JP2017228678A - Gas purge unit and load port device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a gas purge unit capable of realizing smooth introduction of purification gas into a tightly-sealed transport container.SOLUTION: A gas purge unit for introducing purification gas into a purge object container having an opening through the opening, includes a first blowing member having a first nozzle port for blowing the purification gas toward the interior of the purge object container, and placed along the side of the opening, and a second blowing member placed at a position farther from the opening than the first nozzle port, having a second nozzle port for blowing the purification gas toward the interior of the purge object container, and placed along the side.SELECTED DRAWING: Figure 6

Description

  The present invention relates to a gas purge unit used in, for example, a semiconductor manufacturing process, and a load port apparatus having a gas purge unit.

  In a semiconductor manufacturing process, a wafer accommodated in a wafer transfer container includes, for example, one formed with metal wiring or the like. Such metal wiring may oxidize on the surface, so that desired characteristics may not be obtained when the device is completed. For this reason, it is necessary to keep the cleanness inside the container high.

  However, when the wafer in the transfer container is brought into various processing apparatuses and subjected to predetermined processing, the interior of the container and the interior of the processing apparatus or the intermediate chamber connecting the processing apparatus and the container are always kept in communication. The Rukoto. A fan and a filter are arranged in the upper part of the intermediate chamber in which the transfer robot is arranged, and the cleanliness in the intermediate chamber is controlled to a certain level or more, but the cleanliness may be lower than that in the container. Therefore, when such air enters the inside of the container, the wafer surface may be oxidized by oxygen or moisture in the air.

  Therefore, in Patent Document 1, for example, a cleaning gas such as nitrogen gas is introduced toward the inside of the container, and an opening is provided to block introduction of a low-cleanness gas from the inside of the processing chamber to the inside of the container. It has been proposed to blow out gas along the opening surface of the part.

WO2005 / 124853 publication

  However, the conventional system that blows out gas along the opening surface of the opening cannot sufficiently prevent the problem that gas with low cleanliness is caught inside the container, and the inside of the container is efficiently cleaned It has a problem that it is difficult to do.

  The present invention has been made in view of such a situation, and an object thereof is to provide a gas purge unit capable of efficiently cleaning the inside of a purge target container and a load port device having such a gas purge unit. It is.

In order to achieve the above object, a gas purge unit according to the present invention comprises:
A gas purge unit for introducing a cleaning gas into the purge target container having an opening through the opening,
A first blowing member that has a first nozzle port for blowing a cleaning gas toward the inside of the purge target container, and is disposed along a side of the opening;
A second blowing member that is disposed at a position farther from the opening than the first nozzle port, has a second nozzle port that blows cleaning gas toward the inside of the purge target container, and is disposed along the side. And having.

  In the gas purge unit of the present invention, the first nozzle port and the second nozzle port that blow out the cleaning gas toward the inside of the purge target container are arranged in parallel along the side of the opening, so that the interior of the container Can be efficiently cleaned. That is, by arranging the first nozzle port and the second nozzle port having different distances from the opening in parallel, the cleaning gas layer toward the container becomes thicker than in the case of the first nozzle port alone, It is possible to prevent the problem of entraining the room with a low cleanliness gas in the container. Further, since the cleaning gas is also discharged toward the inside of the purge target container also at the second nozzle port, a larger amount of cleaning gas can be introduced into the purge target container than in the case of the first nozzle port alone. it can.

  Further, for example, the gas purge unit according to the present invention has a third nozzle port that blows the cleaning gas in a direction along the opening surface of the opening, and is arranged along the upper side of the opening. You may have.

  By having the third blowing member that blows out the cleaning gas in the direction along the opening surface, the problem is that the air flow with a low cleanliness in the room is caught in the flow of the cleaning gas toward the inside of the container. Efficient cleaning can be realized. Further, since the third blowing member discharges the cleaning gas downward from the upper side in the direction along the opening surface, the flow of the cleaning gas by the first and second blowing members is like a down flow by FFU. It is possible to effectively prevent the problem of being disturbed by the airflow directed downward in the room.

Further, for example, the first blowing member may have a first flow path that is a flow path of the cleaning gas and communicates with the first nozzle port,
The third blowing member may have a third flow path that is a flow path for the cleaning gas and communicates with the third nozzle port,
The first blowing member and the third blowing member may be connected so that the first flow path and the third flow path communicate with each other.

  By connecting the first blowing member and the third blowing member so as to communicate the first channel and the third channel, such a gas purge unit shortens the total length of the cleaning gas channel. Or the flow path structure can be simplified.

Further, for example, the second blowing member may have a second flow path that is a flow path of the cleaning gas and communicates with the second nozzle port,
The third blowing member may have a third flow path that is a flow path for the cleaning gas and communicates with the third nozzle port,
The second blowing member and the third blowing member may be connected so that the second flow path and the third flow path communicate with each other.

