JP2018021093A5 - - Google Patents
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- JP2018021093A5 JP2018021093A5 JP2016151282A JP2016151282A JP2018021093A5 JP 2018021093 A5 JP2018021093 A5 JP 2018021093A5 JP 2016151282 A JP2016151282 A JP 2016151282A JP 2016151282 A JP2016151282 A JP 2016151282A JP 2018021093 A5 JP2018021093 A5 JP 2018021093A5
- Authority
- JP
- Japan
- Prior art keywords
- screen plate
- carbon atoms
- component
- group
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004140 cleaning Methods 0.000 claims 8
- 150000001875 compounds Chemical class 0.000 claims 8
- 125000004432 carbon atoms Chemical group C* 0.000 claims 7
- BDAGIHXWWSANSR-UHFFFAOYSA-N formic acid Chemical compound OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims 6
- 150000003839 salts Chemical class 0.000 claims 3
- 239000011780 sodium chloride Substances 0.000 claims 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 3
- 125000000217 alkyl group Chemical group 0.000 claims 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 2
- 235000019253 formic acid Nutrition 0.000 claims 2
- 125000000542 sulfonic acid group Chemical group 0.000 claims 2
- 238000005406 washing Methods 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 150000001412 amines Chemical class 0.000 claims 1
- 239000012459 cleaning agent Substances 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 125000004435 hydrogen atoms Chemical group [H]* 0.000 claims 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N oxane Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N propylene oxide Chemical group CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims 1
- 238000007650 screen-printing Methods 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid group Chemical group S(O)(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 1
Claims (7)
前記成分Aが、下記式(I)で表される化合物から選ばれる少なくとも1種である、スクリーン版用洗浄剤組成物。
A cleaning composition for a screen plate, wherein the component A is at least one selected from compounds represented by the following formula (I) .
R4O−(EO)m(PO)n−H (II)
上記式(II)において、R4は、炭素数3以上12以下の炭化水素基を示し、EOはエチレンオキシド基を示し、mはEOの付加モル数であって0以上5以下の数であり、POはプロピレンオキシド基を示し、nはPOの付加モル数であって0以上2以下の数であり、m+n≧1であり、EOとPOの付加形態はブロックでもランダムでもよく、EOとPOの付加順序は問わない。 The cleaning composition for screen plates according to any one of claims 1 to 3 , wherein Component B is at least one compound selected from compounds represented by the following formula (II).
R 4 O— (EO) m (PO) n —H (II)
In the above formula (II), R 4 represents a hydrocarbon group having 3 to 12 carbon atoms, EO represents an ethylene oxide group, m is an added mole number of EO, and is a number from 0 to 5; PO represents a propylene oxide group, n is the number of moles of PO added and is a number of 0 or more and 2 or less, m + n ≧ 1, and the addition form of EO and PO may be block or random. The order of addition does not matter.
前記被洗浄物は、スクリーン印刷後のスクリーン版である、スクリーン版の洗浄方法。 Comprising the step of washing the object to be cleaned using the cleaning agent composition according to any one of claims 1 to 5,
The method for cleaning a screen plate, wherein the object to be cleaned is a screen plate after screen printing.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016151282A JP6951059B2 (en) | 2016-08-01 | 2016-08-01 | Detergent composition for screen plate |
KR1020197002981A KR102176804B1 (en) | 2016-08-01 | 2017-07-20 | Screen plate cleaner composition |
PCT/JP2017/026231 WO2018025648A1 (en) | 2016-08-01 | 2017-07-20 | Detergent composition for screen printing plate |
CN201780047526.7A CN109563453B (en) | 2016-08-01 | 2017-07-20 | Cleaning agent composition for screen printing plate |
TW106125434A TWI734816B (en) | 2016-08-01 | 2017-07-28 | Detergent composition for screen plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016151282A JP6951059B2 (en) | 2016-08-01 | 2016-08-01 | Detergent composition for screen plate |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2018021093A JP2018021093A (en) | 2018-02-08 |
JP2018021093A5 true JP2018021093A5 (en) | 2019-08-08 |
JP6951059B2 JP6951059B2 (en) | 2021-10-20 |
Family
