JP2017217595A - Liquid treatment device and liquid treatment method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To enhance efficiency of process for treating a liquid containing an object for reaction by plasma.SOLUTION: A liquid treatment device 1 has a liquid flow path 21 through which an object for reaction flows, a gas flow path 22 through which a gas flows, and a discharge part 40 for generating plasma of the gas. At an outlet of the liquid flow path, the gas flow path 22 is arranged with surrounding the liquid flow path 21. The discharge part 40 is arranged in the gas flow path 22. At the outlet of the liquid flow path 21, the gas flow path 22 and the liquid flow path 21 extend so that a direction to which the liquid flow path 21 extends and a direction to which the gas flow path 22 extends intersect at an acute angle.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an apparatus for processing a liquid containing a reactant using plasma, and a processing method using the apparatus.

  Various techniques for reacting an object to be reacted using plasma are known. For example, Patent Document 1 discloses a high-temperature electric plasma device for generating a high-temperature electric plasma torch and a liquid or gaseous waste, which is directly injected into the high-temperature electric plasma torch to complete the high-temperature treatment of the waste. A liquid or gaseous waste treatment device comprising an injection device is described.

  In Patent Document 2, in a liquid introduction plasma device that generates plasma in a plasma generation chamber, a spray device that sprays liquid into the plasma generation chamber from the spray port with a spray gas, and the vicinity of the spray port of the spray device, There is described a device including an surrounding gas introduction pipe that blows out surrounding gas surrounding a liquid sprayed into the plasma generation chamber from a blowing port. In this plasma apparatus, the sprayed liquid is surrounded by the surrounding gas so as to prevent the sprayed liquid from diffusing.

  Patent Document 3 discloses a plasma-liquid reaction device provided with a plasma generating means for generating plasma in the atmosphere, a holding means for liquid to be reacted, and a means for forcibly bringing the generated plasma into contact with the held liquid. Have been described. In this apparatus, an interaction between the plasma and the liquid is generated.

  Patent Document 4 discloses a gas microfluid having a plasma generation mechanism using gas discharge, a liquid microfluidic channel, and a gas / liquid formed by joining a gas microfluidic channel and a liquid microfluidic channel. A microfluidic device is described having a microphase channel.

Japanese Patent Laid-Open No. 7-19437 JP 2006-202541 A JP 2007-252981 A JP 2008-201723 A

  In the technique described in each of the above-mentioned patent documents, for example, when the contact between the liquid containing the reactant and the generated plasma is slow and the plasma is deactivated, or the contact area between the reactant and the plasma is small In some cases, the reactant may be swept away by the plasma airflow, and the contact frequency between the reactant and the plasma may be low, and it may not be easy to increase the reaction efficiency of the reactant due to these reasons. . Alternatively, when the contact between the liquid containing the reactant and the plasma is a batch type, the product and the plasma may react again, and it is not easy to increase the reaction efficiency of the reactant.

  Accordingly, an object of the present invention is to provide an apparatus for treating a reaction product that can eliminate the drawbacks of the above-described conventional technology.

The present invention is a liquid processing apparatus having a liquid flow path through which an object to be reacted flows, a gas flow path through which a gas flows, and a discharge unit for converting the gas into plasma,
At the outlet of the liquid channel, the gas channel is disposed so as to surround the liquid channel,
The discharge part is disposed in the gas flow path;
A liquid processing apparatus in which the gas flow path and the liquid flow path extend so that the direction in which the liquid flow path extends and the direction in which the gas flow path extends at an acute angle at the outlet of the liquid flow path Is to provide.

The present invention is also a liquid processing method using the liquid processing apparatus,
While circulating the liquid containing the reactant in the liquid channel, the gas is circulated in the gas channel and the gas is turned into plasma in the gas channel,
Provided is a liquid processing method in which the liquid discharged from the liquid flow path and the plasma gas discharged from the gas flow path are brought into contact with each other and the reactant in the liquid is chemically reacted by plasma. To do.

