JP6597875B2 - Gas purge unit and gas purge device - Google Patents

Description

  The present invention relates to a gas purge unit and a gas purge apparatus used in, for example, a semiconductor manufacturing process.

  In a semiconductor manufacturing process, a wafer accommodated in a wafer transfer container includes, for example, one formed with metal wiring or the like. Such metal wiring may oxidize on the surface, so that desired characteristics may not be obtained when the element is completed. For this reason, it is necessary to keep the oxygen concentration inside the container at a low level.

  However, when the wafer in the pod is brought into various processing apparatuses and subjected to predetermined processing, the inside of the container and the inside of the processing apparatus are always kept in communication. A fan and a filter are arranged in the upper part of the chamber in which the transfer robot is arranged, and clean air in which particles and the like are usually managed is introduced into the room. However, when such air enters the inside of the container, the wafer surface may be oxidized by oxygen or moisture in the air.

  Therefore, in Patent Document 1, for example, a purge gas such as nitrogen gas is introduced toward the inside of the container, and the opening surface of the opening is used to block the introduction of dirty air from the inside of the processing chamber to the inside of the container. It has been proposed to blow gas along.

  However, in the conventional apparatus, the container inward nozzle that blows out gas toward the inside of the container is arranged on the side of the opening, and the curtain nozzle that blows out gas along the opening surface of the opening It is arranged on the upper side. The gas flow blown out from the curtain nozzle becomes weak at the lower part of the opening surface, and there is a possibility that a sufficient shielding effect (curtain effect) cannot be obtained.

  Therefore, there are problems such as variations in the arrival speed until the purge is completed between the upper part and the lower part of the container. Further, the purge gas flow path inside the container becomes complicated, and there is a problem that ideal gas replacement cannot be performed. In such a case, for example, the oxygen or moisture concentration in the atmosphere differs between the wafer disposed at the upper part of the container and the wafer disposed at the lower part of the container, and the processing of the wafer varies in subsequent manufacturing processes. Have problems such as

WO2005 / 124853 publication

  The present invention has been made in view of such a situation, and an object of the present invention is to provide a gas purge unit and a gas purge apparatus capable of uniformly replacing the inside of a purge target container, particularly in the vertical direction.

In order to achieve the above object, a gas purge unit according to the present invention comprises:
A gas purge unit for introducing a cleaning gas into a purge target container having an opening through the opening,
A first nozzle port that blows a cleaning gas from the side of the opening toward the inside of the purge target container;
A second nozzle port that blows a cleaning gas from a side portion of the opening along the opening surface of the opening;

  In the gas purge unit of the present invention, the second nozzle port for blowing the cleaning gas along the opening surface of the opening is arranged along the side portion of the opening. For this reason, the flow of the gas blown out from the second nozzle port constitutes a curtain flow that blocks the flow from entering the inside of the container through the opening. Since this curtain flow is generated from the side of the opening of the container, the curtain flow is uniform in the vertical direction of the container. In addition, since the first nozzle that blows the cleaning gas toward the inside of the container is also disposed along the side of the opening, the inward flow of the container is a uniform flow in the vertical direction of the container. .

  Therefore, in the present invention, it is possible to perform gas replacement uniformly in the vertical direction. As a result, the quality of the processing object such as a wafer accommodated in the container can be made uniform.

  Preferably, the first nozzle port and the second nozzle port are formed in a single bidirectional blowing member. By forming the first nozzle port and the second nozzle port in a single bidirectional blowing member, the number of parts can be reduced, which contributes to the miniaturization of the unit.

  The bidirectional blowing member may be disposed on at least one side of the opening. Preferably, the bidirectional blowing member is disposed opposite to both sides of the opening. By comprising in this way, a curtain flow will arise from a both-sides part, and the effect which interrupts | blocks the flow which tries to enter an inside from the exterior of a container through opening increases. Further, since the flow of the cleaning gas blown out toward the inside of the purge target container is two places from both sides of the opening, the gas replacement inside the container is performed quickly and uniformly.

  The first nozzle port may be formed in a first dedicated blowing member, and the first dedicated blowing member may be disposed on at least one side of the opening. The second nozzle port may be formed in a second dedicated blowing member, and the second dedicated blowing member may be disposed on at least one side of the opening.

