JP2017213502A - Surface treatment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a surface treatment device capable of preventing reduction of substitution degree in a treatment chamber even when intervals are arranged between an entrained flow blocking roller and a treatment chamber.SOLUTION: There is provided a device having a treatment roller 1 and a treatment chamber 2 facing the treatment roller 1, supplying a substitution gas to inside and forming gas substitution discharge and modifying a surface of a film F by energy of the gas substitution discharge, and this has a constitution that entrained flow blocking rollers 7 and 10 which are different bodies from the treatment chamber 2 in a movement direction upstream side of the film F than the treatment chamber 2 and at a position facing the film F contacted with the treatment roller 1, the entrained flow blocking rollers 7 and 10 have a substitution gas release mechanism for releasing the substitution gas from a surface, block entrained flow adhered to the film F in an upstream side of the entrained flow blocking rollers 7 and 10, and entrain the substitution gas released from a surface in a downstream side of the entrained flow blocking rollers 7 and 10 with the film F.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a surface treatment apparatus for supplying a replacement gas into a processing chamber and modifying the surface of a film by gas replacement discharge.

2. Description of the Related Art A surface processing apparatus is known in which a replacement gas such as nitrogen is supplied into a processing chamber provided with a discharge electrode to form a gas replacement discharge, and a film surface that moves facing the processing chamber is modified.
For example, in Patent Document 1, a processing chamber is provided opposite to a grounded processing roller, a discharge electrode is provided in the processing chamber, and a replacement gas is supplied.
And the surface of the film conveyed in contact with the said processing roller is processed with the energy of gas displacement discharge.

In such a surface processing apparatus, in order to maintain a stable gas replacement discharge state in the processing chamber, the degree of gas replacement in the processing chamber is important.
However, there is a possibility that air outside the processing chamber adheres to the surface of the moving film and flows into the processing chamber as an entrained flow. If the entrained flow flows into the processing chamber and the concentration of the replacement gas inside decreases, the gas replacement discharge state may become unstable.

Therefore, it is necessary to increase the supply amount of the replacement gas to the processing chamber corresponding to the inflow of the accompanying flow, or to prevent the accompanying flow from flowing.
If the supply amount of the replacement gas is increased and the consumption amount is increased, there is a problem that the cost increases accordingly. Further, the replacement gas with the increased supply amount may leak out of the processing chamber and cause a problem. For example, if a large amount of nitrogen or the like flows out to the outside, an oxygen deficiency state is caused outside.

In order to cope with such a problem, in the apparatus of Patent Document 1, in order to prevent the inflow of the entrained flow, a nip roller that rotates by following the rotational force of the processing roller in contact with the film surface is opened in the processing chamber. It is provided close to. This conventional apparatus is provided with a nip roller in contact with the film in the vicinity of the processing chamber. The nip roller blocks the entrained flow layer on the film and prevents the entrained flow from flowing into the processing chamber. That's it.
However, there are cases where a nip roller for blocking the entrained flow cannot be provided near the processing chamber due to various conditions.

Therefore, an apparatus shown in FIG. 6 can be considered.
In this apparatus, the processing chamber 2 is disposed opposite to the processing roller 1 with which the film F is in contact. A discharge electrode 3 is provided in the processing chamber 2 and a replacement gas is supplied into the processing chamber 2 through the gas supply pipes 4 and 5.
In the figure, the arrow x indicates the direction of rotation of the processing roller, and the arrow a indicates the direction of movement of the film F that moves as the processing roller 1 rotates.
The gas supply pipe 4 is for guiding the replacement gas to the vicinity of the tip of the discharge electrode 3, and the gas supply pipe 5 is for supplying the replacement gas to the entire inside of the processing chamber 2.

  A nip roller 6 is provided upstream of the processing chamber 2 in the moving direction of the film F. The nip roller 6 is provided separately from the processing chamber 2. It is made to provide in the arbitrary positions which maintained the space | interval.

