JP2018037476A - Method for manufacturing printed wiring board and printed wiring board - Google Patents

Method for manufacturing printed wiring board and printed wiring board Download PDF

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JP2018037476A
JP2018037476A JP2016167501A JP2016167501A JP2018037476A JP 2018037476 A JP2018037476 A JP 2018037476A JP 2016167501 A JP2016167501 A JP 2016167501A JP 2016167501 A JP2016167501 A JP 2016167501A JP 2018037476 A JP2018037476 A JP 2018037476A
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wiring board
printed wiring
plating
vias
forming
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石岡 卓
Taku Ishioka
卓 石岡
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Kyocera Corp
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Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a printed wiring board which can use a via without a recess and with a large diameter as heat dissipation conductor and in which dimensional behavior is not dispersed and work does not become complicated.SOLUTION: A method for manufacturing a printed wiring board includes the steps of: forming a prepared hole 3a for forming vias 3 and 4 in an insulation layer 1 in which a metal layer 5 is formed on at least one surface; selectively forming a plating in the prepared hole 3a for via formation and in a peripheral part of the hole; removing plating in a portion protruding from a surface of the metal layer 5; and forming a circuit 2 by a subtractive method.SELECTED DRAWING: Figure 2

Description

本開示は、印刷配線板の製造方法および印刷配線板に関する。   The present disclosure relates to a method for manufacturing a printed wiring board and a printed wiring board.

従来、ビアなどを含む電解パネルめっきにおいて、パネル(印刷配線板)全体にめっきを厚付けすることにより、ビアにめっきを充填しているが、層間厚みやビア径などにより、ビアに十分にめっきを充填できず、ビア表面に6μm以上の凹みが発生することがある。この凹みが残るとビアの接続信頼性などが低下する。そのため、パネルめっきプロセスの後に、凹みを低減するためにパネル全体を複数回に渡って機械的に研磨し、この凹みが規格内に入った後、化学的な研磨(硫酸過酸化水素水系のソフトエッチングなど)を施して、所望の導体厚みに調整している。   Conventionally, in electrolytic panel plating including vias, the vias are filled by thickening the entire panel (printed wiring board), but the vias are sufficiently plated due to interlayer thickness, via diameter, etc. May not be filled, and a recess of 6 μm or more may occur on the via surface. If this dent remains, via connection reliability and the like are reduced. Therefore, after the panel plating process, the entire panel is mechanically polished several times to reduce the dents, and after this dent enters the standard, chemical polishing (sulfuric acid / hydrogen peroxide aqueous soft Etching etc.) is performed to adjust to a desired conductor thickness.

しかしながら、研磨が機械的研磨と化学的研磨のいずれであっても、パネル全面を常に均一に研磨はできず、且つ厚く付けためっきを研磨で除去すると、研磨の面内ばらつきが発生する。また、機械的研磨は、摩擦によってパネルの縦方向および横方向の寸法が変化するので、パネル毎の研磨回数が異なると、パネル毎の寸法挙動がばらつく。さらに、研磨により、導体の厚みにばらつきが生じれば、エッチングプロセス(サブトラクティブ法)での回路幅の精度が下がってしまう。これに対して、例えば特許文献1には、ビア内部への金属析出のための電解めっき工程と、配線形成のための電解めっき工程を分離する配線板の製造方法が開示されているが、工程が増えると作業が煩雑になる。   However, regardless of whether the polishing is mechanical polishing or chemical polishing, the entire panel surface cannot always be uniformly polished, and if the thick plating is removed by polishing, in-plane variation of polishing occurs. In mechanical polishing, the vertical and horizontal dimensions of the panel change due to friction. Therefore, if the number of polishings for each panel differs, the dimensional behavior for each panel varies. Further, if the conductor thickness varies due to polishing, the accuracy of the circuit width in the etching process (subtractive method) is lowered. On the other hand, for example, Patent Document 1 discloses a method of manufacturing a wiring board that separates an electrolytic plating process for depositing metal into the via and an electrolytic plating process for forming a wiring. As the number increases, the work becomes complicated.