  ADVANTAGE OF THE INVENTION According to this invention, the efficiency of the process which carries out the chemical reaction process of the liquid containing a to-be-reacted object by plasma can be improved.

FIG. 1 is a cross-sectional view showing an embodiment of a liquid processing apparatus of the present invention. FIG. 2 is a perspective view showing a second block in the liquid processing apparatus shown in FIG. FIG. 3 is a view of the liquid processing apparatus shown in FIG. 1 as viewed from the discharge end side of the liquid channel and the gas channel. FIG. 4 is a cross-sectional view (corresponding to FIG. 1) showing another embodiment of the liquid processing apparatus of the present invention. FIG. 5 is a schematic diagram showing a state in which a chemical reaction is caused to the reaction object using the liquid processing apparatus shown in FIG. FIG. 6 is a cross-sectional view (corresponding to FIG. 1) showing another embodiment of the liquid processing apparatus of the present invention. FIG. 7 is a cross-sectional view (corresponding to FIG. 6) showing another embodiment of the liquid processing apparatus of the present invention. FIG. 8 is a cross-sectional view (corresponding to FIG. 1) showing still another embodiment of the liquid processing apparatus of the present invention.

  Hereinafter, the present invention will be described based on preferred embodiments thereof. The present invention relates to increasing the efficiency of chemical reactions utilizing the high activity of plasma. There is no restriction | limiting in particular in the chemical reaction used as the object of this invention. There is no particular limitation on the type of the reaction target. As the reactant, either an organic compound or an inorganic compound may be used. Further, the reactant may be a polymer or a low molecular weight. Further, the reactant may be soluble in the liquid or insoluble.

  The plasma contains various active species such as radicals generated by dissociation of gas molecules, in addition to charged particles and ions generated by ionization of gas molecules. In recent years, chemical reaction processes using the high activity of plasma have been actively studied, and their use in liquid sterilization and organic substance modification has been reported.

  As the gas used for generating plasma in the present invention, any kind of gas known so far can be used without particular limitation. For example, argon, helium, oxygen, nitrogen and the like can be mentioned.

  As a result of various studies by the present inventors from the viewpoint of efficiently promoting a chemical reaction using plasma, the contact area between the reactant and the plasma is generated by causing the reaction in a state where the liquid containing the reactant is atomized. It has been found that the reaction efficiency is improved. Further, as a result of the inventor's examination, it becomes possible to cause the intended chemical reaction to occur with high efficiency by bringing the plasma generated in the discharge part into contact with the reactant in a shorter time. did. One embodiment of a reactor capable of performing such chemical reactions is shown in FIG.

  The liquid processing apparatus 1 shown in FIG. 1 is configured by assembling a plurality of blocks. For example, the liquid processing apparatus 1 can be composed of two blocks, a first block 10 and a second block 20. The two blocks 10 and 20 are integrally assembled by inserting and tightening bolts (not shown) in the screw holes 11 provided in the blocks 10 and 20.

  The liquid processing apparatus 1 has a liquid channel 21 through which a liquid containing a reaction object flows. The liquid channel 21 is formed by perforating the second block 20. The liquid channel 21 extends substantially linearly, and both ends thereof are open. The opening at each end of the liquid channel 21 is a liquid input end 21a and a liquid discharge end 21b. The liquid channel 21 preferably has a circular shape in cross section, and is generally circular, but is not limited to this shape, and may be other shapes such as a polygon.

  FIG. 2 shows a second block 20 of the two blocks constituting the liquid processing apparatus 1. The second block 20 has a shape in which a columnar portion 20a and a frustoconical portion 20b are combined. The diameter of the circle of the columnar portion 20a and the diameter of the circle on the bottom surface of the frustoconical portion 20b substantially coincide with each other. Further, when a center line passing through the center of the circle of the cylindrical portion 20a is considered, the center line passes through the apex of the truncated cone portion 20b, and the cylindrical portion 20a and the truncated cone shape. Is combined with the part 20b. The liquid channel 21 described above extends along the X direction, which is the height direction of the cylindrical portion 20a. The liquid channel 21 is formed on a center line passing through the center of the circle of the cylindrical portion 20a. Therefore, the fluid flow path 21 is opened at the apex position of the frustoconical portion 20b, and the opening serves as the liquid discharge end 21b described above.