JP 2005-076063 A

In the conventional apparatus shown in FIG. 6, the entrained flow b from the upstream can be reliably blocked at the contact portion P between the nip roller 6 and the film F.
However, if the distance from the contact portion P to the upstream opening 2a of the processing chamber 2 is long, the film F may be accompanied by air or the like in the meantime. The amount of this entrained flow varies depending on the distance from the nip roller 6 to the processing chamber 2, the width of the film F, the moving speed of the film F, etc., but if the amount increases, the degree of substitution in the processing chamber 2 decreases. The problem occurs.
An object of the present invention is to provide a surface treatment apparatus capable of preventing a reduction in the degree of substitution in a processing chamber even when a gap is provided between the entrained flow blocking roller and the processing chamber.

The present invention is provided with a processing roller and a processing chamber facing the processing roller and supplying a replacement gas therein to form a gas replacement discharge, and the gas surface is moved on the film surface in contact with the processing roller. It is assumed that the surface treatment apparatus is modified by the energy of replacement discharge.
Based on the above apparatus, the first invention is the upstream of the film in the moving direction of the film, and the entrained flow separated from the processing chamber at a position facing the film in contact with the processing roller. A blocking roller is provided, and the entrained flow blocking roller has a replacement gas discharge mechanism for discharging a replacement gas from the surface, and blocks the accompanying flow adhering to the film on the upstream side of the accompanying flow blocking roller. The replacement gas released from the surface on the downstream side of the flow blocking roller is configured to accompany the film.

  In a second aspect of the present invention, the entrained flow blocking roller has a configuration in which the replacement gas is discharged only from the replacement gas discharge range corresponding to a specific rotation angle range.

  According to a third aspect of the present invention, the entrained flow blocking roller includes a replacement gas supply body in which a replacement gas is supplied, and a cylindrical outer layer supported so as to be relatively rotatable outside the replacement gas supply body. The replacement gas supply body has a replacement gas discharge port formed only in a portion corresponding to the replacement gas discharge range, and the outer layer has discharge holes that allow the replacement gas to flow over the entire circumference or substantially the entire circumference. It is formed.

  A fourth invention is characterized in that the replacement gas discharge range of the entrained flow blocking roller is fixed to face the film surface.

According to the first aspect of the present invention, the replacement gas released from the entrainment flow blocking roller adheres to the film surface between the entrained flow blocking roller and the processing chamber to form a replacement gas entrainment layer. For example, it is possible to prevent re-adhesion of other air such as air as an accompanying flow. Therefore, even if an interval is provided between the entrained flow blocking roller and the processing chamber, it is possible to prevent a gas other than the replacement gas from flowing into the processing chamber and to prevent a reduction in the degree of replacement in the processing chamber.
In other words, with the cutoff flow prevention roller of the present invention, the installation position is not limited to the vicinity of the upstream side of the processing chamber, and the degree of freedom of the installation position is increased.

According to the 2nd-4th invention, the discharge | release range of the replacement gas discharge | released from the surface of an entrainment flow interruption roller is limited, and a required amount of replacement gas can be discharge | released to a required part. Therefore, the consumption amount of the replacement gas can be suppressed, and the cost can be reduced accordingly.
Also, depending on the type of the replacement gas, there may be a problem due to discharge to the surroundings. However, according to the present invention, such a problem can be prevented.
In particular, according to the fourth invention, on the upstream side of the entrained flow blocking roller, the replacement gas more reliably blocks the accompanying flow against the accompanying flow such as the atmosphere, while on the downstream side of the entrained flow blocking roller, The replacement gas radiated toward the film can be entrained in the film, and adhesion of gases other than the replacement gas can be prevented more efficiently.

It is the schematic which shows 1st Embodiment. It is sectional drawing of the accompanying flow interruption | blocking roller of 1st Embodiment. It is the schematic which shows 2nd Embodiment. It is an axial sectional view of the entrainment flow blocking roller of the second embodiment. It is the VV sectional view taken on the line of FIG. It is the schematic which shows the conventional surface treatment apparatus.