特開2001−053444号公報JP 2001-053444 A

本開示の印刷配線板の製造方法は、少なくとも一方の表面に金属層が形成された絶縁層に、ビア形成用の穴を形成し、ビア形成用の穴および該穴の周縁部に、めっきを選択的に形成し、金属層表面から突出した部分のめっきを除去し、サブトラクティブ法によって回路を形成する。   In the printed wiring board manufacturing method of the present disclosure, a hole for forming a via is formed in an insulating layer having a metal layer formed on at least one surface, and plating is performed on the hole for forming the via and a peripheral portion of the hole. A circuit is formed by a subtractive method by selectively forming, removing the plating at a portion protruding from the surface of the metal layer.

本開示の印刷配線板は、めっきが充填された少なくとも1つのビアと金属層で形成された回路とを含み、該ビアの表面と該回路の表面とが面一である絶縁層を、少なくとも1層含み、該絶縁層が、少なくとも一方の表層を構成するように配置されている。   The printed wiring board of the present disclosure includes at least one via filled with plating and a circuit formed of a metal layer, and includes at least one insulating layer in which the surface of the via is flush with the surface of the circuit. The insulating layer is arranged so as to constitute at least one surface layer.

本開示に係る印刷配線板の一実施形態を示す説明図である。It is explanatory drawing which shows one Embodiment of the printed wiring board which concerns on this indication. 本開示の印刷配線板の製造工程の一実施形態を示す説明図である。It is explanatory drawing which shows one Embodiment of the manufacturing process of the printed wiring board of this indication. 本開示の印刷配線板の製造工程の一実施形態を示す説明図である。It is explanatory drawing which shows one Embodiment of the manufacturing process of the printed wiring board of this indication.

本開示の印刷配線板の製造方法は、少なくとも一方の表面に金属層が形成された絶縁層に、ビア形成用の穴を形成し、このビア形成用の穴および該穴の周縁部に、めっきを選択的に形成し、その後、金属層表面から突出した部分のめっきを選択的に除去している。そのため、ビアの表面に凹みができず、且つ印刷配線板の寸法挙動がばらつくことはない。さらに、ビア以外にはめっきがされていないので、金属層の厚みにばらつきが生じず、サブトラクティブ法によるエッチングプロセスで回路幅の精度が安定し、且つ回路幅の微細化が可能になる。
また、本開示の印刷配線板は、少なくとも一方の表層に、ビアの表面と回路の表面とが面一である絶縁層が少なくとも1層含まれているため、ビア(めっき)の表面に凹みがなく、接続信頼性が向上する。
以下、本開示について詳細に説明する。
According to the method for manufacturing a printed wiring board of the present disclosure, a hole for forming a via is formed in an insulating layer having a metal layer formed on at least one surface, and plating is performed on the hole for forming the via and a peripheral portion of the hole. Then, the plating protruding from the surface of the metal layer is selectively removed. Therefore, the via surface cannot be dented, and the dimensional behavior of the printed wiring board does not vary. Further, since the plating is not performed except for the vias, the thickness of the metal layer does not vary, the circuit width accuracy is stabilized by the subtractive etching process, and the circuit width can be miniaturized.
In addition, since the printed wiring board of the present disclosure includes at least one insulating layer in which at least one surface layer is flush with the surface of the via and the surface of the circuit, the surface of the via (plating) has a dent. Connection reliability is improved.
Hereinafter, the present disclosure will be described in detail.

図1に示すように、印刷配線板10´は、それぞれの表面が面一である回路2およびビア3,4を含む絶縁層1を、少なくとも一方の表層に含んでいる。   As shown in FIG. 1, the printed wiring board 10 ′ includes an insulating layer 1 including a circuit 2 and vias 3 and 4 whose surfaces are flush with each other on at least one surface layer.