  By connecting the second blowing member and the third blowing member so that the second channel and the third channel communicate with each other, such a gas purge unit shortens the total length of the cleaning gas channel. Or the flow path structure can be simplified. Further, by connecting the second flow path and the third flow path, it is possible to collectively manage the supply of the cleaning gas that prevents the entrainment of the air flow having a low cleanliness in the room.

Further, for example, the gas purge unit according to the present invention is disposed at a predetermined interval with respect to the first blowing member and the second blowing member, and the first blowing member and the second blowing member are arranged in the first blowing member. You may have a cover member which surrounds at least the side opposite to the blowing direction of a nozzle mouth and the 2nd nozzle mouth,
You may have a collar member arrange | positioned along the upper side of the said opening, and protrudes in the normal line direction of the said opening surface.
Furthermore, in the gas purge unit according to the present invention, the flange member and the cover member may have an integrated structure connected to each other.

Since the cover member and the saddle member can prevent the problem that the air flow of the cleaning gas from the first and second nozzle ports is disturbed by the air flow formed in the room by the down flow by the FFU, such a gas purge unit is efficient. Cleaning is possible.
In addition, since the gutter member and the cover member have an integrated structure, the problem of disturbing the flow of the cleaning gas from the first and second nozzle ports can be effectively prevented, and the cleaning gas flow can be protected. It is possible to simplify the structure.

  For example, the load port apparatus according to the present invention includes any one of the gas purge units described above.

  The load port apparatus according to the present invention includes the gas purge unit as described above, thereby efficiently cleaning the inside of the container placed on the load port apparatus and effectively preventing problems such as wafer oxidation. be able to.

FIG. 1 is a partial cross-sectional schematic view of a load port apparatus to which a gas purge unit according to the first embodiment is applied. 2 is a partial cross-sectional perspective view of the load port device shown in FIG. FIG. 3A is a schematic view showing a process in which the lid of the sealed transport container is opened by the load port device. FIG. 3B is a schematic diagram showing a step subsequent to FIG. 3A. FIG. 3C is a schematic view showing a step subsequent to FIG. 3B. FIG. 3D is a schematic diagram showing a continuation process of FIG. 3C. FIG. 4 is a schematic perspective view showing the first blowing member of the gas purge unit. FIG. 5 is a schematic cross-sectional view showing the first and second blowing members and the cleaning gas supply unit. FIG. 6 is a schematic cross-sectional view of the gas purge unit according to the first embodiment in a horizontal cross section. FIG. 7 is a partial cross-sectional schematic view of a load port apparatus to which the gas purge unit according to the second embodiment is applied. FIG. 8 is a schematic cross-sectional view of the gas purge unit according to the second embodiment in the horizontal direction. FIG. 9 is a schematic cross-sectional view of the gas purge unit according to the third embodiment in the horizontal direction. FIG. 10 is a schematic perspective view showing a gas purge unit according to a modification.

  Hereinafter, the present invention will be described based on embodiments shown in the drawings.

1st Embodiment As shown in FIG. 1, the load port apparatus 10 which concerns on one Embodiment of this invention is connected with the intermediate chamber 60 grade | etc., Of a mini-environment apparatus. The load port device 10 is movable in the Y-axis direction with respect to the vertical wall 11, the installation table 12 provided on one side of the wall 11, and the installation table 12 in addition to the gas purge unit 20 described later. Movable table 14. In the drawings, the Y axis indicates the moving direction of the movable table 14, the Z axis indicates the vertical direction in the vertical direction, and the X axis indicates the direction perpendicular to the Y axis and the Z axis.

  On the upper part of the movable table 14 in the Z-axis direction, a sealed transfer container 2 as a container to be purged composed of a pot, a hoop or the like for storing and transferring a plurality of wafers 1 in a sealed manner can be detachably mounted. It has become. The sealed transport container 2 has a casing 2a. Inside the casing 2a, a space for accommodating the wafer 1 as an object to be processed is formed. The casing 2a has a substantially box shape having an opening 2b on either side surface.

  The sealed transfer container 2 shown in the present embodiment is a wafer transfer container conforming to the SEMI standard called FOUP, but is not limited to this. In addition, the accommodation accommodated in the sealed transfer container 2 is not limited to the wafer 1 and may be other accommodations that need to be accommodated in a clean environment.

  The sealed transport container 2 includes a lid 4 for sealing the opening 2b of the casing 2a. The opening 2b is substantially rectangular, and the lid 4 has a rectangular flat plate shape substantially equal to the opening 2b. A shelf (not shown) having a plurality of steps for stacking the wafer 1 held horizontally inside the casing 2a in the vertical direction (Z-axis direction) is arranged, and each wafer 1 placed thereon is arranged. It is accommodated inside the sealed transport container 2 with the interval kept constant.

  The load port device 10 is an interface device for transferring the wafer 1 accommodated in a sealed state in the sealed transfer container 2 into the intermediate chamber 60 while maintaining a clean state. A single or a plurality of processing chambers 70 are hermetically connected to the intermediate chamber 60. The processing chamber 70 is an apparatus used in a semiconductor manufacturing process, such as a vapor deposition apparatus, a sputtering apparatus, and an etching apparatus, although it is not particularly limited.

