JP2018021093A5 - - Google Patents

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JP2018021093A5
JP2018021093A5 JP2016151282A JP2016151282A JP2018021093A5 JP 2018021093 A5 JP2018021093 A5 JP 2018021093A5 JP 2016151282 A JP2016151282 A JP 2016151282A JP 2016151282 A JP2016151282 A JP 2016151282A JP 2018021093 A5 JP2018021093 A5 JP 2018021093A5
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screen plate
carbon atoms
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JP2018021093A (en
JP6951059B2 (en
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Priority claimed from JP2016151282A external-priority patent/JP6951059B2/en
Priority to JP2016151282A priority Critical patent/JP6951059B2/en
Priority to PCT/JP2017/026231 priority patent/WO2018025648A1/en
Priority to KR1020197002981A priority patent/KR102176804B1/en
Priority to CN201780047526.7A priority patent/CN109563453B/en
Priority to TW106125434A priority patent/TWI734816B/en
Publication of JP2018021093A publication Critical patent/JP2018021093A/en
Publication of JP2018021093A5 publication Critical patent/JP2018021093A5/ja
Publication of JP6951059B2 publication Critical patent/JP6951059B2/en
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Claims (7)

２５℃の水１００ｇに対する溶解度が１０ｇ未満であるアミン（成分Ａ）又はその塩、２５℃の水１００ｇに対する溶解度が０．０２ｇ以上１０ｇ未満である溶剤（成分Ｂ）、及び水を含み、
前記成分Ａが、下記式（Ｉ）で表される化合物から選ばれる少なくとも１種である、スクリーン版用洗浄剤組成物。
Figure 2018021093
 上記式（Ｉ）において、Ｒ 1 は、炭素数５以上１８以下の直鎖又は分岐鎖のアルキル基、及び炭素数５以上１８以下の直鎖又は分岐鎖のアルケニル基から選ばれる少なくとも１種を示し、Ｒ 2 及びＲ 3 は同一又は異なり、炭素数１以上５以下の直鎖又は分岐鎖のアルキル基、及び水素原子から選ばれる少なくとも１種を示し、Ｒ 1 、Ｒ 2 及びＲ 3 の合計炭素数が６以上２６以下である。 An amine (component A) or a salt thereof having a solubility in 100 g of water at 25 ° C. of less than 10 g, a solvent (component B) having a solubility in 100 g of water at 25 ° C. of 0.02 g or more and less than 10 g, and water,
A cleaning composition for a screen plate, wherein the component A is at least one selected from compounds represented by the following formula (I) .
Figure 2018021093
 In the above formula (I), R 1 is at least one selected from a linear or branched alkyl group having 5 to 18 carbon atoms and a linear or branched alkenyl group having 5 to 18 carbon atoms. R 2 and R 3 are the same or different and represent at least one selected from a linear or branched alkyl group having 1 to 5 carbon atoms and a hydrogen atom, and the total of R 1 , R 2 and R 3 The number of carbon atoms is 6 or more and 26 or less. ｐＨが５以上１２以下である、請求項１記載のスクリーン版用洗浄剤組成物。   The cleaning composition for a screen plate according to claim 1, wherein the pH is 5 or more and 12 or less. 成分Ａの塩が、前記式（Ｉ）で表される化合物から選ばれる少なくとも１種の化合物と、カルボキシ基、スルホン酸基、硫酸基及びリン酸基を１〜３個有する炭素数２以上１２以下の化合物並びにギ酸から選ばれる少なくとも１種の化合物との塩である、請求項１又は２に記載のスクリーン版用洗浄剤組成物。 The salt of component A has at least one compound selected from the compounds represented by the formula (I) and 2 to 12 carbon atoms having 1 to 3 carboxy groups, sulfonic acid groups, sulfuric acid groups, and phosphoric acid groups. The cleaning composition for a screen plate according to claim 1 or 2 , which is a salt with the following compound and at least one compound selected from formic acid. 成分Ｂが、下記式（ＩＩ）で表される化合物から選ばれる少なくとも１種の化合物である、請求項１から３のいずれかに記載のスクリーン版用洗浄剤組成物。
Ｒ4Ｏ−（ＥＯ）m（ＰＯ）n−Ｈ （ＩＩ）
