JP2017502331A5 - - Google Patents

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Publication number
JP2017502331A5
JP2017502331A5 JP2016536814A JP2016536814A JP2017502331A5 JP 2017502331 A5 JP2017502331 A5 JP 2017502331A5 JP 2016536814 A JP2016536814 A JP 2016536814A JP 2016536814 A JP2016536814 A JP 2016536814A JP 2017502331 A5 JP2017502331 A5 JP 2017502331A5
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JP
Japan
Prior art keywords
liquid composition
photoreactive liquid
photon
free radical
component
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JP2016536814A
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English (en)
Japanese (ja)
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JP2017502331A (ja
JP6566952B2 (ja
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Priority claimed from PCT/US2014/067955 external-priority patent/WO2015084735A2/en
Publication of JP2017502331A publication Critical patent/JP2017502331A/ja
Publication of JP2017502331A5 publication Critical patent/JP2017502331A5/ja
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Publication of JP6566952B2 publication Critical patent/JP6566952B2/ja
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JP2016536814A 2013-12-06 2014-12-01 光反応性液体組成物及び構造体の作製方法 Active JP6566952B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361912754P 2013-12-06 2013-12-06
US61/912,754 2013-12-06
PCT/US2014/067955 WO2015084735A2 (en) 2013-12-06 2014-12-01 Liquid photoreactive composition and method of fabricating structures

Publications (3)

Publication Number Publication Date
JP2017502331A JP2017502331A (ja) 2017-01-19
JP2017502331A5 true JP2017502331A5 (enExample) 2017-11-09
JP6566952B2 JP6566952B2 (ja) 2019-08-28

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JP2016536814A Active JP6566952B2 (ja) 2013-12-06 2014-12-01 光反応性液体組成物及び構造体の作製方法

Country Status (5)

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US (1) US10133174B2 (enExample)
EP (1) EP3077421B1 (enExample)
JP (1) JP6566952B2 (enExample)
CN (1) CN105917275B (enExample)
WO (1) WO2015084735A2 (enExample)

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US11809161B2 (en) * 2020-07-13 2023-11-07 Lawrence Livermore National Security, Llc Computed axial lithography optimization system
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JP6640087B2 (ja) 2013-12-06 2020-02-05 スリーエム イノベイティブ プロパティズ カンパニー 保護要素を備えた半液浸系顕微鏡対物レンズ及び多光子結像方法におけるその使用

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