The first embodiment shown in FIGS. 1 and 2 is separated from the processing chamber 2 at a position upstream of the processing chamber 2 in the moving direction of the film F and facing the film F in contact with the processing roller 1. A surface treatment apparatus provided with an accompanying flow blocking roller 7.
The configuration other than the accompanying flow blocking roller 7 is the same as that of the conventional apparatus shown in FIG. Therefore, the same reference numerals as those in FIG.
As shown in FIG. 2, the entrained flow blocking roller 7 of the first embodiment includes a porous layer 9 that is an outer layer of the present invention on the outer periphery of a central gas supply pipe 8. A plurality of discharge ports 8 a are formed in the side wall of the gas supply pipe 8, and a replacement gas supply source (not shown) is connected to the end of the gas supply pipe 8.
In the description of this embodiment, the upstream side and the downstream side are based on the moving direction of the film F unless otherwise specified.

The replacement gas supplied from the replacement gas supply source is discharged from the outer periphery of the entrained flow blocking roller 7 to the outside through the porous layer 9 from the discharge port 8a of the gas supply pipe 8. In the first embodiment, the replacement gas supply mechanism, the gas supply pipe 8, the discharge port 8a, and the porous layer 9 constitute the replacement gas discharge mechanism of the present invention.
In addition, the said porous porous layer 9 can be formed with a sintered ceramic, the foamed resin provided with the open cell, etc., for example.

The entrained flow blocking roller 7 as described above is provided in contact with the film F at a position spaced from the processing chamber 2.
In the apparatus according to the first embodiment, when the processing roller 1 rotates in the x direction, the entrained flow blocking roller 7 rotates in the y direction opposite to the rotation direction x of the processing roller 1 and from the outer periphery thereof by an arrow. The indicated replacement gas is discharged to the outside.
When the replacement gas is released from the surface of the accompanying flow blocking roller 7, the accompanying flow b on the upstream side of the accompanying flow blocking roller 7 is pushed away by the replacement gas and is blocked at the contact portion P with the film F. As a result, the accompanying flow b on the upstream side of the accompanying flow blocking roller 7 hardly moves beyond the contact portion P to the downstream side of the accompanying flow blocking roller 7.

In addition, on the downstream side of the entrained flow blocking roller 7, the replacement gas released from the surface of the porous layer 9 toward the film F adheres to the film F to form an accompanying layer, and a gas other than the replacement gas is attached. Make it harder.
Therefore, although the entrainment layer of the replacement gas formed on the film F flows into the processing chamber 2 on the downstream side of the entrainment flow blocking roller 7, the entrainment flow of the gas other than the replacement gas such as the atmosphere does not flow in. . Therefore, the degree of substitution in the processing chamber 2 does not decrease.
The entrainment flow blocking roller 7 is kept in a free rotating state so as to rotate in the y direction by the movement of the film F in contact therewith.

3-5 is an apparatus using the accompanying flow blocking roller 10 shown in FIGS. 4 and 5 in place of the accompanying flow blocking roller 7 of the first embodiment.
Other configurations are the same as those of the first embodiment. Therefore, the same reference numerals as those in FIG. 1 are used for the same constituent elements as those in the first embodiment, and individual descriptions are omitted.
As shown in FIGS. 4 and 5, the entrained flow blocking roller 10 of the second embodiment includes a central cylindrical body 12 that is a replacement gas supply body of the present invention and a ball bearing 13 in a hollow porous cylindrical body 11. It is incorporated so as to be relatively rotatable.

The porous cylinder 11 is composed of a porous cylindrical member formed in the same manner as the porous layer 9 of the first embodiment, and constitutes the outer layer of the present invention.
On the other hand, the central cylinder 12 includes a gas chamber 12a facing the inner wall of the porous cylinder 11 via a small gap, and a pair of support shafts 12b connected to both ends thereof. The support shaft 12b is a cylindrical member that communicates with the inside of the gas chamber 12a.
The gas chamber 12a has a plurality of small holes 12c in a specific range in the circumferential direction.
The range in which the small holes 12c are formed is a range corresponding to the rotation angle α of the porous cylinder 11 as shown in FIG.

The roller 10 as illustrated can be assembled as follows, for example.
First, the central cylindrical body 12 is inserted into the porous cylindrical body 11, and the support shaft 12b of the central cylindrical body 12 is protruded from both axial ends of the porous cylindrical body 11. Next, a ball bearing 13 is fitted between the support shaft 12 b and the porous cylinder 11. At this time, the support shaft 12 b is press-fitted into the inner ring 13 a of the ball bearing 13, and a dimensional relationship is provided in which the outer ring 13 b of the ball bearing 13 is press-fitted into the porous cylinder 11.