絶縁層1は、絶縁性を有する素材で形成されていれば特に限定されない。このような絶縁性を有する素材としては、例えば、エポキシ樹脂、ビスマレイミド−トリアジン樹脂、ポリイミド樹脂などの有機樹脂などが挙げられる。これらの有機樹脂は2種以上を混合して用いてもよい。   The insulating layer 1 will not be specifically limited if it is formed with the raw material which has insulation. Examples of such an insulating material include organic resins such as epoxy resins, bismaleimide-triazine resins, and polyimide resins. These organic resins may be used in combination of two or more.

絶縁層1として有機樹脂を使用する場合、有機樹脂に補強材を配合して使用するのが好ましい。補強材としては絶縁性布材、例えば、ガラス繊維、ガラス不織布、アラミド不織布、アラミド繊維、ポリエステル繊維などが挙げられる。これらの補強材は2種以上を併用してもよい。絶縁層1は、好ましくはガラス繊維などのガラス材入り有機樹脂から形成される。さらに、絶縁層1にはシリカ、硫酸バリウム、タルク、クレー、ガラス、炭酸カルシウム、酸化チタンなどの無機充填材が含まれていてもよい。絶縁層1は、絶縁性布材を有していてもよい。絶縁層1は単層構造であってもよく、多層構造であってもよい。   When an organic resin is used as the insulating layer 1, it is preferable to use the organic resin with a reinforcing material. Examples of the reinforcing material include an insulating cloth material such as glass fiber, glass nonwoven fabric, aramid nonwoven fabric, aramid fiber, and polyester fiber. Two or more of these reinforcing materials may be used in combination. The insulating layer 1 is preferably formed from an organic resin containing a glass material such as glass fiber. Furthermore, the insulating layer 1 may contain inorganic fillers such as silica, barium sulfate, talc, clay, glass, calcium carbonate, and titanium oxide. The insulating layer 1 may have an insulating cloth material. The insulating layer 1 may have a single layer structure or a multilayer structure.

絶縁層1の少なくとも一方の表面には、他の部品や基材と電気的に接続する導電回路である回路2が少なくとも1つ形成される。この回路2は、後述するように絶縁層1の表面に形成した金属層を、公知のサブトラクティブ法により露光・現像・エッチング・剥離して形成される。   On at least one surface of the insulating layer 1, at least one circuit 2 that is a conductive circuit that is electrically connected to another component or a substrate is formed. As will be described later, the circuit 2 is formed by exposing, developing, etching, and peeling a metal layer formed on the surface of the insulating layer 1 by a known subtractive method.

ビア3および4は、レーザ加工などによって絶縁体1にビア形成用の穴を形成し、この穴およびその周縁部に選択的にめっきを形成して設けられる。すなわち、ビア3,4は内部およびその周縁部がめっき(金属めっき)で形成され、印刷配線板10´の内層の回路2と電気的に接続される。また、印刷配線板10´上にビアは少なくとも1つあればよく、複数設けた場合にビアの径が異なっていてもよい。本実施形態の場合、ビア3はビア4より径が大きい。   The vias 3 and 4 are provided by forming a hole for forming a via in the insulator 1 by laser processing or the like, and selectively forming plating on the hole and the peripheral portion thereof. That is, the vias 3 and 4 are formed by plating (metal plating) in the inside and the peripheral edge thereof, and are electrically connected to the circuit 2 in the inner layer of the printed wiring board 10 ′. Further, it is sufficient that at least one via is provided on the printed wiring board 10 ', and the diameters of the vias may be different when a plurality of vias are provided. In the present embodiment, the via 3 has a larger diameter than the via 4.

