JP2018012064A - Atomization device with back pressure function capable of stationary cleaning/sterilization - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an atomization device with back pressure function which can perform vapor sterilization and is capable of stationary cleaning/sterilization endurable for atomization of hard particles.SOLUTION: An atomization device which supplies vapor from a raw material supply port, upon sterilization, from a vapor supply means and supplies cleaning liquid from a cleaning liquid supply means upon cleaning includes: a partial extraction means for an atomization chamber which is provided on the immediate front of an atomization nozzle in the atomization chamber and discharges a part of vapor or cleaning liquid to an atomization nozzle supply channel exterior; a sub supply means for the atomization chamber which is provided on the immediate back of the atomization nozzle in the atomization chamber and supplies vapor or cleaning liquid additively into a back pressure nozzle supply channel; a partial extraction means for a back pressure unit which is provided on the immediate front of a back pressure nozzle in a back pressure unit and discharges a part of vapor or cleaning liquid to a back pressure nozzle supply channel exterior; and a sub supply means for the back pressure unit which is provided on the immediate back of the back pressure nozzle in the back pressure unit and supplies vapor or cleaning liquid additively into a back pressure unit subsequent channel.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an atomization device with a back pressure function capable of performing stationary cleaning or stationary sterilization in a flow path.

  The present applicant has proposed a wet atomization apparatus (see Patent Document 1) equipped with steam sterilization means capable of managing the sterilization state. In the wet atomization apparatus equipped with this steam sterilization means, sterilization can be effectively performed by suppressing the condensation and retention of steam in the internal space of the flow path. In addition, the sterilization condition can be effectively managed by periodically measuring the sterilization conditions, but it is also disclosed that the circuit can be steam-sterilized by manually supplying steam. .

  On the other hand, in a wet atomization apparatus that atomizes by high-pressure injection, it is effective to apply a back pressure immediately after the orifice subjected to high-pressure injection as an acceleration of atomization. That is, atomization is further promoted by applying a back pressure of the second stage, the third stage, or the fourth stage immediately after the orifice (chamber nozzle) subjected to high pressure injection. This is because atomization is promoted by cavitation impact which is one of atomization elements.

  In addition, by applying an appropriate back pressure derived from the pressure and flow rate, the cavitation bubbles can be ruptured / collapsed and the impact force can be increased. Further, cavitation can be suppressed (bubbles are not generated) depending on the degree of back pressure, and an effect of preventing bubbles that are alienated for atomization can be obtained.

JP 2013-42814 A

  In general, as a method of applying back pressure, there is a method of applying pressure by creating a narrow gap formed by a valve type valve and a valve seat. With this method, even for hard-wearing valves and valve seats, there are only ceramics and cemented carbides even if the material is selected as a hard body. Even in these cases, atomization of hard particles (metal, ceramic particles) The wear of the valve and valve seat was extensive. For this reason, the object to which the back pressure is applied has been limited to the droplet emulsion. That is, the back pressure mechanism has been limited to the purpose of promoting emulsion emulsification (high pressure homogenizer).

  Moreover, even if the back pressure of the second stage and the third stage that promotes the atomization and emulsification of the particles, a high pressure circuit of 5 to 100 MPa is obtained. Therefore, the device itself that applies the back pressure is maintained while maintaining the high pressure circuit. There was no automatic cleaning and sterilization mechanism.

  An object of this invention is to obtain the atomization apparatus with a back pressure function which can be sterilized and can be sterilized and can be sterilized by steam and can withstand atomization of hard particles (metal, ceramic particles).

The atomization apparatus with back pressure function capable of stationary cleaning and sterilization according to the invention described in claim 1 includes a pressure intensifier that pressurizes the raw material, and a high-pressure jet of the material pressurized by the pressure intensifier from the atomization nozzle A fine atomizing chamber that is atomized by an injection pressure of 100 to 245 MPa, and a high pressure jet from the back pressure nozzle to the hard body supported inside by the back pressure of the raw material discharged from the discharge port of the atomizing chamber. At least one back pressure unit to be collided, a pressure booster supply flow path for supplying the raw material from a raw material supply port for charging the raw material to the supply port of the pressure booster, and from the inside of the housing of the pressure booster to the atomization nozzle A atomization nozzle supply flow path for supplying a pressurized raw material, a back pressure nozzle supply flow path for supplying the raw material to the back pressure nozzle while maintaining the back pressure state of the raw material after injection of the atomization chamber, The back By maintaining a back pressure condition of the material struck hard body of the unit to a atomizer that includes a back-pressure unit subsequent flow path for supplying the downstream,
The raw material supply port is supplied with steam from the steam supply means during sterilization, and supplied with cleaning liquid from the cleaning liquid supply means during cleaning,
A partial extraction means for atomization chamber provided immediately before the atomization nozzle in the atomization chamber, for discharging a part of the vapor or the cleaning liquid to the outside of the atomization nozzle supply flow path;
A sub-feeding means for the atomization chamber, which is provided immediately after the atomization nozzle in the atomization chamber, and which supplies steam or a cleaning liquid into the back pressure nozzle supply channel,
A part extracting means for the back pressure unit provided immediately before the back pressure nozzle in the back pressure unit, for discharging a part of the steam or the cleaning liquid to the outside of the back pressure nozzle supply flow path;
A back pressure unit sub-supply means that is provided immediately after the back pressure nozzle in the back pressure unit and supplies steam or cleaning liquid to the back pressure unit subsequent flow path is provided. is there.

