|
US3808006A
(en)
|
1971-12-06 |
1974-04-30 |
Minnesota Mining & Mfg |
Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
|
|
US3729313A
(en)
|
1971-12-06 |
1973-04-24 |
Minnesota Mining & Mfg |
Novel photosensitive systems comprising diaryliodonium compounds and their use
|
|
US3741769A
(en)
|
1972-10-24 |
1973-06-26 |
Minnesota Mining & Mfg |
Novel photosensitive polymerizable systems and their use
|
|
AU497960B2
(en)
|
1974-04-11 |
1979-01-25 |
Minnesota Mining And Manufacturing Company |
Photopolymerizable compositions
|
|
US4250053A
(en)
|
1979-05-21 |
1981-02-10 |
Minnesota Mining And Manufacturing Company |
Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
|
|
CA1323949C
(en)
|
1987-04-02 |
1993-11-02 |
Michael C. Palazzotto |
Ternary photoinitiator system for addition polymerization
|
|
US4859572A
(en)
|
1988-05-02 |
1989-08-22 |
Eastman Kodak Company |
Dye sensitized photographic imaging system
|
|
US6608228B1
(en)
|
1997-11-07 |
2003-08-19 |
California Institute Of Technology |
Two-photon or higher-order absorbing optical materials for generation of reactive species
|
|
WO1998021521A1
(en)
|
1996-11-12 |
1998-05-22 |
California Institute Of Technology |
Two-photon or higher-order absorbing optical materials and methods of use
|
|
US6335149B1
(en)
*
|
1997-04-08 |
2002-01-01 |
Corning Incorporated |
High performance acrylate materials for optical interconnects
|
|
US6025406A
(en)
|
1997-04-11 |
2000-02-15 |
3M Innovative Properties Company |
Ternary photoinitiator system for curing of epoxy resins
|
|
US5770737A
(en)
|
1997-09-18 |
1998-06-23 |
The United States Of America As Represented By The Secretary Of The Air Force |
Asymmetrical dyes with large two-photon absorption cross-sections
|
|
US5859251A
(en)
|
1997-09-18 |
1999-01-12 |
The United States Of America As Represented By The Secretary Of The Air Force |
Symmetrical dyes with large two-photon absorption cross-sections
|
|
US6100405A
(en)
|
1999-06-15 |
2000-08-08 |
The United States Of America As Represented By The Secretary Of The Air Force |
Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
|
|
US7166409B2
(en)
|
2000-06-15 |
2007-01-23 |
3M Innovative Properties Company |
Multipass multiphoton absorption method and apparatus
|
|
AU2001266918A1
(en)
|
2000-06-15 |
2001-12-24 |
3M Innovative Properties Company |
Multidirectional photoreactive absorption method
|
|
US6852766B1
(en)
|
2000-06-15 |
2005-02-08 |
3M Innovative Properties Company |
Multiphoton photosensitization system
|
|
JP4786858B2
(ja)
|
2000-06-15 |
2011-10-05 |
スリーエム イノベイティブ プロパティズ カンパニー |
封入光学素子を提供するための多光子硬化
|
|
US7265161B2
(en)
|
2002-10-02 |
2007-09-04 |
3M Innovative Properties Company |
Multi-photon reactive compositions with inorganic particles and method for fabricating structures
|
|
US7118845B2
(en)
|
2000-06-15 |
2006-10-10 |
3M Innovative Properties Company |
Multiphoton photochemical process and articles preparable thereby
|
|
US7005229B2
(en)
|
2002-10-02 |
2006-02-28 |
3M Innovative Properties Company |
Multiphoton photosensitization method
|
|
DE60138021D1
(enExample)
*
|
2000-06-15 |
2009-04-30 |
3M Innovative Properties Co |
|
|
EP1295180B1
(en)
|
2000-06-15 |
2013-05-22 |
3M Innovative Properties Company |
Process for producing microfluidic articles
|
|
US7381516B2
(en)
|
2002-10-02 |
2008-06-03 |
3M Innovative Properties Company |
Multiphoton photosensitization system
|
|
JP4965052B2
(ja)
|
2000-06-15 |
2012-07-04 |
スリーエム イノベイティブ プロパティズ カンパニー |
3次元光学素子の加工方法
|
|
EP1390664A4
(en)
|
2001-03-30 |
2008-01-02 |
Univ Arizona |