回路2およびビア3,4を含む絶縁層1は、任意の層数を積層して多層構造のビルドアップ層とすることができる。図1に示す実施形態では、印刷配線板10´は二層構造を有しており、絶縁層1´上に、回路2およびビア3,4を含む絶縁層1を積層して形成されている。2つの絶縁層1、1´は、同じ樹脂で形成されるのがよく、ビア3,4はそれぞれビア3´,4´上に形成されている。なお、ビア3´,4´は印刷配線板10´の表層に形成されないので、表面に凹みがあってもよいし表面が面一でなくてもよい。   The insulating layer 1 including the circuit 2 and the vias 3 and 4 can be formed as a build-up layer having a multilayer structure by laminating an arbitrary number of layers. In the embodiment shown in FIG. 1, the printed wiring board 10 ′ has a two-layer structure, and is formed by laminating the insulating layer 1 including the circuit 2 and the vias 3 and 4 on the insulating layer 1 ′. . The two insulating layers 1 and 1 'are preferably formed of the same resin, and the vias 3 and 4 are formed on the vias 3' and 4 ', respectively. Since the vias 3 'and 4' are not formed on the surface layer of the printed wiring board 10 ', the surface may have a dent or the surface may not be flush.

このように、表面に凹みが無く、且つ回路2と面一であるビア3,4は、多層構造のビルドアップ層となる場合、少なくとも一方の表層を構成するように配置されるので、特に縦方向の放熱構造に用いる大径ビア(放熱用導体)などに有効に使用される。放熱用導体は、印刷配線板に少なくとも1つは設けられ、印刷配線板10´内で発生した熱を伝達して逃がすものであり、ビアの径が大きいものが用いられる。   As described above, the vias 3 and 4 that have no dent on the surface and are flush with the circuit 2 are arranged so as to constitute at least one surface layer in the case of a build-up layer having a multilayer structure. It is effectively used for large-diameter vias (heat-dissipating conductors) used in directional heat dissipation structures. At least one of the heat dissipating conductors is provided on the printed wiring board, which transfers heat generated in the printed wiring board 10 'and releases it, and has a large via diameter.

本開示の一実施形態に係る印刷配線板の製造方法は、下記の工程を含む。
(i)少なくとも一方の表面に金属層が形成された絶縁層に、レーザ加工などでビア形成用の穴を形成する。
(ii)ビア形成用の穴および該穴の周縁部に、めっきを選択的に形成する。
(iii)金属層表面から突出した部分のめっきを除去する。
(iv)サブトラクティブ法によって回路を形成する。
The manufacturing method of the printed wiring board which concerns on one Embodiment of this indication includes the following process.
(I) A via forming hole is formed by laser processing or the like in an insulating layer having a metal layer formed on at least one surface.
(Ii) Plating is selectively formed on a hole for forming a via and a peripheral portion of the hole.
(Iii) The plating of the part which protruded from the metal layer surface is removed.
(Iv) A circuit is formed by a subtractive method.

本開示の印刷配線板の製造方法を、図2および3に基づいて説明する。なお、上述した部材についての説明は省略する。   The manufacturing method of the printed wiring board of this indication is demonstrated based on FIG. In addition, the description about the member mentioned above is abbreviate | omitted.

まず、図2(a)に示すように、金属層5が表面に形成された絶縁層1に、ビア形成用の下穴3a、4aをレーザ加工などにより形成する。次に、このビア形成用の下穴3a、4aにめっき(導体)を充填した後、レジスト(例えばドライフィルム)を形成し、公知の方法(サブトラクティブ法など)で露光および現像、エッチング、剥離をして、ビア3,4および回路2の形成位置以外の部分を除去し、回路2およびビア3,4を形成する(図2(b))。このとき、ビア3、4は径の大きさが異なるように形成され、ビア4を充填するめっき充填量では、ビア3にはめっきが十分に充填されないため、表面に凹み9aが発生する。   First, as shown in FIG. 2A, via formation pilot holes 3a and 4a are formed in the insulating layer 1 having the metal layer 5 formed on the surface thereof by laser processing or the like. Next, after filling the via holes 3a, 4a for forming vias with plating (conductor), a resist (for example, a dry film) is formed, and exposure, development, etching, and peeling are performed by a known method (subtractive method or the like). Then, the portions other than the formation positions of the vias 3 and 4 and the circuit 2 are removed, and the circuit 2 and the vias 3 and 4 are formed (FIG. 2B). At this time, the vias 3 and 4 are formed so as to have different diameters, and the plating filling amount for filling the via 4 does not sufficiently fill the via 3 with plating, so that a dent 9a is generated on the surface.