ID=61073409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016151282A Active JP6951059B2 (en) | 2016-08-01 | 2016-08-01 | Detergent composition for screen plate |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6951059B2 (en) |
KR (1) | KR102176804B1 (en) |
CN (1) | CN109563453B (en) |
TW (1) | TWI734816B (en) |
WO (1) | WO2018025648A1 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111386185A (en) | 2017-11-20 | 2020-07-07 | 日本聚丙烯株式会社 | Decorative film and method for producing decorative molded body using same |
US11441109B2 (en) | 2018-03-14 | 2022-09-13 | Mitsubishi Gas Chemical Company, Inc. | Cleaning solution for removing dry etching residue and method for manufacturing semiconductor substrate using same |
JP2020037726A (en) * | 2018-09-05 | 2020-03-12 | 株式会社トクヤマMetel | Method of cleaning metallic article |
JP7385597B2 (en) | 2018-12-05 | 2023-11-22 | 花王株式会社 | Cleaning composition for removing flux residue |
KR20210099006A (en) * | 2018-12-05 | 2021-08-11 | 카오카부시키가이샤 | cleaning of flux residues |
JP7305454B2 (en) * | 2019-06-20 | 2023-07-10 | アルバックテクノ株式会社 | How to wash the mask |
JP7372662B2 (en) * | 2019-09-20 | 2023-11-01 | 化研テック株式会社 | Cleaning compositions and stock solutions for cleaning compositions |
JP7372661B2 (en) * | 2019-09-20 | 2023-11-01 | 化研テック株式会社 | Cleaning compositions and stock solutions for cleaning compositions |
CN111097746A (en) * | 2019-12-18 | 2020-05-05 | 西安英诺维特新材料有限公司 | Cleaning method of photovoltaic solder strip mold |
CN112760660A (en) * | 2020-12-25 | 2021-05-07 | 浙江亚欣包装材料有限公司 | Cleaning agent for holographic nickel plate and preparation method thereof |
CN117545830A (en) | 2021-08-10 | 2024-02-09 | 日油株式会社 | Cleaning agent for conductive paste and cleaning method for conductive paste |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0525494A (en) * | 1991-07-24 | 1993-02-02 | Dai Ichi Kogyo Seiyaku Co Ltd | Detergent |
JPH05125395A (en) | 1991-11-05 | 1993-05-21 | Metsuku Kk | Cleaner composition |
JPH07276845A (en) * | 1994-04-04 | 1995-10-24 | Nippon Hyomen Kagaku Kk | Washing solution for screen printing plate |
JP4063344B2 (en) | 1995-08-23 | 2008-03-19 | 旭化成ケミカルズ株式会社 | Metal mask cleaning composition |
JPH0987668A (en) | 1995-09-27 | 1997-03-31 | Dai Ichi Kogyo Seiyaku Co Ltd | Cleansing agent composition and its regeneration method |
JP2000267293A (en) | 1999-03-15 | 2000-09-29 | Asahi Chem Ind Co Ltd | Composition for deterging screen plate |
JP4327322B2 (en) * | 2000-01-19 | 2009-09-09 | 昭和電工株式会社 | Soldering flux and solder paste |
JP2006199939A (en) * | 2004-12-20 | 2006-08-03 | Sanyo Chem Ind Ltd | Cleanser for electronics |
JP2006265300A (en) | 2005-03-22 | 2006-10-05 | Tokuyama Corp | Detergent |
KR101530321B1 (en) * | 2007-08-08 | 2015-06-19 | 아라까와 가가꾸 고교 가부시끼가이샤 | Cleaner composition for removing lead-free soldering flux, and method for removing lead-free soldering flux |
JP5252853B2 (en) * | 2007-08-10 | 2013-07-31 | 花王株式会社 | Detergent composition for solder flux |
DE202007011599U1 (en) * | 2007-08-18 | 2007-11-15 | Wüstefeld, Jens-Hagen | Support structure for lightweight components |
CN101629131B (en) * | 2008-07-15 | 2011-09-14 | 村上精密制版(昆山)有限公司 | Silk screen cleaning agent for silk screen printing |
JP5556658B2 (en) * | 2008-08-27 | 2014-07-23 | 荒川化学工業株式会社 | Cleaning composition for lead-free solder flux removal and lead-free solder flux removal system |
JP5546263B2 (en) * | 2009-01-26 | 2014-07-09 | 化研テック株式会社 | Cleaning liquid regenerating device and circulating cleaning device |
US9193938B2 (en) * | 2012-05-28 | 2015-11-24 | Kao Corporation | Detergent compositions for endoscope washers |
JP6544237B2 (en) * | 2013-10-23 | 2019-07-17 | 荒川化学工業株式会社 | Recyclable industrial azeotropic cleaner, method of cleaning articles, method of regenerating industrial azeotropic cleaner, industrial azeotropic cleaner regenerated by the method of regeneration, and cleaning device |
-
2016
- 2016-08-01 JP JP2016151282A patent/JP6951059B2/en active Active
-
2017
- 2017-07-20 KR KR1020197002981A patent/KR102176804B1/en active IP Right Grant
- 2017-07-20 WO PCT/JP2017/026231 patent/WO2018025648A1/en active Application Filing
- 2017-07-20 CN CN201780047526.7A patent/CN109563453B/en active Active
- 2017-07-28 TW TW106125434A patent/TWI734816B/en active
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