  A robot arm 50 is accommodated in the intermediate chamber 60. An FFU (Fan Filter Unit) 40 is mounted on the upper part of the intermediate chamber 60, and clean air or other gas is allowed to flow from the FFU 40 to the inside of the intermediate chamber 60 in a downflow to create a local clean environment. Yes. The cleanliness inside the intermediate chamber 60 is often lower than the cleanliness inside the sealed transport container 2 filled with the cleaning gas, but is kept higher than the cleanliness of the external environment assumed to be a normal indoor environment. Be drunk.

  The load port apparatus 10 has a door 18 that opens and closes the wall side opening 13 of the wall 11 and the lid 4 of the sealed transport container 2. The wall 11 functions as a part of a casing that seals the inside of the intermediate chamber 60 in a clean state. As shown in FIG. 2, the wall side opening 13 is a substantially rectangular shape having a size substantially equal to the opening 2 b of the sealed transport container 2.

  As shown in FIGS. 1 and 2, the load port device 10 includes a gas purge unit 20 that introduces a cleaning gas into the sealed transport container 10 through the opening 2 b of the sealed transport container 10. The gas purge unit 20 is disposed along a pair of first blowing members 22 and a pair of second blowing members 24 disposed along a pair of side edges 2bb (see FIG. 6) of the opening 2b, and along an upper side 2ba of the opening 2b. And a third blowing member 26. The gas purge unit 20 will be described in detail later.

  Hereinafter, the opening / closing operation of the wall-side opening 13 and the lid 4 by the door 18 and the operation of the load port device 10 and the gas purge unit 20 provided in response to the opening / closing state of the door 18 will be described with reference to FIGS. Will be described.

  As shown in FIG. 3A, when the sealed transport container 2 is installed on the movable table 14, the positioning pins 16 are fitted into the recesses of the positioning section 3 provided on the lower surface of the casing 2 a of the sealed transport container 2. Thus, the positional relationship between the sealed transport container 2 and the movable table 14 is uniquely determined. During storage and transfer of the wafer 1, the inside of the sealed transfer container 2 is sealed, and the environment around the wafer 1 is generally maintained regardless of the environment outside the sealed transfer container 2.

  When the sealed transport container 2 is positioned and installed on the upper surface of the movable table 14, the air supply port 5 and the exhaust port 6 formed on the lower surface of the sealed transport container 2 are arranged inside the movable table 14. It is airtightly connected to a bottom purge device. Then, a bottom gas purge is performed through an air supply port 5 and an exhaust port 6 provided at the lower part of the sealed transfer container 2. In the state where the bottom gas purge is performed, as shown in FIG. 3B, the movable table 14 moves in the Y-axis direction, and the opening edge 2c to which the lid 4 that hermetically closes the opening 2b of the sealed transfer container 2 is attached. Enters the inside of the wall-side opening 13 of the wall 11.

  At the same time, the door 18 located inside the wall 11 (on the side opposite to the movable table 14 on which the sealed transport container 2 is installed) engages with the lid 4 of the sealed transport container 2. At that time, the gap between the opening edge 2c and the opening edge 2c of the wall side opening 13 is sealed with a gasket or the like, and the gap between these is well sealed. Thereafter, as shown in FIG. 3C, the door 18 is moved in parallel with the lid 4 in the X-axis direction or is pivotally moved to remove the lid 4 from the opening edge 2c, open the opening 2b, open the opening 2b and the wall. The inside of the sealed transport container 2 and the inside of the wall 11 are communicated with each other through the side opening 13.

  Even after opening the opening 2b, the load port device 10 may be operated by continuing the bottom gas purge. In addition, after opening the opening 2b, the load port device 10 supplies the first cleaning gas such as nitrogen gas or other inert gas or purified air from the inside of the wall 11 toward the sealed transfer container 2. -Blow out from the third blowing members 22, 24, 26 (front purge). The load port device 10 may perform the front purge in parallel with the bottom purge, or may stop the bottom purge and perform the front purge.

  Next, as shown in FIG. 3D, the opening 2 b of the sealed transport container 2 is completely opened with respect to the inside of the wall 11 by moving the door 18 below the Z axis inside the wall 11. It becomes. After the opening 2b of the sealed transport container 2 is completely opened, the robot arm 50 or the like disposed inside the wall 11 passes through the opening 2b and the wall-side opening 13 between the sealed transport container 2 and the wall 11. Thus, the wafer 1 is delivered.

  Also in this case, the inside of the sealed transport container 2 and the inside of the wall 11 (intermediate chamber 60 (see FIG. 1)) are shielded from the outside air. Furthermore, when the gas purge unit 20 of the load port device 10 continues the front purge, the inside of the sealed transfer container 2 is maintained in a cleaner environment than the inside of the wall 11. In order to return the wafer 1 to the inside of the sealed transfer container 2 and remove the sealed transfer container 2 from the movable table 14, the reverse operation described above may be performed.