次に、絶縁層形成ならびに先ほどと同様の工程を適宜行い、図2(c)に示すように任意の層数から構成され金属層5が表面に形成されている積層体10aを形成する。このとき、積層体10aにおいて、パネル全体にめっきを厚付けしているので、径の小さいビア4に十分な量のめっきを充填すると、径の大きいビア3に最表層に凹み9が生じる。この凹み9は図2(b)に示した凹み9aが積み重ねられたものであり、積層体10aの層数が増えるほど大きくなる。なお、ビア3に十分な量のめっきを充填するとパネル全体のめっきが厚くなり過ぎ、凹み除去と同様に研磨の問題が発生する。そのため、研磨の問題を懸念する場合、径の異なるビアにめっきする際は、径の小さなビアを十分に充填できるめっき量でめっきする。   Next, an insulating layer is formed and the same process as described above is appropriately performed to form a laminate 10a having an arbitrary number of layers and a metal layer 5 formed on the surface as shown in FIG. At this time, in the laminated body 10a, the entire panel is plated. Therefore, when a sufficient amount of plating is filled in the via 4 having a small diameter, a recess 9 is formed in the outermost layer of the via 3 having a large diameter. This recess 9 is a stack of the recesses 9a shown in FIG. 2B, and becomes larger as the number of layers of the laminate 10a increases. If a sufficient amount of plating is filled in the via 3, the entire panel becomes too thick, and a polishing problem occurs as in the case of removing the dent. Therefore, when worried about the problem of polishing, when plating on vias having different diameters, plating is performed with a plating amount that can sufficiently fill vias having smaller diameters.

次に、レーザ加工などで積層体10aのビア3および4と電気的に接続する最表層のビア30,40形成用の穴30a、40aをそれぞれ形成する。金属層5は、例えば金属箔などで構成され、金属箔としては銅箔であるのが特によい。穴30aおよび40aは、それぞれ異なる径であってもよく、本実施形態の場合、穴30aは穴40aより径が大きい。このレーザ加工で用いられるレーザ光としては、例えばCO2レーザ、UV−YAGレーザなどが挙げられる。なお、穴30a、40aの開口部周辺や内壁面などに、開口時の積層体10aの樹脂の残渣(図示せず)が残る場合は、デスミア処理により残渣を除去する。
次に、めっきレジスト6(例えばドライフィルム)を積層体10aの表面に形成し、公知の方法で露光および現像をして、穴30a,40aの形成位置を開口する。(図2(d))
Next, holes 30a and 40a for forming the outermost vias 30 and 40 that are electrically connected to the vias 3 and 4 of the stacked body 10a are formed by laser processing or the like. The metal layer 5 is made of, for example, a metal foil, and the metal foil is particularly preferably a copper foil. The holes 30a and 40a may have different diameters. In this embodiment, the hole 30a has a larger diameter than the hole 40a. Examples of laser light used in this laser processing include a CO 2 laser and a UV-YAG laser. In addition, when the resin residue (not shown) of the laminated body 10a at the time of opening remains in the periphery of an opening part of the holes 30a and 40a, an inner wall surface, etc., a residue is removed by a desmear process.
Next, a plating resist 6 (for example, a dry film) is formed on the surface of the laminate 10a, and exposure and development are performed by a known method to open the positions where the holes 30a and 40a are formed. (Fig. 2 (d))

次に、図2(e)に示すように、穴30a、40aに導体50を充填する。充填方法としては例えばパターンめっき法がよい。このとき、導体50は穴30a、40aに対して、突出部50aとして突出する。導体50としては、例えば電解銅めっきなどが挙げられる。   Next, as shown in FIG. 2E, the conductors 50 are filled in the holes 30a and 40a. As a filling method, for example, a pattern plating method is preferable. At this time, the conductor 50 protrudes as the protruding portion 50a with respect to the holes 30a and 40a. Examples of the conductor 50 include electrolytic copper plating.