  Preferably, the first dedicated blowing member is disposed closer to the opening than the second dedicated blowing member. By arranging in this way, the curtain flow blown from the second nozzle port of the second dedicated blowing member does not interfere with the inward flow of the container blown from the first nozzle port of the first dedicated blowing member. The flow of both is performed smoothly.

  Preferably, the first nozzle port and the second nozzle port are formed continuously or intermittently along the longitudinal direction of the side portion of the opening. The first nozzle port and the second nozzle port may be slit-like elongated outlets, or may be an aggregate of a plurality of outlets. These nozzle openings may be slit-like through holes formed along the longitudinal direction of the tubular member, circular through holes, or through holes formed inside the nozzle protruding from the tubular member.

In the gas purge apparatus of the present invention,
The purge target container is detachably attached from the outside to a wall side opening formed in a wall whose inside is sealed,
The opening of the purge target container and the wall side opening are communicated in an air-tight manner, and the gas purge unit according to any one of the above is provided inside the wall and at least one of the wall side openings. It is attached to one side.

FIG. 1A is a partial cross-sectional schematic view of a load port apparatus to which a gas purge unit according to an embodiment of the present invention is applied. 1B is a partial cross-sectional perspective view of the load port device shown in FIG. 1A. 1C is a cross-sectional view of the gas purge unit shown in FIG. 1B. 2A is a perspective view of the bidirectional blowing member of the gas purge unit shown in FIG. 1C, and FIG. 2B is a perspective view showing a modification of the bidirectional blowing member shown in FIG. ) Is a perspective view showing another modification of the bidirectional blowing member shown in FIG. 2A, and FIG. 2D is a perspective view showing still another modification of the bidirectional blowing member shown in FIG. It is. FIG. 3A is a schematic view showing a process in which a hoop lid is opened by a load port device. FIG. 3B is a schematic view showing a step subsequent to FIG. 3A. FIG. 3C is a schematic view showing a step subsequent to FIG. 3B. FIG. 3D is a schematic view showing a step subsequent to FIG. 3C. 4A is a cross-sectional view of the inside of the container along the line IV-IV shown in FIG. 3D. FIG. 4B is a cross-sectional view in a container similar to FIG. 4A showing a gas purge unit according to another embodiment of the present invention. FIG. 4C is a cross-sectional view inside a container similar to FIG. 4A showing a gas purge unit according to another embodiment of the present invention. FIG. 4D is a cross-sectional view inside a container similar to FIG. 4A showing a gas purge unit according to another embodiment of the present invention. FIG. 4E is a cross-sectional view inside a container similar to FIG. 4A showing a gas purge unit according to another embodiment of the present invention. FIG. 4F is a cross-sectional view inside a container similar to FIG. 4A showing a gas purge unit according to another embodiment of the present invention. FIG. 4G is a cross-sectional view inside a container similar to FIG. 4A showing a gas purge unit according to another embodiment of the present invention. FIG. 4H is a cross-sectional view in a container similar to FIG. 4A showing a gas purge unit according to another embodiment of the present invention. FIG. 4I is a cross-sectional view in a container similar to FIG. 4A showing a gas purge unit according to another embodiment of the present invention.

  Hereinafter, the present invention will be described based on embodiments shown in the drawings.

First Embodiment As shown in FIG. 1A, a load port device 10 according to an embodiment of the present invention is connected to an intermediate chamber 60 such as an EFEM. The load port apparatus 10 includes an installation table 12 and a movable table 14 that can move in the X-axis direction with respect to the installation table 12. In the drawings, the X-axis indicates the moving direction of the movable table 14, the Z-axis indicates the vertical direction in the vertical direction, and the Y-axis indicates the direction perpendicular to these X-axis and Z-axis.

  On the upper part of the movable table 14 in the Z-axis direction, a sealed transfer container 2 composed of a pot, a hoop, or the like for sealing, storing, and transferring a plurality of wafers 1 can be detachably mounted. The sealed transport container 2 has a casing 2a. Inside the casing 2a, a space for accommodating the wafer 1 as an object to be processed is formed. The casing 2a has a substantially box-like shape having an opening on any one surface that exists in the horizontal direction.