Further, a replacement gas supply pipe 14 connected to a replacement gas supply source (not shown) is connected to the support shaft 12b of the central cylinder 12 so that the replacement gas can be supplied to the inside.
Further, the ball bearing 13 is a bearing with a seal so that the replacement gas in the porous cylinder 11 does not leak outside through the ball bearing 13.
In the second embodiment, the replacement gas supply mechanism, the pipe 14, the central cylinder 12, the small hole 12c, and the porous cylinder 11 constitute the replacement gas discharge mechanism of the present invention.

The outer periphery of the entrained flow blocking roller 10 as described above, that is, the porous cylinder 11 is provided so as to contact the film F on the processing roller 1, and the support shaft 12b of the central cylinder 12 is fixed to an external base (not shown). . At this time, the range of the rotation angle α of the gas chamber 12a in which the small hole 12c is formed is positioned on the contact portion P (see FIG. 3) side with the film F.
Further, the porous cylinder 11 is in a freely rotatable state around the central cylinder 12. Accordingly, when the processing roller 1 rotates and the film F moves, the porous cylinder 11 rotates in the y direction opposite to the processing roller 1 in accordance with the movement (see FIG. 3).

As described above, in the second embodiment, the central cylindrical body 12 is fixed so that the small hole 12c formed in the gas chamber 12a is positioned on the contact portion P side with the film F.
Therefore, even if the porous cylinder 11 rotates with the film F, the small hole 12c formed in the fixed central cylinder 12 always maintains the position on the side facing the film F.
Therefore, also in the porous cylinder 11 formed entirely porous, the replacement gas is released only from the range corresponding to the rotation angle α. That is, the small hole 12c is the replacement gas discharge port of the present invention, and the range of the rotation angle α corresponds to the replacement gas discharge range.

In the second embodiment, when the replacement gas is supplied to the central cylinder 12, the replacement gas released from the porous cylinder 11 that is the surface of the entrained flow blocking roller 10 is released toward the surface of the film F. Will be.
However, since there is a gap between the central cylinder 12 and the porous cylinder 11, there is a possibility that the replacement gas supplied to the gap leaks somewhat from the portion other than the replacement gas discharge range.
A linear convex portion that is continuous in the axial direction of the central cylindrical body 12 is formed at positions corresponding to both outer sides of the rotation angle α on the outer peripheral surface of the central cylindrical body 12 to restrict the flow of the replacement gas. If the mechanism is formed, the replacement gas discharge range corresponding to the rotation angle α and other portions are more clearly divided, and the directivity in the discharge direction of the replacement gas can be enhanced.

Also in the apparatus of the second embodiment, the accompanying flow b such as the atmosphere attached to the surface during the movement process of the film F is blocked by the contact portion P of the accompanying flow blocking roller 10 and at the downstream side of the porous cylinder body A replacement gas released from the film 11 toward the film F can be accompanied.
As described above, also in the second embodiment, by actively entraining the replacement gas with the film F on the downstream side of the entrainment flow blocking roller 10, gas other than the replacement gas such as the atmosphere is exchanged with the processing chamber 2. It can prevent adhesion.

In the second embodiment, the position of the small hole 12c formed in the gas chamber 12a of the central cylindrical body 12 of the entrained flow blocking roller 10 is limited to the rotation angle α, so that the replacement gas discharge range can be reduced. Limited. Therefore, it is possible to reduce the amount of replacement gas released to the atmosphere as it is without going to the film F. That is, the replacement gas is not wasted and the cost can be suppressed.
Further, in the case where various problems occur due to the replacement gas flowing out of the apparatus, a means for exhausting the replacement gas discharged to the outside of the processing chamber 2 must be provided. The exhaust means can be omitted if the replacement gas discharge range is limited as in the embodiment.

  The replacement gas discharge range may be set according to the purpose. For example, when the moving speed of the film is high and the time for attaching the replacement gas is shortened, and when the distance between the entrained flow blocking roller 10 and the processing chamber 2 is large, the replacement gas is brought into contact with the film F. In order to lengthen the time, it is conceivable to increase the replacement gas discharge range.