次に、図3(f)に示すように、めっきレジスト6を剥離して除去した後、金属層5の表面から突出した突出部50aを、金属層5と面一になるまで研磨して選択的に除去する(図3(g))。この研磨は、突出部50aのみを選択的に研磨するため、少ない研磨回数で容易に突出部50aを除去でき、印刷配線板の寸法挙動が安定する。この研磨は機械的研磨がよく、中でも、研磨輪(バフ)の周囲(表面)に種々の研磨剤などを付け、これを回転させて素材を研磨するバフ研磨がよい。バフに用いる材料としては例えば不織布などが挙げられるが、中でもセラミックバフによって行われるのがよい。このセラミックバフとしては例えばCGSW(三共理化学株式会社製)などが挙げられる。   Next, as shown in FIG. 3 (f), after removing the plating resist 6 by peeling, the protruding portion 50 a protruding from the surface of the metal layer 5 is polished and selected until it is flush with the metal layer 5. (Fig. 3 (g)). Since this polishing selectively polishes only the protrusions 50a, the protrusions 50a can be easily removed with a small number of polishings, and the dimensional behavior of the printed wiring board is stabilized. This polishing is preferably mechanical polishing, and in particular, buffing in which various abrasives are attached to the periphery (surface) of the polishing wheel (buff) and rotated to polish the material. As a material used for the buff, for example, a non-woven fabric or the like can be mentioned. Examples of this ceramic buff include CGSW (manufactured by Sankyo Rikagaku Co., Ltd.).

次に、図3(h)に示すように、公知のサブトラクティブ法を用いて回路を形成する。すなわち、エッチングレジスト7を回路2およびビア30,40の形成位置の金属層5上に配置し、露光および現像する。ビア30,40および回路2の形成位置以外の金属層5をエッチングにて除去し、次いでエッチングレジスト7を剥離すると、表面に凹みが無いビア30,40と、このビア30,40と表面が面一である回路2とを備える印刷配線板10を得ることができる(図3(i))。
この後、さらに回路2とビア3,4を含む絶縁層1を積層してビルドアップ層としてもよいし、所望の部分にソルダーレジスト層(図示せず)を形成してもよい。
Next, as shown in FIG. 3H, a circuit is formed using a known subtractive method. That is, the etching resist 7 is disposed on the metal layer 5 at the position where the circuit 2 and the vias 30 and 40 are formed, and is exposed and developed. When the metal layer 5 other than the positions where the vias 30 and 40 and the circuit 2 are formed is removed by etching, and then the etching resist 7 is peeled off, the vias 30 and 40 having no dents on the surface, and the vias 30 and 40 and the surface face each other. A printed wiring board 10 having a single circuit 2 can be obtained (FIG. 3I).
Thereafter, the insulating layer 1 including the circuit 2 and the vias 3 and 4 may be further laminated to form a buildup layer, or a solder resist layer (not shown) may be formed in a desired portion.