The sealed transport container 2 includes a lid 4 for sealing the opening 2b of the casing 2a. A shelf (not shown) having a plurality of steps for stacking the wafer 1 held horizontally inside the casing 2a in the vertical direction (Z-axis direction) is arranged, and each wafer 1 placed thereon is arranged. It is accommodated inside the container 2 with the interval kept constant.

  The load port device 10 is an interface device for transferring the wafer 1 accommodated in a sealed state in the sealed transfer container 2 into the intermediate chamber 60 while maintaining a clean state. A single or a plurality of processing chambers 70 are hermetically connected to the intermediate chamber 60. The processing chamber 70 is an apparatus used in a semiconductor manufacturing process, such as a vapor deposition apparatus, a sputtering apparatus, and an etching apparatus, although it is not particularly limited.

  A robot arm 50 is accommodated in the intermediate chamber 60. An FFU (Fan Filter Unit) 40 is mounted on the upper part of the intermediate chamber 60, and clean air is caused to flow from the FFU 40 to the inside of the intermediate chamber 60 by a downflow to create a local clean environment. The cleanliness inside the intermediate chamber 60 is lower than the cleanliness inside the sealed transfer container 2 described below, but higher than the cleanliness in the external environment.

  The load port device 10 includes a door 18 that opens and closes the wall side opening 13 of the wall 11. The wall 11 functions as a part of a casing that seals the inside of the intermediate chamber 60 in a clean state. The movement of the door 18 will be briefly described with reference to FIGS. 3A to 3D.

  As shown in FIG. 3A, when the container 2 is installed on the table 14, the positioning pins 16 are fitted into the recesses of the positioning part 3 provided on the lower surface of the casing 2 a of the container 2, whereby the container 2 and The positional relationship with the movable table 14 is uniquely determined. During the storage and transfer of the wafer 1, the inside of the sealed transfer container 2 is sealed, and the periphery of the wafer 1 is maintained in a clean environment.

  When the sealed transport container 2 is positioned and installed on the upper surface of the movable table 14, the air supply port 5 and the exhaust port 6 formed on the lower surface of the sealed transport container 2 are arranged inside the table 14. It is hermetically connected to a bottom purge device. Then, a bottom gas purge is performed through an air supply port 5 and an exhaust port 6 provided at the lower part of the container 2. In the state where the bottom gas purge is performed, as shown in FIG. 3B, the table 14 moves in the X-axis direction, and the opening edge 2c to which the lid 4 that airtightly closes the opening 2b of the container 2 is attached is formed on the wall. 11 inside the wall-side opening 13.

  At the same time, the door 18 located inside the wall 11 (on the side opposite to the table 14) engages with the lid 4 of the container 2. At that time, the gap between the opening edge 2c and the opening edge of the wall side opening 13 is sealed with a gasket or the like, and the gap between these is well sealed. Thereafter, as shown in FIG. 3C, the door 18 is moved in parallel with the lid 4 in the X-axis direction or is pivotally moved to remove the lid 4 from the opening edge 2c, open the opening 2b, open the opening 2b and the wall. The inside of the container 2 and the inside of the wall 11 are communicated with each other through the side opening 13.

  Also in this case, the bottom gas purge may be continued for operation. In addition to the bottom purge or by stopping the bottom purge, a purge gas (cleaning gas) such as nitrogen gas or other inert gas is blown out from the inside of the wall 11 toward the inside of the container 2 (front purge).

Next, as shown in FIG. 3D, if the door 18 is moved downward in the Z axis inside the wall 11, the opening 2 b of the container 2 opens completely with respect to the inside of the wall 11, and the inside of the wall 11. The wafer 1 is delivered to the inside of the wall 11 through the opening 2b and the wall-side opening 13 by the robot hand 50 or the like arranged in FIG. Also in this case, the inside of the container 2 and the inside of the wall 11 are shielded from the outside air, and at least the front purge is continued, and the inside of the container 2 is maintained in a clean environment. In order to return the wafer 1 to the inside of the container 2 and remove the container 2 from the table 14, the reverse operation described above may be performed.