  In the drawing, the air supply port 5, the exhaust port 6, the gas purge unit 20, and the like are illustrated in an enlarged manner as compared with the sealed transfer container 2 for easy understanding. Is different.

  Next, the gas purge unit 20 for performing the front purge according to the present embodiment will be described with reference to the drawings.

  As shown in FIG. 2, the gas purge unit 20 is disposed around the wall side opening 13. The first blowing member 22, the second blowing member 24, and the third blowing member 26 of the gas purge unit 20 are attached to the inner surface of the wall 11, which is the surface opposite to the installation table 12, so as to avoid the door 18.

  As shown in FIG. 6, the first blowing member 22 has a first nozzle port 22 a that blows the cleaning gas toward the inside of the sealed transport container 2, and extends along the side 2 bb of the opening 2 b that extends in the Z-axis direction. Are arranged. As shown in FIG. 4, which is a perspective view of the first blowing member 22, the first blowing member 22 is configured by a substantially rectangular parallelepiped tubular member that is elongated in the Z-axis direction, and is one of the corners extending in the Z-axis direction. In addition, a first nozzle port 22a formed of a slit-like through hole is formed. The opening angle of the first nozzle port 22a with respect to the XY direction can be, for example, about 30 degrees, but is not particularly limited.

  As shown in FIG. 6, the second blowing member 24 has a second nozzle port 24 a that blows the cleaning gas toward the inside of the sealed transport container 2, and extends along the side 2 bb of the opening 2 b that extends in the Z-axis direction. Are arranged. The second blowing member 24 is arranged in parallel with the first blowing member 22, but the second nozzle port 24 a of the second blowing member 24 is opened from the opening 2 b than the first nozzle port 22 a of the first blowing member 22. It is arranged at a distant position.

  As shown in FIG. 2, the second blowing member 24 has the same shape as the first blowing member 22 shown in FIG. That is, the second blowing member 24 is formed of a rectangular parallelepiped tubular member having a slit-like second nozzle port 24a formed at one of the corners extending in the Z-axis direction. The opening angle of the second nozzle port 24a with respect to the XY direction can be about 30 degrees as with the first nozzle port 22a, but is not particularly limited.

  As shown in FIG. 6, in the gas purge unit 20, a pair of blowing members including one first blowing member 22 and one second blowing member 24 correspond to each side 2bb of the opening 2b. Two sets in total are arranged. The first blowing member 22 and the second blowing member 24 are arranged symmetrically on both sides in the X-axis direction of the opening 2b. However, the arrangement of the first blowing member 22 and the second blowing member 24 is not limited to this. For example, another gas purge unit may have one set or three or more sets of blowing members, and asymmetrically. You may have the 1st and 2nd blowing member 22 and 24 arrange | positioned.

  As shown in FIG. 2, the first and second blowing members 22, 24 are attached to the inner surface of the wall 11 via a plate-like attachment member 28, but the first and second blowing members 22, 24 The attachment method is not limited to this. For example, the first and second blowing members 22 and 24 may be directly fixed to the wall 11 or may be suspended from above. In the gas purge unit 20, the first and second blowing members 22 and 24 are provided so as to be in contact with each other, so that the size can be reduced.

  As shown in FIG. 6, the first nozzle port 22 a of the first blowing member 22 and the second nozzle port 24 a of the second blowing member 24 both blow out the cleaning gas toward the inside of the sealed transfer container 2. . That is, the center position of the blowing direction in the XY direction of the first nozzle port 22a and the second nozzle port 24a is the direction (Y axis) toward the inside of the sealed transport container 2 with respect to the X axis direction that is the direction along the opening surface. In the negative direction), it is inclined by a predetermined angle. Although the inclination θ1 in the blowing direction of the first nozzle port 22a may be the same as the inclination θ2 in the blowing direction of the second nozzle port 24a, the inclination θ1 in the blowing direction of the first nozzle port 22a is the second nozzle port. It may be larger than the inclination θ2 in the blowing direction of 24a.

  FIG. 5A is a schematic cross-sectional view showing the internal structure of the first blowing member 22 and the second blowing member 24. The first blowing member 22 has a first flow path 22b that is a flow path for the cleaning gas and communicates with the first nozzle port 22a. A cleaning gas is supplied to the first flow path 22b from a first gas supply unit 32 having a first gas supply chamber 32a and a first gas supply pipe 32b. The first gas supply chamber 32a includes a tank filled with a cleaning gas having a predetermined pressure, a control valve capable of adjusting the gas flow rate, and the like. The first gas supply pipe 32 b is configured by a pipe or the like that connects the first gas supply chamber 32 a and the first flow path 22 b of the first blowing member 22. In addition, when it has the two 1st blowing members 22 as shown in FIG. 6, the 1st gas supply pipe 32b is the 1st gas supply chamber 32a and the 1st flow path 22b of the two 1st blowing members 22. And connect.