  Returning to FIG. 1, the liquid processing apparatus 1 shown in the figure has a gas flow path 22 through which a gas flows. The gas flow path 22 is formed by a gap generated between the first block 10 and the second block 20 when assembled. The gas flow path 22 has a continuous annular shape when a cross section perpendicular to the extending direction is viewed. As described above, the second block 20 is composed of a combination of the columnar portion 20a and the frustoconical portion 20b, so that the gap between the second block 20 and the first block 10 is determined. The formed gas flow path 22 has a continuous annular shape. Therefore, the gas channel 22 having an annular shape is arranged over the entire circumference of the liquid channel 21 described above. The liquid channel 21 is located at the center of an annular gas channel 22. That is, when viewed in a cross-section orthogonal to the direction in which the liquid channel 21 extends, the distance to the gas channel 22 is the same at any position of the gas channel 22 when viewed from the liquid channel 21. It has become. This relationship is established over the entire length direction of the gas flow path 22.

  One end of the gas flow path 22 communicates with the gas input end 12 formed in the first block 10. The other end of the gas flow path 22 is open and serves as a gas discharge end 13.

  As shown in FIG. 1, when the liquid channel 21 and the gas channel 22 are viewed in a cross section along their extending direction, the first part 31 in which both extend in parallel and the first part 31 in which the two are not parallel to each other. It is divided into two parts 32. The first part 31 is a part on the gas and liquid input end side. The second portion 32 is a portion on the gas and liquid discharge end side, and includes the outlet of the liquid flow path 21. Specifically, the second portion 32 includes a gas discharge end 13 and a liquid discharge end 21b. In the second part 32 including the outlet of the liquid channel 21, the extending direction of the gas channel 22 changes with respect to the first part 31. Specifically, in the second portion 32, the extending direction of the gas flow path 22 is directed to the extending direction of the liquid flow path 21, and the extending direction of the liquid flow path 21 and the extending direction of the gas flow path 22. The direction intersects. The extending direction of the gas flow path 22 changes in the second portion 32 so that the extending direction of the gas flow path 22 intersects the liquid flow path 21 extending linearly at an acute angle. As a result, the gas flow path 22 in the second portion 32 is gradually reduced in diameter as it goes toward the gas discharge end 13 when viewed in a cross section perpendicular to the extending direction. .

  As shown in FIG. 1, the liquid flow path 21 and the gas flow path 22 coincide with each other when the positions of the discharge ends 13 and 21 b are viewed along the extending direction thereof. And also in those discharge ends 13 and 21b, the state by which the gas flow path 22 is arrange | positioned over the perimeter of the liquid flow path 21 is maintained as shown in FIG. FIG. 3 is a view of the liquid processing apparatus according to the present embodiment as viewed from the discharge ends 13 and 21 b of the liquid flow path 21 and the gas flow path 22.

  As described above, the second block 20 is composed of a combination of the columnar portion 20a and the frustoconical portion 20b, and thus is formed by the gap between the second block 20 and the first block 10. The three-dimensional shape of the second portion 32 of the gas flow path 22 is a hollow frustoconical shape, in other words, a hollow frustum shape.

  In addition to the liquid flow path 21 and the gas flow path 22 that have been described so far, the liquid processing apparatus 1 has a discharge unit 40 for converting the gas into plasma. The discharge part 40 refers to a region where discharge occurs due to a potential difference applied between the electrodes. The discharge unit 40 is disposed in the gas flow path 22. In the present embodiment, in order to form the discharge part 40, a pair of electrodes 41 and 42 arranged so as to sandwich the gas flow path 22 are used as electrodes, but the form of the discharge part 40 is not limited to this. As long as the discharge part for generating plasma is of a known type, it can be used without limitation.