  In the drawing, the air supply port 5, the exhaust port 6, the gas purge unit 20, and the like are illustrated in an enlarged manner as compared with the sealed transfer container 2 for easy understanding. Is different.

  Next, the gas purge unit 20 for performing the front purge according to the present embodiment will be described with reference to the drawings.

  As shown in FIG. 1B, in this embodiment, the wall-side opening 13 formed in the wall 11 has a rectangular opening surface, and an upper side portion 13b, a lower side portion 13c, and two side portions 13a in the wall 11 are provided. Surrounded by As shown in FIG. 4A, the opening 2 b of the container 2 has a shape corresponding to the wall-side opening 13 and is set to have the same or slightly smaller dimensions as the wall-side opening 13.

  As shown in FIG. 1B, in this embodiment, the gas purge unit 20 is attached to the inner surface of the wall 11 so as to avoid the door 18 at both side portions 13 a of the wall side opening 13. The inner surface of the wall 11 is the surface of the wall 11 opposite to the installation base 12.

  As shown in FIGS. 3D and 4A, the gas purge unit 20 is disposed on both side portions 13a of the wall side opening 13 so as to be longer in the Z axis direction than the opening 2b of the container 2 along the Z axis direction. It is. Each gas purge unit 20 has a bidirectional blowing member 22.

  In the present embodiment, the bidirectional blowing member 22 is formed of a tubular member that is elongated in the Z-axis direction. As shown in FIG. A first nozzle port 26 is formed. In addition, a second nozzle port 28 is formed in the flat portion of the square tubular bidirectional blowing member 22 adjacent to the first nozzle port 26.

  In the present embodiment, as shown in FIG. 2A, the first nozzle port 26 and the second nozzle port 28 are slits formed continuously in the Z-axis direction of the square tubular bidirectional blowing member 22, respectively. These are through holes that are parallel to each other at a predetermined interval in the X-axis direction.

  As shown in FIG. 1C, the bidirectional blowing member 22 is not necessarily essential, but an air supply member 24 may be connected thereto. In the present embodiment, the air supply member 24 is configured by a tubular member elongated in the Z-axis direction, like the bidirectional blowing member 22, and has a blowing passage 25 having a square cross section inside. The communication hole 27 formed in the bidirectional blowing member 22 and the communication hole 29 formed in the air supply member 24 communicate with each other via the filter 21.

  These communication holes 27 and 29 are constituted by, for example, slit-like through holes formed continuously in the Z-axis direction or intermittently formed through holes. The cleaning gas flowing through the air supply passage 25 of the air supply member 24 passes through the communication holes 27 and 29 and the filter 21 and enters the inside of the blowout flow passage 23 of the bidirectional blowout member 22. It blows out from the nozzle port 28 to the outside.

  By using the air supply member 24, the flow rate of the cleaning gas blown out from the first nozzle port 26 and the second nozzle port 28 can be made more uniform in the Z-axis direction. Alternatively, by using the air supply member 24, it is possible to intentionally control the flow rate of the cleaning gas blown out from the first nozzle port 26 and the second nozzle port 28 along the Z-axis direction. .

  The supply of gas to the bidirectional blowing member 22 through the air supply member 24 or the direct supply of gas to the bidirectional blowing member 22 is not shown in the figure. It may be performed from below or from above. In addition, the gas purge unit 20 may supply gas from below, and the other gas purge unit 20 may supply gas from above.

  In the present embodiment, the first nozzle port 26 and the second nozzle port 28 are configured as slit-like elongated outlets. However, as shown in FIG. 2B, an assembly of a plurality of outlets. It may be. These nozzle openings 26 and 28 are slit-like through holes formed along the longitudinal direction of the tubular member, circular through holes, or through holes formed inside the nozzle protruding from the tubular member. There may be. Furthermore, the first nozzle port 26 and the second nozzle port 28 are not necessarily configured by the same type of through hole. For example, the first nozzle port 26 is configured by a slit-shaped through hole, and the second nozzle port 28 is configured. May be composed of an assembly of a plurality of outlets, or vice versa. Furthermore, in this embodiment, as shown in FIG. 2C and FIG. 2D, the bidirectional blowing member 22 may be formed in a cylindrical shape or other cylindrical shape.