MATERIALS, METHODS AND USES FOR PHOTOCHEMICAL GENERATION OF ACIDS AND / OR RADICAL SPECIES
|
|
US20040012872A1
(en)
|
2001-06-14 |
2004-01-22 |
Fleming Patrick R |
Multiphoton absorption method using patterned light
|
|
US6750266B2
(en)
|
2001-12-28 |
2004-06-15 |
3M Innovative Properties Company |
Multiphoton photosensitization system
|
|
US7232650B2
(en)
|
2002-10-02 |
2007-06-19 |
3M Innovative Properties Company |
Planar inorganic device
|
|
US20030155667A1
(en)
|
2002-12-12 |
2003-08-21 |
Devoe Robert J |
Method for making or adding structures to an article
|
|
TWI223736B
(en)
|
2002-12-19 |
2004-11-11 |
Ind Tech Res Inst |
Hybrid photoresist with multi reaction models and process for forming pattern using the same
|
|
US20050124712A1
(en)
|
2003-12-05 |
2005-06-09 |
3M Innovative Properties Company |
Process for producing photonic crystals
|
|
AU2003304694A1
(en)
|
2003-12-05 |
2005-08-12 |
3M Innovative Properties Company |
Process for producing photonic crystals and controlled defects therein
|
|
WO2007031505A1
(en)
|
2005-09-13 |
2007-03-22 |
Huntsman Advanced Materials (Switzerland) Gmbh |
Photocurable compositions for preparing abs-like articles
|
|
US7893410B2
(en)
|
2005-12-21 |
2011-02-22 |
3M Innovative Properties Company |
Method and apparatus for processing multiphoton curable photoreactive compositions
|
|
US7583444B1
(en)
|
2005-12-21 |
2009-09-01 |
3M Innovative Properties Company |
Process for making microlens arrays and masterforms
|
|
EP1998844A4
(en)
*
|
2006-03-24 |
2017-03-01 |
3M Innovative Properties Company |
Process for making microneedles, microneedle arrays, masters, and replication tools
|
|
EP2018263B1
(en)
*
|
2006-05-18 |
2017-03-01 |
3M Innovative Properties Company |
Process for making light guides with extraction structures
|
|
CN101755238B
(zh)
|
2007-04-13 |
2013-01-02 |
3D系统公司 |
二元光引发剂、可光固化的组合物、它们的用途以及制备三维制品的方法
|
|
US9440376B2
(en)
|
2007-09-06 |
2016-09-13 |
3M Innovative Properties Company |
Methods of forming molds and methods of forming articles using said molds
|
|
CN101796443A
(zh)
|
2007-09-06 |
2010-08-04 |
3M创新有限公司 |
具有提供输出光区域控制的光提取结构的光导装置
|
|
EP2207820A4
(en)
|
2007-10-11 |
2011-10-26 |
3M Innovative Properties Co |
HIGHLY FUNCTIONAL REACTIVE SPECIES WITH MULTIPHOTONIC HARDENING
|
|
WO2009070434A1
(en)
|
2007-11-27 |
2009-06-04 |
3M Innovative Properties Company |
Methods for forming sheeting with a composite image that floats and a master tooling
|
|
EP2215525B1
(en)
|
2007-11-27 |
2018-01-10 |
3D Systems Incorporated |
Photocurable resin composition for producing three dimensional articles having high clarity
|
|
KR101403187B1
(ko)
|
2008-02-19 |
2014-06-02 |
삼성전자주식회사 |
감광성 조성물, 이를 이용한 미세 가공 방법 및 그에 의해형성된 미세 가공물
|
|
WO2009142741A1
(en)
*
|
2008-05-21 |
2009-11-26 |
Theraject, Inc. |
Method of manufacturing solid solution peforator patches and uses thereof
|
|
JP5563589B2
(ja)
|
2008-12-05 |
2014-07-30 |
スリーエム イノベイティブ プロパティズ カンパニー |
非線形熱重合を使用した三次元物品
|
|
JP5346618B2
(ja)
*
|
2009-02-19 |
2013-11-20 |
シーメット株式会社 |
炭素質立体造形物の製造方法
|
|
KR20180001595A
(ko)
|
2009-07-30 |
2018-01-04 |
쓰리엠 이노베이티브 프로퍼티즈 컴파니 |
노즐 및 그 제조 방법
|
|
JP2012047787A
(ja)
|
2010-08-24 |
2012-03-08 |
Daicel Corp |
体積ホログラム記録用感光性組成物および媒体製造法
|
|
DE202011111072U1
(de)
|
2011-02-25 |
2019-03-27 |
Nanoscribe Gmbh |
Vorrichtung zum ortsaufgelösten Einbringen eines Intensitätsmusters aus elektromagnetischer Strahlung in eine photosensitive Substanz
|
|
CN103492951A
(zh)
|
2011-04-22 |
2014-01-01 |
3M创新有限公司 |
增大多光子成像分辨率的方法
|
|
CN111679417B
(zh)
|
2013-12-06 |
2022-08-19 |
3M创新有限公司 |
具有保护元件的半潜式显微镜物镜和物镜在多光子成像方法中的用途
|