  The atomizing device with back pressure function according to the invention described in claim 2 can be used for stationary cleaning and sterilization, wherein the partial extraction means for the back pressure unit according to claim 1 has a length within 6 times the pipe diameter. It is connected to the blind hole passage and is characterized by turning on / off the outflow of steam or cleaning liquid.

  According to a third aspect of the present invention, there is provided a back-pressure function atomization device capable of stationary cleaning and sterilization, wherein the back-pressure unit according to claim 1 or 2 is communicated with an outlet of the atomization chamber, and A high-pressure jet from a back-pressure nozzle having a nozzle diameter larger than the nozzle diameter of the atomizing nozzle is made to collide with a hard body supported inside.

  The atomization apparatus with back pressure function capable of stationary cleaning and sterilization according to the invention described in claim 4 has a back pressure nozzle diameter (d2) according to claim 3 larger than the atomization nozzle diameter (d1), Back pressure nozzle diameter (d2) / atomization nozzle diameter (d1) = 1.6 to 2.4.

  The atomization device with back pressure function capable of stationary cleaning and sterilization according to the invention described in claim 5 is the back pressure unit auxiliary supply means according to any one of claims 1 to 4, wherein It is connected to a blind hole passage having a length of 6 times or less, and turns on or off the inflow of steam or cleaning liquid.

  The atomization apparatus with back pressure function capable of stationary cleaning and sterilization according to the invention described in claim 6 is characterized in that the blind hole flow path of the sub pressure supply means for the back pressure unit according to claim 5 is supported by the hard body. It is characterized by being distributed to the collision chamber.

  The atomization apparatus with back pressure function capable of stationary cleaning and sterilization according to the invention described in claim 7 has one or more back pressure units according to any one of claims 1 to 6 connected in series. It is provided.

  INDUSTRIAL APPLICABILITY The present invention has an effect that it is possible to obtain a atomizing device with a back pressure function that can be sterilized by steam and can withstand the atomization of hard particles (metal, ceramic particles) and can be cleaned in place and sterilized. More specifically, cleaning with a cleaning liquid and sterilization with steam can be performed without disassembling the atomization apparatus itself, and the working time can be greatly shortened.

It is a circuit diagram of one Example of the atomization apparatus of this invention, and is explanatory drawing which shows the circuit diagram of a atomization state. It is explanatory drawing which shows the structure of the atomization chamber and back pressure unit of the atomization state shown in FIG. It is explanatory drawing of the pressure booster of the atomization state shown in FIG. It is a simplified explanatory drawing which shows the structure of the back pressure unit shown in FIG. It is explanatory drawing which shows the structure of the back pressure unit shown in FIG. It is explanatory drawing which shows the structure of another back pressure unit. It is explanatory drawing which shows the circuit diagram of the washing | cleaning state of FIG. It is explanatory drawing which shows the structure of the atomization chamber and back pressure unit of the washing | cleaning state shown in FIG. It is explanatory drawing which shows the structure of the pressure booster of the washing | cleaning state shown in FIG. It is explanatory drawing which shows the circuit diagram of the sterilization state of FIG. It is explanatory drawing which shows the structure of the booster of the sterilization state shown in FIG.

  In the present invention, a pressure intensifier that pressurizes the raw material, a fine atomization chamber that atomizes the high pressure jet of the raw material pressurized by the pressure intensifier from the atomization nozzle at an injection pressure of 100 to 245 MPa, and the fine particles From at least one back pressure unit that causes high pressure jetting to collide with the hard body supported inside from the back pressure nozzle by the back pressure of the material discharged from the discharge port of the gasification chamber, and from the material supply port for charging the material A pressure intensifier supply channel for supplying a raw material to a supply port of the pressure intensifier, a atomization nozzle supply channel for supplying a pressurized material from the inside of the housing of the pressure intensifier to the atomization nozzle, and the atomization chamber A back pressure nozzle supply channel for supplying the raw material to the back pressure nozzle while maintaining the back pressure state of the raw material after the injection of the material, and maintaining the back pressure state of the raw material collided with the hard body of the back pressure unit An atomizing device that includes a back-pressure unit subsequent flow path for supplying the downstream.

  That is, the raw material is supplied from the raw material supply port to the pressure intensifier via the pressure intensifier supply flow path, and the raw material pressurized by the pressure intensifier is supplied to the atomization chamber via the atomization nozzle supply flow path. It atomizes by injecting a jet from the atomizing nozzle at an injection pressure of 100 to 245 MPa. In such a atomization chamber, in order to perform atomization efficiently, a hard body may be supported inside and may be collided with the hard body to promote atomization. Promoting further atomization of the raw material with one or more back pressure units while maintaining the back pressure state of the raw material discharged from the discharge port of the atomization chamber through the back pressure nozzle supply flow path and the back pressure unit subsequent flow path. To do.