  FIG. 4 shows a modification of the embodiment shown in FIG. In the embodiment shown in FIG. 4, the second block 20 is made of a conductive material, and the discharge part 40 is formed by using it as an electrode instead of the electrode 42. Similarly, the first block 10 may be made of a conductive material without using the electrode 41 and may be used as an electrode instead of the electrode 41. In order to prevent a current from flowing directly to the surface where the first block 10 and the second block 20 are in contact, it is preferable that one of the first block 10 and the second block 20 is made of a non-conductive material.

  Returning to FIG. 1, each of the electrodes 41 and 42 is made of a conductive material. Each of the electrodes 41 and 42 is fixed to either one of the first block 10 and the second block 20 that are two blocks that define the gas flow path 22. The other electrode is fixed to the other of the first block 10 and the second block 20. FIG. 1 shows a state where the first electrode 41 is fixed to the first block 10 and the second electrode 42 is fixed to the second block 20. When the 1st block 10 and / or the 2nd block 20 are comprised from the electrically-conductive material, it is preferable that these blocks and the electrodes 41 and 42 are electrically insulated.

  In the electrode 41, the surface of the electrode 41 that is closer to the gas flow path 22, in other words, the surface that faces the gas flow path 22, is parallel to the direction in which the gas flow path 22 extends. It has become. Similarly, in the electrode 42, the surface of the electrode 42 on the side close to the gas flow path 22 is parallel to the direction in which the gas flow path 22 extends.

  As shown in FIGS. 1 and 2, the electrodes 41 and 42 are installed in the gas channel 22 at a position closer to the discharge end 13. Specifically, the electrodes 41 and 42 are installed in the second portion 32 of the gas flow path 22.

  The liquid processing apparatus 1 has a configuration in which a voltage can be applied between a pair of opposed electrodes 41 and 42. For example, an electric wire (not shown) for applying a voltage to each electrode 41, 42 can be connected, and the electric wire can be connected to a voltage source installed outside the apparatus 1. The voltage source may be a DC voltage source, an AC voltage source, or a pulse voltage source. Examples of the discharge method for generating plasma include glow discharge, corona discharge, high frequency discharge, and dielectric barrier discharge, but are not particularly limited as long as they are known plasma generation methods. The voltage applied by the voltage source is preferably 0.1 kV or more, more preferably 1.8 kV or more, and even more preferably 3.0 kV or more, from the viewpoint of effective generation of plasma. . Further, it is preferably 100 kV or less, more preferably 50 kV or less, and still more preferably 20 kV or less. For example, the voltage applied by the voltage source is preferably from 0.1 kV to 100 kV, more preferably from 1.8 kV to 50 kV, and even more preferably from 3.0 kV to 20 kV.

  When the liquid processing apparatus 1 having the above configuration is operated, a liquid containing a reactant is supplied from the input end 21 a of the liquid flow path 21 into the liquid flow path 21, and the gas flow from the gas input end 12. Gas is supplied into the passage 22. The liquid can be used as it is when the reactant itself is a liquid, and can be used by being dissolved or dispersed in a liquid medium when the reactant is not a liquid. As the liquid medium, water or a non-aqueous medium can be used depending on the type of the reactant.

  When the gas supplied into the gas flow path 22 reaches the discharge part 40, it is turned into plasma. The generated plasma is preferably a low-temperature plasma from the viewpoints of suppressing alteration of the reaction object due to heat and reducing power consumption in plasma generation. The low temperature plasma is a plasma having a gas temperature of 200 ° C. or lower at the time of contact with the reactant.

  The plasma P generated in this way is discharged out of the apparatus from the discharge end 13 of the gas flow path 22 as shown in FIG. At the same time, the liquid L flowing through the liquid flow path 21 is discharged from the discharge end 21b to the outside of the apparatus. In this case, at the discharge end 13, the entire periphery of the liquid flow path 21 is surrounded by the annular gas flow path 22, so that the liquid L is surrounded by the plasma P discharged from the discharge end 13. In this state, the ink is discharged from the discharge end 21b. Therefore, contact leakage between the liquid L and the plasma P is less likely to occur. Due to these reasons, the reactants in the liquid L react efficiently.