  In the present embodiment, as shown in FIG. 4A, the pair of bidirectional blowing members 22 are attached so as to face the inner surface of the wall 11 at both side portions 13 a of the wall-side opening 13. Therefore, the blowing direction of the gas blown from the first nozzle port 26 is directed to the inside of the container 2, and the blowing direction of the gas blown from the second nozzle port 28 is a direction along the opening surfaces of the openings 13 and 2b. ing.

  In particular, in this embodiment, the gas blown out from the second nozzle port 28 formed in each bidirectional blowing member 22 flows so as to oppose each other and shield the opening surfaces of the openings 13 and 2b. Constitutes the curtain flow. Further, the gas blown out from the first nozzle port 26 formed in each bidirectional blowing member 22 flows toward the inside of the container 2 so as to intersect at the substantially central portion of the wafer 1.

  However, in this embodiment, the flow direction of the gas blown out from the first nozzle port 26 is not particularly limited as long as it is a direction toward the inside of the container 2. For example, as shown in FIG. 4B, the gas flows in the inner wall of the casing 2 a. A direction along the periphery of the wafer 1 may be used. In addition, the flow direction of the gas blown out from the pair of first nozzle ports 26 and 26 is preferably symmetric with respect to the X axis passing through the center of the wafer 1, but is not necessarily symmetric.

  Furthermore, in this embodiment, it is preferable that the flow rate of the gas blown out from each of the second nozzle ports 28, 28 is substantially the same, but may be different depending on the case. Moreover, it is preferable that the flow rate of the gas blown out from each of the first nozzle ports 26 and 26 is substantially the same, but may be different depending on the case.

  If the flow rate of the gas blown from the first nozzle port 26 is Q1, and the flow rate of the gas blown from the second nozzle port 28 is Q2, Q1 / Q2 may be configured to be variable. In order to adjust the flow rate ratio, the opening area of the first nozzle port 26 and the second nozzle port 28 may be changed, a partition plate may be inserted inside the member 22, or the number of outlets may be changed. .

In the present embodiment, the lengths of the first nozzle port 26 and the second nozzle port 28 in the Z-axis direction are the same, and substantially the same as the height in the Z-axis direction of the opening 2b of the container 2 as shown in FIG. 3D. It is preferable that With such a configuration, the cleaning gas blown from the first nozzle port 26 circulates on the front and back surfaces of all the wafers 1 accommodated in the container 2.

  In the present embodiment, the first nozzle port 26 and the second nozzle port 28 do not have to have the same length in the Z-axis direction. For example, the length of the second nozzle port 28 in the Z-axis direction is The length of one nozzle port 26 may be longer than the length in the Z-axis direction. In that case, the effect of shielding the dirty gas flow from the inside of the wall 11 to the inside of the container 2 is enhanced. Further, the length of the first nozzle port 26 in the Z-axis direction is not necessarily equal to the height of the opening 2b of the container 2 in the Z-axis direction, and may be configured to be shorter than that.

  The type of gas blown out from the first nozzle port 26 and the second nozzle port 28 is not particularly limited, but is a gas that is at least higher in cleanliness (not including particles or moisture) than the inner environment of the wall 11. For example, an inert gas such as nitrogen gas is exemplified. The type and cleanliness of the gas blown from the first nozzle port 26 and the second nozzle port 28 are preferably the same, but may be changed depending on circumstances.

  In the gas purge unit 20 of the present embodiment, the second nozzle ports 28 for blowing the cleaning gas along the opening surface of the opening 13 are arranged inside the wall 11 along both side portions 13 a of the opening 13. For this reason, the flow of the gas blown out from each second nozzle port 28 constitutes a curtain flow that blocks the flow that tries to enter the inside of the container 2 from the outside of the container 2 (inside the wall 11) through the opening 13.

  Since this curtain flow is generated from the side portion 13a of the opening 13 parallel to the Z-axis direction, the curtain flow is uniform in the vertical direction (Z-axis direction) of the container 2. Moreover, since the 1st nozzle 26 which blows off cleaning gas toward the inside of the container 2 is also arrange | positioned along the side part 13a of the opening 13, the inward flow (flow toward the inside of the container 2) Is a uniform flow in the vertical direction of the container 2.