  According to the present invention, in this atomization apparatus, the raw material supply port is supplied with steam from the vapor supply means during sterilization, and supplied with cleaning liquid from the cleaning liquid supply means during cleaning, immediately before the atomization nozzle in the atomization chamber. A part of the atomization chamber for discharging the vapor or the cleaning liquid to the outside of the atomization nozzle supply flow path, and the vapor or the cleaning liquid provided immediately after the atomization nozzle in the atomization chamber A sub-supply means for the atomization chamber that supplies the back pressure nozzle supply flow path to the back pressure nozzle supply flow path, and a part of the steam or cleaning liquid provided immediately before the back pressure nozzle in the back pressure unit. For the back pressure unit, which is provided immediately after the back pressure nozzle in the back pressure unit and supplies steam or cleaning liquid to the back pressure unit subsequent flow path. Vice And a feeding means. As a result, there is an effect that it is possible to obtain a atomizing device with a back pressure function capable of performing steam sterilization and capable of withstanding and sterilizing that can withstand the atomization of hard particles (metal, ceramic particles).

  That is, in the atomization apparatus of the present invention, by the atomization chamber that collides the high-pressure jet of the raw material pressurized by the pressure intensifier with the atomization hard body supported inside with an injection pressure of 100 to 245 MPa from the atomization nozzle, The raw material is atomized. At this time, the raw material is atomized because it includes at least one back pressure unit that causes the back pressure nozzle to collide with the hard body supported inside by the back pressure of the raw material discharged from the discharge port of the atomization chamber. Is more promoted.

  In the atomization apparatus of the present invention, stationary cleaning CIP (Cleaning-in-Place) and steam sterilization (stationary) are performed by a steam supply means for supplying steam to the raw material supply port and a cleaning liquid supply means for supplying cleaning liquid to the raw material supply port. Sterilization SIP (Sterilization-in-Place) is performed, that is, cleaning is performed by flowing a cleaning liquid from the raw material supply port into the flow path, and sterilization is performed by flowing steam from the raw material supply port into the flow path.

  That is, a part of the cleaning liquid is discharged to the outside of the atomization nozzle supply channel immediately before the atomization nozzle of the atomization chamber by the partial extraction means for the atomization chamber, and the atomization nozzle is supplied by the auxiliary supply means for the atomization chamber. Immediately after that, the cleaning liquid is added and supplied into the back pressure nozzle supply flow path to ensure cleaning of the atomization chamber. Furthermore, a part of the cleaning liquid is discharged to the outside of the back pressure nozzle supply flow path immediately before the back pressure nozzle of the back pressure unit by the partial extraction means for the back pressure unit, and the back pressure nozzle is supplied by the back pressure unit auxiliary supply means. Immediately after that, the cleaning liquid is added and supplied into the back pressure unit subsequent flow path to ensure the cleaning of the back pressure unit.

  Further, a part of the vapor is discharged to the outside of the atomization nozzle supply flow path just before the atomization nozzle of the atomization chamber by the partial extraction means for the atomization chamber, and the atomization nozzle is supplied by the auxiliary supply means for the atomization chamber. Immediately after that, steam is added and supplied into the back pressure nozzle supply flow path to ensure sterilization in the atomization chamber. Further, a part of the vapor for the back pressure unit is discharged from the back pressure nozzle supply channel immediately before the back pressure nozzle of the back pressure unit by the partial extraction means for the back pressure unit, and the back pressure nozzle is discharged by the sub supply means for the back pressure unit. Immediately after that, steam is added and supplied into the back pressure unit subsequent flow path to ensure sterilization in the back pressure unit.

  The back pressure unit of the present invention is a unit that causes high pressure jetting to collide with a hard body supported inside from the back pressure nozzle by the back pressure of the raw material discharged from the discharge port of the atomization chamber. More preferably, it is a hard body that is connected to the discharge port of the atomization chamber and supports a high-pressure jet from a back pressure nozzle having a nozzle diameter larger than the nozzle diameter of the atomization nozzle. It is a thing to collide with.

  The partial extraction means for the back pressure unit of the present invention may be any means provided in front of the back pressure nozzle in the back pressure unit and discharging a part of the steam or the cleaning liquid to the outside of the back pressure nozzle supply channel. More preferably, it is connected to a blind hole passage having a length within 6 times the diameter of the pipe to turn on or off the outflow of steam or cleaning liquid. Accordingly, there is an advantage that the so-called “6D law (that is, the length of the blind hole is within 6 times the diameter of the pipe)” that is a regulation of the blind hole that regulates the liquid pool in the circuit of the sterilization and cleaning is provided. Yes, even pharmaceuticals can be atomized in the same way.