  Moreover, since the gas flow path 22 is bent toward the outlet of the liquid flow path 21 and the extending directions of both flow paths intersect each other, the liquid L forcibly passes through the air flow composed of the plasma P. It will be. This also increases the contact frequency between the plasma P and the liquid L. From the viewpoint of making this advantage even more prominent, it is preferable that the intersection angle between the direction in which the liquid channel 21 extends and the direction in which the gas channel 22 extend is an acute angle. In particular, the crossing angle is preferably 5 degrees or more, more preferably 15 degrees or more, and further preferably 30 degrees or more. The crossing angle is preferably 85 degrees or less, more preferably 75 degrees or less, and still more preferably 60 degrees or less. For example, the crossing angle is preferably 5 ° to 85 °, more preferably 15 ° to 75 °, and still more preferably 30 ° to 60 °. This crossing angle is an angle formed by the direction in which the liquid channel 21 extends and the direction in which the gas channel 22 extends when the liquid processing apparatus 1 is viewed along the direction in which the liquid channel 21 extends.

  In addition, when the gas flow rate is sufficiently high, the liquid L is atomized by the force of the plasma air flow and increases in surface area when discharged from the discharge end 21b and comes into contact with the plasma. Will greatly increase the chance of contact. As a result, the reaction efficiency is increased. The size of the droplet of the liquid L due to atomization is controlled by adjusting the flow rate and flow rate of the gas, the crossing angle, in addition to the cross-sectional area of the liquid flow channel 21 and the flow rate of the liquid L at the discharge end 21b. it can.

  Furthermore, in the liquid processing apparatus 1, the flow path 21 of the liquid L containing the reactant and the flow path 22 of the plasma P for reacting the reactant are independent, so the liquid L is plasma. It does not pass through the discharge part 40 for generating P. As a result, the discharge in the discharge part 40 can always maintain a constant state regardless of the properties of the liquid.

  In order to cause the reaction of the reactant by the plasma P, it is effective to use highly active plasma immediately after generation. From this point of view, it is advantageous that the discharge part 40 for generating the plasma P is disposed at a position close to the discharge end 21b of the liquid L. From this point of view, in the liquid processing apparatus 1 of the present embodiment, the discharge unit 40 is disposed in the second portion 32 of the gas flow path 22, which is a position close to the discharge end 21 b of the liquid L. Further, the discharge of the plasma P is further stabilized because the surfaces of the electrodes 41 and 42 facing the gas, that is, the surfaces close to the gas flow channel 22 are parallel to the direction in which the gas flow channel 22 extends.

  When the liquid processing apparatus 1 is operated, from the viewpoint of further enhancing the surrounding effect of the liquid by plasma and further enhancing the effect of atomization, the liquid flow rate (unit: L / min) including the reactants is increased. The gas flow rate (unit: L / min) is preferably larger. For example, the ratio of the gas flow rate (unit: L / min) to the flow rate (unit: L / min) of the liquid containing the reactant (hereinafter referred to as “gas / liquid ratio”) is preferably 10 or more. More preferably, it is 100 or more, and more preferably 3000 or more. The gas / liquid ratio is preferably 100,000 or less, more preferably 50,000 or less, and even more preferably 20,000 or less. For example, the gas / liquid ratio is preferably 10 or more and 100,000 or less, more preferably 100 or more and 50,000 or less, and still more preferably 3000 or more and 20,000 or less.

  6 to 8 show another embodiment of the liquid processing apparatus of the present invention. In the embodiments shown in these drawings, the description of the same points as those of the embodiments described so far will be omitted, and only different points will be described. 6 to 8, the same members as those in FIGS. 1 to 5 are denoted by the same reference numerals.