上記式（ＩＩ）において、Ｒ4は、炭素数３以上１２以下の炭化水素基を示し、ＥＯはエチレンオキシド基を示し、ｍはＥＯの付加モル数であって０以上５以下の数であり、ＰＯはプロピレンオキシド基を示し、ｎはＰＯの付加モル数であって０以上２以下の数であり、ｍ＋ｎ≧１であり、ＥＯとＰＯの付加形態はブロックでもランダムでもよく、ＥＯとＰＯの付加順序は問わない。 The cleaning composition for screen plates according to any one of claims 1 to 3 , wherein Component B is at least one compound selected from compounds represented by the following formula (II).
R 4 O— (EO) m (PO) n —H (II)
In the above formula (II), R 4 represents a hydrocarbon group having 3 to 12 carbon atoms, EO represents an ethylene oxide group, m is an added mole number of EO, and is a number from 0 to 5; PO represents a propylene oxide group, n is the number of moles of PO added and is a number of 0 or more and 2 or less, m + n ≧ 1, and the addition form of EO and PO may be block or random. The order of addition does not matter. カルボキシ基、スルホン酸基、硫酸基及びリン酸基を１〜３個有する炭素数２以上１２以下の化合物並びにギ酸から選ばれる少なくとも１種の酸（成分Ｃ）をさらに含む、請求項１から４のいずれかに記載のスクリーン版用洗浄剤組成物。 Carboxy group, a sulfonic acid group, further comprising two or more carbon atoms having 1 to 3 sulfate groups and phosphate groups 12 the following compounds and at least one acid selected from formic acid (component C), of claims 1-4 A cleaning composition for a screen plate according to any one of the above. 請求項１から５のいずれかに記載の洗浄剤組成物を用いて被洗浄物を洗浄する工程を含み、
前記被洗浄物は、スクリーン印刷後のスクリーン版である、スクリーン版の洗浄方法。 Comprising the step of washing the object to be cleaned using the cleaning agent composition according to any one of claims 1 to 5,
The method for cleaning a screen plate, wherein the object to be cleaned is a screen plate after screen printing. 前記洗浄後のスクリーン版を濯がずに乾燥する工程を含む、請求項６に記載のスクリーン版の洗浄方法。 The method for washing a screen plate according to claim 6 , comprising a step of drying the rinsed screen plate without rinsing.
JP2016151282A 2016-08-01 2016-08-01 Detergent composition for screen plate Active JP6951059B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2016151282A JP6951059B2 (en) 2016-08-01 2016-08-01 Detergent composition for screen plate
PCT/JP2017/026231 WO2018025648A1 (en) 2016-08-01 2017-07-20 Detergent composition for screen printing plate
KR1020197002981A KR102176804B1 (en) 2016-08-01 2017-07-20 Screen plate cleaner composition
CN201780047526.7A CN109563453B (en) 2016-08-01 2017-07-20 Cleaning agent composition for screen printing plate
TW106125434A TWI734816B (en) 2016-08-01 2017-07-28 Detergent composition for screen plate

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JP2016151282A JP6951059B2 (en) 2016-08-01 2016-08-01 Detergent composition for screen plate

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JP2018021093A JP2018021093A (en) 2018-02-08
JP2018021093A5 true JP2018021093A5 (en) 2019-08-08
JP6951059B2 JP6951059B2 (en) 2021-10-20

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JP (1) JP6951059B2 (en)
KR (1) KR102176804B1 (en)
CN (1) CN109563453B (en)
TW (1) TWI734816B (en)
WO (1) WO2018025648A1 (en)

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CN111097746A (en) * 2019-12-18 2020-05-05 西安英诺维特新材料有限公司 Cleaning method of photovoltaic solder strip mold
CN112760660A (en) * 2020-12-25 2021-05-07 浙江亚欣包装材料有限公司 Cleaning agent for holographic nickel plate and preparation method thereof
WO2023017749A1 (en) 2021-08-10 2023-02-16 日油株式会社 Cleaning agent for electroconductive paste and method for cleaning electroconductive paste
JP2024112297A (en) * 2023-02-07 2024-08-20 花王株式会社 Flux cleaning composition

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