  The sub-supply unit for the back pressure unit according to the present invention may be any means provided immediately after the back pressure nozzle in the back pressure unit and supplying steam or cleaning liquid into the back pressure unit subsequent flow path. Preferably, it is connected to a blind hole passage having a length within six times the diameter of the pipe to turn on or off the inflow of steam or cleaning liquid. Thus, as with the partial extraction means for the back pressure unit, the so-called “6D law” (that is, the length of the blind hole is the pipe diameter), which is a regulation of a blind hole that regulates a liquid pool in a sterilizing and cleaning pharmaceutical device circuit. Within 6 times as much as the above) ”, and even pharmaceuticals can be similarly atomized.

  The atomization chamber partial extraction means, the back pressure unit partial extraction means, and the atomization chamber auxiliary supply means and the back pressure unit auxiliary supply means remove vapor or cleaning liquid from the path. Alternatively, the same automatic on / off valve may be used to feed into the path. That is, since the atomization nozzle or the back pressure nozzle of each chamber has a smaller diameter than the flow path diameter, it is difficult for vapor or cleaning liquid to pass through. Therefore, an automatic on / off valve for the steam / cleaning liquid drain is provided in front of each nozzle, and the steam / cleaning liquid is allowed to flow through another automatic on / off valve for sterilization / cleaning after the nozzle.

  The automatic on / off valves are both closed during high-pressure atomization, and both valves are opened during sterilization or cleaning to flow steam or cleaning liquid. For this reason, the steam sterilization to the ultrafine passage in the nozzle is within the regulation of 6D, so that the steam / cleaning liquid is spread inside, and the stationary sterilization and the stationary cleaning are possible.

  The blind hole flow path of the sub pressure supply unit for the back pressure unit is preferably distributed in a collision chamber in which a hard body is supported. Thereby, a washing | cleaning liquid and vapor | steam can touch a hard body favorably, and washing | cleaning and sterilization are performed favorably.

  Furthermore, the hard body of the back pressure unit is supported inside the back pressure unit and is collided with a high pressure jet from the back pressure nozzle. More preferably, the back pressure unit is injected in the back pressure unit body. It is a spherical hard body that is eccentric from the fluid axis and is rotatably supported in the collision chamber. Thereby, since it always rotates by the collision of a high-speed jet, the intensive damage is reduced and the advantage that durability is improved is obtained.

  The back pressure unit of the present invention promotes atomization by further applying back pressure to the atomization nozzle. For this reason, the back pressure can be effectively utilized by making the diameter of the back pressure nozzle larger than the diameter of the atomizing nozzle. More specifically, the back pressure nozzle diameter (d2) is larger than the atomization nozzle diameter (d1) of 0.1 to 0.5 mm with respect to the back pressure nozzle diameter (d2) of 0.16 to 1.2 mm. ) / Atomization nozzle diameter (d1) = 1.6 to 2.4. Thereby, with respect to the atomization nozzle collided with the atomization hard body supported inside with the injection pressure of 100 to 245 MPa, the back pressure nozzle has an injection pressure of 8 to 20 MPa.

  One or more back pressure units of the present invention may be connected to form a plurality of stages. That is, atomization is further promoted by connecting one or more back pressure units of the present invention in two or three stages. Specifically, a part for the back pressure unit that is provided immediately before the back pressure nozzle in the back pressure unit in the subsequent back pressure unit and discharges a part of the steam or the cleaning liquid to the outside of the back pressure nozzle supply channel. Extraction means, and back pressure unit sub supply means that is provided immediately after the back pressure nozzle in the back pressure unit and supplies steam or cleaning liquid to the back pressure unit subsequent flow path.

  Also in the atomization chamber of the present invention, as with the back pressure unit, the on / off valve and the auxiliary supply means are connected to a blind hole passage having a length within 6 times the diameter of the pipe to turn on or off the outflow of steam or cleaning liquid. Alternatively, the high pressure jet may collide with a hard body supported inside, or the blind hole flow channel may be circulated to a collision chamber where the hard body is supported.

The difference between the atomization chamber of the present invention and the back pressure unit is that (1) the diameter of the back pressure nozzle is larger than the diameter of the atomization nozzle. When the atomization nozzle injection pressure P1, the back pressure nozzle injection pressure P2, the atomization nozzle diameter d1, and the back pressure nozzle diameter d2, the following equation holds.
(D2 / d1) ⁴ = P1 / P2
The actual situation of P2 is approximately P2 = 8 to 20 MPa, and P1 is 150 to 245 MPa in the case of SBS (starburst), so P1 / P2 = 7 to 30, and practically 10 to 24. That is, d2 / d1 = 1.6 to 2.4, and practically 1.7 to 2.2. For example, from d1 = 0.17 and d2 = 0.3, d2 / d1 = 1.76. Become.

  Other differences include (2) the difference in the distance between the nozzle and the hard body. In the atomization chamber, consider collision with the ball in anticipation of atomization impact force. In other words, the closer the distance, the more effective. On the other hand, since the back pressure unit is a simple jet catcher, it is a priority to keep a distance that does not wear.