  Therefore, in this embodiment, it is possible to perform gas replacement uniformly inside the container 2 particularly in the vertical direction. As a result, the quality of the processing object such as the wafer 1 accommodated in the container 2 in the Z-axis direction can be made uniform.

  In the present embodiment, the first nozzle port 26 and the second nozzle port 28 are formed in the single bidirectional blowing member 22. By forming the first nozzle port 26 and the second nozzle port 28 in the single bidirectional blowing member 22, it is possible to reduce the number of parts and contribute to the downsizing of the unit 20.

  The bidirectional blowing member 22 only needs to be disposed on at least one side portion 13a of the opening 13, but in the present embodiment, the bidirectional blowing member 22 is disposed to face both side portions 13a of the opening 13. By configuring in this way, the curtain flow is generated from the side portions 13a, and the effect of blocking the flow entering the inside from the outside of the container 2 through the opening 13 is increased. Further, since the cleaning gas blows out toward the inside of the container 2 at two locations from the side portions 13a of the opening 13, gas replacement inside the container 2 is performed quickly and uniformly.

  In this embodiment, since the curtain flow can be formed by using the second nozzle port 2826, the curtain nozzle 30 of the down flow method attached to the upper side portion 13b of the wall side opening 13 shown in FIGS. 1B and 3D is used. It becomes possible to lose. However, this downflow curtain nozzle 30 may be used in combination.

Incidentally, in the related art, since the second nozzle port 28 is not provided and only the down flow type curtain nozzle 30 is provided, there is a possibility that a state in which the gas hardly reaches as the bottom surface of the container 2 is approached may occur. For example, when the height in the Z-axis direction of the opening 2b of the container 2 is 30 cm, the downflow may reach only about 15 cm from the top. This is also considered because the downflow from the curtain nozzle 30 diffuses due to the influence of the downflow from the FFU 40 mounted on the intermediate chamber 60 shown in FIG. 1A.

  In the present embodiment, as shown in FIGS. 4A and 4B, the second nozzle ports 28 that form the curtain flow are formed in both side portions 13 a of the opening 13. Therefore, even if the gas flow from each second nozzle port 28 reaches only about 15 cm, the gas flow from each second nozzle port 28 is combined to form the entire surface of the opening 13. Can be covered.

  It is also conceivable to provide the conventional curtain nozzle 30 also on the lower side portion 13c. However, the curtain flow from the bottom to the top is mixed with the gas flow colliding with the downflow (low cleanliness) from the FFU 40 shown in FIG. 1C, and the cleanliness into the container 2 is low. There is a possibility that the effect of preventing the contamination of the material cannot be fully exhibited.

Second Embodiment FIG. 4C shows a combination of gas purge units 20a according to another embodiment of the present invention. In this embodiment, as shown in FIG. 4C, the first nozzle port 26 is formed in the first dedicated blowing member 22α, and the second nozzle port 28 is formed in the second dedicated blowing member 22β. Only the first nozzle port 26 is formed in the first dedicated blowing member 22α, and the second nozzle port 28 is not formed. Further, only the second nozzle port 28 is formed in the second dedicated blowing member 22β, and the first nozzle port 26 is not formed.

  In the present embodiment, the first dedicated blowing member 22α and the second dedicated blowing member 22β constitute a gas purge unit 20a, and the first dedicated blowing member 22α is located in the opening 13 more than the second dedicated blowing member 22β. It is arranged at a close position. By arranging in this way, the curtain flow blown from the second nozzle port 28 of the second dedicated blowing member 22β interferes with the inward flow of the container blown from the first nozzle port 26 of the first dedicated blowing member 22α. The flow of both is performed smoothly.

  In the present embodiment, a common air supply member 24 as shown in FIG. 1C may be connected to each of the first dedicated blowing member 22α and the second dedicated blowing member 22β, or gas may be supplied from separate supply means. May be supplied.