  As shown in FIG. 5A, the second blowing member 24 has a second flow path 24b that is a flow path for the cleaning gas and communicates with the second nozzle port 24a, like the first blowing member 22. ing. A cleaning gas is supplied to the second flow path 24b from a second gas supply unit 34 having a second gas supply chamber 34a and a second gas supply pipe 34b. Similar to the first gas supply chamber 32a, the second gas supply chamber 34a includes a tank filled with a cleaning gas having a predetermined pressure, a control valve capable of adjusting the gas flow rate, and the like. Further, the second gas supply pipe 34 b is configured by a pipe or the like that connects the second gas supply chamber 34 a and the second flow path 24 b of the second blowing member 24. The second gas supply pipe 34b is similar to the first gas supply pipe 32b in that one second gas supply chamber 34a and two second flow paths 24b are connected.

  As shown in FIG. 5A, in this embodiment, the first gas supply unit 32 that supplies the cleaning gas to the first blowing member 22 and the second gas that supplies the cleaning gas to the second blowing member 24. Since the supply unit 34 is independent, the gas purge unit 20 individually controls the discharge of the cleaning gas from the first nozzle port 22a and the discharge of the cleaning gas from the second nozzle port 24a. Can do.

  The gas purge unit 20 may vary the timing for discharging the cleaning gas by the first blowing member 22 and the timing for discharging the cleaning gas by the second blowing member 24. For example, as shown in FIG. 3D, the lid 4 is completely open, and the door 4 holding the lid 4 and the lid 4 is detached from the opening surface of the opening 2b in the Z-axis direction (the door 18 is lowered). In this state, the cleaning gas is discharged from both the first blowing member 22 and the second blowing member 24. In contrast, as shown in FIG. 3C, the lid 4 is not completely opened, and the lid 18 and the door 18 holding the lid 4 partially overlap with respect to the opening surface of the opening 2b in the Z-axis direction. Then, the cleaning gas is released only from the first blowing member 22, and the emission of the cleaning gas from the second blowing member 24 located near the door 18 is stopped.

  In this way, by adjusting the discharge timing of the cleaning gas of the first blowing member 22 and the second blowing member 24 individually according to the positions of the lid 4 and the door 18, the amount of consumed gas is adjusted as necessary. it can.

  Further, the gas purge unit 20 shown in FIG. 5A is discharged from the first nozzle port 22 a of the second blowing member 24 and the flow rate of the cleaning gas discharged from the first nozzle port 22 a of the first blowing member 22. The flow rate of the cleaning gas to be changed can be individually changed. Either one of the flow rates may be larger than the other, or the same flow rate may be used. Here, for example, when the gas purge unit 20 releases the cleaning gas from both the first blowing member 22 and the second blowing member 24 as shown in FIG. 6, the cleaning gas released from the first nozzle port 22a. Can be made larger than the flow rate of the cleaning gas discharged from the second nozzle port 24a. By reducing the flow rate from the second blowing member 24 arranged at a position further away from the opening 2b, it is possible to prevent the problem that a gas having a low cleanliness in the intermediate chamber 60 flows into the sealed transport container 2.

  Further, the load port apparatus 10 may use a gas purge unit 120 according to the first modification shown in FIG. 5B instead of the gas purge unit 20 shown in FIG. The gas purge unit 120 has a common gas supply unit 38 that supplies the cleaning gas to the first blowing member 22 and the second blowing member 24. The common gas supply unit 38 includes a common gas supply chamber 38a and a branch gas supply pipe 38b. Similar to the first and second gas supply chambers 32a and 34a, the common gas supply chamber 38a includes a tank filled with a cleaning gas having a predetermined pressure, a control valve capable of adjusting the gas flow rate, and the like.

  Further, the branch gas supply pipe 38b is configured by a pipe or the like that connects the common gas supply chamber 38a, the first flow path 22b of the first blowing member 22, and the second flow path 24b of the second blowing member 24. . Unlike the gas purge unit 20, it is difficult for the gas purge unit 120 to individually control the discharge timing of the cleaning gas from the first blowing member 22 and the second blowing member 24, but the number of gas supply chambers is reduced, or By shortening the total length of the piping, the entire unit can be simplified.

  As shown in FIGS. 2 and 3D, the third blowing member 26 of the gas purge unit 20 is disposed along the upper side 2ba of the opening 2b, and the first to third blowing members 22, 24, and 26 are arranged in the opening 2b. And it arrange | positions so that the wall side opening 13 may be enclosed in U shape. The 3rd blowing member 26 has the 3rd nozzle port 26a which blows off cleaning gas toward the direction in alignment with the opening surface of the sealed conveyance container 2. As shown in FIG. In FIG. 2, the third blowing member 26 is seen through in order to make the other members easy to see.