  Still another difference is (3) the difference in the shape of the orifice. Basically the same shape may be used, but if it makes a difference, the atomization nozzle needs an atomization impact force, so the jet flow is jetted straight so as not to reduce the jet velocity as much as possible It becomes a shape. On the other hand, the back pressure nozzle is not related to the shape of the jet flow, so any shape is possible. Rather, an orifice shape in which the jet is scattered is good so as not to give an impact to the ball.

  Other differences include (4) selection of hard bodies. Since the hard body of the back pressure unit has a smaller impact force than the atomization chamber, it can be made smaller, and the material of the back pressure unit can be selected from those who are vulnerable to impact, or the same material as the atomization chamber may be used. Further, (5) the back pressure unit is as low as P1 / P2 = 7 to 30 and close to 10 to 24 in reality, so that the pressure resistance / wear countermeasure structure can be simplified.

  FIG. 1 is a circuit diagram of an embodiment of the atomization apparatus of the present invention, and is an explanatory diagram showing a circuit diagram in the atomization state. FIG. 2 is an explanatory diagram showing the configuration of the atomization chamber and the back pressure unit in the atomization state shown in FIG. FIG. 3 is an explanatory diagram of the pressure booster in the atomized state shown in FIG. FIG. 4 is a simplified explanatory diagram showing the configuration of the back pressure unit shown in FIG. FIG. 5 is an explanatory view showing the configuration of the back pressure unit shown in FIG. FIG. 6 is an explanatory view showing the configuration of another back pressure unit. FIG. 7 is an explanatory diagram showing a circuit diagram of the cleaning state of FIG. FIG. 8 is an explanatory view showing the structure of the atomization chamber and back pressure unit in the cleaning state shown in FIG. FIG. 9 is an explanatory diagram showing the configuration of the pressure booster in the cleaning state shown in FIG. FIG. 10 is an explanatory diagram showing a circuit diagram of the sterilized state of FIG. FIG. 11 is an explanatory diagram showing the configuration of the sterilized pressure booster shown in FIG.

  As shown in FIG. 1, the atomization apparatus 10 of the present embodiment includes, as main devices, two intensifiers 20 that pressurize the raw material, and a high-pressure jet of the raw material pressurized by the intensifier 20 at 100 to 245 MPa. The high pressure jet is made to collide with the hard body supported inside from the back pressure nozzle by the back pressure of the raw material discharged from the discharge port of the atomization chamber 30 and the atomization chamber 30 which is atomized by the injection pressure of At least one back pressure unit 40 and a heat exchanger 50 that recovers the heat of the raw material that has passed through the back pressure unit 40 are provided.

  Individual devices communicate with each other through a flow path. Specifically, the pressure booster supply flow path 12 for supplying the raw material from the raw material supply port 11 for supplying the raw material to the supply port of the pressure booster 20, and the atomization inside the atomization chamber 30 from the housing of the pressure booster 20. A back-pressure nozzle of the back pressure unit 40 is maintained by maintaining the back pressure state of the material sprayed from the atomization nozzle supply flow path 13 for supplying the material pressurized to the nozzle and the atomization nozzle of the atomization chamber 30. The back pressure nozzle supply flow path 14 for supplying the raw material, and the back pressure unit subsequent flow path 15 for maintaining the back pressure state of the raw material collided with the hard body inside the back pressure unit 40 and supplying it downstream.

  As shown in FIGS. 2 and 8, the atomization chamber 30 and the back pressure unit 40 are disposed. In the atomization chamber 30, an atomized hard body (not shown) is supported in an internal collision chamber 31, and a raw material pressurized by the pressure booster 20 shown in FIG. In order to make it collide by injecting with high injection pressure. Specifically, the nozzle diameter of the atomizing nozzle 32 is 0.1 to 0.5 mm, and the nozzle is injected at an injection pressure of 100 to 245 MPa. The pressure booster 20 always drives the plunger 24 that slides in the cylinders 21 of the two pressure boosters 20 with a half cycle shift, so that the two sets of check valves 22 and 23 always make the atomization nozzle supply flow path 13. The raw material is pressurized at a high pressure. A high pressure sensor 38 is attached to the atomization nozzle supply flow path 13 immediately before the atomization chamber 30, and a back pressure pressure sensor 48 is connected to the back pressure nozzle supply flow path 14 immediately before the back pressure unit 40. Is installed.

  In the atomization chamber 30, immediately before the atomization nozzle 32, a part of the steam or the cleaning liquid flowing in the atomization nozzle supply channel 13 during cleaning or sterilization of the atomization apparatus 10 is atomized nozzle supply channel. An extraction on / off valve 33 is provided as a partial extraction means for the atomization chamber that discharges to the outside. Further, immediately after the atomization nozzle 32, it is added to the back pressure nozzle supply flow path 14 so as to supplement the steam or the cleaning liquid discharged by the extraction on / off valve 33 during the cleaning or sterilization of the atomization apparatus 10. A sub supply on / off valve 34 is provided as sub supply means for the atomization chamber.