  In the present embodiment, the first dedicated blowing member 22α and the second dedicated blowing member 22β constitute the gas purge unit 20a, and the first embodiment is the same except that the number of parts is increased compared to the first embodiment. The same configuration and effects as the embodiment are obtained.

Third Embodiment FIG. 4D shows a combination of gas purge units 20b and 20c according to another embodiment of the present invention. In this embodiment, as shown in FIG. 4D, the first nozzle port 26 is formed in the first dedicated blowing member 22α, and the second nozzle port 28 is formed in the second dedicated blowing member 22β.

  In the present embodiment, the gas purge unit 20b having the first dedicated blowing member 22α without the second dedicated blowing member 22β is arranged along the Z-axis direction of the one side portion 13a of the opening 13 on the inner surface of the wall 11. It is fixed. In addition, the gas purge unit 20c having the second dedicated blowing member 22β without the first dedicated blowing member 22α is fixed along the Z-axis direction of the other side portion 13a of the opening 13 on the inner surface of the wall 11. is there.

  In the present embodiment, a container inward flow is formed by a single first dedicated blowing member 22α, and a curtain flow is formed by only the second dedicated blowing member 22β. Other configurations and operational effects are the same as those of the first embodiment or the second embodiment. In addition, the direction of the gas blown out from the first nozzle port 26 of the first dedicated blowing member 22α is not limited to FIG. 4D, and as a flow along the inner wall of the casing 2a of the container 2, for example, as shown in FIG. 4E. Also good.

  As shown in FIG. 4E, due to the flow of gas blown from the first nozzle port 26 and the flow of gas blown from the second nozzle port 28, the inside of the container 2 is moved to the right along the wall surface of the casing 2a. A gas flow that circulates around is formed. As a result, gas replacement inside the container 2 can be easily performed while obtaining a curtain effect on the opening surface of the opening 13.

Fourth Embodiment FIG. 4F shows a combination of gas purge units 20a and 20c according to another embodiment of the present invention. In this embodiment, as shown in FIG. 4F, the first nozzle port 26 is formed in the first dedicated blowing member 22α, and the second nozzle port 28 is formed in the second dedicated blowing member 22β.

  In the present embodiment, the gas purge unit 20a having the second dedicated blowing member 22β and the first dedicated blowing member 22α is fixed along the Z-axis direction of the one side portion 13a of the opening 13 on the inner surface of the wall 11. It is. In addition, the gas purge unit 20c having the second dedicated blowing member 22β without the first dedicated blowing member 22α is fixed along the Z-axis direction of the other side portion 13a of the opening 13 on the inner surface of the wall 11. is there.

  In the present embodiment, a container inward flow is formed by a single first dedicated blowing member 22α, and a curtain flow is formed by a pair of second dedicated blowing members 22β. Other configurations and operational effects are the same as those of the first to third embodiments. Note that the direction of the gas blown out from the first nozzle port 26 of the first dedicated blowing member 22α is not limited to FIG. 4F, as in the above-described embodiment.

Fifth Embodiment FIG. 4G shows a combination of gas purge units 20a and 20b according to another embodiment of the present invention. In this embodiment, as shown in FIG. 4G, the first nozzle port 26 is formed in the first dedicated blowing member 22α, and the second nozzle port 28 is formed in the second dedicated blowing member 22β.

  In the present embodiment, the gas purge unit 20a having the second dedicated blowing member 22β and the first dedicated blowing member 22α is fixed along the Z-axis direction of the one side portion 13a of the opening 13 on the inner surface of the wall 11. It is. The gas purge unit 20b having the first dedicated blowing member 22α and not having the second dedicated blowing member 22β is fixed along the Z-axis direction of the other side 13a of the opening 13 on the inner surface of the wall 11. It is.

  In the present embodiment, the inward flow of the container is formed by the pair of first dedicated blowing members 22α, and the curtain flow is formed by the single second dedicated blowing member 22β. Other configurations and operational effects are the same as those in the first to fourth embodiments. It is to be noted that the direction of the gas blown out from the first nozzle port 26 of the first dedicated blowing member 22α is not limited to FIG. 4G, as in the above-described embodiment.