  In the embodiment shown in FIG. 6, the dielectric 43 is disposed on the surface close to the gas flow path 22 in at least one of the pair of electrodes 41, 42, that is, the surface facing the gas. The dielectric 43 is disposed so as to cover the entire surface facing the gas, or is disposed so as to cover at least a part of the surface facing the gas. In FIG. 6, a state in which the dielectric 43 is installed on the electrode 41 is shown, but the dielectric 43 may be installed on the electrode 42 instead. Alternatively, the dielectric 43 may be installed on both the electrodes 41 and 42. By covering at least one of the electrodes 41 and 42 with the dielectric 43, abnormal discharge can be suppressed, discharge can be further stabilized, and plasma can be generated more stably. From this point of view, it is preferable to use glass, alumina, zirconia, olefin resin, polyether ketone resin, or the like as the dielectric 43.

  FIG. 7 shows a modification of the embodiment shown in FIG. In the embodiment shown in FIG. 7, the second block 20 is made of a conductive material, and the discharge portion 40 is formed by using it as an electrode instead of the electrode 42. Similarly, the first block 10 may be made of a conductive material without using the electrode 41 and may be used as an electrode instead of the electrode 41. In order to prevent a current from flowing directly to the surface where the first block 10 and the second block 20 are in contact, it is preferable that one of the first block 10 and the second block 20 is made of a non-conductive material.

  In the embodiment shown in FIG. 8, the liquid processing apparatus 1 includes a mechanism for adjusting the channel width of the gas channel 22. By making the flow path width variable, the gas flow rate can be changed, thereby changing the state of atomization of the liquid. Further, by making the flow path width variable, the distance between the pair of electrodes 41 and 42 changes, and the discharge state can be changed. That is, the flow path width adjusting mechanism also serves as a mechanism for arbitrarily adjusting the distance between the electrodes of the pair of electrodes. However, it is not impeded to provide a mechanism for arbitrarily adjusting the inter-electrode distance separately from the flow path width adjusting mechanism.

  Various mechanisms can be used as the channel width adjusting mechanism, and there is no particular limitation on the mechanism. For example, in the embodiment shown in FIG. 8, a mechanism capable of sliding the second block 20 out of the two blocks 10 and 20 constituting the liquid processing apparatus 1 so as to be able to advance and retreat relative to the first block 10 is employed. ing. “Advancing and retracting” as used herein means that it can advance and retract along the direction in which the liquid channel 21 extends. And in the sliding direction, that is, the direction orthogonal to the direction in which the liquid flow path 21 extends, the surface where the first block 10 and the second block 20 abut, that is, between the surfaces indicated by reference numerals 10A and 20A in FIG. By interposing the spacer 50, the flow path width is adjusted. Increasing the thickness of the spacer 50 increases the width of the flow path and the distance between the electrodes. On the other hand, by reducing the thickness of the spacer 50, the flow path width is narrowed and the distance between the electrodes is narrowed.

  Specific examples of the chemical reaction of the reactant using the liquid treatment apparatus 1 of each of the above embodiments include, for example, treatment of harmful substances in water, sterilization of bacteria contained in water, gas fixation, and the like. Not limited to.

  Although the present invention has been described based on the preferred embodiments thereof, the present invention is not limited to the above-described embodiments, and various modifications can be made within the ordinary knowledge of those skilled in the art. It goes without saying that such modified embodiments are within the scope of the technical idea of the present invention. For example, in the above embodiment, as shown in FIG. 3, the gas flow path 22 is arranged so as to be continuous over the entire periphery of the liquid flow path 21. The figure formed by virtually connecting the opening of the gas flow path, that is, the discharge end may be a closed shape, and the discharge end of the liquid flow path 21 may be positioned within the closed shape.

  Hereinafter, the present invention will be described in more detail with reference to examples. However, the scope of the present invention is not limited to such examples.