  In the atomization apparatus 10 of the present embodiment, when the raw material is atomized, the extraction on / off valve 33 and the auxiliary supply on / off valve 34 of the atomization chamber 30 and the extraction on / off valve 43 and the auxiliary supply of the back pressure unit 40 are provided. The on / off valve 34 is closed, and the supply valve 16 is also closed. In addition, the plunger 24 of the pressure booster 20 is slidably installed in the cylinder 21. By driving the plunger 24 sliding inside the cylinder 21 of the pressure booster 20 with a half cycle shift, the raw material is supplied from the raw material supply port 11 by opening and closing the check valves 22 and 23 and pressurized to MAX245 MPa by the pressure booster. And atomized in the atomization chamber 30. Thereafter, atomization is promoted by the back pressure unit 40 and the heat is passed through the heat exchanger 50 and discharged.

  Specifically, a blind hole passage 35 is branched from the atomization nozzle supply flow channel 13 immediately before the atomization nozzle 32, and an extraction on / off valve 33 is provided at an end of the passage. The blind hole passage 35 has a branch length within six times the diameter of the blind hole passage 35. Further, another blind hole passage 36 is branched from the back pressure nozzle supply flow path 14 immediately after the atomization nozzle 32, and a sub supply on / off valve 34 of the sub supply means for the atomization chamber is provided at the end of the passage. Yes. This blind hole passage 36 also has a branching length within six times the diameter of the blind hole passage 35. Thereby, even in the case of stationary cleaning and stationary sterilization, the so-called “6D law” (that is, the blind hole length is 6 times the pipe diameter), which is a regulation of a blind hole that regulates a liquid pool in a pharmaceutical device circuit that performs sterilization and cleaning. Within a small amount), and even a pharmaceutical can be atomized in the same manner.

  As shown in FIGS. 4 and 5, in the back pressure unit 40, as in the atomization chamber 30, a back pressure hard body 47 made of ceramic balls is supported in an internal collision chamber 41, and the hard body 47 is atomized. The material is ejected from the back pressure nozzle 42 by the back pressure of the raw material discharged from the discharge port of the chamber 30 to collide. Specifically, the nozzle diameter of the back pressure nozzle 42 is 0.16 to 1.2 mm, and the back pressure nozzle 42 is injected at an injection pressure of approximately 8 to 20 MPa.

  Similar to the atomization chamber 30, the back pressure unit 40 includes a vapor or cleaning liquid that flows in the back pressure nozzle supply channel 14 immediately before the back pressure nozzle 42 during the cleaning or sterilization of the atomization apparatus 10. An extraction on / off valve 43 is provided as a partial extraction means for the back pressure unit that discharges the portion out of the back pressure nozzle supply flow path 14. Further, immediately after the back pressure nozzle 42, it is added to the back pressure nozzle subsequent flow path 15 so as to supplement the steam or the cleaning liquid discharged by the extraction on / off valve 43 during the cleaning or sterilization of the atomization apparatus 10. A sub supply on / off valve 44 is provided as a sub pressure supply means for the back pressure unit.

  Specifically, a blind hole passage 45 is branched from the back pressure nozzle supply channel 14 immediately before the back pressure nozzle 42, and an extraction on / off valve 43 is provided at an end of the passage. This blind hole passage 45 has a branch length within six times the diameter of the blind hole passage 45. Further, a blind hole passage 46 branches off from the back pressure nozzle subsequent flow path 15 immediately after the back pressure nozzle 42, and a sub supply on / off valve 44 of the back pressure unit sub supply means is provided at the end of the passage. This blind hole passage 46 also has a branch length within six times the diameter of the blind hole passage 45. Thereby, even in the case of stationary cleaning and stationary sterilization, the so-called “6D law” (that is, the blind hole length is 6 times the pipe diameter), which is a regulation of a blind hole that regulates a liquid pool in a pharmaceutical device circuit that performs sterilization and cleaning. Within a small amount), and even a pharmaceutical can be atomized in the same manner.

  The extraction on / off valve 43 and the auxiliary supply on / off valve 44 can be sealed up to 100 MPa and do not need to use an O-ring seal. Become. In addition, by combining multiple orifices (such as three stages) with the orifice resistance by the back pressure nozzle and the collision ceramic balls, the pressure is gradually reduced from the injection pressure to the final outlet pressure, suppressing the generation of bubbles and wear resistance. Can be obtained. When a plurality of back pressure units are combined in two or three stages, another back pressure unit including the same extraction on / off valve 43 and sub-supply on / off valve 44 may be added downstream of the back pressure unit.

  The blind hole passage 46 in which the sub supply on / off valve 44 of the back pressure unit 40 is provided may be provided immediately after the back pressure nozzle. Preferably, in the back pressure unit 60 shown in FIG. You may distribute | circulate to the collision chamber 61 in which 67 is supported. That is, immediately before the back pressure nozzle 62, an extraction on / off valve 63 for discharging a part of the steam or the cleaning liquid to the outside of the back pressure nozzle supply flow path 14 is provided, and the collision chamber 61 in which the back pressure hard body 67 is supported. In addition, a supply port for a sub supply on / off valve 64 is provided so as to supplement the steam or the cleaning liquid and supply it into the back pressure nozzle subsequent flow path 15.