  The third blowing member 26 is formed of a substantially rectangular parallelepiped tubular member elongated in the X-axis direction, and a third nozzle port 26a formed of a through hole is formed on a surface facing downward. As shown in FIG. 3D and the like, the third blowing member 26 has therein a third flow path 26b that is a flow path for the cleaning gas and communicates with the third nozzle port 26a. A cleaning gas is supplied to the third flow path 26b from the first or second gas supply unit 32, 34 shown in FIG. 5A or another gas supply unit (not shown).

  As shown in FIG. 3D, the cleaning gas discharged from the third nozzle port 26a forms an airflow that goes downward along an opening surface parallel to the XZ plane. The distance from the opening 2b of the 3rd nozzle opening 26a is not specifically limited.

  Although it does not specifically limit as cleaning gas which the 1st-3rd nozzle ports 22a, 24a, 26a blow out, Inert gas, such as nitrogen gas and argon gas, cleaned air, etc. are mentioned, for example, nitrogen gas Is preferred. The cleaning gas supplied to the first to third nozzle ports 22a, 24a, and 26a may have the same component and purity, but may be different from each other. In addition, the intermediate chamber 60 according to the embodiment is filled with purified air, but the intermediate chamber 60 is filled with other gas such as an inert gas or a gas in which air and other gases are mixed. It may be.

  In the gas purge unit 20 according to the present embodiment, the first nozzle port 22a and the second nozzle port 24a that blow out the cleaning gas toward the inside of the sealed transfer container 2 are arranged in parallel along the side 2bb of the opening 2b. By doing so, the layer of the cleaning gas which goes into the container can be formed, and the problem that the gas having a low cleanliness in the intermediate chamber 60 is caught in the sealed transport container 2 can be prevented. Further, by arranging the first nozzle port 22a and the second nozzle port 24a having different distances from the opening in parallel, a thick cleaning gas layer is formed, and the sealed transport container 2 is efficiently cleaned. to enable.

  Further, since the airflow from the second nozzle port 24a is also directed to the inside of the sealed transport container 2, the cleaning gas from the second nozzle port 24a can be easily introduced into the sealed transport container 2, and the first Since the cleaning gas blown from the nozzle port 22a is also pushed into the container, the cleaning gas can be efficiently introduced into the sealed transport container 2 as compared with the case of the first nozzle port 22a alone.

  Furthermore, in the gas purge unit 20, a pair of blowing members including one first blowing member 22 and one second blowing member 24 is arranged so as to correspond to each side 2bb of the opening 2b. As compared with the case where the cleaning gas is discharged from one side, it is possible to introduce the cleaning gas uniformly into the sealed transfer container 2.

  Further, the gas purge unit 20 has a third blowing member 26 disposed along the upper side 2ba of the opening 2b. The third blowing member 26 blows the cleaning gas in a direction along the opening surface. A three-nozzle port 26a is provided. Unlike the cleaning gas discharged from the first and second nozzle ports 22a and 24a, the cleaning gas blown out from the third nozzle port 26a has a high ratio of not being introduced into the sealed transport container 2. However, by sending the cleaning gas to the periphery of the air flow from the first and second nozzle ports 22a, 24a into the sealed transport container 2, the low cleanliness gas in the intermediate chamber 60 enters the sealed transport container 2. You can prevent problems.

  Further, the lengths of the first nozzle port 22a and the second nozzle port 24a in the Z-axis direction are not particularly limited, but the first and second nozzle ports 22a and 24a are preferably the same length as each other, as shown in FIG. 3D. As shown, it is preferable that the height is substantially equal to the height in the Z-axis direction of the opening 2 b of the sealed transport container 2. With this configuration, the cleaning gas blown from the first and second nozzle ports 22a and 24a is passed through the front and back surfaces of all the wafers 1 accommodated in the sealed transfer container 2 so as to be sealed and transferred. It becomes possible to clean the container 2 uniformly.

Second Embodiment FIG. 7 is a schematic perspective view showing a load port device 210 according to a second embodiment of the present invention, and corresponds to FIG. 2 of the load port device 10 according to the first embodiment. The gas purge unit 220 included in the load port device 210 according to the second embodiment is different from the gas purge unit 20 included in the load port device 10 according to the first embodiment in that it includes a flange member 272 and a cover member 274. The point is the same as that of the gas purge unit 20. Therefore, only the difference between the gas purge unit 220 of the load port device 210 and the gas purge unit 20 will be described.

  The eaves member 272 is disposed along the upper side 2ba (see FIG. 3D) of the opening 2b of the sealed transport container 2, and protrudes from the inner surface of the wall 11 in the positive Y-axis direction (direction away from the opening surface). The collar member 272 is provided above the upper end portions of the first and second blowing members 22 and 24 (on the Z axis positive direction side), and when the gas purge unit 220 includes the third blowing member 26, It is provided above the flange member 272 (Z-axis positive direction side).

  The flange member 272 has a triangular prism-like outer shape extending along the X-axis direction, and the flange upper surface 272 a that is the upper surface of the flange member 272 is inclined in a direction of lowering as it is separated from the wall 11. However, the shape of the flange member 272 is not limited to this, and may be another shape such as a flat plate shape, other prismatic shape, or curved surface shape. The length of the flange member 272 in the X-axis direction is not particularly limited, but the distance between the two first blowing members 22, the distance between the two second blowing members 24, and the X-axis of the third blowing member 26 It is preferable that the length is longer than the direction length.

