-10-13

Publications (2)

Publication Number Publication Date
JP2018064091A JP2018064091A (ja) 2018-04-19
JP2018064091A5 true JP2018064091A5 (https=) 2020-11-12

Family

ID=61902562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2017188984A Withdrawn JP2018064091A (ja) 2016-10-13 2017-09-28 インプリント材料の拡がりを制御する方法

Country Status (6)

Country Link
US (1) US10035296B2 (https=)
JP (1) JP2018064091A (https=)
KR (1) KR102196382B1 (https=)
CN (1) CN107942617A (https=)
SG (1) SG10201707435QA (https=)
TW (1) TWI710858B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10549313B2 (en) 2016-10-31 2020-02-04 Canon Kabushiki Kaisha Edge field imprint lithography
JP2019212862A (ja) * 2018-06-08 2019-12-12 キヤノン株式会社 モールド、平面プレート、インプリント方法、および物品製造方法
JP7086758B2 (ja) * 2018-07-06 2022-06-20 キオクシア株式会社 パターン形成方法および半導体装置の製造方法
US11294277B2 (en) * 2018-07-25 2022-04-05 Canon Kabushiki Kaisha Process of imprinting a substrate with fluid control features
JP7150535B2 (ja) * 2018-09-13 2022-10-11 キヤノン株式会社 平坦化装置、平坦化方法及び物品の製造方法
CN109445247B (zh) * 2018-11-16 2020-06-19 京东方科技集团股份有限公司 压印模板及其制备方法和压印方法
US11243466B2 (en) * 2019-01-31 2022-02-08 Canon Kabushiki Kaisha Template with mass velocity variation features, nanoimprint lithography apparatus that uses the template, and methods that use the template
CN116149133A (zh) * 2021-11-23 2023-05-23 歌尔股份有限公司 压印母板和压印母板的制作方法

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3066930A (en) 1959-04-20 1962-12-04 Walter I Chinnick Holding tongs
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US6936194B2 (en) 2002-09-05 2005-08-30 Molecular Imprints, Inc. Functional patterning material for imprint lithography processes
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
CN101573659A (zh) * 2005-12-08 2009-11-04 分子制模股份有限公司 排除位于基板和模具之间的气体的方法
US20080303187A1 (en) * 2006-12-29 2008-12-11 Molecular Imprints, Inc. Imprint Fluid Control
US8361371B2 (en) 2008-02-08 2013-01-29 Molecular Imprints, Inc. Extrusion reduction in imprint lithography
JP5460541B2 (ja) * 2010-03-30 2014-04-02 富士フイルム株式会社 ナノインプリント方法、液滴配置パターン作成方法および基板の加工方法
JP2012015324A (ja) * 2010-06-30 2012-01-19 Fujifilm Corp 液体塗布装置及び液体塗布方法並びにナノインプリントシステム
JP5759195B2 (ja) * 2011-02-07 2015-08-05 キヤノン株式会社 型、インプリント方法及び物品製造方法
WO2015006695A1 (en) * 2013-07-12 2015-01-15 Canon Nanotechnologies, Inc. Drop pattern generation for imprint lithography with directionally-patterned templates
TWI665078B (zh) * 2013-07-22 2019-07-11 皇家飛利浦有限公司 製造圖案化印模以圖案化輪廓表面之方法、供在壓印微影製程中使用之圖案化印模、壓印微影方法、包括圖案化輪廓表面之物件及圖案化印模用於壓印微影之用法

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