  In the atomization apparatus 10 of the present embodiment, it is possible to perform stationary cleaning and stationary sterilization. As shown in FIGS. 7 and 8, during the stationary cleaning, the extraction on / off valve 33 and the sub supply on / off valve 34 of the atomization chamber 30 and the extraction on / off valve 43 and the sub supply on / off valve 44 of the back pressure unit 40 are opened. Then, the supply valve 16 for supplying the cleaning liquid to the auxiliary supply on / off valves 34 and 44 is opened. In addition, as shown in FIG. 9, the plunger 24 of the pressure booster 20 is retracted until it is removed from the ultra-high pressure seal portion, and the steam drains E and F reaching the discharge path 18 communicating with the cylinder support 25 from which the plunger 24 has come off are passed. .

  The cleaning liquid is supplied from the raw material supply port 11 and flows to the pressure booster 20. During the flow to the pressure intensifier, the cleaning liquid is branched from the supply valve 16 and flows to the auxiliary supply on / off valves 34 and 44. The cleaning liquid that has flowed to the pressure booster 20 flows through the supply port side check valve 22 of the pressure booster 20 while branching to the plunger side, and flows downstream from the discharge port side check valve 23. The cleaning liquid that has flowed to the plunger side passes through the cylinder support 25 and is discharged even if it passes through the steam drain E or the steam drain F of each pressure booster 20. This flow cleans the pressure booster 20.

  The cleaning liquid flowing through the atomization nozzle supply flow path 13 via the pressure intensifier 20 enters the atomization chamber 30, partly passes through the blind on-off path 35, passes through the extraction on / off valve 33, passes through the steam drain D, and is discharged from the discharge path. 18 is discharged. The other part flows through the atomizing nozzle 32 to the collision chamber 31 on the downstream side. The cleaning liquid branched from the supply valve 16 and flowing to the sub-supply on / off valve 34 passes through the blind hole passage 36 and merges with the cleaning liquid that has passed through the collision chamber 31 on the downstream side of the atomization nozzle and back pressure nozzle supply flow path 14. And then flows to the downstream back pressure unit 40.

  In the back pressure unit 40, part of the cleaning liquid passes through the blind passage 45, passes through the extraction on / off valve 43, passes through the steam drain C, and is discharged through the discharge path 18. The other part flows to the collision chamber 41 on the downstream side via the back pressure nozzle 42. The cleaning liquid branched from the supply valve 16 and flowing to the sub-supply on / off valve 44 passes through the blind hole passage 46 and merges with the cleaning liquid that has passed through the collision chamber 41 on the downstream side of the atomization nozzle, and the back pressure unit subsequent flow path 15. Through the heat exchanger 50 and discharged. With these cleaning liquids, the atomization apparatus 10 of this embodiment is cleaned well.

  As shown in FIG. 10, the extraction on / off valve 33 and the auxiliary supply on / off valve 34 of the atomization chamber 30 and the extraction on / off valve 43 and the auxiliary supply on / off valve 44 of the back pressure unit 40 are the same as in the stationary cleaning at the time of stationary sterilization. And the supply valve 16 for supplying steam to the auxiliary supply on / off valves 34 and 44 is opened. In addition, as shown in FIG. 11, the plunger 24 of the pressure booster 20 is retracted until it comes out of the ultrahigh pressure seal portion.

  The steam is supplied from the raw material supply port 11 and flows to the pressure booster 20. During the flow to the pressure booster 20, the steam is branched from the supply valve 16 and flows to the auxiliary supply on / off valves 34 and 44. The steam that has flowed to the pressure booster 20 flows through the supply port side check valve 22 of the pressure booster 20 while branching to the plunger side, and then flows downstream from the discharge port side check valve 23. The steam flowing to the plunger side reaches the cylinder support. Downstream of the cylinder support, steam drains E and F that pass not only high-temperature (121 ° C or higher) steam but low-temperature air, low-temperature steam and condensed water generated by cooling of the steam are installed. The low-temperature air, the low-temperature steam and the condensed water generated by the cooling of the steam pass through the steam drains E and F and are discharged from the discharge path 18.

  Vapor flowing through the atomization nozzle supply flow path 13 via the pressure intensifier 20 enters the atomization chamber 30, partially passes through the blind passage 35, passes through the extraction on / off valve 33, passes through the steam drain D, and discharges 18 is discharged. The other part flows through the atomizing nozzle 32 to the collision chamber 31 on the downstream side. The steam branched from the supply valve 16 and flowing to the sub-supply on / off valve 34 passes through the blind hole passage 36 and merges with the steam that has passed through the collision chamber 31 on the downstream side of the atomization nozzle and back pressure nozzle supply flow path 14. And then flows to the downstream back pressure unit 40.