  The eaves member 272 is disposed above the first to third blowing members 22, 24, 26, so that air of relatively low cleanliness formed in the intermediate chamber 60, such as a downflow due to FFU, is obtained. The problem that the flow disturbs the flow of the cleaning gas by the first to third blowing members 22, 24, and 26 can be prevented. In addition, since the eaves member 272 has an eaves folding portion 272b that is bent downward from the tip of the eaves upper surface 272a and extends parallel to the wall 11, the downflow due to FFU flows into the vicinity of the opening 2b. Can be prevented more effectively.

  As shown in FIGS. 7 and 8, the cover member 274 is composed of a pair of L-shaped plates. The cover member 274 is arranged at a predetermined interval with respect to the first blowing member 22 and the second blowing member 24, and the first nozzle port 22 a and the second nozzle port in the first blowing member 22 and the second blowing member 24. It surrounds at least the direction opposite to the blowing direction of 24a. The first blowing member 22 and the second blowing member 24 are attached between the side 2bb of the opening 2b and the cover member 274.

  As shown in FIG. 8, the cover member 274 includes a side cover portion 274a extending in a direction perpendicular to the wall 11 and the opening surface, and a folded cover portion 274b folded from the tip of the side cover portion 274a toward the opening 2b. Have The folded cover portion 274b extends parallel to the wall 11, but is disposed at a position where it does not interfere with the movement path of the door 18 and the lid 4 and the movement path of the robot arm 50 and the wafer 1.

  The cover member 274 surrounds the periphery of the first nozzle port 22a and the second nozzle port 24a, so that a relatively low clean air flow formed in the intermediate chamber 60 causes the first to third blowing members 22 to flow. 24, 26 can prevent the problem of disturbing the flow of the cleaning gas.

  As shown in FIG. 7, in the gas purge unit 220, the eaves member 272 and the cover member 274 have an integral structure connected to each other. Such a gas purge unit 220 is effective in that the flow of air having a relatively low cleanness formed in the intermediate chamber 60 disturbs the flow of the cleaning gas by the first to third blowing members 22, 24, and 26. In addition, the structure for protecting the flow of the cleaning gas can be simplified.

Third Embodiment FIG. 9 is a schematic sectional view of a gas purge unit 320 provided in a load port device according to a third embodiment of the present invention, and corresponds to FIG. 8 of the gas purge unit 220 according to the second embodiment. The gas purge unit 320 included in the load port device according to the third embodiment is the second embodiment in that the first blowing member 22 and the second blowing member 24 are not in contact with each other and are arranged at a predetermined interval. Although different from the gas purge unit 220 according to the embodiment, the other points are the same as the gas purge unit 220. Therefore, only the difference between the gas purge unit 320 and the gas purge unit 220 will be described.

  In the gas purge unit 320, the first blowing member 22 and the second blowing member 24 are arranged with a space therebetween, so that the gap between the first nozzle port 22a and the second nozzle port 24a is as shown in FIG. It is wider than 220. Therefore, the gas purge unit 320 reduces the problem that the flow of the cleaning gas blown from the first nozzle port 22a and the flow of the cleaning gas blown from the second nozzle port 24a interfere with each other. Cleaning can be realized. Further, since a thick cleaning gas layer can be formed in the space surrounded by the cover member 274 and the like in the direction toward the sealed transport container 2, Efficient cleaning becomes possible while preventing entrainment.

  As mentioned above, although this invention was demonstrated, showing embodiment, this invention is not limited to embodiment mentioned above, It can change variously within the scope of the present invention. For example, the second blowing member 24 and the third blowing member 26 of the gas purge unit according to each embodiment can be replaced with the second blowing member 424 and the third blowing member 426 of the gas purge unit 420 shown in FIG. In FIG. 10, the description of the first blowing member of the gas purge unit 420 is omitted for the sake of simplicity.

  In the gas purge unit 420, the cleaning gas supplied from the second gas supply unit 34 shown in FIG. 5A to the second flow path 424b of the second blowing member 424 is converted into the third flow path 426b of the third blowing member 426. Is also supplied from the third nozzle port (see FIG. 3D). Further, the cleaning gas is supplied to the second flow path 424b of one of the second blowing members 424 through the third flow path 426b of the third blowing member 426, and is blown out from the second nozzle port 424a. Also good.

  In such a gas purge unit 420, the second flow path 424b of the second blowing member 424 and the third flow path 426b of the third blowing member 426 serve as a gas supply pipe that supplies the cleaning gas to each blowing member. Therefore, the structure is simple, which is advantageous for downsizing. Further, the third blowing member 426 is a third blowing member 22 relative to the first blowing member 22 (see FIGS. 4 and 5A) instead of the second blowing member 424 or in addition to the second blowing member 424. The flow path 426b and the first flow path 22b may be connected to each other so as to communicate with each other. Also in this case, since the flow path of the blowing member also serves as the gas supply pipe, such a gas purge unit has a simple structure and is advantageous for downsizing.

