JP2017526805A - モリブデン酸ランタンのアブレイダブル皮膜、その形成方法、及び用途 - Google Patents
モリブデン酸ランタンのアブレイダブル皮膜、その形成方法、及び用途 Download PDFInfo
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Abstract
Description
12 中心回転軸
14 空気取入口側
16 排気側
18 コアガスタービンエンジン
20 高圧圧縮機
22 燃焼器
24 高圧タービン
26 低圧タービン
28 ファンアセンブリ
30 ファンブレード
32 ロータハブ
34 第1のロータ軸
36 第2のロータ軸
40 ロータブレード
42 静止シュラウド、金属シュラウド
43 隙間
44 ブレード端、先端部
46 内側の付け根部
48 翼形部
100 被覆基板、金属基板
102 基板
103 表面
104 移行層、ボンドコート、被膜
106 アブレイダブル皮膜
108 被膜
110 遮熱コーティング(TBC)
Claims (26)
- 表面(103)を画成する基板(102)と、
基板(102)の表面(103)上の、式:La2-xAxMo2-y-y'WyBy'O9-δを有し、結晶構造を形成するアブレイダブル皮膜(106)と
を含む被覆基板(100)。
式中、
Aは、Li、Na、K、Rb、Cs、Sc、Y、Ce、Pr、Nd、Pm、Sm、Eu、Gd、Tb、Dy、Ho、Er、Tm、Yb、Lu、Th、Be、Mg、Ca、Sr、Ba、Cu、Bi、Cd、Zn、Ag、Au、Pt、Ir、Rh、Ru、Pd又はそれらの組合せを含み、
0<x≦約0.2であり、
0≦y≦約1.5であり、
Bは、Ta、Nb、V、Fe、Cr、Mn、Co、Ni、Sn、Ga、Al、Re、In、S又はそれらの組合せを含み、
0≦y’≦約0.2(ただし、yとy’の合計は約0.01〜約1.6である。)であり、
0≦δ≦約0.2である。 - アブレイダブル皮膜(106)が、Y、Yb、Gd、Ce、Ca、Sr、Ba、及びその組合せからなる群から選択されるAを含有する、請求項1に記載の被覆基板(100)。
- アブレイダブル皮膜(106)が、Y及びYb、並びにその組合せからなる群から選択されるAを含有する、請求項1に記載の被覆基板(100)。
- アブレイダブル皮膜(106)においてyが0である、請求項1に記載の被覆基板(100)。
- アブレイダブル皮膜(106)においてy’が0である、請求項1に記載の被覆基板(100)。
- アブレイダブル皮膜(106)において0<y’≦約0.15である、請求項1に記載の被覆基板(100)。
- アブレイダブル皮膜(106)が、Ta、Nb、V又はそれらの組合せからなる群から選択されるBを含有する、請求項1に記載の被覆基板(100)。
- アブレイダブル皮膜(106)が、Fe、Cr、Mn、Co、Ni、Sn、Ga、Al、In又はそれらの組合せからなる群から選択されるBを含有する、請求項1に記載の被覆基板(100)。
- アブレイダブル皮膜(106)においてBはFeである、請求項1に記載の被覆基板(100)。
- 表面(103)を画成する基板(102)と、
基板(102)の表面(103)上の、式:La2-xYxMo2-y-y'WyBy'O9-δを有し、結晶構造を形成するアブレイダブル皮膜(106)と
を含む被覆基板(100)。
式中、
約0.05≦x≦約0.15、
0≦y≦約1.5、
約0.01≦y’≦約0.2、
0≦δ≦約0.2である。 - アブレイダブル皮膜(106)においてyが0であり、任意選択で約0.05<y’<約0.2である、請求項10に記載の被覆基板(100)。
- 表面(103)を画成する基板(102)と、
基板(102)の表面(103)上の、式:La2-xYxMo2-yWyO9-δを有し、結晶構造を形成するアブレイダブル皮膜(106)と
を含む被覆基板(100)。
式中、
約0.05≦x≦約0.15、
0≦y≦約1.5、
約0.01≦y’≦約0.2、
0≦δ≦約0.2である。 - アブレイダブル皮膜(106)においてyが0であり、任意選択で約0.05≦y’≦約0.2である、請求項12に記載の被覆基板(100)。
- 結晶構造は、約10体積%以下の二次相を含む単相構造を有することができる、請求項1に記載の被覆基板(100)。
- 単相構造が立方晶相の結晶構造である、請求項14に記載の被覆基板(100)。
- アブレイダブル皮膜(106)が約0.005インチ以上の厚さを有する、請求項1に記載の被覆基板(100)。
- 基板(102)が、Ni、Cr、及びCo又はそれらの組合せからなる群から選択される母材金属を含む超合金である、請求項1に記載の被覆基板(100)。
- 基板(102)とアブレイダブル皮膜(106)との間に位置するボンドコート(104)をさらに含む、請求項1に記載の被覆基板(100)。
- ボンドコート(104)がニッケルアルミナイド、白金アルミナイド、アルミニウム、及び酸化アルミニウム又はそれらの組合せからなる群から選択される拡散皮膜である、請求項18に記載の被覆基板(100)。
- ボンドコート(104)が式MCrAlY(式中、MはNi、Co、Fe、又はその混合物である)のものである、請求項18に記載の被覆基板(100)。
- ボンドコート(104)とアブレイダブル皮膜(106)との間に位置する遮熱コーティング(TBC)(110)をさらに含む、請求項18に記載の被覆基板(100)。
- TBC(110)が、ジルコン酸スカンジウム、ジルコン酸イットリウム、ジルコン酸ランタン、ジルコン酸セリウム、ジルコン酸プラセオジム、ジルコン酸ネオジム、ジルコン酸プロメチウム、ジルコン酸サマリウム、ジルコン酸ユーロピウム、ジルコン酸ガドリニウム、ジルコン酸テルビウム、ジルコン酸ジスプロシウム、ジルコン酸ホルミウム、ジルコン酸エルビウム、ジルコン酸ツリウム、ジルコン酸イッテルビウム、及びジルコン酸ルテチウム又はそれらの組合せからなる群から選択されるジルコン酸塩である、請求項21に記載被覆基板(100)。
- TBC(110)は、ハフニウム酸スカンジウム、ハフニウム酸イットリウム、ハフニウム酸ランタン、ハフニウム酸セリウム、ハフニウム酸プラセオジム、ハフニウム酸ネオジム、ハフニウム酸プロメチウム、ハフニウム酸サマリウム、ハフニウム酸ユーロピウム、ハフニウム酸ガドリニウム、ハフニウム酸テルビウム、ハフニウム酸ジスプロシウム、ハフニウム酸ホルミウム、ハフニウム酸エルビウム、ハフニウム酸ツリウム、ハフニウム酸イッテルビウム、及びハフニウム酸ルテチウム又はそれらの組合せからなる群から選択されるハフニウム酸塩である、請求項21に記載被覆基板(100)。
- 請求項1に記載の被覆基板(100)を備えるガスタービン(10)であって、
被覆基板(100)がブレード端(44)に隣接して位置づけられるシュラウド(42)を画成し、ブレード端(44)との接触時にアブレイダブル皮膜(106)の一部がシュラウド(42)から除去される、
ガスタービン(10)。 - ブレード端(44)がCMCである、請求項24に記載のガスタービン(10)。
- ブレード端(44)が耐環境コーティング(EBC)をさらに備え、アブレイダブル皮膜(106)がシュラウド(42)から除去される速度はEBCがブレード端(44)から除去される速度より遅い、請求項25に記載のガスタービン(10)。
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