  In the back pressure unit 40, a part of the steam passes through the blind hole passage 45, passes through the extraction on / off valve 43, passes through the steam drain C, and is discharged through the discharge path 18. The other part flows to the collision chamber 41 on the downstream side via the back pressure nozzle 42. The steam branched from the supply valve 16 and flowing to the sub-supply on / off valve 44 passes through the blind hole passage 46 and merges with the steam that has passed through the collision chamber 41 on the downstream side of the atomization nozzle, and the back pressure unit subsequent flow path 15. Through the heat exchanger 50 and discharged. The atomization apparatus 10 of this embodiment is sterilized well by the flow of these vapors.

10 ... atomization device,
11 ... Raw material supply port,
12 ... pressure booster supply flow path,
13 ... atomization nozzle supply flow path,
14: Back pressure nozzle supply flow path,
15: Back pressure unit subsequent flow path,
16 ... Supply valve,
18 ... discharge path,
20 ... Intensifier,
21 ... Cylinder,
22 ... Check valve,
23 ... Check valve,
24 ... Plunger,
25 ... Cylinder support,
30 ... Atomization chamber,
31 ... Collision chamber,
32 ... atomizing nozzle,
33 ... Extraction on / off valve (partial extraction means for atomization chamber),
34 ... Sub supply on / off valve (sub supply means for atomization chamber),
35 ... blind hole passage,
36 ... blind hole passage,
38 ... Pressure sensor for high pressure,
40 ... Back pressure unit,
50 ... heat exchanger,
41 ... Collision chamber,
42 ... back pressure nozzle,
43 ... Extraction on / off valve (partial extraction means for back pressure unit),
44 ... Sub supply on / off valve (sub supply means for back pressure unit),
45 ... blind hole passage,
46 ... blind hole passage,
47. Back pressure hard body,
48 ... Pressure sensor for back pressure,

Claims (7)

A pressure intensifier for pressurizing the raw material, a atomization chamber for atomizing the high pressure jet of the material pressurized by the pressure intensifier from the atomization nozzle at an injection pressure of 100 to 245 MPa, and an outlet of the atomization chamber Supply of the pressure intensifier from the raw material supply port for charging the raw material with at least one back pressure unit that causes the back pressure nozzle to collide with the hard body supported inside from the back pressure nozzle with the back pressure discharged from the raw material A pressure intensifier supply channel for supplying the raw material to the mouth, a atomization nozzle supply channel for supplying a pressurized material from the inside of the housing of the pressure intensifier to the atomization nozzle, and a material after injection of the atomization chamber A back pressure nozzle supply channel that supplies the raw material to the back pressure nozzle while maintaining the back pressure state of the back pressure, and a back pressure that maintains the back pressure state of the raw material that has collided with the hard body of the back pressure unit and supplies it downstream. Pressure A atomizer that includes a Tsu preparative subsequent passage,
The raw material supply port is supplied with steam from the steam supply means during sterilization, and supplied with cleaning liquid from the cleaning liquid supply means during cleaning,
A partial extraction means for atomization chamber provided immediately before the atomization nozzle in the atomization chamber, for discharging a part of the vapor or the cleaning liquid to the outside of the atomization nozzle supply flow path;
A sub-feeding means for the atomization chamber, which is provided immediately after the atomization nozzle in the atomization chamber, and which supplies steam or a cleaning liquid into the back pressure nozzle supply channel,
A part extracting means for the back pressure unit provided immediately before the back pressure nozzle in the back pressure unit, for discharging a part of the steam or the cleaning liquid to the outside of the back pressure nozzle supply flow path;
In-situ cleaning comprising back pressure unit sub-supply means that is provided immediately after the back pressure nozzle in the back pressure unit and supplies steam or cleaning liquid to the back pressure unit subsequent flow path.・ Sterilization device with back pressure function that can be sterilized.   2. The back pressure unit partial extraction means is connected to a blind hole passage having a length within six times the diameter of the pipe, and turns on or off the outflow of steam or cleaning liquid. A fine atomizer with back pressure that can be cleaned and sterilized.   The back pressure unit is configured to collide a high pressure jet from a back pressure nozzle, which is in communication with the discharge port of the atomization chamber and has a nozzle diameter larger than the diameter of the atomization nozzle, against a hard body supported therein. The atomization device with back pressure function capable of stationary cleaning and sterilization according to claim 1 or 2.   The back pressure nozzle diameter (d2) is larger than the atomization nozzle diameter (d1), and the back pressure nozzle diameter (d2) / atomization nozzle diameter (d1) = 1.6 to 2.4. The atomization apparatus with the back pressure function which can be fixedly cleaned and sterilized according to claim 3.   5. The back pressure unit sub-supply means is connected to a blind hole passage having a length within six times the pipe diameter, and turns on / off the inflow of steam or cleaning liquid. The atomization apparatus with a back pressure function which can be cleaned and sterilized according to item 1.   The back pressure function capable of stationary cleaning and sterilization according to claim 5, wherein the blind hole flow path of the sub supply means for the back pressure unit is circulated in a collision chamber on which the hard body is supported. Attached atomizer.   The atomization apparatus with back pressure function capable of stationary cleaning and sterilization according to any one of claims 1 to 6, wherein one or more of the back pressure units are provided in series.

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