As described above, in the surface treatment apparatuses of the first and second embodiments, the entrained flow blocking rollers 7 and 10 provided at positions spaced from the processing chamber 2 block the entrained flow from the upstream side, On the downstream side, the replacement gas can be entrained in the film F, so that the inflow of gas that causes a decrease in the degree of replacement into the processing chamber 2 can be prevented more reliably.
And the freedom degree of the installation position of the accompanying flow interruption | blocking rollers 7 and 10 can be raised.

  In the first and second embodiments, the outer surfaces of the accompanying flow blocking rollers 7 and 10 are in contact with the film F. However, the accompanying flow blocking rollers 7 and 10 may not be in contact with the film F. Absent. However, the distance between the accompanying flow blocking rollers 7 and 10 and the surface of the film F needs to be close enough to exhibit the blocking effect against the accompanying flow. When the entrained flow blocking rollers 7 and 10 and the film F are not in contact with each other, the entrained flow blocking rollers 7 and 10 are rotated by a driving mechanism, and the rotation of the gas flow facing the entrained flow b is caused. You may make it form.

1 and 3, the processing chamber 2 is positioned above the processing roller 1, but the positional relationship between the processing roller 1 and the processing chamber 2 is not limited to this. It is only necessary that the two are disposed to face each other with the film F to be processed interposed therebetween. For example, the processing chamber 2 may be positioned beside or below the processing roller 1.
In the above embodiment, the processing roller 1 is connected to the ground, but the processing roller 1 is grounded if a potential difference capable of forming a gas displacement discharge is maintained with the discharge electrode 3 in the processing chamber 2. It may not be a potential.
Furthermore, the configuration of the processing chamber 2 may be any configuration as long as a replacement gas can be introduced therein to form a gas replacement discharge. The present invention is not limited to the above embodiment.
Further, the material and thickness of the film to be processed are not limited. For example, it can be used for surface modification of paper or metal in addition to resin.

  The present invention can be applied to a surface treatment apparatus for modifying a film surface having various characteristics by gas displacement discharge.

DESCRIPTION OF SYMBOLS 1 Processing roller 2 Processing chamber 3 Discharge electrode 4 Gas supply pipe 5 Gas supply pipe 7 Entrainment flow interruption roller 8 Gas supply pipe 8a Release port 9 (Outer layer) Porous layer 10 Entrainment flow interruption roller 11 (Outer layer) Porous cylindrical body 12 (Gas Supply body) Central cylinder 12a Gas chamber 12b Support shaft 13 Ball bearing 14 Pipe F (for replacement gas supply) Film α Rotation angle (replacement gas discharge range)

Claims (4)

A processing roller;
A processing chamber is provided facing the processing roller and supplying a replacement gas therein to form a gas replacement discharge.
In the surface treatment apparatus for modifying the film surface moving in contact with the treatment roller with the energy of the gas replacement discharge,
An entrainment flow blocking roller separated from the processing chamber is provided on the upstream side of the processing chamber in the moving direction of the film and facing the film in contact with the processing roller,
The accompanying flow blocking roller is
With a replacement gas release mechanism that releases replacement gas from the surface,
A surface treatment apparatus configured to block an accompanying flow adhering to the film on the upstream side of the entrained flow blocking roller, and to allow the replacement gas released from the surface on the downstream side of the entrained flow blocking roller to accompany the film. The accompanying flow blocking roller is
The surface treatment apparatus of Claim 1 provided with the structure by which substitution gas is discharge | released only from the substitution gas discharge | release range corresponding to a specific rotation angle range. The accompanying flow blocking roller is
A replacement gas supply body in which a replacement gas is supplied;
It consists of a cylindrical outer layer supported so as to be relatively rotatable outside the replacement gas supply body,
In the replacement gas supply body, a replacement gas discharge port is formed only in a portion corresponding to the replacement gas discharge range,
The surface treatment apparatus according to claim 2, wherein the outer layer is formed with discharge holes that allow the replacement gas to flow over the entire circumference or substantially the entire circumference.   The surface treatment apparatus according to claim 2 or 3, wherein a replacement gas discharge range of the entrained flow blocking roller is fixed to face the film surface.

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