[Example 1]
The reactant was reacted using the liquid processing apparatus 1 of the embodiment shown in FIG. The diameter of the liquid flow path 21 at the discharge end was 0.3 mm, and the annular diameter of the gas flow path 22 centering on the diameter was 3.0 mm.
Indigo carmine (Kanto Chemical Co., Ltd., CAS No. 860-22-0), which is a kind of blue dye, was used as a reaction product. A 20 mg / L aqueous solution of indigo carmine was prepared and supplied to the liquid channel 21 at a flow rate of 3 mL / min. Nitrogen gas was supplied to the gas flow path 22 as a gas to be converted into plasma. The supply amount was three conditions of 10 L / min, 20 L / min, and 50 L / min.
The voltage applied to the electrodes was a pulse voltage of 5.6 kV, the frequency was 6.0 kHz, and the pulse width was 2.0 μs.
As a result of operating the liquid processing apparatus 1 under the above conditions, it was confirmed that the blue color of indigo carmine fades in the aqueous solution after flowing through the liquid processing apparatus 1. The reason for this is that active species containing active oxygen such as plasma and OH radicals generated by the reaction of plasma and water molecules react with indigo carmine, and the chemical structure related to color development in the indigo carmine molecule is different from other chemicals. This is thought to be due to the change in structure. Further, it was confirmed that the blue color of the aqueous solution faded as the gas supply amount increased. The reaction rate or substance conversion rate of indigo carmine when the gas supply amount was 10 L / min, 20 L / min, and 50 L / min were 57%, 78%, and 96%, respectively. These reaction rates and substance conversion rates were determined by measuring absorbance at a wavelength of 610 nm using a spectrophotometer U-3310 manufactured by Hitachi High-Tech Science Co., Ltd. Calculated based on the concentration calculated using the line. The reaction rate and the substance conversion rate are calculated by dividing the indigo carmine concentration after flowing through the liquid processing apparatus 1 by the indigo carmine concentration before flowing through the liquid processing apparatus 1. The reason why the reaction was promoted by increasing the gas supply amount is that the surrounding effect of the reactants by the plasma was improved, and the contact area between the plasma and the aqueous solution increased because of the atomization of the aqueous solution. It is done.

DESCRIPTION OF SYMBOLS 1 Liquid processing apparatus 10 1st block 11 Screw hole 12 Gas input end 13 Gas discharge end 20 Second block 21 Liquid flow path 21a Liquid input end 21b Liquid discharge end 22 Gas flow path 31 1st part 32 2nd Part 40 Discharge part 41, 42 Electrode

Claims (7)

A liquid processing apparatus having a liquid flow path through which a reaction object flows, a gas flow path through which a gas flows, and a discharge unit for converting the gas into plasma,
At the outlet of the liquid channel, the gas channel is disposed so as to surround the liquid channel,
The discharge part is disposed in the gas flow path;
A liquid processing apparatus in which the gas flow path and the liquid flow path extend so that the direction in which the liquid flow path extends and the direction in which the gas flow path extends at an acute angle at the outlet of the liquid flow path .   The liquid processing apparatus according to claim 1, wherein the gas flow path is disposed over the entire periphery of the liquid flow path at an outlet of the liquid flow path.   The liquid processing apparatus according to claim 1, wherein the gas flow path has a hollow frustoconical shape, and the discharge unit is disposed in the gas flow path. The discharge unit includes a pair of electrodes arranged to face each other with the gas flow path interposed therebetween,
4. The liquid according to claim 1, wherein a surface of the electrode that is closer to the gas flow channel is parallel to a direction in which the gas flow channel extends. Processing equipment.   The liquid processing apparatus according to claim 1, further comprising a mechanism for adjusting a channel width of the gas channel.   6. The discharge unit according to claim 1, further comprising a pair of electrodes arranged to face each other so as to sandwich the gas flow path, and a mechanism for arbitrarily adjusting a distance between the pair of electrodes. The liquid processing apparatus according to item. A liquid processing method using the liquid processing apparatus according to any one of claims 1 to 6,
While circulating the liquid containing the reactant in the liquid channel, the gas is circulated in the gas channel and the gas is turned into plasma in the gas channel,
A liquid processing method, wherein the liquid discharged from the liquid flow path is brought into contact with a plasma gas discharged from the gas flow path, and the reactant in the liquid is chemically reacted by plasma.

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