  In the gas purge unit shown in the first to third embodiments, the blowing member arranged along the side 2bb is the first blowing member 22 having the first nozzle port 22a and the second blowing port having the second nozzle port 24a. Although it is comprised by two types of blowing members, the 2 blowing member 24, the gas purge unit of this invention is not limited to this. The gas purge unit of the present invention may have another blowing member having a nozzle port having a different distance from the opening 2b from the first nozzle port 22a and the second nozzle port 24a. Further, the other blowing members may be arranged along the side 2bb, may be arranged along the upper side 2ba, or may be arranged obliquely.

  Further, the arrangement of the first blowing member 22 and the second blowing member 24 is not limited to the arrangement along the Y axis as shown in FIG. 6, and is arranged with the position shifted in the X direction. Also good. Furthermore, although the first and second nozzle ports 22a and 24a are configured by slit-shaped through holes, the shape of the nozzle ports is not limited to this, and a plurality of through holes may be formed intermittently. In addition, a filter or the like may be attached to the nozzle opening.

DESCRIPTION OF SYMBOLS 1 ... Wafer 2 ... Sealed conveyance container 2a ... Casing 2b ... Opening 2ba ... Upper side 2bb ... Side 2c ... Opening edge 3 ... Positioning part 4 ... Lid 5 ... Air supply port 6 ... Exhaust port 10 ... Load port device 11 ... Wall 12 ... Installation stand 13 ... Wall side opening 14 ... Movable table 16 ... Positioning pin 18 ... Door 20, 120, 220, 320, 420 ... Gas purge unit 22 ... First blowing member 22a ... First nozzle port 22b ... First flow path 24 424 ... 2nd blowing member 24a, 424a ... 2nd nozzle port 24b, 424b ... 2nd flow path 26, 426 ... 3rd blowing member 26a, 426a ... 3rd nozzle port 26b, 426b ... 3rd flow path 28 ... Installation Member 32 ... 1st gas supply part 32b ... 1st gas supply pipe 32a ... 1st gas supply chamber 34 ... 2nd gas supply part 34b ... 2nd gas supply 34a ... second gas supply chamber 38 ... common gas supply unit 38b ... branch gas supply pipe 38a ... common gas supply chamber 40 ... FFU
50 ... Robot arm 60 ... Intermediate chamber 70 ... Processing chamber 272 ... Hook member 272a ... Hook upper surface 272b ... Hook turnover portion 274 ... Cover portion 274a ... Side cover portion 274b ... Folding cover portion

Claims (8)

A gas purge unit for introducing a cleaning gas into the purge target container having an opening through the opening,
A first blowing member that has a first nozzle port for blowing a cleaning gas toward the inside of the purge target container, and is disposed along a side of the opening;
A second blowing member that is disposed at a position farther from the opening than the first nozzle port, has a second nozzle port that blows cleaning gas toward the inside of the purge target container, and is disposed along the side. When,
Having a gas purge unit.   2. The apparatus according to claim 1, further comprising: a third nozzle port that blows cleaning gas in a direction along an opening surface of the opening, and a third blowing member disposed along the upper side of the opening. Gas purge unit. The first blowing member has a first flow path that is a flow path for a cleaning gas and communicates with the first nozzle port.
The third blowing member has a third flow path that is a cleaning gas flow path and communicates with the third nozzle port,
3. The gas purge unit according to claim 1, wherein the first blowing member and the third blowing member are connected so that the first flow path and the third flow path communicate with each other. . The second blowing member has a second flow path that is a flow path for the cleaning gas and communicates with the second nozzle port,
The third blowing member has a third flow path that is a cleaning gas flow path and communicates with the third nozzle port,
The said 2nd blowing member and the said 3rd blowing member are connected so that the said 2nd flow path and the said 3rd flow path may connect, The Claim 1 characterized by the above-mentioned. Gas purge unit.   The first blowing member and the second blowing member are disposed at a predetermined interval, and the blowing direction of the first nozzle port and the second nozzle port in the first blowing member and the second blowing member, The gas purge unit according to claim 1, further comprising a cover member surrounding at least the opposite side.   The gas purge unit according to any one of claims 1 to 5, further comprising a flange member disposed along the upper side of the opening and protruding in a normal direction of the opening surface. The first blowing member and the second blowing member are disposed at a predetermined interval, and the blowing direction of the first nozzle port and the second nozzle port in the first blowing member and the second blowing member, Has a cover member that surrounds at least the opposite side, and a flange member that is disposed along the upper side of the opening and projects in the normal direction of the opening surface,
The gas purging unit according to any one of claims 1 to 6, wherein the flange member and the cover member form an integral structure connected to each other.   A load port apparatus comprising the gas purge unit according to claim 1.

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