以上、本開示の印刷配線板の製造方法および印刷配線板を説明したが、本発明は上記実施形態に限定されるものではなく、種々の改善や改良が可能である。このような本開示の印刷配線板の製造方法によると、印刷配線板のビア形成用の穴にめっきを十分充填でき、例えば異なる径を有する少なくとも2種のビアがある場合でも、ビアのめっき表面の凹みを無くし、接続信頼性を向上させることができる。さらに、導体の研磨が選択的に行われるので、印刷配線板表面のビアと回路の表面が面一となり、寸法挙動の安定した印刷配線板を得ることができる。また、本開示の印刷配線板では凹みの無い大径のビアを放熱用導体として効率よく用いることができる。   Although the printed wiring board manufacturing method and the printed wiring board of the present disclosure have been described above, the present invention is not limited to the above-described embodiment, and various improvements and improvements can be made. According to such a method for manufacturing a printed wiring board of the present disclosure, a plating hole can be sufficiently filled in a via forming hole of the printed wiring board, for example, even when there are at least two types of vias having different diameters, It is possible to improve the connection reliability. Furthermore, since the conductor is selectively polished, the via on the printed wiring board surface and the surface of the circuit are flush with each other, and a printed wiring board with stable dimensional behavior can be obtained. Further, in the printed wiring board of the present disclosure, a large-diameter via without a dent can be efficiently used as a heat radiating conductor.

1、1´ 絶縁層
2 回路
3、3´、30 ビア
3a、4a 下穴
4、4´、40 ビア
30a、40a 穴
5 金属層
50 導体
50a 突出部
6 めっきレジスト
7 エッチングレジスト
9、9a 凹み
10、10´ 印刷配線板
10a 積層体
DESCRIPTION OF SYMBOLS 1, 1 'Insulating layer 2 Circuit 3, 3', 30 Via 3a, 4a Pilot hole 4, 4 ', 40 Via 30a, 40a Hole 5 Metal layer 50 Conductor 50a Protrusion part 6 Plating resist 7 Etching resist 9, 9a Recess 10 10 'printed wiring board 10a laminate

Claims (6)

少なくとも一方の表面に金属層が形成された絶縁層に、ビア形成用の穴を形成し、
ビア形成用の穴および該穴の周縁部に、めっきを選択的に形成し、
金属層表面から突出した部分のめっきを除去し、
サブトラクティブ法によって回路を形成することを特徴とする印刷配線板の製造方法。
Forming a hole for forming a via in an insulating layer having a metal layer formed on at least one surface;
A plating is selectively formed on a hole for forming a via and a peripheral portion of the hole,
Remove the plating that protrudes from the surface of the metal layer,
A method of manufacturing a printed wiring board, wherein a circuit is formed by a subtractive method.
前記金属層表面から突出した部分のめっきが、セラミックバフによって選択的に除去される請求項1に記載の製造方法。   The manufacturing method according to claim 1, wherein plating of a portion protruding from the surface of the metal layer is selectively removed by a ceramic buff. 前記金属層が金属箔で形成されている請求項1または2に記載の製造方法。   The manufacturing method according to claim 1, wherein the metal layer is formed of a metal foil. 前記ビア形成用の穴が複数形成されており、異なる径を有する少なくとも2種の穴が存在している請求項1〜3のいずれかに記載の製造方法。   The manufacturing method according to claim 1, wherein a plurality of holes for forming the vias are formed, and there are at least two kinds of holes having different diameters. めっきが充填された少なくとも1つのビアと金属層で形成された回路とを含み、該ビアの表面と該回路の表面とが面一である絶縁層を、少なくとも1層含み、
該絶縁層が、少なくとも一方の表層を構成するように配置されていることを特徴とする印刷配線板。
Including at least one via filled with plating and a circuit formed of a metal layer, and including at least one insulating layer in which the surface of the via is flush with the surface of the circuit;
The printed wiring board, wherein the insulating layer is arranged to constitute at least one surface layer.
前記ビアの少なくとも1つが、放熱用導体である請求項5に記載の印刷配線板。   The printed wiring board according to claim 5, wherein at least one of the vias is a heat radiating conductor.
JP2016167501A 2016-08-30 2016-08-30 Method for manufacturing printed wiring board and printed wiring board Pending JP2018037476A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018123950A1 (en) 2018-03-02 2019-09-05 Hitachi Metals, Ltd. Insulated wire, coil and method of making the coil

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102018123950A1 (en) 2018-03-02 2019-09-05 Hitachi Metals, Ltd. Insulated wire, coil and method of making the coil

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