Sixth Embodiment FIG. 4H shows a combination of gas purge units 20 and 20b according to another embodiment of the present invention. In this embodiment, as shown in FIG. 4H, the gas purge unit 20 having the bidirectional blowing member 22 is fixed along the Z-axis direction of one side 13 a of the opening 13 on the inner surface of the wall 11. The gas purge unit 20b having the first dedicated blowing member 22α and not having the second dedicated blowing member 22β is fixed along the Z-axis direction of the other side 13a of the opening 13 on the inner surface of the wall 11. It is.

  In this embodiment, the inward flow of the container is formed by the pair of first nozzle ports 26, and the curtain flow is formed by the single second nozzle port 28. Other configurations and operational effects are the same as those in the first to fifth embodiments. Note that the direction of the gas blown out from the first nozzle port 26 of the bidirectional blowing member 22 is not limited to that shown in FIG. 4H, as in the above-described embodiment.

Seventh Embodiment FIG. 4I shows a combination of gas purge units 20 and 20c according to another embodiment of the present invention. In this embodiment, as shown in FIG. 4I, the gas purge unit 20 having the bidirectional blowing member 22 is fixed along the Z-axis direction of one side portion 13 a of the opening 13 on the inner surface of the wall 11. The gas purge unit 20c having the second dedicated blowing member 22β and not having the first dedicated blowing member 22α is fixed along the Z-axis direction of the other side 13a of the opening 13 on the inner surface of the wall 11. It is.

  In the present embodiment, a container inward flow is formed by a single first nozzle port 26, and a curtain flow is formed by a pair of second nozzle ports 28. Other configurations and operational effects are the same as those in the first to sixth embodiments. Note that the direction of the gas blown from the first nozzle port 26 of the bidirectional blowing member 22 is not limited to FIG. 4I, as in the above-described embodiment.

  The present invention is not limited to the above-described embodiment, and can be variously modified within the scope of the present invention.

  For example, in the above-described embodiment, the gas purge unit of the present invention is applied to the load port device 10, but may be applied to other devices. For example, the gas purge unit of the present invention may be installed in another device or place where a clean environment is required.

DESCRIPTION OF SYMBOLS 1 ... Wafer 2 ... Sealed conveyance container 2a ... Casing 2b ... Opening 2c ... Opening edge 3 ... Positioning part 4 ... Lid 5 ... Air supply port 6 ... Exhaust port 10 ... Load port apparatus 11 ... Wall 12 ... Installation stand 13 ... Wall side Opening 13a ... Side edge 13b ... Upper edge 13b ... Lower edge 14 ... Movable table 16 ... Positioning pin 18 ... Door 20, 20a-20c ... Gas purge unit 21 ... Filter 22, 22a-22c ... Bidirectional blowing member 22α ... First Dedicated blowing member 22β ... Second dedicated blowing member 23 ... Blowing flow path 24 ... Air supply member 25 ... Air supply flow path 26 ... First nozzle port 27 ... Communication hole 28 ... Second nozzle port 28
29 ... Communication hole 30 ... Curtain nozzle 40 ... FFU
50 ... Robot arm 60 ... Intermediate room 70 ... Processing room

Claims (3)

A gas purge unit for introducing a cleaning gas into a purge target container having an opening through the opening,
A first nozzle port that blows a cleaning gas from the side of the opening toward the inside of the purge target container;
Cleaning gas is blown out from the side portion of the opening, and a second nozzle port that forms a gas flow in a direction along the opening surface of the opening,
The first nozzle port and the second nozzle port are formed in a single bidirectional blowing member,
The second nozzle port is formed in the second dedicated blowing member,
The gas purge unit, wherein the second dedicated blowing member is disposed on one side of the opening, and the bidirectional blowing member is disposed on the other side of the opening.   The gas purge unit according to claim 1, wherein the first nozzle port and the second nozzle port are formed continuously or intermittently along a longitudinal direction of a side portion of the opening. The container to be purged is detachably attached from the outside to a wall side opening formed in a wall whose inside is sealed,
The opening of the container to be purged and the wall side opening are communicated in an airtight manner,
The gas purge unit according to claim 1 or 2, wherein the gas purge unit is attached to at least one side portion of the wall-side opening inside the wall.

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